Composition, method for producing film, method for producing solid-state imaging element, and method for producing infrared sensor

Abstract

Disclosed is a composition which contains an infrared-absorbing dye A represented by formula (1) or (2), a curable compound B, and a solvent C, wherein: the solvent C contains a solvent c1 that has a CLogP value of -2.00 to -0.35; and the content of the solvent c1 in the composition is 0.1 ppm by mass to 1,000 ppm by mass. Also disclosed are: a method for producing a film which uses the composition; a method for producing a solid-state imaging element; and a method for producing an infrared sensor.

Description

Composition, film manufacturing method, solid-state imaging device manufacturing method, and infrared sensor manufacturing method

[0001] The present invention relates to a composition containing an infrared absorbing dye, and also to a method for producing a film, a solid-state imaging device, and an infrared sensor using the composition containing the infrared absorbing dye.

[0002] Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image sensors for color imaging, such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light-receiving sections. For this reason, an infrared cut filter is sometimes used to correct visibility.

[0003] Infrared cut filters are produced using compositions containing infrared absorbing dyes, such as phthalocyanine compounds.

[0004] Patent Document 1 describes the production of an infrared cut filter or the like using a composition containing a specific partially expanded aluminum phthalocyanine compound.

[0005] International Publication No. 2022 / 172980

[0006] However, phthalocyanine compounds tend to aggregate in compositions or films. Therefore, compositions containing phthalocyanine compounds as infrared absorbing dyes have room for improvement in terms of storage stability. Furthermore, films formed using compositions containing phthalocyanine compounds tend to generate aggregates derived from the phthalocyanine compounds, leaving room for further improvement in terms of suppressing foreign matter defects.

[0007] The present inventors have investigated the composition disclosed in Patent Document 1 and found that this composition also had insufficient storage stability. Furthermore, films obtained using the composition frequently suffered from foreign matter defects.

[0008] Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent storage stability and suppressing the occurrence of foreign matter defects. Another object of the present invention is to provide a method for producing a film, a method for producing a solid-state imaging device, and a method for producing an infrared sensor.

[0009] The present invention provides the following:

[0010] <1> A composition comprising an infrared absorbing dye A represented by formula (1) or (2), a curable compound B, and a solvent C, wherein the solvent C comprises a solvent c1 having a CLogP value of −2.00 to −0.35, and the content of the solvent c1 in the composition is 0.1 to 1000 ppm by mass; In formula (1), X １ａ ~X １ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; １ａ ~X １ｐ may each independently bond to each other to form an aromatic ring, M １ represents a trivalent cation atom; Z １ represents a ligand; ２ａ ~X ２ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; ２ａ ~X ２ｐ may each independently bond to each other to form an aromatic ring, M ２represents a tetravalent cationic atom; Z ２ａ and Z ２ｂ each independently represents a ligand. <2> A composition comprising an infrared absorbing dye A represented by formula (1) or (2), a curable compound B, and a solvent C, wherein the solvent C contains at least one solvent c1a selected from ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, dipropylene glycol, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide, and the content of the solvent c1a in the composition is 0.1 to 1,000 ppm by mass; In formula (1), X １ａ ~X １ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; １ａ ~X １ｐ may each independently bond to each other to form an aromatic ring, M １ represents a trivalent cation atom; Z １ represents a ligand; ２ａ ~X ２ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; ２ａ ~X ２ｐmay each independently bond to each other to form an aromatic ring, M ２ represents a tetravalent cationic atom; Z ２ａ and Z ２ｂ each independently represents a ligand. <3> The composition according to <2>, wherein the solvent c1a is at least one selected from the group consisting of triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide. <4> M in the formula (1) １ is B, Al, Ga, In or Sc, and M in the above formula (2) ２ <5> The composition according to any one of <1> to <3>, wherein Z in the formula (1) is Ti, Zr, Hf, V, Nb, Ta, Si, Ge, or Sn. １ , and Z in the above formula (2) ２ａ and Z ２ｂ are each independently a ligand represented by formula (3) or formula (4); In formula (3), R ３ａ and R ３ｂ each independently represents a hydrogen atom, a hydroxy group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (5), * represents M １ or M ２ In formula (4), Y ４ Is -OSO ２ represents -, -OCO-, or -O-; ４ represents a single bond or an n4+1-valent linking group, Pm ４ represents a polymer chain, n4 represents an integer of 1 to 5, and when n4 is 2 to 5, a plurality of Pm ４ may be the same or different, * is M １ or M ２ It is a combination of In formula (5), L ５ represents a single bond or an n5+1-valent linking group, Pm ５ represents a polymer chain, n5 represents an integer of 1 to 5, and when n5 is 2 to 5, a plurality of Pm ５may be the same or different, and * represents a bond to P in formula (3). <6> The composition according to <5>, wherein the ligand represented by formula (3) is a ligand that is a polymer having a structure represented by formula (3-1), a ligand represented by formula (3-2), or a ligand represented by formula (3-3); In formula (3-1), R １１ａ represents a hydrogen atom, an alkyl group or a halogen atom; R １１ｂ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; １１ａ is -CONH-L １１ｂ -, -COO-L １１ｃ -, -CONH-L １１ｄ -O- or -COO-L １１ｅ represents —O—, and L １１ｂ ~L １１ｅ each independently represents a hydrocarbon group or a divalent group in which multiple hydrocarbon groups are linked by -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO-; * represents M １ or M ２ In formula (3-2), R １２ａ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; R １２ｂ represents an alkyl group or an aryl group; １２ represents an alkylene group or an arylene group, n12 represents 0 or 1, m12 represents an integer of 2 or more, * represents M １ or M ２ In formula (3-3), R １３ａ and R １３ｂ each independently represents an alkyl group or an aryl group; １３ａ and L １３ｂ each independently represents an alkylene group or an arylene group; n13 and p13 each independently represent 0 or 1; m13 and q13 each independently represent an integer of 2 or more; * represents M １ or M ２<7> In the above formula (1), X １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ At least one pair of X is bonded to each other to form an aromatic ring which may have a substituent, ２ｂ and X ２ｃ , X ２ｆ and X ２ｇ , X ２ｊ and X ２ｋ , X ２ｎ and X ２ｏ The composition according to any one of <1> to <6>, wherein any one or more pairs of the above may be bonded to each other to form an aromatic ring which may have a substituent. <8> The composition according to any one of <1> to <7>, wherein the infrared absorbing dye A includes a compound represented by formula (8): In formula (8), R ８ａ ~R ８ｖ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; Z ８ represents a ligand represented by formula (21) or a ligand that is a polymer having a structure represented by formula (22). In formula (21), R ２１ａ and R ２１ｂ each independently represents a hydrogen atom, a hydroxy group, an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, and * represents a bond to Al; ２２ａ represents a hydrogen atom, an alkyl group or a halogen atom; R ２２ｂ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; ２２ａis -CONH-L ２２ｂ -, -COO-L ２２ｃ -, -CONH-L ２２ｄ -O- or -COO-L ２２ｅ represents —O—, and L ２２ｂ ~L ２２ｅ each independently represent a hydrocarbon group or a divalent group in which multiple hydrocarbon groups are linked via -O-, -CO-, -COO-, -OCO-, -CONH-, or -NHCO-, and * represents a bond to Al. <9> The composition according to any one of <1> to <8>, in which the solvent C further contains at least one selected from propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, cyclopentanone, cyclohexanone, ethyl lactate, butyl acetate, and ethyl 3-ethoxypropionate. <10> The composition according to any one of <1> to <9>, in which the composition further contains a polymerizable compound and a photopolymerization initiator. <11> The composition according to any one of <1> to <10>, in which the composition further contains a coloring material that transmits infrared light and blocks visible light. <12> A method for producing a film, in which the composition according to any one of <1> to <11> is applied to a support. <13> A method for manufacturing a solid-state imaging device, the method comprising the method for manufacturing the film according to <12>. <14> A method for manufacturing an infrared sensor, the method comprising the method for manufacturing the film according to <12>.

[0011] According to the present invention, there is provided a composition capable of forming a film having excellent storage stability and suppressing the occurrence of foreign matter defects. The present invention also provides a method for producing a film using the composition, a method for producing a solid-state imaging device, and a method for producing an infrared sensor.

[0012] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor.

[0013] The present invention will be described in detail below. In this specification, the term "to" is used to mean that the numerical values ​​before and after the term are included as the lower and upper limits. In the description of groups (atomic groups) in this specification, a term without specifying whether it is substituted or unsubstituted encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only unsubstituted alkyl groups (unsubstituted alkyl groups) but also substituted alkyl groups (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. As used herein, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. As used herein, weight-average molecular weight and number-average molecular weight are defined as polystyrene equivalent values ​​measured by gel permeation chromatography (GPC). As used herein, Me in chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. As used herein, infrared light refers to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. As used herein, total solids refers to the total mass of all components of a composition excluding the solvent. As used herein, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

[0014] <Composition> A first aspect of the composition of the present invention is a composition comprising: an infrared absorbing dye A represented by formula (1) or (2); a curable compound B; and a solvent C, wherein the solvent C comprises solvent c1 having a CLogP value of −2.00 to −0.35, and the content of the solvent c1 in the composition is 0.1 to 1000 ppm by mass.

[0015] A second aspect of the composition of the present invention is a composition comprising: an infrared absorbing dye A represented by formula (1) or (2); a curable compound B; and a solvent C, wherein the solvent C comprises at least one solvent c1a selected from ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, dipropylene glycol, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide, and the content of the solvent c1a in the composition is 0.1 to 1,000 ppm by mass.

[0016] The composition of the present invention, by containing 0.1 to 1000 ppm by mass of the above-mentioned solvent c1 or solvent c1a, can suppress aggregation of the infrared absorbing dye A represented by formula (1) or (2) in the composition, and can improve storage stability. Furthermore, it can suppress aggregation of the infrared absorbing dye A represented by formula (1) or (2) in the film during film formation, and can form a film in which the occurrence of foreign matter defects is suppressed. The reason for obtaining such effects is presumed to be as follows. The above-mentioned solvent c1 and solvent c1a are hydrophilic solvents, and the central cation atom (M in formula (1)) of the infrared absorbing dye A represented by formula (1) or (2) is １ , M in Equation (2) ２ ) and the ligand (Z in formula (1) １ , Z in formula (2) ２ａ and Z ２ｂ) is likely to interact with the infrared absorbing dye A. Furthermore, it is presumed that the content of the above-mentioned solvent c1 or solvent c1a is 0.1 to 1000 ppm by mass, so that the above-mentioned solvent c1 and solvent c1a interact appropriately with the infrared absorbing dye A represented by formula (1) or (2). Therefore, it is presumed that aggregation of the infrared absorbing dye A can be suppressed while maintaining the dispersibility of the infrared absorbing dye A in the composition and in the film during film formation. For these reasons, it is presumed that the composition of the present invention has excellent storage stability and can form a film in which the occurrence of foreign matter defects is suppressed.

[0017] The composition of the present invention can be used as a composition for an optical filter. Examples of optical filters include an infrared cut filter and an infrared transmission filter. Since the infrared absorbing dye A represented by formula (1) or (2) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0018] Each component used in the composition of the present invention will be described below.

[0019] <<Infrared absorbing dye A (specific infrared absorbing dye)>> The composition contains an infrared absorbing dye A (hereinafter referred to as specific infrared absorbing dye) represented by formula (1) or (2).

[0020] In formula (1), X １ａ ~X １ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; １ａ ~X １ｐ may each independently bond to each other to form an aromatic ring, M １ represents a trivalent cation atom; Z １represents a ligand; ２ａ ~X ２ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; ２ａ ~X ２ｐ may each independently bond to each other to form an aromatic ring, M ２ represents a tetravalent cationic atom; Z ２ａ and Z ２ｂ each independently represents a ligand.

[0021] -X １ａ ~X １ｐ , X ２ａ ~X ２ｐ Regarding - X in formula (1) １ａ ~X １ｐ and X in formula (2) ２ａ ~X ２ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group.

