Substrate processing apparatus and substrate processing method

Abstract

To provide a substrate processing apparatus and a substrate processing method, capable of highly accurately identifying processing liquid in a processing liquid supply unit.SOLUTION: A substrate processing apparatus 100 includes a nozzle 136, a processing liquid supply unit 200, a near-infrared light source 140, a near-infrared imaging unit 150, and a control unit 102. The nozzle 136 supplies processing liquid onto an upper surface Wa of a substrate W. The processing liquid supply unit 200 supplies multiple types of processing liquid to the nozzle 136. The near-infrared light source 140 irradiates a region including at least a part of the processing liquid supply unit 200 with near-infrared rays. The near-infrared imaging unit 150 generates a captured image obtained by capturing an image of the processing liquid irradiated with the near-infrared rays. The control unit 102 controls the processing liquid supply unit 200 and the near-infrared imaging unit 150. The control unit 102 identifies the type of the processing liquid in a region including at least a part of the processing liquid supply unit 200 on the basis of the captured image.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus and a substrate processing method. [Background technology]

[0002] A substrate processing apparatus that processes a substrate by supplying a processing liquid to the substrate is known (see, for example, Patent Document 1). Patent Document 1 describes a substrate processing apparatus that includes a multiple valve to which multiple types of processing liquid are supplied, and a processing liquid nozzle that supplies the processing liquid from the multiple valve to the substrate. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2023-4684 Summary of the Invention [Problem to be solved by the invention]

[0004] In a substrate processing apparatus such as that described in Patent Document 1, for example, when switching the type of processing liquid supplied from the multiple valve to the processing liquid nozzle, the open / close state of the valve of the multiple valve connected to the processing liquid supply source is changed. In this case, it is difficult to confirm whether the processing liquid in the flow path of the multiple valve has been switched. Specifically, since the processing liquid used in substrate processing is generally transparent, a general CCD camera cannot detect the processing liquid. As a result, it may not be possible to accurately identify the processing liquid in the multiple valve.

[0005] The present invention has been made in view of the above-mentioned problems, and its object is to provide a substrate processing apparatus and a substrate processing method that are capable of identifying the processing liquid in a processing liquid supply unit with high accuracy. [Means for solving the problem]

[0006] According to one aspect of the present invention, a substrate processing apparatus includes a substrate holding unit, a processing liquid nozzle, a processing liquid supply unit, at least one near-infrared light source, a near-infrared imaging unit, and a controller. The substrate holding unit holds a substrate. The processing liquid nozzle supplies a processing liquid to an upper surface of the substrate. The processing liquid supply unit supplies multiple types of processing liquid to the processing liquid nozzle. The at least one near-infrared light source irradiates an area including at least a portion of the processing liquid supply unit with near-infrared light. The near-infrared imaging unit generates a captured image of the processing liquid irradiated with near-infrared light from the near-infrared light source. The controller controls the processing liquid supply unit and the near-infrared imaging unit. The controller identifies the type of processing liquid in the area including at least a portion of the processing liquid supply unit based on the captured image.

[0007] In one embodiment, the control unit controls the processing liquid supply unit to switch the type of processing liquid to be supplied to the processing liquid nozzle.

[0008] In one embodiment, the control unit controls the processing liquid supply unit based on the result of identifying the type of processing liquid.

[0009] In one embodiment, the processing liquid supply unit includes a plurality of upstream pipes, a common pipe, and a downstream pipe. The plurality of upstream pipes respectively pass the plurality of processing liquids. The common pipe is connected to downstream ends of the plurality of upstream pipes. The downstream pipe has an upstream end connected to the common pipe and supplies the processing liquid to the processing liquid nozzle.

[0010] In one embodiment, the near-infrared light source irradiates an area including the common pipe with near-infrared light, and the control unit identifies the type of the processing liquid in the area including the common pipe based on the captured image.

[0011] In one embodiment, the common pipe is formed by a multiple valve.

[0012] In one embodiment, the processing liquid supply unit has a discharge pipe whose upstream end is connected to the common pipe and which discharges the processing liquid.

[0013] In one embodiment, the near-infrared light source irradiates an area including the discharge pipe with near-infrared light, and the control unit identifies the type of the treatment liquid in the area including the discharge pipe based on the captured image.

[0014] In one embodiment, the control unit controls the processing liquid supply unit to supply a first processing liquid to the processing liquid nozzle via the common pipe, then supply the first processing liquid to the discharge pipe via the common pipe, and then supply a second processing liquid to the discharge pipe via the common pipe, and when it detects based on the captured image that the processing liquid in the common pipe or the discharge pipe has been switched from the first processing liquid to the second processing liquid, supply the second processing liquid to the processing liquid nozzle via the common pipe.

[0015] In one embodiment, the at least one near-infrared light source is provided in plurality. The near-infrared light sources emit near-infrared light having different peak wavelengths. The control unit acquires type information indicating the type of the treatment liquid, and changes the near-infrared light source that irradiates an area including at least a portion of the treatment liquid supply unit based on the acquired type information.

[0016] According to another aspect of the present invention, a substrate processing method includes steps of holding a substrate and rotating the substrate, supplying multiple types of processing liquid from a processing liquid supply unit to a processing liquid nozzle and supplying the processing liquid from the processing liquid nozzle to an upper surface of the substrate, the step of supplying the processing liquid includes steps of irradiating an area including at least a portion of the processing liquid supply unit with near-infrared rays, generating a captured image of the processing liquid being irradiated with the near-infrared rays, and identifying the type of the processing liquid in the area including at least a portion of the processing liquid supply unit based on the captured image.

[0017] In one embodiment, in the step of supplying the processing liquid, the type of the processing liquid supplied to the processing liquid nozzle is switched.

[0018] In one embodiment, in the step of supplying the treatment liquid, the treatment liquid supply unit is controlled based on the result of identifying the type of the treatment liquid.

[0019] In one embodiment, the processing liquid supply unit includes a plurality of upstream pipes, a common pipe, and a downstream pipe. The plurality of upstream pipes respectively pass the plurality of processing liquids. The common pipe is connected to downstream ends of the plurality of upstream pipes. The downstream pipe has an upstream end connected to the common pipe and supplies the processing liquid to the processing liquid nozzle.

[0020] In one embodiment, the step of irradiating with near-infrared rays irradiates an area including the common pipe with near-infrared rays, and the step of identifying the type of the processing liquid in the area including the common pipe is performed based on the captured image.

[0021] In one embodiment, the common pipe is formed by a multiple valve.

[0022] In one embodiment, the processing liquid supply unit has a discharge pipe whose upstream end is connected to the common pipe and which discharges the processing liquid.

[0023] In one embodiment, the step of irradiating with near-infrared rays irradiates an area including the discharge pipe with near-infrared rays, and the step of identifying the type of the treatment liquid in the area including the discharge pipe is performed based on the captured image.

[0024] In one embodiment, in the process of supplying the processing liquid, a first processing liquid is supplied to the processing liquid nozzle via the common pipe, and then the first processing liquid is supplied to the discharge pipe via the common pipe, and then a second processing liquid is supplied to the discharge pipe via the common pipe, and when it is detected based on the captured image that the processing liquid in the common pipe or the discharge pipe has been switched from the first processing liquid to the second processing liquid, the second processing liquid is supplied to the processing liquid nozzle via the common pipe.

[0025] In one embodiment, the process of supplying the treatment liquid includes a process of acquiring type information indicating the type of the treatment liquid, and a process of changing the peak wavelength of the near-infrared light irradiating an area including at least a portion of the treatment liquid supply section based on the acquired type information. [Effects of the Invention]

[0026] According to the present invention, it is possible to provide a substrate processing apparatus and a substrate processing method that are capable of identifying the processing liquid in the processing liquid supply unit with high accuracy. [Brief explanation of the drawings]

[0027] [Figure 1] 1 is a schematic plan view of a substrate processing apparatus according to an embodiment of the present invention; [Figure 2] FIG. 2 is a schematic view of a substrate processing unit in the substrate processing apparatus. [Figure 3] FIG. 2 is a block diagram of the substrate processing apparatus. [Figure 4] FIG. 2 is a flow chart of a substrate processing method according to the present embodiment. [Figure 5] 2 is a schematic diagram illustrating a configuration of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. [Figure 6] FIG. 1 is a flow chart showing a substrate processing process. [Figure 7] 2 is a schematic diagram illustrating a configuration of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. [Figure 8] 2 is a schematic diagram illustrating a configuration of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. [Figure 9]2 is a schematic diagram illustrating a configuration of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. [Figure 10] 2 is a schematic diagram illustrating a configuration of a processing liquid supply unit of the substrate processing apparatus according to the present embodiment. FIG. [Figure 11] 1 is a schematic diagram of a substrate processing unit in a substrate processing apparatus equipped with a plurality of near-infrared light sources. DETAILED DESCRIPTION OF THE INVENTION

[0028] Hereinafter, embodiments of a substrate processing apparatus and a substrate processing method according to the present invention will be described with reference to the drawings. In the drawings, identical or corresponding parts are designated by the same reference numerals, and description thereof will not be repeated. In this specification, to facilitate understanding of the invention, mutually orthogonal X-, Y-, and Z-axes may be described. Typically, the X- and Y-axes are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0029] First, a substrate processing apparatus 100 according to this embodiment will be described with reference to Fig. 1. Fig. 1 is a schematic plan view of the substrate processing apparatus 100.

[0030] 1, the substrate processing apparatus 100 processes a substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of etching, surface treatment, property imparting, treatment film formation, removal of at least a portion of a film, and cleaning on the substrate W.

[0031] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W has a substantially circular disk shape. Here, the substrate processing apparatus 100 processes the substrates W one by one.

[0032] 1, the substrate processing apparatus 100 includes a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid box 10B, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a controller 101. The controller 101 controls the load ports LP, the indexer robot IR, the center robot CR, and the substrate processing units 110.

[0033] Each load port LP accommodates a plurality of stacked substrates W. The indexer robot IR transports substrates W between the load port LP and the center robot CR. Note that a placement stage (path) on which the substrate W is temporarily placed may be provided between the indexer robot IR and the center robot CR, and the device may be configured so that the substrate W is indirectly transferred between the indexer robot IR and the center robot CR via the placement stage. The center robot CR transports substrates W between the indexer robot IR and the substrate processing units 110. Each of the substrate processing units 110 processes the substrate W by discharging a processing liquid onto the substrate W. The fluid cabinet 10A contains a processing liquid. Note that the fluid cabinet 10A may contain a gas.

