High-temperature process apparatus

Abstract

A high-temperature process apparatus according to one embodiment of the present invention comprises: a vacuum chamber; a rail provided inside the vacuum chamber; a stage provided on the rail so as to be positioned inside the vacuum chamber; and an actuator which is provided outside the vacuum chamber and transmits a driving force to the rail so that the stage moves along the rail, wherein the actuator can induce the stage to move relative to the rail by varying the direction of the driving force and the speed of the driving force.

Description

High-temperature process equipment

[0001] The present invention relates to high-temperature process equipment, and more specifically, provides high-temperature process equipment that enables rapid temperature control and changes the position of a sample using a stick-slip method.

[0002] In general, Chemical Vapor Phase Deposition (CVD) is used as a primary method for growing various crystalline films on various substrates.

[0003] Recently, horizontal chemical vapor deposition (CVD) apparatuses have been used for chemical vapor deposition. The chemical vapor deposition method using a horizontal CVD apparatus can be broadly divided into three processes as follows.

[0004] First, the wafer and metal precursor are fed into a boat and then loaded (injected) into a vacuum tube. After the precursor is loaded into the vacuum tube, the deposition conditions are established. Finally, once the deposition conditions are complete, the temperature of the heating unit is raised to vaporize the precursor, and the vaporized precursor is deposited as a thin film.

[0005] Meanwhile, rapid temperature changes are a critical factor in process equipment based on tube furnaces, such as chemical vapor deposition (CVD) units. In particular, rapid temperature changes can affect the growth rate and crystal structure of thin films. Rapid temperature increases or decreases can regulate the activation energy of chemical reactions, thereby promoting the formation of specific thin film layers. Additionally, rapid temperature changes influence the concentration of reactants and surface diffusion, which helps induce specific crystal structures. Furthermore, temperature control can reduce surface defect density, thereby improving the quality of the thin film.

[0006] However, conventional CVD or process equipment utilizes a sliding furnace method to achieve rapid temperature changes during the process. This method involves moving a heating element mounted on the outside of the vacuum tube linearly, and it cannot move the sample stage inside the vacuum tube.

[0007] In addition, electric motor stages or metal transfer devices cannot be used to move the position of a sample inside a vacuum tube. This is because the metal materials of electric motor stages or metal transfer devices would melt or be damaged inside a heating section at a high temperature of 1,000 degrees or higher. Magnet-based methods also cannot be installed inside a high-temperature heating section.

[0008] However, since the position of the vacuum tube itself does not change even when the furnace is repositioned, there is a limitation in that the temperature does not change rapidly due to the tube's thermal capacity. Additionally, the sliding furnace method requires the vacuum tube to be longer than necessary, and there is a problem in that additional space is required for the process of inserting and removing samples from the vacuum tube using a long rod. Furthermore, there is also the issue of high manufacturing costs due to the need for large mechanical structures.

[0009] The applicant has proposed the present invention to solve the above-mentioned problems.

[0010] Related prior art is Korean registered patent No. 10-1637980 (Title of invention: Thermochemical vapor deposition apparatus and thermochemical vapor deposition method, Registration date: July 4, 2016).

[0011] The present invention has been devised to solve the above problems and provides high-temperature process equipment capable of rapid temperature control, occupying minimal space, being manufactured at a low cost, and changing the position of a sample within a vacuum chamber.

[0012] The present invention provides a high-temperature process equipment capable of changing the position of a sample inside a vacuum chamber by transmitting mechanical vibrations from outside the vacuum chamber.

[0013] The present invention provides high-temperature process equipment capable of changing the position of a sample or moving a sample within a vacuum chamber by utilizing the mutual conversion of static frictional force and dynamic frictional force.

[0014] The present invention provides high-temperature process equipment capable of withstanding high temperatures by applying a stick-slip actuator and maintaining a high vacuum state by installing the actuator outside the vacuum.

[0015] The problems that the present invention aims to solve are not limited to the problem(s) mentioned above, and other unmentioned problems will be clearly understood by those skilled in the art from the description below.

[0016] A high-temperature process equipment according to one embodiment of the present invention for achieving the above-described objectives comprises: a vacuum chamber; a rail provided inside the vacuum chamber; a stage provided on the rail to be located inside the vacuum chamber; and an actuator provided outside the vacuum chamber and transmitting a driving force to the rail so that the stage moves along the rail; wherein the actuator can vary the direction and speed of the driving force to induce the stage to move relative to the rail.

