Automatic ash removal equipment capable of conveniently cleaning furnace bottom of monocrystalline silicon furnace

Abstract

The automatic ash removal equipment comprises a furnace body, a furnace bottom plate is arranged below the furnace body, a waste discharge port used for discharging dust or waste gas in the furnace body is formed in the furnace bottom plate, an ash removal device is arranged on one side of the waste discharge port, and an ash removal device is arranged on the other side of the waste discharge port. The ash removal device partially extends into the waste discharge port to automatically clean accumulated ash on the inner wall during ash removal, and after ash removal is completed, the ash removal device is separated from the waste discharge port, so that dust or waste gas can be discharged from the waste discharge port. When the ash cleaning device of the automatic ash cleaning equipment is used for cleaning ash, the ash cleaning device can extend into the waste discharge port to automatically clean accumulated ash on the inner wall of the waste discharge port on the furnace bottom plate, so that the influence on the growth quality of monocrystalline silicon and the environment in the furnace chamber due to blockage caused by dust accumulation on the inner wall of the waste discharge port is avoided; and after dust removal is completed, the dust can be separated from the waste discharge port, so that the dust removal effect of the dust removal device is prevented from being influenced by dust accumulation at the waste discharge port for a long time.

Description

[Technical field] The invention relates to the technical field of dust cleaning, and in particular to an automatic dust cleaning device which is convenient for cleaning the bottom of a single crystal silicon furnace. [Background technology] Single crystal silicon is a relatively active non-metallic element and an important component of crystal materials. It is at the forefront of the development of new materials. Its main uses are as semiconductor materials and using solar photovoltaic power generation and heating. The Czochralski single crystal silicon furnace is a key technical equipment for producing single crystal silicon. The single crystal silicon furnace is a device that uses a graphite heater to melt polycrystalline materials such as polysilicon in an inert gas (mainly nitrogen and helium) environment and grows single crystal silicon without dislocation using the Czochralski method.

[0003] During the crystal growth process of the current single crystal silicon furnace, dust and carbon monoxide particles are generated in the furnace chamber. The generated dust and carbon monoxide particles are usually discharged through the exhaust port of the furnace body and then processed by a vacuum pump and dust removal equipment. During the discharge process, the dust is easy to adhere to the inner wall of the exhaust port. However, the dust removal equipment of the existing single crystal silicon furnace cannot effectively remove the dust accumulated on the inner wall of the exhaust port, which can easily cause the exhaust port to be blocked, resulting in poor dust removal effect, thereby affecting the growth quality of the single crystal silicon. At the same time, the dust accumulated on the inner wall of the exhaust port will also affect the clean environment in the furnace chamber and affect the growth quality of the single crystal silicon. [Summary of the invention] In order to solve the technical problem that the dust accumulated on the inner wall of the waste outlet cannot be effectively removed, which easily causes the waste outlet to be blocked, thereby affecting the growth quality of single crystal silicon and the internal environment of the furnace, the present invention proposes an automatic dust cleaning device that is convenient for cleaning the bottom of a single crystal silicon furnace.

[0005] The present invention is achieved by the following technical solutions: An automatic dust cleaning device for facilitating cleaning of the bottom of a single crystal silicon furnace comprises a furnace body, a furnace bottom plate is arranged below the furnace body, the furnace bottom plate is provided with a waste discharge port for discharging dust or waste gas inside the furnace body, a dust cleaning device is arranged on one side of the waste discharge port, the dust cleaning device partially extends into the waste discharge port during dust cleaning to automatically clean dust accumulated on the inner wall, and is separated from the waste discharge port after the dust cleaning is completed so that the waste discharge port can discharge dust or waste gas.

[0006] As described above, an automatic dust cleaning device is provided for facilitating cleaning of the bottom of a single crystal silicon furnace. The dust cleaning device comprises an actuator for cleaning dust accumulated on the inner wall and a power mechanism for controlling the rotation and lifting of the actuator. The power mechanism comprises a rotating mechanism for controlling the rotation of the actuator and a lifting mechanism for controlling the lifting of the actuator.

