Process system

Abstract

The invention relates to a process system for treating substrates, in particular semiconductor substrates, comprising the following: a process chamber housing forming a process chamber for receiving a substrate, a substrate receptacle in the process chamber for receiving a substrate to be treated, and a tube element which extends through the process chamber and the process chamber housing, wherein the tube element is configured for receiving a heating lamp or a plasma rod, and wherein the tube element is open to the environment at its ends and / or is connected to a gas source for conducting gas. The process system also has a separating element which is arranged between the tube element and the substrate receptacle in such a way that the process chambers are separated into at least one tube element receiving space and one substrate receiving space, wherein the tube element receiving space is not open to the environment, and means for adjusting and / or monitoring a gas atmosphere in the tube element receiving space.

Description

[0001] Process facility

[0002] The present invention relates to a process plant for the thermal and / or plasma-assisted treatment of substrates, in particular semiconductor or PV substrates.

[0003] Such process chambers typically comprise a process chamber housing with a loading and unloading device, a gas management system for setting a desired gas atmosphere inside, and a substrate holder for receiving at least one substrate to be treated. Different gases can be introduced into and out of the process chamber via the gas management system, and various pressures can be set as needed.

[0004] One type of process chamber, as known, for example, from WO 2012 059 203 A1, has a multitude of quartz tubes that extend completely through the process chamber and its housing. The outer circumference of the quartz tubes is sealed against corresponding feedthroughs in the process chamber housing. The ends of the quartz tubes are often open to the environment or connected to a gas source for the passage of gas (e.g., ambient air). In a process chamber for thermal treatment, each quartz tube is configured to accommodate a heating lamp (e.g., a halogen lamp), which is supplied with electrical power via the ends of the quartz tube. In a process chamber for plasma-assisted treatment, each quartz tube would be configured to accommodate a plasma rod, as known, for example, from EP 2 31 1 066 B1.

[0005] In this type of process chamber, the quartz tube provides a separation between the gas atmosphere inside the chamber and the surrounding environment. However, defects in both the quartz tube and the seal can lead to undesirable gas exchange. Gas flow from the outside to the inside could disrupt substrate treatment, while gas flow from the inside to the outside (depending on the gas) could lead to undesirable environmental contamination. Even a small amount of gas exchange, which may initially go undetected, could have significant effects on process results or the ambient air. The present invention aims to minimize at least one of the above problems.

[0006] According to the invention, a process chamber is provided for in accordance with the attached claims.

[0007] In particular, a process plant for treating substrates, especially semiconductor substrates, is provided, comprising the following: a process chamber housing forming a process chamber for receiving a substrate, a substrate receptacle in the process chamber for receiving a substrate to be treated, a pipe element extending through the process chamber and the process chamber housing, wherein the pipe element is configured to receive an energy input element, such as a heating lamp or a plasma rod, and wherein the pipe element is open to the environment at its ends and / or connected to a gas source for passing gas, a separating element arranged between the pipe element and the substrate receptacle such that the process chamber is divided into at least one pipe element receiving space and one substrate receiving space, wherein the pipe element receiving space is not open to the environment.and means for setting and / or monitoring a gas atmosphere in the pipe element receiving chamber.

[0008] Such a process plant can detect leaks between the environment or the substrate receiving chamber and the pipe element receiving chamber by monitoring the gas atmosphere (e.g., gas composition and / or pressure) within the chamber, and appropriate measures can be taken. This allows for early fault detection and prevents contamination of the process atmosphere in the substrate receiving chamber and / or the environment.

[0009] Preferably, a plurality of tubular elements extending through the process chamber and the process chamber housing are provided, each configured to receive a heating lamp or a plasma rod, and the ends of which are open to the environment and / or connected to a gas source for conveying gas. In one embodiment, the separating element is another tubular element that completely surrounds the first tubular element, forming the tubular element receiving space within the process chamber. In the embodiment with the plurality of tubular elements, a corresponding plurality of separating elements can each be in the form of another tubular element, with each additional tubular element completely surrounding one of the plurality of tubular elements, each configured to receive a heating lamp or a plasma rod, forming a corresponding plurality of tubular element receiving spaces within the process chamber.

[0010] In an alternative embodiment, the separating element is a plate element that, for example, completely spans the process chamber and thereby forms a pipe element receiving space for one or a multitude of pipe elements.

[0011] Preferably, the separating element is essentially permeable to lamp radiation from a heating lamp and / or to plasma-exciting energy.

[0012] In one embodiment, the means for adjusting and / or monitoring a gas atmosphere in the tube element receiving chamber include means for introducing and / or passing a predetermined gas, in particular an inert gas, into / through the tube element receiving chamber or the plurality of tube element receiving chambers, and means for monitoring the purity of the predetermined gas in the tube element receiving chamber or the plurality of tube element receiving chambers. This allows a reliable detection of leakage from the substrate receiving chamber or from the environment into a tube element receiving chamber.

[0013] Alternatively or additionally, the means for setting and / or monitoring a gas atmosphere in the pipe element receiving chamber can include means for setting and monitoring a predetermined pressure, in particular a negative pressure, in the pipe element receiving chamber or in the plurality of pipe element receiving chambers. This also allows for the detection of leaks from the substrate receiving chamber or from the environment into a pipe element receiving chamber, or vice versa.

