Substrate Processing Equipment

Abstract

To make it possible to stably enhance throughput by effectively utilizing processing tanks by diverting functions.SOLUTION: When causing a third transport mechanism WTR to transport a plurality of substrates W and causing a substrate standby unit CWS, a drying processing unit LPD, deionized water cleaning processing units ONB1 to ONB3, chemical liquid processing units CHB1 to CHB3, and the like to perform processing on the plurality of substrates in accordance with recipes, a control unit 25 can switch a processing function of a diversion mode regarding these processing units. Therefore, frequencies of use can be increased and processing tanks usable for processing can be increased by switching processing functions with respect to processing tanks with low frequencies of use, or processing tanks that are not used for a long time. As a result, throughput can be stably improved by effectively utilizing the processing tanks.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus for performing predetermined processing on substrates such as semiconductor substrates, substrates for FPDs (Flat Panel Displays) such as liquid crystal displays and organic EL (Electroluminescence) display devices, glass substrates for photomasks, and substrates for optical disks. [Background technology]

[0002] Conventionally, this type of device includes a transport and storage section, a first transport mechanism, a second transport mechanism, a drying section, and first to third processing sections (see, for example, Patent Document 1).

[0003] Each of the first to third processing sections is equipped with a pair of processing tanks. The pair of processing tanks has fixed functions set for each of the first to third processing sections, for example, as a pure water cleaning processing tank and a chemical liquid processing tank, respectively. The pure water cleaning processing tank performs cleaning processing on substrates using pure water. The chemical liquid processing tank performs chemical processing on substrates using chemical liquid. Each of the pure water cleaning processing tanks and each of the chemical liquid processing tanks is equipped with a lifter that transfers substrates between them and the second transport mechanism. Substrates stored in the carrier are transported from the transport storage section to the second transport mechanism via the first transport mechanism. In the pure water cleaning processing tank and the chemical liquid processing tank, the lifter that receives the substrates from the second transport mechanism descends into the internal processing tank, and the substrates are processed by immersing them in pure water or chemical liquid. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2010-238919 Summary of the Invention [Problem to be solved by the invention]

[0005] However, the conventional example having such a configuration has the following problems. That is, in conventional apparatuses, scheduling is performed taking into consideration which processing tanks substrates should be transported to and when in order to improve throughput, etc. However, depending on the operation of the operator, the recipe used by the operator, and the maintenance status, some of the processing tanks may not be used for a long period of time.

[0006] In other words, in conventional apparatuses, it is sometimes the case that not all of the treatment tanks provided in the apparatus are effectively utilized, which results in a lower throughput compared to the number of treatment tanks provided in the apparatus. In other words, there is a problem in conventional apparatuses that they are not able to stably improve throughput.

[0007] The present invention has been made in consideration of the above circumstances, and aims to provide a substrate processing apparatus that can stably improve throughput by effectively utilizing processing tanks through the repurposing of functions. [Means for solving the problem]

[0008] In order to achieve the above object, the present invention has the following configuration. That is, the invention described in claim 1 is a substrate processing apparatus that performs a predetermined process on a substrate according to a recipe that defines the process content, and is capable of processing a plurality of substrates, and is equipped with a plurality of processing tanks having at least two types of processing functions, namely a first processing function that is the original processing function for performing the process on a substrate according to the recipe, and a second processing function that is different from the first processing function, a transport mechanism that transports substrates between each of the processing tanks, and a control unit that causes the transport mechanism to transport a plurality of substrates and have the plurality of processing tanks perform processing according to the recipe, and is characterized in that the control unit is capable of switching the processing functions for the plurality of processing tanks.

[0009] [Operation and Effect] According to the invention described in claim 1, when the control unit transports multiple substrates using the transport mechanism and causes multiple processing tanks to perform processing according to a recipe, it can switch the processing functions of the multiple processing tanks. Therefore, by switching a processing tank that is used less frequently or has not been used for a long time to a processing function that is used more frequently, it is possible to increase the frequency of use and increase the number of processing tanks available for processing. As a result, it is possible to effectively utilize the processing tanks and stably improve throughput.

[0010] In addition, in the present invention, it is preferable that the apparatus further comprises a selection means that is operated by an operator to select the processing function, and the control section switches to the processing function selected by the selection means (claim 2).

[0011] The selection means allows the operator to flexibly switch to a suitable processing function at his / her discretion.

[0012] In addition, in the present invention, it is preferable that the apparatus further comprises a suggestion means for suggesting, for each of the plurality of processing baths, switching to a processing function suitable for the recipe (claim 3).

[0013] The suggestion means proposes switching to a suitable processing function for each of the processing baths according to the recipe, so that the operator can improve throughput simply by selecting a suitable processing function from the proposals.

[0014] In addition, in the present invention, it is preferable that the apparatus further comprises an actual throughput calculation unit that calculates the throughput during actual processing for each recipe using the multiple processing tanks as an actual throughput, a diverted throughput calculation unit that calculates the throughput when switching to a different processing function during the actual processing as a diverted throughput, and a display unit that displays the actual throughput and the diverted throughput (Claim 4).

