Optical laminate, method for manufacturing optical laminate, optical member, optical device, method for manufacturing optical member, and method for manufacturing optical device

Abstract

To provide an optical laminate having a void of a void layer into which a binder, an adhesive or the like hardly penetrates.SOLUTION: An optical laminate 10a or 10b of the invention includes a void layer 12 and a low moisture permeable layer 13 formed on the void layer 12. The low moisture permeable layer 13 contains at least one selected from the group consisting of a metal, a metal oxide, silicon, a silicon oxide, and an organic-inorganic hybrid material and has a steam permeability of 35 g / m2 day or less measured by a cup method stipulated by JIS Z 0208-1976.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an optical laminate, a method for manufacturing an optical laminate, an optical member, an optical device, a method for manufacturing an optical member, and a method for manufacturing an optical device. [Background technology]

[0002] In optical devices, for example, an air layer with a low refractive index is used as a total reflection layer. Specifically, for example, optical film components (e.g., a light guide plate and a reflector) in a liquid crystal device are laminated with an air layer between them. However, if the components are separated by an air layer, problems such as bending of the components may occur, especially when the components are large. Furthermore, due to the trend toward thinner devices, integration of the components is desired. Therefore, components are integrated with adhesives without an air layer (e.g., Patent Document 1). However, if the air layer that performs the role of total reflection is lost, optical properties such as light leakage may be degraded.

[0003] Therefore, it has been proposed to use a low refractive index layer instead of the air layer. For example, Patent Document 2 describes a structure in which a layer having a lower refractive index than the light guide plate is inserted between the light guide plate and the reflector. As the low refractive index layer, for example, an air gap layer having voids is used in order to make the refractive index as low as possible to that of air.

[0004] Furthermore, in order to introduce a void layer into a device, it has also been proposed to integrate the void layer with an adhesive layer (Patent Document 3). [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2012-156082 [Patent Document 2] Japanese Patent Application Publication No. 10-62626 [Patent Document 3] Japanese Patent Application Laid-Open No. 2014-46518 Summary of the Invention [Problem to be solved by the invention]

[0006] However, if a pressure-sensitive adhesive layer or the like is formed directly on the void layer, the pressure-sensitive adhesive, adhesive, etc. may penetrate into the voids of the void layer, which may reduce the porosity of the void layer. The higher the porosity of the void layer, the more likely the pressure-sensitive adhesive, adhesive, etc. to penetrate into the voids. Furthermore, the reduction in the porosity of the void layer may increase the refractive index of the void layer, which may cause the void layer to no longer function as a low-refractive-index layer.

[0007] Therefore, the present invention aims to provide an optical laminate in which pressure-sensitive adhesives, adhesives, etc. are less likely to penetrate into the voids of the void layer, a method for manufacturing an optical laminate, an optical element, an optical device, a method for manufacturing an optical element, and a method for manufacturing an optical device. [Means for solving the problem]

[0008] In order to achieve the above object, the optical laminate of the present invention is a gap layer and a low moisture permeable layer formed on the gap layer, The low moisture permeable layer contains at least one selected from the group consisting of metal, metal oxide, silicon, silicon oxide, and organic-inorganic hybrid material, and has a water vapor transmission rate of 35 g / m2 measured by the cup method specified in JIS Z 0208-1976. 2 ·day or less.

[0009] The method for producing the optical laminate of the present invention comprises: a low-moisture-permeable layer forming step of forming the low-moisture-permeable layer on at least one surface of the air gap layer, The method for producing the optical laminate of the present invention is characterized in that in the low-moisture-permeable layer formation step, the low-moisture-permeable layer is formed by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD).

[0010] The optical member of the present invention is characterized by including the optical laminate of the present invention.

[0011] The optical device of the present invention is characterized by including the optical member of the present invention.

[0012] The method for manufacturing an optical element of the present invention is characterized by including an optical laminate manufacturing step of manufacturing the optical laminate of the present invention by the method for manufacturing an optical laminate of the present invention.

[0013] The method for manufacturing an optical device of the present invention is characterized by including an optical member manufacturing step of manufacturing the optical member of the present invention by the method for manufacturing an optical member of the present invention. [Effects of the Invention]

[0014] According to the present invention, it is possible to provide an optical laminate in which pressure-sensitive adhesives, adhesives, etc. are less likely to penetrate into the voids of the void layer, a method for manufacturing an optical laminate, an optical element, an optical device, a method for manufacturing an optical element, and a method for manufacturing an optical device. [Brief explanation of the drawings]

[0015] [Figure 1] Fig. 1(a) is a cross-sectional view showing an example of the configuration of the optical laminate of the present invention. Fig. 1(b) is a cross-sectional view showing another example of the configuration of the optical laminate of the present invention. Fig. 1(c) is a cross-sectional view showing an example of the configuration of the optical laminate not including a low moisture-permeable layer. [Figure 2] 2(a) to 2(d) are cross-sectional views showing an example of steps in the method for producing an optical layered body of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0016] Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following description in any way.

[0017] In the optical layered body of the present invention, for example, the porosity of the porous layer may be 30% by volume or more.

[0018] In the optical layered body of the present invention, for example, the low moisture-permeable layer may contain at least one selected from the group consisting of silicon, aluminum, silicon dioxide, aluminum oxide, zinc tin composite oxide (ZTO), indium tin composite oxide (ITO), indium zinc composite oxide (IZO), gallium zinc composite oxide (GZO), and polysiloxane.

[0019] In the optical layered body of the present invention, for example, the low moisture-permeable layer may have a thickness of 5 nm or more.

[0020] In the optical layered body of the present invention, for example, the low moisture-permeable layer may be a layer formed by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD).

[0021] In the optical layered body of the present invention, for example, the porous layer may be a porous body in which microporous particles of a silicon compound are chemically bonded to each other.

[0022] The optical layered body of the present invention may further include, for example, a tacky adhesive layer, and the tacky adhesive layer may be provided on the surface of the low moisture-permeable layer opposite to the porous layer.

[0023] The optical layered body of the present invention may have a haze value of less than 10%, for example.

[0024] In the present invention, "on" or "on the surface" may refer to a state of being in direct contact with the surface or a state of being via another layer or the like.

[0025] In the present invention, the term "adhesive layer" refers to a layer formed of at least one of a pressure-sensitive adhesive and an adhesive. In addition, in the present invention, a pressure-sensitive adhesive and an adhesive may be collectively referred to as a "pressure-sensitive adhesive." Generally, a distinction is made between an agent having relatively weak adhesive or bonding strength (e.g., an agent that allows the adherend to be removably attached) and an agent having relatively strong adhesive or bonding strength (e.g., an agent that makes it impossible or extremely difficult to removably attach the adherend) and being called an "adhesive." In the present invention, there is no clear distinction between a pressure-sensitive adhesive and an adhesive. In the present invention, there is no clear distinction between "adhesive strength" and "adhesive strength."