[0034] The substrate processing units 110 form a plurality of towers TW (four towers TW in FIG. 1) arranged to surround the center robot CR in a plan view. Each tower TW includes vertically stacked substrate processing units 110 (three substrate processing units 110 in FIG. 1). Each fluid box 10B corresponds to a plurality of towers TW. The processing liquid in the fluid cabinet 10A is supplied to all of the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via one of the fluid boxes 10B. Furthermore, the gas in the fluid cabinet 10A is supplied to all of the substrate processing units 110 included in the tower TW corresponding to the fluid box 10B via one of the fluid boxes 10B.

[0035] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose computer.

[0036] The storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may include removable media. The control unit 102 executes computer programs stored in the storage unit 104 to perform substrate processing operations.

[0037] The storage unit 104 stores data. The data includes recipe data. The recipe data includes information indicating a plurality of recipes. Each of the plurality of recipes defines the processing content and processing procedure for the substrate W.

[0038] The storage unit 104 may also store the brightness value or luminosity of the reference treatment liquid, or may store a reference image obtained by capturing an image of the reference treatment liquid.

[0039] Next, the substrate processing unit 110 in the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 2. Fig. 2 is a schematic diagram of the substrate processing unit 110 in the substrate processing apparatus 100.

[0040] The substrate processing unit 110 includes a chamber 112, a substrate holding part 120, a nozzle 136, a processing liquid supply part 200, a near-infrared light source 140, and a near-infrared imaging part 150. The chamber 112 accommodates the substrate holding part 120, the nozzle 136, and at least a part of the processing liquid supply part 200, the near-infrared light source 140, and the near-infrared imaging part 150. The nozzle 136 is an example of the "processing liquid nozzle" of the present invention.

[0041] The chamber 112 has a generally box-like shape with an internal space. The chamber 112 accommodates the substrates W. Here, the substrate processing unit 110 is a single-wafer type that processes the substrates W one by one, and the chamber 112 accommodates the substrates W one by one. The substrates W are accommodated in the chamber 112 and are processed in the chamber 112.

[0042] The substrate holding unit 120 holds the substrate W. The substrate holding unit 120 holds the substrate W horizontally so that the upper surface (front surface) Wa of the substrate W faces upward and the lower surface (back surface) Wb of the substrate W faces vertically downward. The substrate holding unit 120 also rotates the substrate W while holding it. The upper surface Wa of the substrate W may be flattened. Alternatively, the upper surface Wa of the substrate W may be provided with a device surface or a pillar-shaped stacked body with a recess. The substrate holding unit 120 rotates the substrate W while holding it.

[0043] For example, the substrate holding unit 120 may be a clamping type that clamps the edge of the substrate W. Alternatively, the substrate holding unit 120 may have any mechanism that holds the substrate W from its lower surface Wb. For example, the substrate holding unit 120 may be a vacuum type. In this case, the substrate holding unit 120 holds the substrate W horizontally by adsorbing the central portion of the lower surface Wb of the substrate W, which is the surface on which devices are not formed, to its upper surface. Alternatively, the substrate holding unit 120 may be a combination of a clamping type that brings multiple chuck pins into contact with the peripheral edge surface of the substrate W, and a vacuum type.

[0044] For example, the substrate holder 120 includes a spin base 121, a chuck member 122, a shaft 123, an electric motor 124, and a housing 125. The chuck member 122 is provided on the spin base 121. The chuck member 122 chucks the substrate W. Typically, the spin base 121 is provided with a plurality of chuck members 122.

[0045] The shaft 123 is a hollow shaft. The shaft 123 extends vertically along the rotation axis Ax. The spin base 121 is coupled to the upper end of the shaft 123. The substrate W is placed above the spin base 121.

[0046] The spin base 121 is disk-shaped. The chuck member 122 supports the substrate W horizontally. The shaft 123 extends downward from the center of the spin base 121. The electric motor 124 applies a rotational force to the shaft 123. The electric motor 124 rotates the shaft 123 in a rotational direction, thereby rotating the substrate W and the spin base 121 around the rotation axis Ax. The housing 125 surrounds the shaft 123 and the electric motor 124.

[0047] The nozzle 136 ejects the processing liquid onto the upper surface Wa of the substrate W. Specifically, the nozzle 136 supplies the processing liquid onto the upper surface Wa of the substrate W held and rotated by the substrate holder 120. The nozzle 136 also supplies multiple types of processing liquid to the substrate W. In this embodiment, the nozzle 136 switches between the types of processing liquid to supply. The nozzle 136 is preferably configured to be movable relative to the substrate W. The nozzle 136 is made of resin. The nozzle 136 is not particularly limited, but is formed of, for example, PFA (perfluoroalkoxyalkane) or PTFE (polytetrafluoroethylene).

[0048] The processing liquid may be an etching liquid for etching the substrate W. Examples of the etching liquid include hydrofluoric nitric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3)), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of etching liquid is not particularly limited, and may be, for example, acidic or alkaline.

[0049] The treatment liquid may also contain hydrogen peroxide, SC1 (ammonia-hydrogen peroxide mixture), SC2 (hydrochloric acid-hydrogen peroxide mixture), or aqua regia (a mixture of concentrated hydrochloric acid and concentrated nitric acid).

[0050] Alternatively, the processing liquid may be a rinse liquid, such as deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water, and reduced water (hydrogen water).

[0051] Alternatively, the treatment liquid may be an organic solvent. Typically, the volatility of the organic solvent is higher than that of the rinse liquid. Examples of organic solvents include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoroether (HFE), propylene glycol monoethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0052] The processing liquid supply unit 200 supplies a processing liquid to the nozzle 136. In this embodiment, the processing liquid supply unit 200 supplies a plurality of types of processing liquid to the nozzle 136. In this embodiment, the processing liquid supply unit 200 switches the type of processing liquid to be supplied to the nozzle 136.

[0053] The processing liquid supply unit 200 has an upstream pipe 210a, an upstream pipe 210b, a common pipe 220, a downstream pipe 230, and a discharge pipe 240. At least a portion of the upstream pipe 210a, at least a portion of the upstream pipe 210b, a portion of the common pipe 220, a portion of the downstream pipe 230, and at least a portion of the discharge pipe 240 are disposed inside the fluid box 10B.

[0054] A treatment liquid flows through the upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, and the discharge pipe 240. A plurality of types of treatment liquid flows through the upstream pipe 210a and the upstream pipe 210b, respectively. In other words, different types of treatment liquid flow through the upstream pipe 210a and the upstream pipe 210b, respectively. In this embodiment, for example, carbonated water (H2CO3) from a supply source flows through the upstream pipe 210a. Also, in this embodiment, for example, SC2 from a supply source flows through the upstream pipe 210b.

[0055] The downstream end of the upstream pipe 210 a and the downstream end of the upstream pipe 210 b are connected to a common pipe 220 .

[0056] The treatment liquid from the upstream pipe 210a and the upstream pipe 210b flows through the common pipe 220. The treatment liquid from the upstream pipe 210a and the upstream pipe 210b may flow through the common pipe 220 simultaneously or at different times. In this embodiment, the treatment liquid from the upstream pipe 210b flows through the common pipe 220, and then the treatment liquid from the upstream pipe 210a flows through the common pipe 220.

[0057] The downstream pipe 230 is connected to the common pipe 220. Specifically, the upstream end of the downstream pipe 230 is connected to the common pipe 220. The processing liquid from the common pipe 220 flows through the downstream pipe 230. The downstream end of the downstream pipe 230 is connected to the nozzle 136. The downstream pipe 230 supplies the processing liquid from the common pipe 220 to the nozzle 136. As the processing liquid flows through the nozzle 136, the nozzle 136 ejects the processing liquid onto the upper surface Wa of the substrate W.

[0058] The discharge pipe 240 is connected to the common pipe 220. Specifically, the upstream end of the discharge pipe 240 is connected to the common pipe 220. The processing liquid from the common pipe 220 flows through the discharge pipe 240. Furthermore, the downstream end of the discharge pipe 240 is connected to, for example, a processing liquid tank 290. For example, when switching the processing liquid to be supplied to the nozzle 136, the processing liquid is supplied to the discharge pipe 240 from the common pipe 220.

[0059] The processing liquid supply unit 200 also includes an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253. The upstream valve 251a opens and closes the flow path in the upstream pipe 210a. The upstream valve 251b opens and closes the flow path in the upstream pipe 210b. The downstream valve 252 opens and closes the flow path in the downstream pipe 230. The discharge valve 253 opens and closes the flow path in the discharge pipe 240. The upstream valves 251a, 251b, downstream valve 252, and discharge valve 253 are not particularly limited, and may be, for example, air valves. Note that the upstream valves 251a, 251b, downstream valve 252, and discharge valve 253 may be valves other than air valves, and may include, for example, needle valves that can change the flow rate and / or speed controllers that can change the opening and closing speed.

[0060] The processing liquid supply unit 200 is made of resin. The processing liquid supply unit 200 transmits near-infrared rays emitted from the near-infrared light source 140. Specifically, the upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, and the discharge pipe 240 are made of resin and transmit the near-infrared rays emitted from the near-infrared light source 140. In this embodiment, the upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, the discharge pipe 240, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 are made of resin and transmit the near-infrared rays emitted from the near-infrared light source 140. The upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, the exhaust pipe 240, the upstream valve 251a, the upstream valve 251b, the downstream valve 252 and the exhaust valve 253 are formed of, for example, PFA or PTFE, although not particularly limited thereto.

[0061] The processing liquid supply unit 200 has a movement mechanism 138. The movement mechanism 138 moves the nozzle 136 in the horizontal and vertical directions. Specifically, the movement mechanism 138 moves the nozzle 136 in the circumferential direction around a rotation axis extending in the vertical direction. The movement mechanism 138 also raises and lowers the nozzle 136 in the vertical direction.

[0062] The movement mechanism 138 has an arm 138a, a shaft 138b, and a drive unit 138c. The arm 138a extends horizontally. The nozzle 136 is disposed at the tip of the arm 138a. The nozzle 136 is disposed at the tip of the arm 138a in a position that allows the nozzle 136 to supply a processing liquid toward the upper surface Wa of the substrate W held by the chuck member 122. More specifically, the nozzle 136 is coupled to the tip of the arm 138a and protrudes downward from the arm 138a. The base end of the arm 138a is coupled to the shaft 138b. The shaft 138b extends vertically.

[0063] The drive unit 138c has a rotation drive mechanism and an elevation drive mechanism. The rotation drive mechanism of the drive unit 138c rotates the shaft 138b around the rotation axis, causing the arm 138a to pivot along a horizontal plane around the shaft 138b. As a result, the nozzle 136 moves along the horizontal plane. More specifically, the nozzle 136 moves in the circumferential direction around the shaft 138b. The rotation drive mechanism of the drive unit 138c includes, for example, a motor that can rotate forward and backward.

