Apparatus and tuning method for mitigating RF load impedance variations caused by periodic disturbances - Patents.com

Abstract

The radio frequency (RF) power generation system includes an RF power supply that generates an RF output signal that is supplied to a load. An RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, the parameter being controlled according to a trigger signal. The parameter is adjusted according to a cost function, the cost function being determined by applying a perturbation to an actuator that affects the cost function. The actuator may control the external RF output signal, and the trigger signal may vary according to the external RF output signal.

Description

[Technical field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims priority to U.S. Utility Application No. 17 / 102,598, filed November 24, 2020. The entire disclosure of the above application is incorporated herein by reference.

[0002] The present disclosure relates to RF generator systems and control of RF generators. [Background technology]

[0003] The background discussion provided herein is intended to generally present the context of the present disclosure. The presently cited inventors' work within the scope of what is described in this background section, as well as aspects of the description that may not be considered prior art at the time of filing, are not admitted expressly or impliedly as prior art to the present disclosure.

[0004] Plasma production is often used in semiconductor manufacturing. In plasma production, ions are accelerated by an electric field to etch material from or deposit material onto the surface of a substrate. In one basic implementation, the electric field is generated based on a radio frequency (RF) or direct current (DC) power signal generated by a respective RF or DC generator in a power supply system. The power signal generated by the generator must be precisely controlled to perform plasma etching efficiently. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] U.S. Patent No. 7,602,127 [Patent Document 2] U.S. Patent No. 8,110,991 [Patent Document 3] U.S. Patent No. 8,395,322 [Patent Document 4] U.S. Patent Application Serial No. 13 / 834,786 [Patent Document 5] U.S. Patent No. 9,947,514 [Patent Document 6] U.S. Provisional Patent Application No. 62 / 923,959 [Patent Document 7] U.S. Patent Application Serial No. 16 / 452,716 [Patent Document 8] U.S. Patent No. 10,546,724 Summary of the Invention [Means for solving the problem]

[0006] The radio frequency (RF) generator includes an RF power source. The RF generator also includes an RF power controller coupled to the RF power source. The RF power controller is configured to generate a control signal to vary an RF output signal from the RF power source. The RF power controller is further configured to adjust a parameter associated with the RF output signal according to the trigger signal. The parameter is adjusted according to one of minimizing or maximizing a cost in response to a perturbation of the parameter.

[0007] The radio frequency (RF) generator system includes a first power supply configured to output a first RF signal that is applied to a load. The RF generator system also includes a second RF generator. The second RF generator includes a second power supply configured to generate a second RF signal that is applied to the load. The second RF generator also includes a power controller coupled to the second power supply. The power controller is configured to generate a control signal to vary the second RF signal, the control signal adjusting a frequency of the second RF signal that varies according to the first RF signal. The frequency adjustment varies according to a cost in response to a perturbation in the frequency of the RF signal.

[0008] A method for generating a radio frequency (RF) signal includes coupling a power controller to an RF power source. The method also includes controlling a first RF generator to output a first RF output signal. The method also includes adjusting an electrical parameter associated with applying the RF output signal to a load. The electrical parameter is adjusted according to a cost, the cost being one of minimized or maximized according to a response of the electrical parameter to a perturbation, and the electrical parameter is adjusted relative to a trigger signal.

[0009] Implementations may include one or more of the following features: a method in which a cost is determined according to one of a reflected power or a magnitude of a reflection coefficient; a method in which a slope is determined according to a cost and an electrical parameter is adjusted according to the slope; a method in which an electrical parameter is adjusted according to a plurality of adjustments arranged in a pattern; a method in which the pattern varies according to a period of an external RF output signal; a method in which the external RF output signal includes a plurality of bins and a parameter is perturbed within each bin; a method in which the RF output signal is a source RF signal applied to the plasma chamber, the trigger signal varies according to the external RF output signal, and the external RF output signal is a bias RF signal applied to the plasma chamber; a method in which the RF power controller adjusts the electrical parameter according to the trigger signal, the trigger signal indicating a relative position of the external RF output signal; a method in which the electrical parameter is one of a frequency or a frequency offset and includes a plurality of respective frequencies or frequency offsets used by the RF power controller to adjust the electrical parameter in a predetermined order according to the trigger signal; a method in which the electrical parameter is adjusted according to intermodulation distortion caused by the external RF output signal.

[0010] A non-transitory computer readable medium stores instructions for controlling a first RF generator to output a first RF output signal to a load, the instructions also varying a value of an electrical parameter associated with one of the RF output signal or the provision of the RF output signal to the load, the value of the electrical parameter being determined according to a cost, the cost being one of minimized or maximized according to a response of the electrical parameter to a perturbation, and the value being varied in response to a trigger signal.

[0011] Implementations may include one or more of the following features: A non-transitory computer readable medium in which the cost varies according to one of a reflected power or a magnitude of a reflection coefficient; A non-transitory computer readable medium in which a gradient is determined according to the cost and the electrical parameter is varied according to the gradient; A non-transitory computer readable medium in which varying the value of the electrical parameter includes applying a plurality of electrical parameters arranged in a pattern, the pattern varying according to a period of an external RF output signal; A non-transitory computer readable medium in which the RF output signal is a source RF signal applied to the plasma chamber, the trigger signal varies according to the external RF output signal, the external RF output signal being a bias RF signal applied to the plasma chamber; A non-transitory computer readable medium in which the external RF output signal includes a plurality of bins, and for each bin, the electrical parameter is perturbed within each bin; A non-transitory computer readable medium in which the parameter that is varied is a frequency offset, and includes a plurality of frequencies of the RF output signal that are output in a predetermined order according to the trigger signal; A non-transitory computer readable medium in which the parameter is varied according to intermodulation distortion caused by the external RF output signal.

[0012] Further areas of applicability of the present disclosure will become apparent from the detailed description, the claims, and the drawings. The detailed description and specific examples are for purposes of illustration only and are not intended to limit the scope of the present disclosure.

[0013] The present disclosure will become more fully understood from the detailed description and the accompanying drawings, in which: [Brief description of the drawings]

[0014] [Figure 1] FIG. 1 illustrates a representation of an inductively coupled plasma system. [Diagram 2] FIG. 1 illustrates a representation of a capacitively coupled plasma system. [Diagram 3] FIG. 1 illustrates a generalized representation of a plasma system arranged in accordance with various embodiments of the present disclosure. [Figure 4] 1 is an example plot of intermodulation distortion (IMD) resulting from applying two signals of different frequencies to a nonlinear reactor. [Diagram 5] FIG. 2 illustrates voltage and power waveforms for a system having two RF signals applied to a load and the effect of intermodulation distortion on the power delivery to the load. [Figure 6] FIG. 2 illustrates voltage and power waveforms for a system with two RF signals applied to a load and the power delivery when there is no intermodulation distortion between the two signals. [Figure 7] FIG. 1 is a schematic diagram of a power supply system having multiple power sources arranged in accordance with various embodiments of the present disclosure. [Figure 8] 2A and 2B are diagrams showing the waveform of an RF signal and pulses that modulate the RF signal. [Figure 9] FIG. 13 illustrates voltage and power waveforms for a system with two RF signals applied to a load with no periodic impairment compensation applied. [Figure 10] FIG. 1 illustrates voltage and power waveforms for a system with two RF signals applied to a load with periodic impairment compensation applied. [Figure 11] FIG. 1 illustrates a waveform subdivided into bins to illustrate the periodic impairment compensation system described herein. [Figure 12] 1 is a flow chart of a periodic fault compensation system. [Figure 13] FIG. 1 is a functional block diagram of a periodic fault compensation system. [Figure 14]FIG. 1 illustrates voltage and power waveforms for a system having two RF signals applied to a load, where periodic impairment compensation is applied in accordance with the present disclosure. [Figure 15] FIG. 16 illustrates voltage and power waveforms for the system of FIG. 15, where the periodic impairment compensation further includes smoothing the transitions between each compensation value. [Figure 16] FIG. 1 illustrates an RF generator configured to compensate for periodic system impairments. [Figure 17] FIG. 2 is a functional block diagram of an exemplary control module arranged in accordance with various embodiments. [Figure 18] 1 is a flow chart of the operation of a control system arranged in accordance with the principles of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0015] In the drawings, reference numbers may be reused to identify similar and / or identical elements.

[0016] The power system may include a DC or RF power generator or a matching network, and a load (such as a process chamber, a plasma chamber, or a reactor with fixed or variable impedance). The power generator generates a DC or RF power signal, which is received by a matching network or an impedance optimization controller or circuit. The matching network or impedance optimization controller or circuit matches the input impedance of the matching network to the characteristic impedance of the transmission line between the power generator and the matching network. The impedance matching helps to maximize the amount of power transferred to the matching network ("forward power") and minimize the amount of power reflected from the matching network to the power generator ("reverse power" or "reflected power"). When the input impedance of the matching network matches the characteristic impedance of the transmission line and the generator, the forward power can be maximized and the reverse power can be minimized.

[0017] In the field of power supplies or power delivery, there are typically two approaches to applying a power signal to a load. The first, more traditional approach is to apply a continuous power signal to a load. In continuous mode or continuous wave mode, the continuous power signal is typically a constant DC or sinusoidal RF power signal that is continuously output by the power supply to the load. In the continuous mode approach, the power signal is assumed to be a constant DC or sinusoidal output, and the amplitude and / or frequency (for RF power signals) of the power signal may be varied to vary the output power applied to the load.

[0018] A second approach for applying a power signal to a load involves pulsing the RF signal rather than applying a continuous RF signal to the load. In a pulsed mode of operation, the RF signal is modulated by a modulation signal to define an envelope for the modulated power signal. For example, the RF signal can be a sinusoidal RF signal or other time-varying signal. The power delivered to the load is typically varied by varying the modulation signal.

