Chamber apparatus, gas laser apparatus, and method for manufacturing electronic device

Abstract

A chamber device (CH) is provided with: a housing (30) enclosing a laser gas; a pair of discharge electrodes (32a, 32b) for causing light to be generated from the laser gas through application of voltage; windows (31a, 31b) which are arranged on a wall surface of the housing (30) and through which the light passes; a first fan (46) for causing the laser gas to flow between the pair of discharge electrodes (32a, 32b); filters (53a, 53b); and second fans (311, 321) that rotate along with the first fan (46) due to driving force from a drive source (46a) of the first fan (46). The chamber device (CH) is also provided with: fan-side flow paths (313, 323) through which laser gas to be filtered by the filters (53a, 53b) is made to flow by the second fans (311, 321), and which cause some of the laser gas to flow in a direction drawing away from the windows (31a, 31b); and window-side flow paths (315, 325) which communicate with the fan-side flow paths (313, 323) and which cause the laser gas flowing from the fan-side flow paths (313, 323) due to the second fans (311, 321) to flow to the window (31a, 31b) side.

Description

[Technical Field]

[0001] The present disclosure relates to a chamber apparatus, a gas laser apparatus, and a method for manufacturing an electronic device. [Background technology]

[0002] In recent years, semiconductor exposure devices have been required to improve their resolution in response to the miniaturization and high integration of semiconductor integrated circuits. To this end, the wavelength of light emitted from exposure light sources has been shortened. For example, KrF excimer laser devices, which output laser light with a wavelength of approximately 248 nm, and ArF excimer laser devices, which output laser light with a wavelength of approximately 193 nm, are used as gas laser devices for exposure.

[0003] The spectral linewidth of the spontaneously oscillating light of KrF excimer laser devices and ArF excimer laser devices is as wide as 350 pm to 400 pm. Therefore, if a projection lens is constructed using a material that transmits ultraviolet light, such as KrF and ArF laser light, chromatic aberration may occur. As a result, resolution may decrease. Therefore, it is necessary to narrow the spectral linewidth of the laser light output from the gas laser device to a level where chromatic aberration is negligible. Therefore, a line narrowing module (LNM) containing a line narrowing element (e.g., an etalon or a grating) may be installed inside the laser resonator of the gas laser device to narrow the spectral linewidth. Hereinafter, a gas laser device with a narrowed spectral linewidth is referred to as a line narrowing gas laser device. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 6-132582 [Patent Document 2] Japanese Patent Application Publication No. 6-152030 [Patent Document 3] Japanese Patent Application Publication No. 6-237029 [Patent Document 4] Summary of Special Publication No. 7-118556

[0005] A chamber device according to one aspect of the present disclosure may include a housing for sealing laser gas, a pair of discharge electrodes arranged opposite each other in the internal space of the housing and generating light from the laser gas when a voltage is applied, a window arranged on a wall of the housing and allowing light to pass through, a first fan arranged in the internal space and flowing the laser gas between the pair of discharge electrodes, a filter arranged in the internal space, a second fan that rotates together with the first fan by driving force from a driving source of the first fan, a fan-side flow path arranged in the internal space through which the laser gas filtered by the filter flows by the second fan and which flows a portion of the laser gas in a direction away from the window, and a window-side flow path arranged in the internal space, connected to the fan-side flow path, and which flows the laser gas flowed from the fan-side flow path by the second fan toward the window.

[0006] A gas laser device according to one aspect of the present disclosure includes a chamber device, and the chamber device may include a housing that seals laser gas, a pair of discharge electrodes that are arranged opposite each other in the internal space of the housing and that generate light from the laser gas when a voltage is applied, a window that is arranged on a wall surface of the housing and that allows light to pass through, a first fan that is arranged in the internal space and that causes the laser gas to flow between the pair of discharge electrodes, a filter that is arranged in the internal space, a second fan that rotates together with the first fan by driving force from a driving source of the first fan, a fan-side flow path that is arranged in the internal space and causes the laser gas filtered by the filter to flow by the second fan and that causes a portion of the laser gas to flow in a direction away from the window, and a window-side flow path that is arranged in the internal space and communicates with the fan-side flow path and causes the laser gas flowed from the fan-side flow path by the second fan to flow toward the window.

[0007] A method for manufacturing an electronic device according to one aspect of the present disclosure may include generating laser light using a gas laser apparatus including a chamber apparatus having: a housing for enclosing laser gas; a pair of discharge electrodes arranged opposite each other in the internal space of the housing and generating light from the laser gas when a voltage is applied; a window arranged on a wall of the housing and transmitting light; a first fan arranged in the internal space and flowing the laser gas between the pair of discharge electrodes; a filter arranged in the internal space and filtering the laser gas; a second fan rotated together with the first fan by driving force from a driving source of the first fan; the filter arranged in the internal space; the second fan rotated together with the first fan by driving force from a driving source of the first fan; a fan-side flow path provided in the internal space through which the laser gas filtered by the filter flows and which flows a portion of the laser gas in a direction away from the window; and a window-side flow path provided in the internal space, connected to the fan-side flow path, and which flows the laser gas flowed from the fan-side flow path by the second fan toward the window, the gas laser apparatus generating laser light, outputting the laser light to an exposure apparatus, and exposing a photosensitive substrate in the exposure apparatus to the laser light to manufacture an electronic device. [Brief explanation of the drawings]

[0008] Some embodiments of the present disclosure will now be described, by way of example only, with reference to the accompanying drawings, in which: [Figure 1] FIG. 1 is a schematic diagram showing an example of the overall configuration of an electronic device manufacturing apparatus. [Figure 2] FIG. 2 is a schematic diagram showing an example of the overall configuration of a gas laser device of a comparative example. [Figure 3] FIG. 3 is a view of the internal space of the housing of the chamber apparatus shown in FIG. 2, viewed from the insulating part side toward the cross-flow fan side. [Figure 4] FIG. 4 is a cross-sectional view of the chamber apparatus shown in FIG. 2 taken along a plane perpendicular to the direction in which the laser light travels. [Figure 5] FIG. 5 is a view of the internal space of the housing of the chamber apparatus of the first embodiment, viewed from the insulating part side toward the cross-flow fan side. [Figure 6]FIG. 6 is a perspective view of the partition wall and the front-side flow channel as seen from the internal space where the electrodes are arranged. [Figure 7] FIG. 7 is a perspective view of the partition wall and the front-side flow passage as seen from the internal space on the window side. [Figure 8] FIG. 8 is a view of the internal space of the housing of the chamber apparatus of the second embodiment, viewed from the insulating part side toward the cross-flow fan side. Embodiment

[0009] 1. Explanation of the electronic device manufacturing equipment used in the exposure process of electronic devices 2. Description of the gas laser device of the comparative example 2.1 Configuration 2.2 Operation 2.3 Challenges 3. Description of the chamber device of embodiment 1 3.1 Configuration 3.2 Operation 3.3 Actions and Effects 4. Description of the chamber device of the second embodiment 4.1 Configuration 4.2 Actions and Effects

[0010] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The embodiments described below are examples of the present disclosure and are not intended to limit the scope of the present disclosure. Furthermore, not all of the configurations and operations described in each embodiment are necessarily essential to the configurations and operations of the present disclosure. Identical components are designated by the same reference numerals, and redundant descriptions will be omitted.