[0014] Preferably, the means for adjusting and / or monitoring a gas atmosphere in the pipe element receiving space include a gas sensor and / or a pressure sensor in the pipe element receiving space or in the plurality of pipe element receiving spaces and / or in an associated line for venting / extracting gas from the pipe element receiving space.

[0015] In one embodiment, the tube element(s) and / or the separating element(s) are made of quartz. Alternatively, the tube element(s) and / or the separating element(s) can be made of ceramic, in particular transparent ceramic. It is also possible that the corresponding elements are made of both quartz and ceramic, or one is made of quartz and the other of ceramic.

[0016] The invention is explained in more detail below with reference to the drawings. The drawings show:

[0017] Fig. 1 shows a schematic partial sectional view through a process plant according to a first embodiment of the invention;

[0018] Fig. 2 shows a detailed view of a penetration and sealing area according to the first embodiment;

[0019] Fig. 3 shows a schematic partial sectional view through a process plant according to a second embodiment of the invention;

[0020] Fig. 4 shows a detailed view of a penetration and sealing area according to the second embodiment;

[0021] Fig. 5 shows a schematic partial sectional view through a process chamber according to a third embodiment.

[0022] Fig. 6 shows a schematic partial sectional view through another process plant.

[0023] In the following description, terms such as above, below, right, and left refer to the representation in the figures and are not to be considered restrictive, although they may indicate a preferred orientation. In the illustrations of the embodiments, parts of the respective process plant that are not relevant to the explanation of the invention have been omitted. However, they are briefly mentioned in the description of the first embodiment. The same reference numerals are used in the different illustrations for identical or similar components.

[0024] Fig. 1 shows a schematic partial sectional view through a process plant 1 according to a first embodiment of the invention, while Fig. 2 shows a detailed view of a feedthrough and sealing area according to the first embodiment. The process plant 1 comprises a process chamber housing 2 forming a process chamber 3, a substrate receptacle 4, a gas management system 6 for setting a process atmosphere in the process chamber 3, and an energy input unit 8.

[0025] The process chamber housing 2 can be designed as a one-piece or multi-piece housing, as is known in the art, and can be made of a material suitable for the respective process. For example, the process chamber housing 2 is often made of aluminum. The process chamber housing 2 can, for example, have an upper part and a lower part (or several parts) that are movable relative to each other, stacked on top of each other to form the process chamber 3, and can be moved away from each other for loading and unloading the process chamber 3. In another embodiment, for example, a loading and unloading opening can be provided in a side wall of the process chamber housing 2, which is connected to a lock chamber. However, such details are not shown, as they are not relevant to the present invention, and the process chamber housing 2 is not shown in its entirety, as can be seen from the curved lines in Fig. 1.

[0026] According to the embodiment, the process chamber housing 2 has several feedthroughs. For example, a feedthrough 10 is provided in the base of the process chamber housing 2 and accommodates part of the substrate holder 4. A feedthrough 11 (shown here in the right side wall) is connected, for example, to the gas management system 6. As is known in the art, several such feedthroughs can be provided at different locations. Feedthroughs 12 in the side walls of the process chamber housing 2 serve to accommodate parts of the energy input unit 8. The feedthroughs will be explained in more detail below in the description of the respective parts to be accommodated.

[0027] The substrate holder 4 has a substrate retainer 14 for a substrate W and a shaft 15. The substrate retainer 14 can have any shape suitable for holding the substrate W in the process chamber 3, with the substrate W typically being held in a horizontal orientation. In the illustration, the substrate retainer 14 is shown schematically as a horizontal plate, but this is not the only possible configuration. In practice, a wide variety of shapes for a substrate retainer 14 are known.

[0028] The shaft 15 extends perpendicularly to the substrate holder 14 and supports it in the process chamber 3. The shaft 15 extends through the opening 10 in the base of the process chamber housing 2. The shaft 15 can, for example, be designed as a rotary and / or lifting shaft to rotate a substrate W held on the substrate holder 14 during processing and / or to change its height in the process chamber 3. In such a case, a bellows unit or other seal is provided, for example, to seal the opening 10. If movement of the substrate holder 14 is not required, the shaft 15 and the opening 10 can be omitted.

[0029] The gas management system 6 for setting a process atmosphere comprises at least one gas supply unit 18, which is connected to the process chamber 3 via a line 20. The at least one gas supply unit 18 can set a desired gas atmosphere in the process chamber 3 in a known manner. For this purpose, it can, for example, introduce different process gases into the process chamber 3 in a controlled manner and / or provide for controlled extraction of gas from the process chamber 3. Even though only one line 20 is shown, those skilled in the art will recognize that several lines 20 can be provided between the gas supply unit 18 and the process chamber 3, each extending through a corresponding feedthrough 11 and sealed against it. It is also known to provide internal lines with corresponding connections within the housing, which, for example, enable a distributed supply / return of gases.

[0030] The energy input unit 8 is formed by a rod-shaped energy input element 22, such as a heating lamp or a plasma rod, and a receptacle 24. The energy input element 22, which is designed, for example, as a heating lamp or plasma rod, is connected via leads 26 to a suitable energy source (not shown) located outside the process chamber housing 2. The receptacle 24 is formed by a first tube element 30 and a second tube element 32. The tube elements 30, 32 are essentially transparent to the energy supplied by the energy input element 22, that is, they allow a large proportion, preferably > 80%, particularly > 90% of the energy to pass through. In the case of heating lamps, the energy introduced into the process chamber is, in particular, thermal radiation, and in the case of the plasma rod, for example, microwaves. The tube elements 30, 32 can be made, for example, of quartz and / or a suitable ceramic.