[0022] Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

[0023] The number of carbon atoms in the alkyl group, alkoxy group, and alkylthio group is preferably 1 to 20, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group, alkoxy group, and alkylthio group may be linear, branched, or cyclic, but linear or branched groups are preferred, and linear groups are more preferred. The alkyl group, alkoxy group, and alkylthio group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0024] The number of carbon atoms in the aryl group, aryloxy group, and arylthio group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group, aryloxy group, and arylthio group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0025] With respect to the heterocyclic group, heterocyclic oxy group, heterocyclic thio group, and heterocyclic oxycarbonyl group, the number of carbon atoms constituting the heterocyclic ring is preferably 1 to 30, more preferably 1 to 12. Examples of heteroatoms constituting the heterocyclic ring include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the heterocyclic ring is preferably 1 to 3, more preferably 1 to 2. The heterocyclic ring is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings. The heterocyclic group, heterocyclic oxy group, heterocyclic thio group, and heterocyclic oxycarbonyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0026] The number of carbon atoms in the acyl group and alkoxycarbonyl group is preferably 2 to 30, and more preferably 2 to 20. The acyl group and alkoxycarbonyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0027] The aryloxycarbonyl group preferably has 7 to 30 carbon atoms, more preferably 7 to 20 carbon atoms, and even more preferably 7 to 12 carbon atoms. The aryloxycarbonyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0028] The amino group is -NRa １ Ra ２ and a cyclic amino group. １ Ra ２ In the group represented by １ and Ra ２ are each independently a hydrogen atom, an alkyl group, or an aryl group, and are preferably an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom. Ra １ and Ra ２ and may be bonded to form a ring. Examples of the cyclic amino group include a pyrrolidine group, a piperidine group, a piperazine group, and a morpholine group. These groups may further have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0029] In formula (1), adjacent X １ａ ~X １ｐ may each independently bond to each other to form an aromatic ring. １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ, X １ｎ and X １ｏ In formula (2), it is preferable that at least one pair of adjacent X ２ａ ~X ２ｐ may each independently bond to each other to form an aromatic ring. ２ｂ and X ２ｃ , X ２ｆ and X ２ｇ , X ２ｊ and X ２ｋ , X ２ｎ and X ２ｏ It is preferable that at least one pair of any of the above be bonded to each other to form an aromatic ring. The aromatic ring formed above may have a substituent. Examples of the substituent include a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, and a sulfamoyl group. Details of these groups are as described above.

[0030] When the specific infrared absorbing dye is a compound represented by formula (1), the specific infrared absorbing dye is X in formula (1). １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ and a compound in which none of X forms an aromatic ring. １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ In addition, the compound may contain one or more compounds in which one or more pairs of X in formula (1) are bonded to each other to form an aromatic ring. １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊand X １ｋ , X １ｎ and X １ｏ The compound may contain a plurality of compounds in which one or more pairs of X in formula (1) are bonded to each other to form an aromatic ring. １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ An example of an embodiment containing a plurality of compounds in which one or more pairs of X are bonded to each other to form an aromatic ring is １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ a compound in which any one pair of X is bonded to each other to form an aromatic ring; １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ and a compound in which any two or more pairs of the above are bonded to each other to form an aromatic ring; １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ a compound in which any two pairs of X are bonded to each other to form an aromatic ring; １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ and a compound in which any three or more pairs of the above are bonded to each other to form an aromatic ring; １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏa compound in which any three pairs of X are bonded to each other to form an aromatic ring; １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ and the like, which include compounds in which the above-mentioned groups are bonded to each other to form an aromatic ring.

[0031] The same applies to the case where the specific infrared absorbing dye is a compound represented by formula (2).

[0032] -M １ and M ２ Regarding M in Equation (1) １ represents a trivalent cation atom, and M in formula (2) ２ represents a tetravalent cationic atom.

[0033] M in formula (1) １ The trivalent cationic atom represented by is preferably B, Al, Ga, In or Sc, more preferably Al, Ga or In, and even more preferably Al.

[0034] M in formula (2) ２ The tetravalent cationic atom represented by is preferably Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn, and more preferably Si, Ge or Sn.

[0035] -Z １ , Z ２ａ , Z ２ｂ Regarding Z in formula (1) １ , Z in formula (2) ２ａ and Z ２ｂ each independently represents a ligand. Examples of the ligand include an oxygen atom, a halogen atom, -OR Ｍ１ , -OCOR Ｍ１ , -OSO ２ R Ｍ１ , a ligand represented by formula (3) and a ligand represented by formula (4). Ｍ１ represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0036] R Ｍ１The number of carbon atoms in the alkyl group represented by is preferably 1 to 20, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0037] R Ｍ１ The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0038] R Ｍ１ The number of carbon atoms constituting the heterocyclic ring of the heterocyclic group represented by is preferably 1 to 30, more preferably 1 to 12. Examples of heteroatoms constituting the heterocyclic ring include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the heterocyclic ring is preferably 1 to 3, more preferably 1 to 2. The heterocyclic ring is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings. The heterocyclic group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, and a halogen atom.

[0039] Z in formula (1) １ and the ligand represented by Z in formula (2) ２ａ and Z ２ｂ are each independently preferably a ligand represented by formula (3) or formula (4), more preferably a ligand represented by formula (3). In formula (3), R ３ａ and R ３ｂ each independently represents a hydrogen atom, a hydroxy group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (5), * represents M １ or M ２In formula (4), Y ４ Is -OSO ２ represents -, -OCO-, or -O-; ４ represents a single bond or an n4+1-valent linking group, Pm ４ represents a polymer chain, n4 represents an integer of 1 to 5, and when n4 is 2 to 5, a plurality of Pm ４ may be the same or different, * is M １ or M ２ It is a combination of In formula (5), L ５ represents a single bond or an n5+1-valent linking group, Pm ５ represents a polymer chain, n5 represents an integer of 1 to 5, and when n5 is 2 to 5, a plurality of Pm ５ may be the same or different, and * is a bond to P in formula (3).

[0040] R in formula (3) ３ａ and R ３ｂ The alkyl group and alkoxy group represented by the formula (I) preferably have 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 5 carbon atoms. The alkyl group and alkoxy group may be linear, branched, or cyclic, but linear or branched groups are preferred, and linear groups are more preferred. The alkyl group and alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0041] R in formula (3) ３ａ and R ３ｂ The aryl group and aryloxy group represented by the formula (I) preferably have 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and even more preferably 6 to 12 carbon atoms. The aryl group and aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0042] R in formula (3) ３ａ and R ３ｂ are each independently preferably an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (5), more preferably an aryl group, an aryloxy group, or a group represented by formula (5), still more preferably an aryloxy group or a group represented by formula (5), and particularly preferably a group represented by formula (5).

[0043] Y in formula (4) ４ Is -OSO ２ represents -, -OCO-, or -O-, ２ It is preferably - or -OCO-.

[0044] L in formula (4) ４ and L of formula (5). ５ Examples of the n5+1-valent linking group represented by include hydrocarbon groups, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and groups combining two or more of these. Examples of the hydrocarbon group include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, and even more preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aromatic hydrocarbon group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and preferred are a halogen atom, a hydroxy group, an alkyl group, and an aryl group.

[0045] Pm in formula (4) ４ and a polymer chain represented by Pm ５ The polymer chain represented by is preferably a polymer chain containing repeating units of at least one structure selected from a polyether structure, a polyester structure, and a poly(meth)acrylic structure.

[0046] Pm in formula (4) ４ and a polymer chain represented by Pm ５The weight average molecular weight of the polymer chain represented by is preferably 1,000 to 50,000, and more preferably 1,500 to 20,000.

[0047] In formula (4), n4 represents an integer of 1 to 5, preferably 1 or 2, and more preferably 1. In formula (5), n5 represents an integer of 1 to 5, preferably 1 or 2, and more preferably 1.

[0048] The ligand represented by formula (3) is preferably a ligand that is a polymer having a structure represented by formula (3-1), a ligand represented by formula (3-2), or a ligand represented by formula (3-3). In formula (3-1), R １１ａ represents a hydrogen atom, an alkyl group or a halogen atom; R １１ｂ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; １１ａ is -CONH-L １１ｂ -, -COO-L １１ｃ -, -CONH-L １１ｄ -O- or -COO-L １１ｅ represents —O—, and L １１ｂ ~L １１ｅ each independently represents a hydrocarbon group or a divalent group in which multiple hydrocarbon groups are linked by -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO-; * represents M １ or M ２ In formula (3-2), R １２ａ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; R １２ｂ represents an alkyl group or an aryl group; １２ represents an alkylene group or an arylene group, n12 represents 0 or 1, m12 represents an integer of 2 or more, * represents M １ or M ２ In formula (3-3), R １３ａ and R １３ｂeach independently represents an alkyl group or an aryl group; １３ａ and L １３ｂ each independently represents an alkylene group or an arylene group; n13 and p13 each independently represent 0 or 1; m13 and q13 each independently represent an integer of 2 or more; * represents M １ or M ２ It is a combination of.

[0049] R in formula (3-1) １１ａ is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom or a methyl group.

[0050] R in formula (3-1) １１ｂ The alkyl group and alkoxy group represented by the formula (I) preferably have 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 5 carbon atoms. The alkyl group and alkoxy group may be linear, branched, or cyclic, but linear or branched groups are preferred, and linear groups are more preferred. The alkyl group and alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0051] R in formula (3-1) １１ｂ The aryl group and aryloxy group represented by the formula (I) preferably have 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and even more preferably 6 to 12 carbon atoms. The aryl group and aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0052] R in formula (3-1) １１ｂWith regard to the heterocyclic group and heterocyclic-oxy ​​group represented by the formula (I), the number of carbon atoms constituting the heterocyclic ring is preferably 1 to 30, more preferably 1 to 12. Examples of heteroatoms constituting the heterocyclic ring include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the heterocyclic ring is preferably 1 to 3, more preferably 1 to 2. The heterocyclic ring is preferably a monocyclic ring or a fused ring having 2 to 8 rings, more preferably a monocyclic ring or a fused ring having 2 to 4 rings. The heterocyclic group and heterocyclic-oxy ​​group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a nitro group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0053] L in formula (3-1) １１ａ is -CONH-L １１ｂ -, -COO-L １１ｃ -, -CONH-L １１ｄ -O- or -COO-L １１ｅ represents —O—, and L １１ｂ ~L １１ｅ each independently represents a hydrocarbon group or a divalent group in which multiple hydrocarbon groups are linked via -O-, -CO-, -COO-, -OCO-, -CONH-, or -NHCO-. Examples of the hydrocarbon group include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, and even more preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aromatic hydrocarbon group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described below, and preferred are a halogen atom, a hydroxy group, an alkyl group, and an aryl group.

[0054] R in formula (3-2) １２ａ The alkyl group, heterocyclic group, aryl group, alkoxy group, heterocyclic oxy group and aryloxy group represented by R in formula (3-1) are １１ｂ The preferred ranges are also the same as those described above for these groups represented by the formula (I).

[0055] R in formula (3-2) １２ｂ and an alkyl group represented by R １３ａ and R １３ｂ The number of carbon atoms in the alkyl group represented by is preferably 1 to 20, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, an aryl group, a heterocyclic group, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, an aryloxy group, a heterocyclic oxy group, an alkenyl group, and an alkynyl group. R in formula (3-2) １２ｂ and an aryl group represented by R １３ａ and R １３ｂ The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heterocyclic group, a halogen atom, a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, an aryloxy group, a heterocyclic oxy group, an alkenyl group, and an alkynyl group.

[0056] L in formula (3-2) １２ and L in formula (3-3). １３ａ and L １３ｂ The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 8. The alkylene group is preferably linear or branched, more preferably linear. １２ The number of carbon atoms in the alkylene group represented by is preferably 1 to 5, more preferably 1 to 3, and even more preferably 2 to 3. When n13 is 0, L １３ａ The number of carbon atoms in the alkylene group represented by is preferably 1 to 5, more preferably 1 to 3, and even more preferably 2 to 3. When p13 is 0, L １３ｂThe alkylene group represented by the formula (3-2) preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 2 to 3 carbon atoms. １２ and L in formula (3-3). １３ａ and L １３ｂ The number of carbon atoms in the arylene group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. １２ , and L in formula (3-3) １３ａ and L １３ｂ are preferably each independently an alkylene group.