[0064] The lifting drive mechanism of the drive unit 138c raises and lowers the shaft 138b in the vertical direction. The lifting drive mechanism of the drive unit 138c raises and lowers the shaft 138b, thereby raising and lowering the nozzle 136 in the vertical direction. The lifting drive mechanism of the drive unit 138c has a drive source such as a motor and a lifting mechanism, and the drive source drives the lifting mechanism to raise or lower the shaft 138b. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

[0065] The near-infrared light source 140 emits at least near-infrared light. The near-infrared light source 140 irradiates an area including at least a portion of the processing liquid supply unit 200 with near-infrared light. In this embodiment, the near-infrared light source 140 irradiates an area outside the chamber 112 and including at least a portion of the processing liquid supply unit 200 with near-infrared light. For example, the near-infrared light source 140 may irradiate an area including all or a portion of the common pipe 220 with near-infrared light. Furthermore, for example, the near-infrared light source 140 may irradiate an area including a portion of the downstream pipe 230 with near-infrared light. Furthermore, for example, the near-infrared light source 140 may irradiate an area including all of the common pipe 220 and a portion of the downstream pipe 230 with near-infrared light.

[0066] For example, the near-infrared light source 140 emits near-infrared light having a wavelength in the range of 800 nm to 2.5 μm. Typically, the near-infrared light source 140 emits near-infrared light having a wavelength in the range of at least 800 nm to 1.5 μm. Note that the near-infrared light source 140 may emit visible light together with the near-infrared light.

[0067] For example, the near-infrared light emitted from the near-infrared light source 140 travels linearly along the optical axis. Alternatively, the near-infrared light emitted from the near-infrared light source 140 travels while diverging from the optical axis. The near-infrared light source 140 is preferably disposed so that the optical axis of the near-infrared light source 140 passes through the treatment liquid supply unit 200. In this embodiment, the near-infrared light source 140 is disposed so that the optical axis of the near-infrared light source 140 passes through the common pipe 220 or the downstream pipe 230.

[0068] The near-infrared imaging unit 150 has a plurality of pixels. The near-infrared imaging unit 150 is sensitive to at least near-infrared light. The near-infrared imaging unit 150 captures an image of an area including at least a part of the processing liquid supply unit 200 by receiving components of near-infrared light emitted from the near-infrared light source 140 that are transmitted and / or reflected by the processing liquid supply unit 200, etc., to generate a captured image. Therefore, the near-infrared imaging unit 150 can capture an image of the processing liquid irradiated with near-infrared light emitted from the near-infrared light source 140 to generate a captured image.

[0069] The near-infrared imaging unit 150 images an area including at least a portion of the processing liquid supply unit 200. In this embodiment, the near-infrared imaging unit 150 images an area outside the chamber 112 and including at least a portion of the processing liquid supply unit 200. For example, the near-infrared imaging unit 150 may image an area including all or a portion of the common pipe 220. Furthermore, for example, the near-infrared imaging unit 150 may image an area including a portion of the downstream pipe 230. Furthermore, for example, the near-infrared imaging unit 150 may image an area including all of the common pipe 220 and a portion of the downstream pipe 230. Note that the near-infrared imaging unit 150 may image an area including the entire interior of the chamber 112. The area imaged by the near-infrared imaging unit 150 does not have to coincide with the area irradiated by the near-infrared light source 140.

[0070] In the near-infrared imaging section 150, the frame rate may be 30 fps or 60 fps, or may be 120 fps.

[0071] The near-infrared imaging unit 150 may include a SWIR (Short Wavelength Infrared) image sensor. In this case, the near-infrared imaging unit 150 detects near-infrared light having a wavelength in the range of 800 nm to 2.5 μm, for example.

[0072] The near-infrared imaging section 150 may be sensitive to not only near-infrared light but also visible light, or may switch between receiving near-infrared light and visible light.

[0073] The near-infrared imaging unit 150 captures an image of the surroundings centered on the imaging optical axis. Typically, the imaging optical axis is located at the center of the captured image. For example, the center of the image captured by the near-infrared imaging unit 150 is located at the processing liquid supply unit 200. Furthermore, for example, the center of the image captured by the near-infrared imaging unit 150 is located at the common pipe 220. In this case, the imaging optical axis of the near-infrared imaging unit 150 is located at the common pipe 220. Alternatively, the center of the image captured by the near-infrared imaging unit 150 may be located at the downstream pipe 230.

[0074] The near-infrared imaging unit 150 generates a captured image of at least a portion of the processing liquid supply unit 200. It is preferable that the captured image can identify the processing liquid in at least a portion of the processing liquid supply unit 200. For example, it is preferable that the captured image can identify multiple types of processing liquid in at least a portion of the processing liquid supply unit 200. It is also preferable that the captured image can identify the position of the outer edge of the processing liquid in at least a portion of the processing liquid supply unit 200.

[0075] When the fluid box 10B is viewed from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 pass through at least a part of the treatment liquid supply unit 200. When the fluid box 10B is viewed from above, the near-infrared light source 140 and the near-infrared imaging unit 150 may be disposed on opposite sides of the treatment liquid supply unit 200. When the fluid box 10B is viewed from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 may be coincident or parallel. When the fluid box 10B is viewed from above, the optical axis of the near-infrared light source 140 and the imaging optical axis of the near-infrared imaging unit 150 do not have to be parallel.

[0076] Here, the near-infrared light source 140 and the near-infrared image capturing section 150 are disposed inside the fluid box 10 B. The near-infrared light source 140 and the near-infrared image capturing section 150 may be disposed fixedly relative to each other.

[0077] The near-infrared light source 140 and the near-infrared image capturing unit 150 may be movable relative to the substrate W. For example, the near-infrared light source 140 and the near-infrared image capturing unit 150 are preferably movable in the horizontal and / or vertical directions according to a movement mechanism controlled by the control unit 102. When the near-infrared light source 140 and the near-infrared image capturing unit 150 are moved, the near-infrared light source 140 and the near-infrared image capturing unit 150 may be movable independently of each other. Alternatively, the near-infrared light source 140 and the near-infrared image capturing unit 150 may be movable as a unit.

[0078] The processing liquid may contain organic substances. For example, in organic substances, bonds such as CH, CO, CN, and CF absorb specific wavelengths included in near-infrared rays. The amount of near-infrared rays absorbed at specific wavelengths is proportional to the amount of components having specific bonding groups. Therefore, the amount of specific components present on the substrate W can be measured based on the near-infrared rays reflected from the substrate W.

[0079] The substrate processing apparatus 100 further includes a cup 180. The cup 180 collects the processing liquid that has splashed from the substrate W. The cup 180 moves up and down. For example, the cup 180 moves up vertically to the side of the substrate W during the period in which the nozzle 136 supplies the processing liquid to the substrate W. In this case, the cup 180 collects the processing liquid that has splashed from the substrate W due to the rotation of the substrate W. Furthermore, when the period in which the nozzle 136 supplies the processing liquid to the substrate W ends, the cup 180 moves down vertically from the side of the substrate W.

[0080] As described above, the control device 101 includes the control unit 102 and the memory unit 104. The control unit 102 controls the substrate holder 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared image capture unit 150, and / or the cup 180. In one example, the control unit 102 controls the electric motor 124, the upstream valve 251 a, the upstream valve 251 b, the downstream valve 252, the discharge valve 253, the moving mechanism 138, the near-infrared light source 140, the near-infrared image capture unit 150, and / or the cup 180.

[0081] According to the substrate processing apparatus 100 of this embodiment, the near-infrared imaging unit 150 captures an image of the processing liquid irradiated with near-infrared light from the near-infrared light source 140. Specifically, the near-infrared imaging unit 150 captures an image of the processing liquid in at least a portion of the processing liquid supply unit 200. Typically, the processing liquid supply unit 200 is transparent and transmits visible light and near-infrared light. The processing liquid is transparent and transmits visible light. On the other hand, the processing liquid often exhibits relatively strong absorption in the near-infrared region. Therefore, the outer edge of the processing liquid can be identified in an image captured by the near-infrared imaging unit 150 of an area including at least a portion of the processing liquid supply unit 200. Specifically, the brightness or luminosity of the captured image is high in the portions of the captured image representing the upstream pipe 210a, the upstream pipe 210b, the common pipe 220, the downstream pipe 230, and the discharge pipe 240. On the other hand, the brightness or luminosity of the captured image is low in the portions of the captured image representing the processing liquid. Therefore, the outer edge of the processing liquid can be identified in the captured image.

[0082] Furthermore, different types of treatment liquids often exhibit unique absorption in the near-infrared region. Therefore, in the captured image of the treatment liquid in at least a portion of the treatment liquid supply unit 200 captured by the near-infrared imaging unit 150, the luminance or brightness of the treatment liquid varies depending on the type of treatment liquid. Therefore, the type of treatment liquid can be identified based on the luminance or brightness of the treatment liquid in the captured image.

[0083] Alternatively, since different treatment liquids exhibit different wavelengths of strong absorption, the near-infrared light source 140 may change the wavelength of the emitted near-infrared light, thereby making it possible to easily identify the outer edge and type of treatment liquid.

[0084] The substrate processing apparatus 100 of this embodiment is suitable for use in the manufacture of semiconductor devices having semiconductors. Typically, in semiconductor devices, conductive layers and insulating layers are stacked on a substrate. The substrate processing apparatus 100 is suitable for use in cleaning and / or processing (e.g., etching, changing characteristics, etc.) the conductive layers and / or insulating layers during the manufacture of semiconductor devices.

[0085] Next, a substrate processing apparatus 100 according to this embodiment will be described with reference to Figures 1 to 3. Figure 3 is a block diagram of the substrate processing apparatus 100.

[0086] 3 , the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared image capturing unit 150, and the cup 180. Specifically, the control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared image capturing unit 150, and the cup 180 by transmitting control signals to the indexer robot IR, the center robot CR, the substrate holding unit 120, the processing liquid supply unit 200, the near-infrared light source 140, the near-infrared image capturing unit 150, and the cup 180.

[0087] The memory unit 104 also stores computer programs and data. The data includes recipe data. The recipe data includes information indicating a plurality of recipes. Each of the plurality of recipes specifies the processing content, processing procedure, and substrate processing conditions for the substrate W. The control unit 102 executes the computer programs stored in the memory unit 104 to perform substrate processing operations.

[0088] The recipe data also includes type information indicating the type of processing liquid supplied from the supply source to the common pipe 220. The storage unit 104 also stores in advance data that associates the type of processing liquid with the brightness or luminance of the processing liquid in the reference image.

[0089] The control unit 102 controls the indexer robot IR to transfer the substrate W by the indexer robot IR.

