Analysis device
The analytical device's tilting mechanism and safety features enable versatile observation and safe operation by allowing observation from multiple angles and preventing laser exposure, addressing the challenge of analyzing objects with complex shapes.
Patent Information
- Application Number
- JP2021162199
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2020-10-14
- Filing Date
- 2021-09-30
- Publication Date
- 2025-08-04
- Estimated Expiration
- 2041-09-30
AI Technical Summary
Existing analytical devices face difficulties in component analysis of objects with various shapes, particularly those standing vertically, as they lack the ability to observe from multiple angles, compromising usability.
The device incorporates a tilting mechanism that allows the observation optical system to be tilted relative to a reference axis perpendicular to the placement surface, enabling observation from various angles, including oblique directions, and includes safety features to prevent laser emission when the system is excessively tilted.
This configuration enhances the user's ability to easily grasp the observation position, allows for component analysis of objects with complex shapes, and improves safety by preventing laser exposure to the user.
Smart Images

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Abstract
Description
Technical Field
[0001] The technology disclosed herein relates to an analytical device.
Background Art
[0002] For example, Patent Document 1 discloses an analytical device using Laser Induced Breakdown Spectroscopy (LIBS). Specifically, the analytical device (measurement device) disclosed in this Patent Document 1 irradiates a laser beam onto an object to be analyzed (sample), and receives and analyzes the light (plasma light) generated by the object to be analyzed with a spectroscope, thereby performing component analysis of the object to be analyzed.
[0003] In addition, Patent Document 2 discloses another example of an analytical device using the LIBS method. Specifically, the analytical device (component measurement device) disclosed in this Patent Document 2 is configured such that an observation optical system is arranged on the optical path from the object to be analyzed (sample) to the spectroscope, and light is guided to the spectroscope through this observation optical system.
Prior Art Documents
Patent Documents
[0004]
Patent Document 1
Patent Document 2
Summary of the Invention
Problems to be Solved by the Invention
[0005] By the way, with the analytical devices as described in Patent Documents 1 and 2 above, there may be cases where component analysis is performed on objects to be analyzed having various shapes, such as a structure standing vertically. In that case, it is difficult for the user to grasp the observation position unless the object to be analyzed can be observed from various angles such as an oblique direction, which is inconvenient for improving the usability of the device.
[0006] The technology disclosed herein has been made in view of such points, and the intended purpose is to enable the user to easily grasp the observation position of the object to be analyzed.
Means for Solving the Problems
[0007] The first aspect of the present disclosure relates to an analyzer for performing component analysis of an object to be analyzed. This analyzer includes a stage having a placement surface for placing the object to be analyzed, a laser oscillator that emits laser light, a first optical axis extending along a predetermined direction, which condenses the laser light emitted from the laser oscillator and irradiates the object to be analyzed placed on the stage, and a first objective lens that condenses the light generated in the object to be analyzed by irradiating the laser light. And a spectroscope that generates a spectral spectrum that is the intensity distribution for each wavelength of the light generated in the object to be analyzed and condensed by the first objective lens, an analysis optical system including, having a second optical axis parallel to the first optical axis, a second objective lens that condenses the light from the object to be analyzed, and a camera that images the object to be analyzed by detecting the amount of light received from the object to be analyzed received through the second objective lens, an observation optical system including, and a tilting mechanism that tilts at least the observation optical system among the analysis optical system and the observation optical system with respect to a predetermined reference axis perpendicular to the placement surface.
[0008] According to the first aspect, the tilting mechanism tilts at least the observation optical system among the analysis optical system and the observation optical system with respect to a predetermined reference axis perpendicular to the placement surface. By mounting an observation optical system that can be tilted on the analyzer, it becomes possible to observe the object to be analyzed from various angles such as an oblique direction. As a result, it becomes possible to enable the user to easily grasp the observation position of the object to be analyzed.
[0009] Further, according to the second aspect of the present disclosure, the tilting mechanism may integrally tilt the analysis optical system and the observation optical system while maintaining the relative position of the second optical axis with respect to the first optical axis.
[0010] According to the second aspect, it becomes possible to irradiate the object to be analyzed with laser light from various directions such as an oblique direction. As a result, it becomes possible to perform component analysis on objects to be analyzed having various shapes, such as a structure rising in the vertical direction.
[0011] Further, according to a third aspect of the present disclosure, the analysis apparatus includes emission limiting means operable to limit the emission of laser light from the laser oscillator, and inclination detection means for detecting the inclination of the observation optical system with respect to the reference axis. When the inclination detected by the inclination detection means exceeds a predetermined first threshold value, the analysis apparatus may further include a control unit that limits the emission of the laser light via the emission limiting means.
[0012] Here, the term "limiting the emission of laser light" includes at least one of a process of reducing the output of the laser light, a process of prohibiting the emission of the laser light, and a warning notification to the user.
[0013] Generally, if laser light is emitted in a state where the analysis optical system is excessively tilted, it may hit the retina of the human body or the like. Therefore, by limiting the emission of laser light according to the inclination as in the third aspect, it becomes possible to improve the safety of the analysis apparatus.
[0014] Further, according to a fourth aspect of the present disclosure, the analysis apparatus may include notification means for notifying the user of a notification related to the emission of the laser light based on the detection result by the inclination detection means.
[0015] According to the fourth aspect, by the notification means performing the notification, it becomes possible to notify the user of various information such as the inclination of the analysis optical system. This is effective in improving the safety of the analysis apparatus.
[0016] Further, according to a fifth aspect of the present disclosure, the notification means may switch the content of the notification to the user according to the inclination detected by the inclination detection means.
[0017] According to the fifth aspect, by switching the notification content according to the inclination, it becomes possible to notify the user of information corresponding to the posture of the analysis optical system. This is effective in enhancing the safety of the analysis apparatus.
[0018] Further, according to a sixth aspect of the present disclosure, the notification by the notification means may include at least a notification indicating that the emission of the laser light is not recommended.
[0019] According to the sixth aspect, for example, as compared with a configuration in which only the inclination of the analysis optical system is notified, it is possible to more surely call the user's attention. This is advantageous in enhancing the safety of the analysis apparatus.
[0020] Further, according to a seventh aspect of the present disclosure, the analysis apparatus includes an analysis housing that houses the analysis optical system, and the emission restriction means may be constituted by a shielding member that is disposed in the analysis housing and can be inserted into the optical path of the laser light.
[0021] According to the seventh aspect, it is possible to more surely suppress the emission of the laser light, which is advantageous in enhancing the safety of the analysis apparatus.
[0022] Further, according to an eighth aspect of the present disclosure, the analysis apparatus further includes an analysis housing that houses the analysis optical system, and a shielding cover that can be attached to the first objective lens or the analysis housing, and the control unit determines whether or not the shielding cover is attached to the first objective lens or the analysis housing. When it is determined that the shielding cover is attached to the first objective lens or the analysis housing, the emission of the laser light is permitted regardless of the inclination of the analysis optical system with respect to the reference axis. On the other hand, when it is determined that the shielding cover is not attached to the first objective lens or the analysis housing, the emission of the laser light is restricted according to the inclination of the analysis optical system with respect to the reference axis.
[0023] According to the eighth aspect described above, in a state where safety is ensured (a state in which a shielding cover is attached to the first objective lens or the like), control according to the inclination is not executed (regardless of the magnitude of the inclination, emission of the laser beam is permitted), and emission of the laser beam is restricted according to the magnitude of the inclination only in a state where there is a possibility that safety is not ensured (a state in which it is not attached to the second objective lens or the like). Thereby, control according to the situation in which emission should be restricted can be performed.
[0024] Further, according to a ninth aspect of the present disclosure, the analytical optical system may restrict emission of the laser beam regardless of the inclination of the analytical optical system with respect to the reference axis in a state where the analytical optical system and the observation optical system are integrally inclined.
[0025] According to the ninth aspect described above, in a state where the analytical optical system is inclined, by restricting emission of the laser beam regardless of the magnitude of the inclination, a configuration that is safer can be realized.
[0026] Further, according to a tenth aspect of the present disclosure, the analyzer may include a horizontal drive mechanism that moves the relative positions of the observation optical system and the analytical optical system with respect to the mounting table along the horizontal direction so that imaging of the analysis object by the observation optical system and generation of the spectral spectrum by the analytical optical system are performed on the same location of the analysis object.
[0027] Here, the term "moved along the horizontal direction" includes linear movement in the front-rear direction, left-right direction, etc. In addition, curvilinear movement such as rotation along a horizontal plane is also included.
[0028] According to the tenth aspect, the analysis device can perform imaging of an object to be observed by the observation optical system and generation of a spectral spectrum by the analysis optical system at the same location on the object to be observed by moving the relative positions of the observation optical system and the analysis optical system with respect to the mounting table. Thereby, the deviation between the observation position by the observation optical system and the analysis position by the analysis optical system can be eliminated, and thus the usability of the device can be improved.
[0029] Furthermore, according to the tenth aspect, since the observation optical system and the analysis optical system are configured as independent optical systems, each optical system can be made to have specifications optimal for their respective applications. Thereby, it becomes possible to enhance the performance of each optical system as much as possible.
[0030] Also, according to the eleventh aspect of the present disclosure, the horizontal drive mechanism may move the relative positions of the observation optical system and the analysis optical system with respect to the mounting table while maintaining at least the posture in which the observation optical system is tilted by the tilting mechanism.
[0031] According to the eleventh aspect, imaging of an object to be observed by the observation optical system and generation of a spectral spectrum by the analysis optical system can be performed at the same location on the object to be analyzed from the same direction (same angle). Thereby, the deviation between the observation position by the observation optical system and the analysis position by the analysis optical system is further eliminated, which is advantageous for improving the usability of the device.
[0032] Also, according to the twelfth aspect of the present disclosure, the moving directions of the observation optical system and the analysis optical system by the horizontal drive mechanism may extend parallel to the central axis of the swing by the tilting mechanism.
[0033] According to the twelfth aspect, it is advantageous for performing imaging of an object to be observed by the observation optical system and generation of a spectral spectrum by the analysis optical system at the same location on the object to be analyzed from the same direction (same angle).
[0034] Further, according to the 13th aspect of the present disclosure, the analysis device may include a stand configured to be attachable to the mounting table, the observation optical system, and the analysis optical system.
[0035] According to the 13th aspect, it can be configured as an all-in-one type of analysis device, and it becomes possible to realize from observation to analysis only by attaching each optical system to the stand. This is effective in improving the usability of the device.
Advantages of the Invention
[0036] As described above, according to the present disclosure, the user can easily grasp the observation position of the object to be analyzed.
Brief Description of the Drawings
[0037]
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DETAILED DESCRIPTION OF THE INVENTION
[0038] Hereinafter, embodiments of the present disclosure will be described with reference to the drawings. Note that the following description is illustrative.
[0039] <Overall Configuration of Analysis Observation Device A> FIG. 1 is a schematic diagram illustrating the overall configuration of an analysis observation device A as an analysis device according to an embodiment of the present disclosure. The analysis observation device A illustrated in FIG. 1 can perform an enlarged observation of a sample SP as an object to be observed and an object to be analyzed, and can also perform a component analysis of the sample SP.
[0040] Specifically, the analysis observation device A according to the present embodiment can search for a site where component analysis is to be performed in the sample SP, or perform inspection, measurement, etc. of the appearance thereof, by magnifying and imaging a sample SP composed of, for example, a sample such as a minute object, an electronic component, a workpiece, etc. When focusing on the observation function of the analysis observation device A, it can be referred to as an enlarged observation device, simply as a microscope, or as a digital microscope.
[0041] The analysis observation device A can also perform a technique called Laser Induced Breakdown Spectroscopy (LIBS), Laser Induced Plasma Spectroscopy (LIPS), etc. when performing a component analysis of the sample SP. When focusing on the analysis function of the analysis observation device A, it can also be referred to as a component analysis device, simply as an analysis device, or as a spectroscopic device.
[0042] As shown in FIG. 1, the analysis observation device A according to the present embodiment includes, as main components, an optical system unit group 1, a controller main body 2, and an operation unit 3.
[0043] Among these, the optical system unit group 1 can perform imaging and analysis of the sample SP, and can output an electrical signal corresponding to the imaging result and the analysis result to the outside.
[0044] The controller main body 2 has a control unit 21 for controlling various components that make up the optical system unit group 1, such as the first camera 81. The controller main body 2 can cause the optical system unit group 1 to observe and analyze the sample SP via the control unit 21. The controller main body 2 also has a display unit 22 capable of displaying various information. Images captured by the optical system unit group 1, data indicating the analysis results of the sample SP, etc. can be displayed on this display unit 22.
[0045] The operation unit 3 has a mouse 31, a console 32, and a keyboard 33 (the keyboard 33 is only shown in FIG. 13) for receiving operation inputs from the user. The console 32 can instruct the controller main body 2 to capture image data, adjust brightness, focus the first camera 81, etc. by operating buttons, adjustment knobs, etc.
[0046] Note that the operation unit 3 does not necessarily have to have all three of the mouse 31, the console 32, and the keyboard 33, and may have any one or two of them. Also, in addition to or instead of the mouse 31, the console 32, and the keyboard 33, a touch panel type input device, a voice type input device, etc. may be used. In the case of a touch panel type input device, it can be configured to detect any position on the screen displayed on the display unit 22.
