Electrostatic chuck seasoning system and method using dielectric seasoning film

Abstract

A semiconductor processing system and method are described that include flowing a deposition precursor into a substrate processing region of a semiconductor processing chamber, the substrate processing region including an electrostatic chuck. The method can further include depositing a seasoning layer on the electrostatic chuck from the deposition precursor to form a seasoned electrostatic chuck. The seasoning layer can be characterized by a dielectric constant of about 3.5 or greater. The method can further include applying a voltage of about 500 V or greater to the seasoned electrostatic chuck. The seasoned electrostatic chuck can be characterized by a leakage current of about 25 mA or less when the voltage is applied.

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims the benefit of and priority to U.S. patent application Ser. No. 17 / 073,071, filed October 16, 2020, entitled "SYSTEMS AND METHODS OF SEASONING ELECTROSTATIC CHUCKS WITH DIELECTRIC SEASONING FILMS," the entire contents of which are incorporated herein by reference.

[0002] Technical Field

[0002] The present technology relates to components and apparatus for semiconductor manufacturing. More particularly, the present technology relates to substrate support assembly components and other semiconductor processing equipment. [Background technology]

[0003] background

[0003] Integrated circuits are made possible by processes that create intricately patterned layers of material on a substrate surface. Fabricating patterned materials on a substrate requires controlled methods for forming and removing material. The process of fabricating integrated circuits can involve depositing many layers on a substrate wafer. In some cases, the cumulative stresses created by the increasing number of layers can create enough stress to cause the substrate wafer to warp during fabrication. Wafer bowing can have many adverse effects on circuit fabrication, including the formation of layers of uneven thickness across the wafer surface.

[0004]

[0004] As the number of layers formed on a wafer substrate continues to increase, the amount of stress placed on the wafer continues to increase, resulting in more pronounced wafer bow during manufacturing. Therefore, there is a need for improved systems and methods that can be used to manufacture high quality devices and structures with reduced substrate wafer bow. These and other needs are addressed by current technology. Summary of the Invention

[0005]

[0005] Embodiments of the present technology include systems and methods for seasoning an electrostatic chuck using a dielectric seasoning film that enables the chuck to retain a large amount of electrostatic charge with a small amount of charge leakage. The seasoning film may include a dielectric material characterized by a dielectric constant (κ value) of about 3.5 or greater. The seasoning film may be deposited on exposed surfaces of the electrostatic chuck, as well as other exposed surfaces of the substrate support assembly and the interior walls of a semiconductor processing chamber. The electrically insulating seasoning film allows high voltages to be applied to the electrostatic chuck with low levels of leakage current.

[0006]

[0006] Embodiments of the present technology include a semiconductor processing method including flowing a deposition precursor into a semiconductor processing chamber. The processing chamber can include a substrate processing region including an electrostatic chuck. The method can further include depositing a seasoning layer on the electrostatic chuck from the deposition precursor to form a seasoned electrostatic chuck. The seasoning layer can be characterized by a dielectric constant of about 3.5 or greater. The method can further include applying a voltage of about 500 V or greater to the seasoned electrostatic chuck. The seasoned electrostatic chuck can be characterized by a leakage current of about 25 mA or less when the voltage is applied.

[0007] In additional embodiments, the deposition precursors forming the seasoning layer can include a silicon-containing precursor. In further embodiments, the deposition precursors can also include molecular oxygen (O2). In some embodiments, the seasoning layer formed from the deposition precursors can include undoped silicon oxide. In embodiments, the seasoning layer can be characterized by a thickness of about 500 Å or greater. In additional embodiments, the seasoning layer can include a bilayer of silicon oxide and undoped polysilicon. In embodiments, the seasoning layer can be characterized by a thickness of about 300 Å or less. In yet another embodiment, the seasoning layer can be characterized by about 1 atomic % carbon or less.

[0008]

[0008] Embodiments of the present technology also include a processing method that includes contacting a semiconductor wafer with an electrostatic chuck. The electrostatic chuck can be positioned in a substrate processing region of a semiconductor processing chamber. The chuck can be seasoned with a seasoning layer characterized by a dielectric constant of about 3.5 or greater. The method can further include applying a clamping voltage of about 500 V or greater to the seasoned electrostatic chuck to chuck the semiconductor wafer. When the clamping voltage is applied, the electrostatic chuck can be characterized by a leakage current of about 25 mA or less. The method can also include depositing three or more layers on the chucked semiconductor wafer. In embodiments, the deposition of the layers can induce stresses of about 500 MPa or greater in the wafer.

[0009] In an additional embodiment, the chucked wafer is characterized by a bow of about 100 μm or less after layer deposition. In a further embodiment, the chucked wafer can be characterized by a deviation from the average thickness of about 2% or less after layer deposition. In yet another embodiment, the number of layers deposited can be at least 50 pairs of layers, each pair of layers including a dielectric layer and a semiconductor layer. In yet another embodiment, the seasoning layer can include undoped silicon oxide and can be characterized by about 1 atomic % or less of carbon.

[0010]

[0010] Embodiments of the present technology may further include a substrate support assembly. The assembly may include an electrostatic chuck body defining the substrate support assembly. The electrostatic chuck body may be seasoned with a seasoning layer characterized by a dielectric constant of about 3.5 or greater. The substrate support assembly may further include a support stem coupled to the electrostatic chuck body and an electrode embedded within the electrostatic chuck body between the substrate support surface and the support stem. The substrate support assembly may be characterized by a leakage current through the electrostatic chuck body of about 25 mA or less at a clamping voltage of about 500 V or greater.

[0011] In additional embodiments, the seasoning layer may comprise undoped silicon oxide and may be characterized by a thickness of about 500 Å or greater. In further embodiments, the electrostatic chuck body may have a thickness of about 1×10 9 The electrostatic chuck body may include a ceramic material characterized by a volume resistivity of Ω-cm or greater. In yet another embodiment, the substrate support assembly may include a heater embedded within the electrostatic chuck body.