[0019] In a typical power supply configuration, the output power applied to a load is determined using sensors that measure the forward and reflected power or voltage and current of an RF signal applied to the load. Any set of these signals is analyzed in a control loop. The analysis typically determines a power value that is used to adjust the output of the power supply to vary the power applied to the load. In a power supply system where the load is a process chamber or other nonlinear or time-varying load, the applied power is to some extent a function of the impedance of the load, so that varying load impedance causes a corresponding variation in the power applied to the load.

[0020] In systems where the manufacture of various devices relies on the introduction of power to a load to control the manufacturing process, the power is typically provided in one of two configurations. In the first configuration, the power is capacitively coupled to the load. Such systems are referred to as Capacitively Coupled Plasma (CCP) systems. In the second configuration, the power is inductively coupled to the load. Such systems are typically referred to as Inductively Coupled Plasma (ICP) systems. Power coupling to the plasma can also be achieved via waveform coupling at microwave frequencies. Such approaches typically use electron cyclotron resonance (ECR) or microwave sources. Helicon sources are another form of waveform-coupled sources, typically operating at RF frequencies similar to those of conventional ICP and CCP systems. The power delivery system can include at least one bias power and / or source power applied to one or more of the electrodes of the load. The source power typically creates the plasma and controls the plasma density, while the bias power modulates the ions in the formation of the sheath. The bias and source may share the same electrode or use separate electrodes according to various design considerations.

[0021] When a power supply system drives a time-varying or nonlinear load, such as a process or plasma chamber, the power absorbed by the bulk plasma and plasma sheath results in a density of ions with a range of ion energies. One characteristic measure of ion energy is the IEDF. The IEDF can be controlled using bias power. One method of controlling the IEDF for a system in which multiple RF power signals are applied to a load occurs by varying multiple RF signals related in amplitude, frequency and phase. The relative amplitude, frequency and phase of the multiple RF power signals can also be related in a Fourier series and related coefficients. The frequency between the multiple RF power signals can be locked and the relative phase between the multiple RF signals can also be locked. Examples of such systems can be found by reference to U.S. Pat. No. 7,602,127, U.S. Pat. No. 8,110,991, and U.S. Pat. No. 8,395,322, all of which are assigned to the assignee of the present application and incorporated herein by reference.

[0022] Time-varying or nonlinear loads may exist in a variety of applications. In one application, a plasma processing system may also include components for plasma generation and control. One such component is a nonlinear load implemented as a process chamber, such as a plasma chamber or reactor. As an example, a typical plasma chamber or reactor utilized in a plasma processing system, such as for thin film manufacturing, may utilize a dual power system. One power generator (source) controls the generation of the plasma and one power generator (bias) controls the ion energy. Examples of dual power systems include those described in the above-referenced U.S. Pat. Nos. 7,602,127, 8,110,991, and 8,395,322. The dual power systems described in the above-referenced patents require a closed-loop control system to adapt the power supply operation to control the ion density and its corresponding ion energy distribution function (IEDF).

[0023] There are several approaches to control a process chamber that can be used to generate plasma. For example, in an RF power supply system, the phase and frequency of multiple driving RF signals operating at the same or nearly the same frequency can be used to control plasma generation. For RF-driven plasma sources, periodic waveforms that affect plasma sheath dynamics and corresponding ion energy are generally known and controlled by the frequency and associated phase interactions of the periodic waveforms. Another approach in RF power supply systems involves dual frequency control. That is, two RF frequency sources operating at different frequencies are used to power the plasma chamber to provide substantially independent control of ion and electron density.

[0024] Another approach utilizes a broadband RF power source to drive the plasma chamber. The broadband approach presents several challenges. One challenge is coupling the power to the electrodes. A second challenge is that the transfer function of the generated waveform to the actual sheath voltage for the desired IEDF must be formulated for a wide process space to support material surface interaction. In one approach that is responsive in inductively coupled plasma systems, controlling the power applied to the source electrode controls the plasma density, while controlling the power applied to the bias electrode modulates the ions to control the IEDF and provide etch rate control. Using control of the source and bias electrodes, the etch rate is controlled via ion density and ion energy.

[0025] As the manufacturing of integrated circuits and integrated devices continues to evolve, so do the power requirements to control the processes for manufacturing. For example, for memory device manufacturing, the requirements for bias power continue to increase. With increased power, more energetic ions are generated for faster surface interactions, thereby increasing the etch rate and directionality of the ions. In RF systems, increased bias power may be accompanied by lower bias frequency requirements along with an increased number of bias supplies coupled to the plasma sheath generated in the plasma chamber. Increased power at lower bias frequencies and an increased number of bias supplies result in intermodulation distortion (IMD) emissions from sheath modulation. IMD emissions may significantly reduce the power supplied by the source where plasma generation occurs. U.S. Patent Application No. 13 / 834,786, filed March 15, 2013, entitled Pulse Synchronization by Monitoring Power in Another Frequency Band, which is assigned to the assignee of the present application and incorporated herein by reference, describes a method of pulse synchronization by monitoring power in another frequency band. In the referenced U.S. patent application, the pulsing of the second RF generator is controlled according to detecting the pulsing of the first RF generator at the second RF generator, thereby synchronizing the pulsing between the two RF generators.

[0026] FIG. 1 shows a representation of an inductively coupled plasma (ICP) system 110. The ICP system 110 includes a nonlinear load, such as a reactor, plasma reactor, or plasma chamber 112, referred to interchangeably herein, to generate a plasma 114. Power in the form of voltage or current is applied to the plasma chamber 112 through a pair of coils, which in various embodiments include a coil assembly including an inner coil 116 and an outer coil 118. Power is applied to the inner coil 116 through an RF power generator or power supply 120, and power is applied to the outer coil 118 through an RF power generator or power supply 122. The coils 116 and 118 are attached to a dielectric window 124 that aids in coupling the power to the plasma chamber 112. A substrate 126 is placed within the plasma chamber 112 and generally forms a workpiece that is the subject of the plasma action. An RF power generator, power supply, or power supply 128 (these terms may be used interchangeably herein) applies power to the plasma chamber 112 through the substrate 126. In various configurations, the power supplies 120, 122 provide a source voltage or current to ignite or generate the plasma 114 or to control the plasma density. Also, in various configurations, the power supply 128 provides a bias voltage or current to modulate the ions to control the ion energy or ion density of the plasma 114. In various embodiments, the power supplies 120, 122 are locked to operate at the same frequency, voltage, and current with a fixed or varying relative phase. In various other embodiments, the power supplies 120, 122 may operate at different frequencies, voltages, and currents, and relative phases.

[0027] FIG. 2 shows a representation of a capacitively coupled plasma (CCP) system 210. The CCP system 210 includes a plasma chamber 212 for generating a plasma 214. A pair of electrodes 216, 218 disposed within the plasma chamber 212 connect to DC (ω=0) or RF power generators or sources 220, 222, respectively. In various embodiments, the source 220 provides a source voltage or current for igniting or generating the plasma 214 or for controlling the plasma density. In various embodiments, the source 222 provides a bias voltage or current for modulating ions in the plasma to control the ion energy and / or ion density of the plasma 214. In various RF embodiments, the sources 220, 222 operate in relative phase when the sources are harmonically related. In various other embodiments, the sources 220, 222 operate at different frequencies, voltages, and currents with fixed or varying relative phases. Also, in various embodiments, the power sources 220, 222 may be connected to the same electrode while the counter electrode is connected to ground or even to a third DC (ω=0) or RF power generator (not shown).

[0028] 3 shows a cross-sectional view of a generalized representation of a dual power input plasma system 310. The plasma system 310 includes a first electrode 312 connected to ground 314 and a second electrode 316 spaced apart from the first electrode 312. A first DC (ω=0) or RF power source 318 generates a first RF power at a first frequency f=ω1 that is applied to the second electrode 316. A second power source 320 generates a second DC (ω=0) or RF power that is applied to the second electrode 316. In various embodiments, the second power source 320 operates at a second frequency f=ω2, where ω2=nω is an nth harmonic frequency of the frequency of the first power source 318. In various other embodiments, the second power source 320 operates at a frequency that is not a multiple of the frequency of the first power source 318.

[0029] The coordinated operation of the respective power sources 318, 320 results in the generation and control of a plasma 322. As shown in the schematic diagram of Figure 3, the plasma 322 is formed within an asymmetric sheath 330 of a plasma chamber 324. The sheath 330 includes a ground or earthed sheath 332 and a powered sheath 334. A sheath is generally described as a surface area surrounding the plasma 322. As seen in the schematic diagram of Figure 3, the grounded sheath 332 has a relatively large surface area 326. The powered sheath 334 has a small surface area 328. Each sheath 332, 334 acts as a dielectric between the conductive plasma 322 and the respective electrode 312, 316, so that each sheath 332, 334 forms a capacitance between the plasma 322 and the respective electrode 326, 328.

[0030] As described in more detail herein, in a system of a high frequency voltage source, such as the second power source 320, and a low frequency voltage source, such as the first power source 318, intermodulation distortion (IMD) products are introduced. The IMD products are due to variations in the plasma sheath thickness, which varies the capacitance between the plasma 322 and the electrode 312 through the ground sheath 332 and between the plasma 322 and the electrode 316 through the feed sheath 334. The variations in the capacitance of the feed sheath 334 generate IMD. The variations in the feed sheath 334 have a larger effect on the capacitance between the plasma 322 and the electrode 316, and therefore on the reverse IMD radiated from the plasma chamber 324. In some plasma systems, the ground sheath 332 acts as a short circuit, and its effect on the reverse IMD is not considered.

