An
electron beam curing method, materials, and equipment for complex
ceramic components are disclosed. This method employs a focused
electron beam with a variable
beam diameter to selectively cure and form
ceramic materials containing photosensitive resin, layer by layer, to create complex components. These components are then sintered to obtain the final complex
ceramic component. Due to the high penetration of the
electron beam and the real-
time control of the
beam diameter, this method can not only form complex, irregularly shaped, high-density components such as ultrafine carbides, nitrides, and ultra-high temperature ceramics, but also reduce the difficulty of
sintering. Simultaneously, the real-time adjustment of the
beam diameter allows for efficient filling of large areas within complex components and precise shaping of fine contours. Furthermore, the high vacuum requirement during electron beam curing significantly reduces defects such as pores within the material. Since electron beam curing can reduce or eliminate the need for initiators, the storage stability of the prepared
ceramic materials is also greatly improved. This represents a novel additive manufacturing process for high-performance complex ceramic components.