Antifouling member, and display, touch panel and sensor each using same, and method for producing antifouling member

Abstract

One embodiment of the present invention provides an antifouling member, one surface of which is provided with a relief structure on the order of nanometers, and which comprises antifouling layers that are provided on the recessed parts of the relief structure. The present invention also provides: a display in which at least a part of a display portion is covered with the antifouling member; a touch panel in which at least a part of a touch unit is covered with the antifouling member; and a sensor, the surface of which is at least partially covered with the antifouling member.

Description

Antifouling member, display, touch panel and sensor using same, and method for manufacturing antifouling member

[0001] The present invention relates to an antifouling member, a display, a touch panel and a sensor using the same, and a method for manufacturing the antifouling member.

[0002] It is known that the use of fluorine-based compounds in the treatment of a substrate can impart water repellency, oil repellency, and stain resistance to the substrate (see, for example, Patent Documents 1 and 2). [Patent Document 1] JP 2014-218639 A [Patent Document 2] JP 2017-082194 A

[0003] In a first aspect of the present invention, there is provided an antifouling member having an antifouling layer. Nano-order irregularities may be provided on one surface of the antifouling substrate. The antifouling layer may be provided on the concave portions of the irregularities.

[0004] In the above, the average pitch width of the convex portions of the concave and convex portions may be 5 to 18 nm.

[0005] In the above, the surface roughness (Rz) measured on the flat surface of the irregularities may be 9 to 12 nm.

[0006] In the above, the surface roughness (Rz) measured on the cross section of the irregularities may be 3 to 5 nm.

[0007] In the above, the maximum height difference (PV) measured on the flat surface of the irregularities may be 5 to 15 nm.

[0008] In the above, the maximum height difference (PV) measured on the cross section of the irregularities may be 4 to 8 nm.

[0009] In the above, the arithmetic mean roughness (Ra) measured on the uneven surface may be 0.6 to 2.0 nm.

[0010] In the above, the arithmetic mean roughness (Ra) measured on the cross section of the irregularities may be 0.6 to 2.0 nm.

[0011] In the above, the root mean square roughness (RMS) measured on the flat surface of the irregularities may be 0.8 to 2.0 nm.

[0012] In the above, the root mean square roughness (RMS) measured on the cross section of the irregularities may be 0.7 to 3.0 nm.

[0013] In the above, the antifouling member may include a substrate and a roughness-forming layer, and roughness may be formed on the surface of the roughness-forming layer.

[0014] In the above, the antifouling member may include a substrate, and the surface of the substrate may be uneven.

[0015] In the above, the height of one surface of the antifouling layer formed in the recessed portion in the normal direction does not need to exceed the height of the protruding portion of the unevenness.

[0016] In the above, the contact angle of water when it comes into contact with one surface of the antifouling member may be 105 to 120°.

[0017] In the above, the pencil hardness of one surface of the antifouling member may be HB or higher.

[0018] In the above, the antifouling layer may contain a perfluoropolyether-containing silane compound.

[0019] In the above, the irregularity forming layer may contain a silicone resin.

[0020] In the above, the silicone resin may contain a Q unit structure and a T unit structure.

[0021] In the above, the composition ratio of carbon atoms in the recesses of the roughness-forming layer may be higher than that in the protrusions.

[0022] In the above, the molar concentration of silanol groups in the recesses of the roughness-forming layer may be higher than that in the protrusions.

[0023] In a second aspect of the present invention, there is provided a display in which at least a part of the display area is covered with the above-mentioned antifouling member.

[0024] In a third aspect of the present invention, there is provided a touch panel in which at least a part of a touch area is covered with the above-described antifouling member.

[0025] In a fourth aspect of the present invention, there is provided a sensor having at least a portion of its surface covered with the antifouling member described above.

[0026] The above summary of the invention does not list all of the necessary features of the present invention, and subcombinations of these features may also be inventions.

[0027] 1 shows an example of an antifouling member 10 according to this embodiment. 2 shows another example of an antifouling member 10 according to this embodiment. 3 shows an example of a flow of a method for manufacturing the antifouling member 10 according to this embodiment. 4 shows an example of S100 in the flow of FIG. 3 when a concavo-convex layer 120 is provided.

[0028] The present invention will be described below through embodiments of the invention, but the following embodiments do not limit the scope of the invention as claimed. Furthermore, not all of the combinations of features described in the embodiments are necessarily essential to the solution of the invention.

[0029] 1 and 2 show an example of an antifouling member 10 according to this embodiment. The antifouling member 10 is a surface protection member that is resistant to adhesion of dirt and other contaminants and facilitates removal of any adhered contaminants. The antifouling member 10 is applied to products or components (e.g., automobiles, mobile devices such as smartphones, optical products such as cameras, measuring instruments such as sensors, other machinery, electrical products, etc.) where adhesion of dirt (e.g., dust, pollen, fingerprints, oil, etc.) is undesirable. For example, the antifouling member 10 is used to cover at least a portion of the display area of ​​a display, to cover at least a portion of the touch area of ​​a touch panel, or to cover at least a portion of the surface of a sensor. The antifouling member 10 has nano-order irregularities on one surface, and an antifouling layer 130 is provided on the concave portions of the irregularities.

[0030] In FIG. 1, the antifouling member 10 includes a substrate 110, a roughness-forming layer 120, and an antifouling layer 130, and the roughness-forming layer 120 has a surface with nano-order roughness.

[0031] The substrate 110 serves to support the irregularities and the antifouling layer 130 provided on the antifouling member 10. The substrate 110 can be selected from a variety of materials depending on the purpose for which the antifouling member 10 is used. For example, the substrate 110 may be formed from any material, including glass, resin, metal, ceramics, semiconductors, fiber materials, fur, leather, wood, porcelain, and stone. When the antifouling member 10 is provided in an optical product or a component thereof, such as a display or touch panel, the substrate 110 may be formed from a transparent material, such as glass or resin. The substrate 110 may have any shape as long as there is a location where irregularities can be provided, and may be, for example, a plate-like shape.

[0032] The irregularity-forming layer 120 is provided on one surface of the substrate 110 and is a layer that holds the antifouling layer 130 by providing irregularities. The irregularity-forming layer 120 may also function as a hard coat layer that imparts abrasion resistance to the antifouling member 10. The irregularity-forming layer 120 may be made of an abrasion-resistant material, such as an inorganic material such as silica or a metal oxide, or a relatively hard organic material such as a silicone resin, an acrylic resin, a melamine resin, or a urethane resin.

[0033] In the example shown in FIG. 1 , the unevenness is provided on the unevenness-forming layer 120. By providing the unevenness on the unevenness-forming layer 120, which is the layer below the antifouling layer 130, the antifouling layer 130 is surrounded and protected by the convex portions, and the antifouling layer 130 fits into the concave portions, thereby firmly bonding the antifouling layer 130 to the unevenness-forming layer 120. Conventionally, the antifouling layer on the surface of an antifouling member is worn away by friction caused by wiping off stains or by long-term use, resulting in a shortened duration of antifouling performance. On the other hand, with the antifouling member 10 of this embodiment, the antifouling layer 130 is firmly held in place by the unevenness, making it possible to maintain the antifouling performance for a longer period of time. Furthermore, the nano-order unevenness ensures the transparency of the antifouling member 10.

[0034] As an example, the irregularity-forming layer 120 may be made of a silicone resin having irregularities. The silicone resin may contain Q unit structures and T unit structures. The T unit structures may be contained more in the recesses than in the protruding portions of the irregularities. Active silanol groups (Si—OH) may be exposed at least partially on the surfaces of the protruding portions and recesses (particularly the surface of the recesses). This can further strengthen the bond with the antifouling layer 130. A method for forming irregularities in the silicone resin will be described later.

[0035] The cross section of the convex portions of the unevenness may have various shapes, for example, a shape with a rectangular tip, a shape with a tapered or inversely tapered tip, a shape with a pointed tip, a shape with a curved tip such as a hemisphere, etc.

[0036] The average pitch width (average peak-to-peak length) of the convex portions of the unevenness may be 5 to 18 nm, and preferably 7 to 15 nm. If the average pitch width is equal to or less than a predetermined size, the transparency of the antifouling member 10 can be ensured. Furthermore, if the average pitch width is equal to or greater than a predetermined size, the antifouling layer 130 can be more firmly held. In particular, when the average pitch width falls within a certain range, the unevenness of the unevenness-forming layer and the antifouling layer 130 are firmly bound together by an anchor effect, thereby strengthening the holding power of the antifouling layer 130. The average pitch width may be a value measured at a specific cross section or plane using an atomic force microscope or the like.

[0037] The surface roughness (Rz) measured on the plane of the irregularities may be 1 to 15 nm, preferably 9 to 12 nm. The surface roughness (Rz) assumed on the cross section of the irregularities may be 1 to 10 nm, preferably 3 to 5 nm or more. If the surface roughness (Rz) is a predetermined value or less, the transparency of the antifouling member 10 can be ensured. Furthermore, if the surface roughness (Rz) is a predetermined value or more, the antifouling layer 130 can be more firmly held. In particular, when the surface roughness (Rz) falls within a certain range, the irregularities of the irregularity-forming layer and the antifouling layer 130 are firmly bonded to each other by an anchor effect, thereby strengthening the holding power of the antifouling layer 130.

[0038] The arithmetic mean roughness (Ra) measured on the flat surface of the irregularities may be 0.6 to 2.0 nm or more, and preferably 0.8 to 1.0 nm. The arithmetic mean roughness (Ra) measured on the cross section of the irregularities may be 0.6 to 2.0 nm, and preferably 0.8 to 1.0 nm. When the arithmetic mean roughness (Ra) is a predetermined value or less, the transparency of the antifouling member 10 can be ensured. Furthermore, when the arithmetic mean roughness (Ra) is a predetermined value or more, the antifouling layer 130 can be more firmly held. In particular, when the arithmetic mean roughness (Ra) falls within a certain range, the irregularities of the irregularity-forming layer and the antifouling layer 130 are firmly bonded to each other by an anchor effect, and the holding power of the antifouling layer 130 can be strengthened.

[0039] The root mean square roughness (RMS) measured on the plane of the irregularities may be 0.8 to 2.0 nm, preferably 0.9 to 1.5 nm. The root mean square roughness (RMS) measured on the cross section of the irregularities may be 0.7 to 3.0 nm, preferably 0.9 to 1.5 nm. When the root mean square roughness (RMS) is a predetermined value or less, the transparency of the antifouling member 10 can be ensured. Furthermore, when the root mean square roughness (RMS) is a predetermined value or more, the antifouling layer 130 can be more firmly held. In particular, when the root mean square roughness (RMS) falls within a certain range, the irregularities of the irregularity-forming layer and the antifouling layer 130 are firmly bonded to each other through an anchor effect, thereby strengthening the holding power of the antifouling layer 130.

[0040] The maximum height difference (PV) measured on the plane of the irregularities may be 5 to 15 nm, preferably 8 to 12 nm. The maximum height difference (PV) measured on the cross section of the irregularities may be 4 to 8 nm, preferably 3 to 7 nm. If the maximum height difference (PV) is a predetermined value or less, the transparency of the antifouling member 10 can be ensured. Furthermore, if the maximum height difference (PV) is a predetermined value or more, the antifouling layer 130 can be more firmly held. In particular, if the maximum height difference (PV) falls within a certain range, the irregularities of the irregularity-forming layer and the antifouling layer 130 are firmly bound to each other by an anchor effect, thereby strengthening the holding power of the antifouling layer 130.

[0041] The antifouling layer 130 is formed on the side of the irregularity-forming layer 120 opposite the substrate 110 (i.e., on the outermost surface of the antifouling member 10) and prevents deposits such as dirt from adhering to the surface of the antifouling member 10. The antifouling layer 130 may be formed at least in the recesses among the irregularities of the irregularity-forming layer 120. For example, as shown in FIG. 1 , the antifouling layer 130 may be formed only in the recesses.

[0042] Alternatively, the antifouling layer 130 may be formed not only on the recessed portions but also on the protruding portions. In this case, the antifouling layer 130 on the protruding portions may be partially or completely peeled off due to transportation, use, wiping off of deposits, etc. of the product. Even in such a case, the antifouling layer 130 is firmly held in place by the recessed portions. Therefore, the antifouling performance of the antifouling member 10 can be maintained.

[0043] The antifouling layer 130 may be provided on at least the bottom surfaces of the recesses and / or the upper surfaces of the protrusions. The antifouling layer 130 may be provided on the entire or part of the side surfaces of the recesses and / or protrusions, or may not be provided at all.

[0044] The height in the normal direction (vertical direction in FIG. 1 ) of one surface of the antifouling layer 130 formed in the recesses of the unevenness-forming layer 120 may not exceed the convex portions of the unevenness of the unevenness-forming layer 120. For example, it is desirable that the height of the antifouling layer 130 in the recesses does not exceed the convex portions in at least about half of the recesses. In the example of FIG. 1 , the height in the normal direction of one surface of the antifouling layer 130 formed in the recesses is the same as the height of the convex portions of the unevenness-forming layer 120 (i.e., flush with the upper surfaces of the convex portions). Furthermore, the thickness of the antifouling layer 130 on the recesses is preferably 1 to 10 nm.

[0045] The antifouling performance of the antifouling layer 130 is exhibited in the surface portion, but if the antifouling layer 130 in the recessed portions is too thick, it may cause haze (clouding) of the antifouling member. By not making the antifouling layer 130 in the recessed portions too thick, haze (clouding) of the antifouling member can be prevented. Note that the thick portions of the antifouling layer 130 on the convex portions are relatively easily worn away by wiping or the like, so the problem of haze (clouding) is unlikely to occur.

[0046] The antifouling layer 130 may be formed of a material that is oil-repellent and / or water-repellent. For example, the antifouling layer 130 may contain a fluorine-containing silane compound. Examples of the fluorine-containing silane compound include a perfluoropolyether-containing silane compound, a perfluoroalkyl group-containing silane compound, and an isocyanuric skeleton-containing silane compound. Details of the material of the antifouling layer 130 will be described later.

[0047] The antifouling member 10 may have a contact angle of 105 to 120° when water comes into contact with one surface (for example, the antifouling layer 130 side). This allows the antifouling member 10 to exhibit water repellency and exhibit antifouling performance. Furthermore, the antifouling member 10 may have a contact angle of 90° or more after Abrasion Test 1 and / or Abrasion Test 2, which will be described later. This allows the antifouling member 10 to exhibit antifouling performance for a long period of time.

