Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

1results about How to "Avoid severe distortion" patented technology

Virtual character costume fitting method, device, equipment, medium and program product

PendingCN122289602Aretain featuresretention volumeGraphicsMorphing
This disclosure relates to the field of computer graphics technology, and provides a method, apparatus, device, medium, and program product for clothing adaptation of virtual characters. The method for clothing adaptation of virtual characters includes: first, establishing a three-dimensional spatial mesh containing a source virtual character model and a target virtual character model with the same topological structure, as well as a source clothing model; then, based on the positional correspondence between the source and target virtual character models, and combined with smoothing constraints to limit the difference in deformation vectors between adjacent mesh points, calculating the deformation vector of each mesh point in the three-dimensional spatial mesh; finally, using the deformation vector of each mesh point, mapping and transforming the source position of each vertex in the source clothing model to the target position, thereby generating a target clothing model adapted to the target virtual character model. This disclosure can effectively maintain the geometric characteristics of the clothing model, reduce distortion during the adaptation process, and improve visual effects.
Owner:GUANGZHOU BOGUAN TELECOMM TECH LTD