Treatment system for optical substrates, use of a coupling mechanism in such a treatment system, and method for operating a treatment system

Abstract

A treatment system (10) for optical substrates (12) has at least one evacuated substrate receiving chamber (32, 34) and at least one evacuated substrate treatment chamber (28). A substrate transport device (22) has at least one rigid pivot arm (24) which is fixed at a first end (25) to a pivot shaft (36) and which, at a second end (42), has a coupling apparatus (44) via which the pivot arm (24) is couplable to a substrate holder (14), wherein the pivot shaft (36) is arranged in the substrate receiving chamber (30, 32, 34). The pivot arm (24) is pivotable at least between a first working position (38) and a second working position (40), wherein the first working position (38) is situated in the substrate receiving chamber (30, 32, 34) and the second working position (40) is situated in the substrate treatment chamber (28). The substrate transport device (22) is designed such that the coupling apparatus (44) is couplable to the substrate holder (14) and decouplable from the substrate holder (14) both in the first working position (38) and in the second working position (40). Also described are the use of a coupling mechanism in a treatment system (10), and a method for operating a treatment system (10).

Description

[0001] Treatment system for optical substrates, use of a coupling mechanism in such a treatment system, and methods for operating a treatment system

[0002] The invention relates to a treatment system for optical substrates. Furthermore, the invention relates to the use of a coupling mechanism in a treatment system for optical substrates and to a method for operating a treatment system.

[0003] It is known from the prior art that optical substrates, for example spectacle lens substrates, undergo at least one treatment step in treatment systems, which typically takes place in a vacuum. For treatment steps of substrates that take place in a vacuum, the transport of the substrates into and through the vacuum chambers of a treatment system is a significant factor in terms of time and cost.

[0004] Furthermore, during the transport of the substrates in the vacuum chambers, it must be ensured that the substrates are not contaminated by particles generated, for example, by abrasion processes of a transport device inside the vacuum chambers. It should also be possible to maintain a sufficient vacuum in the vacuum chambers.

[0005] Furthermore, the respective optical substrate must be fed into the treatment system and subsequently removed from the treatment system, whereby it is particularly important to ensure that the vacuum is maintained.

[0006] Therefore, numerous steps must be considered in the treatment of optical substrates, e.g. for loading, positioning, cleaning and coating the substrates.

[0007] The object of the invention is to simplify the transport of optical substrates in a treatment system, in particular within the vacuum chambers of the treatment system.

[0008] This problem is solved by a treatment system for optical substrates, comprising at least one substrate receiving chamber and at least one substrate treatment chamber. The substrate receiving chamber and the substrate treatment chamber are designed as evacuable vacuum chambers. Furthermore, the treatment system includes a substrate transport device designed to move a substrate holder with a plurality of mounts for optical substrates to be treated from the substrate receiving chamber to the substrate treatment chamber. The substrate transport device has at least one rigid pivot arm, which is fixed at one end to a pivot shaft and has a coupling device at the other end, allowing the pivot arm to be coupled to the substrate holder. The pivot shaft is located in the substrate receiving chamber.The swivel arm is pivotable in a pivot plane at least between a first working position and a second working position, both of which lie on an arc of motion along which the coupling device can move, with the first working position being in the substrate receiving chamber and the second working position in the substrate treatment chamber. The substrate transport device is designed such that the coupling device can be coupled to and uncoupled from the substrate holder at both the first and second working positions.

[0009] The length and shape of the swivel arm, and therefore also its pivot plane and the arc of movement, are fixed and do not change during the movement of the swivel arm.

[0010] The use of a rigid swivel arm for transporting the substrate holder offers several advantages, including the fact that the same forces act on the coupling device at every position along the arc of movement. This ensures uniform movement of the swivel arm and substrate holder across the entire arc without significant positional deviations. The movement is therefore precisely defined, and the positioning of the substrate holder is highly reproducible. The swivel arm can thus be designed for large and heavy substrate holders up to approximately one meter in diameter and weighing several hundred kilograms. Conversely, such a treatment system can also be implemented for small substrate holders weighing just a few grams and with a diameter of only a few millimeters to centimeters, based on the same principle.The dimensions of the treatment system must, of course, be specifically adapted to the respective application.

[0011] Furthermore, the swivel arm can be moved solely by rotating the pivot shaft, which minimizes the number of moving parts inside the vacuum chamber. This also reduces the amount of particles generated by abrasion, which could contaminate the optical substrates, particularly compared to solutions with roller systems or telescopic arms. The use of a swivel arm can therefore also reduce pretreatments, such as cleaning, of the optical substrates, saving both time and money. The swivel arm is also subject to minimal wear. Therefore, such a treatment system can increase overall productivity.

[0012] The simple movement pattern of the swivel arm is also well suited for a high degree of automation of the treatment system.

[0013] Furthermore, the treatment system is very compact and can therefore be installed even where space is limited.

[0014] In general, such a treatment device makes it possible to treat optical substrates, especially for consumer products, with high quality, short processing times and high throughput.

[0015] Each of the vacuum chambers can, in principle, be evacuated by means of a suitable flow connection to a vacuum pump.

[0016] At least one substrate receiving chamber can be arranged so that it can be loaded and / or unloaded from a cleanroom. For example, it is conceivable to install the treatment system itself in a gray room, but to place it adjacent to a wall of a cleanroom, and to make at least one substrate receiving chamber accessible through an opening in this wall. The treatment system is thus positioned between the gray room and the cleanroom, since one side of the treatment system faces the cleanroom, while another side is accessible from the gray room. A gray room refers to an area in the vicinity of the treatment system that is subject to less stringent particle-free requirements than the cleanroom.

[0017] In this context, "optical substrates" refer to, for example, lens substrates for corrective lenses, sports glasses, or sunglasses, but also to planar substrates for eyeglass-like devices, such as those used in virtual and augmented reality (VR and AR) applications. Optical substrates can also be other planar substrates, such as those for heads-up displays or optical filters. The dimensions of the substrates can range from a few millimeters to several decimeters.

[0018] To increase the rigidity and thus the stability of the swivel arm, it can have a suitable profile, such as an I- or double-T profile. This results in high bending stiffness while simultaneously reducing the weight of the swivel arm. Such a design offers advantages for high reproducibility of the substrate holder's positioning during transport through the processing system.

