Opening / closing mechanism, switching mechanism, and substrate processing apparatus

Abstract

To provide a substrate processing device which can exhaust a gas of a processing housing properly.SOLUTION: A substrate processing device 1 includes a processing housing 23A1, a holding part 31, and a liquid supply part 33. The holding part 31 is housed in the processing housing 23A1. The holding part 31 is configured to hold a substrate W. The liquid supply part 33 is housed in the processing housing 23A1. The liquid supply part 33 is configured to supply a processing liquid to the substrate W held by the holding part 31. The substrate processing device 1 includes exhaust pipes 41A, 42A. The exhaust pipes 41A, 42A are respectively disposed at sides of the processing housing 23A1. The exhaust pipes 41A, 42A exhaust a gas. The substrate processing device 1 includes a switch mechanism 51A1. The switch mechanism 51A1 is disposed at the same height position as the processing housing 23A1. The switch mechanism 51A1 switches an exhaust passage of the processing housing 23A1 to one of the exhaust pipes 41A, 42A.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus for processing substrates, such as semiconductor wafers, liquid crystal display substrates, organic electroluminescence (EL) substrates, flat panel display (FPD) substrates, optical display substrates, magnetic disk substrates, optical disk substrates, magneto-optical disk substrates, photomask substrates, and solar cell substrates. [Background technology]

[0002] Patent Document 1 discloses a substrate processing system. Hereinafter, reference symbols used in Patent Document 1 will be written in parentheses. The substrate processing system (1) includes a processing unit (16) for processing a wafer (W). The processing unit (16) includes a chamber (20), a substrate holding mechanism (30), and a processing fluid supply unit (40). The chamber (20) is a processing housing. The substrate holding mechanism (30) and the processing fluid supply unit (40) are installed inside the chamber (20). The substrate holding mechanism (30) holds the wafer (W). The processing fluid supply unit (40) supplies a processing fluid to the wafer (W) held by the substrate holding mechanism (30). The processing fluid is, for example, an alkaline processing liquid, an acidic processing liquid, or an organic processing liquid.

[0003] The substrate processing system (1) includes a second exhaust pipe (200), an exhaust switching unit (300), and three individual exhaust pipes (101, 102, 103). The second exhaust pipe (200) connects the chamber (20) and the exhaust switching unit (300). The second exhaust pipe (200) includes a horizontal section (201) and an ascending section (202). The horizontal section (201) is connected to the chamber (20). The horizontal section (201) extends horizontally from the chamber (20). The ascending section (202) extends upward from the horizontal section (201). The ascending section (202) has an upper end. The upper end of the ascending section (202) is connected to the exhaust switching unit (300). The exhaust switching unit (300) is further connected to the three individual exhaust pipes (101, 102, 103). The exhaust switching unit (300) connects the second exhaust pipe (200) to one of the three individual exhaust pipes (101, 102, 103). The gas in the chamber (20) flows through the second exhaust pipe (200) into one of the three individual exhaust pipes (101, 102, 103).

[0004] For example, when the treatment fluid supply unit (40) supplies an alkaline treatment liquid, the exhaust switching unit (300) connects the second exhaust pipe (200) to the individual exhaust pipe (101). When the treatment fluid supply unit (40) supplies an acidic treatment liquid, the exhaust switching unit (300) connects the second exhaust pipe (200) to the individual exhaust pipe (102). When the treatment fluid supply unit (40) supplies an organic treatment liquid, the exhaust switching unit (300) connects the second exhaust pipe (200) to the individual exhaust pipe (103). As a result, when an alkaline treatment liquid is used in the chamber (20), the individual exhaust pipe (101) exhausts gas from the chamber (20). When an acidic treatment liquid is used in the chamber (20), the individual exhaust pipe (102) exhausts gas from the chamber (20). A separate exhaust pipe (103) evacuates the chamber (20) when organic processing liquid is used within the chamber (20).

[0005] The exhaust switching unit (300) is disposed at a higher position than the processing unit (16). The rising portion (202) of the second exhaust pipe (200) extends to a higher position than the processing unit (16). Therefore, mist contained in the gas is less likely to rise in the rising portion (202). The mist is less likely to rise to the exhaust switching unit (300). Therefore, the exhaust switching unit (300) can be protected from the mist.

[0006] As described above, the exhaust switching unit (300) is disposed at a higher position than the processing unit (16), and therefore the individual exhaust pipes (101, 102, 103) are also disposed at a higher position than the processing unit (16). [Prior art documents] [Patent documents]

[0007] [Patent Document 1] Japanese Patent Application Publication No. 2019-16818 Summary of the Invention [Problem to be solved by the invention]

[0008] However, the coating and developing apparatus (1) disclosed in Patent Document 1 has the following problem: The chamber (20) and the exhaust switching unit (300) are connected by a second exhaust pipe (200). Because the exhaust switching unit (300) is located higher than the processing unit (16), the second exhaust pipe (200) has an ascending portion (202). Therefore, the second exhaust pipe (200) is relatively long.

[0009] The gas in the chamber (20) always flows through the second exhaust pipe (200). For example, whether an alkaline processing liquid, an acidic processing liquid, or an organic processing liquid is used in the chamber (20), the second exhaust pipe (200) exhausts the gas from the chamber (20).

[0010] As described above, since the second exhaust pipe (200) is relatively long and discharges various gases, the second exhaust pipe (200) is easily soiled. For example, crystals (salt) are easily generated inside the second exhaust pipe (200). For example, crystals are easily deposited inside the second exhaust pipe (200).

[0011] If the second exhaust pipe (200) becomes dirty, gas does not flow smoothly through the second exhaust pipe (200). In other words, the second exhaust pipe (200) cannot smoothly exhaust gas from the chamber (20). For this reason, it is necessary to periodically perform maintenance on the second exhaust pipe (200). Maintenance of the second exhaust pipe (200) includes, for example, cleaning the second exhaust pipe (200) or replacing the second exhaust pipe (200).

[0012] When the second exhaust pipe 200 is undergoing maintenance, the processing unit 16 cannot process wafers W. When the second exhaust pipe 200 is undergoing maintenance, the substrate processing system 1 stops processing wafers W. This reduces the throughput of the substrate processing system 1.

[0013] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate processing apparatus that can appropriately exhaust gas from a processing housing. [Means for solving the problem]

[0014] In order to achieve the above object, the present invention is configured as follows: That is, the present invention is a substrate processing apparatus including a first processing casing, a first holding part installed inside the first processing casing and configured to hold a substrate, a first liquid supply part installed inside the first processing casing and configured to supply a processing liquid to the substrate held by the first holding part, a first exhaust pipe installed on a side of the first processing casing and configured to exhaust gas, a second exhaust pipe installed on the side of the first processing casing and configured to exhaust gas, and a first switching mechanism located at the same height as the first processing casing and configured to switch an exhaust path of the first processing casing to one of the first exhaust pipe and the second exhaust pipe.

[0015] The substrate processing apparatus includes a first processing housing, a first holding unit, and a first liquid supply unit. The substrate processing apparatus supplies a processing liquid to a substrate inside the first processing housing. That is, the substrate processing apparatus performs liquid processing on the substrate inside the first processing housing.

[0016] The substrate processing apparatus includes a first exhaust pipe, a second exhaust pipe, and a first switching mechanism that switches the exhaust path of the first processing housing to one of the first exhaust pipe and the second exhaust pipe. Specifically, the first switching mechanism switches between a state in which the first processing housing is connected to the first exhaust pipe and disconnected from the second exhaust pipe, and a state in which the first processing housing is connected to the second exhaust pipe and disconnected from the first exhaust pipe. When the exhaust path of the first processing housing is the first exhaust pipe, the first exhaust pipe exhausts gas from the first processing housing and the second exhaust pipe does not exhaust gas from the first processing housing. When the exhaust path of the first processing housing is the second exhaust pipe, the second exhaust pipe exhausts gas from the first processing housing and the second exhaust pipe does not exhaust gas from the first processing housing.

[0017] The first switching mechanism is disposed at the same height as the first processing casing. This allows the flow path between the first processing casing and the first switching mechanism to be suitably short. This effectively prevents the flow path between the first processing casing and the first switching mechanism from becoming dirty. This allows the gas to flow smoothly from the first processing casing to the first switching mechanism. As a result, the gas in the first processing casing can be properly exhausted.

[0018] The first exhaust pipe is disposed on the side of the first processing housing. Therefore, the first switching mechanism can be easily connected to the first exhaust pipe. The second exhaust pipe is disposed on the side of the first processing housing. Therefore, the first switching mechanism can be easily connected to the second exhaust pipe.

[0019] As described above, the substrate processing apparatus can appropriately exhaust the gas in the first processing housing.

[0020] In the substrate processing apparatus described above, the first switching mechanism is preferably disposed at a position equal to or lower than an upper end of the first holding part. The size of the first switching mechanism is relatively small. This can suitably prevent the substrate processing apparatus from becoming large.

[0021] In the above-described substrate processing apparatus, it is preferable that the first switching mechanism is disposed at a position that does not overlap with the first holding part in a plan view, thereby easily avoiding interference between the first switching mechanism and the first holding part.

[0022] In the substrate processing apparatus described above, it is preferable that the first exhaust pipe extends vertically and the second exhaust pipe also extends vertically, which can suitably reduce the installation space for the first exhaust pipe and the second exhaust pipe in a plan view.

[0023] In the above-described substrate processing apparatus, the substrate processing apparatus includes a transfer space extending in a horizontal first direction and adjacent to the first processing casing, a transfer mechanism installed in the transfer space for transferring a substrate to the first holding unit, and a first piping space adjacent to the first processing casing and accommodating the first exhaust pipe and the second exhaust pipe, wherein the first processing casing and the first piping space are preferably aligned in the first direction, and the first exhaust pipe and the second exhaust pipe are preferably aligned perpendicular to the first direction and in a horizontal second direction. The substrate processing apparatus includes a transfer space and a transfer mechanism. The transfer space is adjacent to the first processing casing. This allows the transfer mechanism to easily transfer the substrate to the first holding unit. The substrate processing apparatus includes a first piping space. This allows the first exhaust pipe and the second exhaust pipe to be preferably installed. The first piping space is adjacent to the first processing casing. This allows the first exhaust pipe and the second exhaust pipe to be installed near the first processing casing. The transfer space extends in the first direction. The first processing casing and the first piping space are aligned in the first direction. Therefore, the transfer space adjacent to the first processing casing and the first piping space adjacent to the first processing casing can each be preferably arranged. This makes it possible to preferably prevent the transfer mechanism from interfering with the first exhaust pipe and the second exhaust pipe. The first piping space and the first processing casing are aligned in a first direction. The first exhaust pipe and the second exhaust pipe are aligned in a second direction. This makes it possible to install the first exhaust pipe and the second exhaust pipe near the first processing casing.

[0024] In the substrate processing apparatus described above, it is preferable that at least a part of the first switching mechanism is installed in the first piping space, and the first switching mechanism can be installed in the vicinity of the first processing housing.

[0025] In the above-described substrate processing apparatus, the first switching mechanism preferably includes a first opening / closing unit movable between a position where the first processing casing is connected to the first exhaust pipe and a position where the first processing casing is disconnected from the first exhaust pipe, and a second opening / closing unit movable, independently of the first opening / closing unit, between a position where the first processing casing is connected to the second exhaust pipe and a position where the first processing casing is disconnected from the second exhaust pipe. The first opening / closing unit and the second opening / closing unit are movable independently of each other. Therefore, the first switching mechanism can individually connect the first exhaust pipe and the second exhaust pipe to the first processing casing. The switching mechanism can individually disconnect the first exhaust pipe and the second exhaust pipe from the first processing casing.

[0026] In the substrate processing apparatus described above, the first switching mechanism preferably includes a switching housing connected to the first processing housing and accommodating the first and second opening / closing units. The switching housing can suitably form a flow path from the first processing housing to the first and second opening / closing units.

[0027] In the above-described substrate processing apparatus, the switching housing preferably includes an inlet connected to the first processing housing and extending in the first direction, and a distributor connected to the inlet, extending in the second direction, connected to both the first exhaust pipe and the second exhaust pipe, and accommodating both the first and second open / close units. The inlet is connected to the first processing housing. This allows gas to be easily introduced from the first processing housing to the switching housing. The inlet extends in the first direction. As described above, the transfer space extends in the first direction. This allows the transfer space adjacent to the first processing housing and the inlet connected to the first processing housing to be preferably positioned. This effectively prevents the transfer mechanism from interfering with the inlet. The distributor is connected to the inlet. The distributor is connected to the first exhaust pipe and the second exhaust pipe. This allows gas to be easily released from the switching housing to the first exhaust pipe and the second exhaust pipe. The distributor accommodates both the first and second open / close units. Therefore, the first switching mechanism can easily switch the exhaust path of the first processing housing between the first exhaust pipe and the second exhaust pipe. The distribution unit extends in the second direction. As described above, the first exhaust pipe and the second exhaust pipe are aligned in the second direction. Therefore, the distribution unit can be easily connected to the first exhaust pipe and the second exhaust pipe.

[0028] In the substrate processing apparatus described above, it is preferable that the separation distance between the introduction unit and the transfer space is smaller than the separation distance between the first holding unit and the transfer space in a plan view. The introduction unit is disposed relatively close to the transfer space. This allows gas to be smoothly introduced from the first processing housing to the switching housing.

[0029] In the above-described substrate processing apparatus, the substrate processing apparatus preferably includes an air supply pipe that supplies gas to the first processing casing and a second piping space adjacent to the first processing casing and accommodating the air supply pipe, and the first piping space, the first processing casing, and the second piping space are aligned in this order in the first direction. The substrate processing apparatus includes the air supply pipe and the second piping space. The second piping space is adjacent to the first processing casing. Therefore, the air supply pipe can easily supply gas to the first processing casing. The first piping space, the first processing casing, and the second piping space are aligned in this order in the first direction. Therefore, the first piping space and the second piping space are separated by the first processing casing. Therefore, the arrangement of the first exhaust pipe and the second exhaust pipe is not restricted by the air supply pipe. That is, the degree of freedom in arranging the first exhaust pipe and the second exhaust pipe is preferably increased.

[0030] In the above-mentioned substrate processing apparatus, it is preferable that the substrate processing apparatus comprises: a second processing housing arranged below the first processing housing; a second holding unit installed inside the second processing housing and holding a substrate; a second liquid supply unit installed inside the second processing housing and supplying a processing liquid to the substrate held by the second holding unit; and a second switching mechanism arranged at the same height as the second processing housing and switching the exhaust path of the second processing housing to one of the first exhaust pipe and the second exhaust pipe.

[0031] The substrate processing apparatus includes a second processing housing, a second holding unit, and a second liquid supply unit. This allows liquid processing of substrates inside the second processing housing, thereby favorably improving the throughput of the substrate processing apparatus.

[0032] The second processing housing is disposed below the first processing housing, which effectively prevents an increase in the footprint of the substrate processing apparatus.

[0033] The substrate processing apparatus includes a second switching mechanism. The second switching mechanism switches the exhaust path of the second processing housing to one of the first exhaust pipe and the second exhaust pipe. Specifically, the second switching mechanism switches between a state in which the second processing housing is connected to the first exhaust pipe but is isolated from the second exhaust pipe, and a state in which the second processing housing is connected to the second exhaust pipe but is isolated from the first exhaust pipe. When the exhaust path of the second processing housing is the first exhaust pipe, the first exhaust pipe exhausts gas from the second processing housing but the second exhaust pipe does not exhaust gas from the second processing housing. When the exhaust path of the second processing housing is the second exhaust pipe, the second exhaust pipe exhausts gas from the second processing housing but the first exhaust pipe does not exhaust gas from the second processing housing. Therefore, the first exhaust pipe exhausts gas from the second processing housing in addition to gas from the first processing housing. The second exhaust pipe also exhausts gas from the second processing housing in addition to the gas from the first processing housing, thereby simplifying the structure of the substrate processing apparatus.

[0034] The second switching mechanism is disposed at the same height as the second processing casing. This allows the flow path between the second processing casing and the second switching mechanism to be suitably short. This effectively prevents the flow path between the second processing casing and the second switching mechanism from becoming dirty. This allows the gas to flow smoothly from the second processing casing to the second switching mechanism. As a result, the gas in the second processing casing can be properly exhausted.

[0035] As described above, the present substrate processing apparatus can properly exhaust the gas from the second processing housing in addition to the gas from the first processing housing.

[0036] In the above-described substrate processing apparatus, it is preferable that the second processing casing is disposed at the same position as the first processing casing in a plan view, the second switching mechanism is disposed at the same position as the first switching mechanism in a plan view, the first exhaust pipe extends vertically, and the second exhaust pipe extends vertically. The second processing casing is disposed at the same position as the first processing casing in a plan view. The second switching mechanism is disposed at the same position as the first switching mechanism in a plan view. Therefore, the relative positions of the second processing casing and the second switching mechanism are substantially the same as the relative positions of the first processing casing and the first switching mechanism. Therefore, the conditions for exhausting gas can be easily made equal between the first processing casing and the second processing casing. As a result, the quality of processing performed on substrates can be suitably made equal between the first processing casing and the second processing casing. The first exhaust pipe extends vertically. Therefore, the first switching mechanism and the second switching mechanism can be easily connected to the first exhaust pipe. The second exhaust pipe extends vertically. Therefore, the first switching mechanism and the second switching mechanism can each be easily connected to the second exhaust pipe.

[0037] In the above-mentioned substrate processing apparatus, it is preferable that the substrate processing apparatus comprises a third processing housing arranged at the same height as the first processing housing, a third holding unit installed inside the third processing housing and holding a substrate, a third liquid supply unit installed inside the third processing housing and supplying processing liquid to the substrate held in the third holding unit, a third exhaust pipe installed on the side of the third processing housing and discharging gas, a fourth exhaust pipe installed on the side of the third processing housing and discharging gas, and a third switching mechanism arranged at the same height as the third processing housing and switching the exhaust path of the third processing housing to one of the third exhaust pipe and the fourth exhaust pipe.

[0038] The substrate processing apparatus includes a third processing housing, a third holding unit, and a third liquid supply unit. This allows liquid processing of substrates inside the third processing housing. This can favorably improve the throughput of the substrate processing apparatus.

[0039] The third processing housing is disposed at the same height as the first processing housing. The substrate processing apparatus includes a third switching mechanism, a third exhaust pipe, and a fourth exhaust pipe. The third switching mechanism switches the exhaust path of the third processing housing to one of the third exhaust pipe and the fourth exhaust pipe. Specifically, the third switching mechanism switches between a state in which the third processing housing is connected to the third exhaust pipe but is isolated from the fourth exhaust pipe, and a state in which the third processing housing is connected to the fourth exhaust pipe but is isolated from the third exhaust pipe. When the exhaust path of the third processing housing is the third exhaust pipe, the third exhaust pipe exhausts gas from the third processing housing, but the fourth exhaust pipe does not exhaust gas from the third processing housing. When the exhaust path of the third processing housing is the fourth exhaust pipe, the fourth exhaust pipe exhausts gas from the third processing housing, but the third exhaust pipe does not exhaust gas from the third processing housing.

[0040] The third switching mechanism is disposed at the same height as the third processing housing. This allows the flow path between the third processing housing and the third switching mechanism to be suitably short. This effectively prevents the flow path between the third processing housing and the third switching mechanism from becoming dirty. This allows the gas to flow smoothly from the third processing housing to the third switching mechanism. As a result, the gas in the third processing housing can be properly exhausted.

[0041] The third exhaust pipe is disposed on the side of the third processing housing. Therefore, the third switching mechanism can be easily connected to the third exhaust pipe. The fourth exhaust pipe is disposed on the side of the third processing housing. Therefore, the third switching mechanism can be easily connected to the fourth exhaust pipe.

[0042] As described above, the present substrate processing apparatus can appropriately exhaust the gas in the third processing housing.

[0043] In the above-described substrate processing apparatus, the substrate processing apparatus preferably includes a first pressure sensor that measures the pressure of the gas on the primary side of the first switching mechanism, a first pressure adjustment mechanism that adjusts the pressure of the gas on the primary side of the first switching mechanism based on the detection result of the first pressure sensor, a third pressure sensor that measures the pressure of the gas on the primary side of the third switching mechanism, and a third pressure adjustment mechanism that adjusts the pressure of the gas on the primary side of the third switching mechanism based on the detection result of the third pressure sensor. The substrate processing apparatus includes the first pressure sensor and the first pressure adjustment mechanism. This allows the pressure on the primary side of the first switching mechanism to be suitably adjusted. Similarly, the substrate processing apparatus includes a third pressure sensor and the third pressure adjustment mechanism. This allows the pressure on the primary side of the third switching mechanism to be suitably adjusted.