[0031] FIG. 4 shows a plot of amplitude versus frequency for an exemplary power supply system having a low frequency source, such as the first power supply 318, and a high frequency source, such as the second power supply 320. FIG. 4 shows the amplitude of the reflected power versus frequency. FIG. 4 includes a central peak 410 that indicates the center frequency of operation of the high frequency power supply, such as the second power supply 320 of FIG. 3. On either side of the central peak 410, FIG. 4 also shows IMD components 412, 414 that represent IMD introduced by application of power from a low frequency power supply, such as the first power supply 318 of FIG. 3. As a non-limiting example, if the second power supply 320 operates at a frequency of 60 MHz and the low frequency power supply 318 operates at 400 kHz, the IMD components may be found at 60 MHz±n*400 kHz, where n is any integer. Thus, the peaks 412, 414 represent the high frequency±low frequency of the respective power supplies. Driving the electrodes at multiple harmonics, as shown in FIG. 3, provides the opportunity to electrically control the DC self-bias and to adjust the energy level of the ion density.

[0032] FIG. 5 shows the waveforms of forward power 512 and reverse or reflected power 514 for a higher frequency generator or source RF generator. As a non-limiting example, the source RF generator may operate at 60 MHz. FIG. 5 also shows a voltage waveform 516 showing the output voltage of a lower frequency generator or bias RF generator operating at 400 KHz as a non-limiting example. As seen in FIG. 5, the reflected power 514 of the source RF generator varies according to the voltage variations of the voltage waveform 516 of the bias RF generator. As also seen in FIG. 5, when the reflected power 514 increases, the power delivered to the load or reactor (the difference between the forward power 512 and the reflected power 514) also decreases.

[0033] 6, the voltage 616 output by the bias RF generator has zero amplitude. When the voltage 616 has a generally constant value, the reverse or reflected power 614 does not vary substantially. Therefore, the forward power 612 delivered to the load is relatively constant at a higher amplitude in the absence of fluctuations in the reflected power 614. In various configurations, the voltage 616 can be maintained constant without fluctuations when the bias RF generator is off.

[0034] 5 and 6, fluctuations in the bias RF generator voltage waveform 516 result in IMD being experienced at the load. The resulting IMD causes fluctuations in the reverse power 514, which adversely affects the delivery of forward power 512. By minimizing the IMD, a more consistent forward power at a higher amplitude can be delivered to the load or process chamber.

[0035] As shown in Figure 5, various approaches to addressing IMD-related load variations include configuring the source RF generator to provide higher output power to the load. Increasing the power does not improve the efficiency of the system and requires components selected to operate at higher power levels. When operating at such higher power levels, other RF generator components must be selected not only to apply more forward power but also to withstand higher reflected power levels. Thus, increasing the power results in higher generator costs.

[0036] Other approaches to address IMD-related load variations include implementing a disturbance cancellation system that adjusts the frequency actuator of the source RF generator in synchronization with the operation of the bias RF generator. Since the operation of the bias RF generator is typically periodic, the adjustment of the frequency actuator of the source RF generator may be synchronized with the frequency of the low frequency generator. One example of such an approach may be found in connection with U.S. Patent No. 9,947,514, entitled "Plasma RF Bias Cancellation System," issued on April 17, 2018, which is assigned to the assignee of the present application and is incorporated herein by reference.

[0037] Another impairment cancellation system is implemented by controlling actuators that affect the matching network reactance, an example of which may be found in connection with U.S. Provisional Patent Application No. 62 / 923,959, entitled "Intermodulation Distortion Mitigation Using Electronic Variable Capacitor," filed October 21, 2019, which is assigned to the assignee of the present application and incorporated herein by reference. Further techniques may be found in connection with controlling actuators such as power amplifier drive controls, an example of which may be found in connection with U.S. Patent Application No. 16 / 452,716, entitled "High Speed ​​Synchronization of Plasma Source / Bias Power Delivery," filed June 26, 2019, which is assigned to the assignee of the present application and incorporated herein by reference.

[0038] Returning to the impairment cancellation system implemented by adjusting the frequency actuator of the source RF generator described above, impairment cancellation requires tuning a frequency actuator profile. Such a profile may be generally described as a hopping pattern, adjustment pattern, or correction pattern, since the frequency of the source RF generator is changed synchronously with the frequency of the bias RF generator. The approach may be generally described as frequency hopping.

[0039] Traditionally, frequency hopping or tuning patterns have been derived using manual tuning of frequency profiles via an iterative approach using a graphical user interface. Such approaches lack efficiency and cannot accommodate disturbances that occur during normal system operation because the patterns are tuned prior to the manufacturing process occurring in the process or plasma chamber.

[0040] 7 illustrates an RF generator or power supply system 710. The power supply system 710 includes radio frequency (RF) generators or power supplies 712a, 712b, matching networks 718a, 718b, and a load 732, such as a nonlinear load, which may be a plasma chamber, a process chamber, or the like. In various embodiments, the RF generator 712a is referred to as a source RF generator or power supply, and the matching network 718a is referred to as a source matching network. Also in various embodiments, the RF generator 712b is referred to as a bias RF generator or power supply, and the matching network 718b is referred to as a bias matching network. It will be understood that components may be referred to individually or collectively using reference numbers without letter suffixes or primes.

[0041] In various embodiments, the source RF generator 712a receives a control signal 730 from the matching network 718b or a control signal 730' from the bias RF generator 712b. As described in more detail, the control signal 730 or 730' represents an input signal to the source RF generator 712a indicative of one or more operating characteristics or parameters of the bias RF generator 712b. In various embodiments, the bias detector 734 senses the RF signal output from the matching network 718b to the load 732 and outputs a synchronization or trigger signal 730 to the source RF generator 712a. In various embodiments, unlike the trigger signal 730, the synchronization or trigger signal 730' may be output from the bias RF generator 712b to the source RF generator 712a. The difference between the trigger or synchronization signals 730 and 730' may be due to the effect of the matching network 718b, which may adjust the phase between the input signal to the matching network and the output signal from the matching network. The signals 730, 730', in various embodiments, contain information about the operation of the bias RF generator 712b that allows a predictive response to periodic variations in the impedance of the plasma chamber 732 caused by the bias RF generator 712b. In the absence of a control signal 730 or 730', the RF generators 712a, 712b operate autonomously.

[0042] The RF generators 712a, 712b each include an RF power source or amplifier 714a, 714b, an RF sensor 716a, 716b, and a processor, controller, or control module 720a, 720b. The RF power sources 714a, 714b generate respective RF power signals 722a, 722b that are output to the respective sensors 716a, 716b. The sensors 716a, 716b receive the output of the RF power sources 714a, 714b and generate respective RF power signals f1 and f2. The sensors 716a, 716b also output signals that vary according to various parameters sensed from the load 732. Although the sensors 716a, 716b are shown within the respective RF generators 712a, 712b, the RF sensors 716a, 716b may be located outside the RF power generators 712a, 712b. Such external sensing may occur at the output of the RF generator, or at the input of an impedance matching device located between the RF generator and the load or between the output of the impedance matching device (including inside the impedance matching device) and the load.

[0043] The sensors 716a, 716b detect various operating parameters and output signals X and Y. The sensors 716a, 716b may include voltage, current, and / or directional coupler sensors. The sensors 716a, 716b detect (i) the voltage V and current I, and / or (ii) the forward power P output from the respective power amplifiers 714a, 714b and / or RF generators 712a, 712b. FWD and the reverse or reflected power P received from the respective matching network 718a, 718b or load 732 connected to the respective sensor 716a, 716b. REV It can detect voltage V, current I, forward power P FWD and reverse power P REVmay be scaled and / or filtered versions of the actual voltage, current, forward power, and reverse power associated with each power source 714a, 714b. The sensors 716a, 716b may be analog and / or digital sensors. In a digital implementation, the sensors 716a, 716b may include an analog-to-digital (A / D) converter and a signal sampling component with a corresponding sampling rate. The signals X and Y represent the voltage V and current I or forward (or source) power P FWD , reverse (or reflected) power P REV It can represent any of the following:

[0044] The sensors 716a, 716b generate sensor signals X, Y, which are received by respective controllers or power control modules 720a, 720b. The power control modules 720a, 720b process the respective X, Y signals 724a, 726a and 724b, 726b and generate one or more of feedforward and / or feedback control signals 728a, 728b for the respective power supplies 714a, 714b. The power supplies 714a, 714b adjust the RF power signals 722a, 722b based on the received feedback and / or feedforward control signals. In various embodiments, the power control modules 720a, 720b may control the matching networks 718a, 718b, respectively, via the respective control signals. The power control modules 720a, 720b may include at least a proportional-integral-derivative (PID) controller, or a subset thereof, and / or a direct digital synthesis (DDS) component, and / or any of the various components described below in connection with the modules.

[0045] In various embodiments, the power control modules 720a, 720b may be PID controllers or a subset thereof and may include functions, processes, processors, or sub-modules. The control signals 728a, 728b may be drive signals and may include DC offset or rail voltages, voltage or current magnitude, frequency, and phase components. In various embodiments, the control signals 728a, 728b may be used as inputs to one or more control loops. In various embodiments, the multiple control loops may include proportional-integral-derivative (PID) control loops for RF drive and for rail voltages. In various embodiments, the control signals 728a, 728b may be used in a multiple-input multiple-output (MIMO) control scheme. An example of a MIMO control scheme may be found by reference to U.S. Patent No. 10,546,724, entitled “Pulsed Bidirectional Radio Frequency Source / Load,” issued on January 28, 2020, which is assigned to the assignee of the present application and incorporated herein by reference.