[0012] Such techniques may offer many advantages over conventional systems and techniques. For example, embodiments of the present technique may provide a substrate support with increased electrostatic chucking force, which counteracts the tendency of a wafer to bow under stresses caused by the deposition of multiple layers on the wafer. Furthermore, the voltage chucking window may be increased by reducing leakage current compared to conventional techniques. These and other embodiments, along with many of their advantages and features, are described in more detail in conjunction with the following description and accompanying figures.

[0013] A further understanding of the nature and advantages of the disclosed technology may be realized by reference to the remaining portions of the specification and drawings. [Brief explanation of the drawings]

[0014] [Figure 1] 1 illustrates a plan view of an exemplary processing system in accordance with some embodiments of the present technique. [Figure 2]

[0015] 1 shows a schematic cross-sectional view of an exemplary plasma system in accordance with some embodiments of the present technique; [Figure 3]

[0016] 1 shows a schematic partial cross-sectional view of an exemplary substrate support assembly, in accordance with some embodiments of the present technique; [Figure 4]

[0017] 1 shows a schematic partial cross-sectional view of an exemplary substrate support assembly, in accordance with some embodiments of the present technique; [Figure 5]

[0018] 1A-1C illustrate selected operations in a processing method according to an embodiment of the present technology. DETAILED DESCRIPTION OF THE INVENTION

[0015]

[0019] Some of the figures are included as circuit diagrams. It should be understood that these figures are for illustrative purposes and should not be considered to scale unless specifically stated to be to scale. Furthermore, as schematic diagrams, the figures are provided to aid in understanding and may not include all aspects or information compared to realistic representations and may include exaggerated material for illustrative purposes.

[0016]

[0020] In the accompanying figures, similar components and / or features may have the same reference label. Furthermore, various components of the same type may be distinguished by tracing the reference numerals with a letter that distinguishes between the similar components. When only a first reference numeral is used herein, the description is applicable to any one of the similar components having the same first reference numeral, regardless of the letter.

[0017]

[0021] Plasma-enhanced deposition processes can energize one or more constituent precursors to facilitate film formation on a substrate. These formed films can be produced under conditions that induce stress in the substrate. For example, in the development of dielectric layers for vertical memory applications, such as oxide-nitride (ON) or oxide-polysilicon (OP) stacks, many layers of material can be deposited on the substrate. These formed films can be characterized by internal stresses acting on the substrate. This can cause the substrate to warp during processing, resulting in poor formation uniformity and potentially causing device damage or malfunction.

[0018]

[0022] Electrostatic chucks can be used to generate a clamping action on a substrate to overcome warping stresses. However, as the number of layers in these device stacks increases, the stresses acting on the substrate increase, which may require a proportional increase in chucking voltage. Increasing the chucking voltage (also called clamping voltage) can increase the leakage current level of the electrostatic chuck. Increased leakage current reduces the chuck's ability to maintain the high electrostatic attractive force required to offset the forces that cause the wafer substrate to warp. If the leakage current becomes too large, the electrostatic chuck will no longer be able to generate a sufficiently high electrostatic force to prevent the wafer substrate from warping during multilayer film deposition.

[0019]

[0023] One of the causes of increased leakage current with increasing chucking voltage is the conductivity of the seasoning film covering the exposed surface of the electrostatic chuck. Conventional seasoning films include a bilayer of silicon oxide and doped polysilicon deposited on the surface of the chuck. The doped polysilicon layer, in particular, is highly conductive and can act as a conduit for electrical current buildup on the chuck as the chucking voltage increases. As the chucking voltage increases, leakage current across the conductive doped polysilicon layer also increases. These issues have limited conventional techniques to a narrow chucking window that cannot accommodate increased layer scaling during deposition.

[0020]

[0024] The present technology overcomes these challenges with a substrate support assembly having specific materials and configurations that exhibit particular electrical properties that can produce reduced leakage current over prior art, particularly at increased chucking voltages. Additionally, the assembly may include a seasoning layer deposited on the surface of the electrostatic chuck body, which electrically insulates the chuck, allowing for increased electrostatic charge buildup with increasing levels of applied chucking voltage, while also reducing the level of leakage current.

[0021]

[0025] While the remainder of the disclosure routinely identifies a particular deposition process utilizing the disclosed technology, it will be readily understood that the systems and methods are equally applicable to other deposition and cleaning chambers and processes that may occur in the described chambers. Thus, the technology should not be considered limited for use with only these particular deposition processes or chambers. This disclosure discusses one possible system and chamber that may include a pedestal according to embodiments of the present technology, before describing additional modifications and adjustments to this system according to embodiments of the present technology.

[0022]

[0026] FIG. 1 illustrates a top view of one embodiment of a deposition, etch, bake, and cure chamber processing system 100, according to an embodiment. In the figure, a pair of front-opening integrated pods 102 deliver substrates of various sizes that are received by a robotic arm 104, placed in one of the substrate processing chambers 108a-f, and placed in a low-pressure holding area 106 before being positioned in tandem sections 109a-c. A second robotic arm 110 can be used to transfer substrate wafers from the holding area 106 to and from the substrate processing chambers 108a-f. Each substrate processing chamber 108a-f can be equipped to perform multiple substrate processing operations, including plasma-enhanced chemical vapor deposition, atomic layer deposition, physical vapor deposition, etching, pre-cleaning, degassing, alignment, and other substrate processes, including annealing, ashing, and the like.

[0023]

[0027] The substrate processing chambers 108a-f can include one or more system components for depositing, annealing, curing, and / or etching a dielectric or other film on a substrate. In one configuration, two pairs of processing chambers, e.g., 108c-d and 108e-f, can be used to deposit a dielectric material on a substrate, and a third pair of processing chambers, e.g., 108a-b, can be used to etch the deposited dielectric. In another configuration, all three pairs of chambers, e.g., 108a-f, can be configured to deposit a stack of alternating dielectric films on a substrate. Any one or more of the described processes can be performed in chambers separate from the fabrication system shown in different embodiments. It should be understood that additional configurations of deposition, etching, annealing, and curing chambers for dielectric films are contemplated by system 100.