[0048] The antifouling member 10 may have a pencil hardness of HB or higher on one side (e.g., the side facing the antifouling layer 130), which allows the antifouling member 10 to maintain sufficient abrasion resistance to maintain the antifouling layer 130 for a longer period of time.

[0049] The antifouling member 10 may have a ΔHaze of 5 or less on one surface (e.g., the antifouling layer 130 side) in a Taber abrasion test according to ASTM D1044. This enables the antifouling member 10 to retain the antifouling layer 130 for a longer period of time and to maintain sufficient abrasion resistance to maintain transparency.

[0050] In the embodiment of Fig. 2, the antifouling member 10 includes a substrate 110 and an antifouling layer 130. In Fig. 2, the unevenness-forming layer 120 is not present, and unevenness is provided on the surface of the substrate 110. This results in direct contact between the substrate 110 and the antifouling layer 130. In the embodiment of Fig. 2, the unevenness firmly holds the antifouling layer 130, thereby achieving the same effect as in the embodiment of Fig. 1. The matters described in Fig. 1, such as the material and shape of the substrate 110 and the antifouling layer 130, as well as the size, contact angle, hardness, etc. of the unevenness, also apply to the embodiment of Fig. 2, and therefore will not be described again.

[0051] 1 and 2, the antifouling member 10 includes the substrate 110 and the antifouling layer 130 (and the roughness-forming layer 120 in FIG. 1), but other layers may also be provided. For example, the antifouling member 10 may be provided with layers such as a primer layer, an antireflection layer, an antiglare layer, an insulating layer, an adhesive layer, a release layer, a polarizing layer, and / or a retardation layer, as needed.

[0052] 3 shows an example of a flow chart of a method for manufacturing the antifouling member 10 of this embodiment. The antifouling member 10 may be manufactured by performing at least a part of S100 to S200.

[0053] In S100, nano-order irregularities are formed on the surface of the substrate 110. The substrate 110 may be the one described with reference to Figures 1 and 2. For example, the irregularities may be formed on the substrate 110 by providing an irregularity-forming layer 120 on which nano-order irregularities are formed on the substrate 110.

[0054] 4 shows an example of S100 in the flow of Fig. 3 when providing the irregularity forming layer 120. S100 in Fig. 3 may be executed by performing the processes of S110 to S130 in Fig. 4.

[0055] In S110, the resin composition for forming irregularities is applied onto the substrate 110. The resin composition for forming irregularities may be an organosiloxane-based hard coating agent having a T unit structure and a Q unit structure.

[0056] The Q unit structure may be contained in the resin composition for forming irregularities as silica gel particles (colloidal silica). The silica gel particles will later give the shape of the convex portions of the irregularities, and may preferably have a diameter of 1 to 100 nm, preferably 10 to 50 nm, and more preferably 10 to 20 nm. Here, the diameter may be the median diameter D50, which is the particle size at which the cumulative volume becomes 50% by volume when the volume-based particle size distribution is measured by a laser diffraction / scattering particle size distribution measurement method.

[0057] The T unit structure may be contained in the resin composition for forming irregularities as an organosilsesquioxane polymer. The Q unit structure may be uniformly dispersed in a matrix of the T unit structure. The Q unit structure may be contained in an amount of 5 to 50 wt %, preferably 15 to 35 wt %, based on the sum of the T unit structure and the Q unit structure.

[0058] For example, a resin composition for forming unevenness containing a T unit structure and a Q unit structure can be obtained by hydrolyzing colloidal silica and an alkyltrialkoxysilane (e.g., methyltrimethoxysilane) and then condensing them.

[0059] A skeleton having an ultraviolet absorbing function may be at least partially incorporated into the T unit structure and / or the Q unit structure. Examples of skeletons having an ultraviolet absorbing function include 4,6-dibenzoyl-2-(3-trialkoxysilylalkyl)resorcinol (specifically, 4,6-dibenzoyl-2-(3-triethoxysilylpropyl)resorcinol, etc., as described in JP-A-7-278525, and hydroxybenzophenone-based compounds as described in JP-A-57-21476 and JP-A-57-21432. Examples of resin compositions for forming irregularities that can be used include Hard Coat AS4700, AS4700F, PHC587C, and PHC587C2 manufactured by Momentive Corporation.

[0060] The coating method may be various coating methods such as dip coating, spin coating, flow coating, spray coating, roll coating, and gravure coating, or printing methods such as letterpress printing, gravure printing, lithographic printing, reverse printing, and inkjet printing.

[0061] The thickness of the applied resin composition for forming irregularities may be 1 to 20 μm, preferably 3 to 10 μm.

[0062] In S110, before applying the resin composition for forming unevenness, a primer composition for improving adhesion between the substrate 110 and the resin composition for forming unevenness may be applied to the substrate 110. For example, the primer composition may be an acrylic resin composition, a polyester resin composition, a polyurethane resin composition, an epoxy resin composition, a melamine resin composition, a polyolefin resin composition, or a urethane acrylate resin composition.

[0063] Next, in S120, the resin composition for forming projections and recesses applied in S110 is dried. For example, heat curing may be performed at a temperature of 100 to 150°C, preferably 120 to 130°C, for 10 to 120 minutes, preferably 30 to 60 minutes. Drying may be performed using a hot air drying oven, a hot plate, an infrared heater, or the like.

[0064] Next, in S130, the roughness is formed on the dried resin composition for forming roughness. For example, the roughness is formed by exposing the resin composition for forming roughness to light. This is because the T unit structure of the resin composition for forming roughness is converted to silica (SiO ２ ), which causes volume shrinkage. Specifically, ozone and active oxygen radicals are generated from oxygen in the atmosphere by irradiation with UV light, and these react with the Si-alkyl group contained in the T unit structure. As a result, the Si-alkyl group contained in the T unit structure is decomposed into a silanol group and an aldehyde, and two silanol groups are further condensed to form silica (SiO ２ The aldehyde further reacts with water to form CO ２ In this way, the T unit structure is decomposed into silica (SiO ２ When the surface is modified to the desired shape, volume shrinkage occurs, and the areas where volume shrinkage occurs become depressed, forming recesses.

[0065] Depending on the exposure conditions, silica (SiO ２ It is believed that there are components that remain as T structural units without being modified to the Q structural unit. As a result, the convex portions of the unevenness are composed of Q structural units, and the concave portions of the unevenness contain Q structural units and T structural units.

[0066] On the other hand, the Q unit structure (colloidal silica) does not undergo chemical changes or volume shrinkage upon exposure to light. As a result, recesses are formed only in areas of the layer of the resin composition for forming irregularities that contain a large amount of T unit structures, and protrusions are formed in areas that contain a large amount of Q unit structures. In this way, an irregularity-forming layer 120 having irregularities is formed.

[0067] Silanol groups remain on the surface of the unevenness-forming layer 120 formed in this manner. In particular, in the recesses, some of the silanol groups decomposed from the T unit structures remain without condensation. In addition, some Si-alkyl groups derived from the T unit structures remain in the recesses. As a result, the composition ratio of carbon atoms contained in the recesses is higher than that of the protrusions. As a result of the large number of carbon atoms and silanol groups remaining in the recesses, they bond more strongly to the antifouling layer 130 containing a perfluoropolyether-containing silane compound, etc., thereby increasing the durability of the antifouling layer 130. The molar concentration of carbon atoms can be measured using an X-ray photoelectron spectroscopy analyzer.

[0068] The light source used for exposure may be any light source capable of modifying the T unit structure to silica, and may have a wavelength of, for example, about 150 to 190 nm. Specifically, an excimer lamp, an excimer laser, F ２ The exposure may be carried out using a laser or the like.

[0069] The exposure was performed at an integrated illuminance of 300 mJ / cm ２ The irradiation may be performed so that the cumulative illuminance is 1000 mJ / cm or more. ２ If it is less than this, the decomposition and condensation of the T unit structure may be insufficient, and the unevenness may not be formed sufficiently.

[0070] The exposure was performed at an integrated illuminance of 6000 mJ / cm ２ The dose may be set to 6000 mJ / cm or less. ２ If the integrated illuminance exceeds 6000 mJ / cm, there may not be enough silanol groups remaining on the surface of the recesses, resulting in insufficient adhesion to the antifouling layer 130. ２ Even if the integrated illuminance is more than 6000 mJ / cm 2 , the unevenness-forming layer 120 itself is formed, which sufficiently contributes to improving the durability of the antifouling layer. Therefore, it is not necessary to limit the integrated illuminance to 6000 mJ / cm 2 . ２ There is no need to do the following:

[0071] 4, the unevenness-forming layer 120 is obtained by exposing the organosiloxane-based hard coating agent to light, but this method is not limited to this. The unevenness-forming layer 120 may be obtained by forming nano-order unevenness by performing nanoimprinting, photolithography, plasma treatment, laser treatment, or the like on a thin film formed from a resin material or the like.

[0072] 4, S100 may be performed by forming projections and recesses on the substrate 110. For example, the substrate 110 may be subjected to nanoimprinting, photolithography, plasma treatment, laser treatment, or the like to form the desired projections and recesses. In this case, the antifouling member 10 shown in FIG. 2 is formed. After S100, the process of S200 is performed.

[0073] In S200, the antifouling layer 130 is formed on the unevenness formed in S100. For example, the antifouling layer 130 may be formed by forming a layer of a fluorine-containing silane compound having oil and / or water repellency on the unevenness. The antifouling layer 130 may be formed by applying a composition containing a fluorine-containing silane compound onto the unevenness and drying it.

[0074] Examples of the fluorine-containing silane compound include perfluoroalkyl group-containing silane compounds (particularly perfluoropolyether-containing silane compounds), isocyanuric skeleton-containing silane compounds, and the like.

[0075] An example of the perfluoroalkyl group-containing silane compound is a compound represented by the following formula (I): [A] ｂ１ Q ２ [B] ｂ２ (I) [wherein: Q ２ is a linking group having a valence of (b1+b2), and A is R ｆ３ -O-R ｆ２ -, and R ｆ２ is a poly(oxyfluoroalkylene) chain, R ｆ３ is a perfluoroalkyl group, and B is one -R １２ -(SiR ２ ｒ X ２３－ｒ ) and is a monovalent group containing no fluorine atom, R １２ is a hydrocarbon group having 2 to 10 carbon atoms which may have an etheric oxygen atom between carbon atoms or at the end opposite to the end to which Si is bonded, or which may have —NH— between carbon atoms, ２ are each independently a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent, ２ are each independently a hydroxyl group or a hydrolyzable group, r is an integer from 0 to 2, and Q ２ and B does not contain a cyclic siloxane structure, b1 is an integer of 1 to 3, and b2 is an integer of 2 to 9, and when b1 is 2 or more, b1 As may be the same or different, and b2 Bs may be the same or different.

[0076] In formula (I), A is R ｆ３ -O-R ｆ２ - is a group represented by the formula:

[0077] R ｆ３ is a perfluoroalkyl group, preferably having 1 to 20 carbon atoms, more preferably 1 to 6 carbon atoms. ｆ３ may be linear or branched. Among them, the linear group: CF ３ (CF ２ ) ｍ３－１ (wherein m3 is 1 to 20, preferably 1 to 6), and more preferably CF ３ - or CF ３ (CF ２ ) ２ - and especially CF ３ (CF ２ ) ２ - is preferred.

[0078] R ｆ２ is a poly(oxyfluoroalkylene) chain. ｆ２ For example, -(C ｘ F ２ｘ O) ｙ -(x is an integer from 1 to 6, y is an integer of 2 or more, and each -C ｘ F２ｘ The O- units may be the same or different. ｘ F ２ｘ The O-unit may be linear or branched, for example, -CF ２ CF ２ CF ２ CF ２ CF ２ CF ２ O-, -CF ２ CF ２ CF ２ CF ２ CF ２ O-, -CF ２ CF ２ CF ２ CF ２ O-, -CF ２ CF ２ CF ２ O-, -CF(CF ３ )CF ２ O-, -CF ２ CF ２ O-, -CF ２ O-. y can be appropriately adjusted depending on the desired number average molecular weight. The preferred upper limit of y is 200.

[0079] R ｆ２ may be a combination of a plurality of units, and in this case, each unit may be present in any of a block, alternating, or random configuration. For example, from the viewpoint of excellent light resistance, -CF ２ CF ２ CF ２ CF ２ CF ２ CF ２ O-, -CF ２ CF ２ CF ２ CF ２ CF ２ O-, -CF ２ CF ２ CF ２ CF ２ It is preferable that the compound contains —O—, and the proportion of these structures present is preferably large. From the viewpoint of ease of synthesis, —CF ２ CF ２ CF ２ CF ２ O- and -CF ２CF ２ -CF, a unit combining O- and ２ CF ２ O-CF ２ CF ２ CF ２ CF ２ It is O-.

[0080] R ｆ２ Specifically, -(CF ２ CF ２ CF ２ CF ２ CF ２ CF ２ O) ｎ３ -(CF ２ CF ２ CF ２ CF ２ CF ２ O) ｎ４ -(CF ２ CF ２ CF ２ CF ２ O) ｎ５ -(CF ２ CF ２ CF ２ O) ｎ６ -(CF(CF ３ )CF ２ O) ｎ７ -(CF ２ CF ２ O) ｎ８ -(CF ２ O) ｎ９ - (wherein n3, n4, n5, n6, n7, n8 and n9 each independently represent an integer of 0 or more, the sum of n3, n4, n5, n6, n7, n8 and n9 is 2 or more, and each repeating unit may be present in any of block, alternating or random configuration).

[0081] R ｆ２ As for {(CF ２ O) ｎ１１ (CF ２ CF ２ O) ｎ１２}, (CF ２ CF ２ O) ｎ１３ , (CF ２ CF ２ CF ２ O)ｎ１４ , (CF ２ CF ２ O-CF ２ CF ２ CF ２ CF ２ O) ｎ１５ is preferred, and {(CF ２ O) ｎ１１ (CF ２ CF ２ O) ｎ１２}, (CF ２ CF ２ CF ２ O) ｎ１４ where n11 is an integer of 1 or more, n12 is an integer of 1 or more, n11+n12 is an integer of 2 to 200, and n11 CFs ２ O and n12 CFs ２ CF ２ The bonding order of O is not limited. n13 and n14 are integers of 2 to 200, and n15 is an integer of 1 to 100.

[0082] In formula (I), R ｆ３ -O-R ｆ２ The number (b1) of groups A represented by - is an integer of 1 to 3. In formula (I), when a plurality of groups A are present, the groups A may be the same or different. The group A and the perfluoroalkyl group in the fluoroalkylsilane compound are groups that contribute to the water repellency of the resulting surface treatment layer. When the perfluoroalkyl group-containing silane compound has a plurality of groups A, R ｆ３ -O-R ｆ２ This is preferable in that the density of the - groups becomes high and the abrasion resistance of the surface treatment layer becomes excellent.

