Pellicle, pellicle support, and method for manufacturing pellicle

Abstract

The present invention addresses the problem of providing a pellicle capable of improving impact resistance and suppressing the generation of foreign matter.　A pellicle (100) comprises: a pellicle membrane (10); a support (30) having a frame portion (31) and an opening portion (32); and a first reinforcing layer (40). The first reinforcing layer (40) is disposed between the pellicle membrane (10) and the support (30) in a region in which the pellicle membrane (10) and the support (30) overlap in a plan view of the pellicle membrane (10) supported by the support (30), and contains at least one material selected from the group consisting of carbon nanotubes, graphene, silicon carbide, silicon nitride, boron nitride, etc. When the first reinforcing layer (40) contains carbon nanotubes, the carbon nanotubes are oriented in a direction perpendicular to a support surface (34).

Description

[Technical field]

[0001] The present invention relates to a pellicle, a pellicle support, and a method for manufacturing a pellicle. [Background technology]

[0002] In a manufacturing process for semiconductor devices and the like, for example, a desired circuit pattern is formed on a substrate such as a semiconductor wafer by applying a photoresist to the substrate, irradiating the substrate with the photoresist through a photomask with light, and removing the photoresist.

[0003] When light is irradiated onto a photomask with foreign matter adhering thereto, the foreign matter may cause problems with the circuit pattern formed on the substrate. For this reason, a pellicle having a pellicle film for capturing foreign matter may be used to prevent foreign matter from adhering to the photomask. The pellicle is placed above the photomask at a distance such that the pellicle film does not come into contact with the photomask.

[0004] In recent years, the use of extreme ultraviolet (EUV) has been considered in order to form finer circuit patterns. EUV refers to light with a wavelength of 1 nm or more and 100 nm or less. Specifically, light rays of about 13.5 nm ± 0.3 nm are beginning to be used as EUV. When EUV is irradiated onto a pellicle film, the EUV passes through the pellicle film, but a portion of the irradiated EUV is absorbed by the pellicle film. The light energy of the absorbed EUV is converted into thermal energy, causing the temperature of the pellicle film to rise. For this reason, the pellicle film is required to have EUV transmittance, heat resistance, durability, and the like.

[0005] For example, Patent Document 1 describes that the strength of a pellicle film can be improved by subjecting the pellicle film to a heat treatment (annealing treatment). Furthermore, Patent Document 2 describes a pellicle for photolithography that is composed of a pellicle membrane and a pellicle frame, with the pellicle membrane being attached to the upper end surface of the pellicle frame via an adhesive or pressure sensitive adhesive. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] JP 2020-91314 A [Patent Document 2] JP 2020-98227 A Summary of the Invention [Problem to be solved by the invention]

[0007] Although Patent Document 1 describes a method capable of improving the strength of a pellicle membrane, there is a demand for a technique for further improving the impact resistance of a pellicle. In addition, in the pellicle of Patent Document 2, the pellicle membrane is fixed to the support (pellicle frame) via an adhesive or pressure-sensitive adhesive. Since adhesives and pressure-sensitive adhesives are not materials with excellent heat resistance, there is a possibility that they will decompose and become foreign matter when irradiated with high-energy light such as EUV.

[0008] An object of the present invention is to provide a pellicle and a pellicle support that can improve impact resistance and suppress the generation of foreign matter, as well as to provide a manufacturing method for manufacturing said pellicle. [Means for solving the problem]

[0009] [1]. A pellicle membrane; A support having a frame and an opening surrounded by the frame, and supporting the pellicle membrane; A first reinforcing layer that reinforces the pellicle membrane, The frame portion has a support surface facing the pellicle membrane, The pellicle membrane has a first pellicle membrane surface facing the support and a second pellicle membrane surface opposite the first pellicle membrane surface, The first reinforcing layer is a region where the pellicle membrane and the support overlap when the pellicle membrane supported by the support is viewed in a plan view, and is disposed between the pellicle membrane and the support on the first pellicle membrane surface side, The first reinforcing layer contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride; A pellicle, wherein when the first reinforcing layer contains carbon nanotubes, the carbon nanotubes in the first reinforcing layer are oriented in a direction perpendicular to the support surface of the frame.

[0010] [2]. [1] The pellicle according to the present invention, A pellicle, wherein the pellicle membrane is an inorganic thin film or an organic thin film.

[0011] [3]. In the pellicle according to [1] or [2], The pellicle film contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride.

[0012] [4]. [1] to [3], wherein the pellicle is A pellicle, wherein the pellicle membrane contains carbon nanotubes.

[0013] [5]. [1] to [4], wherein the pellicle is A pellicle, wherein the material of the pellicle membrane and the material of the first reinforcing layer are the same.

[0014] [6]. [1] to [5], wherein the pellicle is The pellicle further comprises a second reinforcing layer disposed on the second pellicle membrane surface side.

[0015] [7]. [6] The pellicle according to the present invention, The pellicle, wherein the second reinforcing layer contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride.

[0016] [8]. [6] or [7], wherein the pellicle the second reinforcing layer includes carbon nanotubes, A pellicle, wherein the carbon nanotubes in the second reinforcing layer are oriented in a direction parallel to the support surface of the frame.

[0017] [9]. A pellicle support for supporting a pellicle membrane, comprising: A frame portion and an opening portion surrounded by the frame portion, The frame portion has a support surface that faces the pellicle membrane when supporting the pellicle membrane, A first reinforcing layer is disposed on the outer circumferential side of the opening and on the support surface of the frame portion, The first reinforcing layer contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride; A pellicle support, wherein when the first reinforcing layer contains carbon nanotubes, the carbon nanotubes in the first reinforcing layer are oriented in a direction perpendicular to the support surface of the frame.

[0018]

[10] . A method for manufacturing a pellicle using the pellicle support according to [9], A method for manufacturing a pellicle, comprising a step of attaching the pellicle membrane to the support surface side of the frame portion so as to cover the opening and be supported by the first reinforcing layer.

[0019]

[11] .

[10] The method for producing a pellicle according to the present invention, Prior to the step of attaching the pellicle membrane to the pellicle support, a step of disposing a second reinforcing layer on a second pellicle membrane surface opposite a first pellicle membrane surface of the pellicle membrane facing the pellicle support, A method for manufacturing a pellicle, wherein the step of placing the second reinforcing layer is a step of placing the second reinforcing layer at a position where the pellicle membrane, the pellicle support, and the first reinforcing layer overlap when the pellicle membrane is viewed in a plane after being attached to the pellicle support.

[0020]

[12] .