[0024]

[0028] 2 shows a schematic cross-sectional view of an exemplary plasma system 200 in accordance with some embodiments of the present technique. The plasma system 200 may be adapted to one or more of the tandem sections 109 described above and may represent a pair of processing chambers 108 that may include a substrate support assembly in accordance with embodiments of the present technique. The plasma system 200 may generally include a chamber body 202 having a sidewall 212, a bottom wall 216, and an interior sidewall 201 that define a pair of processing regions 220A and 220B. Each of the processing regions 220A-220B may be similarly configured and may include identical components.

[0025]

[0029] For example, processing region 220B, whose components may be included in processing region 220A, may include a pedestal 228 disposed in the processing region through a passageway 222 formed in the bottom wall 216 of the plasma system 200. The pedestal 228 may provide a heater adapted to support a substrate 229 on an exposed surface of the pedestal, such as a body portion. The pedestal 228 may include a heating element 232, such as a resistive heating element, that may heat and control the substrate temperature at a desired processing temperature. The pedestal 228 may also be heated by a remote heating element, such as a lamp assembly, or any other heating device.

[0026]

[0030] The body of the pedestal 228 can be coupled to the stem 226 by a flange 233. The stem 226 can electrically couple the pedestal 228 to a power outlet or power box 203. The power box 203 can include a drive system that controls the elevation and movement of the pedestal 228 within the processing region 220B. The stem 226 can also include a power interface for supplying power to the pedestal 228. The power box 203 can also include an interface for power and temperature indicators, such as a thermocouple interface. The stem 226 can include a base assembly 238 adapted to removably couple to the power box 203. A circumferential ring 235 is shown on the power box 203. In some embodiments, the circumferential ring 235 can be a shoulder adapted as a mechanical stop or land configured to provide a mechanical interface between the base assembly 238 and the top surface of the power box 203.

[0027]

[0031] The rod 230 may be contained through a passage 224 formed in the bottom wall 216 of the processing region 220B and may also be utilized to position substrate lift pins 261 disposed through the body of the pedestal 228. The substrate lift pins 261 may selectively move the substrate 229 away from the pedestal to facilitate exchange of the substrate 229 with a robot utilized to move the substrate 229 into and out of the processing region 220B through the substrate transfer port 260.

[0028]

[0032] A chamber lid 204 may be coupled to the top of the chamber body 202. The lid 204 may house one or more precursor delivery systems 208 coupled thereto. The precursor delivery system 208 may include a precursor inlet passage 240 that may deliver reactant and cleaning precursors into the processing region 220B via a dual channel showerhead 218. The dual channel showerhead 218 may include an annular base plate 248 having a blocker plate 244 disposed intermediate a faceplate 246. A radio frequency (“RF”) source 265 may be coupled to the dual channel showerhead 218, which may provide power to the dual channel showerhead 218 to facilitate generation of a plasma region between the faceplate 246 and the pedestal 228 of the dual channel showerhead 218. In some embodiments, the RF source may be coupled to other portions of the chamber body 202, such as the pedestal 228, to facilitate plasma generation. A dielectric isolator 258 can be disposed between the lid 204 and the dual channel showerhead 218 to prevent RF power from being conducted to the lid 204. A shadow ring 206 can be disposed around the pedestal 228 to engage the pedestal 228.

[0029]

[0033] Optional cooling channels 247 can be formed in the annular base plate 248 of the precursor delivery system 208 to cool the annular base plate 248 during operation. A heat transfer fluid, such as water, ethylene glycol, or gas, can be circulated through the cooling channels 247 to maintain the base plate 248 at a predetermined temperature. A liner assembly 227 can be positioned within the processing region 220B in close proximity to the sidewalls 201, 212 of the chamber body 202 to prevent exposure of the sidewalls 201, 212 to the processing environment within the processing region 220B. The liner assembly 227 can include a circumferential pumping cavity 225 that can be coupled to a pumping system 264 configured to evacuate gases and byproducts from the processing region 220B and control the pressure within the processing region 220B. A plurality of exhaust ports 231 can be formed on the liner assembly 227. The exhaust ports 231 can be configured to allow gas flow from the processing region 220B to the circumferential pumping cavity 225 in a manner that facilitates processing within the system 200.

[0030]

[0034] 3 shows a schematic partial cross-sectional view of an exemplary semiconductor processing chamber 300 in accordance with some embodiments of the present technique. FIG. 3 may include one or more components discussed above with respect to FIG. 2 and may show additional details related to the chamber. Chamber 300 can be used to perform semiconductor processing operations, including deposition of a stack of dielectric materials, as previously described. Chamber 300 may show a partial view of a processing region of a semiconductor processing system, but may not include all components, such as the additional lid stack components previously described, which are understood to be incorporated into some embodiments of chamber 300.

[0031]

[0035] As mentioned above, FIG. 3 may depict a portion of a processing chamber 300. The chamber 300 may include a showerhead 305 and a substrate support assembly 310. The showerhead 305 and substrate support 310, together with chamber sidewalls 315, may define a substrate processing region 320 in which plasma may be generated. The substrate support assembly may include an electrostatic chuck body 325, which may include one or more components embedded or disposed within the body. Components embedded within the top pack may not be exposed to the processing material in some embodiments and may be retained entirely within the chuck body 325. The electrostatic chuck body 325 may define a substrate support surface 327 and may be characterized by a thickness and a length or diameter, depending on the particular shape of the chuck body. In some embodiments, the chuck body may be elliptical and characterized by one or more radial dimensions from a central axis through the chuck body. It should be understood that the top pack may be any shape, and when radial dimensions are discussed, they may define any length from a central location of the chuck body.

[0032]

[0036] In an embodiment, a seasoning layer (not shown) may be formed on an exposed surface of the substrate support assembly 310. In a further embodiment, the seasoning layer may be formed on a surface of the substrate support surface 327 exposed to the substrate processing region. The seasoning layer may increase the electrical resistance between a semiconductor wafer disposed on the substrate support assembly 310 and the underlying electrostatic chuck body 325. In an embodiment, the seasoning layer may include a dielectric layer having a dielectric constant of about 3.5 or greater. In a further embodiment, the seasoning layer may include a silicon oxide layer. In yet an additional embodiment, the seasoning layer may be a bilayer of silicon oxide and undoped polysilicon.