[0031] The first pipe element 30 extends completely through the process chamber 3 and the process chamber housing 2, in particular through the feedthroughs 12. The first pipe element 30 is suitably sealed against the feedthroughs 12. As shown in Fig. 2, for example, O-rings are provided to seal the outer circumference of the first pipe element 30 against the feedthroughs 12. The first pipe element 30 can be open at its ends or connected to a gas source for conveying gas (for example, ambient air). A corresponding energy input element 22 can be inserted into the first pipe element through one end and supported, for example, by support elements (not shown) within the first pipe element 30. The energy input element 22 can be supplied with energy via the supply lines 26 through the ends of the first pipe element 30.Alternatively, the energy input element 22 could also be freely carried in the first pipe element 30 via the supply lines 26 or corresponding other elements extending from the open ends of the first pipe element 30.

[0032] The second pipe element 32 also extends completely through the process chamber 3 and partially into the process chamber housing 2, in particular an extended area of ​​the feedthroughs 12, which are designed as stepped feedthroughs 12. The feedthroughs 12 are designed such that they have an outer first section and an inner second section, the diameter of the second section being larger than the diameter of the first section. The second pipe element 32 completely surrounds the first pipe element 30 in the area of ​​the process chamber 3. In particular, the first pipe element 30 passes substantially concentrically through the second pipe element 32. A gap is formed between the pipe elements 30 and 32.The second pipe element 32 acts as a separating element, dividing the process chamber 3 into a receiving chamber 36 for the first pipe element 30, hereinafter also referred to as pipe element receiving chamber 36, and a receiving chamber 38 for the substrate W, hereinafter also referred to as substrate receiving chamber 38. The second pipe element 32 is sealed against the second section of the stepped feedthroughs 12. In Fig. 2, a simple O-ring is shown for such a seal. However, it is clear to those skilled in the art that other seals are also possible.

[0033] As can be seen in Fig. 2, a conduit is formed in the process chamber housing 2, connecting the second section of a feedthrough 12 and thus the gap formed between the first pipe element 30 and the second pipe element 32 to the environment. A connection for a secondary gas management system 44 and / or one or more sensors is provided at the outer end of the conduit. A corresponding conduit can optionally also be provided on the opposite side of the process chamber housing 2, so that the gap between the pipe elements 30 and 32 is connected to a conduit at each end. For example, a gas such as nitrogen can be introduced in a controlled manner via one conduit and discharged at the other end.Preferably, the gas in question should be an inert gas that, even if it leaks into the substrate receiving chamber 38 of process chamber 3, has no significant impact on the process outcome of a substrate treatment. A leak into the environment would also initially be harmless. The gas could, for example, be circulated continuously.

[0034] Several such pipe systems can be connected in series, so that corresponding gaps between pipe element pairs 30, 32 are interconnected, and the gas flows through them sequentially, allowing changes to be detected. They can also be connected in parallel, for example, with a common supply line and individual distribution and a corresponding collecting line at the outlet, or even an individual discharge line. As shown in Fig. 2, a double O-ring purge can also be implemented on the inner pipe between the two O-rings for added safety (not shown separately), so that any leaks that may occur during operation can also be detected.

[0035] For example, a sensor can be provided in the discharge line to monitor the gas and detect whether one or more foreign gases are present in the discharge gas stream. This would indicate a leak from the environment or from the substrate receiving chamber 38 of the process chamber 3 into the gap. This would suggest a lack of sealing or damage to one of the pipe elements 30, 32. If the foreign gas(es) and their mixture or reaction products can be determined, the location of the leak can potentially be narrowed down, since the composition of the gas in the substrate receiving chamber 38 of the process chamber 3 usually differs from that of the ambient air.

[0036] Alternatively or additionally, the pressure in the gap can be set to a predetermined pressure via the secondary gas management system 44 and monitored by a suitably positioned pressure sensor. The predetermined pressure is preferably below ambient pressure. This ensures that no gases escape from the substrate receiving chamber 38 of the process chamber 3 into the environment. Optionally, the predetermined pressure in the gap can also be below the pressure in the substrate receiving chamber 38 of the process chamber 3, at least in phases. Since the pressure in the substrate receiving chamber 38 of the process chamber 3 may change during the process, this criterion is not necessarily met at all times. A pressure sensor in the gap and / or the lines to / from the gap can detect pressure changes. Such a pressure change can then also indicate a leak and possibly its location.A pressure increase indicates that a leak originates from an area with higher pressure, such as the environment. If such a pressure increase is detected while the pressure in the substrate receiving chamber 38 of process chamber 3 is below the pressure in the gap, it is clear that the leak is coming from the first pipe element 30 or the seal of the first pipe element. A corresponding pressure drop would, in this case, indicate that the leak is coming from the second pipe element 32 or the seal of the second pipe element. Upon detection of a leak, a corresponding warning can be issued to an operator of process plant 1, and the ongoing process can be automatically interrupted if necessary. Alternatively, the process can be completed normally.

