Moving device, exposure apparatus, method for driving mobile unit, exposure method, and device manufacturing method

Abstract

This exposure apparatus has a stage moving device (7). The stage moving device (7) is provided with a first mobile unit (32) that extends in an X-axis direction and moves in a Y-axis direction, a second mobile unit (34) that moves in the Y-axis direction, a first measurement system (36), and a second measurement system (37). The first measurement system (36) measures the position of the second mobile unit (34) in the X-axis direction using a first head (45) provided on the second mobile unit (34) and a scale (41) extending in the X-axis direction and provided on the first mobile unit (32) so as to face the first head (45). The second measurement system (37) acquires information relating to a space along the Y-axis direction between the first mobile unit (32) and the second mobile unit (34).

Description

Moving apparatus, exposure apparatus, moving body driving method, exposure method, and device manufacturing method

[0001] The present invention relates to a moving apparatus, an exposure apparatus, a method for driving a moving body, an exposure method, and a device manufacturing method.This application claims priority to Japanese Patent Application No. 2023-213947, filed December 19, 2023, the contents of which are incorporated herein by reference.

[0002] Conventionally, in the lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), an exposure apparatus is used to transfer a predetermined pattern on a mask (photomask) or reticle (hereinafter collectively referred to as "mask") onto a photosensitive glass plate or wafer (hereinafter collectively referred to as "substrate") by exposing the substrate to illumination light (energy beam) via a projection optical system.

[0003] This type of exposure apparatus requires highly accurate control of the position of the substrate relative to the projection optical system, and so is known to use a linear encoder system as a position measurement system for the stage on which the substrate is placed (see, for example, Patent Document 1).

[0004] Here, when the position information of the substrate is obtained using an optical interferometer system, the optical path length of the laser to the bar mirror becomes long, and the influence of so-called air fluctuations cannot be ignored.

[0005] US Patent Application Publication No. 2010 / 0266961

[0006] According to a first aspect of the present invention, a moving device includes a first moving body extending in a first direction and moving in a second direction intersecting the first direction, a second moving body moving in the second direction, a first head provided on one of the first moving body and the second moving body, and a scale extending in the first direction and provided on the other of the first moving body and the second moving body so as to face the first head, a first measurement system that measures the position of the second moving body in the first direction using the first head, and a second measurement system that acquires information regarding the distance between the first moving body and the second moving body.

[0007] According to a second aspect of the present invention, a moving device includes a first moving body extending in a first direction and moving in a second direction intersecting the first direction, a second moving body moving in the second direction, a first measurement system that measures the position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body, and a scale provided on the other of the first moving body and the second moving body so as to extend in the first direction and face the first head, a second measurement system that acquires information regarding the positional relationship between the first moving body and the second moving body in the second direction, and a third measurement system that measures the position of the first moving body in the second direction, and controls the position of the second moving body in the first direction and the second direction based on the measurement results of the first measurement system, the second measurement system, and the third measurement system.

[0008] According to a third aspect of the present invention, a method for driving a movable body is a method for driving a movable body that moves a first movable body that extends in a first direction and moves in a second direction intersecting the first direction, and a second movable body that moves in the second direction, and includes measuring the position of the second movable body in the first direction using a first head provided on one of the first movable body and the second movable body, and a scale provided on the other of the first movable body and the second movable body so as to extend in the first direction and face the first head, obtaining information regarding the distance between the first movable body and the second movable body, and driving the first movable body and the second movable body based on the measurement result regarding the second movable body and the information regarding the distance.

[0009] According to a fourth aspect of the present invention, a method for driving a movable body is a method for driving a movable body that moves a first movable body extending in a first direction and moving in a second direction intersecting the first direction, and a second movable body moving in the second direction, and includes measuring the position of the second movable body in the first direction using a first head provided on one of the first movable body and the second movable body, and a scale provided on the other of the first movable body and the second movable body extending in the first direction and facing the first head, acquiring information regarding the positional relationship between the first movable body and the second movable body in the second direction, measuring the position of the first movable body in the second direction, and controlling the position of the second movable body in the first direction and the second direction based on the measured position of the second movable body in the first direction, the acquired information regarding the positional relationship between the first movable body and the second movable body, and the measured position of the first movable body in the second direction.

[0010] According to a fifth aspect of the present invention, an exposure method is an exposure method for exposing an object using an exposure apparatus including a first moving body extending in a first direction and moving in a second direction intersecting the first direction, a second moving body moving in the second direction, an object held by the second moving body, and an optical system for irradiating light onto the object, the exposure method including: measuring the position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body, and a scale provided on the other of the first moving body and the second moving body so as to extend in the first direction and face the first head; obtaining information regarding the distance between the first moving body and the second moving body; controlling the movement of the first moving body and the second moving body based on the measurement result regarding the second moving body and the information regarding the distance; and exposing the object with light from the optical system while moving the second moving body holding the object in the first direction.

[0011] 1 is a diagram that schematically shows the configuration of an exposure apparatus according to a first embodiment. FIG. 2 is an external perspective view that schematically shows the configuration of an exposure apparatus according to a first embodiment. FIG. 3 is a diagram that schematically shows the configuration of an illumination optical apparatus according to a first embodiment. FIG. 4 is a front view that schematically shows the configuration of a stage movement apparatus according to a first embodiment. FIG. 5 is a plan view that schematically shows the configuration of the stage movement apparatus according to the first embodiment. FIG. 6 is a front view that schematically shows the configuration of the stage movement apparatus according to the first embodiment after movement. FIG. 7 is an external perspective view that shows a part of the exposure apparatus according to the first embodiment. FIG. 8 is an external perspective view of a part of the exposure apparatus according to the first embodiment, seen from diagonally above. FIG. 9 is a plan view that schematically shows the configuration of a stage movement apparatus according to a second embodiment. FIG. 10 is a front view that schematically shows the configuration of the stage movement apparatus according to the second embodiment. FIG. 11 is a plan view that schematically shows the configuration of a plurality of encoder measurement systems of the stage movement apparatus according to the second embodiment. FIG. 12 is a plan view that schematically shows the configuration of a stage movement apparatus according to a third embodiment. FIG. 13 is a front view that schematically shows the configuration of the stage movement apparatus according to the third embodiment. FIG. 14 is a plan view that schematically shows the configuration of the stage movement apparatus according to a fourth embodiment. FIG. 15 is a front view that schematically shows the configuration of the stage movement apparatus according to the fourth embodiment. 10A and 10B are front views each showing a schematic configuration of a stage movement device according to a fifth embodiment, a plan view each showing a schematic configuration of a stage movement device according to a sixth embodiment, and a front view each showing a schematic configuration of a stage movement device according to a sixth embodiment.

[0012] DETAILED DESCRIPTION OF THE INVENTION

[0013] The present invention will now be described with reference to the accompanying drawings, in which:

[0014] The following detailed description of the present invention is illustrative only and not limiting;

[0015] The same or similar reference numerals are used throughout the drawings and the following detailed description.

[0013] First Embodiment FIG. 1 is a diagram schematically illustrating the configuration of an exposure apparatus 1 according to a first embodiment. FIG. 2 is an external perspective view schematically illustrating the configuration of the exposure apparatus 1 according to the first embodiment. As shown in FIGS. 1 and 2 , the exposure apparatus 1 is an apparatus that irradiates an exposure object P with modulated light. In a specific embodiment, the exposure apparatus 1 is a step-and-scan projection exposure apparatus, a so-called scanner, that uses a rectangular (square) glass substrate used in liquid crystal display devices (flat panel displays) and the like as the exposure object. The glass substrate P, which is the exposure object, has at least one side length or diagonal length of 500 mm or more and may be a substrate for a flat panel display. The exposure object P (e.g., a substrate for a flat panel display) exposed by the exposure apparatus 1 is developed and then provided as a product.

