Batch type substrate processing device

Abstract

The present invention relates to a batch type substrate processing device capable of securing uniformity of a substrate processing process. A substrate boat provided in the batch type substrate processing device of the present invention comprises: an upper support plate and a lower support plate facing each other; and a plurality of support pillars interposed between the upper support plate and the lower support plate and providing a plurality of substrate seating surfaces formed to support a plurality of substrates, respectively, wherein the plurality of support pillars may be connected to the upper support plate and the lower support plate so as to partially protrude outside the upper support plate and the lower support plate.

Description

Batch-type substrate processing device

[0001] The present invention relates to a batch-type substrate processing apparatus, and more specifically, to a batch-type substrate processing apparatus capable of ensuring uniformity in the substrate processing process.

[0002] Generally, substrate processing equipment includes single-wafer type systems, which can perform processing on a single substrate, and batch type systems, which can perform processing on multiple substrates simultaneously. While the single-wafer type offers the advantage of a simple equipment configuration, the batch type, which enables mass production, is widely used due to the problem of lower productivity.

[0003] Conventional batch-type substrate processing devices perform the process by vertically stacking multiple substrates; however, even if substrate processing gas is supplied through spray nozzles corresponding to each substrate, it is difficult to perform uniform substrate processing on the multiple substrates within the substrate boat.

[0004] Various attempts have been made to ensure in-plane uniformity of the substrate, such as rotating the substrate boat, but even if the substrate boat is rotated, the flow of the substrate processing gas supplied to the substrate is obstructed due to interference with the substrate boat structure, and the substrate processing gas may not reach the substrate surface uniformly, and as a result, non-uniformity in the substrate processing process may still remain unresolved.

[0005] (Patent Document 1) Korean Registered Patent No. 10-1715193

[0006] The present invention provides a substrate processing apparatus capable of effectively improving the uniformity of the substrate processing process and suppressing particle generation.

[0007] A batch-type substrate processing device according to an embodiment of the present invention comprises: a reaction tube providing a substrate processing space extending in a first direction; a substrate boat for stacking a plurality of substrates in multiple stages in the first direction; a hollow manifold supporting the reaction tube; a seal cap portion supporting the substrate boat and opening and closing an open lower portion of the manifold; a nozzle portion extending along the first direction and providing processing gas to the substrate processing space; and a rotary drive portion having a rotating shaft that transmits rotational force to the substrate boat through the seal cap portion; wherein the substrate boat comprises an upper support plate and a lower support plate facing each other; and a plurality of support columns positioned between the upper support plate and the lower support plate and providing a plurality of substrate seating surfaces formed to support a plurality of substrates, and the plurality of support columns may be connected to the upper support plate and the lower support plate so as to partially protrude to the outside of the upper support plate and the lower support plate.

[0008] Each of the above plurality of support columns comprises: a semi-cylindrical body portion having a flat side surface and a curved side surface opposite to the one side surface; and a plurality of protrusions extending perpendicularly from the one side surface in the longitudinal direction of the body portion and provided to be spaced apart from each other, wherein the portion protruding outward from the upper support plate and the lower support plate may be the other side surface.

[0009] The plurality of substrates can be supported on each of the plurality of protrusions so as to be spaced apart from the one side.

[0010] The above body portion may further include a pair of chamfered portions formed between the one side and the other side.

[0011] Each of the above plurality of protrusions may include: a substrate mounting surface on which a substrate is mounted, an upper surface perpendicular to the longitudinal direction of the body portion; and an inclined surface connected to the upper surface and inclined downward toward the outside.

[0012] The above-mentioned inclined surface may be a curved surface in which the angle of inclination gradually increases.

[0013] One side of each of the plurality of support columns may be positioned to face a virtual central axis penetrating the center of the upper support plate and the lower support plate.

[0014] The plurality of substrates can be loaded onto the substrate boat such that the contact area between the substrate mounting surface of each of the plurality of support pillars and the substrate is equal to each other.

[0015] The plurality of support columns includes a first support column provided in the middle and second support columns provided symmetrically on both sides of the first support column, and the angle (θ) formed by a virtual central axis penetrating the center of the upper support plate and the lower support plate, a virtual line connecting the first support column and the virtual central axis, and a virtual line connecting the second support column may be 95° to 105°.

[0016] It may further include a loading chamber that communicates with the reaction tube and provides a loading space capable of loading a substrate onto the substrate boat; and a linear moving member that linearly moves the seal cap portion along the first direction so that the substrate boat can reciprocate between the substrate processing process and the loading space.