[0017] The actuator can reciprocate the rail along the longitudinal direction of the rail, but can reciprocate the rail by making the speed of movement in one longitudinal direction different from the speed of movement in the other longitudinal direction.

[0018] The actuator can induce the stage to move relative to the rail by utilizing the frictional force generated between the rail and the stage.

[0019] The actuator can move the stage on the rail by utilizing the mutual conversion between static friction force and dynamic friction force generated between the rail and the stage.

[0020] The above actuator can apply vibration to the rail by a stick-slip driving method.

[0021] The above actuator may be provided as either a stepper motor or a piezo actuator.

[0022] When the actuator is a stepper motor, the time per forward rotation pulse and the time per reverse rotation pulse of the stepper motor can be set differently, and the time during which rotation stops between forward rotation and reverse rotation can be set to make the stage move relative to the rail.

[0023] In the case where the actuator is a piezo actuator, the stage can be made to move relatively slowly along one direction of the longitudinal direction of the rail and move relatively quickly along the opposite direction, thereby causing the stage to move relative to the rail.

[0024] It includes a heating unit for heating the vacuum chamber, and the heating unit may be formed so as not to change its position relative to the vacuum chamber.

[0025] It may include a position measuring unit provided inside or outside the vacuum chamber or the heating unit, which measures the position of the stage moving along the rail.

[0026] Specific details of other embodiments are included in the detailed description and attached drawings.

[0027] A high-temperature process equipment according to one embodiment of the present invention can rapidly control the internal temperature of a vacuum chamber, does not occupy much space, and can be manufactured at a low cost.

[0028] A high-temperature process equipment according to one embodiment of the present invention can change the position of the sample within a vacuum chamber, so the temperature of the sample can be rapidly controlled.

[0029] In a high-temperature process equipment according to one embodiment of the present invention, since the actuator with rails is located outside the vacuum chamber, the actuator can be prevented from being damaged by heat even if the inside of the vacuum chamber becomes a high-temperature environment.

[0030] A high-temperature process equipment according to one embodiment of the present invention can precisely change the position of a sample, etc., within a vacuum chamber by using a stick-slip method to alternate static friction force and dynamic friction force between a rail and a stage.

[0031] A high-temperature process equipment according to one embodiment of the present invention is not affected by high temperature because a stick-slip type actuator is provided outside the vacuum chamber, and a high vacuum state can be maintained because the actuator can be installed outside the vacuum.

[0032] A high-temperature process equipment according to one embodiment of the present invention can move a stage by means of an actuator that moves a rail by means of a stick-slip driving method, so the position of the stage can be adjusted finely and precisely.

[0033] In a high-temperature process equipment according to one embodiment of the present invention, the vacuum chamber, rail, and stage are made of a material that withstands high temperatures of 1000°C or higher, so the drive system can be prevented from being affected by high temperatures.

[0034] A high-temperature process equipment according to one embodiment of the present invention can independently and freely change the position of a sample or source by separately providing a stage, rail, and actuator for moving a precursor in addition to a stage, rail, and actuator for moving a sample.

[0035] A high-temperature process equipment according to one embodiment of the present invention can measure the position of a sample or precursor by installing a sensor, such as a lidar, inside or outside a vacuum chamber.

[0036] FIG. 1 is a perspective view illustrating a high-temperature process equipment according to one embodiment of the present invention.

[0037] Figure 2 is a plan view illustrating the equipment according to Figure 1.

[0038] Fig. 3 is a front view illustrating the equipment according to Fig. 1.

[0039] Fig. 4 is a rear view illustrating the equipment according to Fig. 1.

[0040] FIG. 5 is a drawing for exemplarily explaining the operating principle of the equipment according to FIG. 1.

[0041] FIG. 6 is a front view illustrating a modified example of the equipment according to FIG. 1.

[0042] Hereinafter, embodiments disclosed in this specification will be described in detail with reference to the attached drawings. Identical or similar components are assigned identical or similar reference numerals, and redundant descriptions thereof will be omitted. The suffix "bu" for components used in the following description is assigned or used interchangeably solely for the ease of drafting the specification and does not inherently possess a distinct meaning or role. Furthermore, in describing embodiments disclosed in this specification, if it is determined that a detailed description of related prior art could obscure the essence of the embodiments disclosed in this specification, such detailed description will be omitted. Additionally, the attached drawings are intended only to facilitate understanding of the embodiments disclosed in this specification; the technical concept disclosed in this specification is not limited by the attached drawings, and it should be understood that they include all modifications, equivalents, and substitutions that fall within the spirit and technical scope of the present invention.