[0033]

[0037] The electrostatic chuck body 325 can be coupled to a stem 330, which can support the chuck body and can include channels, described below, for receiving and transmitting electrical and / or fluid lines that can be coupled to the internal components of the chuck body 325. While the chuck body 325 can include associated channels or components for operating as an electrostatic chuck, in some embodiments, the assembly can operate or include components as a vacuum chuck or any other type of chucking system. The stem 330 can be coupled to the chuck body at a second surface of the chuck body opposite the substrate support surface. The electrostatic chuck body 325 can include an electrode 335, which can be a DC electrode, embedded within the chuck body proximate the substrate support surface. The electrode 335 can be electrically coupled to a power source 340. The power source 340 can be configured to provide energy or voltage to the conductive chuck electrode 335, which can be operated to form a plasma of a precursor within the processing region 310 of the semiconductor processing chamber 300, although other plasma operations can be maintained as well. For example, the electrode 335 can also be a chucking mesh that acts as an electrical ground for a capacitive plasma system that includes an RF source 307 electrically coupled to the showerhead 305. For example, the electrode 335 can act as a ground path for RF power from the RF source 307 while also acting as an electrical bias to the substrate to provide electrostatic clamping of the substrate to the substrate support surface. The power supply 340 can include filters, power sources, and several other electrical components configured to provide a chucking voltage.

[0034]

[0038] During operation, a substrate can be brought into at least partial contact with the substrate support surface of the electrostatic chuck body, which can create a contact gap that essentially creates a capacitive effect between the surface of the pedestal and the substrate. When a voltage is applied to the contact gap, an electrostatic force for chucking can be generated. The power supply 340 can provide charge that migrates from the electrode to the substrate support surface, where it can accumulate and create a charge layer with an opposite charge and Coulombic attraction to the substrate, electrostatically holding the substrate against the substrate support surface of the chuck body. This charge transfer can occur due to current flowing through the dielectric of the chuck body based on the finite resistance in the dielectric of a Johnsen-Rahbek type chucking, which can be used in some embodiments of the present technology.

[0035]

[0039] The chuck body 325 can also define a recessed region 345 in the substrate support surface, which can provide a recessed pocket in which a substrate can be placed. The recessed region 345 can be formed in an interior region of the top puck and configured to receive a substrate for processing. The recessed region 345 can surround a central region of the electrostatic chuck body as shown and can be sized to accommodate any of a variety of substrate sizes. The substrate can be seated within the recessed region and accommodated by an outer region 347, which can surround the substrate. In some embodiments, the height of the outer region 347 can be such that the substrate is at the same height as or lower than the surface height of the substrate support surface in the outer region 347. The recessed surface can control edge effects during processing, which in some embodiments can improve deposition uniformity across the substrate. In some embodiments, an edge ring can be disposed around the periphery of the top puck and can at least partially define a recess in which the substrate can be seated. In some embodiments, the surface of the chuck body can be substantially flat, and the edge ring can completely define the recess in which the substrate is seated.

[0036]

[0040] In some embodiments, the electrostatic chuck body 325 and / or stem 330 may be made of insulating or dielectric materials. For example, oxides, nitrides, carbides, and other materials may be used to form the components. Exemplary materials may include ceramics including aluminum oxide, aluminum nitride, silicon carbide, tungsten carbide, and any other metal or transition metal oxide, nitride, carbide, boride, or titanate, as well as combinations of these materials with other insulating or dielectric materials. Different grades of ceramic materials may be used to provide composite materials configured to operate over specific temperature ranges; therefore, in some embodiments, different ceramic grades of similar materials may be used for the top pack and stem. As described further below, dopants may be incorporated in some embodiments to tailor electrical properties. Exemplary dopant materials may include yttrium, magnesium, silicon, iron, calcium, chromium, sodium, nickel, copper, zinc, or any number of other elements known to be incorporated into ceramic or dielectric materials.

[0037]

[0041] The electrostatic chuck body 325 may also include an embedded heater 350 contained within the chuck body. The heater 350 may, in embodiments, include a resistive heater or a fluid heater. In some embodiments, the electrode 335 may operate as a heater, but separating these operations allows for more individual control and may increase the heater's coverage area while limiting the area of ​​plasma formation. The heater 350 may be bonded to the chuck body material or may include a polymer heater bonded thereto, but a conductive element may be embedded within the electrostatic chuck body and configured to receive an electric current, such as an AC current, to heat the top pack. The electric current may be supplied through the stem 330 via a channel similar to the DC power described above. The heater 350 may be coupled to a power source 365, which may supply an electric current to a resistive heating element to facilitate heating of the associated chuck body and / or substrate. The heater 350 may, in embodiments, include multiple heaters, each associated with a zone of the chuck body, such that an exemplary chuck body may include an equal or greater number of zones than heaters. In some embodiments, as described further below, a chucking mesh electrode 335 may be positioned between the heater 350 and the substrate support surface 327 to maintain a distance between the electrode in the chuck body and the substrate support surface.

[0038]

[0042] The heater 350 may be capable of regulating the temperature of the electrostatic chuck body 325 as well as the entire substrate residing on the substrate support surface 327. The heater may have a range of operating temperatures to heat the chuck body and / or substrate to about 100° C. or higher, and the heater may be configured to heat to about 125° C. or higher, about 150° C. or higher, about 175° C. or higher, about 200° C. or higher, about 250° C. or higher, about 300° C. or higher, about 350° C. or higher, about 400° C. or higher, about 450° C. or higher, about 500° C. or higher, about 550° C. or higher, about 600° C. or higher, about 650° C. or higher, about 700° C. or higher, about 750° C. or higher, about 800° C. or higher, about 850° C. or higher, about 900° C. or higher, about 950° C. or higher, about 1,000° C. or higher, or higher. The heater may also be configured to operate in any range included between any two of these recited numbers, or in a smaller range included in any of these ranges. In some embodiments, as further described below, the chucking heater can be operated to maintain a substrate temperature above at least 500° C. during deposition operations, such as forming stacks of materials for memory devices as described above.