[0046] In various embodiments, the power supply system 710 can include a controller 720'. The controller 720' can be located outside one or both of the RF generators 712a, 712b and may be referred to as an external or common controller 720'. In various embodiments, the controller 720' can implement one or more of the functions, processes, or algorithms described herein with respect to one or both of the controllers 720a, 720b. Thus, the controller 720' communicates with each of the RF generators 712a, 712b via a pair of respective links 736, 738 that enable data and control signals to be exchanged between the controller 720' and the RF generators 712a, 712b as appropriate. For various embodiments, the controllers 720a, 720b, 720' can provide analysis and control in a distributed and coordinated manner in conjunction with the RF generators 712a, 712b. In various other embodiments, the controller 720' can provide control of the RF generators 712a, 712b, eliminating the need for respective local controllers 720a, 720b.

[0047] In various embodiments, the RF power supply 714a, the sensor 716a, the controller 720a, and the matching network 718a may be referred to as a source RF power supply 714a, a source sensor 716a, a source controller 720a, and a source matching network 718a. Similarly, in various embodiments, the RF power supply 714b, the sensor 716b, the controller 720b, and the matching network 718b may be referred to as a bias RF power supply 714b, a bias sensor 716b, a bias controller 720b, and a bias matching network 718b. In various embodiments, as explained above, the term source refers to an RF generator that generates a plasma, and the term bias refers to an RF generator that tunes the plasma ion energy distribution function (IEDF). In various embodiments, the source and bias RF power supplies operate at different frequencies. In various embodiments, the source RF power supply operates at a higher frequency than the bias RF power supply. In various other embodiments, the source and bias RF power supplies operate at the same frequency or substantially the same frequency.

[0048] According to various embodiments, the source RF generator 712a and the bias RF generator 712b include multiple ports for communicating with the outside world. The source RF generator 712a includes a digital communication port 742. The bias RF generator 712b includes a digital communication port 750. The digital communication port 742 of the source RF generator 712a and the digital communication port 750 of the bias RF generator 712b communicate via a digital communication port 756.

[0049] FIG. 8 shows a plot of voltage versus time to illustrate the operation of a pulse mode for powering a load, such as the load 732 of FIG. 7. In FIG. 8, an RF signal 810 is modulated by a pulse 812. When the pulse 812 is on, as shown in period or region 814 of the pulse 812, the RF generator 732 outputs the RF signal 810. Conversely, during period or region 816 of the pulse 812, the pulse 812 is off and the RF generator 732 does not output the RF signal 810. The pulse signal 812 can repeat at a constant or variable duty cycle. Furthermore, the pulse signal 812 need not be embodied as a square wave as shown in FIG. 2. Still further, the pulse 812 can have multiple on and off regions of varying amplitude and duration. The multiple regions can repeat in a fixed or variable period.

[0050] The present disclosure is directed to compensating for periodic disturbances caused by variations in electrical parameters of an RF power delivery system. In RF generator applications, the RF frequency of a signal applied to a load affects the impedance of the load. In various configurations, frequency is used as a control actuator to minimize the power reflected from the load back to the RF generator. The RF frequency is varied to minimize the reflected power and maximize the forward power delivered to the load.

[0051] As explained above, the application of a second RF signal, such as a bias RF generator, which applies a low frequency RF signal to a load, can affect the power delivered by a first generator or source RF generator, which typically applies a higher RF frequency to a load. In various impairment cancellation systems, the period of the low frequency generator is divided into a selected number of bins. In the source RF generator, the RF frequency of the signal output by the source RF generator is adjusted according to the impairments expected from the periodic signal output by the low frequency generator. Furthermore, the RF frequency of the source RF generator is adjusted according to each of the bins of the RF signal output by the low frequency generator or bias RF generator. The frequency offset applied to the RF frequency signal output by the higher frequency generator or source RF generator defines a hopping pattern intended to reduce or minimize the effects of load variations caused by IMD from the RF signal output by the low frequency generator or source RF generator. Thus, this approach provides a feed-forward connection to the RF source frequency actuator, and the frequency hopping pattern per bin provides a correction value or offset.

[0052] FIG. 9 discloses waveforms corresponding to the voltage and power of an RF generator generating an RF signal applied to a typical load, such as a plasma chamber or reactor. Waveform 912 represents a signal related to the RF signal output by a bias RF generator. As a non-limiting example, the bias RF generator operates at 400 KHz. Waveform 914 is a square wave sync pulse that generally varies according to the RF signal output by the bias RF generator. Waveform 916 represents the forward power output by a source RF generator output to a load, such as load 732 of FIG. 7. Waveform 918 shows the power reflected back from the load, as a non-limiting example, the source RF generator operates at 60 MHz.

[0053] Referring to FIG. 10, FIG. 10 shows waveforms similar to FIG. 9, where the RF signal output by the source RF generator 712a of FIG. 7 is adjusted, for example, using a frequency hopping or correction pattern. As explained above, waveform 1012 shows the forward voltage output by, for example, the bias RF generator 712b of FIG. 7. As in FIG. 9, waveform 1014 represents a synchronization pulse associated with the output of the RF signal from a bias RF generator, such as RF generator 712b. As seen in FIG. 10, the application of a frequency offset to the output from RF generator 712a significantly reduces the reverse power 1018 and increases the power delivered to the load or reactor (the difference between the forward power 1016 and the reverse power 1018). Thus, using the impairment cancellation described herein, the reflected power 1018 is reduced and the delivered power is increased.

[0054] In various embodiments, the challenge to impairment cancellation is how to determine the necessary frequency offset, adjustment, or correction actuation to implement a frequency hopping, adjustment, or correction pattern. This disclosure describes an extremum-seeking iterative learning control (ILC) approach to determining a frequency actuation profile, or hopping pattern, to mitigate the effects of IMD from periodic load impedance variations.

[0055] FIG. 11 illustrates a voltage versus time waveform 1112 for an RF signal output by a higher frequency generator or source RF generator, such as RF generator 712a of FIG. 7. The waveform 1112 includes a first section 1124 and a second section 1126. In various aspects, the sections 1124, 1126 may be further divided into bins bx, where x generally denotes a number of any bins. As illustrated in FIG. 11, the section 1124 is subdivided into bins such as bins ba1, ba2, ..., ban. Similarly, the section 1126 may be subdivided into bins bb1, bb2, ..., bbn. In various embodiments, both the width and number of bins within and between each section 1124, 1126 can vary. The width of each bin within the section 1124 may be the same width or a varying width. Similarly, the width of each bin in the section 1126 may be the same width or a varying width. Additionally, the number of bins that make up section 1124 and the number of bins that make up section 1126 can vary. For pulsed implementations, the width of the bins can be narrow for bins close to the pulse edges and wider over the relatively steady-state portion of the pulse.

[0056] In various embodiments, any or one of the bins bx may define a segment of a pattern of electrical parameter hops, adjustments, or corrections that defines, by way of non-limiting example, a parameter hopping, adjustment, or correction pattern for controlling the frequency or other electrical parameter operation of a source RF generator that mitigates or reduces IMD of the RF generator system or in some cases improves the operation of the RF generator system. Such parameters may include the frequency, amplitude, and phase of an RF signal output by an RF generator, such as RF generator 712a of FIG. 7, matching network control parameters, and other control parameters. Other parameters may include various actuators in the RF power delivery system, such as reactances, including inductances and capacitances, in the matching network. Control of such reactances may be implemented using electrically variable capacitances or inductances. In various embodiments, the width of the bins bx may be selected such that the bin spacing is small compared to the maximum rate of change in the reflected power profile caused by IMD. If the bins are too wide, only low frequency content in the IMD profile may be adequately corrected. In some embodiments, the bin width may be selected based on hardware or software requirements that may limit the number of bin values ​​that can be treated and written as a frequency offset from the generator.

[0057] In various embodiments, the width of the sections 1124 or 1126 is determined according to the periodic nature of the signal that causes fluctuations in reflected power in the load driven by the waveform 1112. As a non-limiting example, in an RF generator system including a source RF generator operating at 60 MHz and a bias RF generator operating at 400 KHz, the width of the sections 1124, 1126 may be set according to the period of the bias RF generator output signal of 400 KHz. Because the bias RF generator output signal causes periodic impairments in the load in the form of IMD, the adjustment pattern formed by the bins bx in the sections 1124, 1126 corrects the IMD when the pattern is applied to the source RF signal associated with the operation of the bias RF generator. In the example described herein where the source RF generator operates at 60 MHz and the bias RF generator operates at 400 KHz, the source RF waveform completes approximately 150 cycles over one bias RF waveform. Thus, the sections 1124, 1126 are not shown to scale with respect to the waveform 1112.

[0058] As described herein, each bin is assigned an offset frequency or frequency adjustment, also referred to as a hop, adjustment or correction parameter, that is applied to the RF signal output by the source RF generator 712a in synchronization with the bias RF waveform 1112 of FIG. 11. The offset or correction associated with each bin defines a frequency hopping pattern. The frequency offset or adjustment associated with each bin may be determined as a calibration step and stored in memory or continuously updated. Thus, in various configurations, the frequency hopping or adjustment of the source RF frequency is a feedforward control, and the feedforward values ​​in the bins are updated based on measurements taken over one or more previous pulses for the corresponding bin.

[0059] Each bin bx may define a hopping frequency, a frequency offset, an adjustment, or a correction parameter of the RF signal output by the RF generator 712a. The frequency may be selected to vary the impedance match between the RF generator 712a and the load 732 to control the power delivered to the load. Additionally, in various embodiments, the bins bx of FIG. 11 may define adjustments of various electrical parameters of a source RF generator of a matching network, such as the matching network 718.

