Current supply configuration, plasma generating device, and method for controlling multiple plasma processes

Abstract

A current supply configuration (10) for a plurality of plasma generators (17a, 17b, …, 17n) that are each specifically designed to excite a gas into a gas plasma at a location remote from the plasma treatment position, a) a power input terminal (2) for connection to a supply power source (7), b) a data connection (13) for connection to a control mechanism (4) and comprising, c) the current supply configuration (10) is designed to convert the power from the power input terminal (2) into AC voltage power in an AC voltage generator stage (6), d) the current supply configuration (10) is adapted, via the data connection (13), to ensure that the AC voltage power can be delivered as a first AC voltage power to a first load (9a) and as a second AC voltage power to a second load (9b) located at a location remote from the first load, and in particular that power is not supplied to the two loads simultaneously, and further, the first and second AC voltage powers are output current, output voltage, output frequency, output power, output profile of current and / or voltage adapted to be controllable to adjust different characteristics with at least one or a plurality of control values of, e) the current supply configuration (10) is adapted to output a control signal for impedance matching devices (15a, 15b, …, 15n) assigned to one of the AC voltage powers, the current supply configuration (10).

Description

[Technical Field]

[0001] The present invention relates to a current supply arrangement for multiple plasma generators, a plasma generating device comprising such a current supply arrangement, and a method for controlling multiple plasma processes comprising such a current supply arrangement. [Background technology]

[0002] Here, the plasma generator can be specifically designed to excite gas into gas plasma at a location remote from the plasma processing location. Such a plasma generator is also called a "remote plasma source." Such a plasma generator is described, for example, in U.S. Pat. No. 6,277,329 or U.S. Pat. No. 6,277,329.

[0003] The current supply arrangement is often provided integrally with the plasma generator, i.e., the plasma chamber in which the gas plasma is generated. When processing and / or manufacturing materials in a processing chamber, multiple such gas plasma generators at separate locations are often required. They can be used, for example, to excite gases so that the excited gases are used in the process. Similarly, they can be used, for example, to excite gases so that the gases are excited to exit the processing chamber.

[0004] The cost of multiple units consisting of current supply arrangements and plasma generators is high, and as the number of such units increases, the risk of one of the units failing increases. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] International Publication No. 2014 / 016335A1 Brochure [Patent Document 2] US Patent Application Publication No. 2007 / 0103092A1 [Patent Document 3] International Publication No. 2016 / 177766A1 Brochure [Patent Document 4] International Publication No. 2017 / 072087A1 Brochure [Patent Document 5] International Publication No. 2019 / 185423A1 Brochure [Patent Document 6] International Publication No. 2021 / 255250A1 Brochure [Patent Document 7] U.S. Patent No. 9,368,328 B2 Summary of the Invention [Problem to be solved by the invention]

[0006] It is an object of the present invention to provide a current supply arrangement, a plasma generating device, and / or a method for controlling some plasma processes that overcomes these drawbacks. [Means for solving the problem]

[0007] This object is achieved by a current supply arrangement according to claim 1, a plasma generating device according to claim 11 and / or a method according to claim 15. Advantageous configurations are disclosed in the dependent claims and / or in the present description.

[0008] Accordingly, one aspect of the present invention provides a current supply arrangement for a plurality of plasma generators, each specifically designed to excite a gas into a gas plasma at a location remote from a plasma processing location, the current supply arrangement comprising: a) a power input terminal for connection to a power supply source; b) a data connection for connecting to a control mechanism; Equipped with c) the current supply configuration is designed to convert the power from the power input terminal into AC voltage power in an AC voltage generator stage; d) The current supply configuration is via a data connection: adapted to ensure that AC voltage power can be delivered to a first load as a first AC voltage power and to a second load located remotely from the first load as a second AC voltage power, in particular such that the two loads are not powered simultaneously; and The first and second AC voltage power Output current, Output voltage, Output frequency, Output power, Current and / or voltage output profile and adapted to be controllable so as to be able to have different characteristics at at least one or more control values ​​of e) the current supply arrangement is adapted to output a control signal for an impedance matching device assigned to one of the AC voltage powers; A current supply configuration is disclosed.

[0009] A "characteristic relating to a control value" means a specific given value relating to one or more control values.

[0010] For example, the first AC voltage power may have an output power of 3 kW, an output frequency of 30 kHz, and a current output profile of rectangular pulses with a pulse pause ratio of 70% and a repetition frequency of 100 Hz. For example, the second AC voltage power may have an output power of 4 kW, an output frequency of 35 kHz, and a current output profile of rectangular pulses with a pulse pause ratio of 70% and a repetition frequency of 100 Hz, similar to the first AC voltage power.

[0011] The control value characteristic may additionally or alternatively specify extreme values ​​for one or more control values, ie values ​​that must not be exceeded (eg a maximum current of 10A or a minimum power of 100W).

[0012] The first and second AC voltage powers differ in at least one of these control value characteristics.

[0013] In one embodiment, the control value characteristics differ in at least two of these control value characteristics, and particularly preferably in at least three.

[0014] In this specification, an impedance matching device refers to a device capable of transforming the output impedance of a load connected at its output, for example, so that a given impedance at its input can be adjusted. There are many types of impedance matching devices. Descriptions of such devices are found, for example, in U.S. Pat. No. 5,629,499, U.S. Pat. No. 5,629,499, U.S. Pat. No. 5,629,499, and U.S. Pat. No. 5,629,499. They often include both variable and fixed reactances, i.e., inductances and capacitances. Also known are elements that change impedance, such as transmission lines, resistors, transducers, baluns, and couplers. Variable elements can be electronically controllably variable. Here, for example, a vacuum capacitor can be changed by a motor, or a reactance can be switched on and off.

[0015] An AC voltage generator stage refers to an electronic circuit adapted to convert a first power, e.g., DC power, into AC power. AC power is characterized by voltage and current periodically changing their sign. Here, the current and voltage can have different profiles. The voltage and / or current can be, for example, approximately sinusoidal or approximately square-wave. In the latter case, it is often called a bipolar voltage generator stage. Such an AC voltage generator stage often comprises a bridge circuit composed of switching elements, in particular transistors, preferably MOSFETs or IGBTs.