[0014] The exposure apparatus 1 includes a vibration isolation table 2, a mount unit 3, a main column 4, an optical surface plate 5, an illumination optical device 6 (optical system), a stage movement device 7 (movement device), and a control unit 8. In the following, a three-dimensional Cartesian coordinate system will be used as needed, in which the direction parallel to the optical axis direction of light irradiated from the illumination optical device 6 toward the exposure object P is defined as the Z-axis direction (third direction), the direction of a predetermined plane perpendicular to the Z-axis is defined as the X-axis direction (first direction), and the direction perpendicular to both the Z-axis and the X-axis is defined as the Y-axis direction (second direction). In this embodiment, the direction in which the exposure object P (glass substrate) is scanned relative to the projection module 17 of the illumination optical device 6 during exposure operation is defined as the X-axis direction.

[0015] The vibration isolation table 2 is placed on the ground (ground surface). The pedestal unit 3 is a base of the exposure apparatus 1, and is placed on the vibration isolation table 2. The pedestal unit 3 supports a stage (second moving body 34) of the stage moving device 7, on which the exposure object P is placed, so that the stage can move in the X-axis and Y-axis directions.

[0016] The stage movement device 7 supports the exposure object P and positions the exposure object P with high precision relative to multiple partial images of the circuit pattern projected via the projection module 17 of the illumination optical device 6 during scanning exposure. The stage movement device 7 drives the exposure object P in six degrees of freedom (the X-, Y-, and Z-axis directions and the θx, θy, and θz directions, which are rotational directions relative to each axis). The second movable body 34, which is the movable part of the stage movement device 7, moves in the X-axis direction during scanning exposure and in the Y-axis direction when changing the exposure target area on the exposure object P. Note that multiple exposure target areas are formed on the exposure object P. The exposure apparatus 1 is capable of exposing multiple exposure target areas on a single exposure object P. The stage movement device 7 can be a stage device with a so-called coarse / fine movement configuration, which includes a gantry-type two-dimensional coarse movement stage and a fine movement stage that is finely driven relative to the two-dimensional coarse movement stage. In this case, the coarse movement stage allows the exposure object P to be moved in three degrees of freedom in a horizontal plane, and the fine movement stage allows the exposure object P to be finely moved in six degrees of freedom. The stage movement device 7 will be described in detail later.

[0017] The main column 4 supports an optical surface plate 5 above (in the positive direction of the Z axis) the stage moving device 7. The optical surface plate 5 supports an illumination optical device 6.

[0018] FIG. 3 is a diagram schematically illustrating the configuration of an illumination optical device 6 according to the first embodiment. As shown in FIG. 3, the illumination optical device 6 includes an illumination module 16, a projection module 17 (projection optical system), a light source unit 18, and a light modulation unit 20. The illumination module 16 is disposed above the optical base 5 and connected to the light source unit 18 via an optical fiber 19. In one example of this embodiment, the illumination modules 16 include a first illumination module 16A, a second illumination module 16B, a third illumination module 16C, and a fourth illumination module 16D. In the following description, when the first illumination module 16A to the fourth illumination module 16D are not distinguished from one another, they will be collectively referred to as the illumination module 16.

[0019] Each of the first lighting module 16A to fourth lighting module 16D guides light emitted from the light source unit 18 via an optical fiber 19 to the first light modulation section 20A, the second light modulation section 20B, the third light modulation section 20C, and the fourth light modulation section 20D, respectively. The lighting module 16 illuminates the light modulation section 20. The first lighting module 16A and the first light modulation section 20A are arranged side by side in the scanning direction. The second lighting module 16B and the second light modulation section 20B are arranged side by side in the scanning direction. The third lighting module 16C and the third light modulation section 20C are arranged side by side in the scanning direction. The fourth lighting module 16D and the fourth light modulation section 20D are arranged side by side in the scanning direction.

[0020] The light modulation unit 20 is controlled based on the circuit pattern to be transferred onto the exposure object P, and modulates the illumination light from the illumination module 16. The modulated light modulated by the light modulation unit 20 is guided to the projection module 17. The first light modulation unit 20A to the fourth light modulation unit 20D are disposed at different positions on the XY plane. In the following description, when the first light modulation unit 20A to the fourth light modulation unit 20D are not to be distinguished from one another, they will be collectively referred to as the light modulation unit 20.

[0021] The projection module 17 is disposed below the optical surface plate 5 and irradiates the exposure object P placed on the stage movement device 7 with modulated light modulated by the light modulation unit 20. The projection module 17 forms an image of the light modulated by the light modulation unit 20 on the exposure object P, thereby exposing the exposure object P. In other words, the projection module 17 projects the pattern on the light modulation unit 20 onto the exposure object P. A plane including the optical axis of the illumination light illuminating the light modulation unit 20 and the optical axis of the projection module 17 is arranged parallel to the scanning direction (X-axis direction). In one example of this embodiment, the projection module 17 includes first projection module 17A to fourth projection module 17D corresponding to the first illumination module 16A to fourth illumination module 16D and first light modulation unit 20A to fourth light modulation unit 20D described above. In the following description, when the first projection module 17A to fourth projection module 17D are not to be distinguished from one another, they will be collectively referred to as the projection module 17.

[0022] A unit consisting of the first illumination module 16A, the first light modulation unit 20A, and the first projection module 17A is called the first exposure module. Similarly, a unit consisting of the second illumination module 16B, the second light modulation unit 20B, and the second projection module 17B is called the second exposure module. Each exposure module is provided at a different position on the XY plane and can expose a pattern at a different position on the exposure object P placed on the stage 14. The stage 14 can scan and expose the entire surface of the exposure object P or the entire surface of the exposure target area by moving relative to the exposure modules in the X-axis direction, which is the scanning direction.

[0023] The illumination module 16 is also referred to as an illumination system. The illumination module 16 (illumination system) illuminates the spatial light modulation element of the light modulation unit 20. The projection module 17 is also referred to as a projection unit. The projection module 17 (projection unit) may be a life-size system that projects an image of the pattern on the light modulation unit 20 at life-size, or may be a magnification system or a reduction system. The projection module 17 is preferably made of one or two types of glass material (particularly quartz or fluorite).

[0024] 2, a pair of light source units 18 are provided. As the light source unit 18, a light source unit using a highly coherent laser as a light source, a light source unit using a light source such as a semiconductor laser type UV-LD, a light source unit using a lens relay type retarder, etc. Examples of the light source 18a included in the light source unit 18 include a lamp or laser diode that emits light with a wavelength of 405 nm or 365 nm.

[0025] In addition to the above-mentioned components, the exposure apparatus 1 includes an AF (Auto Focus) unit (not shown) that measures the position in the Z-axis direction of the exposure object P on the stage moving device 7. The exposure apparatus 1 may further include an alignment unit (not shown) that measures the relative position of each pattern when exposing a different pattern on top of a pattern already exposed on the exposure object P. The AF unit and alignment unit may be configured as TTL (Through the lens) units that perform measurements via the projection module 17.

[0026] FIG. 4 is a front view schematically showing the configuration of the stage movement device 7 according to the first embodiment. FIG. 5 is a plan view schematically showing the configuration of the stage movement device 7 according to the first embodiment. FIG. 6 is a front view schematically showing the configuration of the stage movement device 7 according to the first embodiment after movement. FIG. 6 shows a state after the first moving body 32 and the second moving body 34 have moved in the Y-axis direction (+Y direction in the figure) from the state shown in FIG. 4. FIG. 7 is an external perspective view showing a part of the exposure apparatus 1 according to the first embodiment. FIG. 7 is a perspective view mainly showing the external view of the first moving body 32. FIG. 8 is an external perspective view of a part of the exposure apparatus 1 according to the first embodiment, seen from diagonally above. FIG. 8 is a perspective view mainly showing the first moving body 32, seen from diagonally above. The exposure object P is not shown in FIGS. 4 to 8. As shown in FIGS. 2, 4, and 5, the stage movement device 7 is provided below the optical surface plate 5 and above the pedestal unit 3. The stage moving device 7 has a base member 30 (see Figures 1 and 2) attached to the mount part 3, a first moving body 32 and a second moving body 34 configured to be movable relative to the base member 30, a first measurement system 36, a second measurement system 37, and a third measurement system 38.

