Mask jig, film formation method and film formation apparatus
The use of an imide-based mask jig with specific through-hole configurations addresses the instability of film formation on mask jigs, enabling stable and efficient film deposition on substrates by minimizing jig surface film accumulation.
Patent Information
- Application Number
- JP2023525636
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2021-05-31
- Filing Date
- 2022-03-30
- Publication Date
- 2026-02-20
- Estimated Expiration
- 2042-03-30
AI Technical Summary
The formation of films on the surface of mask jigs during thermal spraying methods leads to unstable film quality on substrates, requiring frequent cleaning and process adjustments, which hinders efficient film formation.
A mask jig comprising a main body and a mask cover made of imide-based resin, with specific through-hole configurations, is used to minimize film deposition on the jig surface, ensuring consistent film quality on the substrate.
The solution allows for stable and efficient film formation on substrates by reducing film formation on the mask jig, thereby maintaining consistent process conditions and extending the jig's operational life.
Smart Images

Figure 0007818588000004 
Figure 0007818588000005 
Figure 0007818588000006
Abstract
Description
[Technical Field]
[0001] The present disclosure relates to a mask jig, a film forming method, and a film forming apparatus. [Background technology]
[0002] Cold spraying, a type of thermal spraying method, is known. In cold spraying, a film is formed on a substrate by spraying a film-forming material onto the substrate together with a carrier gas (see, for example, JP 2017-170369 A).
[0003] Furthermore, in thermal spraying methods such as the above-mentioned cold spray method, a mask jig is used that is placed on the surface of the substrate to define the film formation area (see, for example, JP 2002-361135 A). The film formation material is supplied to the surface of the substrate through through holes formed in the mask jig, thereby defining the planar shape of the film formation area. [Prior art documents] [Patent documents]
[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2017-170369 [Patent Document 2] Japanese Patent Application Laid-Open No. 2002-361135 Summary of the Invention [Problem to be solved by the invention]
[0005] When a mask jig is used in a thermal spraying method such as the cold spray method described above, a film made of the film-forming material is also formed on the surface of the mask jig. When a film is formed on the surface of the mask jig, the process conditions (film-forming conditions) when the film-forming material is supplied to the surface of the substrate through the through-holes in the mask jig may change from the conditions at the start of film formation. This makes it difficult to stably form a film on the surface of the substrate. Furthermore, to ensure the quality of the film formed on the surface of the substrate, a process such as removing the film formed on the surface of the mask jig must be performed at regular intervals. As a result, it has been difficult to efficiently form a film of stable quality on the surface of the substrate. Japanese Patent Application Laid-Open No. 2002-361135 studies suppressing film formation on the surface of the mask jig. However, from the perspective of more efficiently forming a film of stable quality on the surface of the substrate, further improvements are desirable, such as manufacturing the mask jig from a material that is difficult to form a film on.
[0006] An object of the present disclosure is to provide a mask jig, a film forming method, and a film forming apparatus that are capable of efficiently forming a film of stable quality on the surface of a substrate. [Means for solving the problem]
[0007] A mask jig according to the present disclosure is used in a thermal spraying method. The mask jig includes a main body and a mask cover. The main body includes a first surface and a second surface located opposite the first surface. The mask cover is disposed on the second surface side of the main body so as to overlap the main body, and includes a third surface and a fourth surface located opposite the third surface. The mask cover is formed from an imide-based resin.
[0008] The film formation method according to the present disclosure includes a step of arranging the mask jig so that it faces the surface of the substrate. In the arranging step, the mask jig is arranged so that a first surface of the mask jig faces the surface of the substrate. The film formation method according to the present disclosure includes a step of spraying a powder serving as a film formation raw material onto the surface of the substrate by a cold spray method through the first and second through holes of the mask jig.
[0009] The film forming apparatus according to the present disclosure includes a spray gun including a nozzle, a powder supply unit, a gas supply unit, and the mask jig. The powder supply unit supplies powder, which is a film forming raw material, to the spray gun. The gas supply unit supplies an operating gas to the spray gun. The mask jig is disposed between the substrate and the spray gun. [Effects of the Invention]
[0010] According to the above, a film of stable quality can be efficiently formed on the surface of a substrate. [Brief explanation of the drawings]
[0011] [Figure 1] 1 is a schematic diagram showing a configuration of a film forming apparatus according to an embodiment of the present invention; [Figure 2] 1 is a schematic cross-sectional view showing a mask jig according to the present embodiment, and a substrate and a base jig on which the mask jig is placed. [Figure 3] 3 is a schematic cross-sectional view showing an enlarged first example of an embodiment of an area A surrounded by a dotted line in FIG. 2. FIG. [Figure 4] 3 is a schematic cross-sectional view showing an enlarged second example of the embodiment of the region A surrounded by the dotted line in FIG. 2. FIG. [Figure 5] 3 is a schematic cross-sectional view showing an enlarged view of a third example of the embodiment of the region A surrounded by the dotted line in FIG. 2. FIG. [Figure 6] 3 is a schematic cross-sectional view showing an enlarged fourth example of the embodiment of the region A surrounded by the dotted line in FIG. 2. FIG. [Figure 7] 3 is a schematic cross-sectional view showing an enlarged view of a fifth example of the embodiment of an area A surrounded by a dotted line in FIG. 2. FIG. [Figure 8] 3 is a schematic cross-sectional view generally showing further modified examples of the mask jig of FIG. 2. FIG. [Figure 9] 2 is a flowchart illustrating a film forming method according to the present embodiment. [Figure 10] FIG. 10 is a schematic cross-sectional view showing a first example of an embodiment of a mask jig used in Example 3. [Figure 11] FIG. 10 is a schematic cross-sectional view showing a second example of the mask jig used in Example 3. [Figure 12] FIG. 10 is a schematic cross-sectional view showing a third example of the mask jig used in Example 3. [Figure 13] 10 is a photograph showing the deposition of film-forming raw materials on the inner wall of the inclined portion formed in the main body of Sample 11 of Example 3, as viewed from above. [Figure 14] 10 is a photograph showing the deposition of film-forming raw materials on the inner wall of the inclined portion formed in the main body of Sample 12 of Example 3, as viewed from above. [Figure 15] 10 is a photograph showing the deposition of film-forming raw materials on the inner wall of the inclined portion formed in the main body of Sample 13 of Example 3, as viewed from above. DETAILED DESCRIPTION OF THE INVENTION
[0012] Hereinafter, embodiments of the present disclosure will be described. Note that the same reference numerals are used to designate the same components, and the description thereof will not be repeated.