[0039]

[0043] 1 illustrates a schematic partial cross-sectional view of an exemplary substrate support assembly 400 in accordance with some embodiments of the present technique. The substrate support assembly 400 may include any of the materials or components described above, and may illustrate additional details of the substrate support assemblies described above. As illustrated, an electrostatic chuck body 405 may include an embedded electrode 410 and an embedded heater 415, as described above. A substrate support surface 406 may be defined by the chuck body and may be configured to support a semiconductor substrate 430. The substrate support surface may define a recessed pocket 408 within the substrate support surface. A recessed ledge 420 may also be defined in the substrate support surface. The recessed ledge may extend radially inward from a radially outer end of the recessed pocket.

[0040]

[0044] As described above, in embodiments, a power supply may be provided for each of the heater 415 and the electrode 410, and any number of power supplies may be provided. For example, the power supply for the electrode may be a DC power supply or any other power supply, and may provide a voltage range configured to chuck the substrate to the substrate support surface 406. For example, a relatively higher power supply may be used in systems according to some embodiments of the present technique to facilitate chucking of substrates with thicker deposition layers, which may be characterized by greater stresses that contribute to bowing. As one non-limiting example, in the case of an ON or OP stack, as the number of layer pairs increases, forces acting on the substrate may increase. Higher temperatures may contribute to these forces, further increasing the amount of bowing and making the ability to properly chuck the substrate to the support assembly challenging. In embodiments, the substrate may be characterized by a bow of about 100 μm or more, about 200 μm or more, about 300 μm or more, about 400 μm or more, about 500 μm or more, about 600 μm or more, about 700 μm or more, about 800 μm or more, about 900 μm or more, about 1000 μm or more, or more.

[0041]

[0045] To compensate for these forces, increased chucking voltages can be used to maintain a substantially flat substrate surface, although some bowing may still occur. As the number of pairs of these layers continues to increase, the minimum voltage to maintain chucking may also continue to increase. As a result, in some embodiments, the minimum chucking voltage is −250 V or greater, and depending on the stress and the number of pairs being compensated, the minimum chucking voltage can be about −300 V or greater, about −350 V or greater, about −400 V or greater, about −450 V or greater, about −500 V or greater, about −550 V or greater, about −600 V or greater, about −650 V or greater, about −700 V or greater, about −750 V or greater, about −800 V or greater, about −850 V or greater, about −900 V or greater, about −950 V or greater, about −1000 V or greater, or greater.

[0042]

[0046] However, as mentioned above, these deposition operations can be performed at high temperatures, which can directly affect the resistivity of the chuck body material and its ability to properly function as a JR chuck. For example, the electrostatic chuck body 405 may be made of aluminum nitride, which can be characterized by its bulk resistance at a specific temperature. As the temperature of the material increases, its resistance decreases, and at temperatures above 500°C, for example, the resistance may decrease significantly. This decrease in resistance increases the likelihood of electrostatic discharge or arcing. Furthermore, to limit substantial bowing of the substrate that may occur during these depositions, increased voltages can be used to maintain chucking. However, this increased voltage can also increase the likelihood of arcing near the ledge 420 region, limiting the amount of voltage that can be applied for chucking and the ability to counter bowing. This has traditionally resulted in damage and reduced production quality.

[0043]

[0047] However, the present technology utilizes materials and configurations that can facilitate an increased voltage window without arcing compared to conventional techniques. For example, conventional techniques can experience arcing at clamping voltages of about −300 V or greater, even exceeding about −350 V. This voltage may be insufficient to compensate for film stresses that arise during the deposition of multilayer stacks, such as ON depositions involving tens or hundreds of layers of material. The present technology can facilitate chucking at voltages including between about −500 V and about −1000 V, and between about −600 V and about −800 V, potentially addressing the stresses associated with more deposition layers while limiting arcing from the pedestal.

[0044]

[0048] The present technology also includes embodiments that utilize a seasoning layer that further increases the electrical resistivity between the electrostatic chuck body 405 and the substrate 430. The increased electrical resistivity provided by the seasoning layer further limits arcing from the pedestal at higher chucking voltages and higher operating temperatures. Additionally, the seasoning layer reduces leakage current from the electrostatic chuck material at higher chucking voltages and higher operating temperatures.

[0045]

[0049] In JR chucking, chucking force typically increases to a saturation level as temperature increases due to resistance changes within the pedestal material, which facilitates charge migration to the surface of the chuck body. However, this has traditionally led to arcing around the substrate when the chucking voltage is increased to a level corresponding to increased substrate bow. This technology remedies these shortcomings and provides a seasoning layer-coated assembly capable of operating at increased chucking voltages to compensate for increased substrate stress by reducing leakage current within the substrate support assembly. Leakage current is an indicator of migration within the substrate support material and can be measured from leakage emanating from the electrodes.

[0046]

[0050] While conventional techniques can tolerate leakage currents of approximately 25 mA or more at certain operating temperatures, leakage currents can increase dramatically at operating temperatures above 500°C. Conventional techniques may consider leakage current in terms of insulating layer damage and substrate damage, but allow for relatively large leakage currents to increase chucking force. However, this results in increased arcing in conventional designs. The present technique alters the aspects and characteristics of the substrate support assembly to limit leakage current by effectively increasing the resistivity of the substrate support material to limit leakage current while maintaining chucking force on the substrate. Thus, the present technique produces a substrate support assembly characterized by a resistivity based on leakage current that is maintained within a range that adequately chucks substrates characterized by stresses as described above, while also limiting or preventing arcing due to higher chucking voltages.

[0047]

[0051] Embodiments of the present technology for forming a seasoning layer on an electrostatic chuck body can limit leakage current at chucking voltages of about 400 V or greater, and can limit leakage current at chucking voltages of about 450 V or greater, about 500 V or greater, about 550 V or greater, about 600 V or greater, about 650 V or greater, about 700 V or greater, about 750 V or greater, about 800 V or greater, about 850 V or greater, about 900 V or greater, or greater. The present technology can limit leakage current within these voltage ranges to about 25 mA or less, and can limit leakage current to about 20 mA or less, about 15 mA or less, about 10 mA or less, 5 mA or less, about 4 mA or less, about 3 mA or less, about 2 mA or less, about 1 mA or less, or less. However, in some embodiments, the leakage current can be maintained at about 0.2 mA or greater to ensure adequate movement to facilitate JR chucking, and in some embodiments, the leakage current can be maintained at about 0.3 mA or greater, about 0.5 mA or greater, about 0.7 mA or greater, about 1.0 mA or greater, or more.