[0015] By looking at the actual throughput and the diverted throughput displayed on the display unit, the operator can easily determine which processing function should be switched to in order to improve the throughput.

[0016] In the present invention, it is preferable that the control unit automatically switches to the processing function with the highest throughput based on the actual throughput and the diverted throughput (claim 5).

[0017] The control unit automatically switches to the processing function that maximizes throughput, thereby ensuring improved throughput.

[0018] Furthermore, in the present invention, it is preferable that a predicted throughput calculation unit is further provided for calculating a throughput as a predicted throughput for each recipe for future processing based on a prediction of processing when a plurality of processing functions by the plurality of processing tanks are used, and that the control unit automatically switches to the processing function that provides the maximum predicted throughput (claim 6).

[0019] The predicted throughput calculation unit calculates the predicted throughput, and the control unit automatically switches to the processing function with the largest predicted throughput, thereby ensuring an improvement in throughput.

[0020] In the present invention, it is preferable that the control unit switches a processing tank that has not been used for a long time among the plurality of processing tanks to the second processing function as a substrate standby unit (claim 7).

[0021] The control unit switches the processing tank that has not been used for a long time to the second processing function as a substrate waiting unit. This increases the number of places where substrates can be temporarily waited due to substrate transport, allowing for more flexible transport. As a result, throughput can be improved.

[0022] In the present invention, it is preferable that the control unit switches a processing tank that has not been used for a long time among the plurality of processing tanks to the second processing function as a chuck water washing tank of the transport mechanism (claim 8).

[0023] The control unit switches the processing tank that has not been used for a long time to the second processing function as a chuck rinsing tank of the transport mechanism. This reduces the distance that the transport mechanism travels to rinse and dry the chucks, and shortens the waiting time for rinsing and drying the chucks. As a result, throughput can be improved.

[0024] In the present invention, it is preferable that the control unit switches a treatment tank that has not been used for a long time among the plurality of treatment tanks to the second treatment function as a general-purpose safety tank (claim 9).

[0025] The control unit switches a treatment tank that has not been used for a long time to the second treatment function as a general-purpose safety tank. Therefore, when a need arises to evacuate a treatment tank during chemical treatment, there is no waiting time that would delay the introduction of chemical treatment due to a lack of a place to evacuate the tank. As a result, throughput can be improved. [Effects of the Invention]

[0026] In the substrate processing apparatus according to the present invention, the control unit can switch the processing functions of the processing tanks when the transport mechanism transports multiple substrates and causes the processing tanks to perform processing according to a recipe. Therefore, by switching a processing tank that is used less frequently or has not been used for a long time to a processing function that is used more frequently, the frequency of use can be increased, and the number of processing tanks available for processing can be increased. As a result, the processing tanks can be used more effectively, and throughput can be stably improved. [Brief explanation of the drawings]

[0027] [Figure 1] 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to a first embodiment. [Figure 2]FIG. 2 is a block diagram showing a control system of the substrate processing apparatus according to the first embodiment. [Figure 3] FIG. 10 is a diagram showing a setting screen for a processing function in the first embodiment. [Figure 4] 1 is a flowchart showing a processing flow in the first embodiment. [Figure 5] FIG. 10 is a diagram showing a setting screen for a processing function in the second embodiment. [Figure 6] 10 is a flowchart showing a processing flow in the second embodiment. [Figure 7] FIG. 11 is a diagram showing a setting screen for a processing function in the third embodiment. [Figure 8] 10 is a flowchart showing the flow of processing in the third embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0028] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. [Example]

[0029] A first embodiment of the present invention will be described below with reference to the drawings.

[0030] <1. Overall structure>

[0031] Please refer to Fig. 1. Fig. 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to a first embodiment.

[0032] The substrate processing apparatus 1 performs a predetermined process on the substrates W. The predetermined process may, for example, involve a chemical process using a chemical solution, followed by a pure water cleaning process using pure water, and then a drying process. The substrate processing apparatus 1 can process a plurality of substrates W at once. The substrate processing apparatus 1 can handle and process a plurality of substrates W as one lot. The substrate processing apparatus can also handle and process a single substrate W as one lot.

[0033] A plurality of substrates W (for example, 25 substrates) are stored in a horizontal position in a carrier 3. The carrier 3 storing unprocessed substrates W is placed in an input section 5. The input section 5 is provided with two mounting tables 7 on which the carriers 3 are placed. An unloading section 9 is provided in a position adjacent to the input section 5. This unloading section 9 stores processed substrates W in the carrier 3 and unloads the processed substrates W together with the carrier 3. The unloading section 9, which functions in this manner, is provided with two mounting tables 11 on which the carriers 3 are placed, similar to the input section 5.

[0034] A first transport mechanism 13 configured to be movable between the input unit 5 and the discharge unit 9 is disposed at a position along these units. The first transport mechanism 13 transports the plurality of substrates W together with the carriers 3 placed in the input unit 5 to the second transport mechanism 15. The second transport mechanism 15 is disposed at the rear side in the direction in which the input unit 5, the discharge unit 9, and the first transport mechanism 13 are aligned.