[0013] <Configuration of film deposition equipment> 1 is a schematic diagram showing the configuration of a film formation apparatus according to the present embodiment. Referring to FIG. 1, the film formation apparatus 100 mainly includes a spray gun 2 including a nozzle 2 b, a powder supply unit 3, a gas supply unit 4, and a mask jig 1.
[0014] The spray gun 2 mainly includes a spray gun main body 2a, a nozzle 2b, a heater 2c, and a temperature sensor 9. The nozzle 2b is connected to a first end, which is the front end of the spray gun main body 2a. A pipe 6 is connected to a second end, which is the rear end of the spray gun main body 2a. The pipe 6 is connected to a gas supply unit 4 via a valve 7. The gas supply unit 4 supplies operating gas to the spray gun 2 via the pipe 6. The supply state of operating gas from the gas supply unit 4 to the spray gun 2 can be controlled by opening and closing the valve 7. A pressure sensor 8 is installed in the pipe 6. The pressure sensor 8 measures the pressure of the operating gas supplied from the gas supply unit 4 to the pipe 6.
[0015] The working gas supplied from the second end of the spray gun body 2a to the inside of the spray gun body 2a is heated by a heater 2c. The heater 2c is located on the second end side of the spray gun body 2a. The working gas flows inside the spray gun body 2a along the arrow 31. A temperature sensor 9 is connected to the connection between the nozzle 2b and the spray gun body 2a. The temperature sensor 9 measures the temperature of the working gas flowing inside the spray gun body 2a.
[0016] Nozzle 2b is connected to pipe 5. Pipe 5 is connected to powder supply unit 3. Powder supply unit 3 supplies powder, which is a film-forming raw material, to nozzle 2b of spray gun 2 via pipe 5.
[0017] The mask jig 1 is placed between the substrate 20 and the spray gun 2. A first through hole 11c and a second through hole 12a (see FIG. 2) are formed in the mask jig 1. The first through hole 11c and the second through hole 12a define a film formation region on the surface of the substrate 20. The specific configuration of the mask jig 1 will be described later.
[0018] <Operation of the film formation device> In the film-forming apparatus 100 shown in FIG. 1 , an operating gas is supplied from a gas supply unit 4 to a spray gun 2 through a pipe 6, as indicated by an arrow 30. Examples of the operating gas include nitrogen, helium, dry air, and a mixture thereof. The operating gas has a pressure of, for example, approximately 1 MPa. The flow rate of the operating gas is, for example, 300 L / min to 500 L / min. The operating gas supplied to the second end of the spray gun main body 2a is heated by a heater 2c. The heating temperature of the operating gas is set appropriately depending on the composition of the film-forming raw material, but may be, for example, 100°C to 500°C. The operating gas flows from the spray gun main body 2a to a nozzle 2b. Powder 10, which serves as a film-forming raw material, is supplied to the nozzle 2b from a powder supply unit 3 through a pipe 5, as indicated by an arrow 32. Examples of the powder 10 include nickel powder, tin powder, or a mixture of tin powder and zinc powder. Alternatively, aluminum powder may be used. The particle size of the powder 10 is, for example, 1 μm to 50 μm.
[0019] The powder 10 supplied to the nozzle 2b is sprayed together with the operating gas from the tip of the nozzle 2b toward the substrate 20. A mask jig 1 is placed on the surface of the substrate 20. The sprayed powder 10 reaches the surface of the substrate 20 through the first through-hole 11c and the second through-hole 12a (see FIG. 2) of the mask jig 1. A film made of the sprayed powder 10 as a raw material is formed on the surface of the substrate 20.
[0020] <Mask jig configuration> 2 is a schematic cross-sectional view showing a mask jig according to this embodiment, and a substrate and a base jig on which the mask jig is installed. Referring to FIG. 2, the mask jig 1 is used in a cold spray method, which is an example of a thermal spray method. The mask jig 1 includes a main body 11 and a mask cover 12.
[0021] The main body 11 includes a first surface 11s1 and a second surface 11s2. The second surface 11s2 is located on the opposite side of the first surface 11s1. The first surface 11s1 and the second surface 11s2 are, for example, rectangular. The distance from the first surface 11s1 to the second surface 11s2, which is the thickness of the main body 11, is approximately constant throughout the entire main body 11. Therefore, the main body 11 is a plate-like member having a rectangular planar shape.
[0022] The mask cover 12 includes a third surface 12s1 and a fourth surface 12s2. The fourth surface 12s2 is located on the opposite side of the third surface 12s1. The third surface 12s1 and the fourth surface 12s2 are, for example, rectangular. The distance from the third surface 12s1 to the fourth surface 12s2, which is the thickness T of the mask cover 12, is substantially constant throughout the entire mask cover 12. Therefore, the mask cover 12 is a plate-like member having a rectangular planar shape. The mask cover 12 is arranged on the second surface 11s2 side of the main body portion 11, i.e., the upper side in FIG. 2, so as to overlap with the main body portion 11. The mask cover 12 is arranged so that the third surface 12s1 faces the second surface 11s2 of the main body portion 11 and they are in contact with each other.
[0023] The mask cover 12 is made of an imide resin. Specifically, the mask cover 12 is made of, for example, polyamide-imide. The mask cover 12 may be made of, for example, polyimide instead of polyamide-imide.
[0024] A first through hole 11c is formed in the main body 11. The first through hole 11c penetrates the main body 11 so as to reach the second surface 11s2 from the first surface 11s1. The planar shape of the first through hole 11c is arbitrary, and may be, for example, circular or rectangular (particularly square) in plan view.