[0011] 1. Explanation of the electronic device manufacturing equipment used in the exposure process of electronic devices FIG. 1 is a schematic diagram showing an example of the overall configuration of an electronic device manufacturing apparatus used in an exposure process for electronic devices. As shown in FIG. 1, the manufacturing apparatus used in the exposure process includes a gas laser apparatus 100 and an exposure apparatus 200. The exposure apparatus 200 includes an illumination optical system 210, which includes multiple mirrors 211, 212, and 213, and a projection optical system 220. The illumination optical system 210 illuminates a reticle pattern on a reticle stage RT with laser light incident from the gas laser apparatus 100. The projection optical system 220 reduces and projects the laser light transmitted through the reticle to form an image on a workpiece (not shown) placed on a workpiece table WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with photoresist. The exposure apparatus 200 synchronously translates the reticle stage RT and the workpiece table WT to expose the workpiece with laser light reflecting the reticle pattern. Semiconductor devices, which are electronic devices, can be manufactured by transferring a device pattern onto a semiconductor wafer using the exposure process described above.

[0012] 2. Description of the gas laser device of the comparative example 2.1 Configuration A comparative example of a gas laser device 100 will be described. Note that the comparative example of the present disclosure is a configuration that the applicant recognizes as being known only by the applicant, and is not a publicly known example that the applicant acknowledges.

[0013] FIG. 2 is a schematic diagram showing an example of the overall configuration of a gas laser apparatus 100 according to this embodiment. The gas laser apparatus 100 is, for example, an ArF excimer laser apparatus that uses a mixed gas containing argon (Ar), fluorine (F), and neon (Ne). In this case, the gas laser apparatus 100 outputs a pulsed laser beam having a center wavelength of approximately 193 nm. The gas laser apparatus 100 may be a gas laser apparatus other than an ArF excimer laser apparatus, such as a KrF excimer laser apparatus that uses a mixed gas containing krypton (Kr), F, and Ne. In this case, the gas laser apparatus 100 emits a pulsed laser beam having a center wavelength of approximately 248 nm. A mixed gas containing Ar, F, and Ne as a laser medium, or a mixed gas containing Kr, F, and Ne as a laser medium, may be referred to as a laser gas. Note that the mixed gas used in the ArF excimer laser apparatus and the KrF excimer laser apparatus may use helium (He) instead of Ne.

[0014] The gas laser device 100 of this example mainly comprises a housing 110, a laser oscillator 130 arranged in the internal space of the housing 110, a monitor module 150, a laser gas supply device (not shown), a laser gas exhaust device (not shown), and a laser processor 190.

[0015] The laser oscillator 130 includes a chamber device CH, a charger 141, a pulse power module 143, a rear mirror 145, and an output coupling mirror 147 as its main components.

[0016] Fig. 2 shows the internal configuration of the chamber apparatus CH as viewed from a direction substantially perpendicular to the traveling direction of the laser light. Fig. 3 is a view of the internal space of the housing 30 of the chamber apparatus CH as viewed from the insulating portion 33 side toward the cross-flow fan 46 side. Fig. 4 is a cross-sectional view of the chamber apparatus CH shown in Fig. 2 as viewed perpendicular to the traveling direction of the laser light. The chamber apparatus CH mainly comprises the housing 30, a pair of windows 31a, 31b, a pair of electrodes 32a, 32b, an insulating portion 33, a feedthrough 34, an electrode holder portion 36, a cross-flow fan 46, a heat exchanger 47, a pressure sensor 48, and a filter case 50.

[0017] The above-mentioned laser gas is enclosed in housing 30. Housing 30 also includes an internal space in which light is generated by excitation of the laser gas. The laser gas is supplied to the internal space of housing 30 from a laser gas supply device via piping (not shown). The light generated by excitation of the laser gas travels to windows 31a and 31b.

[0018] Window 31a is located on the front side in the direction of propagation of the laser light from gas laser apparatus 100 to exposure device 200, and window 31b is located on the rear side in the direction of propagation. Windows 31a and 31b are inclined at a Brewster angle with respect to the direction of propagation of the laser light so as to suppress reflection of P-polarized laser light. Window 31a is located on the front wall of housing 30, and window 31b is located on the rear wall of housing 30. Specifically, as shown in FIG. 3 , window 31a is held by a cylindrical holder 31c connected to the front wall and is positioned by holder 31c so as to face opening 30a in the wall. Window 31b is held by holder 31d, which has the same configuration as holder 31c and is connected to the rear wall, and is positioned by holder 31d so as to face opening 30b in the wall.

[0019] The longitudinal direction of the electrodes 32a and 32b is along the traveling direction of the laser light, and the electrodes 32a and 32b are disposed opposite each other in the internal space of the housing 30. The space between the electrodes 32a and 32b in the housing 30 is sandwiched between the windows 31a and 31b. The electrodes 32a and 32b are discharge electrodes for exciting the laser medium by glow discharge. In this example, the electrode 32a is a cathode, and the electrode 32b is an anode.

[0020] The electrode 32a is supported by an insulating portion 33. The insulating portion 33 closes an opening that is continuous with the housing 30. The insulating portion 33 includes an insulator. For example, an example of the insulator is alumina ceramics, which has low reactivity with F2 gas. Furthermore, a feedthrough 34 made of a conductive member is disposed in the insulating portion 33. The feedthrough 34 applies a voltage supplied from the pulse power module 143 to the electrode 32a.

[0021] The electrode 32b is supported by and electrically connected to the electrode holder part 36. For clarity of illustration, the electrode holder part 36 is not shown in Fig. 3. Furthermore, as shown in Fig. 4, the electrode holder part 36 is electrically connected to the housing 30 via a return plate 37.

[0022] A crossflow fan 46 is disposed in the internal space of the housing 30 on the opposite side of the electrode 32b side with respect to the electrode holder portion 36. The space in the internal space of the housing 30 where the crossflow fan 46 is disposed is connected to the space between the electrodes 32a and 32b. The crossflow fan 46 is connected to a motor 46a disposed outside the housing 30. When the motor 46a rotates, the crossflow fan 46 rotates. The rotation of the crossflow fan 46 causes the laser gas to flow between the electrodes 32a and 32b. In FIG. 4, the flow of the laser gas is indicated by thick arrows, and the laser gas is circulated by the crossflow fan 46 in the following order: crossflow fan 46, between electrodes 32a and 32b, heat exchanger 47, and crossflow fan 46. The ON / OFF and rotation speed of the motor 46a are adjusted by control of the laser processor 190. Therefore, the laser processor 190 can adjust the circulation speed of the laser gas circulating in the internal space of the housing 30 by controlling the motor 46a.

[0023] A heat exchanger 47 is disposed beside the cross flow fan 46. Most of the laser gas caused to flow by the cross flow fan 46 passes through this heat exchanger 47, and the heat of the laser gas is removed by the heat exchanger 47.

[0024] As shown in FIGS. 3 and 4 , the filter case 50 is disposed on the wall surface of the housing 30 on the opposite side of the heat exchanger 47 with respect to the crossflow fan 46. The filter case 50 includes an inlet 51 that communicates with an opening 30c that is continuous with approximately the center of the housing 30 in the traveling direction of the laser light, and outlets 51a and 51b that communicate with flow paths 30d and 30e provided in the wall surfaces on the front and rear sides of the housing 30. In the internal space of the filter case 50, a front-side filter 53a is disposed between the inlet 51 and the front-side outlet 51a, and a rear-side filter 53b is disposed between the inlet 51 and the rear-side outlet 51b. The filters 53a and 53b are indicated by dashed lines in FIG. 3 and have the same shape and length. They filter the laser gas passing through them and remove particulates (described later) from the laser gas.