[0037] Such monitoring can be carried out continuously or intermittently during the normal operation of process plant 1. Leakage tests can also be performed selectively between processes or at specific process sections. Defects in the seal and / or defects in the pipe elements 30, 32, such as microcracks, can be detected early, thus preventing or at least reducing contamination of the environment or the process gas atmosphere. The secondary gas management system 44 is shown as a separate unit, but it can also be integrated into the gas management system 6 for process chamber 3.

[0038] Although only one energy input unit 8 is shown in the illustration, several are usually provided, arranged parallel to each other (one behind the other in the plane of the image). These do not necessarily have to be of the same type (thermal / plasma-assisted) in a process plant 1; they can be a mix of both. It is also possible to provide corresponding energy input units 8 above and / or below the substrate intake unit in a process plant 1, whereby these do not have to be parallel to each other, but are usually arranged orthogonally to each other.

[0039] It should also be mentioned that corresponding energy input units 8 can be provided above (frontside heating) and / or below (backside heating) a rectangular substrate holder or substrate. Furthermore, it is not necessary for corresponding energy input units 8 to be arranged in a closed process chamber; rather, they can also be provided in a continuous furnace.

[0040] The second pipe element inherently provides multi-stage safety against contamination of the process chamber via a leak in the first pipe element 30, or conversely, from the substrate receiving chamber 38 of the process chamber 3 into the environment. A gas / pressure sensor can detect a leak in either of the pipe elements 30 or 32, or in their seals.

[0041] Figures 3 and 4 show a second embodiment of the invention, which differs from the first embodiment in the area of ​​the energy input units 8 and the feedthroughs 12. Figure 3, similar to Figure 1, shows a schematic partial sectional view through a process plant 1, while Figure 4 shows a detailed view of an embodiment of a feedthrough and sealing area. The process plant 1 has essentially the same structure as the first embodiment, with a process chamber housing 2 forming a process chamber 3, a substrate receptacle, a gas management system, and an energy input unit 8. For the sake of simplicity, the representation of the substrate receptacle, the gas management system, and the corresponding feedthroughs in the process chamber housing 2 has been omitted.

[0042] Differences arise primarily in the area of ​​the energy input unit 8 and its storage in the process chamber housing 2. In this embodiment, the energy input unit 8 is again formed by a rod-shaped energy input element 22, such as a heating lamp or a plasma rod, and a receptacle 24.

[0043] The intake 24 is formed, as in the first embodiment, by first and second pipe elements 30, 32, which are essentially transparent to the energy supplied by the energy input element 22. Additionally, the intake 24 has end caps 50 and 50', respectively, which will be explained in more detail below. The illustration shows two different end caps 50 and 50', but typically one of the same type of end cap 50 or 50' is used in a process plant 1.

[0044] In this embodiment as well, the first pipe element 30 extends completely through the process chamber 3 and the process chamber housing 2. Additionally, the first pipe element 30 also extends through opposing end caps which receive and support the first pipe element 30. The first pipe element 30 is not sealed directly against the feedthroughs 12, but rather against the end caps 50, 50', as will be explained in more detail below in the description of the end caps 50, 50'.

[0045] The first pipe element 30 can be open at its ends or connected to a gas source for conveying gas (for example, ambient air). A corresponding energy input element 22 can be inserted into the first pipe element at one end and supported, for example, by support elements (not shown) within the first pipe element 30. The energy input element 22 can be supplied with energy via the supply lines at the ends of the first pipe element 30. Alternatively, the energy input element 22 could also be freely supported within the first pipe element 30 via the supply lines 26 or other corresponding elements extending from the open ends of the first pipe element 30.

[0046] The second pipe element 32 also extends completely through the process chamber 3 and at least partially into the process chamber housing 2, in particular through the feedthroughs 12. The feedthroughs can be straight, i.e., without a step, as shown on the right side of the process plant 1 in Fig. 3. However, the feedthroughs can also be designed as stepped feedthroughs, as shown on the left side of the process plant 1 in Fig. 3. In this case, the stepped feedthrough 12 is designed such that it has an outer first section and an inner second section, the diameter of the first section being larger than the diameter of the second section. An internal thread is provided in the area of ​​the first section. The differently shaped feedthroughs are configured to work with the different end caps 50, 50', as will be explained in more detail below.

[0047] The second pipe element 32 completely surrounds the first pipe element 30 in the area of ​​the process chamber 3. Specifically, the first pipe element 30 passes essentially concentrically through the second pipe element 32, and a gap is formed between the pipe elements 30 and 32. The second pipe element 32 acts as a partition, dividing the process chamber 3 into a pipe element receiving chamber 36 and a substrate receiving chamber 38. The second pipe element 32 is open at its ends and sealed from the environment by the end caps 50 and 50'.

[0048] As mentioned previously, Fig. 3 shows two different types of end caps 50, 50', whereby the same type is usually used on both sides of the process chamber housing 2 in a process plant 1. Other embodiments will also be apparent to those skilled in the art.

