Condensed water separator and semiconductor process equipment

Abstract

A condensed water separation device used in a gas exhaust system of a semiconductor process equipment, the gas exhaust system including an exhaust pipeline, a pressure control valve group 5 provided in the exhaust pipeline, the condensed water separation device including a bent-line gas passage provided therein, the gas passage including a plurality of passages connected in sequence along a gas flow direction, the intake end of the most upstream passage 1a functioning as an intake port and used to connect to the outlet end of the pressure control valve group 5, the exhaust end A4 of the most downstream passage 1d functioning as an exhaust port and being higher than the intake end of the passage, and at least one exhaust end of the remaining passages being lower than the intake end, and a one-way liquid drainage structure 7 connected to a connection point between the passage whose exhaust end is lower than the intake end and the downstream passage, and used to drain the flowing condensed water.

Description

[Technical Field]

[0001] The present invention relates to the technical field of semiconductor processing equipment, and more particularly to a condensed water separator and a semiconductor processing equipment. [Background technology]

[0002] Semiconductor processing equipment, such as diffusion furnaces, is an important piece of front-end processing equipment in integrated circuit production lines, primarily used for doping semiconductors. While ion implantation can be used for some processes, thermal diffusion is the primary and most common doping method. Thermal oxidation of silicon involves reacting the silicon wafer surface with an oxidizing agent at high temperatures to grow a layer of silica. There are two oxidation methods: dry oxygen oxidation and wet oxygen oxidation. The thickness, uniformity, and particle content of the oxide film are key performance indicators for vertical furnace equipment, and many factors affect these indicators, with chamber pressure stability being a key factor.

[0003] A diffusion furnace generally includes five basic assemblies: a control system, a process furnace tube, a gas delivery system, a gas exhaust system, and a loading system. The gas exhaust system is connected to a factory facility system, including a factory facility exhaust unit and a factory facility drainage unit, and is used to exhaust by-products and unused raw material gases during the process and to control the pressure within the chamber to fluctuate within a certain range. The pressure control valves in the gas exhaust system are an important component for stabilizing chamber pressure control. Many factors affect the stability of pressure control, of which the process exhaust gas temperature, condensed water content, and impurity content are the main influencing factors. Summary of the Invention [Problem to be solved by the invention]

[0004] In conventional gas exhaust systems for semiconductor process equipment, pressure control valves are susceptible to backflow of condensed water in factory facility gas exhaust units, which results in unstable pressure control effects of the pressure control valves and ultimately damage to the valve bodies.

[0005] The objective of the present invention is to provide a condensate separator and a semiconductor processing device in response to the deficiencies of the prior art, the condensate separator being installed at the outlet end of the pressure control valve group of the gas exhaust system, and capable of preventing backflowing condensate from entering the pressure control valve group. [Means for solving the problem]

[0006] In order to achieve the above object, the present invention provides a condensed water separator for use in a gas exhaust system of a semiconductor process equipment, the gas exhaust system including an exhaust pipeline, and a group of pressure control valves provided in the exhaust pipeline; an apparatus main body having a bent-line gas passage provided therein, the gas passage including a plurality of passages communicating in sequence along a gas flow direction, the intake end of the most upstream passage functioning as an intake port and used to connect to the outlet ends of the pressure control valve group, the exhaust end of the most downstream passage functioning as an exhaust port and higher than the intake end of the most downstream passage, and the exhaust end of at least one of the remaining passages lower than the intake end; and a one-way drainage structure connected to a junction of the passage and a downstream passage, the exhaust end of which is lower than the intake end, for discharging flowing condensed water.

[0007] Optionally, the plurality of passages include a first passage, a second passage, and a third passage, a lower end of the first passage being open to form the intake port, an upper end of the first passage being connected to an intake end of the second passage via the third passage inclined downward, an upper end of the second passage being open to form the exhaust port, and the intake end of the second passage being lower than the upper end thereof; The one-way drainage structure has one end connected to the lower end of the second passage and the other end forming a drainage port.

[0008] Optionally, the second passage includes a first sub-passage and an inclined second sub-passage, an axis of the first sub-passage being parallel to the axis of the first passage, the first sub-passage having an intake end of the second passage and connected to an upper end of the first passage via the third passage, a lower end of the first sub-passage being connected to one end of the one-way drainage structure, the first sub-passage further having an exhaust end connected to the lower end of the second sub-passage, the exhaust end being higher than the intake end of the second passage; The upper end of the second sub-passage forms the exhaust port in the device body, and the exhaust port is provided coaxially with the intake port.

