Apparatus and method for drying and / or purifying a pot-shaped hollow container, particularly a transport container for semiconductor wafers or EUV lithography masks.

Abstract

The invention relates to an apparatus 10 for drying and / or cleaning a pot-shaped hollow body 12, in particular a transport container for semiconductor wafers or for EUV lithography masks, the hollow body 12 having a hollow body wall 14 forming a hollow body inner surface 16 which defines a hollow body interior space 17, and a hollow body opening 18 surrounded by the hollow body wall 14, through which the hollow body interior space 17 is accessible, a first holding means 30 by means of which the apparatus 10 can interact to hold the hollow body wall 14, an exhaust device 60 for applying a vacuum in the hollow body interior space 17 and / or a conveying device 66 for conveying a cleaning fluid through the hollow body interior space 17, and a displacement member 48 which can be or has been introduced into the hollow body interior space 17 through the hollow body opening 18. The invention further relates to a corresponding method for drying and / or cleaning the pot-like hollow body 12.

Description

Technical Field

[0001] The present invention relates to an apparatus and a method for drying and / or purifying a pot-shaped hollow body, which is a transport container for semiconductor wafers or EUV lithography masks in particular.

Background Art

[0002] The manufacture of high-integration semiconductor circuits and other delicate semiconductor components is today carried out in a factory through a number of processing steps for so-called semiconductor wafers. Most of these processing steps are carried out in a clean room, and great effort is made to keep it free of contaminants, particularly particles. When particles come into contact with the semiconductor material of the semiconductor wafer, they can particularly affect the material properties of the semiconductor wafer, and the entire production batch may become defective and unusable and have to be discarded, so such complex processing is required.

[0003] With the increase in the integration density of semiconductor circuits, keeping it clean has become more important, and as the size of the clean room increases, the effort to keep it clean increases exponentially, so semiconductor wafers are not transported "open" from one processing station to the next. Instead, special transport containers (so-called FOUPs (front opening unified pods)) are used. These are understood as box-shaped transport containers into which a number of semiconductor wafers are inserted. The FOUP is generally closed by a removable cover. Without the cover, the FOUP has a pot-shaped basic shape with a rectangular base surface. When the FOUP is closed by the cover, the inserted semiconductor wafers can be transported from one clean room to another in a state protected from the environment. When the FOUP reaches the processing station, it is opened, the semiconductor wafers are taken out and processed there. After the processing is done, the semiconductor wafers are returned to the FOUP and then transported to the next processing station.

[0004] Contamination of semiconductor wafers can result in long production downtime, making it necessary to occasionally purify the FOUP (Fill-in-the-Up Unit) with a purification fluid. The FOUP is particularly contaminated by wear particles from the semiconductor wafers during introduction into and removal from the FOUP.

[0005] The same applies to transport containers for EUV (extreme ultraviolet radiation) lithography masks. EUV lithography masks are used to manufacture very small integrated circuits. Like semiconductors, EUV lithography masks also need to be transported, and similar situations arise. When FOUP is mentioned below, the description from this point of view also applies equally to transport containers for EUV lithography masks.

[0006] Apparatus for purifying FOUP is known, for example, from U.S. Patent No. 5,238,703 (US,A), U.S. Patent Publication No. 2002 / 0046760 (US,A1), U.S. Patent Publication No. 2003 / 0102015 (US,A1), International Publication No. 2005 / 001888 (WO,A2), and European Patent No. 1899084 (EP,B1).

[0007] Such a purification device purifies the FOUP both internally and externally. Generally, the external surface of the FOUP is more contaminated than the internal surface. As a result, the purification fluid accumulates particles from both the external and internal surfaces during the purification process. Therefore, particles can be transported from the external to the internal surface. However, satisfactory purification results are only achieved when the particle count is reduced to a certain value or lower. To allow for sufficient particle removal by particles originating from the external surface, the purification process must be carried out for a correspondingly long duration.

[0008] Once the purification process is complete, a vacuum acting on the exterior and / or interior surfaces may be applied. Applying a sufficiently high vacuum helps remove any residue of the purification fluid remaining on the surfaces of the hollow body and cover as a result of the purification of the hollow body in the purification device. Moisture also diffuses into the microscopic pores on the surfaces of the hollow body and cover by capillary action. This moisture can also be removed by vacuum, and drying is also possible at a microscopic level. However, applying a sufficiently high vacuum is a relatively energy-intensive and cumbersome procedure, making the purification process more expensive and prolonged. [Prior art documents] [Patent Documents]

[0009] [Patent Document 1] U.S. Patent No. 5,238,703 (US,A) [Patent Document 2] U.S. Patent Application Publication No. 2002 / 0046760 (US, A1) [Patent Document 3] U.S. Patent Application Publication No. 2003 / 0102015 (US, A1) [Patent Document 4] International Publication No. 2005 / 001888 (WO, A2) [Patent Document 5] European Patent No. 1899084 (EP, B1) [Overview of the project] [Problems that the invention aims to solve]

[0010] The object of the embodiments of the present invention is to provide an apparatus for drying and / or purifying a pot-shaped hollow body, particularly a transport container for semiconductor wafers or EUV lithography masks, which can address the above-mentioned disadvantages by simple and inexpensive means, and in particular can enable drying that is inexpensive and time-efficient compared to processes known from the prior art. Furthermore, the object of the embodiments of the present invention below is to provide a method for operating such an apparatus.

[0011] This objective is achieved by the features described in claims 1 and 10. Advantageous embodiments are the subject of the dependent claims. [Means for solving the problem]

[0012] An embodiment of the present invention is an apparatus for drying and / or purifying a pot-shaped hollow body, particularly a transport container for semiconductor wafers or EUV lithography masks. - The hollow body includes hollow body walls that form the inner surface of the hollow body, and the inner surface of the hollow body defines the internal space of the hollow body. - A hollow body has a hollow body opening that is surrounded by a hollow body wall, through which the internal space of the hollow body is accessible. The device, - A first retaining means that can interact with the device to hold the hollow body wall, • Exhaust device for applying a vacuum to the internal space of a hollow body, and / or • A conveying device for transporting cleaning fluid through the internal space of a hollow body, - Replacement member that can be introduced into or is introduced into the internal space of the hollow body through the opening of the hollow body and This relates to a device that includes the following features.

