Treatment device and method of using same
By designing drainable vehicles and spray parts in the processing equipment, the problems of low output and efficiency in existing equipment are solved, achieving higher space utilization and lower costs.
Patent Information
- Application Number
- PCT/CN2024/090160
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-05-05
- Filing Date
- 2024-04-26
- Publication Date
- 2025-03-27
AI Technical Summary
When existing processing equipment improves output and efficiency, it is easy to lead to poor uniformity of silicon wafer film thickness at the tail and head of the reaction boat, and the expansion of the cavity leads to an increase in the equipment footprint and cost.
A processing device is designed that includes a cavity body, a carrier and a spray member. The carrier can drain in the first direction, carry the substrate, and is sealedly connected with the spray member, which is used to transport gas to the carrier and improve gas circulation efficiency.
By increasing the space utilization rate of the cavity, more substrates can be carried in the vehicle, which improves the output and efficiency of the processing equipment, while reducing equipment costs.
Smart Images

Figure CN2024090160_27032025_PF_FP_ABST
Abstract
Description
Processing equipment and method of use thereof
[0001] Related applications
[0002] This application claims priority to Chinese patent application entitled “Processing equipment and method of use thereof” filed on May 5, 2023, application number 202310494251.9, the entire text of which is hereby incorporated by reference. Technical Field
[0003] The present application relates to the technical field of processing equipment, and in particular to processing equipment and methods of using the same. Background Art
[0004] Processing equipment (such as coating equipment) refers to equipment that can provide a specific environment (such as a vacuum environment) and coat the surface of a substrate (such as a silicon wafer). Improving the output and efficiency of processing equipment has always been a common concern in the industry.
[0005] To improve the output and efficiency of processing equipment, a common solution is to increase the number of substrates loaded into a single reaction boat. This results in a significant difference in film thickness uniformity between the silicon wafers at the rear and the front of the reaction boat. Another solution is to place as many reaction boats as possible in the chamber. However, more reaction boats will significantly increase the chamber size, the equipment footprint, and the equipment cost. Moreover, as the chamber size increases, the reactant consumption also increases dramatically, increasing production costs. Therefore, there is an urgent need to provide a new type of processing equipment to improve the output and efficiency of processing equipment.
[0006] Summary of the Invention
[0007] According to various embodiments of the present application, a processing device and a method for using the same are provided.
[0008] In a first aspect, a processing device of the present application includes:
[0009] a cavity body having a cavity;
[0010] a carrier operably disposed in the chamber, the carrier being configured to drain in a first direction and configured to carry a substrate arranged on a drainage path of the carrier;
[0011] A spraying member is disposed in the chamber and covers the inlet end of the carrier in the first direction, and the spraying member is used for delivering gas to the carrier.
[0012] In one embodiment, the processing equipment further includes a first vacuum cylinder, the first vacuum cylinder being at least partially located in the chamber and covering an outlet end of the carrier disposed opposite to the inlet end thereof in the first direction, for connecting the carrier with the outside of the chamber;
[0013] The upper limit of the carrier in the first direction is located between the first vacuum cylinder and the spraying member.
[0014] In one embodiment, the processing equipment further includes a chamber door and a bottom cover provided at opposite ends of the chamber body in the first direction, the spraying member is provided on the chamber door, and the first vacuum cylinder is provided on the bottom cover;
[0015] The spraying element is elastically connected to the cavity door, and / or the first vacuum cylinder is elastically connected to the bottom cover.
[0016] In one embodiment, the processing device further includes a connecting frame and an elastic structure, wherein the connecting frame is provided on the first vacuum cylinder, and the elastic structure is elastically connected between the bottom cover and the connecting frame in the first direction.
[0017] In one embodiment, the processing device further includes an elastic structure, a power source, and a pushing member;
[0018] The pushing member is movably mounted on the bottom cover in the first direction; the power source is disposed on the bottom cover and is used to drive the pushing member to move;
[0019] The elastic structure is elastically deformable in the first direction and is connected between the first vacuum cylinder and the pushing member.
[0020] In one embodiment, the elastic structure includes a guide member and an elastic member, and the guide member is connected between the first vacuum cylinder and the pushing member along the first direction;
[0021] The guide member is relatively movable along the first direction with at least one of the first vacuum cylinder and the push member, and is fixedly connected to the other one. The elastic member is sleeved on the guide member.
[0022] In one embodiment, the first vacuum cylinder is movably mounted on the bottom cover along the first direction, and the inlet end of the first vacuum cylinder and the outlet end of the first vacuum cylinder are configured to be located on opposite sides of the bottom cover in a direction perpendicular to the first direction;
[0023] The elastic structure includes an elastic member, the pushing member is fixedly connected to the outlet end of the first vacuum cylinder, and the elastic member is sleeved on the first vacuum cylinder between the bottom cover and the outlet end of the first vacuum cylinder.
[0024] In one embodiment, the processing equipment further includes a chamber door, which is provided at one end of the chamber body in the first direction, and a gas channel is constructed on the chamber door; the gas channel is connected to the spray hole of the spray member.
[0025] In one embodiment, the processing equipment further includes a connecting block connected between the spray element and the chamber door, and the connecting block has a transition air channel connecting the gas channel and the spray hole.
[0026] In one embodiment, the connecting block rigidly connects the spray element and the chamber door.
[0027] In one embodiment, an end face flange is provided at one end of the cavity body facing the cavity door, and the end face flange is sealedly connected to the cavity door;
[0028] The end face flange has an air inlet hole for connecting to an air source, and the air inlet hole is connected to the gas channel.
[0029] In one embodiment, the outer contour of the carrier and the projection of the inner wall of the cavity body along the first direction are both rectangular.
[0030] In one embodiment, the processing device further comprises an air curtain member, wherein the air curtain member is located in the chamber;
[0031] The air curtain element is arranged around the outer periphery of the spray element; and / or,
[0032] The processing equipment further includes a first vacuum cylinder, and the air curtain member is disposed around an inlet end of the first vacuum cylinder.
[0033] In one embodiment, the carrier includes at least two carrying positions arranged side by side in a direction perpendicular to the first direction, and each of the carrying positions includes at least one reaction boat connected in sequence in the first direction; the spraying member is simultaneously sealed and connected to the inlet ends of at least two of the carrying positions arranged side by side.
[0034] In one embodiment, the processing device further includes a heating element, and the heating element is arranged between the carrier and the inner wall of the chamber body.
[0035] In one embodiment, a plurality of heating elements are provided between the carrier and the chamber body, and each heating element is independently controlled.
[0036] In one embodiment, the cavity body is divided into a plurality of temperature zones along the first direction, each temperature zone is provided with the heating element, and the heating elements in each temperature zone are independently controlled.
[0037] In one embodiment, a guide structure is provided on the inner wall of the cavity body, and the guide structure is used to guide the carrier to enter the cavity along the first direction.
[0038] In one embodiment, the guide structure includes a support plate and at least two limiting rails, the support plate is supported on the inner wall of the cavity body, and the limiting rails extend along the first direction and are arranged at intervals;
[0039] A guide channel for guiding the transport of the carrier is formed between adjacent limiting rails.
[0040] In one embodiment, the processing equipment further includes an air inlet pipeline and an air exhaust pipeline, wherein the air inlet pipeline is connected to the spray part for delivering gas to the spray part, and the air exhaust pipeline is connected to the carrier located in the chamber for discharging the gas in the carrier to outside the chamber.
[0041] In a second aspect, a method for using a processing device of the present application is applied to the processing device in any of the above embodiments, and the method for using the processing device includes:
[0042] Sending the carrier carrying the substrate into the chamber of the chamber body;
[0043] Covering the spraying element in the chamber with the inlet end of the carrier so that the spraying element and the carrier together form a processing space;
[0044] A processing gas is introduced into the spraying member so that the processing gas enters the processing space through the spraying member.