[0047] <Details of the optical system unit group 1> FIGS. 2 to 4 are a perspective view, a side view, and a front view respectively illustrating the optical system unit group 1. Also, FIG. 5 is an exploded perspective view of the optical system unit group 1, and FIG. 6 is a side view schematically showing the configuration of the optical system unit group 1.
[0048] As shown in FIGS. 1 to 6, the optical system unit group 1 includes a stand 4 for supporting various devices, a stage 5 and a head unit 6 attached to the stand 4. Here, the head unit 6 is formed by attaching an observation unit 63 in which an observation optical system 9 is housed to an analysis unit 62 in which an analysis optical system 7 is housed. Here, the analysis optical system 7 is an optical system for performing component analysis of the sample SP. The observation optical system 9 is an optical system for performing magnified observation of the sample SP. The head unit 6 is configured as a device group having both the analysis function and the magnified observation function of the sample SP.
[0049] In the following description, as shown in FIGS. 1 to 4, the front-back direction and the left-right direction of the optical system unit group 1 are defined. That is, the side facing the user is the front side of the optical system unit group 1, the opposite side is the rear side of the optical system unit group 1, and when the user and the optical system unit group 1 face each other, the right side as seen from the user is the right side of the optical system unit group 1, and the left side as seen from the user is the left side of the optical system unit group 1. The definitions of the front-back direction and the left-right direction are for helping the understanding of the description and do not limit the actual usage state. Any direction can be used as the front.
[0050] Also, in the following description, the left-right direction of the optical system unit group 1 is defined as the "X direction", the front-back direction of the optical system unit group 1 is defined as the "Y direction", the up-down direction of the optical system unit group 1 is defined as the "Z direction", and the direction of rotation about an axis parallel to this Z axis is defined as the "φ direction". The X direction and the Y direction are orthogonal to each other on the same horizontal plane, and the direction along that horizontal plane is defined as the "horizontal direction". The Z axis is the direction of the normal line orthogonal to that horizontal plane. These definitions can also be changed as appropriate.
[0051] Although details are omitted, the head unit 6 can move along the central axis Ac shown in FIGS. 2 to 6 and can swing around this central axis Ac. This central axis Ac is configured to extend along the aforementioned horizontal direction, particularly the front-back direction, as shown in FIG. X6 and the like.
[0052] (Stand 4) The stand 4 has a base portion 41 placed on a workbench or the like, and a support column portion 42 extending upward from the rear portion of the base portion 41. This stand 4 is a member for defining the positional relationship between the stage 5 and the head portion 6, and is configured to be attachable to at least the mounting table 51 of the stage 5, the observation optical system 9 of the head portion 6, and the analysis optical system 7.
[0053] The base portion 41 constitutes substantially the lower half of the stand 4, and as shown in FIG. 2, is formed in a pedestal shape having a longer dimension in the front-rear direction than in the left-right direction. The stage 5 is attached to the front portion of the base portion 41.
[0054] Also, as shown in FIG. 6 and the like, a first support portion 41a and a second support portion 41b are provided in a state of being arranged in order from the front side in the rear portion of the base portion 41 (particularly, the portion located rearward of the stage 5). Both the first and second support portions 41a and 41b are provided so as to protrude upward from the base portion 41. Circular bearing holes (not shown) are formed in the first and second support portions 41a and 41b so as to be concentric with the central axis Ac.
[0055] The support column portion 42 constitutes substantially the upper half of the stand 4, and as shown in FIGS. 2 to 3, FIG. 6 and the like, is formed in a columnar shape extending along the vertical direction. The head portion 6 is attached to the front surface of the upper portion of the support column portion 42 via a separate mounting tool 43.
[0056] Also, as shown in FIG. 6 and the like, a first attachment portion 42a and a second attachment portion 42b are provided in a state of being arranged in order from the front side in the lower portion of the support column portion 42. The first and second attachment portions 42a and 42b have a configuration corresponding to the aforementioned first and second support portions 41a and 41b. Specifically, the first and second support portions 41a and 41b and the first and second attachment portions 42a and 42b are laid out such that the first attachment portion 42a and the second attachment portion 42b sandwich the first support portion 41a, and the first support portion 41a and the second support portion 41b sandwich the second attachment portion 42b.
[0057] In addition, circular bearing holes (not shown) that are concentric and have the same diameter as the bearing holes formed in the first and second support portions 41a and 41b are formed in the first and second attachment portions 42a and 42b. A shaft member 44 is inserted into these bearing holes via a bearing (not shown) such as a cross roller bearing. The shaft member 44 is arranged such that its axis is concentric with the aforementioned central axis Ac. By inserting the shaft member 44, the base portion 41 and the support column portion 42 are connected so as to be relatively swingable. The shaft member 44, together with the first and second support portions 41a and 41b and the first and second attachment portions 42a and 42b, constitutes the tilting mechanism 45 in the present embodiment.
[0058] By connecting the base portion 41 and the support column portion 42 via the tilting mechanism 45, the support column portion 42 is supported by the base portion 41 in a state where it can swing around the central axis Ac. By swinging around the central axis Ac, the support column portion 42 is inclined in the left - right direction with respect to a predetermined reference axis As (see FIGS. 12A and 12B). This reference axis As can be an axis extending perpendicular to the upper surface (mounting surface 51a) of the stage 5 in the non - inclined state shown in FIG. 4 and the like. Also, the central axis Ac functions as the central axis (rotation center) of the swing by the tilting mechanism 45.
[0059] Specifically, the tilting mechanism 45 according to the present embodiment is capable of tilting the support column portion 42 about 90° to the right side with respect to the reference axis As or about 60° to the left side with respect to the reference axis As. As described above, since the head portion 6 is attached to the support column portion 42, this head portion 6 can also be tilted in the left - right direction with respect to the reference axis As. Tilting the head portion 6 is equivalent to tilting the analysis optical system 7 and the observation optical system 9, and thus, is equivalent to tilting the analysis optical axis Aa and the observation optical axis Ao described later.
[0060] The mounting device 43 has a rail portion 43a that guides the head portion 6 along the longitudinal direction of the support column portion 42 (which coincides with the vertical direction in the non-inclined state and is hereinafter referred to as the "substantially vertical direction"), and a lock lever 43b for locking the relative position of the head portion 6 with respect to the rail portion 43a. Among these, the rear surface portion of the head portion 6 (specifically, the mounting plate 61) is inserted into the rail portion 43a and can be moved along the substantially vertical direction. Then, by operating the lock lever 43b with the head portion 6 set at a desired position, the head portion 6 can be fixed at the desired position. Also, by operating the first operation dial 46 shown in FIGS. 2 to 3, the position of the head portion 6 can be adjusted.
[0061] Furthermore, a head driving unit 47 for moving the head portion 6 in the substantially vertical direction is incorporated in the stand 4 or the head portion 6. This head driving unit 47 includes an actuator (e.g., a stepping motor) not shown that is controlled by the controller main body 2, and a motion conversion mechanism that converts the rotation of the output shaft of the stepping motor into a linear motion in the substantially vertical direction, and moves the head portion 6 based on the drive pulses input from the controller main body 2. By the head driving unit 47 moving the head portion 6, the head portion 6, and thus the analysis optical axis Aa and the observation optical axis Ao, can be moved along the substantially vertical direction.
[0062] (Stage 5) The stage 5 is disposed in front of the center in the front-rear direction of the base portion 41 and is attached to the upper surface of the base portion 41. This stage 5 is configured as an electric mounting table, and the sample SP placed on its mounting surface 51a can be moved horizontally, raised and lowered vertically, or rotated in the φ direction.
[0063] Specifically, the stage 5 according to the present embodiment has a mounting table 51 having a mounting surface 51a for mounting the sample SP, a mounting table support portion 52 disposed between the base portion 41 and the mounting table 51 and displacing the mounting table 51, and a mounting table driving unit 53 shown in FIG. 10 described later.
[0064] The mounting table 51 has its upper surface forming a mounting surface 51a. This mounting surface 51a is formed to extend along a substantially horizontal direction. On the mounting surface 51a, the sample SP is placed in an air-open state, that is, a state where it is not housed in a vacuum chamber or the like.
[0065] The mounting table support portion 52 is a member that connects the base portion 41 and the mounting table 51, and is formed in a substantially columnar shape extending along the vertical direction. The mounting table support portion 52 can accommodate the mounting table drive portion 53.
[0066] The mounting table drive portion 53 includes a plurality of actuators (for example, stepping motors), not shown, controlled by the controller main body 2, and a motion conversion mechanism that converts the rotation of the output shaft of the stepping motor into a linear motion, and moves the mounting table 51 based on the drive pulses input from the controller main body 2. By the mounting table drive portion 53 moving the mounting table 51, the mounting table 51, and thus the sample SP placed on its mounting surface 51a, can be moved along the horizontal direction and the vertical direction.
[0067] Similarly, the mounting table drive portion 53 can also rotate the mounting table 51 along the φ direction based on the drive pulses input from the controller main body 2. By the mounting table drive portion 53 rotating the mounting table 51, the sample SP placed on the mounting surface 51a can also be rotated in the φ direction.
[0068] Also, by operating the second operation dial 54 or the like illustrated in FIG. 2, the mounting table 51 can be manually moved and rotated. Details of the second operation dial 54 are omitted.
[0069] Returning to the description of the stand 4, the aforementioned base portion 41 incorporates a first tilt sensor Sw3. This first tilt sensor Sw3 can detect the tilt of a reference axis As perpendicular to the mounting surface 51a with respect to the direction of gravity. On the other hand, a second tilt sensor Sw4 is attached to the support column portion 42. This second tilt sensor Sw4 can detect the tilt of the analysis optical system 7 with respect to the direction of gravity (more specifically, the tilt of the analysis optical axis Aa with respect to the direction of gravity). The detection signals of the first tilt sensor Sw3 and the second tilt sensor Sw4 are both input to the control unit 21. The first tilt sensor Sw3 and the second tilt sensor Sw4 constitute the "tilt detection means" in the present embodiment.
[0070] (Head unit 6) FIG. 7 is a schematic diagram illustrating the configuration of the analysis unit 62. FIG. 8 is a perspective view illustrating the configuration of the unit connector 64, and FIG. 9 is a schematic diagram for explaining the attachment and detachment of the observation unit 63. And FIG. 10 is a schematic diagram for explaining the configuration of the unit switching mechanism 65 as viewed from above. FIGS. 11A and 11B are diagrams for explaining the horizontal movement of the head unit 6.
[0071] The head unit 6 includes a mounting plate 61, an analysis unit 62, an observation unit 63, a unit connector 64 as lens barrel holding means, and a unit switching mechanism 65 as a horizontal drive mechanism.
[0072] The mounting plate 61 is disposed on the rear side of the head unit 6 and is configured as a plate-like member for attaching the head unit 6 to the stand 4. As described above, this mounting plate 61 is fixed to the fixture 43 of the stand 4.
[0073] The mounting plate 61 has a plate body 61a extending substantially parallel to the rear surface of the head unit 6, a cover member 61b protruding forward from the lower end of the plate body 61a, and a connector 61c attached to the cover member 61b. Details of the cover member 61b and the connector 61c will be described later.
[0074] Also, as shown in FIG. 10, a guide rail 65a that constitutes a unit switching mechanism 65 is attached to the left end portion of the mounting plate 61. The guide rail 65a connects the mounting plate 61 and other elements (specifically, the analysis unit 62, the observation unit 63, and the unit coupler 64) in the head portion 6 so as to be horizontally relatively displaceable.
[0075] Hereinafter, the configurations of the analysis unit 62, the observation unit 63, the unit coupler 64, and the unit switching mechanism 65 will be described in order.
[0076] - Analysis Unit 62 - The analysis unit 62 includes an analysis optical system 7 for analyzing the sample SP and an analysis housing 70 that houses the analysis optical system 7. The analysis optical system 7 is a set of components for analyzing the sample SP as an analysis object, and each component is housed in the analysis housing 70. The analysis optical system 7 can perform analysis using, for example, the LIBS method. A communication cable C1 for transmitting and receiving electrical signals to and from the controller main body 2 is connected to this analysis unit 62. This communication cable C1 is not essential, and the analysis unit 62 and the controller main body 2 may be connected by wireless communication.
[0077] Note that the term "optical system" as used here is used in a broad sense. That is, the analysis optical system 7 is defined as a system that includes optical elements such as lenses, as well as a light source, an imaging element, etc. The same applies to the observation optical system 9 in the observation unit 63.
[0078] Specifically, as shown in FIG. 7, the analysis optical system 7 includes an electromagnetic wave emitting unit 71, an output adjusting means 72, a half mirror 73, a reflective objective lens 74, a dichroic mirror 75, a first parabolic mirror 76A, a first detector 77A, a first beam splitter 78A, a second parabolic mirror 76B, a second detector 77B, a second beam splitter 78B, an LED light source 79, an imaging lens 80, and a first camera 81, and an optical element 82. The reflective objective lens 74 is an example of the "first objective lens" in the present embodiment. Also, the first detector 77A and the second detector 77B are examples of the "detector" in the present embodiment. Some of the components of the analysis optical system 7 are also shown in FIG. 6.
[0079] The electromagnetic wave emitting unit 71 emits an electromagnetic wave for analyzing the sample SP. In particular, the electromagnetic wave emitting unit 71 according to the present embodiment is constituted by a laser light source that emits laser light as the electromagnetic wave. The electromagnetic wave emitting unit 71 is an example of the "laser oscillator" in the present embodiment.