[0026] In the present invention, there is no clear distinction between a "sheet" and a "film." Generally, a relatively thick material is called a "sheet," and a relatively thin material is called a "film," but in the present invention, there is no clear distinction between a "sheet" and a "film."

[0027] [1. Optical laminate, optical member, and optical device] As described above, the optical laminate of the present invention comprises a porous layer and a low-moisture-permeable layer formed on the porous layer, and the low-moisture-permeable layer comprises at least one selected from the group consisting of metal, metal oxide, silicon, silicon oxide, and organic-inorganic hybrid material, and has a water vapor transmission rate of 35 g / m or more as measured by the cup method specified in JIS Z 0208-1976. 2 ·day or less.

[0028] The cross-sectional view of Figure 1(a) shows an example of the configuration of an optical laminate of the present invention. As shown in the figure, this optical laminate 10a has a substrate 11 on which a porous layer 12 is formed, and a low-moisture-permeable layer 13 is further formed on the porous layer 12. The porous layer 12 has a porosity of 30% by volume or more. The low-moisture-permeable layer 13 contains at least one material selected from the group consisting of metals, metal oxides, silicon, silicon oxides, and organic-inorganic hybrid materials.

[0029] 1(b) shows a cross-sectional view of another example of the configuration of the optical laminate of the present invention. As shown in the figure, this optical laminate 10b is the same as the optical laminate 10a of FIG. 1(a) except that a tacky adhesive layer 14 is further provided on the surface of the low-moisture-permeable layer 13 opposite to the air gap layer 12.

[0030] 1(c) shows an example of the configuration of an optical laminate 20 that does not include a low-moisture-permeable layer. As shown in the figure, this optical laminate 20 is the same as the optical laminate 10b in FIG. 1(b) except that it does not include a low-moisture-permeable layer 13 and that an adhesive layer 14 is provided on the air gap layer 12 in a state of direct contact with the air gap layer 12.

[0031] For example, in an optical laminate, if a pressure-sensitive adhesive layer is provided in direct contact with a void layer as shown in Figure 1(c), the pressure-sensitive adhesive or the like forming the pressure-sensitive adhesive layer may penetrate into the voids of the void layer, reducing the porosity of the void layer and thereby increasing the refractive index of the void layer. In response to this, the present inventors have found that by providing a low moisture-permeable layer on the void layer, an optical laminate can be provided in which pressure-sensitive adhesives, adhesives, etc. are less likely to penetrate into the voids of the void layer, and have arrived at the present invention.

[0032] As described above, the optical laminate of the present invention includes the void layer and a low-moisture-permeable layer formed on the void layer. The optical laminate of the present invention may or may not include layers other than the void layer and the low-moisture-permeable layer. For example, the other layer may or may not include a substrate 11 as shown in FIGS. 1(a) and 1(b). For example, the other layer may or may not include a tacky-adhesive layer 14 as shown in FIG. 1(b). Furthermore, other layers may or may not be included between the substrate 11, the void layer 12, the low-moisture-permeable layer 13, and the tacky-adhesive layer 14.

[0033] 1(a) and 1(b), the substrate 11 is not particularly limited and may be, for example, a substrate such as a film. Examples of suitable substrates include, but are not limited to, substrates made of thermoplastic resins, glass substrates, inorganic substrates such as silicon, plastics molded from thermosetting resins, semiconductor elements, and carbon fiber materials such as carbon nanotubes. Examples of the substrate include films and plates. Examples of thermoplastic resins include polyethylene terephthalate (PET), acrylic, cellulose acetate propionate (CAP), cycloolefin polymer (COP), triacetyl cellulose (TAC), polyethylene naphthalate (PEN), polyethylene (PE), and polypropylene (PP). The thickness of the substrate 11 is not particularly limited, but may be 10 μm or more, 20 μm or more, or 30 μm or more, and may be, for example, 1000 μm or less, 500 μm or less, 400 μm or less, 300 μm or less, 200 μm or less, or 100 μm or less, for example, 10 μm to 1000 μm, 10 μm to 500 μm, or 10 μm to 100 μm. From the viewpoint of a thin optical laminate, it is preferable that the thickness of the substrate 11 is not too large. On the other hand, from the viewpoint of the strength of the optical laminate, it is preferable that the thickness of the substrate 11 is not too small.

[0034] 1(a) and 1(b), the void layer 12 has a porosity of 30% by volume or more, as described above. The void layer in the optical laminate of the present invention (hereinafter, sometimes referred to as the "void layer of the present invention") will be described below using examples. However, the void layer of the present invention is not limited thereto.

[0035] The porous layer of the present invention may have a porosity of, for example, 30% by volume or more, as described above, or 35% by volume or more. The porous layer of the present invention may have a peak pore size of, for example, 50 nm or less. However, this is merely an example, and the porous layer of the present invention is not limited thereto.

[0036] The porosity may be, for example, 30% by volume or more, 35% by volume or more, 38% by volume or more, or 40% by volume or more, or 90% by volume or less, 80% by volume or less, or 75% by volume or less. The porous layer of the present invention may be, for example, a highly porous layer having a porosity of 60% by volume or more.

[0037] The porosity can be measured, for example, by the following measurement method.

[0038] (Method for measuring void ratio) If the layer to be measured for porosity is a single layer containing only voids, the ratio (volume ratio) of the layer's constituent material to air can be calculated using standard methods (e.g., measuring weight and volume to calculate density), allowing the porosity (volume %) to be calculated. Furthermore, since there is a correlation between refractive index and porosity, the porosity can also be calculated from the refractive index value of the layer. Specifically, the porosity can be calculated using the Lorentz-Lorenz formula from the refractive index value measured with an ellipsometer, for example.

[0039] The porous layer of the present invention can be produced, for example, by chemically bonding pulverized gel (microporous particles) as described below. In this case, the pores in the porous layer can be conveniently divided into the following three types (1) to (3). (1) The voids in the raw gel itself (within the particles) (2) Possibility of voids in the gel pulverized material units (3) Voids between the crushed gel particles due to accumulation of the crushed gel particles

[0040] The voids (2) are voids formed during pulverization, separate from the voids (1) that can be formed within each block when each particle group produced by pulverizing the gel is considered as a single block, regardless of the size, dimensions, etc., of the pulverized gel (microporous particles). The voids (3) are voids that arise during pulverization (e.g., medialess pulverization) due to the uneven size, dimensions, etc., of the pulverized gel (microporous particles). The porous layer of the present invention has, for example, the voids (1) to (3) described above, and thereby has an appropriate porosity and peak pore diameter.

