Process apparatus with distributed actuators and method for controlling distributed actuators

Abstract

A linear electrical machine includes: a frame; an array of electromagnets arranged in more than one sets; a reaction platen where excitation of the electromagnets generates levitation and propulsion forces against the at least one reaction platen; and a controller system that has a distributed control configuration to sequentially excite the electromagnets so that each reaction platen is levitated and propelled with at least four degrees of freedom. Each respective coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, each of the multiple sets being at different corresponding predetermined locations in the array of electromagnets from each other set of the multiple sets, the respective coil controller being variably coupled to one set at a time and switched from the one set, at a predetermined location corresponding to the one set, to a different set at a different predetermined location.

Description

Aty. Docket No. 390P017054-WO (PCT)PROCESS APPARATUS WITH DISTRIBUTED ACTUATORS AND METHOD FOR CONTROLLING DISTRIBUTED ACTUATORSCROSS-REFERENCE TO RELATED APPLICATION(S)

[0001] This application is a non-provisional of and claims the benefit of United States provisional patent application number 63 / 679,418 filed on August 5, 2024, the disclosure of which is incorporated herein by reference in its entirety.BACKGROUND1. Field

[0002] The present disclosure generally relate to substrate processing equipment, and more particularly, to substrate transports of the substrate processing equipment.2. Brief Description of Related Developments

[0003] Semiconductor automation generally comprises a series of building blocks that are required to support the implementation of processes to ultimately achieve predetermined levels of quality and reproducibility in semiconductor chip manufacturing. One component of semiconductor automation is the wafer (also referred to as a substrate) handler that transports the wafer or substrate between load locks and process modules and / or between process modules (e.g., in the case of sequential process tool architectures).

[0004] Conventional wafer handlers employed in semiconductor automation generally comprise multi-link robotic manipulators. The multi-link robotic manipulators have end effectors that hold and transport wafers or substrates from one location to another location. As an alternative to theAty. Docket No. 390P017054-WO (PCT) conventional wafer handlers noted above, magnetically levitated wafer conveyors may be employed where an alternating current magnetic floating apparatus for floating and conveying a conductive floating body or paramagnetic or nonmagnetic metallic material above a line of alternating current electromagnets is provided. However, the electromagnets form a large set of, what may be referred to as, actuators that may be controlled over a distributed network of power and data. When considering scalability of magnetically levitated wafer conveyors, the control architecture may require a potentially large number of actuators to be controlled to achieve a desired six degrees of freedom motion control for the magnetically levitated wafer conveyors of the semiconductor automation. In addition, not all actuators are required to be controlled at all times because only a subset of the actuators contribute to the motion of any given wafer conveyor. Here, the actuators may be provided in groups (e.g., coil sets) where each group is connected to a respective controller (e.g., coil controller) that in turn belongs to a power and data network. The number of controllers required to move the wafer conveyors will substantially directly scale based on a total number of actuators that are installed on a given physical motion domain of the wafer conveyors.

[0005] In the above-described controls architecture, a master controller is provided for issuing control commands to the coil controllers. The master controller may also be provided with location information (such as by sensors that detect the wafer conveyors) for each of the wafer handlers within the motion domain of the wafer conveyors. Here, the master controller may determine which coils of the coil sets are energized for levitating and moving the wafer conveyors however, as noted above, the number of coils directly defines and scales the number of controllers. As such, the total controller cost is directly impacted by the number of actuators.

[0006] Accordingly, the present disclosure addresses a number of those issues.BRIEF DESCRIPTION OF THE DRAWINGSPage o f 54Aty. Docket No. 390P017054-WO (PCT)

[0007] The foregoing aspects and other features of the present disclosure are explained in the following description, taken in connection with the accompanying drawings, wherein:

[0008] Fig. l is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;

[0009] Fig. 1 A is a schematic illustration of the substrate processing apparatus of Fig. 1 illustrating drive line features in accordance with the present disclosure;

[0010] Fig. 2 is a schematic illustration of a portion of a control system for the substrate processing apparatus described herein and in accordance with the present disclosure;

[0011] Fig. 2A is a schematic illustration of the portion of the control system of Fig. 2 in accordance with the present disclosure;

[0012] Fig. 2B is a schematic illustration of the portion of the control system of Fig. 2 in accordance with the present disclosure;

[0013] Fig. 2C is a schematic illustration of the portion of the control system of Fig. 2 in accordance with the present disclosure;

[0014] Fig. 2D is a schematic illustration of the portion of the control system of Fig. 2 in accordance with the present disclosure;

[0015] Fig. 2E is a schematic illustration of the portion of the control system of Fig. 2 in accordance with the present disclosure;

[0016] Fig. 3 is a schematic illustration of a conventional substrate processing apparatus control system;

[0017] Fig. 4 is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;Aty. Docket No. 390P017054-WO (PCT)

[0018] Fig. 5 is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;

[0019] Fig. 6 is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;

[0020] Fig. 7 is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;

[0021] Fig. 8 is a schematic illustration of a portion of the substrate processing apparatus described herein and in accordance with the present disclosure;

[0022] Fig. 9 is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;

[0023] Figs. 10A and 10B are respectively schematic plan and side views of a substrate processing apparatus in accordance with the present disclosure;

[0024] Figs. 11 A and 1 IB are respectively schematic plan and side view illustrations of a substrate processing apparatus in accordance with the present disclosure;

[0025] Fig. 12 is a schematic illustration of a substrate processing apparatus in accordance with the present disclosure;

[0026] Fig. 12A is a schematic illustration of the substrate processing apparatus of Fig. 12 in accordance with the present disclosure;

[0027] Figs. 12B and 12C are respectively schematic side and plan view illustrations of a substrate handler in accordance with and in accordance with the present disclosure;

[0028] Fig. 13 A is a schematic partial perspective illustration of a portion of a substrate processing apparatus in accordance with and in accordance with the present disclosure;Aty. Docket No. 390P017054-WO (PCT)

[0029] Fig. 13B is a schematic perspective illustration of a portion of a substrate processing apparatus of Fig. 13A in accordance with and in accordance with the present disclosure;

[0030] Fig. 13C is a schematic side view illustration of a portion of a substrate processing apparatus of Fig. 13A in accordance with and in accordance with the present disclosure;

[0031] Fig. 14 is a schematic perspective illustration of a portion of a substrate processing apparatus in accordance with and in accordance with the present disclosure;

[0032] Fig. 15 is an exemplary flow diagram of a method in accordance with the present disclosure; and

[0033] Fig. 16 is an exemplary flow diagram of a method in accordance with the present disclosure.DETAILED DESCRIPTION

[0034] The following detailed description is meant to assist the understanding of one skilled in the art, and is not intended in any way to unduly limit any claims connected or related to the present disclosure.

[0035] The following detailed description references various figures, where like reference numbers refer to like components and features across various figures, whether specific figures are referenced, or not.

[0036] The word “each” as used herein refers to a single object (i.e., the object) in the case of a single object or each object in the case of multiple objects. The words “a,” “an,” and “the” as used herein are inclusive of “at least one” and “one or more” so as not to limit the noun being referred to as being in its “singular” form.Page o f 54Aty. Docket No. 390P017054-WO (PCT)

[0037] Spatial terms such as “left,” “right,” “top,” “bottom,” “upper,” “lower,” “front,” “back,” “vertical,” and “horizontal” as may be used herein are by way of example and illustration only are not meant to limit the description and may be exchanged in position and orientation.

[0038] The terms “substantially” and “about” as may be used herein refer to a feature that may be varied within an acceptable manufacturing tolerance for a given application.

[0039] Figs. 1 and 1A illustrate an exemplary substrate processing apparatus 100 (see also substrate processing apparatus 100A-100E described herein) in accordance with the present disclosure. Although the present disclosure will be described with reference to the drawings, it should be understood that the present disclosure can be embodied in many forms. In addition, any suitable size, shape or type of elements or materials could be used.

[0040] The present disclosure provides the substrate processing apparatus 100 (see also substrate processing apparatus 100A-100E described herein) with a minimized number of controllers while maintaining motion control of all substrate handlers 110 within an entire motion domain PTS (illustrated in Fig. 1A for clarity) of the substrate handlers 110. The motion domain PTS is the area(s) within the substrate processing apparatus, defined by the linear electrical machine 700, that includes an array of electromagnets or coils 1700 (as described herein) and in which the substrate handlers 110 may traverse. For example, the motion domain PTS includes at least the closed bounds or platen travel space of a linear electrical machine 700 of the substrate processing apparatus 100, 100A-100E, where the closed bounds or platen travel space at least one of conforms substantially to one or more sides of the transport chamber(s) 118 and extends through at least one closable port 1180 of a transport chamber 118 of the substrate processing apparatus 100, 100A- 100E. Such area(s) of the motion domain include, but are not limited to, one or more of the transfer chamber 118, load locks 116, substrate aligners 4444 (which may be formed by a cart HOC, as described herein, and predetermined group(s) of electromagnets at dynamically located positions within the substrate processing apparatus), and substrate handler service locks 115 (also referred to herein as substrate handler stations - e.g., having door(s) 115D for introducing orAty. Docket No. 390P017054-WO (PCT) removing substrate handlers 110 to and from the substrate processing apparatus) such as those described in United States Provisional patent applications having Attorney docket numbers 390P017044-US (-#1) (titled “Scalable Substrate Handler Apparatus and Processing Apparatus Including the Same” and having application serial number 63 / 594,743 fded on October 31, 2023), 390P017044-US (-#2) (titled “Scalable Substrate Handler Apparatus and Processing Apparatus Including the Same” and having application serial number 63 / 636,472 fded on April 19, 2024), and 390P017053-US (-#1) (titled “Distributed Network Controls Apparatus for Substrate Handlers”), and Untied States patent application number 18 / 050,300 fded on October 27, 2022, the disclosures of which are incorporated herein by reference in their entireties).

[0041] Referring to Figs. 1, 1A, 4, and 5, there is shown a schematic plan view of an exemplary substrate processing apparatus 100 in accordance with the present disclosure. The substrate processing apparatus 100 may be connected to one or more environmental or equipment front end module (EFEM) 114 which has one or more load ports 112 (see Fig. 4). The load ports 112 are capable of supporting a number of substrate storage canisters or substrate carriers 171 such as for example conventional FOUP canisters, though any other suitable type of substrate carriers may be provided. The EFEM 1 14 communicates with the processing apparatus 100 through one or more load locks 116 or one or more substrate handler stations 115, which are connected to the processing apparatus 100. The EFEM 114 (which may be open to atmosphere) has a substrate transport apparatus 113 capable of transporting substrates between substrate carriers 171 disposed at the load ports 112 and the load locks 116. The EFEM 114 may include substrate alignment capability, batch handling capability, substrate and carrier identification capability, and / or otherwise.

[0042] One or more of the load lock(s) 116, substrate handler station(s) 115, and transfer chamber 118 may interface directly with the load ports 112 (see Fig. 5, where the substrate handler stations 115 and transfer chamber 118 are interfaced with the load ports 112, noting that the load locks 116 may interface with the load ports 112 in a similar manner) as in the case where the load locks have batch handling capability or in the case where the load locks have the ability to transfer wafers directly from the FOUP to the lock. Some examples of such apparatus are disclosed in US patentAty. Docket No. 390P017054-WO (PCT) numbers 6,071,059, 6,375,403, 6,461,094, 5,588,789, 5,613,821, 5,607,276, 5,644,925, 5,954,472, 6,120,229, and 6,869,263 all of which are incorporated by reference herein in their entirety. Other load lock options may be provided.