[0044] In the substrate processing apparatus described above, the first pressure adjustment mechanism and the third pressure adjustment mechanism preferably equalize the gas pressure on the primary side of the first switching mechanism and the gas pressure on the primary side of the third switching mechanism, thereby making it possible to suitably equalize the quality of processing performed on substrates between the first processing housing and the third processing housing.

[0045] In the above-described substrate processing apparatus, it is preferable that the substrate processing apparatus further comprises a fifth exhaust pipe connected to the first exhaust pipe and the third exhaust pipe and discharging the gas from the first exhaust pipe and the gas from the third exhaust pipe, and a sixth exhaust pipe connected to the second exhaust pipe and the fourth exhaust pipe and discharging the gas from the second exhaust pipe and the gas from the fourth exhaust pipe, thereby simplifying the structure of the substrate processing apparatus.

[0046] In the above-described substrate processing apparatus, the substrate processing apparatus preferably includes a fifth pressure sensor that measures the pressure of the gas inside the fifth exhaust pipe, a fifth pressure adjustment mechanism that adjusts the pressure of the gas inside the fifth exhaust pipe based on the detection result of the fifth pressure sensor, a sixth pressure sensor that measures the pressure of the gas inside the sixth exhaust pipe, and a sixth pressure adjustment mechanism that adjusts the pressure of the gas inside the sixth exhaust pipe based on the detection result of the sixth pressure sensor. The substrate processing apparatus includes the fifth pressure sensor and a fifth switching mechanism. This allows the pressure inside the fifth exhaust pipe to be suitably adjusted. Similarly, the substrate processing apparatus includes a sixth pressure sensor and a sixth switching mechanism. This allows the pressure inside the sixth exhaust pipe to be suitably adjusted.

[0047] In the above-described substrate processing apparatus, it is preferable that the fifth pressure sensor be installed downstream of a connection position between the first exhaust pipe and the fifth exhaust pipe and a connection position between the third exhaust pipe and the fifth exhaust pipe, and the sixth pressure sensor be installed downstream of a connection position between the second exhaust pipe and the sixth exhaust pipe and a connection position between the fourth exhaust pipe and the sixth exhaust pipe. The fifth pressure sensor can suitably detect the total exhaust pressure of the first exhaust pipe and the third exhaust pipe. The sixth pressure sensor can suitably detect the total exhaust pressure of the second exhaust pipe and the fourth exhaust pipe.

[0048] In the above-described substrate processing apparatus, it is preferable that the first liquid supply unit is capable of supplying a first processing liquid and a second processing liquid, and that when the first liquid supply unit supplies the first processing liquid, the first switching mechanism switches the exhaust path of the first processing housing to the first exhaust pipe, and when the first liquid supply unit supplies the second processing liquid, the first switching mechanism switches the exhaust path of the first processing housing to the second exhaust pipe. When the first liquid supply unit supplies the first processing liquid, the first exhaust pipe exhausts gas from the first processing housing. When the first liquid supply unit supplies the second processing liquid, the first exhaust pipe does not exhaust gas from the first processing housing. This can preferably prevent the interior of the first exhaust pipe from being contaminated. Similarly, when the first liquid supply unit supplies the second processing liquid, the second exhaust pipe exhausts gas from the first processing housing. When the first liquid supply unit supplies the first processing liquid, the second exhaust pipe does not exhaust gas from the first processing housing. This effectively prevents the inside of the second exhaust pipe from becoming soiled, thereby enabling the gas in the first processing housing to be exhausted more appropriately. [Effects of the Invention]

[0049] According to the substrate processing apparatus of the present invention, the gas in the processing housing can be appropriately exhausted. [Brief explanation of the drawings]

[0050] [Figure 1] FIG. 2 is a plan view showing the inside of the substrate processing apparatus according to the embodiment. [Figure 2] FIG. 2 is a right side view showing the configuration of a central portion of the substrate processing apparatus in the width direction. [Figure 3] FIG. 2 is a front view of the processing block. [Figure 4] FIG. 2 is a right side view showing the configuration of the right part of the substrate processing apparatus. [Figure 5] FIG. 2 is a left side view showing the configuration of the left part of the substrate processing apparatus. [Figure 6] FIG. 2 is a plan view of the processing unit. [Figure 7] FIG. 2 is a side view of the processing unit. [Figure 8] FIG. [Figure 9]FIG. 10 is a system diagram of an exhaust path from a processing housing. [Figure 10] FIG. 2 is a plan view showing the upper part of the processing block. [Figure 11] FIG. 2 is a control block diagram of the substrate processing apparatus. [Figure 12] 10 is a flowchart showing the procedure of an operation for processing a substrate. [Figure 13] FIG. 10 is a plan view of a processing unit in a modified embodiment. [Figure 14] FIG. 10 is a plan view of a processing unit in a modified embodiment. [Figure 15] FIG. 10 is a plan view of a processing unit in a modified embodiment. [Figure 16] FIG. 10 is a plan view of a processing unit in a modified embodiment. [Figure 17] FIG. 10 is a plan view showing the inside of a substrate processing apparatus according to a modified embodiment. [Figure 18] FIG. 10 is a front view of a switching mechanism according to a modified embodiment. [Figure 19] 19(a) and 19(b) are side views of a switching mechanism according to a modified embodiment. [Figure 20] 20(a) and 20(b) are plan views showing examples of arrangement of wind speed sensors in modified embodiments. [Figure 21] 21(a) and 21(b) are plan views showing examples of arrangement of wind speed sensors in modified embodiments. DETAILED DESCRIPTION OF THE INVENTION

[0051] The substrate processing apparatus of the present invention will be described below with reference to the drawings.

[0052] <Outline of substrate processing equipment> 1 is a plan view showing the inside of a substrate processing apparatus 1 according to an embodiment of the present invention. The substrate processing apparatus 1 processes a substrate (for example, a semiconductor wafer) W.

[0053] The substrate W is, for example, a semiconductor wafer, a liquid crystal display substrate, an organic EL (Electroluminescence) substrate, an FPD (Flat Panel Display) substrate, an optical display substrate, a magnetic disk substrate, an optical disk substrate, a magneto-optical disk substrate, a photomask substrate, or a solar cell substrate. The substrate W has a thin, flat plate shape. The substrate W has a substantially circular shape in a plan view.

[0054] The substrate processing apparatus 1 includes an indexer unit 3 and a processing block 11. The processing block 11 is connected to the indexer unit 3. The indexer unit 3 and the processing block 11 are aligned horizontally. The indexer unit 3 supplies substrates W to the processing block 11. The processing block 11 processes the substrates W. The indexer unit 3 retrieves the substrates W from the processing block 11.

[0055] For convenience, in this specification, the horizontal direction in which the indexer unit 3 and the processing block 11 are aligned is referred to as the "front-rear direction X." Within the front-rear direction X, the direction from the processing block 11 toward the indexer unit 3 is referred to as the "front." The direction opposite to the front is referred to as the "rear." The horizontal direction perpendicular to the front-rear direction X is referred to as the "width direction Y." One direction in the "width direction Y" is referred to as the "right" as appropriate. The direction opposite to the right is referred to as the "left." The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z." For reference, in each figure, front, rear, right, left, top, and bottom are indicated as appropriate.

[0056] When there is no particular distinction between "front," "rear," "right," and "left," they are referred to as "side."

[0057] The indexer unit 3 includes a plurality of (for example, four) carrier placement units 4. The carrier placement units 4 are arranged in the width direction Y. Each carrier placement unit 4 places one carrier C thereon. The carrier C stores a plurality of substrates W. The carrier C is, for example, a FOUP (front opening unified pod).

[0058] The indexer unit 3 includes a transport space 5. The transport space 5 is disposed behind the carrier placement unit 4. The transport space 5 extends in the width direction Y.

[0059] The indexer unit 3 includes a transport mechanism 6. The transport mechanism 6 is installed in the transport space 5. The transport mechanism 6 is disposed behind the carrier platform 4. The transport mechanism 6 transports substrates W. The transport mechanism 6 is accessible to the carriers C placed on the carrier platform 4.

[0060] The processing block 11 includes a transport space 12A. The transport space 12A is disposed in the center of the processing block 11 in the width direction Y. The transport space 12A extends in the front-rear direction X. The front of the transport space 12A is connected to the transport space 5 of the indexer unit 3.

[0061] The processing block 11 includes a substrate placement part 14A. The substrate placement part 14A is installed in the transport space 12A. The substrate placement part 14A is located at the front of the transport space 12A. The transport mechanism 6 of the indexer unit 3 is also accessible to the substrate placement part 14A. A substrate W is placed on the substrate placement part 14A.

[0062] The processing block 11 includes a transport mechanism 16A. The transport mechanism 16A is installed in the transport space 12A. The transport mechanism 16A transports the substrate W. The transport mechanism 16A is accessible to the substrate platform 14A.

[0063] The processing block 11 includes processing units 21A1, 21B1, 21C1, and 21D1. The processing units 21A1 and 21B1 are arranged to the right of the transport space 12A. The processing units 21A1 and 21B1 are aligned in the front-to-rear direction X. The processing unit 21B1 is arranged behind the processing unit 21A1. The processing units 21C1 and 21D1 are arranged to the left of the transport space 12A. The processing units 21C1 and 21D1 are aligned in the front-to-rear direction X. The processing unit 21D1 is arranged behind the processing unit 21C1.

[0064] When there is no need to distinguish between the processing units 21A1, 21B1, 21C1, and 21D1, they are referred to as processing units 21. Each processing unit 21 performs a process on a substrate W. The processing performed by each processing unit 21 is the same.

[0065] A brief description will be given of the structure of the processing unit 21. Each processing unit 21 includes a processing housing 23.

[0066] Each processing unit 21 includes a holder 31. The holder 31 is installed inside the processing housing 23. The holder 31 holds a substrate W. In FIG. 1, the substrate W held by the holder 31 is indicated by a dashed line.

[0067] The processing unit 21 includes a liquid supply part 33. The liquid supply part 33 is installed inside the processing housing 23. The liquid supply part 33 supplies a processing liquid to the substrate W held by the holder 31.

[0068] The transport mechanism 16A is accessible to each processing unit 21. Specifically, the transport mechanism 16A is accessible to the holder 31 of each processing unit 21.

[0069] Hereinafter, the processing casing 23 of processing unit 21A1 will be referred to as processing casing 23A1 as appropriate. Similarly, the processing casings 23 of processing units 21B1, 21C1, and 21D1 will be referred to as processing casings 23B1, 23C1, and 23D1 as appropriate. Processing casings 23A1, 23B1, 23C1, and 23D1 are arranged at the same height.

[0070] The processing block 11 includes exhaust pipes 41A, 42A, and 43A. The exhaust pipes 41A, 42A, and 43A are all installed outside the processing housing 23. The exhaust pipes 41A-43A are each installed on the side of the processing housing 23A1. The exhaust pipes 41A-43A each pass through a position on the side of the processing housing 23A1. The exhaust pipes 41A-43A each exhaust gas. The exhaust pipes 41A-43A are not connected to each other. The exhaust pipes 41A-43A each have exhaust paths that are separated from each other.

[0071] Similarly, the processing block 11 includes exhaust pipes 41B-43B, 41C-43C, and 41D-43D. The exhaust pipes 41B-43B, 41C-43C, and 41D-43D are installed on the sides of the processing housings 23B1, 23C1, and 23D1, respectively. The exhaust pipes 41B-43B, 41C-43C, and 41D-43D exhaust gases, respectively.

[0072] The processing block 11 includes switching mechanisms 51A1, 51B1, 51C1, and 51D1. The switching mechanism 51A1 is disposed at approximately the same height as the processing casing 23A1. Similarly, the switching mechanisms 51B1, 51C1, and 51D1 are disposed at approximately the same height as the processing casings 23B1, 23C1, and 23D1, respectively.

[0073] The switching mechanism 51A1 switches the exhaust path of the processing housing 23A1 to one of the exhaust pipes 41A to 43A. The switching mechanism 51A1 switches the exhaust path of the gas from the processing housing 23A1 between the exhaust pipes 41A to 43A.

[0074] Specifically, the switching mechanism 51A1 switches between a first state, a second state, and a third state. In the first state, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 41A and disconnects the processing housing 23A1 from the exhaust pipes 42A and 43A. In the second state, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 42A and disconnects the processing housing 23A1 from the exhaust pipes 41A and 43A. In the third state, the switching mechanism 51A1 connects the processing housing 23A1 to the exhaust pipe 43A and disconnects the processing housing 23A1 from the exhaust pipes 41A and 42A. In this way, the switching mechanism 51A1 is configured to individually connect the exhaust pipes 41A-43A to the processing housing 23A1 and individually disconnect the exhaust pipes 41A-43A from the processing housing 23A1.

[0075] Similarly, the switching mechanism 51B1 switches the exhaust path of the processing housing 23B1 to one of the exhaust pipes 41B-43B. The switching mechanism 51C1 switches the exhaust path of the processing housing 23C1 to one of the exhaust pipes 41C-43C. The switching mechanism 51D1 switches the exhaust path of the processing housing 23D1 to one of the exhaust pipes 41D-43D.

[0076] In FIG. 1, the switching mechanism 51A1 switches the exhaust path of the processing housing 23A1 to the exhaust pipe 41A. The switching mechanism 51B1 switches the exhaust path of the processing housing 23B1 to the exhaust pipe 41B. The switching mechanism 51C1 switches the exhaust path of the processing housing 23C1 to the exhaust pipe 42C. The switching mechanism 51D1 switches the exhaust path of the processing housing 23D1 to the exhaust pipe 43D.

[0077] Specifically, the switching mechanism 51A1 connects the processing casing 23A1 to the exhaust pipe 41A and isolates the processing casing 23A1 from the exhaust pipes 42A and 43A. The exhaust pipe 41A exhausts gas from the processing casing 23A1. The exhaust pipes 42A and 43A do not exhaust gas from the processing casing 23A1.

[0078] The switching mechanism 51B1 connects the processing casing 23B1 to the exhaust pipe 41B and isolates the processing casing 23B1 from the exhaust pipes 42B and 43B. The exhaust pipe 41B exhausts gas from the processing casing 23B1. The exhaust pipes 42B and 43B do not exhaust gas from the processing casing 23B1.

[0079] The switching mechanism 51C1 connects the processing casing 23C1 to the exhaust pipe 42C and isolates the processing casing 23C1 from the exhaust pipes 41C and 43C. The exhaust pipe 42C exhausts gas from the processing casing 23C1. The exhaust pipes 41C and 43C do not exhaust gas from the processing casing 23C1.

[0080] The switching mechanism 51D1 connects the processing housing 23D1 to the exhaust pipe 43D and isolates the processing housing 23D1 from the exhaust pipes 41D and 42D. The exhaust pipe 43D exhausts gas from the processing housing 23D1. The exhaust pipes 41D and 42D do not exhaust gas from the processing housing 23D1.

[0081] Here, processing casing 23A1 is an example of a first processing casing in the present invention. Holding section 31 of processing unit 21A1 is an example of a first holding section in the present invention. Liquid supply section 33 of processing unit 21A1 is an example of a first liquid supply section in the present invention. Exhaust pipe 41A is an example of a first exhaust pipe in the present invention. Exhaust pipe 42A is an example of a second exhaust pipe in the present invention. Switching mechanism 51A1 is an example of a first switching mechanism in the present invention.

[0082] Processing casing 23B1 is an example of a third processing casing in the present invention. Holding section 31 of processing unit 21B1 is an example of a third holding section in the present invention. Liquid supply section 33 of processing unit 21B1 is an example of a third liquid supply section in the present invention. Exhaust pipe 41B is an example of a third exhaust pipe in the present invention. Exhaust pipe 42B is an example of a fourth exhaust pipe in the present invention. Switching mechanism 51B1 is an example of a third switching mechanism in the present invention.

[0083] The substrate processing apparatus 1 operates, for example, as follows. The transport mechanism 6 transports the substrate W from the carrier C on the carrier platform 4 to the substrate platform 14A. The transport mechanism 16A transports the substrate W from the substrate platform 14A to the processing unit 21. Specifically, the transport mechanism 16A places the substrate W on the holder 31. The processing unit 21 performs liquid processing on the substrate W inside the processing housing 23. Each processing unit 21 processes one substrate W at a time. Specifically, the liquid supply part 33 supplies a processing liquid to the substrate W held in the holder 31. After the substrate W has been processed, the transport mechanism 16A transports the substrate W from the processing unit 21 to the substrate platform 14A. The transport mechanism 6 transports the substrate W from the substrate platform 14A to the carrier C on the carrier platform 4.

[0084] When one processing unit 21 processes a substrate W, another processing unit 21 may process another substrate W. The number of processing units 21 to which each substrate W is transported is, for example, one.

[0085] When a substrate W is being processed inside the processing housing 23, the switching mechanism 51 switches the exhaust path of the processing housing 23. For example, when a substrate W is being processed, the switching mechanism 51A1 switches the exhaust path one or more times. For example, the period during which one substrate W is processed in one processing housing 23 may include two or more of a first period, a second period, and a third period. Here, the first period is a period during which the first exhaust pipe exhausts gas from the processing housing 23. The second period is a period during which the second exhaust pipe exhausts gas from the processing housing 23. The third period is a period during which the third exhaust pipe exhausts gas from the processing housing 23.

[0086] The above-described substrate processing apparatus 1 can achieve the following effects: The switching mechanism 51A1 is disposed at approximately the same height as the processing casing 23A1, which allows the flow path between the processing casing 23A1 and the switching mechanism 51A1 to be suitably short.

[0087] Furthermore, the processing casing 23A1 and the switching mechanism 51A1 are connected without piping, which allows the flow path between the processing casing 23A1 and the switching mechanism 51A1 to be suitably short.

[0088] Since the flow path between the processing casing 23A1 and the switching mechanism 51A1 can be suitably short, contamination of the flow path between the processing casing 23A1 and the switching mechanism 51A1 can be suitably prevented. Therefore, the gas flows smoothly from the processing casing 23A1 to the switching mechanism 51A1. As a result, the gas in the processing casing 23A1 can be suitably exhausted.

[0089] The switching timing is determined by, for example, the gas change timing and the delay time. Here, the switching timing is the timing when the switching mechanism 51 switches the exhaust path. The gas change timing is the timing when the gas composition in the processing housing 23 changes. The delay time is the time required for the gas to reach the switching mechanism 51 from the processing housing 23. The shorter the flow path between the processing housing 23 and the switching mechanism 51, the shorter the delay time. The shorter the flow path between the processing housing 23 and the switching mechanism 51, the smaller the variation in the delay time. As described above, the substrate processing apparatus 1 can suitably shorten the flow path between the processing housing 23A1 and the switching mechanism 51A1. Therefore, the delay time can be suitably shortened. Furthermore, the variation in the delay time can be suitably suppressed. Therefore, the switching timing can be suitably determined. Therefore, the switching mechanism 51A1 can switch the exhaust path of the processing housing 23A1 at the appropriate timing.

[0090] Since the switching mechanism 51A1 is disposed at approximately the same height as the processing housing 23A1, the flow path between the processing housing 23A1 and the switching mechanism 51A1 extends in an approximately horizontal direction. This allows the gas to flow more smoothly from the processing housing 23A1 to the switching mechanism 51A1. As a result, the gas in the processing housing 23A1 can be more appropriately exhausted.

[0091] Similarly, the switching mechanisms 51B1, 51C1, and 51D1 are disposed at approximately the same height as the processing casings 23B1, 23C1, and 23D1, respectively, so that gases in the processing casings 23A1, 23C1, and 23D1 can be appropriately exhausted.

[0092] The exhaust pipe 41A is disposed on the side of the processing casing 23A1. Therefore, the switching mechanism 51A1 can be easily connected to the exhaust pipe 41A. The exhaust pipes 42A and 43A are also disposed on the side of the processing casing 23A1. Therefore, the switching mechanism 51A1 can be easily connected to the exhaust pipes 42A and 43A.

[0093] Similarly, the exhaust pipes 41B-43B are arranged on the side of the processing casing 23B1. Therefore, the switching mechanism 51B1 can be easily connected to the exhaust pipes 41B-43B. The exhaust pipes 41C-43C are arranged on the side of the processing casing 23C1. Therefore, the switching mechanism 51C1 can be easily connected to the exhaust pipes 41C-43C. The exhaust pipes 41D-43D are arranged on the side of the processing casing 23D1. Therefore, the switching mechanism 51D1 can be easily connected to the exhaust pipes 41D-43D.