[10] The method for producing a pellicle according to the present invention, A method for manufacturing a pellicle, further comprising a step of placing a second reinforcing layer in a region of a second pellicle membrane surface opposite a first pellicle membrane surface facing the pellicle support, where the pellicle membrane and the pellicle support overlap when the pellicle membrane is viewed in a plane.

[0021]

[13] . A method for producing a pellicle according to

[11] or

[12] , A method for manufacturing a pellicle, wherein the second reinforcing layer contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride.

[0022]

[14] . A method for producing a pellicle according to

[13] , the second reinforcing layer includes carbon nanotubes, A method for manufacturing a pellicle, comprising forming the second reinforcing layer so that carbon nanotubes in the second reinforcing layer are oriented in a direction parallel to a membrane surface of the pellicle membrane.

[0023] According to one aspect of the present invention, it is possible to provide a pellicle and a pellicle support body that can improve impact resistance and suppress the generation of foreign matter, and to provide a manufacturing method for manufacturing the pellicle. [Brief description of the drawings]

[0024] [Figure 1] FIG. 2 is a plan view illustrating a schematic example of a pellicle according to the first embodiment. [Diagram 2] FIG. 2 is a cross-sectional view showing a cross section taken along line II-II of FIG. [Diagram 3] FIG. 11 is a plan view illustrating an example of a pellicle according to a second embodiment. [Figure 4] FIG. 4 is a cross-sectional view showing a cross section IV-IV of FIG. [Figure 5A] FIG. 2 is a plan view diagrammatically illustrating a pellicle for evaluating the strength of a pellicle membrane. [Figure 5B] FIG. 2 is a side view diagrammatically illustrating a pellicle for evaluating the strength of a pellicle membrane. [Figure 6] FIG. 1 is an explanatory diagram illustrating a schematic diagram of a strength evaluation of a pellicle membrane. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0025] [First embodiment] (Pellicle) The pellicle according to the first embodiment includes a pellicle membrane, a support that supports the pellicle membrane, and a first reinforcing layer that reinforces the pellicle membrane. In this specification, ordinal numbers such as "first" and "second" are used to distinguish configurations and the like, and are not used to specify an order. In this specification, when ordinal numbers are used to specify an order, this is separately specified. Thus, for example, in the first reinforcing layer and the second reinforcing layer (see the second embodiment), "first" and "second" are used in the wording "reinforcing layer" to distinguish between the multiple reinforcing layers, in consideration of the fact that the pellicle has multiple reinforcing layers that are different from each other. In this specification, since the first reinforcement layer is positioned inside the pellicle membrane, the first reinforcement layer can also be referred to as the inner reinforcement layer, and since the second reinforcement layer is positioned on the outer side of the pellicle membrane, the second reinforcement layer can also be referred to as the outer reinforcement layer.

[0026] Hereinafter, an example of a pellicle according to the first embodiment will be described with reference to the drawings. The present invention is not limited to the pellicle shown in the drawings. In addition, in the drawings in which the description is given with reference to the drawings in this specification, some parts are illustrated enlarged or reduced in size to facilitate the description.

[0027] Figures 1 and 2 show a pellicle 100 as an example of the first embodiment. Figure 1 shows a plan view of the pellicle 100 viewed from the surface side to which the pellicle film 10 is attached, and Figure 2 shows a cross-sectional view of the pellicle 100 shown in Figure 1.

[0028] The pellicle 100 comprises a pellicle membrane 10, a support 30 that supports the pellicle membrane 10, and a first reinforcing layer 40 that reinforces the pellicle membrane 10.

[0029] (Support) The support 30 has a frame portion 31 and an opening portion 32 surrounded by the frame portion 31 . The frame 31 has a support surface 34 facing the pellicle membrane 10. Specifically, the support surface 34 faces the first pellicle membrane surface 11 of the pellicle membrane 10 when supporting the pellicle membrane 10. The support 30 having the first reinforcing layer 40 disposed on the support surface 34 may be referred to as a pellicle support 30A. The opening 32 penetrates from one surface to the other surface of the support 30. The frame 31 and the opening 32 are both formed in a rectangular shape. In this embodiment, all four corners of the outer shape of the frame 31 are rounded, but the shape of the frame 31 is not limited to such a shape. The material of the support 30 may be any known material, such as a resin material (polyethylene, etc.), a metal material (aluminum, aluminum alloy, magnesium alloy, stainless steel, titanium, titanium alloy, invar, etc.), a ceramic material (SiC, SiN, etc.), quartz, and a fiber-reinforced plastic material (carbon fiber-reinforced plastic, glass fiber-reinforced plastic, etc.).

[0030] (First reinforcing layer) The first reinforcing layer 40 is a region where the pellicle membrane 10 and the support 30 overlap when the pellicle membrane 10 supported by the support 30 is viewed in plan, and is disposed between the pellicle membrane 10 and the support 30 on the first pellicle membrane surface 11 side. The first reinforcing layer 40 is disposed along the peripheral portion 13 of the pellicle membrane 10. It is also preferable that the first reinforcing layer 40 is disposed in direct contact with the support surface 34.

[0031] The first reinforcing layer 40 may extend toward the opening 32 of the support 30 in a plan view of the pellicle 100 within a range that does not interfere with development (a range that does not block exposure light necessary for development). The inner end portion (the end portion on the opening 32 side) of the first reinforcing layer 40 may be formed to be aligned with the inner end face (the end face on the opening 32 side) of the frame portion 31 as shown in Fig. 2. The inner end portion of the first reinforcing layer 40 may be formed to be located more inward than the inner end face of the frame portion 31 within a range that does not interfere with support and reinforcement of the pellicle membrane 10.

[0032] The thickness of the first reinforcing layer 40 is preferably greater than the thickness of the pellicle membrane 10, and from the viewpoint of easily obtaining impact resistance, is preferably 0.05 μm or more, and more preferably 0.1 μm or more. Moreover, from the viewpoint of productivity and prevention of generation of foreign matter due to heating, the thickness of the first reinforcing layer 40 is preferably 1 μm or less, and more preferably 0.5 μm or less.

[0033] The first reinforcing layer 40 contains one or more materials (reinforcing materials) selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride. By containing these materials in the first reinforcing layer 40, the pellicle 100 functions stably against heat during exposure, has excellent durability, and is less likely to generate particles (fine particles having a size of several hundred nm to several tens of nm) from the first reinforcing layer 40. The content of these materials (reinforcing materials) in the first reinforcing layer 40 is preferably 60 mass% or more, 70 mass% or more, 80 mass% or more, 90 mass% or more, 95 mass% or more, or 98 mass% or more. It is more preferable that the first reinforcing layer 40 contains one or more materials selected from the group consisting of carbon nanotubes, graphene, silicon carbide, silicon nitride, and boron nitride. It is more preferable that the first reinforcing layer 40 is formed of carbon nanotubes or graphene. Nanocarbon materials such as carbon nanotubes and graphene have excellent heat resistance. The content of the nanocarbon material in the first reinforcing layer 40 is preferably 60 mass% or more, 70 mass% or more, 80 mass% or more, 90 mass% or more, 95 mass% or more, or 98 mass% or more.