[0043] Terms including ordinal numbers, such as first, second, etc., may be used to describe various components, but said components are not limited by said terms. These terms are used solely for the purpose of distinguishing one component from another.

[0044] When it is stated that a component is "connected" to another component, it should be understood that it may be directly connected to that other component, or that there may be other components in between.

[0045] A singular expression includes a plural expression unless the context clearly indicates otherwise.

[0046] In this application, terms such as “comprising” or “having” are intended to specify the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0047] It should be noted that the drawings are schematic and not drawn to scale. The relative dimensions and proportions of parts in the drawings are exaggerated or reduced in size for clarity and convenience, and any dimensions are illustrative only and not limiting. Additionally, the same reference numerals are used to denote similar features for the same structure, element, or part appearing in two or more drawings.

[0048] The embodiments of the present invention specifically illustrate ideal embodiments of the present invention. As a result, various variations of the drawings are expected. Accordingly, the embodiments are not limited to the specific form of the illustrated area and include, for example, variations in form resulting from manufacturing.

[0049] FIG. 1 is a perspective view illustrating a high-temperature process equipment according to one embodiment of the present invention, FIG. 2 is a plan view illustrating the equipment according to FIG. 1, FIG. 3 is a front view illustrating the equipment according to FIG. 1, FIG. 4 is a rear view illustrating the equipment according to FIG. 1, FIG. 5 is a drawing for exemplarily explaining the operating principle of the equipment according to FIG. 1, and FIG. 6 is a front view illustrating a modified example of the equipment according to FIG. 1.

[0050] The high-temperature process equipment according to the present invention described below can be applied not only to chemical vapor deposition (CVD) equipment but also to various equipment requiring chemical treatment at high temperatures.

[0051] For convenience of explanation, the following description is given by citing an example in which a high-temperature process equipment (100) according to one embodiment of the present invention is applied to chemical vapor deposition. Additionally, the description of general techniques applied to chemical vapor deposition is omitted.

[0052] Referring to FIGS. 1 to 4, a high-temperature process equipment (100) according to one embodiment of the present invention may include: a vacuum chamber (190); a rail (130) provided inside the vacuum chamber (190); a stage (140) provided on the rail (130) to be located inside the vacuum chamber (190); and an actuator (110) provided outside the vacuum chamber (190) and transmitting driving force to the rail (130) so that the stage (140) moves along the rail (130).

[0053] Here, the actuator (110) can vary the driving speed to induce the stage (140) to move relative to the rail (130).

[0054] That is, the actuator (110) can cause the stage (140) to move or move on the rail (130) by applying mechanical vibration to the rail (130) from outside the vacuum chamber (190).

[0055] At this time, the actuator (110) can apply vibration to the rail (130) such that the vibration frequency of the rail (130) changes. The actuator (110) can make the stage (140) move on the rail (130) by making the rail (130) vibrate quickly or by making the rail (130) vibrate relatively slowly.

[0056] The actuator (110) can cause the rail (130) to reciprocate along the longitudinal direction of the rail (130), but by making the rail (130) reciprocate with a different speed of motion in one longitudinal direction and a different speed of motion in the other longitudinal direction, the stage (140) can be made to move relative to the rail (130).

[0057] Referring to FIGS. 1 to 4, a high-temperature process equipment (100) according to one embodiment of the present invention may include a vacuum chamber (190), a rail (130) provided inside the vacuum chamber (190) along the longitudinal direction of the vacuum chamber (190), a stage (140) provided on the rail (130) so as to be able to move along the longitudinal direction of the rail (130), and an actuator (110) that transmits driving force to the rail (130) so that the stage (140) can move relative to the rail (130), i.e., an actuator that drives the rail (130).

[0058] In FIGS. 1 to 4 and FIG. 6, the vacuum chamber (190) is shown in the form of a vacuum tube formed long in the longitudinal direction, but the shape of the vacuum chamber (190) is not limited to a tube shape. For convenience of explanation, the case where the vacuum chamber (190) is in the form of a vacuum tube will be described below as an example.

[0059] Referring to the drawing, the vacuum chamber (190) is shown with both ends open, but the longitudinal ends of the vacuum chamber (190) can be formed to be sealed so that the interior of the vacuum chamber (190) maintains a vacuum state.