[0090] The control unit 102 controls the center robot CR to transfer the substrate W by the center robot CR. For example, the center robot CR receives an unprocessed substrate W and transports the substrate W into one of the plurality of chambers 112. The center robot CR also receives a processed substrate W from the chamber 112 and transports the substrate W out.

[0091] The control unit 102 controls the substrate holding unit 120 to start rotation of the substrate W, change the rotation speed, and stop rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 120 to change the rotation speed of the substrate holding unit 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holding unit 120.

[0092] The control unit 102 controls the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 of the processing liquid supply unit 200 to switch the states of the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 between an open state and a closed state. For example, the control unit 102 controls the upstream valve 251a to open the upstream valve 251a, thereby allowing the processing liquid flowing in the upstream pipe 210a toward the common pipe 220 to pass. Furthermore, for example, the control unit 102 controls the upstream valve 251a to close the upstream valve 251a, thereby stopping the supply of the processing liquid flowing in the upstream pipe 210a toward the common pipe 220.

[0093] The control unit 102 controls the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 to change the treatment liquid supplied to the nozzle 136. Specifically, when changing the treatment liquid supplied to the nozzle 136 from SC2 to carbonated water, the control unit 102 opens the upstream valve 251b to supply SC2 to the common pipe 220, and opens the downstream valve 252 to supply SC2 from the common pipe 220 to the downstream pipe 230. Then, the control unit 102 closes the downstream valve 252 and opens the discharge valve 253 to supply SC2 from the common pipe 220 to the discharge pipe 240. Thereafter, the control unit 102 closes the upstream valve 251b and opens the upstream valve 251a to supply carbonated water to the common pipe 220. When the control unit 102 detects that the processing liquid in the common pipe 220 or the discharge pipe 240 has switched from SC2 to carbonated water, it closes the discharge valve 253 and opens the downstream valve 252, thereby supplying carbonated water to the nozzle 136 via the common pipe 220 and the downstream pipe 230.

[0094] The control unit 102 controls the movement mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136. Specifically, the control unit 102 controls the movement mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136 above the upper surface Wa of the substrate W. The control unit 102 also controls the movement mechanism 138 of the processing liquid supply unit 200 to move the nozzle 136 to a retracted position away from above the upper surface Wa of the substrate W.

[0095] The control unit 102 controls the near-infrared light source 140 and the near-infrared imaging unit 150 to capture an image of an area including at least a portion of the treatment liquid supply unit 200 and generate a captured image. The control unit 102 controls the near-infrared light source 140 to irradiate the area including at least a portion of the treatment liquid supply unit 200 with near-infrared light. The control unit 102 also controls the near-infrared imaging unit 150 to capture an image of an area including at least a portion of the treatment liquid supply unit 200 and generate a captured image.

[0096] For example, the control unit 102 controls the near-infrared light source 140 and the near-infrared image capturing unit 150 so that the near-infrared light source 140 emits near-infrared rays toward an area including at least a part of the treatment liquid supply unit 200, and the near-infrared image capturing unit 150 receives the near-infrared rays transmitted through or reflected by each member and measures the luminance value or brightness. Note that the control unit 102 may control the near-infrared light source 140 and the near-infrared image capturing unit 150 to move the near-infrared light source 140 and the near-infrared image capturing unit 150 relative to the treatment liquid supply unit 200.

[0097] The control unit 102 identifies the type of processing liquid in the captured image based on the luminance value or brightness in the captured image. The control unit 102 identifies the type of processing liquid in the captured image based on the luminance value or brightness in the captured image and the luminance value or brightness of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the captured image and the reference image.

[0098] Furthermore, the control unit 102 identifies the outer edge of the treatment liquid in the captured image. For example, the control unit 102 identifies the outer edge of the treatment liquid in the captured image based on the luminance value or brightness in the captured image. In one example, the control unit 102 identifies the outer edge of the treatment liquid in the captured image based on the luminance value or brightness in the captured image and the luminance value or brightness of a reference treatment liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the outer edge of the treatment liquid in the captured image based on the captured image and the reference image.

[0099] The control unit 102 may control the cup 180 to move the cup 180 relative to the substrate W. Specifically, the control unit 102 raises the cup 180 vertically upward to the side of the substrate W during the period in which the processing liquid supply unit 200 supplies the processing liquid to the substrate W. Furthermore, when the period in which the processing liquid supply unit 200 supplies the processing liquid to the substrate W ends, the control unit 102 lowers the cup 180 vertically downward from the side of the substrate W.

[0100] The substrate processing apparatus 100 of this embodiment is preferably used for forming semiconductor elements. For example, the substrate processing apparatus 100 is preferably used for processing a substrate W used as a semiconductor element having a stacked structure. The semiconductor element is a so-called 3D structure memory (storage device). As an example, the substrate W is preferably used as a NAND flash memory.

[0101] Next, the substrate processing method of this embodiment will be described with reference to Figures 1 to 4. Figure 4 is a flow diagram of the substrate processing method of this embodiment. Step SB is an example of the "step of rotating the substrate" of the present invention. Step SC is an example of the "step of supplying multiple types of processing liquids" of the present invention.

[0102] 4, in step SA, the substrate W is loaded into the substrate processing apparatus 100. Specifically, the substrate W is loaded into the chamber 112 of the substrate processing unit 110 via the indexer robot IR and the center robot CR.

[0103] In step SB, the substrate holding part 120 holds the substrate W. Specifically, when the substrate W is loaded into the chamber 112, it is held by the substrate holding part 120.

[0104] In step SC, the control unit 102 processes the substrate W. The substrate W is processed in the substrate processing unit 110. Typically, the substrate holder 120 holds and rotates the substrate W, the processing liquid supply unit 200 supplies the processing liquid to the nozzle 136, and the nozzle 136 supplies the processing liquid to the substrate W. The control unit 102 stops the supply of the processing liquid to the substrate W when a predetermined time has elapsed since the supply of the processing liquid to the substrate W started.

[0105] In this embodiment, in step SC, the control unit 102 switches between the types of processing liquid supplied from the processing liquid supply unit 200 to the nozzle 136. Specifically, the control unit 102 processes the substrate W with a first processing liquid (here, SC2). Thereafter, the control unit 102 switches the processing liquid from the first processing liquid to a second processing liquid (carbonated water), and processes the substrate W with the second processing liquid.

[0106] In this embodiment, the near-infrared light source 140 emits near-infrared light in step SC. At least a portion of the processing liquid supply unit 200 is irradiated with the near-infrared light emitted from the near-infrared light source 140. For example, the common pipe 220 of the processing liquid supply unit 200 is irradiated with the near-infrared light emitted from the near-infrared light source 140. The near-infrared image capturing unit 150 captures an image of a region including at least a portion of the processing liquid supply unit 200 irradiated with the near-infrared light. For example, the near-infrared image capturing unit 150 captures an image of the common pipe 220 irradiated with the near-infrared light. By capturing an image of a region including at least a portion of the processing liquid supply unit 200 irradiated with the near-infrared light from the near-infrared image capturing unit 150, it is possible to capture an image of the processing liquid with high accuracy even if the processing liquid in at least a portion of the processing liquid supply unit 200 is substantially transparent.

[0107] In the present embodiment, in step SC, the control unit 102 controls the near-infrared imaging unit 150 to generate an image of an area including at least a portion of the processing-liquid supply unit 200. In the present embodiment, when switching the processing liquid to be supplied to the processing-liquid supply unit 200, the control unit 102 causes the near-infrared imaging unit 150 to image an area including at least a portion of the processing-liquid supply unit 200. Specifically, the control unit 102 controls the near-infrared light source 140 to emit near-infrared light. The area including at least a portion of the processing-liquid supply unit 200 is irradiated with the near-infrared light emitted from the near-infrared light source 140. The control unit 102 also controls the near-infrared imaging unit 150 to image at least a portion of the area irradiated with the near-infrared light. Specifically, the control unit 102 images an area including at least a portion of the processing-liquid supply unit 200. By capturing an image of an area including at least a portion of the processing liquid supply section 200 irradiated with near-infrared light from the near-infrared imaging section 150, the processing liquid can be captured with high accuracy even if the processing liquid in at least a portion of the processing liquid supply section 200 is substantially transparent.

[0108] In this embodiment, in step SC, the control unit 102 identifies the position of the outer edge of the processing liquid in at least a part of the processing liquid supply unit 200 based on the captured image. The control unit 102 also identifies the type of processing liquid in at least a part of the processing liquid supply unit 200 based on the captured image. This makes it possible to detect whether the type of processing liquid in the processing liquid supply unit 200 has been switched.

[0109] In step SD, the control unit 102 stops the rotation of the substrate W by the substrate holding unit 120 and releases the substrate W from the substrate holding unit 120.

[0110] In step SE, the substrate W is unloaded from the substrate processing apparatus 100. Specifically, the substrate W is unloaded from the chamber 112 of the substrate processing unit 110 via the center robot CR and the indexer robot IR.

[0111] According to this embodiment, the control unit 102 controls the near-infrared imaging unit 150 to capture an image of an area including at least a part of the treatment liquid supply unit 200. In other words, the near-infrared imaging unit 150 captures an image of the treatment liquid being irradiated with near-infrared light from the near-infrared light source 140. Because the treatment liquid absorbs near-infrared light relatively strongly, the outer edge of the treatment liquid can be identified with high accuracy.

[0112] Furthermore, the control unit 102 uses the near-infrared imaging unit 150 to capture an image of the processing liquid in at least a portion of the processing liquid supply unit 200. Therefore, the captured image can identify the type of processing liquid in at least a portion of the processing liquid supply unit 200. Therefore, for example, when switching the type of processing liquid to be supplied to the nozzle 136, it can be confirmed whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0113] Next, the processing liquid supply unit 200 of the substrate processing apparatus 100 of this embodiment will be further described with reference to Fig. 5. Fig. 5 is a schematic diagram showing the configuration of the processing liquid supply unit 200 of the substrate processing apparatus 100 of this embodiment.

[0114] 5, the processing liquid supply unit 200 includes a multiple valve 300. The multiple valve 300 includes a base 310, an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253.

[0115] The base 310 has a common flow path 311 and upstream flow paths 312a, 312b, downstream flow paths 312c, and discharge flow paths 312d. The common flow path 311 extends in a substantially straight line. Both ends of the common flow path 311 are closed. The upstream flow paths 312a, 312b, downstream flow paths 312c, and discharge flow paths 312d are each connected to the common flow path 311. The upstream flow paths 312a, 312b, downstream flow paths 312c, and discharge flow paths 312d each extend in a direction intersecting the extension direction of the common flow path 311. The upstream flow paths 312a, 312b, downstream flow paths 312c, and discharge flow paths 312d are connected in this order from one end of the common flow path 311 to the other end. The upstream flow path 312a is connected to one end of the common flow path 311, and the discharge flow path 312d is connected to the other end of the common flow path 311.