[0080] Although detailed illustration is omitted, the electromagnetic wave emitting unit 71 according to the present embodiment includes an excitation light source constituted by a laser diode (LD) or the like, a focusing lens that condenses the laser output from the excitation light source and emits it as laser excitation light, a laser medium that generates a fundamental wave based on the laser excitation light, a Q switch for pulse oscillation of the fundamental wave, a rear mirror and an output mirror for amplifying the fundamental wave, and a wavelength conversion element that converts the wavelength of the laser light output from the output mirror.
[0081] Here, as the laser medium, it is preferable to use, for example, rod-shaped Nd:YAG in order to increase the energy per pulse. In the present embodiment, the wavelength (so-called fundamental wavelength) of the photons emitted from the laser medium by stimulated emission is set to 1064 nm in the infrared region in the present embodiment.
[0082] Also, as the Q-switch, instead of a so-called active Q-switch whose attenuation rate can be controlled externally, a passive Q-switch whose transmittance increases when the intensity of the fundamental wave exceeds a predetermined threshold can be used. The passive Q-switch is composed of, for example, a saturable absorber such as Cr:YAG. By using the passive Q-switch, it becomes possible to automatically generate pulses at the timing when energy equal to or more than a predetermined amount is accumulated in the laser medium.
[0083] Also, as the wavelength conversion element, a configuration using two nonlinear optical crystals such as LBO (LiB3O3) is adopted. By using two crystals, the third harmonic wave can be generated from the fundamental wave. The wavelength of the third harmonic wave is set to 355 nm in the ultraviolet region in this embodiment.
[0084] That is, the electromagnetic wave emitting unit 71 according to this embodiment can output laser light composed of ultraviolet rays as the electromagnetic wave. Thereby, analysis by LIBS can also be performed on an optically transparent sample SP such as glass. In addition, the laser light in the ultraviolet region has a very low rate of reaching the human retina. By configuring so that the laser light does not form an image on the retina, the safety of the device can be enhanced.
[0085] The output adjustment means 72 is arranged on the optical path connecting the electromagnetic wave emitting unit 71 and the half mirror 73, and can adjust the output of the electromagnetic wave (laser light) (hereinafter also referred to as "laser power"). Specifically, the output adjustment means 72 according to this embodiment includes a half-wave plate 72a and a deflection beam splitter 72b. The half-wave plate 72a is configured to rotate relative to the deflection beam splitter 72b, and by controlling the rotation angle, the amount of light passing through the deflection beam splitter 72b can be adjusted.
[0086] The half mirror 73 reflects the laser light output from the electromagnetic wave output unit 71 and passed through the output adjustment means 72, and guides this reflected light to the sample SP via the reflective objective lens 74. On the other hand, the half mirror 73 transmits the light returning from the sample SP corresponding to this laser light (the light emitted along with the plasmatization occurring on the surface of the sample SP), and is laid out so as to guide this transmitted light to the first detector 77A, the second detector 77B, and the first camera 81.
[0087] The reflective objective lens 74 condenses the electromagnetic wave from the sample SP corresponding to the irradiation of the electromagnetic wave (laser light). Specifically, the reflective objective lens 74 according to the present embodiment has an analysis optical axis Aa extending along the substantially vertical direction described above, condenses the electromagnetic wave emitted from the electromagnetic wave output unit 71, irradiates the sample SP, and at the same time, condenses the light returning from the sample SP corresponding to the electromagnetic wave (laser light) irradiated to the sample SP (the light emitted along with the plasmatization occurring on the surface of the sample SP). The analysis optical axis Aa is provided so as to be parallel to the observation optical axis Ao of the objective lens 92 of the observation unit 63. The analysis optical axis Aa is an example of the "first optical axis" in the present embodiment.
[0088] This reflective objective lens 74 is configured to coaxialize the optical system related to the light reception by the first camera 81, the optical system related to the laser light output from the electromagnetic wave output unit 71 and irradiated to the sample SP, and the optical system related to the light returning from the sample SP and reaching the first and second detectors 77A and 77B. In other words, the reflective objective lens 74 is shared by three types of optical systems.
[0089] Specifically, the reflective objective lens 74 according to the present embodiment is a Schwarzschild type objective lens composed of two mirrors, and incorporates an annular and relatively large-diameter primary mirror 74a and a disk-shaped and relatively small-diameter secondary mirror 74b.
[0090] The first mirror 74a allows the laser beam to pass through an aperture provided in its central portion, while reflecting the light returning from the sample SP (electromagnetic waves emitted from electrons when returning from a plasma state to a state such as a gas) by a mirror surface provided around it. The latter reflected light is reflected again by the mirror surface of the second mirror 74b and passes through the aperture of the first mirror 74a in a state coaxial with the laser beam.
[0091] The second mirror 74b is configured to transmit the laser beam while reflecting the light reflected by the first mirror 74a in a focused state. The former laser beam irradiates the sample SP, while the latter reflected light passes through the aperture of the first mirror 74a as described above and reaches the half mirror 73. The reflected light that reaches the half mirror 73 passes through the half mirror 73 and reaches the dichroic mirror 75.
[0092] When the laser beam is input to the reflective objective lens 74, the laser beam passes through the second mirror 74b disposed at the central portion of the reflective objective lens 74 and reaches the surface of the sample SP. When the sample SP is locally plasma - ized by the laser beam and light is emitted accordingly, the light passes through an aperture provided around the second mirror 74b and reaches the first mirror 74a. The light that reaches the first mirror 74a is reflected by its mirror surface, reaches the second mirror 74b, is reflected by the second mirror 74b, and returns from the reflective objective lens 74 to the half mirror 73.
[0093] The dichroic mirror 75 guides a part of the light returning from the sample SP to the first detector 77A and the other part to the second detector 77B and so on. Specifically, the light returning from the sample SP contains various wavelength components in addition to the wavelength of the laser beam. Therefore, the dichroic mirror 75 according to this embodiment reflects the light in a short - wavelength band among the light returning from the sample SP and guides this to the first detector 77A. This dichroic mirror 75 also transmits the light in other bands and guides this to the second detector 77B.
[0094] The first parabolic mirror 76A is configured as a so-called parabolic mirror and is disposed between the dichroic mirror 75 and the first detector 77A. The first parabolic mirror 76A condenses the light reflected by the dichroic mirror 75 and makes the condensed light incident on the first detector 77A.
[0095] The first detector 77A generates an intensity distribution spectrum, which is the intensity distribution for each wavelength of the light (the light returning from the sample SP) generated at the sample SP and condensed by the reflective objective lens 74. This first detector 77A separates the light by reflecting the light at different angles for each wavelength and makes each of the separated lights incident on an image sensor having a plurality of pixels. Thereby, the wavelength of the light received by each pixel can be made different, and the received light intensity can be acquired for each wavelength. As the first detector 77A, for example, one based on a Czerny-Turner type detector can be used. The entrance slit of the first detector 77A is aligned with the focal position of the first parabolic mirror 76A. The intensity distribution spectrum generated by the first detector 77A is input to the control unit 21 of the controller main body 2.
[0096] The first beam splitter 78A reflects a part of the light transmitted through the dichroic mirror 75 and guides it to the second detector 77B, while transmitting the other part and guiding it to the second beam splitter 78B.
[0097] The second parabolic mirror 76B is configured as a parabolic mirror in the same manner as the first parabolic mirror 76A and is disposed between the first beam splitter 78A and the second detector 77B. The second parabolic mirror 76B condenses the light reflected by the first beam splitter 78A and makes the condensed light incident on the second detector 77B.
[0098] Similar to the first detector 77A, the second detector 77B generates an intensity distribution spectrum, which is the intensity distribution for each wavelength of the light (the light returning from the sample SP) generated in the sample SP and condensed by the reflective objective lens 74. As the second detector 77B, for example, one based on a Czerny-Turner type detector can be used. The entrance slit of the second detector 77B is aligned with the focal position of the second parabolic mirror 76B. The intensity distribution spectrum generated by the second detector 77B is input to the control unit 21 shown in FIG. 1 etc., similar to the first detector 77A.
[0099] The second beam splitter 78B transmits at least a part of the light transmitted through the first beam splitter 78A and makes it incident on the first camera 81 via the imaging lens 80. The second beam splitter 78B also reflects the illumination light emitted from the LED light source 79 and passed through the optical element 82, and irradiates the sample SP with this light via the first beam splitter 78A, the dichroic mirror 75, the half mirror 73, and the reflective objective lens 74.
[0100] Note that the illumination light irradiated from the LED light source 79 is coaxial with the laser light output from the electromagnetic wave emitting unit 71 and irradiated to the sample SP, and thus functions as so-called "coaxial epi-illumination". In the example shown in FIG. 7, the LED light source 79 is built into the analysis housing 70, but the present disclosure is not limited to such a configuration. For example, a light source may be laid out outside the analysis housing 70, and the light source and the analysis optical system 7 may be optically coupled to the optical system via an optical fiber cable.
[0101] The first camera 81 images the sample SP by detecting the amount of light received from the sample SP received through the reflective objective lens 74. Specifically, the first camera 81 according to the present embodiment photoelectrically converts the light incident through the imaging lens 80 by a plurality of pixels arranged on its light receiving surface, and converts it into an electrical signal corresponding to the optical image of the subject (sample SP).
[0102] The first camera 81 may be configured by arranging a plurality of light-receiving elements along the light-receiving surface. In this case, each light-receiving element corresponds to a pixel, and an electrical signal based on the amount of light received by each light-receiving element can be generated. Specifically, the first camera 81 according to the present embodiment is configured by an image sensor made of CMOS (Complementary Metal Oxide Semiconductor), but is not limited to this configuration. As the first camera 81, for example, an image sensor made of CCD (Charged-Coupled Device) can also be used.
[0103] Then, the first camera 81 generates image data corresponding to the optical image of the subject based on the electrical signal generated by detecting the amount of light received by each light-receiving element, and inputs the image data to the controller main body 2.
[0104] Note that the light returning from the sample SP is split and incident on the first detector 77A, the second detector 77B, and the first camera 81. Therefore, the amount of light received by the first camera 81 is smaller than that of the second camera 93 described later.
[0105] The optical components described so far are housed in the aforementioned analysis housing 70. A through hole 70a is provided in the lower surface of the analysis housing 70. The reflective objective lens 74 faces the mounting surface 51a through the through hole 70a.
[0106] A shielding member 83 shown in FIG. 7 is disposed in the analysis housing 70. This shielding member 83 is disposed between the through hole 70a and the reflective objective lens 74, and can be inserted into the optical path of the laser light based on an electrical signal input from the controller main body 2 (see the dotted line portion in FIG. 7). The shielding member 83 is configured to be at least non-transmissive to the laser light.
[0107] By inserting the shielding member 83 into the optical path, the emission of the laser light from the analysis housing 70 can be restricted. The shielding member 83 may be disposed between the electromagnetic wave emission unit 71 and the output adjustment means 72.
[0108] As shown in FIG. 10, the analysis housing 70 demarcates a housing space for the unit switching mechanism 65 in addition to the housing space for the analysis optical system 7. In that sense, the analysis housing 70 can also be regarded as an element of the unit switching mechanism 65.
[0109] Specifically, the analysis housing 70 according to the present embodiment is formed in a box shape with a shorter dimension in the front-rear direction than in the left-right direction. And the left side portion of the front surface 70b of the analysis housing 70 protrudes forward in order to secure a movement allowance for the guide rail 65a in the front-rear direction. Hereinafter, this protruding portion will be referred to as the "protruding portion" and is denoted by reference numeral 70c. In the vertical direction, this protruding portion 70c is disposed in the lower half of the front surface 70b (in other words, only the lower half of the left side portion of the front surface 70b protrudes).
[0110] - Basic principle of analysis by analysis unit 62 - The control unit 21 performs component analysis of the sample SP based on the intensity distribution spectra input from the first detector 77A and the second detector 77B as detectors. As a specific analysis method, the LIBS method can be used as described above. The LIBS method is a method for analyzing the components contained in the sample SP at the elemental level (so-called elemental analysis method).
[0111] Generally, when a high energy is applied to a substance, electrons are separated from the atomic nucleus, and the substance becomes a plasma state. Although the electrons separated from the atomic nucleus are temporarily in a high-energy and unstable state, they lose energy from that state and are then captured by the atomic nucleus again and transition to a low-energy and stable state (in other words, return from the plasma state to the non-plasma state).
[0112] Here, the energy lost by the electrons is emitted from the electrons as electromagnetic waves, and the magnitude of the energy of these electromagnetic waves is defined by the energy levels based on the shell structure unique to each element. That is, the energy of the electromagnetic waves emitted when electrons return from the plasma state to the non-plasma state has a unique value for each element (more precisely, the orbit of the electrons bound to the atomic nucleus). The magnitude of the energy of an electromagnetic wave is defined by the wavelength of that electromagnetic wave. Therefore, by analyzing the wavelength distribution of the electromagnetic waves emitted from the electrons, that is, the wavelength distribution of the light emitted from the substance during plasma formation, the components contained in that substance can be analyzed at the elemental level. Such a technique is generally called Atomic Emission Spectroscopy (AES).
[0113] The LIBS method is an analytical technique belonging to this AES method. Specifically, in the LIBS method, energy is imparted to a substance (sample SP) by irradiating it with a laser. Here, since the irradiated area of the laser is locally plasmaized, component analysis of the substance can be performed by analyzing the intensity distribution spectrum of the light emitted accompanying that plasma formation.