[0035] In the following description, the direction in which the input section 5 and the dispensing section 9 are aligned with the first conveying mechanism 13 is referred to as the "front-to-back direction X" (horizontal direction). In particular, the direction from the first conveying mechanism 13 toward the input section 5 and the dispensing section 9 is referred to as the "forward XF," and the direction opposite the forward XF direction is referred to as the "backward XB." The direction perpendicular to the front-to-back direction X and the horizontal direction is referred to as the "width direction Y." Furthermore, when viewed from the front of the input section 5 and the dispensing section 9, one direction in the width direction Y is appropriately referred to as the "right direction YR," and the other direction opposite the right direction YR is appropriately referred to as the "left direction YL." Furthermore, the vertical direction is referred to as the "up-down direction Z" (height direction, vertical direction). Note that when simply referring to "side" or "lateral direction," it is not limited to either the front-to-back direction X or the width direction Y.

[0036] The second transport mechanism 15 converts the orientation of the substrates W between a horizontal orientation and an upright orientation. After removing all stored substrates W from the carriers 3, the second transport mechanism 15 converts the substrates W to an upright orientation and then transports all of the substrates W to the third transport mechanism WTR. After receiving processed substrates W from the third transport mechanism WTR, the second transport mechanism 15 converts the orientation of the substrates W to a horizontal orientation, then stores the substrates W in the carriers 3 and transports them to the first transport mechanism 11. The second transport mechanism 15 can perform batch assembly, removing substrates W from two carriers 3 and combining them into one lot. A lot is a unit of substrates W that are processed simultaneously.

[0037] The third transport mechanism WTR is configured to be movable in the front-rear direction X. The third transport mechanism WTR is equipped with chucks 17 for simultaneously holding multiple substrates W. The chucks 17 move up and down in the up-down direction Z. The chucks 17 clamp both side surfaces of the substrates W. The chucks 17 oscillate, for example, around a horizontal axis to clamp the substrates W. By clamping the substrates W, the pure water and chemical liquid adhering to the substrates W adhere to the chucks 17.

[0038] A drying part LPD is arranged behind the third transport mechanism WTR in the front-rear direction XB. The drying part LPD stores a plurality of substrates W in a chamber and dries them. The drying part LPD promotes drying of the substrates W, for example, by reducing the pressure inside the chamber.

[0039] A substrate waiting part CWS is provided between the third transport mechanism WTR and the second transport mechanism 15. The substrate waiting part CWS can accommodate multiple substrates W. The substrate waiting part CWS does not process the accommodated substrates W; it simply accommodates substrates W. The substrates W accommodated in the substrate waiting part CWS may be unprocessed, processed, or in the process of being processed.

[0040] A chuck washing tank CHCL is disposed in front XF of the substrate waiting unit CWS, adjacent to the right YR of the discharge unit 9. The chuck washing tank CHCL cleans the chucks 17 of the third transport mechanism WTR. The cleaning process involves, for example, cleaning the chucks 17 with pure water and then drying them. The chuck washing tank CHCL only cleans the chucks 17 of the third transport mechanism WTR, and does not perform any processing on the substrates W.

[0041] A first processing unit 19 is disposed at the rear XB of the third transport mechanism WTR in the front-rear direction X and adjacent to the drying processing unit LPD.

[0042] The first processing unit 19 includes a pure water cleaning unit ONB1 and a chemical processing unit CHB1. The pure water cleaning unit ONB1 performs pure water cleaning processing on a plurality of substrates W. The chemical processing unit CHB1 performs chemical processing on a plurality of substrates W using a processing liquid. The pure water cleaning unit ONB1 includes a lifter LF1 for transferring substrates W to and from the third transport mechanism WTR. The lifter LF1 is configured to be movable between a processing position within the pure water cleaning unit ONB1 and a transfer position above it. The chemical processing unit CHB1 similarly includes a lifter LF2. The lifters LF1 and LF2 move up and down in the vertical direction Z.

[0043] A second processing apparatus 21 is disposed in the rear XB adjacent to the first processing apparatus 19. The second processing apparatus 21 has the same configuration as the first processing apparatus 19. That is, the second processing apparatus 21 includes a pure water cleaning processing apparatus ONB2, a chemical processing apparatus CHB2, and lifters LF3 and LF4.

[0044] A third processing unit 23 is disposed at the rear XB adjacent to the second processing unit 21. The third processing unit 23 has the same configuration as the first processing unit 19 and the second processing unit 21. That is, the third processing unit 23 has a pure water cleaning processing unit ONB3, a chemical processing unit CHB3, and lifters LF5 and LF6.

[0045] The substrate processing apparatus 1 is controlled in an integrated manner by a control unit 25. The control unit 25 is configured with a CPU and a memory. An instruction unit 27 and a display unit 29 are connected to the control unit 25. The control unit 25 is configured to be able to communicate with a host computer (not shown). The control unit 25 can download recipes from the host computer. The recipes are information that specify the specific processing contents for the substrates W.

[0046] The instruction unit 27 is configured with a keyboard and a pointing device such as a mouse, etc. The instruction unit 27 is operated by an operator of the substrate processing apparatus 1.

[0047] The display unit 29 displays various types of information and is configured, for example, by a liquid crystal display device or an organic EL display device.