[0027] As shown in FIG. 2 , the base member 30 is fixed to the upper part of the mount 3. In other words, the base member 30 is immovable relative to the mount 3. The base member 30 may be integrally formed with the mount 3, for example. As shown in FIGS. 4 , 5 , and 7 , the first movable body 32 is, for example, a long member for installing an encoder. The first movable body 32 is, for example, a movable mirror having a reflective surface 32 a at least in part. The first movable body 32 extends along the X-axis direction and moves along the Y-axis direction relative to the base member 30. Note that, because the base member 30 and the optical table 5 are fixed to each other, "moving relative to the base member 30" may be synonymous with "moving relative to the optical table 5." For the sake of explanation, FIGS. 4 and 6 illustrate an example in which the first movable body 32 is movably attached to the optical table 5.

[0028] The first movable body 32 is attached to the base member 30 via Y guides 42. A pair of Y guides 42 are arranged on the base member 30. The Y guides 42 extend in the Y-axis direction and are rectangular in XZ cross section. The Y guides 42 are fixed to the base member 30. The Y guides 42 and the base member 30 may be formed integrally. The pair of Y guides 42 are arranged parallel to each other at a predetermined interval in the X-axis direction. The pair of Y guides 42 include a linear guide mechanism and a drive motor (not shown). The linear guide mechanism and the drive motor are driven by signals from the control unit 8, thereby allowing the first movable body 32 to move freely in the Y-axis direction on the base member 30. As shown in FIGS. 4 and 6 , the first movable body 32 moves stepwise in the Y-axis direction in response to the stepwise movement in the Y-axis direction of the second movable body 34 on which the exposure object P (described later) is placed. This controls the distance between the first movable body 32 and the second movable body 34 along the Y-axis direction to be constant. It should be noted that while the second moving body 34 is being scanned in the X direction, the first moving body 32 is controlled to remain stationary.

[0029] A Y encoder scale 43 (second measurement member) extending along the Y-axis direction is attached to the base member 30. The Y encoder scale 43 is a strip-shaped member extending along the Y-axis direction, and its upper surface (the surface facing the +Z direction) has a reflective one-dimensional diffraction grating whose periodic direction is the Y-axis direction. Furthermore, as shown in FIG. 4 , a Y encoder head 44 is provided on the first movable body 32 so as to face the Y encoder scale 43 in the Z direction. The Y encoder head 44 irradiates the corresponding Y encoder scale 43 with a measurement beam and receives light (here, diffracted light) from the Y encoder scale 43. The Y encoder scale 43 and the Y encoder head 44 measure the position of the first member in the Y-axis direction. The member to which the Y encoder scale 43 is attached is preferably made of a material that is resistant to thermal deformation, such as ceramics. The Y encoder scale 43 may have a reflective two-dimensional diffraction grating whose periodic directions are two orthogonal axes (e.g., the Y-axis and X-axis directions). In this case, first movable body 32 may also be movable in the X-axis direction relative to Y guide 42. Alternatively, an X-movement stage (not shown) may be further provided between Y guide 42 and base member 30, and Y guide 42 may be attached to this X-movement stage. In other words, first movable body 32 may be movable in two axes, the X-axis and the Y-axis, by moving the X-movement stage in the X-axis direction relative to base member 30 and moving Y guide 42 in the Y-axis direction relative to the X-movement stage.

[0030] The first movable body 32 extends along the X-axis direction and has a rectangular YZ cross section. The first movable body 32 has a reflective surface 32a formed on at least one surface corresponding to the side where the second movable body 34 (described later) is provided. In this embodiment, the first movable body 32 is formed so that all four surfaces facing both sides in the Y direction and both sides in the Z direction are reflective surfaces 32a. The reflective surfaces 32a of the first movable body 32 are formed by metal deposition on the surface of a rod-shaped member having a rectangular cross section. The first movable body 32 is preferably formed from a material that is resistant to thermal deformation, such as ceramics. Of the four surfaces of the first movable body 32 having the reflective surface 32a, the surface corresponding to the side where the second movable body 34 (described later) is provided (the surface facing the +Y-axis direction in this embodiment) is provided with an X encoder scale 41 (scale) extending along the X-axis direction. That is, the X encoder scale 41 and the reflective surface 32a are provided on the same side of the first movable body 32 (the same surface facing the same direction). X encoder scale 41 is attached to the surface of first movable body 32 using, for example, an adhesive. Similar to Y encoder scale 43 described above, X encoder scale 41 has, for example, a one-dimensional diffraction grating whose periodic direction is in the X-axis direction.

[0031] The second movable body 34 is, for example, a precision stage. The second movable body 34 moves along the X-axis and Y-axis directions relative to the base member 30. The second movable body 34 has a plate table 46 that is movably mounted relative to the base member 30, and a plate holder 47 that is fixed on the plate table 46 and holds the exposure object P. A coarse XY stage (not shown) is provided between the plate table 46 and the base member 30. Like the first movable body 32, the second movable body 34 has a linear guide mechanism and a drive motor (not shown), and is movable along the X-axis and Y-axis directions on the base member 30 by driving these linear guide mechanism and drive motor in response to signals from the control unit 8. The second movable body 34 is controlled to scan along the X-axis direction during the exposure operation of the exposure object P, and to move stepwise along the Y-axis direction when changing the exposure area.

[0032] An X encoder head 45 (first head) is provided on the plate holder 47 of the second movable body 34. As shown in FIGS. 5 and 7 , a plurality of X encoder heads 45 (two in this embodiment) are provided and aligned in the X-axis direction. A pair of X encoder heads 45 faces the X encoder scale 41 of the first movable body 32 in the Y-axis direction. The X encoder head 45 irradiates the corresponding X encoder scale 41 with a measurement beam and receives light (here, diffracted light) from the X encoder scale 41. The light from the X encoder scale 41 is supplied to a detector (not shown), and the output of the detector is supplied to the control unit 8 (see FIG. 1 ). Note that the term "encoder head" in this specification refers to any device that emits a measurement beam to a diffraction grating and has a portion onto which light from the diffraction grating is incident. The encoder head itself illustrated in each figure does not necessarily have a light source, detector, etc.

[0033] The plate table 46 and the plate holder 47 are formed of a material with a smaller coefficient of thermal expansion than the X encoder scale 41 provided on the first movable body 32. By providing the X encoder head 45 on a material with such a small coefficient of thermal expansion, the relative position of the second movable body 34 with respect to the first movable body 32 can be measured precisely. Furthermore, by providing a pair of X encoder heads 45 aligned in the X-axis direction, the absolute position of the second movable body 34 can be measured. By reading one X encoder scale 41 with a pair of X encoder heads 45 aligned in the X-axis direction mounted on a base 55 (table) with a small coefficient of thermal expansion, absolute value correction can be performed in real time. For example, the base 55 may be made of a material with a smaller coefficient of thermal expansion than the X encoder scale 41.

[0034] 4 to 7 , an interferometer head 50 (second head) is further provided on the plate holder 47 of the second movable body 34. A plurality of interferometer heads 50 (two in this embodiment) are provided lined up in the X-axis direction. In this embodiment, a pair of X encoder heads 45 is provided between the pair of interferometer heads 50 in the X-axis direction. The pair of interferometer heads 50 are provided so as to face the reflecting surface 32a of the first movable body 32 in the Y-axis direction. The distance between the interferometer head 50 and the reflecting surface 32a is greater than the distance between the X encoder head 45 and the X encoder scale 41.

[0035] In the above embodiment, the X encoder head 45 and the interferometer head 50 are provided on the plate holder 47, but the present invention is not limited to this. For example, the X encoder head 45 and the interferometer head 50 may be provided on the plate table 46. Alternatively, the X encoder head 45 and the interferometer head 50 may be provided on another member of the second movable body 34 that moves integrally with the plate holder 47 and the plate table 46.

[0036] First measurement system 36 includes X encoder scale 41 provided on first movable body 32 and X encoder head 45 provided on second movable body 34. First measurement system 36 measures the position of second movable body 34 in the X-axis direction using X encoder head 45 provided on second movable body 34 and X encoder scale 41 provided on first movable body 32 so as to face X encoder head 45. The measurement results of first measurement system 36 are transmitted to control unit 8.