[0094] The structure of the substrate processing apparatus 1 will be described in more detail below.

[0095] <Indexer section 3> Please refer to Figures 1 and 2. Figure 2 is a right side view showing the configuration of the central part of the substrate processing apparatus 1 in the width direction Y. The structure of the transport mechanism 6 will be described. The transport mechanism 6 includes a hand 7 and a hand drive unit 8. The hand 7 supports one substrate W in a horizontal position. The hand drive unit 8 is connected to the hand 7. The hand drive unit 8 moves the hand 7. The hand drive unit 8 moves the hand 7 in the front-rear direction X, the width direction Y, and the vertical direction Z.

[0096] The structure of the hand driving unit 8 is illustrated below. The hand driving unit 8 includes, for example, a rail 8a, a horizontal moving unit 8b, a vertical moving unit 8c, a rotating unit 8d, and an advancing / retreating moving unit 8e. The rail 8a is fixedly installed. The rail 8a is disposed at the bottom of the conveying space 5. The rail 8a extends in the width direction Y. The horizontal moving unit 8b is supported by the rail 8a. The horizontal moving unit 8b moves in the width direction Y relative to the rail 8a. The vertical moving unit 8c is supported by the horizontal moving unit 8b. The vertical moving unit 8c moves in the vertical direction Z relative to the horizontal moving unit 8b. The rotating unit 8d is supported by the vertical moving unit 8c. The rotating unit 8d rotates relative to the vertical moving unit 8c. The rotating unit 8d rotates around a rotation axis parallel to the vertical direction Z. The advancing / retreating moving unit 8e moves relative to the rotating unit 8d. The forward / backward moving unit 8e moves back and forth in one horizontal direction determined by the orientation of the rotating unit 8d. The forward / backward moving unit 8e is connected to the hand 7. Because the hand driving unit 8 has this configuration, the hand 7 can move parallel to the vertical direction Z. The hand 7 can move parallel to any horizontal direction. The hand 7 can rotate within a horizontal plane.

[0097] <Outline of Processing Block 11> Please refer to Figures 2 and 3. Figure 3 is a front view of the processing block 11. Figure 3 omits the illustration of the substrate placement unit 14A and the like. The processing block 11 includes a transport space 12B in addition to the transport space 12A. The transport space 12B is located below the transport space 12A. The transport space 12B is also connected to the transport space 5 of the indexer unit 3. Although not shown, the transport space 12B is located at the same position as the transport space 12A in a plan view.

[0098] When there is no need to distinguish between the transport spaces 12A and 12B, they are referred to as the transport spaces 12.

[0099] The processing block 11 includes one partition wall 13. The partition wall 13 is disposed below the transport space 12A and above the transport space 12B. The partition wall 13 has a horizontal plate shape. The partition wall 13 separates the transport space 12A from the transport space 12B.

[0100] Referring to FIG. 2, the processing block 11 includes a substrate placement part 14B in addition to the substrate placement part 14A. The substrate placement part 14B places a substrate W on it. The substrate placement part 14B is arranged below the substrate placement part 14A. The substrate placement part 14B is installed in the transport space 12B. The substrate placement part 14B is arranged at the front of the transport space 12B. The transport mechanism 6 of the indexer unit 3 can also access the substrate placement part 14B. The transport mechanism 6 transports the substrate W alternately to the substrate placement parts 14A and 14B, for example.

[0101] The processing block 11 includes a transport mechanism 16B in addition to the transport mechanism 16A. The transport mechanism 16B is installed in the transport space 12B. The transport mechanism 16B transports the substrate W. The transport mechanism 16B is accessible to the substrate platform 14B.

[0102] When there is no need to distinguish between the transport mechanisms 16A and 16B, they will be referred to as the transport mechanism 16.

[0103] 1, 2 and 3, the structure of the transport mechanism 16 will be described. The transport mechanism 16 includes a hand 17 and a hand drive unit 18. The hand 17 supports one substrate W in a horizontal position. The hand drive unit 18 is connected to the hand 17. The hand drive unit 18 moves the hand 17. The hand drive unit 18 moves the hand 17 in the front-rear direction X, the width direction Y and the vertical direction Z.

[0104] The structure of the hand driving unit 18 is illustrated below. The hand driving unit 18 includes, for example, two support columns 18a, a vertical moving section 18b, a horizontal moving section 18c, a rotating section 18d, and an advancing / retreating moving section 18e. The support columns 18a are fixedly installed. The support columns 18a are arranged on the sides of the transport space 12. The two support columns 18a are aligned in the front-to-rear direction X. Each support column 18a extends in the vertical direction Z. The vertical moving section 18b is supported by the support columns 18a. The vertical moving section 18b extends in the front-to-rear direction X between the two support columns 18a. The vertical moving section 18b moves in the vertical direction Z relative to the support columns 18a. The horizontal moving section 18c is supported by the vertical moving section 18b. The horizontal moving section 18c moves in the front-to-rear direction X relative to the vertical moving section 18b. The rotating section 18d is supported by the horizontal moving section 18c. The rotating unit 18d rotates relative to the horizontal moving unit 18c. The rotating unit 18d rotates around a rotation axis parallel to the vertical direction Z. The advancing / retreating moving unit 18e moves relative to the rotating unit 18d. The advancing / retreating moving unit 18e moves back and forth in one horizontal direction determined by the orientation of the rotating unit 18d. The advancing / retreating moving unit 18e is connected to the hand 17. Because the hand driving unit 18 is configured in this manner, the hand 17 can move parallel to the vertical direction Z. The hand 7 can move parallel to any horizontal direction. The hand 7 can rotate within a horizontal plane.

[0105] FIG. 4 is a right side view showing the configuration of the right part of the substrate processing apparatus 1. The processing block 11 includes five processing units 21A2-21A6 in addition to the processing unit 21A1. The processing units 21A2-21A6 include processing casings 23A2-23A6, respectively. The processing casings 23A2-23A6 are arranged below the processing casing 23A1. The processing casings 23A1-23A6 are lined up from top to bottom. The processing casings 23A1-23A6 are lined up in a row in the vertical direction Z. Although not shown, the processing casings 23A2-23A6 are each arranged at the same position as the processing casing 23A1 in a plan view. The processing casings 23A1-23A6 are stacked on top of each other.

[0106] Similarly, processing block 11 includes processing units 21B2-21B6 in addition to processing unit 21B1. Processing units 21B2-21B6 include processing casings 23B2-23B6, respectively. The relative positions of processing casings 23B1-23B6 are the same as the relative positions of processing casings 23A1-23A6.

[0107] 5 is a left side view showing the configuration of the left part of the substrate processing apparatus 1. Processing block 11 includes processing units 21C2-21C6 and 21D2-21D6 in addition to processing units 21C1 and 21D1. Processing units 21C2-21C6 and 21D2-21D6 include processing casings 23C2-23C6 and 23D2-23D6, respectively. Processing casings 23C1-23C6 and 23D1-23D6 are arranged in the same manner as processing casings 23A1-23A6, respectively.

[0108] See Figures 3, 4, and 5. As described above, processing housings 23A1, 23B1, 23C1, and 23D1 are arranged at the same height. Processing housings 23A2-23A6, 23B2-23B6, 23C2-23C6, and 23D2-23D6 are arranged similarly. That is, processing housings 23An, 23Bn, 23Cn, and 23Dn are arranged at the same height. Here, "n" is an integer from 1 to 6.

[0109] 3, the processing casings 23A1-23A3, 23B1-23B3, 23C1-23C3, and 23D1-23D3 are each disposed at the same height as the transfer space 12A, so the transfer mechanism 16A can access the processing casings 23A1-23A3, 23B1-23B3, 23C1-23C3, and 23D1-23D3.

[0110] The processing casings 23A4-23A6, 23B4-23B6, 23C4-23C6, and 23D4-23D6 are disposed at the same height as the transfer space 12B. Therefore, the transfer mechanism 16B can access the processing casings 23A4-23A6, 23B4-23B6, 23C4-23C6, and 23D4-23D6.

[0111] When processing units 21A1-21A6 are not distinguished from one another, they are called processing units 21A. When processing units 21B1-21B6 are not distinguished from one another, they are called processing units 21B. When processing units 21C1-21C6 are not distinguished from one another, they are called processing units 21C. When processing units 21D1-21D6 are not distinguished from one another, they are called processing units 21D. When processing units 21A, 21B, 21C, and 21D are not distinguished from one another, they are called processing units 21.

[0112] When there is no need to distinguish between the processing housings 23A1-23A6, they are referred to as processing housing 23A. When there is no need to distinguish between the processing housings 23B1-23B6, they are referred to as processing housing 23B. When there is no need to distinguish between the processing housings 23C1-23C6, they are referred to as processing housing 23C. When there is no need to distinguish between the processing housings 23D1-23D6, they are referred to as processing housing 23D. When there is no need to distinguish between the processing housings 23A, 23B, 23C, and 23D, they are referred to as processing housing 23.

[0113] 1, each processing housing 23 is adjacent to the transport space 12. Each processing housing 23A, 23B is disposed on the right side of the transport space 12. Each processing housing 23C, 23D is disposed on the left side of the transport space 12.

[0114] The processing block 11 includes first piping spaces 44A and 44B and second piping spaces 46A and 46B. The first piping spaces 44A and 44B and the second piping spaces 46A and 46B are adjacent to the transfer space 12. The first piping spaces 44A and 44B and the second piping spaces 46A and 46B are disposed to the right of the transfer space 12.

[0115] The first piping space 44A, the processing casing 23A, and the second piping space 46A are aligned in the front-to-rear direction X. The first piping space 44A, the processing casing 23A, and the second piping space 46A are aligned in this order. The first piping space 44A is disposed in front of the processing casing 23A. The first piping space 44A is adjacent to the processing casing 23A. The second piping space 46A is disposed behind the processing casing 23A. The second piping space 46A is adjacent to the processing casing 23A.

[0116] The relative positions of the processing casing 23B, the first piping space 44B, and the second piping space 46B are the same as the relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A. The first piping space 44B is disposed behind the second piping space 46A. The first piping space 44B is adjacent to the second piping space 46A.

[0117] The processing block 11 includes first piping spaces 44C and 44D and second piping spaces 46C and 46D. The first piping spaces 44C and 44D and the second piping spaces 46C and 46D are adjacent to the transfer space 12. The first piping spaces 44C and 44D and the second piping spaces 46C and 46D are disposed to the left of the transfer space 12. The relative positions of the processing casing 23C, the first piping space 44C, and the second piping space 46C are different from the relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A only in terms of orientation. The relative positions of the processing casing 23C, the first piping space 44C, and the second piping space 46C correspond to the relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A rotated 180 degrees around an axis parallel to the vertical direction Z. Therefore, the first piping space 44C is disposed behind the processing housing 23C. The second piping space 46C is disposed in front of the processing housing 23C. In this way, the relative positions of the processing housing 23C, the first piping space 44C, and the second piping space 46C are the same as the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. The processing housing 23C, the first piping space 44C, and the second piping space 46C differ only in the installation orientation from the processing housing 23A, the first piping space 44A, and the second piping space 46A. The relative positions of the processing housing 23D, the first piping space 44D, and the second piping space 46D are also the same as the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. The processing casing 23D, the first piping space 44D, and the second piping space 46D are different from the processing casing 23A, the first piping space 44A, and the second piping space 46A only in the orientation in which they are installed.

[0118] The first piping space 44A accommodates the exhaust pipes 41A-43A. In other words, the exhaust pipes 41A-43A are installed in the first piping space 44A. Similarly, the first piping space 44B accommodates the exhaust pipes 41B-43B. The first piping space 44C accommodates the exhaust pipes 41C-43C. The first piping space 44D accommodates the exhaust pipes 41D-43D.

[0119] Exhaust pipes 41A-43A are disposed in front of processing housing 23A. Exhaust pipes 41B-43B are disposed in front of processing housing 23B. Exhaust pipes 41C-43C are disposed behind processing housing 23C. Exhaust pipes 41D-43D are disposed behind processing housing 23D.

[0120] The exhaust pipes 41A-43A are aligned in the width direction Y. Each of the exhaust pipes 41A-43A is adjacent to the processing housing 23A. Similarly, the exhaust pipes 41B-43B are aligned in the width direction Y. Each of the exhaust pipes 41B-43B is adjacent to the processing housing 23B. The exhaust pipes 41C-43C are aligned in the width direction Y. Each of the exhaust pipes 41C-43C is adjacent to the processing housing 23C. The exhaust pipes 41D-43D are aligned in the width direction Y. Each of the exhaust pipes 41D-43D is adjacent to the processing housing 23C.

[0121] The processing block 11 includes air supply pipes 48A, 48B, 48C, and 48D. The air supply pipe 48A is installed in the second piping space 46A. The air supply pipe 48A supplies gas (e.g., clean air) to the processing housing 23A. Similarly, the air supply pipes 48B, 48C, and 48D are housed in the second piping spaces 46B, 46C, and 46C, respectively. The air supply pipes 48B, 48C, and 48D supply gas to the processing housings 23B, 23C, and 23D, respectively.

[0122] 3, 4, and 5. Each of the exhaust pipes 41A-43A extends in the vertical direction Z. Each of the exhaust pipes 41A-43A extends from the height position of the processing housing 23A1 to the height position of the processing housing 23A6. Similarly, each of the exhaust pipes 41B-43B, 41C-43C, and 41D-41D extends in the vertical direction Z.

[0123] 4 and 5, the air supply pipes 48A-48D extend vertically and are installed on the sides of the processing housings 23A-23D, respectively.

[0124] The front-rear direction X is an example of a first direction in the present invention, and the width direction Y is an example of a second direction in the present invention.

[0125] When exhaust pipes 41A-41D are not distinguished, they are called exhaust pipes 41. When exhaust pipes 42A-42D are not distinguished, they are called exhaust pipes 42. When exhaust pipes 43A-43D are not distinguished, they are called exhaust pipes 43. When first piping spaces 44A, 44B, 44C, and 44D are not distinguished, they are called first piping spaces 44. When second piping spaces 46A, 46B, 46C, and 46D are not distinguished, they are called second piping spaces 46. When air intake pipes 48A-48D are not distinguished, they are called air intake pipes 48.

[0126] The first piping space 44 does not accommodate piping for supplying gas to the processing housing 23. The first piping space 44 does not accommodate piping for supplying processing liquid to the processing unit 21 (liquid supply section 33). The first piping space 44 does not accommodate piping for discharging processing liquid from the processing unit 21.

[0127] The second piping space 46 may accommodate, for example, a pipe that supplies the processing liquid to the processing unit 21 (liquid supply part 33). The second piping space 46 may accommodate, for example, a pipe that discharges the processing liquid from the processing unit 21.

[0128] See Figures 3 and 4. As described above, the switching mechanism 51A1 is disposed at approximately the same height as the processing casing 23A1. The switching mechanism 51A1 overlaps with the processing casing 23A1 in a front view. Specifically, the entire switching mechanism 51A1 overlaps with the processing casing 23A1 in a front view. The relative position between the switching mechanism 51B1 and the processing casing 23B1 is the same as the relative position between the switching mechanism 51A1 and the processing casing 23A1. The relative positions between the switching mechanisms 51C1 and 51D1 and the processing casings 23C1 and 23D1 are also the same as the relative position between the switching mechanism 51A1 and the processing casing 23A1.

[0129] The processing block 11 includes switching mechanisms 51A2-51A6 in addition to the switching mechanism 51A1. The relative position between the switching mechanism 51A2 and the processing casing 23A2 is the same as the relative position between the switching mechanism 51A1 and the processing casing 23A1. Specifically, the switching mechanism 51A2 is disposed at approximately the same height as the processing casing 23A2. The switching mechanism 51A2 overlaps with the processing casing 23A2 in a front view. Similarly, the relative positions between the switching mechanisms 51A3-51A6 and the processing casings 23A3-23A6 are the same as the relative positions between the switching mechanism 51A1 and the processing casing 23A1.

[0130] Switching mechanism 51A2 switches the exhaust path of processing housing 23A2 to one of exhaust pipes 41A-43A. Similarly, switching mechanisms 51A3-51A6 switch the exhaust paths of processing housings 23A3-23A6 to one of exhaust pipes 41A-43A, respectively. Therefore, exhaust pipes 41A-43A exhaust gas from processing housings 23A1-23A6, respectively.

[0131] Referring to FIG. 4, the processing block 11 includes switching mechanisms 51B2-51B6 in addition to the switching mechanism 51B1. The relative positions of the switching mechanisms 51B2-51B6 and the processing housings 23B2-23B6 are the same as the relative positions of the switching mechanism 51B1 and the processing housing 23B1. The switching mechanisms 51B2-51B6 switch the exhaust paths of the processing housings 23B2-23B6 to one of the exhaust pipes 41B-43B, respectively. Therefore, the exhaust pipes 41B-43B exhaust gas from the processing housings 23B1-23B6, respectively.

[0132] Referring to FIG. 5, the processing block 11 includes switching mechanisms 51C2-51C6 in addition to the switching mechanism 51C1. The relative positions of the switching mechanisms 51C2-51C6 and the processing housings 23C2-23C6 are the same as the relative positions of the switching mechanism 51C1 and the processing housing 23C1. The switching mechanisms 51C2-51C6 switch the exhaust paths of the processing housings 23C2-23C6 to one of the exhaust pipes 41C-43C, respectively. Therefore, the exhaust pipes 41C-43C exhaust gas from the processing housings 23C1-23C6, respectively.

[0133] The processing block 11 includes switching mechanisms 51D2-51D6 in addition to the switching mechanism 51D1. The relative positions of the switching mechanisms 51D2-51D6 and the processing housings 23D2-23D6 are the same as the relative positions of the switching mechanism 51D1 and the processing housing 23D1. The switching mechanisms 51D2-51D6 switch the exhaust paths of the processing housings 23D2-23D6 to one of the exhaust pipes 41D-43D, respectively. Therefore, the exhaust pipes 41D-43D exhaust gas from the processing housings 23D1-23D6.

[0134] Although not shown, switching mechanisms 51A2-51A6 are each disposed at the same position as switching mechanism 51A1 in a plan view. Similarly, switching mechanisms 51B2-51B6 are each disposed at the same position as switching mechanism 51B1 in a plan view. Switching mechanisms 51C2-51C6 are each disposed at the same position as switching mechanism 51B1 in a plan view. Switching mechanisms 51D2-51D6 are each disposed at the same position as switching mechanism 51B1 in a plan view.

[0135] When switching mechanisms 51A1-51A6 are not distinguished, they are called switching mechanisms 51A. When switching mechanisms 51B1-51B6 are not distinguished, they are called switching mechanisms 51B. When switching mechanisms 51C1-51C6 are not distinguished, they are called switching mechanisms 51C. When switching mechanisms 51D1-51D6 are not distinguished, they are called switching mechanisms 51D. When switching mechanisms 51A, 51B, 51C, and 51D are not distinguished, they are called switching mechanisms 51.

[0136] Referring to FIG. 1, the switching mechanism 51 is installed at a position that does not overlap with the holding portion 31 in a plan view. At least a portion of the switching mechanism 51 is installed outside the processing housing 23. At least a portion of the switching mechanism 51 is installed on the side of the processing housing 23. At least a portion of the switching mechanism 51 is installed in the first piping space 44. At least a portion of each switching mechanism 51A is installed in the first piping space 44A. At least a portion of each switching mechanism 51B is installed in the first piping space 44B. At least a portion of each switching mechanism 51C is installed in the first piping space 44C. At least a portion of each switching mechanism 51D is installed in the first piping space 44D.

[0137] <Structure of processing unit 21> Fig. 6 is a plan view of processing unit 21. Fig. 7 is a side view of processing unit 21. As described above, each processing unit 21 includes processing housing 23, holding section 31, and liquid supply section 33. Note that Fig. 1 shows liquid supply section 33 in a simplified manner for convenience, and therefore liquid supply section 33 shown in Fig. 6 is slightly different from liquid supply section 33 shown in Fig. 1.

[0138] The following describes the structure of the processing housing 23. The processing housing 23 has a substantially box shape. The processing housing 23 has a substantially rectangular shape in plan view, front view, and side view.

[0139] Each processing housing 23 includes four side walls 25a, 25b, 25c, and 25d, a top plate 25e, and a bottom plate 25f. Each of the side walls 25a-25d has a substantially vertical plate shape. The top plate 25e and the bottom plate 25f have a substantially horizontal plate shape.