[0043] As illustrated in Fig. 5, and as noted above, the load ports 112 may interface directly with a transfer chamber 118 of the processing apparatus, where a pressure within the substrate carrier 171 is brought down or up to (i.e., equalized) with a pressure of the internal environment of the transfer chamber 118 so that substrates may be transferred directly between the substrate carrier 171 and the transfer chamber 118. The load port 112 may be capable of pumping down and / or venting the interior of the substrate carrier 171 so as to increase or decrease the pressure thereof to match that of the transfer chamber 118 in a manner similar to that described in, for example, United States patent numbers 9,105,673 issued on August 11, 2015 and 10,395,959 issued on August 27, 2019, the disclosures of which are incorporated herein by reference in their entireties.

[0044] The processing apparatus may be configured to transfer substrates S between the transfer chamber 118 and a substrate carrier 112 one or more of directly, through a load lock 116, and / or through an EFEM 114. Examples of apparatus suitable for transferring substrates to and from the processing apparatus, such as directly from the substrate carrier 112 to a load lock 116 are described in United States patent numbers 6,071,059 issued on June 6, 2000; 6,375,403 issued on April 23, 2002; 6,461,094 issued on October 8, 2002; 5,588,789 issued on December 31, 1996; 5,613,821 issued on March 25, 1997; 5,607,276 issued on March 4, 1997; 5,954,472 issued on September 21, 1999; 6,120,229 issued on September 19, 2000; and 6,869,263 issued on March 22, 2005, the disclosures of which are incorporated herein by reference in their entireties.

[0045] Still referring to Figs. 1, 1A, 4, and 5, the substrate processing apparatus 100 may be used for processing semiconductor substrates (e.g. 200 mm, 300 mm, 450 mm, or other suitably sized wafers), panels for flat panel displays, or any other desired kind of substrate in any suitable vacuum, atmospheric, and / or otherwise controlled environments. The processing apparatus 100 may generally include transfer chamber 118 (which holds any suitable sealed / controlledAty. Docket No. 390P017054-WO (PCT) atmosphere therein), process modules 120, and at least one substrate transport apparatus or linear electrical machine 700. The substrate transport apparatus 700 may be integrated with the transfer chamber 118 or coupled to the transfer chamber 118 in any suitable manner such as described in, for example, United States patent number 11,476,139 issued on October 18, 2022 and United States patent application number 18 / 050,300 fded on October 27, 2022, the disclosures of which are incorporated herein by reference in their entireties. As illustrated in Figs. 1, 1A, 4, and 5, process modules 120 are mounted on both sides of the transfer chamber 118; however, process modules 120 may be mounted on one side of the chamber 118 as shown for example in Fig. 7.

[0046] The process modules 120 are illustrated in Figs. 1, 1 A, 4, and 5 as being mounted opposite each other in rows Yl, Y2, ..., Yn or vertical planes; however, the process modules 120 may be staggered from each other on the opposite sides of the transfer chamber 118 or stacked in a vertical direction relative to each other. The transport apparatus 700 has one or more substrate handler 110 that is moved in the transfer chamber 118 to transport substrates S between substrate holding stations. The substrate holding stations include one or more of load locks 116, process modules 120, substrate carriers 171 and any other suitable location for holding a substrate that is accessible within or from within the transfer chamber 1 18. Any suitable number of substrate handlers 1 10 may be provided within the transfer chamber 118. Substrate handlers 110 may be input or removed from the transfer chamber 118 by an operator or with automation (e.g., such as through a substrate handler service lock 115) substantially without disrupting operation of the substrate processing apparatus 100 in a manner substantially similar to that described in United States provisional Patent application number 63 / 594,743 fded on October 31, 2023, previously incorporated herein by reference in its entirety.

[0047] The transfer chamber 118 has a frame 118M with a level reference plane 1299 (as described herein - see Fig. 13C) and may be configured to hold a sealed / controlled environment. The sealed / controlled environment may be a vacuum, an inert atmosphere, simply a clean room environment, or a combination thereof in the interior of the transfer chamber 118. The transportAty. Docket No. 390P017054-WO (PCT) chamber 118 has at least one closable port 1180 along one or more sides of the transport chamber 118.

[0048] As described herein, an array of electromagnets 1700 is connected to the frame 118M to form a drive plane DP at a predetermined height relative to the level reference plane 1299 (see Fig. 13C). The array of electromagnets 1700 is arranged in more than one sets M of coils or electromagnets (see Figs. 2-2E) where at least one set M of electromagnets of the array of electromagnets 1700 defines at least one drive line DL1-DL8 (see, e.g., Fig. 1A) within the drive plane 1299, and each of the electromagnets is coupled to a power source 1585 (see, e g., Figs. 2A and 2B) energizing each electromagnet 1700A-1700n. At least one reaction platen 1510 of material disposed to cooperate with electromagnets 1700A-1700n of the array of electromagnets 1700 so that excitation of the electromagnets 1700A-1700n generates levitation and propulsion forces against the at least one reaction platen that controllably levitate and propel the at least one reaction platen 1510 along the at least one drive line DL1-DL8, in a controlled attitude relative to the drive plane 1299. A controller 199 system has a distributed control configuration (see, e.g., Figs. 1A-2B) with a master controller 199M and more than one coil controllers (e.g., distributed controllers 199D) communicably connected to each other. The more than one coil controllers 199D may be selectably coupled to different sets M of electromagnets 1700A-1700n so that a variable group of at least one of the more than one coil controllers 199D, 199DA, 199DB (see, e.g., Figs. 2-2B) are selectably connected to each of the at least one set M of electromagnets 1700A-1700n. The master controller 199M may be configured to send master commands MC that switch each of the more than one coil controllers 199D between the more than one sets M of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set M of electromagnets, on demand based on a pose of the at least one reaction platen 1510 along the drive line DL1-DL8, and sequentially excite the electromagnets 1700A-1700n with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen 1510 is levitated and propelled with at least four degrees of freedom. The master controller 199M may be configured to send master commands MC that switches eachAty. Docket No. 390P017054-WO (PCT) of the at least one coil controllers 199D, of the variable group of at least one of the more than one coil controllers 199D, 199DA, 199DB, just in time between sets M of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set M of electromagnets, based on a pose of the at least one reaction platen 1510 along the drive line DL1-DL8, and sequentially excite the electromagnets 1700A-1700n with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen 1510 is levitated and propelled with at least four degrees of freedom.

[0049] Each (or at least one) respective coil controller 199D may be selectably coupled to electromagnets 1700A-1700n of multiple sets M from the more than one set M of electromagnets, where each of the multiple sets M being at different corresponding predetermined locations in the array of electromagnets 1700 (see, e.g., Figs. 2-2E) from each other set M of the multiple sets. The respective coil controller 199D may be variably coupled to one set M at a time and switched from the one set M, at a predetermined location corresponding to the one set M, to a different set at a different predetermined location.

[0050] Each (or at least one) respective coil controller 199D is selectably coupled to electromagnets 1700A-1700n of multiple sets M from the more than one set M of electromagnets. The respective coil controller 199D may be variably coupled to one set M a time and switched from the one set M (e.g., such as one of coil set 1 to coil set M) to a different set M (e.g., such as a different one of coil set 1 to coil set M) so that the variable group of coil controllers 199D, 199DA, 199DB selectably connected to the more than one sets M of electromagnets varies from a first group of coil controllers 199D, 199DA, 199DB to a different second group of coil controllers 199D, 199DA, 199DB, where at least one coil controller 199D, 199DA, 199DB in the second group being different than each coil controller 199D, 199DA, 199DB in the first group. Each of the multiple sets M is at different corresponding predetermined locations in the array of electromagnets 1700 from each other set M of the multiple setsAty. Docket No. 390P017054-WO (PCT)

[0051] The respective coil controller 199D is switched in one or more of the following ways: just in time (i.e., so as to continue sequential excitation of the electromagnets 1700A-1700n across different sets M and maintain substantially steady state reaction platen control of the reaction platen 1510 levitated and propelled along the drive line DL 1 -DL8), from one set M to the different set M based on the pose of the reaction platen 1510; based on an identity characteristic (such as a shape / indicia (e g., facets, scallops, angles, chamfers, radius, etc., see, e.g., Fig. 2) or other suitable characteristic that uniquely characterizes the reaction platen identity from different from identity of each other reaction platen, such as described in application serial numbers 63 / 594,743 and 63 / 636,472 previously incorporated herein by reference) of each of the at least one reaction platen 1510, uniquely identifying and discriminating each reaction platen 1510 different from each other reaction platen 1510; and based on a trajectory of the at least one reaction platen 1510. The switching of the respective coil controller 199D effects de-energizing of electromagnets 1700A- 1700n of a preceding set M and energizing, from a de-energized state, of electromagnets 1700A- 1700n of a succeeding set M, such as along a trajectory of the reaction platen 1510.

[0052] The transport chamber 118 has a configuration, and employs the substrate transport apparatus 700, that may allow the process modules 120 to be mounted to the chamber 118 in a Cartesian arrangement with process modules 120 arrayed in substantially parallel vertical planes or rows. This may result in the processing apparatus 100 having a more compact footprint than a comparable conventional processing apparatus. The transfer chambers 118 described herein may be modular and capable of being coupled to each other directly or through one or more of load locks 116 and substrate handler stations 115 to provide a processing apparatus 100, 100A-100E having a transfer chamber with any desired length. For example, the length of the processing apparatus 100, 100A-100E is scalable (see Fig. 6) where the transfer chambers 118 are coupled to each other by one or more of load locks 116, substrate handler stations 115, or directly to each other to add any desired number of rows Yl-Yn of process modules 120 in order to increase throughput, such as in a manner similar to that described in United States patent number 11,476,139 issued on October 18, 2022 and United States patent application number 18 / 050,300Aty. Docket No. 390P017054-WO (PCT) filed on October 27, 2022, the disclosures of which are incorporated herein by reference in their entireties.

[0053] The environments of the respective transfer chambers 118 may be atmospheric, vacuum, ultra-high vacuum (e.g., 10’5Torr and below), inert gas, or any other environment that may correspond to the processes performed on the substrates S by the process modules 120 coupled to the respective transfer chambers 118. As can be seen in Fig. 6, where load locks 116 or substrate handler stations 115 couple the transfer chambers 118 to each other, the transfer chambers 118 may have the same (atmospheric, vacuum, same cleanliness level, etc.) or different (e.g., one vacuum and one atmospheric, two different vacuum levels, different cleanliness levels, etc.) environments therein where the substrates S are transferred between the different transfer chambers 118 and respective environments thereof through one or more of the load locks 116 and substrate handler stations 115. The substrate handler stations 115 may provide for transfer of the substrate handlers 110 (with or without substrate(s) held thereon) between the different environments of the coupled transfer chambers 118.

[0054] The transfer chamber(s) 1 18 may be capable of supporting any desired number of substrate handlers 110 therein and allowing the substrate handlers 110 to reach any desired processing chamber 120 and enter into any desired substrate handler station 115 coupled to the transfer chamber 118 without interfering with each other. This in effect may decouple the throughput of the processing apparatus 100 from the handling capacity of the transport apparatus 700 so that the processing apparatus 100 throughput may become processing limited rather than handling limited. Throughput can be increased as desired by adding process modules 120 and / or substrate handlers 110 on the same substrate processing apparatus platform.

