Apparatus for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or EUV exposure masks

Abstract

To provide a device for cleaning a pot-shaped hollow body in a shorter time by simple and inexpensive means.SOLUTION: A device 10 for cleaning a pot-shaped hollow body 12, specifically, a transportation container 30 for a semiconductor wafer or an EUV exposure mask, comprises: a base wall 20 to which the hollow body 12 can be installed to an upper side by a peripheral edge surface 38; a lock device 26 that seals the hollow body 12 so as to be detachably coupled with the base wall 20; at least one penetration open part 24 that is formed by the base wall 20, and is arranged into an inner side of the lock device 26 with respect to a radial direction; a cleaning device 40 that can discharge a first cleaning fluid for cleaning an inner surface 33 of the hollow body in the case where the hollow body 12 is coupled to the base wall 20; and a first discharge path 70 that has a first end part 72. The first discharge path 70 is connected with the penetration open part 24 so as to pass exclusively a fluid from the first end part 72 and discharges the first cleaning fluid discharged from the cleaning device 40 through the first discharge path 70.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an apparatus for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or EUV exposure masks. [Background technology]

[0002] Today, the manufacture of highly integrated electronic circuits and other sensitive semiconductor devices is carried out in factories where so-called semiconductor wafers pass through numerous processing steps, most of which are carried out in clean spaces that are kept extremely contaminant-free, and in particular particle-free, especially since particles coming into contact with the semiconductor material of the semiconductor wafers can affect the material properties of the semiconductor wafers in such a way that the entire production batch becomes defective, unusable, and must be discarded.

[0003] As the integration density of semiconductor circuits increases, maintaining cleanliness becomes increasingly important. Furthermore, the burden of maintaining cleanliness increases exponentially as the size of the clean space increases. Therefore, semiconductor wafers are not transported in an "open" manner from one processing station to the next. Instead, special transport containers (known as FOUPs, or Front Open Unified Pods) are used. These are understood to be loaf-pan-shaped transport containers that can hold multiple semiconductor wafers. FOUPs are usually closed with a removable lid. Without the lid, a FOUP has the basic shape of a pan with a square base. When a FOUP is closed with its lid, the semiconductor wafers contained therein can be transported from one clean space to another while being protected from the outside world. When the FOUP reaches a processing station, it is opened, and the semiconductor wafers are removed and processed accordingly. After processing, the semiconductor wafers are returned to the FOUP, transported, and transferred to the next processing station.

[0004] FOUPs must be cleaned from time to time because contamination of semiconductor wafers can result in significant production losses. FOUPs are particularly susceptible to contamination by dust from semiconductor wafers when they are being loaded into and unloaded from the FOUP.

[0005] Significantly, the same is true for transport containers for EUV (Extreme Ultra-Violet Radiation) exposure masks, which are used to fabricate very small integrated circuits. EUV exposure masks, like semiconductors, must be transported, and similar situations arise. In the following, when a FOUP is mentioned, the same statements about it also apply to transport containers for EUV exposure masks.

[0006] Apparatuses for cleaning FOUPs are well known, for example, from Patent Documents 1 to 3.

[0007] In such an apparatus, the FOUP is cleaned on both its inner and outer surfaces. The outer surface of the FOUP is usually cleaned significantly more than the inner surface. As a result, the cleaning fluid captures both particles originating from the outer surface and particles originating from the inner surface during the cleaning process. These particles can therefore be transported from the outer surface to the inner surface. However, satisfactory cleaning results are only achieved if the particle count is below a certain value. Due to the particles originating from the outer surface, the cleaning process must be carried out for a correspondingly long time to allow a sufficient amount of particles to be removed. This is disadvantageous in that, on the one hand, a relatively large amount of cleaning fluid is required, and, on the other hand, the FOUP cannot be used to transport semiconductor wafers during the cleaning process. This increases the cost of semiconductor wafer production. Additionally, cleaning the outer surface only contributes to a limited reduction in defective semiconductor wafers. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] U.S. Patent Publication No. 5,238,703 [Patent Document 2] International Patent Publication No. 2005 / 001888 [Patent Document 3] European Patent Registration No. 1899084 Summary of the Invention [Problem to be solved by the invention]

[0009] The object of an embodiment of the invention is to propose a device for cleaning pot-shaped hollow bodies, which allows cleaning the hollow bodies in a short time using simple and inexpensive means. [Means for solving the problem]

[0010] This problem is solved by the features of claim 1. Advantageous embodiments are the subject of the dependent claims.

[0011] One embodiment of the invention relates to an apparatus for cleaning a pot-shaped hollow body, in particular a carrier container for semiconductor wafers or EUV exposure masks, which hollow body comprises: a bottom wall and one or more side walls forming a hollow interior surface; an opening in the bottom wall surrounded by a peripheral surface of the side wall; and This device, a base wall with a peripheral surface on which the hollow body can be placed; a locking device for sealing the hollow body by a peripheral surface and for enabling removably connection to the base wall; At least one through hole formed by the base wall and positioned radially inward of the locking device; a cleaning device capable of emitting a first cleaning fluid for cleaning the inner surface of the hollow body when the hollow body is connected to the base wall; a first exhaust channel having a first end; The first discharge flow path is in fluid communication exclusively with the through-hole at its first end and can be used to drain the first cleaning fluid released from the cleaning device.

[0012] For cleaning, the hollow body is placed on the base wall by its peripheral surface, with the opening of the hollow body and the through-hole in the base wall directly adjacent to each other. It is therefore possible to introduce a first cleaning fluid into the hollow body and thereby clean its inner surface. Due to the fact that the locking device is configured so that the hollow body is not only fixed but also sealed to the base wall by its peripheral surface, the first cleaning fluid cannot leave the interior space of the hollow body. Therefore, the first cleaning fluid cannot be contaminated by particles present outside the hollow body. Therefore, as mentioned at the beginning, the first cleaning fluid only serves to clean the inner surface of the hollow body, which is typically significantly less contaminated than the outer surface of the hollow body. As a result, the first cleaning fluid is not contaminated by particles originating from the outer surface of the hollow body, thereby effectively cleaning the inner surface of the hollow body. This peripheral surface serves as a separator between the inner surface of the hollow body and the outer surface of the hollow body when the hollow body is placed on the base wall. This peripheral surface also seals the hollow body against the base wall. The time required for cleaning the inner surface of the hollow body can be significantly reduced compared to devices known from the prior art. Furthermore, the amount of first cleaning fluid required for cleaning the inner surface of the hollow body is likewise reduced.