[0060] An actuator (110) may be provided on one side of the vacuum chamber (190). That is, the actuator (110) may be provided on one side of the outside of the vacuum chamber (190) along the longitudinal direction of the vacuum chamber (190).

[0061] The vacuum chamber (190) may be formed of a heat-resistant material capable of withstanding a high temperature of 1,000°C or higher. For example, it is preferable that the vacuum chamber (190) be formed of a heat-resistant material capable of withstanding a high temperature of 1,000°C or higher, such as quartz, ceramic, or tungsten.

[0062] Since the internal temperature of the vacuum chamber (190) becomes high temperature of 1,000 ℃ or higher, it is preferable that not only the vacuum chamber (190) but also the rail (130) and the stage (140) be formed of a heat-resistant material capable of withstanding high temperatures of 1,000 ℃ or higher, such as quartz, ceramic, or tungsten.

[0063] However, the material of parts exposed to high temperatures of 1,000°C or higher, such as the vacuum chamber (190) and rail (130), is not limited to quartz, ceramic, or tungsten, and any material capable of withstanding high temperatures of 1,000°C or higher is sufficient.

[0064] The rail (130) can be formed in the shape of a quartz tube similar to the vacuum chamber (190).

[0065] In FIGS. 1 to 4, the stage (140) is configured to move along two rails (130), but the stage (140) may be configured to move along one or three or more rails (130).

[0066] As described, when two or more rails (130) are provided in the vacuum tube (190), the spacing between the rails (130) must be kept equal so that the stage (140) can move straight along the rails (130). If the spacing between the two or more rails (130) is not equal, there may be parts where the stage (140) cannot move straight along the rails (130).

[0067] To prevent such problems, a rail support (139) may be provided to support the rail (130) and maintain a constant spacing. Multiple rail support (139) may be provided along the length direction of the rail (130).

[0068] It is preferable that the rail support (139) be located at both ends in the longitudinal direction of the rail (130) so as not to interfere with the movement of the stage (140). In addition, it is preferable that the rail support (139) be formed of a heat-resistant material capable of withstanding high temperatures of 1,000°C or higher, such as quartz, ceramic, or tungsten.

[0069] A stage (140) can be provided on the rail (130) so that frictional force is generated on the contact surface between the rail (130) and the stage (140).

[0070] An actuator (110) may be provided on one end of the longitudinal direction of the rail (130). The output portion (112) of the actuator (110) may be directly connected to one end of the longitudinal direction of the rail (130), or an output buffer portion (120) may be provided between the output portion (112) of the actuator (110) and one end of the longitudinal direction of the rail (130).

[0071] An actuator (110) of a high-temperature process equipment (100) according to one embodiment of the present invention may be provided as either a step motor or a piezo actuator. That is, the actuator (110) may be provided as a step motor or as a piezo actuator.

[0072] If the actuator (110) is a piezo actuator, the actuator (110) can be directly connected to one end of the rail (130) in the longitudinal direction without an output buffer (120). On the other hand, if the actuator (110) is a stepper motor, an output buffer (120) can be provided between the actuator (110) and one end of the rail (130) in the longitudinal direction.

[0073] When the actuator (110) is a stepper motor, the output portion (112) of the stepper motor is provided as a rotation axis, whereas the stage (140) must move linearly along the longitudinal direction of the rail (130). Therefore, in order to apply linear vibration to the rail (130) using the rotational force output from the output portion (112) of the stepper motor, the rotational force must be converted into a linear driving force (excitation force). The output damping portion (120) is provided between the actuator (110), which is provided as a stepper motor, and one end of the longitudinal direction of the rail (130) to convert the rotational force output from the output portion (112) of the stepper motor into a linear driving force.

[0074] A gear section (not shown) may be provided inside the housing (121) of the output buffer section (120). The gear section provided inside the housing (121) may be provided in the form of a lead screw or a ball screw.

[0075] A coupler (114) may be provided between the output damping unit (120) and the actuator (110). The coupler (114) is an auxiliary mechanism that absorbs vibrations generated by the actuator (110) and transmits mechanical power.

[0076] The rotational force output from the output section (112) of the actuator (110) provided as a stepper motor can be converted into linear driving force by the gear section (114) and transmitted to the output buffer section (120).

[0077] Bellows may be provided inside the output buffer (120). The output buffer (120) contains bellows inside, so it transmits mechanical vibrations to the rail (130) but blocks the entry and exit of air, thereby maintaining a vacuum inside the chamber. Costs can be reduced by manufacturing this part by modifying an existing commercial vacuum valve.