[0034] When the first reinforcing layer 40 contains carbon nanotubes, the carbon nanotubes in the first reinforcing layer 40 are oriented in a direction perpendicular to the support surface 34 of the frame 31. The first reinforcing layer 40 is also preferably a carbon nanotube forest. A carbon nanotube forest is a growth body in which a plurality of carbon nanotubes are grown on a support or substrate so as to be oriented in a direction perpendicular to the surface of the support or substrate, and is sometimes called an "array." The impact absorption properties of the first reinforcing layer 40 are improved by the carbon nanotubes in the first reinforcing layer 40 being oriented in the vertical direction.

[0035] In this specification, "oriented in the vertical direction" means oriented approximately perpendicular to the surface of the support or substrate, and "approximately perpendicular" means that the angle of the orientation direction of the material (such as carbon nanotubes) in the first reinforcing layer relative to the surface of the support or substrate is 90 degrees ±20 degrees (70 degrees or more, 110 degrees or less).

[0036] The first reinforcing layer 40 more preferably contains carbon nanotubes, and further preferably consists essentially of carbon nanotubes. Here, "consist essentially of carbon nanotubes" means that 98% by mass or more of the first reinforcing layer 40 is carbon nanotubes, excluding the metal catalyst used in producing the carbon nanotubes. In other words, the first reinforcing layer 40 "consist essentially of carbon nanotubes" means that the percentage of the mass of carbon nanotubes to the total mass of the first reinforcing layer 40 after subtracting the mass of the metal catalyst used in producing the carbon nanotubes and contained in the first reinforcing layer 40 is 98% by mass or more. When the first reinforcing layer 40 consists essentially of carbon nanotubes, unavoidable impurities that are not intentionally added to the first reinforcing layer 40 and are mixed in the raw materials or manufacturing process may or may not be contained in the first reinforcing layer 40.

[0037] When the first reinforcing layer 40 contains carbon nanotubes, the carbon nanotubes contained in the first reinforcing layer 40 are not particularly limited, and are preferably at least one type selected from the group consisting of multi-walled carbon nanotubes (MWCNTs), few-walled carbon nanotubes (FWCNTs), double-walled carbon nanotubes (DWCNTs), and single-walled carbon nanotubes (SWCNTs).

[0038] (Pellicle membrane) The pellicle film 10 has a first pellicle film surface 11 facing the support 30 and a second pellicle film surface 12 opposite the first pellicle film surface 11. The peripheral portion 13 of the pellicle film 10 is fixed to a part of the support surface 34 of the frame portion 31, and covers the opening 32 of the support 30. In the pellicle 100, it is preferable that the pellicle film 10 and the first reinforcing layer 40 are in direct contact with each other.

[0039] The pellicle membrane 10 is preferably an inorganic thin film or an organic thin film. The pellicle membrane 10 preferably contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride.

[0040] The pellicle film 10 preferably contains carbon nanotubes, and is preferably substantially composed of only carbon nanotubes. Here, "substantially composed of only carbon nanotubes" means that 98% by mass or more of the pellicle film is carbon nanotubes, excluding the metal catalyst used in the production of carbon nanotubes. In other words, "substantially composed of only carbon nanotubes" means that the percentage of the mass of carbon nanotubes to the total mass of the pellicle film 10 after subtracting the mass of the metal catalyst used in the production of carbon nanotubes and contained in the pellicle film 10 is 98% by mass or more. When the pellicle film 10 is substantially composed of only carbon nanotubes, unavoidable impurities that are not intentionally added to the pellicle film 10 and are mixed in the raw materials or production process may or may not be contained in the pellicle film 10.

[0041] The carbon nanotubes contained in the pellicle membrane 10 are not particularly limited, and are preferably at least one type selected from the group consisting of multi-walled carbon nanotubes, few-walled carbon nanotubes, double-walled carbon nanotubes, and single-walled carbon nanotubes.

[0042] In this embodiment, the multi-walled carbon nanotube is, for example, a carbon nanotube having 4 to 20 concentric layers and a diameter of 4 to 100 nm. The few-walled carbon nanotube is, for example, a carbon nanotube having 2 or 3 concentric layers and a diameter of 2 to 8 nm. The single-walled carbon nanotube is, for example, a single-walled carbon nanotube with a tube diameter of 0.2 to 5 nm.

[0043] Carbon nanotubes can be obtained, for example, by chemical vapor deposition, laser ablation or arc discharge.

[0044] In this embodiment, the length of the carbon nanotube is preferably, for example, not less than 0.1 μm and not more than 1000 μm. In this embodiment, the length of the carbon nanotubes is more preferably 0.5 μm or more, and further preferably 1 μm or more. In this embodiment, the length of the carbon nanotubes is more preferably 600 μm or less, and further preferably 400 μm or less.

[0045] In this embodiment, the cross-sectional diameter of the carbon nanotube is preferably 0.2 nm or more and 50 nm or less. In this embodiment, the cross-sectional diameter of the carbon nanotubes is more preferably 0.5 nm or more, and further preferably 1 nm or more. In this embodiment, the cross-sectional diameter of the carbon nanotubes is more preferably 30 nm or less, and further preferably 20 nm or less.

[0046] The pellicle film according to the present embodiment is preferably self-supporting from the viewpoint of improving transparency to the exposure light. The fact that the pellicle film is self-supporting means that the pellicle film is in a state in which it is self-supporting, and that the pellicle film is a film that has self-supporting properties (also called a self-supporting film). In other words, a pellicle film that is self-supporting is a film that can maintain its shape by itself even without the presence of a substrate or the like.

[0047] In the pellicle 100, the material of the pellicle membrane 10 and the material of the first reinforcing layer 40 may be the same or different. For example, it is also preferable that the material of the pellicle membrane 10 and the material of the first reinforcing layer 40 are both carbon nanotubes. By forming the pellicle membrane 10 and the first reinforcing layer 40 from the same material, the adhesion between the pellicle membrane 10 and the first reinforcing layer 40 can be improved.

[0048] The thickness of the pellicle film according to the present embodiment is not particularly limited, and is preferably 3 nm or more and 1000 nm or less. The thickness of the pellicle film is preferably 10 nm or more, more preferably 20 nm or more, and even more preferably 30 nm or more. The thickness of the pellicle film is preferably 600 nm or less, and more preferably 300 nm or less. If the thickness of the pellicle film is, for example, 3 nm or more and 1000 nm or less, the strength of the pellicle film is further improved and EUV transmittance is easily ensured.

