The invention discloses a high-molecular photosensitive material and a preparation method thereof, and relates to the field of photosensitive materials. Nano
zinc boride modified organic
silicon resin modified epoxy resin is used as modified resin, hydroxyl groups on the surface of the
epoxy resin and borate groups form
hydrogen bonds or are subjected to a
condensation reaction, cohesion of the material is enhanced, crosslinking points of the
epoxy resin are increased due to introduction of the organic
silicon resin, a complex crosslinking net structure is formed, and the performance of the material is improved;
boron is introduced to form a strong B-O bond, the stability of the resin is improved,
zinc ions can promote formation of a
carbon layer in the
combustion process, the structure of an expanded
carbon layer is improved, and the
flame retardance of the material is improved. According to the invention, the alkenyl phosphite modified epoxy
acrylic resin is used as a film-forming main material and has strong compatibility with the modified epoxy resin, and the synthesized material has stable performance; the introduction of the alkenyl phosphite group can reduce the
viscosity of the resin, prevent UV yellowing and improve the photocuring rate. The light-sensitive material prepared by the invention is rapid in
light curing and stable in chemical performance.