[0017] According to the batch-type substrate processing apparatus of the present invention, interference between the processing gas supplied through the nozzle part and the substrate boat is minimized so that it can flow uniformly over the substrate, thereby improving the uniformity within the substrate of the substrate processing process.

[0018] By mounting the support pillars of the substrate boat so as to protrude outward from the upper and lower support plates, a wider gap is secured between the substrate and the support pillars, thereby facilitating the flow of processing gas and improving the uniformity of the substrate processing process. Furthermore, since there is no need to increase the size of the upper and lower support plates, interference between the upper and lower support plates and other components during the raising and lowering of the substrate boat can be minimized.

[0019] By adjusting the mounting position and mounting direction of the support pillars for the upper and lower support plates of the substrate boat, substrate sagging can be minimized, thereby stably supporting the substrate.

[0020] By minimizing the contact area between the substrate boat and the substrate, and by minimizing the upper surface that provides the substrate mounting surface, the generation of particles from the substrate boat material can be minimized even if the substrate moves due to warpage or thermal expansion during the substrate processing process, thereby extending the maintenance cycle of the batch-type substrate processing device.

[0021] FIG. 1 is a schematic diagram showing a batch-type substrate processing apparatus according to an embodiment of the present invention.

[0022] FIG. 2 is a perspective view of a substrate boat according to an embodiment of the present invention.

[0023] FIG. 3 is a diagram illustrating the working effect of a substrate boat according to an embodiment of the present invention.

[0024] Embodiments of the present invention will be described in more detail below with reference to the attached drawings. However, the present invention is not limited to the embodiments disclosed below but may be implemented in various different forms; these embodiments are provided merely to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention. In the description, the same reference numerals are assigned to identical components, and the drawings may be partially exaggerated in size to accurately describe the embodiments of the present invention, and the same reference numerals in the drawings refer to the same elements.

[0025] FIG. 1 is a schematic diagram showing a batch-type substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a perspective view of a substrate boat according to an embodiment of the present invention, and FIG. 3 is a diagram explaining the effects of operation of a substrate boat according to an embodiment of the present invention.

[0026] Referring to FIGS. 1 to 3, a batch-type substrate processing apparatus according to an embodiment of the present invention may include: a reaction tube (100) providing a substrate processing space extending in a first direction; a substrate boat (200) for stacking a plurality of substrates in multiple stages in the first direction; a hollow manifold (300) supporting the reaction tube; a seal cap portion (400) supporting the substrate boat (200) and opening and closing the open lower end of the manifold (300); a nozzle portion (500) extending along the first direction and providing processing gas to the substrate processing space; and a rotary drive portion (600) having a rotary shaft (610) that transmits rotational force to the substrate boat (200) through the seal cap portion (400).

[0027] The reaction tube (100) may extend in a first direction (e.g., a vertical direction) and provide a substrate processing space extending in the first direction. The reaction tube (100) may have a cylindrical shape with the top closed and the bottom open, and may be made of a material such as quartz or silicon carbide (SiC) that can withstand high temperatures. To improve the uniformity of the substrate processing process, the reaction tube (100) may be formed into a double structure by further including an inner tube (110) inside. In the double-structured reaction tube, the reaction tube (100) functions as an outer tube, and the substrate processing space may be provided inside the inner tube (110).

[0028] The substrate processing space of the reaction tube (100) accommodates a substrate boat (200) in which a plurality of substrates are stacked in multiple layers during the substrate processing process, and is a space where substrate processing processes such as deposition or cleaning processes are performed. A heating unit (130) for heating the processing space of the reaction tube (100) to a process temperature can be arranged to surround the reaction tube (100).

[0029] The substrate boat (200) is configured to support a plurality of substrates and may be formed such that a plurality of substrates are stacked in multiple stages at a predetermined interval in a first direction, and may also form a plurality of unit processing spaces in which each of the plurality of substrates is processed individually. The substrate boat (200) may be brought into or taken out of the processing space of the reaction tube (100) through the hollow portion of the manifold (300) by raising or lowering the seal cap portion (400). The substrate boat (200) may be made of a heat-resistant material such as quartz or SiC.

[0030] A plurality of insulating plates, which are insulating members made of heat-resistant materials such as quartz or SiC, may be installed at the bottom of the substrate boat (200), and a pedestal (800) may be provided to suppress the transfer of heat from the heating unit (130) to the seal cap unit (400) and the rotary drive unit (600).