[0049] The end cap 50' shown on the right side of Fig. 3 has a one-piece design with a through-hole 52 for receiving and passing through the first pipe element 30. A seal, for example an O-ring or another type of gasket, is provided in the area of ​​the through-hole 52. The end cap 50' is larger than the through-hole 12 in the process chamber housing 2, thus completely covering it, and can be detachably attached to the process chamber housing 2 using fasteners such as screws. A seal between the end cap 50' and the process chamber housing 2, shown here as an O-ring in a receiving groove of the end cap, provides a suitable seal. A seal is also provided between the through-hole 12 and the outer circumference of the second pipe element 32 to seal the through-hole 12.

[0050] As can be seen in Fig. 3, a conduit is formed in the end cap 50', connecting the gap formed between the first pipe element 30 and the second pipe element 32 to the environment. A connection for linking to a secondary gas management system and / or one or more sensors is provided at the outer end of the conduit, as in the first embodiment.

[0051] The end cap 50 shown on the left side of Fig. 3, which is also shown enlarged in Fig. 4, is specifically designed for use with the stepped bushing 12 with internal thread in the area of ​​the outer first section. The end cap 50 has a two-part structure with a first end cap part 60 and a second end cap part 62.

[0052] The first end cap part 60 has a main body 64 and an annular projection 65 extending from the main body 64. The main body 64 has external dimensions larger than the diameter of the through-hole 12 in the process chamber housing 2 to completely cover it. The main body also has a through-hole 67, which is stepped such that it has an outer first section and an inner second section. The diameter of the first section is larger than the diameter of the second section, and an internal thread is provided in the area of ​​the first section. The diameter of the second section of the through-hole 67 is dimensioned to accommodate and guide the first pipe element 30.

[0053] The annular projection 65 is positioned concentrically to the through-hole 67 and extends from a surface of the main body adjacent to the second section of the through-hole 67. The annular projection 65 has an inner circumference for receiving the second pipe element 32. An external thread is provided on the outer circumference of the annular projection 65, which fits the internal thread in the outer first section of the through-hole 12. Thus, the annular projection 65 can be screwed into the first section of the through-hole 12. As best illustrated in Figure 4, a sealing element 70, such as an O-ring, can be compressed between a front end of the annular projection 65 and a shoulder at the transition between the first and second sections of the through-hole 12. The sealing element 70 can then press against the second pipe element 32, providing both a seal and a slightly elastic bearing.Furthermore, a seal is provided between the annular projection 65 and the housing 2. The length of the annular projection 65, the depth of the first section of the feedthrough 12, and the sealing element are coordinated to ensure a good seal and a secure hold for the second pipe element 32.

[0054] As can be seen in Figs. 3 and 4, a conduit is formed in the first end cap part 60, connecting the gap formed between the first pipe element 30 and the second pipe element 32 to the environment. A connection for linking to a secondary gas management system and / or one or more sensors is provided at the outer end of the conduit, as in the first embodiment.

[0055] The second end cap part 62 has a main body 74 and an annular projection 75 extending from the main body 74. The main body 74 has external dimensions larger than the diameter of the through-hole 67 in the first end cap part 60 in order to completely cover it. The main body 74 also has a through-hole 77 with a diameter for receiving and passing through the first pipe element 30.

[0056] The annular projection 75 is positioned concentrically to the through-hole 77, extends from a surface of the main body, and has an inner circumference that is aligned with the inner circumference of the through-hole 77. The annular projection 75 has an inner circumference for receiving the first pipe element 30. An external thread is provided on the outer circumference of the annular projection 75, which fits the internal thread in the outer first section of the through-hole 67 of the first end cap part 60. Thus, the annular projection 75 can be screwed into the first section of the through-hole 67. As best illustrated in Figure 4, a sealing element 80, such as an O-ring, can be compressed between a front end of the annular projection 75 and a shoulder at the transition between the first and second sections of the through-hole 67.The sealing element 80 can then press against the first pipe element 30, providing both a seal and a slightly elastic support. Furthermore, a seal is provided between the first and second end cap parts. The length of the annular projection 75, the depth of the first section of the through-hole 67, and the sealing element are coordinated to ensure a good seal and secure hold for the first pipe element. Instead of providing internal and external threads, the respective end caps could also be attached to the housing / other end cap by screws that extend, for example, through the respective main body.

[0057] Figure 5 shows a third embodiment of the invention, which differs from the first embodiment primarily in the area of ​​the energy input units 8 and the feedthroughs 12. Figure 5, similar to Figure 1, shows a schematic partial sectional view through a process plant 1.

[0058] The process plant 1 has essentially the same structure as the first embodiment, with a process chamber housing 2 forming a process chamber 3, a substrate holder, a gas management system, and an energy input unit 8. For the sake of simplicity, the representation of the substrate holder, the gas management system, and the corresponding feedthroughs in the process chamber housing 2 has been omitted.

[0059] The process chamber housing 2 consists of at least one upper part 81 and one lower part 82, which are movable relative to each other and, when placed one on top of the other, form the process chamber 3. In one embodiment, the parts can be moved away from each other for loading and unloading the process chamber 3. In the placed position, the upper part 81 and lower part 82 are sealed against each other by suitable seals. The dividing line between the upper part 81 and lower part 82 is indicated at 84.

[0060] The side walls of the upper part 81 of the process chamber housing 2 are provided with feedthroughs 12, which are again depicted as stepped feedthroughs 12 similar to the second embodiment. The stepped feedthroughs 12 are designed such that they have an outer first section and an inner second section, the diameter of the first section being larger than the diameter of the second section. An internal thread is provided in the area of ​​the first section. The feedthroughs 12 will be explained in more detail below in the description of the respective parts to be accommodated.

