In situ optoelectronic characterization system

Abstract

Provided in the present application is an in situ optoelectronic characterization system (1000). The in situ optoelectronic characterization system (1000) comprises a sample stage (100), an optical path structure (200), a light source component (300), a light source analysis assembly (400), and a source meter device (500), wherein the light source component (300) is used to project light onto the optical path structure (200), so that the source meter device (500) can record and form an electrical characteristic curve; moreover, at least one of a near-infrared spectrometer (410), a visible spectrometer (420), a single-photon counter (430), a monochromator (440) coupled with a near-infrared photomultiplier tube, and a monochromator (450) coupled with a visible photomultiplier tube in the light source analysis assembly (400) can analyze and detect a product, thereby effectively optimizing a detection operation and improving the detection efficiency.

Description

An in-situ photoelectric characterization system

[0001] This application claims priority to Chinese Patent Application No. 202411456977.4, filed on October 18, 2024, entitled “An In-situ Photoelectric Characterization System,” which is incorporated herein by reference in its entirety. Technical Field

[0002] This application relates to the field of in-situ photoelectric characterization system technology, and in particular provides an in-situ photoelectric characterization system. Background Technology

[0003] Concerns about global warming caused by greenhouse gas emissions have made the development of green energy to meet ever-increasing energy demands a major focus. Utilizing abundant and environmentally friendly solar photovoltaic power generation is a feasible technological solution for sustainable energy supply and addressing climate change. In the field of photovoltaic power generation, perovskite solar cells offer higher energy conversion efficiency and simpler fabrication processes compared to traditional solar cells, demonstrating high cost-effectiveness and commercial potential.

[0004] In related technologies, multiple testing procedures are required to detect different parameters of perovskite solar cells. However, performing multiple testing procedures necessitates the use of different equipment, leading to complex testing operations and high costs.

[0005] Application content

[0006] The purpose of this application is to provide an in-situ photoelectric characterization system, which aims to solve the problem that related technologies require multiple different devices to perform battery testing, resulting in complex testing operations.

[0007] To achieve the above objectives, the technical solution adopted in the embodiments of this application is as follows:

[0008] This application provides an in-situ photoelectric characterization system, including a sample stage, an optical path structure, a light source assembly, a light source analysis assembly, and a source surface device. The sample stage is used to place a sample, the optical path structure is used to transmit light, and the optical path structure has an objective lens end facing the sample. The light source assembly is connected to the optical path structure and is used to project light into the optical path structure so that the light passes through the objective lens end and is projected onto the sample. The light source analysis assembly is connected to the optical path structure and acts on the sample. The light source analysis assembly includes at least one of a near-infrared spectrometer, a visible spectrometer, a single-photon counter, a monochromator coupled with a near-infrared photomultiplier tube, and a monochromator coupled with a visible photomultiplier tube. The source surface device is electrically connected to the sample.

[0009] The beneficial effects of the embodiments of this application are as follows: The in-situ photoelectric characterization system provided by the embodiments of this application uses a light source component to project light onto an optical path structure so that the source and surface device can record and form an electrical characteristic curve; at the same time, at least one of the near-infrared spectrometer, visible spectrometer, single-photon counter, monochromator coupled with a near-infrared photomultiplier tube, and monochromator coupled with a visible photomultiplier tube in the light source analysis component can analyze and detect the product, thereby effectively optimizing the detection operation and improving the detection efficiency.

[0010] In some embodiments, the optical path structure includes a first optical path layer, within which a first beam splitter is movably disposed; the light source assembly includes a halogen light source and a plurality of LED light sources, which are disposed on the first optical path layer; wherein at least one of the plurality of LED light sources has a different wavelength than the other LED light sources; the halogen light source and the plurality of LED light sources are used to project light onto the first beam splitter along the first incident light path, the first incident light path is refracted by the first beam splitter to form a first refracted light path, and the first refracted light path passes through the objective lens end and faces the sample.

[0011] By adopting the above technical solution, by moving the first beam splitter to refract the first incident light path to form the first refracted light path, the halogen light source and multiple LED light sources with different wavelengths can project different types of light onto the sample, so that different light sources can be used as excitation sources and the electrical characteristic curves can be recorded by the source meter device.

[0012] In some embodiments, a first bandpass filter is movably disposed within the first optical path layer, and the first bandpass filter is disposed on the path of the first incident light path; and / or, a first fluorescent filter is movably disposed within the first optical path layer, and the first fluorescent filter is disposed on the path of the first refracted light path.

[0013] By adopting the above technical solution, the first bandpass filter can filter the light in the first incident light path, and the first fluorescent filter can filter the light in the first refracted light path, so as to reduce impurity light and effectively improve the accuracy of detection.

[0014] In some embodiments, the optical path structure includes a second optical path layer, within which a second beam splitter and a third beam splitter are movably disposed; the light source assembly includes a first stable light source and a second stable light source, the first stable light source being used to project light onto the second beam splitter along the second incident light path, the second incident light path being refracted by the second beam splitter to form a second refracted light path, the second refracted light path passing through the objective lens end and facing the sample; the second stable light source being used to project light onto the third beam splitter along the third incident light path, the third incident light path being refracted by the third beam splitter to form a third refracted light path, the third refracted light path passing through the objective lens end and facing the sample.

[0015] By adopting the above technical solution, by moving the second beam splitter to refract the second incident light path to form a second refracted light path, the first steady-state light source can project corresponding light onto the sample; and / or, by moving the third beam splitter to refract the third incident light path to form a third refracted light path, the second steady-state light source can project corresponding light onto the sample; thus, different test requirements of the sample can be met by projecting different light onto the sample.

[0016] In some embodiments, a second bandpass filter is movably disposed within the second optical path layer, and the second bandpass filter is disposed on the path of the second incident light path; and / or, a third bandpass filter is movably disposed within the second optical path layer, and the third bandpass filter is disposed on the path of the third incident light path; and / or, a second fluorescence filter is movably disposed within the second optical path layer, and the second fluorescence filter is disposed on the path of the second refracted light path; and / or, a third fluorescence filter is movably disposed within the second optical path layer, and the third fluorescence filter is disposed on the path of the third refracted light path.

[0017] By adopting the above technical solution, the second bandpass filter can filter the light in the second incident light path, the third bandpass filter can filter the light in the third incident light path, the second fluorescent filter can filter the light in the second refracted light path, and the third fluorescent filter can filter the light in the third refracted light path, so as to reduce impurity light and effectively improve the accuracy of detection.

[0018] In some embodiments, a first attenuator is movably disposed within the second optical path layer, the first attenuator being disposed on the path of the second incident optical path and the third incident optical path; and / or, a first polarizer is movably disposed within the second optical path layer, the first polarizer being disposed on the path of the second incident optical path and the third incident optical path.

[0019] By adopting the above technical solution, the first attenuator can attenuate the light in the second and third incident light paths to meet the light intensity adjustment required for detection; and / or, the first polarizer can filter light waves in specific directions in the second and third incident light paths to further improve the detection effect.

[0020] In some embodiments, the optical path structure includes a third optical path layer, within which a fourth beam splitter is movably disposed; the light source assembly includes an adjustable light source, which projects light onto the fourth beam splitter along the fourth incident optical path, the fourth incident optical path being refracted by the fourth beam splitter to form a fourth refracted optical path, the fourth refracted optical path passing through the objective lens end and facing the sample; wherein, the adjustable light source includes any one of a third steady-state light source, a fourth steady-state light source, a first pulse light source, a second pulse light source, and a third pulse light source.

[0021] By adopting the above technical solution, by moving the fourth beam splitter to refract the fourth incident light path to form a fourth refracted light path, any one of the third steady-state light source, the fourth steady-state light source, the first pulse light source, the second pulse light source, and the third pulse light source can project corresponding light onto the sample to meet the different testing requirements of the sample.

[0022] In some embodiments, a fourth bandpass filter is also movably disposed within the third optical path layer, and the fourth bandpass filter is disposed on the path of the fourth incident light path; and / or, a fourth fluorescence filter is also movably disposed within the third optical path layer, and the fourth fluorescence filter is disposed on the path of the fourth refracted light path.

[0023] By adopting the above technical solutions, the fourth bandpass filter can filter the light in the fourth incident light path, and the fourth fluorescent filter can filter the light in the fourth refracted light path, thereby reducing impurity light and effectively improving the accuracy of detection.

[0024] In some embodiments, a second attenuator is further disposed in the third optical path layer and disposed on the path of the fourth incident optical path; and / or, a second polarizer is further disposed in the third optical path layer and disposed on the path of the fourth incident optical path.

[0025] By adopting the above technical solution, the second attenuator can attenuate the light in the fourth incident light path to meet the light intensity adjustment required for detection; and / or, the second polarizer can filter light waves in a specific direction in the fourth incident light path to further improve the detection effect.

[0026] In some embodiments, the optical path structure includes a fourth optical path layer, within which a fifth beam splitter is movably disposed; a near-infrared spectrometer is connected to the fourth optical path layer, and the fiber optic probe of the near-infrared spectrometer is inserted into the fourth optical path layer and used to project light along the fifth incident optical path onto the fifth beam splitter, so that the fifth incident optical path is refracted to form a fifth refracted optical path; the fifth refracted optical path passes through the objective lens end and projects light toward the sample to form a first reflected optical path, the first reflected optical path coinciding with the fifth refracted optical path; and / or, a monochromator coupled with a near-infrared photomultiplier tube is connected to the fourth optical path layer, and the fiber optic probe of the monochromator coupled with the near-infrared photomultiplier tube is inserted into the fourth optical path layer and used to project light along the fifth incident optical path onto the fifth beam splitter, so that the fifth incident optical path is refracted to form a fifth refracted optical path; the fifth refracted optical path passes through the objective lens end and projects light toward the sample to form a first reflected optical path, the first reflected optical path coinciding with the fifth refracted optical path.

[0027] By adopting the above technical solution, the near-infrared spectrometer and / or the monochromator coupled with the near-infrared photomultiplier tube can detect and analyze the sample through the fifth beam splitter.

[0028] In some embodiments, a fifth bandpass filter is movably disposed within the fourth optical path layer, and the fifth bandpass filter is disposed on the path of the fifth incident optical path; and / or, a fifth fluorescence filter is movably disposed within the third optical path layer, and the fifth fluorescence filter is disposed on the path of the fifth refracted optical path.