[0055] Still referring to Figs. 1, 1A, 4, and 5, the transfer chamber 118 may have a general rectangular shape though the transfer chamber may have any other suitable shape. For exemplary purposes only, the transfer chamber 118 has a slender shape (i.e. length much longer than width) and defines a generally linear transport path for the transport apparatus 700 therein. The transferAty. Docket No. 390P017054-WO (PCT) chamber 118 has side walls 118S that form longitudinal sides (e.g., extending along the length of the transfer chamber 118) and lateral sides (e.g., extending along the width of the transfer chamber 118). The side walls 118S have transport openings or ports 1180 (also referred to as substrate pass through openings) formed there through. The transport ports 1180 are sized large enough to allow substrates S (and / or substrate handlers 110) to pass through the ports 1180 (which ports can be sealable by respective slot valves) into and out of the transfer chamber 118.

[0056] As can be seen in Figs. 1, 1A, 4, and 5, the process modules 120 may be mounted outside the side walls 118S with each process module 120 being aligned with a corresponding transport port 1180 in the transfer chamber 118. Each process module 120 may be sealed against the sides 118S of the chamber 118 around the periphery of the corresponding transport port 1180 to maintain the vacuum (or other atmosphere / environment) in the transfer chamber 118. The slot valve sealing each process module 120 is controlled by any suitable means, such as controller 199, to close the respective transport port 1180 when desired. The transport ports 1180, and process modules 120 coupled thereto, may be located in the same horizontal plane; however, the transport ports 1180 and process modules 120 coupled thereto may be disposed in different horizontal planes.

[0057] As seen in Figs. 1, 1A, 4, and 5, for exemplary purposes only, the load locks 116 and substrate handler stations 115 are mounted to the lateral chamber sides 118S. This may allow the load locks 116 and substrate handler stations 115 to be adjacent a respective EFEM 14 at opposite ends of the processing apparatus 100 (see Fig. 4), although one or more load locks 116 may be located at any other transport ports 1180 on the transfer chamber 118 such as shown for example in Fig. 7. The hexahedron shape of the transfer chamber 118 allows the length of the chamber to be selected as desired in order to mount as many process modules 120 as desired (for example see Figs. 1-6 showing exemplary configurations in which the transfer chamber 118 length is such to accommodate any number of process modules 120).Aty. Docket No. 390P017054-WO (PCT)

[0058] As noted before, and referring also to Figs. 13A-13C, the transfer chamber 118 illustrated in Figs. 1, 1A, 4, and 5-9 has a substrate transport apparatus (also referred to as a linear electrical machine) 700 having one or more substrate handler 110. The substrate transport apparatus 700 is integrated with the transfer chamber 118 and each substrate handler station 115 to translate substrate handler 110 throughout the transfer chamber 118, between connected transfer chambers (see, e.g., Fig. 6) and between the transfer chamber 118 and each of the substrate handler station 115. As can be seen in at least Figs. 13B and 13C, the substrate handler 110 of the substrate transport apparatus 700 has a reaction platen or base 1510 (e.g., that reacts forces imparted on the base by an array of electromagnets 1700) and a substrate holder SH (such as end effector 110E or any other suitable support such as supports 1431-1433, 1431A-1433A) for holding and transporting at least one substrate S. The reaction platen 1510 is of a paramagnetic, diamagnetic, or non-magnetic conductive material. The substrate handler 110 may be configured as a transfer arm 1 IOTA or a transfer cart 110C. When configured as a transfer arm 1 IOTA, the substrate holder SH of the one or more substrate handler 110 may be at least one end effector 110E configured for holding one or more substrates S (see, for example, Figs. 1, 1 A). When configured as a cart 110C, one or more substrate supports 1431-1433 are provided on the substrate handler 110 and are configured to stably hold a substrate (e.g., from the bottom or edge grip - see Figs. 12A-12C) in a manner similar to that described in United States patent application number 18 / 050,300 filed on October 27, 2022, the disclosure of which is incorporated herein by reference in its entirety. The cart 110C may be configured to hold more than one substrate in a vertical stack, where the cart HOC includes a multilevel frame 1440, each level including respective substrate supports 1431- 1433, 1431A-1433A.

[0059] At least the transfer chamber 118 and each substrate handler station 115 include respective linear tracks 1550 formed by respective arrays of electromagnets 1700 (i.e., the linear tracks 1550 extend from the transfer chamber 118 into each substrate handler station 115 so that substrate handlers 110 traverse or otherwise move from the transfer chamber 118 into the substrate handler station 115 and from the substrate handler station 115 to the transfer chamber 118 through aAty. Docket No. 390P017054-WO (PCT) respective slot valve). The electromagnets 1700 (and the distributed coils or actuators thereof) are configured so as to controllably levitate and propel the base 1510 (and the substrate handler 110 as a whole) along the at least one drive line DL1-DL8 (see, e.g., Fig. 1 A) in a controlled attitude relative to the drive plane DP (see Fig. 13C) of the substrate transport apparatus 700. The drive lines illustrated are exemplary and there may be more or less drive lines depending on one or more of a width of transfer chamber 118 and a number of process modules / load locks / substrate handling stations arranged along the length and width of the transfer chamber, where generally there may be at least one drive line for each process modules / load locks / substrate handling stations that provides substrate handler access to that process modules / load locks / substrate handling stations.

[0060] The substrate handlers 110 may be capable of transporting substrates S throughout the entire motion domain PTS in at least the transfer chamber 118 and substrate handler stations 115 of the processing apparatus 100, 100A, 100B, 100C without constraint from any robotic linkage mechanism (such constrained linkages include, for example, those found in SCARA robots, telescoping robots, frog-leg robots, and other conventional substrate transport robots). The movement of the substrate handlers 110 throughout the transfer chamber 118 and / or substrate handler stations 115 may be effected by a control apparatus, such as controller 199, that enables magnetic levitation of one or more substrate handler 110 without employment of magnets, bonding elements, bearings, or transmissions. The present disclosure is described with respect to induction levitation of the one or more substrate handler 110 however, the present disclosure may apply equally to other suitable types of electro or electro-magnetic levitation systems or any other suitable types of levitation that may be employed for moving substrate handlers and transporting substrates.

[0061] Referring to Figs. 1 and 2, the controller 199 has a distributed controls architecture, where the controller 199 includes a master controller 199M, one or more distributed controllers 199D, and a digital switching module (also referred to as a dynamic switch board) 199S. The controller 199 and the array of electromagnets 1700 (having any suitable number of distributed coils or actuators) may form a control and drive system for controlling movement of the one or moreAty. Docket No. 390P017054-WO (PCT) substrate handlers 110 of the substrate processing apparatus described herein. As can be seen in Figs. 1 and 2, the control and drive system has M coil or electromagnet sets. The M coil sets are located within the motion domain PTS of the substrate handlers 110. Energization of all coils (also referred to herein as electromagnets or actuators - see also Fig. 13C) in the M coil sets may not be required to levitate and move the one or more substrate handlers 110 because only a respective reduced set of coils overlaps with each location of each of the one or more substrate handlers 110. In view of this, the controller 199 provides a minimum number of distributed controllers U required to levitate and move the one or more substrate handlers 110 throughout the entire motion domain PTS, where the minimum number of distributed controllers U may not scale directly with the number of coils (e g., the number of distributed controllers is decoupled from the total number of coils). The minimum number of distributed controllers U is defined by the maximum number of coils required to be energized at the same time T, which in turn is defined in terms of the number of active substrate handlers S. For exemplary purposes only, the following nomenclature is provided:

[0062] M = the number of coil sets,

[0063] N = the number of coils per coil set,

[0064] O = the total number of coils (O = M x N),

[0065] P = the number of distributed controllers,

[0066] Q = the number of supported coils per distributed controller,

[0067] R = the required number of active coils per substrate handler,

[0068] S = the number of substrate handlers,

[0069] T = the maximum number of coils active at the same time (T = S x R), andAty. Docket No. 390P017054-WO (PCT)

[0070] U = the minimum number of distributed controllers required (U = ceil(T / Q)).

[0071] As can be seen in Fig. 1, the exemplary substrate processing apparatus 100 is illustrated in the form of a linear processing tool but the substrate processing apparatus may have any suitable configuration such as, but not limited to, a clustered configuration. For exemplary purposes only, the substrate processing apparatus has a total number of coils O equal to 210 coils (although there may be more or less than 210 coils), where the required number of active coils per substrate handler 110 is 16 coils (noting the number of active coils per substrate handler may depend on a levitated area or size of the substrate handler), the number of substrate handlers S is 2 (although there may be more or less than two substrate handers), and the maximum number of coils active at the same time T is 32 coils (i.e., S x R).

[0072] Referring also to Fig. 3, a conventional controls architecture that may be employed in a conventional substrate processing apparatus having a structure similar to substrate processing apparatus 100 is illustrated for comparison purposes only. For the comparison, both the conventional substrate processing apparatus and the substrate processing apparatus 100 may be configured as follows: the coil sets may be arranged such the number of coils sets M is 10 and the number of coils per coil set N is equal to 21 coils; the number of coils per distributed controller Q is 21 coils; and the minimum number of distributed controllers required U is 2 (i.e., ceil(T / Q)). With the controls architecture of Fig. 3 employed in the conventional substrate processing apparatus, the number of distributed controllers P is 10 distributed controllers, because, as illustrated in Fig. 3, there is one distributed controller 199D for each respective coil set and there are a total of 10 coil sets, all of which coil sets are required to move the substrate handlers 110 throughout the entire motion domain for each substrate handler 110.

[0073] As noted above, the minimum required number of distributed controllers U is 2 distributed controllers 199D for the substrate processing apparatus 100 ofFig. 1 (e.g., having a similar number of coil sets as that illustrated in Fig. 3). Referring again to Figs. 1 and 2, the controller 199 of the substrate processing apparatus 100 in accordance with the present disclosure has the controlsAty. Docket No. 390P017054-WO (PCT) architecture (as noted above and including, for example, the master controller 199M, dynamic switch board 199S, and distributed controller(s) 199D) that minimizes the number of distributed controllers 199D for the substrate processing apparatus 100 to the minimum required number of distributed controllers U while maintaining movement of each substrate handler 110 throughout the entire motion domain PTS. In the present disclosure, the coils of the coil sets are not directly connected to a respective distributed controller as illustrated in Fig. 3. Rather, in accordance with the present disclosure, and as illustrated in Fig. 2, the dynamic switch board 199S is provided and is configured to dynamically and selectively connect each of the distributed controllers 199D of the minimum number of distributed controllers U with one or more selected coils of the coil sets so as to form at least one virtual motion multi-phase actuator unit 3000, DLIM, DLIM2, DLIM3 (see Figs. 2A-2E) that propels at least one substrate handler 110 throughout the entire (or at least a portion of) the motion domain PTS.

[0074] Each coil of the coil sets is connected (e.g., through any suitable wired or wireless connection / network) to a respective terminal CNT (each of which may be referred to as a control terminal) of the dynamic switch board 199S. The two distributed controllers 199DA, 199DB are also connected to respective terminals CMD (each of which may be referred to as a command terminal) of the dynamic switch board 199S such that each of the distributed controllers 199DA, 199DB (of the minimized number of distributed controllers) may be dynamically and selectively coupled, as described herein, to any of the coils of the coil sets through the dynamic switch board 199S for providing movement of the one or more substrate handlers 110 throughout the entire range of the motion domain PTS. As can be seen in Fig. 2, each of the command terminals CMD (and the distributed controllers 199DA, 199DB) are coupled to, what may be referred to as a bus, which bus commonly connects each of the distributed controllers 199D to each of one or more digital switches (i.e., there is one switch or set of switches for each of the control terminals CNT and the respective coil set), so that each of the distributed controllers 199D can be selectively coupled to any one (or more) of the distributed coil of the coil sets. The multiple switches are actuated as described herein to selectively couple one or more coils of a respective coil set to aAty. Docket No. 390P017054-WO (PCT) selected one of the distributed controllers 199DA, 199DB. While the switches of the dynamic switch board 199S are described herein as digital switches, any suitable switches or switching devices (and combinations thereof) may be employed.