[0016] In one aspect, the current supply arrangement comprises: a) a first power output terminal for delivering a first AC voltage power to a first load; b) a second power output terminal for delivering a second AC voltage power to a second load located remotely from the first load; Further provided are:

[0017] In one aspect, the current supply arrangement further comprises a switching unit, particularly a part of the current supply arrangement, which is controllable via a data connection such that the switching unit can inject the AC voltage power generated by the AC voltage generator stage into each of the power output terminals and / or loads, respectively, and is adapted to adjust different characteristics of the respective AC voltage power. Here, the switching unit refers to an electronic component adapted to conduct an electrical signal from a first contact to a second contact in a first setting and to disrupt, particularly prevent, this conduction in a second setting. Advantageously, in a second setting, the switching unit can conduct an electrical signal from the first contact to a third contact in a second position and to disrupt, particularly prevent, this conduction in the first setting. The switching unit may be a transistor, particularly a power transistor, preferably an IGBT or a MOSFET. Other embodiments are also possible, such as a PIN diode or an electromechanical switch.

[0018] In one aspect, there is provided a current supply arrangement for a plurality of plasma generators, each specifically designed to excite a gas into a gas plasma at a location remote from a plasma processing location, comprising: a) a power input terminal for connection to a power supply source; b) a data connection, in particular for connecting to a control mechanism which may be located inside or outside the current supply arrangement; Equipped with c) the current supply arrangement is designed to convert power from the power input terminal into first and second AC voltage power in an AC voltage generator stage; The current supply configuration further d) a first power output terminal for delivering a first AC voltage power to a first load; e) a second power output terminal for delivering a second AC voltage power to a second load remote from the first load; Equipped with f) the current supply configuration includes first and second AC voltage power supplies via the data connection; Output current, Output voltage, Output frequency, Output power, Current and / or voltage output profile and adapted to be controllable so as to be able to have different characteristics at at least one or more control values ​​of g) the current supply arrangement is adapted to output a control signal, in particular a plurality of control signals, for one, in particular for each one of the impedance matching devices, assigned to one of the AC voltage powers; A current supply configuration is disclosed.

[0019] Therefore, multiple plasma processes or multiple plasma generators can be operated with one current supply configuration, which increases reliability and significantly reduces costs. By providing one or more control signals for the impedance matching devices assigned to the plasma generators, these control signals can also be individually tailored to the respective AC voltage power of each plasma generator.

[0020] In one embodiment, the current supply arrangement can include one, in particular a plurality of, switching units, the current supply arrangement being adapted to ensure that the switching units inject the AC voltage power generated by the AC voltage generator stages into respective ones of the power output terminals via a data connection, and the current supply arrangement can further be adapted to adjust different characteristics of the respective AC voltage power. Thus, one current supply arrangement can provide AC voltage generator stages for each plasma generator, which can result in considerable cost savings.

[0021] In one embodiment, one or more switching units may be arranged outside the current supply arrangement, and the current supply arrangement may be adapted to control, via a data connection, the switching units to inject the AC voltage power generated by the AC voltage generator stages into respective ones of the power output terminals, whereby different characteristics of the respective AC voltage power can be adjusted. Thus, one current supply arrangement can provide AC voltage generator stages for individual plasma generators. This significantly reduces costs and is also highly flexible in adapting to the corresponding applications.

[0022] Between the impedance matching device and the current supply arrangement, a connecting line for transmitting AC voltage power, having a length of at least 1 m, in particular at least 3 m, can be arranged, which makes the use of the current supply arrangement particularly flexible and therefore cost-effective.

[0023] In one aspect, the current supply configuration can be designed so that the sum of the rated powers of all AC voltage powers that can be delivered, particularly output, to the load is greater than the rated power of the AC voltage generator stage. Thus, an AC voltage generator stage with a relatively low rated power can be used to power multiple plasma generators, all of which individually do not require a rated power greater than the rated power that the AC voltage generator stage can provide, but at the same time, all of which add up to a significantly higher rated power. This works because the plasma generators can be powered sequentially in time, i.e., not all at the same time.

[0024] In one aspect, the current supply arrangement may be adapted to output different drive signals for a plurality of impedance matching devices assigned to respective ones of the AC voltage power.

[0025] In one embodiment, the current supply arrangement may be adapted to receive one and / or several plasma signals, in particular one and / or several plasma voltages, transmitted from one of the plasma generators. By plasma signal, we mean a signal that is determined, i.e., measured, in or in the immediate vicinity of the generated plasma. This may be, for example, a signal measured on the winding side of an excitation transformer where the plasma is excited. It may also be a measured optical signal, an electromagnetic wave in the invisible range, such as the UV or X-ray range, an electric or magnetic field, a noise signal, a vibration signal, or an ultrasonic signal. Particularly preferred is a plasma voltage, in particular measurable on the winding side of an excitation transformer.

[0026] In one aspect, the current supply arrangement may be adapted to assign one or more of the transmitted plasma signals to the characteristics of the AC voltage power, and in particular to adjust the characteristics of the AC voltage power depending on the respective plasma signal, so that all plasma generators can be individually controlled very accurately and reliably by the current supply arrangement.

[0027] In one aspect, the current supply arrangement may be adapted to receive one and / or several voltages and / or current intensities transmitted from a current and / or voltage measuring sensor arranged and adapted to measure the current and / or voltage of the AC voltage power. In particular, the current supply arrangement may further be adapted to assign one or several of the transmitted voltages and / or current intensities to the characteristics of the AC voltage power, in particular to adjust the characteristics of the AC voltage power depending on the respective voltage and / or current intensity. This allows all plasma generators to be individually controlled very accurately and reliably by the current supply arrangement.

[0028] In one aspect, the current supply arrangement can be adapted to receive one and / or more voltages and / or current intensities transmitted from a current and / or voltage measuring sensor arranged and adapted to measure the current and / or voltage in or at the impedance matching device. In particular, here, the current supply arrangement can be further adapted to assign one or more of the transmitted voltages and / or current intensities to the characteristics of the AC voltage power, in particular to adjust the characteristics of the AC voltage power depending on the respective voltage and / or current intensity. This allows all plasma generators to be individually controlled very accurately and reliably by the current supply arrangement.

[0029] In one aspect, the control mechanism can be integrated into the current supply arrangement, which allows for further cost savings and allows all plasma generators to be individually controlled by the current supply arrangement very accurately and reliably.