[0025] The first through-hole 11c is a portion where a component constituting the main body 11 is missing, and may have a columnar portion 11a and an inclined portion 11b. The columnar portion 11a has an inner wall that extends in a direction substantially perpendicular to the first surface 11s1 and the second surface 11s2. In other words, in the cross-sectional view of FIG. 2, two opposing portions of the inner wall of the columnar portion 11a, positioned 180° apart from the center, extend parallel to each other. Therefore, the left and right inner walls of the columnar portion 11a in the cross-sectional view of FIG. 2 are parallel to each other. Note that the "substantially perpendicular" direction here allows for an error of ±1° from the perfectly perpendicular direction. The inclined portion 11b has an inner wall that extends in a direction inclined relative to the direction substantially perpendicular to the first surface 11s1 and the second surface 11s2. 2, the inner wall at the left end and the inner wall at the right end of the inclined portion 11b extend in a direction different from the inner wall of the columnar portion 11a. The inner wall at the left end and the inner wall at the right end of the inclined portion 11b extend in a direction inclined with respect to the first surface 11s1 and the second surface 11s2.
[0026] As shown in FIG. 2, the inclined portion 11b is preferably formed closer to the second surface 11s2 than the columnar portion 11a, and the inner wall is preferably inclined so that its diameter gradually increases from the first surface 11s1 toward the second surface 11s2. However, this is not limiting, and for example, the inclined portion 11b may be formed closer to the first surface 11s1 than the columnar portion 11a. The inclined portion 11b may have an inner wall inclined so that its diameter gradually decreases from the first surface 11s1 toward the second surface 11s2. Alternatively, for example, the inclined portion 11b may be formed only in the center in the direction connecting the first surface 11s1 and the second surface 11s2 without contacting either the first surface 11s1 or the second surface 11s2. In this case, the columnar portion 11a reaching the first surface 11s1 is formed on the first surface 11s1 side of the inclined portion 11b, and the inclined portion 11b 2nd side 11s2 On the side 2nd side 11s2 At the boundary between adjacent columnar portions 11a and inclined portions 11b, the inner wall of columnar portion 11a and the inner wall of inclined portion 11b are preferably continuous.
[0027] 2, as an example, first through hole 11c has both columnar portion 11a and inclined portion 11b. However, this is not limiting, and first through hole 11c may have only columnar portion 11a or only inclined portion 11b. Furthermore, the diameter of first through hole 11c, etc., is the diameter of the circle when its planar shape is circular. However, when first through hole 11c, etc., has a square planar shape, its diameter is the length of one side of the square.
[0028] A second through hole 12a is formed in the mask cover 12. The second through hole 12a penetrates the mask cover 12 so as to extend from the third surface 12s1 to the fourth surface 12s2. Similar to the columnar portion 11a, the inner wall of the second through hole 12a extends entirely in a direction substantially perpendicular to the first surface 11s1 and the second surface 11s2. However, similar to the inclined portion 11b, the inner wall of the second through hole 12a may extend in a direction inclined with respect to the direction substantially perpendicular to the third surface 12s1 and the fourth surface 12s2. The inclination angle of the inner wall of the second through hole 12a with respect to the direction perpendicular to the third surface 12s1 may be, for example, 10° or less with respect to the direction perpendicular to the third surface 12s1.
[0029] Although not shown, the first through hole 11c and the second through hole 12a do not extend over the entire mask jig 1 in the depth direction of the paper in Fig. 2, but are formed only in a partial region in the depth direction of the paper. In other words, the dimensions of the first through hole 11c and the second through hole 12a in the depth direction of the paper in Fig. 2 are relatively short. Specifically, the dimensions of the first through hole 11c and the second through hole 12a in the depth direction of the paper in Fig. 2 are equal to or slightly larger or smaller than the dimensions in the left-right direction of Fig. 2.
[0030] The base jig 21 is a member for placing the substrate 20 on which a film is to be formed. The base jig 21 is a plate-like member having a rectangular planar shape. One main surface of the base jig 21, i.e., the upper main surface in FIG. 2, may be placed so as to be in contact with the first surface 11s1 of the main body 11 constituting the mask jig 1, as shown in FIG. 2. However, as shown in FIG. 1, one main surface of the base jig 21 may be placed so as not to be in contact with the first surface 11s1 (so as to have a gap between it and the first surface 11s1).
[0031] A groove 22 is formed on a main surface of the base jig 21 opposite the first surface 11s1. The groove 22 is formed as a recess that is recessed in a direction perpendicular to one of the main surfaces of the base jig 21. The substrate 20 is placed on the base jig 21 by fitting the substrate 20 into the groove 22.
[0032] Screw holes 13 are formed so as to penetrate all of the mask cover 12, main body 11, and base jig 21, which are stacked so as to be in contact with each other. The screw holes 13 are formed so that the holes formed on the mask cover 12, main body 11, and base jig 21 all overlap in a plan view. In this way, the mask cover 12 can be fixed to the main body 11 and base jig 21 by screws. This allows the mask cover 12 and the main body 11 to be replaced independently. As a result, when the mask cover 12 and the main body 11 have different life spans, replacement costs can be reduced compared to a configuration in which the main body 11 and mask cover 12 are integrated.
[0033] 2, the diameter of the screw holes 13 may be smaller in the base jig 21 than in the mask cover 12 and the main body 11, and may be the same size in the mask cover 12 and the main body 11. However, the diameter of the screw holes 13 may be the same size in the main body 11 and the base jig 21, and may be larger in the mask cover 12 than in the main body 11.
[0034] Next, the materials and sizes of the above-mentioned components will be described. Any material can be used for the main body 11 of the mask jig 1, but copper, a metal material with high heat dissipation properties, may be used, for example. This can mitigate the thermal impact on the substrate 20. However, instead of copper, metals such as stainless steel or steel, or ceramics such as carbon or alumina can be used for the main body 11.