[0013] In one alternative embodiment, the first exhaust channel is connected by its first end to the base wall and surrounds the through-hole. This embodiment reduces the structural burden required for preparing the device. In particular, the first exhaust channel can be manufactured integrally with the base wall or connected to the base wall, for example, by welding.

[0014] In one improved embodiment, the first discharge channel can widen in a funnel shape towards its first end. Because the first discharge channel widens in a funnel shape towards its first end, the difference in diameter between the through-opening and the first discharge channel can be easily equalized, thereby reducing structural loads. Furthermore, no abrupt diameter changes occur, which could cause flow disturbances, for example in the form of turbulence. These disturbances could lead to particle deposition, which could slow down or even completely hinder particle discharge, negatively affecting cleaning of the inner surface of the hollow body.

[0015] In one improved embodiment, the first discharge channel can terminate at its first end flush with the through-opening, so that no dead spaces are created in which particles can accumulate and thereby cleaning of the inner surface of the hollow body can be adversely affected.

[0016] In another embodiment, the cleaning device can have a first cleaning head that protrudes beyond the through-opening. In this embodiment, the first cleaning head can be inserted into the interior space of the hollow body. As a result, the distance between the first cleaning head and the inner surface of the hollow body can be reduced. The pressure for forcing the cleaning fluid out of the first cleaning head also acts on the inner surface of the hollow body with only small losses, thereby allowing particularly effective removal of particles present on the inner surface of the hollow body.

[0017] One improved embodiment is characterized in that the first cleaning head is rotatably and / or translatably movable. This mobility of the cleaning head allows it to be adapted to the geometric characteristics of the inner surface of the hollow body. In particular, it is possible to spray the first cleaning fluid at least approximately perpendicularly to the inner surface of the hollow body, so that the kinetic energy of the first cleaning fluid can be particularly effectively utilized to clean the inner surface of the hollow body.

[0018] In one improved embodiment, the first cleaning head includes a number of first cleaning nozzles through which the first cleaning fluid can be emitted at a spray angle. In this case, the first cleaning head includes an adjustment device that allows the spray angle to be adjusted. The spray angle at which the first cleaning fluid is emitted also determines the angle at which this cleaning fluid strikes the inner surface of the hollow body. An angle of 90° or approximately 90° is ideal. Due to the adjustable spray angle, the first cleaning fluid can be adapted to the geometric shape of the inner surface of the hollow body, so that it can be sprayed at an angle of 90° or approximately 90° over almost the entire inner surface of the hollow body. The inner surface of a hollow body usually has irregularities, which can result in shadows that prevent the first cleaning fluid from being sprayed onto the inner surface of the hollow body with sufficient kinetic energy or only a limited amount of the first cleaning fluid. In this embodiment, such shadows can be prevented, resulting in an overall improved cleaning result.

[0019] One improved embodiment provides that the first cleaning nozzles can be opened and closed independently of one another. When one of the first cleaning nozzles is open, the first cleaning fluid can be released, which is not possible when the nozzle is closed. This allows the inner surface of the hollow body to be cleaned so that the expected cleaner areas are cleaned first, followed by the more contaminated areas. This minimizes the first cleaning fluid's exposure to particles detached from the inner surface of the hollow body. In particular, this prevents relatively clean areas from being cleaned with a high load of the first cleaning fluid. In many cases, the particle-accepting capacity of the first cleaning fluid decreases with increasing load. In extreme cases, particles from the first cleaning fluid may even accumulate on the relatively clean areas of the inner surface of the hollow body. This can be prevented by appropriately driving the first cleaning nozzle.

[0020] Furthermore, only a selected portion of the interior surface of the hollow body can be cleaned and the number of particles collected can be counted. This particle count can be repeated as often as necessary to provide representative information. This can determine whether a given semiconductor wafer manufacturing process results in an above-average number of particles on the interior surface of the hollow body. From this, specific defects or potential improvements in the manufacturing process can be inferred.

[0021] One embodiment is characterized in that the device comprises at least one coupling unit for coupling sound waves into the first cleaning fluid. In this case, the sound waves can be ultrasonic or hypersonic. By definition, ultrasonic waves have a frequency range of approximately 20 kHz to 500 kHz, while hypersonic waves have a frequency range of approximately 500 kHz to 3 MHz. It is conceivable to couple the sound waves into the first cleaning fluid by completely wetting the inner surface of the hollow body with the first cleaning fluid or by filling the entire space enclosed by the inner surface of the hollow body. The first cleaning fluid then serves as a transmitter for the sound waves. Due to the fact that a predetermined amount of energy is thereby applied to the first cleaning fluid, it is possible to particularly effectively detach particles adhering to the inner surface of the hollow body, thereby improving the cleaning effect. The amount of energy input increases with the frequency of the coupled sound. The use of hypersonic waves offers the advantage of being able to apply the energy in a very precisely targeted manner close to the inner surface of the hollow body to be cleaned, thereby achieving good cleaning results.

[0022] In one improved embodiment, at least some of the coupling units can be integrated into or cooperate with at least some of the first cleaning nozzles, which can then be configured as so-called "megasonic nozzles" capable of coupling sound waves into the first cleaning fluid emitted from the first cleaning nozzles, thereby eliminating the need to wet the entire inner surface of the hollow body with the first cleaning fluid, thereby reducing the amount of first cleaning fluid required.

[0023] In another embodiment, the cleaning device comprises a supply channel for supplying a first cleaning fluid to the first cleaning head, and the first discharge channel and the supply channel are at least partially combined in one fluid conducting unit. However, in this case, the supply channel and the discharge channel remain fluidically separated. In this case, the supply channel and the discharge channel can be configured as conduits and / or tubes. By combining the first discharge channel and the supply channel in one fluid conducting unit, it is possible to save construction space and therefore to configure the device compactly. Furthermore, the number of components of the device can be reduced, which reduces the manufacturing burden.

[0024] In another embodiment, a first channel is arranged in the base wall, and this channel can be used to guide a cleaning fluid to the peripheral surface. The cleaning fluid can be, in particular, nitrogen or compressed air, or, particularly preferably, very clean dry air, also known as XCDA. This prevents the first cleaning fluid from reaching the outer surface of the hollow body via the peripheral surface and mixing there with the second cleaning fluid. Furthermore, it prevents the second cleaning fluid from reaching the inner surface of the hollow body via the peripheral surface and mixing there with the first cleaning fluid. This prevents contamination.