[0061] In this embodiment, an internal recess is provided in the underside of the side wall of the upper part, designed to receive a plate-shaped separating element 86. The separating element 86 is suitably attached to the upper part 81 and sealed against it (for example, by means of O-rings, not shown). The separating element 86 completely spans the process chamber and, when the upper part 81 and lower part 82 are joined, divides it into a pipe element receiving chamber 87 and a substrate receiving chamber 88, as will be explained in more detail below. The separating element 86 consists of a material that is essentially transparent to the energy supplied by the energy input unit 8, meaning that it allows a large proportion, preferably > 80%, and in particular > 90% of the energy to pass through. The separating element 86 can, for example, consist of quartz or a suitable ceramic, or it can contain both.A conduit is formed in the upper part 81, connecting the pipe element receiving chamber 87, formed by the upper part 81 and the separating element 86, to the environment. A connection for a secondary gas management system 44 and / or one or more sensors is provided at the outer end of the conduit. A corresponding conduit can optionally also be provided on the opposite side of the process chamber housing 2, so that the pipe element receiving chamber 87 is connected to a conduit at opposite ends.

[0062] In this embodiment, the energy input unit 8 is again formed by a rod-shaped energy input element 22, such as a heating lamp or a plasma rod, and a receptacle 24.

[0063] The receptacle 24 is formed, as in this embodiment, by a single tube element 30, corresponding to the first tube element of the preceding embodiments, which is essentially transparent to the energy supplied by the energy input element 22. Additionally, the receptacle 24 has end caps 90, which will be explained in more detail below.

[0064] The pipe element 30 extends completely through the pipe element receiving space 87 of the process chamber 3 and the process chamber housing 2. Additionally, the pipe element 30 also extends through opposing end caps 90 which receive and support the pipe element 30. The first pipe element 30 can be configured as in the first embodiment and receive the energy input element 22.

[0065] The end caps 90 each have a main body 94 and an annular projection 95 extending from the main body 94. The main body 94 has external dimensions larger than the diameter of the feedthrough 12 in the process chamber housing 2 in order to completely cover it. The main body 94 also has a feedthrough opening 97 with a diameter for receiving and passing through the pipe element 30.

[0066] The annular projection 95 is positioned concentrically to the through-hole 97, extends from a surface of the main body 94, and has an inner circumference that is aligned with the inner circumference of the through-hole 97. The annular projection 95 has an inner circumference for receiving the pipe element 30. An external thread is provided on the outer circumference of the annular projection 95, which fits the internal thread in the outer first section of the through-hole 12 in the upper part 81 of the housing 2. Thus, the annular projection 95 can be screwed into the first section of the through-hole 12. A sealing element 98, such as an O-ring, can then be compressed between a front end of the annular projection 95 and a shoulder at the transition between the first and second sections of the through-hole 12.The sealing element 98 can then press against the pipe element 30, providing both a seal and a slightly elastic bearing. Furthermore, a seal is provided between the end cap parts 90 and the housing. The length of the annular projection 95, the depth of the first section of the feedthrough 12, and the sealing element 98 are coordinated to ensure a good seal and a secure hold for the pipe element 30. Instead of providing internal and external threads, the end caps could also be attached to the housing by screws that extend, for example, through the main body.

[0067] Figure 6 shows a fourth embodiment of the invention. In this embodiment, the energy input units 8 again have an energy input element 22, such as a heating lamp or a plasma rod, an inner tube element 30, and an outer tube element 32, as in the embodiments according to Figures 1 to 4. Therefore, a more detailed description of these elements is omitted. The fourth embodiment differs from the first embodiments primarily in the area of ​​the fastening and mounting of the tube elements 30, 32 of the energy input units 8 and the feedthroughs 12. Figure 6 shows a schematic partial sectional view through a process plant, with the section running horizontally here—instead of vertically as in Figures 1–5.

[0068] The process plant has essentially the same structure as the second embodiment, with a process chamber housing 2 forming a process chamber, a substrate intake, a gas management system, and energy input units 8, as described above.

[0069] In the process chamber housing 2, a plurality of feedthroughs 12 for receiving the energy input units 8 are provided on opposite sides. Figure 6 shows a section of one feedthrough 12 as a whole and a partial view of a horizontally spaced second feedthrough 12. The feedthroughs 12 are each multi-stage with a first, inner section, an adjacent second section, an adjacent third section, and a fourth, outer section, the diameter increasing from the first, inner section to the fourth, outer section.

[0070] The first section is dimensioned to receive the outer pipe element 32 of the energy input units 8. As shown in Figure 100, a circumferential groove can be provided in this section to receive a bearing element, such as an O-ring, in order to elastically support the pipe element, for example, in the first section of the feedthrough 12 and, if necessary, to provide a certain degree of sealing. The second section of the feedthrough 12 forms a shoulder at its inner end due to the different diameter. This shoulder serves as a counter bearing for a sealing element 102, such as an O-ring, as will be explained in more detail below. Similarly, the third section of the feedthrough 12 also forms a shoulder at its inner end. This shoulder also serves as a counter bearing for a sealing element 104, such as an O-ring, as will be explained in more detail below.The fourth, outer area of ​​the feedthrough 12 again has an internal thread.