[0083] In formula (I), the group B is one -R １２ -(SiR ２ ｒ X ２ ３－ｒ ) (hereinafter referred to as “Group (B ａ ) at its terminal and does not contain a cyclic siloxane structure or a fluorine atom.

[0084] The group B is specifically —Y ａ -R １２ -(SiR ２ ｒX ２ ３－ｒ ) is a group represented by the formula: ａ - to form the group (B ａ ) and Q ２ are concatenated. ａ Y is a single bond or a divalent organic group that does not contain a cyclic siloxane structure or a fluorine atom. ａ is, for example, an alkylene group (e.g., an alkylene or arylene group having 8 to 16 carbon atoms) containing an arylene group such as a phenylene group having 6 to 8 carbon atoms at its terminal, a divalent group in which an alkylene group (e.g., 1 to 20 carbon atoms) is bonded to a silalkylene structure (e.g., 1 to 10 carbon atoms, 2 to 10 Si atoms) or a silarylene structure (e.g., 1 to 10 carbon atoms, 2 to 10 Si atoms), and the group (B ａ The terminal on the Y ) side is other than an alkylene group. ａ Q to which ２ The atoms Y are atoms that constitute the main chain, and specific examples thereof include Si, C, and N. ａ is preferably a single bond.

[0085] R １２ is a hydrocarbon group having 2 to 10 carbon atoms which may have an etheric oxygen atom between carbon atoms or at the end opposite to the bond to Si, or which may have -NH- between carbon atoms. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ -, -OCH ２ CH ２ CH ２ - (where the right side is bonded to Si) is preferred, and in terms of excellent light resistance of the water-repellent film, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ In formula (I), R of the group B is preferably 0 or 1. １２may or may not all be the same group.

[0086] X ２ is a hydroxyl group or a hydrolyzable group, and the hydrolyzable group is １ The examples and preferred embodiments of the hydrolyzable group in the above are applicable. r is an integer of 0 to 2, and from the viewpoint of excellent adhesion and durability, 0 or 1 is preferred, and 0 is more preferred. X ２ If there are multiple X ２ may be the same or different, but are preferably the same in terms of availability.

[0087] R ２ is a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms, and the hydrocarbon group may contain a substituent. Examples of the hydrocarbon group include linear or branched alkyl groups. Among these, from the viewpoint of availability, linear or branched alkyl groups having 1 to 4 carbon atoms are preferred, and methyl or ethyl groups are more preferred. Examples of the substituent include halogen atoms (e.g., chlorine atoms). The R to which Si is bonded ２ The number r is an integer from 0 to 2. ２ If there are multiple R ２ may be the same or different, but are preferably the same in terms of availability.

[0088] In formula (I), the number of groups B represented by b2 is an integer of 2 to 9. Therefore, the number of groups (B ａ The number of groups (B) is 2 to 9. ａ ) is a group that contributes to the light resistance and abrasion resistance of the resulting water-repellent film. ａ The number of ) is preferably 2 to 4 in view of excellent light resistance and abrasion resistance of the resulting water-repellent film.

[0089] The multiple groups B contained in the perfluoroalkyl group-containing silane compound may be the same or different. ａ ) may be the same or different.

[0090] In formula (I), Q ２ is a (b1+b2)-valent linking group. ２ is, for example, a hydrocarbon group, which may have an ester bond, an ether bond, an amide bond, a urethane bond, a phenylene group, -S-, a divalent amino group, a silalkylene structure, a silarylene structure, or a siloxane structure (excluding cyclic siloxane structures) at the terminal or between carbon atoms, and a hydrogen atom of the hydrocarbon group may be substituted with a fluorine atom. A hydrogen atom of the hydrocarbon group may be substituted with a hydroxyl group, and the number of substituted hydroxyl groups is preferably 1 to 5. The hydrocarbon group may be linear or branched. Q ２ The number of carbon atoms in the group is preferably 1 to 20, and more preferably 1 to 10.

[0091] Furthermore, Q ２ In the formula (I), the group A and the group B may be bonded to the same atom, but it is preferable that they are bonded to different atoms, and it is more preferable that the bonded atoms are as far apart as possible within the molecule.

[0092] Also, Q ２ is directly bonded to an atom other than the end of the molecular chain, -SiR ０ ｒ１ X ４ ３－ｒ１ (R ０ , X ４ , and r1 are each a group (B ａ ) R ２ , X ２ ) as the perfluoroalkyl group-containing silane compound, ａ It is preferable that the perfluoroalkyl group-containing silane compound does not have a hydrolyzable silyl group other than —SiR ０ ｒ１ X ４ ３－ｒ１ When the -SiR ０ ｒ１ X ４ ３－ｒ１ is SiR of compound (1) １ ｐ X １ ３－ｐ and a perfluoroalkyl group-containing silane compound, SiR２ ｒ X ２ ３－ｒ When calculating the molar ratio of SiR ２ ｒ X ２ ３－ｒ shall not be included in the

[0093] In one embodiment, the perfluoroalkyl group-containing silane compound is represented by the following formulae (A1), (A2), (B1), (B2), (C1), and (C2):

[0094] wherein PFPE, at each occurrence, independently represents a group of the formula: -(OC ４ F ８ ) ａ - (OC ３ F ６ ) ｂ - (OC ２ F ４ ) ｃ -(OCF ２ ) ｄ - (wherein a, b, c, and d each independently represent an integer of 0 to 200, the sum of a, b, c, and d is at least 1, and the order of occurrence of each repeating unit enclosed in parentheses with the subscript a, b, c, or d is arbitrary in the formula); Rf each independently represents an alkyl group having 1 to 16 carbon atoms which may be substituted with one or more fluorine atoms; R ２１ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group; R ２２ each occurrence independently represents a hydrogen atom or an alkyl group having 1 to 22 carbon atoms; n1 is (—SiR ２１ ｎ１ R ２２ ３－ｎ１ ) units are independently an integer of 0 to 3; provided that in formulas (A1) and (A2), at least one n1 is an integer of 1 to 3; X ５ each independently represents a single bond or a divalent to decavalent organic group; each independently represents an integer of 1 to 9; each independently represents an integer of 1 to 9; X７ each independently represents a single bond or a divalent to decavalent organic group; each γ independently represents an integer of 1 to 9; each γ' independently represents an integer of 1 to 9; R ａ is independently at each occurrence -Z １ -SiR ７１ ｐ１ R ７２ ｑ１ R ７３ ｒ１ represents; Z １ represents, independently in each occurrence, an oxygen atom or a divalent organic group; R ７１ represents, independently at each occurrence, R ａ' represents; R ａ' is R ａ and R ａ Medium, Z １ The number of Si atoms linearly linked via R groups is at most 5; ７２ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group; R ７３ each occurrence independently represents a hydrogen atom or a lower alkyl group; each occurrence independently represents an integer of 0 to 3; each occurrence independently represents an integer of 0 to 3; each occurrence independently represents an integer of 0 to 3; and each occurrence independently represents an integer of 0 to 3; provided that in formulas (B1) and (B2), at least one q1 is an integer of 1 to 3; R ｂ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group; R ｃ each occurrence independently represents a hydrogen atom or a lower alkyl group; k1 each occurrence independently represents an integer from 1 to 3; l1 each occurrence independently represents an integer from 0 to 2; m1 each occurrence independently represents an integer from 0 to 2; provided that in the unit enclosed in parentheses with γ, the sum of k1, l1 and m1 is 3; X ９each independently represents a single bond or a divalent to decavalent organic group; each δ independently represents an integer of 1 to 9; each δ' independently represents an integer of 1 to 9; R ｄ is independently at each occurrence -Z ２ -CR ８１ ｐ２ R ８２ ｑ２ R ８３ ｒ２ represents; Z ２ represents, independently in each occurrence, an oxygen atom or a divalent organic group; R ８１ represents, independently at each occurrence, R ｄ' represents; R ｄ' is R ｄ and R ｄ Medium, Z ２ The number of Cs linked in a linear chain via R groups is at most 5; ８２ is independently at each occurrence -Y-SiR ８５ ｎ２ R ８６ ３－ｎ２ Y independently in each occurrence represents a divalent organic group; R ８５ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group; R ８６ represents, independently in each occurrence, a hydrogen atom or a lower alkyl group; n2 represents (—Y—SiR ８５ ｎ２ R ８６ ３－ｎ２ ) units independently represent an integer of 0 to 3; provided that in formulas (C1) and (C2), at least one n2 is an integer of 1 to 3; R ８３ each occurrence independently represents a hydrogen atom, a hydroxyl group, or a lower alkyl group; p2 each occurrence independently represents an integer of 0 to 3; q2 each occurrence independently represents an integer of 0 to 3; r2 each occurrence independently represents an integer of 0 to 3; R ｅ is independently at each occurrence -Y-SiR ８５ ｎ２ R８６ ３－ｎ２ represents; R ｆ are each independently in each occurrence a hydrogen atom, a hydroxyl group, or a lower alkyl group; k2 is each independently in each occurrence an integer of 0 to 3; l2 is each independently in each occurrence an integer of 0 to 3; m2 is each independently in each occurrence an integer of 0 to 3; with the proviso that in formulas (C1) and (C2), at least one q2 is 2 or 3, or at least one l2 is 2 or 3.

[0095] Formulas (A1) and (A2):

[0096]

[0097] In the above formulas (A1) and (A2), PFPE is independently represented by -(OC ６ F １２ ) ａ - (OC ５ F １０ ) ｂ - (OC ４ F ８ ) ｃ - (OC ３ F ６ ) ｄ - (OC ２ F ４ ) ｅ -(OCF ２ ) ｆ - is a group represented by the formula. In the formula, a, b, c, d, e, and f are each independently an integer of 0 or more and 200 or less, and the sum of a, b, c, d, e, and f is at least 1. Preferably, the sum of a, b, c, d, e, and f is 5 or more, more preferably 10 or more. Preferably, the sum of a, b, c, d, e, and f is 200 or less, more preferably 200 or less, for example, 10 or more and 200 or less, more specifically 10 or more and 100 or less. Furthermore, the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.

[0098] The above a and b are each preferably 0 or more and 30 or less, and may be 0.

[0099] In one aspect, the above a, b, c, and d are each independently preferably an integer of 0 or more and 30 or less, more preferably an integer of 20 or less, particularly preferably an integer of 10 or less, even more preferably an integer of 5 or less, and may be 0.

[0100] In one embodiment, the sum of a, b, c and d is preferably 30 or less, more preferably 20 or less, even more preferably 10 or less, and particularly preferably 5 or less.

[0101] In one embodiment, the sum of e and f is preferably 30 or more, more preferably 40 or more, and even more preferably 50 or more.

[0102] These repeating units may be linear or branched, but are preferably linear. For example, -(OC ６ F １２ )- is -(OCF ２ CF ２ CF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ CF ２ CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ CF ２ CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF ２ CF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF ２ CF ２ CF (CF ３))-, etc., but preferably -(OCF ２ CF ２ CF ２ CF ２ CF ２ CF ２ )-. -(OC ５ F １０ )- is -(OCF ２ CF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF ２ CF (CF ３ ))-, etc., but preferably -(OCF ２ CF ２ CF ２ CF ２ CF ２ )-. -(OC ４ F ８ )- is -(OCF ２ CF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ CF ２ ) -, -(OCF ２ CF (CF ３ )CF ２ ) -, -(OCF ２ CF ２ CF (CF ３ )) -, -(OC(CF ３ ) ２ CF ２ ) -, -(OCF ２ C (CF ３ ) ２ )-,-(OCF(CF ３)CF(CF ３ ))-,-(OCF(C ２ F ５ )CF ２ )- and -(OCF ２ CF (C ２ F ５ ))-, but preferably -(OCF ２ CF ２ CF ２ CF ２ )-. -(OC ３ F ６ )- is -(OCF ２ CF ２ CF ２ )-,-(OCF(CF ３ )CF ２ )- and -(OCF ２ CF (CF ３ ))-, but preferably -(OCF ２ CF ２ CF ２ )-. Also, -(OC ２ F ４ )- is -(OCF ２ CF ２ )- and -(OCF(CF ３ ))-, but preferably -(OCF ２ CF ２ )-.

[0103] In one embodiment, the PFPE is —(OC ３ F ６ ) ｄ - (wherein d is an integer of 1 or more and 200 or less, preferably 5 or more and 200 or less, more preferably 10 or more and 200 or less). Preferably, the PFPE is -(OCF ２ CF ２ CF ２ ) ｄ -(wherein d is an integer of 1 or more and 200 or less, preferably 5 or more and 200 or less, more preferably 10 or more and 200 or less) or -(OCF(CF ３ )CF ２ ) ｄ- (wherein d is an integer of 1 or more and 200 or less, preferably 5 or more and 200 or less, more preferably 10 or more and 200 or less). More preferably, the PFPE is -(OCF ２ CF ２ CF ２ ) ｄ - (wherein d is an integer of 1 or more and 200 or less, preferably 5 or more and 200 or less, more preferably 10 or more and 200 or less).

[0104] In another embodiment, the PFPE is -(OC ４ F ８ ) ｃ - (OC ３ F ６ ) ｄ - (OC ２ F ４ ) ｅ -(OCF ２ ) ｆ -(wherein c and d each independently represent an integer of 0 or more and 30 or less, e and f each independently represent an integer of 1 or more and 200 or less, preferably 5 or more and 200 or less, more preferably 10 or more and 200 or less, the sum of c, d, e and f is at least 5 or more, preferably 10 or more, and the order of occurrence of each repeating unit enclosed in parentheses with the subscript c, d, e or f is arbitrary in the formula). Preferably, PFPE is -(OCF ２ CF ２ CF ２ CF ２ ) ｃ -(OCF ２ CF ２ CF ２ ) ｄ -(OCF ２ CF ２ ) ｅ -(OCF ２ ) ｆ - is.

[0105] In one embodiment, the PFPE is -(OC ２ F ４ ) ｅ -(OCF ２ ) ｆ-(wherein e and f each independently represent an integer of 1 or more and 200 or less, preferably 5 or more and 200 or less, more preferably 10 or more and 200 or less, and the order of occurrence of each repeating unit enclosed in parentheses with the subscript e or f is arbitrary in the formula).

