Multichannel process monitoring system and method

Abstract

A multichannel process monitoring system and method are disclosed. The multichannel process monitoring system comprises: light receiving units that are respectively connected to output terminals of a chamber; a switching unit; first optical lines connecting the light receiving units to the switching unit; and a spectrometer. Here, light generated inside the chamber is transmitted to the light receiving units through the output terminals, each of the light receiving units collects the transmitted light, the collected light is transmitted to the switching unit through the first optical lines, and the switching unit transmits some of the light transmitted through the first optical lines to the spectrometer, and the light receiving units and the switching unit are fixed members.

Description

Multichannel process monitoring system and method

[0001] The present invention relates to a multi-channel process monitoring system and method.

[0002] The present invention also relates to a multi-channel process monitoring system and method using a plurality of spectrometers.

[0003] In addition, the present invention relates to a multi-channel process monitoring system and method for selectively applying an algorithm.

[0004] Due to the increasing demands for high-density semiconductor chips, the difficulty of semiconductor processes is increasing, and wafer sizes are also increasing. In the case of large wafers, differences in electrical, chemical, and thermal properties between the center and the edge occur, resulting in lower wafer yields.

[0005] Therefore, it is necessary to monitor each area of ​​the wafer, but currently, the process status of the chamber is being monitored through a single channel, so it is not possible to monitor each area of ​​the wafer.

[0006] The present invention provides a multi-channel process monitoring system and method.

[0007] In addition, the present invention provides a multi-channel process monitoring system and method using a plurality of spectrometers.

[0008] In addition, the present invention provides a multi-channel process monitoring system and method for selectively applying an algorithm.

[0009] A multi-channel process monitoring system according to one embodiment of the present invention includes light-receiving units each connected to output terminals of a chamber; a switching unit; first optical lines connecting the light-receiving units to the switching unit; and a spectrometer. Here, light generated inside the chamber is transmitted to the light-receiving units through the output terminals, each of the light-receiving units collects the transmitted light, and the collected light is transmitted to the switching unit through the first optical lines, and the switching unit transmits some of the light transmitted through the first optical lines to the spectrometer, and the light-receiving units and the switching unit are fixed members.

[0010] A multi-channel process monitoring system according to another embodiment of the present invention includes a switching unit; a light collecting unit; and a spectrometer. Here, the switching unit is connected to output terminals of a chamber through first optical lines, light generated inside the chamber is transmitted to the switching unit through the output terminals and the first optical lines, some of the light transmitted to the switching unit according to the switching of the switching unit is transmitted to the light collecting unit, the light collecting unit collects the transmitted light and transmits it to the spectrometer, and the switching unit and the light collecting unit are fixed members.

[0011] A multi-channel process monitoring system according to another embodiment of the present invention comprises a switching unit having a plurality of switches connected to light output ports of at least one chamber; and a monitoring unit. Here, some or all of the lights transmitted through the light output ports are selected according to the on / off status of the switches, and the monitoring unit monitors the process status of the chamber by applying an algorithm matching the turned-on switches when analyzing the selected lights.

[0012] A multi-channel process monitoring system according to one embodiment of the present invention comprises: a switching unit having a plurality of switches connected to light output ports of at least one chamber; and a monitoring unit that analyzes light transmitted through at least some of the switches. Here, the monitoring unit applies an algorithm that is different from an algorithm applied when analyzing light transmitted through a single switch when the plurality of switches are turned on and the light transmitted through the turned-on switches is analyzed.

[0013]

[0014] The multi-channel process monitoring system and method according to the present invention analyzes light using fixedly installed lenses and shutters without using any moving parts. Consequently, process monitoring precision can be improved while monitoring the process through multiple channels.

[0015] In addition, the multi-channel process monitoring system and method according to the present invention utilizes multiple spectrometers, all of which are set based on a reference spectrometer, and corrects optical data using pixel-by-pixel correction values ​​calculated based on the pixels of the reference spectrometer. Consequently, the process status of the chamber can be precisely monitored despite various surrounding environments. Furthermore, precise monitoring of each wafer region is also possible.

[0016] In addition, the multi-channel process monitoring system and method according to the present invention selects lights output from at least one chamber using switches and analyzes the lights by applying different algorithms depending on which switch is turned on, thereby enabling precise monitoring while optimizing the process status of the chamber.

[0017] Moreover, the multi-channel process monitoring system and method can precisely monitor the process status of the chamber by analyzing the light collected from various locations in the chamber.

[0018] FIG. 1 is a diagram illustrating a multi-channel process monitoring system according to one embodiment of the present invention.

[0019] FIG. 2 is a drawing illustrating the structure of a light receiving unit according to one embodiment of the present invention.

[0020] FIG. 3 is a drawing showing the structure of a light receiving unit according to another embodiment of the present invention.

[0021] FIG. 4 is a drawing illustrating the structure of a switching unit according to one embodiment of the present invention.

[0022] FIG. 5 is a drawing illustrating the structure of a light collecting unit according to one embodiment of the present invention.

[0023] FIG. 6 is a drawing showing the structure of a light collecting unit according to another embodiment of the present invention.

[0024] FIG. 7 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0025] FIG. 8 is a drawing showing the structure of a light receiving unit according to another embodiment of the present invention.

[0026] FIG. 9 is a drawing showing the structure of a light receiving unit according to another embodiment of the present invention.

[0027] FIG. 10 is a drawing showing the structure of a light receiving unit according to another embodiment of the present invention.

[0028] Figure 11 is a flowchart illustrating the operation process of a spectrometer and control module according to one embodiment of the present invention.