[0049] (Method of manufacturing a pellicle) Next, a method for manufacturing a pellicle according to the first embodiment (hereinafter, sometimes referred to as the manufacturing method of the first embodiment) will be described. The manufacturing method of the first embodiment includes a step of manufacturing a pellicle using a pellicle support 30A. More specifically, the manufacturing method of the first embodiment includes the following step (P1).

[0050] Step (P1) is a step of attaching a pellicle membrane 10 to the support surface 34 side of the frame portion 31 of the pellicle support 30A so as to cover the opening 32 and be supported by the first reinforcing layer 40.

[0051] The manufacturing method of the first embodiment may include a step of manufacturing a pellicle support 30A and a step of manufacturing a pellicle membrane 10, prior to step P1.

[0052] (Method of manufacturing a pellicle support) The method for manufacturing the pellicle support 30A includes a step of forming a first reinforcing layer 40 on the support surface 34 of the support 30 (PS1).

[0053] The first reinforcing layer 40 may be formed using a material appropriately selected depending on the material of the pellicle membrane 10 and the area supporting the pellicle membrane 10. The method for forming the first reinforcing layer 40 may be appropriately selected depending on the material used.

[0054] When the first reinforcing layer 40 is a layer containing carbon nanotubes (CNT layer), the CNT layer can be formed by, for example, a chemical vapor deposition (CVD) method, a laser ablation method, or an arc discharge method. The CNT layer may be formed directly on the support surface 34 of the support 30 by a CVD method, or the CNT layer may be formed on a substrate and then the CNT layer on the substrate may be transferred onto the support surface 34, or the substrate on which the CNT layer is formed may be fixed to the support surface 34.

[0055] Since the first reinforcing layer 40 is formed in an area that does not interfere with development (an area that does not block the exposure light necessary for development), the carbon nanotube content in the first reinforcing layer 40 (for example, the mass of carbon nanotubes per unit area of ​​the film) can be made higher than that of the pellicle film 10. As a result, the strength of the first reinforcing layer 40 is improved, and the impact resistance of the pellicle film 10 is also improved.

[0056] When the first reinforcing layer 40 is a carbon nanotube forest, the carbon nanotube forest can be formed by directly growing a plurality of carbon nanotubes so as to be oriented in a direction perpendicular to the support surface 34 of the support 30. Alternatively, the carbon nanotube forest can be formed on a substrate, and the substrate can be fixed to the support surface 34.

[0057] When forming a CNT layer on a substrate, a known substrate may be used as appropriate, for example, at least one substrate selected from the group consisting of a plastic substrate, a glass substrate, a silicon substrate, and a metal substrate (a substrate containing metals such as iron and copper or alloys thereof (e.g., stainless steel)). A silicon dioxide film may be laminated on the surface of these substrates. The substrate on which the CNT layer is formed as the first reinforcing layer 40 may be fixed to the support surface 34 by an adhesive member (e.g., double-sided tape). The carbon nanotubes to be grown by chemical vapor deposition on the substrate are preferably at least one type selected from the group consisting of multi-walled carbon nanotubes, few-walled carbon nanotubes, and single-walled carbon nanotubes, and may be a mixture of multiple types of carbon nanotubes.

[0058] When the first reinforcing layer 40 is a layer containing graphene (graphene layer), the graphene layer as the first reinforcing layer 40 can also be formed by a CVD method. For example, a graphene layer may be formed directly on the support surface 34 of the support 30 by a CVD method, or a graphene layer may be formed on a base material of a metal foil (e.g., Ni foil or Cu foil, etc.) by a CVD method, and then the graphene layer on the base material may be transferred onto the support surface 34. The graphene layer as the first reinforcing layer 40 may have a single-layer structure consisting of one layer, but may have a multilayer structure consisting of two or more layers from the viewpoint of enhancing the effect of reinforcing the pellicle film. Since the first reinforcing layer 40 is formed within a range that does not interfere with development, even if the graphene layer has a multilayer structure, development is not hindered. When the graphene layer has a multilayer structure, the graphene layer may be formed in advance in multiple layers and transferred onto the support surface 34.

[0059] Alternatively, the material (reinforcing material) to be contained in the first reinforcing layer 40 can be dispersed in a solvent to prepare a reinforcing material dispersion, and this reinforcing material dispersion can be applied to the support surface 34 of the support body 30, and the solvent can be evaporated to form a film made of the reinforcing material as the first reinforcing layer 40.

[0060] (Method of manufacturing pellicle membrane) The method for producing the pellicle membrane 10 is not particularly limited and may be appropriately selected depending on the material used.

[0061] One example of a preferred method for producing a pellicle membrane containing carbon nanotubes includes, for example, a step (PE1) of dispersing carbon nanotubes, a step (PE2) of precipitating and depositing the dispersed carbon nanotubes on an air-permeable member to obtain a carbon nanotube film formed in a mat shape on the air-permeable member, and a step (PE3) of removing the air-permeable member from the carbon nanotube film to obtain a pellicle membrane.

[0062] First, in step PE1, carbon nanotubes are dispersed in a liquid to prepare a carbon nanotube dispersion in which the carbon nanotubes are dispersed. The liquid is preferably a liquid containing water. The carbon nanotube dispersion may contain only carbon nanotubes, or may contain various additives such as a dispersant that disperses the carbon nanotubes in addition to the carbon nanotubes.

[0063] Next, in step PE2, the dispersed carbon nanotubes are precipitated and deposited on the breathable member. For example, the carbon nanotube dispersion liquid prepared in step PE1 is filtered through a filtration membrane as a breathable member, whereby the carbon nanotubes are precipitated and deposited, forming a mat-shaped carbon nanotube film on the filtration membrane. For example, a membrane filter or the like is preferably used as the filtration membrane.

[0064] Next, in step PE3, the filtration membrane is removed from the mat-shaped carbon nanotube membrane to obtain a pellicle membrane containing carbon nanotubes. Before removing the filtration membrane from the mat-shaped fiber membrane, or after removing the filtration membrane from the mat-shaped fiber membrane, a drying step may be performed as necessary. The obtained pellicle membrane is a free-standing membrane.

[0065] Pellicle 100 is used, for example, as a dust cover when manufacturing semiconductor devices, IC packages, printed circuit boards, liquid crystal displays, organic EL displays, etc. Pellicle 100 is used, for example, by being disposed above a photomask and spaced apart from the photomask so that first pellicle film surface 11 faces the photomask. Use of pellicle 100 suppresses adhesion of foreign matter to the photomask.