[0116] The base 310 is made of resin and transmits near-infrared rays emitted from the near-infrared light source 140. The base 310 is not particularly limited, but is formed of, for example, PFA or PTFE.

[0117] In this embodiment, the processing liquid supply unit 200 includes an upstream tube 211a, an upstream tube 211b, a downstream tube 231, and a discharge tube 241. The upstream tube 211a constitutes the upstream piping 210a. The upstream tube 211b constitutes the upstream piping 210b. The downstream tube 231 constitutes the downstream piping 230. The discharge tube 241 constitutes the discharge piping 240.

[0118] The upstream tube 211a, the upstream tube 211b, the downstream tube 231, and the discharge tube 241 are made of resin and transmit near-infrared rays emitted from the near-infrared light source 140. The upstream tube 211a, the upstream tube 211b, the downstream tube 231, and the discharge tube 241 are not particularly limited, but are formed of, for example, PFA or PTFE.

[0119] One end (downstream end) of the upstream flow path 312a is connected to the common flow path 311. One end (downstream end) of the upstream tube 211a is connected to the other end (upstream end) of the upstream flow path 312a, and the other end (upstream end) of the upstream tube 211a is connected to a supply source. The flow path of the upstream tube 211a is in communication with the upstream flow path 312a.

[0120] One end (downstream end) of the upstream flow path 312b is connected to the common flow path 311. One end (downstream end) of the upstream tube 211b is connected to the other end (upstream end) of the upstream flow path 312b, and the other end (upstream end) of the upstream tube 211b is connected to a supply source. The flow path of the upstream tube 211b is in communication with the upstream flow path 312b.

[0121] One end (upstream end) of the downstream flow path 312c is connected to the common flow path 311. One end (upstream end) of the downstream tube 231 is connected to the other end (downstream end) of the downstream flow path 312c, and the other end (downstream end) of the downstream tube 231 is connected to the nozzle 136. The flow path of the downstream tube 231 communicates with the downstream flow path 312c.

[0122] One end (upstream end) of the discharge flow path 312d is connected to the common flow path 311. One end (upstream end) of the discharge tube 241 is connected to the other end (downstream end) of the discharge flow path 312d, and the other end (downstream end) of the discharge tube 241 is connected to the treatment liquid tank 290. The flow path of the discharge tube 241 is in communication with the discharge flow path 312d.

[0123] Base 310 has common piping section 321, upstream piping section 322a, upstream piping section 322b, downstream piping section 322c, and discharge piping section 322d. In Fig. 5, for ease of understanding, common piping section 321, upstream piping section 322a, upstream piping section 322b, downstream piping section 322c, and discharge piping section 322d are shown by dashed lines.

[0124] The common piping section 321 constitutes the common flow path 311 and extends in the same direction as the common flow path 311. The common piping section 321 is a portion of the base 310 that surrounds the common flow path 311. In this embodiment, the common piping section 321 constitutes the common piping 220.

[0125] The upstream piping section 322a constitutes the upstream flow path 312a and extends in the same direction as the upstream flow path 312a. The upstream piping section 322a is a portion of the base 310 that surrounds the upstream flow path 312a. In this embodiment, the upstream piping section 322a and the upstream tube 211a constitute the upstream piping 210a.

[0126] The upstream piping section 322b constitutes the upstream flow path 312b and extends in the same direction as the upstream flow path 312b. The upstream piping section 322b is a portion of the base 310 that surrounds the upstream flow path 312b. In this embodiment, the upstream piping section 322b and the upstream tube 211b constitute the upstream piping 210b.

[0127] The downstream piping section 322c constitutes the downstream flow path 312c and extends in the same direction as the downstream flow path 312c. The downstream piping section 322c is a portion of the base 310 that surrounds the downstream flow path 312c. In this embodiment, the downstream piping section 322c and the downstream tube 231 constitute the downstream piping 230.

[0128] The discharge pipe section 322d constitutes the discharge flow path 312d and extends in the same direction as the discharge flow path 312d. The discharge pipe section 322d is a portion of the base 310 that surrounds the discharge flow path 312d. In this embodiment, the discharge pipe section 322d and the discharge tube 241 constitute the discharge pipe 240.

[0129] The upstream valve 251a is movable between a closed position and an open position. The closed position of the upstream valve 251a indicates a position where the upstream valve 251a closes one end of the upstream flow path 312a. The open position of the upstream valve 251a indicates a position where the upstream valve 251a opens one end of the upstream flow path 312a, thereby connecting the upstream flow path 312a to the common flow path 311.

[0130] When the upstream valve 251a moves from the open position to the closed position, one end of the upstream flow path 312a is closed, and the upstream flow path 312a is no longer in communication with the common flow path 311. In other words, when the upstream valve 251a moves from the open position to the closed position, the upstream pipe 210a is no longer in communication with the common pipe 220. On the other hand, when the upstream valve 251a moves from the closed position to the open position, one end of the upstream flow path 312a is opened, and the upstream flow path 312a is now in communication with the common flow path 311. In other words, when the upstream valve 251a moves from the closed position to the open position, the upstream pipe 210a is now in communication with the common pipe 220.

[0131] The upstream valve 251b is movable between a closed position and an open position. The closed position of the upstream valve 251b indicates a position where the upstream valve 251b closes one end of the upstream flow path 312b. The open position of the upstream valve 251b indicates a position where the upstream valve 251b opens one end of the upstream flow path 312b, thereby connecting the upstream flow path 312b to the common flow path 311.

[0132] When the upstream valve 251b moves from the open position to the closed position, one end of the upstream flow path 312b is closed, and the upstream flow path 312b is no longer in communication with the common flow path 311. In other words, when the upstream valve 251b moves from the open position to the closed position, the upstream pipe 210b is no longer in communication with the common pipe 220. On the other hand, when the upstream valve 251b moves from the closed position to the open position, one end of the upstream flow path 312b is opened, and the upstream flow path 312b is now in communication with the common flow path 311. In other words, when the upstream valve 251b moves from the closed position to the open position, the upstream pipe 210b is now in communication with the common pipe 220.

[0133] The downstream valve 252 is movable between a closed position and an open position. The closed position of the downstream valve 252 indicates a position where the downstream valve 252 closes one end of the downstream flow path 312c. The open position of the downstream valve 252 indicates a position where the downstream valve 252 opens one end of the downstream flow path 312c, thereby connecting the downstream flow path 312c to the common flow path 311.

[0134] When the downstream valve 252 moves from the open position to the closed position, one end of the downstream flow path 312c is closed, and the downstream flow path 312c and the common flow path 311 are no longer in communication with each other. In other words, when the downstream valve 252 moves from the open position to the closed position, the downstream piping 230 and the common piping 220 are no longer in communication with each other. On the other hand, when the downstream valve 252 moves from the closed position to the open position, one end of the downstream flow path 312c is opened, and the downstream flow path 312c and the common flow path 311 are now in communication with each other. In other words, when the downstream valve 252 moves from the closed position to the open position, the downstream piping 230 and the common piping 220 are now in communication with each other.

[0135] The discharge valve 253 is movable between a closed position and an open position. The closed position of the discharge valve 253 indicates a position where the discharge valve 253 closes one end of the discharge flow path 312d. The open position of the discharge valve 253 indicates a position where the discharge valve 253 opens one end of the discharge flow path 312d, thereby connecting the discharge flow path 312d to the common flow path 311.

[0136] When the discharge valve 253 moves from the open position to the closed position, one end of the discharge flow path 312d is closed, and the discharge flow path 312d and the common flow path 311 are no longer in communication with each other. In other words, when the discharge valve 253 moves from the open position to the closed position, the discharge pipe 240 and the common flow path 220 are no longer in communication with each other. On the other hand, when the discharge valve 253 moves from the closed position to the open position, one end of the discharge flow path 312d is opened, and the discharge flow path 312d and the common flow path 311 are now in communication with each other. In other words, when the discharge valve 253 moves from the open position to the closed position, the discharge pipe 240 and the common flow path 220 are now in communication with each other.

[0137] Next, the substrate processing step (step SC in FIG. 4) in the substrate processing method of this embodiment will be described with reference to FIGS. 1 to 10. FIG. 6 is a flow diagram showing the substrate processing step. FIGS. 7 to 10 are schematic diagrams showing the configuration of the processing liquid supply unit 200 of the substrate processing apparatus 100 of this embodiment. Step S15 is an example of the "step of acquiring type information" of the present invention. Step S16 is an example of the "step of irradiating with near-infrared rays" of the present invention. Step S17 is an example of the "step of generating a captured image" of the present invention. Step S18 is an example of the "step of identifying the type of processing liquid" of the present invention.

[0138] 6, step SC includes steps S11 to S21. In this embodiment, when step S11 starts, the upstream valve 251a, the upstream valve 251b, the downstream valve 252, and the discharge valve 253 are in a closed state.

[0139] In step S11, a first processing liquid (here, SC2) is supplied to the nozzle 136. Specifically, as shown in FIG. 5, the control unit 102 changes the upstream valve 251b and the downstream valve 252 from a closed state to an open state, and maintains the upstream valve 251a and the discharge valve 253 in a closed state. As a result, the first processing liquid is supplied to the nozzle 136 from the upstream pipe 210b via the common pipe 220 and the downstream pipe 230. Therefore, the supply of the first processing liquid from the nozzle 136 to the substrate W begins. When a predetermined time (e.g., several tens of seconds) has elapsed since the upstream valve 251b and the downstream valve 252 were opened, the process proceeds to step S12.

[0140] Next, in step S12, a first processing liquid (here, SC2) is supplied to the discharge pipe 240. Specifically, as shown in FIG. 7, the control unit 102 changes the downstream valve 252 from an open state to a closed state, and changes the discharge valve 253 from a closed state to an open state. As a result, the first processing liquid is supplied from the upstream pipe 210b to the discharge pipe 240 via the common pipe 220. Therefore, the supply of the first processing liquid from the nozzle 136 to the substrate W is stopped. In addition, the first processing liquid is discharged from the discharge pipe 240 to the processing liquid tank 290. When a predetermined time (for example, one second or less) has elapsed since the discharge valve 253 was opened, the process proceeds to step S13.

[0141] Next, in step S13, the supply of the first processing liquid is stopped. Specifically, the control unit 102 changes the upstream valve 251b from an open state to a closed state. As a result, the first processing liquid is no longer supplied to the common pipe 220.

[0142] Next, in step S14, the second processing liquid (carbonated water in this case) is supplied to the discharge pipe 240. Specifically, as shown in Fig. 8, the control unit 102 changes the upstream valve 251a from a closed state to an open state. As a result, the second processing liquid is supplied from the upstream pipe 210a through the common pipe 220 to the discharge pipe 240.

