Sample holder and sample processing device

Abstract

To provide a sample holder which can reduce heat damage of a sample caused by radiation of a charged particle beam and produce a good smooth surface.SOLUTION: A sample holder 100 is used for a sample processing device which radiates a charged particle beam to a sample S to process the sample S, and includes: a holder base 20 thermally connected to a cooling source; a holder 30 serving as a rotating body which is rotatably supported by the holder base 20 and holds the sample S; and a motor 50 serving as a drive part which rotates the rotating body. The rotating body has a slide surface 30a which slidably makes surface contact with the holder base 20.SELECTED DRAWING: Figure 3

Description

[Technical field]

[0001] The present invention relates to a sample holder and a sample processing device. [Background technology]

[0002] Known sample processing devices that use an ion beam to process a sample include a Cross Section Polisher (registered trademark) for processing a cross section of a sample and an Ion Slicer (registered trademark) for producing a thin film sample.

[0003] Patent Document 1 discloses a sample processing device equipped with a sample holder capable of changing the incident angle of an ion beam with respect to a sample.

[0004] Plane milling is known as a method of processing samples using an ion beam. In planar milling, the surface of a rotating sample is irradiated with an ion beam at an angle, which makes it possible to remove polishing scratches and crystal distortions caused by mechanical polishing over a wide area, producing a smooth surface. By observing a sample prepared using planar milling with a scanning electron microscope, it is possible to obtain crystal information on the outermost surface of the sample. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2016-100111 A Summary of the Invention [Problem to be solved by the invention]

[0006] However, for samples that are sensitive to heat, such as polymers or low-melting-point metals, ion beam irradiation can cause thermal damage, making it difficult to produce a satisfactory smooth surface even if the sample is subjected to flat milling. [Means for solving the problem]

[0007] One aspect of the sample holder according to the present invention is A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; a magnet that causes the rotor to adhere closely to the holder base by magnetic force; Including, The rotating body has a sliding surface that is in slidable surface contact with the holder base. One aspect of the sample holder according to the present invention is A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; a first rotation transmission member that rotates by rotation of the drive unit; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, The rotating body is A sample holder for holding the sample; a second rotation transmission member that is rotated by power transmitted from the first rotation transmission member; Including, the first rotation transmission member is a first gear, the second rotation transmission member is a second gear that meshes with the first gear, The second gear generates a force for pressing the sliding surface against the holder base by power transmitted from the first gear. One aspect of the sample holder according to the present invention is A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, The holder base has a first wall and a second wall, The sample is disposed between the first wall and the second wall. One aspect of the sample holder according to the present invention is A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, The rotating body is A holder for holding the sample; a rotation base that detachably holds the holder and is rotatably supported by the holder base; A multilayer foil having a surface that serves as the sliding surface; Includes. One aspect of the sample holder according to the present invention is A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; a base thermally connected to the cooling source; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, the holder base is thermally connected to the cooling source via the base; The holder base is tiltably connected to the base.

[0008] In this type of sample holder, the rotor has a sliding surface that is in sliding contact with the holder base, so the holder can be efficiently cooled while rotating. Therefore, this type of sample holder can reduce thermal damage to the sample caused by irradiation with a charged particle beam, and can create a good smooth surface by flat milling.

[0009] One aspect of the sample processing device according to the present invention is to The sample holder; a charged particle beam source that irradiates the sample held by the sample holder with a charged particle beam; Includes.

[0010] Since such a sample processing device includes the above-mentioned sample holder, it is possible to reduce thermal damage to the sample caused by irradiation with a charged particle beam, and to create a satisfactory smooth surface by flat surface milling. [Brief description of the drawings]

[0011] [Figure 1] FIG. 1 is a perspective view showing a sample holder according to a first embodiment. [Diagram 2] FIG. 1 is a perspective view showing a sample holder according to a first embodiment. [Diagram 3] FIG. 2 is a cross-sectional view showing a schematic view of the sample holder according to the first embodiment. [Figure 4] FIG. 1 is a plan view showing a schematic view of a sample holder according to a first embodiment. [Diagram 5] FIG. 11 is a cross-sectional view showing a schematic diagram of a sample holder according to a first modified example. [Figure 6] FIG. 11 is a cross-sectional view showing a schematic diagram of a sample holder according to a second modified example. [Figure 7] FIG. 11 is a cross-sectional view showing a sample holder according to a third modified example. [Figure 8] FIG. [Figure 9] FIG. 13 is a cross-sectional view showing a sample holder according to a fourth modified example. [Figure 10] FIG. 13 is a perspective view showing a sample holder according to a fifth modified example. [Figure 11] FIG. 13 is a cross-sectional view showing a sample holder according to a sixth modified example. [Figure 12] FIG. 11 is a perspective view showing a sample holder according to a second embodiment. [Figure 13] FIG. 11 is a perspective view showing a sample holder according to a second embodiment. [Figure 14] FIG. 11 is a cross-sectional view showing a schematic view of a sample holder according to a second embodiment. [Figure 15] FIG. 13 is a diagram showing the configuration of a sample processing device according to a third embodiment. [Figure 16] 1 is a flowchart showing an example of a sample processing method. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] Preferred embodiments of the present invention will be described in detail below with reference to the drawings. Note that the embodiments described below do not unduly limit the contents of the present invention described in the claims. In addition, not all of the configurations described below are necessarily essential components of the present invention.

[0013] 1. First embodiment 1.1. Sample holder configuration First, the sample holder according to the first embodiment will be described with reference to the drawings. Fig. 1 and Fig. 2 are perspective views that typically show the sample holder 100 according to the first embodiment. Fig. 3 is a cross-sectional view that typically shows the sample holder 100 according to the first embodiment. Fig. 4 is a plan view that typically shows the sample holder 100. Fig. 3 is a cross-sectional view taken along line III-III in Fig. 4.

[0014] The sample holder 100 is a sample holder for a sample processing device that irradiates an ion beam onto a sample S to process the sample S. As shown in FIGS. 1 to 4 , the sample holder 100 includes a base 10, a holder base 20, a holder 30, a motor base 40, a motor 50, a first gear 60, a magnet 70, and a magnetic body 80.

[0015] The base 10 has a wall portion 12, a wall portion 14, and a bottom portion 16 connecting the wall portion 12 and the wall portion 14. The wall portion 12 and the wall portion 14 face each other. A holder base 20 is disposed between the wall portion 12 and the wall portion 14.