[0066] (Effects of the first embodiment) According to the pellicle and pellicle support of the first embodiment, a first reinforcing layer 40 is disposed between the pellicle membrane 10 and the support 30, making the pellicle membrane 10 less susceptible to damage and improving the impact resistance of the pellicle 100.

[0067] In the pellicle and pellicle support according to the first embodiment, the first reinforcing layer 40 is not an adhesive layer or pressure-sensitive adhesive layer, but is formed of a material with excellent heat resistance, and is therefore unlikely to decompose even when exposed to high-energy light irradiation such as EUV. Therefore, with the pellicle and pellicle support according to the first embodiment, the generation of foreign matter can be suppressed compared to a pellicle in which the pellicle membrane is fixed to the support via an adhesive layer or pressure-sensitive adhesive layer.

[0068] In the pellicle and pellicle support of the first embodiment, when the first reinforcing layer 40 is a CNT layer in which carbon nanotubes are vertically oriented (e.g., a carbon nanotube forest), when reinforcing layers using the same mass of carbon nanotubes are compared, the CNT layer in which the carbon nanotubes are vertically oriented has improved impact resistance compared to a CNT layer in which the carbon nanotubes are horizontally oriented.

[0069] In the pellicle and pellicle support according to the first embodiment, the region in which the first reinforcing layer 40 is disposed is the region in which the pellicle membrane 10 and the support 30 overlap in a plan view of the pellicle 100, so the transparency of the first reinforcing layer 40 may be low. This broadens the range of materials that can be used for the first reinforcing layer 40, and allows the content of the reinforcing material in the first reinforcing layer 40 (e.g., the mass of the reinforcing material (e.g., carbon nanotubes) per unit area of ​​the membrane) to be increased more than in the pellicle membrane 10. As a result, the strength of the first reinforcing layer 40 is improved, and the impact resistance of the pellicle 100 is also improved.

[0070] The pellicle and pellicle support of the first embodiment have improved impact resistance, thereby reducing the number of times the pellicle needs to be replaced, and improving the productivity of manufacturing processes that utilize pellicles (e.g., manufacturing processes for semiconductor devices, etc.).

[0071] According to the manufacturing method of the first embodiment, a pellicle with improved impact resistance can be manufactured.

[0072] Second Embodiment (Pellicle) Next, the configuration of the pellicle according to the second embodiment will be described. In the description of the second embodiment, the same components as those in the first embodiment will be omitted or simplified by using the same reference numerals or names. In addition, in the second embodiment, for structures and materials that are not specifically mentioned, the same structures and materials as those described in the first embodiment can be used.

[0073] The pellicle according to the second embodiment differs from the pellicle according to the first embodiment in that it further comprises a second reinforcing layer disposed on the second pellicle film side, but is otherwise similar to the pellicle according to the first embodiment. That is, in the second embodiment, the pellicle membrane is reinforced with its peripheral portion sandwiched between the first reinforcing layer and the second reinforcing layer, and is supported by the support.

[0074] Hereinafter, an example of a pellicle according to the second embodiment will be described with reference to the drawings. The present invention is not limited to the pellicle shown in the drawings.

[0075] As an example of the second embodiment, a pellicle 110 is shown in Fig. 3 and Fig. 4. Fig. 3 shows a plan view of the pellicle 110 seen from the surface side on which the pellicle membrane 10 is installed, and Fig. 4 shows a cross-sectional view of the pellicle 110 shown in Fig. 3.

[0076] The pellicle 110 comprises a pellicle membrane 10, a support 30 that supports the pellicle membrane 10, and a first reinforcing layer 40 and a second reinforcing layer 50 that reinforce the pellicle membrane 10.

[0077] (Second reinforcing layer) The second reinforcing layer 50 is disposed on the second pellicle film surface 12 side. The second reinforcing layer 50 is disposed along the peripheral portion 13 of the pellicle film 10. The second reinforcing layer 50 is preferably disposed in a region where the pellicle membrane 10 and the support 30 overlap when the pellicle membrane 10 supported by the support 30 is viewed in plan. In the pellicle 110, the pellicle membrane 10 and the second reinforcing layer 50 are preferably in direct contact with each other.

[0078] The thickness of the second reinforcing layer 50 is preferably greater than the thickness of the pellicle film 10, and from the viewpoint of easily obtaining impact resistance, is preferably 0.05 μm or more, and more preferably 0.1 μm or more. Moreover, from the viewpoint of productivity and prevention of generation of foreign matter due to heating, the thickness of the second reinforcing layer 50 is preferably 1 μm or less, and more preferably 0.5 μm or less.

[0079] The second reinforcing layer 50 may also protrude toward the opening 32 of the support 30 in a plan view of the pellicle 110, within a range that does not interfere with development (a range that does not block exposure light necessary for development). The inner end of the second reinforcing layer 50 may be formed to be aligned with at least one of the inner end face of the frame 31 and the inner end of the first reinforcing layer 40, as shown in Fig. 4. The inner end of the second reinforcing layer 50 may also be formed to be located more inward than the inner end of the frame 31, within a range that does not interfere with reinforcement of the pellicle membrane 10.

[0080] The second reinforcing layer 50 preferably contains one or more materials (reinforcing materials) selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride. By containing these materials in the second reinforcing layer 50, the pellicle 110 functions stably against heat during exposure, has excellent durability, and is less likely to generate particles from the second reinforcing layer 50. The content of these materials (reinforcing materials) in the second reinforcing layer 50 is preferably 60% by mass or more, 70% by mass or more, 80% by mass or more, 90% by mass or more, 95% by mass or more, or 98% by mass or more. The second reinforcing layer 50 more preferably contains one or more materials selected from the group consisting of carbon nanotubes, graphene, silicon carbide, silicon nitride, and boron nitride. It is more preferable that the second reinforcing layer 50 is formed of carbon nanotubes or graphene. Nanocarbon materials such as carbon nanotubes and graphene have excellent heat resistance, and therefore the second reinforcing layer 50 containing the nanocarbon material has improved heat resistance. The content of the nanocarbon material in the second reinforcing layer 50 is preferably 60 mass% or more, 70 mass% or more, 80 mass% or more, 90 mass% or more, 95 mass% or more, or 98 mass% or more. In the pellicle 110, the material of the first reinforcing layer 40 and the material of the second reinforcing layer 50 may be the same or different.

[0081] The second reinforcing layer 50 more preferably contains carbon nanotubes, and even more preferably consists essentially of carbon nanotubes. Here, "consist essentially of carbon nanotubes" means that 98% by mass or more of the second reinforcing layer 50 is carbon nanotubes, excluding the metal catalyst used in producing the carbon nanotubes. In other words, the second reinforcing layer 50 "consist essentially of carbon nanotubes" means that the percentage of the mass of carbon nanotubes to the total mass of the second reinforcing layer 50 after subtracting the mass of the metal catalyst used in producing the carbon nanotubes and contained in the second reinforcing layer 50 is 98% by mass or more. When the second reinforcing layer 50 consists essentially of carbon nanotubes, unavoidable impurities that are not intentionally added to the second reinforcing layer 50 and are mixed in the raw materials or manufacturing process may or may not be contained in the second reinforcing layer 50.