[0048] <2. Control System>

[0049] Here, reference will be made to Fig. 2. Fig. 2 is a block diagram of a control system of the substrate processing apparatus according to the first embodiment.

[0050] The control unit 25 includes a storage unit 31, a scheduling unit 33, and a throughput calculation unit .

[0051] The memory unit 31 stores various information such as a schedule creation program, recipes, operation history of each component, processing functions set in each processing unit and processing tank, throughput calculated from the schedule, and throughput when actual processing is performed.

[0052] When processing a substrate W based on the recipe in the storage unit 31, the scheduling unit 33 creates a schedule that chronologically specifies in which processing unit the substrate W will be processed and at what timing the substrate W will be transported before the processing is actually performed. The scheduling unit 33 creates the schedule by referring to the recipe and the processing functions of each processing unit. The scheduling unit 33 creates a schedule for performing processing using each resource, such as the first transport mechanism 13, so that the processing is completed as quickly as possible, for example.

[0053] The throughput calculation unit 35 calculates the throughput according to a schedule calculated by the scheduling unit 33 that has not yet been implemented, the throughput according to a schedule created by the scheduling unit 33 that has already been implemented, and the like.

[0054] The control unit 25 can switch between at least two types of processing functions, for example, a first processing function which is the original processing function, and a second processing function which is different from the first processing function, for the substrate waiting unit CWS, the drying processing unit LPD, the pure water cleaning processing unit ONB1, the chemical liquid processing unit CHB1, the pure water cleaning processing unit ONB2, the chemical liquid processing unit CHB2, the pure water cleaning processing unit ONB3, and the chemical liquid processing unit CHB3.

[0055] The first processing function of the substrate waiting part CWS is to accommodate and wait for the substrate W. The first processing function of the drying part LPD is to perform drying processing on the substrate W. The first processing function of the pure water cleaning part ONB1-3 is to perform pure water cleaning on the substrate W. The first processing function of the chemical liquid processing part CHB1-3 is to perform chemical liquid processing on the substrate W.

[0056] In this embodiment, the above-mentioned resources are provided with a second processing function different from the first processing function, which includes a CWS mode, a CHCL mode, and a PP mode. The second processing function is appropriately referred to as a diversion mode. The CWS mode is a processing function as a substrate standby unit. The CHCL mode is a processing function as a chuck water rinse tank. The PP mode is a processing function as a general-purpose safety tank.

[0057] The CWS mode as a processing function is used to make a processed lot wait until transport resources become available, or to make an unprocessed lot wait before processing it. In the CWS mode, no processing is performed on the lot. For example, the pure water cleaning processor ONBx (x is 1 to 3) functions in the CWS mode when the internal processing tank is left empty and the only operation performed is to accommodate substrates W.

[0058] The CHCL mode as a processing function is used to rinse and dry the chucks 17 of the third transfer mechanism WTR. Rinsing and drying are usually performed only in the chuck rinse tank CHCL. If throughput drops due to the unavailability of the chuck rinse tank CHCL, other resources can be operated in place of the chuck rinse tank CHCL. For example, the pure water cleaning unit ONBx (x is 1 to 3) has pure water flowing upward in its internal processing tank, and the lifter LFx (x is 1, 3, or 5) is moved to a position where it does not interfere with the chucks 17. By receiving the chucks 17 and rinsing and drying them, the pure water cleaning unit ONBx (x is 1 to 3) functions as the CHCL mode. Furthermore, if the chuck rinse tank CHCL is located at both ends, front XF and rear XB, of the third transfer mechanism WTR in the forward / backward direction X, the third transfer mechanism WTR does not need to return to the front XF each time the chucks are cleaned. In other words, when chuck cleaning becomes necessary, by selecting the chuck water rinse tank CHCL that is located closer, it is possible to suppress a decrease in throughput due to chuck cleaning.

[0059] The PP mode as a processing function is used to evacuate the lot being processed when an abnormality occurs during processing. For example, if an abnormality occurs in the pure water cleaning tank, which is the next processing step during chemical processing, and it becomes impossible to transport the lot, the pure water cleaning process is performed and the lot is put on standby to prevent the chemical processing from proceeding until another pure water cleaning tank becomes available. This is what the PP mode is used for.

[0060] <3.Settings screen> Here, reference is made to Fig. 3. Fig. 3 is a diagram showing a setting screen for processing functions in the first embodiment.

[0061] The setting screen is displayed on the display unit 29. The operator can select a processing function for each resource by operating the instruction unit 27. In this embodiment, the processing function can be switched for each of the resources, namely, the substrate waiting unit CWS, the drying unit LPD, the pure water cleaning units ONB1 to ONB3, and the chemical processing units CHB1 to CHB3.

[0062] Processing history information IP1 is displayed on the left side of the setting screen. The processing history information IP1 displays the date and time and the recipe. These indicate past recipes that have already been executed and the date and time when each recipe was executed. Actual performance information IP2 is displayed to the right of the processing history information IP1. Actual performance information IP2 displays the actual performance throughput of the processing history information IP1. The actual performance throughput is the throughput calculated for the recipe selected by the operator from the processing history information IP1. Diversion information IP3 is displayed below the actual performance information IP2. The diversion information IP3 displays the diversion throughput. The diversion throughput is the throughput calculated when a diversion mode is set for any resource for the recipe selected in the processing history information IP1.