[0019] In one variant, a pivoting shaft is located only in the substrate receiving chamber, while no pivoting shaft is present in the substrate treatment chamber. The pivoting arm is continuously moved from the substrate receiving chamber to the substrate treatment chamber and then back again. For example, the substrate holder is transported from the substrate receiving chamber to the substrate treatment chamber and decoupled from the pivoting arm there. After the substrate holder is decoupled in the substrate treatment chamber, the pivoting arm is then moved back to the substrate receiving chamber before substrate treatment takes place. This has the advantage, among others, that another substrate holder can already be handled in the substrate receiving chamber, for example, unloaded from or loaded into the substrate receiving chamber.Another advantage is that the swivel arm is not exposed to the substrate treatment taking place in the substrate treatment chamber and is therefore not affected by the treatment process, meaning it is not contaminated by a coating, for example. If the swivel arm is positioned at the edge of the substrate receiving chamber, the first working position can easily be placed in a central area of ​​the substrate receiving chamber and the second working position in a central area of ​​the substrate treatment chamber. This allows handling of the substrate holder to always take place in the center of the respective vacuum chamber, keeping the volume of the vacuum chamber as small as possible and thus making the entire treatment system very compact.

[0020] The concept of using swivel arms in conjunction with fixed working positions in different vacuum chambers, where the substrate holder can be coupled to and decoupled from the swivel arm, enables highly variable transport of the substrate holder through the treatment system. At the same time, it also allows for a flexible arrangement of the vacuum chambers within the treatment system. A swivel arm only ever needs to operate between two adjacent vacuum chambers. Since only the transport of the substrate holder between two adjacent vacuum chambers is considered, expanding the treatment system with additional vacuum chambers, with and without swivel arms, is easily accomplished.

[0021] In its simplest configuration, the treatment system has exactly one substrate intake chamber and one substrate treatment chamber.

[0022] In this case, among others, the substrate transport device may be designed to move the substrate holder back from the substrate treatment chamber to the substrate receiving chamber. This typically occurs when the treatment of the optical substrates in the substrate treatment chamber is complete.

[0023] In a more complex setup, the treatment system can have several substrate intake chambers and optionally also several substrate treatment chambers.

[0024] In such a treatment system, the substrate transport device is designed, for example, to move the substrate holder from the substrate treatment chamber to either a first substrate receiving chamber and a second substrate receiving chamber. At least one of the several substrate receiving chambers can have a sluice valve to a non-evacuated area of ​​the treatment system and serve as a loading and / or unloading chamber for the substrate holder.

[0025] The airlock valve forms a closable passage in the wall of a vacuum chamber to the ambient environment at normal pressure (i.e., in a non-evacuated area) or to an adjacent vacuum chamber. The airlock valve is, for example, a valve with a slide or a flap. In the open position, the airlock valve provides an opening with sufficient height and width to allow the substrate holder, possibly together with its attached swivel arm, to pass through. In the open position, a substrate holder can therefore be inserted into (loaded) or removed from (unloaded) the vacuum chamber, or transferred from one vacuum chamber to an adjacent one. In the closed position, the airlock valve seals the opening sufficiently tightly, for example, to allow ventilation of one of the adjacent vacuum chambers without affecting the vacuum in the other vacuum chambers.The pressure in each vacuum chamber can then be adjusted independently. For example, a vacuum can always be maintained in the substrate treatment chamber, while the substrate receiving chambers are usually vented for loading and unloading the substrate holder and evacuated again before the substrate holder is transferred to the substrate treatment chamber.

[0026] When the substrate receiving chamber serves as a loading chamber, a substrate holder is introduced into this chamber from a non-evacuated area of ​​the treatment system or from outside the system, particularly in a cleanroom. Inside the receiving chamber, the substrate holder is coupled to the swivel arm located there. In one possible configuration, the receiving chamber is then evacuated. The substrate holder can now be moved by the swivel arm to the adjacent (evacuated) substrate treatment chamber and detached from the swivel arm there. The swivel arm is then moved back into the receiving chamber serving as the loading chamber. After the optical substrates have been treated in the treatment chamber, the swivel arm of the receiving chamber serving as the unloading chamber, which is evacuated at this point, takes over the substrate holder and transfers it into this receiving chamber.The unloading chamber can now be ventilated while the substrate treatment chamber remains evacuated. From the unloading chamber, the substrate holder is transferred back to a non-evacuated area.

[0027] It is possible to use the first or second substrate intake chamber as a dedicated loading chamber and, correspondingly, the other substrate intake chamber as a dedicated unloading chamber. However, it is equally conceivable to use the first and / or second substrate intake chamber as both a loading and an unloading chamber.

[0028] Especially if the treatment system has more than three vacuum chambers, the multiple substrate receiving chambers can include at least one substrate receiving chamber that is directly adjacent to at least two vacuum chambers and in which two pivoting shafts, each with a pivoting arm, are arranged. This substrate receiving chamber serves to transfer the substrate holder to a subsequent area of ​​the treatment system by passing the substrate holder from one of the pivoting arms to the other.

[0029] The treatment system can comprise any combination of substrate treatment chambers, substrate receiving chambers with a pivot shaft and a pivot arm, and substrate receiving chambers with two pivot shafts and thus two pivot arms, thereby enabling the realization of a complex substrate transport system with which a substrate holder can be moved throughout the entire treatment system. For example, the substrate holder can thus be moved sequentially into different substrate treatment chambers, in which different chemical and / or physical treatments of the optical substrates are carried out. A return movement into one of the substrate treatment chambers and / or substrate receiving chambers would also be conceivable.Similarly, branches or diverts can be implemented for the substrate holder in the treatment system, for example to move different substrate holders to different unloading chambers or to place a substrate holder on a waiting area, from which it is picked up again by a suitable swivel arm and transported further at a predetermined work step.

[0030] Generally, all working positions reachable by two swivel arms are located at points of contact or intersection of the arcs of motion of the coupling devices of these two swivel arms.

[0031] In one possible variant, the substrate treatment chamber is located between a first substrate intake chamber and a further

[0032] Substrate intake chamber of the several substrate intake chambers arranged, and in the first substrate intake chamber and in the further

[0033] Each substrate receiving chamber has at least one pivoting shaft with a

[0034] A swivel arm is arranged, wherein the first substrate receiving chamber and the subsequent substrate receiving chamber are each connected via a sluice valve to a non-evacuated area belonging to the treatment plant or located outside the treatment plant. The first

[0035] The substrate intake chamber serves as a loading chamber and the further

[0036] Substrate intake chamber as discharge chamber, or the first

[0037] The substrate intake chamber serves as an unloading chamber and the further

[0038] Substrate intake chamber as loading chamber.