[0082] When the second reinforcing layer 50 contains carbon nanotubes, the carbon nanotubes in the second reinforcing layer 50 are preferably oriented in a direction parallel to the support surface 34 of the frame 31. That is, the long axis direction of each carbon nanotube is preferably a direction along the support surface 34 of the frame 31. By aligning the carbon nanotubes in the second reinforcing layer 50 in this manner, entanglement with the pellicle film in which the carbon nanotubes are also oriented in a parallel direction occurs, and an improvement in the reinforcing effect can be expected. The carbon nanotubes in the second reinforcing layer 50 may be oriented in a direction perpendicular to the support surface 34 of the frame 31.

[0083] (Pellicle membrane) The pellicle membrane 10 in the second embodiment is similar to that in the first embodiment. In the pellicle 110, the material of the pellicle membrane 10 and the material of the second reinforcing layer 50 may be the same or different. For example, it is also preferable that the material of the pellicle membrane 10 and the material of the second reinforcing layer 50 are both the same carbon nanotubes. By forming the pellicle membrane 10 and the second reinforcing layer 50 from the same material, the adhesion between the pellicle membrane 10 and the second reinforcing layer 50 can be improved. Furthermore, the material of the pellicle membrane 10, the material of the first reinforcing layer 40, and the material of the second reinforcing layer 50 may be the same or different. When the material of the pellicle membrane 10, the material of the first reinforcing layer 40, and the material of the second reinforcing layer 50 are the same, the adhesion between them is improved. It is preferable that the material of the pellicle membrane 10, the material of the first reinforcing layer 40, and the material of the second reinforcing layer 50 are carbon nanotubes.

[0084] (Method of manufacturing a pellicle) Next, a method for manufacturing a pellicle according to a second embodiment (hereinafter, may be referred to as the manufacturing method according to the second embodiment) will be described. The manufacturing method of the second embodiment also includes a step of manufacturing a pellicle using the pellicle support 30A described in the first embodiment. More specifically, the manufacturing method of the second embodiment may be an aspect including the following steps (P1) and (P2), or an aspect including the following steps (P1) and (P3).

[0085] Step (P1) is a step of attaching a pellicle membrane 10 to the support surface 34 side of the frame 31 of the pellicle support 30A so as to cover the opening 32 and be supported by the first reinforcing layer 40. Step (P1) is the same as in the first embodiment.

[0086] Step (P2) is a step of arranging a second reinforcing layer 50 in a region of the second pellicle film surface 12 opposite the first pellicle film surface 11 facing the pellicle support 30A of the pellicle film 10, where the pellicle film 10 and the pellicle support 30A overlap when the pellicle film 10 is viewed in a plan view. That is, in step (P2), the pellicle 100 of the first embodiment is first manufactured, and the second reinforcing layer 50 is arranged on the second pellicle film surface 12 of the pellicle film 10.

[0087] Step (P3) is a step of placing a second reinforcing layer 50 on the second pellicle film surface 12 opposite the first pellicle film surface 11 of the pellicle film 10 facing the pellicle support 30A prior to the step of attaching the pellicle film 10 to the pellicle support 30A. In this step (P3) (step of placing the second reinforcing layer), the second reinforcing layer 50 is placed in the area or position where the pellicle membrane 10, the pellicle support 30A, and the first reinforcing layer 40 overlap when the pellicle membrane 10 is viewed in a plane after the pellicle membrane 10 is attached to the support 30. That is, in step (P3), the second reinforcing layer 50 is first placed on the pellicle membrane 10, and the pellicle membrane 10 with the second reinforcing layer 50 is attached to the support 30 with the first reinforcing layer 40 (pellicle support 30A).

[0088] As a method for disposing the second reinforcing layer 50 on the pellicle membrane 10, a method in which the second reinforcing layer 50 is formed at a predetermined position on the pellicle membrane 10 can be mentioned.

[0089] The second reinforcing layer 50 may be formed using a material appropriately selected depending on the material of the pellicle membrane 10 and the area to be placed on the pellicle membrane 10. The method for forming the second reinforcing layer 50 may be appropriately selected depending on the material used.

[0090] For example, the material (reinforcing material) to be contained in the second reinforcing layer 50 can be dispersed in a solvent to prepare a reinforcing material dispersion, and this reinforcing material dispersion can be applied to the pellicle membrane 10, and the solvent can be evaporated to form a membrane made of the reinforcing material as the second reinforcing layer 50.

[0091] In the manufacturing method of the second embodiment, when forming the second reinforcing layer 50 containing carbon nanotubes, it is preferable to form the second reinforcing layer 50 so that the carbon nanotubes in the second reinforcing layer 50 are oriented in a direction parallel to the support surface 34 of the frame portion 31.

[0092] Since the second reinforcing layer 50 is formed in an area that does not interfere with development (an area that does not block the exposure light necessary for development), the carbon nanotube content in the second reinforcing layer 50 (for example, the mass of carbon nanotubes per unit area of ​​the film) can be made higher than that of the pellicle film 10. As a result, the strength of the second reinforcing layer 50 is improved, and the impact resistance of the pellicle film 10 is also improved.

[0093] The manufacturing method of the second embodiment may also include, before step P1, a step of manufacturing a pellicle support body and a step of manufacturing a pellicle membrane, which are described in the first embodiment.

[0094] The pellicle 110 is used as a dust cover, similar to the pellicle 100 of the first embodiment.

[0095] (Effects of the second embodiment) The pellicle according to the second embodiment provides the same effects as the pellicle according to the first embodiment. Furthermore, since the pellicle according to the second embodiment has a second reinforcing layer 50 on the second pellicle film surface 12 side, the pellicle film 10 is further reinforced, and the impact resistance of the pellicle 110 is further improved.

[0096] In the pellicle according to the second embodiment, the region where the second reinforcing layer 50 is disposed is also a region where the pellicle film 10 and the support 30 overlap in a plan view of the pellicle 110, so the transparency of the second reinforcing layer 50 may also be low. Therefore, the options of materials that can be used for the second reinforcing layer 50 are expanded, and the content of the reinforcing material in the second reinforcing layer 50 (for example, the mass of the reinforcing material per unit area of ​​the film) can be increased more than that of the pellicle film 10. As a result, the strength of the second reinforcing layer 50 is improved, and the impact resistance of the pellicle 110 is also improved. Since the region where the second reinforcing layer 50 is disposed is the peripheral portion 13 of the pellicle film 10, the peripheral portion 13 of the pellicle film 10 can be protected more effectively.