[0007] As described above, an automatic dust cleaning device is provided for facilitating cleaning of the bottom of a single crystal silicon furnace. The outer side of the waste outlet is connected to a waste outlet pipe for discharging dust or waste gas out of the furnace body. The waste outlet pipe is provided with an opening for allowing an actuator to extend into or out of the waste outlet, and a sealing device for sealing the actuator and the opening. The sealing device is provided with a containing space for accommodating the actuator after the dust cleaning is completed.

[0008] In the automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace as described above, the opening includes a transverse cutout for facilitating the rotation of the actuator and a longitudinal cutout for facilitating the lifting of the actuator.

[0009] As described above, an automatic dust cleaning device is provided for facilitating cleaning of the bottom of a single crystal silicon furnace, wherein the rotating mechanism comprises a rotatable turntable and a driving device for driving the turntable to rotate, the turntable is provided with a coaxially rotating rotating assembly, a coaxially rotating rotating rod is connected to the rotating assembly, and a support rod for providing support for the actuator is provided between the rotating rod and the actuator.

[0010] As described above, an automatic dust cleaning device is provided for facilitating cleaning of the bottom of a single crystal silicon furnace, wherein the lifting mechanism comprises a movable rod that can be raised and lowered and a sheet metal component for fixing the lifting mechanism on a rotating assembly, a limit block is provided on the top of the movable rod for lifting and lowering into place, a through hole is provided on the top of the sheet metal component for allowing the movable rod to move up and down, and the sheet metal component is provided with a control device for controlling the lifting and lowering of the movable rod.

[0011] As described above, in the automatic dust cleaning device for facilitating cleaning of the bottom of a single crystal silicon furnace, the rotating assembly comprises a rotating shaft for driving the actuator to rotate and a mounting plate for mounting the lifting mechanism.

[0012] As described above, an automatic dust cleaning device is provided for cleaning the bottom of a single crystal silicon furnace, and a protective bracket for protecting the power mechanism is provided on the outer side of the dust cleaning device.

[0013] As described above, an automatic dust cleaning device is provided for facilitating cleaning of the bottom of a single crystal silicon furnace, wherein the furnace body comprises a main furnace chamber and an auxiliary furnace chamber, a furnace cover is provided on the top of the main furnace chamber, an isolation valve seat for isolating the main furnace chamber from the auxiliary furnace chamber is installed on the furnace cover, a monitoring window for monitoring the growth process of single crystal silicon and changes in the state in the furnace chamber is provided on the main furnace chamber, and installation positions for installing other components are also reserved on the furnace cover.

[0014] The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace as described above, wherein the driving device is arranged below the turntable, and the driving device is driven by a motor or a rotary cylinder; One end of the support rod is connected to the actuator, and the other end is vertically connected to the rotating rod.

[0015] Compared with the prior art, the automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace proposed by the present invention has the following beneficial effects: 1. When the ash cleaning device proposed in the present invention is in ash cleaning operation, the actuator can extend into the waste outlet to automatically clean the dust accumulated on the inner wall of the waste outlet on the furnace bottom plate, so as to avoid the accumulation of dust on the inner wall of the waste outlet and cause blockage, thereby affecting the growth quality of single crystal silicon and the furnace indoor environment; and after the ash cleaning is completed, the actuator can be separated from the waste outlet, so as to avoid the actuator being in the waste outlet for a long time, which causes dust accumulation, thereby affecting the cleaning effect of the ash cleaning device.

[0016] 2. The waste discharge pipe proposed in the present invention is provided with an opening, and the design of the opening allows the actuator to smoothly extend into or out of the waste discharge port, thereby ensuring the precise positioning of the actuator and improving the dust cleaning efficiency.

[0017] 3. The waste discharge pipe proposed in the present invention is provided with a sealing device. The accommodating space in the sealing device can ensure that the actuator will not accumulate dust for a long time at the waste discharge port in a non-working state, thereby affecting the cleaning effect of the cleaning device; at the same time, it can also prevent the diffusion of dust during the cleaning process and cause environmental pollution.