[0016] The base 10 is configured to be detachable from the sample processing apparatus. For example, a recess 15 is formed in the bottom 16 of the base 10. The base 10 can be attached to the sample processing apparatus by fitting the recess 15 into a protrusion provided on a stage of the sample processing apparatus. The method of attaching the base 10 to the sample processing apparatus is not particularly limited.

[0017] As shown in FIG. 3, the base 10 is thermally connected to the cooling source 2 and is cooled by thermal conduction. The bottom 16 of the base 10 is in surface contact with the cooling source 2. In the sample processing device, the base 1 The stage on which the temperature sensor 0 is attached is cooled by a refrigerant such as liquid nitrogen, and the stage serves as the cooling source 2.

[0018] The holder base 20 has a first wall portion 22, a second wall portion 24, and a bottom portion 26 connecting the first wall portion 22 and the second wall portion 24. The first wall portion 22 and the second wall portion 24 face each other. A holder 30 for holding a sample S is disposed between the first wall portion 22 and the second wall portion 24.

[0019] The wall 12 of the base 10 and the first wall 22 of the holder base 20 face each other, and there is a gap between the wall 12 and the first wall 22. The wall 14 of the base 10 and the second wall 24 of the holder base 20 face each other, and there is a gap between the wall 14 and the second wall 24. The bottom 16 of the base 10 and the bottom 26 of the holder base 20 face each other, and there is a gap between the bottom 16 and the bottom 26.

[0020] The holder base 20 is thermally connected to the base 10. The holder base 20 is thermally connected to the cooling source 2 via the base 10 and is cooled by thermal conduction. The first wall 22 is provided with a first protrusion 23 that protrudes toward the wall 12 of the base 10. A surface 23a at the tip of the first protrusion 23 is in slidable surface contact with the wall 12. The second wall 24 is provided with a second protrusion 25 that protrudes toward the wall 14 of the base 10. A surface 25a at the tip of the second protrusion 25 is in slidable surface contact with the wall 14. The first protrusion 23 and the second protrusion 25 are in surface contact with the base 10, so that the holder base 20 is thermally connected to the base 10. Therefore, the holder base 20 is thermally connected to the cooling source 2 via the holder base 20.

[0021] A hole 28 for guiding the shaft portion 36 of the holder 30 is formed in the bottom portion 26 of the holder base 20. The bottom portion 26 also has a bottom surface 27 with which the sliding surface 30a of the holder 30 comes into slidable surface contact.

[0022] The holder base 20 is connected to the base 10 so as to be tiltable. The holder base 20 is tilted with the axis A shown in FIG. 3 as the tilt axis. The first protrusion 23 and the second protrusion 25 are rotatably connected to the base 10 by rod-shaped shaft members each extending along the axis A. Therefore, the holder base 20 can be tilted with the axis A as the tilt axis. The holder base 20 can be tilted manually or by using a motor (not shown) as power. By tilting the holder base 20, the holder 30, the motor base 40, and the motor 50 can be tilted. By tilting the holder base 20, the sample S can be tilted.

[0023] The holder 30 holds a sample S to be processed. The holder 30 is rotatably supported by the holder base 20. The holder 30 is a rotating body that rotates when driven by a motor 50. The holder 30 has a sliding surface 30a that is in surface contact with the holder base 20 so as to be slidable.

[0024] The holder 30 has a sample holding portion 32, a columnar portion 33, a second gear 34, and a shaft portion 36. The sample holding portion 32, the columnar portion 33, the second gear 34, and the shaft portion 36 are, for example, integrally formed.

[0025] The sample holder 32 holds the sample S. The sample holder 32 is located between the first wall 22 and the second wall 24 of the holder base 20. The sample S is fixed to the sample holder 32 so that the axis A, which is the tilt axis of the holder base 20, passes through the surface Sa of the sample S. The sample S may be fixed to the sample holder 32 using, for example, a resin or adhesive, or may be fixed using a spring, a screw, or the like. The sample holder 32 may be fixed to the sample holder 32 by a magnetron. The shape of the sample holder 32 is a circle when viewed from the direction along the axis B. The shape of the sample holder 32 is not particularly limited, and may be a polygon when viewed from the direction along the axis B.

[0026] The columnar portion 33 is a columnar portion extending along the axis B. The shape of the columnar portion 33 is, for example, a cylindrical shape with the axis B as the central axis. The sample holder 32 is connected to one end of the columnar portion 33, and the second gear 34 and the shaft portion 36 are connected to the other end of the columnar portion 33.

[0027] The second gear 34 meshes with the first gear 60. The second gear 34 rotates by power transmitted from the first gear 60. The second gear 34 is, for example, a spur gear. The center of the second gear 34 is located on the axis B that is the rotation axis of the holder 30. The second gear 34 has a sliding surface 30a that is in slidable surface contact with the holder base 20. The sliding surface 30a is an annular region centered on the axis B. A plurality of teeth that constitute the second gear 34 are formed around the sliding surface 30a.

[0028] 4 is larger than the maximum width W of the sample holder 32. The maximum width W of the sample holder 32 is the size in a direction perpendicular to the axis B of the sample holder 32. Here, the shape of the sample holder 32 is a circle when viewed from the direction along the axis B, and the maximum width W is the maximum diameter of the sample holder 32.

[0029] When viewed from the direction along the axis B, the second gear 34 has the largest width (size in the direction perpendicular to the axis B) in the holder 30. That is, when viewed from the direction along the axis B, the maximum diameter D of the second gear 34 is larger than the maximum width W of the sample holding portion 32, the maximum width (maximum diameter) of the columnar portion 33, and the maximum width (maximum diameter) of the shaft portion 36. By increasing the maximum diameter D of the second gear 34, the area of ​​the sliding surface 30a can be increased. This allows the area of ​​surface contact between the holder 30 and the holder base 20 to be increased, and the cooling efficiency to be improved.

[0030] The shaft portion 36 is inserted into the hole 28 of the holder base 20. The holder 30 can be attached to the holder base 20 by inserting the shaft portion 36 into the hole 28. The holder 30 rotates using the hole 28 into which the shaft portion 36 is inserted as a guide. The central axis of the shaft portion 36 overlaps with axis B. The holder 30 rotates around axis B as the rotation axis.