[0025] Another embodiment is characterized in that a particle measuring device for measuring particles contained in the first cleaning fluid is disposed in the first discharge flow path. This particle measuring device can be configured, for example, to measure the number of particles passing through the particle measuring device through the first discharge flow path at a given volumetric flow rate of the first cleaning fluid. If the number of counted particles falls below a certain value, the inner surface of the hollow body can be considered sufficiently cleaned. Using this particle measuring device, it is possible to ensure, on the one hand, that the inner surface of the hollow body has actually been sufficiently cleaned, and, on the other hand, to stop the cleaning process in this case. In devices known from the prior art, the cleaning process is performed long enough to be able to consider the hollow body sufficiently cleaned with sufficient probability. In most cases, for safety reasons, the cleaning process is performed significantly longer than necessary. According to this embodiment, the ability to stop the cleaning process as described above reduces both the time and the amount of first cleaning fluid, thereby enabling the cleaning process to be performed significantly more efficiently than in the prior art. Furthermore, the particle measuring device also enables documentation of whether a given FOUP has actually been sufficiently cleaned.

[0026] In one improved embodiment, the hollow body comprises a lid having an inner lid surface and an outer lid surface, the lid being capable of closing the opening, wherein a cleaning opening that is at least partially closable by means of a closure is arranged in the base wall or another wall part, the closure comprising a receiving unit for receiving the lid of the hollow body, and the cleaning device comprises a further first cleaning head, the cleaning head being capable of spraying a first cleaning fluid onto the inner surface of the lid for cleaning when the cleaning opening is closed by the closure or the lid.

[0027] The previously described embodiments of the apparatus relate to cleaning the inner surface of a hollow body. As mentioned above, a FOUP is closed using a removable lid. However, just like the inner surface of the hollow body, particles that may adversely affect the production of semiconductor wafers may accumulate on the inner surface of the lid. However, in this embodiment, the apparatus includes a separate first cleaning head, which can be used to clean the inner surface of the lid. For this purpose, the same first cleaning fluid as that used to clean the inner surface of the hollow body is used. However, if deemed necessary, a different cleaning fluid can also be used. Thus, particles on the inner surface of the lid can be similarly removed. To prevent the first cleaning fluid from flowing out of the cleaning opening in an uncontrolled manner, the cleaning opening must be sealed during the cleaning process. To this end, either the lid or the closing body cooperates with a base wall or another wall portion to seal the cleaning opening. In this case, the cleaning opening can be positioned so that particles from the surroundings of the hollow body cannot reach the first cleaning fluid during the cleaning process. In this case, it is conceivable to drain the first cleaning fluid through a first discharge channel. In this case, the receiving unit of the closure works in cooperation with the outer surface of the lid, so that the inner surface of the lid is unhinderedly accessible, in particular for the first cleaning fluid.

[0028] Another embodiment provides that the closure is fixed to the base wall or another wall part so that it can move between an open position in which the closure opens the cleaning opening and a closed position in which the closure closes the cleaning opening. In this embodiment, the closure can be particularly easily fastened to the handle of the lid. In the open position, a gripping robot or equivalent can fit the lid into the storage unit of the closure. The storage unit has fastening means by which the lid can be removably fastened to the closure. After the gripping robot removes the lid and fastens it to the closure, the closure is moved to the closed position. In the closed position, the cleaning opening is sealed, so that a cleaning process can begin on the inner surface of the lid. After the cleaning process is completed, the closure is again moved to the open position, and the connection between the closure and the lid is released, so that the gripping robot can remove the lid from the storage unit. In this case, it is conceivable to fasten the closure to the base wall or another wall part in a rotatable manner.

[0029] Another embodiment provides that the device can include a second flow path, which can be used to guide the cleaning fluid to the lid. Typically, the lid of the transport container is equipped with a lid seal, which can be used to seal the lid from the rest of the transport container. Nitrogen or compressed air, or particularly preferably, very clean dry air, also known as XCDA, is used as the cleaning fluid. This cleaning fluid can be used to precisely limit the area of ​​action of the first cleaning fluid for cleaning the inner surface of the lid. In this case, the limited area can be selected so that the first cleaning fluid cannot reach the lid seal. This prevents particles present in the first cleaning fluid and that may adhere to the seal from being dislodged from the seal during operation of the transport container and potentially damaging the semiconductor wafers. When a gas is used, turbulence is generated, which facilitates active blowing or cleaning of the seal.

[0030] In another embodiment, in which the bottom wall and the side wall form the outer surface of the hollow body, the cleaning device can include a second cleaning head, which can be used to discharge a second cleaning fluid for cleaning the outer surface of the hollow body. In this case, the device can include a second discharge channel, which can be used to discharge the second cleaning fluid discharged from the second cleaning head. As mentioned above, cleaning the outer surface of the hollow body is not necessarily required. Nevertheless, this can be desirable, for example, to reduce particle deposition in the clean space. In this embodiment, the outer surface of the hollow body can be cleaned, and the second cleaning fluid is discharged separately from the first cleaning fluid. Mixing of the first and second cleaning fluids and the resulting increase in particle deposition due to particles originating from the outer surface of the hollow body are prevented, which is not possible with prior art devices. Thus, even when both the inner surface and the outer surface of the hollow body are cleaned, particles originating from the outer surface of the hollow body are prevented from reaching the inner surface of the hollow body. Therefore, the cleaning process of the inner surface of the hollow body is not adversely affected by particles originating from the outer surface of the hollow body.

[0031] Typically, particle buildup on the inner surface of a hollow body is lower than on the outer surface of the hollow body. Separate discharge of the first and second cleaning fluids allows the first cleaning fluid to be reused to clean the outer surface of the hollow body. In this case, the load (or particle buildup) in the first cleaning fluid can be measured first to determine whether the load of the first cleaning fluid is low enough to clean the outer surface of the hollow body to the required extent. If this is possible, the amount of cleaning fluid, and therefore the cleaning costs, can be reduced.

[0032] In one improved embodiment, the device comprises a housing which, together with a base wall, encloses a process space, the process space being accessible through a housing opening which can be closed by a cover, through which the hollow body can be transported into the process space and removed again, In this embodiment, the second cleaning fluid can be guided in a defined manner to prevent its uncontrolled dispersion in the device.

[0033] In one improved embodiment, the base wall can have a number of through-holes, which are arranged radially outside the locking device and by means of which the second discharge channel is fluid-tightly connected to the process space. Depending on the embodiment of the hollow body, the through-holes can also be realized as through-holes. The second cleaning fluid can be removed in a controlled manner from the process space via the second discharge channel without mixing with the first cleaning fluid.