[0097] In the pellicle according to the second embodiment, the second reinforcing layer 50 is not an adhesive layer or a pressure sensitive adhesive layer, but is formed of a material with excellent heat resistance, and is therefore unlikely to decompose even when irradiated with high energy light such as EUV. Therefore, even if the second reinforcing layer 50 is provided as in the pellicle according to the second embodiment, the generation of foreign matter can be suppressed.

[0098] According to the manufacturing method of the second embodiment, a pellicle with further improved impact resistance can be manufactured.

[0099] [Modifications of the embodiment] The present invention is not limited to the above-described embodiment, and modifications and improvements within the scope of the present invention that can achieve the object of the present invention are included in the present invention. Although an example of a pellicle according to the first and second embodiments has been described with reference to FIGS. 1 to 4, the pellicle according to the present invention is not limited to this example of a pellicle.

[0100] The pellicle according to the present invention may adopt various forms as long as it can obtain the effects of the pellicle using the pellicle membrane according to the first and second embodiments described above. The shape and dimensions of each part of each member constituting the pellicle according to the first and second embodiments may be determined, for example, according to the dimensions of a photomask (not shown) when the pellicle according to the first and second embodiments is used.

[0101] 1 to 4, the pellicle membrane 10 and the support 30 of the pellicles 100 and 110 are both formed in a rectangular shape. The pellicle according to the present invention is not limited to this, and may be formed in any desired shape, such as a circle, an ellipse, or a polygon.

[0102] In addition, in the pellicle 110 shown in FIG. 3 and FIG. 4, the second reinforcing layer 50 is disposed on the peripheral portion 13 of the pellicle film 10, but the pellicle according to the present invention is not limited to such an example. For example, the second reinforcing layer 50 may not only be disposed on the peripheral portion 13 of the pellicle film 10, but may also extend to the area of ​​the support surface 34 where the pellicle film 10 is not attached. The second reinforcing layer 50 may extend to the support surface 34 side and cover the side of the pellicle film 10. By covering the side of the pellicle film 10 with the second reinforcing layer 50, it is possible to suppress the pellicle film 10 from peeling off from the support 30. The second reinforcing layer 50 may extend from the peripheral portion 13 of the pellicle film 10 and contact a part or the entire surface of the exposed part of the support surface 34 where the first reinforcing layer 40 is not disposed.

[0103] Also, for example, in the pellicle 100, 110 shown in Figures 1 to 4, the peripheral portion 13 of the pellicle film 10 is fixed by the first reinforcing layer 40 arranged on a part of the support surface 34 of the support 30. The pellicle according to the present invention is not limited to such an example, and the peripheral portion 13 of the pellicle film 10 may be fixed by the first reinforcing layer 40 arranged on the entire support surface 34 of the support. For example, the first reinforcing layer 40 may extend not only to the area supporting the pellicle film 10 but also to the area of ​​the support surface 34 where the pellicle film 10 is not attached. The first reinforcing layer 40 thus extending may be in contact with the second reinforcing layer 50 extending as described above. By arranging the first reinforcing layer 40 and the second reinforcing layer 50 so as to be in contact with each other in this way, the peripheral portion 13 of the pellicle film 10 is sandwiched between the first reinforcing layer 40 and the second reinforcing layer 50, and the effect of reinforcing the pellicle film 10 is further improved. EXAMPLES

[0104] The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples in any way.

[0105] [Example 1] The fabrication of the pellicle according to Example 1 will be described with reference to Fig. 5A and Fig. 5B. Fig. 5A is a schematic plan view of the pellicle WK as viewed from the pellicle film 10W side. Fig. 5B is a schematic side view of the pellicle WK as viewed from the side along the short side direction. An acrylic plate (2 cm×5 cm×2 mm) having an opening 32W measuring 1 cm×1 cm was prepared as the support 30W. The opening 32W was located near the center of the first end E1 side of the support 30W. Furthermore, vertically aligned MWCNTs were prepared as the first reinforcing layer 40 W. These MWCNTs were formed on a substrate BP made of SUS with a height of 0.25 mm. Next, the substrate BP was fixed on the support surface of the support 30W to the peripheral portion of the opening 32W (here, a region 5 mm wide from the edge of the opening 32W) with double-sided tape as the adhesive member 20W. In this manner, the support 30W (pellicle support) having the first reinforcing layer 40W was produced. Next, SWCNTs were dispersed in water to prepare a SWCNT dispersion. The SWCNT dispersion was filtered using a membrane filter to form a membrane consisting only of SWCNTs on the membrane filter as pellicle membrane 10W. The entire membrane filter was submerged in water, and pellicle membrane 10W consisting only of SWCNTs was isolated on the water surface. A support 30W having a first reinforcing layer 40W was submerged in the water in which the pellicle film 10W was isolated, and the support 30W was pulled out of the water, and the pellicle film 10W was picked up as a free-standing film so as to cover the opening 32W and be supported on the first reinforcing layer 40W. In this way, a pellicle WK was produced. In the pellicle WK, the pellicle film 10W (CNT free-standing film) was integrated with the support 30W and reinforced by the first reinforcing layer 40W.

[0106] [Reference example 1] The pellicle of Reference Example 1 was prepared in the same manner as in Example 1, except that in the preparation of the pellicle of Example 1, a dispersion of MWCNTs was previously dripped and dried on the outer periphery of the opening 32W to provide horizontally oriented MWCNTs as the first reinforcing layer 40W.

[0107] [Comparative Example 1] The pellicle of Comparative Example 1 was prepared in the same manner as in Example 1, except that in preparing the pellicle of Example 1, a first reinforcing layer 40W was not provided on the support 30W, and the pellicle membrane 10W was picked up as a free-standing membrane to cover the opening 32W.

[0108] [Comparative Example 2] The pellicle of Comparative Example 2 was prepared in the same manner as in Example 1, except that in the preparation of the pellicle of Example 1, a SUS substrate BP without a first reinforcing layer 40W was attached to a support 30W with an adhesive member 20W (double-sided tape), and the pellicle film 10W was picked up as a free-standing film so as to be supported on the substrate BP.