[0048]

[0052] Embodiments of the present technology may also limit leakage current at operating temperatures of about 500° C. or greater, and may limit leakage current at temperatures of about 550° C. or greater, about 600° C. or greater, about 650° C. or greater, about 700° C. or greater, about 750° C. or greater, or greater. The above leakage current ranges may apply to substrate support assemblies operating at both the above chucking voltages and operating temperatures.

[0049]

[0053] As discussed above, JR chucking can be based at least in part on the resistance of a contact layer provided between the substrate and the pedestal. The resistance can be adjusted by adjusting the distance of the electrode from the contact surface of the electrostatic chuck body. Based on the temperature increase in some embodiments of the present technology, the chucking force can be substantially maintained or minimally reduced to stay along the relative chucking force plateau. As a result, in some embodiments, the electrode can be recessed further away from the contact surface, which can effectively increase the resistance of the substrate support assembly and reduce leakage currents that can contribute to arcing.

[0050]

[0054] 4, the contact surface can be formed along the outermost surface, e.g., the top surface, of the substrate support assembly within the recessed pocket 408. From this plane, the electrode 410 can be recessed to a certain depth within the substrate support assembly to maintain a minimum distance between the electrode and the substrate support surface. For example, in some embodiments, depending on the characteristics of the substrate support assembly, the electrode 410 can be recessed within the electrostatic chuck body at a distance or depth of about 2 mm or more from the substrate support surface 406, and can be recessed at a distance of about 3 mm or more, about 4 mm or more, about 5 mm or more, about 6 mm or more, about 7 mm or more, about 8 mm or more, about 9 mm or more, about 10 mm or more, about 12 mm or more, about 14 mm or more, about 16 mm or more, about 18 mm or more, about 20 mm or more, or more from the substrate support surface.

[0051]

[0055] The electrostatic chuck body 405 may be or include a material characterized by a particular volume resistivity. As noted above, the chuck body may be or include a ceramic material, such as aluminum nitride, or any of the materials discussed above. In some embodiments, the material may be selected, doped, sintered, or otherwise produced to provide a volume resistivity above a threshold value. For example, in some embodiments, the chuck body may be made of an aluminum nitride material, such as an aluminum nitride material, that has a volume resistivity above about 5×10 at temperatures of about 550° C. or greater, about 600° C. or greater, about 650° C. or greater, or greater.8 The dielectric material may be or include a dielectric material characterized by a volume resistivity of about 1×10 ohm-cm or greater in any of these temperature ranges. 9 Ω-cm or more, approximately 5×10 9 Ω-cm or more, approximately 1×10 10 Ω-cm or more, approximately 3×10 10 Ω-cm or more, approximately 5×10 10 Ω-cm or more, approximately 7×10 10 Ω-cm or more, approximately 1×10 11 Ω-cm or more, approximately 3×10 11 Ω-cm or more, approximately 5×10 11 Ω-cm or more, approximately 7×10 11 Ω-cm or more, approximately 1×10 12 It can be characterized by a volume resistivity of equal to or greater than ohm-cm.

[0052]

[0056] Embodiments of the present technology also include a processing method for forming a seasoning layer on the exposed surfaces of an electrostatic chuck body. The method can be performed in a variety of processing chambers, including the processing system 200 described above, as well as any other chamber in which plasma deposition can be performed. The method can include several optional operations that may or may not be specifically related to some embodiments of the method according to the present technology. One or more operations may be performed before or after the method. For example, a cleaning operation may be performed in a semiconductor processing chamber before a seasoning layer is formed on the exposed surfaces of the electrostatic chuck body and other surfaces within the processing chamber. In some cases, the cleaning operation may include flowing an etchant gas, such as NF3, into the processing chamber to remove material deposited in or on the chamber walls during a previous deposition operation. In a further example, the cleaning operation may leave cleaning residue on one or more exposed surfaces of the chamber walls that are covered with the seasoning layer.

[0053]

[0057] 5 illustrates an embodiment of a processing method 500 that includes flowing deposition precursors for depositing a seasoning layer into a semiconductor processing chamber in operation 505. In an embodiment, the deposition precursors can include one or more silicon-containing precursors, such as silane (SiH). In a further embodiment, the deposition precursors can include one or more silicon-oxygen-containing precursors, such as tetraethylorthosilicate (TEOS). In yet another embodiment, the deposition precursors can further include molecular oxygen (O).

[0054]

[0058] In some embodiments, the deposition precursors flowing into the semiconductor processing chamber can include O and a silicon-containing precursor. In embodiments, the flow ratio of O to silicon-containing precursor can be about 1:1 or greater, about 1.1:1 or greater, about 1.2:1 or greater, about 1.3:1 or greater, about 1.4 or greater, about 1.5:1 or greater, about 1.6:1 or greater, about 1.7:1 or greater, about 1.8:1 or greater, about 1.9:1 or greater, about 2:1 or greater, or greater. In further embodiments, the flow rate of O can be about 300 sccm or greater, about 325 sccm or greater, about 350 sccm or greater, about 375 sccm or greater, about 400 sccm or greater, or greater. In yet other embodiments, the flow rate of the silicon-containing precursor may be about 300 sccm or less, about 275 sccm or less, about 250 sccm or less, about 225 sccm or less, about 200 sccm or less, about 175 sccm or less, about 150 sccm or less, or lower.

[0055]

[0059] In yet another embodiment, the deposition precursors can include one or more carrier gases, such as helium, argon, or nitrogen (N). In embodiments, the carrier gas can be mixed with one or both of the silicon-containing precursor and the oxygen-containing precursor. In further embodiments, the flow rate of the one or more carrier gases can be about 100 sccm or more, about 200 sccm or more, about 300 sccm or more, about 400 sccm or more, about 500 sccm or more, or more.