[0009] Optionally, the one-way drainage structure includes a valve body and a partition plate; a valve chamber is provided inside the valve body, the valve chamber including a first straight body portion, a tapered portion, and a second straight body portion connected in this order, a liquid supply port is formed in the valve body at one end of the second straight body portion remote from the tapered portion, and the liquid supply port is connected to a connection point between each passage, whose exhaust end is lower than its intake end, and a downstream passage; The partition plate is provided within the first straight body portion, and a plurality of through holes are opened in the partition plate to connect both sides of the partition plate. A sphere is provided on the side of the partition plate near the tapered portion, and the sphere is slidably engaged with the first straight body portion. An elastic part is provided between the sphere and the partition plate, and the elastic force of the elastic part applies an elastic force to the sphere in the direction of the tapered portion, causing the sphere to contact the inner wall of the tapered portion and close the valve chamber. The drain port is formed in the valve body on the side of the partition plate in the first straight body portion away from the tapered portion.

[0010] Optionally, the one-way drainage structure further includes a first connecting pipe and a fourth connecting pipe; the liquid supply port is connected via the first connecting pipe to a connection point between each passage, the exhaust end of which is lower than the intake end, and a downstream passage, and the valve body is detachably connected to the first connecting pipe; The fourth connecting pipe is detachably connected to the valve body and communicates with the drain port.

[0011] Optionally, a second connecting pipe is connected to the air inlet, and a heating element is provided on the outer periphery of the second connecting pipe.

[0012] Optionally, the heating element includes a heating wire helically wound around the second connecting tube.

[0013] Optionally, a third connecting pipe is connected to the exhaust port, and a cooling component is provided on the outer periphery of the third connecting pipe.

[0014] Optionally, the cooling component includes a cooling jacket, a cooling chamber is provided inside the cooling jacket, and a water intake pipe and a water discharge pipe are provided outside the cooling jacket, communicating with the cooling chamber.

[0015] Optionally, a temperature sensor is provided within the second passageway.

[0016] The present invention relates to a semiconductor processing apparatus including a reaction chamber and a gas exhaust system, the gas exhaust system comprising: an exhaust pipeline connected to the reaction chamber; a pressure control valve group provided in the exhaust pipeline; and a condensate separator as described above, the intake of which is removably connected to the outlet end of the pressure control valve group.

[0017] Optionally, the system further includes an exhaust gas condenser, a gas-liquid separator, and a condensed water drainage device; the gas-liquid separator is connected to the reaction chamber via a first pipe line, an exhaust gas condenser is provided in the first pipe line, and a liquid discharge end and an exhaust end of the gas-liquid separator are connected to the condensed water discharge device and the pressure control valve group via a second pipe line and a third pipe line, respectively; The exhaust port of the condensate separator is used to connect to an exhaust unit of a factory facility system, and the drain port is used to connect to a drainage unit of the factory facility system, and the condensate drainer is connected to the drainage unit via a fourth pipe. [Effects of the Invention]

[0018] The present invention provides a condensed water separator, the beneficial effects of which are as follows:

[0019] 1. The condensed water separator is installed at the outlet end of a pressure control valve group in a gas exhaust system of a semiconductor processing equipment, and has a bent-line gas passageway within its body, which includes a plurality of passageways connected in sequence along the gas flow direction, the intake end of the most upstream passageway functions as an intake port and is connected to the outlet end of the pressure control valve group, the exhaust end of the most downstream passageway functions as an exhaust port and is higher than the intake end of the most downstream passageway, and the exhaust end of at least one of the remaining passageways is lower than the intake end. Gas enters through the intake port, passes through the bent-line gas passageway, and is exhausted through the exhaust port. By having the exhaust end of at least one passageway lower than the intake end, backflowing condensed water is less likely to flow back into the upstream passage after entering the passageway, and can be discharged using the one-way drainage structure, preventing backflowing condensed water from entering the pressure control valve group. 2. The condensate separation device is connected to the exhaust unit of the factory facility system and the drainage unit of the factory facility system via the second connecting pipe and the third connecting pipe, respectively. A heating element and a cooling element are respectively provided on the outer periphery of the second connecting pipe and the third connecting pipe. The heating element can heat the gas entering the first passage, thereby preventing the condensate in the first passage from flowing back into the control valve group. The cooling element promotes the condensation effect in the third connecting pipe at the top of the second passage, causing the condensate at this location to flow into the lower end of the second passage and then be discharged through a one-way drainage structure, further preventing the condensate from flowing back into the control valve group. 3. In the gas exhaust system of the semiconductor process equipment, the condensed water separator is installed between the outlet end of the pressure control valve group and the exhaust unit of the factory facility system. The exhaust gas condenser and the cooling components of the condensed water separator produce a double condensation effect, effectively separating the gas and liquid in the exhaust gas. The condensed water in the third connecting pipe above the second passage and the exhaust unit is discharged through the second passage and the one-way drainage structure, making it less likely to enter the first passage and less likely to flow back into the pressure control valve group.