[0025] Flow path 30d communicates with front-side purge chamber 30g provided in the front wall of housing 30, and purge chamber 30g communicates with the internal space of housing 30 via opening 30j in the wall and with the internal space of holder 31c via opening 30a. A purge chamber is also provided in the rear wall, and rear-side purge chamber 30h, like purge chamber 30g, communicates with flow path 30e and the internal space of housing 30 via opening 30k in the wall and with the internal space of holder 31d via opening 30b.

[0026] A front-side cylindrical member 60a is disposed in the purge chamber 30g. The longitudinal direction of the cylindrical member 60a is aligned with the traveling direction of the laser light. One end of the cylindrical member 60a is spaced apart from the opening 30j and is positioned closer to the holder 31c than the flow path 30d. The other end of the cylindrical member 60a is connected to the edge of the holder 31c so as to surround the opening of the holder 31c. A rear-side cylindrical member 60b is disposed in the purge chamber 30h, similar to the purge chamber 30g.

[0027] The cylindrical member 60a includes a plurality of plate members 61 arranged on the inner circumferential surface of the cylindrical member 60a. The plate members 61 are arranged parallel to the longitudinal direction of the cylindrical member 60a at a predetermined interval, with the in-plane direction of the plate members 61 aligned substantially perpendicular to the longitudinal direction of the cylindrical member 60a. Therefore, the plate members 61 are arranged with gaps between them. Furthermore, openings 63 are continuous with each plate member 61. The openings 63 are arranged on the same straight line. The arrangement of the plate members 61 including the openings 63 described above provides the cylindrical member 60a with a labyrinth structure. The laser light passes through these continuous openings 63. For ease of viewing, FIG. 3 shows the plate members 61 and openings 63 in a simplified manner, with only one plate member 61 and one opening 63 being labeled, and the other plate members 61 and openings 63 being omitted. The cylindrical member 60b has the same configuration as the cylindrical member 60a.

[0028] Returning to FIG. 2 , the gas laser apparatus 100 of this embodiment will be described further. The charger 141 is a DC power supply that charges a capacitor (not shown) provided in the pulsed power module 143 with a predetermined voltage. The charger 141 is disposed outside the housing 30 and is connected to the pulsed power module 143. The pulsed power module 143 includes a switch 143a controlled by the laser processor 190. When the switch 143a is turned on by the control, the pulsed power module 143 boosts the voltage applied from the charger 141 to generate a pulsed high voltage and applies this high voltage to the electrodes 32a and 32b. When the high voltage is applied, the insulation between the electrodes 32a and 32b breaks down, causing a discharge. The energy of this discharge excites the laser medium in the housing 30, generating an excimer at an excited level. Then, when the excimer transitions to a ground level where it dissociates into two atoms, it emits light corresponding to the difference in energy levels. The emitted light travels to windows 31a and 31b.

[0029] Rear mirror 145 faces window 31b, and output coupling mirror 147 faces window 31a. Rear mirror 145 is coated with a highly reflective film, and output coupling mirror 147 is coated with a partially reflective film. Rear mirror 145 reflects the laser light emitted from window 31b with high reflectivity and returns it to housing 30. Output coupling mirror 147 transmits a portion of the laser light output from window 31a and reflects the other portion and returns it to the internal space of housing 30 via window 31a. Output coupling mirror 147 is composed of, for example, an element in which a dielectric multilayer film is formed on a calcium fluoride substrate.

[0030] Therefore, the rear mirror 145 and the output coupling mirror 147 form a Fabry-Perot type laser resonator, and the housing 30 is disposed on the optical path of the laser resonator. Therefore, the laser light emitted from the housing 30 travels back and forth between the rear mirror 145 and the output coupling mirror 147. The traveling laser light is amplified every time it passes through the laser gain space between the electrodes 32a and 32b. A portion of the amplified light passes through the output coupling mirror 147 as pulsed laser light.

[0031] The rear mirror 145 is fixed to the internal space of a housing 145a connected to the rear side of the housing 30. The output coupling mirror 147 is fixed to the internal space of an optical path pipe 147a connected to the front side of the housing 30.

[0032] The function of rear mirror 145 may be imparted to window 31b. In this case, holder 31d has a flexible structure so that the angle of laser light incident on window 31b can be adjusted. The function of output coupling mirror 147 may be imparted to window 31a. In this case, holder 31c has a flexible structure so that the angle of laser light incident on window 31b can be adjusted. Furthermore, a line narrowing module (not shown) that narrows the line of laser light may be disposed instead of rear mirror 145. The line narrowing module includes a prism, a grating, and a rotary stage. The prism, grating, and rotary stage are disposed in the internal space of housing 145a.

[0033] The prism expands the beam width of light emitted from window 31b and makes the light incident on the grating. The prism also reduces the beam width of light reflected from the grating and returns the light to the internal space of housing 30 via window 31b. At least one prism needs to be provided.

[0034] The surface of the grating is made of a highly reflective material and has numerous grooves formed at regular intervals on the surface. The grating is a dispersive optical element. The cross-sectional shape of each groove is, for example, a right-angled triangle. Light entering the grating from the prism is reflected by these grooves and diffracted in a direction according to the wavelength of the light. The grating is Littrow-oriented so that the angle of incidence of the light entering the grating from the prism matches the angle of diffraction of the diffracted light of the desired wavelength. This allows light near the desired wavelength to be returned to the housing 30 via the prism.

[0035] The rotation stage supports and rotates the prism. Rotating the prism changes the angle of incidence of the light with respect to the grating. Therefore, by rotating the prism, it is possible to select the wavelength of the light that returns from the grating through the prism to the housing 30.

[0036] A laser resonator is formed by the grating and the output coupling mirror 147, which are disposed on either side of the housing 30, and the housing 30 is disposed on the optical path of the laser resonator. Therefore, light emitted from the housing 30 travels back and forth between the grating and the output coupling mirror 147.

[0037] Monitor module 150 is disposed on the optical path of the pulsed laser light transmitted through output coupling mirror 147. Monitor module 150 mainly comprises a housing 151, a beam splitter 152 disposed in the internal space of housing 151, a condenser lens 153, and an optical sensor 154. An opening is continuous with housing 151, and optical path pipe 147a is connected to surround this opening. Therefore, the internal space of housing 151 communicates with the internal space of optical path pipe 147a through this opening.

[0038] The beam splitter 152 transmits the pulsed laser beam that has passed through the output coupling mirror 147 to an exit window 161 with high transmittance, and also reflects a portion of the pulsed laser beam toward a condenser lens 153. The condenser lens 153 condenses the pulsed laser beam onto the light-receiving surface of an optical sensor 154. The optical sensor 154 measures the pulse energy E of the pulsed laser beam that is incident on the light-receiving surface. The optical sensor 154 is electrically connected to the laser processor 190, and outputs a signal indicating data related to the measured pulse energy E to the laser processor 190.

[0039] An opening is continuous with the housing 151 of the monitor module 150 on the side opposite to the side to which the optical path pipe 147a is connected, and an optical path pipe 161a is connected to surround this opening. Therefore, the internal space of the housing 151 and the internal space of the optical path pipe 161a are in communication with each other. The optical path pipe 161a is also connected to the housing 110. An exit window 161 is provided in the housing 110 at a position surrounded by the optical path pipe 161a. Light that passes through the beam splitter 152 of the monitor module 150 is emitted from the exit window 161 to the exposure apparatus 200 outside the housing 110.

[0040] Purge gas is filled in the optical path pipes 147a, 161a and the internal spaces of the housings 145a, 151. The purge gas contains an inert gas such as high-purity nitrogen with little impurities such as oxygen. The purge gas is supplied from a purge gas supply source (not shown) located outside the housing 110 to the optical path pipes 147a, 161a and the internal spaces of the housings 145a, 151 through piping (not shown).