[0075] As noted above, the number of coils (in the example provided) that may be controlled by each distributed controller 199D is 21 coils, but more or less than 21 coils may be controlled by each distributed controller. The switches of the dynamic switch board 199S may be controlled by the master controller 199M, depending on a location and pose of the substrate handler 110 being controlled, such that a single distributed controller 199D is coupled to a single coil set or simultaneously coupled to two coils sets (i.e., through two actuated switches) such that the distributed controller 199D controls at least one coil from one or more of the coil sets. This control scheme may be referred to as dynamic phase allocation and is described in greater detail herein. The coils sets simultaneously connected to the same (i.e., a common) distributed controller 199D may be adjacent coil sets where the control of at least one coil from each of the adjacent coil sets by the same distributed controller 199D provides fortransition of a substrate handler 110 from one of the adjacent coil sets to the other of the adjacent coil sets along a predetermined trajectory of the substrate handler 110 within the substrate processing apparatus described herein.

[0076] The master controller 199M is configured (with any suitable non-transitory computer program code including, but not limited to, any suitable algorithms, state machines, and neural networks) to selectively actuate the switches of the dynamic switch board 199S. Each one of the distributed controllers 199D (in the example illustrated in Fig. 2, distributed controllers 199DA, 199DB) can be dynamically and selectively connected to any one of the coils of the coil sets of the entire substrate processing apparatus 100 without exceeding the hardware limit on the number of oils per controller Q (which in the example provided is 21 coils). As the substrate handler(s) move throughout the motion domain PTS of the substrate processing apparatus 100 the master controller 199M determines (e.g., with the non-transitory computer program code), based on the location, pose, and desired trajectory of the substrate handler 110 being controlled, the appropriate states of each switch of the dynamic switch board 199S so that the desired coils are connected to appropriateAty. Docket No. 390P017054-WO (PCT) channels on each distributed controller 199DA, 199DB. The dynamic switch board 199S effects decoupling the number of distributed controllers 199DA, 199DB from the total number of coils O.

[0077] For exemplary purposes, with the controls architecture illustrated in Fig. 2 and the substrate processing apparatus 100 configured as shown in Fig. 1, the required (i.e., minimized) number of controllers may be calculated as follows:

[0078] O = the total number of coils = 210 coils,

[0079] Q = the number of supported coils per controller = 21 coils per controller (using the coil sets as configured in Figs. X, Y, and Z for exemplary purposes where each coils set has a 3 x 7 array coils),

[0080] R = the required number of active coils per substrate handler = 16 coils,

[0081] S = the number of substrate handlers = 2 substrate handlers,

[0082] T = the maximum number of coils active at the same time (T = S x R) = 32 active coils, and

[0083] U = the minimum number of controllers required (U = ceil(T / Q)) = 2 controllers.

[0084] The controls architecture of the present disclosure may provide for a minimized number of distributed controllers U (each distributed controller 199DA, 199DB in the example provided being configured to activate 21 coils), where 32 coils are or can be active at all times (e.g., for the operation of two substrate handlers).

[0085] While each coil set is shown as having 21 coils and each the distributed controller is described as being configured to activate 21 coils, the coil sets may have any suitable number of coils and each distributed controller may be configured to activate a number of coils that is substantially the same as the number of coils in each coil set.Aty. Docket No. 390P017054-WO (PCT)

[0086] While two substrate handlers 100 (see substrate handlers 110A, HOB in Fig. 2) are described, the substrate processing apparatus may be configured with more or less than two substrate handlers and, per the minimum number of controllers determination described herein the minimum number of controllers may be more or less than two controllers.

[0087] Given the exemplary hardware / structural configuration of the substrate processing apparatus 100 of Fig. 1, only two distributed controllers 199DA, 199dB may be required for operation of the two substrate handlers 100 A, 100B because the two distributed controllers can together energize one through forty-two (e.g., up to forty-two) coils concurrently (e.g., with dynamic phase allocation), which may be enough to support the control of the two substrate handlers 100A, 100B throughout the entire motion domain PTS. For a comparison, with the exemplary hardware / structure illustrated in the substrate processing apparatus 100 of Fig. 1, the aspects of the present disclosure can reduce, with the addition of the dynamic switch board 199S, the required number of distributed controllers from ten distributed controllers (as illustrated in Fig. 3) to two distributed controllers (as illustrated in Fig. 2) which is about an 80% reduction in distributed controllers.

[0088] The architecture of the dynamic switch board 199S may be simpler than that of a distributed controller and may provide a reduction in cost of the substrate processing apparatus 100 compared to the conventional substrate processing apparatus having the conventional controls architecture illustrated in Fig. 3. Still referring to Fig. 2, the dynamic switch board 199S may have any suitable components that configure the dynamic switch board 199S to transfer power and / or data between the coils and the distributed controllers 199D, 199DA, 199BD and to provide data communication between the dynamic switch board 199S and the master controller 199M. For example, the dynamic switch board 199S includes a digital input board 199SB populated with power circuits 199SP (such as, but not limited to, field-effect transistors orFETs) whose state (e.g., on or off) is digitally controlled by the master controller 199 (e.g., depending on the location and pose of a substrate handler 110 being controlled) such as through an EtherCat® or other suitable data network. The master controller 199M transmits data over the data network, where the dataAty. Docket No. 390P017054-WO (PCT) includes a digital I / O “switch word” that embodies a desired switch configuration at any given time for operating the substrate handler(s) 110. The switch word establishes the states of each digital switch of the dynamic switch board 199S such that the desired connections between the coils and the distributed controllers 199D, 199DA, 199BD are established. The master controller 199M may be configured (with the suitable non-transitory computer program code) to effect changes in the switch states (e g., between the on and off states) so that the desired coils are controlled by the respective distributed controller 199D, 199DA, 199DB in a manner in which the motion and / or levitation (or other desired action) of a desired substrate handler 110 is undisrupted. The changes in the state of a desired switch from the off state to the on state may be effected by the master controller 199M in advance of power transfer so that power may be transferred through the actuated switch so as to substantially eliminate undesirable transients from changing states of the switches and transfer of power to the respective coils that may affect motion of the substrate handler(s). Similarly, changes in the state of a desired switch from the on state to the off state may be effected by the master controller 199M in advance of power to the desired switch being disabled so as to substantially eliminate undesirable transients from changing states of the switches and transfer of power to the respective coils that may affect motion of the substrate handler(s) 110.

[0089] As described herein, the master controller 199M controls the switches of the dynamic switch board 199S depending on the location and pose (e.g., in six degrees of freedom motion) of each of the substrate handlers 110 along a respective trajectory of the substrate handlers 110. To determine the location and pose of the substrate handlers 110, the substrate processing apparatus includes one or more substrate handler position sensors 177 (see Fig. 1) connected to the master controller 199M over, for example, the data network. Position data embodying the location and pose, in the six degrees of freedom motion, of each substrate handler 110 in the substrate processing apparatus 100 is received by the master controller 199M from the one or more substrate hander position sensors 177. The master controller 199M is configured to, based on the location and pose data, determine the location and pose of each substrate handler 110 in the substrate processing system 100 for effecting actuation and / or de-actuation of the switches of the dynamicAty. Docket No. 390P017054-WO (PCT) switch board 199S according to a predetermined trajectory (corresponding to any suitable substrate processing recipe) of each substrate handler 110 through the entire range (or a least a portion thereof) of the motion domain PTS.

[0090] The one or more substrate handler position sensors 177 may include, but are not limited to, one or more of vision sensor(s) 177V, distance sensor(s) 177S, induction sensor(s) 177D, and any other suitable sensors configured to determine a location and pose (e.g., in the six degrees of freedom) of the substrate handler(s) 110. The vision sensor(s) 177V may be any suitable machine vision sensor(s) including, but not limited to, time of flight camera(s) and stereo-vision camera(s) where the master controller 199M is configured with any suitable non-transitory machine vision / image recognition algorithms for determining the location and pose of the substrate handler(s) 110 in the six degrees of freedom motion based on the position data from the vision sensor(s) 177V. The distance sensor(s) 177S may be any suitable optical and / or acoustic distance sensors including, but not limited to, sonar, radar, Lidar, and laser scanners where the master controller 199M is configured with any suitable non-transitory computer program code for determining the location and pose of the substrate handler(s) 110 in the six degrees of freedom motion based on the position data from the distance sensor(s) 177S. The induction sensors 177D may be formed, at least in part, by the distributed coils of the coil sets where, for example, the master controller 199M is configured to employ a measure of inductance (or any other suitable characteristic such as inductance, a phase lag / amplitude, and / or a coil power factor) from the coils interacting with the substrate handler(s) 110 to determine the location and pose of the substrate handler(s) in the six degrees of freedom motion in a manner substantially similar to that described in United States patent application number 18 / 050,300 filed on October 27, 2022, the disclosure of which is incorporated herein by reference in its entirety.

[0091] Referring to Figs. 10A, 10B, 11A, 1 IB, while the transfer chamber 118 has been described above as a longitudinally extended chamber that forms part of a linear processing tool, the transfer chamber may have a cluster tool configuration, where the present disclosure described herein may be applied to the cluster tool configuration. For example, referring to Figs. 10A and 10B theAty. Docket No. 390P017054-WO (PCT) transfer chamber 118T1 has a substantially square configuration (although the transfer chamber may have any suitable shape such as hexagonal, octagonal, etc.). The transfer chamber 118T1 may include an electrical machine 700R (substantially similar to the linear electrical machine 700) configured as a side-by-side transport apparatus that includes at least two side-by-side substrate handlers 110A, HOB. The substrate handlers 110A, HOB are substantially similar to substrate handler 110 described herein. The array of electromagnets 1700 is configured to move the substrate handlers 110A, HOB so that the substrate handlers 110A, HOB rotate about common axis of rotation 1277 (such axis being akin to a 9 axis of, for example, a conventional SCARA type robot) for changing a direction of “extension and retraction” (the terms extension and retraction are being used herein for convenience noting that the extension and retraction is effected by linear propulsion movement of the substrate handler 110, 110A, 110B along a respective drive line) of the side-by-side transport apparatus. For example, the array of electromagnets 1700 has an arrangement that forms drive lines 177, 178, 179, 180. The drive lines 177, 178 may be spaced from one another and substantially parallel to one other so as to be substantially aligned with a respective transport openings 118OA, 118OF and 118OB, 118OE (at least one of which may have a substrate handling station 115 coupled thereto). The drive lines 179, 180 are substantially orthogonal to drive lines 177, 178 and are spaced from one another and substantially parallel to one other so as to be substantially aligned with a respective transport openings 118OC, 118OH and 118OD, 118OG. The drive lines can be in any suitable pattern (such as arced or curved segments with constant or varying radii) and orientation and the description that follows is for nonlimiting exemplary purposes. The electromagnets 1700A-1700N (illustrated in Fig. 10A but not numbered for clarity of the figure) provide for at least linear propulsion of the substrate handlers 110A, 110B through the transport openings 118OA-118OH. The array of electromagnets 1700 also includes rotational electromagnet sub-arrays 1231-1234 that effect, under control of controller 199 and with the electromagnets that form the drive lines 177-180, the rotation of the substrate handlers 110A, HOB about the common axis of rotation 1277. Alternatively, the electromagnets may form a dense enough and large enough grid without being specifically designated for propulsion or rotation and can perform that function based on the base’s 1510 position and thePage 25 f 54Aty. Docket No. 390P017054-WO (PCT) control law of the controller 199. While the substrate handlers 110A, HOB may rotate about the common axis of rotation 1277 at the same time, extension and retraction of the substrate handler 110A, HOB may be independent of extension and retraction of the other one of the substrate handler 110A, HOB. In general, the motion of each substrate handler 110A, 110B is independent of each other substrate handler 110A, HOB and the complexity of that motion can range from one degree of freedom motion to six degrees of freedom motion.