[0020] Other features and advantages of the present invention are described in detail in the following specific embodiment section. [Brief explanation of the drawings]

[0021] The above and other objects, features, and advantages of the present invention will become more apparent from the following detailed description of exemplary embodiments of the present invention, taken in conjunction with the accompanying drawings, in which like reference numerals generally represent like components.

[0022] [Figure 1] 1 is a schematic structural view of a polygonal gas passage according to an embodiment of the present invention; [Figure 2] 1 is a structural schematic diagram of a condensed water separator according to an embodiment of the present invention; [Figure 3] 1 is a structural schematic diagram of a one-way drainage structure of a condensed water separator according to an embodiment of the present invention; [Figure 4] A schematic cross-sectional structure diagram of direction A in FIG. 3 is shown. [Figure 5] 1 shows a structural schematic diagram of a gas exhaust system according to an embodiment of the present invention; DETAILED DESCRIPTION OF THE INVENTION

[0023] Hereinafter, preferred embodiments of the present invention will be described in more detail. Hereinafter, preferred embodiments of the present invention will be described, but it should be understood that the present invention is not limited to the embodiments described herein and can be realized in various forms. Rather, these embodiments are provided to more clearly and completely explain the present invention and fully convey the scope of the present invention to those skilled in the art.

[0024] Example The present invention provides a condensed water separator for use in a gas exhaust system of a semiconductor processing device, the gas exhaust system including an exhaust pipeline and a pressure control valve group in the exhaust pipeline. The condensed water separator includes an apparatus body 1 and a one-way drainage structure 7.

[0025] A polygonal gas passage is provided inside the device body 1, and the gas passage includes multiple passages that are connected in sequence along the gas flow direction. For example, the gas passage shown in FIG. 1 includes four passages: an upstream passage 1a, a first intermediate passage 1b, a second intermediate passage 1c, and a downstream passage 1d, in that order along the gas flow direction. The intake end A1 of the upstream passage 1a functions as an intake port and is used to connect to the outlet end of the pressure control valve group. The exhaust end A4 of the downstream passage 1d functions as an exhaust port and is higher than the intake end A3 of the downstream passage 1d. The exhaust ends of the remaining two passages are both lower than the intake ends. That is, the exhaust end A2 of the first intermediate passage 1b is lower than its intake end, and the exhaust end A3 of the second intermediate passage 1c is lower than its intake end.

[0026] The one-way drainage structure 7 is connected to the connection point between a passage whose exhaust end is lower than the intake end (for example, the exhaust end A3 of the second intermediate passage 1c) and a downstream passage (i.e., the most downstream passage 1d), and is used to drain flowing condensed water.

[0027] The flow direction of gas is indicated by solid arrows in Fig. 1, and the flow direction of condensed water is indicated by dashed arrows in Fig. 1. Gas enters from an intake port (i.e., intake end A1 of the most upstream passage 1a), passes through the zigzag gas passage, and is then discharged from an exhaust port (i.e., exhaust end A4 of the most downstream passage 1d). By making the exhaust end of at least one passage (i.e., first intermediate passage 1b and second intermediate passage 1c) lower than the intake end, backflowing condensed water is less likely to flow back into the upstream passage after entering that passage, and can be discharged by the one-way drainage structure 7, preventing the backflowing condensed water from entering the pressure control valve group.

[0028] Although FIG. 1 shows two passages (i.e., the first intermediate passage 1b and the second intermediate passage 1c) connected between the most upstream passage 1a and the most downstream passage 1d, the embodiment of the present invention is not limited to this, and in actual operation, one passage or three or more passages may be connected. Furthermore, while FIG. 1 shows the exhaust ends of both the first intermediate passage 1b and the second intermediate passage 1c being lower than the intake ends, the embodiment of the present invention is not limited to this, and in actual operation, the exhaust end of only one intermediate passage may be lower than the intake end. Furthermore, while FIG. 1 shows the one-way drainage structure 7 connected to the connection point between the exhaust end A3 of the second intermediate passage 1c and the downstream passage (i.e., the most downstream passage 1d), the embodiment of the present invention is not limited to this, and in actual operation, the one-way drainage structure 7 may be connected to the connection point between the exhaust end A2 of the first intermediate passage 1b and the downstream passage (i.e., the second intermediate passage 1c). Alternatively, there are two one-way drainage structures 7, connected to the connection point between the exhaust end A3 of the second intermediate passage 1c and the downstream passage, and to the connection point between the exhaust end A2 of the first intermediate passage 1b and the downstream passage, respectively.