[0106] In yet another embodiment, the PFPE is —(R ６ -R ７ ) ｊ In the formula, R ６ may each independently in each occurrence represent OCF ２ or O.C. ２ F ４ and preferably OC ２ F ４ In the formula, R ７ may each independently in each occurrence represent OC ２ F ４ , O.C. ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ or a combination of two or three groups independently selected from these groups. ７ is O.C. ２ F ４ , O.C. ３ F ６ and O.C. ４ F ８ or a group selected from OC ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ or a combination of two or three groups independently selected from these groups. ２ F ４ , O.C. ３ F ６ and O.C. ４ F ８The combination of two or three groups independently selected from the group consisting of, but not limited to, —OC ２ F ４ O.C. ３ F ６ -, -OC ２ F ４ O.C. ４ F ８ -, -OC ３ F ６ O.C. ２ F ４ -, -OC ３ F ６ O.C. ３ F ６ -, -OC ３ F ６ O.C. ４ F ８ -, -OC ４ F ８ O.C. ４ F ８ -, -OC ４ F ８ O.C. ３ F ６ -, -OC ４ F ８ O.C. ２ F ４ -, -OC ２ F ４ O.C. ２ F ４ O.C. ３ F ６ -, -OC ２ F ４ O.C. ２ F ４ O.C. ４ F ８ -, -OC ２ F ４ O.C. ３ F ６ O.C. ２ F ４ -, -OC ２ F ４ O.C. ３ F ６ O.C. ３ F ６ -, -OC ２ F ４ O.C. ４ F ８ O.C. ２ F ４ -, -OC ３ F６ O.C. ２ F ４ O.C. ２ F ４ -, -OC ３ F ６ O.C. ２ F ４ O.C. ３ F ６ -, -OC ３ F ６ O.C. ３ F ６ O.C. ２ F ４ -, and -OC ４ F ８ O.C. ２ F ４ O.C. ２ F ４ The above j is an integer of 2 or more, preferably 3 or more, more preferably 5 or more, and is an integer of 100 or less, preferably 50 or less. ２ F ４ , O.C. ３ F ６ , O.C. ４ F ８ , O.C. ５ F １０ and O.C. ６ F １２ may be either linear or branched, preferably linear. In this embodiment, the PFPE is preferably -(OC ２ F ４ -OC ３ F ６ ) ｊ -or- (OC ２ F ４ -OC ４ F ８ ) ｊ - is.

[0107] In PFPE, the ratio of e to f (hereinafter referred to as the "e / f ratio") is 0.1 or more and 10 or less, preferably 0.2 or more and 5 or less, more preferably 0.2 or more and 2 or less, and even more preferably 0.2 or more and 1.5 or less. By setting the e / f ratio within the above range, the water repellency, oil repellency, and chemical resistance (e.g., durability against salt water, acid or basic aqueous solutions, acetone, oleic acid, or hexane) of the surface treatment layer obtained from the surface treatment agent of the present disclosure can be further improved. The smaller the e / f ratio, the more improved the water repellency, oil repellency, and chemical resistance of the surface treatment layer. On the other hand, by setting the e / f ratio to 0.1 or more, the stability of the compound can be further improved. The larger the e / f ratio, the more improved the stability of the compound.

[0108] In the above formula, Rf represents an alkyl group having 1 to 16 carbon atoms which may be substituted with one or more fluorine atoms.

[0109] The "alkyl group having 1 to 16 carbon atoms" in the alkyl group having 1 to 16 carbon atoms which may be substituted with one or more fluorine atoms may be linear or branched, and is preferably a linear or branched alkyl group having 1 to 6 carbon atoms, particularly 1 to 3 carbon atoms, and more preferably a linear alkyl group having 1 to 3 carbon atoms.

[0110] The Rf is preferably an alkyl group having 1 to 16 carbon atoms substituted with one or more fluorine atoms, more preferably CF ２ H-C １－１５ It is a fluoroalkylene group, and more preferably a perfluoroalkyl group having 1 to 16 carbon atoms.

[0111] The perfluoroalkyl group having 1 to 16 carbon atoms may be linear or branched, and is preferably a linear or branched perfluoroalkyl group having 1 to 6 carbon atoms, particularly 1 to 3 carbon atoms, and more preferably a linear perfluoroalkyl group having 1 to 3 carbon atoms, specifically -CF ３ , -CF ２ CF ３ , or -CF ２ CF ２ CF ３is.

[0112] In the above formula, R ２１ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group.

[0113] In the above formula, R ２２ In each occurrence, each independently represents a hydrogen atom or an alkyl group having 1 to 22 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms.

[0114] In the above formula, n1 is (—SiR ２１ ｎ１ R ２２ ３－ｎ１ ) units are independently an integer of 0 to 3, preferably 1 to 3, and more preferably 3. However, in the formula, all n1s cannot be 0 at the same time. In other words, in the formula, at least one R ２１ exists.

[0115] In the above formula, X ５ Each of X independently represents a single bond or a divalent to decavalent organic group. ５ In the compounds represented by formulas (A1) and (A2), the compound has a perfluoropolyether moiety (Rf-PFPE moiety or -PFPE- moiety) that mainly provides water repellency and surface slipperiness, and a silane moiety (specifically, -SiR ２１ ｎ１ R ２２ ３－ｎ１ ) and the linker. ５ may be any organic group as long as the compounds represented by formulas (A1) and (A2) can exist stably.

[0116] In the above formula, β is an integer of 1 to 9, and β' is an integer of 1 to 9. These β and β' are determined by X ３ In formula (A1), the sum of β and β' is determined according to the valence of X ５ For example, X ５ When X is a decavalent organic group, the sum of β and β' is 10, and for example, β can be 9 and β' can be 1, β can be 5 and β' can be 5, or β can be 1 and β' can be 9. ５is a divalent organic group, β and β' are 1. In formula (A2), β is X ５ is the value obtained by subtracting 1 from the valence value of

[0117] Above X ５ is preferably a divalent to heptavalent, more preferably a divalent to tetravalent, and even more preferably a divalent organic group.

[0118] In one embodiment, X ５ is a divalent to tetravalent organic group, β is 1 to 3, and β' is 1.

[0119] In another embodiment, X ５ is a divalent organic group, β is 1, and β' is 1. In this case, formulas (A1) and (A2) are represented by the following formulas (A1') and (A2').

[0120]

[0121] Above X ５ Examples of the group include, but are not limited to, a single bond or the following formula: -(R ３１ ) ｐ' -(X ａ ) ｑ' - [In the formula: R ３１ is independently in each occurrence a single bond, —(CH ２ ) ｓ' - or an o-, m- or p-phenylene group, preferably -(CH ２ ) ｓ' -, s' is an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3, and even more preferably 1 or 2; X ａ is independently at each occurrence -(X ｂ ) ｌ' represents -, and X ｂ each occurrence independently represents an —O—, —S—, o-, m-, or p-phenylene group, —C(O)O—, —Si(R ３３ ) ２ -, -(Si(R ３３ ) ２ O) ｍ' -Si(R ３３ ) ２ --, --CONR３４ --, --O-CONR ３４ -, -NR ３４ - and -(CH ２ ) ｎ' represents a group selected from the group consisting of -, ３３ is independently in each occurrence a phenyl group, C １－６ Alkyl group or C １－６ represents an alkoxy group, preferably a phenyl group or C １－６ R is an alkyl group, more preferably a methyl group; ３４ is independently in each occurrence a hydrogen atom, a phenyl group or C １－６ represents an alkyl group (preferably a methyl group), m' in each occurrence is independently an integer of 1 to 100, preferably an integer of 1 to 20, n' in each occurrence is independently an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, l' in each occurrence is independently an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, p' is 0, 1 or 2, q' is 0 or 1, wherein at least one of p' and q' is 1, and the order of occurrence of the repeating units enclosed in parentheses with p' or q' is arbitrary. ３１ and X ａ (Typically R ３１ and X ａ hydrogen atom) is a fluorine atom, C １－３ Alkyl group and C １－３ It may be substituted with one or more substituents selected from fluoroalkyl groups.

[0122] In one embodiment, l' is 1.

[0123] Preferably, the X ５ is -(R ３１ ) ｐ' -(X ａ ) ｑ' -R ３２ - is. R ３２ is a single bond, -(CH ２ ) ｔ'- or an o-, m- or p-phenylene group, preferably -(CH ２ ) ｔ' t' is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3. ３２ (Typically R ３２ hydrogen atom) is a fluorine atom, C １－３ Alkyl group and C １－３ It may be substituted with one or more substituents selected from fluoroalkyl groups.

[0124] Preferably, the X ５ represents a single bond or -Rf'-X １２ - [wherein, X １２ is C １－２０ alkylene group, -R ３１ -X ｃ -R ３２ - or -X ｄ -R ３２ - [wherein, R ３１ and R ３２ has the same meaning as above.] group, and Rf′ is a single bond or —(C ｌ' F ２ｌ' )-, and l′ is an integer of 1 to 4. The alkylene group may be a group represented by the formula: ｎ H ２ｎ )-structure, which may be substituted or unsubstituted, and may be linear or branched.

[0125] More preferably, the above X ５ is -X ｆ -, -X ｆ -C １－２０ an alkylene group, -X ｆ - (CH ２ ) ｓ' -X ｃ -, -X ｆ - (CH ２ ) ｓ' -X ｃ - (CH ２ ) ｔ' - -X ｆ -X ｄ - or -X ｆ -X ｄ- (CH ２ ) ｔ' In the formula, s' and t' are as defined above. ｆ is an alkylene group having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, more preferably 1 to 2 carbon atoms, such as a methylene group. ｆ The hydrogen atoms in １－３ Alkyl group and C １－３ It may be substituted, and preferably is substituted, with one or more substituents selected from fluoroalkyl groups. ｆ may be linear or branched, preferably linear.

[0126] More preferably, the above X ５ is a single bond or -Rf'-X １３ - [wherein, X １３ is C １－２０ an alkylene group, —(CH ２ ) ｓ' -X ｃ -, -(CH ２ ) ｓ' -X ｃ - (CH ２ ) ｔ' -, -X ｄ - or -X ｄ - (CH ２ ) ｔ' - (wherein s' and t' are as defined above) group, Rf' is a single bond or -(C ｌ' F ２ｌ' )-, and l′ is an integer of 1 to 4.

[0127] In the above formula, X ｃ -O-, -S-, -C(O)O-, -CONR ３４ -, -O-CONR ３４ -, -Si(R ３３ ) ２ -, -(Si(R ３３ ) ２ O) ｍ' -Si(R ３３ ) ２ -, -O-(CH２ ) u' -(Si(R ３３ ) ２ O) ｍ' -Si(R ３３ ) ２ -, -O-(CH ２ ) u' -Si(R ３３ ) ２ —O—Si(R ３３ ) ２ -CH ２ CH ２ -Si(R ３３ ) ２ —O—Si(R ３３ ) ２ -, -O-(CH ２ ) u' -Si(OCH ３ ) ２ OSi(OCH ３ ) ２ -, -CONR ３４ - (CH ２ ) u' -(Si(R ３３ ) ２ O) ｍ' -Si(R ３３ ) ２ -, -CONR ３４ - (CH ２ ) u' -N(R ３４ ) -, or -CONR ３４ -(o-, m- or p-phenylene)-Si(R ３３ ) ２ - [wherein, R ３３ , R ３４ and m' are as defined above, and u' is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3. ｃ is preferably —O—.

[0128] In the above formula, X ｄ is -S-, -C(O)O-, -CONR ３４ -, -CONR ３４ - (CH ２ ) u' -(Si(R ３３ ) ２ O)ｍ' -Si(R ３３ ) ２ -, -CONR ３４ - (CH ２ ) u' -N(R ３４ ) -, or -CONR ３４ -(o-, m- or p-phenylene)-Si(R ３３ ) ２ wherein each symbol has the same meaning as defined above.

[0129] Particularly preferably, the above X ５ is -X ｆ -, -X ｆ -C １－２０ an alkylene group, -X ｆ - (CH ２ ) ｓ' -X ｃ -, -X ｆ - (CH ２ ) ｓ' -X ｃ - (CH ２ ) ｔ' -, -X ｆ -X ｄ - or -X ｆ -X ｄ - (CH ２ ) ｔ' - [wherein, X ｆ , s' and t' are as defined above.], and X ｃ is —O— or —CONR ３４ -, X ｄ But, -CONR ３４ -, R ３４ is independently in each occurrence a hydrogen atom, a phenyl group or C １－６ It represents an alkyl group (preferably a methyl group).

[0130] In one embodiment, the X ５ is -X ｆ - (CH ２ ) ｓ' -X ｃ -, -X ｆ - (CH ２ ) ｓ' -X ｃ- (CH ２ ) ｔ' -, -X ｆ -X ｄ - or -X ｆ -X ｄ - (CH ２ ) ｔ' - [wherein, X ｆ , s' and t' are as defined above.], and X ｃ But, -CONR ３４ -, X ｄ But, -CONR ３４ -, R ３４ is independently in each occurrence a hydrogen atom, a phenyl group or C １－６ It represents an alkyl group (preferably a methyl group).

[0131] In one embodiment, the X ５ is a single bond, C １－２０ an alkylene group, —(CH ２ ) ｓ' -X ｃ - (CH ２ ) ｔ' - or -X ｄ - (CH ２ ) ｔ' wherein each symbol has the same meaning as defined above.

[0132] Preferably, the X ５ is a single bond or -Rf'-X １４ - [wherein, X １４ is C １－２０ an alkylene group, —(CH ２ ) ｓ' -O-(CH ２ ) ｔ' -, -(CH ２ ) ｓ' -(Si(R ３３ ) ２ O) ｍ' -Si(R ３３ ) ２ - (CH ２ ) ｔ' -, -(CH ２ ) ｓ' -O-(CH ２ )u' -(Si(R ３３ ) ２ O) ｍ' -Si(R ３３ ) ２ - (CH ２ ) ｔ' - or -(CH ２ ) ｓ' -O-(CH ２ ) ｔ' -Si(R ３３ ) ２ - (CH ２ ) u' -Si(R ３３ ) ２ -(C v H ２v ) - [wherein, R ３３ , m', s', t' and u' are as defined above, and v is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3.] group, Rf' is a single bond or -(C ｌ' F ２ｌ' )-, and l′ is an integer of 1 to 4.

[0133] In the above formula, -(C v H ２v )- may be a straight chain or a branched chain, for example, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -It can be.

[0134] Above X ５ The group is a fluorine atom, C １－３ Alkyl group and C １－３ Fluoroalkyl groups (preferably C １－３ and perfluoroalkyl groups).