[0030] In one aspect, the plasma generating device comprises: a) the current supply configuration described above; b) a current supply arrangement, in particular a plurality of plasma generators connected to its power output terminals, each of which can be operated according to a control value characteristic; It can be equipped with:

[0031] In one embodiment, the plasma generating device includes a first transformer arrangement for coupling AC voltage power to a load, particularly one transformer arrangement for each plasma generator, preferably located in close proximity to the load. This allows for further cost savings and allows all plasma generators to be individually controlled by a current supply arrangement with high accuracy and reliability. Here, the transformer arrangement is an electrically inductive component that includes a first winding and a second winding and can transfer AC power applied to the first winding (primary winding) to the second winding (secondary winding). Such a transformer arrangement has many different construction options, for example, the windings can be wound on a magnetic core or arranged planarly on a circuit board, or both construction styles can be combined, and other variations are also possible. A possible second "winding" can be, for example, the generated plasma itself. An example of such a transformer arrangement is disclosed, for example, in U.S. Pat. No. 6,445,393, as "Transformer 35."

[0032] In one embodiment, the plasma generator comprises an impedance matching device, in particular a plurality of impedance matching devices, preferably one impedance matching device each arranged between the current supply arrangement and the plasma generators, which allows further cost savings and thus allows all plasma generators to be controlled individually by the current supply arrangement very accurately and reliably.

[0033] In one embodiment, the plasma generator can comprise a connection line between the impedance matching device and the current supply arrangement having a length of 1 m or more, in particular 3 m or more, which makes the plasma generator particularly flexible to use.

[0034] In one aspect, the plasma generating device can use a plasma generator for post-treating gases exiting the plasma processing device. In one aspect, the plasma generating device can use a plasma generator for pre-treating gases introduced into the plasma processing device. In particular, the plasma generating device can include both plasma generators.

[0035] In one aspect, the impedance matching device comprises: a) inductance, b) Capacitance where the inductance and / or capacitance may be adjustable and controlled by signals connected to the data terminals. This allows for further cost savings and thus allows all plasma generators to be individually controlled very accurately and reliably by the current supply arrangement.

[0036] In one embodiment, one or more of the plasma generators can be designed to excite gas into gas plasma at a location remote from the plasma processing location and thus advantageously used as a so-called remote plasma source.

[0037] In one aspect, a method for controlling a plurality of plasma processes, each specifically designed to excite a gas into a gas plasma at a location remote from a plasma processing location, is provided, comprising: a) providing a supply power to a current supply arrangement; b) converting the supply power into a first AC voltage power and delivering the first AC voltage power to a first load of the first plasma generator; c) converting the supply power into a second AC voltage power and delivering the second AC voltage power to a second load in a second plasma generator; In particular, steps b) and c) are not performed simultaneously; d) Output current, Output voltage, Output frequency, Output power, current and / or voltage output profiles, controlling the AC voltage power according to various characteristics with one or more control values ​​of e) generating and outputting a control signal for an impedance matching device assigned to one of the AC voltage powers; A method may be provided that includes:

[0038] Thus, multiple plasma processes or multiple plasma generators can be operated with one current supply configuration, which increases reliability and significantly reduces costs. By providing one or more control signals for the impedance matching devices assigned to the plasma generators, these control signals can be individually tailored to the respective AC voltage power of each plasma generator. All of the features of the device described above can significantly develop the method.

[0039] In one aspect, the method can deliver multiple AC voltage powers to respective ones of the loads of an associated plasma generator, the delivery of the AC voltage powers to the loads not occurring simultaneously, and each load being operated with a control characteristic associated therewith, in particular generating and outputting multiple control signals for an impedance matching device assigned to one of the AC voltage powers.

[0040] In one aspect, the first and / or second AC voltage power may each be transmitted via a connecting line having a length of 1 m or more, in particular 3 m or more, which makes the method particularly flexible and therefore cost-effective.

[0041] In one aspect, a computer program product may be provided for controlling the current supply arrangements described above, particularly with respect to features g) and f) and / or with respect to method steps d) and e).

[0042] In one aspect, a non-volatile storage medium can be provided having stored thereon instructions for execution by a processor or for configuring a programmable logic device to perform the control of the current supply arrangements described above, particularly for features g) and f) and / or with respect to method steps d) and e).

[0043] Further features and advantages of the present invention will become apparent from the following detailed description of exemplary embodiments of the invention, which refers to the figures of the drawings showing the essential details of the invention, and from the claims. The features shown therein are not necessarily to scale, but are illustrated so that the characteristics according to the invention can be clearly seen. In variants of the invention, the various features can be realized individually or together in any combination.

[0044] Exemplary embodiments of the invention are shown in the schematic drawings and explained in the following description. [Brief explanation of the drawings]

[0045] [Figure 1] FIG. 2 shows a first plasma generation device having a first current supply configuration. [Figure 2] FIG. 10 shows a second plasma generating device with a second current supply configuration. [Figure 3] FIG. 4 is a timing diagram of the output power at the first power output terminal. [Figure 4] FIG. 10 is a timing diagram of the output power at the second power output terminal. [Figure 5] FIG. 1 illustrates a rectifier bridge circuit. [Figure 6] FIG. 1 illustrates a bipolar power conversion bridge. [Figure 7] FIG. 1 illustrates a first embodiment of a switching unit. [Figure 8] FIG. 2 illustrates a second embodiment of a switching unit. [Figure 9] 1 is a flow diagram of a method procedure. DETAILED DESCRIPTION OF THE INVENTION

[0046] 1 shows a first plasma generation device 1 comprising a first current supply arrangement 10 and, by way of example, three plasma generators 17a, 17b, ..., 17n. The plasma generation units 17a, 17b, ..., 17n comprise respective loads 9a, 9b, ..., 9n, which are connected to power output terminals 3a, 3b, ..., 3n via respective impedance matching devices 15a, 15b, ..., 15n.