[0029] FIG. 12 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0030] FIG. 13 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0031] FIG. 14 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0032] FIG. 15 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0033] As used herein, singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, terms such as "consist of" or "include" should not be construed to necessarily include all components or steps described in the specification, and should be construed to mean that some of the components or steps may not be included, or that additional components or steps may be included. In addition, terms such as "part" and "module" described in the specification mean a unit that processes at least one function or operation, which may be implemented by hardware or software, or by a combination of hardware and software.

[0034]

[0035] The present invention relates to a multi-channel process monitoring system that monitors a process using only fixed components, without using any moving components. While the use of moving components can result in poor alignment of the components, which can degrade process monitoring accuracy, the multi-channel process monitoring system of the present invention utilizes only fixed components, thereby eliminating alignment issues and providing superior monitoring accuracy.

[0036] From another perspective, the multi-channel process monitoring system of the present invention can adjust the settings and operation of all spectrometers based on a reference spectrometer. Consequently, the precision of process monitoring can be improved.

[0037] From another perspective, the multi-channel process monitoring system of the present invention can more precisely monitor the process status of the chamber by analyzing the lights of multiple channels.

[0038]

[0039] Hereinafter, various embodiments of the present invention will be described in detail with reference to the attached drawings.

[0040] FIG. 1 is a diagram illustrating a multi-channel process monitoring system according to one embodiment of the present invention, FIG. 2 is a diagram illustrating the structure of a light receiving unit according to one embodiment of the present invention, and FIG. 3 is a diagram illustrating the structure of a light receiving unit according to another embodiment of the present invention. FIG. 4 is a diagram illustrating the structure of a switching unit according to one embodiment of the present invention, FIG. 5 is a diagram illustrating the structure of a light collecting unit according to one embodiment of the present invention, and FIG. 6 is a diagram illustrating the structure of a light collecting unit according to another embodiment of the present invention.

[0041] Referring to FIG. 1, the multi-channel process monitoring system of the present embodiment may include a light receiving unit (102), a switching unit (104), a light collecting unit (106), a spectrometer (108), a switching control unit (110), and a process control unit (112).

[0042] The light receiving unit (102) is connected to the chamber (100) and receives light generated from a plasma reaction inside the chamber (100). For example, the light receiving unit (102) may be connected to a light output port (output terminal, e.g., viewport, 120) of the chamber (100).

[0043] In particular, the multi-channel process monitoring system may utilize multiple channels to accurately identify a process from a plasma reaction. Specifically, a plurality of optical output ports (120) may be formed in the chamber (100), and a light receiving unit (102) may be connected to each of the optical output ports (120). Consequently, there may be a number of light receiving units (102) corresponding to the number of optical output ports (120) used for plasma monitoring.

[0044] This light receiving unit (102) functions to focus light generated within the chamber (100), for example, light resulting from a plasma reaction, into a single focus. To this end, the light receiving unit (102) may include a lens (122) that focuses the light into a desired focus. Consequently, light output from the chamber (100) can be better transmitted to the first optical line (130) connected to the light receiving unit (102).

[0045] If there is no light receiving unit (102), the amount of light output from the chamber (100) that is input to the first optical line (130) may be small, whereas if the light receiving unit (102) is used, the light output from the chamber (100) can be transmitted to the first optical line (130) as much as possible.

[0046] According to one embodiment, a hole (200) may be formed at the input end of the light receiving unit (102), as illustrated in FIG. 2, and a fixing tab (202) may be formed at the output end. At this time, the light output port (120) of the chamber (100) may be inserted into the hole (200) and coupled, and the first optical line (130) may be coupled to the fixing tab (202) of the light receiving unit (102). As a result, light (plasma light) resulting from a plasma reaction inside the chamber (100) is transmitted to the first optical line (130) through the light output port (120).

[0047] In this case, there is a possibility that the worker may hit the first optical line (130). To prevent this, the light receiving unit (102) may include a mirror (300) as well as a lens (122), as shown in FIG. 3.

[0048] The mirror (300) can reflect light passing through the lens (122) and change the direction of the light. For example, as illustrated in FIG. 3, the direction of light passing through the lens (122) can be changed to a downward vertical direction. In this case, the fixing tab (202) of the light receiving unit (102) can be formed on the lower surface, and the first optical line (130) can be coupled to the fixing tab (202) in the downward direction. As a result, the possibility of the worker colliding with the first optical line (130) can be reduced. In FIG. 3, the mirror (300) changes the light passing through the lens (122) downward, but it can also change it upward.

[0049] In one embodiment, the reflective surface of the mirror (300) can be positioned at the focal length of the lens (122). Consequently, light passing through the lens (122) can be uniformly redirected by the mirror (300).

[0050] Meanwhile, the positions of the lenses (122) in the plurality of light-receiving units (102) may be the same or different. For example, the lenses (122) of all light-receiving units (102) may have the same size and be positioned at a certain distance from the corresponding light output port (120). In this case, the focal lengths of the lenses (122) will be the same.

[0051] As another example, the position, size, or focal length of the lens (122) of the light receiving unit (102) may vary depending on the intensity or direction of the light output from the light output port (120). The light output ports (120) will be formed on each side of the chamber (100). In this case, the intensity, amount, or direction of the light incident on the light output ports (120) may vary. Accordingly, the position, size, or focal length of the lens (122) of the light receiving unit (102) may vary depending on the position of the light output port (120). In this case, the position, size, or light conversion direction of the mirror (300) may vary depending on the position of the light output port (120).

[0052] The switching unit (104) may include a plurality of shutters (switching means, 124) to which the first optical lines (130) are connected. Consequently, one light receiving unit (102), one first optical line (130), and one shutter (124) are matched to one optical output port (120) of the chamber (100), thereby forming one optical path (channel). In this case, light resulting from a plasma reaction inside the chamber (100) is transmitted to the shutter (124) through the optical output port (120), the light receiving unit (102), and the first optical line (130).