[0135] In another embodiment, X ５ Examples of groups include the following:

[0136]

[0137] [In the formula, R ４１ are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or C １－６ an alkoxy group, preferably a methyl group; D is -Rf'-X １５ - [wherein, X １５ is -CH ２ O (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ -, -CF ２ O (CH ２ ) ３ -, -(CH ２ ) ２ -, -(CH ２ ) ３ -, -(CH ２ )4-, -CONH-(CH ２ )-, -CONH-(CH ２ ) ２ -, -CONH-(CH ２ ) ３ -, -CON(CH ３ )-(CH ２ ) ３ -, -CON(Ph)-(CH ２ ) ３ - (wherein Ph means phenyl), and

[0138] (In the formula, R ４２ are each independently a hydrogen atom, C １－６ or an alkyl group of C １－６ Rf′ represents a single bond or —(C ｌ' F ２ｌ' )-, and l' is an integer of 1 to 4.], E is a group represented by the formula: ２ ) ｎ -(n is an integer of 2 to 6), D is bonded to PFPE in the molecular main chain, and E is bonded to a group opposite to PFPE.]

[0139] Above X ５ Specific examples of the group include: a single bond, or -Rf'-X １０ - [wherein, X １０ is -CH ２ OCH ２ -, -CH ２ O (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ -, -CH ２ O (CH ２ ) ６ -, -CF ２ -CH ２ -O-CH ２ -, -CF ２ -CH ２ -O-(CH ２ ) ２ -, -CF ２ -CH ２ -O-(CH ２ ) ３ -, -CF ２ -CH ２ -O-(CH ２ ) ６ -, -CH ２ O (CH ２ ) ３ Si(CH ３ ) ２ OSi(CH ３ ) ２ (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ Si(CH ３ ) ２ OSi(CH ３ ) ２ OSi(CH ３ ) ２ (CH ２ ) ２ -, -CH ２ O (CH ２ ) ３ Si(CH ３ ) ２ O(Si(CH ３ ) ２ O) ２H ３ ) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ３ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) １０ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ O(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２０ H ３ ) ２ (CH ２ ) ２ -、 -CH ２ OCF ２ CHFOCF ２ -、 -CH ２ OCF ２ CHFOCF ２ CF ２ -、 -CH ２ OCF ２ CHFOCF ２ CF ２ CF ２ -、 -CH ２ SO ２ CF ２ CF ２ H ２ -、 -CH ２ SO ２ CF ２ CF ２OCF ２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF(CF ３ )CF ２ OCF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ -、 -CH ２ OCH ２ CF ２ CF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF ２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF(CF ３ )CF ２ OCF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF(CF ３ )CF ２ OCF２ CF ２ -、 -CH ２ OCH ２ CHFCF ２ OCF(CF ３ )CF ２ OCF ２ CF ２ CF ２ -、 -CH ２ OCF ２ CHFOCF ２ CF ２ CF ２ -C(O)NH-CH ２ -、 -CH ２ OCH ２ (CH) ２ ) ７ CH ２ Si(OCH ３ ) ２ OSi (OCH) ３ ) ２ (CH) ２ ) ２ Si(OCH ３ ) ２ OSi (OCH) ３ ) ２ (CH) ２ ) ２ -、 -CH ２ OCH ２ CH ２ CH ２ Si(OCH ３ ) ２ OSi (OCH) ３ ) ２ (CH) ２ ) ３ -、 -CH ２ OCH ２ CH ２ CH ２ Si(OCH ２ CH ３ ) ２ OSi (OCH) ２ CH ３ ) ２ (CH) ２ ) ３ -、 -CH ２ OCH ２ CH ２ CH ２ Si(OCH ３ ) ２HUNTER ３ ) ２ (CH ２ ) ２ -、 -CH ２ SO ２ CH ２ CH ２ H. ２ CH ３ ) ２ HUNTER ２ CH ３ ) ２ (CH ２ ) ２ -、 -(CH ２ ) ２ -Si(CH ３ ) ２ -(CH ２ ) ２ -、 -CH ２ -、 -(CH ２ ) ２ -、 -(CH ２ ) ３ -、 -(CH ２ ) ４ -、 -(CH ２ ) ５ -、 -(CH ２ ) ６ -、 -CF ２ -、 -(CF ２ ) ２ -、 -CF ２ -CH ２ -、 -CF ２ -(CH ２ ) ２ -、 -CF ２ -(CH ２ ) ３ -、 -CF ２ -(CH ２ ) ４ -、 -CF ２ -(CH ２ ) ５ -、 -CF ２ -(CH ２ ) ６ -、 -CO- -CONH- -CONH-CH ２ -、 -CONH-(CH ２ ) ２ -、 -CONH-(CH ２) ３ -, -CONH-(CH ２ ) ６ -, -CF ２ CONH-, -CF ２ CONHCH ２ -, -CF ２ CONH (CH ２ ) ２ -, -CF ２ CONH (CH ２ ) ３ -, -CF ２ CONH (CH ２ ) ６ -, -CON(CH ３ )-(CH ２ ) ３ -, -CON(Ph)-(CH ２ ) ３ - (wherein Ph means phenyl), -CON(CH ３ )-(CH ２ ) ６ -, -CON(Ph)-(CH ２ ) ６ - (wherein Ph means phenyl), -CF ２ -CON (CH ３ )-(CH ２ ) ３ -, -CF ２ -CON(Ph)-(CH ２ ) ３ - (wherein Ph means phenyl), -CF ２ -CON (CH ３ )-(CH ２ ) ６ -, -CF ２ -CON(Ph)-(CH ２ ) ６ - (wherein Ph means phenyl), -CONH-(CH ２ ) ２ NH (CH ２ ) ３ -, -CONH-(CH ２ ) ６ NH (CH ２ ) ３ -, -CH ２ O-CONH-(CH ２ )３ -、 -CH ２ P.S. ２ ) ６ -、 -S-(CH ２ ) ３ -、 -(CH ２ ) ２ H ２ ) ３ -、 -CONH-(CH ２ ) ３ H ３ ) ２ HUNTER ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ HUNTER ３ ) ２ HUNTER ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２ H ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ３ H ３ ) ２ (CH ２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) １０ H ３ ) ２ (CH２ ) ２ -、 -CONH-(CH ２ ) ３ H ３ ) ２ O(Si(CH ３ ) ２ O) ２０ H ３ ) ２ (CH ２ ) ２ -、 -C(O)O-(CH ２ ) ３ -、 -C(O)O-(CH ２ ) ６ -、 -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ -(CH ２ ) ２ -Si(CH ３ ) ２ -(CH ２ ) ２ -、 -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ -(CH ２ ) ２ -Si(CH ３ ) ２ -CH(CH ３ )-、 -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ -(CH ２ ) ２ -Si(CH ３ ) ２ -(CH ２ ) ３ -、 -CH ２ -O-(CH ２ ) ３ -Si(CH ３ ) ２ -(CH ２ ) ２ -Si(CH ３ ) ２ -CH(CH ３ )-CH２ -, -OCH ２ -, -O(CH ２ ) ３ -, -OCFHCF ２ -,

[0140] Rf′ is a single bond or —(C ｌ' F ２ｌ' )-, and l′ is an integer of 1 to 4.

[0141] In a more preferred embodiment, X ５ is X ｅ' represents. ｅ' represents a single bond, an alkylene group having 1 to 6 carbon atoms, -R ５１ -C ６ H ４ -R ５２ -, -R ５１ -CONR ４ -R ５２ -, -R ５１ -CONR ４ -C ６ H ４ -R ５２ -, -R ５１ -CO-R ５２ -, -R ５１ -CO-C ６ H ４ -R ５２ -, -R ５１ -SO ２ NR ４ -R ５２ -, -R ５１ -SO ２ NR ４ -C ６ H ４ -R ５２ -, -R ５１ -SO ２ -R ５２ - or -R ５１ -SO ２ -C ６ H ４ -R ５２ - is. R ５１ and R ５２R each independently represents a single bond or an alkylene group having 1 to 6 carbon atoms, and is preferably a single bond or an alkylene group having 1 to 3 carbon atoms. ４ has the same meaning as above. The alkylene group is substituted or unsubstituted, preferably unsubstituted. Examples of the substituent on the alkylene group include halogen atoms, preferably fluorine atoms. The alkylene group is linear or branched, preferably linear.

[0142] In a further preferred embodiment, X ｅ' is a single bond, -X ｆ -, an alkylene group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, -X ｆ -C １－６ Alkylene group, preferably -X ｆ -C １－３ An alkylene group, more preferably -X ｆ -C １－２ an alkylene group, ６ H ４ -R ５２' -, -CONR ４' -R ５２' -, -CONR ４' -C ６ H ４ -R ５２' -, -X ｆ -CONR ４' -R ５２' -, -X ｆ -CONR ４' -C ６ H ４ -R ５２' -, -CO-R ５２' -, -CO-C ６ H ４ -R ５２' -, -SO ２ NR ４' -R ５２' -, -SO ２ NR ４' -C ６ H ４ -R ５２' -, -SO ２ -R ５２' -, -SO ２ -C６ H ４ -R ５２' -, -R ５１' -C ６ H ４ -, -R ５１' -CONR ４' -, -R ５１' -CONR ４' -C ６ H ４ -, -R ５１' -CO-, -R ５１' -CO-C ６ H ４ -, -R ５１' -SO ２ NR ４' -, -R ５１' -SO ２ NR ４' -C ６ H ４ -, -R ５１' -SO ２ -, -R ５１' -SO ２ -C ６ H ４ -, -C ６ H ４ --CONR ４' -, -CONR ４' -C ６ H ４ -, -X ｆ -CONR ４' -, -X ｆ -CONR ４' -C ６ H ４ -, -CO-, -CO-C ６ H ４ -, -SO ２ NR ４' -, -SO ２ NR ４' -C ６ H ４ - -SO ２ - or -SO ２ -C ６ H ４ - (wherein, R ５１' and R ５２'are each independently a linear alkylene group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, and as described above, the alkylene group may be substituted or unsubstituted. Examples of the substituent of the alkylene group include a halogen atom, preferably a fluorine atom. ４' is a hydrogen atom or a methyl group.

[0143] Among the above, X ｅ' is preferably -X ｆ -, an alkylene group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, -X ｆ -C １－６ Alkylene group, preferably -X ｆ -C １－３ An alkylene group, more preferably -X ｆ -C １－２ an alkylene group, -CONR ４' -R ５２' -, -CONR ４' -C ６ H ４ -R ５２' -, -X ｆ -CONR ４' -R ５２' -, -X ｆ -CONR ４' -C ６ H ４ -R ５２' -, -R ５１' -CONR ４' -, -R ５１' -CONR ４' -C ６ H ４ -, -CONR ４' -, -CONR ４' -C ６ H ４ -, -X ｆ -CONR ４' -, -X ｆ -CONR ４' -C ６ H ４ -, -R ５１' -CONR ４' - or -R ５１' -CONR ４' -C６ H ４ -, where X ｆ , R ４' , R ５１' and R ５２' have the same meanings as above.

[0144] Among the above, X ｅ' is more preferably -CONR ４' -R ５２' -, -CONR ４' -C ６ H ４ -R ５２' -, -X ｆ -CONR ４' -R ５２' -, -X ｆ -CONR ４' -C ６ H ４ -R ５２' -, -R ５１' -CONR ４' -, -R ５１' -CONR ４' -C ６ H ４ -, -CONR ４' -, -CONR ４' -C ６ H ４ -, -X ｆ -CONR ４' - or -X ｆ -CONR ４' -C ６ H ４ -, it can be.

[0145] In this embodiment, X ｅ' Specific examples of the alkyl group include a single bond, a perfluoroalkylene group having 1 to 6 carbon atoms (for example, -CF ２ -, - (CF ２ ) ２ - etc.), an alkylene group having 1 to 6 carbon atoms, -CF ２ -C １－６ an alkylene group, —CONH—, —CONH-CH ２ -, -CONH-(CH ２ ) ２ - -CONH-(CH２ ) ３ -、 -CF ２ -CONH-、 -CF ２ P.S. ２ -、 -CF ２ P.S. ２ ) ２ -、 -CF ２ P.S. ２ ) ３ -、 -CON(CH ３ )-、 -CON(CH ３ )-CH ２ -、 -CON(CH ３ )-(CH ２ ) ２ -、 -CON(CH ３ )-(CH ２ ) ３ -、 -CF ２ -CON(CH ３ )-、 -CF ２ -CON(CH ３ )CH ２ -、 -CF ２ -CON(CH ３ )-(CH ２ ) ２ -、 -CF ２ -CON(CH ３ )-(CH ２ ) ３ -、 -CH ２ -CONH-, -CH ２ -CONH-CH ２ -、 -CH ２ -CONH-(CH ２ ) ２ -、 -CH ２ -CONH-(CH ２ ) ３ -、 -CF ２ -CH ２ -CONH-、 -CF ２ -CH ２ -CONH-CH ２ -、 -CF ２ -CH ２ -CONH-(CH ２ ) ２ -、 -CF ２ -CH ２-CONH-(CH ２ ) ３ -、 -CONH-C ６ H ４ -、 -CON(CH ３ )-C ６ H ４ -、 -CH ２ -CON(CH ３ )-CH ２ -、 -CH ２ -CON(CH ３ )-(CH ２ ) ２ -、 -CH ２ -CON(CH ３ )-(CH ２ ) ３ -、 -CON(CH ３ )-C ６ H ４ -、 -CF ２ -CONH-C ６ H ４ -、 -CF ２ -CON(CH ３ )-C ６ H ４ -、 -CF ２ -CH ２ -CON(CH ３ )-CH ２ -、 -CF ２ -CH ２ -CON(CH ３ )-(CH ２ ) ２ -、 -CF ２ -CH ２ -CON(CH ３ )-(CH ２ ) ３ -、 -CF ２ -CON(CH ３ )-C ６ H ４ -、 -CO-、 -CO-C ６ H ４ -、 -C ６ H ４ -、 -SO ２ NH-, -SO ２ H ２ -、 -SO ２ H. ２) ２ -, -SO ２ NH-(CH ２ ) ３ -, -SO ２ NH-C ６ H ４ -, -SO ２ N (CH ３ ) -, -SO ２ N (CH ３ )-CH ２ -, -SO ２ N (CH ３ )-(CH ２ ) ２ -, -SO ２ N (CH ３ )-(CH ２ ) ３ -, -SO ２ N (CH ３ )-C ６ H ４ -, -SO ２ -, -SO ２ -CH ２ -, -SO ２ - (CH ２ ) ２ -, -SO ２ - (CH ２ ) ３ - or -SO ２ -C ６ H ４ - etc.