[0047] For clarity, only three plasma generation units 17a, 17b, ..., 17n are shown, each equipped with one impedance matching device 15a, 15b, ..., 15n. Of course, there may be four or more such devices. This is indicated, for example, by the ellipses between the power output terminals 3b and 3n. The power output terminals 3a, 3b, ..., 3n each have measurement sensors CT1a, CT1b, ..., CT1n, for example, for measuring current and / or voltage. The signals determined therein are transmitted via a data bus 16 to a data connection 13 connected to the control mechanism 4. There may also be measurement sensors for frequency, phase, and power, in particular forward and / or reflected power.

[0048] The loads 9a, 9b, ..., 9n are in particular so-called "remote plasma sources" (RPS) here. These are special plasma generators 17a, 17b, ..., 17n adapted to excite gas into a gas plasma at a location remote from the plasma processing location. Transformer arrangements T1a, T1b, ..., T1n are advantageously used for this type of plasma excitation. On the secondary side of these transformer arrangements facing the plasma, multiple plasma signals CT4a, CT4b, ..., CT4n, in particular one and / or multiple plasma voltages, can be detected. These can also be transmitted to the data connection 13 via the data bus 16.

[0049] At least one plasma generator 17a is connected via an impedance matching device 15a to a power output terminal 3a of the current supply arrangement 10. In the exemplary embodiment, all plasma generators 17a, 17b, ..., 17n are connected to one power output terminal 3a, 3b, ..., 3n of the current supply arrangement 10 via one impedance matching device 15a, 15b, ..., 15n, respectively.

[0050] The impedance matching devices 15a, 15b, ..., 15n comprise, for example, a plurality of switchable inductances L1a, L2a, L3a, L1b, L2b, L3b, ..., L1n, L2n, L3n. These are switchably arranged in parallel with the connecting lines between the plasma generators 17a, 17b, ..., 17n and the power output terminals 3a, 3b, ..., 3n of the current supply arrangement 10. This allows for very rapid, stepwise impedance matching. The currents through these inductances L1a, L2a, L3a, L1b, L2b, L3b, ..., L1n, L2n, L3n can be determined using measurement sensors CT2a, CT2b, ..., CT2n. These determined signals can also be transmitted to the data bus 16.

[0051] The impedance matching devices 15a, 15b, ..., 15n each have, for example, a capacitance C1a, C1b, ..., C1n, which may in particular be an adjustable capacitance, for example by means of an adjustable vacuum capacitor. As shown here, the capacitances can be arranged in series between the plasma generators 17a, 17b, ..., 17n and the power output terminals 3a, 3b, ..., 3n of the current supply arrangement 10. This allows for very reliable impedance matching.

[0052] Similarly, as shown here, further inductances L4a, L4b, ..., L4n may be provided in series between the plasma generators 17a, 17b, ..., 17n and the power output terminals 3a, 3b, ..., 3n of the current supply arrangement 10. This may be realized at least in part by the leakage inductance of the transformer arrangements T1a, T1b, ..., T1n.

[0053] At the output of or within the impedance matching devices 15a, 15b, ..., 15n, further measurement sensors CT4a, CT4b, ..., CT4n suitable for detecting current, voltage, phase, impedance and / or power may be provided, and these detected signals may likewise be fed to the data bus 16.

[0054] The current supply arrangement 10 comprises a power input terminal 2 for connection to a power supply source 7 .

[0055] The current supply arrangement 10 further comprises a first power converter stage 5 configured to convert the input power at the power input terminals 2 into intermediate power, preferably DC intermediate circuit power 12. A plurality of first power converter stages 5 for converting the input power at the power input terminals 2 into intermediate power, preferably intermediate circuit power 12, may also be part of the current supply arrangement 10 and may preferably be connected in parallel.

[0056] The current supply arrangement 10 in particular further comprises an AC voltage generator stage 6 connected downstream of the first power converter stage 5 and configured to convert intermediate power from the first power converter stage into a bipolar output power.

[0057] Between the power converter stage 5 and the further AC voltage generator stage 6, energy storage elements such as, for example, inductances or capacitors can be implemented, in particular for current or voltage smoothing.

[0058] The current supply arrangement 10 further comprises a number of switching units 8a, 8b, ..., 8n, here for example arranged between the AC voltage generator stage 6 and the power output terminals 3a, 3b, ..., 3n.

[0059] The switching unit or units can also be arranged (not shown) outside the current supply arrangement 10, in particular near, immediately before or after, or inside one of the impedance matching devices 15a, 15b, ..., 15n. Control of the switching units is also possible outside the current supply arrangement 10, since the data bus 16 has a connection in any case external to the current supply arrangement 10.

[0060] The current supply arrangement 10 further includes a control mechanism 4 configured to adjust the current supply arrangement 10 to deliver bipolar output power to the power output terminals 3 a, 3 b, ..., 3 n using at least one control parameter of power, voltage, current, excitation frequency, or threshold for protective measures, wherein at least one of the control parameters at a first power output terminal 3 a is different from a corresponding control parameter at another power output terminal 3 b, ..., 3 n.

[0061] In this example, the control mechanism 4 has connections to the power converter stage 5 and to the switching units 8a, 8b, ..., 8n. Some of these connections, for example the connection to the power converter stage 5, may be optional. The control mechanism 4 may be configured to switch the switching units 8a, 8b, ..., 8n from a closed state to an open state only when the absolute value of the current through the switch is less than 1 ampere, preferably zero. This has the advantage that switching units 8a, 8b, ..., 8n may be used that do not need to be designed to switch higher currents, making the device even cheaper.

[0062] The plasma generating device 1 may include a control mechanism external to the current supply arrangement 10. This external control mechanism may also control the plasma process in the loads 9a, 9b, ..., 9n.

[0063] The control mechanism 4 may also be configured to switch the switching units 8a, 8b, ..., 8n from an open state to a closed state only if the absolute value of the voltage across the open switch is less than 20 volts, preferably zero. This has the advantage that switching units can be used that do not need to be designed to switch higher voltages, making the device even cheaper.

[0064] The current supply arrangement 10 is capable of converting input power into bipolar output power and delivering this output power to at least two independent loads 9a, 9b, ..., 9n, the current supply arrangement comprising: a power input terminal 2 for connection to a power supply 7; at least two, preferably three or more, power output terminals 3a, 3b, ..., 3n for connection to one of the loads 9a, 9b, ..., 9n, respectively; a control mechanism 4 configured to control the current supply arrangement to deliver a bipolar output power to the power output terminals using at least one control parameter of power, voltage, current, excitation frequency, or thresholds for protective measures by obtaining a complete set of target values ​​for parameters of the power output terminals; Including, The control mechanism 4 is further designed to, in particular, calculate whether the current supply configuration is capable of delivering each target value to each power output terminal, and if so, calculate a sequence of pulses for delivering power to the power output terminals to provide power for the plasma process.