[0029] By adopting the above technical solutions, the fifth bandpass filter can filter the light in the fifth incident light path, and the fifth fluorescent filter can filter the light in the fifth refracted light path, thereby reducing impurity light and effectively improving the accuracy of detection.

[0030] In some embodiments, the optical path structure includes a fifth optical path layer, within which a sixth beam splitter is movably disposed; a visible spectrometer is connected to the fifth optical path layer, the fiber optic probe of the visible spectrometer is inserted into the fifth optical path layer and used to project light along the sixth incident optical path toward the sixth beam splitter, so that the sixth incident optical path is refracted to form a sixth refracted optical path; the sixth refracted optical path passes through the objective lens end and projects light toward the sample to form a second reflected optical path, the second reflected optical path coinciding with the sixth refracted optical path; and / or, a monochromator coupled with a visible photomultiplier tube is connected to the fifth optical path layer, coupled with a visible photomultiplier tube. The fiber optic probe of the monochromator with the booster tube is inserted into the fifth optical path layer and is used to project light along the sixth incident optical path to the sixth beam splitter, so that the sixth incident optical path is refracted to form the sixth refracted optical path; the sixth refracted optical path passes through the objective lens end and projects light toward the sample to form the second reflected optical path, which coincides with the sixth refracted optical path; and / or, a single-photon counter is connected to the fifth optical path layer, the light source assembly projects light toward the sample and reflects it to form the third reflected optical path, the third reflected optical path projects light toward the sixth beam splitter and refracts it to form the detection optical path, and the single-photon counter is used to receive the light on the detection optical path.

[0031] By adopting the above technical solutions, a visible spectrometer and / or a monochromator coupled with a visible photomultiplier tube can analyze and detect samples through a sixth beam splitter; and / or, a single-photon counter is used to measure the arrival time distribution of single photons.

[0032] In some embodiments, a sixth bandpass filter is movably disposed within the fifth optical path layer, and the sixth bandpass filter is disposed on the path of the sixth incident optical path; and / or, a sixth fluorescence filter is movably disposed within the fourth optical path layer, and the sixth fluorescence filter is disposed on the path of the sixth refracted optical path.

[0033] By adopting the above technical solutions, the sixth bandpass filter can filter the light in the sixth incident light path, and the sixth fluorescent filter can filter the light in the sixth refracted light path, thereby reducing impurity light and effectively improving the accuracy of detection.

[0034] In some embodiments, the optical path structure includes a sixth optical path layer, in which a reflector is movably disposed; a light source component projects light onto the sample and reflects it to form a third reflected light path, and the third reflected light path projects light onto the reflector and refracts it to form an observation light path; the in-situ photoelectric characterization system further includes a first camera, which is disposed on the sixth optical path layer, and the receiving end of the first camera is located on the observation light path.

[0035] By adopting the above technical solution, the reflector can be moved to refract the third reflected light path to form an observation light path, thereby enabling the first camera to photograph and observe the sample through the observation light path.

[0036] In some embodiments, the in-situ photoelectric characterization system further includes a second camera, which is disposed on the optical path structure, and the receiving end of the second camera is located on the third reflected optical path.

[0037] By adopting the above technical solution, the second camera can capture and observe the sample through the third reflected light path.

[0038] In some embodiments, the in-situ photoelectric characterization system further includes an ultraviolet aging light source, which faces the sample stage.

[0039] By adopting the above technical solution, ultraviolet aging light sources can be used to simulate and accelerate the aging process of samples, so as to facilitate the detection of samples.

[0040] In some embodiments, the in-situ photoelectric characterization system further includes an environmental cavity, in which the sample is placed, and a transparent window is provided on the environmental cavity, with the objective lens facing the transparent window; a temperature control device is provided on the environmental cavity, and the environmental cavity is also connected to an atmosphere conditioning device for introducing inert gas and water vapor into the environmental cavity.

[0041] By adopting the above technical solution, the temperature inside the environmental chamber can be controlled by a temperature control device, and an atmosphere conditioning device can be used to introduce inert gas and water vapor into the environmental chamber to achieve atmosphere conditioning, thereby adjusting the atmosphere in which the sample is located to achieve detection under different environmental atmospheres.

[0042] In some embodiments, the in-situ photoelectric characterization system further includes a driving device that is driven to connect to the sample stage, the sample stage being configured to move in a horizontal direction.

[0043] By adopting the above technical solution, the driving device can drive the sample stage and move the sample in the horizontal direction, thereby enabling analysis and observation of different parts of the sample. Attached Figure Description

[0044] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0045] Figure 1 is a schematic diagram of the in-situ photoelectric characterization system provided in an embodiment of this application;

[0046] Figure 2 is a schematic diagram of the structure of the first optical path layer provided in an embodiment of this application;

[0047] Figure 3 is a schematic diagram of the connection structure between the first beam splitter, the first bandpass filter, and the first fluorescence filter provided in an embodiment of this application;

[0048] Figure 4 is a schematic diagram of the structure of the second optical path layer provided in an embodiment of this application;

[0049] Figure 5 is a schematic diagram of the structure of the third optical path layer provided in the embodiment of this application;

[0050] Figure 6 is a schematic diagram of the structure of the fourth and fifth optical path layers provided in the embodiments of this application;

[0051] Figure 7 is a schematic diagram of the sixth optical path layer provided in the embodiment of this application.

[0052] In the figures, the following labels are used: 1000, In-situ photoelectric characterization system; 100, Sample stage; 200, Optical path structure; 201, Objective lens end; 210, First optical path layer; 211, First beam splitter; 212, First incident light path; 213, First refracted light path; 214, First bandpass filter; 215, First fluorescence filter; 220, Second optical path layer; 221, Second beam splitter; 222, Third beam splitter; 223, Second incident light path; 224, Second refracted light path; 225, Third incident light path; 226, Third refracted light path; 227, First attenuator; 228, First polarizer; 230, Third optical path layer; 231, Fourth beam splitter; 232, Fourth incident light path; 233, Fourth refracted light path; 234, Second attenuator; 235, Second polarizer. 240. Fourth optical path layer; 241. Fifth beam splitter; 242. Fifth incident light path; 243. Fifth refracted light path; 244. First reflected light path; 250. Fifth optical path layer; 251. Sixth beam splitter; 252. Sixth incident light path; 253. Sixth refracted light path; 254. Second reflected light path; 260. Sixth optical path layer; 261. Mirror; 262. Third reflected light path; 263. Observation light path; 300. Light source assembly; 310. Halogen light source; 320. LED light source; 330. First steady-state light source; 340. Second steady-state light source; 350. Adjustable light source; 351. Third steady-state light source; 352. Fourth steady-state light source; 353. First pulsed light source; 354. Second pulsed light source; 355. Third pulsed light source; 400. Light source analysis component; 410. Near-infrared spectrometer; 420. Visible spectrometer; 430. Single-photon counter; 440. Monochromator coupled with near-infrared photomultiplier tube; 450. Monochromator coupled with visible photomultiplier tube; 500. Source meter device; 600. First camera; 700. Second camera; 800. Ultraviolet aging light source; 900. Environmental chamber. Detailed Implementation

[0053] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain this application, and should not be construed as limiting this application.

[0054] In the description of this application, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0055] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0056] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0057] Concerns about global warming caused by greenhouse gas emissions have made the development of green energy to meet ever-increasing energy demands a major focus. Utilizing abundant and environmentally friendly solar photovoltaic power generation is a feasible technological solution for sustainable energy supply and addressing climate change. In the field of photovoltaic power generation, perovskite cells offer higher energy conversion efficiency and simpler fabrication processes compared to traditional solar cells, demonstrating high cost-effectiveness and commercial potential. However, related technologies require multiple testing procedures to measure different parameters of perovskite cells. These procedures necessitate the use of multiple sets of different equipment, leading to complex testing operations and high costs.

[0058] Based on the above considerations, in order to solve the problem of complex testing operations caused by the need for multiple sets of different equipment for battery testing, an in-situ photoelectric characterization system was designed. By setting up an optical path structure with the objective lens of the optical path structure facing the sample, a light source component connected to the optical path structure can project light onto the sample through the objective lens, forming a reflected light path. Then, a light source analysis component connected to the optical path structure is used to detect and analyze the light in the reflected light path. The light source analysis component includes at least one of a near-infrared spectrometer, a visible spectrometer, a single-photon counter, a monochromator coupled with a near-infrared photomultiplier tube, and a monochromator coupled with a visible photomultiplier tube. Therefore, this in-situ photoelectric characterization system can perform various testing operations, effectively optimizing the testing process and improving testing efficiency.

[0059] The in-situ photoelectric characterization system provided in the embodiments of this application will now be described in detail.

[0060] Please refer to Figures 1 and 6. This application provides an in-situ photoelectric characterization system 1000, including a sample stage 100, an optical path structure 200, a light source assembly 300, a light source analysis assembly 400, and a source surface device 500. The sample stage 100 is used to place a sample, and the optical path structure 200 is used to transmit light. The optical path structure 200 has an objective lens end 201 facing the sample. The light source assembly 300 is connected to the optical path structure 200 and is used to project light into the optical path structure 200 so that the light passes through the objective lens end 201 and is projected onto the sample. The light source analysis assembly 400 is connected to the optical path structure 200 and acts on the sample. The light source analysis assembly 400 includes at least one of a near-infrared spectrometer 410, a visible spectrometer 420, a single-photon counter 430, a monochromator 440 coupled with a near-infrared photomultiplier tube, and a monochromator 450 coupled with a visible photomultiplier tube. The source surface device 500 is electrically connected to the sample.

[0061] The sample stage 100 is used to place the sample. The sample can be placed directly on the end face of the sample stage 100, or the sample can be placed in a closed cavity, and then the closed cavity containing the sample is placed on the end face of the sample stage 100.

[0062] The optical path structure 200 is used to transmit light; wherein, the optical path structure 200 can be a closed and hollow light-shielding structure; or, the optical path structure 200 can also be provided with optical fibers, light guides, or other structures to facilitate the transmission of light. Thus, after the light emitted from the light source assembly 300 or the light reflected by the sample enters the optical path structure 200, the external light has a low impact on the light transmitted within the optical path structure 200.

[0063] The objective lens end 201 refers to an observation port on the optical path structure 200 facing the sample stage 100, so that light can pass through the objective lens end 201 to illuminate the sample, or light reflected from the sample after being illuminated can enter the optical path structure 200 through the objective lens end 201; optionally, a lens structure (such as a plane mirror, convex lens, concave lens, etc.) can be provided on the objective lens end 201.