[0063] Processing function setting information IP4 is displayed in the upper area of ​​the setting screen. Set processing function information IP5 is displayed below the processing function setting information IP4. The processing function setting information IP4 sets a processing function for each resource. The processing function setting information IP4 allows various processing functions to be selected, for example, using a pull-down menu. Note that the dotted line portion of the processing function setting information IP4 in Figure 3 is normally invisible and is only displayed when the pull-down menu is displayed. The processing function setting information IP4 allows the selection of at least two types of processing functions, for example, a first processing function that is the original processing function of the resource, and a second processing function that is different from the first processing function.

[0064] The processing function setting information IP4 is stored in the storage unit 31. The processing function setting information IP4 can set multiple processing functions for each resource as follows: The processing function setting information IP4 associates resources with processing functions in a table format. The processing function setting information IP4 can be edited by the operator.

[0065] In this embodiment, for example, processing functions can be selected for each resource as follows: The substrate standby unit CWS can select from CWS mode as a substrate standby unit, which is its original processing function, CHCL mode as a chuck water-rinsing tank, and PP mode as a general-purpose safety tank. The drying unit LPD can select from LPD mode as a drying unit, which is its original processing function, CWS mode as a substrate standby unit, and PP mode as a general-purpose safety tank. The pure water cleaning unit ONB1 of the first processing unit 19 can select from ONB mode as a pure water cleaning unit, which is its original processing function, CHCL mode as a chuck water-rinsing tank, PP mode as a general-purpose safety tank, and CWS mode as a substrate standby unit. The chemical processing unit CHB1 of the first processing unit 19 can select from CHB mode as a chemical processing unit, CHCL mode as a chuck water-rinsing tank, PP mode as a general-purpose safety tank, and CWS mode as a substrate standby unit, which are its original processing functions. The pure water cleaning unit ONB2 of the second processing unit 21 is the same as the pure water cleaning unit ONB1 of the first processing unit 19. The chemical liquid processing section CHB2 of the second processing section 21 is the same as the chemical liquid processing section CHB1 of the first processing section 19. The pure water cleaning processing section ONB3 of the third processing section 23 is the same as the pure water cleaning processing section ONB1 of the first processing section 19. The chemical liquid processing section CHB3 of the third processing section 23 is the same as the chemical liquid processing section CHB1 of the first processing section 19.

[0066] The set processing function information IP5 displays the processing function when a processing function different from the original processing function is set for each resource. In other words, if it is the original processing function, the name of each resource is displayed as it is. On the other hand, if a processing function different from the original processing function is set, for example, the set processing function is displayed as a diversion mode below the name of each resource.

[0067] <4. Processing flow>

[0068] Next, reference will be made to Fig. 4. Fig. 4 is a flowchart showing the flow of processing in Example 1. Note that, as an example, the description will be given assuming that the pure water cleaning processing unit ONB3 of the third processing unit 23 is a resource that has not been used for a long time.

[0069] Step S1 The operator of the substrate processing apparatus 1 operates the instructing unit 27 while viewing the setting screen of the display unit 29, and switches the processing function of the pure water cleaning unit ONB3 to the diversion mode. For example, it is assumed here that the mode is switched to the CHCL mode as a chuck water rinsing tank. Since the operator switches the processing function by operating the instructing unit 27, the operator can flexibly switch to a suitable processing function at his or her discretion.

[0070] Step S2 The scheduling unit 33 of the control unit 25 creates a schedule based on the recipe and the processing functions of each resource set in the set processing function information IP5 on the setting screen. The throughput calculation unit 35 calculates the throughput based on the created schedule.

[0071] Step S3 The throughput calculated by the throughput calculation unit 25 is displayed as a diverted throughput in the diverted information IP3 on the setting screen, as shown in Fig. 3. Here, as an example, the set processing function information IP5 displays the CHCL mode as a diverted mode for the pure water cleaning processing unit ONB3.

[0072] Step S4 The operator compares the actual throughput on the setting screen with the diverted throughput and determines whether to perform processing in this state. If the diverted throughput is lower than the actual throughput or there is no significant difference, the operator can operate the instruction unit 27 to return to step S1 and reselect the processing function.

[0073] Step S5 When the operator operates the instruction unit 27 to instruct that processing be performed, the control unit 25 executes the recipe in the set state of the processing functions including the diversion mode, and starts processing the lot.

[0074] According to this embodiment, the control unit 25 controls the third transport mechanism WTR to transport multiple substrates W and to perform processing according to a recipe in the substrate waiting unit CWS, the drying unit LPD, the pure water cleaning units ONB1-ONB3, the chemical processing units CHB1-CHB3, etc., and can switch the processing functions of these processing units to the diversion mode. Therefore, by switching infrequently used processing tanks or processing tanks that have not been used for a long time to more frequently used processing functions, the frequency of use can be increased, and the number of processing tanks available for processing can be increased. As a result, the processing tanks can be used more effectively, and throughput can be stably improved.