[0092] Referring to Fig. 10B, the electrical machine 700R may include multiple transport levels 1220A, 1220B that are stacked one above the other. Each level 1220A, 1220B is formed by a respective level support 1221 each having a respective reference plane 1299R that is substantially parallel with the level reference plane 1299 of the transfer chamber 118T1 frame 118M. Each level support 1221 includes an array of electromagnets 1700 substantially similar to that illustrated in Fig. 10A for linearly driving the side-by-side substrate handlers 110A, HOB along drive lines 177-180 and rotating the side by side substrate handlers 110A, HOB (e.g., with full six degree of freedom control) about the common axis of rotation 1277. Each level support 1221 is coupled to a common Z axis drive 1211 that moves the level supports 1221 and the substrate handlers 110A, 110B thereon in the Z direction so as to align the end effectors 1 10E of the substrate handlers 110A, HOB on the respective level supports 1221 with a substrate transport plane 1290 of the transport openings 1180 of the transfer chamber 118T1. The Z axis drive 1211 may be any suitable linear actuator such as a screw drive, electromagnetic drive, pneumatic drive, hydraulic drive, etc.

[0093] Referring to Figs. 11A and 1 IB, the transfer chamber 118T2 has a substantially hexagonal configuration (although the transfer chamber may have any suitable shape as noted herein). The electrical machine 700R is configured as a radial transport apparatus that includes a substrate handler 110 having a double ended / sided end effector HOED (although a single ended / sided end effector may be employed). The array of electromagnets 1700 is configured to rotate the substrate handler 110 about axis of rotation 1377 (such axis being akin to a 0 axis of, for example, a conventional SC ARA type robot) for changing a direction of “extension and retraction” (the termsAty. Docket No. 390P017054-WO (PCT) extension and retraction are being used herein for convenience noting that the extension and retraction is effected by linear propulsion movement of the substrate handler 110 along a respective drive line), and linearly propel the substrate handler 110 so as to extend through the transport openings 118OA-118OF. For example, the array of electromagnets 1700 has an arrangement that forms radially offset drive lines 177, 178, 179, where an angle a between adjacent drive lines may depend on the number of sides / facets of the transfer chamber 118T2 on which the transport openings 118OA-118OF are located (again, at least one of the transport openings may have a substrate handler station 15 coupled thereto). The electromagnets 1700A-1700N (illustrated in Fig. 10A but not numbered for clarity of the figure) provide for at least linear propulsion of the substrate handler 110 through the transport openings 118OA-118OH and rotation of the substrate handler 110 about axis of rotation 1377 with full six degree of freedom control so as to maintain linear transport and rotation in a desired attitude in pitch and roll.

[0094] Referring to Fig. 1 IB, the electrical machine 700R includes multiple transport levels 1320A, 1320B that are stacked one above the other in a manner substantially similar to that described above with respect to Fig. 10B. For example, each level 1320A, 1320B is formed by a respective level support 1321 each having a respective reference plane 1299R that is substantially parallel with the level reference plane 1299 of the transfer chamber 118T1 frame 118M. Each level support 1321 includes an array of electromagnets 1700 substantially similar to that illustrated in Fig. 11A for linearly driving (along drive lines 177-179) and rotating (about axis 1377) the substrate handler 110. Each level support 1321 is coupled to a common Z axis drive 1311 (that is substantially similar to Z-axis drive 1211) that moves the level supports 1321 and the substrate handler 110 thereon in the Z direction so as to align each of the end effector HOED of the substrate hander 110 on the respective level supports 1321 with a substrate transport plane 1390 of the transport openings 1180 of the transfer chamber 118T2.

[0095] Referring to Figs. 10B and 1 IB, the vertical motion provided by the Z actuator 1211, 1311 can be used for enabling the substrate handler 110A, HOB to perform wafer handoff operations such as pick or place to / from a wafer process station. The supports 1221, 1321 can include a singleAty. Docket No. 390P017054-WO (PCT) module (level) with the purpose of providing additional elevation capability to the substrate handler 110A, HOB to achieve larger vertical strokes during the wafer handoff operations. For example, in the case of process modules or load locks that have more than one stacked wafer slot, it would be advantageous to have a vertical lift apparatus such as Z-axis actuator 1211, 1311 to be able to reach each of the stacked wafer slots without increase of applied levitation power provided by the electrical machine 700R.

[0096] Referring to Figs. 10B and 1 IB, the vertical lift apparatus (or Z-axis actuator) 1211, 1311 and level 1221, 1321 may have dual (or more) separate and independently operable apparatus, e.g., one for each substrate handler 110. This may provide the ability to perform independent vertical strokes for different substrate handlers that can access different slots on at least two independent stations (e.g., process modules, load locks, etc.).

[0097] As described herein, and referring also to Fig. 14, linear propulsion of the substrate handler 110 is generally provided by one or more linear tracks 1550 (see, e.g., Figs. 1, 1A, 8, 10A, 1 1A, 12, 12A) of independently controlled electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2- 1700n2, 1700A3- 1700n3, 1700A4-l 700n4, 1700A5-1700n5. The number of electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5- 1700n5. Where there is more than one linear track 1550 the linear tracks 1550 may be substantially parallel to each other and may be spaced apart from one another (see also, e.g., Fig. 8) depending on dimensions of the base 1510 and / or a desired accuracy of substrate handler positioning, noting spacing PX2, PX3 provides greater positioning accuracy in areas of substrate handoff than spacing PX1, PX4 in areas of substrate transport) so as to control all six degrees of freedom (roll, pitch, yaw (T), and translation in each of the X, Y, Z directions) of the substrate handler in space. For example, as illustrated in Fig. 14, the electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2- 1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5-1700n5 may be spaced apart from each other so that two or more electromagnets 1700A-170011, 1700Al-1700nl, 1700A2-1700N2, 1700A3- 1700n3, 1700A4-1700n4, 1700A5-1700n5 (cooperating so as to form a motor actuator (e g., the motor primary) 1701 and in combination with the base (e.g,, the motor secondary) 1510 the motor)Page f 54Aty. Docket No. 390P017054-WO (PCT) of each parallel linear track 1550 are disposed underneath the base 1510 at all times in the direction of motion of the base 1510 so as to stably levitate and propel the base 1510 (as may be realized, Fig. 14 schematically illustrates a representative configuration of the system, and are provided to show generally an exemplary representation of the interrelationship between the base 1510 and the electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2- 1700N2, 1700A3- 1700113, 1700A4- 1700n4, 1700A5-1700n5, and is not intended as limiting in any way)

[0098] The size, numbers, and spacing (e.g., pitch - see for example Fig. 8) of the electromagnets 1700A-1700n, I700A1-1700nl, 1700A2-1700N2, 1700A3-1700n3. 1700A4-1700n4, 1700A5- 1700n5 in both the X and Y axes may vary, as may the size and shape of the base 1510 in relation to the electromagnets 1700A-1700n, 1700A1-1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5-1700n5. For example, referring to Figs. 8 and 14, the spacing between the electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4- 1700n4, 1700A5-1700n5 may vary’ between pitch PX1 and pitch PX2 where the pitch PX2 is smaller than pitch PX1 and provides for greater definition of movement of the base 1510 and substrate handler 110. The larger pitch (or greater distance between electromagnets) such as pitch PX1 is employed for long movements of the substrate handler 1 10 where position location of the substrate handler 110 is to be grossly known. In areas where picking and placing of substrates S occurs (or other areas where substrate handler position is to be known with increased position definition / accuracy), such as at the process module 120, the spacing or pitch PX2 between the electromagnets is decreased to provide a higher electromagnet density that effects greater definition of position location of the substrate handler 1 10 (compared to the definition of position location provided by electromagnets spaced apart by the larger pitch PX1) so that the substrate handler 110 picks and places substrates S at the process module 120 with sub-micron position accuracy. In the examples illustrated the pitch PX of the electromagnets 1700A-1700n, 1700A1- 1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5-1700n5 is shown as varying in the X direction along the longitudinal length of the transfer chamber 1 18 to provide varying degrees of substrate handler position accuracy; however, the pitch of the electromagnetsAty. Docket No. 390P017054-WO (PCT)1700A-1700n, 1700Al-1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5- 1700115 may also vary in the Y direction (see pitches PX3 and PX4) along a lateral width of the transfer chamber 118 so as to provide increased accuracy with respect to substrate handler 110 rotations and / or Z axis height movements. For example, in the areas where picking and placing of substrates S occurs (or other areas where substrate handler position is to be known with increased position definition / accuracy) the pitch between electromagnets may be a decreased pitch PX3 compared to a pitch between the electromagnets in the areas of long motions (e.g., motions between substrate holding stations) where substrate handler rotations and Z height motions are not desired

[0099] As illustrated in Figs. 8 and 14, the array of electromagnets 1700 may also include stabilization tracks 155OS disposed laterally outward of the tracks 1550. In Fig. 16 the stabilization tracks 1550S may be formed by one or more rows of the electromagnets 1700A-1700n, 1700.A1- 1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5-1700n5. The stabilization tracks 1550S may be substantially similar to the tracks 1550 and are configured to provide additional stabilization of the base 1510 through the generation of additional lift and / or propulsion forces (e g., in addition to the lift and propulsion forces generated by electromagnets of the parallel linear tracks 1550) that act on the base 1510. The result is a substrate handler 110 that can move along a direction of the tracks 1550 (i.e., the propulsion direction) while changing orientation in one or more of roll, pitch and yaw. According to magnetic induction principles where the electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2- 1700N2, 1700A3-1700n3, 1700A4- !700n4, 1700A5-1700n5 are akin to the ‘"primary” and the base 1510 corresponds to the “secondary” where electrical currents are induced by means of Eddy current effects.

[0100] The electromagnets 1700A-1700n, 1700Al-1700nl, 1700A2-1700N2, 1700A3-1700n3, 1700A4-1700n4, 1700A5-1700n5 can be physical electromagnets / coils that can be dynamically configured when it comes to the respective “phase” definitions of each coil with respect to “phase” definiti ons of the other electromagnets / coils of the given motor actuator unit so that the position of the given motor actuator unit (formed of cooperative excitation phases of the motor underAty. Docket No. 390P017054-WO (PCT) propulsion) may be deemed as moving virtually in unison with the base propulsion, though the physical electromagnets / coils are fixed (e.g., static) as will be described further below. This may provide continuity in the desired force vectors for motion control of the substrate handler.

[0101] The present disclosure employs the array of electromagnets 1700 to magnetically levitate and drive (e.g., along any suitable motion path or trajectory) the substrate handler 110 with electromagnetic induction in a manner substantially similar to that described in United States patent application number 18 / 050,300 filed on October 27, 2022, the disclosure of which is incorporated herein by reference in its entirety. Referring to Fig. 13A, the present disclosure separates the array of electromagnets 1700 from the substrate handler 110 with a non-magnetic isolation wall 4400 (see Fig. 13 A - such as the floor 118L of the transfer chamber 118, or where the array of electromagnets 1700 are located on lateral sides of the transfer chamber 118 the side walls form the non-magnetic isolation wall). Examples of suitable materials from which the nonmagnetic isolation wall may be constructed include, but are not limited to, the 300-series stainless steel (as described herein), the low conductivity aluminum such as an 6061 series aluminum (as described herein), or any other suitable non-magnetic material). The non-magnetic isolation wall facilitates the induction of Eddy currents on the base 1 10 (located within the sealed environment of the transfer chamber 118) from the alternating magnetic field generated by the array of electromagnets 1700. The non-magnetic isolation wall may isolates the array of electromagnets from the environment within the transfer space of the transfer chamber 118.