[0045] In one embodiment, the processing apparatus further comprises a first vacuum pump, wherein the first vacuum pump is at least partially located within the chamber;
[0046] The method of delivering the carrier carrying the substrate into the chamber of the chamber body includes:
[0047] The carrier carrying the substrate is sent into the chamber until the outlet end of the carrier is covered by the first vacuum cylinder. BRIEF DESCRIPTION OF THE DRAWINGS
[0048] FIG1 is a schematic structural diagram of a processing device according to one or more embodiments;
[0049] FIG2 is a schematic diagram of the assembly of the first vacuum cylinder and the bottom cover according to one or more embodiments;
[0050] FIG3 is a schematic diagram of the assembly of the elastic structure, the first air pump, and the pushing member according to one or more embodiments;
[0051] FIG4 is a schematic diagram of the assembly of the first vacuum cylinder and the bottom cover according to one or more other embodiments;
[0052] FIG5 is an enlarged view of point I in FIG1;
[0053] FIG6 is a schematic diagram of the appearance of a cavity body according to one or more embodiments;
[0054] FIG7 is a schematic diagram illustrating an arrangement of carriers in a processing device according to one or more embodiments;
[0055] FIG8 is a schematic diagram illustrating the division of temperature zones of a cavity body according to one or more embodiments;
[0056] FIG9 is a schematic structural diagram of a processing device according to another one or more embodiments;
[0057] FIG10 is a flowchart illustrating a method for using a processing device according to one or more embodiments.
[0058] Description of reference numerals:
[0059] 100, processing equipment; X, first direction; W, temperature range; 10, chamber body; 11, end flange; J, air inlet; 20, chamber door; S, gas channel; 30, bottom cover; 40, carrier; 41, reaction boat; 50, spray element; 51, connecting block; P, spray hole; G, transition air channel; 52, third sealing ring; 60, first exhaust cylinder; 61, connecting frame; 62, elastic structure; 62a, guide element; 62b, first guide sleeve; 62c, clamping block; 62d, stop element; 62e, pad; 62f, limit member; 62h, second guide sleeve; 62g, third guide sleeve; 62k, first telescopic tube; 62m, second telescopic tube; 62s, elastic member; 63, clamping part; 70, air curtain member; 80, heating member; 90, guide structure; 91, support plate; 92, support frame; 93, limit rail; T, guide channel; 101, power source; 102, pushing member; 102a, guide part; K, connecting hole; 103, exhaust pipe; 104, second exhaust cylinder. DETAILED DESCRIPTION
[0060] To make the above-mentioned objects, features, and advantages of the present application more clearly understood, the specific embodiments of the present application are described in detail below with reference to the accompanying drawings. The following description sets forth many specific details to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways than those described herein, and those skilled in the art can make similar improvements without violating the scope of the present application. Therefore, the present application is not limited to the specific embodiments disclosed below.
[0061] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.
[0062] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of such features. Throughout the description of this application, "plurality" means at least two, for example, two, three, etc., unless otherwise specifically defined.
[0063] In this application, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; internal communication between two elements or interaction between two elements, unless otherwise specified. Those skilled in the art will understand the specific meanings of the above terms in this application based on specific circumstances.
[0064] In this application, unless otherwise expressly specified or limited, when a first feature is "above" or "below" a second feature, it may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Furthermore, when a first feature is "above," "above," or "above" a second feature, it may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is at a higher level than the second feature. When a first feature is "below," "below," or "below" a second feature, it may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature is at a lower level than the second feature.
[0065] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be an intermediate element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be an intermediate element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only implementation methods.
[0066] One reason for the low output and efficiency of processing equipment is the low utilization rate of the internal space of its cavity. In order to improve the utilization rate of the internal space of the cavity and thus improve the output and efficiency of the processing equipment, the inventors of this application have proposed a processing equipment. By disposing a carrier that can both carry substrates and guide gas flow within the outer shell of the cavity, there is no need to set up other structures to ensure gas flow between the carrier and the outer shell. The volume of the carrier can be made larger, and more substrates can be carried in the carrier, thereby improving the utilization rate of the internal space of the cavity, thereby improving the output and efficiency of the processing equipment using the processing equipment, and at the same time, the processing equipment cost is low.
[0067] The processing equipment provided in the embodiments of the present application is not limited to the field of film coating, but can also be applied to other fields, such as the field of sintering, and those skilled in the art can convert it according to actual needs. When the processing equipment is applied to the field of sintering, the substrate can be a ceramic to be sintered, and the gas circulating in the carrier can be nitrogen, inert gas, etc. When the processing equipment is applied to the field of film coating, the substrate processed by the processing equipment can be, but is not limited to, a silicon wafer, and the gas circulating in the carrier can be a gas participating in the film coating reaction of the silicon wafer.
[0068] In the embodiment of the present application, the gas flowing in the processing equipment is a gas that can carry particulate matter such as powder.
[0069] The following is a detailed description of the processing equipment provided in the embodiments of the present application. It should be noted that in the following embodiments, the beneficial effects of the processing equipment are described using the coating field as an example. It is understood that when the processing equipment is applied to other fields, corresponding beneficial effects can also be derived from it. The following embodiments do not limit the application fields of the processing equipment.
[0070] According to some embodiments of the present application, referring to FIG. 1 , a processing apparatus 100 provided in an embodiment of the present application includes a chamber body 10, a carrier 40, and a spray element 50. The chamber body 10 has a chamber. The carrier 40 is operably disposed within the chamber and is configured to direct flow along a first direction X, and is used to support a substrate disposed on a flow path of the carrier 40. The spray element 50 is disposed within the chamber and covers an inlet end of the carrier 40 in the first direction X. The spray element 50 is used to deliver gas to the carrier 40.
[0071] The cavity body 10 is generally made of metal, such as stainless steel or aluminum alloy, and the specific material is not limited. The cavity body 10 is generally arranged longitudinally along the first direction X. The cross-sectional shape of the cavity body 10 can be circular, rectangular, etc.
[0072] The carrier 40 is operably arranged in the chamber, which means that the carrier 40 is placed in the chamber under the operation of an external device / manually, and can also leave the chamber under the operation of an external device / manually. For example, the carrier 40 can be sent into the chamber under the operation of a conveying mechanism, and the conveying mechanism can be a robot, a conveyor roller mechanism, a conveyor belt mechanism, etc. Of course, the carrier 40 can also be sent into the chamber under manual operation. During actual operation, the carrier 40 located outside the chamber is sent into the chamber after the substrate is loaded, and flows out of the chamber after the coating process is completed, and waits for the substrate to be unloaded. When unloading, it can be done manually or by an unloading mechanism (such as a robot).
[0073] When the carrier 40 is located in the chamber, the carrier 40 can be drained along the first direction X. The gas to be drained enters from the inlet end of the carrier 40 in the first direction X and then flows out from its outlet end in the first direction X. The gas to be drained can be nitrogen, inert gas, reactive gas, argon, etc., depending on actual needs. The specific scheme for achieving the carrier 40 being able to drain in the first direction X is not limited. For example, a plurality of carriers spaced apart and staggered are provided in the carrier 40, with spaces for gas circulation formed between the carriers, and each space is arranged for gas circulation at least along the first direction X. Regarding the specific structure of the carrier 40, those skilled in the art can make conventional settings, which are not limited here, as long as it satisfies the requirement of draining along the first direction X.
[0074] It should be emphasized that "guidance" refers to guiding the flow of gas. In the embodiment of the present application, "guidance" refers to guiding the gas to flow from the inlet end of the carrier 40 in the first direction to the outlet end. Usually, in the process of gas flowing out of the carrier 40, it basically only flows out from the outlet end of the carrier 40 in the first direction, and will not overflow from the non-outlet end position of the carrier 40. Moreover, the gas basically only flows into the carrier from the inlet end of the carrier 40, and will not pass into the carrier 40 from the non-inlet end position of the carrier 40.
[0075] The spray part 50 is used to communicate with the gas source and deliver gas to the carrier 40. The spray part 50 covers the inlet end of the carrier 40, and the two can be sealed to prevent air leakage. For example, a third sealing ring 52 is provided between the spray part 50 and the carrier 40, or the spray part 50 itself is made of a sealing material. The spray part 50 has a plurality of spray holes P, which are connected to each other and open toward the carrier 40. The spray part 50 can be in the shape of a plate. Regarding the specific structure of the spray part 50, those skilled in the art can make conventional settings, which are not limited here.
[0076] When the above-mentioned processing equipment 100 is used as a processing equipment, after the carrier 40 is placed in the chamber, the spray part 50 closes its inlet end and transports gas into the carrier 40. When the gas path is set to the substrate in the carrier 40, it participates in the coating reaction of the substrate and then flows out from the outlet end of the carrier 40.