[0078] The rail (130) is provided at one end of the longitudinal direction of the vacuum chamber (190) and can be mechanically connected to an actuator (110) provided as a step motor through a bellows-type output damper (120) that vibrates while maintaining a vacuum state.

[0079] The output buffer (120) may include a housing (121), a first stepped portion (123) connected to the gear portion (114) at one of the longitudinal ends of the housing (121), a second stepped portion (125) provided at the other end of the longitudinal ends of the housing (121), and a flange portion (127) provided at one end of the second stepped portion (125) and provided to be connected to or in contact with one end of the longitudinal direction of the rail (130). A third stepped portion (122) may be provided on the side of the housing (121).

[0080] A bellows (corrugated tube) that blocks the entry and exit of gas while transmitting mechanical vibrations to the rail (130) may be provided inside the housing (121). Additionally, the interior of the housing (121) is provided to maintain a vacuum.

[0081] Here, the vacuum chamber (190) may be configured such that one end in the longitudinal direction is connected to the housing (121) to maintain a vacuum state.

[0082] The output damper (120) includes a bellows and a screw inside and can convert the rotational motion of the actuator (110) into linear motion, and the rail (130) can be linearly excited by the linear motion converted in this way.

[0083] In the case where the actuator (110) is a piezo actuator, the output damping unit (120) may be omitted, but the output damping unit (120) may not be omitted. Since the output damping unit (120) outputs linear motion by means of a bellows or vacuum valve, it can be used even when the piezo actuator outputs linear motion.

[0084] By utilizing a vacuum valve as an output buffer (120), the rotational motion of the actuator (110) is converted into linear motion, allowing the stage (140) placed on the rail (130) inside the vacuum chamber (190) to move left and right.

[0085] A high-temperature process equipment (100) according to one embodiment of the present invention may include a vacuum chamber (190), an output buffer (120), and a support member (20) that supports an actuator (110). Additionally, the high-temperature process equipment (100) may include a base plate (10) on which the support member (20) is placed.

[0086] Meanwhile, the actuator (110) of the high-temperature process equipment (100) according to one embodiment of the present invention can induce the stage (140) to move relative to the rail (130) by utilizing the frictional force generated between the rail (130) and the stage (140).

[0087] The actuator (110) applies vibration to the rail (130) so that the rail (130) moves in both directions along its length, and after the rail (130) moves along one side of the length at a constant speed and for a certain period of time, the rail (130) stops moving for a certain period of time. Afterward, the actuator (110) can apply vibration to the rail (130) so that the rail (130) moves along the other side of the length at a constant speed and for a certain period of time.

[0088] At this time, the speed at which the rail (130) moves in one direction and the speed at which the rail (130) moves in the opposite direction are different, and the rail (130) does not move for a certain period of time when the direction of movement of the rail (130) changes.

[0089] When the rail (130) moves as described above by the actuator (110), vibration can be applied to the rail (130) so that the frictional force generated between the rail (130) and the stage (140) becomes a static frictional force or a dynamic frictional force.

[0090] The actuator (110) can move the stage (140) on the rail (130) by utilizing the mutual conversion between static (static) friction and dynamic (kinetic) friction generated between the rail (130) and the stage (140).

[0091] FIG. 5 illustrates, in an exemplary manner, the operating principle of a high-temperature process equipment (100) according to an embodiment of the present invention illustrated in FIG. 1 to FIG. 4. That is, FIG. 5 illustrates a concept for explaining the principle in which the stage (140) moves by a change in frictional force generated between the rail (130) and the stage (140) by an actuator (110) of the high-temperature process equipment (100) according to an embodiment of the present invention.

[0092] FIG. 5(a) shows the state before the stage (140) moves, FIG. 5(b) shows the state where the stage (140) moves to the left (arrow direction), and FIG. 5(c) shows the state where the stage (140) moves to the right (arrow direction).

[0093] According to FIG. 5, a stage (140) is shown placed on a rail (130), but there are no restrictions on the method or structure of connecting the rail (130) and the stage (140).

[0094] In FIG. 5, the reference numeral "CP" indicates the contact area between the rail (130) and the stage (140). As illustrated, the contact area (CP) does not necessarily have to form a convex curved surface, but it is sufficient if frictional force can be generated at the contact area (CP) between the rail (130) and the stage (140).

[0095] The state illustrated in FIG. 5(a) is a state in which the rail (130) and the stage (140) are stuck to each other at the contact area (CP), i.e., a stick state. The stick state is a state in which a static friction force acts at the contact area (CP).