[0114] That is, as described above, since the wavelength of each light (electromagnetic wave) has a unique value for each element, when the intensity distribution spectrum forms a peak at a specific wavelength, the element corresponding to that peak becomes a component of the sample SP. And when the intensity distribution spectrum contains multiple peaks, the component ratio of each element can be calculated by comparing the intensities (light reception amounts) of each peak.
[0115] According to the LIBS method, evacuation is not required, and component analysis can be performed in an open-air state. Also, although it is a destructive test of the sample SP, treatments such as dissolving the entire sample SP are not required, and the position information of the sample SP remains (it is only a local destructive test).
[0116] -Observation Unit 63- The observation unit 63 is configured as a cylindrical digital microscope, and includes an observation optical system 9 for observing the sample SP, and a lens barrel 90 that houses the observation optical system 9. The observation optical system 9 is a set of components related to the observation of the sample SP, and at least a part of each component is housed in the lens barrel 90. Here, the lens barrel 90 refers to the cylindrical housing at the tip around the objective lens 92 among the housings of the entire observation unit 63. The lens barrel 90 can be removed from the observation unit 63 alone.
[0117] A communication cable C2 for transmitting and receiving electrical signals to and from the controller main body 2 and an optical fiber cable C3 for guiding illumination light from the outside are connected to the observation unit 63. Note that the communication cable C2 is not essential, and the observation unit 63 and the controller main body 2 may be connected by wireless communication.
[0118] Specifically, as shown in FIG. 6, the observation optical system 9 includes a mirror group 91, an objective lens 92, and a second camera 93. The objective lens 92 is an example of the "second objective lens" in the present embodiment. The second camera 93 is an example of the "camera" in the present embodiment.
[0119] The mirror group 91 reflects the illumination light guided from the optical fiber cable C3 and guides it to the surface of the sample SP through the objective lens 92. This illumination light is coaxial with the observation optical axis Ao of the objective lens 92 and functions as so-called "coaxial epi-illumination". Instead of guiding illumination light from the outside through the optical fiber cable C3, a light source may be built into the lens barrel 90. In that case, the optical fiber cable C3 becomes unnecessary.
[0120] The mirror group 91 also transmits the reflected light from the sample SP and guides it to the second camera 93. The mirror group 91 according to the present embodiment can be configured using a total reflection mirror, a half mirror, etc. as illustrated in FIG. 6.
[0121] The objective lens 92 has an observation optical axis Ao extending substantially along the vertical direction, condenses illumination light, irradiates the sample SP placed on the mounting table 51, and condenses the light (reflected light) from the sample SP. The observation optical axis Ao is provided to be parallel to the analysis optical axis Aa of the reflective objective lens 74 of the observation unit 63. The observation optical axis Ao is an example of the "second optical axis" in the present embodiment.
[0122] Also, although details are omitted, as schematically illustrated in FIG. 6, a ring illumination 92a can be attached to the objective lens 92 and used as illumination for observation (non-coaxial epi-illumination).
[0123] Further, the objective lens 92 is configured to be detachable from the lens barrel 90. Thereby, the magnification of the observation optical system 9 can be changed without replacing the entire lens barrel 90 and the observation unit 63.
[0124] The second camera 93 images the sample SP by detecting the amount of light (reflected light) from the sample SP received through the objective lens 92. Specifically, the second camera 93 according to the present embodiment photoelectrically converts the light incident from the sample SP through the objective lens 92 by a plurality of pixels arranged on the light receiving surface, and converts it into an electrical signal corresponding to the optical image of the subject (sample SP).
[0125] The second camera 93 may be configured by arranging a plurality of light receiving elements along the light receiving surface. In this case, each light receiving element corresponds to a pixel, and an electrical signal based on the amount of light received by each light receiving element can be generated. The second camera 93 according to the present embodiment is composed of an image sensor made of CMOS like the first camera 81, but an image sensor made of CCD can also be used.
[0126] Then, the second camera 93 generates image data corresponding to the optical image of the subject based on the electrical signal generated by detecting the amount of light received by each light receiving element, and inputs the image data to the controller main body 2.
[0127] Note that the light returning from the sample SP enters the second camera 93 without being split by a detector or the like. Therefore, the amount of light received by the second camera 93 is larger than the amount of light received by the first camera 81 described above. The second camera 93 can generate a brighter image than the first camera 81.
[0128] As shown in FIG. 3 and the like, the lens barrel 90 is formed in a substantially cylindrical shape. The longitudinal direction of the lens barrel 90 coincides with the direction in which the observation optical axis Ao described above extends. As shown in FIG. 3, the dimension of the lens barrel 90 in the front-rear direction is shorter than the dimension of the analysis housing 70 in the same front-rear direction. Also, as shown in FIG. 4, the dimension of the lens barrel 90 in the left-right direction is shorter than the dimension of the analysis housing 70 in the same left-right direction.
[0129] In this way, the lens barrel 90 is configured to be more compact than the analysis housing 70. Also, the analysis housing 70 houses optical components not included in the observation optical system 9, such as the first detector 77A and the second detector 77B as detectors. Due to these circumstances, the observation unit 63 is configured to be lighter than the analysis unit 62.
[0130] - Unit coupler 64 - The unit coupler 64 is a member for connecting the observation unit 63 to the analysis unit 62. By connecting the two units 62 and 63 with the unit coupler 64, the analysis optical system 7 and the observation optical system 9 move integrally. The unit coupler 64 is an example of the "lens barrel holding means" in the present embodiment.
[0131] The unit coupler 64 can be attached inside or outside the analysis housing 70, that is, inside or outside the analysis housing 70, or to the stand 4. In particular, in the present embodiment, the unit coupler 64 is attached to the outer surface of the analysis housing 70.
[0132] Specifically, the unit coupler 64 according to the present embodiment is configured to be attachable to the aforementioned protruding portion 70c in the analysis housing 70, and is adapted to hold the lens barrel 90 on the right side of the protruding portion 70c.
[0133] Specifically, as shown in FIG. 8, the unit coupler 64 includes a fixing portion 64a fastened to the upper surface of the protruding portion 70c, an arm portion 64b extending downward from the fixing portion 64a, and a holding portion 64c extending rightward from the arm portion 64b and configured to hold the lens barrel 90.
[0134] Among these, the fixing portion 64a is formed in a flat plate shape extending along the horizontal direction. By inserting a fastening tool (not shown) from above with the fixing portion 64a in close contact with the upper surface of the protruding portion 70c, the unit coupler 64 can be fixed to the analysis housing 70 and thus to the analysis unit 62.
[0135] The arm portion 64b is formed in a long plate shape with a dimension in the vertical direction longer than that in the front-rear direction. By fastening the fixing portion 64a to the protruding portion 70c, as shown in FIG. 4, the left side surface of the arm portion 64b comes into contact with the right side surface of the protruding portion 70c, enabling the lens barrel 90 to be stably positioned without wobbling.
[0136] The holding portion 64c is formed in a flat plate shape extending along the horizontal direction and having a through hole 64d formed therein. The inner diameter of the through hole 64d substantially matches the outer diameter of the lens barrel 90. On the outer surface of the holding portion 64c, there are provided a first screw 64e for adjusting the rotation angle of the lens barrel 90 around the observation optical axis Ao, a second screw 64f and a third screw 64g for adjusting the positioning of the lens barrel 90 in the horizontal direction, and a fourth screw 64h for fixing the lens barrel 90 to the holding portion 64c after adjusting the rotation angle and positioning of the lens barrel 90.
[0137] Also, as shown in FIG. 3, in a state where the lens barrel 90 and thus the observation unit 63 are held by the unit coupler 64, the front surface of the protruding portion 70c protrudes forward beyond the unit coupler 64 and the front portion of the lens barrel 90. Thus, in the present embodiment, when the unit coupler 64 holds the lens barrel 90, when viewed from the side (when viewed from a direction orthogonal to the moving direction of the observation optical system 9 and the analysis optical system 7 by the unit switching mechanism 65 as the horizontal drive mechanism), at least a part of the lens barrel 90 and the analysis housing 70 (the protruding portion 70c in the present embodiment) are laid out so as to overlap each other.
[0138] The unit coupler 64 according to the present embodiment can fix the relative position of the analysis optical axis Aa with respect to the observation optical axis Ao by fixing the lens barrel 90 to the analysis optical system 7.
[0139] Specifically, as shown in FIG. 10, by the unit coupler 64 as the lens barrel holding means holding the lens barrel 90, the observation optical axis Ao and the analysis optical axis Aa are arranged so as to be aligned along the direction in which the observation optical system 9 and the analysis optical system 7 relatively move with respect to the stage 5 by the unit switching mechanism 65 as the horizontal drive mechanism (the front-rear direction in the present embodiment). Particularly in the present embodiment, the observation optical axis Ao is arranged on the front side compared to the analysis optical axis Aa.
[0140] Also, as shown in FIG. 10, by the unit coupler 64 holding the lens barrel 90, the observation optical axis Ao and the analysis optical axis Aa are arranged such that their positions in the non-moving direction (the left-right direction in the present embodiment) along the horizontal direction and orthogonal to the aforementioned moving direction (the front-rear direction in the present embodiment) coincide.
[0141] Also, as shown in FIG. 9, the observation unit 63 can be appropriately replaced with respect to the analysis unit 62. For this purpose, the unit coupler 64 according to the present embodiment is configured to selectively hold any one of a plurality of types of lens barrels 90, 90', 90'' that accommodate different observation optical systems 9, 9', 9'' (or each of a plurality of types of observation units 63, 63', 63'' that accommodate different observation optical systems 9, 9', 9''). Here, the different observation optical systems 9', 9'' refer to optical systems in which the magnification of the objective lens 92, the presence or absence of the ring illumination 92a, etc. are different.
[0142] Note that when replacing the lens barrel 90, the lens barrel 90 may be replaced together with the unit coupler 64, or the lens barrel 90 may be removed from the unit coupler 64 and only the lens barrel 90 may be replaced with another lens barrel 90', 90''. When replacing the lens barrel 90, by replacing the lens barrel together with the unit coupler 64, the focal length (Working Distance: WD) between the sample SP (observation object) and the objective lens 92 can be made to coincide (the focal length can be kept constant) before and after the replacement of the lens barrel 90.
[0143] Specifically, the unit coupler 64 for attaching the lens barrel 90 with a short focal length (WD) is designed such that the distance between the sample SP and the lens barrel 90 becomes short, for example, by making its arm portion 64b longer.
[0144] Also, the unit coupler 64 for attaching the lens barrel 90 with a long focal length (WD) is designed such that the distance between the sample SP and the lens barrel 90 becomes long, for example, by making its arm portion 64b shorter.
[0145] In any design, when making the focal length (WD) between the sample SP and the objective lens 92 coincide (keeping the focal length constant) before and after replacing the lens barrel 90 by utilizing the length of the arm portion 64b, it is desirable to design such that the sum of the focal length (WD) of the lens barrel 90 and the length of the arm portion 64b is constant.
[0146] Note that, instead of the length of the arm portion 64b, the focal length (WD) between the sample SP and the objective lens 92 may be made to coincide before and after the replacement of the lens barrel 90 by adjusting the dimensions of various parts such as the thickness of the holding portion 64c.
[0147] Each of the lens barrels 90, 90', 90" is configured to be able to identify at least the type of the objective lens 92. A lens sensor Sw1 for detecting such a type is attached to each of the lens barrels 90, 90', 90". When the lens barrel 90 is attached to the observation optical system 9, this lens sensor Sw1 can detect at least the type of the objective lens 92 among the types of the observation optical system 9 corresponding to the lens barrel 90 fixed to the analysis optical system 7 by the unit coupler 64. The detection signal of the lens sensor Sw1 is input to the controller main body 2.
[0148] Note that the signal input to the controller main body 2 may include not only the detection signal of the lens sensor Sw1 but also, for example, a signal indicating the magnification of the lens barrel 90 attached to the observation optical system 9.
[0149] When the lens barrel 90 is attached to the observation optical system 9, the controller main body 2 and the lens barrel 90 are electrically connected. Through this connection, the controller main body 2 may acquire the type of the objective lens 92, the magnification of the lens barrel 90, and the like. Note that, instead of attaching the lens sensor Sw1 to the optical system unit group 1, it may be configured to manually input the type of the observation optical system 9, the magnification of the lens barrel 90, and the like to the controller main body 2 via the operation unit 3 or the like.
[0150] Furthermore, the controller main body 2 may drive the head drive unit 47 according to the type of the lens barrel 90 attached to the observation optical system 9, and move the head unit 6 in the Z-axis direction. The controller main body 2 may identify the type of the objective lens 92 based on, for example, the detection signal of the lens sensor Sw1, obtain the focal length (WD) of the objective lens 92 fixed by the unit coupler 64, and drive the head drive unit 47 so that the focal length (WD) between the sample SP as an example of the observation object and the objective lens 92 matches before and after the replacement of the lens barrel 90.
[0151] Here, although the attachment of a plurality of types of lens barrels 90, 90', 90" accommodating different observation optical systems 9, 9', 9" has been described, this description is common not only for the lens barrels 90, 90', 90" but also for the case where the entire observation unit 63 is attached together.