[0064] For example, in some embodiments, the sample stage 100 and the optical path structure 200 can be replaced by an optical microscope. The sample stage 100 can be equivalent to the stage of an optical microscope, the optical path structure 200 can be equivalent to the microscope tube, and the objective lens end 201 of the optical path structure 200 can be equivalent to the objective lens of the microscope; thereby realizing the detection, analysis and observation of the sample.

[0065] The light source assembly 300 is used to project light; optionally, the light source assembly 300 includes, but is not limited to, halogen light sources, LED light sources, steady-state light sources, pulsed light sources, etc.; the number of light sources included in the light source assembly 300 can be one, two, or more than two. The light source assembly 300 can be used as an excitation light source and, in conjunction with the source meter device 500, to record electrical characteristic curves.

[0066] The source meter device 500 is an instrument that integrates power supply and measurement functions to test and record the relationship between current (I) and voltage (V). It can provide a precise voltage or current source while simultaneously measuring and recording the corresponding current or voltage, thereby plotting the I / V characteristic curve.

[0067] The light source assembly 300 can directly project light onto the sample through the objective lens end 201; or the light emitted by the light source assembly 300 can be refracted by structures such as a reflector or beam splitter before being projected onto the sample through the objective lens end 201.

[0068] The light source analysis component 400 includes at least one of a near-infrared spectrometer 410, a visible spectrometer 420, a single-photon counter 430, a monochromator 440 coupled with a near-infrared photomultiplier tube, and a monochromator 450 coupled with a visible photomultiplier tube.

[0069] Among them, the near-infrared spectrometer 410 is used to analyze the absorption and reflection characteristics of samples in the near-infrared region, and the visible spectrometer 420 is used to analyze the absorption, reflection, or transmission characteristics of samples in the visible light range. The single-photon counter 430 is a high-precision measurement technique used to detect and count individual photons. The monochromator 440 coupled with a near-infrared photomultiplier tube is used for high-sensitivity spectral analysis in the near-infrared range; the near-infrared photomultiplier tube can effectively detect weak light signals, and when used with the monochromator, it can accurately measure the light intensity of different wavelengths. The monochromator 450 coupled with a visible photomultiplier tube is used for high-sensitivity visible spectral analysis. The monochromator decomposes the light from the light source into different wavelengths, and then uses a visible photomultiplier tube to detect and measure the light intensity of these wavelengths; the visible photomultiplier tube, due to its high gain and low noise characteristics, can effectively detect weak light signals.

[0070] The in-situ photoelectric characterization system 1000 provided in this application embodiment uses a light source assembly 300 to project light onto an optical path structure 200, so that the source meter device 500 can record and form an electrical characteristic curve. At the same time, at least one of the near-infrared spectrometer 410, visible spectrometer 420, single-photon counter 430, monochromator 440 coupled with a near-infrared photomultiplier tube, and monochromator 450 coupled with a visible photomultiplier tube in the light source analysis assembly 400 can analyze and detect the product, thereby effectively optimizing the detection operation and improving the detection efficiency.

[0071] Please refer to Figures 1 and 2. In some embodiments, the optical path structure 200 includes a first optical path layer 210, in which a first beam splitter 211 is movably disposed; the light source assembly 300 includes a halogen light source 310 and a plurality of LED light sources 320, which are disposed on the first optical path layer 210; wherein at least one of the plurality of LED light sources 320 has a different wavelength from the other LED light sources 320; the halogen light source 310 and the plurality of LED light sources 320 are used to project light onto the first beam splitter 211 along the first incident light path 212, and the first incident light path 212 is refracted by the first beam splitter 211 to form a first refracted light path 213, which passes through the objective lens end 201 and faces the sample.

[0072] The first optical path layer 210 is a part of the optical path structure 200; the first optical path layer 210 is used to supply halogen light source 310 and multiple LED light sources 320 with projected light.

[0073] For example, in some embodiments, the optical path structure 200 can be divided into multiple layers in the direction of gravity, wherein the first optical path layer 210 for projecting light from the halogen light source 310 and the plurality of LED light sources 320 can be any one of the layers, for example, the first optical path layer 210 can be the layer located at the bottom in the direction of gravity.

[0074] A first beam splitter 211 is movably disposed within the first optical path layer 210; wherein, the first beam splitter 211 is used to refract the light projected by the halogen light source 310 and the multiple LED light sources 320 so that the light projected by the halogen light source 310 and the multiple LED light sources 320 illuminates the sample.

[0075] The first beam splitter 211 is movably disposed within the first optical path layer 210. For example, the first beam splitter 211 can be driven by a driving structure (e.g., a driving motor, a driving cylinder, etc.) to move the first beam splitter 211 to a first preset position and refract the light projected by the halogen light source 310 and multiple LED light sources 320 along the first incident light path 212 to form a first refracted light path 213. Alternatively, the first beam splitter 211 can be moved away from the first preset position to cancel the refraction operation on the first incident light path 212. Or, the first beam splitter 211 can be movably disposed within the first optical path layer 210 by a transmission structure (e.g., a sliding structure such as a guide rail). The first beam splitter 211 can be moved to the first preset position or moved away from the first preset position by manual operation.

[0076] The first incident light path 212 refers to the transmission path of the light projected by the halogen light source 310 and the multiple LED light sources 320 in the first light path layer 210. Optionally, the light-emitting ends of the halogen light source 310 and / or the LED light source 320 can be directly arranged along the first incident light path 212. Alternatively, a reflector or beam splitter can be set in the first light path layer 210, and the light-emitting ends of the halogen light source 310 and / or the LED light source 320 can face the reflector or beam splitter, and transmit the light along the first light path layer 210 after refraction by the reflector or beam splitter.

[0077] The first refracted light path 213 refers to the light path formed by the light on the first incident light path 212 being refracted by the first beam splitter 211 toward the objective lens end 201. For example, in some embodiments, the first incident light path 212 can be projected horizontally toward the first beam splitter 211, and the light on the first incident light path 212 is refracted by the first beam splitter 211 to form the first refracted light path 213 that is projected downward toward the direction of gravity.

[0078] The number of LED light sources 320 can be any number of two or more. Optionally, at least one of the multiple LED light sources 320 has a different wavelength from the other LED light sources 320, or each of the multiple LED light sources 320 has a different wavelength. For example, in some embodiments, each of the multiple LED light sources 320 has a different wavelength, and the wavelengths of the multiple LED light sources 320 can be, but are not limited to, a wavelength range from 300 nanometers (hereinafter expressed in nm) to 850 nm, such as LED light sources 320 with wavelengths of 350 nm, 400 nm, 450 nm, 500 nm, 550 nm, 600 nm, 650 nm, 700 nm, 750 nm, 800 nm, 850 nm, etc.

[0079] With this configuration, by moving the first beam splitter 211 to refract the first incident light path 212 into the first refracted light path 213, the halogen light source 310 and multiple LED light sources 320 with different wavelengths can project different types of light onto the sample, so that different light sources can be used as excitation sources and the electrical characteristic curves can be recorded by the source meter device 500.

[0080] Please refer to Figures 1 to 3. In some embodiments, a first bandpass filter 214 is also movably disposed in the first optical path layer 210, and the first bandpass filter 214 is disposed on the path of the first incident light path 212; and / or, a first fluorescent filter 215 is also movably disposed in the first optical path layer 210, and the first fluorescent filter 215 is disposed on the path of the first refracted light path 213.

[0081] The first bandpass filter 214 is disposed on the path of the first incident light path 212. Thus, the first bandpass filter 214 can filter the light projected by the halogen light source 310 or the LED light source 320 in the first incident light path 212, allowing light within a specific wavelength range to pass through. For example, when the LED light source 320 has a wavelength range of 300nm to 680nm, the first bandpass filter 214 can allow wavelengths in the 300nm to 680nm range to pass through; when the LED light source 320 has a wavelength range of 700nm to 850nm, the first bandpass filter 214 can allow wavelengths in the 500nm to 850nm range to pass through.

[0082] The first fluorescent filter 215 is disposed on the path of the first refracted light path 213, thereby filtering the light in the first refracted light path 213; by blocking unwanted light, the background noise in the light path is reduced, and the contrast and clarity of the image formed by the light source analysis component 400 are enhanced; at the same time, by utilizing the different wavelengths of light emitted by different fluorescent dyes or markers, the first fluorescent filter 215 can select a specific wavelength range to match the fluorescence characteristics of the sample.

[0083] Both the first bandpass filter 214 and the first fluorescence filter 215 are movably disposed within the first optical path layer 210, thereby allowing the first bandpass filter 214 and / or the first fluorescence filter 215 to be moved or replaced. Exemplarily, in some embodiments, the first bandpass filter 214, the first fluorescence filter 215, and the first beam splitter 211 can be disposed on a frame structure. The first bandpass filter 214 is disposed on the horizontally oriented side surface of the frame structure, the first fluorescence filter 215 is disposed on the downward-facing side surface of the frame structure, and the first beam splitter 211 is obliquely disposed inside the frame structure, for example, at a 45° angle to the horizontal plane, and the first beam splitter 211 faces both the first bandpass filter 214 and the first fluorescence filter 215. Thus, light in the first incident light path 212 can pass through the first bandpass filter 214, be reflected by the first beam splitter 211, pass through the first fluorescence filter 215, and be projected onto the sample. Optionally, multiple of the above-mentioned rectangular structures can be set, and different first beam splitters 211, first bandpass filters 214 and first fluorescence filters 215 can be combined on each rectangular structure. The multiple rectangular structures are enclosed to form a disk shape and connected to a disk adjustment device. Different rectangular structures can be switched by rotating the disk adjustment device to meet different needs.

[0084] Please refer to Figures 1 and 4. In some embodiments, the optical path structure 200 includes a second optical path layer 220, within which a second beam splitter 221 and a third beam splitter 222 are movably disposed; the light source assembly 300 includes a first stable light source 330 and a second stable light source 340. The first stable light source 330 projects light onto the second beam splitter 221 along the second incident light path 223. The second incident light path 223 is refracted by the second beam splitter 221 to form a second refracted light path 224, which passes through the objective lens end 201 and faces the sample; the second stable light source 340 projects light onto the third beam splitter 222 along the third incident light path 225. The third incident light path 225 is refracted by the third beam splitter 222 to form a third refracted light path 226, which passes through the objective lens end 201 and faces the sample.