[0039] In one variant, the substrate intake chamber and the substrate treatment chamber are arranged directly adjacent to each other and connected by a sluice valve, so that no ventilation of the substrate treatment chamber is required when, for example, one of the substrate intake chambers is ventilated and opened for loading or unloading. Furthermore, contamination of the substrate intake chambers by the treatment process in the substrate treatment chamber is reduced, since the sluice valve can be closed during treatment.

[0040] To reduce the overall space requirement of the treatment system and specifically the substrate transport system, the airlock between adjacent vacuum chambers, e.g., a substrate receiving chamber and a substrate treatment chamber, can be oriented such that its opening lies at the midpoint of the arc of movement of the associated swivel arm between its first and second working positions. The width of the airlock opening can be utilized optimally if the airlock is oriented so that a tangent to the arc of movement at this midpoint is perpendicular to a straight line defined by the width of the airlock opening.

[0041] The center point of the opening of the sluice valve, relative to its width, can coincide with the center point of the arc of movement between the first working position (and thus the substrate holder holding device) in the substrate receiving chamber and the second working position (and thus the substrate holder holding device) in the substrate treatment chamber.

[0042] The substrate treatment chamber contains, for example, a device for the physical and / or chemical treatment of the optical substrates. The physical and / or chemical treatment performed by the device includes, for example, coating, vapor deposition, cleaning, degreasing, glowing, curing, and / or annealing, or other suitable pretreatments, treatments, and / or post-treatments of the optical substrates. The treatment can be carried out in any suitable manner, for example, by means of a PVD, CVD, or PECVD system, by plasma treatment, by heating, and / or irradiation with electromagnetic radiation or particle radiation.

[0043] However, it is also possible to perform certain treatments of the optical substrates, e.g., pre- and / or post-treatments, in one of the substrate receiving chambers. These can include, among other things, thermal treatment or coating at room temperature.

[0044] The substrate holder has a top and a bottom opposite the top. The swivel arm is coupled to the substrate holder at the top, while the device for physical and / or chemical treatment of the optical substrates faces the bottom. This design allows the substrate holder to at least partially seal the device, thus shielding the top of the substrate holder and the area of ​​the substrate treatment chamber above it from interference caused by the optical substrate treatment process.

[0045] In one configuration, the swivel arm is always positioned on the top of the substrate holder, while the optical substrates are always treated from the underside of the substrate holder. This significantly reduces contamination of the optical substrates by the movement of the substrate holder or, for example, the coupling processes with the swivel arm, as well as damage to the swivel arm caused by the treatment of the optical substrates. However, it would also be conceivable to design the substrate treatment chamber and / or the substrate holder so that the optical substrates are treated from the top of the substrate holder.

[0046] To facilitate movement of the swivel arm, for example through the sluice valves between a substrate receiving chamber and an adjacent substrate treatment chamber, the swivel arm can be curved between the swivel shaft and the coupling device. This curvature is typically formed in the plane of rotation. The swivel arm can, for example, have two or more (straight) sections running at an angle to each other, resulting in the overall curvature of the swivel arm. Alternatively, the swivel arm could be curved in sections or continuously along its entire length.

[0047] In order to be able to couple the substrate holder with the swivel arm and decouple it from the swivel arm, the substrate holder has, for example, at least one coupling structure for the coupling device, wherein the coupling device is designed to interact with the coupling structure in a force-locking and / or form-locking manner in order to couple the substrate holder with the swivel arm, and to be released from the coupling structure in order to decouple the substrate holder from the swivel arm.

[0048] In one possible variant, the coupling device is a fork with two parallel struts, the struts being aligned parallel to the pivot plane and tangential to the arc of motion. The coupling structure can be formed by a plate on the substrate holder, which defines a receptacle into which the struts of the coupling device can engage to couple the substrate holder to the pivot arm, while the struts are withdrawn from the receptacle to decouple the substrate holder and pivot arm again. However, the coupling device and the coupling structure can also be implemented in any other suitable way, for example, by another mechanical device or even by a magnetic device.

[0049] If the substrate holder has a central attachment point for the swivel arm's coupling device, formed in particular by a single coupling structure, a central fixation of the swivel arm to the substrate holder is feasible, enabling simple and safe transport of the substrate holder through the treatment system. The central attachment point can be the only attachment point, thus minimizing the number of mechanically contacting parts. For example, it is easily possible to fix the substrate holder to the coupling device in a suspended position.

[0050] The substrate holder can, for example, take the form of a dome with a domed surface on which the mounts for the optical substrates are arranged. Other shapes are also conceivable for the substrate holder. For instance, the substrate holder could be plate-shaped, form a holding cage into which several optical substrates are placed, or comprise a frame from which optical substrates are suspended. In any form, the substrate holder can, for example, have approximately 10 to 150 mounts, each for one optical substrate.

[0051] To allow the substrate holder to be placed or suspended at suitable locations within the treatment system when it is decoupled from the swivel arm, for example, at the second working position in the substrate treatment chamber, the substrate transport system includes, at least at the second working position in the substrate treatment chamber, a substrate holder holding device designed to couple with the substrate holder and hold it securely in position. In this case, the swivel arm can transfer the substrate holder to the holding device, where it is securely held in the desired position while the swivel arm moves back. For example, the coupling structure on the substrate holder is used to connect the substrate holder to the holding device.

[0052] In this case, the substrate holder mounting device has a suitable holder for the substrate holder, e.g., a gripping element that engages the coupling structure to couple the substrate holder to the mounting device and releases the coupling structure to decouple the mounting device from the substrate holder. The points of engagement for the coupling device on the swivel arm and for the substrate holder mounting device are typically located at spatially separate positions on the coupling structure so that the swivel arm and the mounting device can be coupled to the substrate holder simultaneously.

[0053] The substrate holder holding device can be designed to rotate the substrate holder about an axis perpendicular to the pivot plane of the swivel arm and / or to move it in a direction perpendicular to the pivot plane. Rotation of the substrate holder can be used, for example, to correctly position it for transfer by a swivel arm. The substrate holder can also be rotated during processing of the optical substrates to achieve more uniform treatment and, for example, a more consistent coating. The substrate holder holding device also typically absorbs the mechanical forces during coupling and uncoupling of the substrate holder with the swivel arm.

[0054] In one variant, only the substrate holder mounting device in the substrate treatment chamber is designed to rotate, for example, to allow rotation of the substrate holder during substrate treatment, while the substrate holder mounting devices in the substrate receiving chambers are not rotatable. In this case, the substrate holder mounting devices in the substrate receiving chambers can be indexed, e.g., at a 120° angle, to simplify coupling with the swivel arm.

[0055] For example, the substrate holder is positioned inside on the top side of the respective vacuum chamber. It is possible to arrange a substrate holder at each working position, so that the substrate holder can be decoupled from the swivel arm at any working position without additional moving components.