[0146] Among the above list, preferred X ｅ' Examples of the alkylene group include an alkylene group having 1 to 6 carbon atoms, a perfluoroalkylene group having 1 to 6 carbon atoms (for example, -CF ２ -, - (CF ２ ) ２ - etc.), -CF ２ -C １－６ an alkylene group, —CONH—, —CONH-CH ２ -, -CONH-(CH ２ ) ２ -, -CONH-(CH ２ ) ３ -, -CF ２ CONH-, -CF ２ CONHCH２ -、 -CF ２ P.S. ２ ) ２ -、 -CF ２ P.S. ２ ) ３ -、 -CON(CH ３ )-、 -CON(CH ３ )-CH ２ -、 -CON(CH ３ )-(CH ２ ) ２ -、 -CON(CH ３ )-(CH ２ ) ３ -、 -CF ２ -CON(CH ３ )-、 -CF ２ -CON(CH ３ )CH ２ -、 -CF ２ -CON(CH ３ )-(CH ２ ) ２ -、 -CF ２ -CON(CH ３ )-(CH ２ ) ３ -、 -CH ２ -CONH-, -CH ２ -CONH-CH ２ -、 -CH ２ -CONH-(CH ２ ) ２ -、 -CH ２ -CONH-(CH ２ ) ３ -、 -CF ２ -CH ２ -CONH-、 -CF ２ -CH ２ -CONH-CH ２ -、 -CF ２ -CH ２ -CONH-(CH ２ ) ２ -、 -CF ２ -CH ２ -CONH-(CH ２ ) ３ -、 -CONH-C ６ H ４-, -CON(CH ３ )-C ６ H ４ -, -CH ２ -CON (CH ３ )-CH ２ -, -CH ２ -CON (CH ３ )-(CH ２ ) ２ -, -CH ２ -CON (CH ３ )-(CH ２ ) ３ -, -CON(CH ３ )-C ６ H ４ -CF ２ -CONH-C ６ H ４ -, -CF ２ -CON (CH ３ )-C ６ H ４ -, -CF ２ -CH ２ -CON (CH ３ )-CH ２ -, -CF ２ -CH ２ -CON (CH ３ )-(CH ２ ) ２ -, -CF ２ -CH ２ -CON (CH ３ )-(CH ２ ) ３ -, -CF ２ -CON (CH ３ )-C ６ H ４ -, etc.

[0147] Among the above-listed, more preferred X ｅ' Examples include -CONH-, -CONH-CH ２ -, -CONH-(CH ２ ) ２ -, -CONH-(CH ２ ) ３ -, -CF ２ CONH-, -CF ２ CONHCH ２-、 -CF ２ P.S. ２ ) ２ -、 -CF ２ P.S. ２ ) ３ -、 -CON(CH ３ )-、 -CON(CH ３ )-CH ２ -、 -CON(CH ３ )-(CH ２ ) ２ -、 -CON(CH ３ )-(CH ２ ) ３ -、 -CF ２ -CON(CH ３ )-、 -CF ２ -CON(CH ３ )CH ２ -、 -CF ２ -CON(CH ３ )-(CH ２ ) ２ -、 -CF ２ -CON(CH ３ )-(CH ２ ) ３ -、 -CH ２ -CONH-, -CH ２ -CONH-CH ２ -、 -CH ２ -CONH-(CH ２ ) ２ -、 -CH ２ -CONH-(CH ２ ) ３ -、 -CF ２ -CH ２ -CONH-、 -CF ２ -CH ２ -CONH-CH ２ -、 -CF ２ -CH ２ -CONH-(CH ２ ) ２ -、 -CF ２ -CH ２ -CONH-(CH ２ ) ３ -、 -CONH-C ６ H ４ -、 -CON(CH３ )-C ６ H ４ -, -CH ２ -CON (CH ３ )-CH ２ -, -CH ２ -CON (CH ３ )-(CH ２ ) ２ -, -CH ２ -CON (CH ３ )-(CH ２ ) ３ -, -CON(CH ３ )-C ６ H ４ -CF ２ -CONH-C ６ H ４ -, -CF ２ -CON (CH ３ )-C ６ H ４ -, -CF ２ -CH ２ -CON (CH ３ )-CH ２ -, -CF ２ -CH ２ -CON (CH ３ )-(CH ２ ) ２ -, -CF ２ -CH ２ -CON (CH ３ )-(CH ２ ) ３ - or -CF ２ -CON (CH ３ )-C ６ H ４ -, etc.

[0148] The compounds represented by the above formulae (A1) and (A2) can be produced by known methods, for example, the method described in Patent Document 1 or an improved method thereof.

[0149] Formulas (B1) and (B2):

[0150]

[0151] In the above formulae (B1) and (B2), Rf and PFPE have the same meanings as those in the above formulae (A1) and (A2).

[0152] In the above formula, X ７ Each of X independently represents a single bond or a divalent to decavalent organic group. ７ In the compounds represented by formulas (B1) and (B2), the compound has a perfluoropolyether moiety (Rf-PFPE moiety or -PFPE- moiety) that mainly provides water repellency and surface slipperiness, and a silane moiety (specifically, -SiR ａ ｋ１ R ｂ ｌ１ R ｃ ｍ１ Therefore, the X ７ may be any organic group as long as the compounds represented by formulas (B1) and (B2) can exist stably.

[0153] In the above formula, γ is an integer of 1 to 9, and γ' is an integer of 1 to 9. These γ and γ' are X ７ In formula (B1), the sum of γ and γ′ is determined according to the valence of X ７ For example, X ７ When X is a decavalent organic group, the sum of γ and γ' is 10, and for example, γ can be 9 and γ' can be 1, γ can be 5 and γ' can be 5, or γ can be 1 and γ' can be 9. ７ When X is a divalent organic group, γ and γ' are 1. In formula (B2), γ is X ７ is the value obtained by subtracting 1 from the valence value of

[0154] Above X ７ is preferably a divalent to heptavalent, more preferably a divalent to tetravalent, and even more preferably a divalent organic group.

[0155] In one embodiment, X ７ is a divalent to tetravalent organic group, γ is 1 to 3, and γ' is 1.

[0156] In another embodiment, X ７is a divalent organic group, γ is 1, and γ' is 1. In this case, formulas (B1) and (B2) are represented by the following formulas (B1') and (B2').

[0157]

[0158] Above X ７ Examples of the group include, but are not limited to, X ５ Examples of the above-mentioned examples are the same as those described above.

[0159] In the above formula, R ａ is independently at each occurrence -Z １ -SiR ７１ ｐ１ R ７２ ｑ１ R ７３ ｒ１ Represents.

[0160] During the ceremony, Z １ represents, independently in each occurrence, an oxygen atom or a divalent organic group.

[0161] Above Z １ is preferably a divalent organic group, and is a Si atom (R ａ This does not include those that form a siloxane bond with the Si atom to which the siloxane bond is bonded.

[0162] Above Z １ is preferably C １－６ Alkylene group, -(CH ２ ) ｇ -O-(CH ２ ) ｈ - (wherein g is an integer of 1 to 6, and h is an integer of 1 to 6) or -phenylene-(CH ２ ) ｉ - (wherein i is an integer from 0 to 6), more preferably C １－３ These groups are, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ alkenyl groups, and C ２－６ It may be substituted with one or more substituents selected from alkynyl groups.

[0163] In the formula, R ７１ represents, independently at each occurrence, R ａ' Represents R ａ' is R ａ It has the same meaning as:

[0164] R ａ Medium, Z １ The number of Si atoms connected in a linear chain via the group is 5 at most. ａ In this case, R ７１ If there is at least one ａ Z inside １ There are two or more Si atoms linearly linked via Z groups. １ The maximum number of Si atoms connected in a linear chain via the "R ａ Z in the middle １ The number of Si atoms linearly linked via R ａ -Z linked in a linear chain １ This is equal to the number of repeats of -Si-.

[0165] For example, ａ In the middle Z １ An example in which the Si atom is linked via a group (hereinafter simply referred to as "Z") is shown.

[0166]

[0167] In the above formula, * means the site of bonding to Si in the main chain, and ... means that a specific group other than ZSi is bonded, that is, when all three bonds of the Si atom are ..., it means the end point of the repetition of ZSi. Also, the number on the right side of Si means the number of occurrences of Si linked in a linear chain via Z groups, counted from *. That is, Si ２ The chain where the ZSi repeat ends is "R ａ Z in the middle １ The number of Si atoms linearly linked via Si groups is two. ３ , Si ４ and Si ５ The chains in which the ZSi repeat ends are called "R ａ Z in the middle １The number of Si atoms linearly linked via R groups is 3, 4, and 5. ａ There are multiple ZSi chains in the molecule, but they do not all need to be the same length, and each may be any length.

[0168] In a preferred embodiment, as shown below, ａ Z in the middle １ The number of Si atoms linearly linked via groups is 1 (left formula) or 2 (right formula) in all chains.

[0169]

[0170] In one embodiment, R ａ The number of Si atoms linearly linked via Z groups in the hydroxyl group is one or two, preferably one.

[0171] In the formula, R ７２ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group.

[0172] The term "hydrolyzable group" as used herein means a group that can undergo a hydrolysis reaction. Examples of hydrolyzable groups include -OR, -OCOR, and -O-N=C(R). ２ , -N(R) ２ , -NHR, halogen (in these formulas, R represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms), and preferably -OR (alkoxy group). Examples of R include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl group or ethyl group is more preferred. The hydroxyl group is not particularly limited, and may be one generated by hydrolysis of a hydrolyzable group.

[0173] Preferably, R ７２ is -OR (wherein R is a substituted or unsubstituted C １－３ It is more preferable that the alkyl group is a methyl group.

[0174] In the formula, R ７３are each independently a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group.

[0175] wherein p1, at each occurrence, is independently an integer from 0 to 3; q1, at each occurrence, is independently an integer from 0 to 3; and r1, at each occurrence, is independently an integer from 0 to 3, with the proviso that the sum of p1, q1, and r1 is 3.

[0176] In a preferred embodiment, R ａ R at the end of the middle ａ '(R ａ If ' does not exist, R ａ In the above formula (I), q1 is preferably 2 or more, for example, 2 or 3, and more preferably 3.

[0177] In a preferred embodiment, R ａ At least one of the terminals is -Si(-Z １ -SiR ７２ ｑ R ７３ ｒ ) ２ or -Si(-Z １ -SiR ７２ ｑ R ７３ ｒ ) ３ , preferably —Si(—Z １ -SiR ７２ ｑ R ７３ ｒ ) ３ In the formula, (-Z １ -SiR ７２ ｑ R ７３ ｒ ) units are preferably (-Z １ -SiR ７２ ３ In a further preferred embodiment, R ａ The ends of all of the １ -SiR ７２ ｑ R ７３ｒ ) ３ , preferably —Si(—Z １ -SiR ７２ ３ ) ３ It could be.

[0178] In the above formulas (B1) and (B2), at least one R ７２ exists.

[0179] In the above formula, R ｂ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group.

[0180] The above R ｂ is preferably a hydroxyl group, —OR, —OCOR, —O—N═C(R) ２ , -N(R) ２ , -NHR, halogen (in these formulas, R represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms), and preferably -OR. R includes unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, and substituted alkyl groups such as chloromethyl group. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl group or ethyl group is more preferred. The hydroxyl group is not particularly limited, but may be one generated by hydrolysis of a hydrolyzable group. More preferably, R ｂ is -OR (wherein R is a substituted or unsubstituted C １－３ It is more preferable that the alkyl group is a methyl group.

[0181] In the above formula, R ｃ are each independently a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group.

[0182] wherein k1, at each occurrence, is independently an integer from 0 to 3; l1, at each occurrence, is independently an integer from 0 to 3; and m1, at each occurrence, is independently an integer from 0 to 3, with the proviso that the sum of k1, l1, and m1 is 3.

[0183] In a preferred embodiment, k1, at each occurrence, is independently an integer from 1 to 3; l1, at each occurrence, is independently an integer from 0 to 2; and m1, at each occurrence, is independently an integer from 0 to 2.

[0184] The compounds represented by the above formulas (B1) and (B2) can be obtained, for example, by using a perfluoropolyether derivative corresponding to the Rf-PFPE- moiety as a raw material, introducing a hydroxyl group at the terminal, then introducing a group having an unsaturated bond at the terminal, reacting this group having an unsaturated bond with a silyl derivative having a halogen atom, and further introducing a hydroxyl group at the terminal of this silyl group, and reacting the introduced group having an unsaturated bond with the silyl derivative.

[0185] Formulas (C1) and (C2):

[0186]

[0187] In the above formulae (C1) and (C2), Rf and PFPE have the same meanings as those in the above formulae (A1) and (A2).

[0188] In the above formula, X ９ are each independently a single bond or a divalent to decavalent organic group. In the compounds represented by formulas (C1) and (C2), X is understood to be a linker that connects the perfluoropolyether portion (i.e., the Rf-PFPE portion or -PFPE- portion) that primarily provides water repellency and surface slipperiness, etc., to the portion that provides the ability to bond to the substrate (i.e., the group enclosed in parentheses with δ). Therefore, X may be any organic group as long as it allows the compounds represented by formulas (C1) and (C2) to exist stably.

[0189] In the above formula, δ is an integer of 1 to 9, and δ' is an integer of 1 to 9. These δ and δ' can change depending on the valence of X. In formula (C1), the sum of δ and δ' is the same as the valence of X. For example, when X is a decavalent organic group, the sum of δ and δ' is 10, and it can be, for example, δ is 9 and δ' is 1, δ is 5 and δ' is 5, or δ is 1 and δ' is 9. In addition, X ９When X is a divalent organic group, δ and δ' are 1. In formula (C2), δ is X ９ is the value obtained by subtracting 1 from the valence of

[0190] Above X ９ is preferably a divalent to heptavalent, more preferably a divalent to tetravalent, and even more preferably a divalent organic group.

[0191] In one embodiment, X ９ is a divalent to tetravalent organic group, δ is 1 to 3, and δ' is 1.

[0192] In another embodiment, X ９ is a divalent organic group, δ is 1, and δ' is 1. In this case, formulas (C1) and (C2) are represented by the following formulas (C1') and (C2').

[0193]

[0194] Above X ９ Examples of the group include, but are not limited to, X ５ Examples of the above-mentioned examples are the same as those described above.

[0195] In the above formula, R ｄ is independently at each occurrence -Z ２ -CR ８１ ｐ２ R ８２ ｑ２ R ８３ ｒ２ Represents.

[0196] During the ceremony, Z ２ represents, independently in each occurrence, an oxygen atom or a divalent organic group.