[0041] The pressure sensor 48 measures the pressure in the internal space of the housing 30. The pressure sensor 48 is electrically connected to the laser processor 190, and outputs to the laser processor 190 a signal indicating data related to the measured pressure.

[0042] The laser gas supply device is supplied with laser gas from a laser gas supply source (not shown) located outside of housing 110 via piping (not shown). The laser gas supply device is provided with valves and flow rate control valves (not shown), and is also connected to other piping that is connected to housing 30. The laser gas supply device supplies multiple gases to the internal space of housing 30 via these other piping in response to control signals from laser processor 190. The laser gas exhaust device is connected to piping that is connected to housing 30. The laser gas exhaust device includes an exhaust pump (not shown), and the exhaust pump exhausts gas from the internal space of housing 30 into the internal space of housing 110 via the piping.

[0043] Furthermore, the housing 110 is provided with an exhaust duct 111. Gas is exhausted from the exhaust duct 111 to the outside of the housing 110. This gas is gas exhausted from the internal space of the housing 30 to the internal space of the housing 110 by a laser gas exhaust device, or gas exhausted from inside the optical path pipes 147a, 161a, etc. to the internal space of the housing 110 by a configuration not shown.

[0044] The laser processor 190 of the present disclosure is a processing device including a storage device in which a control program is stored and a CPU that executes the control program. The laser processor 190 is specially configured or programmed to execute various processes included in the present disclosure. The laser processor 190 also controls the entire gas laser apparatus 100. The laser processor 190 is also electrically connected to the exposure processor of the exposure apparatus 200, and transmits and receives various signals to and from the exposure processor.

[0045] 2.2 Operation Next, the operation of the gas laser device 100 of the comparative example will be described.

[0046] Before gas laser device 100 emits pulsed laser light, the internal spaces of optical path pipes 147a and 161a and housings 145a and 151 are filled with purge gas from a purge gas supply source (not shown). Laser gas is supplied to the internal space of housing 30 from a laser gas supply device (not shown). When laser gas is supplied, laser processor 190 controls motor 46a to rotate crossflow fan 46. The rotation of crossflow fan 46 circulates the laser gas within the internal space of housing 30.

[0047] When the gas laser device 100 emits pulsed laser light, the laser processor 190 sets a predetermined charging voltage in the charger 141 and turns on the switch 143a. This causes the pulse power module 143 to generate a pulsed high voltage from the electrical energy stored in the charger 141, and the high voltage is applied between the electrodes 32a and 32b. When the high voltage is applied, the insulation between the electrodes 32a and 32b breaks down, causing a discharge. When the discharge occurs, the energy of this discharge excites the laser medium contained in the laser gas between the electrodes 32a and 32b, and the laser medium emits spontaneous emission light when it returns to its ground state. Part of this light is ultraviolet light, and the light that passes through the window 31b is reflected by the rear mirror 145. The light reflected by the rear mirror 145 propagates again through the window 31b into the internal space of the housing 30. The light propagating into the internal space of the housing 30 causes stimulated emission in the excited laser medium, amplifying the light. The light passes through window 31a and travels to output coupling mirror 147. Part of the light passes through output coupling mirror 147, and the remaining part of the light is reflected by output coupling mirror 147 and passes through window 31a to propagate into the internal space of housing 30. The light propagating into the internal space of housing 30 travels to rear mirror 145 as described above. In this way, the laser light travels back and forth between rear mirror 145 and output coupling mirror 147, and is amplified each time it passes through a discharge space in the internal space of housing 30. Then, part of the laser light passes through output coupling mirror 147 as pulsed laser light and travels to beam splitter 152.

[0048] A portion of the pulsed laser beam traveling toward the beam splitter 152 is reflected by the beam splitter 152. The reflected pulsed laser beam is received by the optical sensor 154, which measures the pulse energy E of the received pulsed laser beam. The optical sensor 154 outputs a signal indicating data related to the measured pulse energy E to the laser processor 190. The laser processor 190 feedback-controls the charging voltage of the charger 141 so that the difference ΔE between the pulse energy E and the target pulse energy Et falls within an allowable range. When the difference ΔE falls within the allowable range, the pulsed laser beam passes through the beam splitter 152 and the exit window 161 and enters the exposure apparatus 200. This pulsed laser beam is ArF laser beam, which is ultraviolet light with a center wavelength of approximately 193 nm.

[0049] The pressure in the internal space of housing 30 is measured by pressure sensor 48, and a signal indicating data related to the pressure from pressure sensor 48 is input to laser processor 190. If the charging voltage is higher than the maximum value of the allowable range, laser processor 190 controls the laser gas supply device based on the signal from pressure sensor 48, and supplies laser gas to the internal space of housing 30 until the pressure in the internal space of housing 30 reaches a predetermined pressure. If the charging voltage is lower than the minimum value of the allowable range, laser processor 190 controls the laser gas exhaust device based on the signal, and exhausts laser gas from the internal space of housing 30 until the pressure reaches the predetermined pressure.

[0050] However, when a discharge occurs between the electrodes 32a and 32b as described above, metal powder and vapor are generated from the electrodes 32a and 32b due to sputtering or heat caused by the discharge. The metal powder and vapor react with the F2 gas in the laser gas to generate fluorides. The particles, together with the laser gas, are circulated in the internal space of the housing 30 by the cross-flow fan 46. This circulation creates a pressure difference between opening 30c and opening 30j or opening 30k, and this pressure difference causes a portion of the laser gas containing the particles to flow from opening 30c and inlet 51 into filter case 50. The flow of laser gas from the internal space of the housing 30 to filter case 50 is indicated by dashed arrows in FIG.

[0051] A portion of the laser gas flowing through the filter case 50 passes through the filter 53a and is filtered, removing particles from the laser gas. The laser gas from which the particles have been removed passes through the flow path 30d and flows into the purge chamber 30g. A portion of the flowing laser gas passes through the opening 30j and flows into the internal space of the housing 30. Another portion of the laser gas hits the window 31a. The remaining portion of the laser gas then bounces off the window 31a, passes through the opening 30j, and flows into the internal space of the housing 30. However, particles floating in the internal space of the housing 30 may flow from the opening 30j through the purge chamber 30g and onto the window 31a. The cylindrical member 60a is provided to prevent such particles from adhering to the window 31a. The laser gas containing particles from the opening 30j is compressed as it passes through the opening 63 in the cylindrical member 60a. After passing through the gap between the adjacent plate members 61, the compression is released and the gas expands. As the laser gas travels through the internal space of the cylindrical member 60a in the longitudinal direction of the cylindrical member 60a, it repeatedly compresses and expands, and as a result, some of the particles contained in the laser gas adhere to the plate member 61 and the inner circumferential surface of the cylindrical member 60a and are removed. The laser gas from which the particles have been removed flows toward the window 31a and blows against the window 31a. Therefore, adhesion of particles flowing from the opening 30j to the window 31a is suppressed. While the flow and blowing of the laser gas have been described above using the front side, the flow and blowing of the laser gas on the rear side are similar. Therefore, blowing of the laser gas against the window 31b suppresses adhesion of particles to the window 31b.