[0013] The first holding means contributes to positioning the hollow body within the apparatus while a vacuum is applied through the internal space of the hollow body and / or while a cleaning fluid is being transported. In the simplest case, the first holding means may be a support surface.

[0014] A replacement member can be understood as a member that fills a volume so that a particular fluid cannot or can barely pass through it. The replacement member does not necessarily have to be solid, and may allow a different fluid to pass through it in addition to the particular fluid.

[0015] The replacement member is positioned to protrude into the internal space of the hollow body. The volume in which a vacuum is generated is reduced with the assistance of the replacement member. As a result, the time to reach the desired vacuum is reduced, and the entire drying process, particularly on the inner surface of the hollow body, is accelerated. At the same time, the energy required to apply the desired pressure is reduced.

[0016] The transport of the cleaning fluid may be carried out using the same apparatus, either as an alternative to or cumulatively with the application of vacuum. For example, nitrogen can be used as the cleaning fluid. However, so-called AMC (airborne molecular contamination) is removed by vaporization from the inner surface of the hollow body with the assistance of the cleaning fluid. Such AMC are, among other things, fluorine, metals, and radicals. The use of a displacement member reduces the required volume of cleaning fluid. Furthermore, the flow of the cleaning fluid through the internal space of the hollow body is guided by the displacement member, thereby ensuring that the cleaning fluid can reach hard-to-reach surfaces where dead spots may form. Thus, the vaporization process can be carried out effectively and thoroughly.

[0017] At this point, it must be noted again that the apparatus can be used for both vacuum drying and purification using a cleaning fluid. The apparatus only needs to be connected to a corresponding unit for this purpose, such as an exhaust system or a reservoir for the cleaning fluid. In this regard, the exhaust system may also take on the function of a conveying system, or vice versa, and no different units are required. After the drying process is complete, the purification process can proceed without any actual time loss by using a correspondingly automated valve coupling.

[0018] According to a further embodiment, the replacement member is a through-hole which, when the replacement member is introduced into the internal space of the hollow body, opens into the internal space of the hollow body through which a cleaning fluid can be conveyed into the internal space of the hollow body and / or by which a vacuum can be applied into the internal space of the hollow body. In this embodiment, the valve body also contributes to the supply of the cleaning fluid to the internal hollow space. As a result, a targeted flow of the cleaning fluid in the internal space of the hollow body can be generated in a simple manner, and the purification effect can be improved.

[0019] In a further developed embodiment, the device may have a device wall, the replacement member may be releasably connectable to the device wall, or may be formed by the device wall and a component.

[0020] When the replacement member is releasably connected to the device wall, it can be replaced with another replacement member without great effort in case of damage. Furthermore, it is possible to connect replacement members of different shapes to the device wall. As a result, a given device can be quickly converted for hollow bodies of different shapes, and the flexibility of the device is improved.

[0021] When the replacement member is formed by the device wall and a component, parts can be saved, so that mass production of the device can be simplified. Furthermore, the connection step is omitted.

[0022] In further developed embodiments, the apparatus wall may have a first wall portion and a second wall portion that are releasably connectable to one another and, when connected, enclose the internal space of the apparatus, and the first retaining means includes a retaining surface, the first wall portion forming a retaining surface that at least partially defines the internal space of the apparatus. The retaining surface contributes to the support of the hollow body. Since the retaining surface at least partially defines the internal space of the apparatus, the retaining surface faces into the internal space of the apparatus. Therefore, when the hollow body is placed on the retaining surface, the hollow body is positioned within the internal space of the apparatus. The internal space of the apparatus is a closed space when the first wall portion and the second wall portion are connected to one another. Since the first wall portion and the second wall portion can be separated from each other, the hollow body can be introduced into and removed from the internal space of the apparatus without issue. Here the apparatus wall protects the hollow body from external influences, particularly during drying and purification. Where it is deemed practical, the retaining surface may also be formed by a second wall portion.

[0023] In further embodiments, the hollow body wall may form the outer surface of the hollow body, and the apparatus may have at least one fluid conduction device by which a cleaning fluid can be conducted from the internal space of the hollow body to the external space of the hollow body, and / or by which a vacuum can be applied within the internal space of the hollow body and / or within the internal space of the apparatus.

[0024] As mentioned, semiconductor wafers are placed within a hollow space that is mostly enclosed. Therefore, due to spatial proximity, contaminants on the semiconductor wafer are mainly caused by contaminants originating from the inner surface of the hollow space. Thus, cleaning the inner surface of the hollow space is more important than cleaning the outer surface of the hollow space. However, the outer surface of the hollow space is generally more contaminated than the inner surface. In an open hollow space, particles can move into the internal space of the hollow space and from the internal space onto the semiconductor wafer, so cleaning the external space of the hollow space also contributes to reducing the number of defects in the semiconductor wafer. In this embodiment, it is also possible to dry the outer surface of the hollow space as a result of applying a vacuum and / or clean the outer surface of the hollow space by the corresponding conduction of a cleaning fluid. Both measures contribute to reducing contamination of the outer surface of the hollow space.

[0025] As mentioned, the inner surface of a hollow body is generally less contaminated than its outer surface. In this embodiment, the cleaning fluid is first conducted from the fluid conductor over the inner surface of the hollow body, and then over the outer surface. Thus, the cleaning fluid flows first over the less contaminated surface and then over the more contaminated surface. This prevents the cleaning fluid, which is heavily loaded with particles, from being conducted over a relatively uncontaminated surface, resulting in reduced effectiveness of the cleaning or even contamination.