[0071] As shown, adjacent feedthroughs 12 are connected via a transverse bore 108. The transverse bore 108, which is purely optional, extends parallel to the side wall in which the feedthroughs 12 are formed and intersects the respective feedthrough 12 in the second area. The transverse bore 108 is preferably positioned such that, as shown, it runs directly adjacent to one end of the second pipe element 32 when it is received in the feedthrough 12.

[0072] According to the fourth embodiment, a fastening and sealing unit 110 is provided for each pair of pipe elements 30, 32, which consists of the sealing elements 102, 104 already mentioned, a first intermediate element 112, an optional second intermediate element 114, an end cap 116 and further sealing elements 118, 120.

[0073] The first intermediate element 112 has an annular central section 124 and two annular projections 126, 128 extending axially from it. The annular projections 126, 128 extend in opposite directions from the central section 124. The intermediate element 112 is designed to be received in a passage 12 such that the annular projection 126 extends from the central section 124 towards the interior of the housing. The annular central section 124 thus has an inner surface 130 and an outer surface 132 with respect to its intended reception in the passage 12. The annular central section 124 also has an outer circumference 134 and an inner circumference 136. The outer circumference 134 of the annular central section 124 is dimensioned such that the annular central section 124 fits into the third region of the passage 12. The axial dimension of the annular central part 124 corresponds essentially to the axial dimension of the third area of ​​the feedthrough 12.At the transition between the inner surface 130 and the outer circumference 134 of the central section 124, a circumferential recess is formed, creating a shoulder pointing towards the inner surface 130. The recess is dimensioned to receive the sealing element 104, which, as shown, can be pressurized between the shoulder of the recess and the shoulder between the third and second sections of the passage 12. This allows for a seal between the passage 12 and the intermediate element 112. An annular recess for receiving the sealing element 120 is formed in the outer surface 132; both the recess and the sealing element are optional. The inner circumference 136 of the annular central section 124 is dimensioned to receive the pipe element 30.

[0074] The annular projection 126 of the intermediate section 112 is coaxial with the central section 124 and radially offset inwards with respect to the outer circumference 134. In particular, the outer circumference of the annular projection 126 can be aligned with the circumferential recess at the transition between the inner surface 130 and the outer circumference 134. The outer circumference of the annular projection 126 is dimensioned such that it fits into the second section of the passage 12. The annular projection 126 has a width that is slightly less than half the change in diameter between the first and second sections of the passage 12. Thus, the annular projection 126 fits into a gap that is formed in the received state of the second pipe element 32 and the second section of the passage 12, as shown.The annular projection 126 has a length selected such that, when the intermediate element 1 12 is installed, the sealing element 102 is pressurized between a front end of the annular projection 126 and the shoulder at the transition between the first and second sections of the bushing 12. This allows a seal to be provided in this area between the elements involved, namely the bushing 12 in the housing 2, the second pipe element 32, and the intermediate element 1 12. The annular projection 126 has a plurality of transverse bores 138, which, when the intermediate element 1 12 is installed, are aligned with the transverse bores 108 in the housing 2.

[0075] The annular projection 128 of the intermediate element 1 12 is coaxial with the central part 124 and the inner circumference of the annular projection 128 is aligned with the inner circumference of the central part 124. The inner circumference of the annular projection 128 is thus also dimensioned to accommodate the first pipe element 30.

[0076] The optional second intermediate element 114 is an annular disc element for placement between the first intermediate element 112 and the end cap 116. In this position, it can come into contact with the optional sealing element 120 and thereby preload the first intermediate element into the housing, as shown in the left-hand arrangement. The inner circumference of the disc element is dimensioned such that the annular projection 128 can extend through it.

[0077] The end cap 1 16 is annular in shape and has a first area for insertion into a corresponding opening 12 in the housing 2, and a second area for placement outside the housing 2. The first area has an outer circumference, an inner circumference, and an inner surface that, when the end cap 1 16 is properly installed, faces into the housing 2. The outer circumference has an external thread over at least part of its length, which fits the internal thread in the fourth area of ​​the opening 12. The end cap 1 16 can be screwed into the opening 12 via this thread. The inner circumference of at least part of the first area is dimensioned to receive the first pipe element 30. In the transition area between the inner and inner circumferences, a circumferential recess is provided, forming a shoulder and creating a stepped inner circumference.The recess is designed to at least partially accommodate the annular projection 128 of the intermediate element. The recess is also dimensioned to accommodate the sealing element 118. In particular, the elements involved are dimensioned such that, in the installed state of the end cap 116, the sealing element is pressurized between the shoulder and one end of the annular projection 128. This allows for a seal in this area between the elements involved, namely the end cap 116, the first pipe element 30, and the intermediate element 112.

[0078] The second area of ​​the end cap, which is intended for placement outside the housing 2, has a suitable structure that facilitates screwing it into the feedthrough 12. In particular, it may, for example, provide a structure for engagement with a tool or a good grip structure for screwing it in by hand. The screw-in depth may be limited by suitable means to prevent excessive pressure on the sealing elements 102, 104, 118 and 120.