[0052] 2.3 Challenges In the comparative chamber apparatus CH, there is a concern that the flow rate of laser gas flowing through the filter case 50 due to the pressure difference caused by driving the crossflow fan 46 alone may be insufficient. In this case, the flow rate of laser gas flowing from the purge chambers 30g, 30g into the internal space of the housing 30 through the openings 30j, 30k decreases, and particles may travel from the internal space of the housing 30 through the openings 30j, 30k to the windows 31a, 31b. Because the cylindrical members 60a and 60b can only remove a portion of the particles in the laser gas, the particles may adhere to the windows 31a, 31b, reducing the transmittance of the windows 31a, 31b due to the particles. This reduced transmittance may reduce the energy density of the pulsed laser light emitted from the gas laser apparatus 100 toward the exposure device 200. This raises concerns about reduced reliability of the gas laser apparatus 100. This insufficient flow rate becomes more pronounced as the pulse energy of the gas laser apparatus 100 increases, due to factors such as an increase in electrode area, which increases the amount of particles generated.

[0053] Therefore, in the following embodiment, a chamber apparatus CH that can suppress a decrease in the reliability of the gas laser apparatus 100 will be exemplified.

[0054] 3. Description of the chamber device of embodiment 1 Next, the chamber apparatus CH of embodiment 1 will be described. The same components as those described above are designated by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified. In addition, in some drawings, some components may be omitted or simplified for clarity.

[0055] 3.1 Configuration 5 is a view of the internal space of the housing 30 of the chamber apparatus CH of this embodiment, viewed from the insulating portion 33 side toward the cross-flow fan 46 side. Unlike the chamber apparatus CH of the comparative example, the chamber apparatus CH of this embodiment does not include the filter case 50, the flow paths 30d and 30e, and the purge chambers 30g and 30h.

[0056] The chamber device CH includes partition walls 81 and 83 provided in the internal space of the housing 30. The partition wall 81 is provided between the electrodes 32a and 32b and the front wall surface, and the partition wall 83 is provided between the electrodes 32a and 32b and the rear wall surface. The main surface of the partition wall 81 faces the front wall surface of the housing 30, and the main surface of the partition wall 83 faces the rear wall surface of the housing 30. The partition walls 81 and 83 divide the internal space of the housing 30 into three internal spaces 301, 303, and 305. The internal space 301 is a space on the front window side between the partition wall 81 and the front wall surface of the housing 30, and the internal space 303 is a space on the rear window side between the partition wall 83 and the rear wall surface of the housing 30. The internal space 301 is in contact with the front wall surface, and the internal space 303 is in contact with the rear wall surface. Internal space 305 is a space between internal space 301 and internal space 303, specifically, a space on the side of electrodes 32a and 32b between partition wall 81 and partition wall 83. Internal space 305 is an internal space on the opposite side of internal space 301 with partition wall 81 as the reference, and is an internal space on the opposite side of internal space 303 with partition wall 83 as the reference. Internal space 301 and internal space 303 have the same size, and internal space 305 is larger than internal spaces 301 and 305.

[0057] Electrodes 32a and 32b, electrode holder 36, crossflow fan 46 as a first fan, heat exchanger 47, and pressure sensor 48 are arranged in internal space 305. As in FIG. 3, electrode 32b, electrode holder 36, and pressure sensor 48 are not shown in FIG. 5 for clarity of illustration.

[0058] In the chamber apparatus CH of this embodiment, the cross flow fan 46 and the heat exchanger 47 are arranged in the opposite position to those in the comparative example in the internal space 305. Furthermore, unlike the internal space of the housing 30 of the comparative example, filters 53a and 53b are arranged in the internal space 305. The filters 53a and 53b are arranged on the opposite side of the cross flow fan 46 with the heat exchanger 47 as the reference. In the chamber apparatus CH of this embodiment, the cross flow fan 46 circulates the laser gas in the following order: the cross flow fan 46, between the electrodes 32a and 32b, the filters 53a and 53b, the heat exchanger 47, and the cross flow fan 46. Therefore, the filters 53a and 53b filter the laser gas that flows by the cross flow fan 46 and passes through them, removing particulates from the laser gas. The filter 53a is disposed adjacent to the partition wall 81 in the internal space 305 so as to block the opening 81a continuing to the partition wall 81, and the filter 53b is disposed adjacent to the partition wall 81 in the internal space 305 so as to block the opening 83a continuing to the partition wall 83. In FIG. 5, the openings 81a and 83a are indicated by dashed lines. The filters 53a and 53b and the openings 81a and 83a are disposed on the same straight line in the traveling direction of the laser light. The filters 53a and 53b are shorter than those in the comparative example. Note that the filters 53a and 53b may be longer than those in the comparative example or may be the same length. Alternatively, one filter may be disposed between the openings 81a and 83a so as to block the openings 81a and 83a.

[0059] The chamber apparatus CH of this embodiment includes a second fan, a fan-side flow path in which the second fan is disposed, and a window-side flow path that is connected to the fan-side flow path and flows laser gas toward the window side, and these are disposed on the front side and the rear side, respectively. Hereinafter, the second fan, fan-side flow path, and window-side flow path on the front side will be described as second fan 311, flow path 313, and flow path 315. Also, the second fan, fan-side flow path, and window-side flow path on the rear side will be described as second fan 321, flow path 323, and flow path 325. Hereinafter, the description will be made using the front-side second fan 311, flow path 313, and flow path 315, but the rear-side second fan 321, flow path 323, and flow path 325 have the same configuration as the front-side second fan 311, flow path 313, and flow path 315. Therefore, the second fan 321, the flow path 323, and the flow path 325 can obtain the same operation, action, and effect as the second fan 311, the flow path 313, and the flow path 315.

[0060] FIG. 6 is a perspective view of the partition wall 81 and the flow path 313 as viewed from the internal space 305, and FIG. 7 is a perspective view of the partition wall 81 and the flow path 313 as viewed from the internal space 301.

[0061] A second fan 311 is disposed in the flow path 313, and the laser gas filtered by the filter 53a flows through the flow path 313 by the second fan 311. In this embodiment, the flow path 313 is provided in the internal space 301 and the internal space 305 through openings 81a, 81b, and 81c of the partition wall 81. Such flow path 313 includes a first flow path 313a provided in the internal space 301, a second flow path 313b provided in the internal space 305, and a third flow path 313c provided in the internal space 301. Each of the first flow path 313a, the second flow path 313b, and the third flow path 313c is a space surrounded by the partition wall 81 and a plate material. The first flow path 313a, the second flow path 313b, and the third flow path 313c are provided along the planar direction of the partition wall 81.

[0062] One end of first flow path 313a communicates with internal space 305 via opening 81a and filter 53a, and laser gas in internal space 305 flows into first flow path 313a from internal space 305 via opening 81a, which is the first opening. The other end of first flow path 313a communicates with opening 81b continuing to partition wall 81. Opening 81b is smaller than opening 81a and is located lower than opening 81a. In FIG. 5, a portion of first flow path 313a that is hidden by third flow path 313c is shown by a dashed line, and in FIG. 6, a portion of first flow path 313a that is hidden by partition wall 81 is shown by a dashed line. In FIG. 5, opening 81b is omitted for clarity, and opening 81b is shown by a dashed line in FIGS. 6 and 7.

[0063] One end of second flow path 313b communicates with first flow path 313a via opening 81b, which is a second opening, and laser gas from first flow path 313a flows into second flow path 313b from first flow path 313a via opening 81b, which is a second opening. The other end of second flow path 313b communicates with opening 81c, which is a third opening continuous with partition wall 81. In FIG. 7, a portion of second flow path 313b that is hidden by partition wall 81 is shown by a dashed line. Opening 81c is larger than opening 81b and smaller than opening 81a. Opening 81c is located at approximately the same height as opening 81a on the opposite side of opening 81a with respect to opening 81b. Opening 81c is shown by a dashed line in FIG. 5.