[0034] One improved embodiment is characterized in that the second cleaning head is U-shaped and can be rotated and / or translated within the process space. Due to the U-shaped configuration of the second cleaning head, the second cleaning fluid can be guided to both the bottom wall and the side wall. Due to the mobility of the second cleaning head, it can be flexibly adapted to the geometric characteristics of the outer surface of the hollow body to be cleaned.

[0035] In another embodiment, the first cleaning head, the further first cleaning head, and / or the second cleaning head are equipped with at least one drying nozzle and / or infrared diode. In this embodiment, the proposed device can be used not only for cleaning the hollow body, but also for subsequent drying. To terminate the cleaning process, the supply of the first cleaning fluid or the first and second cleaning fluids is stopped, and instead, a drying gas, e.g., air or nitrogen, for drying the hollow body is transferred through the fluid guiding unit. For this purpose, the hollow body has a correspondingly configured port, in particular a negative pressure port, through which a negative pressure can be generated within the hollow body so that the drying gas can be sucked into the hollow body and then removed again. A pipe, also known as a snorkel, which can be connected to a vacuum pump, can be connected to this port. In this case, the position of the hollow body in the device remains unchanged. Depending on the embodiment, both the inner and outer surfaces of the hollow body can be dried. In this case, the drying gas used on the inner and outer surfaces of the hollow body does not mix.

[0036] Alternatively, the second cleaning nozzle and the second cleaning head may have the same features as the first cleaning nozzle and the first cleaning head, and vice versa, as long as it is within the scope of the present invention.

[0037] Alternatively or additionally, infrared diodes can be used, the advantage being that the light emitted by them occurs within a restricted narrow frequency band that is optimal for the cleaning fluid used, so that any residues of cleaning fluid still remaining on the inside or outside of the hollow body are heated very effectively and thus eliminated.

[0038] One aspect of the invention relates to the use of the device according to one of the above-described embodiments for cleaning transport containers for semiconductor wafers. The technical effects and advantages that can be achieved by the proposed use are the same as those discussed for the device. To summarize, it should be noted that the time required for cleaning the inner surface of the hollow body can be significantly reduced compared to devices known from the prior art. Furthermore, the amount of first cleaning fluid required for cleaning the inner surface of the hollow body is likewise reduced. These advantages are particularly relevant during the production of semiconductor wafers.

[0039] One embodiment of the invention relates to a method for cleaning a pot-shaped hollow body, in particular a transport container for semiconductor wafers or EUV exposure masks, using an apparatus according to one of the above-described embodiments, comprising the steps of: placing the hollow body on the base wall by the peripheral surface; sealingly and releasably connecting the hollow body to the base wall using a locking device, the hollow body being sealed against the base wall by a peripheral surface; using a first cleaning head of the cleaning device to discharge a first cleaning fluid for cleaning the inner surface of the hollow body, and discharging the first cleaning fluid using a first discharge flow path; using a second cleaning head of the cleaning device to emit a second cleaning fluid for cleaning the outer surface of the hollow body and discharging the second cleaning fluid using a second discharge channel; or A process that is both of these, It has.

[0040] The technical effects and advantages achievable by the proposed method are the same as those discussed with respect to the present device. In summary, it should be noted that the inner surface of the hollow body and the outer surface of the hollow body can be cleaned independently of each other. This prevents the first cleaning fluid used to clean the inner surface of the hollow body from becoming contaminated with particles detached from the outer surface of the hollow body. Furthermore, the proposed method allows for cleaning either the outer surface of the hollow body alone or the inner surface of the hollow body alone, if desired. Furthermore, the outer surface of the hollow body can be cleaned in a shorter time than the inner surface of the hollow body. Additionally, it is possible to simultaneously clean both the outer surface of the hollow body and the inner surface of the hollow body.

[0041] In one alternative configuration, the method comprises: moving the closure to an open position; placing the lid on the receiving unit of the closure by the exterior surface of the lid to removably secure the lid to the closure; moving the closure to a closed position; using another first cleaning head to emit a first cleaning fluid to clean the interior surface of the lid; It has.

[0042] The lid can be placed on the receiving unit, for example, using a gripping robot. In the open position, the receiving unit is easily accessible, so that the lid can be quickly and easily placed and removed without the gripping robot having to perform complex movements. In the closed position, guidance of the first cleaning fluid is ensured, so that mixing with the second cleaning fluid is prevented for the reasons described above. It should be noted that the proposed device can also be operated so that only the lid is cleaned, and not the hollow body. In this case, the through-opening can be closed using a closing element.

[0043] In one alternative configuration, the method comprises: hollow body Insidecompletely filling the space defined by the first cleaning fluid; coupling acoustic waves into the first cleaning fluid using an in-coupling unit; It is stipulated that:

[0044] The acoustic waves can be coupled in, for example, in the form of ultrasonic waves or hypersonic waves, thereby introducing energy into the first cleaning fluid that serves to loosen particles on the inner surface of the hollow body, thereby improving the cleaning results. The inner surface of the lid and the outer surface of the hollow body can be treated accordingly.

[0045] In one improved configuration, the method comprises: coupling acoustic waves into a first cleaning fluid emitted from a first cleaning nozzle using an input coupling unit, the input coupling unit being integrated into or operating in cooperation with the first cleaning nozzle; It has.

[0046] In this configuration, sound waves can also be coupled in as ultrasonic or hypersonic waves. For the reasons mentioned above, this configuration also improves the cleaning results. However, since this configuration does not require filling the space defined by the inner surface of the hollow body, the required amount of first cleaning fluid can be reduced accordingly. The inner surface of the lid and the outer surface of the hollow body can be treated accordingly.

[0047] In the following, embodiments of the present invention will be described in detail with reference to the accompanying drawings. [Brief explanation of the drawings]

[0048] [Figure 1] 1 shows a main cross-sectional view of an embodiment of an apparatus for cleaning a pot-shaped hollow body, in particular a carrier container for semiconductor wafers or EUV exposure masks. [Figure 2] Not to scale enlargement of cross section A defined in Figure 1 [Figure 3] Not to scale enlargement of cross section B defined in Figure 1 DETAILED DESCRIPTION OF THE INVENTION

[0049] 1 shows a cross-sectional view of an embodiment of the proposed device 10 for cleaning a pot-shaped hollow body 12. The device 10 has a housing 14, which defines a closable housing opening 16 by means of a removable cover 18. A base wall 20 is also arranged within the housing 14, resulting in a closed process space 22 within the housing 14. The process space 22 is defined by the base wall 20, the housing 14 itself, and the cover 18. The base wall 20 defines a through-opening 24, and a locking device 26 is arranged radially outside the through-opening 24. In the illustrated embodiment, two through-holes 28 are provided in the base wall 20, radially outside the locking device 26.