[0053] Since there are multiple light output ports (120), light resulting from the plasma reaction of the chamber (100) is transmitted to the shutters (124) through multiple paths. The shutters (124) have the function of allowing or blocking light.

[0054] According to one embodiment, as illustrated in FIG. 4, fixing tabs (400 and 402) may be formed at the input and output terminals of each shutter (124), respectively. In this case, the first optical line (130) is coupled to the fixing tab (400), and the second optical line (132) is coupled to the fixing tab (402). Consequently, light traveling through the first optical line (130) is transmitted to the second optical line (132) through the shutter (124).

[0055] Since each light receiving unit (102) is connected to its corresponding shutter (124) through its corresponding first optical line (130), the shutters (124) may have a number corresponding to the number of light receiving units (102). Consequently, light output through each optical output port (120) is transmitted to the individual shutters (124) through the light receiving unit (102). The operation control of these shutters (124) is performed by the switching control unit (110).

[0056] For example, the switching control unit (110) can open only one shutter (124) and close the other shutters (124). As a result, light passing through the opened shutter (124) can be transmitted to the light collection unit (106) through the second optical line (132), the bundle (134), and the third optical line (136). Therefore, analysis of light output through a specific optical output port (120) can be possible.

[0057] The switching control unit (110) can sequentially open the shutters (124) so ​​that analysis of the light output from the light output ports (120) can be performed. At this time, shutters (124) other than the opened shutter (124) can be closed. For example, when the first shutter (124) is opened, the other shutters (124) are closed, and then the second shutter (124) is opened, the first shutter (124) is closed again, and the other shutters (124) can remain closed. As a result, the light output from the light output ports (120) can be individually transmitted to the light collection unit (106).

[0058] According to one embodiment, the switching control unit (110) may be controlled by the process control unit (112). However, the spectrometer (108) may also be controlled by the process control unit (112). In this case, the process control unit (112) may transmit a control signal to the switching control unit (110) via the spectrometer (108). This is because the operation of the shutters (124) and the operation of the spectrometer (108) must be synchronized with each other. Of course, the process control unit (112) may also transmit the control signal directly to the switching control unit (110) without going through the spectrometer (108).

[0059] The second optical lines (132) are connected to the output terminals of the shutters (124) and can be combined into a bundle (134). This bundle (134) is used to collect light collected from the second optical lines (132) into one optical line.

[0060] The third optical line (136) is connected to the bundle (134), so that light output from the second optical line (132) can be transmitted to the third optical line (136) through the bundle (134). At this time, the third optical line (136) can include a number of cores corresponding to the number of the second optical line (132). That is, light transmitted through the second optical line (132) is transmitted to the light collecting unit (106) through the corresponding core of the third optical line (136).

[0061] Meanwhile, above, the second optical lines (132) are coupled to the bundle (134), but the third optical lines (132) may be directly connected to the light collector (106).

[0062] The light collecting unit (106) may include at least one lens (126). Specifically, the light collecting unit (106) includes fixing tabs (500 and 502) at the input and output terminals and includes a lens (126) therein, as illustrated in FIG. 5. In this case, the third optical line (136) may be coupled to the fixing tab (500), and the fourth optical line (138) may be coupled to the fixing tab (502). As a result, light transmitted through the third optical line (136) may be concentrated by the lens (126), and the concentrated light may be transmitted to the spectrometer (108) through the fourth optical line (138).

[0063] Since this light collecting unit (106) collects the light transmitted through the third optical line (136), the spectrometer (108) can better analyze the spectrum of the light transmitted through the fourth optical line (138).

[0064] In addition, the condenser (106) can be used to overcome the limitation of the space that the optical line (138) can occupy in the spectrometer (108). For example, when the third optical line (136) includes eight cores each having a size of 10, the fourth optical line (138) can have a size of 60 due to the size limitation caused by the spectrometer (108). Consequently, if there is no condenser (106), the light output from the eight cores of the third optical line (136) cannot be properly input to the fourth optical line (138). Therefore, the present invention can transmit all the light output from the eight cores to the fourth optical line (138) by using the condenser (106). At this time, the fourth optical line (138) can include one to seven cores. That is, if the sizes of the cores are the same, the number of cores of the fourth optical line (138) may be smaller than the number of cores of the third optical line (136). Of course, considering the case where the sizes of the cores are different, the overall size of the fourth optical line (138) may be smaller than the overall size of the third optical line (136).

[0065] In another embodiment, the light collector (106) may additionally include a mirror (600), as illustrated in FIG. 6. Consequently, light collected by the lens (126) may be transmitted in another direction, for example, in a downward vertical direction, through the mirror (600). In this case, a fixing tab (502) may be formed on the lower side of the light collector (106).

[0066] The spectrometer (108) detects the spectrum of light transmitted through the fourth optical line (138), and can detect the process status of the chamber (100) through the detection result. Of course, this detection may be performed by a process control unit (112) connected to the spectrometer (108) or a separate computing device, rather than the spectrometer (108).

[0067] In summary, the multi-channel process monitoring system of the present invention uses only fixed components, such as lenses, without any moving components to selectively transmit light transmitted through multiple optical output ports (120) to a spectrometer (108). Consequently, the accuracy of process diagnosis can be improved and errors can be reduced.

[0068] FIG. 7 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention, FIG. 8 is a diagram illustrating the structure of a light receiving unit according to another embodiment of the present invention, and FIG. 9 is a diagram illustrating the structure of a light receiving unit according to another embodiment of the present invention. FIG. 10 is a diagram illustrating the structure of a light receiving unit according to another embodiment of the present invention, and FIG. 11 is a flowchart illustrating the operation process of a spectrometer and a control module according to one embodiment of the present invention.

[0069] Referring to FIG. 7, the multi-channel process monitoring system of the present embodiment may include a chamber (700), light receiving units (702), spectrometers (704), and a control module (706).