[0064] One end of third flow path 313c is connected to second flow path 313b via opening 81c, and laser gas from second flow path 313b flows into third flow path 313c from second flow path 313b via opening 81c, which is the third opening. The other end of third flow path 313c is connected to one end of flow path 315 on the partition wall 83 side and to internal space 305 via opening 81d. Third flow path 313c allows a portion of the laser gas to flow into internal space 305 via opening 81d, and another portion of the laser gas to flow path 315. Therefore, third flow path 313c allows a portion of the laser gas to flow away from window 31a, and another portion of the laser gas to flow toward window 31a. Opening 81d is larger than opening 81c but smaller than opening 81a. Opening 81d is located above opening 81b.

[0065] The second fan 311 is, for example, a centrifugal fan, and is disposed adjacent to the opening 81c in the third flow path 313c. The second fan 311 is disposed approximately in the middle of the flow path 313. The drive shaft 46b of the crossflow fan 46 passes through the second flow path 313b, the opening 81c, and the third flow path 313c, and the tip of the drive shaft 46b is held by a bearing 46c disposed outside the housing 30. The drive shaft 46b is connected to the second fan 311, and the second fan 311 rotates due to the rotation of the drive shaft 46b. Therefore, when the drive shaft 46b and the crossflow fan 46 are rotated by the driving force of the motor 46a, which is the power source of the crossflow fan 46, the second fan 311 rotates in the same direction as the crossflow fan 46 due to the driving force. The second fan 311 causes the laser gas in the flow path 313 to flow into the flow path 315 by its rotation.

[0066] Flow path 315 is an internal space of a cylindrical member and is provided in internal space 301. The longitudinal direction of flow path 315 is along the traveling direction of the laser light. Flow path 315 is provided in internal space 301. One end of flow path 315 communicates with third flow path 313c, and the other end of flow path 315 is connected to the front wall surface of housing 30 so as to surround opening 30a. When viewed along the traveling direction of the pulsed laser light, opening 81d, the communication portion between opening 81d and third flow path 313c, the communication portion between third flow path 313c and flow path 315, and flow path 315 overlap with window 31a. Flow path 315 flows laser gas, which is flowed from third flow path 313c of flow path 315 by second fan 311, toward window 31a. Furthermore, flow path 315 causes the laser gas bouncing off window 31a to flow in a direction away from window 31a, specifically, the laser gas to flow into internal space 305 via opening 81d.

[0067] A cylindrical member 60a is disposed in the flow path 315. The cylindrical member 60a is disposed coaxially with the window 31a. The cylindrical member 60a is shorter than the flow path 315. One end of the cylindrical member 60a is spaced apart from the partition wall 81 and is located closer to the window 31a than the third flow path 313c. The other end of the cylindrical member 60a is connected to the front wall surface of the housing 30 so as to surround the opening 30a.

[0068] 5, the flow paths of flow path 323 corresponding to first flow path 313a, second flow path 313b, and third flow path 313c are shown as first flow path 323a, second flow path 323b, and third flow path 323c, respectively. Also, openings corresponding to openings 81a, 81b, 81c, and 81d are shown as openings 83a, 83b, 83c, and 83d.

[0069] 3.2 Operation Next, the operation of the cross flow fan 46 and the second fan 311 in this embodiment will be described.

[0070] When motor 46a rotates, drive shaft 46b, which is connected to motor 46a and crossflow fan 46, rotates. As a result, crossflow fan 46 rotates due to the driving force from motor 46a. Furthermore, because second fan 311 is connected to drive shaft 46b, it rotates simultaneously with and in the same direction as crossflow fan 46 due to the driving force from motor 46a. As a result, most of the laser gas circulates through crossflow fan 46, between electrodes 32a and 32b, filters 53a and 53b, heat exchanger 47, and crossflow fan 46, in that order, due to the rotation of crossflow fan 46. Furthermore, another portion of the laser gas passes through filter 53a and opening 81a due to the rotation of crossflow fan 46 and second fan 311, and flows into flow path 313. The laser gas is filtered by filter 53a, and particulate matter contained in the laser gas is removed from the laser gas by filtration before flowing into flow path 313.

[0071] In flow path 313, second fan 311 causes laser gas to flow through first flow path 313a, opening 81b, second flow path 313b, opening 81c, and third flow path 313c in this order. At the other end of third flow path 313c, the direction of travel of the laser gas is roughly perpendicular to the axial direction of opening 81d and flow path 315. This axial direction is the direction of travel of the laser light. At the other end of third flow path 313c, the laser gas collides with the inner circumferential surface of third flow path 313c, which is located in the direction of travel of the laser gas. Due to the collision, part of the laser gas passes through opening 81d and flows into internal space 305, and another part of the laser gas flows into flow path 315.

[0072] In flow path 315, the laser gas flows into cylindrical member 60a and flows onto window 31a, and at the same time, blows against window 31a. The laser gas blown against window 31a bounces off window 31a, passes through cylindrical member 60a, flow path 315, and opening 81d, and flows into internal space 305.

[0073] 3.3 Actions and Effects In the chamber apparatus CH of this embodiment, the second fan 311 rotates together with the cross flow fan 46 by the driving force from the motor 46a, which is the drive source of the cross flow fan 46. The laser gas filtered by the filter 53a flows through the flow path 313, which is the fan side flow path, by the second fan 311. A portion of the laser gas flows in a direction away from the window 31a, and another portion flows into the flow path 315, which is the window side flow path. The laser gas that flows into the flow path 315 flows toward the window 31a by the flow path 315, bounces off the window 31a, and flows in a direction away from the window 31a by the flow path 315.

[0074] In the chamber apparatus CH of this embodiment, the flow rate of the laser gas in the flow path 313 is increased by the second fan 311. Therefore, even if laser gas containing particles in the internal space 305 on the side of the electrodes 32a and 32b attempts to proceed toward the window 31a, the laser gas is pushed back toward the internal space 305 by the laser gas flowing away from the window 31a as the flow rate increases as described above. This prevents particles from proceeding from the internal space 305 toward the window 31a, thereby preventing adhesion of the particles to the window 31a. Furthermore, since the laser gas flowing toward the window 31a blows onto the window 31a with the particles removed, the blowing prevents adhesion of the particles. By preventing adhesion as described above, a decrease in the transmittance of the window 31a due to adhesion can be prevented. Furthermore, by preventing a decrease in the transmittance, a decrease in the energy density of the pulsed laser light emitted from the gas laser apparatus 100 toward the exposure apparatus 200 can be prevented, thereby preventing a decrease in the reliability of the gas laser apparatus 100.

[0075] Furthermore, the second fan 311 rotates together with the crossflow fan 46. In this case, the crossflow fan 46 and the second fan 311 can be driven by a common motor 46a. This reduces the number of motors 46a compared to when a motor 46a is provided for each of the crossflow fan 46 and the second fan 311, thereby reducing the cost of the chamber apparatus CH and making the chamber apparatus CH smaller.

[0076] Furthermore, in the chamber apparatus CH of this embodiment, the flow path 313 is provided in the internal space 301 and the internal space 305 that is larger than the internal space 301, and the flow path 315 is provided in the internal space 301. Because the internal space 305 is larger than the internal space 301, it is easy to ensure extra space in the internal space 305 compared to the internal space 301. Therefore, in the case of the above configuration, it is easy to arrange a part of the flow path 313 in the internal space 301. Furthermore, because another part of the flow path 313 is arranged in the internal space 305, the space in the internal space 301 for arranging each of the flow paths can be wider than when the entire flow paths 313 and 315 are arranged in the internal space 301. As a result, it is easy to arrange the part of the flow path 313 and the flow path 315 in the internal space 301. Furthermore, because the part of the flow path 313 is arranged in the internal space 305, the internal space 301 can be made smaller, and the longitudinal length of the housing 30 can be shortened.