[0102] Referring now to Figs. 2A and 2B, an exemplary control of the array of electromagnets 1700 will be described where dynamic phase allocation is employed. As described herein, the master controller 199M and distributed controllers 199DA, 199DB of the controller 199 are operably coupled to the array of electromagnets 1700 and a power source, such an alternating current power source 1585 (the power source may be any suitable type and can be direct current in which case the controller driving circuit will modulate that to desired frequency / phase for as many alternating current power phases as desired). The master controller 199M and distributed controllers 199DA, 199DB are configured so as to sequentially excite the electromagnets 1700A-Aty. Docket No. 390P017054-WO (PCT)1700n of the array of electromagnets 1700 with multiphase alternating current so that the base 1510 of a substrate handler 110 is levitated and propelled with at least one of attitude control and yaw control with a common set of the electromagnets 1700A-1700n (such as those electromagnets of a respective drive line 177-180, DL1-DL8 - see, e.g., Figs. 1A and 10A). As noted above, the master controller 199M is configured to sequentially excite (e.g., via switching effected with the dynamic switch board 199S) the electromagnets 1700A-1700n cooperating in multi-phase alternating current excitation that form motor actuator units 1701 corresponding to the position of the base 1510 as determined based on the data obtained from the one or more substrate handler position sensors 177 described herein. The number n (an integer, which in the example is three or more, though it may be two or more) of electromagnets 1700A-1700n of each motor actuator unit 1701 as well as the location (static) of the respective n electromagnets 1700A-1700n of each motor actuator unit 1701 are dynamically selectable by the controller 199 in effecting lift and propulsion of the base 1510 at any given time throughout operation of the motor actuator. Each of the electromagnets 1700A-1700n generates, from excitation with common multiphase alternating current having a single common frequency per phase, both the separately controllable levitation and the propulsion forces against the base 1510 so as to control the base 1510 with one, two, three, four, five, or six independent degrees of freedom including at least one of attitude and yaw at least with the base 1510 levitated. The common single frequency per phase of each phase (here respective phases A, B, C) may be selectably variable from different desired excitation frequencies so that levitation and propulsion forces generated by the motor actuation unit 1701 enable substantially independent control of the base 1510 in each of the one, two, three, four, five, or six independent degrees of freedom. The controller 199 may control the roll, pitch, and yaw angles generated by the array of electromagnets 1700A-1700n arranged in the respective motor actuator units 1701, including at least the attitude with the base 1510 levitated and propelled so as to move relative to the array of electromagnets 1700 along the at least one drive line 177-180, DL1-DL8 from a first predetermined position Pl (see Fig. 1 A) with respect to the frame 118M of the chamber 118 to a second different predetermined position P2 (see Fig. 1A) with respect to the frame 118M of the chamber 118. The controller 199 may control the roll, pitch, and yaw angles generated byPage f 54Aty. Docket No. 390P017054-WO (PCT) the array of electromagnets 1700, including at least the base 1510 attitude and the base 1510 yaw with the base 1510 levitated and stationary relative to the array of electromagnets 1700 in a predetermined position (such as position P2 in Fig. 1A) along the at least one drive line 177-180, DL1-DL8 with respect to the frame 118M of the chamber 118.

[0103] Referring also to Figs. 2B, 2C and 2D, an illustrative example is shown where each electromagnet (or coil) 1700A-1700n is grouped so as to define a motor actuator unit 1701. The grouping of the electromagnets 1700A-1700n is effected by dynamically activating / deactivating the swatches of the dynamic switch board 199S corresponding to the coils of the desired motor actuator unit 1701 as described herein and depending on, for example, the location and pose of a substrate handler 1 10 being controlled and / or a predetermined trajectory / of the substrate handler 110. The motor actuator unit 1701 has a dynamically selected (e.g., such as effected through the dynamic switch board 199S) number of electromagnets, for example three electromagnets (n 3 ) and three corresponding phases (m=3) with an electrical angle between the phases of 120° (see also Fig. 15) is also dynamically associated with the three different phases A, B, C so that association of each phase A, B, C with the corresponding static electromagnet 1700A-1700n comports with the dynamic state of the motor actuation unit 1701 Accordingly, with the electromagnets of the motor actuator unit 1701 propelling the base 1510 (e.g., along direction 3100 and under control of at least one distributed controller 199DA, 199DB of the minimum number of distributed controllers U and with the dynamic switch board dynamically connecting and disconnecting the actuators to and from the at least one distributed controller 199DA, 199DB so as dynamically form the motor actuator unit 1701 and effect generation of a virtual (motion) multiphase actuator) each phase A, B, C respectively changes or moves from one static electromagnet to another (i.e., rolling the designation or allocation of the respective phases to consecutive electromagnets 1700A-1700n so as to generate a virtual (motion) multi-phase actuator 3000, 3000tPi, 3000tP2 of each of the linear electrical machine 700 and the electrical machine 700R proceeding in the direction of motion 3100 commensurate with motion of the base 1510 generated by the excitation of the electromagnets 1700A-1700n corresponding to the virtual motion multi-Page f 54Aty. Docket No. 390P017054-WO (PCT) phase actuation unit 3000, 3000tPi, 3000tP2. This dynamic relationship or association producing the virtual motion multi-phase actuator unit 3000, 3000tPi, oOOOtPr between coils and phase will be referred to here for convenience as “dynamic phase allocation” wherein the virtual motion of the representative virtual motion multi-phase actuator unit 3000, 3000tPi, 3000tP2 effecting propulsion of the base 1510 is illustrated schematically in Fig. 2B (see also Fig. 2A). The virtual motion multi-phase actuator / position sensing emit (or “MALT in Fig. 2A) 3000 has dynamically selected three electromagnets and associated phases A, B, C, shown in an initial (representative) position 1’ 0 at time I 10.

[0104] The respective excitation of the virtual motion multi-phase actuator unit 3000 electromagnets generate propulsion forces that move the platen / base 1510 between tl and t2 (see also Figs. 2C and 2D). As shown, at P=0 and t=tO, electromagnets 1700A-1700C are grouped (via the dynamic switch board 190S where the switches are actuated according to commands from the master controller I99M as described herein) to form virtual motion multi-phase actuator unit 3000, and are respectively associated with phases A, B, C. Coincident with generation of propulsion forces Fx, respective excitation of virtual motion multi -phase actuator unit 3000 electromagnets 1700A-1700C generate separately controllable lift forces Fy with a controlled variable height relative to the platen / base 1510, that simultaneously lifts and effects tilt adjustment of the platen / base 1510 simultaneously with propulsion (see Figs. 2C and 2D). As may be realized, under effect of the lift Fy and propulsion Fx forces imparted by the respective electromagnets 1700A- 1700C of the virtual motion multi-phase actuator unit 3000 at time t=tO and position P=0 the platen / base 1510 moves (relative to the transfer chamber and hence the static electromagnets 1700A-1700C) with a predetermined lift and tilt. To maintain steady state tilt of the platen / base 1510 during motion away from the group of electromagnets 1700A-1700C (defining virtual motion multi-phase actuator unit 3000 at P=0 and T=T0) the controller 199 and circuitry 3050, of the respective electromagnets of the electromagnet array 1700A-1700n, are configured to dynamically “move” (or “change”) the allocation of the respective phases A, B, C (from the initial virtual motion multi-phase actuator unit 3000 at P=0 and t=tO) commensurate with the travel ofAty. Docket No. 390P017054-WO (PCT) the platen / base 1510 at time t==tl and position P=;l to corresponding electromagnets 1700B-1700D that now define virtual motion multi-phase actuator unit 3000tP1 disposed at position P==l at time t=tl, and subsequently allocation of the respective phases A, B, C (from the virtual motion multiphase actuator unit 3000tPl at P= 1 and i l l ) commensurate with the travel of the platen / base 1510 at time t=t2 and position P=2 to corresponding electromagnets 1700C-1700E that now define virtual motion multi-phase actuator unit 3000tP2 disposed at position P:=:2 at time t=t2, and so on. Dynamic phase allocation is repeated throughout platen / base 1510 motion so that the phase distribution with respect to the platen, and excitation by respective phases (here A, B, C) of the platen / base 1510 remain substantially steady state throughout motion of the platen / base 1510.

[0105] The virtual multi-phase actuator / position sensing unit 3000, 3000tPi, 3000tP2 may comprise a series of electromagnets 1700A-1700n of the array of electromagnets 1700 coupled to at least the multiphase alternating current power source 1585 that define at least one drive line 177-180 (see, e.g., Fig. 10A, which as noted herein are substantially similar to drive lines DL1- DL8, see, e.g., Fig. 1A) within the drive plane DP (see Fig. 13C), where electromagnets 1700A- 1700n in the series of electromagnets 1700A-1700n are dynamically grouped into at least one multiphase actuator unit DLIM1, DLIM2, DLIM3 (via the dynamic switch board as described herein), and each of the at least one multiphase actuator unit DLIM1, DLIM2, DLIM3 being coupled to at least the multiphase alternating current power source 1585. In this case, on initiating propulsion (effecting motion of the base / secondary) by excitation of corresponding electromagnet groups of the motor actuation unit at an initial position (P=0, t=0) the definition of phases A, B, C and the associated “motors” (e.g., DLIM1, DL1M2, DLIM3) are changing in space and time (Pi, ti), as described above, in order to maintain substantially steady state force vectors FZ1, FZ2, FX1, FX2 imparted on the base 1510 throughout the range of motion within the motion domain PTS, that provide a desired substantially steady state or constant tilt orientation of the substrate handler 110 throughout the range of motion. As noted herein, an exemplary' actuator control system network 1799 configured to effect dynamic phase allocation is described with respect to Fig. 2A. As can be seen in Figs. 2C and 2D, the dynamic phase allocation is controlled by the controllerAty. Docket No. 390P017054-WO (PCT)199 so that the respective electromagnets 1700A-1700n grouped into corresponding motor actuation units (such as described herein is effected by dynamically and selectively connecting the minimized number of distributed controllers 199DA, 199B to the coils via the dynamic switch board 199S) energized by the multiphase alternating current A, B, C present, with respect to the base 1510 (represented by the front portion 3110 and rear portion 3111), a substantially steady state multiphase distribution across respective electromagnets 1700A-1700n of the virtually moving at least one multiphase actuator unit DLIM1, DLIM2, DLIM3. It is noted that the phase currents A, B, C are illustrated within respective electromagnets 1700A-1700n and the phase current distribution across the at least one multiphase actuator unit DLIM1, DLIM2, DLIM3 remains constant or steady state with respect to the base 1510 (e.g., as an example of steady state note phase current A remains at the trailing end of the rear portion 3111, phase current C remains at the leading end of the rear portion 3111, and phase current B remains in the center of the rear portion 3111 throughout movement of the base 1510 and the at least one (virtually moving) multiphase actuator unit DLIM1, DLIM2, DLIM3 in the direction 3100).