[0065] In a further aspect, the control mechanism 4 may be configured to control the current supply arrangement 10 such that at least one of the control parameters at a first power output terminal 3 a, 3 b, ..., 3 n is not equal to a corresponding control parameter at another power output terminal, thereby allowing the use of a single current supply arrangement with a given maximum power instead of multiple current supply arrangements.

[0066] In the present disclosure, bipolar output power means an output power having an alternating current, where the current changes direction at a frequency capable of exciting a plasma process (excitation frequency). The control parameters may be measured values ​​or target values ​​of the above parameters.

[0067] The measured and target values ​​may be absolute values, instantaneous values, effective values ​​such as RMS (root mean square) values, or extreme values ​​(eg maximum or minimum values).

[0068] The input power can be power delivered from an AC power grid or it can be a DC power line (AC: Alternating Current, DC: Direct Current).

[0069] The control mechanism 4 may consist of a microcontroller on which a software program runs when the current supply arrangement is operating. The control mechanism 4 may have multiple interfaces, for example, data connections to external components, monitors, keyboards, which may be connected by wire or wirelessly.

[0070] The control mechanism may have a computational part and a memory part, which may be subdivided for various purposes, for example monitor memory, RAM, data memory, program memory, etc.

[0071] The threshold may be a value used to recognize plasma ignition or breakdown, and may be set differently for each output port and may vary over time.

[0072] The bipolar output power may be at power values ​​above 1 kW, preferably above 10 kW.

[0073] The bipolar output power may have a frequency above 1 kHz, preferably above 10 kHz, preferably above 50 kHz.

[0074] In a further aspect, the current supply arrangement 10 may include a power converter stage 5 configured to convert the input power into intermediate power, preferably DC intermediate circuit power.

[0075] In a further aspect, the current supply arrangement may include at least one AC voltage generator stage 6 configured to convert intermediate power from the first power converter stage 5 into a bipolar output power.

[0076] In a further aspect, the current supply arrangement 10 may include at least two further AC voltage generator stages 6 a, 6 b, ..., 6 n configured to convert the intermediate power from the first power converter stage 5 into a plurality of bipolar output power signals and deliver these powers to the power output terminals.

[0077] In a further aspect, the control mechanism 4 may be configured to control the power converter stage 5 and / or the AC voltage generator stages 6, 6a, 6b, ..., 6n such that, in use, the current supply arrangement 10 delivers a first power output signal at a first time point and for a first time frame, in particular at the first power output terminals, and delivers a second power output signal at a second time point and for a second time frame, in particular at the second power output terminals, wherein the first time point is different from the second time point and / or the first time frame is different from the second time frame.

[0078] In a further aspect, the current supply arrangement may include one or more switching units 8a, 8b, ..., 8n between the power converter stages and the power output terminals 3a, 3b, ..., 3n.

[0079] In a further embodiment, the switching units 8a, 8b, . . . , 8n are controlled by a control mechanism 4.

[0080] In a further aspect, the control mechanism 4 may be configured to control the power converter stage 5, and / or the AC voltage generator stages 6, 6a, 6b, ..., 6n, and / or the switching units 8a, 8b, ..., 8n, such that, in use, the current supply arrangement delivers a first output power signal at the first power output terminals at a first time point and for a first time frame, and delivers a second power signal at the second power output terminals at a second time point and for a second time frame, wherein the first time point is different from the second time point and / or the first time frame is different from the second time frame.

[0081] In a further embodiment, the switching units 8a, 8b, . . . , 8n are configured to be able to conduct current in two opposite directions.

[0082] In a further embodiment, the control mechanism 4 may be configured to switch the switching units 8a, 8b, ..., 8n from the closed state to the open state only when the value of the current through the switch is less than 1 ampere, preferably zero.

[0083] In a further embodiment, the control mechanism 4 may be configured to actuate the switching unit from the open state to the closed state only if the value of the voltage across the open switch is less than 20 volts, preferably zero.

[0084] In a further embodiment, at least one of the power converter stage 5 and / or the AC voltage generator stages 6, 6a, 6b, . . . , 6n comprises a bridge circuit, preferably a full bridge circuit.

[0085] The bridge circuit may be a rectifier bridge circuit capable of rectifying AC power.

[0086] The bridge circuit may be a switching bridge circuit that produces bipolar output power.

[0087] In a further embodiment, the current supply arrangement 10 can include a housing that encloses all other components of the unit.

[0088] In a further aspect, the input terminals may be connected directly to the control board.

[0089] In a further embodiment, the power output terminals 3a, 3b, . . . , 3n may be directly connected to the housing.

[0090] In a further aspect, the plasma processing apparatus 1 includes: two, preferably three or more loads 9a, 9b, ..., 9n; - an electrical current supply arrangement 10 as described above; may include:

[0091] Each load 9a, 9b, ..., 9n may be connected to one of the power output terminals 3a, 3b, ..., 3n of the current supply arrangement.

[0092] The problem of the present invention is also solved by a control mechanism 4 for controlling multiple plasma processes on multiple loads by converting input power into bipolar output power and delivering this output power to the loads, wherein the control mechanism is designed to control a current supply arrangement to deliver the bipolar output power to the power output sections using at least one control parameter of power, voltage, current, excitation frequency, or threshold value for protective measures by obtaining a complete set of target values ​​for parameters of the power output terminals, wherein the control mechanism is further designed to calculate whether the current supply arrangement can deliver each target value to each power output terminal, and if so, calculate a sequence of pulses to deliver power to the power output terminals to provide power for the plasma processes.

[0093] In a further embodiment of the control mechanism 4, the complete set of target values ​​may be provided by an interface connection from a control mechanism that is preferably external to the current supply arrangement, the external control mechanism also controlling the plasma process in the plasma chamber.

[0094] In a further embodiment of the control mechanism 4, the calculation may involve determining a maximum target power at all times and comparing it with the maximum power of the current supply configuration.