[0140] Each processing housing 23 has therein a processing space 24. The substrate W is processed in the processing space 24. The processing space 24 is defined by side walls 25a-25d, a top plate 25e, and a bottom plate 25f.

[0141] The side walls 25a and 25c extend in the front-rear direction X in a plan view. The side wall 25c is provided opposite the side wall 25a. The side walls 25b and 25d extend in the width direction Y in a plan view. The side walls 25b and 25d each extend from the side wall 25a to the side wall 25c. The side wall 25d is provided opposite the side wall 25b.

[0142] Processing housing 23B has the same structure as processing housing 23A. Processing housings 23C and 23D also have the same structure as processing housing 23A. Processing housings 23C and 23D differ from processing housing 23A only in their installation orientation. Processing housings 23C and 23D correspond to processing housing 23A rotated 180 degrees around an axis parallel to the vertical direction Z. Therefore, in all of processing housings 23A-23D, sidewall 25a contacts transfer space 12. In all of processing housings 23A-23D, sidewall 25b contacts first piping space 44. In all of processing housings 23A-23D, sidewall 25d contacts second piping space 46.

[0143] The processing housing 23 has a substrate transfer opening 27. The substrate transfer opening 27 is formed in the side wall 25a. The substrate W can pass through the substrate transfer opening 27. The substrate W moves between the outside of the processing housing 23 and the inside of the processing housing 23 through the substrate transfer opening 27. Specifically, the substrate W moves between the transfer space 12 and the processing space 24 through the substrate transfer opening 27.

[0144] Each processing unit 21 may include a shutter (not shown). The shutter is attached to the side wall 25a. The shutter opens and closes the substrate transfer opening 27.

[0145] The holder 31 holds one substrate W in a horizontal position. The holder 31 has an upper surface 31a. The upper surface 31a is substantially horizontal. The substrate W is placed on the upper surface 31a.

[0146] 6 and 7 show the center point G. The center point G is the position of the center of the substrate W when the substrate W is held by the holder 31.

[0147] See Figure 7. Each processing unit 21 further includes a rotational drive unit 32. The rotational drive unit 32 is installed inside the processing housing 23. The rotational drive unit 32 is connected to the holder 31. The rotational drive unit 32 rotates the holder 31. The substrate W held by the holder 31 rotates integrally with the holder 31. The holder 31 and the substrate W rotate around a rotational axis Aw. The rotational axis Aw is, for example, an imaginary line parallel to the vertical direction Z. The rotational axis Aw passes through the center point G, for example.

[0148] 6, the liquid supply unit 33 supplies a first processing liquid, a second processing liquid, and a third processing liquid. The first processing liquid, the second processing liquid, and the third processing liquid are different from one another. That is, the liquid supply unit 33 supplies a plurality (three) types of processing liquid.

[0149] The first treatment liquid is classified as, for example, an acid liquid and contains at least one of hydrofluoric acid (hydrofluoric acid), hydrochloric acid-hydrogen peroxide solution, sulfuric acid, sulfuric acid-hydrogen peroxide solution, hydrofluoric nitric acid (a mixture of hydrofluoric acid and nitric acid), and hydrochloric acid.

[0150] The second treatment liquid is classified as, for example, an alkaline liquid, and includes, for example, at least one of an ammonia-hydrogen peroxide solution (SC1), an ammonia water solution, an ammonium fluoride solution, and tetramethylammonium hydroxide (TMAH).

[0151] The third processing liquid is classified as an organic liquid, for example, and includes at least one of isopropyl alcohol (IPA), methanol, ethanol, hydrofluoroether (HFE), and acetone.

[0152] The liquid supply unit 33 includes nozzles 34A, 34B, and 34C. The nozzles 34A, 34B, and 34C each eject a treatment liquid. The nozzle 34A ejects, for example, a first treatment liquid. The nozzle 34B ejects, for example, a second treatment liquid. The nozzle 34C ejects, for example, a third treatment liquid.

[0153] Each of the nozzles 34A, 34B, and 34C has a linearly extending tubular shape. Each of the nozzles 34A, 34B, and 34C has a tip end 35A, 35B, and 35C and a base end 36A, 36B, and 36C. Each of the tip ends 35A, 35B, and 35C has a discharge port (not shown) for discharging the treatment liquid.

[0154] The liquid supply unit 33 includes base portions 37A, 37B, and 37C. The base portions 37A, 37B, and 37C support the nozzles 34A, 34B, and 34C, respectively. Specifically, the base portions 37A, 37B, and 37C are connected to the base ends 36A, 36B, and 36C.

[0155] The base portion 37A also moves the nozzle 34A. For example, the base portion 37A rotates the nozzle 34A about a rotation axis that passes through the base portion 37A and is parallel to the vertical direction Z. Similarly, the base portions 37B and 37C move the nozzles 34B and 34C, respectively.

[0156] The nozzle 34A can be moved between a processing position and a retracted position by the base portion 37A. When the nozzle 34A is in the processing position, the tip portion 35A (discharge port) is located above the substrate W held by the holder 31. When the nozzle 34A is in the processing position, the tip portion 35A (discharge port) overlaps with the substrate W held by the holder 31 in a plan view. When the nozzle 34A is in the retracted position, the entire nozzle 34A does not overlap with the substrate W held by the holder 31 in a plan view. Similarly, the nozzles 34B and 34C can each be moved between the processing position and the retracted position. Figure 6 shows the nozzles 34A, 34B, and 34C in the retracted positions.

[0157] Base portions 37A-37C are each disposed near sidewall 25c. Base portion 37A is disposed at a corner where sidewall 25c and sidewall 25b join. Base portions 37B and 37C are disposed at corners where sidewall 25c and sidewall 25d join.

[0158] Each processing unit 21 includes a cup 38. The cup 38 is disposed around the holder 31. The cup 38 surrounds the side of the substrate W held by the holder 31. The cup 38 receives the processing liquid splashed from the substrate W held by the holder 31.

[0159] 7, each processing unit 21 includes a blowing unit 39. The blowing unit 39 supplies gas to the processing space 24. The blowing unit 39 is attached to the upper plate 25e. The blowing unit 39 is disposed above the holder 31. The blowing unit 39 blows gas (e.g., clean air) downward.

[0160] The blowout unit 39 is connected to an air supply pipe 48. The air supply pipe 48 supplies gas to the blowout unit 39.

[0161] The relative positions of processing casing 23, holder 31, and liquid supply unit 33 are the same among processing units 21A to 21D. The relative positions of processing casing 23, holder 31, and liquid supply unit 33 in processing units 21C and 21D differ from the relative positions of processing casing 23, holder 31, and liquid supply unit 33 in processing unit 21A only in terms of orientation.

[0162] <Structure of the switching mechanism 51> 6 and 7, the switching mechanism 51 includes a switching housing 53. The size of the switching housing 53 is smaller than that of the processing housing 23. The switching housing 53 is connected to the processing housing 23. The switching housing 53 is further connected to the exhaust pipes 41-43. Each switching housing 53 extends horizontally. Each switching housing 53 is bent in a substantially L-shape in plan view. The switching housing 53 has a switching space 54 therein.

[0163] Each switching housing 53 includes an introduction portion 55. The introduction portion 55 is connected to the processing housing 23. The introduction portion 55 is connected to the side wall 25b of the processing housing 23.

[0164] The introduction section 55 extends from the processing housing 23 in the front-rear direction X. The introduction section 55 has a first end 55a and a second end 55b. The first end 55a corresponds to the upstream end of the switching space 54. The switching space 54 opens to the processing space 24 at the first end 55a. In this way, the switching housing 53 communicates with the processing housing 23 at the introduction section 55. Gas flows from the processing housing 23 into the switching space 54 through the first end 55a1.

[0165] The introduction part 55 penetrates the processing housing 23. The first end 55a is disposed inside the processing housing 23. That is, the first end 55a is disposed in the processing space 24. The second end 55b is disposed outside the processing housing 23. Specifically, the second end 55b is disposed in the first piping space 44.

[0166] The introduction section 55 is disposed at a position close to the side wall 25a. In contrast, the base sections 37A-37C are disposed at a position close to the side wall 25c. In other words, the introduction section 55 is disposed at a position close to the transport space 12. The base sections 37A-37C are disposed at positions far from the transport space 12.

[0167] The positions of the introduction portion 55 and other components will be described with reference to the side wall 25a. Figure 6 shows distances D1, D2, D3, and D4. Distance D1 is the separation distance between the introduction portion 55 and the side wall 25a in a planar view. Distance D2 is the separation distance between the holding portion 31 and the side wall 25a in a planar view. Distance D3 is the separation distance between the center point G and the side wall 25a in a planar view. Distance D4 is the separation distance between the base portion 37A and the side wall 25a in a planar view. Distance D1 is smaller than distance D2. Distance D2 is smaller than distance D3. Distance D3 is smaller than distance D4.

[0168] Here, the side wall 25a contacts the transport space 12. Therefore, the above-mentioned distances D1-D4 are approximate to distances based on the transport space 12. That is, the distance D1 is approximate to the separation distance between the introduction portion 55 and the transport space 12 in a plan view. The distance D2 is approximate to the separation distance between the holding portion 31 and the transport space 12 in a plan view. The distance D3 is approximate to the separation distance between the center point G and the transport space 12 in a plan view. The distance D4 is approximate to the separation distance between the base portion 37A and the transport space 12 in a plan view. Therefore, in a plan view, the separation distance between the introduction portion 55 and the transport space 12 is smaller than the separation distance between the holding portion 31 and the transport space 12. In a plan view, the separation distance between the holding portion 31 and the transport space 12 is smaller than the separation distance between the center point G and the transport space 12. In a plan view, the distance between the center point G and the transport space 12 is smaller than the distance between the base portion 37A and the transport space 12.

[0169] Each switching housing 53 includes a distribution section 56. The distribution section 56 is connected to the introduction section 55. The distribution section 56 is connected to a second end 55b of the introduction section 55. The distribution section 56 extends in the width direction Y.

[0170] The distribution unit 56 is disposed outside the processing housing 23. The distribution unit 56 is disposed in the first piping space 44. The distribution unit 56 is disposed near the exhaust pipes 41-43.

[0171] The exhaust pipes 41-43 each contact the processing housing 23. In a plan view, the exhaust pipes 41-43 are disposed between the processing housing 23 and the distributor 56. Specifically, the exhaust pipes 41-43 each contact the side wall 25b of the processing housing 23. The exhaust pipes 41-43 are disposed between the side wall 25b and the distributor 56.

[0172] The distribution unit 56 is connected to the exhaust pipes 41-43. The distribution unit 56 is connected to the outer surfaces of the exhaust pipes 41-43. The switching housing 53 communicates with the exhaust pipes 41-43 at the distribution unit 56.

[0173] Specifically, the exhaust pipe 41 has an opening 41k. The opening 41k is formed on the outer surface of the exhaust pipe 41. The opening 41k communicates with a flow path inside the exhaust pipe 41. The distributor 56 connects to a portion of the exhaust pipe 41 located around the opening 41k. This allows the switching space 54 to communicate with the flow path inside the exhaust pipe 41 through the opening 41k. Similarly, the exhaust pipes 42 and 43 have openings 42k and 43k, respectively. The distributor 56 connects to the exhaust pipes 42 and 43 around the openings 42k and 43k.

[0174] 6 and 8. FIG. 8 is a front view of the switching mechanism 51. For convenience, FIG. 8 shows the switching housing 53 with a dashed line. Each switching housing 53 includes three opening / closing units 61, 62, and 63. The opening / closing units 61-63 are installed inside the switching housing 53. That is, the switching housing 53 houses the opening / closing units 61-63. Specifically, the opening / closing units 61-63 are installed inside the distribution unit 56. The opening / closing units 61-63 are installed outside the processing housing 23. The opening / closing units 61-63 are installed in the first piping space 44. The opening / closing units 61, 62, and 63 are disposed in positions facing the openings 41k, 42k, and 43k, respectively. The opening / closing units 61, 62, and 63 are movable between a position that opens the openings 41k, 42k, and 43k, respectively, and a position that closes the openings 41k, 42k, and 43k, respectively.

[0175] 6 and 8, the opening / closing portion 61 is in a position to open the opening 41k, and the opening / closing portions 62 and 63 are in positions to close the openings 42k and 43k, respectively.

[0176] When the opening / closing unit 61 opens the opening 41k, the exhaust pipe 41 communicates with the processing casing 23. When the opening / closing unit 61 closes the opening 41k, the exhaust pipe 41 is cut off from the processing casing 23. In this way, the position of the opening / closing unit 61 that opens the opening 41k corresponds to the position of the opening / closing unit 61 that connects the processing casing 23 to the exhaust pipe 41. The position of the opening / closing unit 61 that closes the opening 41k corresponds to the position of the opening / closing unit 61 that cuts off the processing casing 23 from the exhaust pipe 41.

[0177] Similarly, when the opening / closing units 62 and 63 open the openings 42k and 43k, respectively, the exhaust pipes 42 and 43 are in communication with the processing housing 23. When the opening / closing units 62 and 63 close the openings 42k and 43k, respectively, the exhaust pipes 42 and 43 are isolated from the processing housing 23. In this way, the positions of the opening / closing units 62 and 63 that open the openings 42k and 43k, respectively, correspond to the positions of the opening / closing units 62 and 63 that connect the processing housing 23 to the exhaust pipes 42-43. The positions of the opening / closing units 62 and 63 that close the openings 42k and 43k, respectively, correspond to the positions of the opening / closing units 62 and 63 that isolate the processing housing 23 from the exhaust pipes 42-43.

[0178] The opening and closing units 61, 62, and 63 can move independently of one another. Therefore, the exhaust pipes 41, 42, and 43 can be individually connected to the processing housing 23. The exhaust pipes 41, 42, and 43 can be individually disconnected from the processing housing 23.

[0179] The opening / closing units 61, 62, and 63 have, for example, the following structure. The opening / closing unit 61 has a substantially vertical flat plate shape. The opening / closing unit 61 is installed so that it can swing around a rotation axis A1. The rotation axis A1 is an imaginary line parallel to the vertical direction Z. The rotation axis A1 passes through a first end of the opening / closing unit 61. The opening / closing unit 61 swings around the rotation axis A1. The opening / closing units 62 and 63 have the same structure as the opening / closing unit 61. The opening / closing units 62 and 63 swing around rotation axes A2 and A3, respectively.

[0180] The opening / closing units 61, 62, 63 are moved by a power source (e.g., an electric motor) not shown. Here, the power source is not an element of the switching mechanism 51. The power source is an external element of the switching mechanism 51. The power source may be disposed, for example, outside the switching housing 53.

[0181] The opening / closing section 61 is an example of a first opening / closing section in the present invention, and the opening / closing section 62 is an example of a second opening / closing section in the present invention.

[0182] As described above, the switching mechanism 51 is disposed at a position in a plan view that does not overlap with the holding portion 31. The position of the switching mechanism 51 in a plan view will be described in detail below.

[0183] 6 shows an imaginary circle E3r with a dashed line. The imaginary circle E3r is centered at a central point G. The radius of the imaginary circle E3r is three times the radius of the substrate W. The switching mechanism 51 is disposed outside the imaginary circle E3r in a planar view. That is, the distance from the central point G to the switching mechanism 51 is greater than three times the radius of the substrate W in a planar view.

[0184] 6 shows an imaginary circle E5r with a dashed line. The imaginary circle E5r is centered at a central point G. The radius of the imaginary circle E5r is five times the radius of the substrate W. The switching mechanism 51 is disposed within the imaginary circle E5r in a planar view. That is, the distance from the central point G to the switching mechanism 51 is less than five times the radius of the substrate W in a planar view.

[0185] As described above, the switching mechanism 51 is disposed at approximately the same height as the processing housing 23. The height position of the switching mechanism 51 will be described in more detail.

[0186] Referring to FIG. 7, the switching mechanism 51 has an upper end P1 and a lower end Q1. The upper end P1 and the lower end Q1 correspond to the upper and lower ends of the switching housing 53, respectively. The processing housing 23 has an upper end P2 and a lower end Q2. The upper end P2 corresponds to the upper surface of the upper plate 25e. The lower end Q2 corresponds to the lower surface of the bottom plate 25f. The upper end P1 is positioned at a position equal to or lower than the upper end P2. Specifically, the upper end P1 is positioned lower than the upper end P2. The lower end Q1 is positioned at a position equal to or higher than the lower end Q2. Specifically, the lower end Q1 is positioned higher than the lower end Q2.

[0187] The switching mechanism 51 is disposed at a position equal to or lower than the upper surface 31a of the holding portion 31. That is, the upper end P1 is disposed at a position equal to or lower than the upper surface 31a. Specifically, the upper end P1 is disposed at a position lower than the upper surface 31a. Here, the upper surface 31a of the holding portion 31 is an example of the upper end of the holding portion 31 in the present invention.

[0188] <Exhaust path configuration> 9 is a system diagram of an exhaust path from the processing housing 23. The substrate processing apparatus 1 includes a pressure sensor 71A1. The pressure sensor 71A1 detects the exhaust pressure. Specifically, the pressure sensor 71A1 measures the pressure of the gas on the primary side (upstream side) of the switching mechanism 51A1. The pressure sensor 71A1 measures the pressure of the gas flowing from the processing housing 23A1 into the switching mechanism 51A1.

[0189] The substrate processing apparatus 1 includes a pressure adjustment mechanism 73A1. The pressure adjustment mechanism 73A1 adjusts the exhaust pressure. Specifically, the pressure adjustment mechanism 73A1 adjusts the pressure of the gas on the primary side of the switching mechanism 51A1. More specifically, the pressure adjustment mechanism 73A1 adjusts the pressure of the gas on the primary side of the switching mechanism 51A1 based on the detection result of the pressure sensor 71A1.

[0190] Similarly, the substrate processing apparatus 1 includes pressure sensors 71A2-71A6, 71B1-71B6, 71C1-71C6, and 71D1-71D6. When the pressure sensors 71A1-71A6, 71B1-71B6, 71C1-71C6, and 71D1-71D6 are not distinguished from one another, they are collectively referred to as pressure sensors 71. Each pressure sensor 71 detects the exhaust pressure. Each pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51.

[0191] The substrate processing apparatus 1 includes pressure adjustment mechanisms 73A2-73A6, 73B1-73B6, 73C1-73C6, and 73D1-73D6. When there is no need to distinguish between the pressure adjustment mechanisms 73A1-73A6, 73B1-73B6, 73C1-73C6, and 73D1-73D6, they are referred to as pressure adjustment mechanisms 73. Each pressure adjustment mechanism 73 adjusts the primary pressure of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0192] The substrate processing apparatus 1 includes exhaust pipes 81A, 82A, and 83A. The exhaust pipe 81A is connected to exhaust pipes 41A and 41B. The exhaust pipe 81A exhausts gas from the exhaust pipe 41A and gas from the exhaust pipe 41B. The exhaust pipe 82A is connected to exhaust pipes 42A and 42B. The exhaust pipe 82A exhausts gas from the exhaust pipe 42A and gas from the exhaust pipe 42B. The exhaust pipe 83A is connected to exhaust pipes 43A and 43B. The exhaust pipe 83A exhausts gas from the exhaust pipe 43A and gas from the exhaust pipe 43B.

[0193] Similarly, the substrate processing apparatus 1 includes exhaust pipes 81B, 82B, and 83B. The connection relationship between the exhaust pipes 81B-83B and the exhaust pipes 41C-43C and 41D-43D is the same as the connection relationship between the exhaust pipes 81A-83A and the exhaust pipes 41A-43A and 41B-43B.

[0194] The substrate processing apparatus 1 includes a pressure sensor 84A. The pressure sensor 84A detects the exhaust pressure. Specifically, the pressure sensor 84A measures the gas inside the exhaust pipe 81A.

[0195] The substrate processing apparatus 1 includes a pressure adjustment mechanism 87A. The pressure adjustment mechanism 87A adjusts the exhaust pressure. Specifically, the pressure adjustment mechanism 87A adjusts the pressure of the gas inside the exhaust pipe 81A. More specifically, the pressure adjustment mechanism 87A adjusts the pressure of the gas inside the exhaust pipe 81A based on the detection result of the pressure sensor 84A.

[0196] Similarly, the substrate processing apparatus 1 includes pressure sensors 85A, 86A, 84B, 85B, and 86B. The pressure sensors 85A-86A and 84B-86B detect exhaust pressures, respectively. The pressure sensors 85A-86A and 84B-86B measure gases inside exhaust pipes 82A-83A and 81B-83B, respectively.