[0031] A magnet 70 is fixed to the shaft portion 36. In the illustrated example, the magnet 70 is fixed to the shaft portion 36 by a nut 72. The nut 72 is screwed onto a male screw formed on the shaft portion 36. The magnet 70 has a shape of, for example, a ring when viewed from the direction along the axis B, with the shaft portion 36 passing through the center of the ring. A magnetic body (ferromagnetic body) 80 is fixed to the hole 28 of the holder base 20. The magnetic body 80 has a shape of, for example, a ring when viewed from the direction along the axis B, with the shaft portion 36 passing through the center of the ring.

[0032] The magnetic force generated by the magnet 70 causes the sliding surface 30a of the holder 30 to adhere closely to the bottom surface 27 of the holder base 20. The attractive force acting between the magnet 70 and the magnetic body 80 presses the sliding surface 30a against the bottom surface 27, causing the sliding surface 30a to adhere closely to the bottom surface 27. The magnetic force of the magnet 70 presses the sliding surface 30a against the bottom surface 27 with a constant force.

[0033] The holder 30 is held on the holder base 20 by the attractive force between the magnet 70 and the magnetic body 80. Therefore, the holder 30 is detachable from the holder base 20. Therefore, in the sample holder 100, the sample S can be fixed to the holder 30 in a state where the holder 30 is removed from the holder base 20. Furthermore, when the holder 30 becomes worn, the holder 30 can be replaced.

[0034] The base 10 and the holder base 20 are made of aluminum, for example, and the holder 30 is made of copper, for example. By making the holder base 20 and the holder 30 out of different types of metal, it is possible to prevent galling. The materials of the base 10, the holder base 20, and the holder 30 are not particularly limited as long as they are highly thermally conductive. For example, the base material of the holder base 20 and the base material of the holder 30 may be covered with a plating layer, and the bottom surface 27 of the holder base 20 and the sliding surface 30a of the holder 30 may be the surface of the plating layer. For example, the surface of the plating layer, which has high slidability and high thermal conductivity, may be the bottom surface 27 of the holder base 20 and the sliding surface 30a of the holder 30.

[0035] The motor base 40 holds the motor 50. The motor base 40 is connected to the holder base 20. The motor 50 is connected to a first gear 60. The motor 50 rotates the first gear 60. The motor 50 functions as a drive unit for rotating the holder 30. The first gear 60 is, for example, a spur gear.

[0036] 1.2. Sample holder operation In the sample holder 100, the incident angle of the ion beam with respect to the surface Sa of the sample S can be adjusted by tilting the holder base 20 about the axis A as the tilt axis.

[0037] When the first gear 60 rotates due to the rotation of the motor 50, the second gear 34 meshing with the first gear 60 rotates. This causes the holder 30 to rotate about the axis B, and the sample S held in the sample holding portion 32 to rotate about the axis B. The motor 50, for example, continuously rotates the holder 30 in a constant direction. In other words, the motor 50 rotates the holder 30 multiple times in the same direction.

[0038] As the holder 30 rotates, the sliding surface 30a of the holder 30 slides in surface contact with the bottom surface 27. Here, since the base 10 is in contact with the cooling source 2, it is cooled by thermal conduction. As the base 10 is cooled, the holder base 20 thermally connected to the base 10 is cooled. Since the sliding surface 30a of the holder 30 is in slidable surface contact with the holder base 20, the holder 30 can be cooled while rotating. At this time, the sliding surface 30a is pressed against the bottom surface 27 with a constant force due to the attractive force acting between the magnet 70 fixed to the holder 30 and the magnetic body 80 fixed to the holder base 20. Therefore, the sliding surface 30a and the bottom surface 27 can be brought into close contact with each other.

[0039] 1.3. Effects The sample holder 100 includes a holder base 20 thermally connected to the cooling source 2, a holder 30 rotatably supported by the holder base 20 and holding a sample S, and a motor 50 for rotating the holder 30. The holder 30 has a sliding surface 30a that is in slidable surface contact with the holder base 20. In this manner, in the sample holder 100, since the holder 30 has the sliding surface 30a that is in slidable surface contact with the holder base 20, the holder 30 can be efficiently cooled while rotating. Therefore, in the sample holder 100, thermal damage to the sample S caused by irradiation with an ion beam can be reduced, and therefore, even for samples such as heat-sensitive polymers and low-melting-point metal samples, a good smooth surface can be produced by plane milling.

[0040] For example, when the holder 30 is rotatably supported on the holder base 20 via a bearing, there is a point contact between the holder base 20 and the holder 30 by the balls of the bearing. Therefore, when the holder 30 is supported on the holder base 20 via a bearing, the thermal conduction is poor and the holder 30 cannot be cooled efficiently. In contrast, in the sample holder 100, the holder 30 and the holder base 20 are in surface contact with each other, so the thermal conduction is good and the holder 30 can be cooled efficiently.

[0041] The sample holder 100 includes a magnet 70 that brings the holder 30 into close contact with the holder base 20 by magnetic force. In the sample holder 100, the magnet 70 is fixed to the holder 30, and a magnetic body 80 is fixed to the holder base 20. In this manner, in the sample holder 100, the sliding surface 30a of the holder 30 can be brought into close contact with the holder base 20 by magnetic force, so that the contact thermal resistance between the sliding surface 30a and the holder base 20 can be reduced and the holder 30 can be cooled efficiently.

[0042] In addition, in the sample holder 100, the sliding surface 30a of the holder 30 is brought into close contact with the holder base 20 by the magnetic force of the magnet 70, so that the sliding surface 30a can be pressed with a constant force. This makes it possible to reduce the fluctuation in the frictional force generated on the sliding surface 30a, and also to reduce the fluctuation in the contact thermal resistance between the sliding surface 30a and the bottom surface 27.

[0043] For example, when the sliding surface 30a is brought into close contact with the holder base 20 by an elastic member such as a spring, the magnitude of the spring's restoring force is proportional to the amount of expansion and contraction of the spring from its natural length, so it is difficult to press the sliding surface 30a with a constant force. In contrast, in the sample holder 100, the sliding surface 30a of the holder 30 is brought into close contact with the holder base 20 by magnetic force, so the sliding surface 30a can be pressed with a constant force. This makes it possible to reduce the fluctuation of the frictional force generated on the sliding surface 30a. Furthermore, it is possible to reduce the fluctuation of the contact thermal resistance between the sliding surface 30a and the holder base 20. Therefore, in the sample holder 100, the holder 30 can be rotated at a constant speed and the temperature of the holder 30 can be kept constant.

[0044] The sample holder 100 includes a first gear 60 that rotates by the rotation of the motor 50. The holder 30 also includes a sample holding portion 32 that holds the sample S, and a second gear 34 that rotates by power transmitted from the first gear 60. Therefore, in the sample holder 100, the holder 30 can be rotated continuously in a fixed direction.

