Freestanding films coated with carbon nanostructures

A parylene-coated free-standing film of carbon nanostructures addresses EUV lithography defects by reducing gas permeability and maintaining radiation transparency, enhancing structural integrity and preventing oxidation.

JP7720671B1Active Publication Date: 2025-08-14カナトゥ フィンランド オイ
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Patent Information

Application Number
JP2025069268
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2024-04-26
Filing Date
2025-04-21
Publication Date
2025-08-14
Estimated Expiration
2045-04-21

AI Technical Summary

Technical Problem

Printing defects in EUV lithography pose a significant limitation to the adoption of extreme ultraviolet lithography, necessitating sophisticated particle filters.

Method used

A structure comprising a free-standing film of carbon nanostructures coated with a parylene coating of 5 to 200 nm thickness, attached to a support, which reduces gas permeability while allowing transmission of ionizing radiation.

Benefits of technology

The parylene coating enhances the structure's ability to block gases while maintaining transparency to ionizing radiation, preventing oxidation of metal-based coatings, and improving mechanical properties.

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Abstract

Print defects are a major limitation to the uptake of EUV lithography. [Solution] A structure is disclosed that includes a coated, free-standing film attached to a support. The free-standing film is a free-standing film of carbon nanostructures, and a parylene coating having a thickness of 5 to 200 nm is provided on the free-standing film. Also disclosed is the use of the parylene coating to reduce gas permeability while allowing transmission of ionizing radiation by providing a parylene coating having a thickness of 5 to 200 nm on a structure that includes a free-standing film of carbon nanostructures attached to a support and a metal-based coating.
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