[0041] The peak pore diameter may be, for example, 5 nm or more, 10 nm or more, or 20 nm or more, or 50 nm or less, 40 nm or less, or 30 nm or less. If the peak pore diameter is too large in a porous layer when the porosity is high, light will be scattered and the layer will become opaque. In the present invention, the lower limit of the peak pore diameter of the porous layer is not particularly limited, but if the peak pore diameter is too small, it will be difficult to increase the porosity, so it is preferable that the peak pore diameter is not too small. In the present invention, the peak pore diameter can be measured, for example, by the following method.

[0042] (Method for measuring peak pore diameter) A pore size distribution / specific surface area measuring device (BELLSORP MINI, trade name of Microtrack Bell Co.) is used to calculate the peak pore size from the results of calculating the BJH plot and BET plot by nitrogen adsorption and the isothermal adsorption curve.

[0043] The thickness of the porous layer of the present invention is not particularly limited, and may be, for example, 100 nm or more, 200 nm or more, or 300 nm or more, or 10,000 nm or less, 5,000 nm or less, or 2,000 nm or less.

[0044] As described below, the porous layer of the present invention uses a pulverized porous gel, destroying the three-dimensional structure of the porous gel and forming a new three-dimensional structure different from the porous gel. Thus, the porous layer of the present invention is a layer having a new pore structure (new void structure) that cannot be obtained in a layer formed from the porous gel, thereby forming a nanoscale void layer with high porosity. Furthermore, when the porous layer of the present invention is a silicone porous body, the pulverized materials are chemically bonded together while adjusting the number of siloxane bond functional groups in the silicon compound gel. Here, "silicone porous body" refers to a polymeric porous body containing siloxane bonds, including, for example, a porous body containing silsesquioxane as a structural unit. Furthermore, after a new three-dimensional structure is formed as a precursor of the porous layer, the void layer is chemically bonded (e.g., crosslinked) in a bonding process. Therefore, when the porous layer of the present invention is a functional porous body, the void layer has a voided structure but maintains sufficient strength and flexibility. Therefore, according to the present invention, a porous layer can be easily and simply applied to various objects.

[0045] The porous layer of the present invention contains, for example, pulverized porous gel, and the pulverized materials are chemically bonded together, as described below. In the porous layer of the present invention, the form of chemical bonding (chemical bonding) between the pulverized materials is not particularly limited, and specific examples of the chemical bonding include cross-linking. The method for chemically bonding the pulverized materials together is, for example, as described in detail in the method for manufacturing the porous layer described above.

[0046] The crosslinked bond is, for example, a siloxane bond. Examples of siloxane bonds include the T2 bond, T3 bond, and T4 bond shown below. When the silicone porous body of the present invention has siloxane bonds, it may have, for example, any one type of bond, any two types of bonds, or all three types of bonds. The higher the ratio of T2 and T3 among the siloxane bonds, the greater the flexibility and the gel's inherent properties can be expected, but the film strength will be weaker. On the other hand, if the ratio of T4 among the siloxane bonds is high, the film strength will be easily achieved, but the void size will be small and the flexibility will be weaker. For this reason, it is preferable to change the ratios of T2, T3, and T4 depending on the application, for example.

[0047] [ka]

[0048] When the porous layer of the present invention has the siloxane bond, the ratio of T2, T3 and T4, when expressed relatively with T2 set to "1", is, for example, T2:T3:T4=1:[1-100]:[0-50], 1:[1-80]:[1-40], 1:[5-60]:[1-30].

[0049] In addition, in the porous layer of the present invention, the silicon atoms contained therein are preferably siloxane-bonded. Specifically, the proportion of unbonded silicon atoms (i.e., residual silanols) among all silicon atoms contained in the silicone porous body is, for example, less than 50%, 30% or less, or 15% or less.

[0050] The porous layer of the present invention has, for example, a pore structure. In the present invention, the pore size of the pores refers to the diameter of the major axis of the pores (pores) out of the diameter of the major axis and the diameter of the minor axis. The pore size is, for example, 5 nm to 50 nm. The pore size has a lower limit of, for example, 5 nm or more, 10 nm or more, or 20 nm or more, and an upper limit of, for example, 50 nm or less, 40 nm or less, or 30 nm or less, and the range is, for example, 5 nm to 50 nm, or 10 nm to 40 nm. The preferred pore size is determined depending on the application of the pore structure, and therefore, it is necessary to adjust the pore size to a desired size depending on, for example, the purpose. The pore size can be evaluated, for example, by the following method.

[0051] (Cross-sectional SEM observation of void layer) In the present invention, the morphology of the void layer can be observed and analyzed using a scanning electron microscope (SEM). Specifically, for example, the void layer is subjected to FIB processing (acceleration voltage: 30 kV) under cooling, and a cross-sectional sample obtained is subjected to FIB-SEM (manufactured by FEI: product name Helios NanoLab600, acceleration voltage: 1 kV) to obtain a cross-sectional electron image at a magnification of 100,000 times.

[0052] (Evaluation of void size) In the present invention, the pore size can be quantified by the BET test method. Specifically, 0.1 g of a sample (the porous layer of the present invention) is placed in the capillary of a pore distribution / specific surface area analyzer (BELLSORP MINI, a product name of Microtrack Bell), and then dried under reduced pressure at room temperature for 24 hours to remove gas from the pore structure. Nitrogen gas is then adsorbed onto the sample, and a BET plot, a BJH plot, and an adsorption isotherm are plotted to determine the pore distribution. This allows the pore size to be evaluated.

[0053] The void layer of the present invention may have, for example, a pore structure (porous structure) as described above, and may be, for example, an open-cell structure in which the pore structure is continuous. The open-cell structure means, for example, that the pore structure in the void layer is connected three-dimensionally, and can also be described as a state in which the internal voids of the pore structure are continuous. When a porous material has an open-cell structure, it is possible to increase the porosity in the bulk, but an open-cell structure cannot be formed when closed-cell particles such as hollow silica are used. In contrast, the void layer of the present invention has a three-dimensional dendritic structure in which the sol particles (pulverized porous gel forming the sol) have a three-dimensional dendritic structure, and therefore, the dendritic particles can easily form an open-cell structure in a coating film (a coating film of a sol containing the pulverized porous gel). Furthermore, the void layer of the present invention preferably forms a monolithic structure in which the open-cell structure has a plurality of pore distributions. The monolithic structure refers to, for example, a structure in which nano-sized fine voids exist and a hierarchical structure in which the nano-voids exist as an open-cell structure. When forming the monolithic structure, for example, it is possible to achieve both membrane strength with fine pores and high porosity with coarse open-cell pores. To form such a monolithic structure, for example, it is important to first control the pore distribution of the pore structure to be generated in the porous gel prior to pulverization into the pulverized material. Furthermore, for example, when pulverizing the porous gel, the particle size distribution of the pulverized material can be controlled to a desired size, thereby forming the monolithic structure.