[0026] Further developed embodiments may be characterized in that the hollow body has a cover by which the opening of the hollow body can be closed, and the apparatus has a second retaining means by which the cover can be releasably fastened to the apparatus wall. As mentioned, the FOUP can be closed by a removable cover. In this embodiment, the cover can also be dried and cleaned in the apparatus. A corresponding separate process for the cover only is omitted.

[0027] In further embodiments, the cover may have an inner surface and an outer surface, and the device may include a gripping and moving device to which the cover can be connected to a second retaining means such that the outer surface of the cover faces the outer surface of the hollow body.

[0028] Simultaneous cleaning of the hollow body and cover requires their separation before introduction into the apparatus. Introduction into the apparatus is performed separately. In gripping and moving devices known from the prior art that would be suitable for such operations, it is possible that the inner surface of the cover, separated from the hollow body, faces the outer surface of the hollow body. For the reasons further mentioned above, for example, efforts are made to keep the volume of the internal space of the apparatus as small as possible, so the distance between the outer surface of the hollow body and the inner surface of the cover is generally not very large. Therefore, due to fouling in the external space of the hollow body, a greater load of cleaning fluid may flow over the inner surface of the cover, potentially resulting in little or no effective cleaning of the inner surface of the cover, or even contamination. The cleaning fluid must be supplied accordingly for a long period of time. In this embodiment, this situation is avoided and the cleaning process is accelerated because the cover is positioned within the internal space of the apparatus such that its outer surface faces the outer surface of the hollow body. Here, it can be assumed that as the distance from the surface being cleaned decreases, the load of the cleaning fluid increases.

[0029] In further embodiments, it may be appropriate to have at least one rectifier located within the internal space of the device, which can thereby conduct a flow of cleaning fluid into the internal space of the device. The rectifier may include several baffles and / or partitions. The flow of cleaning fluid can be conducted such that a heavier load of cleaning fluid does not flow over the inner surface of the cover, or only flows over it slightly. The above case is avoided in which a heavier load of cleaning fluid flows over a relatively clean inner surface of the cover, potentially contaminating the inner surface of the cover rather than purifying it.

[0030] Further developed embodiments may be characterized in that the hollow body wall forms an edge surface surrounding the hollow body opening, and the first retaining means includes a locking device by which the hollow body can be sealed and releasably connected to the edge surface and to the retaining surface. The hollow body can be ensured to be securely fixed, positioned, and allowed to flow as desired during drying and cleaning using the locking device. The edge surface separates the inner surface of the hollow body from the outer surface. The fact that the edge surface of the hollow body is on the retaining surface to seal prevents the cleaning fluid from flowing uncontrolledly from the internal space of the hollow body to the external space of the hollow body, or vice versa. Furthermore, this can be achieved simply by applying a permanent vacuum within the internal space of the hollow body.

[0031] Further embodiments are characterized in that the replacement member surrounds a hollow space accessible by a through opening, and a heating device is positioned within the hollow space so that the hollow body can be heated for drying. The heating device contributes to heating the hollow body after purification to assist the drying process. Because the replacement member is introduced into the internal space of the hollow body, the distance between the heating device and the hollow body wall is short, and effective heating can be achieved. Due to the fact that the hollow space is open, atmospheric pressure is present within the hollow space. Therefore, no special measures are required to protect the heating device from vacuum. Furthermore, the heating device is easily accessible through the through opening, and assembly and repair can be performed without special measures.

[0032] Further embodiments may describe a heating device comprising several infrared diodes and a replacement member consisting of or comprising a material that transmits infrared radiation. Infrared diodes have the advantage that the infrared radiation they generate is in a strictly defined frequency range that can be optimized for the purification fluid used. Some of the infrared diodes can generate infrared radiation by which the purification fluid is heated, and other infrared diodes can generate infrared radiation by which the walls of the hollow body are heated. Any residue of the purification fluid still remaining on the inner or outer surface of the hollow body is heated very effectively and removed in interaction with the vacuum.

[0033] Embodiments of the present invention are methods for purifying a pot-shaped hollow body, particularly a transport container for semiconductor wafers or EUV lithography masks, using the apparatus described in any one of the prior claims, - A step in which the hollow body wall interacts with the first holding means, - A step of introducing the replacement member into the internal space of the hollow body, - A step of applying a vacuum to the internal space of the hollow body using an exhaust device, and / or, - A step of transporting the cleaning fluid through the internal space of the hollow body using a transport device. This includes methods.

[0034] The technical effects and advantages that can be achieved by the method proposed by this invention correspond to those discussed in relation to the apparatus. In summary, it must be noted that the volume in which a vacuum is generated is reduced with the assistance of the displacement member. As a result, the time to reach the desired vacuum is reduced, and the entire drying process, especially of the inner surface of the hollow body, is accelerated. At the same time, the energy required to apply the desired pressure is reduced. Also, the volume of cleaning fluid used to purify the inner surface of the hollow body is kept low for the same reason. Here, it seems practical to perform the purification after the drying process.

[0035] In a further embodiment, the hollow body may be defined as having a cover having an inner and outer surface, thereby closing the opening of the hollow body. Here the device has a device wall, a second retaining means by which the cover can be releasably fastened to the device wall, and a gripping and moving device, and the method is - Using a gripping and moving device, the cover is releasably fastened by a second holding means such that the outer surface of the cover faces the outer surface of the hollow body. Includes.

[0036] If the inner surface of the cover faces the outer surface of the hollow body, the cleaning fluid, heavily loaded due to contamination in the external space of the hollow body, may also flow over the inner surface of the cover, potentially resulting in little or no effective cleaning of the inner surface of the cover, or even contamination. In this embodiment, this situation is avoided because the cover is positioned within the internal space of the device such that its outer surface faces the outer surface of the hollow body.