[0056] If the loading and / or unloading of the substrate holder into a substrate receiving chamber does not take place directly onto or from a swivel arm, a substrate holder holding device can also be used to move a substrate holder into or out of the substrate receiving chamber by means of an external device through a sluice valve for loading or unloading and to couple or decouple it accordingly with the substrate holder holding device.

[0057] The substrate transport device can generally be designed such that the substrate holder and at least the coupling device of the swivel arm are movable relative to each other in a direction perpendicular to the pivot plane of the swivel arm. The relative movement is, for example, more than 10 mm and / or less than 100 mm.

[0058] For this purpose, the substrate holder holding device and / or the pivot shaft of the swivel arm can be designed to be displaceable, or the coupling device can be designed to be movable in the direction perpendicular to the pivot plane, for example tiltable.

[0059] The relative movement perpendicular to the pivot plane of the swivel arm has the advantage that it allows for simple coupling between the substrate holder mounting device and the coupling structure of the substrate holder. This can be further enhanced by the rotatability of the substrate holder mounting device.

[0060] If the substrate holder holding device is movable, the substrate holder in the substrate treatment chamber can be lowered a little from the pivot plane of the pivot arm in order to be brought into a suitable position with respect to the treatment device in the substrate treatment chamber.

[0061] All drives of the substrate transport system can be located outside the vacuum chambers in non-evacuated areas of the treatment system, which significantly simplifies the system and considerably reduces contamination by particles inside the vacuum chamber. This also has the advantage that the drives can be located, for example, in the gray area.

[0062] For example, the pivoting movement of the swivel arm can be achieved via a simple rotary union of the swivel shaft in the respective substrate receiving chamber. A rotary union can be used on the top of the respective vacuum chamber for the substrate holder, optionally combined with a linear feedthrough if the substrate holder is to be moved perpendicular to the pivot plane of the swivel arm. Such components offer a safe, simple, and cost-effective way to couple the swivel shaft or substrate holder to a drive outside the vacuum chamber.

[0063] If the substrate treatment chamber has a service door that provides access to the interior of the substrate supply chamber, maintenance of the device for the physical and / or chemical treatment of the optical substrates is easily possible. In one possible configuration, the service door is positioned so that it opens into the gray area, which simplifies servicing and eliminates the need to use the cleanroom through which the substrate holders are loaded and unloaded into the treatment system.

[0064] Furthermore, the invention relates to a coupling mechanism, in particular its use in a treatment system of the aforementioned type. The coupling mechanism comprises a coupling device, a coupling structure provided on a substrate holder, and a substrate holder holding device. The coupling structure is configured to interact with both the coupling device and the substrate holder holding device, such that the substrate holder is coupled to the substrate holder holding device via the coupling structure in a first state and to the coupling device in a second state. In particular, the first state and the second state can exist simultaneously, so that the coupling structure is coupled to both the coupling device and the substrate holder holding device at the same time. The corresponding couplings can be easily implemented by means of pins and openings into which the associated pins engage.

[0065] If the coupling mechanism is also designed to work together with the coupling device of the swivel arm, this has the advantage that the substrate holder fixed to the substrate holder holding device can be easily decoupled from the swivel arm and coupled to the swivel arm.

[0066] The invention further relates to a method for operating a treatment system for optical substrates, which is configured in particular as described above. The treatment system comprises at least one substrate receiving chamber and at least one substrate treatment chamber, as well as a substrate transport device with at least one pivoting arm, wherein the substrate transport device is designed to move a substrate holder with a plurality of holders for optical substrates to be treated between the substrate receiving chamber and the substrate treatment chamber, and a coupling mechanism comprising a coupling device arranged on the pivoting arm, a coupling structure provided on the substrate holder, and a substrate holder holding device. The method comprises the following steps:

[0067] - Loading the substrate holder from a non-evacuated area into the substrate receiving chamber and coupling the substrate holder to the substrate holder holding device in the substrate receiving chamber, and

[0068] Coupling the substrate holder with the swivel arm in the substrate receiving chamber.

[0069] The unloading of the substrate holder from the substrate receiving chamber is carried out according to another aspect, in the reverse order of the previously mentioned process steps.

[0070] In one possible variant, the process continues to move the substrate holder through the swivel arm into the substrate treatment chamber, to treat the optical substrates there, and then to move the substrate holder back through the swivel arm into the substrate receiving chamber, or optionally to transfer the substrate holder through the swivel arm of another substrate receiving chamber, also adjacent to the substrate treatment chamber, into this further substrate receiving chamber.

[0071] The substrate holder is then unloaded from the respective substrate intake chamber into the non-evacuated area.

[0072] The substrate holder can be coupled to the substrate holder holding device in each vacuum chamber and then decoupled from or coupled to the swivel arm. The substrate holder holding device serves as a fix to hold the substrate holder securely during coupling and uncoupling with the swivel arm's coupling device.

[0073] In a further optional process step, the substrate holder is rotated by the substrate holder holding device around an axis of rotation perpendicular to the pivot plane of the swivel arm during the treatment of the substrates.

[0074] The features of all described variants can be combined and interchanged as desired by a person skilled in the art. In particular, the described coupling mechanism and / or the described loading and unloading method can also be used in systems other than the one described here.

[0075] The invention is described in more detail below with reference to an exemplary embodiment and the accompanying figures. The figures show:

[0076] Figure 1 shows a schematic representation of a treatment system according to the invention;

[0077] Figure 2 shows a section of Figure 1 from a different perspective;

[0078] Figure 3 shows further details of the treatment facility from Figure 1;

[0079] Figure 4 shows a schematic representation of one possibility for extending the treatment system from Figure 1;

[0080] Figure 5 shows a perspective view of the treatment facility according to Figure 1 with the service door open;

[0081] Figure 6 is a top view of the treatment system according to Figure 1, showing only one swivel arm; Figure 7 is a detailed view of the coupling using the coupling device;

[0082] Figure 8 is a sectional view of a detail of Figure 7; and

[0083] Figure 9 shows a rear view of the treatment system according to Figure 1 with additional functionalities.

[0084] For the sake of clarity, not all identical components are always labelled with reference symbols.

[0085] Figures 1 to 3 show a treatment system 10 for optical substrates 12 (indicated in Figure 1) which are mounted on a substrate holder 14.

[0086] The treatment system 10 serves, for example, to treat the optical substrates 12 physically and / or chemically, for example to provide them with a suitable coating, and optionally to carry out all further necessary treatment steps, e.g. pre- and post-treatments, such as thermal treatment or cleaning.