[0031] The manifold (300) is coupled to the lower part of the reaction tube (100) to support the reaction tube (100), and may be made of a metal material to form a solid structure, having a hollow cylinder shape with an upper part having a hollow part in the center and an open lower part. An exhaust part (310) may be provided on one side of the manifold (300) to exhaust processing gas, purge gas, and reaction byproducts. If the reaction tube has a double structure, it may further include a support part protruding from the inner wall of the manifold (300) to support the inner tube (110). A sealing member (320) may be interposed between the reaction tube (100) and the manifold (300), and between the manifold (300) and the seal cap part (400) to provide sealing.

[0032] The seal cap portion (400) is provided with a seal cap flange (410) having a first through hole formed in the center and a seal cap plate (420) provided on the seal cap flange (410) having a second through hole formed in the center, and supports the substrate boat (200) and can open and close the open lower portion of the manifold (300). The seal cap flange (410) may be made of metal and must have rigidity to withstand exhaust pressure, as it forms a space (a hollow portion of the manifold (300)) separated from the external environment by being in close contact with the lower surface of the manifold (300) by a sealing member (320) received between a pair of protrusions formed on the edge.

[0033] The batch-type substrate processing apparatus of the present invention may further include a loading chamber (700) that communicates with a reaction tube (100) and provides a loading space capable of loading a substrate onto a substrate boat (200); and a linear moving member (720) that linearly moves a seal cap portion (400) along a first direction so that the substrate boat (200) can reciprocate between the substrate processing process and the loading space.

[0034] One end of the linear moving member (720) is fixed between the upper and lower parts of the loading chamber (700) and is movably connected to a moving axis (710) extending along a first direction, and the other end can be connected to a seal cap portion (400). When the linear moving member (720) moves linearly along the moving axis (710) along the first direction, the substrate boat (200) supported by the seal cap portion (400) can reciprocate between the substrate loading position and the substrate processing position. When the substrate boat (200) reaches the substrate processing position, the seal cap portion (400) coupled to the preceding moving member (720) can close the open lower end of the manifold (300). A gate (730) may be provided on one side wall of the loading chamber (700) so that a substrate can be introduced into the loading chamber (700).

[0035] The nozzle section (500) can extend along a first direction to provide a processing gas to the substrate processing space. The nozzle section (500) can receive a processing gas for processing the substrate (e.g., a source gas or reaction gas for thin film deposition, a purge gas for purging the processing space, a cleaning gas for cleaning the processing space, etc.) from an external processing gas supply source (510) and supply it to the substrate processing space of the reaction tube (100). The nozzle section (500) may include a processing gas injection port formed along the first direction in a gas supply pipe extending along the first direction, and if necessary, a plurality of such ports may be provided along the inner surface of the reaction tube (100) or the inner tube (110).

[0036] The nozzle section (500) is bent and extended in a first direction through the side wall of the manifold (300) to form an L-shape. If the extended nozzle section (500) moves left or right or tilts, it may collide with the reaction tube (100) or the inner tube (110). Therefore, to prevent the nozzle section (500) from moving or tilting, the nozzle section (500) can be stably supported by a nozzle section fixing member (520) that fixes and supports the area near the bent portion of the nozzle section (500). The nozzle section fixing member (520) is fixed to the manifold (400) for stable fixation and can protrude further inward than the bent portion of the nozzle section (500) so as to wrap around the bent portion of the nozzle section (500).

[0037] The rotary drive unit (600) may be equipped with a rotating shaft (610) that is inserted into the first through hole or the second through hole and transmits rotational force to the substrate boat (200). The rotary drive unit (600) may rotate the substrate boat (200) and the pedestal (800) to ensure uniformity of substrate processing (e.g., uniformity of thin film deposition thickness) by the processing gas supplied by the nozzle unit (500).

[0038] A substrate boat (200) may include an upper support plate (220) and a lower support plate (210) facing each other; and a plurality of support pillars (230) positioned between the upper support plate (220) and the lower support plate (210) and providing a plurality of substrate mounting surfaces formed to support a plurality of substrates.

[0039] The upper support plate (220) and the lower support plate (210) of the substrate boat (200) have a shape similar to the shape of the substrate, and at least a portion of the substrate mounting surface of a plurality of support pillars (230) placed between the upper support plate (220) and the lower support plate (210) is provided below the substrate, thereby supporting the substrate by utilizing the area where the lower surface of the substrate and the substrate mounting surface overlap.