[0095] In a further embodiment of the control mechanism 4, an error message can be given if the calculations indicate that delivery of the target amount of power to each power output terminal is not possible.

[0096] In a further embodiment of the control mechanism 4, if the calculations show that the target value of power delivery to each power output terminal is not possible, one or more possibilities may be provided to modify the process using a new set of target values.

[0097] In a further embodiment of the control mechanism 4, the control mechanism is capable of controlling the current supply configuration such that at least one control parameter of a first plasma chamber is not equal to a corresponding control parameter of another plasma chamber.

[0098] The plasma processes at the different loads 9a, 9b, ..., 9n may be different or the same, or they may be the same but in different states, i.e., the plasma process at a first load may be in, for example, a first gas excitation state, while the plasma process at another load may initially be in a gas transformation state.

[0099] The switching units 8a, 8b, ..., 8n can use bipolar transistors 81, 82, 91, 92 as shown in Figures 7 and 8. These bipolar transistors are much cheaper than MOSFETs. The bipolar transistors 81, 82, 91, 92 can be IGBTs, which are cost-effective transistors that conduct high currents with low energy losses. This makes the current supply arrangement 10 even cheaper, as expensive cooling devices are not required.

[0100] In Figures 7 and 8, additional diodes 83, 84, 93, 94 are connected to allow current to flow in the desired direction and block current in the undesired direction.

[0101] The power converter stage 5 may include a rectifier circuit, preferably a rectifier bridge circuit 50 as shown in Figure 5. Four rectifier diodes 52, 53, 54, 55 are connected to form a bridge circuit to rectify the AC current from a first terminal 51 to a second terminal 56. At least one of a filter, an overvoltage protection circuit, and an overcurrent protection circuit may additionally be connected to the first terminal 51. The filter may consist of one or more energy storage elements such as a capacitor or an inductance.

[0102] The AC voltage generator stage 6 can include a switching bridge, preferably a full-bridge circuit 60 as shown in FIG. 6. This full-bridge circuit 60 includes four switching units 62, 63, 64, 65. These switching units can be transistors, bipolar transistors, IGBTs, and particularly preferably MOSFETs. At the input of the second AC voltage generator stage 6, a filter circuit can be located, which includes one or more energy storage elements, such as a capacitor 61 and / or inductances 66, 67. The full-bridge circuit 60 can further include several diodes, as shown.

[0103] The current supply arrangement 10 may include a housing that encloses all other components of the current supply arrangement 10. The housing may be made of metal and therefore provide excellent protection against electromagnetic interference. The power input terminals 2 may be directly connected to the housing. The power output terminals 3a, 3b, ..., 3n may likewise be directly connected to the housing 10.

[0104] In the current supply arrangement 10, the combined current carrying capability of all switching units 8a, 8b, . . . , 8n may be higher than the maximum current delivery capability of the power converter stage 5.

[0105] FIG. 2 shows a second plasma generator 1′ having a second current supply arrangement 10′. The second current supply arrangement 10′ is an alternative to the first current supply arrangement 10 shown in FIG. 1. All elements corresponding to those in FIG. 1 are given the same reference numerals. The current supply arrangement 10′ shown in FIG. 2 includes multiple power converter stages 6a, 6b, ..., 6n instead of the switching units 8a, 8b, ..., 8n. The power converter stages 6a, 6b, ..., 6n are configured to convert DC intermediate power 12 from the first power converter stage 5 into multiple bipolar output power signals and deliver these powers to the power output terminals 3a, 3b, ..., 3n. All power converter stages 6a, 6b, ..., 6n are controllable by the control mechanism 4. All power converter stages 6a, 6b, ..., 6n may comprise a full bridge 60 and filter elements 61, 66, 67, as shown in FIG. 6.

[0106] To the power output terminals 3a, 3b, ..., 3n measurement sensors CT1a, CT1b, ..., CT1n for detecting voltage, current, frequency or power can be connected. The current supply arrangement 10' also comprises a number of power converter stages 5, which are preferably connected in parallel and are configured to convert the input power at the power input terminals 2 into intermediate power, preferably DC intermediate circuit power 12.

[0107] The connecting lines for transmitting AC voltage power between the current supply arrangement 10′ and one or more impedance matching devices 15a, 15b, ..., 15n can have a length of 1 m or more, in particular a length of 3 m or more. These cables can in particular have a given impedance, which is preferably a real impedance without an imaginary part, in particular in the range of 45 to 80 Ω. In such cases, the one or more impedance matching devices 15a, 15b, ..., 15n and the control signals therefor are particularly useful.

[0108] FIG. 3 shows a timing diagram of the output power at the first power output terminal 3a. The axis t is the time axis, and the axis S30 can be, for example, a voltage axis, a current axis, or a power axis. The axis S30 represents the actual values ​​of these parameters, and the axis S31 represents the effective values ​​of these parameters. In the first graph of FIG. 3 with the axis S30, a bipolar signal is shown with two signal sequences 31 and 32. The signal sequence 31 has an excitation frequency with a period of 2 / 11 of the time window, starts at time T31, and ends at time T32. The signal sequence 32 has an excitation frequency with a period of 2 / 11 of the time window, starts at time T33, and ends at time T34. In this example, these frequencies are the same, but these frequencies could also be different. In the second graph of FIG. 3 with the axis S31, the effective values ​​of the two signal sequences 31 and 32 are shown with two signal sequences 33 and 34. Two threshold lines 35 and 36 are also shown on this graph. These can be used to recognize a plasma breakdown, e.g., arcing or ignition of the plasma, when the effective value of one of the parameters power, voltage or current exceeds such a threshold.

[0109] In the current supply configuration 10', the total current delivery capability of all power converter stages 6a, 6b, . . . , 6n may be higher than the total maximum current delivery capability of all power converter stages 5.

[0110] FIG. 4 shows a timing diagram of the output power at the other power output terminals 3b, ..., 3n. Axis t is the time axis, and axis S40 can be, for example, a voltage axis, a current axis, or a power axis. Axis S40 represents the actual values ​​of these parameters, and axis S41 represents the effective values ​​of these parameters. In the first graph of FIG. 4 with axis S40, a bipolar signal is shown with two signal sequences 41, 42. Signal sequence 41 has an excitation frequency with a period of 1 / 7 of the time window and begins at time T41 and ends at time T42. A second pulse 44 begins at time T43, the end of which is not visible in this graph. At time T43, the second signal sequence 42 begins. From this example, it can be seen that the frequencies of signal sequences 31, 32 and signal sequences 41, 42 are different, with the frequency of signal sequences 41, 42 being higher than the frequency of signal sequences 31, 32.