[0070] The light receiving unit (702) is connected to the chamber (700) and receives light (plasma light) generated from a plasma reaction inside the chamber (700). For example, the light receiving unit (702) may be connected to an output terminal of the chamber (700), for example, a light output port (710).

[0071] In particular, the multi-channel process monitoring system may utilize multiple channels to accurately identify a process from a plasma reaction. Specifically, a plurality of optical output ports (710) may be formed in the chamber (700), and a light receiving unit (702) may be connected to each of the optical output ports (710). Consequently, there may be a number of light receiving units (702) corresponding to the number of optical output ports (710) used for plasma monitoring.

[0072] This light receiving unit (702) functions to focus light generated within the chamber (700), for example, light resulting from a plasma reaction, into a single focal point. To this end, the light receiving unit (702) may include a lens (720) that focuses the light into a desired focal point. Consequently, light output from the chamber (700) can be better transmitted to the optical path (712) connected to the light receiving unit (702).

[0073] According to one embodiment, as illustrated in FIG. 8, a hole (800) may be formed at the input end of the light receiving unit (702), and a fixing tab (802) may be formed at the output end. At this time, the light output port (710) of the chamber (700) may be inserted into and coupled to the hole (800) of the light receiving unit (702), and the optical line (712) may be coupled to the fixing tab (802) of the light receiving unit (702). As a result, the plasma light inside the chamber (700) is transmitted to the optical line (712) through the light output port (710) and the light receiving unit (702).

[0074] In this case, there is a possibility that the worker may hit the optical line (712). To prevent this, the fixing tab (802) of the light receiving unit (702) may be formed in the downward direction as shown in FIGS. 9 and 10.

[0075] In one embodiment, the light receiving unit (702) may include a mirror (900). The mirror (900) can be used to reflect light incident on the light receiving unit (800) in a straight direction and convert it in another direction, for example, downward. For example, as illustrated in FIG. 9, the direction of light incident on the light receiving unit (702) can be converted to a downward vertical direction. In this case, the fixing tab (802) of the light receiving unit (702) can be formed on the lower surface, and the optical line (712) can be coupled to the fixing tab (802) in a downward direction. As a result, the possibility of the worker colliding with the optical line (712) can be reduced. In FIG. 9, the mirror (900) converts the light incident on the light receiving unit (702) in a downward direction, but it can also be converted in an upward direction.

[0076] According to another embodiment, the light receiving unit (702) may include a lens (720) and a mirror (900) as illustrated in FIG. 10. Consequently, light incident on the light receiving unit (702) may be collected by the lens (720) and then converted downward by the mirror (900).

[0077] In one embodiment, the reflective surface of the mirror (900) can be positioned at the focal length of the lens (720). Consequently, light passing through the lens (720) can be uniformly redirected by the mirror (900).

[0078] Meanwhile, the positions of the lenses (720) in the multiple light receiving units (702) may be the same or different. For example, the lenses (720) of all light receiving units (702) may have the same size and be positioned at a certain distance from the corresponding light output port (710). In this case, the focal lengths of the lenses (720) will be the same.

[0079] As another example, the position, size, or focal distance of the lens (720) of the light receiving unit (702) may vary depending on the position of the light output port (710) or the intensity or direction of the light output from the chamber (700).

[0080] The light output ports (710) will be formed on various sides of the chamber (700). In this case, the intensity, amount, or direction of light incident on the light output ports (710) may vary. Accordingly, the position, size, or focal length of the lens (720) of the light receiving unit (702) may vary depending on the position of the light output ports (710). In this case, the position, size, or light conversion direction of the mirror (900) may vary depending on the position of the light output ports (710).

[0081] Light passing through the light receiving units (702) can be incident on the spectrometers (704) through the optical lines (712). At this time, the light receiving units (702), the optical lines (712), and the spectrometers (704) can exist in a 1:1:1 ratio.

[0082] That is, the plasma lights output through the optical output ports (710) of the chamber (700) can be incident on the spectrometer (704) through the corresponding light receiving unit (702) and optical line (712), respectively. In this case, the spectrometer (704) can generate optical data corresponding to the incident light and transmit the generated optical data to the control module (706) through the signal line (714) or wireless communication. As a result, optical data for the plasma lights output through the optical output ports (710) of the chamber (700) are provided to the control module (706).

[0083] The control module (706) can analyze the optical data provided from the spectrometers (704) to monitor the process status of the chamber (700). For example, when a wafer deposition process is being performed in the chamber (700), the control module (706) can analyze the optical data to monitor whether the deposition process is progressing normally. In particular, since it is data on plasma lights transmitted through multiple channels, the entire deposition process from the center to the edge region of the wafer can be monitored, thereby improving the process monitoring precision.

[0084] However, although the spectrometers (704) are intended to operate ideally, they may not operate ideally due to various factors such as the surrounding environment and manufacturing environment. In addition, although the spectrometers (704) are set to operate identically, their actual operation may differ. To this end, the multi-channel process monitoring system of the present invention can perform a process of adjusting the spectrometers (704).

[0085] Referring to FIG. 11, a user or control module (706) can match the settings of a spectrometer (704) to those of a reference spectrometer before installing the spectrometer (704) to be used in the multi-channel process monitoring system (S1100). Specifically, the shape and intensity of the reference light can be matched to the shape and intensity of the reference light of the reference spectrometer through a calibration light source that provides reference light for accurate measurement of the spectrometer (704). This matching is performed for all spectrometers (704).

[0086] Next, the user or control module (706) can generate correction values ​​for each pixel of the spectrometer (704) based on the pixels of the reference spectrometer (S1102). Here, the pixels can correspond to each wavelength of the light to be spectrometered.

[0087] This process of generating correction values ​​for pixels is performed for all spectrometers (704), and the correction values ​​can be stored in a lookup table for each spectrometer. The lookup table can be stored in the control module (706) or an external device (not shown) connected to the control module (706).