[0057] In formula (3-2), n12 represents 0 or 1, and m12 represents an integer of 2 or more. m12 is preferably an integer of 5 to 300, and more preferably an integer of 10 to 100.

[0058] In formula (3-3), n13 and p13 each independently represent 0 or 1, and m13 and q13 each independently represent an integer of 2 or greater. m13 and q13 each independently represent an integer of 5 to 300, and more preferably an integer of 10 to 100.

[0059] The polymer having the structure represented by formula (3-1) can be obtained by polymerizing a monomer represented by general formula (7) described in paragraph 0040 of JP-A-2022-091099.

[0060] The polymer having the structure represented by formula (3-1) may further have, in addition to the structure represented by formula (3-1), a repeating unit other than the structure represented by formula (3-1) (also referred to as an other repeating unit). Examples of the other repeating unit include a repeating unit derived from a monomer selected from (meth)acrylic acid esters, crotonate esters, vinyl esters, maleic acid diesters, fumaric acid diesters, itaconic acid diesters, (meth)acrylamides, vinyl ethers, vinyl alcohol esters, styrenes, (meth)acrylonitrile, an acid group-containing monomer, a hydroxy group-containing monomer, an oxetanyl group-containing monomer, a tert-butyl group-containing monomer, an isocyanate group-containing monomer, and a blocked isocyanate group-containing monomer.

[0061] Examples of (meth)acrylic acid esters include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, t-butyl (meth)acrylate, n-hexyl (meth)acrylate, cyclohexyl (meth)acrylate, t-butylcyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, t-octyl (meth)acrylate, dodecyl (meth)acrylate, octadecyl (meth)acrylate, acetoxyethyl (meth)acrylate, phenyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 2-(2-methoxyethoxy)ethyl (meth)acrylate, 3-phenoxy-2-hydroxypropyl (meth)acrylate, benzyl (meth)acrylate, Examples thereof include diethylene glycol monomethyl ether (meth)acrylate, diethylene glycol monoethyl ether (meth)acrylate, triethylene glycol monomethyl ether (meth)acrylate, triethylene glycol monoethyl ether (meth)acrylate, polyethylene glycol monomethyl ether (meth)acrylate, polyethylene glycol monoethyl ether (meth)acrylate, β-phenoxyethoxyethyl (meth)acrylate, nonylphenoxy polyethylene glycol (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, trifluoroethyl (meth)acrylate, octafluoropentyl (meth)acrylate, perfluorooctylethyl (meth)acrylate, dicyclopentanyl (meth)acrylate, tribromophenyl (meth)acrylate, and tribromophenyloxyethyl (meth)acrylate.

[0062] Examples of crotonate esters include butyl crotonate and hexyl crotonate.

[0063] Examples of vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, and vinyl benzoate.

[0064] Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, and dibutyl maleate.

[0065] Examples of fumaric acid diesters include dimethyl fumarate, diethyl fumarate, and dibutyl fumarate.

[0066] Examples of itaconate diesters include dimethyl itaconate, diethyl itaconate, and dibutyl itaconate.

[0067] Examples of (meth)acrylamides include (meth)acrylamide, N-methyl(meth)acrylamide, N-ethyl(meth)acrylamide, N-propyl(meth)acrylamide, N-isopropyl(meth)acrylamide, N-n-butylacryl(meth)amide, N-t-butyl(meth)acrylamide, N-cyclohexyl(meth)acrylamide, N-(2-methoxyethyl)(meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl(meth)acrylamide, N-phenyl(meth)acrylamide, N-benzyl(meth)acrylamide, (meth)acryloylmorpholine, and diacetone acrylamide.

[0068] Examples of vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, and methoxyethyl vinyl ether.

[0069] Examples of styrenes include styrene, methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, isopropylstyrene, butylstyrene, hydroxystyrene, methoxystyrene, butoxystyrene, acetoxystyrene, chlorostyrene, dichlorostyrene, bromostyrene, chloromethylstyrene, hydroxystyrene protected with a group that can be deprotected by an acidic substance (for example, t-Boc), methyl vinylbenzoate, and α-methylstyrene.

[0070] Examples of the acid group-containing monomer include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; unsaturated dicarboxylic acids or anhydrides thereof such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, and mesaconic acid; tri- or higher carboxylic acid unsaturated polycarboxylic acids or anhydrides thereof; mono[(meth)acryloyloxyalkyl] esters of di- or higher carboxylic acid polycarboxylic acids such as mono(2-acryloyloxyethyl) succinate, mono(2-methacryloyloxyethyl) succinate, mono(2-acryloyloxyethyl) phthalate, and mono(2-methacryloyloxyethyl) phthalate; and mono(meth)acrylates of polymers having carboxyl groups at both ends such as ω-carboxy-polycaprolactone monoacrylate and ω-carboxy-polycaprolactone monomethacrylate.

[0071] Examples of the hydroxy group-containing monomer include 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, glycerol mono(meth)acrylate, 4-hydroxyvinylbenzene, 2-hydroxy-3-phenoxypropyl acrylate, and caprolactone adducts of these monomers (number of moles: 1 to 5).

[0072] Examples of oxetanyl group-containing monomers include 3-(acryloyloxymethyl)3-methyloxetane, 3-(methacryloyloxymethyl)3-methyloxetane, 3-(acryloyloxymethyl)3-ethyloxetane, 3-(methacryloyloxymethyl)3-ethyloxetane, 3-(acryloyloxymethyl)3-butyloxetane, 3-(methacryloyloxymethyl)3-butyloxetane, 3-(acryloyloxymethyl)3-hexyloxetane, and 3-(methacryloyloxymethyl)3-hexyloxetane.

[0073] Examples of the tert-butyl group-containing monomer include tert-butyl acrylate and tert-butyl methacrylate.

[0074] Examples of the isocyanate group-containing monomer include 2-isocyanate ethyl methacrylate, 2-isocyanate ethyl acrylate, 4-isocyanate butyl methacrylate, and 4-isocyanate butyl acrylate.

[0075] The blocked isocyanate group in the blocked isocyanate group-containing monomer is a functional group that, under normal conditions, suppresses the reactivity of the isocyanate group by protecting the isocyanate group with another functional group, while at the same time can be deprotected by heating to regenerate an active isocyanate group. Commercially available products of the blocked isocyanate group-containing monomer include 2-[(3,5-dimethylpyrazolyl)carboxyamino]ethyl methacrylate (Karenz MOI-BP, manufactured by Showa Denko K.K.); 2-(O-[1'-methylpropylideneamino]carboxyamino)ethyl methacrylate (Karenz MOI-BM, manufactured by Showa Denko K.K.); and the like.

[0076] The ligand represented by formula (3-2) and the ligand represented by formula (3-3) are also preferably residues obtained by removing hydrogen from the OH group on the phosphorus atom of phosphoric acid ester A2 described in paragraphs

[0130] to

[0148] of JP2016-218433A.

[0077] The ligand represented by formula (3-2) and the phosphate ester compound serving as a raw material for the ligand represented by formula (3-3) are also commercially available, and specific examples thereof include the Plysurf series (polyoxyethylene alkyl ether phosphate) manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., the Phosphanol series (polyoxyethylene alkyl ether phosphate) manufactured by Toho Chemical Industry Co., Ltd., DISPERBYK102, DISPERBYK110, DISPERBYK111, and DISPERBYK140 manufactured by BYK-Chemie, TEGO Dispers 651 and TEGO Dispers 655 manufactured by Evonik Japan Co., Ltd., SOLSPERSE 26000, SOLSPERSE 36000, and SOLSPERSE 41000 manufactured by The Lubrizol Japan Corporation, and ADEKA COLE manufactured by ADEKA Corporation. TS, CS, PS series, Disparlon PW-36 and Disparlon 3500 manufactured by Kusumoto Chemicals Co., Ltd., and the like.

[0078] The specific infrared absorbing dye is preferably a compound represented by formula (1). Furthermore, the specific infrared absorbing dye preferably contains a compound represented by formula (8) because the effects of the present invention are more significantly exhibited. In formula (8), R ８ａ ~R ８ｖ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; Z ８ represents a ligand represented by formula (21) or a ligand that is a polymer having a structure represented by formula (22). In formula (21), R ２１ａ and R ２１ｂ each independently represents a hydrogen atom, a hydroxy group, an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, and * represents a bond to Al; ２２ａ represents a hydrogen atom, an alkyl group or a halogen atom; R ２２ｂ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; ２２ａ is -CONH-L ２２ｂ -, -COO-L ２２ｃ -, -CONH-L ２２ｄ -O- or -COO-L ２２ｅ represents —O—, and L ２２ｂ ~L ２２ｅ each independently represents a hydrocarbon group or a divalent group in which multiple hydrocarbon groups are linked via -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO-, and * represents a bond to Al.

[0079] R in formula (8) ８ａ ~R ８ｖ The above group represented by X in formula (1)１ａ ~X １ｐ The preferred ranges are the same as those described above.

[0080] R in formula (21) ２１ａ and R ２１ｂ The alkyl group, aryl group, alkoxy group, and aryloxy group represented by R in formula (3) ３ａ and R ３ｂ The preferred ranges are the same as those of these groups represented by R ２１ａ and R ２１ｂ are each independently preferably an aryl group, an alkoxy group, or an aryloxy group, more preferably an aryl group or an aryloxy group, and even more preferably an aryloxy group.

[0081] R in formula (22) ２２ａ is R in formula (3-1). １１ａ The same definition and preferred range are also true. ２２ｂ is R in formula (3-1). １１ｂ The same definition and preferred range are also true. ２２ａ is L in formula (3-1). １１ａ The same applies to the preferred range.

[0082] Specific examples of the specific infrared absorbing dye include compounds A-1 to A-25, A-101 to A-163, and A-201 to A-283 shown as specific examples of the infrared absorbing dye A in the examples described below, and structural isomers thereof.

[0083] The maximum absorption wavelength of the specific infrared absorbing dye is more preferably in the wavelength range of 700 to 850 nm, and particularly preferably in the wavelength range of 720 to 800 nm.

[0084] The content of the specific infrared absorbing dye in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 3% by mass or more, still more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 20% by mass or more. The upper limit of the content of the specific infrared absorbing dye is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less. The composition of the present invention may contain only one type of specific infrared absorbing dye, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

[0085] <<Other Infrared Absorbents>> The composition of the present invention can contain an infrared absorbent (other infrared absorbent) other than the specific infrared-absorbing dye described above. By further containing the other infrared absorbent, a film can be formed that can block infrared rays over a wider wavelength range. The other infrared absorbent may be a dye or a pigment (particles). Examples of the other infrared absorbent include pyrrolopyrrole compounds, polymethine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides. At least one selected from squarylium compounds and phthalocyanine compounds is preferred.

[0086] Examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614, the compounds described in paragraphs 0037 to 0052 of JP-A-2011-068731, and the compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169 A, compounds described in paragraph 0040 of WO 2016 / 181987 A, compounds described in JP 2015-176046 A, compounds described in paragraph 0072 of WO 2016 / 190162 A, and compounds described in JP 2016-07464 A. Compounds described in paragraphs 0196 to 0228 of Patent Publication No. 9, compounds described in paragraph 0124 of JP-A-2017-067963, compounds described in WO 2017 / 135359, compounds described in JP-A-2017-114956, compounds described in Japanese Patent No. 6197940, compounds described in WO 2016 / 120166, compounds described in Table 1 of U.S. Pat. No. 11261172, and the like. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, compounds described in JP 2015-172004 A, compounds described in JP 2015-172102 A, compounds described in JP 2008-088426 A, compounds described in paragraph 0090 of WO 2016 / 190162 A, compounds described in JP 2017-031394 A, compounds described in JP 2021-134350 A, compounds described in WO 2021 / 085372 A, and compounds described in paragraphs 0188 to 0192 of WO 2022 / 181422 A. Examples of croconium compounds include compounds described in JP-A-2017-082029 and compounds described in JP-A-2016-079331.Examples of iminium compounds include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018 / 043564. Examples of phthalocyanine compounds include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020 / 071470. Examples of naphthalocyanine compounds include the compounds described in paragraph 0093 of JP 2012-077153 A and the compounds described in JP 2022-173080 A. Examples of dithiolene metal complexes include the compounds described in Japanese Patent No. 5733804 A. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, see paragraph 0080 of JP 2016-006476 A, the contents of which are incorporated herein by reference. Examples of metal borides include lanthanum boride. A commercially available lanthanum boride product is LaB. ６ -F (manufactured by Nippon Shinkinzoku Co., Ltd.). Furthermore, as the metal boride, compounds described in WO 2017 / 119394 can also be used. Commercially available indium tin oxide products include F-ITO (manufactured by Dowa Hitec Co., Ltd.).