[0054] In the air-voided layer of the present invention, the haze indicating transparency is not particularly limited, and its lower limit is, for example, 0.1% or more, 0.2% or more, or 0.3% or more, and its upper limit is, for example, 10% or less, 5% or less, or 3% or less, and its range is, for example, 0.1 to 10%, 0.2 to 5%, or 0.3 to 3%.

[0055] The haze can be measured, for example, by the following method.

[0056] (Hayes's review) The porous layer (porous layer of the present invention) is cut to a size of 50 mm x 50 mm, and is set in a haze meter (HM-150 manufactured by Murakami Color Research Laboratory Co., Ltd.) to measure the haze. The haze value is calculated using the following formula. Haze (%) = [Diffuse transmittance (%) / Total light transmittance (%)] x 100 (%)

[0057] The refractive index of a medium is generally defined as the ratio of the propagation velocity of a wavefront of light in a vacuum to the propagation velocity within the medium. The refractive index of the air-gap layer of the present invention is not particularly limited, and its upper limit is, for example, 1.3 or less, less than 1.3, 1.25 or less, 1.2 or less, or 1.15 or less, and its lower limit is, for example, 1.05 or more, 1.06 or more, or 1.07 or more, and its range is, for example, 1.05 or more to 1.3 or less, 1.05 or more to 1.3 or less, 1.05 or more to 1.25 or less, 1.06 or more to 1.25 or less, or 1.07 or more to 1.15 or less.

[0058] In the present invention, the refractive index is measured at a wavelength of 550 nm unless otherwise specified. The method for measuring the refractive index is not particularly limited, and can be measured, for example, by the following method.

[0059] (Refractive index evaluation) After forming a void layer (void layer of the present invention) on an acrylic film, it was cut to a size of 50 mm x 50 mm and attached to the surface of a glass plate (thickness: 3 mm) using an adhesive layer. The center of the back surface of the glass plate (diameter: approximately 20 mm) was painted with black ink to prepare a sample that was not reflective on the back surface of the glass plate. The sample was placed in an ellipsometer (JA Woollam Japan: VASE) and the refractive index was measured at a wavelength of 550 nm and an incident angle of 50 to 80 degrees, and the average value was taken as the refractive index.

[0060] The thickness of the porous layer of the present invention is not particularly limited, and the lower limit is, for example, 0.05 μm or more, 0.1 μm or more, and the upper limit is, for example, 1000 μm or less, 100 μm or less, and the range is, for example, 0.05 to 1000 μm, 0.1 to 100 μm.

[0061] The form of the void layer of the present invention is not particularly limited, and for example, it may be in the form of a film or a block shape or the like.

[0062] In FIGS. 1(a) and 1(b), the low moisture permeability layer 13 contains at least one selected from the group consisting of metals, metal oxides, silicon, silicon oxides, and organic-inorganic hybrid materials. Hereinafter, the low moisture permeability layer used in the optical laminate of the present invention (hereinafter sometimes referred to as "the low moisture permeability layer of the present invention") will be described with examples.

[0063] In the low moisture permeability layer of the present invention, the metal is not particularly limited, and examples thereof include aluminum, zinc, tin, indium, gallium, lead, and the like. The metal oxide is not particularly limited, and examples thereof include, as described above, aluminum oxide (for example, Al2O3), zinc tin composite oxide (ZTO), indium tin composite oxide (ITO), indium zinc composite oxide (IZO), gallium zinc composite oxide (GZO), and the like. In the present invention, the silicon oxide is a compound represented by, for example, SiOx (0 < x ≤ 2). The silicon oxide is not particularly limited, and examples thereof include silicon dioxide (SiO2) and the like. The organic-inorganic hybrid material is not particularly limited, and examples thereof include polysiloxane resin, silsesquioxane resin, and the like. Here, in the present invention, the "organic-inorganic hybrid material" means a material in which both an organic component and an inorganic component are present in the same molecule.

[0064] The low moisture permeability layer of the present invention may or may not contain other components other than at least one component selected from the group consisting of metals, metal oxides, silicon, silicon oxides, and organic-inorganic hybrid materials. When the low moisture permeability layer of the present invention contains the other components, the content thereof is not particularly limited, and for example, it may be 10% by mass or less, 5% by mass or less, or 1% by mass or less, and the lower limit value is not particularly limited, and for example, it is a value exceeding 0% by mass.

[0065] The method for forming the low moisture-permeable layer of the present invention is not particularly limited, but is preferably a so-called dry process (a formation method without using a solvent). Specifically, for example, as described above, the low moisture-permeable layer may be formed by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD). The specific method for performing vacuum deposition, sputtering, and chemical vapor deposition (CVD) is also not particularly limited, and may be, for example, the same as or similar to a general method.

[0066] As described above, the low moisture-permeable layer of the present invention has a water vapor transmission rate of 35 g / m2 measured by the cup method specified in JIS Z 0208-1976. 2 ·day or less. The water vapor transmission rate of the low moisture-permeable layer of the present invention is measured using a laminate sample obtained by laminating a low moisture-permeable layer on a 30 μm thick acrylic substrate (product name: RZ-30NC-1330, manufactured by Toyo Kohan Co., Ltd.) under the same conditions as those for the low moisture-permeable layer of the present invention, with the low moisture-permeable layer facing inward in a cup and the acrylic substrate facing outward. In the present invention, the unit of the water vapor transmission rate is "g / m 2 The "day" in "day" is synonymous with 24 hours. The water vapor permeability is, for example, 30 g / m 2 ·day or less, 28g / m 2 -day or less, or 26g / m 2 The lower limit of the water vapor transmission rate is not particularly limited, but may be, for example, 0 g / m 2 day or 0g / m 2 It may be a value exceeding 10^-1g / m 2 ·day or more, 10^-2g / m 2·days or more. The mechanism by which a low-moisture permeability layer with such low water vapor transmission rate can inhibit the penetration of adhesives, adhesives, etc. into the voids of the void layer is not clear, but it is thought that, for example, the low-moisture permeability layer blocks molecules (e.g., molecules of adhesives, glue, etc.) smaller than the pore size of the voids of the void layer, preventing the migration of such small molecules into the void layer. Generally, under conditions such as heating and humidification, molecules of adhesives, etc. are more likely to move, and therefore molecules of adhesives, etc., in particular, are more likely to penetrate into the void layer of the void layer. However, the low-moisture permeability layer of the present invention can inhibit the penetration of adhesives, adhesives, etc. into the voids of the void layer, even under such conditions that molecules of adhesives, adhesives, etc. are more likely to penetrate into the void layer of the void layer.