[0088] That is, the user or control module (706) can adjust the settings of the spectrometers (704) to the settings of the reference spectrometer before installing the spectrometers (704) and generate and store correction values ​​of the pixels.

[0089] Looking at the process after the spectrometers (704) are installed in the multi-channel process monitoring system, the control module (706) can simultaneously transmit a start signal to the spectrometers (704) through the signal line (714) in order to simultaneously receive optical data from the spectrometers (704), and the spectrometers (704) can generate optical data for incident plasma light from the time of receiving the start signal and then transmit the generated optical data to the control module (706) (S1104).

[0090] Next, the control module (706) can correct the optical data by applying the correction values ​​of the pre-stored pixels to the optical data transmitted from the spectrometers (704) (S1106). Consequently, all optical data can be objectified based on the reference spectrometer. For example, the control module (706) can call the correction value corresponding to the optical data from the lookup table and apply the called correction value to the optical data to correct the optical data.

[0091] In summary, the multi-channel process monitoring system monitors the process status of the chamber (700) through multiple channels, adjusts the settings of all spectrometers (704) to a reference spectrometer, and applies pre-stored correction values ​​in the control module (706) to the optical data transmitted from the spectrometers (704) to correct the optical data. As a result, the precision of process monitoring can be significantly improved.

[0092] Meanwhile, the user or control module (706) can adjust the light receiving time of the spectrometer (704) using the AGC (Auto Gain Control) function so that the spectrometer (704) has the intensity desired by the user. As a result, the intensity of all spectrometers (704) can be made the same.

[0093] Additionally, the control module (706) can normalize the intensities of all spectrometers (704), and after normalizing the initial intensities of the spectrometers (704) to 1, normalize the intensities of the spectrometers (704) measured later based on the initial intensities. Consequently, the control module (706) can detect changes in the intensities of the spectrometers (704) with a normalized distribution. This process is performed for all spectrometers (704).

[0094] Although it is mentioned above that light is transmitted from the light receiving units (702) to the spectrometers (704), instead of the spectrometers (704), an optical sensor such as an optical filter or a photomultiplier tube that selectively transmits or blocks specific wavelengths of light may be used. That is, light generated from the chamber (700) may be transmitted to the optical filters or optical sensors through the light receiving units (702) and optical lines (712). All of the above embodiments may be applied equally except that the spectrometers are replaced with optical filters or optical sensors.

[0095] Figure 12 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention. However, for convenience of explanation, the process performed in the chamber will be assumed to be an etching process.

[0096] Referring to FIG. 12, the multi-channel process monitoring system of the present embodiment may include a multi-channel control unit (1202) and a monitoring unit (1204).

[0097] In the chamber (1200), various processes are performed using plasma, and light is generated by the plasma reaction. To output this light to the outside, a plurality of light output ports (1210) may be formed in the chamber (1200).

[0098] The optical output ports (1210) are not formed entirely on a specific side of the chamber (1200), but may be formed in multiple sides to monitor the process status from various positions and directions.

[0099] The multi-channel control unit (1202) may include a switching unit (1212) and a spectrometer (1214).

[0100] According to one embodiment, the switching unit (1212) may include a plurality of switches, for example, a plurality of shutters (1220). In this case, the light output ports (1210) and shutters (1220) of the chamber (1200) may be matched one-to-one. For example, the first optical output port may be connected to the first shutter (①) via the first optical line, the second optical output port may be connected to the second shutter (②) via the second optical line, the third optical output port may be connected to the third shutter (③) via the third optical line, the fourth optical output port may be connected to the fourth shutter (④) via the fourth optical line, the fifth optical output port may be connected to the fifth shutter (⑤) via the fifth optical line, the sixth optical output port may be connected to the sixth shutter (⑥) via the sixth optical line, and the seventh optical output port may be connected to the seventh shutter (⑦) via the seventh optical line. As a result, lights at various locations in the chamber (1200) may be input to the switching unit (1212) via the corresponding optical lines.

[0101] According to one embodiment, the switching unit (1212) can be connected to the spectrometer (1214) through one channel (one optical line), and the shutters (1220) can be turned on / off. When the shutter (1220) is turned on, the corresponding light is transmitted to the spectrometer (1214) through the channel. That is, the light output through a specific optical output port of the chamber (1200) can be input to the spectrometer (1214) through the corresponding optical line, the corresponding shutter (1220), and the channel.

[0102] The spectrometer (1214) can analyze the spectrum of light input through the above channel and transmit the analysis result (output) to the monitoring unit (1204).

[0103] The monitoring unit (1204) monitors the process status of the chamber (1200) based on the transmitted analysis results, and may, for example, monitor the end point of an etching process performed within the chamber (1200). Subsequently, the monitoring unit (1204) may transmit a monitoring signal (e.g., an end point signal) including the monitoring results to the chamber (1200) or an external device (not shown). In this case, the chamber (1200) may control, for example, a power supply according to the transmitted monitoring signal.

[0104] According to one embodiment, the shutters (1220) can be turned on / off (open / closed) in a time-division manner, and the operation of the shutters (1220) can be controlled by a separate control unit (not shown) or a monitoring unit (1204). The operation of these shutters (1220) can also be monitored by the monitoring unit (1204).

[0105] For example, during the first time, the first shutter (①) is turned on and the other shutters are turned off so that only the light output through the first light output port of the chamber (1200) is transmitted to the spectrometer (1214), and the monitoring unit (1204) can generate a monitoring signal based on the output of the spectrometer (1214).

[0106] Next, during the second time period after the first time period, the second shutter (②) is turned on and the other shutters are turned off so that only the light output through the second light output port of the chamber (1200) is transmitted to the spectrometer (1214), and the monitoring unit (1204) can generate a monitoring signal based on the output of the spectrometer (1214).