[0060] FIG. 12 illustrates a flow chart 1210, and FIG. 13 illustrates a functional block diagram 1310 describing determining electrical parameters for each bin of FIG. 11 to determine adjustments to the associated electrical parameters to determine adjustment values ​​for the electrical parameters to improve operation of the RF generator system. In general terms, the operation of FIGS. 12 and 13 is determined by iteratively perturbing actuator values, such as a frequency hopping profile, for each iteration. In various embodiments, the electrical parameter may be a frequency. The individual perturbations involve either increasing or decreasing an actuator associated with the electrical parameter for each iteration. For each iteration, one or more bins associated with the electrical parameter are perturbed, such as bin bx described in FIG. 11, and the effect of the perturbation on one or more output metrics of interest is determined. In various configurations, the one or more output metrics of interest may be one or more of an average reflected power, a delivered power, or an average magnitude of a reflection coefficient over an operating period of a bias generator, such as RF generator 712b of FIG. 7. The metric of interest, sometimes referred to as a cost function, is optimized to indicate when a sufficient pattern of regulation has been determined. In various embodiments, the actuators that are perturbed include one or more of the frequency, amplitude or phase of the signal applied to the load, or a reactance, such as an impedance or capacitance, that affects the power delivery to the load.

[0061] Referring to Figure 12, control begins at block 1212 and proceeds to block 1214. In block 1214, each bin bx of the profile is perturbed to determine the effect of each bin's perturbation on the cost function. Referring to Figure 11, one or more actuators corresponding to each bin bx are perturbed, increased or decreased by a set amount to cause a corresponding variation in the output metric of interest. In block 1214, each of the bins bx of Figure 11 are perturbed by a small amount in a similar manner, and the output metric of interest is analyzed to determine the effect of the perturbation on the cost function associated with the metric of interest.

[0062] 13, the functional block diagram 1310 includes a signal conditioning module 1312. The signal conditioning module 1312 receives one or more (n) input signals. In various embodiments, the one or more (n) input signals include one or more signals to be conditioned by the conditioning pattern, such as RF output from a source RF generator. The signal conditioning module 1312 also includes one or more (n) perturbation signals from a perturbation generator 1314. The signal conditioning module outputs one or more (n) perturbed signals according to the one or more (n) inputs and the one or more (n) perturbation signals. The signal conditioning module 1312 can mix, combine, or otherwise process the one or more (n) input signals and the one or more (n) perturbation signals to generate one or more (n) perturbation signals. One or more (n) perturbed signals are input to one or more (n) sensors of the sensor module 1316, which in turn are output to the plant or system 1318. The perturbed signals applied to the plant or system 1318 may cause variations in one or more output metrics of interest determined by the one or more sensors of the sensor module 1316. The sensor module 1316 outputs the one or more (n) sensed values ​​to a cost module 1320. The cost module 1320 determines the one or more (n) costs as described herein. Figures 12 and 13 illustrate an extremum-seeking iterative learning control (ILC) approach to learning the frequency actuation profile or hopping pattern required to mitigate periodic load fluctuations.

[0063] Returning to Figure 12, control passes to block 1216, which determines a composite gradient for the variation in the cost function. Referring to Figure 12, a composite gradient module 1322 receives one or more (n) costs to determine a composite gradient in block 1218. The actuator updates u i (k+1) is determined based on the gradient of one or more (n) cost function gradients. i(k+1) is expressed by the formula (1): u i (k+1)=u i (k)-μG i (1) may be determined using the gradient descent method described below in conjunction with u i is the frequency activation in bin i, G i is the measured cost gradient resulting from perturbing bin i, μ is the tunable learning rate, k is the iteration index. The measured cost gradient is the change from the baseline due to the injection of the perturbation signal. That is, the measured cost gradient is the difference between the output from the sensor module 1316 based on no perturbation signal being applied to the signal conditioning module 1312 and the output from the sensor module 1316 based on the perturbed input signal being applied to the signal conditioning module 1312. Since the gradient points in the direction of increase, the negative sign in equation (1) ensures that the iterations proceed in the direction that minimizes the cost.

[0064] Referring to FIG. 12, in block 1216, G i may be determined using a variety of approaches. In one approach, the bin actuator values, such as one or more (n) perturbed signals output by the signal conditioning module 1312, may be adjusted in one direction and the difference in the cost metric between the baseline (unperturbed) value and the perturbed value may be calculated using equation (2):

[0065]

number

[0066] to determine the actuator response slope as described below.

[0067]

number

[0068] can be used to estimate C pert is the cost of injecting the perturbation, C base is the unperturbed cost, U pert is the amplitude of the perturbation. The measured cost gradient is the difference between the unperturbed output metric and the perturbed output metric divided by the amount of perturbation.

[0069] In another approach, the actuators are

[0070]

number

[0071] , Equation (3)

[0072]

number

[0073] , where: C up is the cost of the bin actuator increased (perturbed) by a fixed amount, C down is the cost of the bin actuator being decreased (perturbed) by the same fixed amount, U pert is the magnitude of the actuator change. The approach of equation (3) is more robust with respect to local nonlinearities such as quadratic cost function shapes than the single-directional perturbation method described above with respect to equation (2).

[0074] Other methods for estimating the local gradient may be used. In one non-limiting example, a quadratic polynomial is used to estimate the baseline, C up and C down , the output values ​​or costs can be fitted using the cost values ​​used in their associated bin operations. A quadratic polynomial can then be used to calculate the estimated slope at the mid-actuator value.

[0075] Returning to FIG. 12, control passes to block 1216, where the obtained gradient information

[0076]

number

[0077] The control proceeds to block 1218 which determines a hopping pattern in the direction of lower cost based on (a) = (b) + (c) + (d). Thus, the adjustment or hopping pattern is adjusted according to equation (1) discussed above. Control then proceeds to block 1220 which determines whether the cost is less than a predetermined threshold. If the cost is not less than the predetermined threshold, control proceeds to block 1214 to perform another iteration of the perturbation at block 1214, the cost gradient determination at block 1216, and the parameter adjustment or correction pattern adjustment at block 1218. If the cost is determined to be less than the predetermined threshold at block 1220, control proceeds to the end at block 1222.

[0078] 13, following the determination of the composite gradient in block 1322, the composite gradient is output to an update module 1334, which determines actuator updates according to the composite gradient determined in the composite gradient module 1322, as shown in equation (1).

[0079]

number

[0080] may be expressed as a vector associated with bin actuator i, where:

[0081]

number

[0082] The update module 1334 outputs a parameter adjustment pattern or hopping pattern to one or more of a memory 1336a, a look-up table (LUT) 1336b, or an adjustment pattern 1336c shown in 1336c. The parameter adjustment pattern can adjust one or more (n) actuators to control one or more costs according to a MIMO approach to parameter adjustment. The parameter adjustment values ​​in the parameter correction pattern can indicate parameter offset values ​​or parameter values.

[0083] Returning to block 1214 of FIG. 12 and block 1320 of FIG. 13, the cost function may be determined using a variety of approaches. In one approach, the cost is an average of a measured value, such as reflected power over a period of a low frequency generator. In various other approaches, the cost function metric may be the average magnitude of the reflection coefficient over a period of a low frequency generator, such as the low frequency generator or bias generator 712b of FIG. 7. In various other approaches, the cost may vary according to the delivered power or magnitude of the reflection coefficient. In addition to averaging, other metrics for the reflected power or average magnitude may be used, including maximum, minimum, or other statistical analysis of such values.

[0084] One generalized expression of the cost function is Equation (4): C total =Σ j W j C j (4) As explained below in, the weighting terms may include separate weighting terms for different cost components. In the above formula, C j and W jThe values ​​of C represent the cost components and the individual weights assigned to them. total may be described as the sum of various weighted cost components, for example, the reflected power or the magnitude of the reflection coefficient measured at the negative and positive zero crossings of the low frequency signal or the bias RF signal may be summed into the cost function, i.e., the reflected power or the magnitude of the reflection coefficient measured at the negative zero crossing may be assigned a first weight, the reflected power or the magnitude of the reflection coefficient measured at the negative zero crossing may be assigned a first value, and the measured reflected power or the magnitude of the reflection coefficient may be assigned a second cost value at a second weight.

[0085] The cost function is given by Equation (5). C total =W avg C avg +W neg C neg +W pos C pos +W smooth C smooth (5) may also include additional terms to improve the smoothness of the actuator profile over the entire correction or hopping pattern, as described below in connection with In the above formula, C avg is the average cost, W avg is the weight assigned to the average cost, C neg is the cost at a negative zero crossing of the periodic impairment or bias RF signal, W neg is the weight assigned to the cost at the negative zero crossing of the bias RF signal, C pos is the cost at a positive zero crossing of the periodic impairment or bias RF signal, W pos is the weight assigned to the cost at the positive zero crossing of the bias RF signal, C smooth is the cost of the smoothness metric, W smooth is the weight assigned to the cost of the smoothness metric. Smoothness metric C smooth can take several forms. In one form, the smoothness metric includes the deviation of the output metric or cost difference between successive bin runs. In another form, the smoothness metric C smooth is the sum of squares of the second order differences in the cost or power metric of successive bin operations.

[0086] 14 and 15 show the difference in system response between the cost function without smoothing shown in FIG. 14 and the cost function with smoothing shown in FIG. 15. Waveform 1412 represents a periodic synchronization signal associated with a low frequency source or bias RF source, such as RF generator 712b of FIG. 7. Waveform 1414 represents the frequency of a high frequency generator or source RF generator, such as RF generator 712a of FIG. 7. Waveform 1414 represents the frequency of the source RF generator over time, and represents the adjustment, correction, or hopping pattern of RF generator 712a. FIG. 15 shows waveforms similarly described with respect to FIG. 14, where waveform 1512 represents the synchronization signal associated with bias RF generator 712b of FIG. 7 and waveform 1514 represents the actual RF frequency of source RF generator 712a of FIG. 7. Waveform 1514 represents the correction or hopping pattern used by the impairment cancellation system approach to minimize the effects of IMD. As can be seen when comparing Figures 14 and 15, waveform 1514 has a smoother appearance than waveform 1414. For both Figures 14 and 15, the reflected power 1418, 1518 is generally similar. However, the additional smoothness in waveform 1514 resulting from applying a smoothing aspect to the cost function provides a smoother operating profile. Such smoothness in the hopping profile can increase uniformity in the customer process.