[0040] For stable substrate support, the upper support plate (220) and the lower support plate (210) may be larger than the substrate, and must be spaced apart from the inner surface of the reaction tube (100) or inner tube (110) and the nozzle part (500) so that the substrate boat (200) can move freely linearly within the substrate processing space. On the other hand, for the uniformity and stability of the substrate processing process, the substrate processing space needs to be limited to be as small as possible, so the upper support plate (220) and the lower support plate (210) must be adjacent to the inner surface of the reaction tube (100) or inner tube (110) as much as possible.

[0041] In particular, for stable support, the nozzle fixing member (520) that surrounds the bent portion of the nozzle portion (500) protrudes further inward than the inner tube (110) and the nozzle portion (500), so the upper support plate (220) and the lower support plate (210) of the substrate boat (200) may interfere with the nozzle fixing member (520). Furthermore, the substrate boat (200) is moved by the seal cap portion (400), and if the level (tilt) state of the seal cap portion (400) or the mounting state of the substrate boat (200) is poor, there may be a problem in that the upper support plate (220) of the substrate boat (200) physically collides with the nozzle fixing member (520) when the substrate boat (200) moves to be inserted into the substrate processing space.

[0042] Accordingly, in the present invention, to ensure uniformity and stability of the substrate processing process while preventing interference between the substrate boat (200) and other parts of the substrate processing device, a plurality of support pillars (230) can be connected to the upper support plate (220) and the lower support plate (210) so as to partially protrude to the outside of the upper support plate (220) and the lower support plate (210). That is, to prevent interference with other parts of the substrate processing device, the size of the upper support plate (220) and the lower support plate (210) can be reduced as much as possible to minimize the substrate processing space, and as a result, the substrate processing gas supplied from the nozzle part (500) positioned adjacent to the substrate can flow uniformly along the surface of the substrate. At the same time, the substrate can be stably supported by the plurality of support pillars (230) connected to protrude to the outside of the upper support plate (220) and the lower support plate (210).

[0043] Since the substrate enters and exits through the side of the substrate boat (200), a plurality of support pillars (230) are arranged clustered on one side of the upper support plate (220) and the lower support plate (210) to secure an entry space, and support pillars (230) may not be arranged on the other side of the upper support plate (220) and the lower support plate (210). Then, when the substrate boat (200) reaches the substrate loading position, the direction of the substrate boat (200) can be adjusted so that the other side of the upper support plate (220) and the lower support plate (210) faces the gate (730) while the substrate boat (200) is in the substrate loading position, so that the substrate inserted through the gate (730) can freely enter and exit the substrate boat (200) (see FIG. 3).

[0044] Due to the structure and arrangement direction of the substrate boat (200), even if the substrate boat (200) moves upward toward the substrate processing space, the other side of the upper support plate (220), where the plurality of support pillars (230) are not arranged, passes through the area where the nozzle part fixing member (520) is provided, so interference between the upper support plate (220), the plurality of support pillars (230), and the nozzle part fixing member (520) can be effectively eliminated. That is, since a portion of the plurality of support pillars (230) protruding outward from the upper support plate (220) and the lower support plate (210) moves on the opposite side of the location where the nozzle part fixing member (520) is provided, the possibility of physical collision can be eliminated.

[0045] Meanwhile, after the substrate processing process is completed, the substrate boat (200) can be rotated so that the other side of the upper support plate (220) and the lower support plate (210) can face the gate (730) before the substrate boat (200) moves downward from the substrate processing space to the substrate loading space.

[0046] Each of the plurality of support columns (230) comprises: a semi-cylindrical body portion (231) having a flat side surface (231b) and a curved side surface (231a) opposite to the one side surface; and a plurality of protrusions (232) that extend perpendicularly from the one side surface (231b) in the longitudinal direction of the body portion (231) and are provided spaced apart from each other, and the portion protruding outward from the upper support plate (220) and the lower support plate (210) may be the other side surface (231a).