[0106] In greater detail of dynamic phase allocation, Fig. 2B depicts at time tl electromagnets 1700A, 1700B, 1700C which are respectively defined as phases A, B, C (Figs. 2B and 2C) which generate a spatial force vector(s) that provides separately controllable lift and propulsion forces of a predetermined substrate handler 110 (i.e., a substrate handler identified by its unique signature as determined by the predetermined excitation characteristic (such as, e.g., a phase lag) of the electromagnets and selected for movement by the controller 199). As the substrate handler 110 moves in space (e.g., along the drive line associated with the array of electromagnets 1700), at time t2 electromagnets 1700B, 1700C, 1700D respectively become phases A, B, C (Figs. 2B and 2D). As the substrate handler 110 continues to travel along the drive line (which in this example is in direction 3100 as shown in Figs. 2C, 2D, and 2E), at time t3 phases A, B, C are associated with electromagnets 1700C, 1700D, 1700E, respectively. This dynamic phase allocation effects continuous spatial and time control of the force vectors that maintain propulsion, lift, and orientation of the predetermined substrate handler 110. The alternating current power source 1585Aty. Docket No. 390P017054-WO (PCT) may be coupled to each of the electromagnets 17C)0A~1700n of the array of electromagnets 1700 through any suitable signal conditioning circuitry 3050 which may include current amplification power supply units 3011 or any other suitable signal processing, where power is supplied to the electromagnets through the dynamic switch board 199S as described herein). The phase A, B, C currents are transmitted to each of the local drive controllers 1750A-1750n which, under control of or in response to instruction from master controller 1760, provide a specified one of the phase A, B, C currents to the respective electromagnets in the manner noted above to effect dynamic phase allocation.

[0107] As described herein, the base 1510 of a substrate handler 110 cooperates with the electromagnets 1700A-1700n of the at least one multiphase actuator unit (Fig. 2C) DLIM, DLIM2, DLIM3 so that excitation of the electromagnets 1700A-1700n with alternating current generates levitation and propulsion forces against the base 1510 that controllably levitate and propel the base 1510 along the at least one drive line 177-180, DL1-DL8, in a controlled attitude relative to the drive plane DP. The controller 199 (which includes the master controller 199M, the distributed controllers 199DA, 199DB, and dynamic switch board 199S; however the controller may have any suitable configuration), is operable coupled to the alternating current power source 1585 and the array of electromagnets 1700. The alternating current power source 1585 may include any suitable associated circuitry 3050 (which may be included in, be a part of, or otheiwise connected to the dynamical switch board 199S so that power is selectively applied to desired coil(s) in the manner described herein) through which the alternating current power source 1585 is connected to the array of electromagnets 1700. The alternating current power source 1585 is controlled by the distributed controllers 199DA, 199DB (or any other suitable controller such as the master controller 199M) and provided to the desired coils through the dynamic switch board 199S (e.g., the dynamic switch board effects coupling and decoupling the alternating current power source 1585 to the desired coils). Typical control parameters for the alternating current power source 1585 comprise of signal amplitude, signal frequency, and phase shift relative to a reference coil unit. Other types of control parameters may be defined. As used herein the “phase” A, B, C asPage f 54Aty. Docket No. 390P017054-WO (PCT) illustrated in Fig. 2B is similar to a particular coil in a multi-phase electrical motor; however, each of the phase definitions (such as A, B, C in Fig. 2B) is not physically tied to any particular coil.

[0108] As described before, and now referring to Fig 2E, controlling propulsion and levitation simultaneously and separately (so that propulsion forces and lift forces are separately controllable in full, and control of each may be deemed independent of one another though both forces are effected by excitation with common multiphase alternating current having a single common frequency per phase, the common frequency per phase is selectably variable from different desired frequencies) may be effected by a variant of the dynamic phase allocation described herein, where one or more dynamic l inear motor (DLIM) may include a selectable n number of phases associated with electromagnets defining the virtual motion multi-phase actuator unit, where n can be an integer larger than three. The number n of electromagnets defining the virtual motion multi-phase actuator unit may be dynamically selected (as described herein, such as by the master controller 199M and activation / actuation of the switches of the dynamic switch board 199S), for example, for effecting different moves of the platen / base 1510 depending on kinematic characteristics of the desired move. The excitation frequency commonly applied per phase of the virtual motion multiphase actuator unit is selected by the controller 199 so as to generate desired kinematic performance and control of the platen / base 1510. The phase control algorithm may maintain the same electrical phase angle difference between the phases (e.g., electromagnets of the motor), as shown in Fig. 2E. The electrical phase difference is calculated relative to a reference phase or relative to each phase. The electrical phase angle difference (p between phases may have a range so as to produce positive and negative values of propulsion forces while maintaining levitation. Depending on the value of the electrical phase angle difference q> the number of electromagnets within a respective dynamic linear motor varies. Here, the boundary between DLIM1 (illustrated for exemplar)' purposes with 6 electromagnets) and DLIM2 as shown in Fig. 32C is dynamic. With respect to the dynamic linear motor electromagnet / phase allocation, all electromagnets of a dynamic linear motor may not need to be energized at the same time. Referring to DLIM 1, only m (in this example m = 4) electromagnets out of all n (in this example n = 6) electromagnets ofPage f 54Aty. Docket No. 390P017054-WO (PCT) dynamic linear motor DLIM1 (where m is the number of electromagnets covered by the base (or secondary')) are energized to effect lift and propulsion of the base 1510, while the other electromagnets of the n electromagnets of the dynamic linear motor DLIM1 can be turned off.

[0109] Referring to Figs, 1-2E, 4-14, and 15, an exemplary method will be described in accordance with the present disclosure. The method includes providing the linear electrical machine 700 (Fig. 15, Block 15100) described herein. The linear electrical machine 700 has the frame 118M with the level reference plane 1299, the array of electromagnets 1700, the at least one reaction platen 1510, and the controller 199. The array of electromagnets 1700 is connected to the frame 118M to form the drive plane DP at a predetermined height relative to the level reference plane 1299 (see Fig. 13C). The array of electromagnets 1700 is arranged in more than one sets M of coils or electromagnets (see Figs. 2-2E) where at least one set M of electromagnets of the array of electromagnets 1700 defines at least one drive line DL1-DL8 (see, e.g., Fig. 1A) within the drive plane 1299, and each of the electromagnets is coupled to a power source 1585 (see, e.g., Figs. 2A and 2B) energizing each electromagnet 1700A-1700n. The least one reaction platen 1510 is of material disposed to cooperate with electromagnets 1700A-1700n of the array of electromagnets 1700 so that excitation of the electromagnets 1700A-1700n generates levitation and propulsion forces against the at least one reaction platen 1510 that controllably levitate and propel the at least one reaction platen 1510 along the at least one drive line DL 1 -DL8, in a controlled attitude relative to the drive plane 1299. The controller 199 system has the distributed control configuration (see, e.g., Figs. 1A-2B) with a master controller 199M and more than one coil controllers (e.g., distributed controllers 199D) communicably connected to each other.

[0110] The master controller 199M sends master commands MC that switch each of the more than one coil controllers 199D between the more than one sets M of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set M of electromagnets, on demand based on a pose of the at least one reaction platen 1510 along the drive line DL1-DL8, and sequentially excite the electromagnets 1700A-1700n with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reactionAty. Docket No. 390P017054-WO (PCT) platen 1510 is levitated and propelled with at least four degrees of freedom (Fig. 15, Block 15110). Each (or at least one) respective coil controller 199D is selectably coupled to electromagnets 1700A-1700n of multiple sets M from the more than one set M of electromagnets, where each of the multiple sets M being at different corresponding predetermined locations in the array of electromagnets 1700 (see, e.g., Figs. 2-2E) from each other set M of the multiple sets. The respective coil controller 199D being variably coupled to one set M at a time and switched from the one set M, at a predetermined location corresponding to the one set M, to a different set at a different predetermined location.

[0111] The method may include one or more of the following, employed individually or in any suitable combination with each other and / or in combination with the features described herein: the respective coil controller 199D is switched, just in time, from the one set M to the different set M based on the pose of the reaction platen 1510; the respective coil controller 199D is switched based on an identity characteristic (see, e.g., Fig. 2) of each of the at least one reaction platen 1510, uniquely identifying and discriminating each reaction platen 1510 different from each other reaction platen 1510; each reaction platen 1510 has predetermined indicia (e.g., facets, scallops, angles, chamfers, radius, etc.) different from each other reaction platen 1510 and uniquely characterizing the reaction platen 1510 identity different from identity of each other reaction platen 1510; the respective coil controller 199D is switched based on a trajectory of the at least one reaction platen 1510; switching of the respective coil controller 199D effects de-energizing of electromagnets 1700A-1700n of a preceding set M and energizing, from a de-energized state, of electromagnets 1700A-1700n of a succeeding set M, such as along a trajectory of the reaction platen 1510; the power source 1585 is an alternating current power source; and the reaction platen 1510 is of paramagnetic, diamagnetic, or non-magnetic conductive material.

[0112] Referring to Figs, 1-2E, 4-14, and 16, an exemplary method will be described in accordance with the present disclosure. The method includes providing a linear electrical machine 700 (Fig. 16, Block 16100). The linear electrical machine 700 has the frame 118M with a level reference plane 1299, the array of electromagnets 1700, the at least one reaction platen 1510, and theAty. Docket No. 390P017054-WO (PCT) controller 199. The array of electromagnets 1700 are connected to the frame 118M to form a drive plane DP at a predetermined height relative to the reference plane 1299 (see Fig. 13C). The array of electromagnets 1700 are arranged in more than one sets M of electromagnets (see Figs. 2-2E) where at least one set M of electromagnets of the array of electromagnets 1700 defines at least one drive line DL1-DL8 (see, e.g., Fig. 1 A) within the drive plane 1299, and each of the electromagnets is coupled to a power source 1585 (see, e.g., Figs. 2A and 2B) energizing each electromagnet 1700A-1700n. The least one reaction platen 1510 is of material disposed to cooperate with the electromagnets 1700A-1700n of the array of electromagnets 1700 so that excitation of the electromagnets generates levitation and propulsion forces against the reaction platen 1510 that controllably levitate and propel the reaction platen 1510 along the at least one drive line DL1-DL8, in a controlled attitude relative to the drive plane 1299. The controller 199 system has a distributed control configuration see, e.g., Figs. 1 A-2B) with a master controller 199M and more than one coil controllers (e.g., distributed controllers 199D) communicably connected to each other. The more than one coil controllers being selectably coupled to different sets M of electromagnets 1700A- 1700n so that a variable group of at least one of the more than one coil controllers are selectably connected to each of the at least one set M of electromagnets. The method also includes sending, with the master controller 199M, commands that switch each of the at least one coil controllers, of the variable group, just in time between sets M of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets (Fig. 16, Block 16110), based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets 1700A-1700n with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen 1510 is levitated and propelled with at least four degrees of freedom.

[0113] The method may include one or more of the following, employed individually or in any suitable combination with each other and / or in combination with the features described herein: each respective coil controller is selectably coupled to electromagnets 1700A-1700n of multiple sets M from the more than one set of electromagnets, the respective coil controller being variablyAty. Docket No. 390P017054-WO (PCT) coupled to one set a time and switched from the one set to a different set so that the variable group of coil controllers selectably connected to the more than one sets of electromagnets varies from a first group of coil controllers to a different second group of coil controllers, where at least one coil controller in the second group being different than each coil controller in the first group; and each of the multiple sets M is at different corresponding predetermined locations in the array from each other set of the multiple sets M.

[0114] The following features of the present disclosure are provided and may be employed individually, in any combination with each other, and / or in any combination with the features described above.