[0037] The second measurement system 37 is an optical interferometer system including the reflecting surface 32a provided on the first movable body 32 and the interferometer head 50 provided on the second movable body 34. The second measurement system 37 acquires information about the positional relationship between the first movable body 32 and the second movable body 34 in the Y-axis direction using the reflecting surface 32a of the first movable body 32 and the interferometer head 50 of the second movable body 34. Specifically, the second measurement system 37 acquires information about the distance between the first movable body 32 and the second movable body 34 in the Y-axis direction. The information about the distance is, for example, the amount of change in the distance when the positional relationship between the first movable body 32 and the second movable body 34 changes. The "distance in the Y-axis direction" may be synonymous with the "distance along the Y-axis direction." Here, since a pair of interferometer heads 50 are provided, the second measurement system 37 can acquire information about the distance between the first movable body 32 and the second movable body 34 in the Y-axis direction at multiple positions in the X-axis direction. Therefore, the second measurement system 37 measures the position of the second moving body 34 in the Y-axis direction and the θz direction relative to the first moving body 32. Information about the gap obtained by the second measurement system 37 is transmitted to the control unit 8.

[0038] The distance along the Y-axis direction between X encoder head 45 and X encoder scale 41 of first measurement system 36 is significantly shorter than the distance along the Y-axis direction between interferometer head 50 of second measurement system 37 (i.e., optical interferometer system) and reflecting surface 32a. Therefore, first measurement system 36 using a linear encoder system is less affected by air fluctuations than second measurement system 37 using an optical interferometer system, and is able to control the position of exposure object P with high precision, thereby enabling improvement in exposure precision.

[0039] Third measurement system 38 includes Y encoder scale 43 provided on base member 30 described above, and Y encoder head 44 provided on first movable body 32. Third measurement system 38 measures the position of first movable body 32 in the Y-axis direction relative to base member 30, using Y encoder scale 43 provided on base member 30 and Y encoder head 44 provided on first movable body 32 so as to face Y encoder scale 43. The measurement results of third measurement system 38 are transmitted to control unit 8.

[0040] The control unit 8 (see FIG. 1 ) includes a so-called microcomputer (or workstation) consisting of a CPU (Central Processing Unit), ROM (Read Only Memory), RAM (Random Access Memory), etc., and controls the entire exposure apparatus 1. The control unit 8 may be provided integrally with the exposure apparatus 1, or may be provided as an external device separate from the exposure apparatus 1 and connected to the exposure apparatus 1 for wired or wireless communication. In the exposure apparatus 1, the control unit 8 controls the positions of at least the first movable body 32 and the second movable body 34. For example, during exposure operations, the positions of the first movable body 32 and the second movable body 34 are managed by the control unit 8 based on measurement values ​​of each measurement system (including the first measurement system 36 and the second measurement system 37). Note that the positions of the first movable body 32 and the second movable body 34 may also be managed and controlled based on measurement values ​​of each measurement system during wafer alignment operations.

[0041] In this embodiment, the control unit 8 acquires the measurement results of the first measurement system 36, information obtained by the second measurement system 37, and measurement results of the third measurement system 38. The control unit 8 controls the distance in the Y-axis direction between the first moving body 32 and the second moving body 34 based on the measurement results of the second measurement system 37. Specifically, the control unit 8 controls the position of the second moving body 34 in the Y-axis direction based on information about the distance acquired using the second measurement system 37. The control unit 8 also controls the position of the second moving body 34 in the X-axis direction based on the measurement results of the first measurement system 36. The control unit 8 also controls the position of the first moving body 32 in the Y-axis direction based on the measurement results of the third measurement system 38. Note that the control unit 8 may control the position of the first moving body 32 or the second moving body 34 by using a combination of the results of any of the first to third measurement systems 36, 37, and 38. For example, the control unit 8 may control the position of the second movable body 34 in the Y-axis direction based on the measurement results of the second measurement system 37 and the third measurement system 38. For example, the control unit 8 may control the position of the second movable body 34 in the X-axis direction and the Y-axis direction based on the measurement results of the first measurement system 36, the second measurement system 37, and the third measurement system 38. The control unit 8 further controls the movement of the first movable body 32 based on correction information for the grating lines that make up the X encoder scale 41. In this way, the control unit 8 determines position information in the XY plane of the second movable body 34 (strictly speaking, the exposure object P placed on the second movable body 34) relative to the optical surface plate 5 based on the above-mentioned acquired information, and controls the position of the exposure object P relative to the projection module 17 using a stage drive system (not shown).

[0042] As shown in FIG. 7 , the exposure apparatus 1 further includes a stopper 39. The stopper 39 is attached to the first movable body 32. The stopper 39 protrudes in the +Y-axis direction further than the X encoder scale 41 attached to the first movable body 32. In other words, the distance between the stopper 39 and the X encoder head 45 is shorter than the distance between the X encoder scale 41 and the X encoder head 45. By providing the stopper 39, when the first movable body 32 and the second movable body 34 approach each other in the Y-axis direction, the stopper 39 comes into contact with the X encoder head 45 before the X encoder scale 41 does. Therefore, the stopper 39 physically (mechanically) prevents contact between the X encoder scale 41 of the first movable body 32 and the X encoder head 45 of the second movable body 34.

[0043] In this exposure apparatus 1, the exposure object P is exposed with light from the illumination optical device 6 while the second movable body 34 holding the exposure object P is moved in the X-axis direction. More specifically, during the exposure operation, a first shot area on the exposure object P (substrate) is exposed with light from the illumination optical device 6, and then the second movable body 34 holding the exposure object P is moved in the Y-axis direction. Thereafter, a second shot area on the exposure object P aligned with the first shot area in the Y-axis direction is exposed with light from the illumination optical device 6. The movable range of the second movable body 34 in the Y-axis direction (the movable range in the step direction) is smaller than the movable range of the second movable body 34 in the X-axis direction (the movable range in the scan direction). As described above, when the second movable body 34 is moved stepwise in the Y-axis direction, the first movable body 32 is moved the same amount as the movement of the second movable body 34. Therefore, during exposure operation, X encoder scale 41 of first movable body 32 and X encoder head 45 of second movable body 34 are arranged so that their positional relationship with respect to the Y axis direction remains unchanged.

[0044] Furthermore, position information of the second movable body 34 (exposure object P) in each of the Z axis, θx, and θy directions (hereinafter referred to as the "Z tilt direction") may be obtained by the control unit 8 using a Z tilt position measurement system (not shown) provided in the exposure apparatus 1. The Z tilt position measurement system can be, for example, a measurement system using a displacement sensor attached to the second movable body 34.

[0045] According to the exposure apparatus 1 of the present embodiment described above, the position of the second movable body 34 (exposure object P) in the X-axis direction is measured using the first measurement system 36 including a linear encoder system, so the influence of air fluctuations is reduced compared to measurements using conventional optical interferometer systems, and the position of the exposure object P can be controlled with high precision. This makes it possible to improve exposure precision.

[0046] Furthermore, information relating to the distance in the Y-axis direction between the first movable body 32 and the second movable body 34 can be obtained using the second measurement system 37 including an optical interferometer system. Because the reflecting surface 32a of the second measurement system 37 and the X encoder scale 41 of the first measurement system 36 are provided on the same surface of the first movable body 32 (movable mirror), an increase in the number of parts and a complicated device can be suppressed even when multiple measurement systems are arranged.

[0047] Since a plurality of X encoder heads 45 are provided side by side in the X-axis direction, it is possible to correct errors due to expansion, for example, even if expansion occurs in X encoder scale 41 due to thermal deformation. In other words, the absolute value of the position of second movable body 34 in the X-axis direction can be calculated (estimated) by using the respective measurement values ​​of a pair of X encoder heads 45 whose separation distance is known, so that if expansion occurs in X encoder scale 41, it is possible to correct errors and control the position of exposure object P with higher precision.

[0048] The first measurement system 36 and the second measurement system 37 indirectly or directly measure the position of the exposure object P relative to the optical surface plate 5, and therefore can measure the position of the exposure object P substantially based on the projection module 17 of the illumination optical device 6. This allows the position of the exposure object P to be controlled based on the illumination light of the illumination optical device 6, thereby improving exposure accuracy.