[0050] When the cover 18 is removed, the hollow body 12, in particular a transport container 30 for semiconductor wafers or a transport container 30 for EUV exposure masks, also called a FOUP, can be brought into the process space 22. The hollow body 12 has a bottom wall 32 and, in this case, four side walls 34, so that the pot-shaped hollow body 12 is formed in an approximately rectangular parallelepiped shape. However, it is quite possible to define the pot-shaped hollow body 12 with other geometric shapes, for example, a cylindrical shape. The bottom wall 32 and the four side walls 34 form an inner surface 33 and an outer surface 35 of the hollow body.

[0051] The hollow body 12 has an opening 36 arranged opposite the bottom wall 32 and surrounded by a peripheral surface 38 formed by the side walls. In the illustrated embodiment, the hollow body 12 is realized in the form of a flange in the region of this peripheral surface 38. This peripheral surface 38 can be used to mount the hollow body 12 on the base wall 20. In the illustrated embodiment, the through-opening 24 in the base wall 20 and the opening 36 in the hollow body 12 are at least approximately the same size and have the same geometric shape.

[0052] Furthermore, the locking device 26 is configured so that the through opening 24 and the part of the inner surface 33 of the hollow body that connects to the through opening 24 are at least approximately flush with each other.

[0053] 2, the characteristic area A in FIG. 1 is shown enlarged and not to scale, and does not correspond exactly. For illustrative purposes, this locking device 26 is not shown. From FIG. 2, it can be seen that the base wall 20 has a base wall portion 37 that forms a contact surface 39 that contacts the peripheral surface 38 of the transfer container 30. In this case, the contact surface 39 of the base wall portion 37 is completely covered by the peripheral surface 38. A first channel 41 is arranged in this base wall portion 37, which merges into the contact surface 39 and can be used to guide a cleaning fluid, for example, air or nitrogen, to the peripheral surface 38.

[0054] Additionally, the apparatus 10 comprises a cleaning device 40, which comprises a first cleaning head 42 that protrudes beyond the through opening 24 and is therefore arranged in the process space 22. When the hollow body 12 is connected to the base wall 20, the first cleaning head 42 is surrounded by the hollow body 12.

[0055] The housing 14 further includes a wall portion 44 in which a flushing opening 46 is located. The wall portion 44 is on the side of the base wall 20 opposite the locking device 26. The flushing opening 46 can be at least partially closed by a closure 48 that is rotatably fixed to the wall portion 44 about a first rotation axis D1 using a drive unit (not shown). The closure 48 can be moved between an open position in which the closure 48 opens the flushing opening 46 and a closed position in which the closure 48 at least partially closes the flushing opening 46. In FIG. 1, the closure 48 is in the closed position.

[0056] The closure 48 comprises a receiving unit 50 by means of which a lid 52 can be removably fastened to the closure 48, with which the hollow body 12 can be closed. The lid 52 forms an inner lid surface 54 and an outer lid surface 56. In this case, the inner lid surface 54 is the side of the lid 52 with which the inner hollow body surface 33 joins when the hollow body 12 is closed with the lid 52. In other words, in this case, the inner lid surface 54 faces towards the bottom wall 32 of the hollow body 12.

[0057] In the illustrated embodiment, the storage unit 50 is implemented to cooperate with the lid 52 only by means of the outer surface 56 of the lid.

[0058] 3 illustrates a not-to-scale enlargement of the characteristic area B in FIG. 1 and does not correspond exactly. It can be seen that the housing gasket 51 is arranged in the housing 14 in contact with and surrounding the flushing opening 46. When the closure 48 is in the closed position, the lid 52 cooperates with the housing gasket 51. To this extent, the flushing opening 46 is closed and sealed with the lid 52. In view of this background, it should be understood that the information presented indicates that the closure 48 at least partially closes the flushing opening 46. However, it is also conceivable that the closure 48 cooperates with the housing gasket 51 to completely seal the flushing opening 46.

[0059] 3 also shows that the lid 52 includes a lid gasket 53 that can be used to seal the transport container 30 when the lid 52 is connected to the transport container 30. Furthermore, a flow path component 55 that forms a second flow path 57 together with the housing 14 is arranged on the housing 14, and can be used to guide a cleaning fluid, for example, air or nitrogen, to the lid 52. The flow path component 55 is configured to form a gap 60 with the lid gasket 53.

[0060] The cleaning device 40 further includes a first cleaning head 58 that is positioned adjacent the closure 48 when the closure is in the closed position.

[0061] The cleaning device 40 further comprises a second cleaning head 64, which is configured approximately U-shaped and is at least partially disposed within the process space 22. However, when the hollow body 12 is connected to the base wall 20 as shown in FIG. 1 , the second cleaning head 64, unlike the first cleaning head 42, is disposed outside the hollow body 12. The second cleaning head 64 is rotatable about a second rotation axis D2; the drive device used for this is not shown. Furthermore, embodiments in which the second cleaning head 64 is movable not only rotationally but also translationally, or only translationally, are not shown. In the illustrated embodiment, the first cleaning head 42 is not movable, but this cleaning head can also be realized to be rotationally and / or translationally movable.

[0062] The apparatus 10 further comprises a fluid directing unit 66, which can be used to direct the first cleaning fluid to the first cleaning head 42 and the further first cleaning head 58, and to direct the second cleaning fluid to the second cleaning head 64. The fluid directing unit 66 comprises a first supply channel 68, which can be used to direct the first cleaning fluid to the first cleaning head 42.

[0063] For illustrative purposes, the details of the second supply channel that supplies the second cleaning fluid to the second cleaning head 64 have been omitted, but this configuration will be readily deduced by one skilled in the art.

[0064] Furthermore, the fluid directing unit 66 includes a first discharge channel 70, through which the first cleaning fluid discharged from the first cleaning head 42 and the additional first cleaning head 58 can be discharged again from the process space 22. The first discharge channel 70 has a first end 72 that is in fluid communication with the through opening 24. As can be seen in FIG. 1 , the first discharge channel 70 widens in a funnel shape toward the first end 72 and is connected to the base wall 20 so that the first end 72 of the discharge channel terminates flush with the through opening 24.