[0111] In addition to or instead of excitation with different frequencies, the power, voltage, current or thresholds for protection measures may be different between two different power output terminals 3a, 3b, ..., 3n or at two different loads 9a, 9b, ..., 9n.

[0112] The graph also shows two threshold lines 45, 46 that can be used to recognize a plasma breakdown, e.g., arcing or ignition of the plasma, when the effective value of one of the parameters power, voltage or current exceeds such threshold.

[0113] The present invention operates to control multiple plasma processes at multiple loads 9a, 9b, ..., 9n using a control mechanism 4 by converting input power into bipolar output power and delivering this output power to the loads 9a, 9b, ..., 9n as shown by signal sequences 31, 32, 41, 42. The control mechanism 4 controls the current supply arrangements 10, 10' to deliver the bipolar output power to the power output terminals 3a, 3b, ..., 3n using at least one control parameter of power, voltage, current, excitation frequency, or threshold for protective measures by obtaining a complete set of target values ​​for the parameters of the power output terminals 3a, 3b, ..., 3n, and the control mechanism 4 is further designed to calculate whether the current supply arrangements 10, 10' can deliver each target value to each power output terminal 3a, 3b, ..., 3n, and if so, calculate a pulse sequence for delivering power to the power output terminals 3a, 3b, ..., 3n to provide power for the plasma processes.

[0114] To this end, the control mechanism 4 can control the power converter stages 6, 6a, 6b, ..., 6n or switching units 8a, 8b, ..., 8n so that the unit 1, in operation, delivers a first output power signal to the first power output terminal 3a at a first point in time T31 over a first time period T31-T32, and delivers a second power signal to the second power output terminals 3b, ..., 3n at a second point in time T41 over a second time period T41-T42, wherein the first point in time T31, T41 is different from the second point in time T32, T42 and / or the first time period T31-T32 is different from the second time period T41-T42.

[0115] The plasma generator 1 in FIG. 1 and the plasma generator 1′ in FIG. 2 impose limitations on the simultaneous operation of multiple power output terminals 3 a, 3 b, ..., 3 n. In the case of the plasma generator 1′ in FIG. 2, these limitations arise, for example, when the total power or processing capacity of the output stages connected to the input stage exceeds the power or instantaneous capacity of this input stage, making it impossible to provide maximum output power simultaneously at all power output terminals 3 a, 3 b, ..., 3 n. In the case of the plasma generator in FIG. 1, the maximum output power can be provided to only one power output terminal 3 a, 3 b, ..., 3 n, or a portion of the power can be provided to multiple power output terminals 3 a, 3 b, ..., 3 n. If independent operation of different plasma processes is required, this can be achieved as long as the total duty cycle of all processes plus the time for switching between outputs is shorter than the total cycle time.

[0116] These limits define the ranges within the above parameters where operation is possible and where operation is not possible. For each request to provide power at the output or at a set of power output terminals 3a, 3b, ..., 3n when sourcing current, it is necessary to determine whether the conditions are within or outside the range of operation. As a result, sequencing is required.

[0117] The sequence control 14 may be part of the control mechanism 4. An algorithm in the sequence control 14 determines, for each request to the current supply arrangement 1 or for a request to change one or more parameters, whether the request is within the possible operating range and the output power to be delivered for each power output terminal. For the process shown in Figures 3 and 4, where power is delivered to the power output terminals 3a, 3b, ..., 3n and different power output terminals 3a, 3b, ..., 3n are operated at different powers, different pulse duty cycles or different pulse frequencies, the sequence control ensures that: - To avoid pulse overlap, the pulse frequencies are integer multiples of each other (as in the case of the plasma device 1' in Figure 2). When the pulses overlap, the total power and current required does not exceed the maximum possible values ​​(in the case of the plasma device 1' in FIG. 2). If the maximum possible value for a limited period within a cycle is exceeded, a pattern is found that does not include this exceedance (as in the case of the plasma device 1' in FIG. 2). The sum of the pulses and the time for switching between outputs at some point is less than the minimum pulse cycle frequency (as in the case of the plasma device 1 in FIG. 1). - The newly requested power pulse pattern at a particular power is activated at the appropriate time to fit into the existing pulse patterns of the other powers (in the case of plasma device 1 in Figure 1). - Total average power and current limits are not exceeded. If the requested sequence is outside the range of possibilities, a warning is issued to the user. -Possible correction sequences are recommended to the user.

[0118] A flow chart of the method steps is shown in Figure 9. This method can be characterized in particular by its suitability for controlling a plurality of plasma processes, each of which is designed to excite a gas into a gas plasma at a location remote from the plasma processing location, i.e., a plurality of so-called "remote plasma sources" RPS, and includes the following steps: Step 71: Supply power to the current supply arrangement 10. Step 72: Convert the supply power into a first AC voltage power, and deliver the first AC voltage power to the first load 9a of the first plasma generator 17a. Step 73: Convert the supply power into a second AC voltage power, and deliver the second AC voltage power to the second load 9b of the second plasma generator 17b, where step 73 and step 72 are not performed simultaneously. Step 74: Output current, Output voltage, Output frequency, Output power, Current and / or voltage output profile and controlling the AC voltage power according to various characteristics with one or more control values ​​of Step 75: Generate and output a control signal for the impedance matching device 15a, 15b, . . . , 15n assigned to one of the AC voltage powers. [Explanation of symbols]

[0119] 1. Plasma generator 2 Power input terminal 3a, 3b,…, 3n Power output terminals 4 Control Mechanism 5 Power Converter Stages 6 AC voltage generator stages 7 Power supply source 8a, 8b, ..., 8n switching units 9a, 9b, …, 9n load 10 Current supply configuration 13 Data Connection 15a, 15b, ..., 15n impedance matching devices 17a, 17b, ..., 17n Plasma generator CT1a, CT1b, ..., CT1n current and / or voltage measurement sensors CT2a, CT2b, ..., CT2n current and / or voltage measurement sensors CT3a, CT3b, ..., CT3n current and / or voltage measurement sensors CT4a, CT4b, ..., CT4n plasma signals T1a, T1b, …, T1n transformer configurations