[0143] Even when the supply of the second processing liquid from the upstream pipe 210a to the common pipe 220 starts, the processing liquid in the common pipe 220 does not immediately switch from the first processing liquid to the second processing liquid. Specifically, as shown in FIG. 9 , the common pipe 220 is provided with, for example, an upstream valve 251a, an upstream valve 251b, a downstream valve 252, and a discharge valve 253, and is connected to the upstream pipe 210b and the downstream pipe 230, so that a portion of the first processing liquid L1 remains in the common pipe 220. Note that in FIG. 9 , for ease of understanding, the first processing liquid is denoted by the symbol "L1" and the second processing liquid is denoted by the symbol "L2." Also, for ease of understanding, only the first processing liquid L1 and the second processing liquid L2 are hatched.

[0144] Next, in step S15, type information indicating the type of the processing liquid is acquired. Specifically, the control unit 102 acquires type information indicating the type of the processing liquid supplied to the common pipe 220 from, for example, recipe data.

[0145] Next, in step S16, the near-infrared light source 140 irradiates an area including at least a part of the processing liquid supply unit 200 with near-infrared light. Specifically, the control unit 102 causes the near-infrared light source 140 to irradiate an area including at least a part of the processing liquid supply unit 200 with near-infrared light. In this embodiment, the control unit 102 causes the near-infrared light source 140 to irradiate an area including the common pipe 220 with near-infrared light. Note that the control unit 102 may also cause the near-infrared light source 140 to irradiate an area including a part of the discharge pipe 240 (for example, an upstream part of the discharge pipe 240) with near-infrared light.

[0146] Next, in step S17, the near-infrared image capturing unit 150 captures an image of an area including at least a portion of the processing liquid supply unit 200 that is irradiated with near-infrared light. Specifically, the control unit 102 causes the near-infrared image capturing unit 150 to capture an image of an area including at least a portion of the processing liquid supply unit 200 that is irradiated with near-infrared light. In this embodiment, the control unit 102 causes the near-infrared image capturing unit 150 to capture an image of an area including the common pipe 220 that is irradiated with near-infrared light. Note that the control unit 102 may also cause the near-infrared image capturing unit 150 to capture an image of an area including a portion of the discharge pipe 240 that is irradiated with near-infrared light.

[0147] In step S17, the near-infrared image capturing unit 150 captures an image of an area including at least a portion of the processing liquid supply unit 200 that is irradiated with near-infrared rays, thereby generating a captured image. The timing at which the near-infrared light source 140 starts emitting near-infrared rays may be the same as or different from the timing at which the near-infrared image capturing unit 150 starts capturing images. The timing at which the near-infrared light source 140 starts emitting near-infrared rays may be earlier or later than the timing at which the near-infrared image capturing unit 150 starts capturing images. The timing at which the near-infrared light source 140 starts emitting near-infrared rays may be the same as or different from the timing at which the second processing liquid starts to be supplied to the discharge pipe 240 in step S14. The timing at which the near-infrared light source 140 starts emitting near-infrared rays may be earlier or later than the timing at which the second processing liquid starts to be supplied to the discharge pipe 240 in step S14.

[0148] Next, in step S18, the type of processing liquid is identified based on the captured image. Specifically, the control unit 102 identifies the type of processing liquid in an area including at least a part of the processing liquid supply unit 200 based on the captured image. In this embodiment, the control unit 102 identifies the type of processing liquid in the common pipe 220 based on the captured image. Note that the control unit 102 may also identify the type of processing liquid in the discharge pipe 240 based on the captured image.

[0149] More specifically, the control unit 102 identifies the type of processing liquid in the captured image based on the luminance value or brightness in the captured image generated by the near-infrared imaging unit 150. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the luminance value or brightness in the captured image and the luminance value or brightness of a reference processing liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the type of processing liquid in the captured image based on the captured image and the reference image.

[0150] Furthermore, the control unit 102 identifies the position of the outer edge of the treatment liquid in the captured image based on the captured image generated by the near-infrared imaging unit 150. For example, the control unit 102 identifies the position of the outer edge of the treatment liquid in the captured image based on the luminance value or brightness in the captured image. For example, the control unit 102 identifies the position of the outer edge of the treatment liquid in the captured image based on the luminance value or brightness in the captured image and the luminance value or brightness of a reference treatment liquid stored in the storage unit 104. Alternatively, the control unit 102 identifies the position of the outer edge of the treatment liquid in the captured image based on the captured image and the reference image. Alternatively, for example, the control unit 102 may determine that a region in the captured image whose luminance value or brightness is within a predetermined range is the treatment liquid, and determine that the outer edge of the region whose luminance value or brightness is within the predetermined range is the outer edge of the treatment liquid.

[0151] The control unit 102 may also identify the position of the second processing liquid in the captured image based on the luminance value or brightness in the captured image and the type information. The control unit 102 may also identify a region where the first processing liquid is located and a region where the second processing liquid is located in a predetermined region of the captured image (e.g., a region corresponding to the common pipe 220) based on the luminance value or brightness in the captured image, the luminance value or brightness of the reference processing liquid stored in the storage unit 104, and the type information. The control unit 102 may also calculate, for example, the ratio of the number of pixels having a luminance value or brightness corresponding to the second processing liquid to the total number of pixels in the predetermined region of the captured image (e.g., a region corresponding to the common pipe 220). The control unit 102 may also calculate the sum of the luminance values ​​or brightness of all pixels in the predetermined region.

[0152] Next, in step S19, it is determined whether the brightness value or brightness in the captured image satisfies a predetermined condition. Specifically, the control unit 102 determines whether the value calculated in step S18 satisfies the predetermined condition. For example, the control unit 102 determines whether the area where the second processing liquid is located is equal to or greater than a predetermined value (e.g., 99%) of a predetermined area in the captured image (e.g., an area corresponding to the common pipe 220). Alternatively, for example, the control unit 102 may determine whether the calculated percentage is equal to or greater than a predetermined value (e.g., 99%). Note that the control unit 102 may also determine whether the calculated total is equal to or greater than a predetermined value.

[0153] If the control unit 102 determines in step S19 that the predetermined condition is not satisfied, the process returns to step S18. That is, if the process liquid has not been sufficiently switched from the first process liquid to the second process liquid in at least a part of the process liquid supply unit 200 (here, the common pipe 220), the process returns to step S18.

[0154] On the other hand, if the control unit 102 determines in step S19 that the predetermined condition is satisfied, the process proceeds to step S20. That is, if the control unit 102 detects that the process liquid in the common pipe 220 or the discharge pipe 240 has been switched from the first process liquid to the second process liquid, the process proceeds to step S20.

[0155] Here, step S19 will be described in more detail. Generally, the time from when the second processing liquid starts to be supplied to the discharge pipe until it starts to be supplied to the downstream pipe is preset. Specifically, generally, even if the supply of the second processing liquid from the upstream pipe to the common pipe is started, since a part of the first processing liquid stays in the common pipe, the processing liquid in the common pipe does not immediately switch from the first processing liquid to the second processing liquid. For example, when the time it takes for the processing liquid in the common pipe to switch from the first processing liquid to the second processing liquid is t1 seconds or more and t2 seconds or less (where t1 < t2), after t2 seconds or more have elapsed since the processing liquid supplied to the common pipe is switched from the first processing liquid to the second processing liquid, the opening and closing states of the discharge valve and the downstream valve are switched. That is, since the time it takes for the processing liquid to switch in the common pipe varies depending on the temperature and the like, the time from when the second processing liquid starts to be supplied to the discharge pipe until it starts to be supplied to the downstream pipe in order to supply the processing liquid to the nozzle after the processing liquid has switched is set longer. Also in this embodiment, in the recipe, the time (for example, t2 seconds or more) from when the second processing liquid starts to be supplied to the discharge pipe 240 until it starts to be supplied to the downstream pipe 230 is set.

[0156] In this embodiment, in step S19, when the control unit 102 determines that a predetermined condition is satisfied, regardless of whether the set time (t2 seconds or more) has elapsed, the process proceeds to step S20. In this case, for example, the control unit 102 may rewrite the recipe so that the time (for example, t2 seconds or more) from when the second processing liquid starts to be supplied to the discharge pipe 240 until it starts to be supplied to the downstream pipe 230 becomes shorter according to the timing when it is determined that the predetermined condition is satisfied. Note that, for example, the control unit 102 may rewrite the recipe so that the time (for example, t2 seconds or more) from when the second processing liquid starts to be supplied to the discharge pipe 240 until it starts to be supplied to the downstream pipe 230 becomes longer according to the timing when it is determined that the predetermined condition is satisfied.

[0157] Next, in step S20, a second processing liquid (carbonated water in this case) is supplied to the nozzle 136. Specifically, the control unit 102 changes the discharge valve 253 from a closed state to an open state and changes the downstream valve 252 from a closed state to an open state so as to fill the state shown in FIG. 10 . As a result, the second processing liquid is supplied to the nozzle 136 from the upstream pipe 210a via the common pipe 220 and the downstream pipe 230. Therefore, the supply of the second processing liquid from the nozzle 136 to the substrate W begins. When a predetermined time (for example, several seconds or more) has elapsed since the downstream valve 252 was opened, the process proceeds to step S21.

[0158] Next, in step S21, the supply of the second processing liquid is stopped. Specifically, the control unit 102 changes the upstream valve 251a and the downstream valve 252 from an open state to a closed state. This stops the supply of the second processing liquid to the common pipe 220 and the supply of the second processing liquid to the nozzle 136.

[0159] In this embodiment, as described above, the control unit 102 identifies the type of processing liquid in an area including at least a part of the processing liquid supply unit 200 based on the captured image. Therefore, for example, it is possible to check whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0160] Furthermore, for example, since it is possible to confirm whether the processing liquid in the processing liquid supply unit 200 has been switched, regardless of whether the set time (for example, t2 seconds or more) has elapsed, the downstream valve 252 can be switched from a closed state to an open state at the timing when it is confirmed that the processing liquid in the processing liquid supply unit 200 has been switched, thereby shortening the substrate processing time. Furthermore, since the amount of the second processing liquid used can be reduced, environmental load can be reduced.

[0161] Furthermore, as described above, the control unit 102 controls the processing liquid supply unit 200 to switch the type of processing liquid and supply it to the nozzle 136. When switching the type of processing liquid and supplying it to the nozzle 136 in this way, it is particularly effective to apply the present invention.