[0045] In the sample holder 100, the sliding surface 30a is a surface of the second gear 34. In addition, a plurality of teeth of the second gear 34 are formed around the sliding surface 30a. Therefore, in the sample holder 100, the sliding surface 30a slides in surface contact with the holder base 20 as the holder 30 rotates. Therefore, in the sample holder 100, the holder 30 can be brought into surface contact with the holder base 20 while being rotated.

[0046] In the sample holder 100, the maximum diameter D of the second gear 34 is larger than the maximum width W of the sample holding portion 32 when viewed from the direction along the axis B. Therefore, in the sample holder 100, the area of ​​the sliding surface 30a can be made larger and the cooling efficiency of the holder 30 can be improved compared to, for example, a case in which the maximum diameter D of the second gear 34 is equal to or smaller than the maximum width W of the sample holding portion 32.

[0047] In the sample holder 100, the motor 50 continuously rotates the holder 30 in a fixed direction. Therefore, in the sample holder 100, processing unevenness of the surface Sa of the sample S can be reduced in flat surface milling, and a satisfactory smooth surface can be produced.

[0048] For example, when the holder 30 and the cooling source 2 are connected with a flat braided wire or the like to cool the holder 30, the holder 30 cannot be rotated continuously in a fixed direction because the flat braided wire will be twisted if the holder 30 is rotated continuously in a fixed direction. In contrast, the sample holder 100 allows the holder 30 to slide with the sliding surface 30a of the holder 30 in surface contact with the holder base 20, so the holder 30 can be rotated continuously in a fixed direction while being cooled.

[0049] The sample holder 100 includes a base 10 that is thermally connected to a cooling source 2. The sample 20 is thermally connected to the cooling source 2 via the base 10, and the holder base 20 is tiltably connected to the base 10. Therefore, in the sample holder 100, the incident angle of the ion beam with respect to the surface Sa of the sample S can be adjusted.

[0050] 1.4. Variations 1.4.1. First variant 5 is a cross-sectional view showing a sample holder 101 according to a first modified example. In the sample holder 101, members having the same functions as those of the above-mentioned sample holder 100 are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0051] In the above-mentioned sample holder 100, as shown in Fig. 3, the magnet 70 is fixed to the holder 30, and the magnetic body 80 is fixed to the holder base 20. In contrast, in the sample holder 101, as shown in Fig. 5, the magnet 70 is fixed to the holder base 20, and the magnetic body 80 is fixed to the holder 30.

[0052] The sample holder 101 can achieve the same effects as the sample holder 100 .

[0053] 1.4.2. Second variant 6 is a cross-sectional view showing a sample holder 102 according to the second modified example. In the sample holder 102, members having the same functions as those of the above-mentioned sample holder 100 are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0054] In the above-described sample holder 100, as shown in Fig. 3, the magnet 70 was fixed to the holder 30, and the magnetic body 80 was fixed to the holder base 20. Therefore, in the sample holder 100, the distance between the magnet 70 and the magnetic body 80 was constant.

[0055] 6, in the sample holder 102, the magnetic body 80 is movable along the axis B. Therefore, in the sample holder 102, the distance between the magnet 70 and the magnetic body 80 can be changed. The magnet 70 is fixed to the holder 30.

[0056] A female screw is formed on the inner surface of the hole 28 formed in the bottom 26 of the holder base 20, and a male screw is formed on the outer surface of the magnetic body 80. By forming the magnetic body 80 and the hole 28 into a screw structure in this way, it is possible to make the magnetic body 80 movable along the axis B. This makes it possible to change the distance between the magnet 70 and the magnetic body 80.

[0057] Although not shown, the magnetic body 80 may be fixed with a screw from a direction perpendicular to the axis B. After adjusting the distance between the magnet 70 and the magnetic body 80, the magnetic body 80 may be fixed by bonding.

[0058] The sample holder 102 can achieve the same effects as the sample holder 100. Furthermore, in the sample holder 102, the distance between the magnet 70 and the magnetic body 80 is variable. Therefore, in the sample holder 102, the magnitude of the attractive force between the magnet 70 and the magnetic body 80 can be adjusted. Therefore, in the sample holder 102, the force with which the sliding surface 30a of the holder 30 is pressed against the holder base 20 can be adjusted.

[0059] 5, the magnetic body 80 may be fixed to the holder 30, and the magnet 70 may be made movable along the axis B. This makes it possible to vary the distance between the magnet 70 and the magnetic body 80.

[0060] 1.4.3. Third variant 7 is a cross-sectional view showing a sample holder 103 according to a third modified example. In the sample holder 103, members having the same functions as those of the above-mentioned sample holder 100 are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0061] In the above-described sample holder 100, the shape of the magnet 70 is annular when viewed from the direction along the axis B. In contrast, in the sample holder 103, the magnets 70 are held by annular holding members 74 and are arranged in multiple numbers around the shaft portion 36.

[0062] FIG. 8 is a perspective view showing a schematic view of the holding member 74. The holding member 74 has a circular shape when viewed from the direction along the axis B, and the shaft portion 36 passes through the center of the ring. The holding member 74 is fixed to the shaft portion 36 by a nut 72. As shown in FIG. 8, the holding member 74 holds a plurality of magnets 70. The magnets 70 are arranged, for example, at equal intervals around the axis B. In the illustrated example, the holding member 74 holds four magnets 70, but the number of magnets 70 held by the holding member 74 is not particularly limited. In addition, the arrangement of the magnets 70 is not particularly limited, and the magnets 70 can be arranged in any position.

[0063] The sample holder 103 can achieve the same effects as the sample holder 100 .

[0064] 1.4.4. Fourth variant 9 is a cross-sectional view showing a sample holder 104 according to a fourth modified example. In the sample holder 104, members having the same functions as those of the above-mentioned sample holder 100 are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0065] In the above-mentioned sample holder 100, as shown in Fig. 3, the sliding surface 30a of the holder 30 is an annular region centered on the axis B, which is the rotation axis of the holder 30. In contrast, in the sample holder 104, as shown in Fig. 9, the sliding surface 30a of the holder 30 is a circle centered on the axis B.