[0087] The optical substrates 12 in this example are intended for the manufacture of consumer products, e.g., lens substrates for vision aids, sports glasses and sunglasses, or planar substrates for eyeglass-like devices for virtual or augmented reality. They could also be, for example, planar substrates for a heads-up display or for optical filters.

[0088] The substrate holder 14 has a plurality of mounts 16, for example 10 to 150, with each mount 16 holding an optical substrate 12 and fixing it in a suitable manner. Each substrate holder 14, along with all the optical substrates 12 mounted on it, is individually inserted into and removed from the treatment system 10, so that within the treatment system, a single optical substrate 12 is never moved alone, but always only the entire substrate holder 14 with all the substrates 12 arranged on it. In a variant not shown, the substrate holder 14 can also have only a single mount 16, e.g., for a very large substrate 12.

[0089] In this example, the treatment system 10 comprises three vacuum chambers 18 arranged in a row, with adjacent vacuum chambers 18 each being connected to one another via a lock valve 20. The lock valve 20 forms a closable passage between the adjacent vacuum chambers 18 and is designed such that a substrate holder 14 can be moved through an opening of the lock valve 20 from one vacuum chamber 18 to an adjacent vacuum chamber 18.

[0090] To move the substrate holder 14 through the vacuum chambers 18 of the treatment system 10, the treatment system 10 has a substrate transport device 22. The substrate transport device 22 comprises two swivel arms 24 and a substrate holder holding device 26 in each vacuum chamber 18.

[0091] In the example shown, the middle vacuum chamber 18 forms a substrate treatment chamber 28, while the two outer vacuum chambers 18, located to the right and left of the substrate treatment chamber 28 in Figure 1, each form a substrate receiving chamber 30, here referred to as the first substrate receiving chamber 32 and the second substrate receiving chamber 34.

[0092] In principle, the treatment system 10 can include any number of vacuum chambers 18 in the form of substrate receiving chambers 30 and substrate treatment chambers 28 (see Figure 4).

[0093] In both the first substrate receiving chamber 32 and the second substrate receiving chamber 34, a pivot shaft 36 is arranged, on which a pivot arm 24 with a first end 25 is fixed in such a way that it can be pivoted by a rotation of the pivot shaft 36 between a first working position 38 in the respective substrate receiving chamber 32, 34 and a second working position 40 in the adjacent substrate treatment chamber 28.

[0094] The pivot shaft 36 defines a direction R perpendicular to a pivot plane E of the pivot arm 24. The direction R coincides here with the vertical V, so that the pivot plane E is horizontal.

[0095] The treatment system 10 is optionally designed such that at least one of the swivel arms 24 can move to one or more further working positions 37, for example in one of the substrate receiving chambers 32, 34 (see, for example, Figure 4). It is also possible for an access door (not shown) of the substrate receiving chambers 32, 34, which is provided, for example, opposite to the respective sluice valve 20, to be opened, so that the respective swivel arm 24 is swung out of the corresponding substrate receiving chamber 32, 34 into a further working position 37, as indicated in Figure 6 by the dashed line for the swivel arm 24 shown there.

[0096] Each swivel arm 24 has a coupling device 44 at its second end 42, which serves to couple the swivel arm 24 to the substrate holder 14 in order to move the substrate holder 14 through the treatment system 10.

[0097] For this purpose, the substrate holder 14 has a coupling structure 46 which can interact with the coupling device 44 of the swivel arm 24 in a force-locking and / or form-locking manner in order to couple the substrate holder 14 and the swivel arm 24 together, and which can be released from the coupling device 44 when the swivel arm 24 is to be decoupled from the substrate holder 14.

[0098] The coupling structure 46 forms a single, central point of attachment on the substrate holder 14 for the coupling device 44 of the swivel arm 24.

[0099] The coupling structure 46, the coupling device 44 and the substrate holder holding device 26 together form a coupling mechanism 47.

[0100] In the example shown, the coupling structure 46 is located on a top surface 48 of the substrate holder 14 and is positioned centrally on the substrate holder 14. The swivel arm 24 is therefore always located above the top surface 48 of the substrate holder 14 and hangs below the swivel arm 24.

[0101] As an alternative to the force-fit and / or form-fit interaction of the coupling device 44 and the coupling structure 46, an electromagnetic holding or coupling can also be provided, for example.

[0102] The treatment system 10 is designed such that at each working position 38, 40, the swivel arm 24 can be coupled to and decoupled from the substrate holder 14. For this purpose, a substrate holder holding device 26 is also provided at each working position 38, 40 in this example. The substrate holder holding device 26 is designed to interact with the coupling structure 46 on the substrate holder 14 to connect the substrate holder 14 to the substrate holder holding device 26 and hold it in position. This corresponds to a first state of the coupling mechanism 47. In this state, the coupling device 44 on the swivel arm 24 can be released from the substrate holder 14, thus decoupling the swivel arm 24 from the substrate holder 14 and removing it from the substrate holder 14.In this state, the coupling device 44 can also be connected to the substrate holder 14, thus coupling the swivel arm 24 to the substrate holder 14, which corresponds to the second state of the coupling mechanism 47.

[0103] Therefore, the coupling structure 46 can be designed such that both the first state and the second state exist simultaneously. In other words, the substrate holder 14 can be coupled via the coupling structure 46 simultaneously to the coupling device 44 on the swivel arm 24 and to the substrate holder holding device 26.

[0104] The coupling device 44 moves on a circular arc 50 when the swivel arm 24 is pivoted, on which all working positions 38, 40 are also located.

[0105] Both swivel arms 24 are designed as mirror images of each other, but are otherwise identical in shape and size, so that their arcs of movement 50 have the same radius.

[0106] The swivel arms 24 are rigid in themselves and do not change their length L between the first and second ends 25, 42, nor their curvature during their swiveling movement.

[0107] For example, the swivel arm 24 has a profiled cross-section, such as in the form of an I- or double-T-profile.

[0108] As can be seen, for example, in Figure 3, the curvature of the swivel arm 24 is created in this example by having several straight sections of the swivel arm 24 join each other at an angle. However, the curvature of the swivel arm 24 could also be achieved by a different geometric shape.

[0109] Essentially, the length L and the curvature of the swivel arm 24 are determined at the discretion of the person skilled in the art from the position of the swivel shaft 36 in the respective substrate receiving chamber 30, 32, 34, a width of the sluice valve 20 and the distance between the working positions 38, 40 such that the swivel arm 24 can reach both working positions 38, 40 and thereby move the substrate holder 14 through the sluice valve 20.