[0077] Because the carrier 40 itself can direct airflow, no additional airflow structure is required between the carrier 40 and the chamber body 10. While the volume of the chamber body 10 remains unchanged, the carrier 40 can be made larger. This allows the carrier 40 to carry more substrates, improving the space utilization of the processing equipment 100 and increasing the throughput and efficiency of the processing equipment. Furthermore, since the larger space in the carrier 40 allows for more circulated gas, the reaction environment for each substrate remains essentially unchanged while the number of substrates increases, resulting in better substrate coating quality. Furthermore, without the need to expand the volume of the chamber body 10, the processing equipment costs are lower.
[0078] In practical applications, the processing equipment may be an ALD (Atomic Layer Deposition) coating equipment, which may be applied to the preparation of wafers. In other embodiments, the processing equipment may also be a sintering equipment, etc.
[0079] It should be noted that in actual applications, the first direction X can be a horizontal direction. In this case, the processing equipment 100 is a horizontal processing equipment. When the processing equipment 100 is a horizontal processing equipment, which is the mainstream layout of the processing equipment 100, the carrier 40 is also arranged horizontally (the main layout). The processing equipment 100 is compatible with most other equipment currently used in conjunction with the mainstream layout, such as the conveying equipment of the carrier 20 and the loading and unloading equipment of the carrier 20, which helps to reduce the use cost and design cost of the processing equipment 100.
[0080] In some embodiments, referring to Figure 1, the processing equipment 100 also includes a first vacuum cylinder 60, which is at least partially located in the chamber and covers the outlet end of the carrier 40 opposite to its inlet end in the first direction X, for connecting the carrier 40 and the outside of the chamber; the carrier 40 is located between the first vacuum cylinder 60 and the spray part 50 at the upper limit of the first direction X.
[0081] The first exhaust cylinder 60 has an exhaust passageway, the inlet of which is sealedly connected to the outlet of the carrier 40. The outlet of the exhaust passageway is connected to an exhaust device. A sealing ring may be provided between the inlet of the exhaust passageway and the outlet of the carrier 40. The exhaust device may be a vacuum pump, which is used to extract gas from the carrier 40. The type of exhaust device is not limited.
[0082] At this time, the first air pump 60 and the spray element 50 are positioned at both ends of the carrier 40, which not only enables the input and extraction of gas, but also provides a certain positional limit for the carrier 40. Furthermore, the first air pump 60 is sealed and positioned at the outlet of the carrier 40, preventing gas from leaking out of the carrier 40. This improves gas utilization, stabilizes the flow inside the carrier 40, and protects the chamber from dust contamination.
[0083] Among them, the specific way in which the carrier 40 is "limited" between the first vacuum cylinder 60 and the spray part 50 in the first direction X is not limited, as long as the position of the carrier 40 is between the first vacuum cylinder 60 and the spray part 50. For example, the carrier 40 is "clamped" between the first vacuum cylinder 60 and the spray part 50 in the first direction X, and the first vacuum cylinder 60 and the spray part 50 jointly clamp the carrier 40. For another example, the carrier 40 has a fixed position, and in this fixed position, the carrier 40 can be fixed in the chamber by a fixing structure (such as a screw or a snap), and the first vacuum cylinder 60 and the spray part 50 are respectively in contact with the two sides of the carrier 40 in the first direction X, that is, the first vacuum cylinder 60 and the spray part 50 can both not apply a limiting force to the carrier 4.
[0084] In a further embodiment, referring to Figures 1 and 5, Figure 5 is an enlarged view of point I in Figure 1, the processing apparatus 100 further includes a chamber door 20 and a bottom cover 30 disposed at opposite ends of the chamber body 10 in a first direction X, a spray member 50 is disposed on the chamber door 20, and a first air pump 60 is disposed on the bottom cover 30. The spray member 50 is elastically connected to the chamber door 20, and / or the first air pump 60 is elastically connected to the bottom cover 30.
[0085] The cavity body 10 is closed at opposite ends in the first direction X by the cavity door 20 and the bottom cover 30 respectively. The cavity door 20 and the cavity body 10 are usually arranged to be movably connected so as to open or close the chamber by moving the cavity. The connection method between the cavity door 20 and the cavity body 10 is not limited in the embodiment of the present application, and those skilled in the art can make conventional settings. The bottom cover 30 and the cavity body 10 are usually fixedly connected, which can be an integral fixed connection or a detachable fixed connection (such as a fixed connection by fastening bolts). A sealing ring can be arranged between the cavity door 20 and the cavity body 10 (in the embodiments shown in Figures 1 and 5, a first sealing ring and a second sealing ring are arranged between the cavity door 20 and the cavity body 10, the first sealing ring is located on the outside of the second sealing ring, and both are arranged around the axis of the cavity body 10). When the cavity body 10 is connected to the bottom cover 30 in a split manner, a sealing ring can also be arranged between the cavity body 10 and the bottom cover 30 to improve the airtightness of the chamber.
[0086] The spray part 50 is elastically connected to the cavity door 20, and the first vacuum cylinder 60 is elastically connected to the bottom cover 30. Both can be achieved through, but not limited to, springs, soft rubber elastomers and other structures to achieve elastic connection. This is something that can be obtained by those skilled in the art based on conventional settings and is not limited here.
[0087] In this case, the spray element 50 is disposed on the chamber door 20, and the first air pump 60 is disposed on the bottom cover 30, thereby achieving a fixed installation of the two, with a simple structure and ease of implementation. Furthermore, the spray element 50 and the chamber door 20 and / or the first air pump 60 and the bottom cover 30 are elastically connected. When the spray element 50, the carrier 40, and the first air pump 60 are assembled, the spray element 50 and the first air pump 60 can be pressed against the carrier 40 by elastic force, thereby enhancing the sealing between the spray element 50 and the carrier 40, and between the first air pump 60 and the carrier 40.
[0088] It can be understood that when the first direction X is horizontal, when the carrier 40 is limited between the first vacuum cylinder 60 and the spray part 50, neither the first vacuum cylinder 60 nor the spray part 50 will be affected by the gravity of the carrier 40, which can greatly improve the service life of the first vacuum cylinder 60 or the spray part 50, and reduce the strength requirements of the two and the manufacturing cost of the processing equipment 100.
[0089] In particular, when the spray part 50 and the chamber door 20 are elastically connected by an elastic component, or the first vacuum cylinder 60 and the bottom cover 30 are elastically connected by an elastic component, the processing equipment 100 is arranged horizontally, and the elastic component does not need to bear the gravity of the carrier 40, and the strength requirement for the elastic component is greatly reduced. It can also greatly improve the reliability of the elastic component and greatly improve the reliability of the processing equipment 100.
[0090] Optionally, the first vacuum cylinder 60 may be partially located in the chamber, and partially extend out of the chamber after passing through the bottom cover 30 to be connected to the vacuum device.
[0091] Further in the embodiment, the processing device 100 further includes a connecting frame 61 and an elastic structure 62. The connecting frame 61 is arranged on the first vacuum cylinder 60, and the elastic structure 62 is elastically connected between the bottom cover 30 and the connecting frame 61 in the first direction X.
[0092] In the embodiment shown in FIG1 , the connecting frame 61 is located in the chamber and is arranged around an axis parallel to the first direction X. One end of the connecting frame 61 can be fixedly connected to the first vacuum cylinder 60 by welding, bonding, fastening, etc., and the other end is elastically connected to the bottom cover 30 via an elastic structure 62. Optionally, the elastic connecting frame 61 includes a bolt and a spring sleeved on the bolt, one end of the bolt is limited by a nut to the side of the bottom cover 30 facing away from the connecting frame 61, and the other end of the bolt is limited by a nut to the side of the connecting frame 61 facing away from the bottom cover 30, and the bolt can move relative to the connecting frame 61, and the spring is located between the connecting frame 61 and the bottom cover 30. Furthermore, the elastic structure 62 includes a plurality of springs, each of which is arranged around an axis parallel to the first direction X.
[0093] At this time, the elastic connection between the first air pump 60 and the bottom cover 30 is achieved through the connecting frame 61 and the elastic structure 62 .
[0094] In some embodiments, referring to FIG. 2 , the processing device 100 further includes an elastic structure 62, a power source 101, and a pusher 102. The pusher 102 is movably mounted on the bottom cover 30 in a first direction X. The power source 101 is disposed on the bottom cover 30 and is configured to drive the pusher 102 to move. The elastic structure 62 is elastically deformable in the first direction X and is connected between the first vacuum cylinder 60 and the pusher 102.