[0067] The method for forming the low-moisture-permeable layer of the present invention, which has a low water vapor permeability as described above, is not particularly limited. For example, the low-moisture-permeable layer of the present invention, which has a low water vapor permeability as described above, can be formed by forming a low-moisture-permeable layer of a certain thickness or more using at least one material selected from the group consisting of metals, metal oxides, silicon, silicon oxides, and organic-inorganic hybrid materials by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD).

[0068] The thickness of the low moisture-permeable layer of the present invention is not particularly limited, and may be, for example, 3 nm or more, 4 nm or more, 5 nm or more, 8 nm or more, 10 nm or more, 20 nm or more, 40 nm or more, 60 nm or more, 80 nm or more, or 100 nm or more, and may be, for example, 200 nm or less, 150 nm or less, 100 nm or less, or 50 nm or less, and may be, for example, 3 to 200 nm, 10 to 200 nm, or 20 to 200 nm. From the viewpoint of a thin optical laminate, it is preferable that the thickness of the low moisture-permeable layer of the present invention is not too large. On the other hand, from the viewpoint of suppressing penetration of the pressure-sensitive adhesive into voids, it is preferable that the thickness of the low moisture-permeable layer of the present invention is not too small.

[0069] In FIG. 1(b), the adhesive layer 14 is not particularly limited, and may be, for example, an adhesive layer formed from an adhesive (adhesive composition). In the optical laminate of the present invention, the thickness of the adhesive layer is not particularly limited, and may be, for example, 3 μm or more, 5 μm or more, or 10 μm or more, and may be, for example, 100 μm or less, 75 μm or less, or 50 μm or less, and may be, for example, 3 to 100 μm, 3 to 50 μm, or 5 to 25 μm. The adhesive is not particularly limited, and examples thereof include (meth)acrylic polymers. These may be dissolved or dispersed in a solvent to form a solution or dispersion, which may be used as the adhesive (adhesive composition). Examples of the solvent include ethyl acetate, and these may be used alone or in combination. The concentration of the solute or dispersoid (e.g., the acrylic polymer) in the solution or dispersion may be, for example, 10% by mass or more, or 15% by mass or more, and may be, for example, 60% by mass or less, 50% by mass or less, 40% by mass or less, or 25% by mass or less. In the present invention, the term "(meth)acrylic polymer" refers to a polymer or copolymer of at least one monomer selected from the group consisting of (meth)acrylic acid, (meth)acrylic acid esters, and (meth)acrylamide. In the present invention, the term "(meth)acrylic acid" refers to "at least one of acrylic acid and methacrylic acid," and the term "(meth)acrylic acid ester" refers to "at least one of acrylic acid esters and methacrylic acid esters." Examples of the (meth)acrylic acid esters include linear or branched alkyl esters of (meth)acrylic acid. In the linear or branched alkyl ester of (meth)acrylic acid, the number of carbon atoms in the alkyl group may be, for example, 1 or more, 2 or more, 3 or more, or 4 or more, and may be, for example, 18 or less, 16 or less, 14 or less, 12 or less, 10 or less, or 8 or less. The alkyl group may be, for example, unsubstituted or substituted with one or more substituents. Examples of the substituent include a hydroxyl group, and when there are multiple substituents, the substituents may be the same or different. Specific examples of the (meth)acrylic acid ester include 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, and 4-hydroxybutyl acrylate.The adhesive may be used alone or in combination of two or more types.

[0070] As described above, the optical layered body of the present invention may or may not include a pressure-sensitive adhesive layer.

[0071] The optical laminate of the present invention may have a light transmittance of 80% or more throughout the optical laminate. Furthermore, as described above, the haze of the entire optical laminate may be less than 10% or 3% or less. The lower limit of the haze of the entire optical laminate is not particularly limited, but is, for example, a value of 0 or more or greater than 0. Note that, for example, in the case of the optical laminate 10a of FIG. 1(a), the "entire optical laminate" refers to the entire structure including the substrate 11, the air gap layer 12, and the low-moisture-permeable layer 13. In the case of the optical laminate 10b of FIG. 1(b), the "entire optical laminate" refers to the entire structure including the substrate 11, the air gap layer 12, the low-moisture-permeable layer 13, and the adhesive layer 14. The light transmittance may be, for example, 82% or more, 84% or more, 86% or more, or 88% or more. The upper limit is not particularly limited, but is ideally 100%, and may be, for example, 95% or less, 92% or less, 91% or less, or 90% or less. The haze of the optical laminate can be measured, for example, by the same method as that for measuring the haze of the porous layer described above. The light transmittance is the transmittance of light with a wavelength of 550 nm, and can be measured, for example, by the following measurement method.

[0072] (Method for measuring light transmittance) The laminate was used as a sample to be measured using a spectrophotometer U-4100 (trade name of Hitachi, Ltd.). The total light transmittance (light transmittance) of the sample was measured, assuming that the total light transmittance of air was 100%. The total light transmittance (light transmittance) value was measured at a wavelength of 550 nm.

[0073] In the optical laminate of the present invention, the adhesive strength or adhesion of the adhesive layer is not particularly limited, and may be, for example, 0.7 N / 25 mm or more, 0.8 N / 25 mm or more, 1.0 N / 25 mm or more, or 1.5 N / 25 mm or more, or 50 N / 25 mm or less, 30 N / 25 mm or less, 10 N / 25 mm or less, 5 N / 25 mm or less, or 3 N / 25 mm or less. From the viewpoint of the risk of peeling during handling when the optical laminate of the present invention is bonded to another layer, it is preferable that the adhesive strength or adhesion of the adhesive layer is not too low. Furthermore, from the viewpoint of rework when re-bonding, it is preferable that the adhesive strength or adhesion of the adhesive layer is not too high. The adhesive strength or adhesion of the adhesive layer can be measured, for example, as follows.