[0096] When the voltage applied to the actuator (110) is increased in the state shown in FIG. 5 (a), the rail (130) moves to the left (in the direction of the arrow shown in FIG. 5 (b)) by the actuator (110) while slowly increasing its speed as shown in FIG. 5 (b). At this time, the rail (130) and the stage (140) remain attached to each other at the contact point (CP). Therefore, the rail (130) and the stage (140) move to the left by a certain distance (D) in the same manner.

[0097] When the rail (130) and the stage (140) stick together and move a certain distance (D), the actuator (110) stops operating for a while. Afterwards, when the rail (130) moves rapidly to the right (in the direction of the arrow shown in FIG. 5 (c)) by the actuator (110), the stage (140) maintains the position (state) shown in FIG. 5 (b) and only the rail (130) moves rapidly to the right (see FIG. 5 (c)).

[0098] In the case illustrated in FIG. 5(c), a dynamic friction force acts on the contact area (CP) between the rail (130) and the stage (140), so the stage (140) remains stationary while only the rail (130) moves to the right and returns to the state of FIG. 5(a). That is, slip occurs at the contact area (CP) between the rail (130) and the stage (140), resulting in the effect of only the stage (140) moving to the left.

[0099] Comparing (a) and (c) of Fig. 5, it can be seen that the left end of the rail (130) has no change in position, while the left end of the stage (140) has moved to the left by a certain distance (D).

[0100] In this way, the actuator (110) can apply vibration to the rail (130) so that the frictional force generated between the rail (130) and the stage (140) becomes static (static) frictional force or dynamic (kinetic) frictional force. At this time, the actuator (110) can make the stage (140) move relative to the rail (130) by changing the speed at which the rail (130) moves when the rail (130) changes direction of movement, that is, make the stage (140) move on the rail (130).

[0101] In other words, the actuator (110) can cause the stage (140) to move on the rail (130) by applying vibration to the rail (130) by a stick-slip motion method.

[0102] The stage (140) may also be a stick-slip stage. The stick-slip stage (140) can perform fine linear motion by utilizing the frictional force applied to the contact area (CP) with the rail (130).

[0103] The actuator (110) can cause the stage (140) to move stepwise along the rail (130) through the repetition of stick and slip of the frictional force applied to the contact area (CP) between the rail (130) and the stage (140). The actuator (110) can perform nanometer-level precise position control or adjustment of the stage (140).

[0104] The state illustrated in FIG. 5(a) is a stick state in which the rail (130) and the stage (140) are stuck together at the contact point (CP). In this state, the stage (140) is stationary and does not move.

[0105] As illustrated in FIG. 5(a), the rail (130) and the stage (140) are initially stuck together (static friction) at the contact area (CP) and are in a stopped state. In this state, even if the actuator (110) applies force to the rail (130), static friction acts on the contact area (CP), so the stage (140) does not move relative to the rail (130) and remains stuck in place, causing the rail (130) and the stage (140) to move together (see FIG. 5(b)). In the state illustrated in FIG. 5(b), the frictional force applied to the contact area (CP) is smaller than the force that keeps the stage (140) in a stopped state.

[0106] The state illustrated in FIG. 5(c) is a slip state. That is, a state in which the stage (140) slides on the rail (130). When the force applied to the rail (130) by the actuator (110) exceeds the static (static) friction force, the stage (140) begins to slide. At this time, as the static (static) friction force is converted into dynamic (kinetic) friction force, the friction force is instantaneously reduced, and the stage (140) slides and moves on the rail (130) in one go.

[0107] After the stage (140) moves, if the force applied to the rail (130) by the actuator (110) weakens again, the stage (140) returns to a stick state and stops.

[0108] In a high-temperature process equipment (100) according to one embodiment of the present invention, when the process illustrated in (a) to (c) of FIG. 5 is repeated by an actuator (110), the stage (140) moves forward little by little on the rail (130).

[0109] When the actuator (110) is a stepper motor, the length of the time per forward rotation pulse and the time per reverse rotation pulse of the stepper motor can be set differently, and the time during which rotation stops between forward rotation and reverse rotation can be set so that the stage (140) moves relative to the rail (130).

[0110] When a stepper motor is used as the actuator (110), the rail (130) moves relatively quickly in one direction and moves relatively slowly in the opposite direction by repeating a fast rotation and a slow rotation in the opposite direction with the stepper motor, and accordingly, the stage (140) moves in one direction.