[0085] The first optical path layer 210 is a part of the optical path structure 200; the second optical path layer 220 is used to project light from the first steady-state light source 330 and the second steady-state light source 340.

[0086] For example, in some embodiments, the optical path structure 200 can be divided into multiple layers in the direction of gravity, wherein the second optical path layer 220 for projecting light from the first steady-state light source 330 and the second steady-state light source 340 can be any one of them.

[0087] A second beam splitter 221 is movably disposed within the second optical path layer 220; wherein, the second beam splitter 221 is used to refract the light projected by the first steady-state light source 330 along the second incident light path 223, so that the light projected by the first steady-state light source 330 is refracted to form a second refracted light path 224.

[0088] The second beam splitter 221 is movably disposed within the second optical path layer 220. For example, the second beam splitter 221 can be driven by a driving structure (e.g., a driving motor, a driving cylinder, etc.) to move the second beam splitter 221 to a second preset position and form a second refracted optical path 224 for the light projected by the first steady-state light source 330 along the second incident optical path 223. Alternatively, the second beam splitter 221 can be moved away from the second preset position to cancel the refraction operation on the second incident optical path 223. Or, the second beam splitter 221 can be movably disposed within the second optical path layer 220 by a transmission structure (e.g., a sliding structure such as a guide rail). The second beam splitter 221 can be moved to the second preset position or moved away from the second preset position by manual operation.

[0089] The second incident optical path 223 refers to the transmission path of the light projected by the first steady-state light source 330 in the second optical path layer 220. Optionally, the first steady-state light source 330 can be connected to the second optical path layer 220 by optical fiber so that the light emitted by the first steady-state light source 330 is transmitted along the second incident optical path 223.

[0090] The second refracted light path 224 refers to the light path formed by the light on the second incident light path 223 being refracted by the second beam splitter 221 towards the objective lens end 201. For example, in some embodiments, the second incident light path 223 can be projected horizontally toward the second beam splitter 221, and the light on the second incident light path 223 is refracted by the second beam splitter 221 to form a second refracted light path 224 that is projected downward toward the direction of gravity.

[0091] A third beam splitter 222 is also movably disposed within the second optical path layer 220; wherein, the third beam splitter 222 is used to refract the light projected by the second steady-state light source 340 along the third incident light path 225, so that the light projected by the second steady-state light source 340 is refracted to form a third refracted light path 226.

[0092] The third beam splitter 222 is movably disposed within the second optical path layer 220. For example, the third beam splitter 222 can be driven by a driving structure (e.g., a driving motor, a driving cylinder, etc.) to move the third beam splitter 222 to a third preset position and form a third refracted optical path 226 for the light projected by the second steady-state light source 340 along the third incident optical path 225. Alternatively, the third beam splitter 222 can be moved away from the third preset position to cancel the refraction operation on the third incident optical path 225. Or, the third beam splitter 222 can be movably disposed within the second optical path layer 220 by a transmission structure (e.g., a sliding structure such as a guide rail). The third beam splitter 222 can be moved to the third preset position or moved away from the third preset position by manual operation.

[0093] The third incident optical path 225 refers to the transmission path of the light projected by the second stable light source 340 in the second optical path layer 220. Optionally, the second stable light source 340 can be connected to the second optical path layer 220 by optical fiber so that the light emitted by the second stable light source 340 is transmitted along the third incident optical path 225.

[0094] The third refracted light path 226 refers to the light path formed by the refraction of light on the third incident light path 225 towards the objective lens end 201 through the third beam splitter 222. For example, in some embodiments, the third incident light path 225 can be projected horizontally toward the third beam splitter 222, and the light on the third incident light path 225 is refracted by the third beam splitter 222 to form a third refracted light path 226 that is projected downward toward the direction of gravity.

[0095] The wavelengths of the first steady-state light source 330 and the second steady-state light source 340 may be the same or different. For example, in some embodiments, the wavelength range of the first steady-state light source 330 may be 500nm to 600nm, such as 511nm, 515nm, 517nm, 522nm, 524nm, 528nm, 532nm, 535nm, 537nm, 541nm, 544nm, 548nm, 553nm, 556nm, 559nm, 563nm, 567nm, 572nm, 577nm, 581nm, 586nm, 595nm, 600nm, etc. The wavelength range of the second steady-state light source 340 can be from 700nm to 800nm, for example, it can be 711nm, 715nm, 717nm, 722nm, 724nm, 728nm, 732nm, 735nm, 737nm, 741nm, 744nm, 748nm, 753nm, 756nm, 759nm, 763nm, 767nm, 772nm, 777nm, 781nm, 785nm, 795nm, 800nm, etc.

[0096] With this configuration, by moving the second beam splitter 221 to refract the second incident light path 223 into a second refracted light path 224, the first stable light source 330 can project corresponding light onto the sample; and / or, by moving the third beam splitter 222 to refract the third incident light path 225 into a third refracted light path 226, the second stable light source 340 can project corresponding light onto the sample; thus, different testing requirements of the sample can be met by projecting different light onto the sample.

[0097] Please refer to Figures 1 to 4. In some embodiments, a second bandpass filter (not shown in the figures, but refer to the layout of the first bandpass filter 214 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed within the second optical path layer 220, and the second bandpass filter is disposed on the path of the second incident optical path 223; and / or, a third bandpass filter (not shown in the figures, but refer to the layout of the first bandpass filter 214 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed within the second optical path layer 220, and the third bandpass filter is disposed on the path of the third incident optical path 223. On the path of 25; and / or, a second fluorescent filter (not shown in the figure, but refer to the layout of the first fluorescent filter 215 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed in the second optical path layer 220, and the second fluorescent filter is disposed on the path of the second refractive optical path 224; and / or, a third fluorescent filter (not shown in the figure, but refer to the layout of the first fluorescent filter 215 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed in the second optical path layer 220, and the third fluorescent filter is disposed on the path of the third refractive optical path 226.

[0098] The second bandpass filter is disposed on the path of the second incident light path 223. Thus, the second bandpass filter can filter the light projected by the first steady-state light source 330 in the second incident light path 223 so that light of a specific wavelength range can pass through.

[0099] The second fluorescence filter is disposed on the path of the second refracted light path 224, thereby filtering the light in the second refracted light path 224 and the reflected light path; by blocking unwanted light, the background noise in the light path is reduced, and the contrast and clarity of the image formed by the light source analysis component 400 are enhanced; at the same time, by utilizing the different wavelengths of light emitted by different fluorescent dyes or markers, the second fluorescence filter can select a specific wavelength range to match the fluorescence characteristics of the sample.

[0100] Both the second bandpass filter and the second fluorescence filter are movably disposed within the second optical path layer 220, thereby allowing the second bandpass filter and / or the second fluorescence filter to be moved or replaced. Exemplarily, in some embodiments, the second bandpass filter, the second fluorescence filter, and the second beam splitter 221 can be disposed on a frame structure. The second bandpass filter is disposed on the horizontally oriented surface of the frame structure, the second fluorescence filter is disposed on the downward-facing surface of the frame structure, and the second beam splitter 221 is obliquely disposed inside the frame structure, for example, at a 45° angle to the horizontal plane, and simultaneously facing both the second bandpass filter and the second fluorescence filter. Thus, light in the second incident light path 223 can pass through the second bandpass filter, be reflected by the second beam splitter 221, pass through the second fluorescence filter, and be projected onto the sample.

[0101] The third bandpass filter is disposed on the path of the third incident light path 225. Thus, the third bandpass filter can filter the light projected by the second steady-state light source 340 in the third incident light path 225 so that light of a specific wavelength range can pass through.

[0102] The third fluorescence filter is positioned on the path of the third refractive light path 226, thereby filtering the light in the third refractive light path 226 and the reflected light path. By blocking unwanted light, the background noise in the light path is reduced, enhancing the contrast and clarity of the image formed by the light source analysis component 400. At the same time, by utilizing the different wavelengths of light emitted by different fluorescent dyes or markers, the third fluorescence filter can select a specific wavelength range to match the fluorescence characteristics of the sample.

[0103] Both the third bandpass filter and the third fluorescence filter are movably disposed within the second optical path layer 220, thereby allowing the third bandpass filter and / or the third fluorescence filter to be moved or replaced. Exemplarily, in some embodiments, the third bandpass filter, the third fluorescence filter, and the third beam splitter 222 can be disposed on a frame structure. The third bandpass filter is disposed on the horizontally oriented surface of the frame structure, the third fluorescence filter is disposed on the downward-facing surface of the frame structure, and the third beam splitter 222 is obliquely disposed inside the frame structure, for example, at a 45° angle to the horizontal plane, and simultaneously faces both the third bandpass filter and the third fluorescence filter. Thus, light from the third incident optical path 225 can pass through the third bandpass filter, be reflected by the third beam splitter 222, pass through the third fluorescence filter, and be projected onto the sample.

[0104] Please refer to Figures 1 and 4. In some embodiments, a first attenuator 227 is movably disposed within the second optical path layer 220, and the first attenuator 227 is disposed on the path of the second incident optical path 223 and the third incident optical path 225; and / or, a first polarizer 228 is movably disposed within the second optical path layer 220, and the first polarizer 228 is disposed on the path of the second incident optical path 223 and the third incident optical path 225.

[0105] The first attenuator 227 is used to reduce the intensity of light to achieve the purpose of light attenuation. The first attenuator 227 is movably disposed within the second optical path layer 220; optionally, the first attenuator 227 can be plugged into the second optical path layer 220. When the first attenuator 227 is needed, the corresponding first attenuator 227 can be inserted into the second optical path layer 220 and cover the second incident light path 223 and the third incident light path 225 to achieve attenuation of the light on the second incident light path 223 and the third incident light path 225.

[0106] The first polarizer 228 is used to filter light waves in a specific direction, thereby reducing the impact of reflection of light outside the second incident light path 223 and the third incident light path 225. The first polarizer 228 is movably disposed within the second optical path layer 220; optionally, the first polarizer 228 can be plugged into the second optical path layer 220. When the first polarizer 228 is needed, it can be inserted into the second optical path layer 220 and cover the second incident light path 223 and the third incident light path 225 to filter light waves in a specific direction on the second incident light path 223 and the third incident light path 225.