[0197] Above Z ２ is preferably C １－６ Alkylene group, -(CH ２ ) ｇ -O-(CH ２ ) ｈ - (wherein g is an integer of 0 to 6, for example, an integer of 1 to 6, and h is an integer of 0 to 6, for example, an integer of 1 to 6), or -phenylene-(CH ２ ) ｉ- (wherein i is an integer from 0 to 6), more preferably C １－３ These groups are, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ alkenyl groups, and C ２－６ It may be substituted with one or more substituents selected from alkynyl groups.

[0198] In the formula, R ８１ represents, independently at each occurrence, R ｄ' Represents R ｄ' is R ｄ It has the same meaning as:

[0199] R ｄ Medium, Z ２ The number of Cs connected in a linear chain via the group is at most 5. ｄ In this case, R ８１ If there is at least one ｄ Z inside ２ There are two or more C atoms linearly linked via Z groups. ２ The maximum number of C atoms connected in a linear chain via the "R ｄ Z in the middle ２ The number of C atoms linearly linked via R ｄ -Z linked in a linear chain ２ This is equal to the number of repetitions of -C-. ａ The same applies to the description of

[0200] In a preferred embodiment, "R ｄ Z in the middle ２ The number of C atoms linearly linked via groups is 1 (left formula) or 2 (right formula) in all chains.

[0201] In one embodiment, R ｄ Z in the middle ２ The number of carbon atoms linked in a linear chain via groups is one or two, preferably one.

[0202] In the formula, R ８２ is -Y-SiR ８５ ｎ２ R８６ ３－２ｎ Represents.

[0203] Y independently in each occurrence represents a divalent organic group.

[0204] In a preferred embodiment, Y is C １－６ Alkylene group, -(CH ２ ) ｇ' -O-(CH ２ ) ｈ' - (wherein g' is an integer of 0 to 6, for example, an integer of 1 to 6, and h' is an integer of 0 to 6, for example, an integer of 1 to 6), or -phenylene-(CH ２ ) ｉ' - (wherein i' is an integer from 0 to 6). These groups include, for example, fluorine atoms, C １－６ Alkyl group, C ２－６ alkenyl groups, and C ２－６ It may be substituted with one or more substituents selected from alkynyl groups.

[0205] In one embodiment, Y is C １－６ Alkylene group, —O—(CH ２ ) ｈ' - or -phenylene-(CH ２ ) ｉ' When Y is the above group, the light resistance, particularly the ultraviolet resistance, can be improved.

[0206] The above R ８５ represents, independently at each occurrence, a hydroxyl group or a hydrolyzable group.

[0207] The term "hydrolyzable group" as used herein means a group that can undergo a hydrolysis reaction. Examples of hydrolyzable groups include -OR, -OCOR, and -O-N=C(R). ２ , -N(R) ２, -NHR, halogen (in these formulas, R represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms), and preferably -OR (alkoxy group). Examples of R include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, and isobutyl group; and substituted alkyl groups such as chloromethyl group. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl group or ethyl group is more preferred. The hydroxyl group is not particularly limited, and may be one generated by hydrolysis of a hydrolyzable group.

[0208] Preferably, R ８５ is -OR (wherein R is a substituted or unsubstituted C １－３ alkyl group, more preferably an ethyl group or a methyl group, especially a methyl group).

[0209] The above R ８６ are each independently a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group.

[0210] n2 is (-Y-SiR ８５ ｎ２ R ８６ ３－ｎ２ Each ) unit independently represents an integer of 0 to 3, preferably an integer of 1 to 3, more preferably 2 or 3, and even more preferably 3.

[0211] The above R ８３ In each occurrence, each independently represents a hydrogen atom, a hydroxyl group, or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group. In one embodiment, R ８３ represents, independently at each occurrence, a hydrogen atom or a lower alkyl group.

[0212] wherein p2, at each occurrence, is independently an integer from 0 to 3; q2, at each occurrence, is independently an integer from 0 to 3; and r2, at each occurrence, is independently an integer from 0 to 3, with the proviso that the sum of p2, q2, and r2 is 3.

[0213] In a preferred embodiment, R ｄ R at the end of the middle ｄ '(R ｄ If ' does not exist, R ｄ In the above formula (I), q2 is preferably 2 or more, for example, 2 or 3, and more preferably 3.

[0214] In a preferred embodiment, R ｄ At least one of the terminals is —C(—Y—SiR ８５ ｑ２ R ８６ ｒ２ ) ２ or -C(-Y-SiR ８５ ｑ２ R ８６ ｒ２ ) ３ , preferably —C(—Y—SiR ８５ ｑ２ R ８６ ｒ２ ) ３ In the formula, (—Y—SiR ８５ ｑ２ R ８６ ｒ２ ) units are preferably (—Y—SiR ８５ ３ In a further preferred embodiment, R ｄ The terminals of all of the groups are -C(-Y-SiR ８５ ｑ２ R ８６ ｒ２ ) ３ , preferably —C(—Y—SiR ８５ ３ ) ３ It could be.

[0215] In the above formula, R ｅ is independently at each occurrence -Y-SiR ８５ ｎ２ R ８６ ３－ｎ２where Y and R ８５ , R ８６ and n2 is the above R ８２ This has the same meaning as the description in

[0216] In the above formula, R ｆ In each occurrence, each independently represents a hydrogen atom, a hydroxyl group, or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group. In one embodiment, R ｆ represents, independently at each occurrence, a hydrogen atom or a lower alkyl group.

[0217] wherein k2, in each occurrence, is independently an integer from 0 to 3; l2, in each occurrence, is independently an integer from 0 to 3; and m2, in each occurrence, is independently an integer from 0 to 3, with the proviso that the sum of k2, l2, and m2 is 3.

[0218] In one embodiment, at least one k2 is 2 or 3, preferably 3.

[0219] In one embodiment, k2 is 2 or 3, preferably 3.

[0220] In one embodiment, l2 is 2 or 3, preferably 3.

[0221] In the above formulas (C1) and (C2), at least one q2 is 2 or 3, or at least one l is 2 or 3. That is, in the formulas, at least two -Y-SiR ８５ ｎ２ R ８６ ３－ｎ２ There is a group.

[0222] The perfluoro(poly)ether group-containing silane compound represented by formula (C1) or formula (C2) can be produced by combining known methods. For example, the compound represented by formula (C1') in which X is divalent can be produced as follows, but is not limited thereto.

[0223] In one embodiment, Rf′ in each of the above embodiments is a single bond in formulas (A1), (B1) and (C1), and X located to the left of PFPE in formulas (A2), (B2) and (C2). ５ In (C ｌ' F ２ｌ' ) and X located to the right of PFPE ５ In (C ｌ' F ２ｌ' )

[0224] In one embodiment, Rf' in each of the above embodiments can be a single bond.

[0225] The perfluoro(poly)ether group-containing silane compounds represented by the above formulas (A1), (A2), (B1), (B2), (C1) and (C2) are not particularly limited, but may be 5×10 ２ ~1 x 10 ５ The number average molecular weight is preferably 2,000 to 30,000, more preferably 3,000 to 10,000, and even more preferably 3,000 to 8,000. The "number average molecular weight" is measured by GPC (gel permeation chromatography) analysis.

[0226] In the surface treatment agent of the present disclosure, the content of the both-terminal compound is preferably 0.1 mol % or more and 35 mol % or less relative to the total of the compound represented by formula (A1), (B1), and (C1) (hereinafter also referred to as "single-terminal compound") and the compound represented by formula (A2), (B2), or (C2) (hereinafter also referred to as "double-terminal compound"). The lower limit of the content of the double-terminal compound relative to the total of the one-terminal compound and the double-terminal compound is preferably 0.1 mol %, more preferably 0.2 mol %, even more preferably 0.5 mol %, even more preferably 1 mol %, particularly preferably 2 mol %, and especially 5 mol %. The upper limit of the content of the double-terminal compound relative to the total of the one-terminal compound and the double-terminal compound is preferably 35 mol %, more preferably 30 mol %, even more preferably 20 mol %, even more preferably 15 mol % or 10 mol %. The proportion of the both-end compound relative to the total of the one-end compound and the both-end compound is preferably 0.1 mol% to 30 mol%, more preferably 0.1 mol% to 20 mol%, even more preferably 0.2 mol% to 10 mol%, still more preferably 0.5 mol% to 10 mol%, particularly preferably 1 mol% to 10 mol%, for example, 2 mol% to 10 mol% or 5 mol% to 10 mol%. By setting the both-end compound in this range, the friction durability can be further improved.

[0227] Other examples of the perfluoroalkyl group-containing silane compound include the following (1) and (2) described in WO2020 / 019653. R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - and R Ｆ２ is -Rf ２ ｐ -R Ｆ -O ｑ -; Rf １ each occurrence independently represents a C optionally substituted by one or more fluorine atoms; １－１６ Rf is an alkyl group; ２ is a C optionally substituted by one or more fluorine atoms;１－６ is an alkylene group; R Ｆ is, independently in each occurrence, a divalent fluoropolyether group; p is 0 or 1; q is, independently in each occurrence, 0 or 1; R Ｓｉ is independently in each occurrence a monovalent group containing a Si atom to which is bonded a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group; Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａ are each independently a single bond or a divalent to decavalent organic group; α is an integer of 1 to 9; β is an integer of 1 to 9; and γ is each independently an integer of 1 to 9.

[0228] As the isocyanuric skeleton-containing silane compound, for example, the following compound having an isocyanuric skeleton described in WO2018 / 056413 can be used. (In the formula, R １ represents a monovalent organic group containing a polyether chain, X １ and X ２ each independently represents a monovalent group, and the polyether chain has the formula: -(OC ６ F １２ ) ｍ１１ - (OC ５ F １０ ) ｍ１２ - (OC ４ F ８ ) ｍ１３ - (OC ３ X １０ ６ ) ｍ１４ - (OC ２ F ４ ) ｍ１５ -(OCF ２ ) ｍ１６ - (wherein m11, m12, m13, m14, m15 and m16 are independently an integer of 0 or 1 or more; X １０ are independently H, F or Cl, and the order of occurrence of each repeating unit is arbitrary).

[0229] The antifouling layer 130 may be formed by depositing a fluorine-containing silane compound into an uneven film by a deposition process such as PVD (such as vacuum deposition, sputtering, or resistance heating deposition) or CVD.

[0230] Alternatively, the antifouling layer 130 may be formed by dissolving a fluorine-containing silane compound in an organic solvent, applying the solution to the irregularities, and drying the solution. Examples of organic solvents include acetone, methyl ethyl ketone, methyl amyl ketone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (PGMEA), dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol monomethyl ether acetate, dipropylene glycol diacetate, tripropylene glycol, 3-methoxybutyl acetate (MBA), 1,3-butylene glycol diacetate, cyclohexanol acetate, dimethylformamide, dimethyl sulfoxide, methyl cellosolve, cellosolve, etc. Examples include rube acetate, butyl cellosolve, butyl carbitol, carbitol acetate, ethyl lactate, isopropyl alcohol, methanol, ethanol, chloroform, HFC141b, HCHC225, hydrofluoroether, pentane, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, petroleum ether, tetrahydrofuran, 1,4-dioxane, methyl isobutyl ketone, butyl acetate, 1,1,2,2-tetrachloroethane, 1,1,1-trichloroethane, trichloroethylene, perchloroethylene, tetrachlorodifluoroethane, trichlorotrifluoroethane, and the like, and one or more of these may be selected and used.

[0231] The coating method may be various coating methods such as dip coating, spin coating, flow coating, spray coating, roll coating, or gravure coating, or printing methods such as letterpress printing or inkjet printing.

[0232] Drying may be performed under conditions that allow the organic solvent to evaporate and form a solid film of the antifouling layer 130. For example, drying may be performed by heating at 100 to 200°C for 1 to 60 minutes. Note that, because the condensation reaction itself proceeds even at low temperatures, drying may be performed under milder conditions than these (a temperature below 100°C for more than 60 minutes). For example, drying may be performed by leaving the film at room temperature for a long period of time.

[0233] In addition to the fluorine-containing silane compound, the antifouling layer 130 may be formed using a monomer, an oligomer, a polymer, or other additives (catalyst, surfactant, polymerization inhibitor, sensitizer, etc.).

[0234] For example, when an isocyanuric skeleton-containing silane compound is used as the fluorine-containing silane compound, in addition to this, (A) a polymerizable coating agent monomer such as a monofunctional and / or polyfunctional acrylate and methacrylate (hereinafter, acrylate and methacrylate will also be collectively referred to as "(meth)acrylate"), a monofunctional and / or polyfunctional urethane (meth)acrylate, a monofunctional and / or polyfunctional epoxy (meth)acrylate, or the like; (B) (b-1) Thermosetting resins such as acrylic polymers, polycarbonate polymers, polyester polymers, polyamide polymers, polyimide polymers, polyethersulfone polymers, cyclic polyolefin polymers, fluorine-containing polyolefin polymers (PTFE, etc.), fluorine-containing cyclic amorphous polymers (CYTOP (registered trademark), TEFLON (registered trademark) AF, etc.), and (b-2) curable monomers such as urethane (meth)acrylate, epoxy (meth)acrylate, polyester (meth)acrylate, polyether (meth)acrylate, silicone (meth)acrylate, and (meth)acrylate monomers may be used.

[0235] When a perfluoroalkyl group-containing silane compound is used as the fluorine-containing silane compound, the antifouling layer 130 may be formed by further using a fluoroalkyl silane oligomer mixture in addition to the perfluoroalkyl group-containing silane compound.

[0236] The fluoroalkylsilane oligomer mixture may contain a partial hydrolysis condensate of a fluoroalkylsilane compound represented by the following formula (II): Rf1-Q1-SiR1pX13-p (II) [wherein: Rf1 is ClF2l+1, l is an integer of 1 to 10, Q1 is a single bond or a divalent hydrocarbon group having 1 to 6 carbon atoms, each R1 is independently a monovalent hydrocarbon group having 1 to 6 carbon atoms, each X1 is independently a hydroxyl group or a hydrolyzable group, and p is an integer of 0 to 2.] In formula (II), R ｆ１ is C ｌ F ２ｌ＋１ and l is an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 6, for example, an integer of 2 to 6 or an integer of 3 to 6.

[0237] In formula (II), Q １ is a single bond or a divalent hydrocarbon group having 1 to 6 carbon atoms, and examples of the hydrocarbon group include a linear or branched alkylene group, and a group having an amide group or an etheric oxygen atom between carbon atoms in a linear or branched alkylene group having 2 to 6 carbon atoms. Among these, a linear alkylene group having 1 to 6 carbon atoms: -(CH ２ ) ｔ - (where t is an integer of 1 to 6) is preferred, and -(CH ２ ) ２ -, -(CH ２ ) ３ - or -(CH ２ ) ４ -, in particular -(CH ２ ) ２ - is preferred.