[0087] Other infrared absorbers include squarylium compounds described in JP-A-2017-197437, squarylium compounds described in JP-A-2017-025311, squarylium compounds described in WO 2016 / 154782, squarylium compounds described in Japanese Patent No. 5884953, squarylium compounds described in Japanese Patent No. 6036689, squarylium compounds described in Japanese Patent No. 5810604, squarylium compounds described in paragraph No. of WO 2017 / 213047,

[0090] to

[0107] , the pyrrole ring-containing compounds described in paragraphs

[0019] to

[0075] of JP-A-2018-054760, the pyrrole ring-containing compounds described in paragraphs

[0078] to

[0082] of JP-A-2018-040955, the pyrrole ring-containing compounds described in paragraphs

[0043] to

[0069] of JP-A-2018-002773, and the squarylium compounds having an aromatic ring at the amide α-position described in paragraphs

[0024] to

[0086] of JP-A-2018-041047. compounds, amide-linked squarylium compounds described in JP-A-2017-179131, compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP-A-2017-141215, dihydrocarbazole bis-type squarylium compounds described in JP-A-2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of JP-A-2017-068120, and pyrrole ring-containing compounds described in JP-A-2017-067963 A compound (carbazole type), a phthalocyanine compound described in Japanese Patent No. 6251530, a compound described in JP 2019-127549 A, a compound described in WO 2022 / 059619 A, a compound described in JP 2022-151682 A, a compound described in JP 2022-188858 A, a compound described in JP 2022-184710 A, a compound described in JP 2022-189736 A, and the like can also be used.

[0088] As another infrared absorber, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used. １ ａ M ２ｂ W ｃ O ｄ (P(O) ｎ R ｍ ) ｅ M １ , M ２ represents an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

[0089] The content of the other infrared absorbent is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass, relative to 100 parts by mass of the above-mentioned specific infrared absorbing dye. The total content of the above-mentioned specific infrared absorbing dye and the other infrared absorbent is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more, based on the total solid content of the composition. The upper limit of the above total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.

[0090] <<Curable Compound>> The composition of the present invention contains a curable compound B (hereinafter also referred to as a curable compound). Examples of the curable compound include a polymerizable compound and a resin. The resin may be a non-polymerizable resin (a resin not having a polymerizable group) or a polymerizable resin (a resin having a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Preferred are a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and more preferred are a (meth)acryloyloxy group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and preferred is an epoxy group.

[0091] As the curable compound, it is preferable to use one that contains at least a resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use, as the curable compound, a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound), and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

[0092] (Polymerizable Compound) Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. In addition, a compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

[0093] Examples of resin-type polymerizable compounds include resins containing repeating units having polymerizable groups.

[0094] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2,000, and more preferably 1,500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2,000 to 2,000,000. The upper limit of the weight-average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight-average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

[0095] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a tri- to 15-functional (meth)acrylate compound, more preferably a tri- to hexa-functional (meth)acrylate compound. Specific examples include JP-A-2009-288705, paragraphs 0095 to 0108, JP-A-2013-029760, paragraph 0227, JP-A-2008-292970, paragraphs 0254 to 0257, JP-A-2013-253224, paragraphs 0034 to 0038, JP-A-2012-208494, paragraph 0477, JP-A-2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, and compounds described in JP-A-2017-194662, the contents of which are incorporated herein by reference.

[0096] Examples of the compound having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), and dipentaerythritol hexa(meth)acrylate (commercially available product: KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK Ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl group of these compounds is bonded via an ethylene glycol and / or propylene glycol residue (for example, SR454 and SR499, commercially available from Sartomer Corporation). Furthermore, examples of the compound having an ethylenically unsaturated bond-containing group that can be used include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product is M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA, manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), and light acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.).

[0097] Furthermore, as the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0098] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group and a urethane bond (hereinafter also referred to as a polymerizable compound having a urethane bond) as the compound having an ethylenically unsaturated bond-containing group. By using such a compound, the heat resistance of the obtained film can be further improved. The reason for this effect is presumed to be that the urethane bond portion forms a physical crosslinked structure due to intermolecular hydrogen bonding.

[0099] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylates obtained by reacting a (meth)acrylate having a hydroxy group with a polyfunctional isocyanate, and urethane (meth)acrylates obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and further reacting the resulting mixture with a (meth)acrylate having a hydroxy group.

[0100] Examples of the (meth)acrylate having a hydroxy group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxy group-containing polyol polyacrylate.

[0101] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and biuret derivatives, isocyanate nurate derivatives, and trimethylolpropane adducts thereof.

[0102] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A No. 2022-173080 can also be used.

[0103] The compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxy group, a sulfo group, a phosphate group, etc. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0104] As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available as a series from Nippon Kayaku Co., Ltd.

[0105] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer Corporation, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0106] The compound having an ethylenically unsaturated bond-containing group may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0107] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0108] Examples of compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, with compounds having an epoxy group being preferred. Examples of compounds having an epoxy group include compounds having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0109] The compound having a cyclic ether group may be a low molecular weight compound (e.g., a molecular weight of less than 1,000) or a high molecular weight compound (macromolecule) (e.g., a molecular weight of 1,000 or more, and in the case of a polymer, a weight average molecular weight of 1,000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0110] As the compound having a cyclic ether group, the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, the compounds described in paragraphs 0147 to 0156 of JP-A-2014-043556, the compounds described in paragraphs 0085 to 0092 of JP-A-2014-089408, and the compounds described in JP-A-2017-179172 can also be used.

[0111] Commercially available compounds having a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), Celloxide 2021P, Celloxide 2081, Celloxide 2083, Celloxide 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adeka Glycirol Examples of such monomers include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (manufactured by NOF Corporation, epoxy group-containing polymers), OXT-101, OXT-121, OXT-212, and OXT-221 (manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomers), and OXE-10 and OXE-30 (manufactured by Osaka Organic Chemical Industry Ltd., oxetanyl group-containing monomers).

[0112] Examples of compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred examples of compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs 0134 to 0147 of JP 2004-295116 A and paragraphs 0095 to 0126 of JP 2014-089408 A can also be used.

[0113] (Resin) The composition of the present invention can use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. Resins are blended, for example, for purposes such as dispersing pigments and the like in the composition or as binders. Resins used primarily to disperse pigments and the like in the composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses. Resins having polymerizable groups also fall under the category of polymerizable compounds.

[0114] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0115] Examples of resins include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. One of these resins may be used alone, or two or more may be mixed and used. As the cyclic olefin resin, norbornene resins are preferred from the viewpoint of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, examples of the resin include resins described in the examples of WO 2016 / 088645, resins described in JP 2017-057265 A, resins described in JP 2017-032685 A, resins described in JP 2017-075248 A, resins described in JP 2017-066240 A, resins described in JP 2017-167513 A, resins described in JP 2017-173787 A, and resins described in paragraphs 0041 to 0060 of JP 2017-206689 A. Resins containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, such as those described in JP 2017-138503 A, resins described in paragraphs 0022 to 0071 of JP 2018-010856 A, resins described in JP 2016-222891 A, resins described in JP 2020-122052 A, resins described in JP 2020-111656 A, resins described in JP 2020-139021 A, and resins containing a structural unit having a ring structure in the main chain and a biphenyl group in the side chain, such as those described in JP 2017-138503 A, can also be used. Furthermore, resins having a fluorene skeleton can also be preferably used as the resin. For resins having a fluorene skeleton, please refer to the description of U.S. Patent Application Publication No. 2017 / 0102610, the contents of which are incorporated herein by reference.Further, as the resin, the resin described in paragraphs 0199 to 0233 of JP-A-2020-186373, the alkali-soluble resin described in JP-A-2020-186325, the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in JP-A-2021-134350, and the resin described in JP-A-2022-174597 can also be used.

[0116] It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0117] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0118] The resin preferably has a cyclic structure in the main chain, which allows the formation of a film with better heat resistance.

[0119] The resin having a cyclic structure in the main chain is preferably a resin having repeating units derived from the compounds represented by formulae (C-1) to (C-3).

[0120]

[0121] In formula (C-1), Rc １ , and Rc ２ Rc each independently represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. １ , and Rc ２Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a t-butyl group, a t-amyl group, a stearyl group, a lauryl group, a cyclohexyl group, an ethylhexyl group, a methoxyethyl group, an ethoxyethyl group, and a benzyl group, and a methyl group, an ethyl group, a cyclohexyl group, or a benzyl group is preferred.

[0122] In formula (C-2), Rc ３ represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. ３ is a linear or branched alkyl group such as a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, t-butyl group, t-amyl group, stearyl group, lauryl group, or 2-ethylhexyl group; an aryl group such as phenyl; an alicyclic group such as a cyclohexyl group, t-butylcyclohexyl group, dicyclopentadienyl group, tricyclodecanyl group, isobornyl group, adamantyl group, or 2-methyl-2-adamantyl group; an alkyl group substituted with an alkoxy group such as a 1-methoxyethyl group or a 1-ethoxyethyl group; or an alkyl group substituted with an aryl group (aralkyl group) such as benzyl; and the like, and is preferably a methyl group, ethyl group, cyclohexyl group, or benzyl group.

[0123] In formula (C-3), Rc ４ represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. ４ Specific examples of the group include a phenyl group, a benzyl group, a naphthalene group, a cyclohexyl group, a methyl group, an ethyl group, and a propyl group, and a benzyl group is preferred.

[0124] The content of repeating units derived from the compounds represented by formulae (C-1) to (C-3) in the resin having a cyclic structure in the main chain is preferably 5 to 50 mol %.

[0125] The resin having a cyclic structure in the main chain preferably further contains a repeating unit having an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group, and the carboxy group is preferred. The content of the repeating unit having an acid group in the resin having a cyclic structure in the main chain is preferably 5 to 30 mol %.

[0126] The resin having a cyclic structure in its main chain is preferably an alkali-soluble resin. The acid value of the resin having a cyclic structure in its main chain is preferably 20 to 300 mgKOH / g, more preferably 50 to 200 mgKOH / g. The weight-average molecular weight of the resin having a cyclic structure in its main chain is preferably 10,000 to 100,000, more preferably 10,000 to 80,000. The number-average molecular weight is preferably 5,000 to 50,000.

[0127] The resin having a cyclic structure in the main chain may contain a repeating unit having a polymerizable group. The content of the repeating unit having a polymerizable group in the resin having a cyclic structure in the main chain is preferably 50 mol% or less, more preferably 40 mol% or less, and even more preferably 30 mol% or less. The lower limit can be 1 mol% or more, or can be 5 mol% or more.

[0128] As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X). In the formula, R １ represents a hydrogen atom or a methyl group, R ２１ and R ２２ each independently represents an alkylene group, and n represents an integer of 0 to 15. ２１ and R ２２ The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and even more preferably an integer of 0 to 3.

[0129] Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of paracumylphenol, etc. Commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).

[0130] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol% or more is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol% is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

[0131] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, please refer to the description in paragraphs 0025 to 0094 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0132] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure containing a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0133] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0134] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0135] As the dispersant, the resin described in JP 2018-087939 A, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803, and the like can also be used.