[0111] For example, when using a stepper motor with 1 / 8 microstep speed as the actuator (110), the stepper motor rotates at high speed with 100 pulses in the forward direction (time 80 us per pulse) and then stops for a certain period of time (10 ms). After that, if the process of the stepper motor rotating at low speed with 100 pulses in the reverse direction (time 500 us per pulse) is repeated, the stage (140) moves in one direction on the rail (130).

[0112] Conversely, the stepper motor rotates at high speed with 100 pulses in the reverse direction (time 80 us per pulse) and then pauses for a certain period of time (10 ms). After that, the process of the stepper motor rotating at low speed with 100 pulses in the forward direction (time 500 us per pulse) is repeated, causing the stage (140) to move in the opposite direction on the rail (130).

[0113] In this way, the rail (130) reciprocates in place by means of the actuator (110), but the stage (140) moves in one direction along the length of the rail (130).

[0114] A high-temperature process equipment (100) according to one embodiment of the present invention can control the pulse interval and rotation direction of a stepper motor using an Arduino controller (200, see FIG. 6).

[0115] Meanwhile, if the actuator (110) is a piezo actuator, the rail (130) can be made to move relatively slowly along one direction of the length of the rail (130) and move relatively quickly along the opposite direction, thereby making the stage (140) move relative to the rail (130).

[0116] A high-temperature process equipment (100) according to one embodiment of the present invention is equipped with an actuator (110) that operates in a stick-slip driving manner, thereby enabling control of the movement distance of a stage (140) in very small units.

[0117] When a stepper motor or a piezoelectric actuator is used as the actuator (110), the stage (140) can be position-controlled with precision at the nanometer level. In addition, since the stage (140) is driven using friction and elasticity without complex motors or gears, the structure is simple and miniaturization is easy, and the movement resolution is high through the control of friction, allowing for fine and precise adjustment.

[0118] Although not illustrated, a high-temperature process equipment (100) according to one embodiment of the present invention may separately include a rail (130) and an actuator (110) on which a stage (140) on which a sample or wafer is mounted moves, and a rail (130) and an actuator (110) on which a precursor is mounted moves. In this case, the actuator (110) of the rail (130) on which the stage (140) on which the sample or wafer is mounted moves, and the actuator (110) of the rail (130) on which the precursor is mounted moves can each be controlled independently.

[0119] In this way, when the high-temperature process equipment (100) according to one embodiment of the present invention includes a plurality of stages (140), the crystal growth can be made different by having the stage (140) on which a sample or wafer is mounted and the stage (140) on which a precursor is mounted different positions within the vacuum chamber (190). By having the positions of the sample or wafer and the precursor different positions, the temperature of the sample or wafer and the temperature of the precursor can be controlled differently.

[0120] Referring to FIG. 6, a modified example of a high-temperature process equipment (100) according to one embodiment of the present invention may include a heating unit (150) that heats a vacuum chamber (190).

[0121] The heating unit (150) may be provided in a form that completely covers the vacuum chamber (190), and the position of the vacuum chamber (190) cannot be changed with respect to the heating unit (150). In a high-temperature process equipment (100) according to one embodiment of the present invention, the temperature of a sample or wafer and the temperature of a precursor can be individually controlled by moving the position of the stage (140) inside the vacuum chamber (190) heated by the heating unit (150).

[0122] In this way, a high-temperature process equipment (100) according to one embodiment of the present invention may include a heating unit (150) in the form of a chamber furnace (tube furnace).

[0123] A high-temperature process equipment (100) according to one embodiment of the present invention illustrated in FIG. 6 may include a position measuring unit (160) that measures the position of a stage (140) moving along a rail (130), provided inside or outside a vacuum chamber (190) or a heating unit (150).

[0124] If the location of the stage (140) inside the vacuum chamber (190) or heating unit (150) can be known, the position of the sample or source can be freely changed and verified without mounting a motor inside the vacuum chamber (190) in semiconductor process equipment requiring high temperature and high vacuum.

[0125] The position measuring unit (160) may be provided with a LiDAR sensor. For example, a LiDAR sensor may be installed inside or outside the vacuum chamber (190) to determine the position of the stage (140) on which the sample is mounted.

[0126] When the position measuring unit (160) is located outside the vacuum chamber (190), the position measuring unit (160) can measure the position of the stage (140) through a window (not shown) provided to observe the interior of the vacuum chamber (190).