[0075] In particular, the throughput is improved for the following reasons.

[0076] That is, as shown in FIG. 1, the chuck water-rinsing tank CHCL is disposed only on the front XF side in the front-rear direction X. When the diversion mode is set, the chuck water-rinsing tank CHCL is also disposed on the rear XB side in the front-rear direction X. Therefore, after the third transfer mechanism WT receives a lot from the chemical solution processing unit CHBx (x is 1 or 2) and transports it to the pure water cleaning processing unit ONBx (x is 1 or 2), the chucks 17 are contaminated with chemical solutions. Therefore, before transporting another lot, the chucks 17 must be rinsed and dried in the chuck water-rinsing tank CHCL. When the pure water cleaning processing unit ONB3 is operated in the diversion mode, after the chucks 17 have transported a lot from the chemical solution processing unit CHB2 to the pure water cleaning processing unit ONB2, the chucks 17 can be rinsed and dried by simply moving them to the pure water cleaning processing unit ONB3 at the rear XB without moving them to the chuck water-rinsing tank CHCL at the front XF. This improves the transport efficiency of the third transport mechanism WTR that transports lots, thereby improving the overall throughput.

[0077] The correspondence between the above-described embodiments and the present invention is as follows.

[0078] The substrate waiting unit CWS, the chuck water rinsing tank CHCL, the pure water cleaning unit ONB1-ONB3, and the chemical solution processing unit CHB1-CHB3 correspond to the "plurality of processing tanks" in the present invention. The third transport mechanism WTR corresponds to the "transport mechanism" in the present invention. The instruction unit 27 corresponds to the "selection means" in the present invention. The throughput calculation unit 35 corresponds to the "actual throughput calculation unit" and the "diversion throughput calculation unit" in the present invention. [Example]

[0079] Next, a second embodiment of the present invention will be described with reference to the drawings.

[0080] 5 is a diagram showing a setting screen for processing functions in Example 2. The schematic configuration of the substrate processing apparatus 1 and the control system of the substrate processing apparatus 1 are the same as those in Example 1 described above, and therefore detailed description thereof will be omitted.

[0081] <5.Settings screen>

[0082] Processing history information IP1 is displayed on the left side of the setting screen. Performance information IP2 is displayed to the right of the processing history information IP1. Diversion information IP3 is displayed below the performance information IP2. Processing function setting information IP4 is displayed in the upper area of ​​the setting screen. Set processing function information IP5 is displayed below the processing function setting information IP4. This information is the same as in the first embodiment described above. This embodiment differs from the first embodiment in that proposed information IP6 is displayed between the set processing function information IP5 and the processing function setting information IP4.

[0083] The proposal information IP6 proposes a suitable processing function for each resource according to the recipe. That is, the throughput calculation unit 35 calculates the throughput when each resource is set to the diversion mode for the recipe specified in the processing history information IP1. The diversion mode that results in the highest throughput is determined to be the suitable processing function. The suitable processing function is then displayed in the proposal information IP6. The proposal information IP6 only displays the suitable processing function, but does not set it as a processing function. If the operator determines that there is no problem with switching to the proposed processing function by referring to the proposal information IP6, he or she can operate the instruction unit 27 to switch the processing function in the processing function setting information IP4 to the proposed processing function in the proposal information IP6.

[0084] <6. Processing flow>

[0085] Next, reference will be made to Fig. 6. Fig. 6 is a flowchart showing the flow of processing in Example 2. Note that, as an example, the description will be given assuming that the pure water cleaning processing unit ONB3 of the third processing unit 23 is a resource that has not been used for a long time.

[0086] Step S11 The operator of the substrate processing apparatus 1 issues an instruction to the instruction unit 27 for the proposed processing.

[0087] Step S12 The scheduling unit 33 of the control unit 25 sets all the processing functions that can be set for each resource, and then creates a schedule for each resource. Then, the throughput calculation unit 25 calculates the throughput for all the schedules.

[0088] Step S13 The control unit 25 displays the processing function used in the schedule with the highest throughput as the preferred processing function in the proposal information IP6. Here, as shown in Fig. 5, for example, it is assumed that the CHCL mode is displayed as the proposed mode for the pure water cleaning processing unit ONB1 of the third processing unit 23.

[0089] Step S14 If the operator checks the display unit 25 and determines that there is no problem in setting the processing function of the proposal information IP6 to the corresponding resource, the operator operates the instruction unit 27 to set the processing function proposed in the proposal information IP6 in the processing function setting information IP4. As a result, the CHCL mode is set as the diversion mode for the pure water cleaning processor ONB3 in the set processing function information IP5, as shown in Fig. 5 .

[0090] Step S15 The scheduling unit 33 creates a schedule based on the processing functions set in the processing function setting information IP4. The throughput calculation unit 35 calculates the throughput according to the schedule.

[0091] Step S16 The throughput calculated in step S15 is displayed as the diverted throughput in the diverted information IP3, as shown in FIG.

[0092] Step S17 The operator compares the actual throughput on the setting screen with the diverted throughput and determines whether to perform processing in this state. If the actual throughput is lower than the actual throughput or there is no significant difference, the operator can operate the instruction unit 27 to return to step S14 and start over by setting other proposed processing functions.