[0136] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0137] The content of the curable compound in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0138] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0139] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0140] When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 70% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0141] When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0142] When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0143] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the composition is preferably 0.1 to 40% by mass. The upper limit is preferably 25% by mass or less, and more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, and more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

[0144] The composition of the present invention may contain only one type of curable compound or may contain two or more types of curable compounds. When two or more types of curable compounds are contained, the total amount thereof is preferably within the above range.

[0145] <<Solvent C>> The composition of the present invention contains solvent C (hereinafter also simply referred to as solvent).

[0146] In a first aspect of the composition of the present invention, a solvent c1 having a CLogP value of -2.00 to -0.35 is used as the solvent, and the content of solvent c1 in the composition is 0.1 to 1,000 ppm by mass. The CLogP value of solvent c1 is preferably -1.80 to -0.37, and more preferably -1.60 to -0.39. The CLogP value is a calculated value of LogP, which is the common logarithm of the 1-octanol / water partition coefficient P. In this specification, the CLogP value is a value obtained by predictive calculation using ChemDraw Professional ver. 20.1.1.125 (manufactured by PerkinElmer).

[0147] Solvent c1 is preferably an alcohol-based solvent, an ether-based solvent, an ester-based solvent, or an amide-based solvent. Specific examples of solvent c1 include ethylene glycol (-1.37), diethylene glycol (-1.30), ethylene glycol monomethyl ether (-0.61), diethylene glycol monomethyl ether (-0.78), triethylene glycol monomethyl ether (-0.96), diethylene glycol monoethyl ether (-0.39), triethylene glycol monoethyl ether (-0.57), propylene glycol (-1.06), dipropylene glycol (-0.69), N-methylpyrrolidone (-0.40), N,N-dimethylformamide (-1.04), and N,N-dimethylacetamide (-0.80). The values ​​in parentheses are CLogP values.

[0148] In a second embodiment of the composition of the present invention, the solvent used contains at least one solvent c1a selected from ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, triethylene glycol monoethyl ether, propylene glycol, dipropylene glycol, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide, and the content of the solvent c1a in the composition is 0.1 to 1000 ppm by mass.

[0149] Hereinafter, solvent c1 and solvent c1a will be collectively referred to as specific solvents.

[0150] The boiling point of the specific solvent is preferably 100 to 300° C. The lower limit is preferably 120° C. or higher, more preferably 140° C. or higher. The upper limit is preferably 280° C. or lower, more preferably 260° C. or lower.

[0151] The specific solvent is preferably at least one selected from triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide, and more preferably triethylene glycol, because this allows the dispersibility of the specific infrared absorbing dye to be better maintained.

[0152] The specific solvent is also preferably N-methylpyrrolidone because it easily interacts with the specific infrared absorbing dye.

[0153] The composition of the present invention may further contain a solvent other than the specific solvent (also referred to as other solvent), such as an ester solvent, a ketone solvent, an alcohol solvent, an amide solvent, an ether solvent, or a hydrocarbon solvent. Specific examples of other solvents include methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, and propylene glycol diacetate. Examples of the alcohol include methyl ether acetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol or 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol, and preferably at least one selected from propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, cyclopentanone, cyclohexanone, ethyl lactate, butyl acetate, and ethyl 3-ethoxypropionate.

[0154] The content of the specific solvent in the composition is 0.1 to 1000 ppm by mass. The upper limit is preferably 500 ppm by mass or less, and more preferably 100 ppm by mass or less. The lower limit is preferably 1 ppm by mass or more, and more preferably 10 ppm by mass or more. The content of the specific solvent in the composition can be quantified by gas chromatography.

[0155] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0156] <<Pigment Derivative>> The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material that enhances the dispersibility of the pigment in the composition.

[0157] Examples of the pigment derivative include a compound having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

[0158] Examples of the dye structure include a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a quinacridone dye structure, an anthraquinone dye structure, a dianthraquinone dye structure, a benzisoindole dye structure, a thiazine indigo dye structure, an azo dye structure, a quinophthalone dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, a dioxazine dye structure, a perylene dye structure, a perinone dye structure, a benzimidazolone dye structure, a benzothiazole dye structure, a benzimidazole dye structure, and a benzoxazole dye structure. A phthalocyanine dye structure, a naphthalocyanine dye structure, a squarylium dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a phthalocyanine dye structure, a quinacridone dye structure, and a benzimidazolone dye structure are preferred, and a phthalocyanine dye structure and a naphthalocyanine dye structure are more preferred.

[0159] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li ＋ , Na ＋ , K. ＋ etc.), alkaline earth metal ions (Ca ２＋ , Mg ２＋ Examples of the carboxylic acid amide group include -NHCOR, ... Ｘ１ As the sulfonic acid amide group, a group represented by -NHSO is preferred. ２ R Ｘ２ As the imide acid group, a group represented by -SO ２ NHSO ２ R Ｘ３ , -CONHSO ２ R Ｘ４ , -CONHCOR Ｘ５ or -SO ２ NHCOR Ｘ６ A group represented by the formula: ２ NHSO ２ R Ｘ３ is more preferred. Ｘ１ ~R Ｘ６ R each independently represents an alkyl group or an aryl group. Ｘ１ ~R Ｘ６ The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0160] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0161] Specific examples of pigment derivatives include compounds described in paragraphs 0037 to 0054 of WO 2016 / 035695, compounds described in paragraphs 0061 to 0086 of WO 2017 / 146092, compounds described in paragraphs 0017 to 0068 of WO 2018 / 230387, compounds described in paragraphs 0085 to 0099 of WO 2020 / 054718, compounds described in paragraph 0099 of WO 2020 / 054718, compounds described in paragraph 0124 of WO 2022 / 085485, benzimidazolone compounds or salts thereof described in JP-A-2018-168244, and compounds having an isoindoline skeleton described in the general formula (1) of Japanese Patent No. 6996282.

[0162] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount be in the above range.

[0163] <<Photopolymerization initiator>> When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light in the ultraviolet to visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0164] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl-substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound.Further, as the photopolymerization initiator, compounds described in paragraphs 0065 to 0111 of JP-A No. 2014-130173, compounds described in Japanese Patent No. 6301489, compounds described in MATERIAL STAGE 37-60pp, vol. 19, No. peroxide-based photopolymerization initiators described in JP-A-2019-3, 2019, photopolymerization initiators described in WO 2018 / 221177, photopolymerization initiators described in WO 2018 / 110179, photopolymerization initiators described in JP-A-2019-043864, photopolymerization initiators described in JP-A-2019-044030, peroxide-based initiators described in JP-A-2019-167313, aminoacetophenone-based initiators having an oxazolidine group described in JP-A-2020-055992, Oxime-based photopolymerization initiators described in JP-A-0459, polymers described in JP-A-2020-172619, compounds represented by formula 1 described in WO 2020 / 152120, compounds described in JP-A-2021-181406, photopolymerization initiators described in JP-A-2022-013379, compounds represented by formula (1) described in JP-A-2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in JP-T-2021-507058, Chinese Patent Application Publication No. 1107643 Initiators described in Patent Publication No. 67, initiators described in JP-T-2022-518535, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022 / 075452, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, Korean Patent Publication No. 10-2017-0087330, Examples of the photopolymerization initiator include compounds described in WO 2019 / 013112, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062, oxime ester photopolymerization initiators described in Japanese Patent No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in WO 2019 / 013112, and photopolymerization initiators described in JP 2023-033731 A.

[0165] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0166] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins B.V.), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

[0167] Examples of oxime compounds include compounds described in paragraph 0142 of WO 2022 / 085485, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738, compounds represented by the general formula (1) of JP 2021-173858 A and compounds described in paragraphs 0022 to 0024, compounds represented by the general formula (1) of JP 2021-170089 A and compounds described in paragraphs 0117 to 0120, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, compounds described in Korean Patent Publication No. 10-2022-0076157, compounds described in paragraphs 0042 to 0062 of WO 2019 / 013112 having a triarylamine or N- arylcarbazole skeleton, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP-A-2012-014052). Furthermore, it is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA ARCLES NCI-730, NCI-831, and NCI-930 (manufactured by ADEKA Corporation).

[0168] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0169] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0170] In formula (OX-1), X １ａ represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring; １ａ represents a hydrogen atom or an acyl group; R ２ａ represents an alkyl group or an aryl group; R ３ａ and R ４ａ each independently represents a hydrogen atom or an alkyl group; Alk １ and Alk ２ each independently represents an alkyl group; R ３ａ and R ４ａ may be bonded to form a ring, Alk １ and Alk ２ may be bonded to form a ring, and n represents 0 or 1.

[0171] X in formula (OX-1) １ａ Examples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded via a single bond or a linking group, a divalent group in which two or more heterocycles are bonded via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocycle are bonded via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings, heterocyclic groups, or aromatic rings and heterocycles include -CH ２ -, -O-, -CO-, -S-, -NR ｘ - and groups combining these. ｘrepresents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0172] X in formula (OX-1) １ａ is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6). In the formula R Ｘ１ ~R Ｘ９ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0173] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0174] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0175] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

[0176] R Ｘ１ ~R Ｘ９The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0177] R Ｘ１ ~R Ｘ９ The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0178] R in formula (OX-1) １ａ represents a hydrogen atom or an acyl group, and is preferably an acyl group. １ａ The acyl group represented by is —C(O)—R １０１ It is preferable that R １０１ represents an aryl group or a heterocyclic group, and is preferably an aryl group.

[0179] R １０１ The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, and more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. １０１ The aryl group represented by is preferably a phenyl group, a methylphenyl group or a naphthyl group, more preferably a methylphenyl group or a naphthyl group.

[0180] R １０１ The heterocyclic group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0181] R in formula (OX-1)２ａ represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. ２ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ２ａ The alkyl group represented by R is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. ２ａ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0182] R in formula (OX-1) ３ａ and R ４ａ R each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. ３ａ and R ４ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ３ａ and R ４ａ may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0183] Alk of formula (OX-1) １ and Alk ２each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk １ and Alk ２ may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0184] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0185] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0186] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0187] In formula (OX-2), R １ｂ and R ２ｂ each independently represents a substituent, R ３ｂ ~R ７ｂ each independently represents a hydrogen atom or a substituent, Ar １ｂ represents an aromatic ring group or a heterocyclic group which may have a substituent; n represents 0 or 1;

[0188] R １ｂ and R ２ｂExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

[0189] R ３ｂ ~R ７ｂ Examples of the substituent represented by R include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and the aryl group include those described above. ３ｂ ~R ７ｂ is preferably a hydrogen atom.

[0190] Ar １ｂ represents an aromatic ring group or a heterocyclic group which may have a substituent, Ar １ｂ is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0191] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0192] In formula (OX-3), Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group; Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group; R １ｃ ~R ３ｃeach independently represents a substituent; １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ each independently represents a hydrogen atom, an alkyl group, or an aryl group; １ｃ represents -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0193] R １ｃ and R ２ｃ Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. R ２ｃ is preferably an alkyl group having a branched or cyclic structure.

[0194] R ３ｃ Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferred. Examples of the acyl group include the acyl groups described above.

[0195] Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0196] Ar ２ｃrepresents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0197] k represents 0 or 1, and is preferably 0.

[0198] m represents an integer of 0 to 4, preferably 0 or 1, and more preferably 1.

[0199] Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0200]

[0201] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g / L using ethyl acetate as a solvent.

[0202] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, thereby obtaining good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, thereby improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0203] The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount thereof preferably falls within the above range.

[0204] <<Curing Agent>> When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition of the present invention further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenolic compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be the compounds described in paragraphs 0072 to 0078 of JP 2016-075720 A or the compounds described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0205] <<Chromatic Colorant>> The composition of the present invention can contain a chromatic colorant. Examples of chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which an inorganic pigment or an organic-inorganic pigment has been partially substituted with an organic chromophore. Substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore makes it easier to design the hue.

[0206] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that are not aggregated.

[0207] The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in an X-ray diffraction spectrum obtained using CuKα radiation as an X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0208] The specific surface area of ​​the pigment is 1 to 300 m ２ / g. The lower limit is 10 m ２ / g or more, and ２ / g or more is more preferable. ２ / g or less, and ２The value of the specific surface area can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0209] The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of the pigment include the following.