[0018] 4. The actuator proposed in the present invention can evenly distribute the force during dust cleaning, ensuring that the dust accumulated on the inner wall of the waste outlet can be completely removed.

Brief Description of the Drawings

[0020] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention; Figure 2 It is a schematic diagram of the decomposition of the present invention; Figure 3 It is a schematic diagram of the decomposition of the dust cleaning device of the present invention; Figure 4 It is a schematic diagram of the structure of the dust cleaning device of the present invention; Figure 5 It is a schematic diagram of the bobbin structure of the present invention; Figure 6 It is a schematic diagram of the structure of the blocking device of the present invention; Figure 7 It is a schematic diagram of the furnace bottom plate structure of the present invention; Figure 8 This is a diagram showing the initial state of the dust cleaning device of the present invention; Fig. 9 This is a working state diagram of the dust cleaning device of the present invention; Fig.10 This is another working state diagram of the dust cleaning device of the present invention; Fig.11It is a cross-sectional view of the working state of the dust cleaning device of the present invention. [Specific implementation method] In order to make the technical problems, technical solutions and beneficial effects solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0022] Specific embodiments, combined with Figures 1 to 11 As shown, the technical scheme of the present invention is further described, an automatic ash cleaning device for cleaning the bottom of a single crystal silicon furnace, comprising a furnace body 10, a furnace bottom plate 20 is provided below the furnace body 10, the furnace bottom plate 20 is provided with a waste outlet 21 for discharging dust or waste gas inside the furnace body 10, and a ash cleaning device 30 is provided on one side of the waste outlet 21, and the ash cleaning device 30 partially extends into the waste outlet 21 to automatically clean the dust accumulated on the inner wall during ash cleaning, and detaches from the waste outlet 21 after ash cleaning is completed so that the waste outlet 21 can normally discharge dust or waste gas. The ash cleaning device 30 of the automatic ash cleaning device can extend into the waste outlet to automatically clean the dust accumulated on the inner wall of the waste outlet 21 on the furnace bottom plate 20 during ash cleaning, so as to avoid the dust accumulation on the inner wall of the waste outlet 21 causing blockage, thereby affecting the growth quality of single crystal silicon and the furnace room environment; and after ash cleaning is completed, it can detach from the waste outlet 21 to avoid long-term ash accumulation at the waste outlet, thereby affecting the ash cleaning effect of the ash cleaning device 30.

[0023] Furthermore, as a preferred embodiment of the present scheme but not a limitation, the cleaning device 30 includes an actuator 31 for cleaning dust accumulated on the inner wall and a power mechanism 32 for controlling the rotation and lifting of the actuator 31, the power mechanism 32 includes a rotating mechanism 33 for controlling the rotation of the actuator 31 and a lifting mechanism 34 for controlling the lifting of the actuator 31, the actuator 31 is adapted to the waste outlet 21, and the actuator 31 is a circular cleaning wheel.

[0024] In this embodiment, the actuator is designed as a circular cleaning wheel, which helps the actuator to evenly distribute the force during cleaning and ensure that the dust accumulated on the inner wall of the waste outlet can be completely removed. At the same time, the cleaning of the actuator is controlled by the power mechanism. On the one hand, the dust accumulated on the inner wall of the waste outlet can be more effectively removed to keep the waste outlet unobstructed. On the other hand, automatic cleaning can be achieved by the power mechanism, which can improve the cleaning efficiency and avoid harmful volatiles and accumulated dust generated during the production process and harm to operators.

[0025] Furthermore, as a preferred embodiment of the present scheme but not a limitation, the waste outlet 21 is connected to the outer side with a waste outlet pipe 22 for discharging dust or waste gas out of the furnace body, the waste outlet pipe 22 is provided with an opening 23 for the actuator 31 to extend into or out of the waste outlet 21 and a sealing device 40 for sealing the actuator 31 and the opening 23, the sealing device 40 is provided with a accommodating space 41 for accommodating the actuator 31 after cleaning, the opening 23 includes a transverse cut 231 for facilitating the rotation of the actuator 31 and a longitudinal cut 232 for facilitating the lifting and lowering of the actuator 31, the transverse cut 231 and the longitudinal cut 232 are interconnected to form a whole, and the opening 23 is in the shape of a "7".