[0093] Step S18 When the operator issues an instruction to perform processing from the instruction unit 27, the control unit 25 executes the recipe in the set state of the processing functions including the diversion mode, and starts processing the lot.

[0094] According to this embodiment, the proposal information IP6 proposes switching to a suitable processing function for each resource according to the recipe. Therefore, the operator can improve throughput by simply selecting a suitable processing function from the proposal.

[0095] The correspondence between the above-described embodiments and the present invention is as follows.

[0096] The display unit 29 and the suggestion information IP6 correspond to the "suggestion means" in the present invention. [Example]

[0097] Next, a third embodiment of the present invention will be described with reference to the drawings.

[0098] 7 is a diagram showing a setting screen for processing functions in Example 3. The schematic configuration of the substrate processing apparatus 1 and the control system of the substrate processing apparatus 1 are the same as those in Example 1 described above, and therefore detailed description thereof will be omitted.

[0099] <7.Settings screen>

[0100] Recipe information IP7 is displayed on the left side of the setting screen. The recipe information IP7 includes the recipe to be executed and the execution order received from a host computer (not shown). The operator can select a desired recipe from the recipe information IP7 using the instruction unit 27. Processing function setting information IP4 is displayed to the right of the recipe information IP7. Set processing function information IP5 is displayed below the processing function setting information IP4. Predicted throughput information IP8 is displayed below the set processing function information IP5.

[0101] The predicted throughput information IP8 displays the predicted throughput calculated by the throughput calculation unit 35. Specifically, the scheduling unit 33 creates all schedules for the recipe selected in the recipe information IP7 when multiple processing functions are used for each resource. The throughput calculation unit 35 calculates the throughput of each created schedule as the predicted throughput. Then, the processing function set in the schedule with the highest throughput is automatically set to the resource as a diverted mode. The processing function in the diverted mode that has been set is then displayed in the set processing function information IP5.

[0102] <8. Processing flow>

[0103] Next, reference will be made to Fig. 7. Fig. 7 is a flowchart showing the flow of processing in Example 3. Note that, as an example, the description will be given assuming that the pure water cleaning processing unit ONB3 of the third processing unit 23 is a resource that has not been used for a long time.

[0104] Step S21 The operator uses the instruction unit 27 to specify the recipe to be used from the recipe information IP7.

[0105] Step S22 The scheduling unit 33 and the throughput calculation unit 35 switch between switchable processing functions for each resource for the specified recipe, create schedules, and calculate the throughput for each schedule.

[0106] Step S23 The control unit 25 switches the processing function of each resource used in the schedule with the maximum throughput among the throughputs of each schedule calculated by the throughput calculation unit 35 to a diversion mode. The diversion mode at this time is displayed in the set processing function information IP5. Here, as an example, as shown in FIG. 7, the CHCL mode is displayed as the diversion mode for the pure water cleaning processing unit ONB3.

[0107] Step S24 The operator issues an instruction to start processing using the instruction unit 29. In response, the substrate processing apparatus 1 starts processing according to the schedule created based on the settings of the set processing function information IP5.

[0108] According to this embodiment, the processing function with the highest predicted throughput is automatically selected, thereby ensuring an improvement in throughput.

[0109] The correspondence between the above-described embodiments and the present invention is as follows.

[0110] The throughput calculation unit 35 corresponds to the "predicted throughput calculation unit" in the present invention.

[0111] The present invention is not limited to the above-described embodiment, but can be modified as follows.

[0112] (1) In each of the above-described embodiments 1 to 3, the substrate processing apparatus 1 having the configuration shown in Fig. 1 has been described as an example. However, the present invention is not limited to the substrate processing apparatus 1 having such a configuration.

[0113] (2) In each of the above-described first to third embodiments, the processing functions of the first processing unit 19, the second processing unit 21, the third processing unit 23, the substrate standby unit CWS, and the drying unit LPD, among the resources of the substrate processing apparatus 1, are switchable. However, the present invention is not limited to switchable processing functions of only these units. For example, the chuck water rinse tank CHCL may also be configured to switchable processing functions. Furthermore, the diversion mode is not limited to the CWS mode, CHCL mode, and PP mode.

[0114] (3) In the first and second embodiments described above, the operator selects and sets the processing function. However, the present invention is not limited to this method. In other words, the actual throughput and the diverted throughput may be compared, and the processing function of each resource set in the schedule with the higher throughput may be automatically switched to.

[0115] (4) In the above-described first to third embodiments, the processing function is switched to the CHCL mode as a chuck water rinse tank. However, the present invention is not limited to such switching. For example, the processing function may be switched to the processing function as a substrate standby unit (CWS mode) or the processing function as a general-purpose safety tank (PP mode).