[0035] The main body 11 may have a thin film formed on the surface of, for example, copper. The thin film is preferably made of a material that has low affinity with the material to be deposited using, for example, the mask jig 1. That is, for example, when the mask jig 1 is used to deposit an aluminum film by thermal spraying, it is preferable to form a thin film of, for example, tin, which is a material that has low affinity with aluminum (is difficult to come into contact with, mix with, or bond with aluminum), on the surface of the main body 11 made of copper.
[0036] Of the first through-hole 11c formed in the main body 11, the minimum angles θ1 and θ2 formed between the inner wall of the inclined portion 11b and the first surface 11s1 and the second surface 11s2 are preferably 30° or more and 60° or less. In other words, the angles θ1 and θ2 formed between the dashed-dotted line parallel to the first surface 11s1 and the like and the inner wall of the inclined portion 11b shown in FIG. 2 are preferably 30° or more and 60° or less. The angles θ1 and θ2 may be equal to or different from each other. The inner wall may include a partially curved surface. Furthermore, the inclination angles θ1 and θ2 may be constant throughout the entire inner wall, or the inner wall may include surfaces with locally different inclination angles θ1 and θ2.
[0037] The mask cover 12 of the mask jig 1 preferably has a thickness T, which is the distance between the third surface 12s1 and the fourth surface 12s2, of 0.5 mm or more and 2.0 mm or less. The base jig 21 is preferably formed from a metal material with high heat dissipation properties. Specifically, the base jig 21 is preferably formed from either a copper-based metal material or an aluminum-based metal material. The main body portion 11 preferably has a thickness, which is the distance between the first surface 11s1 and the second surface 11s2, of 1.5 mm or more and 3 mm or less. In the mask jig 1, it is preferable that the mask cover 12 is thinner than the main body portion 11. However, this is not a limitation, and the main body portion 11 and the mask cover 12 may have the same thickness. Alternatively, the mask cover 12 may be thicker than the main body portion 11.
[0038] The diameter of the second through hole 12a is equal to or greater than the diameter of the first through hole 11c. "Equal to or greater" includes both the same and larger (greater) diameters. That is, the diameter of the second through hole 12a may be the same as or larger than the diameter of the first through hole 11c. When the diameter of the second through hole 12a is larger than the diameter of the first through hole 11c, the second central axis 12as passing through the center of the second through hole 12a in a plan view may be collinear with the first central axis 11as passing through the center of the first through hole 11c in a plan view. That is, as shown in FIG. 2, the second central axis 12as and the first central axis 11as may overlap so as to be coaxial. Alternatively, although not shown, the first central axis 11as in FIG. 2 may be shifted to the right or left of the second central axis 12as, so that the two axes are at different positions. Here, the relationship in size between the diameters of the first through-hole 11c and the second through-hole 12a will be described below, including possible modifications.
[0039] 3 is a schematic cross-sectional view showing an enlarged first example of the embodiment of region A surrounded by a dotted line in FIG. 2. Referring to FIG. 3, in the first example, the first through-hole of the main body 11 consists only of a columnar portion 11a and has a constant diameter throughout. The second through-hole 12a of the mask cover 12 has a constant diameter throughout, similar to the columnar portion 11a. The diameter of the columnar portion 11a and the diameter of the second through-hole 12a are equal. Such a configuration may also be used.
[0040] 4 is a schematic cross-sectional view showing an enlarged second example of the embodiment of region A surrounded by a dotted line in FIG. 2. Referring to FIG. 4, in the second example, as in the first example, the first through hole of the main body 11 consists only of a columnar portion 11a, and the second through hole 12a of the mask cover 12 has a constant diameter throughout, similar to the columnar portion 11a. The diameter of the second through hole 12a is larger than the diameter of the columnar portion 11a. The second example in FIG. 4 excludes the case in which the diameters of the columnar portion 11a and the second through hole 12a are equal, as in FIG. 3. Such a configuration may also be used.
[0041] FIG. 5 is a schematic cross-sectional view showing an enlarged third example of the embodiment of region A surrounded by a dotted line in FIG. 2. Referring to FIG. 5, in the third example, the first through hole of the main body 11 consists only of the inclined portion 11b. The inner wall of the inclined portion 11b is inclined relative to a direction perpendicular to the first and second surfaces 11s1 and 11s2 so that the diameter gradually increases from the first surface 11s1 toward the second surface 11s2. The maximum diameter D1 of the inclined portion 11b in a plan view is formed on the second surface 11s2, and the minimum diameter D2 of the inclined portion 11b in a plan view is formed on the first surface 11s1. Meanwhile, the second through hole 12a of the mask cover 12 has a constant diameter D3 throughout its entirety, similar to the columnar portion 11a. The diameter D3 of the second through hole 12a is larger than the minimum diameter D2 of the inclined portion 11b and smaller than the maximum diameter D1 of the inclined portion 11b. Such a configuration may also be used.
[0042] 6 is a schematic cross-sectional view showing an enlarged view of a fourth example of the embodiment of region A surrounded by a dotted line in FIG. 2. Referring to FIG. 6, in the fourth example, similar to the third example, the first through hole of the main body 11 consists only of the inclined portion 11b, and the inner wall is inclined so that the diameter gradually increases from the first surface 11s1 side toward the second surface 11s2 side. The second through hole 12a of the mask cover 12 has a constant diameter D3 throughout. The diameter D3 of the second through hole 12a is larger than the minimum diameter D2 of the inclined portion 11b and equal to the maximum diameter D1 of the inclined portion 11b. Such a configuration may also be used.
[0043] 7 is a schematic cross-sectional view showing an enlarged view of a fifth example of the embodiment of region A surrounded by a dotted line in FIG. 2. Referring to FIG. 6, in the fifth example, the shapes of the first through hole and second through hole 12a are similar to those of the third and fourth examples, and therefore description thereof will not be repeated. Diameter D3 of second through hole 12a is equal to minimum diameter D2 of inclined portion 11b and is smaller than maximum diameter D1 of inclined portion 11b. Such a configuration may also be used.