[0074] (Method for measuring adhesive strength or adhesion) The laminate film of the present invention (a resin film substrate on which the optical laminate of the present invention is formed) is sampled into a 50 mm x 140 mm strip, and the sample is fixed to a stainless steel plate with double-sided tape. An acrylic adhesive layer (20 μm thick) is attached to a PET film (T100: manufactured by Mitsubishi Plastics Film Co., Ltd.), and a piece of adhesive tape cut to 25 mm x 100 mm is attached to the side of the laminate film of the present invention opposite the resin film, thereby laminating it with the PET film. The sample is then chucked in an autograph tensile tester (Shimadzu Corporation: AG-Xplus) with a chuck distance of 100 mm, and a tensile test is performed at a tensile speed of 0.3 m / min. The average test force after a 50 mm peel test is taken as the adhesive peel strength, i.e., adhesive strength. Adhesion strength can also be measured using the same measurement method. In the present invention, there is no clear distinction between "adhesive strength" and "adhesive strength."

[0075] The use of the optical laminate of the present invention is not particularly limited, but it can be used, for example, in the optical member of the present invention and the optical device of the present invention.

[0076] The optical member of the present invention is not particularly limited, and may be, for example, an optical film containing the optical laminate of the present invention.

[0077] The optical apparatus (optical device) of the present invention is not particularly limited, and may be, for example, an image display apparatus or a lighting apparatus. Examples of image display apparatuses include liquid crystal displays, organic EL (Electro Luminescence) displays, and micro LED (Light Emitting Diode) displays. Examples of lighting apparatuses include organic EL lighting.

[0078] The uses and methods of using the optical element and the optical device of the present invention are not particularly limited, but may be the same as those of a general optical element or a general optical device (e.g., the image display device or lighting device).

[0079] [2. Methods for manufacturing optical laminates, methods for manufacturing optical members, and methods for manufacturing optical devices] The method for producing the optical layered body of the present invention is not particularly limited, but it can be produced, for example, as follows.

[0080] 2(a) to 2(d) are cross-sectional views showing an example of steps in the method for producing an optical laminate of the present invention. First, as shown in FIG. 2(a), a substrate 11 is prepared. The substrate 11 is not particularly limited, but may be, for example, as described above.

[0081] Next, as shown in FIG. 2(b), a void layer 12 is formed on one surface of the substrate 11 (void layer forming step). The method for forming (manufacturing) the void layer 12 is not particularly limited, but the void layer 12 can be manufactured by, for example, the methods described in International Publication Nos. 2019 / 065999 and 2019 / 065803. The disclosures of these publications are incorporated herein by reference. More specifically, the method for forming the void layer 12 may involve, for example, applying a coating liquid for forming the void layer to one surface of the substrate 11, drying the coating liquid, and, if necessary, curing or crosslinking the coating liquid by light irradiation or chemical treatment (e.g., crosslinking treatment). The coating liquid may be, for example, a sol particle liquid of a pulverized gel-like compound. The gel-like compound may be, for example, a silicon oxide (e.g., silica gel). The method for producing the sol particle liquid of the pulverized gel compound is not particularly limited, and can be produced, for example, by the method described in WO 2019 / 065999 or WO 2019 / 065803. The sol particle liquid can also be produced, for example, by the method described in "Reference Example 1" of the Examples of the present application, which will be described later. The coating method for the coating liquid is not particularly limited, and a general coating method can be used. Examples of the coating method include a slot die method, a reverse gravure coating method, a microgravure method (microgravure coating method), a dip method (dip coating method), a spin coating method, a brush coating method, a roll coating method, a flexographic printing method, a wire bar coating method, a spray coating method, an extrusion coating method, a curtain coating method, and a reverse coating method. Among these, from the viewpoints of productivity, the smoothness of the coating film, and the like, the extrusion coating method, the curtain coating method, the roll coating method, the microgravure coating method, and the like are preferred.

[0082] Next, as shown in FIG. 2(c), a low-moisture-permeable layer 13 is formed on the surface of the air-gap layer 12 opposite the substrate 11 (low-moisture-permeable layer forming step). In this low-moisture-permeable layer forming step, the low-moisture-permeable layer 13 is formed by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD). This method is not particularly limited, and may be similar to or equivalent to general vacuum deposition, sputtering, and chemical vapor deposition (CVD), as described above. The material, thickness, etc. of the low-moisture-permeable layer 13 are, for example, as described above. In this way, as shown in FIG. 2(c), an optical laminate 10a can be produced in which the air-gap layer 12 is formed on the substrate 11 and the low-moisture-permeable layer 13 is further formed on the air-gap layer 12. Note that the optical laminate 10a in FIG. 2(c) is the same as the optical laminate 10a in FIG. 1(a).

[0083] Furthermore, as shown in FIG. 2(d), an adhesive layer 14 may be further formed on the surface of the low-moisture-permeable layer 13 in the optical laminate 10a in FIG. 2(c) opposite to the air gap layer 12 to form an optical laminate 10b. The method for forming (manufacturing) the adhesive layer 14 is not particularly limited, but may be the same as or equivalent to a method for forming a general adhesive layer. Specifically, for example, a pressure-sensitive adhesive or adhesive may be applied to the surface of the low-moisture-permeable layer 13, and then heated, if necessary. The pressure-sensitive adhesive or adhesive is not particularly limited, but may be, for example, as described above.

[0084] In addition, the method for manufacturing the optical laminate 10a of FIG. 1(a) or the optical laminate 10b of FIG. 1(b) may involve continuously carrying out the above-mentioned steps while continuously feeding out the long film-like substrate 11, for example.

[0085] The manufacturing method of the optical member of the present invention and the manufacturing method of the optical device of the present invention are not particularly limited. For example, the optical member of the present invention can be manufactured by the same manufacturing method as that of a general optical member, except that the optical laminate of the present invention is manufactured by any manufacturing method (for example, the manufacturing method described above). Furthermore, the optical device of the present invention can be manufactured by the same manufacturing method as that of a general optical device, except that the optical laminate of the present invention is manufactured by any manufacturing method (for example, the manufacturing method described above). [Example]

[0086] Next, examples of the present invention will be described, but the present invention is not limited to the following examples.

[0087] In the following Reference Examples, Examples, and Comparative Examples, the number of parts (relative amount used) of each substance is in parts by mass (parts by weight) unless otherwise specified.

[0088] [Reference example 1] A coating liquid for forming a porous layer (low refractive index layer) was prepared as follows.

[0089] (1) Gelation of silicon compounds Mixture A was prepared by dissolving 0.95 g of methyltrimethoxysilane (MTMS), a precursor of a silicon compound, in 2.2 g of dimethyl sulfoxide (DMSO). 0.5 g of a 0.01 mol / L aqueous solution of oxalic acid was added to this mixture A, and the mixture was stirred at room temperature for 30 minutes to hydrolyze the MTMS, producing mixture B containing tris(hydroxy)methylsilane.