[0107] In this way, the shutters (1220) can be sequentially turned on. Accordingly, the monitoring unit (1204) can analyze the lights output from various locations in the chamber (1200), thereby precisely monitoring the process status of the chamber (1200).

[0108] According to one embodiment, the monitoring unit (1204) can apply different algorithms depending on which shutter (1220) is turned on. For example, when the first shutter (①) is turned on, the monitoring unit (1204) can apply a first algorithm to the output of the spectrometer (1214) to generate a first monitoring signal, and when the second shutter (②) is turned on, the monitoring unit (1204) can apply a second algorithm to the output of the spectrometer (1214) to generate a second monitoring signal. In this manner, a plurality of monitoring signals can be generated.

[0109] At this time, the algorithms for the multiple shutters (1220) may be all different algorithms or may be partially the same algorithm. These algorithms may be determined by considering the position of the light output port (1210) of the chamber (1200). That is, since the intensity of light, etc. varies depending on the position of the light output port (1210), the process status is monitored by applying the optimal algorithm suitable for the position of the light output port (1210). The above algorithm may be a model learned through prior experiments.

[0110] Meanwhile, the monitoring unit (1204) may transmit a monitoring signal to the chamber (1200) or an external device whenever a monitoring signal is generated, may collect all monitoring signals and transmit them to the chamber (1200) or an external device at once, or may integrate all monitoring signals to generate a new integrated monitoring signal and then transmit the integrated monitoring signal to the chamber (1200) or an external device. Since all lights at various locations in the chamber (1200) must be considered, the monitoring unit (1204) may comprehensively analyze all monitoring signals to detect a process state and provide an integrated monitoring signal including information on the detected process state to the chamber (1200) or an external device.

[0111] In the above, the shutters (1220) are connected to the spectrometer (1214) through one channel, but the shutters (1220) may be connected to the spectrometer (1214) through individual channels. For example, a first shutter (①) may be connected to the spectrometer (1214) through a first channel, a second shutter (②) may be connected to the spectrometer (1214) through a second channel, a third shutter (③) may be connected to the spectrometer (1214) through a third channel, a fourth shutter (④) may be connected to the spectrometer (1214) through a fourth channel, a fifth shutter (⑤) may be connected to the spectrometer (1214) through a fifth channel, a sixth shutter (⑥) may be connected to the spectrometer (1214) through a sixth channel, and a seventh shutter (⑦) may be connected to the spectrometer (1214) through a seventh channel. As a result, light passing through the shutters (1220) can be transmitted to the spectrometer (1214) through a separate channel.

[0112] In summary, the multi-channel process monitoring system independently analyzes light at various locations in the chamber (1200) using shutters (1220), and can precisely monitor the process status of the chamber (1200) by applying an optimal algorithm according to the locations. For example, the multi-channel process monitoring system can analyze light at the locations to detect individual endpoints, integrate the endpoints to determine a final endpoint, and transmit the determined final endpoint to the chamber (1200) or an external device.

[0113] FIG. 13 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0114] Referring to FIG. 13, the multi-channel process monitoring system of the present embodiment includes a multi-channel control unit (1202) and a monitoring unit (1204), and the multi-channel control unit (1202) may include a switching unit (1220) and a spectrometer (1214). At this time, the shutters (1220) may be connected to the spectrometer (1214) through one channel (optical path).

[0115] In one embodiment, the shutters (1220) are all turned on (opened) at once, so that the light output through the light output ports (1210) of the chamber (1200) can be integrated and input to the spectrometer (1214) through the channel.

[0116] The spectrometer (1214) can analyze the spectrum of the integrated light and transmit the analysis results to the monitoring unit (1204).

[0117] The monitoring unit (1204) applies an algorithm to the output (analysis result) of the spectrometer (1214) to detect an end point, etc., generates a monitoring signal including the detection result, and can transmit the generated monitoring signal to the chamber (1200) or an external device.

[0118] At this time, the algorithm applied by the monitoring unit (1204) may be different from the algorithm used for individual light analysis. This is because the intensity, wavelength, or spectrum of the integrated light may be different from the intensity, wavelength, or spectrum of the individual light.

[0119] Meanwhile, the previous embodiment or the present embodiment may be applied depending on the operation of the shutter (1220). For example, the monitoring unit (1204) may select and apply an algorithm suitable for the shutter (1220) that is turned on when the shutters (1220) are sequentially turned on, and may apply an algorithm capable of analyzing the integrated light when all the shutters (1220) are turned on.

[0120] FIG. 14 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention.

[0121] Referring to FIG. 14, the multi-channel process monitoring system of the present embodiment includes a multi-channel control unit (1202) and a monitoring unit (1204), and the multi-channel control unit (1202) may include a switching unit (1212) and a spectrometer (1214). At this time, the shutters (1220) may be connected to the spectrometer (1214) through a plurality of channels (optical lines).

[0122] According to one embodiment, the shutters (1220) may be grouped and matched to different channels by group. For example, shutters (①, ②, and ③) may be matched to a first channel, shutters (④, ⑤, and ⑥) may be matched to a second channel, and shutter (⑦) may be matched to a third channel. Consequently, light transmitted through the first channel may correspond to the integrated light of the lights transmitted through shutters (①, ②, and ③), light transmitted through the second channel may correspond to the integrated light of the lights transmitted through shutters (④, ⑤, and ⑥), and light transmitted through the third channel may be light transmitted through shutter (⑦).

[0123] In this case, the monitoring unit (1204) can apply different algorithms according to the group of shutters (1220). For example, the monitoring unit (1204) can apply a first algorithm to light transmitted through the first channel, a second algorithm to light transmitted through the second channel, and a third algorithm to light transmitted through the third channel.