[0066] The sliding surface 30a is provided on the shaft portion 36. The sliding surface 30a is an end surface of the shaft portion 36. The shape of the magnet 70 is, for example, annular when viewed from a direction along the axis B, and the shaft portion 36 passes through the center of the ring. The sliding surface 30a is surrounded by the magnet 70 when viewed from a direction along the axis B. That is, the sliding surface 30a is located inside the annular magnet 70 when viewed from a direction along the axis B. The magnet 70 is fixed to the holder 30 by a fixing member 76. Note that the method of fixing the magnet 70 is not particularly limited, and the magnet 70 may be fixed to the holder 30 by, for example, an adhesive or the like.

[0067] The magnetic body 80 is disposed in an area facing the magnet 70. When viewed from the direction along the axis B, the magnetic body 80 overlaps with the magnet 70. In the illustrated example, the shape of the magnetic body 80 is, for example, annular when viewed from the direction along the axis B. The diameter of the magnet 70 and the diameter of the magnetic body 80 are, for example, equal. The bottom surface 27 of the holder base 20, which comes into surface contact with the sliding surface 30a of the holder 30, is surrounded by the magnetic body 80. That is, the bottom surface 27 of the holder base 20 is located inside the annular magnetic body 80 when viewed from the direction along the axis B.

[0068] The sample holder 104 can achieve the same effects as the sample holder 100 .

[0069] 1.4.5. Fifth variant FIG. 10 is a perspective view showing a sample holder 105 according to the fifth modified example. In the sample holder 105, the components having the same functions as those of the above-mentioned sample holder 100 are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0070] In the sample holder 105, as shown in FIG. 10, the first gear 60 and the second gear 34 are bevel gears.

[0071] The first gear 60 and the second gear 34 are bevel gears with multiple teeth formed on the side of a truncated cone. The first gear 60 and the second gear 34 are upside down. In the example shown in the figure, the first gear 60 is arranged with its top surface, which has a smaller area, on the bottom and its bottom surface, which has a larger area, on the top, and the second gear 34 is arranged with its top surface on the top and its bottom surface on the bottom. Axis C, which is the rotation axis of the first gear 60, and axis B, which is the rotation axis of the second gear 34, are parallel to each other.

[0072] In this way, by using the first gear 60 and the second gear 34 that are upside down, a force pressing the sliding surface 30a of the holder 30 against the holder base 20 acts on the second gear 34 to which power is transmitted from the first gear 60. Therefore, in the sample holder 105, in addition to the magnetic force of the magnet 70, the force generated by the second gear 34 by the transmission of power from the first gear 60 can bring the sliding surface 30a into close contact with the holder base 20.

[0073] The sample holder 105 can achieve the same effects as the sample holder 100. Furthermore, in the sample holder 105, the second gear 34 generates a force that presses the sliding surface 30a of the holder 30 against the holder base 20 by transmitting power from the first gear 60. Therefore, in the sample holder 105, the sliding surface 30a can be brought into closer contact with the holder base 20, and the cooling efficiency of the holder 30 can be improved.

[0074] In the above, the first gear 60 and the second gear 34 are described as bevel gears, but the first gear 60 and the second gear 34 are not particularly limited as long as the second gear 34 generates a force to press the sliding surface 30a against the holder base 20.

[0075] For example, the first gear 60 and the second gear 34 may be helical gears (helical gears) whose teeth are spiral with respect to the rotation axis. This allows the second gear 34 to generate a force that presses the sliding surface 30a against the holder base 20, just like when the first gear 60 and the second gear 34 are bevel gears. Furthermore, by making the first gear 60 and the second gear 34 helical gears, the holder 30 can be made detachable.

[0076] 1.4.6. Sixth Variant 11 is a cross-sectional view showing a sample holder 106 according to the sixth modified example. In the sample holder 106, members having the same functions as those of the above-mentioned sample holder 100 are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0077] The sample holder 106 includes a heater 38 disposed on the holder 30 as shown in FIG.

[0078] The first wall 22 and the second wall 24 are thermally connected to the base 10, which is thermally connected to the cooling source 2, and are therefore cooled by thermal conduction. Here, the sample S held in the sample holder 32 is disposed between the first wall 22 and the second wall 24. Therefore, the first wall 22 and the second wall 24 can function as a cooling trap that adsorbs molecules such as hydrocarbons that are a source of contamination of the sample S, thereby reducing sample contamination.

[0079] The heater 38 is a heater for heating the sample S. The heater 38 is attached to the holder 30. In the illustrated example, the heater 38 is disposed so as to be in contact with the sample holder 32. However, the position where the heater 38 is attached is not particularly limited. Since the heater 38 is attached to the holder 30, it is possible to raise the temperature of the sample S held in the sample holding portion 32 before the temperature of the first wall portion 22 and the second wall portion 24. Although not shown, a thermometer for measuring the temperature of the sample S may be attached to the holder 30. This allows the temperature of the sample S to be known.

[0080] Although not shown, a heater for heating the sample holder 100 is attached to the stage of the sample processing device.

[0081] In the sample holder 106, when the sample S is processed by irradiating the sample S with an ion beam while cooling the sample S, the first wall 22 and the second wall 24 can function as a cooling trap. Therefore, contamination of the sample S can be reduced.

[0082] The sample holder 106 includes a heater 38 attached to the holder 30, so that the holder 30 can be heated independently. This prevents contaminant molecules adsorbed on the first wall 22 and the second wall 24, which function as cold traps, from being reattached to the sample S.

[0083] For example, in the sample holder 106, the sample S can be processed by irradiating it with an ion beam while cooling the first wall 22 and the second wall 24 to function as a cold trap. When returning the sample S to room temperature after processing is completed, the sample S is first heated by the heater 38 attached to the holder 30. Next, the base 10 and the holder base 20 are heated by a heater attached to the stage. This allows the temperature of the sample S to always be higher than the temperatures of the first wall 22 and the second wall 24 when returning the sample S to room temperature. As a result, it is possible to prevent molecules that are a source of contamination and that are adsorbed to the first wall 22 and the second wall 24 from reattaching to the sample S.

[0084] 1.4.7. Seventh variant In the sample holder 100 shown in FIG. 3, a lubricant may be applied to the sliding surface 30a of the holder 30 and the bottom surface 27 of the holder base 20. The lubricant may be sandwiched between the sliding surface 30a and the bottom surface 27. As the lubricant, for example, a conductive lubricant such as an ionic liquid may be used. This can reduce friction between the holder 30 and the holder base 20 and improve the cooling efficiency of the holder 30.