[0047] With the other side of the upper support plate (220) facing the gate (730), the substrate boat (200) loaded with multiple substrates can be rotated by a rotary drive unit (600) after moving to the substrate processing position to ensure uniformity of the substrate processing process. When the nozzle unit (500) sprays processing gas toward the rotating substrate boat (200), the processing gas can flow naturally along the surface of the substrate in the section where there are no multiple support pillars (230), but in the section where multiple support pillars (230) are arranged, the flow of the processing gas is obstructed by the multiple support pillars (230). In order for the processing gas reaching the support column (230) to flow smoothly around the support column (230) without colliding with the support column (230) and forming turbulence, the portion protruding outward from the upper support plate (220) and the lower support plate (210) can be arranged to become the other side (231a) of the body part (231) that forms a curved surface.

[0048] When the processing gas reaches the other side (231a) of the body part (231), it forms a pressure relatively higher than that of the one side (231b), allowing the processing gas to move quickly along the curved surface of the other side (231a) of the body part (231). When the substrate boat (200) rotates, the other side (231a) of the protruding body part (231) faces the nozzle part (500) when passing through the nozzle part (500), thereby enabling smooth flow of the processing gas. On the other hand, if a part of the one side (231b) of the body part (231) or the protrusion (232) protrudes to the outside of the upper support plate (220) and the lower support plate (210), the processing gas may form turbulence or be instantaneously trapped between the protrusions (232) due to the flat surface of the one side (231b) or the complex structure of the protrusion (232).

[0049] A plurality of substrates can be supported on each of a plurality of protrusions (232) so as to be spaced apart from one side (231b) of the body portion (231).

[0050] Even if the processing gas supplied by the nozzle part (500) moves to the rear of the body part (231) along the other side (231a) of the body part (231), if the edge of the substrate is in contact with one side (231b) of the body part (231), the processing gas may not reach the vicinity of the edge of the substrate in contact with the one side (231b) and may flow across the surface of the substrate due to exhaust pressure. In this case, the part of the surface of the substrate where sufficient processing gas does not reach may exhibit a substrate processing result different from that of other parts of the substrate surface (e.g., a variation in the thickness of the deposited thin film).

[0051] On the other hand, if there is a gap between the substrate and one side (231b) of the body part (231), the processing gas that has moved to the rear of the body part (231) can flow uniformly over the entire surface of the substrate after filling the gap between the substrate and one side (231b) of the body part (231), thereby improving the uniformity of the substrate processing process even around the support column (230).

[0052] The body portion (231) may further include a pair of chamfered portions (231c) formed between one side (231b) and the other side (231a).

[0053] Since the body portion (231) has a semi-cylindrical shape, in order for the processing gas flowing along the other side (231b) of the body portion (231) to flow into the rear of one side (231b) of the body portion (231), the flow of the processing gas must be sharply bent at an angle of almost 90°. The processing gas flows across the surface of the substrate due to the injection pressure sprayed from the nozzle portion (500) and the exhaust pressure exhausted from the exhaust portion (310), but it may be difficult for the processing gas flowing at a high speed to bend at an angle of almost 90° and flow into the rear of one side (231b) of the body portion (231).

[0054] If a pair of chamfered portions (231c) are formed between one side (231b) and the other side (231a), the processing gas flowing along the other side (231b) of the body part (231) can move quickly along the chamfered portions (231c) and easily flow into the rear of the one side (231b) of the body part (231). For example, the flow of the processing gas, which used to bend at almost 90°, can be reduced to about 45° using the chamfered portions (231c), thereby suppressing sudden changes in airflow and enabling a smooth and smooth flow of processing gas. By rapidly flowing the processing gas along the other side (231a), the chamfer (231c), and the one side (231b), the processing gas can flow uniformly in the rear area of ​​the support column (230) after filling the gap between the substrate and the one side (231b) of the body part (231).

[0055] Each of the plurality of protrusions (232) may include an upper surface (232a) perpendicular to the longitudinal direction of the body portion (231) and an inclined surface (232b) connected to the upper surface (232a) and inclined downward outward.

[0056] When the substrate undergoes a high-temperature processing, if thermal expansion or deformation occurs, or if bending or warpage occurs due to a difference in the coefficient of thermal expansion between the substrate and the layers formed on the substrate, friction occurs between the edges of the substrate and the substrate mounting surface, causing stress and potentially generating particles. In particular, if the substrate undergoes a downward or upward convex bending, stress may be concentrated only near the edges of the substrate and thus more particles may be generated. Particles are generated at the point where the substrate and the substrate mounting surface come into contact, and they may be quartz particles, which are the material of the substrate boat (200). Additionally, particles may be generated as the substrates collide with each other at the moment they are mounted on the substrate mounting surface of the substrate boat (200). The generated particles may fall onto the surface of the substrate mounted on the lower level among the multiple substrates stacked in multiple layers on the substrate boat (200).