[0124] Although the shutters matching the channels are described above as not overlapping, the shutters matching the channels may overlap. That is, at least some of the groups created by grouping the shutters (1220) may share the same shutter.

[0125] For example, shutters (①, ②, and ③) may be matched to a first channel, shutters (④, ⑤, and ⑥) may be matched to a second channel, and shutters (①, ②, ③, ④, ⑤, ⑥, and ⑦) may be matched to a third channel. The matching of these channels and shutters (1220) may be arbitrarily determined by a user or AI. In this case, separate algorithms may also be applied to each channel.

[0126] Meanwhile, when light from a specific channel is input to the spectrometer (1214), other channels are deactivated, so that the spectrometer (1214) can analyze only the light transmitted through the specific channel. That is, the channels can transmit light to the spectrometer (1214) in a time-division manner.

[0127] From another perspective, when one of the groups is activated and transmits light to the spectrometer (1214) through that channel, the other groups may be deactivated and the light may not be transmitted to the spectrometer (1214).

[0128] In another embodiment, the groups may change while the process is performed in the chamber (1200), and the algorithm applied may vary depending on the change in the groups. For example, at the beginning of the etching process, the shutters (①, ②, and ③) may be matched to the first channel, the shutters (④, ⑤, and ⑥) may be matched to the second channel, and the shutter (⑦) may be matched to the third channel. However, at the end of the etching process, the shutters (①, ②, and ③) may be matched to the first channel, the shutters (④, ⑤, and ⑥) may be matched to the second channel, and the shutters (①, ②, ③, ④, ⑤, ⑥, and ⑦) may be matched to the third channel. Of course, the algorithm applied to the channels by the monitoring unit (1204) may also vary depending on such changes.

[0129] In another embodiment, multiple optical output ports may be connected to a single shutter, such that the combined light transmitted from the optical output ports can be transmitted to the corresponding channel through the shutter. Since the algorithm application in this environment is similar to that described above, a detailed description will be omitted.

[0130] FIG. 15 is a diagram illustrating a multi-channel process monitoring system according to another embodiment of the present invention. Unlike the above embodiments, the multi-channel process monitoring system of the present embodiment can monitor the process status of multiple chambers (1500a to 1500n).

[0131] Referring to FIG. 15, the optical output ports (1510a to 1510n) of the chambers (1500a to 1500n) can be one-to-one matched to the switches of the switching unit (1512), for example, the shutters (1520).

[0132] The shutters (1520) can be sequentially turned on, so that the light output from the chambers (1500a to 1500n) can be input to the spectrometer (1514) through the corresponding shutter and channel. At this time, the shutters (1520) of the switching unit (1512) and the spectrometer (1514) can be connected through one channel or through multiple channels. Since this connection method has been described in the above embodiments, it will be omitted below.

[0133] The monitoring unit (1504) can apply an algorithm that matches the selected shutter (1520) to the output of the spectrometer (1514) to generate a monitoring signal and transmit the generated monitoring signal to the corresponding chamber or external device. At this time, the monitoring unit (1504) can apply an algorithm that matches the open shutter (1520) to the output of the spectrometer (1514).

[0134] Meanwhile, the chambers (1500a to 1500n) may perform the same process or some may perform different processes.

[0135] Additionally, although one optical output port of one chamber is connected to the switching unit (1512) above, multiple optical output ports may be connected to the switching unit (1512). In this case, the operation is similar to that in the above embodiments.

[0136] In another embodiment, chambers (1500a to 1500n) may be grouped based on the process, and the same algorithm may be applied to chambers performing the same process.

[0137]

[0138] Meanwhile, the components of the aforementioned embodiments can be easily understood from a process perspective. That is, each component can be understood as a separate process. Furthermore, the processes of the aforementioned embodiments can be easily understood from the perspective of the device components.

[0139] In addition, the technical contents described above may be implemented in the form of program commands that can be executed through various computer means and recorded on a computer-readable medium. The computer-readable medium may include program commands, data files, data structures, etc., alone or in combination. The program commands recorded on the medium may be those specially designed and configured for the embodiments or may be known and available to those skilled in the art of computer software. Examples of computer-readable recording media include magnetic media such as hard disks, floppy disks, and magnetic tapes, optical media such as CD-ROMs and DVDs, magneto-optical media such as floptical disks, and hardware devices specially configured to store and execute program commands, such as ROMs, RAMs, and flash memories. Examples of program commands include not only machine language codes generated by a compiler, but also high-level language codes that can be executed by a computer using an interpreter, etc. The hardware devices may be configured to operate as one or more software modules to perform the operations of the embodiments, and vice versa.

[0140] The above-described embodiments of the present invention are disclosed for the purpose of illustration, and those skilled in the art with common knowledge of the present invention will be able to make various modifications, changes, and additions within the spirit and scope of the present invention, and such modifications, changes, and additions should be considered to fall within the scope of the following patent claims.

Claims

1. Light-receiving units each connected to the output terminals of the chamber; switching unit; First optical lines connecting the above light-receiving units to the above switching units; and Including a spectrometer, Light generated inside the chamber is transmitted to the light-receiving units through the output terminals, each light-receiving unit collects the transmitted light, and the collected light is transmitted to the switching unit through the first optical lines, and the switching unit transmits some of the light transmitted through the first optical lines to the spectrometer. A multi-channel process monitoring system characterized in that the above light-receiving units and the above switching units are fixed members.

2. In the first paragraph, the switching unit includes switching means, and the first optical lines are connected one-to-one to the switching means, and some of the lights transmitted through the first optical lines are transmitted to the spectrometer according to the switching of the switching means. The above multi-channel process monitoring system, Second optical lines each connected to the above switching means; A bundle in which the above second optical lines are combined; light collector; A third optical line connecting the above bundle and the above light collecting unit; and Further comprising a fourth optical line connecting the above-mentioned light collecting unit and the above-mentioned spectrometer, A multi-channel process monitoring system, wherein the light collecting unit comprises at least one lens for collecting light transmitted through one of the switching means, the second optical line, the bundle, and the third optical line, wherein the third optical line comprises a number of cores corresponding to the number of the second optical lines.