[0065] A first particle measuring device 741 is arranged in this first outlet channel 70, with which particles originating from the hollow body inner surface 33 and present in the first cleaning fluid can be measured, in particular counted. Furthermore, a second particle measuring device 742 is arranged in the associated channel 742, with which particles originating from the lid inner surface 54 and present in the first cleaning fluid can be measured, in particular counted.

[0066] Additionally, the fluid conducting unit 66 is configured substantially identically to the first discharge channel 70, but includes a second discharge channel 76 fluidly connected to the two through-holes 28. In this case, the first discharge channel 70 forms the radially inner wall of the second discharge channel 76, resulting in a very compact design of the fluid conducting unit 66. An embodiment in which a separate particle measuring device 74 is arranged in the second discharge channel 76 is not shown. It should be noted that FIG. 1 only shows the fluid conducting unit 66 in its basic form. Due to the numerous, intricate channels arranged in different planes, the illustration of the fluid conducting unit 66 in FIG. 1 is not intended to be precise. However, a person skilled in the art can easily derive the functional configuration of the fluid conducting unit 66 from FIG. 1.

[0067] The device 10 is operated as follows: In an initial state not shown here, the cover 18 is open and the second cleaning head 64 is rotated 90° relative to Fig. 1 so that the U-shaped portion 64s of the second cleaning head 64 is perpendicular to the plane of Fig. 1. The closure 48 is in an open position, in which the closure 48 is oriented substantially horizontally relative to Fig. 1.

[0068] Using a handling device (not shown), e.g., a gripping robot, the lid 52 is separated from the hollow body 12 and placed on the storage unit 50. The open hollow body 12 is then transported into the process space 22 so that its peripheral surface 38 rests on the base wall 20, as shown in FIG. 1 . The hollow body 12 is then locked by the locking device 26, so that it is connected to the base wall 20 and thus fixed within the process space 22. The locking device 26 includes a sealing means (not shown), so that the hollow body 12 is sealed against the base wall 20. The cover 18 is then closed. The storage unit 50 of the closure body 48 is then activated, so that the lid 52 is fixed to the closure body 48. The closure body 48 is then rotated 90° to the closed position, as shown in FIG. 1 . The lid 52 then seals the cleaning opening 46.

[0069] Here, a first cleaning fluid is guided via a first supply channel 68 to the first cleaning head 42 and is released through a first cleaning nozzle 78 so as to clean the inner surface 33 of the hollow body with the first cleaning fluid. A further first cleaning head 58 comprises a further first cleaning nozzle 80, by means of which the first cleaning fluid is sprayed onto the inner surface 54 of the lid, thereby cleaning this inner surface.

[0070] At the same time, a second cleaning fluid, which may be the same as the first cleaning fluid, is guided via a second supply channel (not shown here) to the second cleaning head 64, where it is emitted through a second cleaning nozzle 82 for cleaning the outer surface 35 of the hollow body. In this case, the second cleaning head 64 is rotatable about a second rotation axis D2.

[0071] The first cleaning nozzle 78, the further first cleaning nozzle 80, and the second cleaning nozzle 82 can be configured so that the spray angle α at which the first cleaning fluid and the second cleaning fluid are emitted is adjustable. To this end, the first cleaning nozzle 78, the further first cleaning nozzle 80, and the second cleaning nozzle 82 can be journaled in the form of a spherical head. Alternatively or additionally, the first cleaning nozzle 78 can be mounted on a rotatable cylinder 83 about a third rotation axis D3, thereby adjusting the spray angle α. In any case, the first cleaning head 58 is provided with an adjustment device 85, by means of which the spray angle α can be adjusted. The further first cleaning nozzle 80 and the second cleaning nozzle 82 can be configured accordingly, and the spray angle α at which the first cleaning fluid is emitted from the further first cleaning nozzle 80 is also adjusted by the adjustment device 85. The adjustment device 85 can be configured so that the spray angle α of the second cleaning nozzle 80 in the second cleaning head 64 can be similarly adjusted. This makes it possible to achieve that the first cleaning fluid and the second cleaning fluid impinge perpendicularly or nearly perpendicularly on the inner surface 33 of the hollow body and the inner surface of the lid or the outer surface 35 of the hollow body.

[0072] Furthermore, the device 10 includes at least one coupling unit 87 for coupling sound waves into the first cleaning fluid. In this case, the coupling unit 87 may also be configured to couple sound waves into the second cleaning fluid. In the illustrated embodiment, some of the coupling units 87 are integrated into at least some of the first cleaning nozzles 78, forming so-called "megasonic nozzles." Hypersonic waves can be coupled into the first cleaning fluid emitted from the first cleaning nozzles 78. The same can be provided for the other first cleaning nozzles 80 and second cleaning nozzles 82.

[0073] These first cleaning nozzles 78 can be opened and closed independently of one another. It is therefore possible to first clean various areas of the inner surface 33 of the hollow body, followed by other areas. For example, areas that are less soiled according to the invention can be cleaned first, followed by areas that are more soiled according to the invention. These further first cleaning nozzles 80 and second cleaning nozzles 82 can be configured accordingly, so that the inner surface 54 of the first lid and the outer surface 35 of the hollow body can be cleaned accordingly.

[0074] At the same time, a cleaning fluid is guided to the peripheral surface 38 through the first flow channel 41, or to the lid 52 through the second flow channel 57, or both. These can be the same cleaning fluid, but it is also possible to guide a first cleaning fluid through the first flow channel 41 and a second cleaning fluid different from the first cleaning fluid through the second flow channel 57. The cleaning fluid guided to the peripheral surface 38 through the first flow channel 41 serves to prevent either the first or second cleaning fluid from crossing the peripheral surface. The cleaning fluid thus achieves a fluidic seal between the first and second cleaning fluids. This ensures that the first and second cleaning fluids cannot mix. Contamination of the first cleaning fluid by the second cleaning fluid and vice versa is prevented.

[0075] The first cleaning fluid emitted from the first cleaning head 42 and sprayed onto the inner surface 33 of the hollow body is discharged via a first discharge channel 70. The same applies to the first cleaning fluid emitted from the other first cleaning head 58 and sprayed onto the inner surface 54 of the lid. To discharge the first cleaning fluid used to clean the inner surface 54 of the lid, the first discharge channel 70 has an accompanying channel 84 that joins the first discharge channel 70.