[0026] In this embodiment, the design of the opening on the waste outlet pipe allows the cleaning device to smoothly extend into or out of the waste outlet, ensuring the precise positioning of the cleaning device and improving the cleaning efficiency; the sealing device helps to discharge the cleaned dust accumulated on the inner wall of the waste outlet directly out of the furnace body through the waste outlet pipe for unified treatment, preventing the spread of dust during the cleaning process and causing environmental pollution.

[0027] Further, as a preferred embodiment of the present invention but not a limitation, the rotating mechanism 33 includes a rotatable turntable 331 and a driving device 332 for driving the turntable 331 to rotate, the turntable 331 is provided with a coaxially rotating rotating component 333, the rotating component 333 includes a rotating shaft 3331 for driving the actuator 31 to rotate and a mounting plate 3332 for mounting the lifting mechanism 34, a coaxially rotating rotating rod 334 is connected to the rotating shaft 3331, a support rod 335 for providing support for the actuator 31 is provided between the rotating rod 334 and the actuator 31, one end of the support rod 335 is connected to the actuator 31, and the other end is vertically connected to the rotating rod 334, the driving device 332 is arranged below the turntable 331, the driving device 332 can be a rotary cylinder drive, a servo motor or a stepping motor, preferably, the driving device 332 is a rotary cylinder drive.

[0028] Furthermore, as a preferred implementation of the present solution but not a limitation, the rotating mechanism 33 may also be provided with other travel limiters such as a travel limit switch commonly used in the industry, and when the rotating shaft 3331 rotates, the mounting plate 3332 will be driven to rotate synchronously.

[0029] In this embodiment, the cooperation of the rotating rod and the supporting rod provides a stable support for the actuator, ensuring that the actuator can maintain a correct position and posture during the rotation process, thereby ensuring the reliability of dust cleaning; the servo motor can provide a stable torque output by adjusting the servo parameters to ensure the rotation reliability of the rotating mechanism, thereby ensuring that the actuator can accurately rotate into place; In addition, the rotating mechanism can also use the added travel limit switch to enable the actuator to accurately rotate to a predetermined position, while also preventing the actuator from rotating beyond the range and causing damage to the equipment.

[0030] Furthermore, as a preferred embodiment of the present invention but not a limitation, the lifting mechanism 34 includes a movable rod 341 that can be lifted and lowered, and a sheet metal part 342 for fixing the lifting mechanism 34 on a mounting plate 3332. A limit block 343 is provided at the top of the movable rod 341 for lifting and lowering into place. A through hole 344 is provided at the top of the sheet metal part 342 for allowing the movable rod 341 to move up and down. The sheet metal part 342 is provided with a control device 345 for controlling the lifting and lowering of the movable rod 341. The control device 345 may be a pneumatic cylinder or a hydraulic cylinder. Preferably, the control device 345 is a hydraulic cylinder.

[0031] Furthermore, as a preferred implementation mode of the present invention but not limitation, the lifting mechanism 34 rotates coaxially with the rotating mechanism 33 through the rotating assembly 333, and the lifting mechanism 34 may also be provided with other travel limiters such as travel limit switches commonly used in the industry.

[0032] In this embodiment, the limit block can ensure that the movable rod can stop automatically when it is lifted to a predetermined position, thereby preventing damage to the equipment caused by excessive lifting; the coaxial rotation of the lifting mechanism and the rotating mechanism can realize the precise positioning of the actuator, which is convenient for the actuator to clean the dust accumulated on the inner wall of the waste outlet and improve the dust cleaning effect; In addition, the lifting mechanism can also use the added travel limit switch to enable the movable rod to accurately rise to a predetermined position, while also preventing the movable rod from being raised or lowered beyond the range and causing damage to the equipment.

[0033] Furthermore, as a preferred implementation of the present solution but not a limitation, a protective bracket 52 for protecting the power mechanism 32 is provided on the outer side of the cleaning device 30 .