[0210] Color Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 13 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine-based), 233 (quinoline-based), 234 (aminoketone-based), 235 (aminoketone-based), 236 (aminoketone-based), etc. (all yellow pigments), C.I. C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (all orange pigments), C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthene type, Organo Ultramarine, Bluish Red), 295 (monoazo type), 296 (diazo type),297 (aminoketone system) and the like (above, red pigments), C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine system), 65 (phthalocyanine system), 66 (phthalocyanine system) and the like (above, green pigments), C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane system), 61 (xanthene system) and the like (above, purple pigments), C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0211] As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Furthermore, as a green colorant, the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP 2020-070426 A, and the diarylmethane compounds described in JP 2020-504758 A can also be used.

[0212] As the blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs

[0022] to

[0030] of JP-A No. 2012-247591 and paragraph

[0047] of JP-A No. 2011-157478.

[0213] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP-A 2019-073695, and the methine dyes described in JP-A 2019-073696 can be used.

[0214] As the red colorant, the compound described in paragraph 0034 of WO 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP-A 2020-085947 can also be used.

[0215] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. Furthermore, the dyes can also include thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540.

[0216] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in JP 2020-117638 A, phthalocyanine compounds described in WO 2020 / 174991 A, isoindoline compounds or salts thereof described in JP 2020-160279 A, ​​compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069442 A, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A, and compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A. Compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP 2020-180176, phenothiazine compounds described in JP 2021-187913, halogenated zinc phthalocyanines described in WO 2022 / 004261, Halide zinc phthalocyanine described in Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 of Korean Patent Publication No. 10-2020-0030759, polymer dye described in Korean Patent Publication No. 10-2020-0061793, colorant described in JP-A-2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP-A-2020-090676, compounds described in JP-A-2020-055956, compounds described in JP-A-2021-031681, compounds described in JP-A-2022-056354, compounds described in US Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP-A-2020-045436, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP-A-2018-178039,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described in the Journal of the Japan Color Materials Association (published in 2022) pages 80 to 84, compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, Korean Patent Publication No. 10-2017-0018993 Cyan pigments described in the publication, isoindoline compounds described in JP 2020-180176 A, compounds described in JP 2023-013209 A, compounds described in JP 2023-013166 A, xanthene compounds described in WO 2023 / 286526, compounds described in JP 2021-155746 A, compounds described in JP 2021-155747 A, compounds described in JP 2021-155748 A, compounds described in JP 2021-155749 A, compounds described in WO 2018 / 051876, compounds described in JP 2020-083981 A, compounds described in JP 2023-056463 ​​A, compounds described in JP-T-2023-515473 A can also be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-like structure, or in both structures.

[0217] When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

[0218] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of a chromatic colorant. Note that, "the composition of the present invention is substantially free of a chromatic colorant" means that the content of the chromatic colorant in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no chromatic colorant.

[0219] <<Coloring material that transmits infrared light and blocks visible light>> The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

[0220] The coloring material that blocks visible light is preferably a coloring material that absorbs light in the violet to red wavelength region. Furthermore, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Furthermore, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B): (A): Contains two or more types of chromatic coloring agents, and forms black by combining two or more types of chromatic coloring agents. (B): Contains an organic black coloring agent.

[0221] Examples of chromatic colorants include those described above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available, for example, as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in JP-A Nos. 01-170601 and 02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichiseika Color & Chemicals Co., Ltd.

[0222] When a black color is formed by combining two or more chromatic colorants, the combination of chromatic colorants may include, for example, the following embodiments (1) to (8): (1) An embodiment containing a yellow colorant, a blue colorant, a violet colorant, and a red colorant; (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant; (3) An embodiment containing a yellow colorant, a violet colorant, and a red colorant; (4) An embodiment containing a yellow colorant and a violet colorant; (5) An embodiment containing a green colorant, a blue colorant, a violet colorant, and a red colorant; (6) An embodiment containing a violet colorant and an orange colorant; (7) An embodiment containing a green colorant, a violet colorant, and a red colorant; (8) An embodiment containing a green colorant and a red colorant.

[0223] When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass %. The lower limit is preferably 5 mass % or more, more preferably 10 mass % or more, even more preferably 20 mass % or more, and particularly preferably 30 mass % or more.

[0224] When the composition of the present invention is used for an infrared cut filter, it is preferable that the composition of the present invention is substantially free of a coloring material that blocks visible light. Here, "the composition of the present invention is substantially free of a coloring material that blocks visible light" means that the content of the coloring material that blocks visible light in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no coloring material that blocks visible light.

[0225] <<Surfactant>> The composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0226] As the fluorine-based surfactant, compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0227] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0228] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie). As the silicone surfactant, compounds having the following structure can also be used.

[0229] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0230] <<Polymerization Inhibitor>> The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solids content of the composition is preferably 0.0001 to 5 mass%. The composition may contain only one type of polymerization inhibitor, or two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0231] <<Silane Coupling Agent>> The composition of the present invention can contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, and more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of silane coupling agents include the compounds described in paragraph 0177 of WO 2022 / 085485 and the compounds described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

[0232] <<Ultraviolet Absorber>> The composition of the present invention may contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. The ultraviolet absorber includes compounds described in paragraphs 0038 to 0052 of JP-A-2009-217221, compounds described in paragraphs 0052 to 0072 of JP-A-2012-208374, compounds described in paragraphs 0317 to 0334 of JP-A-2013-068814, compounds described in paragraphs 0061 to 0080 of JP-A-2016-162946, compounds described in paragraphs 0059 to 0076 of WO 2016 / 181987, compounds described in paragraphs 0052 and 0074 of WO 2021 / 131355, The compounds described in paragraphs 0022 to 0024 of WO 2021 / 132247, the compounds described in paragraph 0179 of WO 2022 / 085485, the reactive triazine ultraviolet absorbers described in JP 2021-178918 A, the ultraviolet absorbers described in JP 2022-007884 A, the compounds described in Korean Patent Publication No. 10-2022-0014454, the compounds described in JP 2023-013321 A, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 A can also be used. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul (Uvinal) series manufactured by BASF Corporation. Further, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or may contain two or more types.When two or more types are contained, the total amount thereof is preferably within the above range.

[0233] <<Antioxidant>> The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. WO 2017 / 006600, a compound described in International Publication No. WO 2017 / 164024, or a compound described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The composition may contain only one antioxidant or two or more antioxidants. When two or more antioxidants are contained, the total amount thereof is preferably within the above range.

[0234] <<Other Components>> The composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliaries (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, compounds described in paragraph 0182 of WO 2022 / 085485 can be used. In addition, as the chain transfer agent, thiol compounds described in JP 2020-109068 A can be used.

[0235] The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with an ion-exchange resin, and purification with an inorganic adsorbent such as hydrotalcite.

[0236] From the standpoint of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, based on the total solids content of the composition. The composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt may be selected. Examples of compounds that can replace restricted compounds include compounds that are exempt from restrictions due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. The composition of the present invention may contain perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt within the maximum allowable range.

[0237] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0238] <Storage container> The storage container for the composition of the present invention is not particularly limited, and a known storage container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the storage container.

[0239] <Method for Preparing Composition> The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (at the time of application) to prepare the composition.

[0240] The preparation of the composition may include a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, when grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads, increase the bead packing ratio, or otherwise increase the grinding efficiency under such conditions. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, for example, the process and disperser described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, or paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details on the materials, equipment, processing conditions, etc. used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The composition may contain 1 to 10,000 ppm of the beads.

[0241] When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0242] <Method for Producing Film> The method for producing a film of the present invention includes a step of applying the above-described composition of the present invention to a support.

[0243] Examples of the support include a semiconductor substrate such as a silicon substrate, and a transparent substrate.

[0244] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include a metal, a metal oxide, and a black matrix. Furthermore, if necessary, an undercoat layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0245] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include substrates made of glass, resin, and the like. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0246] The composition can be applied by a known method such as spin coating, for example, the application method described in paragraph 0207 of WO 2022 / 085485.

[0247] The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0248] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0249] (When forming a pattern by photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the composition of the present invention to a support (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0250] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0251] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wave light sources of 300 nm or more can also be used.

[0252] The exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (for example, milliseconds or less).

[0253] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm ２ is preferred, and 0.05 to 1.0 J / cm ２ The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m ２ ~100000W / m ２ (For example, 5000 W / m ２ , 15000W / m ２ , or 35,000 W / m ２ The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m ２ , oxygen concentration 35% by volume, illuminance 20,000 W / m ２ etc.

[0254] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. Furthermore, to improve residue removability, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0255] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0256] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is preferably, for example, 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions for the developed film. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0257] (When forming a pattern by a dry etching method) Pattern formation by a dry etching method can be performed by a method such as applying the composition of the present invention to a support, forming a composition layer, curing the formed composition layer to form a cured product layer, then forming a patterned photoresist layer on the cured product layer, and then dry etching the cured product layer using an etching gas as a mask. In forming the photoresist layer, it is preferable to perform a pre-bake treatment. For pattern formation by a dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents thereof are incorporated herein by reference.

[0258] The film obtained using the composition of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples thereof include an infrared cut filter and an infrared transmission filter. Examples of infrared cut filters include an infrared cut filter on the light-receiving side of a solid-state imaging device (e.g., an infrared cut filter for a wafer-level lens), an infrared cut filter on the back side (opposite the light-receiving side) of a solid-state imaging device, and an infrared cut filter for an ambient light sensor (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, the film can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and selectively transmit infrared light of a specific wavelength or above.

[0259] The thickness of the film can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0260] When a film obtained using the composition of the present invention is used as an infrared cut filter, the film preferably has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). The average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance over the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. The transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. When the absorbance at the maximum absorption wavelength of the film is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0261] When a film obtained using the composition of the present invention is used as an infrared transmission filter, the film preferably has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with wavelengths longer than 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with wavelengths longer than 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with wavelengths longer than 1150 nm.

[0262] The film obtained using the composition of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film obtained using the composition of the present invention is used as an infrared cut filter and is used in combination with a color filter, it is preferable that the color filter be disposed on the optical path of the film obtained using the composition of the present invention. For example, it is preferable that the film obtained using the composition of the present invention and the color filter are laminated together to form a laminate. In the laminate, the film obtained using the composition of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film obtained using the composition of the present invention and the color filter are not adjacent to each other in the thickness direction, the film obtained using the composition of the present invention may be formed on a support other than the support on which the color filter is formed, and other components constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film obtained using the composition of the present invention and the color filter.

[0263] A film obtained using the composition of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of not only Si but also compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc.), infrared sensors, light-emitting elements, optical communication elements (for both transmission and reception), and image display devices.

[0264] <Method for producing optical filter> The composition of the present invention can also be used for producing an optical filter. The method for producing an optical filter preferably includes the above-described method for producing an optical filter. Types of optical filters include infrared cut filters and infrared transmission filters.

[0265] In addition to the film obtained using the composition of the present invention, the optical filter may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of WO 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255 to 0259 of JP 2014-041318 A. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0266] The optical filter may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer, acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. The optical filter may also be formed as a film directly on various elements.

[0267] <Method for manufacturing a solid-state imaging device> The composition of the present invention can also be used for manufacturing a solid-state imaging device. The method for manufacturing a solid-state imaging device preferably includes the manufacturing method of the present invention described above. The configuration of the solid-state imaging device is not particularly limited as long as it has a film obtained using the composition of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0268] The solid-state imaging device has a support on which a plurality of photodiodes constituting the light-receiving area of ​​the solid-state imaging device and a transfer electrode made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes being opened; a device protective film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film obtained using the composition of the present invention is disposed on the device protective film. Furthermore, the device protective film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film obtained using the composition of the present invention (on the side closer to the support), or a light-focusing means disposed on the film obtained using the composition of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in JP 2012-227478 A and JP 2014-179577 A.