[0049] The configurations of the exposure apparatus 1 and stage movement apparatus 7 described above can be used to execute a method of driving a movable body (i.e., a method of driving a movable body) using the exposure apparatus 1 and stage movement apparatus 7 described above. In other words, the configurations of the exposure apparatus 1 and stage movement apparatus 7 of this embodiment can be rephrased as follows. That is, the method of driving the movable bodies is a method of driving the movable bodies that respectively moves a first movable body 32 that extends in a first direction (the X-axis direction in this embodiment) and moves in a second direction (the Y-axis direction in this embodiment) that intersects the X-axis direction, and a second movable body 34 that moves in the Y-axis direction, and includes measuring the position of the second movable body 34 in the X-axis direction using a first head (X encoder head 45 in this embodiment) provided on one of the first movable body 32 and the second movable body 34 and a scale (X encoder scale 41 in this embodiment) provided on the other of the first movable body 32 and the second movable body 34 that extends in the X-axis direction and faces the X encoder head 45, obtaining information regarding the distance between the first movable body 32 and the second movable body 34, and driving the first movable body 32 and the second movable body 34 based on the measurement result regarding the second movable body 34 and the information regarding the distance.

[0050] Or, it can be rephrased as follows: That is, the method of driving the movable bodies is a method of driving the movable bodies for respectively moving a first movable body 32 that extends in a first direction (in this embodiment, the X-axis direction) and moves in a second direction (in this embodiment, the Y-axis direction) intersecting the X-axis direction, and a second movable body 34 that moves in the Y-axis direction, and the method includes a first head (in this embodiment, the X encoder head 45) provided on one of the first movable body 32 and the second movable body 34, and a scale (in this embodiment, the X encoder head 45) provided on the other of the first movable body 32 and the second movable body 34 that extends in the X-axis direction and faces the X encoder head 45. The method includes measuring the position of the second moving body 34 in the X-axis direction using an encoder scale 41), obtaining information regarding the positional relationship between the first moving body 32 and the second moving body 34 in the Y-axis direction, measuring the position of the first moving body 32 in the Y-axis direction, and controlling the position of the second moving body 34 in the X-axis direction and the Y-axis direction based on the measured position of the second moving body 34 in the X-axis direction, the obtained information regarding the positional relationship between the first moving body 32 and the second moving body 34, and the measured position of the first moving body 32 in the Y-axis direction.

[0051] Alternatively, the configurations of the exposure apparatus 1 and stage movement apparatus 7 described above can be used to execute a method of exposing the exposure object P (i.e., an exposure method) using the exposure apparatus 1 and stage movement apparatus 7 described above. That is, the configurations of the exposure apparatus 1 and stage movement apparatus 7 of this embodiment can be rephrased as follows. That is, the exposure method is an exposure method for exposing the exposure object P using the exposure apparatus 1, which includes a first movable body 32 that extends in a first direction (the X-axis direction in this embodiment) and moves in a second direction (the Y-axis direction in this embodiment) that intersects the X-axis direction, a second movable body 34 that moves in the Y-axis direction, an object (exposure object P) held by the second movable body 34, and an optical system that irradiates the exposure object P with light, and includes a first head (an X-encoder head 45 in this embodiment) provided on one of the first movable body 32 and the second movable body 34, and an optical system that extends in the X-axis direction and is connected to the X-encoder head 45. The method includes measuring the position of the second moving body 34 in the X-axis direction using a scale (X encoder scale 41 in this embodiment) provided on the other of the first moving body 32 and the second moving body 34 so as to face each other; obtaining information regarding the distance between the first moving body 32 and the second moving body 34; controlling the movements of the first moving body 32 and the second moving body 34 based on the measurement result regarding the second moving body 34 and the information regarding the distance; and exposing the exposure object P to light from the illumination optical device 6 while moving the second moving body 34 holding the exposure object P in the X-axis direction.

[0052] Alternatively, the configurations of the exposure apparatus 1 and stage movement apparatus 7 described above can be used to execute a method for manufacturing a device (i.e., a device manufacturing method) using the exposure apparatus 1 and stage movement apparatus 7 described above. That is, the configurations of the exposure apparatus 1 and stage movement apparatus 7 of this embodiment can be rephrased as follows: The device manufacturing method is a device manufacturing method for manufacturing a substrate P for a device using the exposure apparatus 1 described above, and includes exposing the substrate P and developing the exposed substrate P.

[0053] Next, second to sixth embodiments of the present invention will be described. In the following description, the same components as those in the first embodiment will be denoted by the same reference numerals and will not be described again. Note that the specific configurations are not limited to these embodiments and can be modified as appropriate without departing from the spirit of the present invention.

[0054] Second Embodiment First, a second embodiment of the present invention will be described with reference to FIGS. 9 to 11 . FIG. 9 is a plan view schematically showing the configuration of a stage movement device 207 according to the second embodiment. FIG. 10 is a front view schematically showing the configuration of the stage movement device 207 according to the second embodiment. FIG. 10 is a view taken along the X arrow in FIG. 9 . FIG. 11 is a plan view schematically showing the configuration of multiple encoder measurement systems 255, 258 of the stage movement device 207 according to the second embodiment. The second embodiment differs from the first embodiment described above in that the first movement body 32 is configured to be movable also in the Z-axis direction and that the facing direction of the first measurement systems 36 is the Z-axis direction.

[0055] In the second embodiment, the first movable body 32 of the stage moving device 207 is provided to be movable in two axial directions, the Y-axis direction and the Z-axis direction, relative to the base member 30 (see FIG. 2 ). Specifically, the first movable body 32 is attached to the base member 30 via a Y guide 42, a Y stage 251, a Z guide 252, and a Z stage 253. The Y guide 42 has the same configuration as the Y guide 42 in the first embodiment, so a description thereof will be omitted. The Y stage 251 is movably connected to the Y guide 42. Driving the Y guide 42 allows the Y stage 251 to move freely in the Y-axis direction. A pair of Z guides 252 is attached to the Y stage 251. The pair of Z guides 252 are arranged in parallel with each other at a predetermined interval in the X-axis direction. The pair of Z guides 252 include a linear guide mechanism and a drive motor (not shown). The Z stage 253 is movably connected to the Z guide 252. Driving the Z guide 252 allows the Z stage 253 to move freely in the Z-axis direction. The first moving body 32 is fixed to the Z stage 253 .

[0056] As shown in FIG. 11 , a first encoder measurement system 255 and a second encoder measurement system 258 are provided between the first movable body 32 and the base member 30. The first encoder measurement system 255 includes, for example, an encoder scale 256 attached to the first movable body 32 (movable mirror) and extending in the Z-axis direction, and an encoder head 257 attached to the base member 30 and facing the encoder scale 256. The encoder scale 256 has a reflective 1.5-dimensional diffraction grating whose periodic directions are the Z-axis direction, which is the major axis direction, and the Y-axis direction, which is the minor axis direction. The first encoder measurement system 255 can measure positional information of the first movable body 32 relative to the base member 30 in the Z-axis direction, the Y-axis direction, and the θx direction. The second encoder measurement system 258 includes, for example, an encoder scale 259 attached to the first movable body 32 (movable mirror) and extending in the Z-axis direction, and an encoder head 260 attached to the base member 30 and facing the encoder scale 259. The encoder scale 259 has a reflective 1.5-dimensional diffraction grating whose periodic directions are the Z-axis direction, which is the long axis direction, and the X-axis direction, which is the short axis direction. The second encoder measurement system 258 can measure position information of the first movable body 32 relative to the base member 30 in the Z-axis direction, the X-axis direction, and the θy direction.

[0057] As shown in FIGS. 9 and 10 , the first movable body 32 has a reflective surface 32a formed at least on its lower surface (the surface facing the −Z-axis direction). An X encoder scale 241 extending along the X-axis direction is provided on the lower surface of the first movable body 32. The X encoder scale 241 of the second embodiment has a reflective 1.5-dimensional diffraction grating whose periodic directions are the X-axis direction (the major axis) and the Y-axis direction (the minor axis). Furthermore, a pair of XY encoder heads 245 are provided on the second movable body 34 so as to face the X encoder scale 241. The XY encoder heads 245 are provided below the X encoder scale 241 (in the −Z-axis direction) and face the X encoder scale 241 in the Z-axis direction. The first measurement system 36 includes the X encoder scale 241 and the XY encoder heads 245. The first measurement system 36 measures the position of the second movable body 34 relative to the first movable body 32 in the X-axis direction, the Y-axis direction, and the θz direction.