[0197] The substrate processing apparatus 1 includes pressure adjustment mechanisms 88A, 89A, 87B, 88B, and 89B. The pressure adjustment mechanisms 88A-89A and 87B-89B adjust the pressure of the gas inside the exhaust pipes 82A-83A and 81B-83B based on the detection results of the pressure sensors 85A-86A and 84B-86B, respectively.

[0198] When exhaust pipes 81A and 81B are not distinguished, they are called exhaust pipe 81. When exhaust pipes 82A and 82B are not distinguished, they are called exhaust pipe 82. When exhaust pipes 83A and 83B are not distinguished, they are called exhaust pipe 83. When pressure sensors 84A and 84B are not distinguished, they are called pressure sensor 84. When pressure sensors 85A and 85B are not distinguished, they are called pressure sensor 85. When pressure sensors 86A and 86B are not distinguished, they are called pressure sensor 86. When pressure adjustment mechanisms 87A and 87B are not distinguished, they are called pressure adjustment mechanism 87. When pressure adjustment mechanisms 88A and 88B are not distinguished, they are called pressure adjustment mechanism 88. When pressure adjustment mechanisms 89A and 89B are not distinguished, they are called pressure adjustment mechanism 89.

[0199] See Figure 6. The pressure sensor 71 is installed, for example, in the flow path between the processing housing 23 and the switching mechanism 51. The pressure sensor 71 is installed, for example, inside the switching housing 53 (i.e., the switching space 54). The pressure sensor 71 is installed, for example, in the introduction section 55. The pressure sensor 71 is installed, for example, on the primary side of the distribution section 56. The pressure sensor 71 is installed, for example, on the primary side of the opening and closing sections 61-63.

[0200] The pressure adjustment mechanism 73 is installed, for example, in the flow path between the processing casing 23 and the switching mechanism 51. The pressure adjustment mechanism 73 is installed, for example, inside the switching casing 53 (i.e., the switching space 54). The pressure adjustment mechanism 73 is installed, for example, in the introduction section 55. The pressure adjustment mechanism 73 is installed, for example, on the primary side of the distribution section 56. The pressure adjustment mechanism 73 is installed, for example, on the primary side of the opening / closing sections 61-63. The pressure adjustment mechanism 73 is installed, for example, near the pressure sensor 71. The pressure adjustment mechanism 73 is arranged, for example, on the secondary side (downstream side) of the pressure sensor 71. The pressure adjustment mechanism 73 is arranged, for example, on the primary side of the pressure sensor 71.

[0201] The pressure adjustment mechanism 73 may adjust the pressure of the gas by, for example, adjusting the flow rate of the gas. The pressure adjustment mechanism 73 is, for example, a damper or a fan.

[0202] It should be noted that the pressure sensor 71 and the pressure adjustment mechanism 73 are omitted from FIG.

[0203] 3, 4, and 5. Exhaust pipes 81-83 are each disposed at a position higher than the processing housing 23. Each exhaust pipe 81 is connected to two exhaust pipes 41 at a position higher than the processing housing 23. Each exhaust pipe 82 is connected to two exhaust pipes 42 at a position higher than the processing housing 23. Each exhaust pipe 83 is connected to two exhaust pipes 43 at a position higher than the processing housing 23.

[0204] The exhaust pipes 41-43 each extend to a position higher than the processing housing 23. Gas flows upward through the exhaust pipes 41-43. The exhaust pipes 41-43 each have a lower end. The lower ends of the exhaust pipes 41-43 are each closed.

[0205] See FIG. 3. Exhaust pipes 81A-83A are disposed above the processing housings 23A and 23B. The exhaust pipes 81A-83A are aligned in the width direction Y. The exhaust pipes 81A-83A are disposed at the same height. Exhaust pipes 81B-83B are disposed above the processing housings 23C and 23D. The exhaust pipes 81B-83B are aligned in the width direction Y. The exhaust pipes 81B-83B are disposed at the same height. The exhaust pipes 81B-83B are disposed at the same height as the exhaust pipes 81A-83A.

[0206] 10 is a plan view showing the upper part of the processing block 11. The exhaust pipes 81A-83A and 81B-83B each extend in the front-rear direction X. The exhaust pipes 81A-83A have the same length. The exhaust pipes 81B-83B have the same length. The exhaust pipes 81B-83B are shorter than the exhaust pipes 81A-83A.

[0207] The exhaust pipes 81A, 82A, and 83A have front ends 81Af, 82Af, and 83Af, respectively. The exhaust pipes 81B, 82B, and 83B have front ends 81Bf, 82Bf, and 83Bf, respectively. The front ends 81Af-83Af are located forward of the front ends 81Bf-83Bf. The front ends 81Af-83Af are located rearward of the indexer unit 3.

[0208] Exhaust pipe 81 extends to a position behind processing block 11 and is connected in communication with a first exhaust treatment facility (not shown). The first exhaust treatment facility collects gas from exhaust pipe 81. Similarly, exhaust pipes 82 and 83 extend to positions behind processing block 11 and are connected in communication with second and third exhaust treatment facilities (not shown), respectively. The second and third exhaust treatment facilities collect gas from exhaust pipes 82 and 83, respectively. The first to third exhaust treatment facilities are all external elements of substrate processing apparatus 1. The first to third exhaust treatment facilities are each provided, for example, in a factory in which substrate processing apparatus 1 is installed.

[0209] Gas flows rearward in exhaust pipes 81 to 83. Front ends 81Af to 83Af and 81Bf to 83Bf correspond to the upstream ends of exhaust pipes 81A to 83A and 81B to 83B, respectively.

[0210] The front ends 81Af-83Af and 81Bf-83Bf are open to the outside of the substrate processing apparatus 1. For example, the front ends 81Af-83Af and 81Bf-83Bf are open to a clean room in which the substrate processing apparatus 1 is installed.

[0211] The pressure sensor 84 is installed in the exhaust pipe 81. The pressure sensor 84 is installed downstream of the connection position between the exhaust pipe 81 and the exhaust pipe 41. For example, the pressure sensor 84A is installed downstream of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B. The pressure sensor 84A is installed rearward of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B.

[0212] Similarly, pressure sensors 85 and 86 are installed in the exhaust pipes 82 and 83, respectively.

[0213] The pressure adjustment mechanism 87 is installed in the exhaust pipe 81. The pressure adjustment mechanism 87 is installed upstream of the pressure sensor 84. The pressure adjustment mechanism 87 is installed upstream of the connection position between the exhaust pipe 81 and the exhaust pipe 41. For example, the pressure adjustment mechanism 87A is installed upstream of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B. The pressure adjustment mechanism 87A is installed forward of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B. The pressure adjustment mechanism 87A is installed at the front end 81Af of the exhaust pipe 81A. The pressure adjustment mechanism 87A adjusts the flow rate of gas flowing into the exhaust pipe 81A from outside the substrate processing apparatus 1 through the front end 81Af of the exhaust pipe 81A.

[0214] Similarly, pressure adjusting mechanisms 88 and 89 are installed in the exhaust pipes 82 and 83, respectively.

[0215] The pressure adjustment mechanisms 87-89 may adjust the pressure of the gas by, for example, adjusting the flow rate of the gas. The pressure adjustment mechanisms 87-89 are, for example, dampers or fans.

[0216] <Control of the substrate processing apparatus 1> 1, the substrate processing apparatus 1 includes a control unit 91. The control unit 91 is installed in, for example, the indexer unit 3. The control unit 91 controls the substrate processing apparatus 1.

[0217] 11 is a control block diagram of the substrate processing apparatus 1. The control unit 91 controls the transport mechanisms 6 and 16. Specifically, the control unit 91 controls the hand driving units 8 and 18. The control unit 91 controls the processing unit 21. Specifically, the control unit 91 controls the holder 31, the rotation driving unit 32, the liquid supply unit 33, the cup 38, and the blowing unit 39. The control unit 91 controls the switching mechanism 51. Specifically, the control unit 91 controls the opening / closing units 61-63. The control unit 91 acquires the detection results of the pressure sensors 71, 84, 85, and 86. The control unit 91 controls the pressure adjustment mechanisms 73, 87, 88, and 89. The control unit 91 is connected to these elements so as to be able to communicate with them.

[0218] The control unit 91 is realized by a central processing unit (CPU) that executes various processes, a random-access memory (RAM) that serves as a work area for the processes, and a storage medium such as a fixed disk. The storage medium stores various types of information in advance. For example, the storage medium stores information (processing recipes) that define the operating conditions for the processes performed by each processing unit 21. For example, the storage medium stores information that defines the operating conditions for switching the exhaust path performed by the switching mechanism 51. The storage medium stores information that defines the operating conditions for adjusting the exhaust pressure performed by the pressure adjustment mechanisms 73, 87-89.

[0219] Here, processing casing 23A2 is an example of a second processing casing in the present invention. Holding section 32 of processing unit 21A2 is an example of a second holding section in the present invention. Liquid supply section 33 of processing unit 21A2 is an example of a second liquid supply section in the present invention. Switching mechanism 51A2 is an example of a second switching mechanism in the present invention.

[0220] The pressure sensor 71A1 is an example of a first pressure sensor in the present invention. The pressure sensor 71B1 is an example of a third pressure sensor in the present invention. The pressure adjustment mechanism 73A1 is an example of a first pressure adjustment mechanism in the present invention. The pressure adjustment mechanism 73B1 is an example of a third pressure adjustment mechanism in the present invention.

[0221] The exhaust pipe 81A is an example of a fifth exhaust pipe in the present invention. The exhaust pipe 82A is an example of a sixth exhaust pipe in the present invention. The pressure sensor 84A is an example of a fifth pressure sensor in the present invention. The pressure sensor 85A is an example of a sixth pressure sensor in the present invention. The pressure adjustment mechanism 87A is an example of a fifth pressure adjustment mechanism in the present invention. The pressure adjustment mechanism 88A is an example of a sixth pressure adjustment mechanism in the present invention.

[0222] <Operation example of substrate processing apparatus 1> 12 is a flowchart showing the procedure of an operation for processing a substrate W. An example of an operation related to one processing unit 21 will be described. It is assumed that the substrate W is already held in the holder 31. Each element operates according to the control of the control unit 91.

[0223] <<Step S1>> The liquid supply unit 33 supplies the first processing liquid. Specifically, the nozzle 34A moves from the retracted position to the processing position. The nozzle 34A supplies the first processing liquid to the substrate W held by the holder 31. The gas inside the processing housing 23 contains components derived from the first processing liquid.

[0224] The switching mechanism 51 switches the exhaust path of the processing casing 23 to the exhaust pipe 41. Specifically, the switching mechanism 51 connects the processing casing 23 to the exhaust pipe 41. Gas flows from the processing casing 23 to the exhaust pipe 41 via the switching mechanism 51. The exhaust pipe 41 exhausts the gas from the processing casing 23. The gas further flows from the exhaust pipe 41 to the exhaust pipe 81. The exhaust pipe 81 exhausts the gas from the exhaust pipe 41.

[0225] When step S1 is being performed, at least one of the exhaust pipes 42 and 43 may exhaust gas from the other processing housing 23. The same applies to steps S2 and S3, which will be described later.

[0226] The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51. The pressure adjustment mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0227] The operation of the pressure adjustment mechanism 73 is illustrated in more detail below. In steps S2 and S3, which will be described later, the pressure adjustment mechanism 73 may also execute the following exemplary operations. Each pressure adjustment mechanism 73 adjusts, for example, the exhaust pressure to be constant. Each pressure adjustment mechanism 73 adjusts, for example, the detection result of the pressure sensor 71 to be constant. For example, the pressure adjustment mechanisms 73A1 and 73A2 equalize the gas pressure on the primary side of the switching mechanism 51A1 and the gas pressure on the primary side of the switching mechanism 51A2. For example, the pressure adjustment mechanisms 73A1-73A6 equalize the gas pressure on the primary side of the switching mechanisms 51A1-51A6. For example, the pressure adjustment mechanisms 73A1 and 73B1 equalize the gas pressure on the primary side of the switching mechanisms 51A1 and 51B1. The pressure adjustment mechanisms 73A1, 73B1, 73C1, and 73D1, for example, equalize the pressure of gas on the primary side of the switching mechanisms 51A1, 51B1, 51C1, and 51D1. The pressure adjustment mechanism 73, for example, equalizes the pressure of gas on the primary side of each switching mechanism 51.

[0228] The pressure sensors 84-86 measure the gas inside the exhaust pipes 81-83, respectively. The pressure adjustment mechanisms 87-89 adjust the pressure of the gas inside the exhaust pipes 81-83 based on the detection results of the pressure sensors 84-86, respectively.

[0229] The operation of the pressure adjustment mechanisms 87-89 will be described in more detail below. Note that in steps S2 and S3, which will be described later, the pressure adjustment mechanisms 87-89 may also perform the following exemplary operation. Each pressure adjustment mechanism 87-89 adjusts the exhaust pressure, for example, to maintain a constant pressure. For example, pressure adjustment mechanism 87A adjusts the pressure so that the detection result of pressure sensor 84A remains constant. For example, pressure adjustment mechanisms 87A-89A equalize the pressures of gases inside exhaust pipes 81A-83A. For example, pressure adjustment mechanisms 87A and 87B equalize the pressures of gases inside exhaust pipes 81A and 81B. For example, pressure adjustment mechanisms 87A-89A and 87B-89B equalize the pressures of gases inside exhaust pipes 81A-83A and 81B-83B.

[0230] <<Step S2>> The liquid supply unit 33 supplies the second processing liquid. Specifically, the nozzle 34A moves from the processing position to the retracted position, and the nozzle 34B moves from the retracted position to the processing position. The nozzle 34B supplies the second processing liquid to the substrate W held by the holder 31. The gas inside the processing housing 23 contains components derived from the second processing liquid.

[0231] The switching mechanism 51 switches the exhaust path of the processing casing 23 to the exhaust pipe 42. Specifically, the switching mechanism 51 connects the processing casing 23 to the exhaust pipe 42. Gas flows from the processing casing 23 to the exhaust pipe 42 via the switching mechanism 51. The exhaust pipe 42 exhausts the gas from the processing casing 23. The gas further flows from the exhaust pipe 42 to the exhaust pipe 82. The exhaust pipe 82 exhausts the gas from the exhaust pipe 42.

[0232] The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51. The pressure adjustment mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0233] The pressure sensors 84-86 measure the gas inside the exhaust pipes 81-83, respectively. The pressure adjustment mechanisms 87-89 adjust the pressure of the gas inside the exhaust pipes 81-83 based on the detection results of the pressure sensors 84-86, respectively.

[0234] <<Step S3>> The liquid supply unit 33 supplies the third processing liquid. Specifically, the nozzle 34B moves from the processing position to the retracted position, and the nozzle 34C moves from the retracted position to the processing position. The nozzle 34C supplies the third processing liquid to the substrate W held by the holder 31. The gas inside the processing housing 23 contains components derived from the third processing liquid.

[0235] The switching mechanism 51 switches the exhaust path of the processing casing 23 to the exhaust pipe 43. Specifically, the switching mechanism 51 connects the processing casing 23 to the exhaust pipe 43. Gas flows from the processing casing 23 to the exhaust pipe 43 via the switching mechanism 51. The exhaust pipe 43 exhausts the gas from the processing casing 23. The gas further flows from the exhaust pipe 43 to the exhaust pipe 83. The exhaust pipe 83 exhausts the gas from the exhaust pipe 43.

[0236] The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51. The pressure adjustment mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71.

[0237] The pressure sensors 84-86 measure the gas inside the exhaust pipes 81-83, respectively. The pressure adjustment mechanisms 87-89 adjust the pressure of the gas inside the exhaust pipes 81-83 based on the detection results of the pressure sensors 84-86, respectively.

[0238] <Effects of the embodiment> As described above, in the substrate processing apparatus 1, the switching mechanism 51 is disposed at approximately the same height as the processing housing 23, and therefore, the flow path between the switching mechanism 51 and the processing housing 23 can be suitably short. As a result, gas can be appropriately discharged from the processing housing 23.

[0239] Furthermore, the substrate processing apparatus 1 can provide the following effects.

[0240] At least a portion of the switching mechanism 51 is disposed to the side of the processing casing 23. This makes it possible to reduce the overall height of the processing casing 23 and the switching mechanism 51. This also makes it possible to reduce the height of the substrate processing apparatus 1. Furthermore, the number of processing casings 23 arranged in the vertical direction Z can be easily increased. In this way, the throughput of the substrate processing apparatus 1 can be suitably improved while preventing the substrate processing apparatus 1 from becoming larger. Here, "height" refers to the length in the vertical direction Z.

[0241] The upper end P1 of the switching mechanism 51 is equal to or lower than the upper end P2 of the processing housing 23. The lower end Q1 of the switching mechanism 51 is equal to or higher than the lower end Q2 of the processing housing 23. In this way, the entire switching mechanism 51 is disposed at a position equal to or lower than the upper end P2 and equal to or higher than the lower end Q2. This allows the flow path between the switching mechanism 51 and the processing housing 23 to be suitably short.

[0242] The switching casing 53 is disposed at a position equal to or lower than the upper surface 31a of the holder 31. Therefore, the size of the switching mechanism 51 is relatively small. Specifically, the height of the switching mechanism 51 is smaller than the height of the processing casing 23. Therefore, it is possible to suitably prevent the substrate processing apparatus 1 from becoming large.

[0243] The switching mechanism 51 is disposed at a position where it does not overlap with the holding portion 31 in a plan view. Therefore, interference between the holding portion 31 and the switching mechanism 51 can be easily avoided.

[0244] The distance from the center point G to the switching mechanism 51, in a plan view, is greater than three times the radius of the substrate W. That is, the switching mechanism 51 is disposed in an area, in a plan view, where the distance from the center point G is greater than three times the radius of the substrate W. Therefore, interference between the holder 31 and the switching mechanism 51 can be reliably avoided.

[0245] The distance from the center point G to the switching mechanism 51 is less than five times the radius of the substrate W in a planar view. That is, the switching mechanism 51 is disposed in an area where the distance from the center point G is less than five times the radius of the substrate W in a planar view. This effectively shortens the flow path between the switching mechanism 51 and the processing casing 23. Furthermore, the switching mechanism 51 is relatively small in a planar view. This effectively prevents the footprint of the substrate processing apparatus 1 from increasing.

[0246] The exhaust pipes 41-43 each extend in the vertical direction Z. This makes it possible to suitably reduce the installation area of ​​the exhaust pipes 41-43 in a plan view, thereby suitably preventing an increase in the footprint of the substrate processing apparatus 1.

[0247] The substrate processing apparatus 1 includes a first piping space 44. Therefore, the exhaust pipes 41-43 can be suitably installed.

[0248] The transport mechanism 16 transports the substrate W to the holder 31. The transport mechanism 16 is installed in the transport space 12. The transport space 12 is adjacent to the processing housing 23. Therefore, the transport mechanism 16 can easily transport the substrate W to the holder 31.

[0249] The substrate processing apparatus 1 includes a first piping space 44. Therefore, the exhaust pipes 41-43 can be suitably installed.

[0250] The first piping space 44 is adjacent to the processing housing 23. Therefore, the exhaust pipes 41-43 can be installed near the processing housing 23.

[0251] The transfer space 12 extends in the front-rear direction X. The processing casing 23 and the first piping space 44 are aligned in the front-rear direction X. This allows the transfer space 12 adjacent to the processing casing 23 and the first piping space 44 adjacent to the processing casing 23 to be suitably positioned. This effectively prevents the transfer mechanism 16 from interfering with the exhaust pipes 41-43.

[0252] The first piping space 44 and the processing housing 23 are aligned in the front-rear direction X. The exhaust pipes 41-43 are aligned in the width direction Y. Therefore, the exhaust pipes 41-43 can be installed near the processing housing 23, respectively.

[0253] At least a part of the switching mechanism 51 is installed in the first piping space 44. Therefore, the switching mechanism 51 can be installed near the processing housing 23. Furthermore, the switching mechanism 51 can be easily connected to the exhaust pipes 41-43.