[0087] 16 shows an expanded block diagram of an RF generator, such as RF generator 712a of FIG. 7, in which the controller 1620a includes an amplitude parameter control section 1636. The parameter control section 1636 includes a regeneration module 1640, a parameter adjustment module 1642, and an update module 1644. Each module 1640, 1642, 1644 may be collectively or individually implemented as a process, processor, module, or sub-module. Additionally, each module 1640, 1642, 1644 may be implemented as any of the various components described below with respect to the term module. The regeneration module 1640 provides parameter correction, adjustment, or updating of the RF signal.

[0088]

number

[0089] The playback module 1640 monitors for a trigger event or signal to synchronize the application of an offset to the RF signal with the trigger event or signal. The parameter adjustment may include a frequency correction, adjustment, or offset in the frequency hopping pattern, as described above. The correction, adjustment, or offset corresponds to n bins. When the playback module 1640 detects a trigger event or signal, the playback module 1640 applies the parameter adjustment or offset to the RF signal.

[0090]

number

[0091] The reconstruction modules 1640 cooperate with respective parameter adjustment modules 1642, which provide parameter adjustments to respective update modules 1644, which in turn apply the parameter adjustments to the respective RF signals.

[0092]

number

[0093] Alternatively, the parameter adjustments may be one or more of electrical parameters such as frequency, power, amplitude, phase, impedance matching network settings, etc.

[0094] In various embodiments, the parameter adjustment module 1642 may be implemented as a look-up table (LUT). The parameter adjustment is determined, for example, according to timing or synchronization with respect to a trigger event or signal. The bias RF signal from FIG.

[0095]

number

[0096] The periodic nature of the RF signal

[0097]

number

[0098] and the expected periodic impedance variation that occurs in response to applying

[0099]

number

[0100] The adjustment or offset LUT for the RF signal is determined as described above with respect to FIG.

[0101]

number

[0102] The parameter adjustments, offsets, or hops added to the LUT are generated in coordination with the dynamic effects on the load 732 introduced by the RF generator 712b to improve efficiency through selective and coordinated frequency adjustments by the source RF generator 1612a to at least partially counteract the IMD induced by the periodic bias signal. In various embodiments, the LUT may be predetermined and static during operation, or may be dynamically adjusted using an update process, such as using an update module 1644 practicing the ILC techniques described above. In various other embodiments, the parameter adjustments may be dynamically determined.

[0103] FIG. 17 illustrates a control module 1710. The control module 1710 incorporates various components of FIGS. 2-16. The control module 1710 may include a power generation module 1712, an impedance matching module 1714, a parameter control section 1716, and an iterative learning control section 1718. The parameter control section 1712 includes a regeneration module 1720, a parameter adjustment module 1722, and a parameter update module 1724. The iterative learning control section 1718 includes a perturbation module 1730, a cost module 1732, a gradient module 1734, and an actuator pattern update module 1736. In various embodiments, the control module 1710 includes one or more of the module sections or processors that execute code associated with modules 1712, 1714, 1716, 1718, 1720, 1722, 1724, 1730, 1732, 1734, and 1736. The operation of module sections or modules 1712, 1714, 1716, 1718, 1720, 1722, 1724, 1730, 1732, 1734 and 1736 is described below with respect to the method of FIG.

[0104] For a further defined structure of the controllers 20a, 20b, 20' and 1612a of Figures 7 and 16, see the flow chart of Figure 18 provided below and the definition for the term "module" provided below. The systems disclosed herein may be operated using numerous methods, examples, and various control system methods shown in Figure 18. The following operations are primarily described with respect to the implementations of Figures 12, 13, and 16, but the operations may be easily modified to apply to other implementations of the present disclosure. The operations may be performed iteratively. The following operations are shown and primarily described as being performed sequentially, but one or more of the following operations may be performed while one or more of the other operations are being performed.

[0105] 18 shows a flow diagram 1810 of the IMD mitigation system described above. Control begins at block 1812 where various parameters are initialized. Control proceeds to block 1814 which monitors for a trigger event. A trigger event is when a parameter adjustment, correction, or hopping pattern is applied to the RF signal output by the RF generator 1612a.

[0106]

number

[0107] The trigger event may be any event that allows the parameter compensation pattern to be appropriately coordinated with the trigger event. Block 1814 continues to monitor whether a trigger event occurs and loops back in a wait state until such an event occurs. Upon detecting a trigger event, control passes to block 1816, which begins playing the parameter compensation pattern synchronously with the occurrence of the trigger event.

[0108] Once playback is initiated, control proceeds to block 1818. In block 1818, parameter adjustments are determined for the trigger event. In various embodiments, parameter adjustments forming a correction pattern are determined according to expected impedance variations with reference to an event, such as the sequencing of the RF signal output from bias RF generator 712b in FIG. 7. Once the parameter adjustments or corrections are determined, typically in conjunction with a trigger event, control proceeds to block 1820, where the parameter adjustments are applied, such as by applying a parameter adjustment or offset in the pattern to the RF signal output from RF generator 1612a. The one or more adjustments or corrections may include frequency. Control proceeds to block 1826, which returns control to monitor for the next trigger.

[0109] Also shown in Figure 18 is a block 1824 that calls the iterative learning control flow chart of Figure 12. Block 1824 is shown in dashed lines to indicate that the parameter compensation pattern may be executed before the occurrence of a trigger event as indicated by the connection to block 1812. The parameter adjustment pattern remains fixed until it is updated. In an alternative approach, the parameter adjustment pattern may be dynamically updated as indicated by the connection to block 1818.

[0110] In various embodiments, a trigger event such as that described with respect to block 1814 is intended to synchronize the bias RF generator 712b with the source RF generator 712a or 1612a, or so that parameter adjustments can be appropriately applied to the bias RF signal, thereby minimizing impedance variations. Synchronization between the RF generators 712a or 1612a and 712b can occur using a control signal 730 or 730' that can provide a synchronization pulse or replicate the RF signal output from the RF generator 712b. Various other embodiments allow synchronization with the RF generator 712b to occur without a direct connection such as a control signal 730 or 730' or other direct connection between the RF generators 712a or 1612a and 712b.

[0111] Synchronization without a direct connection may be achieved by analyzing the impedance variation and phase locking to a signal indicative of the impedance variation. For example, a signal indicative of the impedance variation may be generated by analyzing the signals X, Y output from the sensor 716a or 1616a. This signal may provide an appropriate trigger event. The signal indicative of the impedance variation may be developed by performing a fast Fourier transform (FFT) on the impedance variation. In this configuration, the source RF generator 712a or 1612a may effectively work as a stand-alone unit without connecting to the bias RF generator 712b.

[0112] The trigger events described in the various embodiments above are generally related to the periodicity of the trigger events. For example, the control signal received from the bias RF generator 712b, which outputs the control signal 730 or 730', may repeat periodically according to the RF signal output from the RF generator 712b. Similarly, the signal described above indicating the impedance variation may also have a periodicity relative thereto.

[0113] In various embodiments, varying perturbation patterns may be employed to estimate the necessary gradient information. As a non-limiting example, bins may be grouped as shown in sections 1124, 1126 of FIG. 11, and groups of bins may be perturbed simultaneously to identify local gradients. In various other embodiments, the amplitude of the perturbation signal may be adjusted as a function of the magnitude of the cost metric. That is, as the cost metric approaches zero, the amplitude of the perturbation may be correspondingly reduced.

[0114] In various other embodiments, alternative basis functions may be used to reduce the number of parameters that must be optimized. That is, with respect to FIG. 14 and FIG. 15, waveforms 1414 and 1514, respectively, may be selected as the correction pattern. Rather than perturbing each bin individually to determine local gradients and learn individual actuator values ​​for each bin of the correction or hopping pattern, a predefined adjustment or hopping pattern may be applied, and a DC offset and a scaling factor may be used to adjust the hopping pattern. In various other embodiments, the shape of the adjustment or hopping pattern may be fairly consistent under varying operating conditions. When using a predefined hopping pattern and varying the DC offset to scale the hopping or correction profile, the techniques described in FIG. 12 and FIG. 13 may be used to determine the variation in DC offset and the scaling of the hopping profile. In various other embodiments, the DC offset and the orthogonal initial hopping or adjustment pattern, as well as additional basis vectors orthogonal to each of the DC shift and the initial hopping pattern and to each other, allow for capturing more granular characteristics of the hopping pattern. The orthogonal basis set can be determined prior to starting a manufacturing process step in a reactor, or can be dynamically learned as a data-dependent basis set.

[0115] The systems and methods described above allow for a steady power supply from an RF source in the presence of periodic load disturbances, such as a source RF generator that maintains a steady power supply in the presence of a low frequency bias RF generator. The methods and systems described above also allow for a significant reduction in reflected power at the source RF generator by reducing the IMD induced by a second low frequency generator, such as a bias RF generator, connected to the same load. The reduction in IMD allows for lower cost hardware for the same power output provided by the source RF generator.

[0116] The apparatus method described herein also allows an automated approach to determine the required generator actuator profile, such as a frequency hopping pattern or correction pattern, which is actuated in synchronism with the period of the low frequency bias RF generator. The system and method described herein also allows for maintaining a steady delivered power through a reduced reflected power profile during semiconductor manufacturing in a nonlinear reactor. This automated tuning approach improves upon manual implementation approaches, which are slower and cannot be implemented dynamically.