[0079] The stepped through-opening 12, in combination with the sealing elements 102, 104, 118, and 120, the intermediate elements 112, 114, and the end cap 116, thus enables a coaxial arrangement of the first and second tube elements 30, 32, as shown. The resulting gap between the first and second tube elements 30, 32 is sealed against both the environment and the interior of the housing, i.e., the process chamber in which substrates are to be accommodated. An energy input element 22 is again appropriately accommodated in the first tube element 30, which is open to the environment. The gap between the tube elements 30, 32 can be pressurized with gas via the transverse bore 108, and / or the pressure in the gap can be monitored via the transverse bore 108.Although not shown, the transverse bore 108 can optionally be closed section by section by means of corresponding plugs, so that, for example, on one side of the process chamber housing 2, two adjacent through-openings 12 are connected to each other, but the connection to the next adjacent through-opening 12 is blocked. Thus, for example, the first and second through-openings, as well as the third and fourth through-openings, etc., on one side of the process chamber housing 2 can be connected via the transverse bore 108, which, however, is closed between the second and third through-openings. Similarly, on the opposite side, for example, a connection between the first and second through-openings could be closed, while the connection between the second and third through-openings could be open, etc. As the person skilled in the art can see, this would allow meandering flow through the gap between pairs of first and second pipe elements.However, it would also be conceivable that the transverse bore 108 connects all the through-openings on one side and serves as a kind of collecting pipe for the respective gaps, with gas being supplied via the transverse bore 108 on one side of the housing and gas being discharged on the opposite side. Hybrid configurations are also possible.

[0080] While the first, second, and fourth embodiments provide a first and a second pipe element to divide the process chamber into a pipe element receiving chamber and a substrate receiving chamber, the third embodiment achieves this division through a combination of a (first) pipe element and the plate-shaped partition element. In both cases, leaks between the environment or the substrate receiving chamber and the pipe element receiving chamber can be detected by monitoring the atmosphere (gas composition and / or pressure) within the pipe element receiving chamber, allowing appropriate measures to be taken. This enables early detection of faults and, if necessary, prevents contamination of the process atmosphere in the substrate receiving chamber or the environment.

Claims

Patent claims 1. Process system (1) for treating substrates (W), in particular semiconductor substrates, comprising: a process chamber housing (2) forming a process chamber (3) for receiving a substrate (W), a substrate receptacle in the process chamber (3) for receiving a substrate (W) to be treated, and a tube element (30) extending through the process chamber (3) and the process chamber housing (2), wherein the tube element (30) is configured to receive an energy input element (22), such as a heating lamp or a plasma rod, and wherein the tube element (30) is open to the environment at its ends and / or connected to a gas source for conveying gas, characterized by a separating element (32; 86) arranged between the tube element (30) and the substrate receptacle such that the process chamber (3) is divided into at least one tube element receiving space (36; 87) and a substrate receiving space (38; 88), wherein the tube element receiving space (36; 87) is not open to the surroundings, and Means for setting and / or monitoring a gas atmosphere in the tube element receiving chamber (36; 87).

2. Process plant (1 ) according to claim 1 comprising a plurality of tube elements (30) extending through the process chamber and the process chamber housing (1 ), each configured to receive a heating lamp or a plasma rod, and being open to the environment at their ends and / or connected to a gas source for conveying gas.

3. Process plant (1 ) according to claim 1 , wherein the separating element is a further pipe element (32) which completely surrounds the one pipe element (30) within the process chamber (1 ) forming the pipe element receiving space (36).

4. Process plant (1) according to claim 2, comprising a plurality of separating elements, each in the form of a further pipe element (32), wherein each Each of the multiple tube elements (30), each configured to receive a heating lamp or a plasma rod, completely surrounds a further tube element (32) within the process chamber (1), forming a corresponding multiple of tube element receiving spaces (36).

5. Process plant (1 ) according to claim 1 or 2, wherein the separating element (86) is a plate element.

6. Process plant (1) according to one of the preceding claims, wherein the separating element (32; 86) is substantially permeable to lamp radiation from a heating lamp and / or to plasma-exciting energy.

7. Process plant (1) according to one of the preceding claims, wherein the means for adjusting and / or monitoring a gas atmosphere in the tube element receiving space comprises means for introducing and / or passing a predetermined gas, in particular an inert gas, into / through the tube element receiving space or the plurality of tube element receiving spaces and means for monitoring the purity of the predetermined gas in the tube element receiving space or the plurality of tube element receiving spaces.

8. Process plant (1) according to one of the preceding claims, wherein the means for setting and / or monitoring a gas atmosphere in the pipe element receiving space comprises means for setting and monitoring a predetermined pressure, in particular a negative pressure in the pipe element receiving space or in the plurality of pipe element receiving spaces.

9. Process plant (1) according to claim 6 or 7, wherein the means for adjusting and / or monitoring a gas atmosphere in the pipe element receiving space comprises a gas sensor and / or a pressure sensor in the pipe element receiving space or in the plurality of pipe element receiving spaces and / or in a line connected thereto for venting / extracting gas from the pipe element receiving space.

10. Process plant (1) according to one of the preceding claims, wherein the tube element(s) and / or the separating element(s) is / are made of quartz. 1 1. Process plant (1 ) according to one of the preceding claims, wherein the pipe element(s) and / or the separating element(s) are made of ceramic, in particular essentially transparent ceramic for the energy introduced by the energy input element(s) (22).

Images