[0058] An interferometer head 50 is provided on the second movable body 34. A plurality of interferometer heads 50 (two in this embodiment) are provided and aligned in the X-axis direction. Each pair of interferometer heads 50 faces a corresponding reflecting surface 32a provided on the underside of the first movable body 32 in the Z-axis direction. The distance between the interferometer head 50 and the reflecting surface 32a may be greater than the distance between the XY encoder head 245 and the X encoder scale 241. The second measurement system 37 includes the interferometer head 50 and the reflecting surface 32a. The second measurement system 37 measures the position of the second movable body 34 in the Z-axis direction and the θy direction relative to the first movable body 32. In other words, the second measurement system 37 acquires information regarding the distance between the first movable body 32 and the second movable body 34 in the Z-axis direction.

[0059] In the exposure apparatus configured in this manner, the control unit 8 (see FIG. 1 ) moves the first movable body 32 stepwise in the Y-axis direction, following the stepwise movement in the Y-axis direction of the second movable body 34 on which the exposure object P is placed, as in the first embodiment. This controls the distance between the first movable body 32 and the second movable body 34 along the Y-axis direction to be constant. Furthermore, in the second embodiment, the control unit 8 controls the position of the Z stage 253 in the Z direction based on the measurement results of the second measurement system 37 so that the distance between the first movable body 32 and the second movable body 34 along the Z-axis direction is constant.

[0060] The stage moving device 207 of the second embodiment uses an X encoder scale 241 with a 1.5-dimensional diffraction grating. This allows a single X encoder scale 241 to measure position information in the X-axis direction as well as position information (small changes) in the θz and Y-axis directions. This eliminates the need for a displacement sensor or the like for measuring position information in the Y-axis direction between the first moving body 32 and the second moving body 34, thereby reducing the number of components. The stage moving device 207 includes a first encoder measurement system 255 and a second encoder measurement system 258, allowing for monitoring of diagonal running errors in the X-axis direction and the Y-axis direction when the first moving body 32 is driven in the Z-axis direction. Note that in this embodiment, a Z tilt position measurement system (not shown) may be separately provided for measuring position information in the θx direction of the second moving body 34 relative to the first moving body 32. The Z tilt position measurement system can be, for example, a measurement system using a displacement sensor (not shown) attached to the second moving body 34.

[0061] Third Embodiment Next, a third embodiment of the present invention will be described with reference to FIGS. 12 and 13 . FIG. 12 is a plan view schematically illustrating the configuration of a stage movement device 307 according to the third embodiment. FIG. 13 is a front view schematically illustrating the configuration of the stage movement device 307 according to the third embodiment. FIG. 13 is a cross-sectional view taken along line XIII-XIII in FIG. 12 . The third embodiment differs from the above-described embodiments in that a member other than a movable mirror is used as the first movable body 332. Note that the configuration of the stage movement device 307 of the third embodiment is generally the same as that of the second embodiment, except that the first movable body 332 is not a movable mirror (does not have a reflective surface 32 a) and does not include an interferometer head 50. Therefore, only the differences will be described below, and a description of elements having the same configuration or function as those of the second embodiment will be omitted.

[0062] In the third embodiment, the first movable body 332 of the stage moving device 307 is a rod-shaped member extending in the X-axis direction and having a rectangular YZ cross section. The first movable body 332 is formed without a reflective surface 32a (see FIG. 10 ) on its surface. A 1.5-dimensional X encoder scale 241 extending along the X-axis direction is provided on the underside (the surface facing the −Z-axis direction) of the first movable body 332. A pair of XY encoder heads 245 is provided on the second movable body 34 so as to face the X encoder scale 241. Note that, in order to measure the position of the second movable body 34 in the Z-axis direction, a sensor or the like (not shown) capable of measuring the height position of the second movable body in the Z-axis direction relative to the optical surface plate 5 may be separately provided.

[0063] According to the stage movement device 307 of the third embodiment, by configuring the first moving body 332 without a movable mirror, it is possible to simplify the configuration of the stage movement device 307 and reduce the cost associated with manufacturing the first moving body 332. It is also possible to increase the versatility of the stage movement device 307. Furthermore, by using a 1.5-dimensional X encoder scale 241 and an XY encoder head 245, it is possible to measure the position of the second moving body 34 in the X-axis direction and the Y-axis direction relative to the first moving body 332, even in the case of a movable mirror-less configuration.

[0064] Fourth Embodiment Next, a fourth embodiment of the present invention will be described with reference to FIGS. 14 and 15 . FIG. 14 is a plan view schematically illustrating the configuration of a stage movement device 407 according to the fourth embodiment. FIG. 15 is a front view schematically illustrating the configuration of the stage movement device 407 according to the fourth embodiment. FIG. 15 is a view taken along the arrow XV in FIG. 14 . The fourth embodiment differs from the above-described embodiments in that a two-dimensional encoder scale 441 is attached to the first movable body 32. Note that the configuration of the stage movement device 407 of the fourth embodiment is generally the same as that of the second embodiment, except that the encoder scale 441 is two-dimensional and that the encoder measurement system 455 of the first movable body 32 is provided only in the Z-axis direction. Therefore, only the differences will be described below, and a description of elements having the same configuration or function as those of the second embodiment will be omitted.

[0065] In the fourth embodiment, the first movable body 32 of the stage moving device 407 is a movable mirror, and a reflective surface 32a is formed on the underside of the first movable body 32 (the surface facing the -Z-axis direction). An encoder scale 441 parallel to the XY plane is provided on the underside of the first movable body 32. The encoder scale 441 may be formed so that its length along the X-axis direction is greater than its length along the Y-axis direction. The encoder scale 441 has a reflective two-dimensional diffraction grating whose periodic directions are the X-axis direction and the Y-axis direction. The first measurement system 36 has this encoder scale 441 and an encoder head 245 provided on the second movable body 34. The first measurement system 36 measures the position of the second movable body 34 relative to the first movable body 32 in the X-axis direction, the Y-axis direction, and the θz direction.

[0066] The stage moving device 407 also has, as a second measurement system 37, a reflecting surface 32 a and a pair of interferometer heads 50 provided on the second moving body 34 so as to face the reflecting surface 32 a. The second measurement system 37 measures the position of the second moving body 34 in the Z axis direction and the θy direction relative to the first moving body 32.

[0067] In the stage movement device 407 of this embodiment, the control unit 8 (see FIG. 1) moves the first movable body 32 stepwise in the Z-axis direction, following the movement in the Z-axis direction of the second movable body 34 on which the exposure object P is placed. The first movable body 32 does not follow the movement in the X-axis and Y-axis directions of the second movable body 34. In other words, the positions of the first movable body 32 in the X-axis and Y-axis directions are fixed. In this case, the first movable body 32 may be formed without the Y guide 42 (see FIG. 10) of the second embodiment.

[0068] An encoder measurement system 455 is also provided between the first movable body 32 and the base member 30. The encoder measurement system 455 has, for example, an encoder scale 456 attached to the first movable body 32 and extending in the Z-axis direction, and an encoder head 457 attached to the base member 30 and facing the encoder scale 456. The encoder scale 456 has a reflective 1.5-dimensional diffraction grating whose periodic directions are the Z-axis direction, which is the major axis direction, and the X-axis direction, which is the minor axis direction. The encoder measurement system 455 can measure positional information of the first movable body 32 relative to the base member 30 in the Z-axis direction, the X-axis direction, and the θy direction.

[0069] According to the stage moving device 407 of the fourth embodiment, the position of the second moving body 34 in the X-axis direction, the Y-axis direction, and the θz direction relative to the first moving body 32 can be measured by using a two-dimensional encoder scale 441. This simplifies the configuration of the stage moving device 407. It also improves the versatility of the stage moving device 407. In particular, it can be suitably used as a stage moving device for direct writing, which requires a small drive amount in the Y-axis direction.