Claims

1. A current supply arrangement (10) for a plurality of plasma generators (17a, 17b, ..., 17n), each designed to excite a gas into a gas plasma at a location remote from a plasma processing location, comprising: a) a power input terminal (2) for connection to a power supply source (7); b) a data connection (13) for connecting to the control mechanism (4); Equipped with c) the current supply arrangement (10) is designed to convert the power from the power input terminals (2) into AC voltage power in an AC voltage generator stage (6); d) said current supply arrangement (10) via said data connection (13): adapted to ensure that the AC voltage power can be delivered as a first AC voltage power to a first load (9a) and as a second AC voltage power to a second load (9b) located remotely from the first load, the two loads not being powered simultaneously; and The first AC voltage power and the second AC voltage power are output current, output voltage, Output frequency, output power, Current and / or voltage output profile and adapted to be controllable so as to be able to have different characteristics at at least one or more control values ​​of e) the current supply arrangement (10) is adapted to output a control signal for an impedance matching device (15a, 15b, ..., 15n) assigned to one of the AC voltage powers; f) designed so that the sum of all rated powers of all AC voltage powers deliverable to said loads (9a, 9b, ..., 9n) is greater than the rated power of said AC voltage generator stage (6); Current supply arrangement (10).

2. a) a first power output terminal (3a) for delivering said first AC voltage power to said first load (9a); b) second power output terminals (3b) for delivering said second AC voltage power to said second load (9b) located remotely from said first load; The current supply arrangement (10) of claim 1, comprising:

3. A current supply configuration (10) as described in claim 1 or 2, further comprising switching units (8a, 8b) which are part of the current supply configuration (10), and which are adapted to ensure that the switching units (8a, 8b) can inject the AC voltage power generated by the AC voltage generator stage (6) into each of the power output terminals (3a, 3b) and / or loads (9a / 9b) via the data connection (13), and in so doing are adapted to adjust the different characteristics of each AC voltage power.

4. 3. A current supply arrangement (10) according to claim 1 or 2, adapted to output different control signals for a plurality of impedance matching devices (15a, 15b) assigned to each one of said AC voltage powers.

5. 3. The current supply arrangement (10) according to claim 1 or 2, adapted to receive one and / or more plasma signals (CT4a, CT4b, ..., CT4n) transmitted from one of the plasma generators (17a, 17b, ..., 17n).

6. 3. The current supply arrangement (10) according to claim 1 or 2, adapted to assign one or more of the transmitted plasma signals (CT4a, CT4b, ..., CT4n) to the characteristics of the AC voltage power and to adjust the characteristics of the AC voltage power in response to the respective plasma signal (CT4a, CT4b, ..., CT4n).

7. 3. A current supply arrangement (10) according to claim 1 or 2, adapted to receive one and / or several voltage and / or current intensities transmitted from current and / or voltage measurement sensors (CT1a, CT1b, ..., CT1n) arranged and adapted to measure the current and / or voltage of the AC voltage power, wherein the current supply arrangement (10) is further adapted to adjust the characteristics of the AC voltage power depending on the respective voltage and / or current intensities so as to assign one or several of the transmitted voltages and / or current intensities to the characteristics of the AC voltage power.

8. 3. A current supply arrangement (10) according to claim 1 or 2, adapted to receive one and / or several voltages and / or current intensities transmitted from current and / or voltage measuring sensors (CT2a, CT2b, ..., CT2n, CT3a, CT3b, ..., CT3n) arranged and adapted to measure currents and / or voltages in or at impedance matching devices (15a, 15b, ..., 15n), wherein the current supply arrangement (10) is further adapted to adjust the characteristics of the alternating voltage power depending on the respective voltages and / or current intensities so as to assign one or several of the transmitted voltages and / or current intensities to the characteristics of the alternating voltage power.

9. 3. A current supply arrangement (10) according to claim 1 or 2, wherein the control mechanism (4) is integrated into the current supply arrangement (10).

10. a) a current supply arrangement (10) according to claim 1; b) a plurality of plasma generators (17a, 17b, ..., 17n) connected to said current supply arrangement (10) and each operable according to a control value characteristic; A plasma generating device (1) comprising:

11. 11. The plasma generation device (1) according to claim 10, further comprising one transformer arrangement (T1a, T1b, ..., T1n) for each plasma generator (17a, 17b, ..., 17n) for coupling the AC voltage power to the loads (9a, 9b, ..., 9n), the transformer arrangements (T1a, T1b, ..., T1n) being arranged in close proximity to the loads (9a, 9b, ..., 9n).

12. A plasma generating device (1) as described in claim 10 or 11, further comprising a plurality of impedance matching devices (15a, 15b, ..., 15n), one impedance matching device (15a, 15b, ..., 15n) each arranged between the current supply configuration (10) and the plasma generator (17a, 17b, ..., 17n).

13. 12. The plasma generation device (1) according to claim 10 or 11, wherein one or more of the plasma generators (17a, 17b, ..., 17n) (so-called remote plasma sources) are designed to excite gas into gas plasma at a location remote from the plasma treatment location.

14. 1. A method for controlling a plurality of plasma processes, each designed to excite a gas into a gas plasma at a location remote from a plasma processing location, comprising: a) supplying a supply power to a current supply arrangement (10); b) converting the supply power into a first AC voltage power and delivering the first AC voltage power to a first load (9a) of a first plasma generator (17a); c) converting the supply power into a second AC voltage power and delivering the second AC voltage power to a second load (9b) of a second plasma generator (17b), Steps b) and c) are not performed simultaneously; d) output current; output voltage, Output frequency, output power, current and / or voltage output profile; controlling the AC voltage power according to various characteristics with one or more control values ​​of e) generating and outputting a control signal for an impedance matching device (15a, 15b, ..., 15n) assigned to one of said AC voltage power sources; Including, f) A method of designing the AC voltage generator stages (6) so that the sum of all rated powers of all AC voltage powers deliverable to the loads (9a, 9b, ..., 9n) is greater than the rated power of the AC voltage generator stages (6).

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