[0085] 1.4.8. Eighth Variant In the sample holder 100 shown in Figures 1 to 4, the first gear 60 rotates due to the rotation of the motor 50, and power is transmitted from the first gear 60 to rotate the second gear 34. However, the first rotation transmission member that rotates due to the rotation of the motor 50 and the second rotation transmission member that rotates by power transmitted from the first rotation transmission member are not limited to the first gear 60 and the second gear 34.

[0086] Although not shown, the first rotation transmission member connected to the motor 50 and the second rotation transmission member provided on the holder 30 may be pulleys, and the first rotation transmission member and the second rotation transmission member may be connected by a belt. This allows the drive of the motor 50 to be transmitted to the holder 30 via the first rotation transmission member and the second rotation transmission member, allowing the holder 30 to rotate.

[0087] 2. Second embodiment 2.1. Sample holder configuration Next, a sample holder according to a second embodiment will be described with reference to the drawings. Fig. 12 and Fig. 13 are perspective views that show a sample holder 200 according to the second embodiment. Fig. 14 is a cross-sectional view that shows a sample holder 200 according to the second embodiment. In the sample holder 200 according to the second embodiment, components having the same functions as those of the sample holder 100 according to the first embodiment are given the same reference numerals, and detailed description thereof will be omitted.

[0088] In the above-described sample holder 100, the rotating body rotatably supported by the holder base 20 is composed of the holder 30. In contrast, in the sample holder 200, as shown in Figs. 12 to 14, the rotating body 202 includes the holder 30, a rotating base 210, and a multilayer foil 220.

[0089] The sample holder 200 includes a rotating base 210, a multi-layer foil 220, and a bearing 230. The holder 30, the rotating base 210, and the multi-layer foil 220 constitute a rotating body 202 that is rotated by the drive of a motor 50.

[0090] The rotating base 210 is supported by the holder base 20 so as to be rotatable about axis B as a rotation axis. The rotating base 210 is fixed to a hole 28 of the holder base 20 via a bearing 230. This allows the rotating base 210 to be rotatably supported by the holder base 20. The rotating base 210 rotates about axis B as a rotation axis.

[0091] The rotating base 210 is formed with a hole 211 with the axis B as its central axis. The shaft portion 36 of the holder 30 is inserted into the hole 211. The holder 30 is in surface contact with the rotating base 210. A surface 35 surrounded by a plurality of teeth of the second gear 34 of the holder 30 is in surface contact with an upper surface 212 of the rotating base 210. A magnetic body 80 is fixed to the rotating base 210. A magnet 70 is fixed to the holder 30. The surface 35 of the holder 30 is in close contact with the upper surface 212 of the rotating base 210 due to an attractive force acting between the magnet 70 fixed to the holder 30 and the magnetic body 80 fixed to the rotating base 210.

[0092] Since the holder 30 is fixed to the rotating base 210 by the magnetic force generated by the magnet 70, the holder 30 is detachable from the rotating base 210. The holder 30 and the rotating base 210 rotate integrally about an axis B as a rotation axis.

[0093] The multi-layer foil 220 is fixed to the rotating base 210. The multi-layer foil 220 rotates together with the rotating base 210. The surface of the multi-layer foil 220 has a circular shape centered on the axis B. The multi-layer foil 220 is, for example, formed by stacking multiple layers of copper foil. The multi-layer foil 220 is disposed between the rotating base 210 and the holder base 20.

[0094] The surface of the multilayer foil 220 becomes the sliding surface 30a. That is, the surface of the multilayer foil 220 is in slidable surface contact with the bottom surface 27 of the holder base 20. The multilayer foil 220 is more elastically deformable than, for example, bulk metal. Therefore, by making the sliding surface 30a the surface of the multilayer foil 220, it is possible to rotate the rotating body 202 while keeping the sliding surface 30a in close contact with the holder base 20.

[0095] For example, if the sliding surface 30a is a surface of a bulk metal with high rigidity, when the position of the rotation base 210 is close to the holder base 20, the frictional resistance becomes large and the rotating body 202 cannot rotate. Also, when the position of the rotation base 210 is far from the holder base 20, the rotating body 202 cannot be brought into close contact with the holder base 20, and the holder 30 cannot be cooled. In this way, when the sliding surface 30a is a surface of a bulk metal with high rigidity, it is difficult to rotate the rotating body 202 while bringing the sliding surface 30a into close contact with the holder base 20. In contrast, by using the surface of the multilayer foil 220, which is easily elastically deformed, as the sliding surface 30a, the rotating body 202 can be rotated while bringing the sliding surface 30a into close contact with the holder base 20.

[0096] The multilayer foil 220 may be disposed between the rotating base 210 and the holder base 20. Therefore, the multilayer foil 220 may be fixed to the holder base 20, and the bottom surface 27 of the holder base 20 may serve as the surface of the multilayer foil 220.

[0097] In addition, although the case where the multilayer foil 220 is used as the member that forms the sliding surface 30a has been described here, the member that forms the sliding surface 30a is not limited to the multilayer foil 220. The member that forms the sliding surface 30a may be any elastic body that has high thermal conductivity and is easily elastically deformed, and may be, for example, a flat braided wire made of copper or the like.

[0098] In the sample holder 200, when the rotating body 202 is fixed to the holder base 20 via the bearings 230, the force with which the sliding surface 30a of the rotating body 202 presses against the holder base 20 can be adjusted depending on the position at which the rotating body 202 is fixed.

[0099] 2.2. Operation The operation of the sample holder 200 is similar to that of the sample holder 100, except that the rotor 202 including the holder 30, the rotating base 210, and the multilayer foil 220 is rotated by the drive of the motor 50, and therefore a description thereof will be omitted.

[0100] 2.3. Effects In the sample holder 200, the rotating body 202 includes a holder 30 that holds the sample S, a rotating base 210 that detachably holds the holder 30 and is rotatably supported by the holder base 20, and a multilayer foil 220 whose surface serves as a sliding surface 30a. In the sample holder 200, the rotating base 210 is rotatably supported by the holder base 20 via a bearing 230. Therefore, in the sample holder 200, the sliding surface 30a of the rotating body 202 can be brought into surface contact with the holder base 20 so as to be slidable, while the rotating body 202 is rotatably supported by the bearing 230. Therefore, the sample holder 200 can achieve the same effects as the sample holder 100.

[0101] 3. Third embodiment 3.1. Sample processing equipment Next, a sample processing device according to a third embodiment will be described with reference to the drawings. Figure 15 is a diagram showing the configuration of a sample processing device 300 according to the third embodiment.