[0095] The pusher 102 and the power source 101 are both supported and mounted on the bottom cover 30, and the pusher 102 can move relative to the bottom cover 30 along the first direction X. The power source 101 serves as the source of power for the movement of the pusher 102, and is usually fixedly mounted on the bottom cover 30. The power source 101 is usually connected to the pusher 102 via a transmission assembly to transmit power to the pusher 102 through the transmission assembly. The structure of the transmission assembly is related to the type of power source 101. When the power source 101 is a rotary motor, the transmission assembly can be, but is not limited to, a screw-ball assembly. When the power source 101 is a cylinder, the transmission assembly can be a coupling connected to the piston rod of the cylinder, etc.
[0096] There are many ways in which the pusher 102 can be arranged to be movable relative to the bottom cover 30, and those skilled in the art can flexibly design them, which are not specifically limited here. As an example, a slide rail is provided on the bottom cover 30, and the pusher 102 is mounted on the slide rail and can move along the slide rail under the push of the power source 101. Limit blocks can be provided at both ends of the path of the slide rail to limit the stroke of the pusher 102 and prevent it from derailing. Optionally, the pusher 102 can be installed on the bottom cover 30 through the power source 101, that is, the pusher 102 is not directly connected to the bottom cover 30, but is supported on the bottom cover 30 by the power source 101.
[0097] The pusher 102 can be a push plate, specifically a thin plate, to reduce its space occupation and help save material. The size of the pusher 102 is flexibly set according to the number of elastic components installed thereon and the size of the first vacuum cylinder 60.
[0098] The elastic structure 62 is a component capable of elastically deforming in the first direction X. Typically, it includes an elastic member 62s capable of elastically deforming along the first direction X, such as a soft elastomer (rubber, silicone, etc.) or a spring.
[0099] During actual operation, when the carrier 40 is sent into the chamber body 10, the power source 101 pushes the pusher 102 along the first direction XX toward the inlet end of the first air pump 60. The pusher 102 compresses the elastic structure 62, and the compressed elastic structure 62 exerts an elastic force on the first air pump 60, so that the inlet end of the first air pump 60 is tightly fitted to the outlet end of the carrier 40, and there is good airtightness between the two, which reduces the escape of substances in the carrier 40, helps to reduce the maintenance cycle of the test equipment, reduces the maintenance cost of the test equipment, and improves resource utilization. In addition, it can prevent dust in the carrier 40 from escaping into the chamber body, while helping to maintain the atmosphere flow field in the chamber body 10.
[0100] In some embodiments, referring to FIG. 3 , the elastic structure 62 includes a guide member 62 a and an elastic member 62 s. The guide member 62 a is connected between the first vacuum cylinder 60 and the pusher 102 along the first direction X. The guide member 62 a is movable relative to at least one of the first vacuum cylinder 60 and the pusher 102 along the first direction X and is fixedly connected to the other. The elastic member 62 s is sleeved on the guide member 62 a.
[0101] The guide member 62a guides the elastic member 62s to expand and contract along the first direction X, thereby regulating the deformation direction of the elastic member 62s. The guide member 62a can be a guide shaft, a guide rod, or other structural forms. The elastic member 62s is mounted on the guide member 62a. When the elastic member 62s deforms, it expands and contracts along the guide member 62a.
[0102] The guide member 62a is connected between the first vacuum cylinder 60 and the pushing member 102 and is movable relative to one of them along the first direction X. Thus, when the power source 101 pushes the pushing member 102 toward the inlet end of the first vacuum cylinder 60, the guide member 62a moves relative to the first vacuum cylinder 60 or the pushing member 102, allowing the pushing member 102 to compress the elastic member 62s, thereby causing the elastic member 62s to tightly fit the first vacuum cylinder 60 against the outlet end of the external passage.
[0103] Further to the embodiment, please refer to Figure 3, the elastic structure 62 also includes a first guide sleeve 62b and a clamping block 62c, the first vacuum cylinder 60 has a clamping portion 63, the first vacuum cylinder 60 and the clamping block 62c are both fixedly sleeved on the guide member 62a, and the clamping portion 63 is clamped between the clamping block 62c and the first guide sleeve 62b.
[0104] The clamping portion 63 can be a clamping frame (such as the connecting frame 61 described above) provided on the outer wall of the first air pump 60. The specific structure of the clamping frame depends on the number of elastic structures 62. In the embodiment shown in FIG2, the elastic structures 62 include multiple groups, and the clamping frames are arranged around the outer wall of the first air pump 60 in a predetermined axial direction. The multiple groups of elastic structures 62 are connected between the clamping frames and the pusher 102 and are symmetrically arranged relative to the longitudinal symmetry plane of the first air pump 60. In this case, the force on the first air pump 60 is relatively uniform.
[0105] The first guide sleeve 62b and the clamping block 62c are both sleeved on the guide member 62a. Optionally, the first guide sleeve 62b and the clamping block 62c are both fixedly sleeved with the guide member 62a. The clamping portion 63 is clamped between the first guide sleeve 62b and the clamping block 62c, so that the guide member 62a and the clamping portion 63 are fixedly arranged, thereby achieving a fixed arrangement of the guide member 62a and the first air pump 60.
[0106] The first guide sleeve 62b and the clamping block 62c are fixedly connected to the guide member 62a by a threaded connection, an interference fit connection, a pin connection, etc.
[0107] At this time, the first guide sleeve 62b and the clamping block 62c are used to achieve a fixed connection between the guide member 62a and the clamping portion 63, which has a simple structure and is easy to assemble and disassemble.
[0108] Further optionally, referring to FIG3 , a connection hole K for a fastener to pass through is provided on both the first guide sleeve 62b and the clamping block 62c, and the first guide sleeve 62b and the clamping block 62c are further tightly connected by the fastener to tightly clamp the clamping portion 63. Furthermore, the fastener connecting the first guide sleeve 62b and the clamping block 62c is also passed through the clamping portion 63 clamped therebetween, thereby achieving a better fixing effect of the clamping portion 63. The fasteners mentioned in the embodiments of the present application include pins, latches, screws, bolts, studs, etc., which pass through the connection hole K on the two components to securely connect the two components.
[0109] In a further embodiment, please refer to Figure 2, the elastic structure 62 also includes a stopper 62d, which is arranged at one end where the guide member 62a is connected to the clamping portion 63, and the first guide sleeve 62b is located between the clamping block 62c and the elastic member 62s, and the clamping block 62c is located between the stopper 62d and the first guide sleeve 62b.
[0110] The stopper 62d is usually fixedly arranged at one end where the guide member 62a is connected to the clamping portion 63. The specific fixing method can be selected as fastener connection (specifically, a connection hole K can be constructed on both the stopper 62d and the guide member 62a, see Figure 5), threaded connection, plug-in, etc.
[0111] The stopper 62d serves as a blocking structure at one end of the guide member 62a, which can prevent the first vacuum cylinder 60 and the clamping block 62c from escaping from the guide member 62a, thereby improving the structural reliability of the processing equipment 100.
[0112] In some embodiments, referring to FIG. 3 , the elastic structure 62 further includes a pad 62 e , which is sleeved on the guide member 62 a and located between the first guide sleeve 62 b and the elastic member 62 s .
[0113] The backing plate 62e is generally thin and is mounted on the guide member 62a and located on the side of the first guide sleeve 62b facing away from the clamping block 62c. The elastic member 62s abuts the side of the backing plate 62e facing away from the first guide sleeve 62b. The backing plate 62e and the first guide sleeve 62b (and the clamping block 62c) can also be connected by fasteners. Alternatively, the elastic member 62s can be used to hold the backing plate 62e against the first guide sleeve 62b.
[0114] At this time, a pad 62e is provided between the first guide sleeve 62b and the elastic member 62s. The pad 62e contacts the elastic member 62s to reduce wear of the first guide sleeve 62b. The pad 62e only needs to be replaced.
[0115] In some embodiments, please refer to Figure 3, the elastic structure 62 also includes a limiting member 62f arranged on the guide member 62a, a mounting hole is provided on the pushing member 102, the guide member 62a passes through the mounting hole and is movable relative to the mounting hole, the elastic member 62s is limited between the pushing member 102 and the pad 62e, and the limiting member 62f is located on the side of the pushing member 102 away from the elastic member 62s.