[0107] Please refer to Figures 1 and 5. In some embodiments, the optical path structure 200 includes a third optical path layer 230, within which a fourth beam splitter 231 is movably disposed; the light source assembly 300 includes an adjustable light source 350, which projects light along the fourth incident optical path 232 onto the fourth beam splitter 231. The fourth incident optical path 232 is refracted by the fourth beam splitter 231 to form a fourth refracted optical path 233, which passes through the objective lens end 201 and faces the sample; wherein, the adjustable light source 350 includes any one of a third steady-state light source 351, a fourth steady-state light source 352, a first pulse light source 353, a second pulse light source 354, and a third pulse light source 355.

[0108] The third optical path layer 230 is a part of the optical path structure 200; the third optical path layer 230 is used to provide the adjustable light source 350 with projected light.

[0109] A fourth beam splitter 231 is movably disposed within the third optical path layer 230; wherein, the fourth beam splitter 231 is used to refract the light projected by the adjustable light source 350 along the fourth incident light path 232, so that the light projected by the adjustable light source 350 is refracted to form a fourth refracted light ray, which then illuminates the sample and is reflected to form a reflected light path.

[0110] The fourth beam splitter 231 is movably disposed within the third optical path layer 230. For example, the fourth beam splitter 231 can be driven by a driving structure (e.g., a drive motor, a drive cylinder, etc.) to move the fourth beam splitter 231 to a fourth preset position and form a fourth refracted optical path 233 for the light projected by the adjustable light source 350 along the fourth incident optical path 232. Alternatively, the fourth beam splitter 231 can be moved away from the fourth preset position to cancel the refraction operation on the fourth incident optical path 232. Or, the fourth beam splitter 231 can be movably disposed within the third optical path layer 230 by a transmission structure (e.g., a sliding structure such as a guide rail). The fourth beam splitter 231 can be moved to the fourth preset position or moved away from the fourth preset position by manual operation.

[0111] The fourth incident light path 232 refers to the transmission path of the light projected by the tunable light source 350 in the third optical path layer 230. Optionally, the tunable light source 350 can be connected to the third optical path layer 230 by optical fiber so that the light emitted by the tunable light source 350 is transmitted along the fourth incident light path 232.

[0112] The fourth refracted light path 233 refers to the light path formed by the refraction of light from the fourth incident light path 232 through the fourth beam splitter 231 towards the objective lens end 201. For example, in some embodiments, the fourth incident light path 232 can be projected horizontally toward the fourth beam splitter 231, and the light from the fourth incident light path 232 is refracted by the fourth beam splitter 231 to form a fourth refracted light path 233 that is projected downward toward the direction of gravity.

[0113] The adjustable light source 350 includes any one of the following: a third steady-state light source 351, a fourth steady-state light source 352, a first pulse light source 353, a second pulse light source 354, and a third pulse light source 355. Exemplarily, in some embodiments, the adjustable light source 350 includes the third steady-state light source 351, the fourth steady-state light source 352, the first pulse light source 353, the second pulse light source 354, and the third pulse light source 355. When one of these light sources is required, the corresponding light source can be connected to the third optical path layer 230 via an optical fiber.

[0114] The wavelengths of the third stable-state light source 351 and the fourth stable-state light source 352 may be the same or different. For example, in some embodiments, the wavelength range of the third stable-state light source 351 may be 400nm to 500nm, such as 400nm, 410nm, 420nm, 430nm, 440nm, 450nm, 460nm, 470nm, 480nm, 490nm, 500nm, etc. The wavelength range of the second stable-state light source 340 may be 800nm ​​to 850nm, such as 801nm, 805nm, 808nm, 812nm, 814nm, 818nm, 822nm, 825nm, 827nm, 831nm, 834nm, 838nm, 843nm, 846nm, 850nm, etc.

[0115] The wavelengths of the first pulse light source 353, the second pulse light source 354, and the third pulse light source 355 may be the same or different. For example, in some embodiments, the wavelength range of the first pulse light source 353 may be 400nm to 450nm, such as 400nm, 405nm, 410nm, 415nm, 420nm, 425nm, 430nm, 435nm, 440nm, 445nm, 450nm, etc. The wavelength range of the second pulsed light source 354 can be from 500nm to 600nm, for example, it can be 511nm, 515nm, 517nm, 522nm, 524nm, 528nm, 532nm, 535nm, 537nm, 541nm, 544nm, 548nm, 553nm, 556nm, 559nm, 563nm, 567nm, 572nm, 577nm, 581nm, 586nm, 595nm, 600nm, etc. The wavelength range of the third pulsed light source 355 can be from 700nm to 800nm, for example, it can be 711nm, 715nm, 717nm, 722nm, 724nm, 728nm, 732nm, 735nm, 737nm, 741nm, 744nm, 748nm, 753nm, 756nm, 759nm, 763nm, 767nm, 772nm, 777nm, 781nm, 785nm, 795nm, 800nm, etc.

[0116] With this configuration, by moving the fourth beam splitter 231 to refract the fourth incident light path 232 into a fourth refracted light path 233, any one of the third stable light source 351, the fourth stable light source 352, the first pulse light source 353, the second pulse light source 354, and the third pulse light source 355 of the adjustable light source 350 can project corresponding light onto the sample; thus, different testing requirements of the sample can be met by projecting different light sources onto the sample as excitation sources.

[0117] Please refer to Figures 1 and 5. In some embodiments, a fourth bandpass filter (not shown in the figures, but refer to the layout of the first bandpass filter 214 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed within the third optical path layer 230. The fourth bandpass filter is disposed on the path of the fourth incident optical path 232. And / or, a fourth fluorescence filter (not shown in the figures, but refer to the layout of the first fluorescence filter 215 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed within the third optical path layer 230. The fourth fluorescence filter is disposed on the path of the fourth refracted optical path 233.

[0118] The fourth bandpass filter is disposed on the path of the fourth incident light path 232. Thus, the fourth bandpass filter can filter the light projected by the tunable light source 350 in the fourth incident light path 232 so that light of a specific wavelength range can pass through.

[0119] The fourth fluorescence filter is positioned on the path of the fourth refractive light path 233, thereby filtering the light in the fourth refractive light path 233 and the reflected light path. By blocking unwanted light, the background noise in the reflected light path is reduced, enhancing the contrast and clarity of the image formed by the light source analysis component 400. At the same time, by utilizing the different wavelengths of light emitted by different fluorescent dyes or markers, the fourth fluorescence filter can select a specific wavelength range to match the fluorescence characteristics of the sample.

[0120] Both the fourth bandpass filter and the fourth fluorescence filter are movably disposed within the third optical path layer 230, thereby allowing the fourth bandpass filter and / or the fourth fluorescence filter to be moved or replaced. Exemplarily, in some embodiments, the fourth bandpass filter, the fourth fluorescence filter, and the fourth beam splitter 231 can be disposed on a frame structure. The fourth bandpass filter is disposed on the horizontally oriented surface of the frame structure, the fourth fluorescence filter is disposed on the downward-facing surface of the frame structure, and the fourth beam splitter 231 is obliquely disposed inside the frame structure, for example, at a 45° angle to the horizontal plane, and the fourth beam splitter 231 simultaneously faces both the fourth bandpass filter and the fourth fluorescence filter. Thus, light from the fourth incident optical path 232 can pass through the fourth bandpass filter, be reflected by the fourth beam splitter 231, pass through the fourth fluorescence filter, and be projected onto the sample.

[0121] Please refer to Figures 1 and 5. In some embodiments, a second attenuator 234 is further provided in the third optical path layer 230, and the second attenuator 234 is disposed on the path of the fourth incident optical path 232; and / or, a second polarizer 235 is further provided in the third optical path layer 230, and the second polarizer 235 is disposed on the path of the fourth incident optical path 232.

[0122] The second attenuator 234 is used to reduce the intensity of light to achieve the purpose of light attenuation. The second attenuator 234 is movably disposed within the third optical path layer 230; optionally, the second attenuator 234 can be plugged into the third optical path layer 230. When the second attenuator 234 is needed, it can be inserted into the third optical path layer 230 and cover the fourth incident optical path 232 to attenuate the light on the fourth incident optical path 232.

[0123] The second polarizer 235 is used to filter light waves in a specific direction, thereby reducing the impact of light reflection outside the fourth incident light path 232. The second polarizer 235 is movably disposed within the third optical path layer 230; optionally, the second polarizer 235 can be plugged into the third optical path layer 230. When the second polarizer 235 is needed, it can be inserted into the third optical path layer 230 and cover the fourth incident light path 232 to filter light waves in a specific direction on the fourth incident light path 232.

[0124] Please refer to Figures 1 and 6. In some embodiments, the optical path structure 200 includes a fourth optical path layer 240, in which a fifth beam splitter 241 is movably disposed. A near-infrared spectrometer 410 is connected to the fourth optical path layer 240. The fiber optic probe of the near-infrared spectrometer 410 is inserted into the fourth optical path layer 240 and is used to project light onto the fifth beam splitter 241 along the fifth incident optical path 242, so that the fifth incident optical path 242 is refracted to form a fifth refracted optical path 243. The fifth refracted optical path 243 passes through the objective lens end 201 and projects light toward the sample to form a first reflected optical path 244, which coincides with the fifth refracted optical path 243.

[0125] The fourth optical path layer 240 is a part of the optical path structure 200; the fourth optical path layer 240 is used for the connection of the near-infrared spectrometer 410 and / or the monochromator 440 coupled with a near-infrared photomultiplier tube.

[0126] A fifth beam splitter 241 is movably disposed within the fourth optical path layer 240; wherein, the fifth beam splitter 241 is used to refract the light projected by the fiber optic probe of the near-infrared spectrometer 410 along the fifth incident optical path 242, so that the fifth incident optical path 242 is refracted to form a fifth refracted optical path 243. It should be understood that the fifth beam splitter 241 can be replaced by a reflector.

[0127] The fifth beam splitter 241 is movably disposed within the fourth optical path layer 240. For example, the fifth beam splitter 241 can be driven by a driving structure (e.g., a drive motor, a drive cylinder, etc.) to move the fifth beam splitter 241 to a fifth preset position and refract the light projected onto the fifth incident light path 242 to form a fifth refracted light path 243, or it can be moved away from the fifth preset position to cancel the refraction operation on the fifth incident light path 242. Alternatively, the fifth beam splitter 241 can be movably disposed within the fourth optical path layer 240 by a transmission structure (e.g., a sliding structure such as a guide rail), and the fifth beam splitter 241 can be moved to the fifth preset position or moved away from the fifth preset position by manual operation.