[0254] The switching mechanism 51 includes opening / closing units 61, 62, and 63. The opening / closing unit 61 is movable between a position where the processing casing 23 communicates with the exhaust pipe 41 and a position where the processing casing 23 is isolated from the exhaust pipe 41. The opening / closing unit 62 is movable between a position where the processing casing 23 communicates with the exhaust pipe 42 and a position where the processing casing 23 is isolated from the exhaust pipe 42. The opening / closing unit 63 is movable between a position where the processing casing 23 communicates with the exhaust pipe 43 and a position where the processing casing 23 is isolated from the exhaust pipe 43. The opening / closing units 61, 62, and 63 are movable independently of one another. Therefore, the switching mechanism 51 can individually connect the exhaust pipes 41-43 to the processing casing 23. The switching mechanism 51 can individually isolate the exhaust pipes 41-43 from the processing casing 23.

[0255] The switching mechanism 51 includes a switching housing 53. The switching housing 53 is connected to the processing housing 23. The switching housing 53 houses the opening and closing units 61-63. Therefore, the switching housing 53 can suitably form a flow path from the processing housing 23 to the opening and closing units 61-63.

[0256] The switching housing 53 is connected to the processing housing 23 and the exhaust pipe 41. Therefore, the switching housing 53 can suitably form a flow path from the processing housing 23 to the exhaust pipe 41. Furthermore, the switching housing 53 is connected to the exhaust pipes 42 and 43. Therefore, the switching housing 53 can suitably form a flow path from the processing housing 23 to the exhaust pipes 42 and 43.

[0257] The opening and closing units 61-63 are installed in one switching housing 53. This allows the flow path from the processing housing 23 to the opening and closing units 61-63 to be further shortened.

[0258] The opening / closing units 61-63 are installed in one switching space 54. Therefore, the opening / closing units 61-63 can open and close the openings 41k-43k of the exhaust pipes 41-43 under the same conditions. This makes it easy to equalize the conditions for discharging gas from the processing housing 23 among the exhaust pipes 41-43. For example, it is possible to suppress variations in exhaust pressure among the exhaust pipes 41-43. For example, it is possible to suppress variations in exhaust flow rate among the exhaust pipes 41-43. This makes it possible to suitably improve the quality of the processing performed on the substrate W in the processing housing 23.

[0259] The switching housing 53 includes an introduction section 55. The introduction section 55 is connected to the processing housing 23. Therefore, gas can be easily introduced from the processing housing 23 into the switching housing 53.

[0260] The introduction section 55 extends in the front-rear direction X. As described above, the transport space 12 extends in the front-rear direction X. Therefore, the transport space 12 adjacent to the processing housing 23 and the introduction section connected to the processing housing 23 can be preferably disposed. Therefore, interference between the transport mechanism 16 and the introduction section 55 can be preferably prevented.

[0261] The switching housing 53 includes a distribution section 56. The distribution section 56 is connected to the introduction section 55. The distribution section 56 is connected to the exhaust pipes 41-43. This allows gas to be easily discharged from the switching housing 53 to the exhaust pipes 41-43.

[0262] The distribution unit 56 is connected to the exhaust pipes 41-43. The distribution unit 56 houses the opening / closing units 61-63. Therefore, the switching mechanism 51 can easily switch the exhaust path of the processing housing 23 between the exhaust pipes 41-43.

[0263] The distribution section 56 extends in the width direction Y. As described above, the exhaust pipes 41-43 are aligned in the width direction Y. In this way, the direction in which the distribution section 56 extends is parallel to the direction in which the exhaust pipes 41-43 are aligned. Therefore, the distribution section 56 can be easily connected to the exhaust pipes 41-43.

[0264] The introduction part 55 is disposed at a position relatively close to the transfer space 12. Specifically, in a plan view, the separation distance between the introduction part 55 and the transfer space 12 is smaller than the separation distance between the holding part 31 and the transfer space 12. Therefore, the introduction part 55 can be easily prevented from interfering with components (e.g., base parts 37A-37C) installed in the processing housing 23. This allows the gas to be smoothly introduced from the processing housing 23 to the introduction part 55. For example, it is possible to preferably prevent the flow of gas entering the introduction part 55 from the processing housing 23 from being disturbed by components installed in the processing housing 23.

[0265] The gas supply pipe 48 supplies gas to the processing housing 23. The second piping space 46 accommodates the gas supply pipe 48. The second piping space 46 is adjacent to the processing housing 23. Therefore, the gas supply pipe 48 can easily supply gas to the processing housing 23.

[0266] The first piping space 44A, the processing casing 23A, and the second piping space 46 are arranged in this order in the front-rear direction X. Therefore, the first piping space 44 and the second piping space 46 are separated by the processing casing 23. Therefore, the arrangement of the exhaust pipes 41-43 is not restricted by the air supply pipe 48. That is, the degree of freedom in the arrangement of the exhaust pipes 41-43 is suitably increased. For example, the exhaust pipes 41-43 can be easily installed near the processing casing 23.

[0267] The processing housing 23A will be described as an example. The substrate processing apparatus 1 includes a processing housing 23A2. The processing housing 23A2 is disposed below the processing housing 23A1. This allows the installation area of ​​the processing housings 23A1 and 23A2 to be suitably reduced in plan view. This effectively prevents the footprint of the substrate processing apparatus 1 from increasing.

[0268] The substrate processing apparatus 1 includes a switching mechanism 51A2. The switching mechanism 51A2 switches the exhaust path of the processing casing 23A2 to one of the exhaust pipes 41A-43A. Therefore, each of the exhaust pipes 41A-43A exhausts gas from the processing casing 23A2 in addition to gas from the processing casing 23A1. This simplifies the structure of the substrate processing apparatus 1.

[0269] The switching mechanism 51A2 is disposed at approximately the same height as the processing casing 23A2. This allows the flow path between the processing casing 23A2 and the switching mechanism 51A2 to be suitably short. As a result, gas can be appropriately discharged from the processing casing 23A2.

[0270] The processing housing 23A2 is disposed at the same position as the processing housing 23A1 in a plan view. The switching mechanism 51A2 is disposed at the same position as the switching mechanism 51A1 in a plan view. Therefore, the relative positions of the processing housing 23A2 and the switching mechanism 51A2 are substantially the same as the relative positions of the processing housing 23A1 and the switching mechanism 51A1. Therefore, the flow path between the processing housing 23A2 and the switching mechanism 51A2 has the same length and shape as the flow path between the processing housing 23A1 and the switching mechanism 51A1. This makes it easy to equalize the gas exhaust conditions between the processing housings 23A1 and 23A2. For example, it is possible to suppress variations in exhaust pressure between the processing housings 23A1 and 23A2. For example, it is possible to suppress variations in exhaust flow rate between the processing housings 23A1 and 23A2. As a result, it is possible to suitably equalize the quality of processing performed on substrates W between the processing housings 23A1 and 23A2.

[0271] The switching mechanism 51A2 is disposed in the same position as the switching mechanism 51A1 in a plan view. The exhaust pipe 41A extends in the vertical direction Z. Therefore, the switching mechanisms 51A1 and 51A2 can each be easily connected to the exhaust pipe 41A. Similarly, the exhaust pipes 42A and 43A each extend in the vertical direction Z. Therefore, the switching mechanisms 51A1 and 51A2 can each be easily connected to the exhaust pipes 42A and 43A.

[0272] Similarly, the substrate processing apparatus 1 includes processing housings 23A3-23A6, which are each disposed below the processing housing 23A1, thereby making it possible to more effectively prevent the footprint of the substrate processing apparatus 1 from increasing.

[0273] The substrate processing apparatus 1 includes switching mechanisms 51A3-51A6. The switching mechanisms 51A3-51A6 switch the exhaust paths of the processing housings 23A3-23A6 to one of the exhaust pipes 41A-43A, respectively. Therefore, the exhaust pipes 41A-43A exhaust gas from the processing housings 23A1-23A6, respectively. This further simplifies the structure of the substrate processing apparatus 1.

[0274] The processing housings 23A3-23A6 are disposed in the same positions as the processing housing 23A1 in a plan view. The switching mechanisms 51A3-51A6 are disposed in the same positions as the switching mechanism 51A1 in a plan view. Therefore, the relative positions of the processing housings 23A3-23A6 and the switching mechanisms 51A3-51A6 are substantially the same as the relative positions of the processing housing 23A1 and the switching mechanism 51A1. As a result, the quality of processing performed on substrates W can be suitably equalized among the processing housings 23A1-23A6.

[0275] The switching mechanisms 51A3-51A6 are each disposed at the same position as the switching mechanism 51A1 in a plan view. The exhaust pipes 41A-43A each extend in the vertical direction Z. Therefore, the switching mechanisms 51A3-51A6 can be easily connected to the exhaust pipes 41A-43A, respectively.

[0276] The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51. The pressure adjustment mechanism 73 adjusts the pressure of the gas on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71. This makes it possible to suitably adjust the pressure on the primary side of the switching mechanism 51. As a result, it is possible to suitably improve the quality of the processing performed on the substrate W in the processing housing 23.

[0277] The pressure adjustment mechanism 73 adjusts the exhaust pressure to be constant, for example. This makes it possible to suppress fluctuations in the exhaust pressure when processing the substrate W in the processing housing 23. Therefore, the quality of the processing performed on the substrate W in the processing housing 23 can be suitably improved.

[0278] The pressure adjustment mechanisms 73A1 and 73A2, for example, equalize the pressure of the gas on the primary side of the switching mechanisms 51A1 and 51A2. This makes it possible to suitably equalize the exhaust pressure when processing the substrate W in the processing housing 23A1 and the exhaust pressure when processing the substrate W in the processing housing 23A2. This makes it possible to suitably equalize the quality of processing performed on the substrate W between the processing housings 23A1 and 23A2 aligned in the vertical direction Z.

[0279] The pressure adjustment mechanisms 73A1-73A6, for example, equalize the gas pressures on the primary sides of the switching mechanisms 51A1-51A6, thereby suitably equalizing the quality of processing performed on substrates W among all of the processing casings 23A1-23A6 aligned in the vertical direction Z.

[0280] The pressure adjustment mechanisms 73A1 and 73B1, for example, equalize the gas pressures on the primary sides of the switching mechanisms 51A1 and 51B1, thereby making it possible to suitably equalize the quality of processing performed on substrates W between the processing casings 23A1 and 23B1 arranged at the same height.

[0281] The pressure adjustment mechanisms 73A1, 73B1, 73C1, and 73D1 equalize the gas pressures on the primary sides of the switching mechanisms 51A1, 51B1, 51C1, and 51D1, for example, thereby making it possible to suitably equalize the quality of processing performed on substrates W among all of the processing casings 23A1, 23B1, 23C1, and 23D1 arranged at the same height.

[0282] The pressure adjustment mechanism 73, for example, equalizes the pressure of the gas on the primary side of each switching mechanism 51. This makes it possible to suitably equalize the quality of the processing performed on the substrate W among all the processing housings 23.

[0283] The exhaust pipe 81A is connected to the exhaust pipes 41A and 41B. The exhaust pipe 81A exhausts gas from the exhaust pipes 41A and 41B. In this way, the two exhaust pipes 41A and 41B are combined into one exhaust pipe 81A. This allows the structure of the substrate processing apparatus 1 to be simplified.

[0284] Similarly, exhaust pipe 82A is connected to exhaust pipes 42A and 42B. Exhaust pipe 82A exhausts gas from exhaust pipes 41A and 42B. Exhaust pipe 83A is connected to exhaust pipes 43A and 43B. Exhaust pipe 83A exhausts gas from exhaust pipes 43A and 43B. This further simplifies the structure of substrate processing apparatus 1.

[0285] The pressure sensor 84 measures the pressure of the gas inside the exhaust pipe 81. The pressure adjustment mechanism 87 adjusts the pressure of the gas inside the exhaust pipe 81 based on the detection result of the pressure sensor 84. This makes it possible to suitably adjust the pressure inside the exhaust pipe 81. As a result, it is possible to further suitably improve the quality of the processing performed on the substrate W inside the processing housing 23.

[0286] Similarly, the pressure sensors 85 and 86 measure the pressure of the gas inside the exhaust pipes 82 and 83. The pressure adjustment mechanisms 88 and 89 adjust the pressure of the gas inside the exhaust pipes 82 and 83 based on the detection results of the pressure sensors 85 and 86. This makes it possible to suitably adjust the pressure inside the exhaust pipes 82 and 83. As a result, it is possible to suitably improve the quality of the processing performed on the substrate W inside the processing housing 23.

[0287] An explanation will be given using exhaust pipe 81A as an example. Pressure sensor 84A is installed downstream of the connection position between exhaust pipe 81A and exhaust pipe 41A and the connection position between exhaust pipe 81A and exhaust pipe 41B. At positions downstream of the connection position between exhaust pipe 81A and exhaust pipe 41A and the connection position between exhaust pipe 81A and exhaust pipe 41B, both gas from exhaust pipe 41A and gas from exhaust pipe 41B flow. Therefore, pressure sensor 84A can suitably detect the overall exhaust pressure of exhaust pipes 41A and 41B.

[0288] Similarly, pressure sensor 85A is installed downstream of the connection position between exhaust pipe 82A and exhaust pipe 42A and the connection position between exhaust pipe 82A and exhaust pipe 42B. Therefore, pressure sensor 85A can suitably detect the overall exhaust pressure of exhaust pipes 42A, 42B. Pressure sensor 86A is installed downstream of the connection position between exhaust pipe 83A and exhaust pipe 43A and the connection position between exhaust pipe 83A and exhaust pipe 43B. Therefore, pressure sensor 86A can suitably detect the overall exhaust pressure of exhaust pipes 43A, 43B.

[0289] For example, the pressure adjustment mechanism 87 adjusts the exhaust pressure to be constant. Similarly, the pressure adjustment mechanisms 88 and 89 adjust the exhaust pressure to be constant. This makes it possible to suppress fluctuations in the exhaust pressure when processing the substrate W in the processing housing 23. Therefore, the quality of the processing performed on the substrate W in the processing housing 23 can be suitably improved.

[0290] The pressure adjustment mechanisms 87A-89A, for example, equalize the pressure of the gas inside the exhaust pipes 81A-83A. This allows the exhaust pressure to be suitably equalized between the exhaust pipes 41A-43A and 41B-43B. This prevents the exhaust pressure from fluctuating when the exhaust paths of the processing housings 23A and 23B are switched. This allows the quality of the processing performed on the substrates W inside the processing housings 23A and 23B to be suitably improved.

[0291] The pressure adjustment mechanisms 87A and 87B, for example, equalize the pressure of the gas inside the exhaust pipes 81A and 81B. This makes it possible to suppress variations in exhaust pressure between the exhaust pipes 81A and 81B even if the exhaust pipes 81A and 81B have different lengths. This makes it possible to equalize the exhaust pressure between the exhaust paths 41A and 41B and the exhaust paths 41C and 41D. This makes it possible to suitably equalize the quality W of the processing performed on the substrates W between the processing housings 23A and 23B and the processing housings 23C and 23D.

[0292] The pressure adjustment mechanisms 87A-89A and 87B-89B equalize the pressure of gas inside the exhaust pipes 81A-83A and 81B-83B, for example. This makes it possible to suppress variations in exhaust pressure between the exhaust pipes 81A-83A and 81B-83B even if the exhaust pipes 81A-83A and 81B-83B have different lengths. This makes it possible to equalize the exhaust pressure between the exhaust paths 41A-43A, 41B-43B, 41C-43C, and 41D-43D. This further improves the uniformity of the quality of processing performed on substrates W between the processing housings 23A, 23B, 23C, and 23D.

[0293] The liquid supply unit 33 can supply a first processing liquid, a second processing liquid, and a third processing liquid. The liquid supply unit 33 switches the processing liquid to be supplied among the first processing liquid, the second processing liquid, and the third processing liquid. In response to the switching of the processing liquid used in the processing housing 23, the switching mechanism 51 switches the discharge path of the processing housing 23 between the exhaust pipes 41 and 43. When the liquid supply unit 33 supplies the first processing liquid, the switching mechanism 51 switches the discharge path of the processing housing 23 to the exhaust pipe 41. When the liquid supply unit 33 supplies the second processing liquid, the switching mechanism 51 switches the discharge path of the processing housing 23 to the exhaust pipe 42. When the liquid supply unit 33 supplies the third processing liquid, the switching mechanism 51 switches the discharge path of the processing housing 23 to the exhaust pipe 43. As a result, when the liquid supply unit 33 supplies the first processing liquid, the exhaust pipe 41 exhausts gas from the processing housing 23. When the liquid supply unit 33 supplies the second processing liquid or the third processing liquid, the exhaust pipe 41 does not exhaust gas from the processing housing 23. Therefore, contamination of the inside of the exhaust pipe 41 can be suitably prevented. For the same reason, contamination of the inside of the exhaust pipes 42, 43 can also be suitably prevented. Therefore, gas flows smoothly through the exhaust pipes 41-43. As a result, gas from the processing housing 23 can be more suitably exhausted.

[0294] Furthermore, it is possible to suitably prevent the inside of the exhaust pipes 81-83 from being soiled, and therefore the gas flows smoothly through the exhaust pipes 81-83. As a result, the gas in the processing housing 23 can be discharged more suitably.

[0295] The present invention is not limited to the embodiments, and can be modified as follows.

[0296] In the embodiment, the switching mechanism 51 switches the exhaust path of the gas from the processing housing 23 to one of the exhaust pipes 41-43. That is, the switching mechanism 51 switches between three exhaust pipes (specifically, the exhaust pipes 41-43). However, this is not limiting. The switching mechanism 51 may switch between two exhaust pipes. For example, the exhaust pipe 43 may be omitted. In this case, the switching mechanism 51 switches the exhaust path of the processing housing 23 to one of the exhaust pipes 41 and 42. The switching mechanism 51 switches the exhaust path of the processing housing 23 between the exhaust pipes 41 and 42. The switching mechanism 51 may switch between four or more exhaust pipes. For example, the substrate processing apparatus 1 may be provided with an additional exhaust pipe in addition to the exhaust pipes 41-43. In this case, the switching mechanism 51 switches the exhaust path of the processing housing 23 to one of the exhaust pipes 41-43 and the additional exhaust pipe. The switching mechanism 51 switches the exhaust path of the processing housing 23 between the exhaust pipes 41-43 and the additional exhaust pipe.

[0297] In the embodiment, the exhaust pipes 41-43 are arranged between the processing housing 23 and the distributor 56 in a plan view. However, this is not limited to this. The distributor 56 may be arranged between the exhaust pipes 41-43 and the processing housing 23 in a plan view.

[0298] 13 is a plan view of a processing unit 21 in the modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0299] The substrate processing apparatus 1 includes a switching mechanism 101. The switching mechanism 101 includes a switching housing 103. The switching housing 103 includes a distribution unit 106. The distribution unit 106 is installed outside the processing housing 23. The distribution unit 106 is installed in the first piping space 44. The distribution unit 106 contacts the processing housing 23. The distribution unit 106 is disposed between the processing housing 23 and the exhaust pipes 41-43 in a plan view. Specifically, the distribution unit 106 contacts the side wall 25b of the processing housing 23. The distribution unit 106 is disposed between the side wall 25b and the exhaust pipes 41-43.

[0300] In the embodiment, a portion of the switching mechanism 51 (for example, the first end 55a) is disposed inside the processing housing 23. However, this is not limited to this. The entire switching mechanism 51 may be disposed outside the processing housing 23. Similarly, in the embodiment, a portion of the switching housing 53 (for example, the first end 55a) is disposed inside the processing housing 23. However, this is not limited to this. The entire switching housing 53 may be disposed outside the processing housing 23.

[0301] Referring to FIG. 13 , the switching mechanism 101 includes an introduction section 105. The introduction section 105 extends in the front-rear direction X. The introduction section 105 has a first end 105a and a second end 105b. The first end 105a corresponds to the upstream end of the switching space 54. The first end 105a is disposed on the side wall 25b of the processing housing 23. The first end 105a is connected to the side wall 25b of the processing housing 23. The first end 105a is not disposed inside the processing housing 23. The second end 105b is installed outside the processing housing 23. Therefore, the entire introduction section 105 is installed outside the processing housing 23. As a result, the entire switching housing 103 is installed outside the processing housing 23. The entire switching mechanism 101 is installed outside the processing housing 23. Here, the outside of the processing housing 23 specifically refers to the first piping space 44.

[0302] In the embodiment, a portion of the switching mechanism 51 (for example, the first end 55a) is installed inside the processing housing 23. However, this is not limited to this. The entire switching mechanism 51 may be installed inside the processing housing 23. Similarly, in the embodiment, a portion of the switching housing 53 is arranged inside the processing housing 23. However, this is not limited to this. The entire switching housing 53 may be arranged inside the processing housing 23. In the embodiment, the opening and closing units 61-63 are arranged outside the processing housing 23. However, this is not limited to this. The opening and closing units 61-63 may be arranged inside the processing housing 23.