[0162] Furthermore, as described above, the control unit 102 controls the processing liquid supply unit 200 based on the result of identifying the type of processing liquid. Therefore, the control unit 102 can easily supply and / or stop supplying the processing liquid to the nozzle 136 depending on the status of the processing liquid in the processing liquid supply unit 200.

[0163] As described above, the processing liquid supply unit 200 includes the upstream pipes 210a and 210b through which multiple types of processing liquids flow, the common pipe 220 to which the downstream ends of the upstream pipes 210a and 210b are connected, and the downstream pipe 230. When multiple types of processing liquids flow through the common pipe 220 in this manner, it is particularly effective to apply the present invention to identify the type of processing liquid.

[0164] Furthermore, as described above, the control unit 102 identifies the type of processing liquid in the area including the common pipe 220 based on the captured image. Therefore, the status of the processing liquid in the common pipe 220 can be easily confirmed. For example, it can be easily confirmed whether the processing liquid in the common pipe 220 has been switched. In other words, it can be easily confirmed whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0165] Furthermore, as described above, the common pipe 220 is configured by a multiple valve, which prevents the structure around the common pipe 220 from becoming large, thereby preventing the substrate processing apparatus from becoming large.

[0166] As described above, the processing liquid supply unit 200 has an upstream end connected to the common pipe 220 and includes a discharge pipe 240 for discharging the processing liquid. Therefore, when switching the processing liquid to be supplied to the nozzle 136, the first processing liquid and the second processing liquid can be supplied to the discharge pipe 240, and therefore, the processing liquid can be prevented from being supplied to the nozzle 136 in a state where the second processing liquid is mixed with the first processing liquid.

[0167] Furthermore, as described above, the control unit 102 may identify the type of processing liquid in the area including the discharge pipe 240 based on the captured image. Therefore, the status of the processing liquid in the discharge pipe 240 can be easily confirmed. For example, it can be easily confirmed whether the processing liquid in the discharge pipe 240 has been switched. In other words, it can be easily confirmed whether the processing liquid in the processing liquid supply unit 200 has been switched.

[0168] Furthermore, as described above, the control unit 102 supplies the first processing liquid to the nozzle 136 via the common pipe 220, then supplies the first processing liquid to the discharge pipe 240 via the common pipe 220, and then supplies the second processing liquid to the discharge pipe 240 via the common pipe 220, and when it detects based on the captured image that the processing liquid in the common pipe 220 or the discharge pipe 240 has been switched from the first processing liquid to the second processing liquid, it supplies the second processing liquid to the nozzle 136 via the common pipe 220. Therefore, the processing liquid supplied to the nozzle 136 can be easily switched from the first processing liquid to the second processing liquid.

[0169] Next, an example in which a plurality of near-infrared light sources 140 are provided will be described with reference to Fig. 11. Here, an example in which the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b will be described. Fig. 11 is a schematic diagram of a substrate processing unit 110 in a substrate processing apparatus 100 equipped with a plurality of near-infrared light sources 140 (the near-infrared light source 140a and the near-infrared light source 140b).

[0170] 11, the near-infrared light source 140 includes a near-infrared light source 140a and a near-infrared light source 140b. The near-infrared light source 140a and the near-infrared light source 140b emit near-infrared rays having different peak wavelengths.

[0171] The control unit 102 acquires recipe data from the storage unit 104, and acquires type information indicating the type of processing liquid to be supplied to the common pipe 220 from the recipe data. Furthermore, for example, the recipe data may include information indicating the type of near-infrared light source 140 corresponding to the type of processing liquid. Furthermore, for example, the control unit 102 may acquire type information indicating the type of processing liquid to be supplied to the common pipe 220 from input information input by the user.

[0172] Based on the acquired type information, the control unit 102 changes the near-infrared light source 140 that irradiates an area including at least a part of the treatment liquid supply unit 200. For example, when carbonated water is supplied from the upstream pipe 210a to the common pipe 220, the control unit 102 irradiates using the near-infrared light source 140a. On the other hand, when SC2 is supplied from the upstream pipe 210b to the common pipe 220, the control unit 102 irradiates using the near-infrared light source 140b.

[0173] Specifically, for example, when switching the processing liquid supplied to the common pipe 220 from SC2 to carbonated water, the control unit 102 supplies the second processing liquid (here, carbonated water) to the common pipe 220 (step S14 in Figure 6), and then changes the near-infrared light source 140 that irradiates an area including at least a portion of the processing liquid supply unit 200 from near-infrared light source 140b to near-infrared light source 140a, and irradiates an area including at least a portion of the processing liquid supply unit 200 with near-infrared light source 140a (step S16 in Figure 6).

[0174] On the other hand, for example, when switching the processing liquid supplied to the common pipe 220 from carbonated water to SC2, the control unit 102 supplies the second processing liquid (here, SC2) to the common pipe 220 (step S14 in Figure 6), and then changes the near-infrared light source 140 that irradiates an area including at least a portion of the processing liquid supply unit 200 from near-infrared light source 140a to near-infrared light source 140b, and irradiates an area including at least a portion of the processing liquid supply unit 200 with near-infrared light source 140b (step S16 in Figure 6).

[0175] In the example where a plurality of near-infrared light sources 140 are provided, the other configurations and substrate processing flow are the same as those of the substrate processing apparatus described with reference to Figures 1 to 10. Note that step S16 in the example where a plurality of near-infrared light sources 140 are provided is an example of the "step of changing the peak wavelength of near-infrared light" of the present invention.

[0176] In this embodiment, as described above, the control unit 102 acquires type information indicating the type of treatment liquid, and, based on the acquired type information, changes the near-infrared light source 140 that irradiates an area including at least a part of the treatment liquid supply unit 200. Therefore, since the near-infrared light to be irradiated can be changed depending on the absorbance (also referred to as absorptivity) of the treatment liquid, the type and outer edge of the treatment liquid can be identified more accurately even when the type of treatment liquid is changed.

[0177] Specifically, the absorbance of the treatment liquid varies depending on the type of treatment liquid. Therefore, for example, by capturing an image of the treatment liquid while irradiating it with light of a wavelength at which the absorbance of the second treatment liquid is relatively high, the contrast in brightness or luminance between the area showing the second treatment liquid and the area other than the second treatment liquid in the captured image can be increased. Therefore, the type and position of the treatment liquid can be more accurately identified based on the captured image.

[0178] In the example in which a plurality of near-infrared light sources 140 are provided, other effects are the same as those of the substrate processing apparatus described with reference to FIGS.

[0179] The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments and can be embodied in various forms without departing from the spirit and scope of the present invention. Furthermore, various inventions can be formed by appropriately combining multiple components disclosed in the above embodiments. For example, some components may be omitted from all components shown in the embodiments. Furthermore, components from different embodiments may be appropriately combined. The drawings mainly show each component in a schematic manner to facilitate understanding. The thickness, length, number, spacing, etc. of each component shown may differ from the actual thickness, length, number, spacing, etc. of each component shown in the above embodiments due to the convenience of drawing. Furthermore, the materials, shapes, dimensions, etc. of each component shown in the above embodiments are merely examples and are not particularly limited. Various modifications are possible within a scope that does not substantially deviate from the effects of the present invention.

[0180] For example, in the above embodiment, an example was shown in which the present invention was applied to shorten the substrate processing time in a substrate processing step, but the present invention is not limited to this. For example, the present invention may be applied when setting (when creating a recipe) the time (e.g., t2 seconds or more) from when the second processing liquid starts to be supplied to the exhaust pipe 240 until when the second processing liquid starts to be supplied to the downstream pipe 230. In this case, the recipe creation time can be shortened. Furthermore, as in the above embodiment, the amount of second processing liquid used can be reduced, which leads to a reduction in the environmental load.

[0181] Furthermore, in the above embodiment, an example in which the type of processing liquid is switched and supplied to the nozzle 136 has been described as an example in which multiple types of processing liquid are supplied to the nozzle 136, but the present invention is not limited to this. For example, a hydrochloric acid solution (processing liquid) may be supplied from the upstream pipe 210a to the common pipe 220, and a hydrogen peroxide solution (processing liquid) may be supplied from the upstream pipe 210b to the common pipe 220, and multiple types (two types in this case) of processing liquid may be mixed in the common pipe 220, and the multiple types of processing liquid may be supplied in a mixed state to the nozzle 136. In this case, by applying the present invention, for example, it is possible to check the mixed state of the multiple types of processing liquid in the common pipe 220.

[0182] In addition, in the above embodiment, an example has been shown in which two upstream pipes (upstream pipe 210a and upstream pipe 210b) are connected to the common pipe 220, but the present invention is not limited to this. For example, three or more upstream pipes may be connected to the common pipe 220.

[0183] In the above embodiment, an example has been described in which only one downstream pipe 230 is provided to supply the processing liquid from the common pipe 220 to the nozzles 136, but the present invention is not limited to this. For example, a plurality of downstream pipes 230 may be provided, and the processing liquid may be supplied from the common pipe 220 to a plurality of nozzles 136.

[0184] In the above embodiment, the processing liquid supply unit 200 has a multi-valve, but the present invention is not limited to this. For example, the processing liquid supply unit 200 does not have to have a multi-valve.

[0185] In addition, in the above embodiment, an example has been shown in which the upstream pipe 210a and the upstream pipe 210b are separately connected to the multiple valve 300, but the present invention is not limited to this. For example, the upstream pipe 210a and the upstream pipe 210b may be connected to the multiple valve 300 after joining together.

[0186] In the above embodiment, the downstream pipe 230 and the discharge pipe 240 are separately connected to the multiple valve 300, but the present invention is not limited to this. For example, a common pipe may be connected to the multiple valve 300, and the downstream pipe 230 and the discharge pipe 240 may branch off from the common pipe. [Industrial Applicability]

[0187] The present invention is suitably used in a substrate processing apparatus and a substrate processing method. [Explanation of symbols]

[0188] 100: Substrate processing apparatus 102: Control unit 120: Board holding part 136: Nozzle (processing liquid nozzle) 140, 140a, 140b: Near-infrared light source 150: Near-infrared imaging unit 200: Processing liquid supply unit 210a, 210b: Upstream piping 220: Common piping 230: Downstream piping 240:Discharge piping 300:Multiple valve L1: First processing liquid L2: Second processing liquid S15: Step (process for acquiring type information) S16: Step (step of irradiating with near-infrared rays, step of changing the peak wavelength of near-infrared rays) S17: Step (process for generating captured image) S18: Step (step of identifying the type of processing liquid) SB: Step (substrate rotation process) SC: Step (process for supplying multiple types of processing liquid) W: Substrate Wa: Top

Claims

1. a substrate holder for holding a substrate; a processing liquid nozzle for supplying a processing liquid to an upper surface of the substrate; a processing liquid supply unit that supplies a plurality of types of the processing liquid to the processing liquid nozzle; at least one near-infrared light source that irradiates a region including at least a part of the processing liquid supply unit with near-infrared rays; a near-infrared imaging unit that receives components of the near-infrared rays from the near-infrared light source that are transmitted through and / or reflected by the treatment liquid supply unit, and thereby generates an image of the treatment liquid in an area that includes at least a part of the treatment liquid supply unit; a control unit that controls the processing liquid supply unit and the near-infrared imaging unit; Equipped with The control unit identifies the type of the processing liquid in an area including at least a part of the processing liquid supply unit based on the captured image and a luminance value, brightness, or image of a reference processing liquid.