[0044] Although not shown, if the second through hole 12a of the mask cover 12 has only an inclined portion whose inner wall is inclined similarly to the inclined portion 11b of the first through hole 11c (or has an inclined portion in part thereof as described below), in the above, the diameter of the second through hole 12a is considered to be its minimum value.
[0045] <Further variations> 8 is a schematic cross-sectional view generally illustrating further modified examples of the mask jig of FIG. 2. The second through-holes 12a of the mask cover 12 may be formed so as to intersect (orthogonally) at the end portions intersecting with the fourth surface 12s2 as in FIG. 2. However, referring to FIG. 8, the second through-holes 12a may be formed so as to be rounded, for example, like a part of a sphere (curved surface), at the end portions intersecting with the fourth surface 12s2. In other words, in the cross-sectional view of FIG. 8, the portion where the second through-holes 12a and the fourth surface 12s2 intersect may be formed as a curved surface 12R having a curved shape (for example, a circular arc or a partial ellipse shape). The same applies to the end portions where the second through-holes 12a and the third surface 12s1 intersect.
[0046] Furthermore, when the second through hole 12a of the mask cover 12 extends in a direction inclined with respect to the direction perpendicular to the third surface 12s1, the inclination angle of the inclined portion may be formed to have two or more stages. In other words, the inclined portion may be formed to have two or more inclined portions with different inclination angles. For example, in FIG. 8, the inner wall of the second through hole 12a has two inclined portions 12a1 and 12a2 that have different angles with respect to the third surface 12s1.
[0047] The above is not limited to the mask cover 12, but also applies to the main body 11. The inner wall of the inclined portion 11b of the main body 11 may also be formed so that its inclination angle has two or more stages. As an example, a part of the inclined portion 11b in FIG. 8 has two inclined portions 11b1 and 11b2 that have different angles relative to the first surface 11s1. Furthermore, the end of the first through hole 11c that intersects with at least one of the first surface 11s1 and the second surface 11s2 may be formed rounded like a curved surface (curved in the cross-sectional view of FIG. 8).
[0048] <Action and effect> A mask jig 1 according to the present disclosure is used in a thermal spraying method. The mask jig 1 includes a main body 11 and a mask cover 12. The main body 11 includes a first surface 11s1 and a second surface 11s2 located opposite the first surface 11s1. The mask cover 12 is disposed on the second surface 11s2 side of the main body 11 so as to overlap the main body 11. The mask cover 12 includes a third surface 12s1 and a fourth surface 12s2 located opposite the third surface 12s1. The mask cover 12 is formed from an imide-based resin.
[0049] The surface of the mask cover 12, which is made of an imide resin, a highly heat-resistant resin material, is less likely to form a film material formed by a thermal spraying method. Therefore, if powder 10 (see FIG. 1) of the material used for film formation is supplied from the mask cover 12 side, when a substrate or other target for film formation is placed downstream of the powder from the mask jig 1, film formation on the surface of the mask jig 1 where film formation is not desired is suppressed. Furthermore, the mask cover 12 is positioned on the second surface 11s2 side of the main body 11 so as to overlap with the main body 11 (cover the surface of the main body 11), suppressing film formation on the surface of the main body 11. This prevents film formation conditions from changing from the conditions initially set. This allows for a more efficient formation of a film of consistent quality on the surface of the substrate than, for example, performing a surface treatment on the formed mask as a post-treatment.
[0050] In the mask jig 1, a first through hole 11c is formed in the main body 11, extending from the first surface 11s1 to the second surface 11s2. A second through hole 12a is formed in the mask cover 12, extending from the third surface 12s1 to the fourth surface 12s2. The diameter of the second through hole 12a is equal to or larger than the diameter of the first through hole 11c. This configuration may be used. The diameter of the second through hole 12a may be larger than the diameter of the first through hole 11c.
[0051] The area on the surface of the substrate where the film is to be formed is defined by the first through-holes 11c formed in the main body 11 adjacent to the substrate. This is because the film is formed in an area overlapping the area where the first through-holes 11c are formed. By making the diameter of the second through-holes 12a equal to or greater than the diameter of the first through-holes 11c (larger than the diameter), the area inside the first through-holes 11c of the main body 11 where the film is to be formed is prevented from being covered by an area other than the through-holes of the mask cover 12, which would hinder film formation. In addition to stabilizing the film quality and improving the efficiency of film formation by the mask cover 12, the problem of film formation being prevented by the mask cover 12 blocking part of the first through-holes 11c can be prevented. In other words, the through-holes formed in the mask jig 1 allow the mask jig 1 to maintain its function as a mask.
[0052] Furthermore, making the diameter of the second through hole 12a larger than the diameter of the first through hole 11c provides the following effect. Repeated film formation may cause the area of the mask cover 12 adjacent to the second through hole 12a to deform due to heat during use, distorting the shape of the second through hole 12a. Even in such a case, making the diameter of the second through hole 12a larger than the diameter of the first through hole 11c ensures that the film-formed area inside the first through hole 11c of the main body 11 does not overlap with the area of the mask cover 12 other than the through hole. This is because the second through hole 12a is large, creating a margin that prevents the mask cover 12 from blocking part of the first through hole 11c even if the mask cover 12 deforms. This allows the mask jig 1, including the mask cover 12, to maintain its function as a mask.
[0053] In the mask jig 1, the main body 11 is formed with a first through hole 11c that extends from the first surface 11s1 to the second surface 11s2. The mask cover 12 is formed with a second through hole 12a that extends from the third surface 12s1 to the fourth surface 12s2. The inner wall of the first through hole 11c extends in a direction that is inclined with respect to a direction perpendicular to the first surface 11s1 and the second surface 11s2. The diameter D3 of the second through hole 12a is equal to or greater than the minimum diameter D2 of the first through hole 11c and equal to or less than the maximum diameter D1 of the first through hole 11c. Such a configuration may be used.