[0110] The pivot shaft 36 is connected to a suitable drive 52 located outside the vacuum chamber 18 in a non-evacuated area 51 of the treatment system 10, which is designed to rotate the pivot shaft 36. For example, this is an electric motor on a known rotary feedthrough connected to the pivot shaft 36.

[0111] In this example, each of the vacuum chambers 18 is connected to at least one suitable vacuum pump via a connecting flange 55 in a flow connection in order to evacuate them to a desired negative pressure (shown here only for the substrate treatment chamber 28).

[0112] In this example, the substrate holder holding device 26 is designed to rotate the substrate holder 14 in the pivot plane E, both to adapt the coupling structure 46 to the position of the coupling device 44 on the pivot arm 24, and to rotate the substrate holder 14 during treatment of the optical substrates 12 in the substrate treatment chamber 28. In a variant not shown, only the substrate holder holding device 26 in the substrate treatment chamber 28 is rotatable, while the substrate holder holding devices 26 in the substrate receiving chambers 30, 32 are rigidly fixed in their respective vacuum chambers.

[0113] Furthermore, the substrate holder holding device 26 is designed such that it can displace the substrate holder 14 along the direction R, i.e., perpendicular to the pivot plane E of the pivot arm 24, by a predetermined amount. The displacement is, for example, more than 10 mm and / or less than 100 mm, in particular approximately between 10 mm and 100 mm. A suitable drive 56 of the substrate holder holding device 26 is located outside the vacuum chamber 18 in a non-evacuated area 51 of the treatment system 10.

[0114] The coupling structure 46 on the substrate holder 14 is formed, for example, by a triangular plate 58 which is firmly connected to the top 48 of the substrate holder 14 via a flange 59 arranged centrally on the plate, so that a receptacle for the coupling device 44 is formed, as can be clearly seen in Figures 7 and 8.

[0115] The coupling device 44 at the end 42 of the swivel arm 24 comprises two immovable, parallel webs 60, which are arranged at a sufficient distance from each other to encompass or accommodate the flange 59 of the coupling structure 46 and to engage an underside of the plate 58.

[0116] To couple the swivel arm 24 with the substrate holder 14, the webs 60 of the coupling device 44 are slid under the plate 58 so that they engage the flange 59 and lie below the plate 58. It is of course also possible to choose another suitable point of attachment, e.g. directly on the flange 59 or on another structure formed on the plate 58.

[0117] Subsequently, the substrate holder 14 can be lowered in the vertical direction V via the substrate holder holding device 26 to enable coupling with the coupling device 44.

[0118] In this process, pins provided on the coupling device 44 can engage in openings of the coupling structure 46, in particular the plate 58. The coupling device 44 is thereby coupled to the coupling structure 46.

[0119] The substrate holder 14 is stabilized by the effect of gravity in the hanging fixation shown here.

[0120] To decouple, the procedure is carried out in reverse, as the substrate holder 14 is lifted vertically V via the substrate holder holding device 26, thereby disengaging the pins provided on the coupling device 44 from the openings of the coupling structure 46, in particular the plate 58. The swivel arm 24 can then be moved in the opposite direction and the webs 60 of the coupling device 44 can be withdrawn from the receptacle under the plate 58.

[0121] The substrate holder holding device 26 has a gripping element 62 with, for example, three downwardly projecting hooks 64, which can be brought into engagement with the plate 58 of the coupling structure 46 by a rotational and / or lateral movement of the substrate holder holding device 26 and can thus connect the coupling structure 46 with the substrate holder holding device 26 (see Figures 3, 4, 7 and 8).

[0122] In particular, pins 65 are also provided on the hooks 64, which engage in corresponding openings 67 in the coupling structure 46, in particular the plate 58, in order to establish the coupling between the substrate holder holding device 26 and the coupling structure 46, as can be clearly seen in Figure 8.

[0123] As explained above, the coupling structure 46 can be coupled simultaneously with the substrate holder holding device 26 and with the coupling device 44, which is why the coupling structure 46 has corresponding openings for the pins 65 of the substrate holder holding device 26, in particular the hooks 64, and for the pins of the coupling device 44.

[0124] To decouple the substrate holder 14 from the substrate holder holding device 26, the coupling structure 46 is first coupled to the coupling device 44 by lifting the substrate holder 14 from the substrate holder holding device 26, so that the coupling device 44 can be pivoted in via the swivel arm 24.

[0125] The substrate holder 14 is then lowered vertically by the substrate holder holding device 26, so that the pins of the coupling device 44 engage in the corresponding openings of the coupling structure 46. In this state, the substrate holder 14 is coupled to both the coupling device 44 and the substrate holder holding device 26 via the coupling structure 46.

[0126] The substrate holder retaining device 26 can then be lowered further, so that the pins 65 of the substrate holder retaining device 26, in particular the hooks 64, are pulled out of the openings 67 of the coupling structure 46. The substrate holder 14 remains in its position, since the substrate holder 14 is coupled to the coupling device 44.

[0127] Afterwards, the substrate holder holding device 26 can be rotated so far that the plate 58 of the coupling structure 46 is released again.

[0128] Since the substrate holder device 26 is designed to be displaceable along the direction R, a relative movement between the coupling device 44 and the substrate holder device 26 along the direction R is possible. Such a relative movement can alternatively be generated, at least partially, by a displacement of the pivot shaft 36 or the pivot arm 24 along the direction R, or by a movement of the coupling device 44 along the direction R.

[0129] The coupling device 44, the coupling structure 46 and the gripping element 62 are described here only as examples and can be designed in any suitable way and may include, for example, not only mechanical but also (electromagnetic elements).

[0130] The following explains how an optical substrate 12 is treated using the treatment system 10, with reference to figures 1, 2, 3 and 6, among others.

[0131] In order to treat the optical substrates 12 on the substrate holder 14 in the treatment system 10, the substrate holder 14 is first loaded with a large number of optical substrates 12 by placing the optical substrates 12 into their holders 16 on the substrate holder 14.

[0132] In this example, the first substrate receiving chamber 32 serves as a loading chamber and has a further airlock valve 68 on its outside. This airlock valve 68 is opened, after the first substrate receiving chamber 32 has been vented if necessary.

[0133] The sluice valve 20 between the substrate treatment chamber 28 and the first substrate receiving chamber 32 is closed in this step.

[0134] The substrate holder 14 is inserted into the first substrate receiving chamber 32 through the airlock valve 68 in a suitable manner and coupled to the substrate holder holding device 26 at the first working position 38. Any transport devices used to move the substrate holder 14 are removed from the first substrate receiving chamber 32. The airlock valve 68 is closed and the first substrate receiving chamber 32 is evacuated again, if necessary (if it was previously vented).