[0037] Exemplary embodiments of the present invention will be described in more detail below with reference to the attached figures. [Brief explanation of the drawing]

[0038] [Figure 1A] This figure shows the steps for operating the apparatus according to the first embodiment of the present invention. [Figure 1B] This figure shows the steps for operating the apparatus according to the first embodiment of the present invention. [Figure 1C] This figure shows the steps for operating the apparatus according to the first embodiment of the present invention. [Figure 1D] This figure shows the steps for operating the apparatus according to the first embodiment of the present invention. [Figure 1E] This figure shows the steps for operating the apparatus according to the first embodiment of the present invention. [Figure 1F] This figure shows the steps for operating the apparatus according to the first embodiment of the present invention. [Figure 2] This figure shows a second embodiment of the apparatus according to the present invention. [Figure 3]This figure shows a third embodiment of the apparatus according to the present invention. [Figure 4] This figure shows a fourth embodiment of the apparatus according to the present invention. [Figure 5A] This is a cross-sectional view of a fifth embodiment of the apparatus according to the present invention. [Figure 5B] Figure 5A is a plan view of the replacement member shown. [Figure 6A] This is a perspective view of a fifth embodiment of the apparatus according to the present invention. [Figure 6B] Figure 6A is a cross-sectional view of a sixth embodiment of the apparatus according to the present invention. [Modes for carrying out the invention]

[0039] A first embodiment of an apparatus 101 for drying and / or purifying a pot-shaped hollow body 12, which is a transport container particularly for semiconductor wafers or EUV lithography masks, according to the present invention, is shown in Figures 1E and 1F with reference to the basic diagram. A cup-shaped hollow body 12, also called a FOUP, is shown in Figures 1E and 1F and referred to below. The hollow body 12 includes a hollow body wall 14 that forms a hollow body inner surface 16, the hollow body inner surface 16 defining a hollow body internal space 17. The hollow body 12 further has a hollow body opening 18 surrounded by the hollow body wall 14, through which the hollow body internal space 17 is accessible, for example, for loading a semiconductor wafer into the hollow body 13. The hollow body wall 14 forms an edge surface 20 surrounding the hollow body opening 18.

[0040] The hollow body 12 further has a hollow body outer surface 22. The edge surface 20 separates the hollow body outer surface 22 from the hollow body inner surface 16.

[0041] A cover 24, which can thereby close the hollow body opening 18, is also shown in Figures 1E and 1F. The cover 24 forms the inner surface 26 and the outer surface 28. This relationship is for a state not shown in which the hollow body opening 18 is closed by the cover 24. Thus, the inner surface 26 faces the internal space 17 of the hollow body, and the outer space 28 faces outwards.

[0042] The device 101 has a first retaining means 30 that can interact with the hollow body 12. In the shown embodiment, the first retaining means 30 includes a retaining surface 32 on which the edge surface 20 of the hollow body 12 can be placed. The first retaining means 30 further includes a locking device 33 by which the hollow space 12 can be sealed and connected to the edge surface 20 and releasably connected to the retaining surface 32.

[0043] In the embodiment shown, the retaining surface 32 is formed by the device wall 34, which includes a first wall portion 36 and a second wall portion 38. The first wall portion 36 and the second wall portion 38 can be connected to each other and then separated from each other again. In this case, the retaining surface 32 is formed by the first wall portion 36. When connected, the first wall portion 36 and the second wall portion 38 surround the internal space 40 of the device.

[0044] As can be seen in Figures 1E and 1F, the retaining surface 32 is positioned on the protrusion 42 of the first wall portion 36. Several passage channels 44 are located within the protrusion 42 and belong to the fluid conduction device 46, a function which will be discussed in more detail below.

[0045] The replacement member 481 according to the first embodiment is designed in a conical shape and is further releasably fastened to the first wall portion 36. It is also conceivable that the replacement member 481 be designed as a single piece with the first wall portion 36. As shown in Figures 1E and 1F, when the hollow body 12 is placed on the holding surface 32, the replacement member 481 protrudes into the internal space 17 of the hollow body, creating a gap between the replacement member 481 and the hollow body wall 14. Here, the shape of the replacement member 481 is selected to roughly correspond to the shape of the internal space 17 of the hollow body. Therefore, the gap has at least a roughly constant width. The through hole 50 passes through the replacement member 481 and opens to the internal space 17 of the hollow body when the hollow space 12 is placed on the holding surface 32, as shown in Figures 1E and 1F.

[0046] As mentioned, the hollow body opening 18 can be closed by the cover 24. The cover 24 is connected to the second wall portion 38 by the second retaining means 52.

[0047] The apparatus 101 according to the first embodiment can be operated as follows.

[0048] Before the steps described below are performed, the hollow body 12 and cover 24 are purified with a purifying fluid in a manner not shown.

[0049] Referring to Figure 1A, it can be seen that the first wall portion 36 is released from the second wall portion 38. The first wall portion 36 is not shown in Figure 1A for illustrative purposes. The cover 24 is separated from the hollow body 12 by the gripping and moving device 54, this separation step is also not shown in Figure 1A. Only that the cover 24 is connected to the gripping and moving device 54 can be seen. The gripping and moving device 54 has a rotating device 56, by which the cover 24 can be rotated around a rotation axis R. Here, the cover 24 is rotated so that the inner surface 26 of the cover faces the second retaining means 52. As soon as the cover 24 takes the corresponding rotational position, the cover 24 is gripped by the displacement device 58 of the gripping and moving device 54 and moved into the internal space 17 of the hollow body so that the cover 24 can contact and be held by the second retaining means 52 (see Figure 1B).