[0109] [Impact resistance evaluation] The evaluation method was carried out in the following procedure. FIG. 6 shows a schematic diagram of a method for evaluating the strength of a pellicle film using a pellicle WK, and shows a state in which the pellicle WK is viewed from the side along the short side direction. As shown in FIG. 6, first, the pellicle WK was placed on a horizontal stand T. A stopper S was placed so as to contact the second end E2 side of the pellicle WK. Next, in a state in which the second end E2 side of the pellicle WK was prevented from slipping, the first end E1 side was lifted, and a plate-like member B having a thickness of 1 mm was sandwiched between the stand T and the pellicle WK. Next, the plate-like member B was removed in the horizontal direction H, and the pellicle WK was dropped. After dropping the pellicle WK, the presence or absence of damage to the pellicle film 10W was visually confirmed. If there was no damage, the plate-like members B having a thickness of 1 mm were stacked, two plate-like members B were sandwiched, the two plate-like members B were removed in the horizontal direction H, and the pellicle WK was dropped. This operation was repeated until the pellicle film 10W was damaged, and the maximum height at which the pellicle film 10W was dropped without damage was evaluated as the impact resistance of the pellicle film 10W. The maximum height corresponds to the maximum number of plate-like members B when 1 mm thick plate-like members B are stacked. The impact resistance evaluation of the pellicle film 10W was performed three times according to the above procedure, and the average value of the three tests was used. The results of the impact resistance evaluation of the pellicles according to Example 1, Reference Example 1, Comparative Example 1, and Comparative Example 2 are shown in Table 1.

[0110] [Table 1]

[0111] As shown in Table 1, by disposing the first reinforcing layer between the pellicle film and the support, the pellicle film of Example 1 was less likely to break than the pellicle films of Comparative Examples 1 and 2 that did not have a first reinforcing layer, and the impact resistance of the pellicle was improved. In the pellicle of Example 1, the MWCNTs in the first reinforcing layer were oriented vertically, and therefore it exhibited even better impact resistance than the pellicle of Reference Example 1 that had a first reinforcing layer in which the MWCNTs were oriented horizontally. In addition, the first reinforcing layer is formed of carbon nanotubes and has excellent heat resistance, so it is not easily decomposed even when irradiated with high-energy light such as EUV. [Explanation of symbols]

[0112] 10...pellicle membrane, 10W...pellicle membrane, 11...first pellicle membrane surface, 12...second pellicle membrane surface, 13...periphery, 20W...adhesive member, 30...support, 30A...pellicle support, 30W...support, 31...frame, 32...opening, 32W...opening, 34...support surface, 40...first reinforcing layer, 40W...first reinforcing layer, 50...second reinforcing layer, 100...pellicle, 110...pellicle, B...plate-shaped member, BP...substrate, E1...first end, E2...second end, S...stopper, T...base, WK...pellicle.

Claims

1. A pellicle membrane; A support having a frame and an opening surrounded by the frame, and supporting the pellicle membrane; A first reinforcing layer that reinforces the pellicle membrane, The frame portion has a support surface facing the pellicle membrane, The pellicle membrane has a first pellicle membrane surface facing the support and a second pellicle membrane surface opposite the first pellicle membrane surface, The first reinforcing layer is a region where the pellicle membrane and the support overlap when the pellicle membrane supported by the support is viewed in a plan view, and is disposed between the pellicle membrane and the support on the first pellicle membrane surface side, The first reinforcing layer contains carbon nanotubes, A pellicle, wherein the carbon nanotubes in the first reinforcing layer are oriented perpendicular to the support surface of the frame.

2. 2. The pellicle according to claim 1, A pellicle, wherein the pellicle membrane is an inorganic thin film or an organic thin film.

3. 2. The pellicle according to claim 1, The pellicle film contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride.

4. 2. The pellicle according to claim 1, The pellicle film contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, and amorphous carbon.

5. 2. The pellicle according to claim 1, A pellicle, wherein the pellicle membrane contains carbon nanotubes.

6. The pellicle according to any one of claims 1 to 5, A pellicle, wherein the material of the pellicle membrane and the material of the first reinforcing layer are the same.

7. The pellicle according to any one of claims 1 to 5, The pellicle further comprises a second reinforcing layer disposed on the second pellicle film surface side.

8. 8. The pellicle according to claim 7, The second reinforcing layer contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride.

9. 9. The pellicle according to claim 8, the second reinforcing layer includes carbon nanotubes, A pellicle, wherein the carbon nanotubes in the second reinforcing layer are oriented in a direction parallel to the support surface of the frame.

10. A pellicle support for supporting a pellicle membrane, comprising: A frame portion and an opening portion surrounded by the frame portion, The frame portion has a support surface that faces the pellicle membrane when supporting the pellicle membrane, A first reinforcing layer is disposed on the outer circumferential side of the opening and on the support surface of the frame portion, The first reinforcing layer contains carbon nanotubes, A pellicle support, wherein the carbon nanotubes in the first reinforcing layer are oriented perpendicular to the support surface of the frame.

11. A method for manufacturing a pellicle using the pellicle support according to claim 10, comprising the steps of: A method for manufacturing a pellicle, comprising a step of attaching the pellicle membrane to the support surface side of the frame portion so as to cover the opening and be supported by the first reinforcing layer.

12. The method for manufacturing a pellicle according to claim 11, Prior to the step of attaching the pellicle membrane to the pellicle support, a step of disposing a second reinforcing layer on a second pellicle membrane surface of the pellicle membrane opposite a first pellicle membrane surface facing the pellicle support, A method for manufacturing a pellicle, wherein the step of positioning the second reinforcing layer is a step of positioning the second reinforcing layer at a position where the pellicle membrane, the pellicle support, and the first reinforcing layer overlap when the pellicle membrane is viewed in a plane after being attached to the pellicle support.

13. The method for manufacturing a pellicle according to claim 11, The method for manufacturing a pellicle further includes a step of placing a second reinforcing layer in a region of a second pellicle membrane surface opposite to a first pellicle membrane surface facing the pellicle support, where the pellicle membrane overlaps with the pellicle support when viewed in a plane.

14. A method for manufacturing a pellicle according to claim 12 or 13, comprising the steps of: The second reinforcing layer is made of carbon nanotubes, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and nitride. A method for producing a pellicle, comprising: forming a pellicle on a substrate;

15. A method for manufacturing a pellicle according to claim 14, comprising the steps of: the second reinforcing layer includes carbon nanotubes, A method for manufacturing a pellicle, comprising forming the second reinforcing layer so that the carbon nanotubes in the second reinforcing layer are oriented in a direction parallel to the membrane surface of the pellicle membrane.

16. The method for manufacturing a pellicle according to any one of claims 11 to 13, The method for manufacturing a pellicle, wherein the pellicle film contains one or more materials selected from the group consisting of carbon nanotubes, graphene, graphite, diamond-like carbon, and amorphous carbon.

17. The method for manufacturing a pellicle according to any one of claims 11 to 13, A method for manufacturing a pellicle, wherein the material of the pellicle membrane and the material of the first reinforcing layer are the same.

Images