[0057] Since particle generation occurs due to friction between the substrate and the substrate mounting surface, particle generation can be effectively suppressed by minimizing the contact area between the substrate and the substrate mounting surface to reduce friction between the substrate and the substrate mounting surface. To this end, in the present invention, the upper surface (232a) of the protrusion (232) perpendicular to the longitudinal direction of the body part (231) functions as a substrate mounting surface on which the substrate is mounted, and by providing an outwardly downward inclined surface (232b) between the upper surface (232a) and the tip of the protrusion (232), the flat upper surface (232a) supports the edge of the substrate, and the remaining part of the protrusion (232), such as the inclined surface (232b), does not come into contact with the substrate.

[0058] Although the contact area and friction between the substrate and the substrate mounting surface can be reduced by forming a support protrusion on the substrate mounting surface where the substrate is mounted, the load of the substrate may be concentrated on the support protrusion due to point contact between the substrate and the support protrusion, which may result in high stress. Also, when the substrate is supported by the support protrusion on the substrate mounting surface, a gap is created between the substrate and the substrate mounting surface, so the processing gas cannot flow uniformly onto the substrate located behind the support column (230) after filling the gap between the substrate and one side (231b) of the body part (231), and may escape through the gap between the substrate and the substrate mounting surface.

[0059] However, in the present invention, only the upper surface (232a) forming a plane supports the lower surface of the substrate edge in surface contact, thereby reducing the contact area and suppressing particle generation. At the same time, there is no gap between the lower surface of the substrate edge and the substrate mounting surface (i.e., the upper surface (232a)), so the processing gas does not leak into the gap and can flow uniformly onto the substrate located behind the support column (230).

[0060] The outwardly downward inclined surface (232b) between the upper surface (232a) and the tip of the protrusion (232) can form a curved surface with a gradually increasing angle of inclination.

[0061] If the inclined surface (232b) is a single plane forming a single slope or multiple planes with gradually increasing angles of inclination, the edges of the planes or the points where planes meet form corners, causing stress to concentrate, and also, stable support cannot be provided even if the substrate deviates from its position during the process of mounting the substrate or moving the substrate boat (200) up and down or rotating.

[0062] By providing the inclined surface (232b) as a curved surface with a gradually increasing angle of inclination, not only is the contact area between the substrate and the substrate mounting surface reduced, but the substrate can also be stably supported without stress concentration occurring at the edges of the upper surface (232a) or the corners of the protrusion (232) at the moment the substrate is mounted on the substrate mounting surface or at the moment the substrate moves, thereby effectively suppressing particle generation.

[0063] The support column (230) can be manufactured by forming a semi-cylindrical body part (231) and a plurality of protrusions (232) through machining such as cutting on a cylindrical base body. Although the base body made of quartz is transparent, it becomes opaque after machining. In order for heating by the heating part (130) to proceed smoothly, the support column (230) must be transparent. Since the quartz product becomes opaque due to machining stress generated during machining, the quartz product can be heat-treated after machining to remove machining stress, thereby making the quartz product (support column (230)) transparent again. The corner of the support column (230) (e.g., the lower surface edge of the protrusion (232)) can be naturally rounded by a re-transparency treatment process (e.g., Fire Polishing process) that re-transpares the quartz product, which is called natural rounding (natural R), and the natural rounded portion has approximately R1 (radius of curvature of 1 mm).

[0064] Natural rounding generated by the re-transparency treatment process is insufficient to reduce the contact area between the substrate and the substrate mounting surface due to the radius of curvature being too small, and thus cannot suppress particle generation. In order to effectively suppress particle generation by reducing the contact area between the substrate and the substrate mounting surface, the curve of the inclined surface (232b) can be formed through machining, and the radius of curvature formed by the curve of the inclined surface (232b) must be much larger than the radius of curvature caused by natural rounding, and may be 1 to 1.5 times the radius of the support column (230). If the radius of curvature of the inclined surface (232b) is too small, the effect of reducing the contact area between the substrate and the substrate mounting surface is not significant, and if the radius of curvature of the inclined surface (232b) is too large, the extended length of the inclined surface (232b) (i.e., the distance between the edge of the upper surface (232a) and the tip of the protrusion (232)) may be too long, making the structure unstable. For example, when the diameter of the support column (230) is 18 mm, the radius of curvature of the inclined surface (232b) may be R9 to R13.5.