[0029] In FIG. 1, the most upstream passage 1a and the most downstream passage 1d are both vertically arranged straight passages, and the first intermediate passage 1b and the second intermediate passage 1c are both arc-shaped passages, but the embodiment of the present invention is not limited to this, and in actual operation, each passage can be set to any shape according to specific needs.

[0030] In a preferred embodiment, as shown in FIGS. 2 to 5, the plurality of passages include a first passage 2, a second passage 3, and a third passage 4, the lower end of the first passage 2 being open to form the intake port, which is used to connect to the outlet end of the pressure control valve group 5, the upper end of the first passage 2 being connected to the intake end of the second passage 3 via the downwardly inclined third passage 4, the upper end of the second passage 3 being open to form the exhaust port, and the intake end of the second passage 3 being lower than the upper end thereof.

[0031] One end of the one-way drainage structure 7 is connected to the lower end of the second passage 3, and the other end forms a drainage port.

[0032] Specifically, the condensed water separation device is installed downstream of a pressure control valve group 5 in a gas exhaust system for a semiconductor device, and a first passage 2 and a second passage 3 are connected independently of each other by an inclined third passage 4 to form a zigzag gas passage, and gas enters through an intake port, passes through the zigzag gas passage, and is then discharged from an exhaust port. After entering the second passage 3, backflowing condensed water is unlikely to flow back into the first passage 2, and can be discharged by a one-way drainage structure 7, preventing the backflowing condensed water from entering the pressure control valve group 5.

[0033] The factory facility system further includes an exhaust unit 6 and a drainage unit 9, with an exhaust port connected to the exhaust unit 6 and a drainage port connected to the drainage unit 9. The first passage 2 and the second passage 3 are connected to each other independently by an inclined third passage 4 to form a zigzag gas passage, and gas enters through the intake port, passes through the zigzag gas passage, and is then discharged from the exhaust port to the exhaust unit 6. Condensed water in the exhaust unit 6 is unlikely to re-enter the first passage 2 after entering the second passage 3, and can be discharged to the drainage unit 9 by the one-way drainage structure 7, preventing backflow of condensed water in the exhaust unit 6 from entering the pressure control valve group 5. In this way, adverse effects on the control valve group caused by condensed water in the drainage unit 9 and corrosive by-products in the reaction chamber 34 are effectively prevented.

[0034] Optionally, the first passage 2 and the second passage 3 are both arranged vertically and parallel to each other, with the upper end of the third passage 4 connected to the upper end of the first passage 2 and the lower end of the third passage 4 connected to the side wall of the second passage 3 near the lower end of the second passage 3. In this way, a storage space capable of storing a certain amount of liquid is formed in the lower part of the second passage 3, making it easy to periodically or quantitatively discharge the liquid in the storage space.

[0035] Optionally, a second connecting pipe 10 is connected to the air inlet, and a heating element 11 is provided on the outer periphery of the second connecting pipe 10 .

[0036] Specifically, the second connecting pipe 10 can be threadedly connected to the piping at the inlet and outlet ends of the pressure control valve group 5, and is detachable, facilitating maintenance, repair, and replacement. The heating element 11 heats the second connecting pipe 10 and the gas therein, raising the gas temperature to 100°C, thereby preventing condensed water from remaining in the piping in this section from flowing back into the control valve group.

[0037] A third connecting pipe 12 is selectively connected to the exhaust port, and a cooling element 13 is provided on the outer periphery of the third connecting pipe 12.

[0038] Specifically, the third connecting pipe 12 can be threadedly connected to the exhaust port and the inlet end pipe of the exhaust unit 6, and is detachable, facilitating maintenance, repair, and replacement. The cooling effect of the cooling element 13 on the third connecting pipe 12 and the gas therein promotes the water vapor to condense in the third connecting pipe 12, which then returns to the second passage 3 and can be discharged by the one-way drainage structure 7, preventing the condensed liquid in the third connecting pipe 12 and the exhaust unit 6 from flowing back into the control valve group.

[0039] The second passage 3 optionally includes a first sub-passage 14 and an inclined second sub-passage 15. The first sub-passage 14 is located on one side of the first passage 2, with the axis of the first sub-passage 14 parallel to the axis of the first passage 2. The first sub-passage 14 has an intake end of the second passage 3 and is connected to the upper end of the first passage 2 via the third passage 4, with the lower end of the first sub-passage 14 connected to one end of the one-way drainage structure 7. The first sub-passage 14 further has an exhaust end connected to the lower end of the second sub-passage 15, with the exhaust end being higher than the intake end of the second passage 3. The upper end of the second sub-passage 15 forms an exhaust port in the device body 1, and the exhaust port is arranged coaxially with the intake port.