[0050] As can be seen in Figure 1C, the edge surface 20 of the hollow body 12 is placed on the holding surface 32. Subsequently, the locking device 33 is activated, and as a result, the hollow body 12 is sealed and coupled to the first wall portion 36. As can be seen in Figure 1D, the first wall portion 36 and the second wall portion 38 are similarly coupled to each other here using the gripping and moving device 54. Referring to Figure 1E, a vacuum is applied to the internal space 40 of the apparatus. For this purpose, the apparatus 101 includes an exhaust device 60, which in the shown embodiment includes a vacuum pump 62. The exhaust device is coupled to the internal space 40 of the apparatus by a coupling valve 63. The operation of the vacuum pump 62 draws out the fluid in the internal space 40 of the apparatus, which is generally air. To prevent inflow through the through hole 50, the through hole 50 is coupled to a check valve 64 which is closed for this purpose. The flow of fluid taken in the internal space 40 of the apparatus is shown with reference to the arrows. It should be noted that the fluid can flow through the passage 44, and therefore the fluid in the internal space 17 of the hollow body can also be drawn out. Here, the locking device 33 is formed such that the flow toward the vacuum pump 62 is clearly not obstructed.

[0051] As a result, a vacuum is formed on the inner surface 16 of the hollow body, the outer surface 22 of the hollow body, the inner surface 26 of the cover, and the outer surface 28 of the cover, thereby removing any residue of the purification fluid remaining on the surfaces of the hollow body 12 and the cover 24 due to the preceding purification of the hollow body 12 in the purification device. This dries the inner surface 16 of the hollow body, the outer surface 26 of the hollow body, the inner surface 26 of the cover, and the outer surface 28 of the cover.

[0052] Referring to Figure 1F, it can be seen that upon completion of the drying process, the through-hole 50 is connected to a fluid reservoir 65 into which a cleaning fluid, such as nitrogen, is placed. This may be done manually or by corresponding valve coupling, and a check valve 64 may also be used and thus actuated to open. The cleaning fluid is conveyed through the apparatus 101 by a conveying device 66, which has a conveying pump 68. The exhaust device 66 is similarly connected to the internal space 40 of the apparatus by the connecting valve 63 already mentioned. At this point, it should be noted that the vacuum pump 62 may be adapted to also be used as the conveying pump 68. To this extent, the vacuum pump 62 and the conveying pump 68 may be formed of the same components.

[0053] If a vacuum is still applied to the internal space 40 of the apparatus before the drying process, the cleaning fluid may also be transported into the internal space 40 of the apparatus in the following manner, and the cleaning fluid may be drawn into the internal space 40 of the apparatus as a result of opening the check valve 64 by the check valve 64 and fluid reservoir of the corresponding embodiment. Active transport of the cleaning fluid by the transport device 66 is not required until the pressure is at least completely equilibrium. Here, the connecting valve 63 and / or check valve 64 may be adapted not only to open and close the flow of the cleaning fluid or another fluid, but also to set volumetric flow. In particular, when a higher vacuum is present in the internal space 40 of the apparatus, it is meaningful to keep the volumetric flow through the check valve 64 small initially in order to perform pressure equilibrium slowly and avoid sudden pressure changes.

[0054] As explained with respect to Figure 1E, when a vacuum is applied, the cleaning fluid flows in substantially the same direction as the fluid. In Figure 1F, the arrows also indicate the direction of flow. Here, the unloaded cleaning fluid flows out of the fluid reservoir 65, flows through the through hole 50, and then flows over the inner surface 16 of the hollow body. Through vaporization aided by the cleaning fluid, AMC (airborne molecular contaminants) are removed from the inner surface 16 of the hollow body, thus being captured and carried away by the cleaning fluid. The cleaning fluid then flows through the through channel 44 and then comes into contact with the outer surface 22 of the hollow body. Here too, the contaminants mentioned above are removed.

[0055] The outer surface 16 of the hollow body is generally dirtier than the inner surface 16 of the hollow body, and the load of the cleaning fluid increases considerably when it flows over the outer surface 22 of the hollow body. This portion of the cleaning fluid has the greatest load here and flows directly over the outer surface 22 of the hollow body. Because the distance between the cover 24 and the hollow body 12 in the internal space 40 of the apparatus is not very large, the relatively heavily contaminated cleaning fluid also flows over the outer surface 28 of the cover. The portion of the cleaning fluid that flows along the second wall portion 38 and is therefore less loaded flows over the inner surface 26 of the cover. Thus, it is avoided that the heavily loaded cleaning fluid flows over the relatively clean inner surface 26 of the cover and contaminates it rather than cleans it. The cleaning fluid then leaves the apparatus 101 and may be stored in a container (not shown), disposed of, or prepared.

[0056] A second embodiment of the apparatus 102 according to the present invention is similarly shown with reference to the basic diagram in Figure 2. The basic design of the apparatus 102 according to this second embodiment largely corresponds to that of the apparatus 101 according to the first embodiment, and therefore only the main differences will be noted. The apparatus 102 according to the second embodiment includes a rectifier 70 designed as a partition wall 72 which may be located within the internal space 40 of the apparatus together with a control device (not shown). The partition wall 72 divides the internal space 40 of the apparatus into a first sub-part 74 and a second sub-part 76. Here, the hollow body 12 is located in the first sub-part 74, and the cover 24 is located in the second sub-part 76. Therefore, a control device is required to allow access to the second sub-part 76, thereby allowing the cover 24 to be located there and removed therefrom.

[0057] The internal space 40 of the device is connected to an additional fluid reservoir 78, which may store the same additional cleaning fluid as the cleaning fluid stored in the fluid reservoir 65. The additional fluid reservoir 78 is in communication with a second sub-section 76.

[0058] As already mentioned with respect to the first embodiment of apparatus 101, the cleaning fluid is transported through the internal space 40 of the apparatus by the transport device 66. However, in the second embodiment of apparatus 102, additional cleaning fluid is also transported from the second fluid reservoir 78 to the second sub-section 76, where the unloaded additional cleaning fluid flows directly over the inner surface 26 of the cover and then over the outer surface 28 of the cover. The additional cleaning fluid then exits the second sub-section 76 through the partition opening 80, where it merges with the cleaning fluid of the first sub-section 74. As mentioned, the cleaning fluid may be supplied to a container (not shown), disposed of, or prepared. This ensures that the inner surface 26 of the cover is acted upon by an unloaded or very lightly loaded cleaning fluid, and effective cleaning of the inner surface 26 of the cover can be achieved.