[0135] The swivel arm 24 is now moved to the first working position 38 in the first substrate receiving chamber 32 by rotating the swivel shaft 36. The coupling device 44 then couples with the coupling structure 46 on the substrate holder 14 to couple the swivel arm 24 to the substrate holder 14. In this step, the substrate holder 14 is also coupled to the substrate holder holding device 26.

[0136] The coupling structure 46 on the substrate holder 14 is now separated from the substrate holder holding device 26, thus decoupling the substrate holder 14 from the substrate holder holding device 26. The substrate holder 14 is then only coupled to the swivel arm 24 via the coupling device 44.

[0137] The substrate holder device 26 is optionally moved, e.g. pulled upwards a little, to allow movement of the swivel arm 24 towards the substrate treatment chamber 28.

[0138] The sluice valve 20 between the first substrate receiving chamber 32 and the substrate treatment chamber 28 is opened, and the swivel arm 24, together with the substrate holder 14 coupled to it, is pivoted to the second working position 40 in the (evacuated) substrate treatment chamber 28.

[0139] Here, the coupling structure 46 on the substrate holder 14 is coupled to the substrate holder holding device 26 in the substrate treatment chamber 28, and then the swivel arm 24 is decoupled from the substrate holder 14 and swiveled back into the first substrate receiving chamber 32. The sluice valve 20 between the first substrate receiving chamber 32 and the substrate treatment chamber 28 is closed again.

[0140] In this example, the substrate holder 14 is now moved downwards a short distance from the pivot plane E by the substrate holder holding device 26, which moves the substrate holder 14 along the direction R. This optionally creates a seal between an edge of the substrate holder 14 and a section of the substrate treatment chamber 28, in which one or more devices 69 for the physical and / or chemical treatment of the optical substrates 12 are arranged (indicated in Figure 1). A bottom surface 66 of the substrate holder 14 faces the device(s) 69. During the treatment of the optical substrates 12 by the device(s) 69, the substrate holder 14 is optionally rotated by the substrate holder holding device 26 at a predetermined frequency.

[0141] After completion of the treatment, the substrate holder 14 is moved back up into the pivot plane E by the substrate holder holding device 26, the sluice valve 20 to the second substrate receiving chamber 34 is opened, and the pivot arm 24 is pivoted from the second substrate receiving chamber 34 to the second working position 40, as shown in Figures 1 and 5. There, the pivot arm 24 is coupled to the substrate holder 14, and subsequently the substrate holder 14 is uncoupled from the substrate holder holding device 26 in the substrate treatment chamber 28.

[0142] The swivel arm 24 now moves the substrate holder 24 into the second substrate receiving chamber 34 to the first working position 38 in the second substrate receiving chamber 34. There, the substrate holder 14 is coupled to the substrate holder holding device 26 of the second substrate receiving chamber 34, and then the swivel arm 24 is uncoupled from the substrate holder 14 and moved to the side. The sluice valve 20 is closed again, and the substrate treatment chamber 34 remains evacuated.

[0143] The second substrate intake chamber 34 serves here as an unloading chamber and accordingly has a sluice valve 68 in one side wall. This sluice valve 68 is now opened (after the second substrate intake chamber 34 has been vented) and the substrate holder 14 is removed from the treatment system 10 in a suitable manner.

[0144] As shown in Figure 5, a service door 71 is associated with the substrate treatment chamber 28, which can be opened to provide access to the substrate treatment chamber 28. The service door 71 is arranged opposite the airlock valves 68 of the substrate receiving chambers 32, 34, thereby maximizing and optimizing accessibility.

[0145] While the airlock valves 68 in this example connect the substrate receiving chambers 30, 32 to a cleanroom, allowing the loading and unloading of the substrate holder 14 directly from and into the cleanroom, the service door 71 here borders a so-called gray room. Gray rooms have lower air purity requirements than cleanrooms. This simplifies maintenance work on the substrate treatment chamber 28, particularly on the device 69.

[0146] The service door 71 is curved outwards in the pivot plane E and thus forms part of the volume required to accommodate the substrate holder 14. Accordingly, the substrate holder holding device 26 of the substrate treatment chamber 28 is arranged near the service door 71.

[0147] Apart from the service door 71, the substrate treatment chamber 28 in this example has a triangular shape in a top view (see, for example, Figure 6). This results in optimized space utilization, minimizing the required installation space for the treatment system 10.

[0148] As can be clearly seen in Figure 6, the sluice valve 20 is oriented with its opening such that the center point of a width b of the opening coincides with a center point M of the arc of movement 50 between the first working position 38 (and thus the substrate holder holding device 26) in the substrate receiving chamber 34 and the second working position 40 (and thus the substrate holder holding device 26) in the substrate treatment chamber 28. A tangent t at the center point M is perpendicular to a straight line defined by the width b.

[0149] Figure 4 shows an example of how the described treatment system 10 can be extended as desired by adding further vacuum chambers 18 in the form of substrate treatment chambers 28 and substrate receiving chambers 30. An alternating sequence of substrate receiving chambers 30 and substrate treatment chambers 28, arranged side by side in a row, is shown as an example. A lock valve 20 (not shown) is arranged between adjacent vacuum chambers 18, so that each pivot arm 24 with a substrate holder 14 coupled to it can be moved between two adjacent vacuum chambers 18, between a first working position 38 and a second working position 40.

[0150] To transfer a substrate holder 14 within the treatment system 10, at least one of the substrate receiving chambers 30 is designed such that two pivot shafts 36, each with a pivot arm 24, are arranged therein. This substrate receiving chamber 30 is designated by reference numeral 70 in Figure 4. Both pivot arms 24 can access the same first working position 38 in this substrate receiving chamber 70, since this position lies on the arcs of movement 50 of both pivot arms 24.

[0151] Furthermore, additional working positions 37 can optionally be provided, for example, in one or more substrate receiving chambers 30, where a substrate holder 14 can be placed for a certain period of time or for further treatment to be carried out in the substrate receiving chamber 30. This is also shown, for example, in Figure 9, which shows a rear view of the treatment system 10. The additional working positions 37 are provided by corresponding modules 72, which can be arranged, for example, below the substrate receiving chambers 30.

[0152] Following the principle shown, branches and switches can also be implemented, whereby the vacuum chambers 18 can also be arranged in a planar arrangement, not just in a linear arrangement relative to each other. In this way, the treatment system 10 can be expanded as desired.