[0117] conclusion The foregoing description is merely exemplary in nature and is not intended to limit the disclosure, its applications, or uses in any way. The broad teachings of the disclosure may be embodied in various forms. Thus, while the disclosure includes specific examples, the true scope of the disclosure should not be so limited, since other modifications will become apparent upon review of the drawings, specification, and the following claims. It should be understood that one or more steps in a method may be performed in a different order (or simultaneously) without altering the principles of the disclosure. Furthermore, although each of the embodiments is described above as having several features, any one or more of those features described with respect to any embodiment of the disclosure may be implemented within and / or combined with any feature of any of the other embodiments, even if that combination is not explicitly described. In other words, the described embodiments are not mutually exclusive, and one or more of the embodiments may be rearranged with one another while remaining within the scope of the disclosure.

[0118] Spatial and functional relationships between elements (e.g., between modules, circuit elements, semiconductor layers, etc.) are described using a variety of terms, including "connected," "engaged," "coupled," "adjacent," "next to," "on," "above," "below," and "disposed." Unless expressly described as "direct," when a relationship between a first element and a second element is described in the disclosure above, the relationship may be a direct relationship when there are no other intervening elements between the first and second elements, but may also be an indirect relationship when there are one or more intervening elements (either spatially or functionally) between the first and second elements.

[0119] The phrase at least one of A, B, and C should be interpreted to mean the logical (A OR B OR C) using a non-exclusive logical OR, and not to mean "at least one A, at least one B, and at least one C." The term subset does not necessarily require a proper subset. In other words, a first subset of a first set may be coextensive with (equal to) the first set.

[0120] In the diagrams, the direction of the arrow, indicated by the arrowhead, generally indicates the flow of information (such as data or instructions) of interest to the example. For example, an arrow may point from element A to element B when element A and element B exchange various information, and the information communicated from element A to element B is relevant to the example. This unidirectional arrow does not imply that there is no other information communicated from element B to element A. Additionally, in response to information sent from element A to element B, element B may send a request for the information or an acknowledgment of receipt of the information to element A.

[0121] In this application, including the following definitions, the term "module" or "controller" may be replaced with the term "circuitry." The term "module" may refer to being part of or including an application specific integrated circuit (ASIC), digital, analog, or mixed analog / digital discrete circuitry, digital, analog, or mixed analog / digital integrated circuitry, combinatorial logic circuitry, a field programmable gate array (FPGA), a processor circuit (shared, dedicated, or group) that executes code, a memory circuit (shared, dedicated, or group) that stores code executed by the processor circuitry, other suitable hardware components that provide the described functionality, or a combination of some or all of the above, such as in a system-on-chip.

[0122] The module may include one or more interface circuits. In some examples, the interface circuit may implement a wired or wireless interface to connect to a local area network (LAN) or a wireless personal area network (WPAN). Examples of LANs include the Institute of Electrical and Electronics Engineers (IEEE) standard 802.11-2016 (also known as the WIFI wireless network standard) and the IEEE standard 802.3-2015 (also known as the Ethernet wired network standard). Examples of WPANs include the IEEE standard 802.15.4 (including the ZIGBEE standard from the ZigBee Alliance) and the BLUETOOTH wireless network standard from the Bluetooth Special Interest Group (SIG), including core specification versions 3.0, 4.0, 4.1, 4.2, 5.0 and 5.1 from the Bluetooth SIG.

[0123] The modules may communicate with other modules using interface circuits. Although the modules may be shown in this disclosure to be in direct logical communication with other modules, in various embodiments, the modules may actually communicate through a communication system. The communication system includes physical and / or virtual network equipment, such as hubs, switches, routers, and gateways. In some implementations, the communication system connects to or traverses a wide area network (WAN), such as the Internet. For example, the communication system may include multiple LANs connected to each other over the Internet or over point-to-point leased lines using technologies including Multiprotocol Label Switching (MPLS) and virtual private networks (VPNs).

[0124] In various implementations, the functionality of a module may be distributed among multiple modules connected via a communication system. For example, multiple modules may implement the same functionality distributed by a load balancing system. In a further example, the functionality of a module may be split between a server (also known as remote or cloud) module and a client (or user) module. For example, a client module may include a native or web application that executes on a client device and in network communication with a server module.

[0125] Some or all of the hardware features of the module may be defined using a language for hardware description, such as IEEE Standard 1364-2005 (commonly referred to as "Verilog") and IEEE Standard 1076-2008 (commonly referred to as "VHDL"). The hardware description language may be used to manufacture and / or program the hardware circuit. In some implementations, some or all of the features of the module may be defined by a language such as IEEE 1666-2005 (commonly referred to as "SystemC"), which encompasses both code and hardware description, as described below.

[0126] The term code as used above may include software, firmware and / or microcode and may refer to programs, routines, functions, classes, data structures and / or objects. The term shared processor circuit encompasses a single processor circuit that executes some or all code from multiple modules. The term group processor circuit encompasses one processor circuit that executes some or all code from one or more modules in combination with additional processor circuits. References to multiple processor circuits encompass multiple processor circuits on multiple discrete dies, multiple processor circuits on a single die, multiple cores of a single processor circuit, multiple threads of a single processor circuit, or combinations of the above. The term shared memory circuit encompasses a single memory circuit that stores some or all code from multiple modules. The term group memory circuit encompasses one memory circuit that stores some or all code from one or more modules in combination with additional memory.

[0127] The term memory circuit is a subset of the term computer-readable medium. As used herein, the term computer-readable medium does not encompass a transitory electrical or electromagnetic signal propagating through a medium (such as on a carrier wave), and the term computer-readable medium may therefore be considered tangible and non-transitory. Non-limiting examples of non-transitory computer-readable media are non-volatile memory circuits (such as flash memory circuits, erasable programmable read-only memory circuits, or masked read-only memory circuits), volatile memory circuits (such as static random access memory circuits or dynamic random access memory circuits), magnetic storage media (such as analog or digital magnetic tape or hard disk drives), and optical storage media (such as CDs, DVDs, or Blu-ray discs).

[0128] The apparatus and methods described in this application may be implemented in part or in whole by a special-purpose computer generated by configuring a general-purpose computer to perform one or more specific functions embodied in a computer program. The functional blocks and flow chart elements described above serve as software specifications, which may be translated into a computer program by the routine work of a skilled technician or programmer.

[0129] A computer program includes processor-executable instructions stored on at least one non-transitory computer-readable medium. A computer program may also include or depend on stored data. A computer program may include a basic input / output system (BIOS) that interacts with the hardware of a special-purpose computer, device drivers that interact with specific devices of a special-purpose computer, one or more operating systems, user applications, background services, background applications, and the like.

[0130] The computer program may include (i) HTML (Hypertext Markup Language), XML (Extensible Markup Language), JSON (JavaScript Object Notation) statements to be parsed, (ii) assembly code, (iii) object code generated from source code by a compiler, (iv) source code executed by an interpreter, (v) source code for compilation and execution by a just-in-time compiler, etc. By way of example only, the source code may be written using syntax from languages ​​including C, C++, C#, ObjectiveC, Swift, Haskell, Go, SQL, R, Lisp, Java, Fortran, Perl, Pascal, Curl, OCaml, JavaScript, HTML5 (Hypertext Markup Language Fifth Revision), Ada, ASP (Active Server Pages), PHP (PHP: Hypertext Preprocessor), Scala, Eiffel, Smalltalk, Erlang, Ruby, Flash, Visual Basic, Lua, MATLAB, SIMULINK, and Python. [Explanation of symbols]

[0131] 20a Controller 20b Controller 20' Controller 110 Inductively Coupled Plasma (ICP) System 112 Plasma Chamber 114 Plasma 116 Internal Coil 118 External Coil 120 Power supply 122 Power supply 124 Dielectric window 126 Board 128 Power supply 210 Capacitively Coupled Plasma (CCP) System 212 Plasma Chamber 214 Plasma 216 Electrode 218 Electrode 220 Power supply 222 Power supply 310 Dual Power Input Plasma System 312 First electrode 314 Grounding 316 Second Electrode 318 RF power supply 320 Second Power Source 322 Plasma 324 Plasma Chamber 326 surface area, electrode 328 surface area, electrode 330 Sheath 332 Ground sheath 334 Power Supply Sheath 410 Central Peak 412 Peak 414 Peak 512 Forward Power 514 Reverse power, reflected power 516 Voltage Waveform 612 Forward Power 614 Reflected power 616 Voltage 712a Radio Frequency (RF) Generators, Power Supplies, Sources RF Generators 712b Radio Frequency (RF) Generators, Power Supplies, Bias RF Generators 714a RF Power Supply or Amplifier 714b RF Power Supply or Amplifier 716a RF Sensor 716b RF Sensor 718 Matching Network 718a Matching Network 718b Matching Network 720 Controller 720a Processors, Controllers, and Control Modules 720b Processors, Controllers, and Control Modules 720' Controller 722a RF power signal 722b RF power signal 724a X signal 724b Y signal 726a X signal 726b Y signal 728a Feedforward and / or feedback control signals 728b Feedforward and / or Feedback Control Signals 730 Control Signals 730' Control Signal 732 Load 734 Bias Detector 736 Links 738 Link 742 Digital Communication Port 750 digital communication port 756 Digital Communication Port 810 RF signal 812 Pulse 814 period, area 816 period, area 912 waveform 914 waveform 916 waveform 918 waveform 1012 waveform 1014 waveform 1016 Forward Power 1018 Reverse power 1112 Waveform 1124 Section Section 1126 1310 Functional Block Diagram 1312 Signal Conditioning Module 1314 Perturbation Generator 1316 Sensor Module 1318 Plants and Systems 1320 Cost Module 1322 Composite Gradient Module 1334 Update Module 1336a Memory 1336b Look-up Table (LUT) 1336c Adjustment Pattern 1412 waveform 1414 Waveform 1418 Reflected power 1512 waveform 1514 waveform 1518 Reflected power 1612a Controller, Source RF Generator 1614a RF power supply 1616a Sensor 1620a Controller 1636 Amplitude Parameter Control Section 1640 module, playback module 1642 module, parameter adjustment module 1644 Module, Update Module 1710 Control Module 1712 Module Section, Module, Power Generation Module 1714 Module Section, Module, Impedance Matching Module 1716 Module Section, Module, Parameter Control Section 1718 Module Section, Module, Iterative Learning Control Section 1720 Module section, module, playback module 1722 Module section, module, parameter adjustment module 1724 Module section, module, parameter update module 1730 Module Section, Module, Perturbation Module 1732 Module Section, Module, Cost Module 1734 Module Section, Module, Gradient Module 1736 Module Section, Module, Actuator Pattern Update Module