[0269] <Method for Manufacturing an Image Display Device> The composition of the present invention can also be used to manufacture an image display device. The method for manufacturing an image display device preferably includes the manufacturing method of the present invention described above. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). The liquid crystal display device to which the present invention can be applied is not particularly limited, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection" edited by Akiyoshi Mikami, published by the Technical Information Association, pages 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430 to 485 nm), green region (530 to 580 nm), and yellow region (580 to 620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650 to 700 nm) in addition to these emission peaks. A film obtained using the composition of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0270] <Method for manufacturing an infrared sensor> The composition of the present invention can also be used for manufacturing an infrared sensor. The method for manufacturing an infrared sensor preferably includes the manufacturing method of the present invention described above. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

[0271] 1 , reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0272] The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range, and is not particularly limited, and a conventionally known color filter for forming pixels can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0273] In the infrared sensor shown in FIG. 1 , an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0274] <Method for manufacturing a camera module> The composition of the present invention can also be used for manufacturing a camera module. The method for manufacturing a camera module preferably includes the manufacturing method of the present invention described above. The configuration of the camera module is not particularly limited as long as it has a film obtained using the composition of the present invention and functions as a camera module. For example, a camera module can be configured to have a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0275] <Method of Manufacturing Light-Emitting Device> The composition of the present invention can also be used to manufacture a light-emitting device. The method of manufacturing a light-emitting device preferably includes the manufacturing method of the present invention described above. The configuration of the light-emitting device is not particularly limited as long as it functions as a light-emitting device, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VISELs). A film obtained using the composition of the present invention may be formed directly on the light-emitting device, or may be disposed on the light-emitting path.

[0276] <Method for manufacturing optical communication element> The composition of the present invention can also be used for manufacturing an optical communication element. The method for manufacturing an optical communication element preferably includes the manufacturing method of the present invention described above. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. A film obtained using the composition of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path.

[0277] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In addition, in the structural formulas shown below, Me represents a methyl group, and Ph represents a phenyl group.

[0278] <Infrared absorbing dye A> In the examples shown below, the following compound was used as infrared absorbing dye A.

[0279]

[0280] Ar in formula (10) １ ~Ar ４ is an aromatic ring selected from the aromatic ring Ph group and aromatic ring Np group shown below. * in the aromatic ring Ph group and aromatic ring Np group represents a linking site with the azaporphyrin skeleton in formula (10). The aromatic ring selected from the aromatic ring Ph group and aromatic ring Np group is Ar in formula (10). １ In this case, the dotted line in the aromatic ring Ph group or the aromatic ring Np group represents a single bond, and the aromatic ring selected from the aromatic ring Ph group or the aromatic ring Np group is Ar ２ ~Ar ４ In the case where X is Ar, the dotted line in the aromatic ring Ph group or the aromatic ring Np group represents a double bond. １ ~Ar ４ In the formula (10), a hydrogen atom on the aromatic ring is substituted. n is the average value in a mixture of different substitution positions and numbers of substitutions of X. * in the ligand Z group is a bond to M in formula (10).

[0281] (Aromatic ring Ph group)

[0282] (Aromatic ring Np group)

[0283] (Ligand Z group)

[0284] The numbers attached to the repeating units of resin-type ligands Z-20, Z-21, Z-23, and Z-30 to Z-33 are the number of repeating units. The numbers attached to the main chains of resin-type ligands Z-22, and Z-24 to Z-29 are the molar ratios of repeating units, and the numbers attached to the side chains are the number of repeating units. b indicates that it is a block copolymer. The weight-average molecular weight, acid value, and glass transition temperature of the resin portion of the resin-type ligands are as shown in the table below.

[0285]

[0286] Ar in formula (10) １ ~Ar ４ The compound names n0 to n4 are defined as shown in the table below depending on the number of aromatic rings selected from the aromatic ring Ph group or the aromatic ring Np group.

[0287] The n0 to n4 forms have the following structures: The n2 form has two isomers with different substitution positions.

[0288] Furthermore, it is asymmetric with respect to the dotted line in the following structure (R １ =R ４ And R ２ =R ３ No, R ａ =R ｆ And R ｂ =R ｅ And R ｃ =R ｄ When the aromatic ring Ph or Np is not bonded to the azaporphyrin skeleton, multiple isomers exist.

[0289] For example, the n0 form has the following four isomers: The n1 to n4 forms also have similar isomers.

[0290] <Preparation of Dispersion Liquid> The types of pigments, pigment derivatives, dispersing resins, binder resins, and solvents shown in the table below were mixed in the parts by mass shown in the table below, and 117 parts by mass of zirconia beads having a diameter of 0.3 mm were further added. A dispersion treatment was carried out for 5 hours using a paint shaker, and the beads were separated by filtration to prepare a dispersion liquid.

[0291]

[0292] Details of the materials listed in the table above are as follows. (Pigments) A-1 to A-25, A-101 to A-163, A-201 to A-283: Compounds A-1 to A-25, A-101 to A-163, A-201 to A-283 shown as specific examples of the infrared-absorbing dye A described above. IR-1: Compound having the following structure (squarylium compound, infrared-absorbing pigment). IR-2: Compound having the following structure (squarylium compound, infrared-absorbing pigment). IR-3: Compound having the following structure (croconium compound, infrared-absorbing pigment). IR-4: Mixture of compound (IR-4-a), compound (IR-4-b), and compound (IR-4-c) having the following structure (compound (IR-4-a): compound (IR-4-b): compound (IR-4-c) = 81:17:2 (mass ratio) (indigo compound, infrared-absorbing pigment). IR-5: Compound having the following structure (indigo compound, infrared absorbing pigment) IR-6: Compound having the following structure (pyrrolopyrrole compound, infrared absorbing pigment) PB15:6: C.I. Pigment Blue 15:6 (phthalocyanine compound, blue pigment) PV23: C.I. Pigment Violet 23 (dioxazine compound, purple pigment) PY139: C.I. Pigment Yellow 139 (isoindoline compound, yellow pigment)

[0293] (Pigment derivatives) Syn-1 to Syn-5: Compounds having the following structure

[0294] (Dispersion Resins) D-1: Block type resin having the following structure (numbers attached to the main chain represent the molar ratio of repeating units. Weight average molecular weight 9800, amine value 50 mg KOH / g, quaternary ammonium salt value 20 mg KOH / g). D-2: Resin having the following structure (numbers attached to the side chain represent the molar ratio of repeating units. Weight average molecular weight 9000, acid value 43 mg KOH / g). D-3: Resin having the following structure (numbers attached to the main chain represent the molar ratio of repeating units, and numbers attached to the side chain represent the number of repeating units. Weight average molecular weight 22900, acid value 32.3 mg KOH / g, amine value 45.0 mg KOH / g). D-4: Resin having the following structure (numbers attached to the main chain represent the molar ratio of repeating units, and numbers attached to the side chain represent the number of repeating units. Weight average molecular weight 22000, acid value 85.0 mg KOH / g).

[0295] (Binder Resin) B-1: Resin having the following structure (the numbers attached to the main chain indicate the molar ratio of repeating units; weight average molecular weight 19,000, acid value 72 mgKOH / g)

[0296] (Solvent) c2-1: Propylene glycol monomethyl ether acetate c2-2: Cyclohexanone c2-3: Ethyl lactate

[0297] <Preparation of Composition> The materials shown in the table below were mixed in the parts by mass shown in the table below, respectively, and the mixture was filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a composition. The content of the solvent (solvent c1) having a CLogP value of −2.00 to −0.35 in the composition is shown in the column “Amount of solvent c1 in composition.”

[0298] The details of the materials listed in the table above are as follows: The dispersion liquid is the dispersion liquid described above.

[0299] (Infrared absorbing dyes) IR-7: Compound having the following structure (squarylium compound, infrared absorbing dye) IR-8: Compound having the following structure (polymethine compound, infrared absorbing dye) IR-9: Compound having the following structure (iminium compound, infrared absorbing dye)

[0300] (Binder resins) B-1: Resin having the following structure (numbers added to the main chain indicate the molar ratio of repeating units. Weight average molecular weight 19,000, acid value 72 mg KOH / g) B-2: Resin having the following structure (numbers added to the main chain indicate the molar ratio of repeating units. Weight average molecular weight 9,000, acid value 72 mg KOH / g, double bond equivalent 493 g / eq, glass transition temperature is greater than -10°C and equal to or less than 80°C) B-3: Resin having the following structure (numbers added to the main chain indicate the molar ratio of repeating units. Weight average molecular weight 10,000, acid value 110 mg KOH / g) B-4: Resin having the following structure (numbers added to the main chain indicate the molar ratio of repeating units. Weight average molecular weight 9,700, acid value 184 mg KOH / g). B-5: Resin having the following structure (the numbers attached to the main chain represent the molar ratio of the repeating unit; weight average molecular weight 10,000, acid value 69 mgKOH / g) B-6: Resin having the following structure (the numbers attached to the main chain represent the mass ratio of the repeating unit; weight average molecular weight 22,900, acid value 130 mgKOH / g, epoxy equivalent 316 g / eq, glass transition temperature 124°C) B-7: Resin having the following structure (the numbers attached to the main chain represent the mass ratio of the repeating unit; weight average molecular weight 26,100, number average molecular weight 8,600, epoxy equivalent 355 g / eq, acid value 163 mgKOH / g, glass transition temperature 133°C) B-8: Resin having the following structure (the numbers attached to the main chain represent the mass ratio of the repeating unit. Weight average molecular weight 18,300, number average molecular weight 9,100, epoxy equivalent 284 g / eq, acid value 98 mg KOH / g, glass transition temperature 134°C) B-9: Resin having the following structure (the numbers attached to the main chain represent the mass ratio of the repeating unit. Weight average molecular weight 20,000, number average molecular weight 8,300, epoxy equivalent 284 g / eq, acid value 130 mg KOH / g, glass transition temperature 136°C) B-10: Resin having the following structure (the numbers attached to the main chain represent the mass ratio of the repeating unit. Weight average molecular weight 21,100, number average molecular weight 8,500, epoxy equivalent 355 g / eq, acid value 157 mg KOH / g, glass transition temperature 157°C) B-11: Resin having the following structure (the numbers attached to the main chain represent the mass ratio of the repeating unit.Weight average molecular weight 9500, number average molecular weight 5800) B-12: Resin of the following structure synthesized by the method described in Resin Synthesis Example 1 of JP 2021-134350 A (weight average molecular weight 137,000, number average molecular weight 32,000, glass transition temperature 165 ° C.) B-13: Resin of the following structure synthesized by the method described in Resin Synthesis Example 2 of JP 2021-134350 A (weight average molecular weight 188,000, number average molecular weight 75,000, glass transition temperature 285 ° C.) B-14: Resin of the following structure synthesized by the method described in Resin Synthesis Example 3 of JP 2021-134350 A (numbers appended to the main chain represent the molar ratio of repeating units. Glass transition temperature 310 ° C., inherent viscosity 0.87).

[0301] (Polymerizable compounds) M-1 to M-5: Compounds having the following structures M-6: Polymerizable compound C1-6 having a urethane bond described in paragraph 0313 of JP-A No. 2022-173080 (aromatic urethane acrylate having 10 polymerizable unsaturated groups). M-7: Polymerizable compound C1-8 having a urethane bond described in paragraph 0315 of JP-A No. 2022-173080 (aromatic urethane acrylate having an average of 9 polymerizable unsaturated groups and an acid group).