[0076] The cleaning fluid guided into the lid 52 flows back through the gap 60 to the associated flow channel 84. The housing gasket 51 prevents the cleaning fluid from reaching the surroundings. This cleaning fluid is used to prevent the first cleaning fluid, which is released from a separate first cleaning head 58 and sprayed onto the inner surface 54 of the lid, from reaching the lid gasket 53, on which particles present in the first cleaning fluid may adhere.

[0077] A sufficiently large pressure can be applied to the cleaning fluid directed against the peripheral surface 38 and / or the lid 52 .

[0078] The first cleaning fluid is used to remove particles present on the inner surface 33 of the hollow body and the inner surface 54 of the lid. Particles originating from the inner surface 33 of the hollow body are detected by the first particle measuring device 741, and particles originating from the inner surface 54 of the lid are detected by the second particle measuring device. In this case, the first particle measuring device 741 and the second particle measuring device 742 can be configured to measure the number of particles passing through the particle measuring device 74 within a predetermined time at a given volumetric flow rate. This allows a determination to be made as to whether the inner surface 33 of the hollow body and the inner surface 54 of the lid have been cleaned to a desired extent. For example, if the inner surface 33 of the hollow body is sufficiently clean, the cleaning process for the hollow body 12 can be stopped, while the cleaning process for the inner surface 54 of the lid continues. Meanwhile, the hollow body 12 can be removed from the apparatus by a gripping robot, thereby saving time.

[0079] As mentioned above, another particle measuring device 74 can be placed in the second discharge channel 76. This other particle measuring device can be used to detect particles originating from the outer surface 35 of the hollow body. This information can also be incorporated into a decision as to whether the cleaning process for the hollow body 12 can be stopped. If the loading of the first cleaning fluid with particles originating from the inner surface 33 of the hollow body does not exceed a predetermined value, this fluid can also be used to clean the outer surface 35 of the hollow body.

[0080] Not shown is an embodiment in which the particle measuring device 74 is located downstream of the point where the auxiliary channel 84 joins the first discharge channel 70. In this case, it is not possible to distinguish whether the particles originate from the inner surface 54 of the lid or the inner surface 33 of the hollow body. Nevertheless, the cleaning process can be stopped if the number of particles falls below a predetermined high number.

[0081] The second cleaning fluid emitted from the second cleaning head 64 and sprayed onto the outer surface 35 of the hollow body is discharged via the second discharge channel 76. The first cleaning fluid and the second cleaning fluid are therefore discharged separately from each other, with the result that particles originating from the outer surface 35 of the hollow body cannot reach the first cleaning fluid and therefore the inner surface 33 of the hollow body or the inner surface 54 of the lid.

[0082] Generally, cleaning the hollow body inner surface 33 and the lid inner surface 54 is of greater importance than cleaning the hollow body outer surface 35. Once it has been determined that the hollow body inner surface 33 and the lid inner surface 54 have been cleaned to the desired extent, the cleaning process can be stopped regardless of the extent to which the hollow body outer surface 35 has already been cleaned.

[0083] Here, the first drying gas and the second drying gas, e.g., air or nitrogen, can be introduced into the first cleaning head 42, the first further cleaning head 58, and the second cleaning head 64 via the first supply channel 68 or the second supply channel in exactly the same way as the first and second cleaning fluids. However, for this purpose, a negative pressure is generated in the hollow body 12 by connecting a pipe (not shown) to a negative pressure port 94, which can be connected to a vacuum pump (also not shown). Due to the negative pressure, the first drying gas and / or the second drying gas are sucked into the hollow body 12 and then removed again from the hollow body 12. The first cleaning head 42 has a first drying nozzle 86, the first further cleaning head 58 has a first drying nozzle 88, and the second cleaning head has a second drying nozzle 90, which can be used to emit the first drying gas or the second drying gas and spray it onto the inner surface 33 of the hollow body, the inner surface 54 of the lid, and the outer surface 35 of the hollow body. The first drying gas and the second drying gas push the first cleaning fluid and the second cleaning fluid out of the apparatus 10. Additionally, the remainder of the first and second cleaning fluids can be blown away.

[0084] Additionally, the first cleaning head 42, the further first cleaning head 58, and the second cleaning head each include an infrared diode 92 that can be used to heat and vaporize the remainder of the first and second cleaning fluids so that they can be expelled from the apparatus 10 by the first and second drying gases.

[0085] After the drying process is completed, the cover 18 is opened and the closure body 48 is moved to the open position. The cleaned hollow body 12 is removed from the process space 22. The storage unit 50 is stopped so that the lid 52 can be removed from the closure body 48 and transferred to the hollow body 12 for closing the hollow body.

[0086] Another hollow body 12 to be cleaned can now be handled in the device 10 in the manner described above. [Explanation of symbols]

[0087] 10 This device 12 Hollow body 14. Case 16 Housing opening 18 Cover 20 Foundation Wall 22 Process Space 24 Through opening 26 Locking Equipment 28 Through Hole 30 Transport Container 32 Bottom wall 33 Inner surface of hollow body 34 Side wall 35 Opening 36 Peripheral surface 40 Cleaning Equipment 42 First cleaning head 44 Wall section 46 Cleaning opening 48 Closed body 50 Containment Units 52 Lid 54 Inside of the lid 56 Outer surface of lid 58 Alternate First Cleaning Head 64 Second Cleaning Head 66 Fluid guide unit 68 First supply channel 70 first discharge flow path 72 First End 74 Particle measuring equipment 76 Second discharge flow path 78 First cleaning nozzle 80 Another first cleaning nozzle 82 Second cleaning nozzle 83 Cylinder 84 Associated Channels 85 Regulatory equipment 86 First Drying Nozzle 87 Input Coupling Unit 88 Another first drying nozzle 90 Second Drying Nozzle 92 Infrared diode 94 Negative pressure port α Spray angle D1 First rotation axis D2 Second rotation axis

Claims

1. An apparatus (10) for cleaning a pot-shaped hollow body (12) or a transport container (30) as this hollow body (12) for semiconductor wafers or EUV exposure masks, comprising: This hollow body (12) a bottom wall (32) and one or more side walls (34) forming the inner surface (33) of the hollow body; an opening (36) facing the bottom wall (32) and surrounded by a peripheral surface (38) of the side wall (34); and the hollow body (12) is provided with a lid (52) having an inner lid surface (54) and an outer lid surface (56), the opening (36) being closable by the lid (52); The device (10) a base wall (20) on which the hollow body (12) can be placed by a peripheral surface (38); a locking device (26) that seals the hollow body (12) by a peripheral surface (38) and allows it to be removably connected to the base wall (20); At least one through opening (24) formed by the base wall (20) and positioned radially inward of the locking device (26); a cleaning device (40) capable of emitting a first cleaning fluid for cleaning the inner surface (33) of the hollow body (12) when the hollow body (12) is connected to the base wall (20); a first exhaust flow path (70) having a first end (72); Equipped with The device, wherein the first discharge channel (70) is in fluid communication with the through opening (24) exclusively by its first end (72), and the first discharge channel can be used to discharge a first cleaning fluid discharged from the cleaning device (40), In another wall section (44) there is arranged a cleaning opening (46) which is at least partially closable by means of a closure (48), which closure (48) comprises a receiving unit (50) for receiving a lid (52) of the hollow body (12), The cleaning device (40) is provided with a separate first cleaning head (58) that can be used to spray a first cleaning fluid onto the inner surface (54) of the lid (52) for cleaning when the cleaning opening (46) is closed by a closing body (48) or a lid (52).