[0056]

[0060] In further embodiments, the deposition gas can include one or more undoped silicon-containing precursors to deposit a seasoning layer made of undoped polysilicon. In these embodiments, the deposition precursor can include silane. In further embodiments, the silane can continue to flow into the semiconductor processing chamber after deposition of the first portion of the seasoning layer, including silicon oxide. In these embodiments, the flow of oxygen associated with the flow of silane into the chamber is reduced or stopped, so that the deposition precursor has a reduced amount of oxygen or is oxygen-free during deposition of the undoped polysilicon portion of the seasoning layer.

[0057]

[0061] In embodiments, the method 500 may further include depositing a seasoning layer on the exposed surface of the electrostatic chuck in operation 510. In some embodiments, the deposition may include a plasma-enhanced chemical vapor deposition (PECVD) operation to deposit the seasoning layer. In further embodiments, the PECVD operation may include generating a plasma from the deposition precursor and forming the seasoning layer from a plasma effluent of the deposition precursor. In embodiments, the power supplied to the deposition precursor to generate the plasma may be RF power having a frequency of 1 MHz or greater. In further embodiments, the plasma power supplied to the deposition precursor may be about 1000 watts or greater, about 2000 watts or greater, about 3000 watts or greater, about 4000 watts or greater, about 5000 watts or greater, or greater.

[0058]

[0062] In embodiments, depositing the seasoning layer may include heating the electrostatic chuck. In some embodiments, the chuck may be heated to a temperature of about 100° C. or greater, about 150° C. or greater, about 200° C. or greater, about 250° C. or greater, about 300° C. or greater, or greater. In some embodiments, heating the electrostatic chuck improves adhesion between the seasoning film and the underlying chuck material.

[0059]

[0063] In embodiments, deposition of the seasoning layer can occur for about 10 seconds or more, about 15 seconds or more, about 20 seconds or more, about 30 seconds or more, about 45 seconds or more, or more. The deposition time can depend on the thickness of the seasoning layer. In embodiments, the seasoning layer can have a thickness of about 500 Å or more, about 750 Å or more, about 1000 Å or more, about 1250 Å or more, about 1500 Å or more, about 1750 Å, about 2000 Å or more, or more. In yet another embodiment, the deposition layer can be a single layer of material. In yet another embodiment, the deposition layer can be a bilayer of two different materials. In yet additional embodiments, the deposition layer can be a multilayer including three or more different materials.

[0060]

[0064] The deposited seasoning layer provides an electrically insulating layer that limits the amount of leakage current from the electrostatic chuck when a chucking voltage is applied. In embodiments, the deposited seasoning layer has a dielectric constant (κ value) of about 3.5 or greater, about 3.6 or greater, about 3.7 or greater, about 3.8 or greater, about 3.9 or greater, about 4 or greater, or greater. In further embodiments, the deposited seasoning layer can include only undoped material. In yet other embodiments, the deposited seasoning layer can have a carbon level of about 1 atomic % or less, about 0.5 atomic % or less, about 0.01 atomic % or less, about 0.001 atomic % or less, or less. In yet other embodiments, the deposited seasoning layer can be carbon-free.

[0061]

[0065] In an embodiment, the method 500 may further include contacting a substrate wafer with the seasoned electrostatic chuck in operation 515. In a further embodiment, the substrate wafer (i.e., semiconductor substrate) may be placed on a seasoned substrate support surface defined by the electrostatic chuck body. The seasoned substrate support surface includes a seasoning layer between the support surface and the surface of the substrate wafer that is in direct contact with the seasoned electrostatic chuck.

[0062]

[0066] Embodiments of method 500 may further include applying a chucking voltage (i.e., clamping voltage) to the seasoned electrostatic chuck in operation 520. As discussed above, the chucking voltage generates an attractive electrostatic force between the substrate support surface and a surface of the substrate wafer in contact with the support surface. This electrostatic force may maintain the substrate wafer in a substantially planar shape by counteracting stresses on the wafer that cause the wafer to bow. In embodiments, the chucking voltage applied to the seasoned electrostatic chuck can be or exceed -250V, about -300V or greater, -350V or greater, about -400V or greater, about -450V or greater, about -500V or greater, about -550V or greater, about -600V or greater, about -650V or greater, about -700V or greater, about -750V or greater, about -800V or greater, about -850V or greater, about -900V or greater, about -950V or greater, about -1,000V or greater.

[0063]

[0067] The seasoning layer formed on the electrostatic chuck is electrically insulating and reduces leakage current from the chuck at an applied chucking voltage. In embodiments, the leakage current within the above-mentioned chucking voltage ranges may be about 10 mA or less, about 8 mA or less, about 6 mA or less, about 5 mA or less, about 4 mA or less, about 3.5 mA or less, about 3 mA or less, about 2.5 mA or less, about 2 mA or less, or about 1.5 mA or less. As mentioned above, in some embodiments, the leakage current may be maintained at about 0.2 mA or more to ensure adequate movement to facilitate JR chucking, and in some embodiments, a leakage current of about 0.3 mA or more, about 0.5 mA or more, about 0.7 mA or more, about 1.0 mA or more, or more may be maintained.

[0064]

[0068] Embodiments of the present technology provide for the formation of a seasoning layer on an electrostatic chuck that is more electrically insulating than conventional seasoning layers, which often include doped oxide and polysilicon materials. Due to this increased electrical resistance, the seasoning layer of the present invention reduces leakage current from the electrostatic chuck when exposed to high chucking voltages and high temperatures to counteract warping forces caused by depositing multiple layers on a wafer substrate. These properties are becoming increasingly important for seasoning layers deposited on electrostatic chucks that hold wafers that undergo multiple ON and OP depositions to manufacture semiconductor devices, such as 3D-NAND devices.

[0065]

[0069] In the foregoing description, for purposes of explanation, numerous details are set forth in order to provide an understanding of various embodiments of the present technology. However, it will be apparent to one skilled in the art that particular embodiments may be practiced without some of these details, or with additional details.

[0066]

[0070] While several embodiments have been disclosed, those skilled in the art will recognize that various modifications, alternative constructions, and equivalents may be used without departing from the spirit of the embodiments. Moreover, in order to avoid unnecessarily obscuring the technology, some well-known processes and elements have not been described. Therefore, the above description should not be construed as limiting the scope of the technology.