[0303] Fig. 14 is a plan view of a processing unit 21 in a modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted. Fig. 14 shows a simplified view of a liquid supply unit 33 for convenience.

[0304] The exhaust pipes 41-43 are installed in the first piping space 44. Openings k1-k3 of the exhaust pipes 41-43 are in contact with the processing housing 23 (specifically, the side wall 25b), respectively.

[0305] The substrate processing apparatus 1 includes a switching mechanism 111. The switching mechanism 111 includes opening / closing units 113, 114, and 115. The opening / closing units 113-115 are each installed inside the processing housing 23. The opening / closing units 113-115 are each installed near the side wall 25b. The opening / closing units 113-115 are disposed at positions facing the openings 41k-43k, respectively.

[0306] Each of the opening / closing units 113-115 has the same structure as the opening / closing units 61-63. The opening / closing unit 113 is movable between a position that connects the processing casing 23 to the exhaust pipe 41 and a position that blocks the processing casing 23 from the exhaust pipe 41. The opening / closing unit 114 is movable between a position that connects the processing casing 23 to the exhaust pipe 42 and a position that blocks the processing casing 23 from the exhaust pipe 42. The opening / closing unit 115 is movable between a position that connects the processing casing 23 to the exhaust pipe 43 and a position that blocks the processing casing 23 from the exhaust pipe 43.

[0307] Thus, the entire switch 111 is located inside the processing enclosure 23 .

[0308] 14, the switching mechanism 111 may or may not include a switching housing. If the switching mechanism 111 includes a switching housing, the entire switching housing of the switching mechanism 111 may be installed inside the processing housing 23.

[0309] In this embodiment, the switching mechanism 51 includes a switching housing 53. However, this is not limitative, and the switching housing 53 may be omitted as appropriate, as shown in the modified embodiment of FIG.

[0310] In the embodiment, the switching housing 53 is not connected to the cup 38. However, this is not limiting. The switching housing 53 may be connected to the cup 38. The switching housing 53 may form a flow path from the inside of the cup 38 to the exhaust pipes 41-43.

[0311] In the embodiment, when the opening / closing unit 61 is in a position that connects the processing casing 23 to the exhaust pipe 41, the opening / closing unit 61 does not isolate the processing casing 23 from the exhaust pipes 42, 43. However, this is not limited to this. When the opening / closing unit 61 is in a position that connects the processing casing 23 to the exhaust pipe 41, the opening / closing unit 61 may isolate the processing casing 23 from the exhaust pipes 42, 43. Similarly, in the embodiment, when the opening / closing unit 62 is in a position that connects the processing casing 23 to the exhaust pipe 42, the opening / closing unit 62 does not isolate the processing casing 23 from the exhaust pipe 43. However, this is not limited to this. When the opening / closing unit 62 is in a position that connects the processing casing 23 to the exhaust pipe 42, the opening / closing unit 62 may isolate the processing casing 23 from the exhaust pipe 43.

[0312] 15 is a plan view of a processing unit 21 in the modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0313] The substrate processing apparatus 1 includes a switching mechanism 121. The switching mechanism 121 includes opening / closing units 123 and 124. The opening / closing units 123 and 124 are installed inside the switching housing 53. That is, the opening / closing units 123 and 124 are installed in the switching space 54. The opening / closing units 123 and 124 are disposed at positions facing the openings 41k and 42k, respectively. The opening / closing unit 123 opens and closes the opening 41k. The opening / closing unit 124 opens and closes the opening 42k. Note that the switching mechanism 121 does not include a member equivalent to the opening / closing unit 63.

[0314] The gas flows in one direction through the switching space 54. The gas flows from the introduction section 55 to the distribution section 56. The openings 41k, 42k, and 43k each communicate with the switching space 54. The position where the opening 42k communicates with the switching space 54 is downstream of the position where the opening 41k communicates with the switching space 54. The position where the opening 43k communicates with the switching space 54 is downstream of the position where the opening 42k communicates with the switching space 54.

[0315] Here, the switching space 54 is divided into a first area 126, a second area 127, and a third area 128 by imaginary boundaries B1 and B2. FIG. 15 illustrates the positions of the boundaries B1 and B2 using dashed lines. The boundary B1 is located downstream of the position where the opening 41k communicates with the switching space 54 and upstream of the position where the opening 42k communicates with the switching space 54. The boundary B2 is located downstream of the position where the opening 42k communicates with the switching space 54 and upstream of the position where the opening 43k communicates with the switching space 54. The first area 126 is the portion of the switching space 54 located upstream of the boundary B1. The second area 127 is the portion of the switching space 54 located downstream of the boundary B1 and upstream of the boundary B2. The third area 128 is the portion of the switching space 54 located downstream of the boundary B2.

[0316] The opening / closing unit 123 is movable between a position that connects the processing casing 23 to the exhaust pipe 41 and a position that blocks the processing casing 23 from the exhaust pipe 41. In Figure 15, the opening / closing unit 123 is shown by a solid line in the position that connects the processing casing 23 to the exhaust pipe 41. In Figure 15, the opening / closing unit 123 is shown by a dashed line in the position that blocks the processing casing 23 from the exhaust pipe 41.

[0317] When the opening / closing unit 123 is in a position that connects the processing casing 23 to the exhaust pipe 41, the opening / closing unit 123 not only opens the opening 41k but also isolates the first section 126 from the second section 127. That is, when the opening / closing unit 123 connects the processing casing 23 to the exhaust pipe 41, the opening / closing unit 123 isolates the processing casing 23 from the exhaust pipes 42 and 43. When the opening / closing unit 123 is in a position that isolates the processing casing 23 from the exhaust pipe 41, the opening / closing unit 123 not only closes the opening 41k but also connects the first section 126 to the second section 127. That is, when the opening / closing unit 123 isolates the processing casing 23 from the exhaust pipe 41, the opening / closing unit 123 does not isolate the processing casing 23 from the exhaust pipes 42 and 43.

[0318] The opening / closing unit 124 is movable between a position that connects the processing casing 23 to the exhaust pipe 42 and a position that blocks the processing casing 23 from the exhaust pipe 42. Figure 15 shows the opening / closing unit 124 in the position that connects the processing casing 23 to the exhaust pipe 42 by a solid line. Figure 15 also shows the opening / closing unit 124 in the position that blocks the processing casing 23 from the exhaust pipe 42 by a dashed line.

[0319] When the opening / closing unit 124 is in a position that connects the processing casing 23 to the exhaust pipe 42, the opening / closing unit 124 not only opens the opening 42k but also isolates the second section 127 from the third section 128. That is, when the opening / closing unit 124 connects the processing casing 23 to the exhaust pipe 42, the opening / closing unit 124 isolates the processing casing 23 from the exhaust pipe 43. When the opening / closing unit 124 is in a position that isolates the processing casing 23 from the exhaust pipe 42, the opening / closing unit 124 not only closes the opening 42k but also connects the second section 127 to the third section 128. That is, when the opening / closing unit 124 isolates the processing casing 23 from the exhaust pipe 42, the opening / closing unit 124 does not isolate the processing casing 23 from the exhaust pipe 43.

[0320] When switching mechanism 121 switches the exhaust path of processing casing 23 to exhaust pipe 41, opening / closing unit 123 moves to a position that connects processing casing 23 to exhaust pipe 41. Opening / closing unit 124 may move to either a position that connects processing casing 23 to exhaust pipe 42 or a position that disconnects processing casing 23 from exhaust pipe 42.

[0321] When the switching mechanism 121 switches the exhaust path of the processing casing 23 to the exhaust pipe 42, the opening / closing unit 123 moves to a position where the processing casing 23 is disconnected from the exhaust pipe 41. The opening / closing unit 124 moves to a position where the processing casing 23 is connected to the exhaust pipe 42.

[0322] When the switching mechanism 121 switches the exhaust path of the processing casing 23 to the exhaust pipe 43, the opening / closing unit 123 moves to a position where the processing casing 23 is isolated from the exhaust pipe 41. The opening / closing unit 124 moves to a position where the processing casing 23 is isolated from the exhaust pipe 42.

[0323] According to this modified embodiment, it is possible to omit the member corresponding to the opening / closing unit 63. That is, the number of opening / closing units 123, 124 can be one less than the number of exhaust pipes 41-43. This simplifies the structure of the switching mechanism 121.

[0324] When switching mechanism 121 switches the exhaust path of processing housing 23 to exhaust pipe 41, it is possible to prevent gas from flowing into second section 127 and third section 128, and it is possible to suitably prevent gas from accumulating in second section 127 and third section 128. Therefore, gas in processing housing 23 can be more suitably exhausted.

[0325] When the switching mechanism 121 switches the exhaust path of the processing housing 23 to the exhaust pipe 42, it is possible to prevent the gas from flowing into the third section 128, and it is possible to suitably prevent the gas from accumulating in the third section 128. Therefore, the gas in the processing housing 23 can be more suitably exhausted.

[0326] In the embodiment, the rotation axis A1 of the opening / closing part 61 passes through the first end of the opening / closing part 61. However, this is not limited to this. The position of the rotation axis A1 of the opening / closing part 61 can be changed as appropriate.

[0327] 16 is a plan view of a processing unit 21 in the modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0328] The substrate processing apparatus 1 includes a switching mechanism 131. The switching mechanism 131 includes opening / closing units 133 and 134. The opening / closing units 133 and 134 are installed inside the switching housing 53. The opening / closing units 133 and 134 are disposed at positions facing the openings 41k and 42k, respectively. The opening / closing unit 133 opens and closes the opening 41k. The opening / closing unit 134 opens and closes the opening 42k. Note that the switching mechanism 131 does not include a member equivalent to the opening / closing unit 63.

[0329] The opening / closing part 133 has a substantially T-shape in plan view. The opening / closing part 133 includes a plate part 133a and a base part 133b. The plate 133a has a substantially vertical flat plate shape. The base part 133b is connected to the center of the plate part 133a in plan view. The base part 133b protrudes horizontally from the plate part 133a. The opening / closing part 133 swings around a rotation axis A4. The rotation axis A4 is an imaginary line parallel to the vertical direction Z. The rotation axis A4 passes through the base part 133b. The rotation axis A4 does not pass through the plate part 133a. The opening / closing part 133 swings around the rotation axis A4.

[0330] The opening / closing unit 134 has the same structure as the opening / closing unit 133. That is, the opening / closing unit 134 includes a plate portion 134a and a base portion 134b. The opening / closing unit 134 swings around a rotation axis A5.

[0331] The opening / closing unit 133 is movable between a position that connects the processing casing 23 to the exhaust pipe 41 and a position that blocks the processing casing 23 from the exhaust pipe 41. In Figure 16, the opening / closing unit 133 is shown by a solid line in the position that connects the processing casing 23 to the exhaust pipe 41. In Figure 16, the opening / closing unit 133 is shown by a dashed line in the position that blocks the processing casing 23 from the exhaust pipe 41.

[0332] The opening / closing unit 134 is movable between a position that connects the processing casing 23 to the exhaust pipe 42 and a position that blocks the processing casing 23 from the exhaust pipe 42. Figure 16 shows the opening / closing unit 134 in the position that connects the processing casing 23 to the exhaust pipe 42 by a dashed line. Figure 16 shows the opening / closing unit 134 in the position that blocks the processing casing 23 from the exhaust pipe 42 by a solid line.

[0333] 15. For example, when the opening / closing unit 133 is in a position that connects the processing casing 23 to the exhaust pipe 41, the opening / closing unit 133 isolates the processing casing 23 from the exhaust pipes 42, 43. When the opening / closing unit 134 is in a position that connects the processing casing 23 to the exhaust pipe 42, the opening / closing unit 134 isolates the processing casing 23 from the exhaust pipe 43.

[0334] In the embodiment, the liquid supply unit 33 supplies a first processing liquid, a second processing liquid, and a third processing liquid. That is, the number of types of processing liquid that the liquid supply unit 33 can supply is three. However, this is not limited to this. The number of types of processing liquid that the liquid supply unit 33 can supply may be less than three. The number of types of processing liquid that the liquid supply unit 33 can supply may be more than three.

[0335] For example, the liquid supply unit 33 may be capable of supplying a fourth processing liquid. The fourth processing liquid may be classified as, for example, a rinse liquid. The fourth processing liquid may include, for example, at least one of pure water, carbonated water, electrolytic ion water, hydrogen water, ozone water, and diluted hydrochloric acid water.

[0336] In the embodiment, the processing unit 21 may further include a processing gas supply unit. The processing gas supply unit is installed inside the processing housing 23. The processing gas supply unit supplies processing gas to the substrate W held in the holder 31. The processing gas supply unit supplies at least one type of processing gas. The processing gas is, for example, a gas other than clean air.

[0337] When the processing unit 21 includes a processing gas supply unit, the switching mechanism 51 may operate as follows. In response to switching between use and non-use of processing gas in the processing housing 23, the switching mechanism 51 may switch the exhaust path of the processing housing 23. When switching between multiple types of processing gases to be used in the processing housing 23, the switching mechanism 51 may switch the exhaust path of the processing housing 23 in response to switching between the types of processing gas. In response to switching between supplying a processing liquid and supplying a processing gas, the switching mechanism 51 may switch the exhaust path of the processing housing 23.

[0338] In the embodiment, the liquid supply unit 33 supplies the first processing liquid, the second processing liquid, and the third processing liquid to the substrate W held in the holder 31 in this order. However, this is not limited to this. The order in which the first processing liquid, the second processing liquid, and the third processing liquid are supplied may be changed as appropriate.

[0339] In the embodiment, the number of processing casings 23 installed at approximately the same height position is four. However, this is not limited to this. The number of processing casings 23 installed at approximately the same height position may be less than four or more than four. In the embodiment described above, the number of processing casings 23 lined up in the vertical direction Z is six. However, this is not limited to this. The number of processing casings 23 lined up in the vertical direction Z may be less than six or more than six.

[0340] In this embodiment, the substrate processing apparatus 1 includes two transport spaces 12A and 12B. That is, the number of transport spaces 12 is two. However, this is not limited to this. For example, the number of transport spaces 12 may be one. For example, the transport space 12B may be omitted. For example, the number of transport spaces 12 may be three or more.

[0341] In the embodiment, the number of transport mechanisms 16 installed in one transport space 12 is one. However, this is not limited to this. For example, the number of transport mechanisms 16 installed in one transport space 12 may be two or more.

[0342] In this embodiment, the first piping space 44A is disposed in front of the processing casing 23A. The second piping space 46A is disposed behind the processing casing 23A. However, this is not limitative. The relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A may be changed as appropriate.

[0343] 17 is a plan view showing the inside of a substrate processing apparatus 141 in the modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0344] In the substrate processing apparatus 141, the first piping space 44A is disposed behind the processing housing 23A, and the second piping space 46A is disposed in front of the processing housing 23A.

[0345] Furthermore, in the substrate processing apparatus 141, the first piping space 44B is disposed rearward of the processing housing 23B. The second piping space 46B is disposed in front of the processing housing 23B. The first piping space 44C is disposed in front of the processing housing 23C. The second piping space 46C is disposed rearward of the processing housing 23C. The first piping space 44D is disposed in front of the processing housing 23D. The second piping space 46D is disposed rearward of the processing housing 23D.

[0346] In the substrate processing apparatus 141, the relative positions of the processing casing 23B, the first piping space 44B, and the second piping space 46B are the same as the relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A. The relative positions of the processing casing 23C, the first piping space 44C, and the second piping space 46C are the same as the relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A. The relative positions of the processing casing 23D, the first piping space 44D, and the second piping space 46D are the same as the relative positions of the processing casing 23A, the first piping space 44A, and the second piping space 46A.

[0347] In this embodiment, the exhaust pipes 41A-43A are disposed in front of the processing housing 23A, but this is not limitative.

[0348] See Fig. 17. In the substrate processing apparatus 141, exhaust pipes 41A-43A are arranged behind the processing housing 23A.

[0349] Furthermore, in the substrate processing apparatus 141, exhaust pipes 41B-43B are arranged behind the processing housing 23B, exhaust pipes 41C-43C are arranged in front of the processing housing 23C, and exhaust pipes 41D-43D are arranged in front of the processing housing 23D.

[0350] In the embodiment, the structure of the transport mechanism 6 of the indexer unit 3 is exemplified. However, the present invention is not limited to this. The structure of the transport mechanism 6 may be changed as appropriate.

[0351] Refer to Figure 17. The indexer unit 3 includes a transport mechanism 146. The transport mechanism 146 includes a hand 147 and a hand driver 148. The hand 147 holds one substrate W in a horizontal position. The hand driver 148 is connected to the hand 147. The hand driver 148 moves the hand 147. The hand driver 8 moves the hand 147 in the front-rear direction X, the width direction Y, and the vertical direction Z.

[0352] The hand driver 148 includes a first driver 148a and a second driver 148b. The second driver 148b is supported by the first driver 148a. The first driver 148a moves the second driver 148b in the vertical direction Z. The first driver 148a also rotates the second driver 148b around a rotation axis parallel to the vertical direction Z. However, the first driver 148a does not move the second driver 148b in the horizontal direction. The first driver 148a itself is immovable in the horizontal direction. The second driver 148b moves in the horizontal direction relative to the first driver 148a. The second driver 148b is configured, for example, as an articulated arm. The second driver 148b is connected to the hand 147. Because the hand driver 148 has this configuration, the hand 147 can move parallel to the vertical direction Z. The hand 147 can translate in any horizontal direction and can rotate within a horizontal plane.

[0353] In the embodiment, the structure of the transport mechanism 16 of the processing block 11 is illustrated. However, the present invention is not limited to this. The structure of the transport mechanism 16 may be changed as appropriate. For example, the transport mechanism 16 may have a structure similar to that of the transport mechanism 146 described above.

[0354] In the embodiment, as shown in Fig. 8, the opening / closing portion 61 has a substantially rectangular shape when viewed from the front. However, this is not limited to this. The shape of the opening / closing portion 61 may be changed as appropriate. Similarly, the shapes of the opening / closing portions 62 and 63 may be changed as appropriate.

[0355] Fig. 18 is a front view of the switching mechanism of the modified embodiment. Figs. 19(a) and 19(b) are side views of the switching mechanism of the modified embodiment. Note that the same components as those in the embodiment are designated by the same reference numerals, and detailed descriptions thereof will be omitted.

[0356] 18, the substrate processing apparatus 1 includes a switching mechanism 141. The switching mechanism 141 includes opening / closing units 142, 143, and 144. The opening / closing units 142-144 are each installed inside the switching housing 53. The opening / closing units 142-144 each have a substantially circular shape.

[0357] The opening / closing unit 142 can swing around a rotation axis A6. The rotation axis A6 is a horizontal imaginary line. The rotation axis A6 is parallel to the width direction Y. The rotation axis A6 is located above the opening / closing unit 142. The rotation axis A6 does not pass through the center of the opening / closing unit 142. By swinging the opening / closing unit 142 around the rotation axis A6, the opening / closing unit 142 moves between a position where the processing casing 23 is connected to the first exhaust pipe 41 and a position where the processing casing 23 is cut off from the first exhaust pipe 41. Similarly, the opening / closing units 143 and 144 can swing around rotation axes A7 and A8, respectively.

[0358] 18, the opening / closing unit 142 is disposed at a position that isolates the processing casing 23 from the exhaust pipe 41. Similarly, the opening / closing units 143 and 144 are disposed at positions that isolate the processing casing 23 from the exhaust pipes 42 and 43, respectively.

[0359] 19(a), the opening / closing unit 142 is positioned to isolate the processing casing 23 from the exhaust pipe 41. The opening / closing unit 142 closes the opening 41k of the exhaust pipe 41. In FIG. 19(b), the opening / closing unit 142 is positioned to connect the processing casing 23 to the exhaust pipe 41. The opening / closing unit 142 opens the opening 41k.

[0360] See Figures 19(a) and 19(b). The opening / closing unit 142 is supported by the switching housing 53. The opening / closing unit 142 is supported by the distribution unit 56. Specifically, the switching mechanism 141 includes a stay 146 and an attachment member 147. The stay 146 is fixed to the switching housing 53. The stay 146 is fixed to the distribution unit 56. The attachment member 147 is supported by the stay 146. The attachment member 147 is rotatable around the rotation axis A6 relative to the stay 146. The attachment member 147 is fixed to the opening / closing unit 142.