[0128] The fifth refracting light path 243 passes through the objective lens end 201 and projects light towards the sample, forming the first reflected light path 244, which coincides with the fifth refracting light path 243. Thus, the first reflected light path 244, after being refracted by the fifth beam splitter 241, can be received by the fiber optic probe of the near-infrared spectrometer 410, thereby enabling the near-infrared spectrometer 410 to analyze and process spectral data, generate spectral maps, and perform related data interpretation.

[0129] And / or, a monochromator 440 coupled with a near-infrared photomultiplier tube is connected to the fourth optical path layer 240. The fiber optic probe of the monochromator 440 coupled with the near-infrared photomultiplier tube is inserted into the fourth optical path layer 240 and is used to project light along the fifth incident light path 242 to the fifth beam splitter 241, so that the fifth incident light path 242 is refracted to form a fifth refracted light path 243. The fifth refracted light path 243 passes through the objective lens end 201 and projects light toward the sample to form a first reflected light path 244. The first reflected light path 244 coincides with the fifth refracted light path 243.

[0130] The monochromator 440 coupled with a near-infrared photomultiplier tube can also emit light and receive reflected light through a light probe. The propagation process of light along the fifth incident light path 242, the fifth refracted light path 243, and the first reflected light path 244 is the same as the scheme described above when the near-infrared spectrometer 410 is connected. The formation of the fifth incident light path 242, the fifth refracted light path 243, and the first reflected light path 244 will not be described in detail here.

[0131] The monochromator 440 coupled with a near-infrared photomultiplier tube refers to a detection device formed by coupling a monochromator with a near-infrared photomultiplier tube. This detection device is typically used to accurately measure the spectral characteristics of a sample in the near-infrared region. Therefore, the monochromator 440 coupled with a near-infrared photomultiplier tube can also be used to analyze and process spectral data, generate spectral maps, and perform related data interpretation.

[0132] Please refer to Figures 1 and 6. In some embodiments, a fifth bandpass filter (not shown in the figures, but refer to the layout of the first bandpass filter 214 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed in the fourth optical path layer 240, and the fifth bandpass filter is disposed on the path of the fifth incident optical path 242; and / or, a fifth fluorescence filter (not shown in the figures, but refer to the layout of the first fluorescence filter 215 relative to the first beam splitter 211 shown in Figures 2 and 3) is also movably disposed in the third optical path layer 230, and the fifth fluorescence filter is disposed on the path of the fifth refracted optical path 243.

[0133] The fifth bandpass filter is disposed on the path of the fifth incident light path 242. Thus, the fifth bandpass filter can filter the light in the fifth incident light path 242 so that light of a specific wavelength range can pass through.

[0134] The fifth fluorescence filter is positioned on the path of the fifth refractive light path 243, thereby filtering the light in the fifth refractive light path 243. By blocking unwanted light, the background noise in the light path is reduced, enhancing the contrast and clarity of the images analyzed by the monochromator 440 and / or the near-infrared spectrometer 410 coupled with the near-infrared photomultiplier tube. At the same time, by utilizing the different wavelengths of light emitted by different fluorescent dyes or markers, the fifth fluorescence filter can select a specific wavelength range to match the fluorescence characteristics of the sample.

[0135] Both the fifth bandpass filter and the fifth fluorescence filter are movably disposed within the fourth optical path layer 240, thereby allowing the fifth bandpass filter and / or the fifth fluorescence filter to be moved or replaced. Exemplarily, in some embodiments, the fifth bandpass filter, the fifth fluorescence filter, and the fifth beam splitter 241 can be disposed on a frame structure. The fifth bandpass filter is disposed on the horizontally oriented surface of the frame structure, the fifth fluorescence filter is disposed on the downward-facing surface of the frame structure, and the fifth beam splitter 241 is obliquely disposed inside the frame structure, for example, at a 45° angle to the horizontal plane, and the fifth beam splitter 241 simultaneously faces both the fifth bandpass filter and the fifth fluorescence filter. Thus, light from the fifth incident optical path 242 can pass through the fifth bandpass filter, be reflected by the fifth beam splitter 241, pass through the fifth fluorescence filter, and be projected onto the sample.

[0136] Please refer to Figures 1 and 6. In some embodiments, the optical path structure 200 includes a fifth optical path layer 250, in which a sixth beam splitter 251 is movably disposed. A visible spectrometer 420 is connected to the fifth optical path layer 250. The fiber optic probe of the visible spectrometer 420 is inserted into the fifth optical path layer 250 and is used to project light onto the sixth beam splitter 251 along the sixth incident optical path 252, so that the sixth incident optical path 252 is refracted to form a sixth refracted optical path 253. The sixth refracted optical path 253 passes through the objective lens end 201 and projects light toward the sample to form a second reflected optical path 254, which coincides with the sixth refracted optical path 253.

[0137] The fifth optical path layer 250 is a part of the optical path structure 200; the fifth optical path layer 250 is used for the connection of the visible spectrometer 420, the monochromator 450 coupled with a visible photomultiplier tube, and the single photon counter 430.

[0138] A sixth beam splitter 251 is movably disposed within the fifth optical path layer 250; wherein, the sixth beam splitter 251 is used to refract the light projected by the fiber optic probe of the visible spectrometer 420 along the sixth incident optical path 252, so that the sixth incident optical path 252 is refracted to form a sixth refracted optical path 253. It should be understood that the sixth beam splitter 251 can be replaced by a reflector.

[0139] The sixth beam splitter 251 is movably disposed within the fifth optical path layer 250. For example, the sixth beam splitter 251 can be driven by a driving structure (such as a drive motor, drive cylinder, etc.) to move the sixth beam splitter 251 to a sixth preset position and refract the light projected onto the sixth incident light path 252 to form a sixth refracted light path 253, or it can be moved away from the sixth preset position to cancel the refraction operation on the sixth incident light path 252. Alternatively, the sixth beam splitter 251 can be movably disposed within the fifth optical path layer 250 by a transmission structure (such as a sliding structure like a guide rail), and the sixth beam splitter 251 can be moved to the fifth preset position or moved away from the sixth preset position by manual operation.

[0140] The sixth refracting light path 253 passes through the objective lens end 201 and projects light towards the sample, forming the second reflected light path 254, which coincides with the sixth refracting light path 253. Thus, the second reflected light path 254 can be received by the fiber optic probe of the visible spectrometer 420 after being refracted by the sixth beam splitter 251, so that the visible spectrometer 420 can perform spectral data analysis and processing, generate spectral maps, and perform related data interpretation.

[0141] And / or, a monochromator 450 coupled with a visible photomultiplier tube is connected to the fifth optical path layer 250. The fiber optic probe of the monochromator 450 coupled with the visible photomultiplier tube is inserted into the fifth optical path layer 250 and is used to project light along the sixth incident light path 252 to the sixth beam splitter 251, so that the sixth incident light path 252 is refracted to form a sixth refracted light path 253. The sixth refracted light path 253 passes through the objective lens end 201 and projects light toward the sample to form a second reflected light path 254. The second reflected light path 254 coincides with the sixth refracted light path 253.

[0142] The monochromator 450 coupled with a visible photomultiplier tube can also emit light and receive reflected light through a light probe. The propagation process of light along the sixth incident light path 252, the sixth refracted light path 253, and the second reflected light path 254 is the same as the scheme described above when the visible spectrometer 420 is connected. The formation of the sixth incident light path 252, the sixth refracted light path 253, and the sixth reflected light path will not be described in detail here.

[0143] The monochromator 450 coupled with a visible photomultiplier tube is a device assembly for high-sensitivity spectral measurements. The monochromator decomposes light emitted from a light source into different wavelengths, while the visible photomultiplier tube detects these wavelengths. Therefore, the monochromator 450 coupled with a visible photomultiplier tube can also be used to analyze and process spectral data, generate spectral maps, and perform related data interpretation.

[0144] And / or, a single-photon counter 430 is connected to the fifth optical path layer 250, the light source assembly 300 projects light onto the sample and reflects it to form a third reflected light path, the third reflected light path projects light onto the sixth beam splitter 251 and refracts it to form a detection light path, and the single-photon counter 430 is used to receive the light on the detection light path.

[0145] The single-photon counter 430 is a high-time-resolution spectroscopic technique used to measure the arrival time distribution of single photons. It should be understood that the sample can be excited by projecting light using the light source assembly 300, causing the sample to reflect light to form a third reflected light path and produce fluorescence or other photon emission phenomena, thus enabling the single-photon counter 430 to achieve its measurement purpose.

[0146] Please refer to Figures 1 and 6. In some embodiments, a sixth bandpass filter (not shown in the figures, but can be referred to in Figures 2 and 3 for the layout of the first bandpass filter 214 relative to the first beam splitter 211) is also movably disposed in the fifth optical path layer 250, and the sixth bandpass filter is disposed on the path of the sixth incident optical path 252; and / or, a sixth fluorescence filter (not shown in the figures, but can be referred to in Figures 2 and 3 for the layout of the first fluorescence filter 215 relative to the first beam splitter 211) is also movably disposed in the fourth optical path layer 240, and the sixth fluorescence filter is disposed on the path of the sixth refracted optical path 253.

[0147] The sixth bandpass filter is disposed on the path of the sixth incident light path 252. Thus, the sixth bandpass filter can filter the light in the sixth incident light path 252 so that light of a specific wavelength range can pass through.

[0148] The sixth fluorescence filter is positioned on the path of the sixth refractive light path 253, thereby filtering the light in the sixth refractive light path 253. By blocking unwanted light, the background noise in the light path is reduced, enhancing the contrast and clarity of the images analyzed by the visible spectrometer 420 and / or the monochromator 450 coupled with a visible photomultiplier tube. At the same time, by utilizing the different wavelengths of light emitted by different fluorescent dyes or markers, the sixth fluorescence filter can select a specific wavelength range to match the fluorescence characteristics of the sample.

[0149] Both the sixth bandpass filter and the sixth fluorescence filter are movably disposed within the fifth optical path layer 250, thereby allowing the sixth bandpass filter and / or the sixth fluorescence filter to be moved or replaced. Exemplarily, in some embodiments, the sixth bandpass filter, the sixth fluorescence filter, and the sixth beam splitter 251 can be disposed on a frame structure. The sixth bandpass filter is disposed on the horizontally oriented surface of the frame structure, the sixth fluorescence filter is disposed on the downward-facing surface of the frame structure, and the sixth beam splitter 251 is obliquely disposed inside the frame structure, for example, at a 45° angle to the horizontal plane, and the sixth beam splitter 251 simultaneously faces both the sixth bandpass filter and the sixth fluorescence filter. Thus, light in the sixth incident optical path 252 can pass through the sixth bandpass filter, be reflected by the sixth beam splitter 251, pass through the sixth fluorescence filter, and be projected onto the sample.