[0102] The sample processing device 300 can process the sample S by irradiating it with an ion beam IB, and prepare a sample for a scanning electron microscope. The sample processing device 300 can process the sample S by planar milling, in which the surface Sa of the sample S is obliquely irradiated with the ion beam IB.

[0103] The sample processing device 300 includes the sample holder 100 shown in FIGS. 1 to 4, a stage 310, a liquid nitrogen tank 320, an ion source 330, a vacuum chamber 340, and a camera 350.

[0104] The sample holder 100 is attached to a stage 310. In the example shown in Fig. 15, a mounting surface 312 of the stage 310 to which the sample holder 100 is attached faces horizontally. The sample holder 100 is attached to the mounting surface 312 so that the bottom 16 of the base 10 is in surface contact with the mounting surface 312. The sample holder 100 is attached to the mounting surface 312 of the stage 310 so that axis A, which is the tilt axis shown in Fig. 3, is horizontal. An ion beam IB is irradiated onto the intersection of axis A and axis B.

[0105] The stage 310 is connected to a liquid nitrogen tank 320 that stores liquid nitrogen as a coolant. The stage 310 is thermally connected via a conductive part. Therefore, the stage 310 can be cooled and can function as the cooling source 2. Although not shown, the stage 310 is equipped with a connection / disconnection mechanism for switching between connection and disconnection at the thermal conductive part connected to the liquid nitrogen tank, and a heater for heating the stage 310. Therefore, in the sample processing device 300, the temperature of the stage 310 can be controlled to a desired temperature.

[0106] In the sample holder 100, the holder base 20 can be tilted about the axis A. Therefore, by tilting the holder base 20, the incident angle of the ion beam IB with respect to the surface Sa of the sample S can be adjusted.

[0107] The ion source 330 irradiates the sample S with an ion beam IB. The ion source 330 is attached to the upper part of the vacuum chamber 340. The ion source 330 is, for example, an ion gun that accelerates and emits the ion beam IB at a predetermined acceleration voltage. The ion source 330 ionizes, for example, argon gas to emit the argon ion beam IB.

[0108] The sample holder 100 is housed in the vacuum chamber 340. In the vacuum chamber 340, the sample S held by the sample holder 100 is irradiated with an ion beam IB. The inside of the vacuum chamber 340 is evacuated to a vacuum by an exhaust device (not shown).

[0109] The camera 350 is a camera for observing the sample S held by the sample holder 100. The camera 350 allows the processing status of the sample S to be confirmed.

[0110] 3.2. Sample processing method 3.2.1. Plane milling In the sample processing device 300, the surface Sa of the sample S can be processed by plane milling. Plane milling is a technique for processing the surface Sa of the sample S by obliquely irradiating the surface Sa of the rotating sample S with an ion beam IB. For example, the surface Sa of the sample S pretreated by mechanical polishing has polishing scratches, crystal distortion, and the like, and polishing agent residue adheres thereto, making it difficult to obtain information on the state and unevenness of the outermost surface of the sample using a scanning electron microscope. By performing plane milling as a final finish on the mechanically polished sample surface, polishing scratches, polishing agent residue, crystal distortion, and the like can be removed over a wide area.

[0111] For example, when the ion beam IB is irradiated to the surface Sa of the sample S at a shallow angle of 10 degrees or less, a surface with few irregularities is obtained in which the difference in etching rate due to crystal orientation and composition is reduced. This allows an image with emphasized channeling contrast to be observed in the scanning electron microscope. In addition, when the ion beam IB is irradiated to the sample surface at a deep angle of 30 degrees or more, differences in etching rate due to crystal orientation and composition occur, allowing an image with emphasized irregularities to be observed in the scanning electron microscope.

[0112] 3.2.2. Sample processing flow 16 is a flow chart showing an example of a sample processing method using a sample processing device 300 including a sample holder 100. Below, the case of plane milling of a sample S will be described with reference to FIGS.

[0113] First, the sample S is set on the sample holder 100 (S100). In the sample holder 100, the holder 30 is detachable from the holder base 20. Therefore, the holder 30 can be removed from the holder base 20 and the sample S can be fixed to the holder 30. Specifically, as shown in FIG. 3, the sample S is fixed to the sample holder 32 so that the intersection of the axis A and the axis B is located at the center of the surface Sa of the sample S. After the sample S is fixed to the sample holder 32, the holder 3 0 is attached to the holder base 20.

[0114] In the sample holder 100, since the holder 30 is detachable, a plurality of holders 30 of different heights may be prepared, and the holder 30 that matches the height of the sample S may be used.

[0115] 15, the sample holder 100 is mounted on the stage 310 (S102). At this time, the position of the sample holder 100 with respect to the optical axis of the ion source 330 is adjusted so that the ion beam IB is irradiated onto the intersection of the axis A and the axis B. Also, the incident angle of the ion beam IB with respect to the surface Sa of the sample S is adjusted. The incident angle of the ion beam IB with respect to the surface Sa of the sample S is adjusted by tilting the holder base 20 with the axis A as the tilt axis.

[0116] Next, the inside of the vacuum chamber 340 is evacuated to create a vacuum state (reduced pressure state) inside the vacuum chamber 340 (S104).

[0117] Next, cooling of the sample S is started (S106). The stage 310 can be cooled by supplying liquid nitrogen to the liquid nitrogen tank 320. By cooling the stage 310, the base 10 thermally connected to the stage 310 and the holder base 20 thermally connected to the base 10 are cooled. In addition, since the holder base 20 and the holder 30 are in surface contact, the holder 30 is also cooled. This allows the sample S to be cooled. The temperature of the sample S may be controlled by operating a heater attached to the stage 310.

[0118] Next, the sample S is processed by the ion beam IB (S108). The motor 50 is operated to rotate the holder 30 continuously in a fixed direction around the axis B as the rotation axis via the first gear 60 and the second gear 34. As the holder 30 rotates, the sliding surface 30a of the holder 30 slides in surface contact with the bottom surface 27 of the holder base 20. In addition, the sliding surface 30a is pressed against the bottom surface 27 by the magnetic force generated by the magnet 70. Therefore, the holder 30 can be efficiently cooled even when the holder 30 rotates. Furthermore, since the sliding surface 30a is pressed against the bottom surface 27 with a constant force by the magnetic force generated by the magnet 70, the fluctuation of the contact thermal resistance can be reduced, and the temperature of the sample S can be kept constant.