[0116] (5) In each of the above-described first to third embodiments, the processing functions are switched using a pull-down menu in the processing function setting information IP4. However, the present invention is not limited to this method. For example, the processing functions may be switched using radio buttons, check boxes, or other methods. [Explanation of symbols]

[0117] W: Substrate 1... Substrate processing equipment 13 ... First transport mechanism 15 ... Second transport mechanism WTR: Third transport mechanism 17 ... Chuck LPD: Drying processing section CHCL: Chuck washing tank 19 ... First processing section 21 ... Second processing section 23 ... Third processing section ONB1~ONB3: Pure water cleaning processing section CHB1~CHB3 ... Chemical treatment section LF1~LF6 ... Lifter 25 ... Control section 27 … Instruction section 29 … Display section 31 … Storage section 33... Scheduling Department 35 ... Throughput calculation section IP1 … Processing history information IP2 … Performance information IP3 … Reuse information IP4 … Processing function setting information IP5 … Configured processing function information IP6 … Proposal information IP7 … Recipe information IP8 … Estimated throughput information

Claims

1. In a substrate processing apparatus, a predetermined process is performed on a substrate according to a recipe that defines the process content, a plurality of processing tanks each capable of processing a plurality of substrates and each having at least two types of processing functions, namely, a first processing function which is an original processing function for processing substrates in accordance with the recipe, and a second processing function which is different from the first processing function; a transport mechanism for transporting substrates between the processing baths; a control unit that causes the transport mechanism to transport a plurality of substrates and causes the plurality of processing baths to perform processing according to the recipe; Equipped with an actual throughput calculation unit that calculates a throughput during actual processing for each recipe using the plurality of processing tanks as an actual throughput; a diverted throughput calculation unit that calculates a throughput when the processing function is switched to a different processing function during the actual processing as a diverted throughput; a display unit that displays the actual throughput and the diverted throughput; Furthermore, The substrate processing apparatus is characterized in that the control unit can switch the processing functions of the plurality of processing tanks.

2. 2. The substrate processing apparatus according to claim 1, further comprising a selection means operated by an operator to select the processing function; The substrate processing apparatus is characterized in that the control unit switches to the processing function selected by the selection means.

3. 3. The substrate processing apparatus according to claim 1, The substrate processing apparatus further comprises a suggestion unit that suggests switching to a suitable processing function for each of the plurality of processing tanks according to the recipe.

4. In the substrate processing apparatus according to claim 1, The substrate processing apparatus is characterized in that the control unit automatically switches to a processing function with the highest throughput based on the actual throughput and the diverted throughput.

5. A substrate processing apparatus that performs a predetermined process on a substrate according to a recipe that defines the process content, a plurality of processing tanks each capable of processing a plurality of substrates and each having at least two types of processing functions, namely, a first processing function which is an original processing function for processing substrates in accordance with the recipe, and a second processing function which is different from the first processing function; a transport mechanism for transporting substrates between the processing baths; a control unit that causes the transport mechanism to transport a plurality of substrates and causes the plurality of processing baths to perform processing according to the recipe; Equipped with a predicted throughput calculation unit that calculates a throughput as a predicted throughput based on a prediction of a process when a plurality of process functions of the plurality of process tanks are used for each recipe for a process to be performed, the control unit is capable of switching the processing functions of the plurality of processing tanks, The substrate processing apparatus is characterized in that the control unit automatically switches to a processing function that maximizes the predicted throughput.

6. A substrate processing apparatus that performs a predetermined process on a substrate according to a recipe that defines the process content, a plurality of processing tanks each capable of processing a plurality of substrates and each having at least two types of processing functions, namely, a first processing function which is an original processing function for processing substrates in accordance with the recipe, and a second processing function which is different from the first processing function; a transport mechanism for transporting substrates between the processing baths; a control unit that causes the transport mechanism to transport a plurality of substrates and causes the plurality of processing baths to perform processing according to the recipe; Equipped with the control unit is capable of switching the processing functions of the plurality of processing tanks, The substrate processing apparatus, wherein the control unit switches a processing tank that has not been used for a long time among the plurality of processing tanks to the second processing function as a substrate standby unit.

7. A substrate processing apparatus that performs a predetermined process on a substrate according to a recipe that defines the process content, a plurality of processing tanks each capable of processing a plurality of substrates and each having at least two types of processing functions, namely, a first processing function which is an original processing function for processing substrates in accordance with the recipe, and a second processing function which is different from the first processing function; a transport mechanism for transporting substrates between the processing baths; a control unit that causes the transport mechanism to transport a plurality of substrates and causes the plurality of processing baths to perform processing according to the recipe; Equipped with the control unit is capable of switching the processing functions of the plurality of processing tanks, The control unit switches a processing tank that has not been used for a long time among the plurality of processing tanks to the second processing function as a chuck water washing tank of the transport mechanism.

8. A substrate processing apparatus that performs a predetermined process on a substrate according to a recipe that defines the process content, a plurality of processing tanks each capable of processing a plurality of substrates and each having at least two types of processing functions, namely, a first processing function which is an original processing function for processing substrates in accordance with the recipe, and a second processing function which is different from the first processing function; a transport mechanism for transporting substrates between the processing baths; a control unit that causes the transport mechanism to transport a plurality of substrates and causes the plurality of processing baths to perform processing according to the recipe; Equipped with the control unit is capable of switching the processing functions of the plurality of processing tanks, The substrate processing apparatus, wherein the control unit switches a processing tank that has not been used for a long time among the plurality of processing tanks to the second processing function as a general-purpose safety tank.

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