[0054] The area on the surface of the substrate where the film is formed is determined by the minimum diameter D2 of the first through-hole 11c formed in the main body 11 adjacent to the substrate. This is because the film is formed in an area that overlaps the minimum diameter D2 of the first through-hole 11c. The minimum diameter D3 of the second through-hole 12a is the same as the minimum diameter D2 of the first through-hole 11c. This prevents the area inside the first through-hole 11c of the main body 11 from overlapping with the area of the mask cover 12 other than the second through-hole 12a. This not only stabilizes the film quality and improves film formation efficiency, but also prevents the mask cover 12 from blocking part of the first through-hole 11c, preventing film formation in that blocked area. In other words, the through-holes formed in the mask jig 1 allow the mask jig 1 to maintain its function as a mask.
[0055] Furthermore, powder 10 (see FIG. 1) passing through second through holes 12a of mask cover 12 may adhere to the inner wall of second through holes 12a. In mask jig 1, the inner wall of first through hole 11c has inclined portion 11b. Therefore, compared to when the inner wall is not inclined with respect to the direction perpendicular to first surface 11s1, the collision energy when powder 10 (see FIG. 1) passing through second through holes 12a of mask cover 12 collides with the inner wall of first through hole 11c can be reduced. Therefore, film formation on the edges of the through holes of mask jig 1, i.e., on the inner wall, can be suppressed.
[0056] In the mask jig 1, the minimum angle formed between the inner wall of the first through hole 11c and the first surface 11s1 and the second surface 11s2 may be 30° or more and 60° or less. This reduces the collision energy when the powder 10 (see FIG. 1) passing through the second through hole 12a of the mask cover 12 collides with the inner wall of the first through hole 11c, as described above. This prevents film formation on the edges of the through holes of the mask jig 1, i.e., on the inner walls.
[0057] In the mask jig 1, from the viewpoint of enhancing the above-mentioned effects, the thickness of the mask cover 12 may be 0.5 mm or more and 2.0 mm or less.
[0058] <Film formation method> Fig. 9 is a flowchart showing a film formation method according to the present embodiment. Referring to Fig. 9, the film formation method according to the present embodiment is a film formation method carried out using mask jig 1 and film formation apparatus 100 shown in Figs. 1 to 7, and mainly includes a preparation step (S10), a film formation step (S20), and a post-processing step (S30).
[0059] The preparation step (S10) includes a step of placing the mask jig 1 so as to face the surface of the substrate 20 as shown in Fig. 1. In this placing step, the mask jig 1 is placed so that the first surface 11s1 (see Figs. 2 to 7) of the mask jig 1 faces the surface of the substrate 20. As described above, the main body 11 of the mask jig 1 is preferably made of a material that has low affinity with the powder material to be sprayed in the subsequent film-forming step (S20).
[0060] In the film formation step (S20), a powder serving as a film-forming raw material is sprayed onto the surface of the substrate 20 by a cold spray method using the film-forming device 100 through the first through-hole 11c and the second through-hole 12a (see FIG. 2) of the mask jig 1. As a result, a film made of the film-forming raw material is formed on the surface of the substrate 20.
[0061] In the post-treatment step (S30), the mask jig 1 is removed from the surface of the base material 20. Thereafter, necessary treatments such as processing are carried out on the base material 20. In this manner, a film can be formed on the surface of the base material 20.
[0062] In the above-described film formation method, since the mask jig 1 according to this embodiment is used, the amount of film-forming raw material attached to the mask jig 1 can be reduced, thereby extending the time for which the film formation step (S20) can be performed continuously. Alternatively, by using the mask jig 1, the number of times the mask jig 1 can be reused can be increased.
[0063] Below, examples for confirming the effects of the mask jig according to the present disclosure will be described. [Example]
[0064] <Sample> A mask jig consisting only of a main body 11 without a mask cover 12 was placed facing the surface of a substrate 20 as shown in FIGS. 1 and 2. A film was formed using the film-forming apparatus 100 shown in FIG. 1, and the amount of film-forming raw material attached to the surface of the main body 11 was measured. The first through-hole 11c of the main body 11 used consisted only of an inclined portion 11b, and the angles θ1 and θ2 (see FIG. 2) between the first surface 11s1 and the inclined portion 11b were 45°. Samples of such mask jigs consisting only of the main body 11 and made of different materials were prepared. Specifically, Sample 1 was made of stainless steel SUS304, Sample 2 was made of carbon steel, and Sample 3 was made of copper. Each sample had a rectangular planar shape, measuring 42 mm wide, 30 mm long, and 3 mm thick. The maximum diameter of the inclined portion 11b was 6 mm, and the minimum diameter was 2 mm. The first through holes 11c are formed in a matrix, with two holes spaced apart in the vertical direction (short side direction) in plan view and three holes spaced apart in the horizontal direction (long side direction) perpendicular to the vertical direction.
[0065] <Film formation process and results> Using the above-mentioned Samples 1 to 3, a film was formed on the surface of a substrate by cold spraying. Aluminum powder was used as the film-forming raw material. The aluminum powder was spherical and had a diameter of 10 μm. The material of the substrate 20 was alumina (Al2O3). The shape of the substrate 20 was a square plate in plan view. The size of the substrate was 42 mm wide x 30 mm long x 3 mm thick.
[0066] The film formation conditions were as follows: dry air was used as the working gas, the temperature of the working gas was 270°C, the flow rate of the working gas was 400 liters / min, and the pressure of the working gas was approximately 0.7 MPa. The width of the area (nozzle width) from the film formation device onto the surface of the mask jig from which the film formation raw material was sprayed was 5 mm. The speed (sweep speed) at which the area onto which the film formation raw material was sprayed moved on the surface of the mask jig so as to include the area where the through-holes were formed was 5 mm / sec. The size of the film formation area (area onto which the film formation raw material was sprayed) on the surface of the mask jig was 5 mm wide x 30 mm long. For each sample, the film formation raw material was sprayed onto the film formation area five times, and a film was formed on the surface of the substrate.