[0152] In that case, in the above description, the terms "a plurality of types of lens barrels 90, 90', 90"" and "lens barrel 90" may be read as the terms "a plurality of types of observation units 63, 63', 63""" and "observation unit 63", respectively (see also FIG. 9). In this case, for example, as shown in FIG. 9, the unit coupler 64 holding the observation unit 63 will be arranged outside the analysis housing 70.
[0153] - Unit switching mechanism 65 - The unit switching mechanism 65 is configured to move the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 51 along the horizontal direction so that imaging of the sample SP by the observation optical system 9 and irradiation of electromagnetic waves (laser light) when an intensity distribution spectrum is generated by the analysis optical system 7 (in other words, irradiation of electromagnetic waves by the electromagnetic wave emitting unit 71 of the analysis optical system 7) can be executed on the same location of the sample SP as the observation object. The unit switching mechanism 65 is an example of the "horizontal drive mechanism" in the present embodiment.
[0154] The moving direction of the relative position by the unit switching mechanism 65 can be the arrangement direction of the observation optical axis Ao and the analysis optical axis As. As shown in FIG. 10, the unit switching mechanism 65 according to the present embodiment moves the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 51 along the front-rear direction.
[0155] The unit switching mechanism 65 according to the present embodiment relatively displaces the analysis housing 70 with respect to the stand 4 and the mounting plate 61. Since the analysis housing 70 and the lens barrel 90 are connected by the unit coupler 64, the lens barrel 90 is also integrally displaced by displacing the analysis housing 70.
[0156] Specifically, the unit switching mechanism 65 according to the present embodiment includes a guide rail 65a and an actuator 65b. Among these, the guide rail 65a is configured to protrude forward from the front surface of the mounting plate 61.
[0157] Specifically, the base end portion of the guide rail 65a is fixed to the mounting plate 61. On the other hand, the tip side portion of the guide rail 65a is inserted into the accommodation space partitioned within the analysis housing 70 and is attached to the analysis housing 70 in a state where it can be inserted and removed. The insertion and removal direction of the analysis housing 70 with respect to the guide rail 65a is equal to the direction in which the mounting plate 61 and the analysis housing 70 are separated or approached (the front-rear direction in the present embodiment).
[0158] The actuator 65b can be, for example, a linear motor or a stepping motor that operates based on an electrical signal from the control unit 100. By driving this actuator 65b, the analysis housing 70, and thus the observation optical system 9 and the analysis optical system 7, can be relatively displaced with respect to the stand 4 and the mounting plate 61. When a stepping motor is used as the actuator 65b, a motion conversion mechanism for converting the rotational motion of the output shaft of the stepping motor into a linear motion in the front-rear direction is further provided.
[0159] The unit switching mechanism 65 further includes a movement amount sensor Sw2 for detecting the movement amounts of the observation optical system 9 and the analysis optical system 7. The movement amount sensor Sw2 can be constituted by, for example, a linear scale (linear encoder) or the like.
[0160] The movement amount sensor Sw2 detects the relative distance between the analysis housing 70 and the mounting plate 61, and inputs an electrical signal corresponding to the relative distance to the controller main body 2. The controller main body 2 determines the displacement amounts of the observation optical system 9 and the analysis optical system 7 by calculating the change amount of the relative distance input from the movement amount sensor Sw2.
[0161] As shown in FIGS. 11A and 11B, when the unit switching mechanism 65 as the horizontal drive mechanism operates, the head unit 6 slides along the horizontal direction, and the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 51 move (horizontal movement). Due to this horizontal movement, the head unit 6 switches between a first mode in which the objective lens 92 faces the sample SP and a second mode in which the reflective objective lens 74 faces the sample SP.
[0162] As shown in FIGS. 11A and 11B, in the first mode, the head unit 6 is in a relatively retracted state, and in the second mode, the head unit 6 is in a relatively advanced state. The first mode is an operation mode for performing magnified observation of the sample SP by the observation optical system 9, and the second mode is an operation mode for performing component analysis of the sample SP by the analysis optical system 7.
[0163] In particular, the analysis and observation apparatus A according to the present embodiment is configured such that the location pointed to by the objective lens 92 in the first mode and the location pointed to by the reflective objective lens 74 in the second mode are the same location. Specifically, the analysis and observation apparatus A is configured such that the location where the observation optical axis Ao intersects the sample SP in the first mode and the location where the analysis optical axis Aa intersects the sample SP in the second mode are the same (see FIG. 11B).
[0164] In order to realize such a configuration, the movement amount D2 of the head unit 6 when the unit switching mechanism 65 operates is set to be the same as the distance D1 between the observation optical axis Ao and the analysis optical axis Ao (see FIGS. 10 and 11A). In addition, as shown in FIG. 10, the arrangement direction of the observation optical axis Ao and the analysis optical axis Ao is set to be parallel to the movement direction of the head unit 6.
[0165] With the above configuration, before and after switching between the first mode and the second mode, at the timing of switching, image generation of the sample SP by the observation optical system 9 and generation of the intensity distribution spectrum by the analysis optical system 7 (specifically, irradiation of electromagnetic waves by the analysis optical system 7 when the intensity distribution spectrum is generated by the analysis optical system 7) can be executed from the same direction for the same location in the sample SP.
[0166] Also, as shown in FIG. 11B, the aforementioned cover member 61b on the mounting plate 61 is arranged to cover (shielding state) the reflective objective lens 74 forming the analysis optical system 7 in the first mode in which the head unit 6 is in a relatively retracted state, and in the second mode in which the head unit 6 is in a relatively advanced state, it is arranged to be separated from the reflective objective lens 74 (non-shielding state).
[0167] In the former shielding state, even if the laser light is emitted unintentionally, the laser light can be shielded by the cover member 61b. Thus, the safety of the apparatus can be improved.
[0168] Also, as shown in FIG. 11B, the connector 61c attached to the cover member 61b is electrically connected to the analysis housing 70 in the first mode (shielding state), while the electrical connection with the analysis housing 70 is released in the second mode (non-shielding state).
[0169] When this connector 61c is connected to the analysis housing 70, it allows the emission of laser light from the electromagnetic wave emission unit 71. When the connection to the analysis housing 70 is released, it is configured to allow the emission of laser light from the electromagnetic wave emission unit 71 according to the operating state of the tilting mechanism 45 (in other words, depending on the operating state of the tilting mechanism 45, the emission of laser light is restricted). By configuring it in this way, the unintended emission of laser light can be suppressed, and the safety of the device can be further improved.
[0170] (Further details of the tilting mechanism 45) FIGS. 12A and 12B are diagrams for explaining the operation of the tilting mechanism 45. Hereinafter, with reference to FIGS. 12A and 12B, the tilting mechanism 45 will be further described, such as its relationship with the unit coupler 64.
[0171] The tilting mechanism 45 is a mechanism constituted by the aforementioned shaft member 44 and the like, and can tilt at least the observation optical system 9 among the analysis optical system 7 and the observation optical system 9 with respect to the reference axis As perpendicular to the mounting surface 51a.
[0172] As described above, in this embodiment, the unit coupler 64 integrally connects the analysis unit 62 and the observation unit 63, so that the relative position of the observation optical axis Ao with respect to the analysis optical axis Aa is maintained. Therefore, when the observation optical system 9 having the observation optical axis Ao is tilted, the analysis optical system 7 having the analysis optical axis Aa will tilt integrally with the observation optical system 9 as shown in FIGS. 12A and 12B.
[0173] Thus, the tilting mechanism 45 according to this embodiment is configured to tilt the analysis optical system 7 and the observation optical system 9 integrally while maintaining the relative position of the observation optical axis Ao with respect to the analysis optical axis Aa.
[0174] In addition, the operation of the unit switching mechanism 65 as the horizontal drive mechanism and the operation of the tilting mechanism 45 are independent of each other, and a combination of both operations is permitted. Therefore, the unit switching mechanism 65 as the horizontal drive mechanism can move the relative positions of the observation optical system 9 and the analysis optical system 7 while maintaining at least the posture in which the observation optical system 9 is tilted by the tilting mechanism 45. That is, as shown by the double-headed arrow A1 in FIG. 12B, the analysis and observation apparatus A according to the present embodiment is configured such that the head unit 6 can be slid back and forth while the observation optical system 9 is tilted.
[0175] Particularly in the present embodiment, since the analysis optical system 7 and the observation optical system 9 are configured to tilt integrally, the unit switching mechanism 65 is configured to move the relative positions of the observation optical system 9 and the analysis optical system 7 while maintaining the state in which both the observation optical system 9 and the analysis optical system 7 are tilted by the tilting mechanism 45.
[0176] Further, the analysis and observation apparatus A is configured to enable eucentric observation. That is, in the analysis and observation apparatus A, a device-specific three-dimensional coordinate system formed by three axes parallel to the X direction, the Y direction, and the Z direction, respectively, is defined. The storage device 21b of the control unit 21 further stores the coordinates of the intersection position described later in the three-dimensional coordinate system of the analysis and observation apparatus A. The coordinate information of the intersection position may be stored in the storage device 21b in advance at the time of factory shipment of the analysis and observation apparatus A. Further, the coordinate information of the intersection position stored in the storage device 21b may be made updatable by the user of the magnification analysis apparatus A.
[0177] The observation optical axis Ao, which is the optical axis of the objective lens 92, intersects the central axis Ac. When the objective lens 92 swings about the central axis Ac, the intersection position of the observation optical axis Ao and the central axis Ac is maintained constant, while the angle (tilt θ) of the observation optical axis Ao with respect to the reference axis As changes. In this way, when the user swings the objective lens 92 about the central axis Ac by the tilting mechanism 45, for example, when the observation target portion of the sample SP is at the above intersection position, even if the objective lens 92 is in a tilted state, the optical center of the second camera 93 does not move from the same observation target portion, maintaining the eucentric relationship. Therefore, it is possible to prevent the observation target portion of the sample SP from deviating from the field of view of the second camera 93 (the field of view of the objective lens 92).
[0178] Particularly in this embodiment, since the analytical optical system 7 and the observation optical system 9 are configured to tilt integrally, the analysis optical axis Aa, which is the optical axis of the reflective objective lens 74, intersects the central axis Ac in the same way as the observation optical axis Ao. When the reflective objective lens 74 swings about the central axis Ac, the intersection position of the analysis optical axis Ao and the central axis Ac is maintained constant, while the angle (tilt θ) of the analysis optical axis Aa with respect to the reference axis As changes.
[0179] Also, as described above, the tilting mechanism 45 can tilt the support portion 42 about 90° to the right with respect to the reference axis As or about 60° to the left with respect to the reference axis As. However, when the analytical optical system 7 and the observation optical system 9 are configured to tilt integrally, if the support portion 42 is tilted excessively, there is a possibility that the laser light emitted from the analytical optical system 7 will be irradiated toward the user.
[0180] Therefore, assuming that the tilts of the observation optical axis Ao and the analysis optical axis Aa with respect to the reference axis As are θ, it is desirable that the tilt θ be within a range that satisfies a predetermined safety standard, at least in situations where laser light can be emitted. Specifically, in this embodiment, the tilt θ can be adjusted within a range below a predetermined first threshold value θmax.
[0181] In order to keep the inclination θ less than the first threshold value θmax, a hard constraint may be imposed on the tilting mechanism 45, or a soft constraint may be imposed on the analysis optical system 7. The former constraint can be realized by providing a brake mechanism (not shown) in the tilting mechanism 45 to physically limit the operating range of the tilting mechanism 45.
[0182] On the other hand, when the latter constraint is imposed, the control unit 21 can be configured to allow or restrict the emission of laser light from the electromagnetic wave emission unit 71 as a laser oscillator according to the inclination θ of the analysis optical system 7 with respect to the reference axis As. The control of the laser light according to the inclination is executed by the laser control unit 213 of the control unit 21.
[0183] (Other hardware configurations) FIG. 17 is a perspective view illustrating a state in which a shielding cover is attached to the head unit 6. As shown in FIG. 17, the analysis and observation apparatus A according to the present embodiment further includes a shielding cover 10 that can be attached to the objective lens 92 or the analysis housing 70. This shielding cover 10 can at least surround the objective lens 92 as the first objective lens from the side and cover the objective lens 92. This shielding cover 10 can shield the laser light when the shielding cover 10 is attached to the objective lens 92 or the analysis housing 70. Thereby, leakage of the laser light can be suppressed.
[0184] The shielding cover 10 also has a connector (not shown). This connector is configured to be electrically connected to the objective lens 92 or the analysis housing 70 when the shielding cover 10 is attached to the objective lens 92 or the analysis housing 70.
[0185] The analysis and observation apparatus A according to the present embodiment is configured to generate a signal indicating whether the connector is electrically connected to the objective lens 92 or the analysis housing 70 and input the signal to the control unit 21. The control unit 21, particularly the laser control unit 213 described later, can execute control based on the signal as described later.
[0186] <Details of the Controller Main Body 2> FIG. 13 is a block diagram illustrating the configuration of the controller main body 2. FIG. 14 is a block diagram illustrating the configuration of the control unit 21. In the example shown in FIG. 13, the controller main body 2 and the optical unit group 1 are configured separately, but the configuration is not limited thereto. At least a part of the controller main body 2 may be provided in the optical unit group 1.
[0187] As described above, the controller main body 2 according to the present embodiment includes a control unit 21 that performs various processes, and a display unit 22 that displays information related to the processes performed by the control unit 21. Among these, the control unit 21 includes a processing device 21a composed of a CPU, a system LSI, a DSP, etc., a storage device 21b composed of a volatile memory, a non-volatile memory, etc., and an input / output bus 21c.