[0070] Fifth Embodiment Next, a fifth embodiment of the present invention will be described with reference to FIGS. 16 and 17 . FIG. 16 is a plan view schematically illustrating the configuration of a stage movement device 507 according to the fifth embodiment. FIG. 17 is a front view schematically illustrating the configuration of the stage movement device 507 according to the fifth embodiment. FIG. 17 is a cross-sectional view taken along line XVII-XVII in FIG. 16 . The fifth embodiment differs from the fourth embodiment in that the first movable body 32 in the fourth embodiment is formed without a movable mirror. Note that the configuration of the stage movement device 507 of the fifth embodiment is generally the same as that of the fourth embodiment, except that the first movable body 532 is not a movable mirror (does not have a reflective surface 32 a) and does not include an interferometer head 50. Therefore, only the differences will be described below, and a description of elements having the same configuration or function as those of the fourth embodiment will be omitted.

[0071] In the fifth embodiment, the first moving body 532 of the stage moving device 507 is a rod-shaped member extending in the X-axis direction and having a rectangular YZ cross section. The first moving body 532 is formed without a reflecting surface 32a (see FIG. 15 ) on its surface. An encoder scale 441 parallel to the XY plane is provided on the underside (surface facing the −Z-axis direction) of the first moving body 532. A pair of encoder heads 245 are provided on the second moving body 34 so as to face the encoder scale 441. Note that, in order to measure the position of the second moving body 34 in the Z-axis direction, a sensor or the like (not shown) capable of measuring the height position of the second moving body in the Z-axis direction relative to the optical surface plate 5 may be separately provided.

[0072] According to the stage movement device 507 of the fifth embodiment, by configuring the first moving body 532 without a movable mirror, the configuration of the stage movement device 507 can be simplified compared to the configuration of the fourth embodiment, and the cost associated with manufacturing the first moving body 532 can be reduced. Also, the versatility of the stage movement device 507 can be improved. Furthermore, by using a two-dimensional encoder scale 441, the position of the second moving body 34 in the X-axis direction, Y-axis direction, and θz direction relative to the first moving body 532 can be measured even in the case of a movable mirror-less configuration.

[0073] Sixth Embodiment Next, a sixth embodiment of the present invention will be described with reference to FIGS. 18 and 19. FIG. 18 is a plan view schematically showing the configuration of a stage movement device 607 according to the sixth embodiment. FIG. 19 is a front view schematically showing the configuration of a stage movement device 607 according to the sixth embodiment. FIG. 19 is a cross-sectional view taken along line XIX-XIX in FIG. 18. The sixth embodiment differs from the above-described embodiments in that the X encoder scale 41 used in the first measurement system 36 and the reflecting surface 632a used in the second measurement system 37 are provided on different surfaces of the first moving body 632.

[0074] In the sixth embodiment, the first moving body 632 of the stage moving device 607 is movably mounted relative to the base member 30 via a Y guide 42, a Y stage 251, a Z guide 252, and a Z stage 253. A first encoder measurement system 255 and a second encoder measurement system 258 are provided between the first moving body 632 and the base member 30. The configurations of the Y guide 42, the Y stage 251, the Z guide 252, the Z stage 253, the first encoder measurement system 255, and the second encoder measurement system 258 are the same as those in the second embodiment, and therefore will not be described here. The first moving body 632 is a rod-shaped member extending in the X-axis direction and having a rectangular YZ cross section. A one-dimensional X encoder scale 41 extending along the X-axis direction is provided on the underside of the first moving body 632 (the surface facing the -Z-axis direction). A pair of X encoder heads 45 are provided on the second moving body 34 so as to face the X encoder scale 41. The first measurement system 36 has this X encoder scale 41 and an X encoder head 45. The first measurement system 36 measures the position of the second movable body 34 relative to the first movable body 32 in the X-axis direction.

[0075] A reflecting surface 632a is formed on the surface of the first movable body 632 facing the +Y-axis direction. The reflecting surface 632a is provided on the rod-shaped member, for example, by attaching a member having a mirror surface to the rod-shaped member. The reflecting surface 632a may also be formed integrally with the rod-shaped member by metal deposition or the like. The rod-shaped member (i.e., the first movable body 32) only needs to have the reflecting surface 632a on at least the surface facing the +Y-axis direction. For example, the reflecting surfaces 632a may be provided on multiple surfaces of the rod-shaped member. A pair of interferometer heads 50 is provided on the second movable body 34 so as to face the reflecting surface 632a. The pair of interferometer heads 50 are attached, for example, to the plate holder 47 of the second movable body 34, and each face the reflecting surface 632a in the Y-axis direction. The second measurement system 37 includes the interferometer heads 50 and the reflecting surfaces 632a. The second measurement system 37 measures the position of the second moving body 34 in the Y-axis direction and the θz direction relative to the first moving body 32 .

[0076] In the exposure apparatus 1 configured in this manner, the control unit 8 (see FIG. 1 ) moves the first movable body 632 stepwise in the Y-axis direction in response to the stepwise movement in the Y-axis direction of the second movable body 34 on which the exposure object P is placed. This controls the distance between the first movable body 632 and the second movable body 34 along the Y-axis direction to be constant. Note that in this embodiment, a sensor or the like (not shown) capable of measuring the height positions of the first movable body 632 and the second movable body 34 in the Z-axis direction relative to the optical surface plate 5 may be separately provided to measure the positions of the first movable body 632 and the second movable body 34 in the Z-axis direction, respectively. In this case, the control unit 8 may control the position of the Z stage 253 in the Z direction based on the output result of the sensor that measures the height position in the Z-axis direction and the measurement result of the second measurement system 37 so that the distance between the first movable body 632 and the second movable body 34 along the Z-axis direction is constant.

[0077] According to the stage moving device 607 of the sixth embodiment, the X-encoder scale 41 and the reflecting surface 632a are provided on different surfaces of the first moving body 632, which increases the degree of freedom in designing the first moving body 632. As a result, the versatility of the stage moving device 607 can be increased.

[0078] The technical scope of the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, in the above-described first embodiment, the first measurement system 36 has been described as having the X encoder scale 41 provided on the first movable body 32 and the X encoder head 45 provided on the second movable body 34. However, this is not limiting. The X encoder head 45 may be provided on the first movable body 32, and the X encoder scale 41 may be provided on the second movable body 34. In other words, the first measurement system 36 may measure the position of the second movable body 34 using the X encoder head 45 provided on one of the first movable body 32 and the second movable body 34, and the X encoder scale 41 extending in the X-axis direction and provided on the other of the first movable body 32 and the second movable body 34 so as to face the X encoder head 45. Similarly, with regard to the second measurement system 37, the interferometer head 50 may be provided on the first movable body 32, and the reflecting surface 32a may be provided on the second movable body 34. In other words, the second measurement system 37 may acquire information about the distance between the first movable body 32 and the second movable body 34 using a reflecting surface 32 a provided on one of the first movable body 32 and the second movable body 34 and at least one interferometer head 50 provided on the other of the first movable body 32 and the second movable body 34. Similarly, with regard to the third measurement system 38, a Y encoder head 44 may be provided on the base member 30, and a Y encoder scale 43 may be provided on the first movable body 32. In other words, the third measurement system 38 may measure the position of the first movable body 32 using a Y encoder scale 43 provided on one of the first movable body 32 and the base member 30, and at least one Y encoder head 44 provided on the other of the first movable body 32 and the base member 30.

[0079] The third measurement system 38 may be configured as an optical interferometer system having a second reflective surface (not shown) and a second interferometer head (not shown) facing the second reflective surface, instead of the Y encoder scale 43 and the Y encoder head 44.

[0080] The plate holder 47 of the second movable body 34 may be a holder of a type that suction-holds the exposure object P. The first measurement system 36, the second measurement system 37, and the third measurement system 38 may determine position information of the first movable body 32 and the second movable body 34 with reference to the optical surface plate 5. The exposure apparatus 1 may have a plurality of measurement systems in addition to the first measurement system 36, the second measurement system 37, and the third measurement system 38 described above. The encoder heads used in the measurement systems of the linear encoder system (e.g., the X encoder head 45 and the XY encoder head 245) do not need to have the entire optical system that irradiates the encoder scale with a beam from the light source, and may have only a part of the optical system, for example, only the emission section.