[0119] With the sample S rotated, an ion beam IB is emitted from the ion source 330, and the ion beam IB is irradiated onto the surface Sa of the sample S. In this way, the sample S can be irradiated with the ion beam IB while rotating and cooling the sample S, thereby processing the surface Sa of the sample S. Through the above steps, the sample S can be subjected to plane milling.

[0120] After the processing of the sample S is completed, the sample holder 100 is returned to room temperature by heating the stage 310 with a heater attached to the stage 310. This allows the sample holder 100 to be removed from the vacuum chamber 340.

[0121] In the above, a case has been described in which the sample S is processed by plane milling using the sample processing device 300, but the sample S can also be processed by a method other than plane milling using the sample processing device 300.

[0122] 3.3. Effects Since the sample processing device 300 includes the sample holder 100, it is possible to create a satisfactory smooth surface by flat milling even for the sample S, such as a heat-sensitive polymer or low-melting point metal sample.

[0123] 3.4. Variations 3.4.1. First variant In the above-mentioned third embodiment, the sample processing device 300 includes the sample holder 100. However, for example, the sample holder 106 shown in FIG. 11 may be included. This allows the first wall 22 and the second wall 24 to be used as a cold trap in step S108 of processing the sample S with the ion beam IB. Furthermore, when the sample holder 100 is removed from the vacuum chamber 340, the heater 38 can raise the temperature of the holder 30, and then the heater attached to the stage 310 can heat the holder base 20. This prevents the molecules that are adsorbed to the first wall 22 and the second wall 24 and serve as a source of contamination from reattaching to the sample S.

[0124] The sample processing device 300 may include the other sample holders 101, 102, 103, 104, 105, and 200 described above.

[0125] 3.4.2. Second variant In the above-described third embodiment, the sample processing apparatus 300 includes an ion source 330 that irradiates the sample S with an ion beam IB. However, the sample processing apparatus 300 may include a charged particle beam source that irradiates the sample S with a charged particle beam other than the ion beam IB, such as an electron beam.

[0126] The above-described embodiment and modifications are merely examples, and the present invention is not limited to these. For example, the embodiments and modifications can be appropriately combined.

[0127] The present invention is not limited to the above-described embodiment, and various modifications are possible. For example, the present invention includes a configuration that is substantially the same as the configuration described in the embodiment. A substantially identical configuration is, for example, a configuration that has the same function, method, and result, or a configuration that has the same purpose and effect. The present invention also includes a configuration in which non-essential parts of the configuration described in the embodiment are replaced. The present invention also includes a configuration that has the same action and effect as the configuration described in the embodiment, or a configuration that can achieve the same purpose. The present invention also includes a configuration in which publicly known technology is added to the configuration described in the embodiment. [Explanation of symbols]

[0128] 2...cooling source, 10...base, 12...wall, 14...wall, 15...recess, 16...bottom, 20...holder base, 22...first wall, 23...first protrusion, 23a...surface, 24...second wall, 25...second protrusion, 25a...surface, 26...bottom, 27...bottom, 28...hole, 30...holder, 30a...sliding surface, 32...sample holder, 33...columnar portion, 34...second gear, 35...surface, 36...shaft, 38...heater, 40...motor base, 50...motor, 60...first gear, 70...magnet, 72...nut, 74...holding member, 7 6...fixing member, 80...magnetic material, 100...sample holder, 101...sample holder, 102...sample holder, 103...sample holder, 104...sample holder, 105...sample holder, 106...sample holder, 200...sample holder, 202...rotating body, 210...rotating base, 211...hole, 212...upper surface, 220...multilayer foil, 230...bearing, 300...sample processing device, 310...stage, 312...mounting surface, 320...liquid nitrogen tank, 330...ion source, 340...vacuum chamber, 350...camera

Claims

1. A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; a magnet that causes the rotor to adhere closely to the holder base by magnetic force; Including, The rotating body has a sliding surface that is in slidable surface contact with the holder base.

2. In claim 1, The magnet is fixed to the rotor, A sample holder having a magnetic body fixed to the holder base.

3. In claim 1, The magnet is fixed to the holder base, A sample holder having a magnetic body fixed to the rotor.

4. In claim 2 or 3, A sample holder, wherein the distance between the magnet and the magnetic body is variable.

5. In claim 1, a first rotation transmission member that rotates by rotation of the drive unit; The rotating body is A sample holder for holding the sample; a second rotation transmission member that is rotated by power transmitted from the first rotation transmission member; a sample holder comprising:

6. In claim 5, The sliding surface is a surface of the second rotation transmission member.

7. In claim 5 or 6, the first rotation transmission member is a first gear, The second rotation transmission member is a second gear that meshes with the first gear.

8. In claim 7, A sample holder, wherein the maximum diameter of the second gear is larger than the maximum width of the sample holding portion when viewed from a direction along the rotation axis of the rotating body.

9. In claim 7, A sample holder, wherein the second gear has a plurality of teeth formed around the periphery of the sliding surface.

10. A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; a first rotation transmission member that rotates by rotation of the drive unit; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, The rotating body is A sample holder for holding the sample; a second rotation transmission member that is rotated by power transmitted from the first rotation transmission member; Including, the first rotation transmission member is a first gear, the second rotation transmission member is a second gear that meshes with the first gear, The second gear generates a force for pressing the sliding surface against the holder base by transmitting power from the first gear.

11. A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, The holder base has a first wall and a second wall, The sample holder, wherein the sample is disposed between the first wall and the second wall.

12. In claim 11, A sample holder including a heater attached to the rotor.

13. A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, The rotating body is A holder for holding the sample; a rotation base that detachably holds the holder and is rotatably supported by the holder base; A multilayer foil having a surface that serves as the sliding surface; a sample holder comprising:

14. In claim 13, The rotating base is rotatably supported by the holder base via a bearing.

15. In any one of claims 1 to 3, The drive unit continuously rotates the rotor in a fixed direction.

16. A sample holder for a sample processing device that processes a sample by irradiating the sample with a charged particle beam, comprising: a holder base thermally connected to a cooling source; a rotor rotatably supported by the holder base and adapted to hold the sample; A drive unit that rotates the rotating body; a base thermally connected to the cooling source; Including, the rotating body has a sliding surface that is in slidable surface contact with the holder base, the holder base is thermally connected to the cooling source via the base; The holder base is tiltably connected to the base, the sample holder.

17. A sample holder according to any one of claims 1, 10, 11, 13 and 16, a charged particle beam source that irradiates the sample held by the sample holder with a charged particle beam; A sample processing device comprising:

Images