[0115] In accordance with the present disclosure a linear electrical machine includes: a frame with a level reference plane; an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the level reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets defines at least one drive line within the drive plane, and each of the electromagnets is coupled to a power source energizing each electromagnet; at least one reaction platen of material disposed to cooperate with electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the at least one reaction platen that controllably levitate and propel the at least one reaction platen along the at least one drive line, in a controlled attitude relative to the drive plane; and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other, the master controller being configured to send master commands that switch each of the more than one coil controllers between the more than one sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, on demand based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom; wherein each respective coil controller isPage f 54Aty. Docket No. 390P017054-WO (PCT) selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, each of the multiple sets being at different corresponding predetermined locations in the array of electromagnets from each other set of the multiple sets, the respective coil controller being variably coupled to one set at a time and switched from the one set, at a predetermined location corresponding to the one set, to a different set at a different predetermined location.

[0116] The linear electrical machine may include one or more of the following, employed individually or in any suitable combination with each other and / or in combination with the features described herein: the respective coil controller is switched, just in time, from the one set to the different set based on the pose of the reaction platen; the respective coil controller is switched based on an identity characteristic of each of the at least one reaction platen, uniquely identifying and discriminating each reaction platen different from each other reaction platen; each reaction platen has predetermined indicia different from each other reaction platen and uniquely characterizing the reaction platen identity different from identity of each other reaction platen; the respective coil controller is switched based on a trajectory of the at least one reaction platen; switching of the respective coil controller effects de-energizing of electromagnets of a preceding set and energizing, from a de-energized state, of electromagnets of a succeeding set; the power source is an alternating current power source; and the reaction platen is of paramagnetic, diamagnetic, or non-magnetic conductive material.

[0117] In accordance with the present disclosure a method includes: providing a linear electrical machine having: a frame with a level reference plane, an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the level reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets defines at least one drive line within the drive plane, and each of the electromagnets is coupled to a power source energizing each electromagnet, at least one reaction platen of material disposed to cooperate with electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the at least one reaction platen that controllably levitate and propel the at least one reactionPage f 54Aty. Docket No. 390P017054-WO (PCT) platen along the at least one drive line, in a controlled attitude relative to the drive plane, and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other; and sending, with the master controller, master commands that switch each of the more than one coil controllers between the more than one sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, on demand based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom; wherein each respective coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, each of the multiple sets being at different corresponding predetermined locations in the array from each other set of the multiple sets, the respective coil controller being variably coupled to one set at a time and switched from the one set, at a predetermined location corresponding to the one set, to a different set at a different predetermined location.

[0118] The method may include one or more of the following, employed individually or in any suitable combination with each other and / or in combination with the features described herein: the respective coil controller is switched, just in time, from the one set to the different set based on the pose of the reaction platen; the respective coil controller is switched based on an identity characteristic of each of the at least one reaction platen, uniquely identifying and discriminating each reaction platen different from each other reaction platen; each reaction platen has predetermined indicia different from each other reaction platen and uniquely characterizing the reaction platen identity different from identity of each other reaction platen; the respective coil controller is switched based on a trajectory of the at least one reaction platen; switching of the respective coil controller effects de-energizing of electromagnets of a preceding set and energizing, from a de-energized state, of electromagnets of a succeeding set; the power source is an alternatingAty. Docket No. 390P017054-WO (PCT) current power source; and the reaction platen is of paramagnetic, diamagnetic, or non-magnetic conductive material.

[0119] In accordance with the present disclosure a linear electrical machine includes: a frame with a level reference plane; an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets define at least one drive line within the drive plane, and each of the electromagnets being coupled to a power source energizing each electromagnet; at least one reaction platen of material disposed to cooperate with the electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the reaction platen that controllably levitate and propel the reaction platen along the at least one drive line, in a controlled attitude relative to the drive plane; and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other, the more than one coil controllers being selectably coupled to different sets of electromagnets so that a variable group of at least one of the more than one coil controllers are selectably connected to each of the at least one set of electromagnets; wherein the master controller is configured to send master commands that switches each of the at least one coil controllers, of the variable group, just in time between sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom.

[0120] The linear electrical machine may include one or more of the following, employed individually or in any suitable combination with each other and / or in combination with the features described herein: each respective of the at least one coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, the respective coil controller being variably coupled to one set a time and switched from the one set to a different setAty. Docket No. 390P017054-WO (PCT) so that the variable group of coil controllers selectably connected to the more than one sets of electromagnets varies from a first group of coil controllers to a different second group of coil controllers, at least one coil controller in the second group being different than each coil controller in the first group; and each of the multiple sets is at different corresponding predetermined locations in the array from each other set of the multiple sets.

[0121] In accordance with the present disclosure a method includes providing a linear electrical machine comprising: a frame with a level reference plane; an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets defines at least one drive line within the drive plane, and each of the electromagnets being coupled to a power source energizing each electromagnet; at least one reaction platen of material disposed to cooperate with the electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the reaction platen that controllably levitate and propel the reaction platen along the at least one drive line, in a controlled attitude relative to the drive plane; and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other, the more than one coil controllers being selectably coupled to different sets of electromagnets so that a variable group of at least one of the more than one coil controllers are selectably connected to each of the at least one set of electromagnets. The method also includes sending, with the master controller, commands that switch each of the at least one coil controllers, of the variable group, just in time between sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom.Aty. Docket No. 390P017054-WO (PCT)

[0122] The method may include one or more of the following, employed individually or in any suitable combination with each other and / or in combination with the features described herein: each respective coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, the respective coil controller being variably coupled to one set a time and switched from the one set to a different set so that the variable group of coil controllers selectably connected to the more than one sets of electromagnets varies from a first group of coil controllers to a different second group of coil controllers, where at least one coil controller in the second group being different than each coil controller in the first group; and each of the multiple sets is at different corresponding predetermined locations in the array from each other set of the multiple sets.

[0123] It should be understood that the foregoing description is only illustrative of the present disclosure. Various alternatives and modifications can be devised by those skilled in the art without departing from the present disclosure. Accordingly, the present disclosure is intended to embrace all such alternatives, modifications and variances that fall within the scope of any claims appended hereto. Further, the mere fact that different features are recited in mutually different dependent or independent claims does not indicate that a combination of these features cannot be advantageously used, such a combination remaining within the scope of the present disclosure.

[0124] What is claimed is:Page f 54

Claims

Aty. Docket No. 390P017054-WO (PCT)CLAIMS1. A linear electrical machine comprising: a frame with a level reference plane; an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the level reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets defines at least one drive line within the drive plane, and each of the electromagnets is coupled to a power source energizing each electromagnet; at least one reaction platen of material disposed to cooperate with electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the at least one reaction platen that controllably levitate and propel the at least one reaction platen along the at least one drive line, in a controlled attitude relative to the drive plane; and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other, the master controller being configured to send master commands that switch each of the more than one coil controllers between the more than one sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, on demand based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom; wherein each respective coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, each of the multiple sets being at different corresponding predetermined locations in the array of electromagnets from each other set of the multiple sets, the respective coil controller being variably coupled to one set at a time and switchedPage f 54Aty. Docket No. 390P017054-WO (PCT) from the one set, at a predetermined location corresponding to the one set, to a different set at a different predetermined location.

2. The linear electrical machine of claim 1, wherein the respective coil controller is switched, just in time, from the one set to the different set based on the pose of the reaction platen.

3. The linear electrical machine of claim 1, wherein the respective coil controller is switched based on an identity characteristic of each of the at least one reaction platen, uniquely identifying and discriminating each reaction platen different from each other reaction platen.

4. The linear electrical machine of claim 3, wherein each reaction platen has predetermined indicia different from each other reaction platen and uniquely characterizing the reaction platen identity different from identity of each other reaction platen.

5. The linear electrical machine of claim 1, wherein the respective coil controller is switched based on a trajectory of the at least one reaction platen.

6. The linear electrical machine of claim 1, wherein switching of the respective coil controller effects de-energizing of electromagnets of a preceding set and energizing, from a de-energized state, of electromagnets of a succeeding set.

7. The linear electrical machine of claim 1, wherein the power source is an alternating current power source.

8. The linear electrical machine of claim 1, wherein the reaction platen is of paramagnetic, diamagnetic, or non-magnetic conductive material.

9. A method comprising: providing a linear electrical machine having: a frame with a level reference plane,Aty. Docket No. 390P017054-WO (PCT) an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the level reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets defines at least one drive line within the drive plane, and each of the electromagnets is coupled to a power source energizing each electromagnet, at least one reaction platen of material disposed to cooperate with electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the at least one reaction platen that controllably levitate and propel the at least one reaction platen along the at least one drive line, in a controlled attitude relative to the drive plane, and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other; and sending, with the master controller, master commands that switch each of the more than one coil controllers between the more than one sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, on demand based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom; wherein each respective coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, each of the multiple sets being at different corresponding predetermined locations in the array from each other set of the multiple sets, the respective coil controller being variably coupled to one set at a time and switched from the one set, at a predetermined location corresponding to the one set, to a different set at a different predetermined location.Aty. Docket No. 390P017054-WO (PCT)10. The method of claim 9, wherein the respective coil controller is switched, just in time, from the one set to the different set based on the pose of the reaction platen.

11. The method of claim 9, wherein the respective coil controller is switched based on an identity characteristic of each of the at least one reaction platen, uniquely identifying and discriminating each reaction platen different from each other reaction platen.

12. The method of claim 9, wherein each reaction platen has predetermined indicia different from each other reaction platen and uniquely characterizing the reaction platen identity different from identity of each other reaction platen.

13. The method of claim 9, wherein the respective coil controller is switched based on a trajectory of the at least one reaction platen.

14. The method of claim 9, wherein switching of the respective coil controller effects deenergizing of electromagnets of a preceding set and energizing, from a de-energized state, of electromagnets of a succeeding set.

15. The method of claim 9, wherein the power source is an alternating current power source.

16. The method of claim 9, wherein the reaction platen is of paramagnetic, diamagnetic, or non-magnetic conductive material.

17. A linear electrical machine comprising: a frame with a level reference plane; an array of electromagnets, connected to the frame to form a drive plane at a predetermined height relative to the reference plane, the array of electromagnets being arranged in more than one sets of electromagnets where at least one set of electromagnets of the array of electromagnets defines atAty. Docket No. 390P017054-WO (PCT) least one drive line within the drive plane, and each of the electromagnets being coupled to a power source energizing each electromagnet; at least one reaction platen of material disposed to cooperate with the electromagnets of the array of electromagnets so that excitation of the electromagnets generates levitation and propulsion forces against the reaction platen that controllably levitate and propel the reaction platen along the at least one drive line, in a controlled attitude relative to the drive plane; and a controller system that has a distributed control configuration with a master controller and more than one coil controllers communicably connected to each other, the more than one coil controllers being selectably coupled to different sets of electromagnets so that a variable group of at least one of the more than one coil controllers are selectably connected to each of the at least one set of electromagnets; wherein the master controller is configured to send master commands that switches each of the at least one coil controllers, of the variable group, just in time between sets of electromagnets so as to selectably energize, from a de-energized state, each of the at least one set of electromagnets, based on a pose of the at least one reaction platen along the drive line, and sequentially excite the electromagnets with a predetermined excitation characteristic that describe six degree of freedom reaction platen control so that each reaction platen is levitated and propelled with at least four degrees of freedom.

18. The linear electrical machine of claim 17, wherein each respective coil controller is selectably coupled to electromagnets of multiple sets from the more than one set of electromagnets, the respective coil controller being variably coupled to one set a time and switched from the one set to a different set so that the variable group of coil controllers selectably connected to the more than one sets of electromagnets varies from a first group of coil controllers to a different second group of coil controllers, where at least one coil controller in the second group being different than each coil controller in the first group.Page f 54Aty. Docket No. 390P017054-WO (PCT)19. The linear electrical machine of claim 17, wherein each of the multiple sets is at different corresponding predetermined locations in the array from each other set of the multiple sets.Page f 54

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