3. In the second paragraph, the light collecting unit further includes a mirror in addition to the lens, A multi-channel process monitoring system, characterized in that light collected by the lens is redirected by the mirror, and the lens and the mirror are fixed members.

4. In the first paragraph, the switching unit includes a plurality of shutters each connected to the first optical lines, A multi-channel process monitoring system, wherein the above shutters are opened sequentially, and when one of the shutters is opened, the remaining shutters are closed.

5. In the first paragraph, the switching unit includes switching means each connected to the first optical lines, The above multi-channel process monitoring system, A switching control unit that controls the opening and closing of the above switching means; and Further comprising a process control unit that controls the operation of the switching unit or the spectrometer, A multi-channel process monitoring system characterized in that the process control unit transmits a control signal to the switching control unit through the spectrometer to control the operation of the switching control unit, and the operation of the spectrometer and the operation of the switching means are synchronized according to the control of the process control unit.

6. In the first paragraph, each of the light-receiving units includes a lens, A multi-channel process monitoring system characterized in that the position, size or focal length of the lens is different depending on the position of the output terminal or the intensity of light output through the output terminals.

7. In paragraph 1, each of the light-receiving units, A lens that focuses the light output from the corresponding output terminal; and Including a mirror that converts and transmits light collected by the above lens in a different direction, A multi-channel process monitoring system, characterized in that the surface of the mirror corresponds to the focal length of the lens.

8. In the first paragraph, the output terminal is a viewport, A multi-channel process monitoring system characterized in that a hole is formed at the input terminal of the light receiving unit and the viewport is inserted into the hole of the light receiving unit.

9. Switching section; light collector; and Including a spectrometer, The switching unit is connected to the output terminals of the chamber through the first optical lines, and light generated inside the chamber is transmitted to the switching unit through the output terminals and the first optical lines, and some of the light transmitted to the switching unit according to the switching of the switching unit is transmitted to the light collecting unit, and the light collecting unit collects the transmitted light and transmits it to the spectrometer. A multi-channel process monitoring system characterized in that the switching unit and the light collecting unit are fixed members.

10. In the 9th paragraph, the switching unit includes switching means, and the first optical lines are connected one-to-one to the switching means, and some of the lights transmitted through the first optical lines are transmitted to the light collecting unit according to the switching of the switching means. The above multi-channel process monitoring system, Second optical lines each connected to the above switching means; A bundle in which the above second optical lines are combined; A third optical line connecting the above bundle and the above light collecting unit; and Further comprising a fourth optical line connecting the above-mentioned light collecting unit and the above-mentioned spectrometer, A multi-channel process monitoring system, wherein the light collecting unit comprises at least one lens for collecting light transmitted through one of the switching means, the second optical line, the bundle, and the third optical line.

11. A multi-channel process monitoring system, characterized in that in the 10th paragraph, the third optical line includes N (an integer greater than or equal to 2) cores, and the fourth optical line includes K (an integer less than N) cores.

12. A switching unit having a plurality of switches connected to the optical output ports of at least one chamber; and Including the monitoring department, A multi-channel process monitoring system characterized in that some or all of the lights transmitted through the light output ports are selected according to the on / off of the switches, and the monitoring unit monitors the process status of the chamber by applying an algorithm matching the turned-on switches when analyzing the selected lights.

13. In the 12th paragraph, the switch is a shutter, A multi-channel process monitoring system characterized in that the applied algorithm varies depending on the open shutter.

14. In paragraph 12, Further comprising a spectrometer that analyzes the spectrum of light transmitted through the above switching unit, A multi-channel process monitoring system characterized in that the monitoring unit monitors the process status of the chamber by applying an algorithm corresponding to the selected switch to the output of the spectrometer.

15. In the 14th paragraph, the switches are connected to the spectrometer through at least one channel, A multi-channel process monitoring system characterized in that the switches are turned on sequentially, when one switch is turned on, the other switches are turned off, the monitoring unit applies an algorithm matching the turned-on switch to the output of the spectrometer, and at least one of the algorithms matching the switches is different.

16. In the 14th paragraph, the switches are connected to the spectrometer through one channel, A multi-channel process monitoring system characterized in that when all switches are turned on, the light output from the optical output ports is integrated, the integrated light is input to the spectrometer through the channel, and an algorithm used to analyze the integrated light is different from an algorithm used to analyze light passing through one switch.

17. In the 14th paragraph, the switches are connected to the spectrometer through a plurality of channels, A multi-channel process monitoring system characterized in that the switches are grouped into a plurality of groups, the switches belonging to each group are connected to the spectrometer through the same channel, when a specific group is activated, all switches belonging to the specific group are turned on, the lights transmitted through the switches belonging to the specific group are integrated to form an integrated light, and an individual algorithm is set for each group, and an algorithm matching the activated specific group is applied to the output of the spectrometer.

18. A multi-channel process monitoring system, characterized in that the groups in paragraph 17 are capable of sharing switches.

19. A multi-channel process monitoring system, characterized in that in paragraph 17, the settings of the group can be varied according to the process progress of the chamber, and the algorithm applied to the output of the spectrometer also varies as the settings of the group vary.

20. A switching unit having a plurality of switches connected to the optical output ports of at least one chamber; and A monitoring unit that analyzes light transmitted through at least some of the above switches, A multi-channel process monitoring system characterized in that the monitoring unit applies an algorithm different from the algorithm applied when analyzing light transmitted through a single switch when a plurality of switches are turned on and the light transmitted through the turned-on switches is analyzed.

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