[0081] The exposure apparatus 1 can be widely used as an exposure apparatus for liquid crystals that transfers a liquid crystal display element pattern onto a rectangular glass plate, an exposure apparatus for manufacturing organic EL (Electro-Luminescence) panels, an exposure apparatus for manufacturing semiconductors, and an exposure apparatus for manufacturing thin-film magnetic heads, micromachines, DNA chips, etc. The object to be exposed is not limited to a glass substrate, but may be other objects such as a wafer, a ceramic substrate, a film member, or a mask blank. Furthermore, when the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes film-like objects (flexible sheet-like members).

[0082] The constituent elements of each of the above-described embodiments may be combined as appropriate. In addition, some of the constituent elements described above may not be used.

[0083] 1... exposure apparatus, 6... illumination optical device (optical system), 7, 207, 307, 407, 507, 607... stage moving device (moving device), 17... projection module (projection optical system), 30... base member, 32, 332, 532, 632... first moving body, 32a, 632a... reflective surface (first measurement member), 34... second moving body, 36... first measurement system, 37... second measurement system, 38... third measurement system, 39... stopper, 41, 241... X encoder scale (scale), 43... Y encoder scale (second measurement member), 44... Y encoder head (third head), 45... X encoder head (first head), 46... plate table (table), 50... interferometer head (second head), 245... XY encoder head (first head), 441... encoder scale (scale), P... exposure object (object, substrate).

Claims

1. A moving device comprising: a first moving body extending in a first direction and moving in a second direction intersecting the first direction; a second moving body moving in the second direction; a first measurement system that measures the position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body and a scale extending in the first direction and provided on the other of the first moving body and the second moving body so as to face the first head; and a second measurement system that obtains information regarding the distance between the first moving body and the second moving body.

2. A moving device according to claim 1, wherein the distance is controlled based on the measurement result of the second measurement system.

3. A moving device according to claim 1 or 2, wherein the first moving body moves in the second direction in association with the movement of the second moving body in the second direction.

4. A moving device according to any one of claims 1 to 3, wherein the first head is provided on the second moving body, and the scale is provided on the first moving body.

5. A moving device according to any one of claims 1 to 4, wherein the second moving body is movable in the first direction, and the position of the second moving body in the first direction is controlled based on the measurement results of the first measurement system.

6. A moving device according to any one of claims 1 to 5, wherein the first measurement system includes a plurality of the first heads arranged in the first direction and mounted on a table having a smaller coefficient of thermal expansion than the scale.

7. A movement device according to any one of claims 1 to 6, further comprising a stopper, wherein the distance between the stopper and the first head is smaller than the distance between the scale and the first head.

8. A displacement apparatus according to any one of claims 1 to 7, wherein the second measurement system includes an interferometer system.

9. A moving device according to any one of claims 1 to 8, wherein the second measurement system acquires information relating to the distance at a plurality of positions in the first direction.

10. A moving device according to any one of claims 1 to 9, wherein the second measurement system acquires information relating to the distance using a first measurement member provided on one of the first moving body and the second moving body, and at least one second head provided on the other of the first moving body and the second moving body.

11. A moving device as described in claim 10, wherein the second measurement system acquires information regarding the distance using the first measurement member provided on the first moving body and at least one of the second heads provided on the second moving body.

12. The moving device according to claim 11, wherein the first measuring member and the scale are provided on the first moving body, and the first head and the at least one second head are provided on the second moving body.

13. The moving device according to claim 12, wherein the first measuring member and the scale are provided on the same side of the first moving body.

14. A movement device according to any one of claims 10 to 13, wherein in the second direction, the first head faces the scale, and in the second direction, the at least one second head faces the first measurement member.

15. A moving device according to any one of claims 1 to 14, wherein the second measurement system acquires information relating to the distance in the second direction, and the position of the second moving body in the second direction is controlled based on the information relating to the distance acquired using the second measurement system.

16. A moving device according to any one of claims 1 to 13, wherein the second measurement system acquires information regarding the distance between the first moving body and the second moving body in the first direction and in a third direction intersecting the second direction.

17. The moving device according to claim 16, wherein the first head faces the scale in the third direction.

18. The moving device according to claim 15, further comprising a third measurement system that measures the position of the first moving body in the second direction, and controls the position of the second moving body in the second direction based on the measurement results of the second measurement system and the measurement results of the third measurement system.

19. A moving device comprising: a first moving body extending in a first direction and moving in a second direction intersecting the first direction; a second moving body moving in the second direction; a first measurement system that measures a position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body and a scale provided on the other of the first moving body and the second moving body so as to extend in the first direction and face the first head; a second measurement system that obtains information regarding a positional relationship between the first moving body and the second moving body in the second direction; and a third measurement system that measures the position of the first moving body in the second direction, and the device controls the position of the second moving body in the first direction and the second direction based on measurement results of the first measurement system, the second measurement system, and the third measurement system.

20. A moving device according to any one of claims 1 to 16, further comprising a third measurement system that measures the position of the first moving body in a second direction.

21. The moving device according to claim 20, wherein the position of the first moving body in the second direction is controlled based on the measurement result of the third measurement system.

22. A moving device as described in any one of claims 18 to 21, further comprising a base member, wherein the third measurement system measures the position of the first moving body in the second direction using a third head provided on one of the first moving body and the base member, and a second measurement member provided on the other of the first moving body and the base member so as to face the third head.

23. A moving device according to any one of claims 1 to 22, wherein the movement of the first moving body is controlled based on correction information for grid lines that constitute the scale.

24. An exposure apparatus comprising: a moving device according to claim 22; and an optical system supported by the base member, the exposure apparatus irradiating light from the optical system onto an object held by the second moving body, thereby exposing the object.

25. An exposure apparatus comprising: a moving device according to any one of claims 1 to 23; and an optical system, wherein an object held by the second moving body is irradiated with light from the optical system, thereby exposing the object.

26. The exposure apparatus according to claim 24 or 25, wherein the object is exposed to light from the optical system while the second movable body holding the object is moved in the first direction.

27. An exposure apparatus according to any one of claims 24 to 26, wherein after a first shot area of ​​the object is exposed to light from the optical system, the second movable body holding the object is moved in the second direction, and then a second shot area of ​​the object aligned with the first shot area in the second direction is exposed to light from the optical system.

28. An exposure apparatus according to any one of claims 24 to 27, wherein the optical system includes a plurality of projection optical systems arranged in the second direction, and the range of movement of the second movable body in the second direction is smaller than the range of movement of the second movable body in the first direction.

29. A method for driving a moving body, which moves a first moving body extending in a first direction and moving in a second direction intersecting the first direction, and a second moving body moving in the second direction, comprising: measuring a position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body, and a scale provided on the other of the first moving body and the second moving body so as to extend in the first direction and face the first head; obtaining information regarding the gap between the first moving body and the second moving body; and driving the first moving body and the second moving body based on the measurement result regarding the second moving body and the information regarding the gap.

30. A method for driving a moving body that moves a first moving body extending in a first direction and moving in a second direction intersecting the first direction, and a second moving body moving in the second direction, comprising: measuring a position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body, and a scale provided on the other of the first moving body and the second moving body so as to extend in the first direction and face the first head; acquiring information regarding a positional relationship between the first moving body and the second moving body in the second direction; measuring the position of the first moving body in the second direction; and controlling the position of the second moving body in the first direction and the second direction based on the measured position of the second moving body in the first direction, the acquired information regarding the positional relationship between the first moving body and the second moving body, and the measured position of the first moving body in the second direction.

31. An exposure method for exposing an object using an exposure apparatus including a first moving body extending in a first direction and moving in a second direction intersecting the first direction, a second moving body moving in the second direction, an object held by the second moving body, and an optical system for irradiating light to the object, the exposure method including: measuring a position of the second moving body in the first direction using a first head provided on one of the first moving body and the second moving body, and a scale provided on the other of the first moving body and the second moving body so as to extend in the first direction and face the first head; obtaining information regarding a gap between the first moving body and the second moving body; controlling the movement of the first moving body and the second moving body based on the measurement result regarding the second moving body and the information regarding the gap; and exposing the object to light from the optical system while moving the second moving body holding the object in the first direction.

32. A device manufacturing method comprising: exposing a substrate using the exposure apparatus according to any one of claims 24 to 28; and developing the exposed substrate.

Images