[0059] In embodiments not shown, the fluid conduction device 46 has several baffles, which divide the cleaning fluid into two partial flows as soon as the cleaning fluid flows through the passage 44. The outer partial flow is conducted along the second wall portion 38 to the cover 24, and the inner partial flow is conducted along the outer surface 22 of the hollow body. Mixing of the outer and inner partial flows is largely avoided until the outer partial flow reaches the cover 24. This also prevents heavily loaded cleaning fluid from flowing over the inner surface 26 of the cover. It is not necessary to provide an additional fluid reservoir 78 here.

[0060] A third embodiment of the apparatus 103 according to the present invention is similarly shown with reference to the basic diagram in Figure 3. The first wall portion 36 forms a through opening 82 which is substantially flush with the hollow body opening 18 when the hollow body 12 is placed in the first wall portion 36. In this embodiment, the fluid conduction device 46 also includes a through passage 44. The first wall portion 36 divides the internal space 40 of the device into a first sub-part 74 and a second sub-part 76, the hollow body 12 may be placed in the first sub-part 74, and the cover 24 may be placed in the second sub-part 76. The replacement member 48 protrudes from the second sub-part 76 through the through opening 82 to the first sub-part 74 and into the internal space 17 of the hollow body.

[0061] In the second sub-part 76, the first wall part 36 forms a wall opening 84. In the third embodiment, a second retaining means 52 is provided in the cover operating unit 86, thereby allowing the cover 24 to be releasably connected using the second retaining means 52, by which the cover 24 can be fixed in place. The cover operating unit 86 is rotatably supported in the first wall part by a fastening device 88, and is movable between an open position in which the wall opening 84 is released, thereby releasing access to the internal space 40 of the device, and a closed position in which the wall opening 84 is closed. In Figure 3, the cover operating unit 86 is in the closed position. It should be noted that the wall opening 84 is closed by the cover 24, and the inner surface 26 of the cover faces into the internal space 40 of the device.

[0062] The main modes of operation of the apparatus 103 according to this third embodiment correspond to those described with respect to the first and second embodiments. One of the main differences is the way the cover 24 is operated. Once the cover 24 is separated from the hollow body 12 by a gripping and moving device 54 (not shown in Figure 3), the cover 24 is placed on the second retaining means 52. At this point, the cover operating unit 86 is in the open position, rotated 90° compared to the closed position shown in Figure 3. The cover 24 is then placed on the second retaining means 52 from above, and subsequently the cover operating unit 86 is rotated 90° to the closed position as shown in Figure 3. Here the cover 24 closes the wall opening 84. At this point, an exhaust device 60 (not shown in Figure 3) may be activated so that a vacuum is applied to the internal space 40 of the apparatus. Any residue of the purifying fluid located on the inner surface 16 of the hollow body, the inner surface 26 of the cover, and the outer surface 22 of the hollow body is removed, and the hollow body 12 and the cover 24 are dried. In this embodiment, it should be noted that no vacuum is applied to the outer surface 28 of the cover, and therefore residues of the purification fluid may still remain there.

[0063] After the drying process is complete, the transition to the purification process shown in Figure 3 may occur as a result of the corresponding valve connection. As mentioned in other embodiments, the conveying pump 68 of the conveying device 66 is activated, the check valve 64 is opened, and the cleaning fluid is conveyed into the internal space 40 of the device through the through hole 50 which is connected to the fluid reservoir 65 as a result of the valve connection. The cleaning fluid flows over the inner surface 16 of the hollow body, the inner surface 26 of the cover, and the outer surface 22 of the hollow body, removing any contaminants located thereon. Again, the cleaning fluid does not reach the outer surface 28 of the cover and therefore does not purify it.

[0064] Next, with reference to the basic diagram in Figure 4, a fourth embodiment of the apparatus 104 according to the present invention is shown. The basic design of the apparatus 104 according to this fourth embodiment largely corresponds to that of the apparatus 101 according to the first embodiment, and therefore only the main differences will be noted. Similar to the first embodiment, the apparatus wall 34 is divided into a first wall portion 36 and a second wall portion 38, but the separation zone extends differently. As can be seen from Figure 4, the first wall portion 36 is U-shaped, while the second wall portion is flat and substantially flat or disc-shaped. The first retaining means 30 is attached to the second wall portion 38 and interacts with the outer surface 22 of the hollow body using a retaining surface 32 so that the hollow body 12 is positioned at a distance from the apparatus wall 34 within the internal space 40 of the apparatus. To this extent, in the fourth embodiment, the retaining surface 32 is formed by the second wall portion 38. Therefore, in the fourth embodiment of the apparatus 104, the hollow body 12 is not placed on a surface, but rather "floats" within the internal space 40 of the apparatus. The first retaining means 30 is configured to leave a gap 90 between the edge surface 20 and the first wall portion 36, allowing the cleaning fluid to flow and move from the inner surface 16 of the hollow body to the outer surface 22 of the hollow body. To this extent, the first retaining means 30, the hollow body wall 14, and the apparatus wall 34 form a fluid conductor 46, taking over those functions in the second embodiment. Here, the first retaining means 30 is designed so as not to substantially obstruct the flow of cleaning fluid within the internal space 40 of the apparatus. Therefore, it is not necessary to provide the protrusions 42 and the passageways 44. The locking device 33 can also be omitted.

[0065] Furthermore, a second retaining means 52 for fastening the cover 24 is positioned on the second wall portion 38.

[0066] In the fourth embodiment of the apparatus 104, the replacement member 481 is formed integrally with the first wall portion 36.

[0067] The apparatus 104 according to the fourth embodiment operates in substantially the same manner as those described with respect to the other embodiments. However, it should be noted that the hollow body 12 and the cover 24 are first fastened to the second wall portion 38 using the gripping and moving device 54 before they are connected to the first wall portion 36. In this regard, the gripping and moving device 54 grips at least one of the two wall portions 36, 38.