[0238] In formula (II), R １ is a monovalent hydrocarbon group having 1 to 6 carbon atoms, and examples thereof include a linear or branched alkyl group. Among these, from the viewpoint of availability, a linear or branched alkyl group having 1 to 4 carbon atoms is preferred, and a methyl group or an ethyl group is more preferred. When a plurality of R １may be the same or different, but are preferably the same in terms of availability.

[0239] In formula (II), X １ is a hydroxyl group or a hydrolyzable group. Here, the term "hydrolyzable group" as used herein means a group that can be eliminated from the main skeleton of a compound by a hydrolysis reaction. Examples of hydrolyzable groups include -OR, -OCOR, and -O-N=CR. ２ , -NR ２ , -NHR, halogen (in these formulas, R represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms), and preferably -OR (i.e., an alkoxy group). Examples of R include unsubstituted alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group; and substituted alkyl groups such as a chloromethyl group. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl groups or ethyl groups are more preferred. The hydroxyl group is not particularly limited, and may be one generated by hydrolysis of a hydrolyzable group.

[0240] X １ When X is a chlorine atom, the reactivity is high and the hydrolysis reaction proceeds sufficiently without the addition of an acid catalyst. １ Compounds in which the atom is a chlorine atom are preferably used.

[0241] In formula (II), p is an integer of 0 to 2, and is preferably 0 or 1, more preferably 0, in terms of excellent adhesion and durability.

[0242] Examples of the compound represented by formula (II) include the following: １ , R １ Exemplary and preferred embodiments are as described above.

[0243] Formula (I-1): CF ３ (CF ２ ) ｌ－１ - (CH ２ ) ｔ -SiX １ ３ Formula (I-2): CF ３ (CF ２ )ｌ－１ - (CH ２ ) ｔ -SiR １ X １ ２

[0244] The fluoroalkylsilane compound represented by formula (II) may be used alone or in combination of two or more. The fluoroalkylsilane compound represented by formula (II) can be produced by a general production method and is commercially available.

[0245] The fluoroalkylsilane oligomer is a compound (SiX) of two or more fluoroalkylsilane compounds represented by the formula (II). １ ) moieties are hydrolyzed and condensed with each other. The fluoroalkylsilane oligomer is usually a mixture containing mainly 2- to 14-mer polymers.

[0246] The degree of oligomerization / condensation is ２９ It can be measured by Si-NMR, and the TO species ( ２９ The values ​​are shown by the integral values ​​of the Si-NMR spectra of T1 (40-48 ppm), T2 (48-54 ppm), T3 (54-63 ppm), and T4 (63-75 ppm). ２９ Si-NMR shows 0-10%, more preferably 0-5%, and even more preferably 0-3% of TO species (40-48 ppm), 0-40%, more preferably 1-30%, and even more preferably 10-25% of T1 species (48-54 ppm), and 20-80%, more preferably 25-75%, and even more preferably 30-70% of T2 species (54-63 ppm). ２９ Explanations of T0, T1, T2, and T3 are given in "Structural Analysis of Silicon-Containing Materials by Si NMR Method," [online], Asahi Glass Research Report 66 (2016), pp. 32-36, Internet <URL: https: / / www.agc.com / innovation / library / pdf / 66-07.pdf>."

[0247] The oligomers are formed by hydrolysis of the compound represented by formula (II). The oligomers can be formed by hydrolysis of the same or different compounds represented by formula (II). The hydrolysis reaction of the compound represented by formula (II) with water can be carried out in the presence or absence of a catalyst. Suitable catalysts include, but are not limited to, acid catalysts, alkali catalysts, organic amine catalysts, or metal catalysts. In one embodiment, the catalyst is selected from hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid, sodium hydroxide, potassium hydroxide, ammonia, triethylamine, titanium isopropoxide, or dibutyltin dilaurate. It will be understood that water can be provided as part of the aqueous catalyst composition.

[0248] The degree of oligomerization ( ２９ The molecular weight (based on Si-NMR analysis) and / or size of the oligomer (based on number average molecular weight) can be adjusted by adjusting the amount of water in the reaction system, by selecting an appropriate catalyst, and / or by selecting appropriate reaction conditions. In particular, the molar ratio of water to silicon is controlled in providing the oligomers of the present disclosure. In one embodiment, the molar ratio of water to silicon (water:silicon) can be about 2.5:1 or less, about 2:1 or less, about 1.5:1 or less, about 1.25:1 or less, about 1:1 or less, about 0.75:1 or less, or about 0.5:1 or less. In one embodiment, the molar ratio of water to silicon (water:silicon) can be 0.5:1 to 2.5:1, 0.75:1 to 2:1, 1:1 to 1.5:1, or 1:1 to 1.25:1. Note that ranges other than those listed above can also be defined by combining the upper and lower limits listed above.

[0249] The fluoroalkylsilane oligomer is １ H-NMR, ２９ Structural analysis and composition analysis are possible by Si-NMR, GC (gas chromatography), and LC (liquid chromatography) analysis, and the composition and ratio of a mixture containing multimers of 2 to 14 monomers, the ratio and residual rate of hydrolyzable groups, the degree of condensation, etc. can be measured.

[0250] The number average molecular weight of the fluoroalkylsilane oligomer mixture may be preferably 300 or more, preferably 400 or more, more preferably 500 or more, and even more preferably 800 or more.

[0251] The number average molecular weight of the fluoroalkylsilane oligomer mixture may be preferably 4,500 or less, more preferably 4,000 or less, even more preferably 3,500 or less, and even more preferably 3,000 or less.

[0252] In the present invention, the "number average molecular weight" is measured by GPC (gel permeation chromatography) analysis.

[0253] In the fluoroalkylsilane oligomer mixture, a methoxy group (OCH ３ ) content ratio (OCH ３ / Si, molar ratio) may be preferably 1.5 or more, more preferably 2.0 or more, and even more preferably 2.2 or more. By making this ratio 1.5 or more, friction durability is further improved. Furthermore, the content ratio of methoxy groups to silicon may be preferably 2.8 or less, more preferably 2.7 or less, and even more preferably 2.5 or less. By making this ratio 2.8 or less, wear durability is further improved.

[0254] The ratio of methoxy groups to silicon is: ２９ It can be measured using Si-NMR.

[0255] The amount of the fluoroalkylsilane oligomer mixture may be preferably 20% by mass or less, more preferably 10% by mass or less, based on the total amount of the fluoroalkylsilane oligomer mixture and the perfluoroalkyl group-containing silane compound.

[0256] The amount of the fluoroalkylsilane oligomer mixture may be preferably 0.1% by mass or more, more preferably 0.5% by mass or more, based on the total amount of the fluoroalkylsilane oligomer mixture and the perfluoroalkyl group-containing silane compound.

[0257] As described above, according to this embodiment, the antifouling layer 130 is formed on the irregularities (the irregularities of the substrate 110 or the irregularity-forming layer 120) by performing steps S100 to S200. This allows the antifouling layer 130 to be firmly bonded to the irregularities, thereby improving the abrasion resistance and durability of the antifouling layer 130.

[0258] [Examples] Hereinafter, examples of this embodiment will be described with reference to Examples. The following compound X was used. Compound X: CF ３ CF ２ CF ２ O (CF ２ CF ２ CF ２ O) ３０ CF ２ CF ２ CONHCH ２ C[CH ２ CH ２ CH ２ Si(OCH ３ ) ３ ] ３ Compound X was dissolved in hydrofluoroether (Novec HFE7200, manufactured by 3M Japan Ltd.) to a concentration of 20% by mass, to obtain surface treatment agent Y.

[0259] [Example 1] AS4700F (manufactured by Momentive) was applied as a resin composition for forming irregularities onto a substrate [chemically strengthened glass (manufactured by Corning Incorporated, "Gorilla" glass, thickness 0.7 mm)] and dried by heating to obtain a member A.

[0260] The dried resin composition for forming projections and recesses of the member A was irradiated with an Xe excimer lamp to form a projection-and-recess forming layer 120, thereby obtaining a member B.

[0261] The surface treatment agent Y was vacuum-deposited on the dried resin composition side of the member A. The vacuum deposition treatment conditions were a pressure of 3.0×10 －３ The surface treatment amount was 2 mg of the surface treatment agent Y (i.e., containing 0.4 mg of the compound X) per piece of chemically strengthened glass, and the antifouling layer 130 was formed by vapor deposition, thereby obtaining a member C.

[0262] The surface treatment agent Y was vacuum-deposited on the roughness-forming layer 120 side of the member B. The vacuum deposition treatment conditions were a pressure of 3.0×10 －３The surface treatment agent Y was vapor-deposited in an amount of 2 mg per one piece of chemically strengthened glass (i.e., 0.4 mg of compound X was contained), and an antifouling layer 130 was formed, thereby obtaining a member D.

[0263] [Friction Durability Test] The static contact angle of water was measured for the surface layers of the members C and D formed above. The static contact angle of water was measured using a contact angle measuring device (manufactured by Kyowa Interface Science Co., Ltd.) with 1 μL of water.

[0264] First, as an initial evaluation, the static contact angles of water on members C and D were measured (number of frictions: 0) with the surfaces still untouched.

[0265] Thereafter, a steel wool friction durability evaluation was carried out as a friction durability evaluation. Specifically, the substrate on which the surface treatment layer was formed was placed horizontally, and steel wool (count #0000, dimensions 5 mm x 10 mm x 10 mm) was brought into contact with the exposed upper surface of the surface treatment layer, and a load of 1,000 gf was applied thereto. Thereafter, the steel wool was reciprocated at a speed of 140 mm / sec while the load was applied. The static contact angle (degrees) of water was measured every 1,000 reciprocations. The evaluation was continued up to 10,000 reciprocations or until the measured contact angle was less than 80°. The results are shown in Table 2 ("-" indicates no measurement).

[0266]

[0267] The surface conditions of members A to D were measured using an atomic force microscope, and the results are shown below.

[0268]

[0269] Here, Profile is a value calculated based on an analysis image with a cross section on the surface as the measurement region, and Image is a value calculated based on an analysis image with the entire plane of the surface as the measurement region. Ra (nm) is the arithmetic mean roughness (which can be calculated using, for example, the formula specified in JIS B0601 or an extension of this formula), RMS (nm) is the root mean square roughness, Rz (nm) is the surface roughness (i.e., the maximum height, which can be calculated using the formula for calculating the ten-point mean roughness Rz specified in JIS B0601 or an extension of this formula), P-V (nm) is the maximum height difference representing the (maximum value - minimum value) of height z, and S (μm ２ ) is the net surface area of ​​the analytical plane calculated as the sum of vector products of the infinitesimal division surfaces, and S Ratio is the surface area S when the analytical plane is ideally flat. ０ is the ratio of the net surface area S to the

[0270] Although the present invention has been described above using the embodiments, the technical scope of the present invention is not limited to the scope described in the above embodiments. It will be apparent to those skilled in the art that various modifications and improvements can be made to the above embodiments. It is clear from the claims that such modifications and improvements can also be included within the technical scope of the present invention.

[0271] It should be noted that the order of execution of each process, such as operations, procedures, steps, and stages, in the methods shown in the claims, the specification, and the drawings, is not specifically stated as "before," "prior to," etc., and can be realized in any order unless the result of a previous process is used in a later process. Even if the operational flow in the claims, the specification, and the drawings is described using "first," "next," etc. for convenience, it does not mean that it is essential to perform the process in this order.

[0272] 10 Antifouling member 110 Substrate 120 Textured layer 130 Antifouling layer

Claims

1. The surface is made of nano-sized irregularities, an antifouling layer provided on the concave portions of the unevenness; An antifouling member comprising:

2. The average pitch width of the convex portions of the unevenness is 5 to 18 nm. The antifouling member according to claim 1 .

3. The surface roughness (Rz) measured on the plane of the irregularities is 9 to 12 nm. The antifouling member according to claim 1 .

4. The surface roughness (Rz) measured on the cross section of the irregularities is 3 to 5 nm. The antifouling member according to claim 1 .

5. The maximum height difference (P-V) measured on the plane of the unevenness is 5 to 15 nm. The antifouling member according to claim 1 .

6. The maximum height difference (P-V) measured on the cross section of the unevenness is 4 to 8 nm. The antifouling member according to claim 1 .

7. The arithmetic average roughness (Ra) measured on the flat surface of the uneven surface is 0.6 to 2.0 nm. The antifouling member according to claim 1 .

8. The arithmetic average roughness (Ra) measured on the cross section of the unevenness is 0.6 to 2.0 nm. The antifouling member according to claim 1 .

9. The root mean square roughness (RMS) measured on the flat surface of the irregularities is 0.8 to 2.0 nm; The antifouling member according to claim 1 .

10. The root mean square roughness (RMS) measured on the cross section of the irregularities is 0.7 to 3.0 nm. The antifouling member according to claim 1 .

11. A substrate; a concavo-convex forming layer; The irregularities are formed on the surface of the irregularity-forming layer. The antifouling member according to claim 1 .

12. a substrate, The irregularities are formed on the surface of the substrate. The antifouling member according to claim 1 .

13. a height in a normal direction of the one surface of the antifouling layer formed in the recess does not exceed a height of the convex portion of the concave-convex portion; The antifouling member according to claim 1 .

14. The contact angle when water comes into contact with the one surface side is 105 to 120°. The antifouling member according to claim 1 .

15. The pencil hardness of the one surface side is HB or higher. The antifouling member according to claim 1 .

16. The antifouling layer contains a perfluoropolyether-containing silane compound. The antifouling member according to claim 1 .

17. The unevenness-forming layer contains a silicone resin. The antifouling member according to claim 11.

18. The silicone resin contains a Q unit structure and a T unit structure. The antifouling member according to claim 17.

19. the composition ratio of carbon atoms in the recesses of the roughness-forming layer is higher than that in the protrusions; The antifouling member according to claim 18.

20. the molar concentration of silanol groups in the recesses of the roughness-forming layer is higher than that in the protrusions; The antifouling member according to claim 18.

21. A display having at least a part of a display area covered with the antifouling member according to any one of claims 1 to 20.

22. A touch panel, at least a part of a touch area of ​​which is covered with the antifouling member according to any one of claims 1 to 20.

23. A sensor having at least a portion of its surface covered with the antifouling member according to any one of claims 1 to 20.