[0065] When the substrate boat (200) reaches the substrate loading position, the other side of the upper support plate (220) and the lower support plate (210), where the support pillar (230) is not positioned, faces the gate (730) so that the substrate being fed through the gate (730) can freely enter and exit the substrate boat (200). The substrate is loaded by linearly moving it through the side of the substrate boat (200) arranged in this direction.

[0066] A plurality of support columns (230) may include a first support column (230A) provided in the middle and second support columns (230B, 230C) provided symmetrically on both sides of the first support column (230A). In order to minimize interference between the linearly moving substrate and the support columns (230), the linear movement direction of the substrate and one side (231b) of the second support columns (230B, 230C) may be arranged parallel. In this case, when the substrate boat (200) rotates, the side condition of the support column (230) to which the processing gas sprayed from the nozzle part (500) reaches may differ between the first support column (230A) and the second support columns (230B, 230C). In the case of the first support column (230A), the processing gas is sprayed into the middle of the other side (231a) of the body part (231) and can flow uniformly to both sides, but in the case of the second support columns (230B, 230C), the one side (231b) is rotated parallel to the direction of the substrate's advance movement, so the processing gas is sprayed biasedly toward the one side (231a) rather than the middle of the other side (231a) and cannot flow uniformly to both sides. Also, when the substrate is seated on the substrate mounting surface, the contact area between the substrate and the upper surface (232a) is smaller in the second support columns (230B, 230C) than in the first support column (230A), so the supporting force provided by the three support columns (230) may become uneven.

[0067] In order to solve these problems, in the present invention, one side (231b) of each of the plurality of support columns (230) may be arranged to face a virtual central axis that penetrates the center of the upper support plate (220) and the lower support plate (210).

[0068] When one side (231b) of the first support column (230A) and the second support column (230B, 230C) is positioned to face a virtual central axis penetrating the center of the upper support plate (220) and the lower support plate (210), as the substrate boat (200) rotates, the middle of the other side (231a) of the body part (231) can always face the nozzle part (500) when the plurality of support columns (230) pass in front of the nozzle part (500). Accordingly, the processing material sprayed from the nozzle part (500) can enter the middle of the other side (231a) of the body part (231) and flow uniformly to both sides.

[0069] When one side (231b) of a plurality of support columns (230) faces a virtual central axis penetrating the center of the upper support plate (220) and the lower support plate (210), the one side (231b) of the plurality of support columns (230) is positioned to face the center of the substrate, so the substrate can be loaded onto the substrate boat (200) such that the contact area between the substrate mounting surface of each of the plurality of support columns (230) and the substrate is equal to each other. Since the contact area between the substrate and the substrate mounting surfaces of the plurality of support columns (230) is equal, the substrate can be supported by the plurality of support columns (230) consistently regardless of direction.

[0070] Generally, when a substrate is supported by a first support column and a pair of second support columns, the second support columns may be positioned at 90° intervals from the first support column to minimize interference when the substrate enters the substrate boat (200). However, while such a positioning of support columns can prevent physical collision with the substrate, the substrate may not be supported in the area where the substrate enters, which may result in sagging of the substrate and uneven processing of the substrate.

[0071] In the present invention, in order to simultaneously secure stable support and the free entry and exit of the substrate boat (200), a plurality of support pillars (230) can be arranged such that the angle (θ) formed by a virtual line connecting the first support pillar to a virtual central axis penetrating the center of the upper support plate (220) and the lower support plate (210) and the virtual line connecting the virtual central axis to the second support pillar is 95° to 105°. By adjusting the arrangement angle of the plurality of support pillars (230), the substrate sagging can be reduced to less than half (about 1 mm) compared to the prior art, and the dispersion of substrate processing uniformity within the substrate surface can be effectively improved.

[0072] As described above, according to the batch-type substrate processing apparatus of the present invention, interference between the processing gas supplied through the nozzle part and the substrate boat is minimized so that it can flow uniformly over the substrate, thereby improving the uniformity within the substrate of the substrate processing process.

[0073] In addition, by mounting the support pillars of the substrate boat so as to protrude outward from the upper and lower support plates, a wider gap is secured between the substrate and the support pillars, thereby facilitating the flow of processing gas and improving the uniformity of the substrate processing process. Furthermore, since there is no need to increase the size of the upper and lower support plates, interference between the upper and lower support plates and other components during the raising and lowering of the substrate boat can be minimized.