[0068] Figures 5A and 5B show the replacement member 482 according to the second embodiment. The replacement member 481 according to the first embodiment is formed as a solid body, while the replacement member 482 according to the second embodiment surrounds a hollow space 92 accessible by a through opening 94 formed by the replacement member wall 96. The replacement member 482 is introduced into the apparatus 105 according to the fifth embodiment, and a vacuum can be applied to the outside of the replacement member wall 96 located in the internal space 40 of the apparatus, while atmospheric pressure exists in the hollow space 92. Only the second wall portion 38 of the apparatus wall 34 is shown in the apparatus 105 according to the fifth embodiment, and in principle, it may have exactly the same design as the apparatuses 101 to 104 according to the embodiments described earlier. Figure 5B shows only the replacement member 482.

[0069] A receiving flange 104 is positioned in a second wall portion 38 that forms a flange opening 106 through which a replacement member 482 can be inserted and thus introduced into the internal space 40 of the device 105. The receiving flange 104 may be designed as a separate component. At least one O-ring seal 108, in this case two O-ring seals 108, is positioned in the receiving flange 104 to seal the second wall portion 38 against the replacement member wall 96 when the replacement member 482 is inserted through the flange opening 106, as shown in Figure 5A. This makes it possible to apply a vacuum inside the device 105. To prevent the replacement member 482 from being pulled into the device 105, the replacement member 482 has an enlarged diameter portion 110 in the passage opening.

[0070] A heating device 98 is positioned within the hollow space 92 and fastened to the replacement member wall 96 by a holder 100. The heating device 98 is accessible through a through opening 94. As mentioned, atmospheric pressure is present within the hollow space 92, so no special measures are required to protect the heating device 98 from vacuum. The heating device 98 includes several infrared diodes 102 for generating infrared radiation. Two groups of infrared diodes 102 can be identified here. The first group of infrared diodes 102 primarily irradiate infrared radiation along the longitudinal axis L of the replacement member 482. These first group of infrared diodes 102 are located in the region of the closed end of the replacement member 482, opposite the through opening 94, in the upper region of Figure 5A. The second group of infrared diodes 102 primarily irradiate infrared radiation perpendicular to the longitudinal axis and are located in the center. The replacement member wall 96 is made from a material that transmits infrared radiation, for example, glass.

[0071] As mentioned, the volume in which a vacuum can be generated is reduced with the assistance of the replacement member 482. Similarly, as mentioned, the vacuum helps to remove the residue of the purification fluid from the inner surface 16 of the hollow body and / or with respect to the outer surface 22 of the hollow body. Removal can be assisted by the heating device 98. The infrared radiation generated by the infrared diode 102 is in a strictly defined frequency range that can be optimized for the purification fluid used. Any residue of the purification fluid still remaining on the inner surface 16 of the hollow body or on the outer surface 22 of the hollow body is heated very effectively and removed in interaction with the vacuum.

[0072] As described above, the replacement member 481 according to the first embodiment has a through hole 50 (see, for example, Figures 1F and 2) through which a cleaning fluid, such as nitrogen, can flow along the inner surface 16 and / or outer surface 22 of the hollow body 12 (not shown in Figures 5A and 5B) upon completion of the drying process. In contrast, the replacement member wall 96 of the replacement member 482 according to the second embodiment is closed, particularly due to the fact that it is made of glass. Nevertheless, multiple connecting passages 112 are arranged on the receiving flange 104 and distributed around the periphery of the receiving flange 104 so that the cleaning fluid can still be introduced into the internal space 40 of the apparatus 105, and can be connected to a check valve 64 and / or fluid reservoir 65 (see, for example, Figure 2), as described with respect to the through hole 50. Only one check valve 65 is shown for illustration purposes in Figure 5A. In other respects, apparatus 105 is operated in the same manner as described with respect to other embodiments of apparatus 101-104.

[0073] Referring to the perspective views in Figures 6A and 6B, a sixth embodiment of the apparatus 106 according to the present invention is shown. The apparatus 106 has a replacement member 483 according to the third embodiment. In the third embodiment, the replacement member 483 is designed in a parallelepiped shape and can be configured as a hollow or solid body, but is closed, in contrast to the second embodiment of the replacement member 482 shown in Figures 5A and 5B. In this embodiment, the replacement member 483 is also connected to a receiving flange 104 fastened to a second wall portion. The receiving flange 104 similarly has a connecting channel for introducing cleaning fluid into the internal space 40 of the apparatus. The heating device 98 includes a total of four groups of infrared diodes 102, located outside the replacement member 483. In this case, the holder is formed as a cross-shaped plate and fastened to the free end of the replacement member 483. The holder has one receiving hole 114 for each group of infrared diodes 102. Furthermore, each group of infrared diodes 102 is connected to the receiving flange 104.

[0074] The infrared diode 102 is positioned to irradiate infrared radiation mainly perpendicular to the longitudinal axis of the replacement member 483, which is not shown in Figures 6A and 6B. Therefore, a portion of this infrared radiation hits the replacement member 483. The replacement member 483 has a reflective surface 116, which reflects the infrared radiation incident on the replacement member 483, and thus can be used for heating the hollow body 12 and is not lost. The reflective surface 116 can be provided, for example, by making the replacement member 483 from a metal such as aluminum, and by polishing the area where the reflective surface 116 is located, thereby providing particularly small roughness.