[0302] (Photopolymerization initiators) I-1 to I-9: Compounds having the following structures

[0303] (Additives) Ad-1 to Ad-4: Compounds having the following structure (antioxidants) Ad-5 to Ad-8: Compounds having the following structure (ultraviolet absorbers) Ad-9: Compounds having the following structure (silane coupling agents) Ad-10: Compounds having the following structure (epoxy resins) Ad-11: 4,4'-bis(diethylamino)benzophenone (sensitizer) Ad-12: Trimellitic acid (curing agent) Ad-13: 2-ethyl-4-methylimidazole (curing agent) Ad-14: Methyltetrahydrophthalic anhydride (curing agent)

[0304] (Polymerization inhibitor) St-1: p-methoxyphenol

[0305] (Surfactant) W-1: Compound having the following structure (weight average molecular weight = 14,000, in the following formula, % indicating the proportion of repeating units is mol %) W-2: KF-6001 (Shin-Etsu Chemical Co., Ltd., silicone surfactant)

[0306] (Solvent) c1-1: Ethylene glycol (CLogP = -1.37) c1-2: Diethylene glycol (CLogP = -1.30) c1-3: Triethylene glycol (CLogP = -1.48) c1-4: Ethylene glycol monomethyl ether (CLogP = -0.61) c1-5: Diethylene glycol monomethyl ether (CLogP = -0.78) c1-6: Triethylene glycol monomethyl ether (CLogP = -0.96) c1-7: Diethylene glycol monoethyl ether (CLogP = -0.39) c1-8: Triethylene glycol monoethyl ether (CLogP = -0.57) c1-9: Propylene glycol (CLogP = -1.06) c1-10: Dipropylene glycol (CLogP = -0.69) c1-11: N-methylpyrrolidone (CLogP = -0.40) c1-12: N,N-dimethylformamide (CLogP = -1.04) c1-13: N,N-dimethylacetamide (CLogP = -0.80) c2-1: Propylene glycol monomethyl ether acetate (CLogP = 0.60) c2-2: Cyclohexanone (CLogP = 0.87) c2-3: Ethyl lactate (CLogP = 0.33) c3: Anisole (CLogP = 2.06)

[0307] In some cases, solvent c1 was originally contained in the composition, and the composition was adjusted to the values ​​shown in the table by further adding solvent c1. The content of solvent c1 in the composition can be quantified by gas chromatography. Examples of gas chromatography conditions include the following: Separation equipment: Shimadzu GC2010 Column: DM-5MS (30 mm x 0.25 mm x 0.25 μm Film, Agilent Technologies), Carrier gas: He, Pressure: 120.0 kPa, Total flow rate: 50.0 ml / min, Column flow rate: 1.77 ml / min, Linear velocity: 49.0 cm / sec, Purge flow rate: 3.0 ml / min, Column temperature: 80°C held for 4 minutes, then heated over 16 minutes and held at 320°C for 5 minutes, Injection mode: Split-less Mode, Injection volume: 1 μl

[0308] <Film Production> (Production Example 1) Method for producing films using the compositions of Examples 1 to 30, 101 to 168, 201 to 357 and Comparative Examples 1 to 3 Each composition was applied to a glass substrate by spin coating and heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed to an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Corporation) at 1000 mJ / cm ２ The entire surface was exposed to an exposure amount of 1.0 μm. Then, the film was heated at 180° C. for 5 minutes using a hot plate to produce a film having a thickness of 1.0 μm.

[0309] (Production Example 2) Method for producing films using the compositions of Examples 401 to 440 and Comparative Examples 4 to 6 Each composition was applied to a glass substrate by spin coating, heated on a hot plate at 100°C for 2 minutes, and then heated at 200°C for 8 minutes for curing treatment, to obtain a film with a thickness of 1.0 μm.

[0310] (Production Example 3) Method for producing films using the compositions of Examples 501 to 534 and Comparative Examples 7 to 9 Each composition was applied to a glass substrate by spin coating, heated on a hot plate at 100°C for 2 minutes, and then heated at 180°C for 5 minutes to produce a film with a thickness of 1.0 μm.

[0311] <Evaluation of infrared absorption> Films were formed using each composition immediately after production by the method described above. The average transmittance of the resulting film in the wavelength range of 700 to 800 nm was measured using a spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation), and the infrared absorption was evaluated according to the following criteria: A: Average transmittance in the wavelength range of 700 to 800 nm ≦ 5% B: 5% < Average transmittance in the wavelength range of 700 to 800 nm ≦ 10% C: 10% < Average transmittance in the wavelength range of 700 to 800 nm

[0312] <Evaluation of Storage Stability> The viscosity (mPa s) of each composition was measured using an "RE-85L" manufactured by Toki Sangyo Co., Ltd. After the above measurement, the composition was stored in a thermostatic chamber at 45°C for 72 hours, and then the viscosity (mPa s) was measured again. The viscosity increase rate was calculated using the following formula, and storage stability was evaluated according to the following criteria. Note that all of the viscosity measurements were performed in a laboratory where the temperature and humidity were controlled at 22±5°C and 60±20%, and the temperature of the composition was adjusted to 25°C. Each measurement was performed three times, and the average value was used. Viscosity increase rate (%) = |(viscosity of composition after storage in a thermostatic chamber at 45°C for 72 hours / viscosity of composition immediately after production) - 1| x 100 A: increase rate ≦ 2% B: 2% < increase rate ≦ 4% C: 4% < increase rate ≦ 7% D: 7% < increase rate ≦ 10% E: 10% < increase rate

[0313] <Evaluation of foreign matter defects> Each composition was stored in an incubator at 45°C for 3 days, and then a film was formed using each composition after storage by the above method. The obtained film was observed using a scanning electron microscope (measurement magnification = 10,000 times) to measure the number of foreign matter present in an area of ​​10 μm × 15 μm, and the foreign matter defects were evaluated according to the following criteria. A: No foreign matter is present in an area of ​​10 μm × 15 μm. B: More than 0 foreign matter is present in an area of ​​10 μm × 15 μm, but not more than 50. C: More than 50 foreign matter is present in an area of ​​10 μm × 15 μm, but not more than 100. D: More than 100 foreign matter is present in an area of ​​10 μm × 15 μm, but not more than 200. E: More than 200 foreign matter is present in an area of ​​10 μm × 15 μm.

[0314] As shown in the above table, the examples were superior to the comparative examples in the evaluation of storage stability and foreign matter defects.

[0315] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: planarization layer

Claims

1. A composition comprising an infrared absorbing dye A represented by formula (1) or (2), a curable compound B, and a solvent C, wherein the solvent C comprises a solvent c1 having a CLogP value of −2.00 to −0.35, and the content of the solvent c1 in the composition is 0.1 to 1000 ppm by mass; In formula (1), X １ａ ~X １ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; １ａ ~X １ｐ may each independently bond to each other to form an aromatic ring; １ represents a trivalent cationic atom; Z １ represents a ligand; ２ａ ~X ２ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; ２ａ ~X ２ｐ may each independently bond to each other to form an aromatic ring; ２ represents a tetravalent cationic atom; Z ２ａ and Z ２ｂ each independently represents a ligand.

2. A composition comprising an infrared absorbing dye A represented by formula (1) or (2), a curable compound B, and a solvent C, wherein the solvent C comprises at least one solvent c1a selected from ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, dipropylene glycol, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide, and the content of the solvent c1a in the composition is 0.1 to 1000 ppm by mass; In formula (1), X １ａ ~X １ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; １ａ ~X １ｐ may each independently bond to each other to form an aromatic ring; １ represents a trivalent cationic atom; Z １ represents a ligand; ２ａ ~X ２ｐ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; ２ａ ~X ２ｐ may each independently bond to each other to form an aromatic ring; ２ represents a tetravalent cationic atom; Z ２ａ and Z ２ｂ each independently represents a ligand.

3. The composition according to claim 2, wherein the solvent c1a is at least one selected from the group consisting of triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, N-methylpyrrolidone, N,N-dimethylformamide and N,N-dimethylacetamide.

4. M in the above formula (1) １ is B, Al, Ga, In or Sc, and M in the formula (2) ２ The composition of claim 1 or 2, wherein is Ti, Zr, Hf, V, Nb, Ta, Si, Ge or Sn.

5. Z in the formula (1) １ and Z in the formula (2) ２ａ and Z ２ｂ is independently a ligand represented by formula (3) or formula (4); In formula (3), R ３ａ and R ３ｂ each independently represents a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a group represented by formula (5), * represents M １ Or M ２ In formula (4), Y ４ Is -OSO ２ represents -, -OCO-, or -O-; ４ represents a single bond or a n4+1-valent linking group; Pm ４ represents a polymer chain, n4 represents an integer of 1 to 5, and when n4 is 2 to 5, a plurality of Pm ４ may be the same or different, * is M １ Or M ２ It is a combination with; In formula (5), L ５ represents a single bond or a n5+1-valent linking group; Pm ５ represents a polymer chain, n5 represents an integer of 1 to 5, and when n5 is 2 to 5, a plurality of Pm ５ may be the same or different, and * is a bond to P in formula (3).

6. The composition according to claim 5, wherein the ligand represented by formula (3) is a ligand which is a polymer having a structure represented by formula (3-1), a ligand represented by formula (3-2), or a ligand represented by formula (3-3); In formula (3-1), R １１ａ represents a hydrogen atom, an alkyl group or a halogen atom; R １１ｂ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; １１ａ is -CONH-L １１ｂ --, --COO-L １１ｃ --CONH-L １１ｄ -O- or -COO-L １１ｅ represents —O—; L １１ｂ ~L １１ｅ each independently represents a hydrocarbon group or a divalent group in which a plurality of hydrocarbon groups are linked via -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO-; * represents M １ Or M ２ In formula (3-2), R １２ａ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; R １２ｂ represents an alkyl group or an aryl group; L １２ represents an alkylene group or an arylene group, n12 represents 0 or 1, m12 represents an integer of 2 or more, * represents M １ Or M ２ In formula (3-3), R １３ａ and R １３ｂ each independently represents an alkyl group or an aryl group; L １３ａ and L １３ｂ each independently represents an alkylene group or an arylene group; n13 and p13 each independently represent 0 or 1; m13 and q13 each independently represent an integer of 2 or more; * represents M １ Or M ２ It is a combination with.

7. In the formula (1), X １ｂ and X １ｃ , X １ｆ and X １ｇ , X １ｊ and X １ｋ , X １ｎ and X １ｏ At least one pair of X in the formula (2) is bonded to each other to form an aromatic ring which may have a substituent. ２ｂ and X ２ｃ , X ２ｆ and X ２ｇ , X ２ｊ and X ２ｋ , X ２ｎ and X ２ｏ The composition according to claim 1 or 2, wherein any one or more pairs of are bonded to each other to form an aromatic ring which may have a substituent.

8. The composition according to claim 1 or 2, wherein the infrared absorbing dye A comprises a compound represented by formula (8): In formula (8), R ８ａ ~R ８ｖ each independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a sulfo group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthio group, an arylthio group, a heterocyclic thio group, an amino group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic oxycarbonyl group, a phthalimidomethyl group, a carbamoyl group, or a sulfamoyl group; Z ８ represents a ligand represented by formula (21) or a ligand which is a polymer having a structure represented by formula (22). In formula (21), R ２１ａ and R ２１ｂ each independently represents a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, and * represents a bond to Al; ２２ａ represents a hydrogen atom, an alkyl group or a halogen atom; R ２２ｂ represents a hydrogen atom, a hydroxy group, an alkyl group, a heterocyclic group, an aryl group, an alkoxy group, a heterocyclic oxy group, or an aryloxy group; ２２ａ is -CONH-L ２２ｂ --, --COO-L ２２ｃ --CONH-L ２２ｄ -O- or -COO-L ２２ｅ represents —O—; L ２２ｂ ~L ２２ｅ each independently represents a hydrocarbon group or a divalent group in which a plurality of hydrocarbon groups are linked via -O-, -CO-, -COO-, -OCO-, -CONH- or -NHCO-, and * represents a bond to Al.

9. The composition according to claim 1 or 2, wherein said solvent C further comprises at least one selected from the group consisting of propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, cyclopentanone, cyclohexanone, ethyl lactate, butyl acetate, and ethyl 3-ethoxypropionate.

10. The composition according to claim 1 or 2, further comprising a polymerizable compound and a photopolymerization initiator.

11. The composition according to claim 1 or 2, further comprising a coloring material that transmits infrared light and blocks visible light.

12. A method for producing a film, comprising the step of applying the composition according to claim 1 or 2 to a support.

13. A method for manufacturing a solid-state imaging device, comprising the method for manufacturing the film according to claim 12.

14. A method for producing an infrared sensor, comprising the method for producing the film according to claim 12.

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