[0150] Please refer to Figures 1 and 7. In some embodiments, the optical path structure 200 includes a sixth optical path layer 260, in which a reflector 261 is movably disposed; the light source assembly 300 projects light onto the sample and reflects it to form a third reflected light path 262, which projects light onto the reflector 261 and refracts it to form an observation light path 263; the in-situ photoelectric characterization system 1000 also includes a first camera 600, which is disposed on the sixth optical path layer 260, and the receiving end of the first camera 600 is located on the observation light path 263.

[0151] The sixth optical path layer 260 is a part of the optical path structure 200; the sixth optical path layer 260 is used to set up the first camera 600 so that the first camera 600 can be used to observe and record the sample.

[0152] The first camera 600 is an electronic device with shooting or recording functions. After the light source assembly 300 projects light onto the sample, the light can be reflected on the sample to form a third reflected light path 262; at the same time, the reflector 261 can refract the light in the third reflected light path 262 to form an observation light path 263, and the first camera 600 can receive the light in the observation light path 263, thus realizing the purpose of the first camera 600 to observe and record the sample.

[0153] With this configuration, the reflector 261 can be moved to refract the third reflected light path 262 to form the observation light path 263, thereby enabling the first camera 600 to photograph and observe the sample through the observation light path 263; and, through the observation light path 263 formed by the light projected and refracted from different light sources in the light source assembly 300, bright-field imaging or dark-field imaging can be achieved.

[0154] Please refer to Figures 1 and 6. In some embodiments, the in-situ photoelectric characterization system 1000 further includes a second camera 700, which is disposed on the optical path structure 200, and the receiving end of the second camera 700 is located on the third reflected optical path 262.

[0155] The second camera 700 is an electronic device with shooting or recording functions. The receiving end of the second camera 700 is located on the third reflected light path 262; thus, the second camera 700 can observe and record the sample through the third reflected light path 262.

[0156] With this setup, the second camera 700 can capture and observe the sample through the third reflected light path 262 to achieve rapid imaging.

[0157] Please refer to Figure 1. In some embodiments, the in-situ photoelectric characterization system 1000 also includes an ultraviolet aging light source 800, which faces the sample stage 100.

[0158] The ultraviolet aging light source 800 is a device that simulates ultraviolet radiation to accelerate the aging process of a sample. Exemplarily, in some embodiments, the ultraviolet aging light source 800 may include one or more LED aging lamps, such as two LED aging lamps, and the wavelengths and power densities of the two LED aging lamps may be set differently for selection.

[0159] Meanwhile, a light shield can be installed outside the ultraviolet aging light source 800 to reduce the impact of the ultraviolet aging light source 800 on the environmental coverage.

[0160] This setup allows the use of an ultraviolet aging light source 800 to simulate and accelerate the aging process of the sample, facilitating sample testing.

[0161] Please refer to Figure 1. In some embodiments, the in-situ photoelectric characterization system 1000 further includes an environmental cavity 900, in which the sample is placed. A transparent window (not shown in the figure) is provided on the environmental cavity 900, and the objective lens end 201 faces the transparent window. A temperature control device (not shown in the figure) is provided on the environmental cavity 900. The environmental cavity 900 is also connected to an atmosphere conditioning device (not shown in the figure), which is used to introduce inert gas and water vapor into the environmental cavity 900.

[0162] The temperature control device can use liquid nitrogen-cooled heating wires to achieve a temperature range of -190℃ to 600℃.

[0163] The atmosphere conditioning device is used to introduce inert gas (such as nitrogen) and water vapor into the environmental cavity 900 to change the atmosphere inside the environmental cavity 900 and achieve the purpose of atmosphere conditioning.

[0164] With this setup, the temperature inside the ambient chamber 900 can be controlled using a temperature control device, and inert gas and water vapor can be introduced into the ambient chamber 900 using an atmosphere conditioning device to achieve atmosphere conditioning. This allows for the adjustment of the atmosphere in which the sample is located, enabling detection under different environmental atmospheres.

[0165] Please refer to Figure 1. In some embodiments, the in-situ photoelectric characterization system 1000 further includes a driving device (not shown in the figure), which is driven to connect to the sample stage 100, which is configured to be driven to move in the horizontal direction.

[0166] The driving device can be, but is not limited to, a motor-driven structure, a cylinder-driven structure, a hydraulic cylinder-driven structure, etc. For example, in some embodiments, the drive connection combination of the sample stage 100 and the driving device can be equivalently replaced by an electric displacement stage of a microscope, thereby realizing the movement control of the sample.

[0167] With this configuration, the drive device can drive the sample stage 100 and move the sample horizontally, thereby enabling analysis and observation of different parts of the sample.

[0168] The in-situ photoelectric characterization system 1000 provided in this application embodiment will be further described below according to specific implementation methods.

[0169] Please refer to Figures 1 to 7. In this embodiment, an in-situ photoelectric characterization system 1000 can be applied to detect perovskite samples. The in-situ photoelectric characterization system 1000 includes a sample stage 100, an optical path structure 200, a light source assembly 300, a light source analysis assembly 400, and a source surface device 500.

[0170] In the direction of gravity, the optical path structure 200 includes a first optical path layer 210, a sixth optical path layer 260, a second optical path layer 220, a third optical path layer 230, a fifth optical path layer 250, and a fourth optical path layer 240 arranged sequentially from bottom to top. An objective lens end 201 is located at the lowermost end of the optical path structure 200 in the direction of gravity, facing the sample on the sample stage 100. The source meter device 500 is electrically connected to the sample.

[0171] A first beam splitter 211 is movably disposed in the first optical path layer 210; the light source assembly 300 includes a halogen light source 310 and multiple LED light sources 320; the halogen light source 310 and multiple LED light sources 320 are respectively mounted on the first optical path layer 210. Specifically, the multiple LED light sources 320 can be three LED light sources 320, and the three LED light sources 320 have different wavelengths. Thus, the halogen light source 310 and the multiple LED light sources 320 can serve as excitation sources, enabling the source meter device 500 to perform electrical characteristic curve testing.

[0172] A reflector 261 is movably disposed in the sixth optical path layer 260, and a first camera 600 is also disposed on the sixth optical path layer 260. The first camera 600 can take pictures of the sample through the refraction of the reflector 261. The halogen light source 310 and multiple LED light sources 320 on the first optical path layer 210 can project light onto the sample for the first camera 600 to perform bright field imaging or dark field imaging.

[0173] A second beam splitter 221 and a third beam splitter 222 are movably disposed in the second optical path layer 220. The light source assembly 300 also includes a first stable light source 330 and a second stable light source 340. The first stable light source 330 and the second stable light source 340 can be connected to the second optical path layer 220 via optical fibers, so that the first stable light source 330 can project light onto the second beam splitter 221 and refract it towards the sample, and the second stable light source 340 can project light onto the third beam splitter 222 and refract it towards the sample. The first stable light source 330 and the second stable light source 340 can also serve as excitation sources, thereby enabling the source surface device 500 to perform electrical characteristic curve testing.

[0174] A fourth beam splitter 231 is movably disposed in the third optical path layer 230; the light source assembly 300 also includes an adjustable light source 350, which includes any one of a third steady-state light source 351, a fourth steady-state light source 352, a first pulse light source 353, a second pulse light source 354, and a third pulse light source 355. Understandably, by connecting any one of the third steady-state light source 351, the fourth steady-state light source 352, the first pulse light source 353, the second pulse light source 354, and the third pulse light source 355 to the third optical path layer 230 via optical fiber, and projecting light onto the sample through the fourth beam splitter 231, imaging conditions can be met or the light source can be used as an excitation source for testing the electrical characteristic curves of the source surface device 500.

[0175] A sixth beam splitter 251 is movably disposed in the fifth optical path layer 250; the light source analysis component 400 includes a visible spectrometer 420, a monochromator 450 coupled with a visible photomultiplier tube, and a single-photon counter 430. The visible spectrometer 420, the monochromator 450 coupled with a visible photomultiplier tube, and the single-photon counter 430 can be connected to the fifth optical path layer 250 respectively through fiber optic probes. The visible spectrometer 420 and the monochromator 450 coupled with a visible photomultiplier tube are used to analyze the absorption, reflection, or transmission characteristics of the sample in the visible light range and analyze and form a spectrum; the single-photon counter 430 is used to detect and count individual photons. The visible spectrometer 420, the monochromator 450 coupled with a visible photomultiplier tube, and the single-photon counter 430 can analyze and detect the sample through the sixth beam splitter 251.

[0176] A fifth beam splitter 241 is movably disposed in the fourth optical path layer 240; the light source analysis component 400 also includes a near-infrared spectrometer 410 and a monochromator 440 coupled with a near-infrared photomultiplier tube. The near-infrared spectrometer 410 and the monochromator 440 coupled with the near-infrared photomultiplier tube can be connected to the fourth optical path layer 240 respectively through fiber optic probes. The near-infrared spectrometer 410 and the monochromator 440 coupled with the near-infrared photomultiplier tube are used to analyze the absorption and reflection characteristics of the sample in the near-infrared region and analyze the resulting spectrum. Furthermore, a second camera 700 is disposed at the top of the fourth optical path layer 240. The second camera 700 can receive the third reflected light path 262 formed by the light projected onto the sample by the light source component 300 and reflected, thereby achieving rapid imaging of the sample.

[0177] Meanwhile, the sample is placed in an environmental chamber 900, which is equipped with a temperature control device and an atmosphere conditioning device to regulate the temperature and atmosphere within the chamber. An ultraviolet aging light source 800 is also installed outside the environmental chamber 900 to simulate and accelerate the aging process of the sample, facilitating sample testing.

[0178] The in-situ photoelectric characterization system 1000 also includes a driving device that is driven to move horizontally on the sample stage 100.