[0090] To 5.5 g of DMSO, 0.38 g of 28 wt % aqueous ammonia and 0.2 g of pure water were added, and then mixed solution B was further added and stirred at room temperature for 15 minutes to gel tris(hydroxy)methylsilane, thereby obtaining mixed solution C containing a gel-like silicon compound.

[0091] (2) Aging treatment Mixture C containing the gel-like silicon compound prepared in the above "(1) Gelation of silicon compound" was incubated as is at 40°C for 20 hours for aging treatment.

[0092] (3) Crushing The gel-like silicon compound in the mixed solution C, which had been aged in the "(2) Aging Treatment" section, was crushed using a spatula into granules of several millimeters to several centimeters in size. Next, 40 g of isopropyl alcohol (IPA) was added to the mixed solution C, and after light stirring, the mixture was left to stand at room temperature for 6 hours, and the solvent and catalyst in the gel were decanted. The same decantation process was repeated three times to replace the solvent, yielding mixed solution D. The gel-like silicon compound in the mixed solution D was then crushed (high-pressure media-less crushing). The crushing process (high-pressure media-less crushing) was carried out using a homogenizer (manufactured by SMT Corporation, trade name "UH-50"), with 1.85 g of the gel-like compound in the mixed solution D and 1.15 g of IPA weighed into a 5 cc screw bottle, and crushed for 2 minutes at 50 W and 20 kHz.

[0093] By this grinding process, the gel-like silicon compound in the mixed solution D was ground, and the mixed solution D was converted into a sol solution of the ground material, mixed solution D'. The volume average particle size, which indicates the particle size variation of the ground material contained in this mixed solution D', was confirmed to be 0.50 to 0.70 using a dynamic light scattering Nanotrac particle size analyzer (manufactured by Nikkiso Co., Ltd., UPA-EX150 type) and was found to be 0.50 to 0.70. Furthermore, 0.062 g of a 1.5 wt% MEK (methyl ethyl ketone) solution of a photobase generator (Wako Pure Chemical Industries, Ltd.: product name WPBG266) and 0.036 g of a 5% MEK solution of bis(trimethoxysilyl)ethane were added to 0.75 g of this sol solution (mixed solution D') in a ratio of 0.062 g and 0.036 g, respectively, to obtain the target coating solution for forming a porous layer.

[0094] [Reference example 2] A laminate of an acrylic pressure-sensitive adhesive layer and a PET film was prepared as follows. First, a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen gas inlet tube, and a condenser was charged with 90.7 parts of butyl acrylate, 6 parts of N-acryloylmorpholine, 3 parts of acrylic acid, 0.3 parts of 2-hydroxybutyl acrylate, and 0.1 parts by weight of 2,2'-azobisisobutyronitrile as a polymerization initiator, along with 100 g of ethyl acetate. Nitrogen gas was introduced while gently stirring to replace the atmosphere. The liquid temperature in the four-necked flask was then maintained at around 55°C, allowing the polymerization reaction to proceed for 8 hours, yielding an acrylic polymer solution. An acrylic adhesive solution was prepared by blending 100 parts of the solids content of the resulting acrylic polymer solution with 0.2 parts of an isocyanate crosslinker (trade name "Coronate L" manufactured by Nippon Polyurethane Industry Co., Ltd., an adduct of trimethylolpropane and tolylene diisocyanate), 0.3 parts of benzoyl peroxide (Niper BMT manufactured by NOF Corporation), and 0.2 parts of γ-glycidoxypropyl methoxysilane (KBM-403 manufactured by Shin-Etsu Chemical Co., Ltd.). The acrylic adhesive solution was then applied to one side of a silicone-treated polyethylene terephthalate (PET) film (manufactured by Mitsubishi Chemical Polyester Film Corporation, thickness: 38 μm) so that the adhesive layer would be 10 μm thick after drying, and the coating was dried at 150°C for 3 minutes to produce a laminate of the adhesive layer and PET film.

[0095] [Example 1] The coating liquid for forming a voided layer prepared in Reference Example 1 was applied to a 30 μm-thick acrylic film (substrate) and further dried by heating at 100° C. for 2 minutes to form a voided layer. The formed voided layer was an ultra-low refractive index layer with a refractive index of 1.18. The porosity was 60% by volume. Furthermore, a 20 nm-thick SiO 2 layer was formed on the formed voided layer by sputtering to obtain an optical laminate of the present invention. The SiO 2 layer corresponds to the "low moisture permeable layer" in the optical laminate of the present invention. The sputtering method was performed using a known sputtering device. The same applies to the sputtering method in each of the following examples. In this example, each of the following examples, and each of the comparative examples, the refractive index of the voided layer was measured by the above-mentioned measurement method.

[0096] Furthermore, the laminate prepared in Reference Example 2 was attached to the low moisture permeable layer, and the PET film on the pressure-sensitive adhesive layer (adhesive layer) was peeled off to produce an optical laminate of the present invention having an adhesive layer.

[0097] [Example 2] The optical laminate of this example was obtained in the same manner as in Example 1, except that a 20 nm thick Si layer was formed by sputtering as the low moisture-permeable layer instead of the 20 nm thick SiO2 layer.

[0098] [Example 3] The optical laminate of this example was obtained in the same manner as in Example 1, except that a ZTO layer having a thickness of 50 nm was formed by sputtering as the low moisture-permeable layer instead of the SiO2 layer having a thickness of 20 nm.

[0099] [Example 4] The optical laminate of this example was obtained in the same manner as in Example 1, except that an 8 nm thick polysiloxane layer was formed as the low moisture-permeable layer instead of the 40 nm thick SiO layer. In this example, the polysiloxane layer was formed by vapor deposition using a solution prepared by dissolving octadecyltrichlorosilane (manufactured by Tokyo Chemical Industry Co., Ltd.) in a fluorine-based solvent (manufactured by 3M Company, trade name "Novec7100").

[0100] [Comparative Example 1] Except for not forming the low moisture-permeable layer (40 nm thick SiO layer), the optical laminate of this comparative example was produced in the same manner as in Example 1. That is, in the optical laminate of this comparative example, the adhesive layer was formed so as to be in direct contact with the surface of the air gap layer.

[0101] Comparative Example 2 An optical laminate of this comparative example was produced in the same manner as in Example 1, except that the thickness of the SiO2 layer was changed from 20 nm to 10 nm.

[0102] Comparative Example 3 An optical laminate of this comparative example was produced in the same manner as in Example 2, except that the thickness of the Si layer was changed from 20 nm to 10 nm.