[0040] Specifically, the inclined second sub-passage 15 allows the position of the exhaust port to correspond to the position of the intake port, thereby realizing a coaxial arrangement of the exhaust port and the intake port. In this way, the detachable connection between the second connecting pipe 10 and the third connecting pipe 12 makes it easy to install the condensate separator in the existing straight pipe between the pressure control valve group 5 and the exhaust unit 6, and facilitates upgrading of the existing gas exhaust system.

[0041] Optionally, the one-way drainage structure 7 includes a valve body 16 and a partition plate 20 .

[0042] A valve chamber is provided inside the valve body 16, and the valve chamber includes a first straight body section 17, a tapered section 18, and a second straight body section 19, which are connected in that order. A liquid supply port is formed in the valve body 16 at one end of the second straight body section 19, away from the tapered section 18, and the liquid supply port is connected to the connection point between each passage (e.g., the third passage 4) whose exhaust end is lower than the intake end and the downstream passage (i.e., the second passage 3).

[0043] The partition plate 20 is provided within the first straight body portion 17, and has a plurality of through holes 21 that communicate with both sides of the partition plate 20. A sphere 22 is provided on the side of the partition plate 20 closer to the tapered portion 18, and the sphere 22 is slidably engaged with the first straight body portion 17. An elastic element 23 is provided between the sphere 22 and the partition plate 20, and the elastic force of the elastic element 23 applies an elastic force to the sphere 22 in the direction of the tapered portion 18, causing the sphere 22 to come into contact with the inner wall of the tapered portion 18 and close the valve chamber. A drain port is formed in the valve element 16 on the side of the partition plate 20 in the first straight body portion 17 away from the tapered portion 18.

[0044] Optionally, the one-way drainage structure 7 further includes a first connecting pipe 8 and a fourth connecting pipe 24 .

[0045] The liquid supply port is connected via a first connecting pipe 8 to the connection point between each passage (e.g., the third passage 4) whose exhaust end is lower than the intake end and the downstream passage (i.e., the second passage 3), and the valve body 16 is detachably connected to the first connecting pipe 8.

[0046] The fourth connecting pipe 24 is detachably connected to the valve body 16 and communicates with the drain port.

[0047] Specifically, the first connecting pipe 8 is threadedly connected to the one-way drainage structure 7 and the lower end of the second passage 3, and is used to drain condensed water from the second passage 3. The center of the partition plate 20 is connected to and supports a spring, which is connected to the sphere 22. The spring is pre-compressed between the sphere 22 and the partition plate 20, and the elastic force of the spring applies an elastic force to the sphere 22 in the direction of the tapered portion 18, causing the sphere 22 to contact the inner wall of the tapered portion 18 and close the valve chamber. In this way, the biasing force of the spring causes the sphere 22 to tightly contact the tapered side wall of the tapered portion 18 of the one-way drainage structure 7, and the negative pressure of the drainage unit 9 in the factory facility system and the biasing force of the spring work together to achieve isolation of the valve chamber by the sphere 22, preventing the negative pressure of the drainage unit 9 from leaking from the one-way drainage structure 7. When a large amount of condensed water has accumulated in the second passage 3, the water pressure overcomes the action of the spring force, causing the sphere 22 to separate from the tapered side wall of the tapered portion 18 of the one-way drainage structure 7, creating a gap through which the condensed water passes into the fourth connecting pipe 24. The fourth connecting pipe 24 connects the one-way drainage structure 7 to the factory facility condensed water piping of the drainage unit 9 via a threaded connection, and discharges the condensed water into the factory facility condensed water piping. The main function of the one-way drainage structure 7 is to discharge the condensed water in the condensed water separator to the factory facility condensed water piping, and also to prevent the negative pressure of the drainage unit 9 from being transmitted to the condensed water separator and affecting the pressure in the exhaust unit 6.

[0048] Optionally, a temperature sensor 25 is provided in the second passage 3 .