[0361] See Figure 18. Similar to the opening and closing part 142, the opening and closing parts 143 and 144 are fixed to mounting members 148 and 149, respectively.

[0362] In the embodiment, no specific example is given of a mechanism for moving the opening / closing units 61-63. Therefore, a mechanism for moving the opening / closing unit 142 will be illustrated with reference to Figures 19(a) and 19(b).

[0363] The processing block 11 includes a drive unit 151 that moves the opening / closing unit 142. The drive unit 151 is not a component of the switching mechanism 141.

[0364] The drive unit 151 includes an actuator 152. The actuator 152 generates power to move the opening / closing unit 142. The actuator 152 is, for example, an air cylinder, a hydraulic cylinder, or an electric motor. The actuator 152 is disposed outside the switching housing 53. The actuator 152 is disposed in the first piping space 44. The actuator 152 is disposed above the switching housing 53. The actuator 152 is disposed above the distribution unit 56.

[0365] The drive unit 151 includes a rod 153. The rod 153 is connected to an actuator 152. The rod 153 extends downward from the actuator 152. The rod 153 passes through the switching housing 53. At least a portion of the rod 153 is disposed inside the switching housing 53. The actuator 152 moves the rod 153 in the vertical direction Z.

[0366] The drive unit 151 includes a link 154. The link 154 is disposed inside the switching housing 53. The link 154 connects the rod 153 and the mounting member 148. The link 154 is rotatable about an axis A11 relative to the rod 153. The link 154 is rotatable about an axis A12 relative to the mounting member 148. The axes A11 and A12 are each horizontal imaginary lines. The axes A11 and A12 are each parallel to the width direction Y.

[0367] When the actuator 152 moves the rod 153 in the vertical direction Z, the opening / closing unit 142 rotates around the rotation axis A6. When the actuator 152 moves the rod 153 upward, the opening / closing unit 142 moves to a position that connects the processing casing 23 to the exhaust pipe 41. When the actuator 152 moves the rod 153 downward, the opening / closing unit 142 moves to a position that disconnects the processing casing 23 from the exhaust pipe 41.

[0368] In the embodiment, it is also possible to detect gas leakage in the exhaust path of the processing housing 23. For example, gas leakage from the opening and closing parts 61-63 may be detected.

[0369] 18, 19(a), and 19(b). The processing block 11 is equipped with wind speed sensors 162, 163, and 164. The wind speed sensor 162 is arranged near the opening / closing unit 142. The wind speed sensor 162 is arranged, for example, inside the switching housing 53. The wind speed sensor 162 is arranged, for example, inside the distribution unit 56. When the rotation axis A6 is arranged above the opening / closing unit 142, it is preferable that the wind speed sensor 162 be arranged below the opening / closing unit 142. Similarly, the wind speed sensors 163 and 164 are arranged near the opening / closing units 143 and 144.

[0370] The wind speed sensor 162 detects the wind speed of the gas (specifically, the movement speed of the gas) in the vicinity of the opening / closing unit 142. Similarly, the wind speed sensors 163 and 164 detect the wind speed of the gas in the vicinity of the opening / closing units 143 and 144. The wind speed sensors 162-164 are, for example, hot wire anemometers.

[0371] The wind speed sensor 162 may further detect the direction of the airflow (specifically, the direction of movement of the air) in the vicinity of the opening / closing section 142. Similarly, the wind speed sensors 163, 164 may further detect the direction of the airflow in the vicinity of the opening / closing sections 143, 144.

[0372] Although not shown in the figure, the control unit 91 is communicably connected to the wind speed sensors 162-164. The control unit 91 acquires the detection results of the wind speed sensors 162-164.

[0373] The control unit 91 determines whether or not there is a gas leak from the opening / closing unit 142 based on the detection result of the air velocity sensor 162. The gas leak from the opening / closing unit 142 means that the opening / closing unit 142 leaks gas from the processing casing 23 to the exhaust pipe 41 when the opening / closing unit 142 is placed in a position that blocks the processing casing 23 from the exhaust pipe 41.

[0374] Specifically, the control unit 91 calculates the wind speed of the gas in the vicinity of the opening / closing unit 142 based on the detection result of the wind speed sensor 162. The calculated wind speed of the gas in the vicinity of the opening / closing unit 142 is referred to as the "actual measurement value."

[0375] When the opening / closing unit 142 is positioned to isolate the processing casing 23 from the exhaust pipe 41, the control unit 91 monitors whether the actual measurement value satisfies a predetermined condition. The predetermined condition is, for example, that the actual measurement value is less than a predetermined first reference value. The predetermined condition is, for example, that the change in the actual measurement value per unit time is less than a second reference value. If the actual measurement value does not satisfy the predetermined condition when the opening / closing unit 142 is positioned to isolate the processing casing 23 from the exhaust pipe 41, the control unit 91 determines that gas is leaking from the opening / closing unit 142.

[0376] Here, it is preferable that at least one of the first reference value and the second reference value is variable, for example. At least one of the first reference value and the second reference value may change, for example, depending on the positions of the other opening / closing units 143 and 144. At least one of the first reference value and the second reference value may change, for example, depending on the position of the opening / closing unit 142 belonging to the other switching mechanism 51. At least one of the first reference value and the second reference value may change, for example, depending on the positions of the opening / closing units 142, 143, and 144 belonging to the other switching mechanism 51. This allows the control unit 91 to accurately determine whether or not gas is leaking from the opening / closing unit 142, even if the wind speed of gas near the opening / closing unit 142 is easily affected by external disturbances.

[0377] Alternatively, at least one of the first reference value and the second reference value may be a constant.

[0378] Similarly, the control unit 91 determines whether or not there is gas leakage from the opening / closing units 143 and 144 based on the detection results of the wind speed sensors 163 and 164 .

[0379] According to this modified embodiment, it is possible to suitably monitor whether the exhaust path of the processing housing 23 is properly switched between the exhaust pipes 41-43.

[0380] Furthermore, the wind speed sensors 162-164 can suitably detect minute gas flows, and therefore it is possible to accurately monitor whether the exhaust path of the processing housing 23 is switching normally between the exhaust pipes 41-43.

[0381] In this modified embodiment, when the control unit 91 detects a gas leak in the exhaust path, the control unit 91 may at least one of issuing an alarm and stopping the operation of the liquid supply unit 33. When the control unit 91 issues an alarm, the user of the substrate processing apparatus 1 can be promptly notified of the gas leak in the exhaust path. When the control unit 91 stops the operation of the liquid supply unit 33, the amount of components derived from the processing liquid contained in the gas inside the processing housing 23 can be promptly reduced. In either case, contamination of the inside of the exhaust pipes 41-43 can be suitably prevented. For example, the generation of crystals (salt) inside the exhaust pipes 41-43 can be suitably prevented. For example, the accumulation of crystals inside the exhaust pipes 41-43 can be suitably prevented.

[0382] 18, 19(a) and 19(b), the wind speed sensors 162-164 are arranged inside the switching housing 53. However, the present invention is not limited to this.

[0383] For example, the wind speed sensor 162 may be disposed inside the exhaust pipe 41. Even when the wind speed sensor 162 is disposed inside the exhaust pipe 41, an appropriate reference value can be set in advance. Therefore, the control unit 91 can appropriately determine whether or not there is a gas leak from the opening / closing unit 142. The locations of the wind speed sensors 163 and 164 may also be changed in a similar manner.

[0384] For example, the wind speed sensor 162 may be disposed inside the processing casing 23. Even when the wind speed sensor 162 is disposed inside the processing casing 23, an appropriate reference value can be set in advance. Therefore, the control unit 91 can appropriately determine whether or not there is a gas leak from the opening / closing unit 142. The locations of the wind speed sensors 163 and 164 may also be changed in a similar manner.

[0385] The arrangement of the wind speed sensors 162-164 will be illustrated with reference to the drawings. Fig. 20(a) is a plan view in which an example of the arrangement of the wind speed sensors is added to Fig. 6. Fig. 20(b) is a plan view in which an example of the arrangement of the wind speed sensors is added to Fig. 13. Fig. 21(a) is a plan view in which an example of the arrangement of the wind speed sensors is added to Fig. 15. Fig. 21(b) is a plan view in which an example of the arrangement of the wind speed sensors is added to Fig. 16. Note that the same components as those in the embodiment are designated by the same reference numerals, and detailed description thereof will be omitted.

[0386] Refer to Figure 20(a). The wind speed sensor 162 includes at least one of wind speed sensors 162a and 162b. The wind speed sensors 162a and 162b are each disposed near the opening / closing section 61. The wind speed sensor 162a is disposed inside the exhaust pipe 41. The wind speed sensor 162a is disposed near the opening 41k. The wind speed sensor 162b is disposed inside the switching housing 53. Similarly, the wind speed sensor 163 includes at least one of wind speed sensors 163a and 163b. The wind speed sensor 164 includes at least one of wind speed sensors 164a and 164b.

[0387] 20(b). The wind speed sensor 162 includes at least one of wind speed sensors 162c and 162d. The wind speed sensors 162c and 162d are each disposed near the opening / closing section 113. The wind speed sensor 162c is disposed inside the processing casing 23. The wind speed sensor 162d is disposed inside the exhaust pipe 41. The wind speed sensor 162d is disposed near the opening 41k. Similarly, the wind speed sensor 163 includes at least one of wind speed sensors 163c and 163d. The wind speed sensor 164 includes at least one of wind speed sensors 164c and 164d.

[0388] 21(a). The wind speed sensor 162 includes at least one of wind speed sensors 162e, 162f, and 162g. The wind speed sensors 162e-162g are each disposed near the opening / closing unit 123. The wind speed sensor 162e is disposed inside the exhaust pipe 41. The wind speed sensor 162e is disposed near the opening 41k. The wind speed sensors 162f and 162g are each disposed inside the switching casing 53. As described above, when the opening / closing unit 123 is disposed at a position that connects the processing casing 23 to the exhaust pipe 41, the opening / closing unit 123 isolates the first area 126 from the second area 127. At this time, the wind speed sensor 162g is provided to detect gas leakage from the opening / closing unit 123. When the opening / closing unit 123 is disposed at a position that connects the processing casing 23 to the exhaust pipe 41, the wind speed sensor 162g can suitably detect the amount of gas leaking from the first section 126 to the second section 127 through the opening / closing unit 123. Similarly, the wind speed sensor 163 includes at least one of wind speed sensors 163e, 163f, and 163g. The wind speed sensor 163g is provided for a purpose similar to that of the wind speed sensor 162g. The wind speed sensor 164 includes at least one of wind speed sensors 164e and 164f.

[0389] 21(b). The wind speed sensor 162 includes at least one of wind speed sensors 162h, 162i, 162j, 162k, and 162l. The wind speed sensors 162h-162l are each disposed near the opening / closing unit 123. The wind speed sensors 162h and 162i are disposed inside the exhaust pipe 41. The wind speed sensors 162h and 162i are disposed near the opening 41k. The wind speed sensors 162j-162l are each disposed inside the switching housing 53. As described above, when the opening / closing unit 133 is disposed at a position that connects the processing housing 23 to the exhaust pipe 41, the opening / closing unit 133 isolates the processing housing 23 from the exhaust pipes 42 and 43. At this time, the wind speed sensors 162k and 162l are provided to detect gas leakage from the opening / closing unit 123. When the opening / closing unit 133 is positioned to connect the processing casing 23 to the exhaust pipe 41, the wind speed sensors 162k and 162l can suitably detect the amount of gas leaking from the processing casing 23 to the exhaust pipes 42 and 43 through the opening / closing unit 123. Similarly, the wind speed sensor 163 includes at least one of wind speed sensors 163h, 163i, 163j, 163k, and 163l. The wind speed sensors 163k and 163l are provided for a purpose similar to that of the wind speed sensors 162k and 162l. The wind speed sensor 164 includes at least one of wind speed sensors 164h, 164i, and 164j.

[0390] The embodiment and each modified embodiment may be further modified as appropriate by replacing or combining each configuration with the configuration of another modified embodiment. [Explanation of symbols]

[0391] 1, 141 ... Substrate processing equipment 11 ... Processing block 12A, 12B, 12...Transport space 16A, 16B, 16 ... conveying mechanism 21... Processing unit 23... Processing enclosure 23A1 ... Processing housing (first processing housing) 23A2 ... Processing housing (second processing housing) 23B1 ... Processing housing (third processing housing) 24 … Processing space 31... Holding section (first holding section, second holding section, third holding section) 33...Liquid supply section (first liquid supply section, second liquid supply section, third liquid supply section) 41, 42, 43 ... exhaust pipe 41A ... Exhaust pipe (first exhaust pipe) 42A ... Exhaust pipe (second exhaust pipe) 41B ... Exhaust pipe (third exhaust pipe) 42B ... Exhaust pipe (fourth exhaust pipe) 44... First piping space 46 … Second piping space 48...Air intake pipe 51, 101, 111, 121, 131, 141 ... Switching mechanism 51A1 ... Switching mechanism (first switching mechanism) 51A2 ... Switching mechanism (second switching mechanism) 51B1 ... Switching mechanism (third switching mechanism) 53, 103, … Switching housing 54...Switching space 55, 105... Introduction 56, 106 … Distribution section 61-63, 113-115, 123-124, 133-134, 142-144 … Opening and closing section 61, 113, 123, 133, 142 ... Opening and closing section (first opening and closing section) 62, 114, 124, 134, 143 ... Opening and closing section (second opening and closing section) 71... Pressure sensor 71A1 ... Pressure sensor (first pressure sensor) 71B1 ... Pressure sensor (third pressure sensor) 73... Pressure adjustment mechanism 73A1 ... Pressure adjustment mechanism (first pressure adjustment mechanism) 73B1 ... Pressure adjustment mechanism (third pressure adjustment mechanism) 81, 82, 83 ... exhaust pipe 81A ... Exhaust pipe (5th exhaust pipe) 82A ... Exhaust pipe (6th exhaust pipe) 84-86 ... Pressure sensor 84A... Pressure sensor (5th pressure sensor) 85A... Pressure sensor (6th pressure sensor) 87-89 ... Pressure adjustment mechanism 87A... Pressure adjustment mechanism (5th pressure adjustment mechanism) 88A... Pressure adjustment mechanism (6th pressure adjustment mechanism) 91 ... Control section W: Substrate X…Anteroposterior direction (first direction) Y: Width direction (second direction) Z: vertical direction

Claims

1. An opening / closing mechanism for connecting and blocking one processing housing and one exhaust pipe, an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, When the opening / closing unit moves between the communicating position and the blocking position, the amount of rotation of the opening / closing unit about the first axis is 45 degrees or less. Opening and closing mechanism.

2. An opening / closing mechanism for connecting and blocking one processing housing and one exhaust pipe, an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, The opening and closing mechanism is A stay that is fixedly installed; an attachment member supported by the stay and fixed to the opening / closing portion; Equipped with The mounting member is rotatable about the first axis relative to the stay. Opening and closing mechanism.

3. In the opening and closing mechanism described in claim 2, The opening and closing mechanism is a drive unit that swings the opening / closing unit around the first axis to move the opening / closing unit between the communication position and the cut-off position; Equipped with Opening and closing mechanism.

4. In the opening and closing mechanism described in claim 3, The drive unit is An actuator; a rod connected to the actuator; a link connecting the rod and the mounting member; Equipped with The link is rotatable about a second axis relative to the rod; The link is rotatable about a third axis relative to the mounting member. Opening and closing mechanism.

5. In the opening and closing mechanism described in claim 4, the second axis is horizontal, The third axis is horizontal. Opening and closing mechanism.

6. In the opening and closing mechanism according to claim 4 or 5, The actuator moves the rod in a vertical direction, When the rod moves in the vertical direction, the opening / closing part moves around the first axis. Opening and closing mechanism.

7. In the opening and closing mechanism described in claim 6, When the actuator moves the rod upward, the opening / closing portion moves to the communicating position, When the actuator moves the rod downward, the opening / closing part moves to the blocking position. Opening and closing mechanism.

8. An opening and closing mechanism according to any one of claims 4 to 7, The rod extends downward from the actuator. Opening and closing mechanism.

9. An opening / closing mechanism for connecting and blocking one processing housing and one exhaust pipe, an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, The first axis is disposed at a position offset in a direction perpendicular to the opening / closing portion. Opening and closing mechanism.

10. In the opening and closing mechanism according to any one of claims 1 to 9, The first axis is disposed above the opening / closing portion. Opening and closing mechanism.

11. In the opening and closing mechanism according to any one of claims 1 to 10, The first axis is horizontal. Opening and closing mechanism.

12. A switching mechanism for switching the exhaust path of the processing housing to one of a plurality of exhaust pipes, a plurality of opening and closing mechanisms provided in the plurality of exhaust pipes, respectively; Equipped with Each of the opening and closing mechanisms is an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, When the opening / closing unit moves between the communicating position and the blocking position, the amount of rotation of the opening / closing unit about the first axis is 45 degrees or less. Switching mechanism.

13. A switching mechanism for switching the exhaust path of the processing housing to one of a plurality of exhaust pipes, a plurality of opening and closing mechanisms provided in the plurality of exhaust pipes, respectively; Equipped with Each of the opening and closing mechanisms is an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, The switching mechanism includes: a switching housing connected to the processing housing and the plurality of exhaust pipes; Equipped with the plurality of opening / closing units are disposed inside the switching housing, The opening and closing mechanism includes: a stay fixed to the switching housing; an attachment member supported by the stay and fixed to the opening / closing portion; Equipped with The mounting member is rotatable about the first axis relative to the stay. Switching mechanism.

14. The switching mechanism according to claim 13, The plurality of opening and closing units are each supported by the switching housing. Switching mechanism.

15. The switching mechanism according to claim 13 or 14, The opening and closing mechanism includes: a drive unit that swings the opening / closing unit around the first axis to move the opening / closing unit between the communication position and the cut-off position; Equipped with Switching mechanism.

16. The switching mechanism according to claim 15, The drive unit is An actuator; Equipped with The actuator is disposed outside the switching housing. Switching mechanism.

17. The switching mechanism according to claim 16, The actuator is disposed above the switching housing. Switching mechanism.

18. The switching mechanism according to claim 16 or 17, the drive unit includes a rod connected to the actuator, The rod passes through the switching housing; At least a portion of the rod is disposed within the switching housing. Switching mechanism.

19. The mechanism of claim 18, The drive unit is a link connecting the rod and the mounting member; Equipped with The link is disposed inside the switching housing. Switching mechanism.

20. A switching mechanism for switching the exhaust path of the processing housing to one of a plurality of exhaust pipes, a plurality of opening and closing mechanisms provided in the plurality of exhaust pipes, respectively; Equipped with Each of the opening and closing mechanisms is an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, The first axis is disposed at a position offset in a direction perpendicular to the opening / closing portion. Switching mechanism.

21. A substrate processing apparatus, a processing housing; A plurality of exhaust pipes; a switching mechanism that switches the exhaust path of the processing housing to any one of the plurality of exhaust pipes; Equipped with The switching mechanism includes: a plurality of opening and closing mechanisms provided in the plurality of exhaust pipes, respectively; Equipped with Each of the opening and closing mechanisms is an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, When the opening / closing unit moves between the communicating position and the blocking position, the amount of rotation of the opening / closing unit about the first axis is 45 degrees or less. Substrate processing equipment.

22. A substrate processing apparatus, a processing housing; A plurality of exhaust pipes; a switching mechanism that switches the exhaust path of the processing housing to any one of the plurality of exhaust pipes; Equipped with The switching mechanism includes: a plurality of opening and closing mechanisms provided in the plurality of exhaust pipes, respectively; Equipped with Each of the opening and closing mechanisms is an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, The opening and closing mechanism includes: A stay that is fixedly installed; an attachment member supported by the stay and fixed to the opening / closing portion; Equipped with The mounting member is rotatable about the first axis relative to the stay. Substrate processing equipment.

23. A substrate processing apparatus, a processing housing; A plurality of exhaust pipes; a switching mechanism that switches the exhaust path of the processing housing to any one of the plurality of exhaust pipes; Equipped with The switching mechanism includes: a plurality of opening and closing mechanisms provided in the plurality of exhaust pipes, respectively; Equipped with Each of the opening and closing mechanisms is an opening / closing unit that swings about a first axis to move to a communication position that connects the processing casing to the exhaust pipe and to a blocking position that blocks the processing casing from the exhaust pipe; Equipped with The first axis is disposed at a position offset from the center of the opening / closing portion, The first axis is disposed at a position offset in a direction perpendicular to the opening / closing portion. Substrate processing equipment.

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