[0103] The water vapor transmission rate of the low moisture-permeable layer was measured for the optical laminates of each Example and Comparative Example produced as described above. Furthermore, the change in refractive index Δn between before and after a heat and humidification durability test was measured for the optical laminates of each Example and Comparative Example having a tacky adhesive layer. The water vapor transmission rate and Δn were measured using the following test method (measurement method). The test results (measurement results) are summarized in Table 1 below.

[0104] [Water vapor permeability test method] <Measurement method> The water vapor transmission rate of the low-moisture-permeable layer in the optical laminates of each of the Examples and Comparative Examples was measured by the cup method specified in JIS Z 0208-1976. Specifically, a laminate obtained by laminating a low-moisture-permeable layer on a 30 μm thick acrylic substrate (product name: RZ-30NC-1330, manufactured by Toyo Kohan Co., Ltd.) under the same conditions as those for producing the optical laminates of each of the Examples and Comparative Examples was used as a measurement sample, and the low-moisture-permeable layer was placed inside a cup and the substrate (acrylic film) was placed outside.

[0105] [Heated and humidified durability test method] <Measurement method> The optical laminates of each of the Examples and Comparative Examples having a pressure-sensitive adhesive layer were used as measurement samples. The measurement samples were placed in an oven at 60°C and 90% RH and left to stand for 240 hours to conduct a heat and humidification durability test. The refractive index of the void layer alone was measured before and after leaving it to stand for 240 hours in the oven, and the refractive index difference Δn was calculated based on the following mathematical formula (1). An optical laminate with a Δn of 0.010 or less was evaluated as good, and an optical laminate with a Δn of more than 0.010 was evaluated as bad. The refractive index was measured using a Metricon Prism Coupler (Model 2010), where a laser beam with a wavelength of 407 nm was incident on the measurement sample through a coupling prism, and the refractive index in TE polarized light was measured. Δn=n a -n b (1) In the formula (1), na is the refractive index of the air gap layer alone before being placed in the 60°C 90% RH oven, and n b is the refractive index of the porous layer alone after the measurement sample is placed in an oven at 60°C and 90% RH and left to stand for 240 hours.

[0106] [Table 1]

[0107] As shown in Table 1, the optical laminates of the Examples having a low-moisture-permeable layer had a small refractive index change Δn before and after the heat and humidity durability test because the penetration of the adhesive into the voids in the void layer was suppressed. In contrast, the optical laminate of Comparative Example 1, which did not have a low-moisture-permeable layer, had a large Δn because the adhesive penetrated into the voids in the void layer during the heat and humidity durability test. Furthermore, the optical laminates of Comparative Examples 2 and 3 each had a SiO2 layer or a Si layer, but these SiO2 layer and Si layer had high water vapor permeability due to their small thickness. Therefore, the optical laminates of Comparative Examples 2 and 3 had a large Δn because the adhesive penetrated into the voids in the void layer during the heat and humidity durability test. [Industrial Applicability]

[0108] As described above, the present invention can provide an optical laminate in which pressure-sensitive adhesives, adhesives, etc. are less likely to penetrate into the voids of the void layer, a method for manufacturing an optical laminate, an optical member, an optical device, a method for manufacturing an optical member, and a method for manufacturing an optical device. The applications of the present invention are not particularly limited. For example, the optical device of the present invention is not particularly limited, and examples thereof include image display devices and lighting devices. Examples of the image display devices include liquid crystal displays, organic EL displays, and micro LED displays. Examples of the lighting devices include organic EL lighting. Furthermore, the applications of the optical laminate of the present invention are not limited to the optical members and optical devices of the present invention, and are arbitrary, and the optical laminate can be used for a wide range of applications. [Explanation of symbols]

[0109] 10a, 10b, 20 optical laminate 11. Substrate 12 interstitial layer 13 Low moisture permeability layer 14 Adhesive adhesive

Claims

1. a gap layer and a low moisture permeable layer formed on the gap layer, the low-moisture-permeable layer contains at least one selected from the group consisting of metal, metal oxide, silicon, silicon oxide, and organic-inorganic hybrid material, and the water vapor transmission rate measured by the cup method defined in JIS Z 0208-1976 using a laminate sample obtained by laminating the low-moisture-permeable layer on an acrylic substrate having a thickness of 30 μm is 35 g / m day or less; An optical laminate characterized by being disposed between layers of components constituting an optical member for the purpose of total reflection of light.

2. An optical laminate as described in claim 1, wherein the refractive index of the void layer at a wavelength of 550 nm is 1.25 or less.

3. 3. The optical laminate according to claim 1, wherein the void layer has a porosity of 30% by volume or more.

4. 4. The optical laminate according to claim 1, wherein the low moisture permeable layer comprises at least one selected from the group consisting of silicon, aluminum, silicon dioxide, aluminum oxide, zinc tin composite oxide (ZTO), indium tin composite oxide (ITO), indium zinc composite oxide (IZO), gallium zinc composite oxide (GZO), and polysiloxane.

5. The optical laminate according to claim 1 , wherein the low-moisture-permeable layer has a thickness of 5 nm or more.

6. The optical laminate according to any one of claims 1 to 5, wherein the low-moisture-permeable layer is a layer formed by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD).

7. The optical laminate according to claim 1 , wherein the porous layer is a porous body in which microporous particles of a silicon compound are chemically bonded to each other.

8. Further, it includes an adhesive layer, The optical laminate according to claim 1 , wherein the adhesive layer is provided on a surface of the low-moisture-permeable layer opposite to the porous layer.

9. 9. The optical laminate according to claim 1, wherein a difference between a refractive index n of the optical laminate before a heat and humidification durability test in which the optical laminate is maintained at a temperature of 60°C and a relative humidity of 90% for 240 hours and a refractive index n of the optical laminate after the test is 0.010 or less.

10. The optical laminate according to claim 1 , wherein the haze value is less than 10%.

11. a low-moisture-permeable layer forming step of forming the low-moisture-permeable layer on at least one surface of the air gap layer, 11. The method for producing an optical laminate according to claim 1, wherein the low-moisture-permeable layer forming step is performed by forming the low-moisture-permeable layer by at least one method selected from the group consisting of vacuum deposition, sputtering, and chemical vapor deposition (CVD).

12. An optical member comprising the optical laminate according to claim 1 .

13. An optical device comprising the optical member according to claim 12.

14. A method for producing an optical member according to claim 12, comprising an optical laminate production step of producing the optical laminate according to any one of claims 1 to 10 by the production method according to claim 11.

15. 14. The method for manufacturing an optical device according to claim 13, further comprising the step of manufacturing the optical member according to claim 12 by the manufacturing method according to claim 14.

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