[0116] In a direction perpendicular to the first direction X, the maximum dimension of the limiting member 62f is greater than the maximum dimension of the guide member 62a, thereby preventing the guide member 62a from slipping out of the mounting hole on the pusher 102. The limiting member 62f can be a limiting rod, a limiting block, a limiting plate, etc. The limiting member 62f and the guide member 62a can be integrally formed or separately connected.
[0117] At this time, the guide member 62a and the limiting member 62f can move relative to each other through the mounting hole, and under the restriction of the limiting member 62f, the guide member 62a will not fall out of the mounting hole. The structure is simple and easy to implement.
[0118] In some other embodiments, referring to FIG. 4 , the first vacuum cylinder 60 is movably mounted on the bottom cover 30 along the first direction X. The inlet end of the first vacuum cylinder 60 and the outlet end of the first vacuum cylinder 60 are located on opposite sides of a direction perpendicular to the first direction X. The elastic structure 62 includes an elastic member 62s. The pusher 102 is fixed to the outlet end of the first vacuum cylinder 60. The elastic member 62s is mounted on the first vacuum cylinder 60 between the bottom cover 30 and the outlet end of the first vacuum cylinder 60.
[0119] The inlet end of the first air pump 60 is located on one side of the bottom cover 30, and the outlet end of the first air pump 60 is located on the other side of the bottom cover 30. In actual application, the inlet end of the first air pump 60 is located inside the cavity body 10, and the outlet end of the first air pump 60 is located outside the cavity body 10.
[0120] The pusher 102 is fixedly connected to the outlet end of the first vacuum cylinder 60, and the elastic member 62s is sleeved on the first vacuum cylinder 60 between the bottom cover 30 and the outlet end. That is to say, in actual application, the elastic member 62s is sleeved on the portion of the first vacuum cylinder 60 located outside the chamber body 10, and the pusher 102 is located outside the chamber body 10. The power source 101 can also be installed outside the chamber body 10. In this way, not only is the installation of the elastic structure 62, the pusher 102 and the power source 101 facilitated, but also the erosion of the elastic structure 62, the pusher 102 and the power source 101 by substances in the chamber body 10 can be reduced, thereby improving the service life of the processing equipment 100.
[0121] At the same time, the first vacuum cylinder 60 itself is used to guide the elastic member 62s, so that the structure of the processing equipment 100 is more compact and the cost is lower.
[0122] During actual operation, when the power source 101 pushes the pushing member 102 to move toward the inlet end of the first vacuum cylinder 60, the pushing member 102 directly drives the first vacuum cylinder 60 to move relative to the bottom cover 30. During the movement of the first vacuum cylinder 60, the elastic member 62s is compressed. Under the action of the elastic force provided by the elastic member 62s, the inlet end of the first vacuum cylinder 60 is tightly fitted with the outlet end of the external channel.
[0123] Further to the embodiment, please refer to Figure 4, the elastic structure 62 also includes a second guide sleeve 62h, which is sleeved between the bottom cover 30 and the first vacuum cylinder 60. It is possible that the second guide sleeve 62h is fixedly connected to one of the first vacuum cylinder 60 and the bottom cover 30, and the other is clearance-fitted, so that the first vacuum cylinder 60 can move relative to the bottom cover 30, so that the first vacuum cylinder 60 is tightly abutted against the outlet end of the external channel. The provision of the second guide sleeve 62h not only guides the movement of the first vacuum cylinder 60, but also reduces the friction between the first vacuum cylinder 60 and the bottom cover 30, thereby improving the reliability of the processing equipment 100.
[0124] Further to the embodiment, referring to FIG. 4 , the elastic structure 62 further includes a third guide sleeve 62 g , which is sleeved between the pusher 102 and the first air pump 60 .
[0125] Specifically, a matching hole can be provided on the pusher 102, the outlet end of the first air pump 60 is provided in the matching hole, and the third guide sleeve 62g is provided in the matching hole to fix the pusher 102 and the outlet end of the first air pump 60. The provision of the third guide sleeve 62g makes it easier to fix the pusher 102 and the first air pump 60.
[0126] Optionally, the elastic member 62s is limited between the second guide sleeve 62h and the third guide sleeve 62g.
[0127] Further to the embodiment, referring to FIG. 4 , the elastic structure 62 further includes a first telescopic tube 62 k . The first telescopic tube 62 k is sleeved on the first air pump 60 and is configured to be fixedly connected between the bottom cover 30 and the pusher 102 .
[0128] Because the first air pump 60 is movable relative to the bottom cover 30 in the first direction X, a clearance exists between the bottom cover 30 and the first air pump 60 to allow air to circulate between the two sides of the bottom cover 30. It is understood that the first telescopic tube 62k and the bottom cover 30, as well as the first telescopic tube 62k and the pusher 102, are sealed (e.g., via a sealing member) to reduce the possibility of air leakage at the connection.
[0129] At this time, the telescopic ends of the first telescopic tube 62k are respectively connected to the bottom cover 30 and the pusher 102. The fitting part of the first vacuum cylinder 60 and the bottom cover 30 is located in the first telescopic tube 62k. The first telescopic tube 62k can isolate the fitting gap from the outside atmosphere, and can prevent impurities from the outside atmosphere from entering the side of the inlet end of the first vacuum cylinder 60 of the bottom cover 30 through the fitting gap. When the processing equipment 100 is applied to the chamber body 10, the probability of impurities from the outside atmosphere entering the chamber body 10 through the fitting gap can be reduced.
[0130] Further to the embodiment, please refer to Figure 4, the elastic structure 62 also includes a second telescopic tube 62m, one end of the second telescopic tube 62m is fixedly connected to the pusher 102, and the other end is used to dock with the exhaust pipe 103, and the second telescopic tube 62m is connected to the outlet end of the first exhaust cylinder 60.
[0131] The air extraction pipeline 103 is used to connect the air extraction device and the pipeline, and is used to connect the air extraction device to the second telescopic tube 62m, and then to the first air extraction cylinder 60. It can be understood that the second telescopic tube 62m and the air extraction pipeline 103, as well as the second telescopic tube 62m and the pusher 102, are sealed (e.g., sealed by a sealing member) to reduce the probability of air leakage at the connection.
[0132] Under the action of the air extraction device, the air flow in the first air extraction cylinder 60 flows to the air extraction device through the second telescopic tube 62m and the air extraction pipeline 103. The design of the second telescopic tube 62m allows the position of the air extraction pipeline 103 to change with the position of the first air extraction cylinder 60. Even if the pusher 102 pushes the first air extraction cylinder 60, the first air extraction cylinder 60 and the air extraction device can still maintain good communication, reducing the probability of air leakage.
[0133] The first and second telescopic tubes 62k and 62m are both capable of extending and retracting along the first direction X. When the power source 101 pushes the pusher 102 to move, the pusher 102 can drive the first and second telescopic tubes 62k and 62m to extend and retract. Understandably, when the first telescopic tube 62k is compressed, the second telescopic tube 62m is stretched, and the two telescopic states are opposite.
[0134] The first telescopic tube 62k and the second telescopic tube 62m can be made of bellows, sleeves, etc., without limitation.
[0135] In some embodiments, referring to Figures 1 and 5, the processing equipment 100 also includes a chamber door 20, which is arranged at one end of the chamber body 10 in the first direction X. A gas channel S is constructed on the chamber door 20, and the gas channel S is connected to the spray hole P of the spray part 50.
[0136] The description of the chamber door 20 and the spray element 50 can be referred to the above description and will not be repeated here.
[0137] During gas delivery, the gas first passes through the gas channel S on the chamber door 20, then enters the spray holes P of the spray element 50, and finally flows toward the carrier 40. Because the spray element 50 is disposed on the chamber door 20, the gas channel S is disposed on the chamber door 20, eliminating the need for other gas delivery pipelines and eliminating the need to occupy internal chamber space. This helps improve chamber space utilization and simplifies the processing apparatus 100.
[0138] In the embodiment, the processing equipment 100 further includes a connecting block 51 . The connecting block 51 is connected between the spraying member 50 and the chamber door 20 . The connecting block 51 has a transition gas channel G connecting the gas channel S and the spray hole P.
[0139] The connecting block 51 may be a metal piece, and may be configured in plurality.
[0140] If the spray part 50 is directly connected to the chamber door 20, a connecting hole for the fastener to pass through needs to be processed on the chamber door 20 or the spray part 50, and the fastener needs to pass through at least one of the spray part 50 and the chamber door 20, which will destroy the structure of the chamber door 20 and the spray part 50, and the connecting hole is prone to air leakage, and the reliability is low.