[0179] Thus, based on the above structure, the in-situ photoelectric characterization system 1000 can achieve bright-field and dark-field imaging of samples; reflectance spectral testing at different wavelengths; in-situ rapid fluorescence imaging using LED light sources 320 of different wavelengths, a first bandpass filter 214, a first fluorescence filter 215, a first camera 600, and a second camera 700; in-situ steady-state fluorescence spectral testing using a first steady-state light source 330, a second steady-state light source 340, a third steady-state light source 351, and a fourth steady-state light source 352, as well as a near-infrared spectrometer 410 and a visible spectrometer 420; steady-state fluorescence spectral imaging by using a driving device to move the sample connected to the sample stage 100; and in-situ rapid fluorescence spectral testing using a coupled first pulse light source 353, a second pulse light source 354, and a third pulse light source 355, and a single-photon meter. In-situ fluorescence lifetime testing is achieved using a counter 430, a monochromator 440 coupled with a near-infrared photomultiplier tube, and a monochromator 450 coupled with a visible photomultiplier tube. Electroluminescence imaging is achieved by using a source meter device 500 to output DC power to the sample and apply a forward bias voltage to the sample. Electrical characteristic curve testing is achieved by using different light source components 300 (e.g., halogen light source 310, LED light source 320, etc.) as excitation sources in conjunction with the source meter device 500. One or more of the first steady-state light source 330, the second steady-state light source 340, the third steady-state light source 351, and the fourth steady-state light source 352 are used, and the sample stage 100 is moved by a driving device to achieve point-by-point scanning. The source meter device 500 records the changes in photocurrent intensity caused by irradiation at different positions to achieve photocurrent imaging and other detection processes.

[0180] The above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. An in-situ photoelectric characterization system, comprising: Sample stage, used to place samples; An optical path structure for transmitting light, the optical path structure having an objective lens end facing the sample; A light source assembly is connected to the optical path structure and is used to project light into the optical path structure so that the light passes through the objective lens end and is projected onto the sample. A light source analysis component, connected to the optical path structure and acting on the sample; wherein the light source analysis component includes at least one of a near-infrared spectrometer, a visible spectrometer, a single-photon counter, a monochromator coupled with a near-infrared photomultiplier tube, and a monochromator coupled with a visible photomultiplier tube; and A source meter device, which is electrically connected to the sample.

2. The in-situ photoelectric characterization system according to claim 1, wherein, The optical path structure includes a first optical path layer, and a first beam splitter is movably disposed within the first optical path layer; The light source assembly includes a halogen light source and a plurality of LED light sources, wherein the halogen light source and the plurality of LED light sources are disposed on the first optical path layer; wherein at least one of the plurality of LED light sources has a different wavelength than the other LED light sources; The halogen light source and the plurality of LED light sources are used to project light onto the first beam splitter along the first incident light path. The first incident light path is refracted by the first beam splitter to form a first refracted light path. The first refracted light path passes through the objective lens end and faces the sample.

3. The in-situ photoelectric characterization system according to claim 2, wherein, A first bandpass filter is also movably disposed within the first optical path layer, and the first bandpass filter is disposed on the path of the first incident light path; and / or, a first fluorescent filter is also movably disposed within the first optical path layer, and the first fluorescent filter is disposed on the path of the first refracted light path.

4. The in-situ photoelectric characterization system according to claim 2 or 3, wherein, The optical path structure includes a second optical path layer, within which a second beam splitter and a third beam splitter are movably disposed; The light source assembly includes a first steady-state light source and a second steady-state light source. The first steady-state light source is used to project light onto the second beam splitter along a second incident light path. The second incident light path is refracted by the second beam splitter to form a second refracted light path, which passes through the objective lens and faces the sample. The second steady-state light source is used to project light onto the third beam splitter along a third incident light path. The third incident light path is refracted by the third beam splitter to form a third refracted light path, which passes through the objective lens and faces the sample.

5. The in-situ photoelectric characterization system according to claim 4, wherein, A second bandpass filter is also movably disposed within the second optical path layer, and the second bandpass filter is disposed on the path of the second incident optical path; And / or, a third bandpass filter is also movably disposed within the second optical path layer, the third bandpass filter being disposed on the path of the third incident optical path; And / or, a second fluorescent filter is also movably disposed within the second optical path layer, the second fluorescent filter being disposed on the path of the second refracted optical path; And / or, a third fluorescent filter is also movably disposed within the second optical path layer, the third fluorescent filter being disposed on the path of the third refractive optical path.

6. The in-situ photoelectric characterization system according to claim 4 or 5, wherein, A first attenuator is also movably disposed within the second optical path layer, and the first attenuator is disposed on the path between the second incident optical path and the third incident optical path; And / or, a first polarizer is also movably disposed within the second optical path layer, the first polarizer being disposed on the path of the second incident optical path and the third incident optical path.

7. The in-situ photoelectric characterization system according to any one of claims 2 to 6, wherein, The optical path structure includes a third optical path layer, and a fourth beam splitter is movably disposed within the third optical path layer; The light source assembly includes an adjustable light source, which is used to project light onto the fourth beam splitter along the fourth incident light path. The fourth incident light path is refracted by the fourth beam splitter to form a fourth refracted light path, which passes through the objective lens end and faces the sample. The adjustable light source includes any one of the following: a third steady-state light source, a fourth steady-state light source, a first pulse light source, a second pulse light source, and a third pulse light source.

8. The in-situ photoelectric characterization system according to claim 7, wherein, A fourth bandpass filter is also movably disposed within the third optical path layer, and the fourth bandpass filter is disposed on the path of the fourth incident optical path; and / or, a fourth fluorescence filter is also movably disposed within the third optical path layer, and the fourth fluorescence filter is disposed on the path of the fourth refracted optical path.

9. The in-situ photoelectric characterization system according to claim 7 or 8, wherein, The third optical path layer is further provided with a second attenuator, which is disposed on the path of the fourth incident optical path; and / or, the third optical path layer is further provided with a second polarizer, which is disposed on the path of the fourth incident optical path.

10. The in-situ photoelectric characterization system according to any one of claims 1 to 9, wherein, The optical path structure includes a fourth optical path layer, and a fifth beam splitter is movably disposed within the fourth optical path layer; The near-infrared spectrometer is connected to the fourth optical path layer. The fiber optic probe of the near-infrared spectrometer is inserted into the fourth optical path layer and is used to project light onto the fifth beam splitter along the fifth incident optical path, so that the fifth incident optical path is refracted to form a fifth refracted optical path. The fifth refracted optical path passes through the objective lens end and projects light toward the sample to form a first reflected optical path. The first reflected optical path coincides with the fifth refracted optical path. And / or, a monochromator coupled with a near-infrared photomultiplier tube is connected to the fourth optical path layer, and the fiber optic probe of the monochromator coupled with the near-infrared photomultiplier tube is inserted into the fourth optical path layer and used to project light onto the fifth beam splitter along the fifth incident optical path, so that the fifth incident optical path is refracted to form a fifth refracted optical path; the fifth refracted optical path passes through the objective lens end and projects light toward the sample to form a first reflected optical path, and the first reflected optical path coincides with the fifth refracted optical path.

11. The in-situ photoelectric characterization system according to claim 10, wherein, A fifth bandpass filter is also movably disposed within the fourth optical path layer, and the fifth bandpass filter is disposed on the path of the fifth incident optical path; and / or, a fifth fluorescence filter is also movably disposed within the third optical path layer, and the fifth fluorescence filter is disposed on the path of the fifth refracted optical path.

12. The in-situ photoelectric characterization system according to any one of claims 1 to 11, wherein, The optical path structure includes a fifth optical path layer, and a sixth beam splitter is movably disposed within the fifth optical path layer; The visible spectrometer is connected to the fifth optical path layer. The fiber optic probe of the visible spectrometer is inserted into the fifth optical path layer and is used to project light onto the sixth beam splitter along the sixth incident optical path, so that the sixth incident optical path is refracted to form a sixth refracted optical path. The sixth refracted optical path passes through the objective lens end and projects light toward the sample to form a second reflected optical path. The second reflected optical path coincides with the sixth refracted optical path. And / or, the monochromator coupled with a visible photomultiplier tube is connected to the fifth optical path layer, and the fiber optic probe of the monochromator coupled with the visible photomultiplier tube is inserted into the fifth optical path layer and used to project light onto the sixth beam splitter along the sixth incident optical path, so that the sixth incident optical path is refracted to form a sixth refracted optical path; the sixth refracted optical path passes through the objective lens end and projects light toward the sample to form a second reflected optical path, and the second reflected optical path coincides with the sixth refracted optical path; And / or, the single-photon counter is connected to the fifth optical path layer, the light source component projects light onto the sample and reflects it to form a third reflected light path, the third reflected light path projects light onto the sixth beam splitter and refracts it to form a detection light path, and the single-photon counter is used to receive the light on the detection light path.

13. The in-situ photoelectric characterization system according to claim 12, wherein, A sixth bandpass filter is also movably disposed within the fifth optical path layer, and the sixth bandpass filter is disposed on the path of the sixth incident optical path; and / or, a sixth fluorescence filter is also movably disposed within the fourth optical path layer, and the sixth fluorescence filter is disposed on the path of the sixth refracted optical path.

14. The in-situ photoelectric characterization system according to any one of claims 1 to 13, wherein, The optical path structure includes a sixth optical path layer, and a reflector is movably disposed within the sixth optical path layer; The light source component projects light onto the sample and reflects it to form a third reflected light path. The third reflected light path projects light onto the mirror and refracts it to form an observation light path. The in-situ photoelectric characterization system also includes a first camera, which is disposed on the sixth light path layer, and the receiving end of the first camera is located on the observation light path.

15. The in-situ photoelectric characterization system according to claim 14, wherein, The in-situ photoelectric characterization system further includes a second camera, which is disposed on the optical path structure, and the receiving end of the second camera is located on the third reflected optical path.

16. The in-situ photoelectric characterization system according to any one of claims 1 to 15, wherein, The in-situ photoelectric characterization system also includes an ultraviolet aging light source, which faces the sample stage.

17. The in-situ photoelectric characterization system according to any one of claims 1 to 16, wherein, The in-situ photoelectric characterization system further includes an environmental cavity, in which the sample is housed, and a transparent window is provided on the environmental cavity, with the objective lens facing the transparent window; The environmental cavity is equipped with a temperature control device; the environmental cavity is also connected to an atmosphere conditioning device, which is used to introduce inert gas and water vapor into the environmental cavity.

18. The in-situ photoelectric characterization system according to any one of claims 1 to 17, wherein, The in-situ photoelectric characterization system also includes a driving device, which is driven and connected to the sample stage, and the sample stage is configured to be driven to move in the horizontal direction.

Images