[0077] Furthermore, in the chamber apparatus CH of this embodiment, third flow path 313c further causes laser gas to flow into internal space 305 communicating with third flow path 313c via opening 81d, which is provided on the opposite side of third flow path 313c from flow path 315. Particulates in internal space 305 may be transported by cross flow fan 46 from internal space 305 to window 31a via opening 81d, third flow path 313c, and flow path 315. In the above configuration, a portion of the laser gas flowing through third flow path 313c flows into internal space 305 so as to push back the particulates, thereby suppressing the inflow of particulates from internal space 305 to window 31a.

[0078] Furthermore, in the chamber apparatus CH of the present embodiment, when viewed along the traveling direction of the pulsed laser beam, opening 81d, a communication portion between opening 81d and third flow path 313c, a communication portion between third flow path 313c and flow path 315, and flow path 315 overlap with window 31a. In this case, the pulsed laser beam travels from internal space 305 through opening 81d, third flow path 313c, and flow path 315 to window 31a, and therefore it may not be necessary to provide an opening through which the pulsed laser beam passes in partition wall 81 separately from opening 81d.

[0079] Furthermore, in the chamber apparatus CH of the present embodiment, the third flow path 313c communicates with the flow path 315 on the partition wall 81 side rather than the front wall surface side of the housing 30. In this case, the inflow of fine particles from the internal space 305 into the flow path 315 through the opening 81d can be suppressed more effectively than in the case where the third flow path 313c communicates with the flow path 315 on the front wall surface side of the housing 30.

[0080] Furthermore, in the chamber apparatus CH of this embodiment, the filter 53a covers the opening 81a in the internal space 305. With this configuration, the progression of particles toward the flow path 313 can be suppressed compared to when the filter 53a is disposed in the internal space 305 so as not to cover the opening 81a. When the progression of particles toward the flow path 313 is suppressed, the accumulation of particles in the flow paths 313, 315 and the progression of particles toward the window 31a through the flow paths 313, 315 can be suppressed.

[0081] Furthermore, in the chamber apparatus CH of this embodiment, the cylindrical member 60a is disposed in the flow path 315. The cylindrical member 60a includes a plurality of plate members 61 with continuous openings 63, and the plate members 61 are disposed in parallel at intervals in the longitudinal direction of the cylindrical member 60a. This allows the laser gas to repeatedly compress and expand as it travels through the internal space of the cylindrical member 60a, and allows fine particles contained in the laser gas to adhere to the plate members 61, thereby enabling the fine particles to be further removed from the laser gas.

[0082] Furthermore, in the chamber apparatus CH of this embodiment, the second fan 311 is coupled to the drive shaft 46b of the crossflow fan 46 and rotates with the rotation of the drive shaft 46b. With this configuration, the second fan 311 can rotate simultaneously with the crossflow fan 46. Furthermore, with this configuration, the number of drive shafts 46b can be reduced compared to when the drive shafts 46b are individually arranged for the crossflow fan 46 and the second fan 311, which can reduce the cost of the chamber apparatus CH and enable the chamber apparatus CH to be made smaller.

[0083] In the chamber apparatus CH of this embodiment, the cross-flow fan 46 has been described as the first fan, but the first fan may be a reflux fan. Also, the second fan 311 has been described as a centrifugal fan, but the second fan 311 may be a sirocco fan.

[0084] 4. Description of the chamber device of the second embodiment Next, a description will be given of the chamber apparatus CH of embodiment 2. Note that the same components as those described above are given the same reference numerals, and redundant description will be omitted unless otherwise specified.

[0085] 4.1 Configuration 8 is a view of the internal space of the housing 30 of this embodiment, viewed from the insulating section 33 side toward the cross-flow fan 46 side. In the chamber apparatus CH of this embodiment, the configurations of the flow paths 313, 315, 323, and 325 are different from those of the first embodiment. Although the following description will be given using the flow paths 313 and 315, the flow paths 323 and 325 have the same configuration as the flow paths 313 and 315. Therefore, the flow paths 323 and 325 can achieve the same operations, functions, and effects as the flow paths 313 and 315.

[0086] The flow path 313 of this embodiment includes a first flow path 313a and a second flow path 313b, and each of the first flow path 313a and the second flow path 313b, i.e., the entire flow path 313, is provided in the internal space 301. Therefore, the partition wall 81 of this embodiment is not provided with the openings 81b and 81c described in the first embodiment that connect the respective flow paths of the flow paths 313 to each other.

[0087] Second flow path 313b is a space surrounded by the wall surface and plate material on the front side of housing 30, and is provided along the wall surface. One end of second flow path 313b communicates with the other end of first flow path 313a, and the other end of second flow path 313b communicates with opening 30a. Second fan 311 is disposed on one end side of second flow path 313b, and tubular member 60a is disposed on the other end side of second flow path 313b.

[0088] The flow path 315 is disposed on the opposite side of the front wall surface of the housing 30 with respect to the cylindrical member 60a. One end of the flow path 315 communicates with the other end of the second flow path 313b on the side in the direction of travel of the laser gas flowing through the second flow path 313b. The laser gas in the second flow path 313b flows into the flow path 315 from the second flow path 313b along the outer peripheral surface of the cylindrical member 60a. In this embodiment, the opening 81d is provided on the opposite side of the second flow path 313b with respect to the flow path 315. The diameter of the flow path 315 is larger than that of the opening 81d, and the other end of the flow path 315 is connected to the partition wall 81 so as to surround the opening 81d. When viewed along the direction of travel of the pulsed laser light, the opening 81d, the communication portion between the opening 81d and the flow path 315, the flow path 315, and the internal space of the cylindrical member 60a overlap with the window 31a. Flow path 315 allows a portion of the laser gas flowing from second flow path 313b along the outer peripheral surface of tubular member 60a as described above to flow toward window 31a via the internal space of tubular member 60a. Flow path 315 also allows another portion of the laser gas to flow into internal space 305 via opening 81d. Flow path 315 also allows laser gas that bounces off window 31a and returns to flow path 315 via tubular member 60a to flow into internal space 305 via opening 81d. Flow path 313 as described above communicates with second flow path 313b on the front wall surface side of housing 30 rather than the partition wall 81 side. In this embodiment, openings 81b and 81c are not provided in partition wall 81, so opening 81d is the second opening of partition wall 81.

[0089] In the flow path 313 of this embodiment, the laser gas is caused to flow in the order of first flow path 313a and second flow path 313b by the second fan 311. At the other end of second flow path 313b, the laser gas flows into flow path 315 along the outer circumferential surface of tubular member 60a in the direction of propagation of the pulsed laser light. A portion of the laser gas flowing into flow path 315 passes through opening 81d and flows into internal space 305. Furthermore, because the diameter of flow path 315 is larger than that of opening 81d as described above, another portion of the laser gas collides with the wall surface of partition wall 81 between the circumferential surface of flow path 315 and the edge of opening 81d. Due to the collision, the laser gas flows through flow path 315 and tubular member 60a to window 31a. Therefore, flow path 315, which is in communication with second flow path 313b, causes laser gas to flow to window 31a via tubular member 60a provided in second flow path 313b. Therefore, second flow path 313b causes a portion of the laser gas to flow in a direction away from window 31a via flow path 315 and opening 81d, and causes a portion of the laser gas to flow toward window 31a via flow path 315. The laser gas in flow path 315 hits window 31a. The laser gas that hits window 31a is bounced off window 31a. Flow path 315 causes the laser gas that bounces off window 31a to flow in a direction away from window 31a, specifically, the laser gas to flow into internal space 305 via opening 81d.