[0127] The LiDAR sensor provided as the position measuring unit (160) measures the distance to the stage (140) using a laser, so it can measure even outside the vacuum chamber (190). In addition, when the position measuring unit (160) is located outside the vacuum chamber (190), it has the advantage of not being affected by the high temperature caused by the heating unit (150).

[0128] Meanwhile, when a step motor is used as the actuator (110) of the high-temperature process equipment (100) according to one embodiment of the present invention, the step motor can serve as the position measuring unit (160). In the case of a step motor, since the specifications of the step pulse (length or time of the pulse, etc.) are fixed, the position of the stage (140) can be determined by knowing the rotation direction of the step motor and the number of input pulses.

[0129] Referring to FIG. 6, a controller (200) of a high-temperature process equipment (100) according to one embodiment of the present invention can control the operation of a heating unit (150), a position measuring unit (160), an actuator (110), or an output buffer (120).

[0130] A high-temperature process equipment (100) according to one embodiment of the present invention is equipped with an actuator (110) and a stage (140) that operate in a stick-slip manner, so that the position of the stage (140) located inside the vacuum chamber (190) can be adjusted, and thus the temperature of a sample, wafer, or precursor mounted on the stage (140) can be rapidly varied. This is because the stage (140) can be moved inside the vacuum chamber (190) which maintains a high temperature high vacuum state of 1,000°C or higher by a heating unit (150), and the position of the stage (140) can be known using a position measuring unit (160), etc., so the temperature can be rapidly varied or controlled by moving the stage (140) to a position suitable for crystal growth, etc.

[0131] The high-temperature process equipment (100) according to one embodiment of the present invention described above can be applied to various semiconductor process equipment including chemical vapor deposition (CVD) equipment and can replace existing high-temperature process equipment of the sliding furnace type.

[0132] As described above, one embodiment of the present invention has been explained with specific details such as specific components, limited embodiments, and drawings; however, this is provided merely to aid in a more comprehensive understanding of the present invention, and the present invention is not limited to the above embodiments. A person skilled in the art to which the present invention pertains can make various modifications and variations from this description. Accordingly, the scope of the present invention should not be limited to the described embodiments, and all things equivalent to or having equivalent variations to the claims set forth below, as well as the claims themselves, shall be considered to fall within the scope of the concept of the present invention.

Claims

1. Vacuum chamber; A rail provided inside the above vacuum chamber; A stage provided on the rail to be located inside the vacuum chamber; and It includes an actuator provided on the outside of the vacuum chamber and transmitting driving force to the rail so that the stage moves along the rail; High-temperature process equipment characterized by the above actuator varying the direction and speed of the driving force to induce the stage to move relative to the rail.

2. In Paragraph 1, High-temperature process equipment characterized by the above actuator reciprocating the rail along the longitudinal direction of the rail, wherein the reciprocating motion of the rail is made such that the motion speed in one longitudinal direction is different from the motion speed in the other longitudinal direction.

3. In Paragraph 1, The above actuator is characterized by inducing the stage to move relative to the rail by utilizing the frictional force generated between the rail and the stage.

4. In Paragraph 3, High-temperature process equipment characterized by the actuator moving the stage on the rail by utilizing the mutual conversion between static friction force and dynamic friction force generated between the rail and the stage.

5. In Paragraph 1, The above actuator is a high-temperature process equipment characterized by applying vibration to the rail by a stick-slip driving method.

6. In Paragraph 1, High-temperature process equipment characterized in that the above actuator is provided as either a stepper motor or a piezo actuator.

7. In Paragraph 6, A high-temperature process equipment characterized by, when the actuator is a stepper motor, setting the length of the time per forward rotation pulse and the time per reverse rotation pulse of the stepper motor differently, and setting a time for the rotation to stop between the forward rotation and the reverse rotation to cause the stage to move relative to the rail.

8. In Paragraph 6, A high-temperature process equipment characterized by, when the actuator is a piezo actuator, causing the rail to move relatively slowly along one direction of the rail's length and the rail to move relatively quickly along the opposite direction, thereby causing the stage to move relative to the rail.

9. In Paragraph 6, A high-temperature process equipment comprising a heating unit for heating the vacuum chamber, wherein the heating unit is formed such that its position cannot be changed relative to the vacuum chamber.

10. In Paragraph 9, High-temperature process equipment characterized by including a position measuring unit provided inside or outside the vacuum chamber or the heating unit, for measuring the position of the stage moving along the rail.

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