[0049] Specifically, a temperature sensor is threadedly connected to the side wall of the second passage 3, and a probe extends into the second passage 3 to detect the temperature of the airflow within the second passage 3. If the temperature is too low, the control system adjusts the power of the heating element 11 to increase the temperature of the airflow within the second connecting pipe 10, preventing condensation from forming in the second connecting pipe 10 and backflowing into the control valve group. The first connecting pipe 8 threadably connects the second passage 3 to the one-way drainage structure 7, allowing condensed water that backflows from the exhaust unit 6 and the third connecting pipe 12 to accumulate at the bottom of the second passage 3. Utilizing the physical principle that condensed water has a greater density than gas, the water and gas are separated and the water accumulates in the second passage 3, preventing it from flowing back into the first passage 2. This prevents condensed water and by-products from the drainage unit 9 from flowing back into the control valve group.

[0050] Optionally, the heating element 11 comprises a heating wire wound helically around the outer periphery of the second connecting tube 10 .

[0051] Specifically, the second connecting pipe 10 and the gas inside it are heated by passing electricity through the heating wire, which generates heat. The heating wire is spirally wound around the outer periphery of the second connecting pipe 10, which has a simple structure, low cost, and makes it easy to control the heating power of the heating wire using the temperature sensor 25.

[0052] Optionally, the cooling element 13 includes a cooling jacket, inside which a cooling chamber is provided, and outside of which a water intake pipe 26 and a water discharge pipe 27 are provided in communication with the cooling chamber.

[0053] Specifically, the water intake pipe 26 and the water discharge pipe 27 are used to introduce cooling water into the cooling chamber and discharge it from the cooling chamber, respectively. The cooling water is used to cool the third connecting pipe 12 and the gas inside it, promoting the condensation effect, and condensing as much water vapor as possible in the third connecting pipe 12 here and returning it to the second passage 3 before being discharged through the one-way drainage structure 7, thereby preventing the water vapor from entering the exhaust unit 6.

[0054] As shown in FIG. 5, the present invention further provides a semiconductor processing apparatus, which includes a reaction chamber 34 and a gas exhaust system, and the gas exhaust system includes an exhaust pipeline connected to the reaction chamber 34, a pressure control valve group 5 installed in the exhaust pipeline, and the condensed water separator, the inlet of which is detachably connected to the outlet end of the pressure control valve group 5.

[0055] Specifically, the condensed water separation device is installed between a pressure control valve group 5 of a gas exhaust system and an exhaust unit 6 of a factory facility system, with a first passage 2 and a second passage 3 being independent of each other and connected by an inclined third passage 4 to form a zigzag gas passage, with gas entering through an intake port, passing through the zigzag gas passage, and then being discharged from an exhaust port to the exhaust unit 6. After entering the second passage 3, condensed water in the exhaust unit 6 is unlikely to flow back into the first passage 2, and can be discharged to the drainage unit 9 by a one-way drainage structure 7, preventing condensed water flowing back in the exhaust unit 6 from entering the pressure control valve group 5.

[0056] In one example, the semiconductor processing tool is a diffusion furnace.

[0057] Specifically, the gas exhaust system is a gas exhaust system of a diffusion furnace.

[0058] Optionally, the system may further include an exhaust gas condenser 28, a gas-liquid separator 29, and a condensed water drain 30. The gas-liquid separator 29 is connected to the reaction chamber 34 via a first pipe 31. The exhaust gas condenser 28 is provided on the first pipe 31. The liquid discharge end and the exhaust end of the gas-liquid separator 29 are connected to the condensed water drain 30 and the pressure control valve group 5 via a second pipe 32 and a third pipe 33, respectively. The exhaust port of the condensed water separator is connected to the exhaust unit 6 of the factory facility system, and the liquid discharge port is connected to the drainage unit 9 of the factory facility system, and the condensed water drain 30 is connected to the drainage unit 9 via a fourth pipe 35.

[0059] Specifically, process gases not involved in the reaction in the reaction chamber 34 or by-products generated during the process are connected to the gas exhaust system via a first pipe 31. The reaction chamber 34 is connected to one end of the first pipe 31 via a flange, and the other end of the first pipe 31 is connected to an exhaust gas condenser 28. The water vapor in the first pipe 31 can be condensed by the cooling action of the exhaust gas condenser 28, and water and gas are separated in a gas-liquid separator 29. The separated water and gas are transported to a condensed water discharge device 30 via a second pipe 32 and further discharged to a factory facility condensed water piping of the drainage unit 9 via a fourth pipe 35. The third pipe 33 is connected to the inlet end of a pressure control valve group 5. The pressure control valve group 5 controls the amount of gas discharged from the reaction chamber 34 to the gas exhaust system, thereby controlling the pressure within the chamber. The outlet end of the pressure control valve group 5 is threadedly connected to the intake port of the condensed water separator, and the exhaust port of the condensed water separator is threadedly connected to the drainage unit 9 of the factory facility system. The gas separated in the first exhaust gas condenser 28 flows through the pressure control valve group 5 and enters the condensed water separator, and then undergoes water vapor condensation again due to the action of the cooling components, separating the water and gas, which are then discharged into the piping of the exhaust unit 6 and the drainage unit 9, respectively.