[0090] 4.2 Actions and Effects In the chamber apparatus CH of the present embodiment, the flow paths 313 and 315 are arranged in the internal space 301. This may eliminate the need to provide the openings 81b and 81c in the partition wall 81. Furthermore, since the flow paths 313 and 315 are not arranged in the internal space 305, it is possible to prevent the flow of gas caused by the cross flow fan 46 from being disturbed by the flow paths 313 and 315.

[0091] The above description is intended to be illustrative rather than limiting. Thus, it will be apparent to one skilled in the art that modifications can be made to the disclosed embodiments without departing from the scope of the claims. It will also be apparent to one skilled in the art that the disclosed embodiments can be used in combination. Terms used throughout this specification and claims should be construed as "open ended" unless expressly stated otherwise. For example, words such as "comprise," "have," "comprise," and "equip" should be construed as meaning "without excluding the presence of elements other than those listed." In addition, the modifier "a" should be construed as meaning "at least one" or "one or more." In addition, the term "at least one of A, B, and C" should be construed as "A," "B," "C," "A+B," "A+C," "B+C," or "A+B+C," and should also be construed as including combinations other than "A," "B," and "C."

Claims

1. a housing that contains laser gas; a pair of discharge electrodes disposed opposite each other in the internal space of the housing, the discharge electrodes generating light from the laser gas when a voltage is applied thereto; a window disposed on a wall surface of the housing and through which the light passes; a first fan disposed in the internal space and configured to cause the laser gas to flow between the pair of discharge electrodes; a filter disposed in the internal space; a second fan that rotates together with the first fan by a driving force from a driving source of the first fan; a fan-side flow path that is provided in the internal space, the laser gas filtered by the filter flows by the second fan, and causes a portion of the laser gas to flow in a direction away from the window; a window-side flow path that is provided in the internal space, communicates with the fan-side flow path, and causes the laser gas that is caused to flow from the fan-side flow path by the second fan to flow toward the window; Equipped with Chamber device.

2. 2. The chamber apparatus according to claim 1, a partition wall provided between the wall surface on which the window is provided and the discharge electrode, the partition wall dividing the internal space into a window-side internal space in contact with the wall surface on which the window is provided and an electrode-side internal space in which the discharge electrode is located and which is larger than the window-side internal space, the fan-side flow path is provided between the window-side internal space and the electrode-side internal space through the partition wall, The window-side flow path is provided in the window-side internal space.

3. 3. The chamber apparatus according to claim 2, The fan side flow path is a first flow path provided in the window-side internal space, into which the laser gas in the electrode-side internal space flows via a first opening in the partition wall; a second flow path provided in the electrode-side internal space, into which the laser gas from the first flow path flows via a second opening of the partition wall; a third flow path provided in the window-side internal space, into which the laser gas from the second flow path flows via a third opening of the partition wall and which causes the laser gas to flow into the window-side flow path; Includes.

4. 4. The chamber apparatus according to claim 3, The second fan is disposed in the third flow path.

5. 4. The chamber apparatus according to claim 3, The filter covers the first opening in the electrode-side internal space.

6. 4. The chamber apparatus according to claim 3, a cylindrical member disposed in the window-side flow path, the cylindrical member includes a plurality of plate members that are arranged in an internal space of the cylindrical member and have continuous openings; The plate members are arranged in parallel at intervals in the traveling direction of the light.

7. 4. The chamber apparatus according to claim 3, The third flow path causes the laser gas to flow into the electrode-side internal space via a fourth opening in the partition wall.

8. 8. The chamber apparatus according to claim 7, When viewed along the direction in which the light travels, the fourth opening, the communication portion between the fourth opening and the third flow path, the communication portion between the third flow path and the window-side flow path, and the window-side flow path overlap with the window.

9. 2. The chamber apparatus according to claim 1, a partition wall provided between the wall surface on which the window is provided and the discharge electrode, The fan-side flow path and the window-side flow path are provided in a window-side internal space between the partition wall and the wall surface on which the window is provided.

10. 10. The chamber apparatus of claim 9, The second fan is disposed in the fan-side flow path.

11. 10. The chamber apparatus of claim 9, the laser gas in the electrode-side internal space, in which the discharge electrode is located, on the opposite side of the partition wall from the window-side internal space, flows into the fan-side flow path via a first opening in the partition wall; The filter covers the first opening in the electrode-side internal space.

12. 10. The chamber apparatus of claim 9, a cylindrical member disposed in the fan-side flow path, the cylindrical member includes a plurality of plate members that are arranged in an internal space of the cylindrical member and have continuous openings; The plate members are arranged in parallel at intervals in the traveling direction of the light.

13. 10. The chamber apparatus of claim 9, The fan-side flow path flows the laser gas through the window-side flow path and the second opening of the partition wall into the electrode-side internal space where the discharge electrode is located on the opposite side of the partition wall from the window-side internal space.

14. 2. The chamber apparatus according to claim 1, The second fan is connected to a drive shaft of the first fan and rotates with the rotation of the drive shaft.

15. 2. The chamber apparatus according to claim 1, The second fan is a centrifugal fan.

16. 2. The chamber apparatus according to claim 1, The second fan is a sirocco fan.

17. A gas laser apparatus including a chamber apparatus, The chamber device is a housing that contains laser gas; a pair of discharge electrodes disposed opposite each other in the internal space of the housing, the discharge electrodes generating light from the laser gas when a voltage is applied thereto; a window disposed on a wall surface of the housing and through which the light passes; a first fan disposed in the internal space and configured to cause the laser gas to flow between the pair of discharge electrodes; a filter disposed in the internal space; a second fan that rotates together with the first fan by a driving force from a driving source of the first fan; a fan-side flow path that is provided in the internal space, the laser gas filtered by the filter flows by the second fan, and causes a portion of the laser gas to flow in a direction away from the window; a window-side flow path that is provided in the internal space, communicates with the fan-side flow path, and causes the laser gas that is caused to flow from the fan-side flow path by the second fan to flow toward the window; Equipped with.

18. 18. The gas laser apparatus of claim 17, The gas laser device is an excimer laser device.

19. A method for manufacturing an electronic device, comprising: a housing that contains laser gas; a pair of discharge electrodes disposed opposite each other in the internal space of the housing, the discharge electrodes generating light from the laser gas when a voltage is applied thereto; a window disposed on a wall surface of the housing and through which the light passes; a first fan disposed in the internal space and configured to cause the laser gas to flow between the pair of discharge electrodes; a filter disposed in the internal space; a second fan that rotates together with the first fan by a driving force from a driving source of the first fan; a fan-side flow path that is provided in the internal space, the laser gas filtered by the filter flows by the second fan, and causes a portion of the laser gas to flow in a direction away from the window; a window-side flow path that is provided in the internal space, communicates with the fan-side flow path, and causes the laser gas that is caused to flow from the fan-side flow path by the second fan to flow toward the window; generating laser light by a gas laser apparatus having a chamber apparatus comprising: outputting the laser light to an exposure device; exposing the laser light onto a photosensitive substrate in the exposure apparatus to manufacture an electronic device. A method for manufacturing an electronic device, comprising:

20. 20. The method of manufacturing an electronic device according to claim 19, comprising: The gas laser device is an excimer laser device.

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