Claims

1. An RF power source; an RF power controller coupled to the RF power source, the RF power controller configured to generate a control signal to vary an RF output signal from the RF power source, the RF power controller configured to adjust a parameter related to the RF output signal according to a trigger signal; A radio frequency (RF) generator, wherein the parameters are adjusted according to one of minimizing or maximizing a cost in response to introducing individual perturbations of the parameters for multiple bins of the RF output signal.

2. The RF generator of claim 1 , wherein the cost is determined according to one of a reflected power, a delivered power, or a magnitude of a reflection coefficient.

3. The RF generator of claim 1 , wherein a gradient is determined according to the cost, and the parameter is adjusted according to the gradient.

4. The RF generator of claim 1 , wherein the parameters are adjusted according to a number of adjustments arranged in a pattern.

5. The RF generator of claim 4 , wherein the pattern varies according to a period of an external RF output signal.

6. 6. The RF generator of claim 5, wherein the external RF output signal includes a plurality of bins, and the parameter is perturbed according to each bin of the plurality of bins.

7. 6. The RF generator of claim 5, wherein each bin has a width, and the width of a selected bin may be the same as or different from a width of another bin.

8. 10. The RF generator of claim 1, wherein the RF output signal is a source RF signal applied to a plasma chamber, and the trigger signal varies according to an external RF output signal, the external RF output signal being a bias RF signal applied to the plasma chamber.

9. 10. The RF generator of claim 1, wherein the RF power controller adjusts the parameter according to the trigger signal, the trigger signal indicating a relative position of an external RF output signal.

10. 10. The RF generator of claim 1, wherein the RF power controller is configured to adjust the parameters based on values ​​stored in a memory or dynamically determined values.

11. 2. The RF generator of claim 1, wherein the parameter is one of a frequency or a frequency offset and includes a plurality of frequencies, the plurality of frequencies being introduced into the RF output signal by the RF power controller in a predetermined order and timing according to the trigger signal.

12. 2. The RF generator of claim 1, wherein the parameter is one of a reactance or a reactance offset, and includes a plurality of reactances controlled by the RF power controller in a predetermined order and timing according to the trigger signal, and the reactance is at least one of a capacitance or an inductance.

13. 13. The RF generator of claim 12, wherein the at least one of capacitance or inductance is varied using an electrically variable capacitance or an electrically variable inductance, respectively.

14. The RF generator of claim 1 , wherein the cost varies according to intermodulation distortion caused by an external RF output signal.

15. 10. The RF generator of claim 1, wherein the RF power controller further comprises a regeneration module, the regeneration module configured to detect the trigger signal and initiate adjustment of the parameter.

16. 16. The RF generator of claim 15, wherein the RF power controller further comprises a look-up table configured to store a plurality of adjustments of the parameter by the regeneration module following detection of the trigger signal.

17. The RF generator of claim 1 , wherein the trigger signal is one of periodic or aperiodic.

18. a first RF generator including a first power supply configured to output a first RF signal that is applied to a load; and a second RF generator, the second RF generator comprising: a second power source configured to generate a second RF signal to be applied to the load; a power controller coupled to the second power supply, the power controller configured to generate a control signal to vary the second RF signal, the control signal adjusting a frequency of the second RF signal according to the first RF signal; A radio frequency (RF) system, wherein the frequency adjustments vary according to a cost in response to individual perturbations of the frequency of the second RF signal for multiple bins of the first RF signal.

19. the cost varies according to one of a reflected power, a delivered power, or a magnitude of a reflection coefficient; A gradient is determined according to the cost; The RF system of claim 18 , wherein the frequency is adjusted according to the gradient.

20. 20. The RF system of claim 19, wherein the frequency is adjusted according to a plurality of frequency adjustments arranged in a pattern.

21. The RF system of claim 20 , wherein the pattern varies according to the first RF signal.

22. 20. The RF system of claim 18, wherein the first RF signal includes a plurality of bins, and for each bin, the frequency of the second RF signal is perturbed according to the respective bin.

23. 20. The RF system of claim 18, wherein the second RF signal is a source RF signal applied to the load, and the second RF signal is a bias RF signal applied to the load.

24. 20. The RF system of claim 18, wherein the power controller adjusts the frequency according to a timing that varies according to the first RF signal.

25. 20. The RF system of claim 18, wherein the power controller is configured to adjust the frequency according to a frequency stored in a memory or determined dynamically.

26. 20. The RF system of claim 18, wherein the frequency is adjusted according to one of a target frequency or a frequency offset and includes a plurality of respective target frequencies or frequency offsets arranged in a predetermined order and timing according to the first RF signal.

27. 20. The RF system of claim 18, wherein the frequency is varied according to intermodulation distortion caused by the first RF signal.

28. 20. The RF system of claim 18, wherein the power controller further includes a regeneration module configured to detect operation of the first RF signal, the regeneration module further configured to begin varying the frequency of the second RF signal based on detection of the first RF signal.

29. 30. The RF system of claim 28, wherein the power controller further comprises a look-up table, the look-up table configured to store the frequency adjustments of the second RF signal initiated by the regeneration module.

30. 30. The RF system of claim 29, wherein the power controller further comprises an update module, the update module configured to update a frequency adjustment according to the cost.

31. 31. The RF system of claim 30, wherein the cost varies according to an impedance of the load connected to the second RF generator.

32. 1. A method for generating a radio frequency (RF) signal, comprising: coupling a power controller to an RF power source; controlling a first RF generator to output an RF output signal; and adjusting an electrical parameter associated with applying the RF power signal to a load. the electrical parameters are adjusted according to a cost, the cost being one of minimized or maximized according to a response of the electrical parameters to a perturbation, the electrical parameters being adjusted individually for multiple bins of the RF output signal relative to a trigger signal.

33. The method of claim 32 , wherein the cost is determined according to one of a reflected power or a magnitude of a reflection coefficient.

34. The method of claim 32 , wherein a gradient is determined according to the cost, and the electrical parameter is adjusted according to the gradient.

35. The method of claim 32 , wherein the electrical parameters are adjusted according to a number of adjustments arranged in a pattern.

36. 36. The method of claim 35, wherein the pattern varies according to a period of an external RF output signal.

37. 33. The method of claim 32, wherein the external RF output signal comprises a plurality of bins, and the parameter is perturbed within each bin.

38. 33. The method of claim 32, wherein the RF output signal is a source RF signal applied to a plasma chamber, and the trigger signal varies according to an external RF output signal, the external RF output signal being a bias RF signal applied to the plasma chamber.

39. 33. The method of claim 32, wherein the power controller adjusts the electrical parameter according to the trigger signal, the trigger signal indicating a relative position of an external RF output signal.

40. 33. The method of claim 32, wherein the electrical parameter is one of a frequency or a frequency offset and includes a plurality of respective frequencies or frequency offsets used by the power controller to adjust the electrical parameters in a predetermined order according to the trigger signal.

41. 33. The method of claim 32, wherein the electrical parameters are adjusted in accordance with intermodulation distortion caused by an external RF output signal.

42. A non-transitory computer readable medium storing instructions, the instructions comprising: controlling a first RF generator to output a first RF output signal to a load; varying a value of an electrical parameter associated with one of the RF output signal or the supply of the RF output signal to the load; The value of the electrical parameter is determined according to a cost, the cost being either minimized or maximized according to a response to the introduction of a perturbation of the electrical parameter, and the value is varied individually with respect to a trigger signal for multiple bins of the RF output signal.

43. 43. The non-transitory computer-readable medium of claim 42, wherein the cost varies according to one of a reflected power or a magnitude of a reflection coefficient.

44. 43. The non-transitory computer-readable medium of claim 42, wherein a gradient is determined according to the cost, and the electrical parameter is varied according to the gradient.

45. 43. The non-transitory computer-readable medium of claim 42, wherein varying the value of the electrical parameter comprises applying a plurality of electrical parameters arranged in a pattern, the pattern varying according to a period of an external RF output signal.

46. 46. ​​The non-transitory computer-readable medium of claim 45, wherein the RF output signal is a source RF signal applied to a plasma chamber, and the trigger signal varies according to an external RF output signal, the external RF output signal being a bias RF signal applied to the plasma chamber.

47. 43. The non-transitory computer-readable medium of claim 42, wherein the external RF output signal comprises a plurality of bins, and for each bin, the electrical parameter is perturbed within each bin.

48. 43. The non-transitory computer-readable medium of claim 42, wherein the parameter that is varied is a frequency offset and includes multiple frequencies of the RF output signal that are output in a predetermined order according to the trigger signal.

49. 43. The non-transitory computer-readable medium of claim 42, wherein the parameter is varied according to intermodulation distortion caused by an external RF output signal.

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