[0067]

[0071] Where a range of values ​​is presented, unless the context clearly dictates otherwise, it is understood that each intervening value between the upper and lower limits of that range is also specifically disclosed, to the smallest unit of the unit of the lower limit. Any narrower range between any stated or unstated intervening value in a stated range, and any other stated or intervening value in that stated range, is also encompassed. The upper and lower limits of these smaller ranges may be individually included or excluded in the range, and each range in which either, neither, or both limits are included in the narrower range is also encompassed within the technology, subject to the specifically excluded limit in the stated range. When a stated range includes one or both of the limits, ranges excluding either or both of the included limits are also included.

[0068]

[0072] As used in this specification and the appended claims, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. Thus, for example, a reference to a "heater" includes a plurality of such heaters, a reference to a "protrusion" includes a reference to one or more protrusions and equivalents thereof known to those skilled in the art, and so forth.

[0069]

[0073] Additionally, the terms "comprise(s)", "comprising", "contain(s)", "containing", "include(s)", and "including", when used in this specification and claims, are intended to specify the presence of stated features, integers, components, or steps, but do not exclude the presence or addition of one or more other features, integers, components, steps, operations, or groups.

Claims

1. A method for manufacturing a semiconductor processing chamber, comprising: flowing a deposition precursor comprising molecular oxygen (O 2 ) at a flow rate of 300 sccm or greater into a substrate processing region including an electrostatic chuck of the semiconductor processing chamber; depositing a seasoning layer characterized by a dielectric constant of 3.5 or greater on the electrostatic chuck from the deposition precursor to form a seasoned electrostatic chuck; applying a voltage of 500 V or greater to the seasoned electrostatic chuck, wherein the seasoned electrostatic chuck is characterized by a leakage current of 25 mA or less when the voltage is applied; A semiconductor processing method comprising:

2. A method for manufacturing a semiconductor processing chamber, comprising: flowing a deposition precursor into a substrate processing region including an electrostatic chuck of the semiconductor processing chamber; depositing a seasoning layer characterized by a dielectric constant of 3.5 or greater and including a bilayer of silicon oxide and undoped polysilicon on the electrostatic chuck from the deposition precursor to form a seasoned electrostatic chuck; applying a voltage of 500 V or greater to the seasoned electrostatic chuck, wherein the seasoned electrostatic chuck is characterized by a leakage current of 25 mA or less when the voltage is applied; A semiconductor processing method comprising:

3. A method for manufacturing a semiconductor processing chamber, comprising: flowing a deposition precursor into a substrate processing region including an electrostatic chuck of the semiconductor processing chamber; depositing a seasoning layer on the electrostatic chuck from the deposition precursor, the seasoning layer comprising a polysilicon layer characterized by a thickness of 300 Å or less and characterized by a dielectric constant of 3.5 or greater to form a seasoned electrostatic chuck; applying a voltage of 500 V or greater to the seasoned electrostatic chuck, wherein the seasoned electrostatic chuck is characterized by a leakage current of 25 mA or less when the voltage is applied; A semiconductor processing method comprising:

4. The semiconductor processing method of claim 1 , wherein the deposition precursor comprises a silicon-containing precursor.

5. The semiconductor processing method of claim 1 , wherein the seasoning layer comprises undoped silicon oxide.

6. 10. The semiconductor processing method of claim 1, wherein the seasoning layer comprises a silicon oxide layer characterized by a thickness of 500 Å or greater.

7. 10. The semiconductor processing method of claim 1, wherein said seasoning layer is characterized by 1 atomic % or less of carbon.

8. A semiconductor processing method described in any one of claims 1 to 3, wherein the seasoned electrostatic chuck is characterized by a leakage current of 10 mA or less when the voltage is applied.

9. A semiconductor processing method described in any one of claims 1 to 3, wherein deposition of the seasoning layer on the electrostatic chuck is carried out for 10 seconds or more.

10. contacting a semiconductor wafer with an electrostatic chuck seasoned with a seasoning layer characterized by a dielectric constant of 3.5 or greater within a substrate processing region of a semiconductor processing chamber; applying a clamping voltage of 500 V or more to the seasoned electrostatic chuck to chuck the semiconductor wafer, the seasoned electrostatic chuck being characterized by a leakage current of 25 mA or less when the clamping voltage is applied; depositing three or more layers on the chucked wafer, wherein deposition of the deposited three or more layers induces a stress of 500 MPa or more in the chucked wafer, and the chucked wafer is characterized by a bow of 100 μm or less after deposition of the three or more layers; A semiconductor processing method comprising:

11. 11. The semiconductor processing method of claim 10, wherein said chucked wafer is characterized by a deviation from an average thickness of no more than 2% after said deposition of said three or more layers.

12. 11. The semiconductor processing method of claim 10, wherein the three or more layers include at least 50 pairs of layers, each pair of layers including a dielectric layer and a semiconductor layer.

13. The semiconductor processing method of claim 10 , wherein the seasoning layer comprises undoped silicon oxide.

14. 11. The semiconductor processing method of claim 10, wherein the seasoning layer is characterized by 1 atomic % or less of carbon.

15. an electrostatic chuck body seasoned with a seasoning layer characterized by a dielectric constant of 3.5 or greater, the seasoning layer being carbon-free and formed from a deposition precursor comprising molecular oxygen, the electrostatic chuck body defining a substrate support assembly; a support stem coupled to the electrostatic chuck body; an electrode embedded within the electrostatic chuck body between a substrate support surface and the support stem; wherein the substrate support assembly is characterized by a leakage current through the electrostatic chuck body of 25 mA or less at a clamping voltage of 500 V or greater.

16. The substrate support assembly of claim 15 , wherein the seasoning layer comprises undoped silicon oxide.

17. The substrate support assembly of claim 15 , wherein the seasoning layer is characterized by a thickness of 500 Å or greater.

18. The substrate support assembly of claim 15 , wherein the electrostatic chuck body comprises a ceramic material.

19. The ceramic material is 1×10 ９ The substrate support assembly of claim 18 characterized by a volume resistivity of Ω-cm or greater.

20. The substrate support assembly of claim 15 , further comprising a heater embedded within the electrostatic chuck body.

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