[0060] The above is an example of the semiconductor processing equipment being a diffusion furnace. In the gas exhaust system for the semiconductor processing equipment of the present invention, the above-mentioned condensed water separator is provided between the outlet end of the pressure control valve group 5 and the exhaust unit 6. In use, the gas in the reaction chamber 34 passes through the exhaust gas condenser 28 and then enters the gas-liquid separator 29. The liquid then passes through the discharge end of the gas-liquid separator 29 into the second pipe 32 and the condensed water discharge device 30, which can discharge the condensed water to the drainage unit 9. The gas passes through the discharge end of the gas-liquid separator 29 into the third pipe 33 and the pressure control valve group 5, and then passes through the above-mentioned condensed water separator before entering the exhaust unit 6. In the condensed water separation device, gas passes through the second connecting pipe 10, the first passage 2, the third passage 4, the second passage 3, the fourth passage, and the third connecting pipe 12 in this order. When the heating wire is energized, the second connecting pipe 10 and the gas therein are heated, raising the gas temperature to 100°C. This prevents condensed water from remaining in this piping from backflowing into the control valve group. The first passage 2 and the second passage 3 are independent of each other and connected by the inclined third passage 4 to form a zigzag gas passage. The gas enters through the intake port, passes through the zigzag gas passage, and is then discharged from the exhaust port to the exhaust unit 6. Condensed water in the exhaust unit 6 is unlikely to re-enter the first passage 2 after entering the second passage 3. Instead, it is discharged to the drainage unit 9 by the one-way drainage structure 7. This prevents condensed water from backflowing into the exhaust unit 6 from entering the pressure control valve group 5. When cooling water is introduced into the cooling component, the gas in the third connecting pipe 12 can be further condensed, and the condensed water at this location flows into the lower end of the second passage 3 and is then discharged to the drainage unit 9 via the one-way drainage structure 7, further preventing the condensed water from backflowing into the control valve group. The condensed water or corrosive by-products in the drainage unit 9 also flows through the third connecting pipe 12 into the second passage 3, and then passes through the one-way drainage structure 7 into the drainage unit 9.The gas discharge system adds the above-mentioned condensate separator at the rear end of the control valve group, which on the one hand separates the process exhaust gas condensate at the rear end of the control valve group, preventing the condensate from flowing back into the control valve group and affecting the accuracy of pressure control; on the other hand, it prevents the condensate and by-products in the drainage unit 9 from flowing back into the control valve group, preventing corrosion of the pressure control valve group 5. This not only improves the stability of pressure control in the reaction chamber 34, but also extends the service life of the pressure control valve group 5.

[0061] While the present invention has been described with reference to various embodiments, the above description is illustrative and not exhaustive, and the present invention is not limited to the disclosed embodiments. Various modifications and alterations will be apparent to those skilled in the art without departing from the scope and spirit of the described embodiments. [Explanation of symbols]

[0062] 1. Device body 1a Uppermost passage 1b 1st intermediate passage 1c 2nd intermediate passage 1d The most downstream passage A1 Air Intake A2 Exhaust end of first intermediate passage A3 Exhaust end of second intermediate passage A4 exhaust vent 2 1st aisle 3 2nd aisle 4 3rd aisle 5 Pressure control valves 6 Exhaust unit 7 One-way drainage structure 8. First connecting pipe 9 Drainage unit 10 Second connecting pipe 11 Heating element 12 Third connecting pipe 13 Cooling components 14 1st Sub-passage 15 Second Sub-passage 16 Valve body 17 1st straight body section 18 Tapered section 19 2nd straight body part 20 Partition 21 Through hole 22 sphere 23 Elastic parts 24 4th connecting pipe 25 Temperature Sensor 26 Water intake pipe 27 Drain pipe 28 Exhaust gas condenser 29 Gas-liquid separation equipment 30 Condensate drain device 31 1st pipeline 32 2nd pipeline 33 3rd pipeline 34 Reaction Chamber 35 4th pipeline

Claims

1. A condensed water separator for use in a gas exhaust system of a semiconductor processing device, the gas exhaust system including an exhaust pipeline, the exhaust pipeline being provided with a group of pressure control valves; an apparatus main body having a bent-line gas passage provided therein, the gas passage including a plurality of passages communicating in sequence along a gas flow direction, the intake end of the most upstream passage functioning as an intake port and used to connect to the outlet ends of the pressure control valve group, the exhaust end of the most downstream passage functioning as an exhaust port and higher than the intake end of the most downstream passage, and the exhaust end of at least one of the remaining passages lower than the intake end; a one-way drainage structure connected to a connection point between the passage and a downstream passage, the exhaust end of which is lower than the intake end, and used to discharge flowing condensed water.