[0141] At this time, the spray part 50 and the chamber door 20 are connected by the connecting block 51. There is no need to process a penetrating hole structure on the spray part 50 or the chamber door 20. The connecting block 51 can be fastened to the chamber door 20 first. Since the connecting block 51 has a certain length, it can provide space for connecting the fastener and the connecting block 51, making it easier to install the spray part 50 on the chamber door 20.
[0142] It can be understood that the spraying member 50 is provided with a spraying inlet which is communicated with the air inlet. When the connecting block 51 is installed, the connecting block 51 is installed at the spraying inlet, and the transition channel is communicated with the spraying inlet.
[0143] In the embodiment, the connection block 51 rigidly connects the spray member 50 and the chamber door 20. In this case, the structure of the connection block 51 is simpler, and it is easier to achieve sealing between the transition channel and the gas channel S of the cavity and between the transition channel and the spray inlet.
[0144] 1 and 5 , an end flange 11 is provided at one end of the chamber body 10 facing the chamber door 20 . The end flange 11 is sealed to the chamber door 20 and has an air inlet J for connecting to an air source.
[0145] The end flange 11 is a structure that protrudes from the chamber body 10 in a direction perpendicular to the first direction X and surrounds the axis of the chamber body 10 (parallel to the first direction X). It typically has a large contact area and makes surface contact with the chamber door 20. The end flange 11 and the chamber body 10 can be integrally formed or separately provided.
[0146] At this time, an air inlet J is provided on the end face flange 11, and the air inlet J is used to connect a joint of the air source, etc., so as to facilitate the installation and connection of the air source.
[0147] Optionally, the air inlet J is configured on the side of the end flange 11 facing away from the chamber door 20. Optionally, the gas channel S is arranged around the axis of the chamber body 10, and multiple air inlet holes J can be arranged and arranged around the axis of the chamber body 10. Further, optionally, two air inlet holes J can be arranged in the height direction, one located above and one located below.
[0148] In some embodiments, please refer to FIG. 6 , which is a schematic structural diagram of the chamber body 10 in one or more embodiments. The outer contour of the carrier 40 and the projection of the inner wall of the chamber body 10 along the first direction X are rectangular.
[0149] When the outer contour of the carrier 40 and the inner wall of the chamber body 10 are both rectangular structures, compared with the inner wall of the cylindrical chamber body 10 with the same cross-sectional area, more carriers 40 can be placed in the rectangular chamber, thereby greatly improving the single-chamber production capacity and improving the production capacity and efficiency of the processing equipment.
[0150] Typically, when the cross-section of the inner wall of the cavity body 10 is rectangular, in order to simplify the processing of the cavity body 10, in some embodiments, the cross-section of the outer wall of the cavity body 10 is also designed to be rectangular, such as the cavity body 10 structure shown in Figure 6. Of course, in other embodiments, the cross-section of the outer wall of the cavity body 10 is also designed to be circular, or other shapes.
[0151] In some embodiments, referring to Figures 1 and 5, the processing apparatus 100 further includes an air curtain 70 located in the chamber. The air curtain 70 surrounds the outer periphery of the spray element 50 and / or surrounds the inlet end of the first exhaust cylinder 60.
[0152] The air curtain member 70 has a plurality of air jet ports, each of which can eject a gas (the gas is usually a gas that does not participate in the substrate coating reaction) to form an air curtain around itself.
[0153] An air curtain member 70 may be provided around the outer periphery of the spray member 50 . The air curtain member 70 may be provided in a ring-shaped structure, or a plurality of non-annular air curtain members 70 may be provided around the outer periphery of the spray member 50 at intervals.
[0154] An air curtain member 7 may also be provided around the inlet end of the first vacuum cylinder 60 . The air curtain member 70 may be a single annular structure, or a plurality of non-annular air curtain members 70 may be provided at intervals around the outer circumference of the inlet end of the first vacuum cylinder 60 .
[0155] The air curtain member 70 has an air jet direction. When the air curtain member 70 is in operation, the air jet forms an air curtain. The air curtain blocks the air flow to a certain extent in the space between the two sides of the air curtain. The specific structure of the air curtain member 70 is not limited in the embodiments of this application and can be set according to conventional configurations.
[0156] Specifically, part of the air curtain member 70 can be used to generate an air curtain that flows parallel to the first direction X, generating an air curtain in the upper and lower directions of the spray member 50. Alternatively, part of the air curtain member 70 can be used to generate an air curtain that flows perpendicular to the first direction X and is located on the side of the spray member 50 away from the carrier 40.
[0157] At this time, an air curtain member 70 is arranged around the spray member 50 and / or around the inlet end of the first vacuum cylinder 60. The air curtain member 70 can form an independent space around the spray member 50 and / or around the inlet end of the first vacuum cylinder 60, which can hinder the exhaust gas, dust, etc. in the chamber from entering the carrier 40 through the joint between the spray member 50 and the carrier 40 and entering the carrier 40 through the joint between the first vacuum cylinder 60 and the carrier 40 to a certain extent, which helps to improve the molding quality of the substrate in the carrier 40, and can also effectively reduce the leakage of substances in the carrier 40 into the chamber, reducing the difficulty of cleaning the chamber.
[0158] In addition, compared with the conventional solution of using a sealing member to achieve sealing at the joint, the sealing at the joint is achieved by using the air curtain member 70, which can provide better sealing and is more reliable.
[0159] In some embodiments, referring to FIG. 9 , the processing apparatus 100 further includes a second vacuum cylinder 104 . The second vacuum cylinder 104 is disposed in the chamber body 10 and communicates with the inside and outside of the chamber.
[0160] The second vacuum cylinder 104 is generally cylindrical in structure, and can be fixedly mounted on the bottom cover 30 , or can be mounted on the chamber body 10 or the chamber door 20 , as long as it can connect the inside and outside of the chamber.
[0161] During actual operation, the second vacuum cylinder 104 can be used to extract the substances in the chamber, especially the substances sprayed by the air curtain 70, to effectively maintain the pressure and cleanliness in the chamber, reduce the probability of the substances in the chamber entering the carrier 40, and improve the molding quality of the substrate in the carrier 40.
[0162] In some embodiments, please refer to FIG. 7 , which illustrates a schematic diagram of the arrangement of the carrier 40 in one or more embodiments. The carrier 40 includes at least two supporting positions arranged side by side in a direction perpendicular to the first direction X. Each supporting position includes at least one reaction boat 41 connected sequentially in the first direction X. The spray element 50 is simultaneously sealed to the inlet ends of the at least two supporting positions arranged side by side.
[0163] The reaction boat 41 is the smallest unit in the carrier 40 that can guide the flow of gas along the first direction X and can carry the substrate. Its specific structure can be configured according to conventional settings in the art and will not be described in detail here. The carrier 40 can be assembled from one or more reaction boats 41.
[0164] When the loading station includes only one reaction boat 41, the inlet and outlet of the loading station correspond to the inlet and outlet of the reaction boat 41. When the loading station includes two or more reaction boats 41, the inlet of the loading station corresponds to the inlet of the reaction boat 41 disposed near the spray element 50, and the outlet of the loading station corresponds to the outlet of the reaction boat 41 disposed near the first vacuum cylinder 60.
[0165] The spraying member 50 may be sealedly connected to the inlet ends of some of the bearing positions arranged side by side, or may be sealedly connected to the inlet ends of all the bearing positions arranged side by side, without limitation.
[0166] In order to cover the inlet end of the carrier 40, one or more spray elements 50 may be provided. The fewer the number of spray elements 50, the lower the cost.
[0167] In some embodiments, referring to FIG1 , the processing device 100 includes a heating element 80, which is arranged between the carrier 40 and the inner wall of the cavity body 10. The heating element 80 can be a resistive heating element 80, an infrared heating element 80, etc., and the specific type is not limited. As a conventional component in this field, it is not limited or elaborated here. Usually, before the substrate is coated, the substrate needs to be preheated. The heating element 80 is set between the carrier 40 and the inner wall of the cavity body 10. The heating element 80 is closer to the carrier 40, and the heating efficiency is higher.