[0188] The control unit 21 is configured to be capable of both generating image data of the sample SP based on the amount of light received from the sample SP and analyzing the substances contained in the sample SP based on the intensity distribution spectrum.
[0189] Specifically, as illustrated in FIG. 13, at least a mouse 31, a console 32, a keyboard 33, a head drive unit 47, a stage drive unit 53, an electromagnetic wave emission unit 71, an output adjustment means 72, an LED light source 79, a first camera 81, a shielding member 83, a ring illumination 92a, a second camera 93, an actuator 65b, a lens sensor Sw1, a movement amount sensor Sw2, a first inclination sensor Sw3, and a second inclination sensor Sw4 are electrically connected to the control unit 21.
[0190] The control unit 21 electrically controls the head drive unit 47, the stage drive unit 53, the electromagnetic wave emission unit 71, the output adjustment means 72, the LED light source 79, the first camera 81, the shielding member 83, the ring illumination 92a, the second camera 93, and the actuator 65b.
[0191] Further, the output signals of the first camera 81, the second camera 93, the lens sensor Sw1, the movement amount sensor Sw2, the first inclination sensor Sw3, and the second inclination sensor Sw are input to the control unit 21. The control unit 21 executes operations and the like based on the input output signals, and executes processing based on the operation results.
[0192] For example, the control unit 21 calculates the inclination θ of the analysis optical system 7 with respect to the reference axis As perpendicular to the placement surface 51a based on the detection signal of the first inclination sensor Sw3 and the detection signal of the second inclination sensor Sw4. When the inclination exceeds a predetermined threshold value, the control unit 21 notifies the user with a warning or the like.
[0193] In addition, the control unit 21 identifies at least the type of the objective lens 92 among the types of the observation optical system 9 corresponding to the lens barrel 90 fixed to the analysis optical system 7 by the unit coupler 64 as the lens barrel holding means, and based on the identification result, It is possible to execute processing related to imaging of the sample SP. Here, the identification of the type of the objective lens 92 can be performed based on the detection signal of the lens sensor Sw1. As processing related to imaging of the sample SP, the control unit 21 can execute, for example, adjustment of the exposure time of the second camera 93 and adjustment of the brightness of the illumination light.
[0194] Specifically, as shown in FIG. 14, the control unit 21 according to the present embodiment includes an inclination determination unit 211, a notification control unit 212, a laser control unit 213, a mode switching unit 214, a spectrum acquisition unit 215, and a spectrum analysis unit 216. These elements may be realized by a logic circuit or may be realized by executing software.
[0195] - Inclination determination unit 211 - The tilt determination unit 211 is electrically connected to the first tilt sensor Sw3 and the second tilt sensor Sw4, and receives the detection signals of these sensors. Based on the detection signals input from each sensor, the tilt determination unit 211 calculates the difference between the tilt of the reference axis As with respect to the direction of gravity and the tilt of the analysis optical system 7 with respect to the direction of gravity (more specifically, the tilt of the analysis optical axis Aa with respect to the direction of gravity). This difference corresponds to the tilt θ of the analysis optical system 7 with respect to the reference axis As.
[0196] Based on the calculated tilt θ, the tilt determination unit 211 determines whether the tilt θ exceeds the first threshold value θmax. The determination result is input to the notification control unit 212 and the laser control unit 213 together with the magnitude of the tilt θ.
[0197] - Notification control unit 212 - Based on the detection results of the first tilt sensor Sw3 and the second tilt sensor Sw4, the notification control unit 212 notifies the user about the emission of the laser light. The notification control unit 212 functions as a "notification means" in this embodiment.
[0198] In this embodiment, the notification control unit 212 is configured to use the display unit 22 as a notification medium. Instead of this configuration, a sound source (not shown) composed of a buzzer or the like can also be used as a notification medium.
[0199] Specifically, the notification control unit 212 as a notification means switches the content of the notification to the user based on the determination result by the tilt determination unit 211. This notification content includes at least a notification indicating that the emission of the laser light is not recommended.
[0200] In particular, the notification control unit 212 according to this embodiment notifies the user by displaying the value of the tilt θ calculated by the tilt determination unit 211 on the display unit 22 and appropriately changing the display mode on the display unit 22 according to the magnitude of the tilt θ.
[0201] Specifically, when the detected inclination is equal to or less than the first threshold value θmax, the notification control unit 212 displays a character string, symbol, etc. indicating that the emission of the laser beam is permitted on the display unit 22. Further, when the head unit 6 is set to the first mode, it may transition to a state in which it can receive an operation input for starting the switching from the first mode to the second mode by the mode switching unit 214 in order to enable the emission of the laser beam.
[0202] On the other hand, when the detected inclination exceeds the first threshold value θmax, the notification control unit 212 displays a character string, symbol, etc. indicating that the emission of the laser beam is not recommended on the display unit 22. Further, when the head unit 6 is set to the first mode, it may transition to a state in which it cannot receive an operation input for starting the switching from the first mode to the second mode by the mode switching unit 214 in order to disable the emission of the laser beam. Note that it is also possible to configure it so that the laser beam can be forcibly emitted based on an operation input by the user without disabling the emission of the laser beam.
[0203] The notification control unit 212 is also configured to be able to change the color of the character string, symbol, etc. to be displayed on the display unit 22 or blink the character string, symbol, etc. according to the determination result.
[0204] - Laser control unit 213 - The laser control unit 213 controls whether to emit the laser beam from the analysis optical system 7 to the outside based on the detection results of the first inclination sensor Sw3 and the second inclination sensor Sw4.
[0205] Specifically, when the inclination θ detected by the first inclination sensor Sw3 and the second inclination sensor Sw4 as inclination detection means exceeds the first threshold value θmax, the laser control unit 213 according to this embodiment restricts the emission of the laser beam through the shielding member 83 as emission restriction means. In this case, as shown by the dotted line in FIG. 7, when the shielding member 83 operates, the through hole 70a of the analysis housing 70 is closed, and the emission of the laser beam to the outside of the analysis housing 70 is suppressed.
[0206] Here, the laser control unit 213 permits the emission of the laser light regardless of the inclination θ of the analysis optical system 7 with respect to the reference axis As when the connector 61c and the analysis housing 70 are connected and the cover member 61b covers the reflective objective lens 74 in a shielding state. In this case, the safety of the device is ensured without performing control related to θ.
[0207] On the other hand, the laser control unit 213 restricts the emission of the laser light according to the inclination θ of the analysis optical system 7 with respect to the reference axis As in a non-shielding state where the connection between the connector 61c and the analysis housing 70 is released and the cover member 61b is separated from the reflective objective lens 74. As a method for restricting the emission of the laser light, the shielding member 83 may be operated as described above, or it may be realized by setting the electromagnetic wave emission unit 71 to a non-operating state.
[0208] Furthermore, the laser control unit 213 can also perform control based on the connection status between the connector of the shielding cover 10 illustrated in FIG. 17 and the objective lens 92 or the analysis housing 70.
[0209] Specifically, when the connector and the objective lens 92 or the analysis housing 70 are electrically connected, the laser control unit 213 determines that the shielding cover 10 is attached to the objective lens 92 or the analysis housing 70. On the other hand, when the connector and the objective lens 92 or the analysis housing 70 are not electrically connected, the laser control unit 213 determines that the shielding cover 10 is not attached to the objective lens 92 or the analysis housing 70.
[0210] Then, when it is determined that the shielding cover 10 is attached to the objective lens 92 or the analysis housing 70, the laser control unit 213 permits the emission of the laser light from the electromagnetic wave emission unit 71 regardless of the inclination of the analysis optical system 7 with respect to the reference axis As. On the other hand, when it is determined that the shielding cover 10 is not attached to the objective lens 92 or the analysis housing 70, the laser control unit 213 may be configured to restrict the emission of the laser light from the electromagnetic wave emission unit 71 according to the inclination of the analysis optical system 7 with respect to the reference axis As.
[0211] -Mode switching unit 214- The mode switching unit 214 switches from the first mode to the second mode or from the second mode to the first mode by moving the analysis optical system 7 and the observation optical system 9 forward and backward along the horizontal direction (the front-rear direction in this embodiment).
[0212] Specifically, the mode switching unit 214 according to this embodiment reads in advance the distance D1 between the observation optical axis Ao and the analysis optical axis Ao stored in the storage device 21b in advance. Next, the mode switching unit 214 operates the actuator 65b to move the analysis optical system 7 and the observation optical system 9 forward and backward.
[0213] Here, the mode switching unit 214 compares the displacement amount of the observation optical system 9 and the analysis optical system 7 detected by the displacement sensor Sw2 with the distance D1 read in advance, and determines whether or not the former displacement amount has reached the distance D1 of the latter. Then, at the timing when the displacement amount reaches the distance D1, the forward and backward movement of the analysis optical system 7 and the observation optical system 9 is stopped. Note that the distance D1 may be determined in advance, or may be configured such that the distance D1 coincides with the maximum movable range of the actuator 65b.
[0214] Note that after switching to the second mode by the mode switching unit 214, the head unit 6 can also be tilted. In that case, similar to the case of the first mode, with the head unit 6 set to the second mode, the tilt determination unit 211 detects the tilt θ, and the notification control unit 212 performs various notifications. In this way, in at least one of the first mode and the second mode, the tilt of the head unit 6, the determination of the tilt θ, and the notification based on the determination can be performed.
[0215] -Spectrum acquisition unit 215- The spectrum acquisition unit 215 acquires an intensity distribution spectrum by causing the analysis optical system 7 to emit a laser beam in the second mode. Specifically, the spectrum acquisition unit 215 according to the present embodiment causes the electromagnetic wave emission unit 71 to emit a laser beam (ultraviolet laser beam) as an electromagnetic wave, and irradiates the sample SP with this via the reflective objective lens 74. When the sample SP is irradiated with the laser beam, the surface of the sample SP is locally plasmaized, and when returning from the plasma state to a gas or the like, light (electromagnetic wave) having energy corresponding to the width between energy levels is emitted from the electrons. The light thus emitted returns to the analysis optical system 7 through the reflective objective lens 74 and reaches the first camera 81, the first detector 77A, and the second detector 77B.
[0216] The light that returns to the first camera 81 generates image data obtained by imaging the light returning from the sample SP, and the light that returns to the first and second detectors 77A and 77B generates an intensity distribution spectrum by the spectrum acquisition unit 215 spectrally analyzing the light reception amount for each wavelength. The intensity distribution spectrum generated by the spectrum acquisition unit 215 is input to the spectrum analysis unit 216.
[0217] Note that the spectrum acquisition unit 215 synchronizes the light reception timing by the first and second detectors 77A and 77B with the emission timing of the laser beam. By setting it in this way, the spectrum acquisition unit 215 can acquire the intensity distribution spectrum in accordance with the emission timing of the laser beam.
[0218] -Spectrum Analysis Unit 216- The spectrum analysis unit 216 performs component analysis of the sample SP based on the intensity distribution spectrum generated by the spectrum analysis unit 216. As already described, when the LIBS method is used, the surface of the sample SP is locally plasma-formed, and the peak wavelength of the light emitted when returning from the plasma state to a gas or the like has a unique value for each element (more precisely, the electron orbit of the electrons bound to the atomic nucleus). Therefore, by specifying the peak position of the intensity distribution spectrum, it can be determined that the element corresponding to the peak position is a component contained in the sample SP, and by comparing the magnitudes (peak heights) of the peaks, the component ratio of each element can be determined, and based on the determined component ratio, the composition of the sample SP can also be estimated.
[0219] The analysis result by the spectrum analysis unit 216 can be displayed on the display unit 22 or stored in the storage device 21b in a predetermined format.
[0220] -Image processing unit 217- The image processing unit 217 can control the display mode on the display unit 22 based on the image data (first image data I1 described later) generated by the second camera 93 in the observation optical system 9, the image data (second image data I2 described later) generated by the first camera 81 in the analysis optical system 7, and the analysis result by the spectrum analysis unit 216 and the like.
[0221] In particular, as shown in FIGS. 16C and 16E described later, the image processing unit 217 according to the present embodiment makes the region imaged by the second camera 93 (for example, the central position of the region) and the region imaged by the first camera 81 (for example, the central position of the region) coincide before and after switching between the first mode and the second mode. The image processing unit 217 can adjust the display modes of the first and second cameras 81 and 93, and thus the first and second image data I1 and I2 generated by each camera 81 and 93 so that the respective regions coincide.
[0222] In addition, the image processing unit 217 can also superimpose and display an index indicating the irradiation position of the laser beam (more generally, the region irradiated with electromagnetic waves) on the second image data.
[0223] <Specific Example of Control Flow> FIG. 15A is a flowchart illustrating the basic operation of the analysis and observation apparatus A. FIG. 15B is a flowchart illustrating the search procedure for the analysis target by the observation unit 63, and FIG. 15C is a flowchart illustrating the analysis procedure for the sample SP by the analysis unit 62. Further, FIGS. 16A to 16G are diagrams illustrating the display screens of the analysis and observation apparatus A.
[0224] First, in step S1 of FIG. 15A, in the first mode, the search for the analysis target by the observation unit 63 is executed. The process performed in step S1 is as shown in FIG. 15B. That is, step S1 in FIG. 15A is composed of steps S11 to S13 in FIG. 15B.