[0067] Under the above conditions, a film was formed on the surface of the substrate using each of Samples 1 to 3. The deposition amount (mg / pass) of the film-forming raw material was measured in the area where the film-forming raw material was sprayed for each of Samples 1 to 3, and the deposition amount (mg) of the film-forming raw material after five sprays was measured. The results are shown in Table 1 below.
[0068] [Table 1]
[0069] From Table 1, it can be seen that when the material of the main body 11 is copper as in Sample 3, the amount of film-forming raw material adhering can be reduced compared to other materials. In other words, when a material with high thermal conductivity is used for the main body 11 (mask jig), the amount of film-forming raw material adhering can be reduced compared to when a material with low thermal conductivity is used.
[0070] Next, the material of the main body 11 was copper, and a thin film of a material with low affinity for the film-forming raw material was formed on the surface of the copper (surface treatment), and the same measurements as above were then performed. Specifically, sample 4 was prepared by plating a thin film of tin, which has low affinity for the film-forming raw material aluminum, on the surface of a sample similar to sample 3. Furthermore, sample 5 was prepared by plating a thin film of chromium on the surface of a sample similar to sample 3. The results of sample 3 in Table 1 above and the measurement results of samples 4 and 5 are compared in Table 2 below.
[0071] [Table 2]
[0072] As can be seen from Table 2, sample 4, which has a thin film of tin formed on its surface, which has low affinity with aluminum, the film-forming raw material, was able to reduce the amount of film-forming raw material attached compared to samples 3 and 5. [Example]
[0073] <Sample> A mask jig sample consisting of only the main body 11 and no mask cover, as in Example 1, and a mask jig sample consisting of the main body 11 and mask cover 12, as in the present embodiment, were used to compare the amount of deposition material adhered to the columnar portions formed on the main body of the mask jig when a film was deposited using the film deposition apparatus 100 shown in FIG. 1 . Specifically, Sample 6 was prepared, which was made of stainless steel SUS304 like Sample 1 in Example 1, but consisted of only the main body 11, with the same configuration as in FIGS. 3 and 4 , in which the first through-hole 11c consisted only of the columnar portion 11a. Sample 10 was also prepared, which included the same main body 11 as Sample 6 and a mask cover 12 provided thereon. The mask cover 12 prepared to constitute the mask jig 1 of Sample 10 was made of polyamideimide. The mask cover 12 had a second through-hole 12a extending in a direction perpendicular to the third surface 12s1 (see FIG. 2 ). The mask cover 12 had a thickness of 1.5 mm, and the diameter of the second through-hole 12a was 5 mm. The second through-hole 12a was formed in the mask cover 12 at a position overlapping the first through-hole 11c in plan view.
[0074] <Film formation process> Using the above-mentioned Sample 6 and Sample 10, a film was formed on the surface of a substrate by cold spraying. Aluminum powder was used as the film-forming raw material. The aluminum powder was spherical and had a diameter of 10 μm. The material of the substrate 20 was stainless steel (SUS304). The shape and size of the substrate 20 were the same as in Example 1.
[0075] The deposition conditions were dry air as the working gas, with a working gas temperature of 270°C, a flow rate of 400 liters / min, and a pressure of approximately 0.7 MPa. The nozzle width was 5 mm. The sweep speed was 10 mm / sec. The deposition area was 5 mm wide x 30 mm long. For each sample, an area was formed in the deposition area where the deposition raw material was sprayed only once.
[0076] Under the above conditions, while forming a film on the surface of the substrate using each of Samples 11 to 13, the weight (adhesion amount) of the film-forming raw material adhered to the surface was measured and observed on the inner wall of the columnar portion 11a of the main body 11 of each of Samples 6 and 10. The results are shown in Table 3 below.
[0077] [Table 3]
[0078] In Table 3, the lamination amount of sample 10 having polyamideimide mask cover 12 is a negative value, which indicates that no deposition material adhered to the mask jig 1. As can be seen from Table 3, when the material of main body 11 is stainless steel SUS304, by covering it with mask cover 12 made of heat-resistant imide resin, deposition of deposition material to mask jig 1 could be suppressed. [Example]
[0079] <Sample> Fig. 10 is a schematic cross-sectional view showing a first example of the embodiment of the mask jig used in Example 3. Fig. 11 is a schematic cross-sectional view showing a second example of the embodiment of the mask jig used in Example 3. Fig. 12 is a schematic cross-sectional view showing a third example of the embodiment of the mask jig used in Example 3. With reference to Figs. 10 to 12, a sample 11 of the mask jig 1 having the configuration shown in Fig. 10, a sample 12 of the mask jig 1 having the configuration shown in Fig. 11, and a sample 13 of the mask jig 1 having the configuration shown in Fig. 12 were prepared.
[0080] Specifically, sample 11 in FIG. 10, sample 12 in FIG. 11, and sample 13 in FIG. 12 all have roughly the same configuration as mask jig 1 in FIG. 2. That is, first through-hole 11c of main body 11 has both columnar portion 11a and inclined portion 11b, and second through-hole 12a of mask cover 12 extends in a direction perpendicular to first surface 11s1 (see FIG. 2) and the like. The diameter of columnar portion 11a was 2 mm, and the maximum diameter of inclined portion 11b was 6 mm. The thickness of mask cover 12 was 1.5 mm. Note that main body 11 was formed of copper, and mask cover 12 was formed of polyamideimide.
[0081] Samples 11 (FIG. 10), 12 (FIG. 11), and 13 (FIG. 12) were prepared as mask jigs 1, each with a different diameter of the second through hole 12a. Specifically, in sample 11 (FIG. 10), the diameter of the second through hole 12a was the largest, sufficiently larger than the maximum diameter of the inclined portion 11b. In sample 12 (FIG. 11), the diameter of the second through hole 12a was slightly smaller than the maximum diameter of the inclined portion 11b but sufficiently larger than the minimum diameter of the inclined portion 11b. Specifically, in sample 12 (FIG. 11), the diameter of the second through hole 12a was 5 mm. In sample 13 (FIG. 12), the diameter of the second through hole 12a was approximately the same as the minimum diameter of the inclined portion 11b. Specifically, in sample 13 (FIG. 12), the diameter of the second through hole 12a was 2 mm. That is, Fig. 11 is considered to be similar to Fig. 5 or Fig. 6, and Fig. 12 is considered to be similar to Fig. 7. Fig. 10 is not similar to any of Figs.