[0168] In the embodiment, referring to FIG. 7 , when the outer contour of the carrier 40 is a rectangular cross-section, a heating element 80 is disposed on the top and side surfaces of the carrier 40. Furthermore, when each carrier position in the carrier 40 includes multiple reaction boats 41, a heating element 80 may be disposed between each reaction boat 41 and the chamber body 10. Optionally, the heating element 80 may be disposed around each reaction boat 41 in the first direction X to provide more uniform heating.
[0169] In some embodiments, a plurality of heating elements 80 are disposed between the carrier 40 and the chamber body 10 , and each heating element 80 is independently controlled.
[0170] Independent control of the heating element 80 means that the opening and closing of the heating element 80 is independent of the other heating elements 80 and can be controlled independently. For example, when the carrier 40 includes at least one group of loading positions, multiple independently controlled heating elements 80 are disposed on the inner wall of the chamber body 10 surrounding each group of loading positions. For another example, if each loading position includes multiple reaction boats 41, each reaction group in the same group is equipped with a heating element 80, and each heating element 80 is independently controlled.
[0171] When the heating elements 80 can be controlled independently, the reaction temperature of each reaction group can be flexibly adjusted, and the adaptability is better.
[0172] In some embodiments, please refer to Figure 8, which illustrates the temperature division of the chamber body 10 in one or more embodiments. Along a first direction X, the chamber body 10 is divided into a plurality of temperature zones W. Each temperature zone W is provided with a heating element 80, and the heating elements 80 in each temperature zone W are independently controlled.
[0173] As shown in FIG8 , along the first direction X, the chamber body 10 is divided into three temperature zones W. The heating elements 80 in each temperature zone W can be independently controlled, and the heating elements 80 in the same temperature zone W can be linked together. This simplifies the control of the heating elements 80 and also enables temperature zoning. This allows for comparison of different reaction temperatures of substrates in the same furnace, expanding its application range.
[0174] In some embodiments, referring to FIG. 6 and FIG. 7 , a guide structure 90 is disposed on the inner wall of the chamber body 10 . The guide structure 90 is used to guide the carrier 40 along the first direction X into the chamber.
[0175] The guide structure 90 can be a guide rail provided on the inner wall of the chamber body 10. Correspondingly, a sliding rail is adapted to be provided on the carrier 40, which moves along the guide rail and enters the chamber. The guide structure 90 can be located at the bottom of the carrier 40, or at the top of the side, without limitation. In the embodiments of the present application, the specific structure of the guide structure 90 is not limited, and conventional configurations can be made according to the art.
[0176] Under the guidance of the guide structure 90 , the carrier 40 can be more conveniently delivered into the cavity body 10 , and the delivery position accuracy of the carrier 40 is easier to confirm.
[0177] Specifically in the embodiment, please refer to Figures 6 and 7. The guide structure 90 includes a support plate 91 and at least two limiting rails 93. The support plate 91 is supported on the inner wall of the cavity body 10. Each limiting rail 93 extends along the first direction X and is arranged at intervals. A guide channel T for guiding the transportation of the carrier 40 is formed between adjacent limiting rails 93.
[0178] The support plate 91, support frame 92, and limiting rail 93 can all be made of metal, with no specific limitation. When the carrier 40 includes multiple loading positions, the distance between the guide channels T formed between adjacent limiting rails 93 is adapted to the width of each loading position, so that each loading position can enter the chamber through a corresponding guide channel T.
[0179] At this time, the carrier 40 is supported by the support plate 91 , and the guide channel T formed by the limiting rails 93 limits the displacement of the carrier 40 in the spacing direction of the limiting rails 93 , so the structural reliability is good.
[0180] Optionally, the guide structure 90 further includes a support frame 92 , which is fixed to the inner wall of the cavity body 10 , and the support plate 9191 is supported on the cavity body 10 through the support frame 92 .
[0181] In some embodiments, the processing equipment 100 also includes an air intake pipeline (not shown) and an air exhaust pipeline 103. The air intake pipeline is connected to the spray part 50 for supplying gas to the spray part 50. The air exhaust pipeline 103 is connected to the carrier 40 located in the chamber for discharging the gas in the carrier 40 out of the chamber.
[0182] The specific configuration of the air intake and exhaust lines 103 is not limited in the present embodiment; they can be formed by separate pipes or by a channel structure formed on the chamber body 10. Typically, the processing device 100 also includes an exhaust device that is communicable with the exhaust line 103. The exhaust device can be a vacuum pump, an exhaust fan, etc., which can promote the flow of gas within the carrier 40.
[0183] During use, the gas in the gas source enters the spray part 50 through the air inlet pipe, and is then sprayed into the carrier 40 by the spray part 50. When the gas is in the carrier 40, it can process the substrate in the carrier 40 (including coating, heating, cleaning, etc.), and finally, under the pumping of the exhaust device, it flows to the exhaust pipe and then discharged from the chamber.
[0184] Specifically, when the processing equipment 100 includes the first air pump 60 , the air pump line may be connected to the carrier 40 via the first air pump 60 .
[0185] In some embodiments, please refer to Figures 1 and 6, the cavity body 10 includes the above-mentioned cavity body 10, the carrier 40, the spray part 50, the first vacuum cylinder 60, the cavity door 20, the bottom cover 30 and the guide structure 90. During the process of the carrier 40 being sent to the cavity body 10, the cavity door 20 drives the spray part 50 to open the entrance of the chamber, and the carrier 40 moves along the guide structure 90 until it is against the first vacuum cylinder 60, and then closes the cavity door 20 and drives the spray part 50 to press the inlet end of the carrier 40. Under the joint action of the spray part 50, the first vacuum cylinder 60 and the guide structure 90, the carrier 40 is convenient to transport and accurately positioned.
[0186] In addition, referring to FIG. 10 , an embodiment of the present application further provides a method for using the processing device 100 . The method for using the processing device 100 includes:
[0187] S10, placing the carrier 40 carrying the substrate into the chamber of the chamber body 10;
[0188] S20, covering the spraying member 50 in the chamber with the inlet end of the carrier 40, so that the spraying member 50 and the carrier 40 enclose and form a processing space;
[0189] S30 , introducing a processing gas into the spraying member 50 so that the processing gas enters the processing space through the spraying member 50 .
[0190] Prior to step S10, the carrier 40 may be loaded with a substrate at the loading station. The substrate may be, but is not limited to, a wafer. While at the loading station, the carrier 40 is located outside the chamber. Typically, automatic loading is performed using a loading mechanism. The loading mechanism may be, but is not limited to, a robotic arm. In step S10, a conveying mechanism may be used to transport the carrier 40 into the chamber body 10. The conveying mechanism may be a conveyor roller, a conveyor belt, a robotic arm, or the like.
[0191] In step S10, before the carrier 40 is introduced into the chamber, the spray element 50 in the chamber is first moved to a clearance position. Typically, the chamber body 10 has a chamber door 20, and the spray element 50 can be installed on the chamber door 20. Before the carrier 40 is introduced into the chamber, the chamber door 20 is first opened, and the spray element 50 moves with the chamber door 20 to a clearance position to avoid the carrier 40. The conveying mechanism is then controlled to convey the carrier 40 from the loading station into the chamber. In step S10, the specific method for implementing the introduction of the carrier 40 into the chamber is not limited and depends on the structure of the conveying mechanism. It is not specifically limited in the embodiments of the present application.
[0192] In step S20, the spray element 50 is placed over the inlet end of the carrier 40. Typically, when the chamber door 20 is closed, the spray element 50 follows the chamber door 20 from its retracted position to a closed position covering the inlet end of the carrier 40. When the spray element 50 is placed over the inlet end of the carrier 40, the spray element 50 and the carrier 40 enclose a processing space. Under the guidance of the carrier 40, gas entering the processing space flows along a first direction X.
[0193] It is understood that the spray element 50 is connected to a gas source, the type of which is determined by the type of gas being charged. The gas source may be interchangeable, allowing the spray element 50 to deliver different gases to the processing space. Alternatively, the spray element 50 may be connected to multiple gas sources, and one or more of these gas sources may be switchably connected to the processing space to deliver different gases to the processing space.
[0194] In step S30, a valve connecting the gas source and the spray element 50 is opened to allow the process gas to be introduced into the spray element 50. The process gas can be an inert gas, a process gas that reacts with the substrate, or the like, without limitation. The gas from the gas source first passes through the spray element 50 and then flows into the processing space under the spraying action of the spray element 50, thereby reacting with the substrates in the processing space or changing the atmosphere within the processing space.