[0225] Here, prior to step S11 in FIG. 15B, with the lens barrel 90 held by the unit coupler 64, only the objective lens 92 is replaced with a lens having a desired magnification, or the entire lens barrel 90 or the observation unit 63 is replaced, so that the objective lens 92 having the desired magnification is selected. When replacing the entire observation unit 63, the observation unit 63 may be replaced together with the unit coupler 64, or only the observation unit 63 may be replaced by removing the observation unit 63 from the unit coupler 64.
[0226] Then, in step S11, based on the operation input by the user, the analysis and observation apparatus A, particularly the control unit 21 in the apparatus, adjusts conditions such as the exposure time of the second camera 93 and the brightness of the illumination light guided by the optical fiber cable C3 while exploring the portion (analysis target) to be analyzed by the analysis unit 62 among each part of the sample SP. At this time, the control unit 21 stores the first image data I1 generated by the second camera 93 as necessary.
[0227] Note that the adjustment of the exposure time of the second camera 93 and the adjustment of the brightness of the illumination light can also be configured such that the control unit 21 automatically executes based on the detection signal of the lens sensor Sw1 without any operation input by the user.
[0228] Also, during this step S11, or before and after this step S11, for example, based on a manual operation by the user, when searching for the analysis target, the observation optical system 9, and thus the entire head unit 6, is tilted by the tilting mechanism 45. The control unit 21 detects the magnitude of the tilt θ at that time. The magnitude of the tilt θ is displayed on the display unit 22 together with the first image data I1 generated by the second camera 93.
[0229] FIG. 16A illustrates a display screen when the sample SP is imaged from directly above (θ = ±0°) in the first mode. In this case, on the display unit 22, a dialog T1 visually indicating the magnitude of the tilt θ can be displayed together with the first image data I1 corresponding to the tilt θ.
[0230] On the other hand, FIG. 16C illustrates a display screen when the sample SP is imaged from obliquely above (θ = +XX°) in the first mode. In this example, the sign of θ corresponds to the swinging direction of the head unit 6, and is set to be a positive sign when swinging to the right and a negative sign when swinging to the left. Of course, the definition of positive and negative is only an example and can be changed as appropriate.
[0231] In the subsequent step S12, the inclination determination unit 211 determines the magnitude of the inclination θ. When the inclination θ exceeds the aforementioned first threshold value θmax, the process proceeds to step S13 to notify the user of a warning and restrict the laser irradiation. On the other hand, when the inclination θ is less than or equal to the first threshold value θmax, step S13 is skipped and the process returns.
[0232] FIG. 16B illustrates a notification screen of the determination result corresponding to FIG. 16A. In this example, numerical data indicating the magnitude of the inclination θ and a character string indicating the determination result are displayed on the dialog T2. The latter character string indicates that the laser irradiation is permitted (emission OK) and is displayed in a state set to a predetermined display color. Button B1 is a button for starting the component analysis by the analysis unit 62, and button B2 is a button for canceling the component analysis.
[0233] On the other hand, FIG. 16D illustrates a notification screen of the determination result corresponding to FIG. 16C. In this example, the dialog T2 indicates that the laser irradiation is not recommended (emission NG) and is displayed in a display color different from that of FIG. 16B. In this case, the laser irradiation may be restricted by making the button B1 shown in FIG. 16B non-displayed, or as shown in FIG. 16D, a button B3 for forcibly starting the component analysis may be displayed on the display unit 22. For example, when the button B3 is pressed, a warning is given to the user and then the component analysis is started.
[0234] When the process shown in step S13 is completed, or when step S13 is skipped, for example, the user checks whether there is a problem with the appearance of the sample SP, such as the brightness of the first image data I1 and the angle of the observation optical system 9. If there is a problem, the control process that the analysis observation apparatus A should perform is returned to step S11. On the other hand, if there is no problem, the flow shown in FIG. 15B is terminated manually or automatically. As a result, the control process is considered to have completed step S1 of FIG. 15A.
[0235] Then, for example, when the analysis start button (see, for example, button B1 in FIG. 16B) is pressed by the user, the control process proceeds from step S1 to step S2.
[0236] In this step S2, the first image data I1 at the time of button pressing is stored in the storage device 21b, and the mode switching unit 214 operates the unit switching mechanism 65 to integrally slide-move the observation optical system 9 and the analysis optical system 7, thereby executing the switching from the first mode to the second mode.
[0237] FIG. 16E illustrates a display screen when the sample SP is imaged from an obliquely upper direction (θ = +XX°) in the second mode. The image data shown in FIG. 16E is generated by the first camera 81 of the analysis optical system 7. Hereinafter, this is also referred to as "second image data I2".
[0238] As is clear from the comparison between FIG. 16C and FIG. 16E, the center position and inclination of the sample SP displayed in the second mode are substantially the same as the center position and inclination of the sample SP displayed in the first mode.
[0239] Subsequently, in step S3 of FIG. 15A, component analysis of the sample SP by the analysis unit 62 is performed in the second mode. The process performed in step S3 is as shown in FIG. 15C. That is, step S3 in FIG. 15A is composed of steps S41 to S46 in FIG. 15C.
[0240] In this embodiment, the reflective objective lens 74 for component analysis has a shallower depth of field of the subject during observation than the objective lens 92 for observation. Therefore, in step S41 of FIG. 15C, the control unit 21 in the controller main body 2 executes autofocus at various locations in the second image data I2 and generates a full-focus image. As a result, focusing can be achieved over substantially the entire area of the second image data I2. At this time, imaging conditions such as the exposure time of the first camera 81 and the light amount of the illumination light emitted from the LED light source 79 are made as close as possible to the imaging conditions in the first mode.
[0241] Further, when the magnification of the objective lens 92 is lower than that of the reflective objective lens 74, the above-described image processing unit 217 uses the first image data I1 saved in step S2 as a mapping image and can display on the display unit 22 which location within the mapping image is imaged as the second image data I2.
[0242] In the subsequent step S42, the image processing unit 217 performs an overlay display of a mark P1 indicating the irradiation position (laser irradiation point) of the laser light on the second image data I2. This mark P1 indicates the aiming of the laser light. The user can check whether the analysis target is appropriately set by checking the position of the mark P1. The image processing unit 217 can advance the control process based on an operation input (for example, manual input by the user) indicating the confirmation result.
[0243] Also, in this step S42, when the analysis target is not appropriately set, the head unit 6 drives the stage drive unit 53 to adjust the position of the stage 51 based on, for example, an operation input by the user. Thereby, the relative position of the sample SP with respect to the mark P1 can be corrected.
[0244] Before executing step S43 following step S42, in response to the completion of the aiming setting of the laser light, the user can press the analysis button B4 displayed on the dialog T3.
[0245] At that time, the user can also confirm whether the illumination light can be visually recognized, and configure it so that the emission of the laser light is permitted only when it cannot be visually recognized. For example, a button displayed as "Illumination light not visible" can be displayed on the display unit 22, and the analysis button B4 can be configured to be displayed on the display unit 22 only when that button is pressed.
[0246] As described in the explanation of the mode switching unit 214, the control unit 21 can also determine the inclination θ of the head unit 6 in the second mode. In such a configuration, the control unit 21 can perform the same processing as steps S12 and S13 in FIG. 15B, for example, at the timing immediately after the analysis button B4 is pressed (the timing after pressing and before step S43 is executed).
[0247] In the subsequent step S43, the control unit 21 stores the second image data I2 immediately before irradiating the laser light in the storage device 21b. In the subsequent step S44, the control unit 21 emits the laser light from the analysis optical system 7 to the sample SP via the laser control unit 213.
[0248] In this step S44, the first and second detectors 77A and 77B receive the light emitted due to the plasma formation of the sample SP. At that time, the light reception timings by the first and second detectors 77A and 77B are set to be synchronized with the emission timing of the laser light. The spectrum acquisition unit 215 acquires the intensity distribution spectrum in accordance with the emission timing of the laser light.
[0249] In the subsequent step S45, the spectrum analysis unit 216 analyzes the intensity distribution spectrum, thereby performing analysis of the components and component ratios of the elements contained in the sample SP and estimation of the material based on the component ratios (see the dialog T4 in FIG. 16F).
[0250] In subsequent step S46, as illustrated in dialog T5 of FIG. 16G, the image processing unit 217 displays the analysis result of step S45 on the display unit 22. Thereafter, the control unit 21 ends the flow shown in FIG. 15C. When this flow ends, the control process proceeds from step S3 in FIG. 15A to step S4 in the same figure.
[0251] In step S4, it is determined whether or not the component analysis of the sample SP has been completed. If the component analysis has been completed (step S5: YES), the control process proceeds to step S5. This determination is executed by the control unit 21 based on, for example, an operation input by the user. In step S5, the control unit 21 creates a report in which the analysis result is described and ends the flow shown in FIG. 15A.
[0252] On the other hand, if the component analysis is not completed (step S4: NO), the process proceeds to step S6. If it is set to return to searching for the analysis target (step S6: YES), the process returns to step S1. If it is set that there is no need to change the analysis target (step S6: NO), the process returns to step S3 and the above-described processing is executed again. Note that the setting related to step S6 may be appropriately read from a storage device 21b or the like that stores a previously created one, or may be generated each time based on an operation input by the user or the like.
[0253] <Main characteristic parts of the analysis and observation apparatus A> (Characteristic parts related to the tilting mechanism 45) Further, according to the present embodiment, as illustrated in FIG. 12B and the like, the tilting mechanism 45 tilts at least the observation optical system 9 among the analysis optical system 7 and the observation optical system 9 with respect to a predetermined reference axis As perpendicular to the mounting surface 51a. By mounting the tiltable observation optical system 9 on the analysis and observation apparatus A, it becomes possible to observe the sample SP from various angles such as an oblique direction. Thereby, it becomes possible to easily let the user grasp the observation position of the sample SP.
[0254] Also, as illustrated in FIGS. 10 and 12B, etc., by configuring the analysis optical system 7 and the observation optical system 9 to be integrally tilted while maintaining the relative position of the observation optical axis Ao with respect to the analysis optical axis Aa, it becomes possible to irradiate the sample SP with laser light from various directions such as an oblique direction. As a result, it becomes possible to perform component analysis on the sample SP having various shapes such as a structure standing upright in the vertical direction.
[0255] Generally, if laser light is emitted in a state where the analysis optical system 7 is excessively tilted, there is a possibility that it may hit the retina of the human body or the like. Therefore, as illustrated in steps S13 and S14 of FIG. 15B, etc., by restricting the emission of laser light according to the inclination θ, it becomes possible to enhance the safety of the analysis magnifying device A.
[0256] Also, as illustrated in FIG. 7, by using the shielding member 83 disposed within the analysis housing 70, it is possible to more reliably suppress the emission of laser light, which is advantageous in enhancing the safety of the analysis observation device A.
[0257] Also, as illustrated in FIG. 16D, by performing notification based on the detection results of the first and second inclination sensors Sw3, Sw4, it becomes possible to notify the user of various information such as the inclination θ of the analysis optical system 7. This is effective in enhancing the safety of the analysis observation device A.
[0258] Also, as illustrated in FIGS. 16B and 16D, by switching the notification content according to the magnitude of the inclination θ, it becomes possible to notify the user of information corresponding to the posture of the analysis optical system 7. This is effective in enhancing the safety of the analysis observation device A.
[0259] Also, as illustrated in FIG. 16D, by including a notification indicating that the emission of laser light is not recommended in the notification that can be realized by the notification control unit 212, it is possible to more surely alert the user as compared with a configuration that notifies only the inclination of the analysis optical system 7, for example. This is advantageous in enhancing the safety of the analysis observation device A.
[0260] Also, in the shielded state where safety is ensured by the cover member 61b shown in FIG. 6 or the like, or in the state where the shielding cover 10 is attached to the objective lens 92 or the analysis housing 70 as shown in FIG. 17, control according to the inclination θ is not executed (regardless of the magnitude of the inclination θ, emission of the laser beam is allowed). Only in the unshielded state where there is a possibility that safety is not ensured, or in the state where the shielding cover 10 is not attached to the objective lens 92 or the analysis housing 70, by restricting the emission of the laser beam according to the magnitude of the inclination θ, it becomes possible to appropriately determine the situation where the emission should be restricted and then control the emission of the laser beam.
[0261] Also, as shown by the double-headed arrow A1 in FIG. 15B, the unit switching mechanism 65 moves the relative positions of the observation optical system 9 and the analysis optical system 7 while maintaining the posture in which at least the observation optical system 9 is tilted by the tilting mechanism 45. Thereby, the sample SP can be observed from a desired angle by the observation optical system 9 and analyzed by the analysis optical system 7 at substantially the same position as the observation position. This eliminates the deviation between the observation position by the observation optical system 9 and the analysis position by the analysis optical system 7, and is thus advantageous in improving the usability of the apparatus.
[0262] (Features related to the unit switching mechanism 65) Also, according to the present embodiment, the analysis and observation apparatus A moves the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 51 as exemplified in FIG. 11B and the like, so that imaging of the sample SP by the observation optical system 9 and irradiation of the laser beam for generating the intensity distribution spectrum by the analysis optical system 7 are executed at the same location on the sample SP. This eliminates the deviation between the observation position by the observation optical system 9 and the analysis position by the analysis optical system 7, and thus the usability of the apparatus can be improved.
[0263] Furthermore, according to the present embodiment, since the observation optical system 9 and the analysis optical system 7 are configured as independent optical systems, each optical system can be made to have specifications suitable for its respective use. As a result, it becomes possible to optimize the performance of each optical system as much as possible.