2. the plurality of passages include a first passage, a second passage, and a third passage, a lower end of the first passage being open to form the intake port, an upper end of the first passage being connected to an intake end of the second passage via the third passage inclined downward, an upper end of the second passage being open to form the exhaust port, and the intake end of the second passage being lower than the upper end thereof; 2. The condensed water separator according to claim 1, wherein one end of the one-way drainage structure is connected to the lower end of the second passage, and the other end forms a drain port.

3. the second passage includes a first sub-passage and an inclined second sub-passage, an axis of the first sub-passage being parallel to the axis of the first passage, the first sub-passage having an intake end of the second passage and connected to an upper end of the first passage via the third passage, a lower end of the first sub-passage being connected to one end of the one-way drainage structure, the first sub-passage further having an exhaust end connected to the lower end of the second sub-passage, the exhaust end being higher than the intake end of the second passage; 3. The condensed water separator according to claim 2, wherein an upper end of the second sub-passage forms the exhaust port in the main body, and the exhaust port is disposed coaxially with the intake port.

4. the one-way drainage structure includes a valve body and a partition plate, a valve chamber is provided inside the valve body, the valve chamber including a first straight body portion, a tapered portion, and a second straight body portion connected in this order, a liquid supply port is formed in the valve body at one end of the second straight body portion remote from the tapered portion, and the liquid supply port is connected to a connection point between each passage, whose exhaust end is lower than its intake end, and a downstream passage; 2. The condensed water separator according to claim 1, wherein the partition plate is provided within the first straight body portion, the partition plate has a plurality of through holes that communicate with both sides of the partition plate, a sphere is provided on a side of the partition plate that is close to the tapered portion, the sphere is slidably engaged with the first straight body portion, an elastic element is provided between the sphere and the partition plate, and the elastic force of the elastic element applies an elastic force to the sphere in the direction of the tapered portion, causing the sphere to contact the inner wall of the tapered portion and close the valve chamber, and a drain port is formed in the valve body on a side of the partition plate in the first straight body portion that is away from the tapered portion.

5. the one-way drainage structure further includes a first connecting pipe and a fourth connecting pipe; the liquid supply port is connected via the first connecting pipe to a connection point between each passage, the exhaust end of which is lower than the intake end, and a downstream passage, and the valve body is detachably connected to the first connecting pipe; 5. The condensed water separator according to claim 4, wherein the fourth connecting pipe is detachably connected to the valve body and communicates with the drain port.

6. 3. The condensed water separator according to claim 2, wherein a second connecting pipe is connected to the intake port, and a heating element is provided on the outer periphery of the second connecting pipe.

7. 7. The condensate separator according to claim 6, wherein the heating element includes a heating wire wound helically around the outer periphery of the second connecting pipe.

8. 3. The condensed water separator according to claim 2, wherein a third connecting pipe is connected to the exhaust port, and a cooling element is provided on the outer periphery of the third connecting pipe.

9. 9. The condensed water separator according to claim 8, wherein the cooling element includes a cooling jacket, a cooling chamber is provided inside the cooling jacket, and a water intake pipe and a water discharge pipe communicating with the cooling chamber are provided outside the cooling jacket.

10. 2. The condensed water separator according to claim 1, wherein a temperature sensor is provided in the most downstream passage.

11. 1. A semiconductor processing apparatus including a reaction chamber and a gas exhaust system, the gas exhaust system comprising: an exhaust pipeline connected to the reaction chamber; a pressure control valve group provided in the exhaust pipeline; and a condensed water separator according to any one of claims 1 to 10, wherein an intake port is connected to the outlet end of the pressure control valve group.

12. Further comprising an exhaust gas condenser, a gas-liquid separator and a condensed water drainage device; the gas-liquid separator is connected to the reaction chamber via a first pipe line, an exhaust gas condenser is provided in the first pipe line, and a liquid discharge end and an exhaust end of the gas-liquid separator are connected to the condensed water discharge device and the pressure control valve group via a second pipe line and a third pipe line, respectively; 12. The semiconductor processing device of claim 11, wherein the exhaust port of the condensate separator is used to connect to an exhaust unit of a factory facility system, and the drain port is used to connect to a drainage unit of the factory facility system, and the condensate drainer is connected to the drainage unit through a fourth pipe.

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