2. A substrate holding part that holds a substrate; a processing liquid nozzle for supplying a processing liquid to an upper surface of the substrate; a processing liquid supply unit that supplies a plurality of types of the processing liquid to the processing liquid nozzle; at least one near-infrared light source that irradiates a region including at least a part of the processing liquid supply unit with near-infrared rays; a near-infrared image capturing unit that captures an image of the treatment liquid being irradiated with near-infrared light from the near-infrared light source; a control unit that controls the processing liquid supply unit and the near-infrared imaging unit; Equipped with The processing liquid supply unit a plurality of upstream pipes through which the plurality of types of treatment liquids respectively flow; a common pipe to which downstream ends of the plurality of upstream pipes are connected; a downstream pipe connected to the common pipe at its upstream end and supplying the processing liquid to the processing liquid nozzle; and the near-infrared light source irradiates an area including the common pipe with near-infrared rays; The control unit identifies the type of the processing liquid in a region including the common pipe based on the captured image.

3. A substrate holding part that holds a substrate; a processing liquid nozzle for supplying a processing liquid to an upper surface of the substrate; a processing liquid supply unit that supplies a plurality of types of the processing liquid to the processing liquid nozzle; at least one near-infrared light source that irradiates a region including at least a part of the processing liquid supply unit with near-infrared rays; a near-infrared image capturing unit that captures an image of the treatment liquid being irradiated with near-infrared light from the near-infrared light source; a control unit that controls the processing liquid supply unit and the near-infrared imaging unit; Equipped with The processing liquid supply unit a plurality of upstream pipes through which the plurality of types of treatment liquids respectively flow; a common pipe to which downstream ends of the plurality of upstream pipes are connected; a downstream pipe having an upstream end connected to the common pipe and configured to supply the processing liquid to the processing liquid nozzle; a discharge pipe connected to the common pipe at its upstream end and configured to discharge the treatment liquid; and the near-infrared light source irradiates an area including the exhaust pipe with near-infrared rays; The control unit identifies the type of the processing liquid in a region including the discharge pipe based on the captured image.

4. A substrate holding part that holds a substrate; a processing liquid nozzle for supplying a processing liquid to an upper surface of the substrate; a processing liquid supply unit that supplies a plurality of types of the processing liquid to the processing liquid nozzle; at least one near-infrared light source that irradiates a region including at least a part of the processing liquid supply unit with near-infrared rays; a near-infrared image capturing unit that captures an image of the treatment liquid being irradiated with near-infrared light from the near-infrared light source; a control unit that controls the processing liquid supply unit and the near-infrared imaging unit; Equipped with The processing liquid supply unit a plurality of upstream pipes through which the plurality of types of treatment liquids respectively flow; a common pipe to which downstream ends of the plurality of upstream pipes are connected; a downstream pipe having an upstream end connected to the common pipe and configured to supply the processing liquid to the processing liquid nozzle; a discharge pipe connected to the common pipe at its upstream end and configured to discharge the treatment liquid; and The control unit controls the processing liquid supply unit, After the first processing liquid is supplied to the processing liquid nozzle through the common pipe, supplying the first processing liquid to the discharge pipe via the common pipe; Thereafter, a second processing liquid is supplied to the discharge pipe via the common pipe; When it is detected based on the captured image that the common pipe or the exhaust pipe has switched from the first processing liquid to the second processing liquid, the substrate processing apparatus supplies the second processing liquid to the processing liquid nozzle via the common pipe.

5. A substrate holding part that holds a substrate; a processing liquid nozzle for supplying a processing liquid to an upper surface of the substrate; a processing liquid supply unit that supplies a plurality of types of the processing liquid to the processing liquid nozzle; at least one near-infrared light source that irradiates a region including at least a part of the processing liquid supply unit with near-infrared rays; a near-infrared image capturing unit that captures an image of the treatment liquid being irradiated with near-infrared light from the near-infrared light source; a control unit that controls the processing liquid supply unit and the near-infrared imaging unit; Equipped with the at least one near-infrared light source is provided in plurality, the plurality of near-infrared light sources emit near-infrared rays having different peak wavelengths, The control unit identifying the type of the processing liquid in an area including at least a part of the processing liquid supply unit based on the captured image; acquiring type information indicating the type of the treatment liquid; The substrate processing apparatus changes the near-infrared light source that irradiates an area including at least a part of the processing liquid supply unit based on the acquired type information.

6. 6. The substrate processing apparatus according to claim 1, wherein the control unit controls the processing liquid supply unit to switch the type of the processing liquid to be supplied to the processing liquid nozzle.

7. 6. The substrate processing apparatus according to claim 1, wherein the control unit controls the processing liquid supply unit based on a result of identifying the type of the processing liquid.

8. The substrate processing apparatus according to claim 2 , wherein the common pipe is formed of a multiple valve.

9. The substrate processing apparatus according to claim 2 , wherein the processing liquid supply unit includes a discharge pipe whose upstream end is connected to the common pipe and which discharges the processing liquid.

10. holding a substrate and rotating said substrate; supplying a plurality of types of processing liquids from a processing liquid supply unit to a processing liquid nozzle and supplying the processing liquids onto the upper surface of the substrate from the processing liquid nozzle; Including, The step of supplying the treatment liquid includes: irradiating a region including at least a part of the treatment liquid supply section with near-infrared rays; generating a captured image of the treatment liquid in an area including at least a part of the treatment liquid supply unit by receiving components of the near-infrared rays that are transmitted through and / or reflected by the treatment liquid supply unit; identifying the type of the processing liquid in an area including at least a part of the processing liquid supply unit based on the captured image and a luminance value, brightness, or image of a reference processing liquid; A substrate processing method comprising:

11. A method for manufacturing a substrate, comprising: holding a substrate and rotating the substrate; supplying a plurality of types of processing liquids from a processing liquid supply unit to a processing liquid nozzle and supplying the processing liquids onto the upper surface of the substrate from the processing liquid nozzle; Including, The processing liquid supply unit a plurality of upstream pipes through which the plurality of types of treatment liquids respectively flow; a common pipe to which downstream ends of the plurality of upstream pipes are connected; a downstream pipe connected to the common pipe at its upstream end and supplying the processing liquid to the processing liquid nozzle; and The step of supplying the treatment liquid includes: irradiating an area including the common pipe with near-infrared light; generating a captured image of the treatment liquid irradiated with the near-infrared light; identifying the type of the processing liquid in the area including the common pipe based on the captured image; A substrate processing method comprising:

12. A method for manufacturing a substrate, comprising: holding a substrate and rotating the substrate; supplying a plurality of types of processing liquids from a processing liquid supply unit to a processing liquid nozzle and supplying the processing liquids onto the upper surface of the substrate from the processing liquid nozzle; Including, The processing liquid supply unit a plurality of upstream pipes through which the plurality of types of treatment liquids respectively flow; a common pipe to which downstream ends of the plurality of upstream pipes are connected; a downstream pipe having an upstream end connected to the common pipe and configured to supply the processing liquid to the processing liquid nozzle; a discharge pipe connected to the common pipe at its upstream end and configured to discharge the treatment liquid; and The step of supplying the treatment liquid includes: irradiating an area including the exhaust pipe with near-infrared light; generating a captured image of the treatment liquid irradiated with the near-infrared light; identifying the type of the processing liquid in an area including the discharge pipe based on the captured image; A substrate processing method comprising:

13. A method for manufacturing a substrate, comprising: holding a substrate and rotating the substrate; supplying a plurality of types of processing liquids from a processing liquid supply unit to a processing liquid nozzle and supplying the processing liquids onto the upper surface of the substrate from the processing liquid nozzle; Including, The processing liquid supply unit a plurality of upstream pipes through which the plurality of types of treatment liquids respectively flow; a common pipe to which downstream ends of the plurality of upstream pipes are connected; a downstream pipe having an upstream end connected to the common pipe and configured to supply the processing liquid to the processing liquid nozzle; a discharge pipe connected to the common pipe at its upstream end and configured to discharge the treatment liquid; and The step of supplying the treatment liquid includes: irradiating a region including at least a part of the treatment liquid supply section with near-infrared rays; generating a captured image of the treatment liquid irradiated with the near-infrared light; identifying the type of the processing liquid in an area including at least a part of the processing liquid supply unit based on the captured image; Including, In the step of supplying the treatment liquid, After the first processing liquid is supplied to the processing liquid nozzle through the common pipe, supplying the first processing liquid to the discharge pipe via the common pipe; Thereafter, a second processing liquid is supplied to the discharge pipe via the common pipe; A substrate processing method, comprising: when it is detected based on the captured image that the common pipe or the exhaust pipe has switched from the first processing liquid to the second processing liquid, supplying the second processing liquid to the processing liquid nozzle via the common pipe.

14. The method of claim 1, further comprising: holding a substrate and rotating the substrate; supplying a plurality of types of processing liquids from a processing liquid supply unit to a processing liquid nozzle and supplying the processing liquids onto the upper surface of the substrate from the processing liquid nozzle; Including, The step of supplying the treatment liquid includes: irradiating a region including at least a part of the treatment liquid supply section with near-infrared rays; generating a captured image of the treatment liquid irradiated with the near-infrared light; identifying the type of the processing liquid in an area including at least a part of the processing liquid supply unit based on the captured image; acquiring type information indicating the type of the treatment liquid; changing a peak wavelength of the near-infrared light irradiating an area including at least a part of the processing liquid supply unit based on the acquired type information; A substrate processing method comprising:

15. 15. The substrate processing method according to claim 10, wherein in the step of supplying the processing liquid, the processing liquid supplied from the processing liquid supply unit to the processing liquid nozzle is switched in type.

16. 15. The substrate processing method according to claim 10, wherein in the step of supplying the processing liquid, the processing liquid supply unit is controlled based on a result of identifying the type of the processing liquid.

17. The substrate processing method according to any one of claims 11 to 13, wherein the common pipe is formed of a multiple valve.

18. The substrate processing method according to claim 11 , wherein the processing liquid supply unit includes a discharge pipe whose upstream end is connected to the common pipe and which discharges the processing liquid.

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