[0195] By using the method of using the processing device 100 provided in the embodiment of the present application, substrate processing can be achieved.
[0196] In some embodiments, the processing apparatus 100 includes a first vacuum cylinder 60 , which is at least partially located in the chamber. Step S10 of delivering the carrier 40 carrying the substrate into the chamber of the chamber body 10 includes:
[0197] The carrier 40 carrying the substrate is brought into the chamber until the outlet of the carrier 40 is covered by the first vacuum cylinder 60 .
[0198] The specific structure and configuration of the first exhaust cylinder 60 are described in the aforementioned embodiments and will not be further elaborated here. The first exhaust cylinder 60 is disposed at the rear end of the chamber body 10. When the carrier 40 is within the chamber, the outlet of the carrier 40 is covered by the first exhaust cylinder 60. The first exhaust cylinder 60 connects the processing space with the outside, and is used to facilitate the outflow of gases within the processing space.
[0199] In step S10 , when the carrier 40 is transported into the chamber, when the outlet of the carrier 40 docks with the first vacuum cylinder 60 and the first vacuum cylinder 60 covers the outlet of the carrier 40 , the carrier 40 reaches the designated position, and the transport of the carrier 40 is completed.
[0200] Specifically, the first air pump 60 can adopt the structure of the first air pump 60 in the above embodiment to closely abut against the outlet end of the carrier 40 , and the interior of the carrier 40 and the first air pump 60 form a space for gas flow.
[0201] At this time, during the process of transporting the carrier 40, the first vacuum cylinder 60 can be used to counteract the outlet end of the carrier 40 to determine whether the carrier 40 is transported to the correct position. By limiting the position of the carrier 40 through the first vacuum cylinder 60, the transportation of the carrier 40 is simpler and more convenient.
[0202] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0203] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that a person of ordinary skill in the art may make various modifications and improvements without departing from the spirit of the present application, and these modifications and improvements fall within the scope of protection of the present application. Therefore, the scope of protection of the present patent application shall be determined by the appended claims.
Claims
1. A processing device, characterized in that: The processing equipment comprises: A cavity body having a cavity; A carrier, operably disposed in the chamber, the carrier being configured to be able to drain in a first direction and used to carry a substrate arranged on a drainage path of the carrier; A spraying member is disposed in the chamber and covers the inlet end of the carrier in the first direction, and the spraying member is used for delivering gas to the carrier.
2. The processing device according to claim 1, characterized in that The processing equipment further includes a first vacuum cylinder, which is at least partially located in the chamber and covers an outlet end of the carrier that is disposed opposite to its inlet end in the first direction, and is used to connect the carrier and the outside of the chamber; The upper limit of the carrier in the first direction is located between the first vacuum cylinder and the spraying member.
3. The processing device according to claim 2, characterized in that The processing equipment further includes a chamber door and a bottom cover arranged at opposite ends of the chamber body in the first direction, the spraying member is arranged on the chamber door, and the first exhaust cylinder is arranged on the bottom cover; Wherein, the processing equipment includes at least one of the following solutions: the spraying part is elastically connected to the chamber door, and the first vacuum cylinder is elastically connected to the bottom cover.
4. The processing device according to claim 3, characterized in that The processing equipment further includes a connecting frame and an elastic structure, wherein the connecting frame is arranged on the first vacuum cylinder, and the elastic structure is elastically connected between the bottom cover and the connecting frame in the first direction.
5. The processing device according to claim 3, characterized in that The processing device also includes an elastic structure, a power source and a pusher; The pushing member is movably mounted on the bottom cover in the first direction; the power source is disposed on the bottom cover and is used to drive the pushing member to move; The elastic structure is elastically deformable in the first direction and is connected between the first vacuum cylinder and the pushing member.
6. The processing device according to claim 5, characterized in that The elastic structure comprises a guide member and an elastic member, wherein the guide member is connected between the first vacuum cylinder and the pushing member along the first direction; The guide member is relatively movable along the first direction with at least one of the first vacuum cylinder and the push member, and is fixedly connected with the other one, and the elastic member is sleeved on the guide member.
7. The processing device according to claim 5, characterized in that The first vacuum cylinder is movably sleeved on the bottom cover along the first direction, and the inlet end of the first vacuum cylinder and the outlet end of the first vacuum cylinder are configured to be located at opposite sides of the bottom cover in a direction perpendicular to the first direction; The elastic structure includes an elastic member, the pushing member is fixedly connected to the outlet end of the first vacuum cylinder, and the elastic member is sleeved on the first vacuum cylinder between the bottom cover and the outlet end of the first vacuum cylinder.
8. The processing device according to any one of claims 1 to 7, characterized in that The processing equipment further comprises a chamber door, which is arranged at one end of the chamber body in the first direction, and a gas channel is constructed on the chamber door; the gas channel is connected to the spray hole of the spray member.
9. The processing device according to claim 8, characterized in that The processing equipment further includes a connection block connected between the spray piece and the chamber door, and the connection block has a transition gas channel connecting the gas channel and the spray hole.
10. The processing device according to claim 9, characterized in that: The connecting block rigidly connects the spraying member and the chamber door.
11. The processing device according to claim 8, characterized in that An end face flange is provided at one end of the cavity body facing the cavity door, and the end face flange is sealed and connected to the cavity door; The end face flange has an air inlet hole for connecting to an air source, and the air inlet hole is connected to the gas channel.
12. The processing device according to any one of claims 1 to 7, characterized in that The projections of the outer contour of the carrier and the inner wall of the cavity body along the first direction are both rectangular.
13. The processing device according to any one of claims 1 to 7, characterized in that The processing device also includes an air curtain member, and the air curtain member is located in the chamber; Wherein, the processing equipment includes at least one of the following solutions: the air curtain member is arranged around the periphery of the spray member, and the air curtain member is arranged around the inlet end of the first vacuum cylinder of the processing equipment.
14. The processing device according to claim 13, characterized in that The processing equipment further includes a second vacuum cylinder, which is disposed in the chamber body and communicates with the inside and outside of the chamber.
15. The processing device according to any one of claims 1 to 7, characterized in that The carrier includes at least two carrying positions arranged side by side in a direction perpendicular to the first direction, and each of the carrying positions includes at least one reaction boat connected in sequence in the first direction; the spray component is simultaneously sealed and connected to the inlet ends of at least two of the carrying positions arranged side by side.
16. The processing device according to any one of claims 1 to 7, characterized in that The processing equipment further includes a heating element, which is arranged between the carrier and the inner wall of the chamber body.
17. The processing device according to claim 16, characterized in that A plurality of heating elements are arranged between the carrier and the chamber body, and each heating element is independently controlled.
18. The processing device according to claim 16, characterized in that Along the first direction, the cavity body is divided into a plurality of temperature zones, each of the temperature zones is provided with the heating element, and the heating elements in each of the temperature zones are independently controlled.
19. The processing device according to any one of claims 1 to 7, characterized in that A guide structure is arranged on the inner wall of the cavity body, and the guide structure is used to guide the carrier to enter the cavity along the first direction.
20. The processing device according to claim 19, characterized in that The guide structure comprises a support plate and at least two limit rails, the support plate is supported on the inner wall of the cavity body, and the limit rails are extended along the first direction and arranged at intervals; A guide channel for guiding the transport of the carrier is formed between adjacent limit rails.
21. The processing device according to any one of claims 1 to 7, characterized in that The processing equipment also includes an air intake pipeline and an air exhaust pipeline. The air intake pipeline is connected to the spray part for conveying gas to the spray part. The air exhaust pipeline is connected to the carrier in the chamber for exhausting the gas in the carrier to outside the chamber.
22. A method for using a processing device, characterized in that: Applied to the processing device according to any one of claims 1 to 21, the method for using the processing device comprises: Sending a carrier carrying a substrate into the chamber of the chamber body; Covering the spraying member in the chamber on the inlet end of the carrier, so that the spraying member and the carrier together form a processing space; A processing gas is introduced into the spraying member so that the processing gas enters the processing space through the spraying member.
23. The method for using the processing device according to claim 22, characterized in that: The processing apparatus further includes a first vacuum pump located at least partially within the chamber; The step of sending the carrier carrying the substrate into the chamber of the chamber body comprises: The carrier carrying the substrate is sent into the chamber until the outlet end of the carrier is covered by the first vacuum cylinder.