[0082] <Film formation process> Using the above-mentioned Samples 11 to 13, a film was formed on the surface of a substrate by cold spraying. The film-forming raw material was aluminum powder. The aluminum powder was spherical and had a diameter of 10 μm. The material of the substrate 20 was stainless steel (SUS304). The shape and size of the substrate 20 were the same as in Example 1.
[0083] The deposition conditions were dry air as the working gas, with a working gas temperature of 270°C, a flow rate of 400 liters / minute, and a pressure of approximately 0.7 MPa. The nozzle width was 5 mm. The sweep speed was 5 mm / second. The size of the deposition area was 5 mm wide x 30 mm long. For each sample, an area was formed in the deposition area where the deposition raw material was sprayed only once.
[0084] After forming a film on the substrate surface using each of samples 11 to 13 under the above conditions, the weight (amount of film deposition) of the film-forming raw material adhered to the surface of the inner wall of the inclined portion 11b of the main body 11 of each of samples 11 to 13 was measured and observed.
[0085] <Result> Amount of adhesion on the inner wall of the inclined portion 11b of each sample: FIG. 13 is a photograph of the deposition of the film-forming raw material on the inner wall of the inclined portion formed in the main body of Sample 11 of Example 3, viewed from above. FIG. 14 is a photograph of the deposition of the film-forming raw material on the inner wall of the inclined portion formed in the main body of Sample 12 of Example 3, viewed from above. FIG. 15 is a photograph of the deposition of the film-forming raw material on the inner wall of the inclined portion formed in the main body of Sample 13 of Example 3, viewed from above. Referring to FIGS. 13 to 15, the deposition amount of Sample 11 was 80 mg. In contrast, no deposition occurred in Samples 12 and 13. This demonstrates that the deposition amount of the film-forming raw material is reduced in the mask jig according to the present disclosure (particularly those having through-holes with dimensions as shown in FIGS. 5 and 7).
[0086] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive. Unless there is a contradiction, at least two of the embodiments disclosed herein may be combined. The basic scope of the present disclosure is defined by the claims, not the above description, and is intended to include all modifications within the meaning and scope of the claims. [Explanation of symbols]
[0087] 1 mask jig, 2 spray gun, 2a spray gun main body, 2b nozzle, 2c heater, 3 powder supply section, 4 gas supply section, 5, 6 piping, 7 valve, 8 pressure sensor, 9 temperature sensor, 10 powder, 11 main body, 11a columnar section, 11as first central axis, 11b, 11b1, 11b2, 12a1, 12a2 inclined section, 11c first through hole, 11s1 first surface, 11s2 second surface, 12 mask cover, 12a second through hole, 12as second central axis, 12R curved surface, 12s1 third surface, 12s2 fourth surface, 13 screw hole, 20 substrate, 21 base jig, 22 groove section, 100 film formation device.
Claims
1. A mask jig used in a thermal spraying method, a main body portion including a first surface and a second surface located opposite the first surface; a mask cover disposed on the second surface side of the main body portion so as to overlap the main body portion, the mask cover including a third surface and a fourth surface located on the opposite side to the third surface; the mask cover is formed of an imide-based resin, a first through hole extending from the first surface to the second surface is formed in the main body; an inner wall of the first through hole includes an inclined portion extending in a direction inclined with respect to a direction perpendicular to the first surface and the second surface; the inclined portion is formed only in a central portion in a direction connecting the first surface and the second surface without contacting either the first surface or the second surface, the first through hole has a first columnar portion formed on the first surface side of the inclined portion and reaching the first surface, and a second columnar portion formed on the second surface side of the inclined portion and reaching the second surface, The mask jig, wherein inner walls of the first columnar section and the second columnar section extend in a direction perpendicular to the first surface and the second surface.
2. a second through-hole extending from the third surface to the fourth surface is formed in the mask cover; The mask jig according to claim 1 , wherein the diameter of the second through hole is equal to or larger than the diameter of the first through hole.
3. The mask jig according to claim 2 , wherein the diameter of the second through hole is larger than the diameter of the first through hole.
4. a second through-hole extending from the third surface to the fourth surface is formed in the mask cover; The mask jig according to claim 1 , wherein a diameter of the second through hole is equal to or larger than a minimum diameter of the first through hole and is equal to or smaller than a maximum diameter of the first through hole.
5. The mask jig according to claim 4 , wherein the minimum angle formed between the inner wall of the inclined portion and the first and second surfaces is equal to or greater than 30° and equal to or less than 60°.
6. The mask jig according to any one of claims 1 to 5, wherein the thickness of the mask cover is 0.5 mm or more and 2.0 mm or less.
7. a step of placing the mask jig according to claim 1 so as to face a surface of a substrate, In the placing step, the mask jig is placed so that the first surface of the mask jig faces the front surface of the base material, and further A film forming method comprising a step of spraying a powder serving as a film forming raw material onto the surface of the substrate by a cold spray method through the first through hole and the second through hole of the mask jig.
8. a spray gun including a nozzle; a powder supply unit that supplies powder as a film-forming raw material to the spray gun; a gas supply unit that supplies operating gas to the spray gun; A film forming apparatus comprising: the mask jig according to claim 1, which is disposed between a substrate and the spray gun.
Citation Information
Patent Citations
Forming method of non-evaporation type getter, image forming device using same non-evaporation type getter, and its manufacture
JP2000231880A
Metal mask
JP2002361135A
Deposition mask and manufacturing method of organic el display using it
JP2007234248A
Method for manufacturing heat transfer member, power module, inverter for vehicle, and vehicle
JP2009001873A
Spray nozzle, film formation apparatus, and film formation method
JP2017170369A