Gas injector for a semiconductor manufacturing apparatus

USD1110973SActive Publication Date: 2026-02-03KOKUSAI DENKI KK
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Patent Information

Application Number
US29/880373
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Priority Date
2023-01-25
Filing Date
2023-07-21
Publication Date
2026-02-03
Estimated Expiration
2041-02-03

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Description

[0001] FIG. 1 is a front, top and left side perspective view of a gas injector for a semiconductor manufacturing apparatus, showing my new design;

[0002] FIG. 2 is a front elevational view thereof;

[0003] FIG. 3 is a rear elevational view thereof;

[0004] FIG. 4 is a left side elevational view thereof;

[0005] FIG. 5 is a right side elevational view thereof;

[0006] FIG. 6 is a top plan view thereof;

[0007] FIG. 7 is a bottom plan view thereof;

[0008] FIG. 8 is an enlarged portion view taken from encircled portion labeled, “FIG. 8,” in FIG. 1; and,

[0009] FIG. 9 is an enlarged view of FIG. 4.

[0010] The even dashed broken lines in the drawings represent portions of the gas injector for a semiconductor manufacturing apparatus that form no part of the claimed design. The dot-dashed lines shown in FIG. 1 and FIG. 8 represent the bounds of the enlarged portion of the claimed design in FIG. 8

Claims

The ornamental design for a gas injector for a semiconductor manufacturing apparatus, as shown and described.

Citation Information

Patent Citations

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    JP2014063959A

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  • Gas nozzle for substrate processing apparatus

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  • injector nozzle

    CN304888470S

  • Gas nozzle for substrate processing equipment

    KR301252422S