[0074] In addition, by adjusting the mounting position and mounting direction of the support pillars for the upper and lower support plates of the substrate boat, substrate sagging can be minimized, thereby stably supporting the substrate.

[0075] In addition, by minimizing the contact area between the substrate boat and the substrate and minimizing the upper surface that provides the substrate mounting surface, the generation of particles from the substrate boat material can be minimized even if the substrate moves due to warpage or thermal expansion during the substrate processing process, and as a result, the maintenance cycle of the batch-type substrate processing device can be extended.

[0076] The term 'on' as used in the above description includes cases of direct contact as well as cases where it is positioned facing the upper or lower surface without direct contact. It is possible to be positioned facing the entire upper or lower surface, or to be positioned facing it partially; it is used to mean facing it from a distance or in direct contact with the upper or lower surface. Furthermore, terms such as 'up,' 'down,' 'front end,' 'rear end,' 'upper,' 'lower,' 'top end,' and 'bottom end' used in the above description are defined based on the drawings for convenience, and the shape and position of each component are not restricted by these terms.

[0077] Although preferred embodiments of the present invention have been illustrated and described above, the present invention is not limited to the embodiments described above, and those skilled in the art will understand that various modifications and equivalent alternative embodiments are possible without departing from the gist of the present invention as claimed in the claims. Accordingly, the technical scope of protection of the present invention should be determined by the following claims.

Claims

1. A reaction tube providing a substrate processing space extending in a first direction; A substrate boat that stacks a plurality of substrates in multiple stages in the first direction above; A hollow manifold supporting the above reaction tube; A seal cap portion that supports the above-mentioned substrate boat and opens and closes the open lower portion of the above-mentioned manifold; A nozzle portion extending along the first direction to provide processing gas to the substrate processing space; and A rotary drive unit having a rotating shaft that transmits rotational force to the substrate boat through the seal cap portion; comprising The above-mentioned substrate boat is, Upper support plate and lower support plate facing each other; and It includes a plurality of support pillars that are positioned between the upper support plate and the lower support plate and provide a plurality of substrate mounting surfaces formed to support a plurality of substrates, respectively. A batch-type substrate processing device in which the plurality of support columns are connected to the upper support plate and the lower support plate so as to partially protrude to the outside of the upper support plate and the lower support plate.

2. In Claim 1, Each of the above plurality of support columns is, A semicylindrical body portion having one side forming a flat surface and another side facing the one side and forming a curved surface; It includes a plurality of protrusions that extend perpendicularly to the longitudinal direction of the body portion from the above-mentioned side and are provided spaced apart from each other. The portion protruding outwardly from the upper support plate and the lower support plate is the other side of the batch-type substrate processing device.

3. In Claim 2, A batch-type substrate processing device in which the plurality of substrates are supported on each of the plurality of protrusions so as to be spaced apart from the one side.

4. In Claim 2, A batch-type substrate processing device comprising a body portion further including a pair of chamfered portions formed between the one side and the other side.

5. In Claim 2, Each of the above plurality of protrusions is, A substrate mounting surface on which a substrate is mounted, and an upper surface perpendicular to the longitudinal direction of the body portion; and A batch-type substrate processing device comprising an inclined surface connected to the upper surface and inclined downward toward the outside.

6. In Claim 5, A batch-type substrate processing device in which the above-mentioned inclined surface is a curved surface with a gradually increasing angle of inclination.

7. In Claim 2, A batch-type substrate processing device in which one side of each of the plurality of support columns is arranged to face a virtual central axis penetrating the center of the upper support plate and the lower support plate.

8. In Claim 1, A batch-type substrate processing device in which a substrate is loaded onto a substrate boat such that the contact area between the substrate mounting surface of each of the plurality of support pillars and the substrate is equal to each other.

9. In Claim 1, The plurality of support columns includes a first support column provided in the middle and second support columns provided symmetrically on both sides of the first support column. A batch-type substrate processing apparatus in which the angle (θ) formed by a virtual central axis penetrating the center of the upper support plate and the lower support plate, a virtual line connecting the first support column, and a virtual line connecting the virtual central axis and the second support column is 95° to 105°.

10. In Claim 1, A loading chamber communicating with the reaction tube and providing a loading space capable of loading a substrate into the substrate boat; A batch-type substrate processing apparatus further comprising: a linear moving member that linearly moves the seal cap portion along the first direction so that the substrate boat can reciprocate between the substrate processing process and the loading space.

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