2. 2. The device (10) according to claim 1, The device is characterized in that the first discharge channel (70) is connected by its first end (72) to the base wall (20) and surrounds the through opening (24).

3. 3. The device (10) according to claim 1 or 2, The device is characterized in that the first discharge channel (70) widens in a funnel shape towards its first end.

4. The device (10) according to any one of claims 1 to 3, The device is characterized in that the first discharge channel (70) terminates at its first end (72) flush with the through opening (24).

5. The device (10) according to any one of claims 1 to 4, The cleaning device (40) comprises a first cleaning head (42) projecting beyond the through opening (24).

6. 6. The device (10) according to claim 5, The device is characterized in that the first cleaning head (42) is rotatably and / or translatably movable.

7. 7. The device (10) according to claim 6, 1. The apparatus according to claim 1, wherein the first cleaning head (42) comprises a number of first cleaning nozzles (78) through which a first cleaning fluid can be emitted at a spray angle (α), and the first cleaning head (42) comprises an adjustment device (85) by means of which the spray angle (α) can be adjusted.

8. The device (10) according to any one of claims 1 to 7, The device (10) comprises at least one in-coupling unit (87) for in-coupling acoustic waves into the first cleaning fluid.

9. 9. The device (10) according to claim 8, 10. The apparatus according to claim 9, wherein at least some of said input coupling units (87) are integrated with or operate in cooperation with at least some of said first cleaning nozzles (78).

10. The device (10) according to any one of claims 1 to 9, The cleaning device (40) comprises a supply channel (68) for supplying a first cleaning fluid to a first cleaning head (42), and the discharge channel (70) and the supply channel (68) are at least partially combined in one fluid conducting unit (66).

11. The device (10) according to any one of claims 1 to 10, The device is characterized in that a first channel (41) is arranged in the base wall (20), by means of which a cleaning fluid can be guided to the peripheral surface (38).

12. The device (10) according to any one of claims 1 to 11, The apparatus further comprises a particle measuring device (74) disposed in the first discharge flow path (70) for measuring particles contained in the first cleaning fluid.

13. The device (10) according to any one of claims 1 to 12, The device is characterized in that the closure (48) is fixed to another wall part (44) so ​​as to be movable between an open position in which the closure (48) opens the cleaning opening (46) and a closed position in which the closure (48) or lid (52) closes the cleaning opening (46).

14. 14. The device (10) according to claim 12 or 13, The device (10) is characterized in that it comprises a second flow path (57) by means of which the cleaning fluid can be guided to the lid (52).

15. 15. The device (10) according to any one of claims 1 to 14, wherein the bottom wall (32) and the side wall (34) form the outer surface (35) of the hollow body, said cleaning device (40) comprising a second cleaning head (64) by means of which a second cleaning fluid can be emitted for cleaning the outer surface (35) of the hollow body; The device (10) comprises a second discharge flow path (76) that can be used to discharge the second cleaning fluid emitted from the second cleaning head (64).

16. 16. The device (10) according to claim 15, The apparatus (10) comprises a housing (14) which, together with a base wall (20), encloses a process space (22), the process space (22) being accessible through a housing opening (16) which can be closed by a cover (18).

17. 17. The device (10) according to claim 16, The apparatus is characterized in that the base wall (20) has a certain number of through holes (28) arranged radially outside the locking device (26), and by means of the through holes, the second discharge channel (76) is fluidly connected to the process space (22).

18. The device (10) according to any one of claims 15 to 17, The apparatus is characterized in that the second cleaning head (64) is formed in a U-shape and is rotatably and / or translatably movable within the process space (22).

19. 16. The device (10) according to claim 1 or claim 15, The apparatus is characterized in that at least one of the first cleaning head (42), the other first cleaning head (58), and the second cleaning head (64) of the cleaning device (40) comprises at least one drying nozzle (86, 88, 90) and / or an infrared diode (92).

20. 20. A method for cleaning a pot-shaped hollow body (12) or a transport container (30) as this hollow body (12) for semiconductor wafers or for EUV exposure masks using an apparatus according to any one of claims 1 to 19, comprising: placing the hollow body (12) on the base wall (20) by the peripheral surface (38); sealingly and releasably connecting the hollow body (12) to the base wall (20) using a locking device (26), wherein the hollow body (12) is sealed against the base wall (20) at a peripheral surface; using a first cleaning head (42) of the cleaning device (40) to emit a first cleaning fluid for cleaning the inner surface (33) of the hollow body and discharging the first cleaning fluid using a first discharge channel (70); or a second cleaning head (64) of the cleaning device (40) is used to emit a second cleaning fluid for cleaning the outer surface (35) of the hollow body and a second discharge channel (76) is used to discharge the second cleaning fluid; or A method having both steps.

21. 21. The method of claim 20, moving the closure (48) to an open position; placing the lid (52) on the storage unit (50) of the closure (48) by the lid's outer surface (56) to removably secure the lid (52) to the closure (48); moving the closure (48) to a closed position; and using another first cleaning head (58) to emit a first cleaning fluid to clean the interior surface (54) of the lid.

22. 22. The method of claim 20 or 21, Completely filling the space defined by the inner surface (33) of the hollow body with a first cleaning fluid; and coupling acoustic waves into the first cleaning fluid using an in-coupling unit (87).

23. 22. The method of claim 20 or 21, and coupling acoustic waves into the first cleaning fluid emitted from the first cleaning nozzle (78) using an input coupling unit (87), the input coupling unit (87) being integrated into or operating in cooperation with the first cleaning nozzle (78).

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