[0264] Also, as illustrated in FIG. 11B and the like, the analysis and observation apparatus A according to the present embodiment can be configured as an all-in-one type apparatus, and it becomes possible to realize everything from observation to analysis just by attaching each optical system to the stand 4. This is effective in improving the usability of the apparatus.
[0265] Also, as illustrated in FIG. 10 and the like, by the unit coupler 64 holding the lens barrel 90 and thus the observation unit 63, the relative position of the analysis optical axis Aa with respect to the observation optical axis Ao becomes constant. Therefore, by relatively moving the observation optical system 9 and the analysis optical system 7 by the distance D1 corresponding to that relative position, observation and analysis of the same location can be performed.
[0266] Also, as illustrated in FIG. 10 and the like, arranging the two optical axes Ao and Aa along the moving directions of both optical systems 7 and 9 by the unit switching mechanism 65 is advantageous for performing observation and analysis of the same location.
[0267] Also, as illustrated in FIG. 2 and the like, by configuring the unit coupler 64 to be attached to the outer surface (the protruding portion 70c) of the analysis housing 70, the analysis optical system 7 and the observation optical system 9 can be made into detachable and completely independent optical units, which is advantageous for making specifications suitable for their respective uses.
[0268] Here, since the lens barrel 90 and the observation unit 63 are to be attached to the outer surface of the analysis housing 70 via the unit coupler 64, it becomes easy to replace the observation optical system 9 as a whole with the lens barrel 90 or the observation unit 63. At the same time, it also becomes extremely easy to replace some elements of the observation optical system 9 (for example, the objective lens 92) by manual work or the like. This is effective in improving the usability of the device.
[0269] Also, as illustrated in FIG. 9, by configuring the unit coupler 64 to selectively hold any one of a plurality of types of lens barrels 90, 90', 90'' or observation units 63, 63', 63'', it becomes easy to replace the observation optical system 9 having desired characteristics such as the magnification of the objective lens 92 as a whole with the lens barrel 90 or the observation unit 63, which is advantageous in improving the usability of the device.
[0270] Also, as illustrated in FIG. 11B etc., before and after the movement by the unit switching mechanism 65, observation and analysis of the sample SP can be performed from the same angle. Thereby, the deviation between the observation position by the observation optical system 9 and the analysis position by the analysis optical system 7 is further eliminated, which is more advantageous for improving the usability of the device.
[0271] Also, as illustrated in FIG. 1 etc., the analysis and observation apparatus A according to the present embodiment is configured such that the control unit 21 that performs the processing related to the observation optical system 9 and the control unit 21 that performs the processing related to the analysis optical system 7 are common. Thereby, while providing two independent optical systems 7, 9, the control unit 21 can be shared, and the number of components can be reduced, and the processing related to both of the two optical systems 7, 9 can be executed smoothly.
[0272] Also, as illustrated in FIG. 11B and the like, when moving the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 51, the unit switching mechanism 65 is configured to move the observation optical system 9 and the analysis optical system 7 instead of the mounting table 51. By configuring in this way, regardless of the position where the sample SP on the stage 5 is placed, the same location as the observation location can be analyzed.
[0273] (Other characteristic parts) Also, as shown in FIG. 6 and the like, the analysis and observation apparatus A according to the present embodiment is an analysis apparatus that condenses laser light and irradiates a sample SP as an analysis object, and analyzes the components contained in the sample SP based on the spectral spectrum of the light generated from the sample SP. The analysis and observation apparatus A includes an analysis housing 70 that houses the analysis optical system 7, a stand 4 that holds the analysis housing 70, an observation housing (housing of the observation unit 63) that houses the observation optical system 9, and a unit coupler 64 provided on the stand 4 or the analysis housing 70 and serving as a holding unit that holds the observation housing.
[0274] Here, the analysis optical system 7 includes an electromagnetic wave emission unit 71 as a laser oscillator that emits laser light to the sample SP, and first and second detectors 77A and 77B as detectors that disperse the light generated in the sample SP when the laser light emitted from the electromagnetic wave emission unit 71 irradiates the sample SP.
[0275] On the other hand, the observation optical system 9 houses the observation optical system 9 including an objective lens 92 that condenses the light from the sample SP and a second camera 93 as a camera that detects the amount of received light of the light received through the objective lens 92 and observes the sample SP.
[0276] And the analysis and observation apparatus A further includes a control unit 21 that performs component analysis of the sample SP based on the intensity distribution spectrum of the light received by the first and second detectors 77A and 77B and generation of image data of the sample SP based on the amount of received light acquired by the second camera 93.
[0277] As described above, in the analysis and observation apparatus A according to the present embodiment, the unit coupler 64 is provided on the stand 4 or the analysis housing 70, and the observation housing is configured to be attached via the unit coupler 64. As a result, the observation optical system 9 and the analysis optical system 7 can be configured as completely independent units, and the specifications of each unit can be optimized separately.
[0278] Also, as shown in FIG. 11B and the like, by horizontally moving the analysis optical system 7 and the observation optical system 9 integrally with respect to the stage 5, it becomes easy to analyze the same location as the location observed by the observation optical system 9 with the analysis optical system 7.
[0279] Also, as shown in FIG. 6 and the like, by arranging the lens barrel 90 in front of the analysis housing 70, it becomes possible to easily perform operations such as attaching and detaching the objective lens 92. In addition, by laying out the relatively lightweight observation optical system 9 in front compared to the analysis optical system 7, when the observation optical system 9 and the analysis optical system 7 are slid forward, the load acting on the guide rail 65a (more specifically, the moment of the force acting on the tip of the guide rail 65a) is reduced, which is advantageous for stabilizing the support of both optical systems 7 and 9 without rattling them. Furthermore, by laying out the observation optical system 9 in front, it becomes possible to easily attach and detach it when selecting the optimal observation optical system 9.
[0280] 《Other Embodiments》 (Modification Example Related to Hardware Configuration) In the above embodiment, the analysis optical system 7 is configured to tilt integrally with the observation optical system 9, but the present disclosure is not limited to such a configuration. The tilting mechanism 45 may tilt at least only the observation optical system 9. When configured to tilt only the observation optical system 9, the laser light as an electromagnetic wave is emitted downward from directly above the sample SP.
[0281] In the above-described embodiment, the unit switching mechanism 65 is configured to move the observation optical system 9 and the analysis optical system 7 instead of the mounting table 51 when moving the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 51. With such a configuration, vibration of the stage 5 can be suppressed, and positional fluctuations of the observation object caused by the movement of the stage 5 can be suppressed. However, the present disclosure is not limited to such a configuration. It is also possible to configure to move the mounting table 51 instead of the observation optical system 9 and the analysis optical system 7. Further, both the observation optical system 9 and the analysis optical system 7 may be integrally moved, and the mounting table 51 may also be moved so that observation and analysis at the same location can be performed.
[0282] In the above-described embodiment, the stand 4 supports the analysis optical system 7 from behind, and the observation optical system 9 is arranged on the front side of the analysis optical system 7. However, the present disclosure is not limited to such a configuration. The observation optical system 9 may be arranged between the stand 4 and the analysis optical system 7.
[0283] Further, instead of arranging the observation optical system 9 outside the analysis housing 70 as in the above-described embodiment, the observation optical system 9 can also be arranged inside the analysis housing 70. In that case, the observation optical system 9 may be arranged inside the analysis housing 70 in a state of being housed in the housing of the entire observation unit 63 including the lens barrel 90, or in a state of not being housed in such a housing, that is, components included in the observation optical system 9 such as an observation camera and a lens barrel may be arranged inside the analysis housing 70.
[0284] In the above-described embodiment, the unit coupler 64 as the lens barrel holding means is configured to fix the lens barrel 90 and thus the observation unit 63 to the analysis optical system 7. However, the present disclosure is not limited to such a configuration. By holding the second camera 93 instead of the observation unit 63, the relative position of the analysis optical axis Aa with respect to the observation optical axis Ao can also be fixed.
[0285] (Modification example related to emission limitation of laser light) In the above-described embodiment, the emission of the laser beam was configured to be permitted or restricted according to the magnitude of the inclination θ. However, the present disclosure is not limited to such a configuration.
[0286] Specifically, according to a modification example of the present disclosure, when the analysis optical system 7 and the observation optical system 9 are integrally inclined, the analysis optical system 7 restricts the emission of the laser beam regardless of the inclination θ of the analysis optical system 7 with respect to the reference axis As.
[0287] According to this modification example, when the analysis optical system 7 is inclined, the emission of the laser beam is restricted regardless of the magnitude of the inclination θ. As a result, a safer configuration can be realized.
Explanation of Reference Numerals
[0288] A Analysis and Observation Device (Analysis Device) 1 Optical System Unit Group 2 Controller Main Body 21 Control Unit 212 Notification Control Unit 22 Display Unit 4 Stand 45 Inclination Mechanism 5 Stage 51 Mounting Table 51a Mounting Surface 6 Head Unit 62 Analysis Unit 63 Observation Unit 64 Unit Coupling Member (Lens Barrel Holding Means) 65 Unit Switching Mechanism (Horizontal Driving Mechanism) 7 Analysis Optical System 70 Analysis Housing 71 Electromagnetic Wave Emission Unit (Laser Oscillator) 74 Reflective Objective Lens (First Objective Lens) 77A First Detector (Detector) 77B Second Detector (Detector) 83 Shielding Member (Emission Restriction Means) 9 Observation Optical System 90 Lens Barrel 92 Objective lens (second objective lens) 93 Second camera (camera) As Reference axis Ao Observation optical axis (second optical axis) Aa Analysis optical axis (first optical axis) Sw3 First tilt inclination sensor (tilt detection means) Sw4 Second tilt sensor (tilt detection means) SP Sample (object to be analyzed)
Claims
1. An analyzer for performing component analysis of an object to be analyzed, comprising: a stage having a placement surface for placing the object to be analyzed; a laser oscillator that emits laser light, having a first optical axis extending along a predetermined direction, condensing the laser light emitted from the laser oscillator and irradiating the object to be analyzed placed on the stage, and condensing the light generated in the object to be analyzed by irradiating the laser light, and a first objective lens, and a spectroscope that generates a spectral spectrum that is an intensity distribution for each wavelength of the light generated in the object to be analyzed and condensed by the first objective lens, an analysis optical system; a second objective lens having a second optical axis parallel to the first optical axis, for condensing the light from the object to be analyzed, and a camera that images the object to be analyzed by detecting the amount of light received from the object to be analyzed received through the second objective lens, an observation optical system; a tilting mechanism that tilts at least the observation optical system among the analysis optical system and the observation optical system with respect to a predetermined reference axis perpendicular to the placement surface; In a state where the posture in which at least the observation optical system is tilted by the tilting mechanism is maintained so that imaging of the object to be analyzed by the observation optical system and generation of the spectral spectrum by the analysis optical system are performed on the same location on the object to be analyzed, a horizontal drive mechanism that moves the relative positions of the observation optical system and the analysis optical system with respect to the stage in a direction extending parallel to the central axis of the swing by the tilting mechanism. An analyzer characterized by the above.
2. In the analyzer according to claim 1, the tilting mechanism integrally tilts the analysis optical system and the observation optical system while maintaining the relative position of the second optical axis with respect to the first optical axis. An analyzer characterized by the above.
3. In the analyzer according to claim 2, an emission limiting means operable to limit the emission of laser light from the laser oscillator, a tilt detection means for detecting the tilt of the observation optical system with respect to the reference axis, and a control unit that limits the emission of the laser light via the emission limiting means when the tilt detected by the tilt detection means exceeds a predetermined first threshold value. An analyzer characterized by the above.
4. In the analyzer according to claim 3, notification means for notifying the user of the emission of the laser light based on the detection result by the tilt detection means. An analyzer characterized by the above.
5. In the analyzer according to claim 4, the notification means switches the content of the notification to the user according to the inclination detected by the inclination detection means An analyzer characterized by the above.
6. In the analyzer according to claim 4 or 5, the notification by the notification means includes at least a notification indicating that the emission of the laser light is not recommended An analyzer characterized by the above.
7. In the analyzer according to any one of claims 3 to 6, it includes an analysis housing that houses the analysis optical system, the emission limiting means is constituted by a shielding member that is disposed in the analysis housing and can be inserted into the optical path of the laser light An analyzer characterized by the above.
8. In the analyzer according to any one of claims 3 to 6, it further includes an analysis housing that houses the analysis optical system, and a shielding cover that can be attached to the first objective lens or the analysis housing, the control unit determines whether the shielding cover is attached to the first objective lens or the analysis housing. When it is determined that the shielding cover is attached to the first objective lens or the analysis housing, regardless of the inclination of the analysis optical system with respect to the reference axis, the emission of the laser light is allowed, while when it is determined that the shielding cover is not attached to the first objective lens or the analysis housing, the emission of the laser light is restricted according to the inclination of the analysis optical system with respect to the reference axis An analyzer characterized by the above.
9. In the analyzer according to claim 2, when the analysis optical system and the observation optical system are integrally inclined, regardless of the inclination of the analysis optical system with respect to the reference axis, the emission of the laser light is restricted An analyzer characterized by the above.
10. In the analyzer according to any one of claims 1 to 9, it includes a stand configured to be able to attach the mounting table, the observation optical system, and the analysis optical system An analyzer characterized by the above.
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