[0075] In other words, the apparatus 106 according to the sixth embodiment is operated substantially in the same manner as described with respect to the fifth embodiment of apparatus 105. [Explanation of Symbols]

[0076] 10 equipment 101, 102, 103, 104, 105, 106 equipment 12 Hollow body 14 Hollow body wall 16 Inner surface of a hollow body 17 Hollow body internal space 18 Hollow body opening 20 Edge 22 Hollow body outer surface 24 Cover 26 Inside of the cover 28 Cover exterior 30 First retaining means 32 Holding surface 33 Locking device 34 Equipment wall 36. First wall section 38. Second wall section 40 Equipment internal space 42 Protrusion 44 Passageway 46 Fluid conduction device 48 Replacement member Replacement members 481, 482, 483 50 Passing hole 52 Second retaining means 54 Gripping and moving device 56 Rotating device 58 Displacement device 60 Exhaust system 62 Vacuum pump 63 Connecting valve 64 Check valve 65 Fluid reservoir 66 Conveying device 68 Conveyor pump 70 rectifier 72 Bulkhead 74 First Subpart 76 Second Subsection 78 Additional fluid reservoir 80 Bulkhead opening 82 Passage opening 84 Wall openings 86 Cover Operating Unit 88 Fastening device 90 gap 92 Hollow space 94 Passage opening 96 Replacement member wall 98 Heating device 100 holders 102 Infrared Diode 104 Receiving flange 106 Flange opening 108 O-ring seals 110 Expanded diameter part 112 Connecting channel 114 receiving holes 116 Reflective surface L Long axis R rotation axis

Claims

1. In particular, an apparatus (10) for drying and / or purifying a pot-shaped hollow body (12), which is a transport container for semiconductor wafers or EUV lithography masks, - The hollow body (12) includes a hollow body wall (14) that forms the inner surface (16) and the outer surface (22) of the hollow body, and the inner surface (16) defines the internal space (17) of the hollow body. - The hollow body (12) has a hollow body opening (18) surrounded by the hollow body wall (14), through which the internal space (17) of the hollow body is accessible. The aforementioned device (10) - Device wall (34) and, - The first holding means (30) can interact with the device (10) to hold the hollow body (12), - An exhaust device (60) for applying a vacuum to the internal space (17) of the hollow body, and / or - A conveying device (66) for transporting the cleaning fluid through the internal space (17) of the hollow body, - A replacement member (48) is provided which can be introduced into the internal space (17) of the hollow body through the hollow body opening (18), - The device wall (34) is releasably connectable to each other and has a first wall portion (36) and a second wall portion (38) that surround the internal space (40) of the device when connected. - The first holding means (30) includes a holding surface (32), - The first wall portion (36) forms the holding surface (32) that at least partially defines the internal space (40) of the device, - The apparatus (10) is characterized by comprising at least one fluid conduction device (46) that can conduct the cleaning fluid from the internal space (17) of the hollow body to the external surface (22) of the hollow body.

2. The replacement member (48) is a through hole (50), - When the replacement member (48) is introduced into the internal space (17) of the hollow body, it is open to the internal space (17) of the hollow body. - Through this, the cleaning fluid can be transported into the internal space (17) of the hollow body, and / or a vacuum can be applied to the internal space (17) of the hollow body. The apparatus (10) according to claim 1, characterized by having a through hole (50).

3. - The apparatus (10) according to claim 1 or 2, characterized in that the replacement member (48) is releasably connectable to the apparatus wall (34) or is formed integrally with the apparatus wall (34).

4. The apparatus (10) according to claim 1 or 2, characterized in that a vacuum can be applied to the internal space (17) of the hollow body and / or the internal space (40) of the apparatus by using the fluid conduction device (46).

5. The hollow body (12) has a cover (24) by which the hollow body opening (18) can be closed, and the device (10) has a second retaining means (52) by which the cover (24) can be releasably fastened to the device wall (34). The apparatus (10) according to claim 3, characterized by the above.

6. The apparatus (10) according to claim 5, characterized in that the cover (24) has an inner surface (26) and an outer surface (28) of the cover, and the apparatus (10) comprises a gripping and moving device (54) to which the cover (24) can be connected to the second holding means (52) such that the outer surface (28) of the cover faces the outer surface (22) of the hollow body.

7. At least one rectifier (70) is located within the internal space (40) of the device, which allows the flow of the cleaning fluid to be conducted into the internal space (40) of the device. The apparatus (10) according to claim 1 or 2, characterized by the above.

8. - The hollow body wall (14) forms an edge surface (20) surrounding the hollow body opening (18), The apparatus (10) according to claim 1 or 2, characterized in that the first retaining means (30) includes a locking device (33) by which the hollow body (12) can be sealed and connected to the edge surface (20) and releasably connected to the retaining surface (32).

9. The apparatus (10) according to claim 1 or 2, characterized in that the substitution member (48) has a heating device (98) by which the hollow body (12) can be heated for drying.

10. The apparatus (10) according to claim 9, characterized in that the heating device (98) includes several infrared diodes (102).

11. The apparatus (10) according to claim 10, characterized in that the replacement member (48) has a reflective surface that reflects infrared radiation emitted by the infrared diode.

12. - The replacement member (48) surrounds the hollow space (92) accessible by the through opening (94), - The heating device (98) is located within the hollow space. The apparatus (10) according to claim 1 or 2, characterized by the above.

13. The apparatus (10) according to claim 12, characterized in that the replacement member (48) is made of or contains a material that transmits infrared radiation.

14. A method for purifying a pot-shaped hollow body (12), which is a transport container for semiconductor wafers or EUV lithography masks, using the apparatus (10) described in claim 1, - The first holding means (30) interacts with the hollow body wall (14), - The step of introducing the replacement member (48) into the internal space (17) of the hollow body, - A step of applying a vacuum to the internal space (17) of the hollow body by an exhaust device (60), and / or, A method comprising the step of transporting a cleaning fluid through the internal space (17) of the hollow body by a transport device (66).

15. - The hollow body (12) has a cover (24) having an inner surface (26) and an outer surface (28) of the cover, which can thereby close the opening (18) of the hollow body. - The aforementioned device (10) - Device wall (34) and, - The cover (24) is thereby releasably fastened to the device wall (34) by a second retaining means (52), ・Gripping and moving device (54) and It has, The method described above is - Using the gripping and moving device (54), fasten the cover releasably by the second holding means (52) such that the outer surface of the cover (28) faces the outer surface of the hollow body wall (14) (22). The method according to claim 14, including the method described in claim 14.

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