Claims

- 29 - Patent claims 1. Treatment system (10) for optical substrates (12), comprising at least one substrate receiving chamber (30, 32, 34, 70) and at least one substrate treatment chamber (28), wherein the substrate receiving chamber (30, 32, 34, 70) and the substrate treatment chamber (28) are designed as evacuable vacuum chambers (18), comprising a substrate transport device (22) designed to move a substrate holder (14) with a plurality of holders (16) for optical substrates (12) to be treated from the substrate receiving chamber (30, 32, 34, 70) into the substrate treatment chamber (28), wherein the substrate transport device (22) comprises at least one rigid pivot arm (24) which is fixed at a first end (25) to a pivot shaft (36) and has a coupling device (44) at a second end (42) via which the pivot arm (24) is connected to the substrate holder (14) is coupleable, wherein the pivot shaft (36) is arranged in the substrate receiving chamber (30, 32, 34, 70),and wherein the pivot arm (24) is pivotable in a pivot plane (E) at least between a first working position (38) and a second working position (40), both of which lie on a circular arc (50) along which the coupling device (44) can move, wherein the first working position (38) is in the substrate receiving chamber (30, 32, 34, 70) and the second working position (40) is in the substrate treatment chamber (28), and wherein the substrate transport device (22) is designed such that the coupling device (44) can be coupled to and uncoupled from the substrate holder (14) at both the first working position (38) and the second working position (40).

2. Treatment system (10) according to claim 1, wherein the treatment system (10) has several substrate receiving chambers (30, 32, 34, 70).

3. Treatment plant (10) according to claim 2, wherein the The substrate transport device (22) is designed to selectively transfer the substrate holder (14) from the substrate treatment chamber (28) into a first - 30 - to move substrate receiving chamber (32) and a second substrate receiving chamber (34).

4. Treatment plant (10) according to claim 2 or 3, wherein at least one of the several substrate receiving chambers (30, 32, 34, 70) has a sluice valve (68) to a non-evacuated area and serves as a loading and / or unloading chamber for the substrate holder (14).

5. Treatment system (10) according to one of claims 2 to 4, wherein the substrate treatment chamber (28) is arranged between a first substrate receiving chamber (32) and a further substrate receiving chamber (30, 32, 34, 70) of the multiple substrate receiving chambers (30, 32, 34, 70), and in the first substrate receiving chamber (32) and in the further substrate receiving chamber (30, 34, 70) at least one pivot shaft (36) with a pivot arm (24) is arranged, wherein the first substrate receiving chamber (32) and the further substrate receiving chamber (30, 34, 70) are each connected to a non-evacuated area via a sluice valve (68), and wherein the first substrate receiving chamber (32) serves as a loading chamber and the further substrate receiving chamber (30, 34, 70) as an unloading chamber, or the first substrate receiving chamber (32) as an unloading chamber and the further substrate receiving chamber (30, 34, 70) serves as a loading chamber.

6. Treatment plant (10) according to one of the preceding claims, wherein the substrate receiving chamber (30, 32, 34, 70) and the The substrate treatment chambers (28) are arranged directly adjacent to each other and are connected to each other by a sluice valve (20).

7. Treatment system (10) according to one of the preceding claims, wherein a device (69) for the physical and / or chemical treatment of the optical substrates (12) is arranged in the substrate treatment chamber (28), in particular wherein the substrate holder (14) has a top (48) and a bottom (66) opposite the top (48), wherein the coupling of the swivel arm (24) with the substrate holder (14) is made at the top (48) of the substrate holder (14) and the device (69) for the physical and / or chemical treatment of the optical substrates (12) faces the bottom (66) of the substrate holder.

8. Treatment system (10) according to one of the preceding claims, wherein the swivel arm (24) runs curved between the swivel shaft and the coupling device.

9. Treatment system (10) according to one of the preceding claims, wherein the substrate holder (14) has at least one coupling structure (46) for the coupling device (44) and wherein the coupling device (44) is designed to interact with the coupling structure (46) in a force-locking and / or form-locking manner in order to couple the substrate holder (14) with the swivel arm (24) and to be released from the coupling structure (44) in order to decouple the substrate holder (14) from the swivel arm (24).

10. Treatment system (10) according to one of the preceding claims, wherein the substrate holder (14) has a central point of attachment for the coupling device (44) of the swivel arm.

11. Treatment plant (10) according to one of the preceding claims, wherein the substrate transport device (22) comprises at least at the second working position (40) in the substrate treatment chamber (28) a substrate holder holding device (26) which is designed to couple with the substrate holder (14) and to hold the substrate holder (14) in a fixed position, in particular wherein the substrate transport device (22) is designed such that the substrate holder holding device (26) and at least the coupling device (44) of the pivot arm (24) are movable relative to each other in a direction (R) perpendicular to the pivot plane (E) of the pivot arm (24).

12. Treatment plant (10) according to one of the preceding claims, wherein all drives (52, 56) of the substrate transport device (22) are arranged outside the vacuum chambers (18) in non-evacuated areas of the treatment plant (10).

13. Treatment plant (10) according to one of the preceding claims, wherein the substrate treatment chamber (28) has a service door (71) which allows access to an interior of the substrate supply chamber (28).

14. Use of a coupling mechanism (47) in a treatment system (10) according to one of the preceding claims, wherein the coupling mechanism (47) is a coupling device (44) attached to a The substrate holder (14) comprises a coupling structure (46) and a substrate holder holding device (26), wherein the coupling structure (46) is configured to interact with both the coupling device (44) and the substrate holder holding device (26), such that the substrate holder (14) is coupled via the coupling structure (46) in a first state to the substrate holder holding device (26) and in a second state to the coupling device (44).

15. Method for operating a treatment system (10) for optical substrates (12), in particular according to one of the preceding claims, wherein the treatment system (10) comprises at least one substrate receiving chamber (30, 32, 34, 70) and at least one substrate treatment chamber (28) as well as a substrate transport device (22) with at least one pivot arm (24), wherein the substrate transport device (22) is designed to move a substrate holder (14) between the substrate receiving chamber (30, 32, 34, 70) and the substrate treatment chamber (28), and a coupling mechanism (47) comprising a coupling device (44) arranged on the pivot arm (24), a coupling structure (46) provided on the substrate holder (14) as well as a substrate holder holding device (26), comprising the following steps: - Loading the substrate holder (14) from a non-evacuated area (51) into the substrate receiving chamber (30) and coupling the substrate holder (14) with the substrate holder holding device (26) in the substrate receiving chamber (30), and - Coupling the substrate holder (14) with the swivel arm (24) in the substrate receiving chamber (30).

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