[0034] In this embodiment, the design of the protection bracket can protect the power mechanism from impact or accidental damage, ensuring that the power mechanism can provide a stable and reliable power source for the dust cleaning device.

[0035] Furthermore, as a preferred implementation mode of the present solution but not a limitation, the furnace bottom plate 20 is a double-layer structure, and a coolant is provided between the double-layer structure for improving the heat dissipation capacity, and the coolant is water.

[0036] Furthermore, as a preferred implementation mode of the present scheme but not a limitation, the furnace body 10 includes a main furnace chamber 11 and an auxiliary furnace chamber 12, the top of the main furnace chamber 11 is provided with a furnace cover 111, and the furnace cover 111 is equipped with an isolation valve seat 112 for isolating the main furnace chamber 11 and the auxiliary furnace chamber 12, the main furnace chamber 11 is provided with a monitoring window 113 for monitoring the growth process of single crystal silicon and the state changes in the furnace chamber, and the furnace cover 111 is also reserved with installation positions for installing other components, and the installation positions can be used to install visual sensors, observation windows or measurement windows.

[0037] In this embodiment, the design of the isolation valve seat can facilitate the replacement and disassembly of the seed crystal chuck, and the monitoring window can facilitate production personnel to directly observe the growth process of single crystal silicon and the state changes in the furnace chamber, so as to make corresponding adjustments according to the changes in the production process to ensure the growth quality of single crystal silicon.

[0038] The working principle of this embodiment is as follows: The present invention proposes an automatic ash cleaning device for cleaning the bottom of a single crystal silicon furnace. The ash cleaning device 30 is used to automatically clean the ash accumulated on the inner wall of the waste outlet 21 on the furnace bottom plate 20, and the cleaned ash is discharged from the furnace body 10 through the waste outlet pipe 22 for unified cleaning. The specific ash cleaning process is as follows: First, the actuator 31 is rotated to a predetermined position. The specific rotation process is as follows: the drive device 332 drives the turntable 331 to rotate, and the turntable 331 drives the actuator 31 to rotate through the rotating shaft 3331, so that the actuator 31 rotates through the transverse cutout 231 and enters the waste discharge pipe 22. When the actuator 31 reaches the predetermined position, the drive device 332 stops driving the turntable 331 to rotate, so that the actuator 31 stops rotating. After the actuator 31 rotates into position, it rises to the dust accumulation area on the inner wall of the waste outlet 21 through the lifting mechanism 34. The specific process is: the movable rod 341 is controlled to rise through the control device 345, so that the movable rod 341 drives the actuator 31 to rise through the longitudinal incision 232. When it rises to the dust accumulation area on the inner wall, the control device 345 stops controlling the movable rod 341 to rise. The actuator 31 scrapes the inner wall of the waste outlet 21 during the rising process and the inner wall of the waste outlet 21 during the descent, so as to scrape off the dust accumulated on the inner wall of the waste outlet 21. The cleaned dust will be discharged from the furnace body 10 through the waste pipe 22 for unified treatment.

[0039] After the dust cleaning is completed, the control device 345 controls the movable rod 341 to drive the actuator 31 to descend to the original position. After the descent is completed, the driving device 332 drives the turntable 331 to drive the actuator 31 to rotate to the original position, and the cleaning device 30 returns to its initial state, so that the waste outlet 21 can discharge dust or exhaust gas normally, and the actuator will not accumulate dust due to being at the waste outlet 21 for a long time.

[0040] Ordinary technicians in the relevant field should understand that the above is an implementation method provided in combination with specific content, and it is not considered that the specific implementation of the present invention is limited to these descriptions. At the same time, due to different industry naming, it is not limited to the above naming, nor is it limited to English naming. Any similarity or similarity with the method, structure, etc. of the present invention, or a number of technical deductions or replacements based on the concept of the present invention, should be regarded as the protection scope of the present invention.

Claims

1. An automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace, characterized in that: The invention comprises a furnace body (10), wherein a furnace bottom plate (20) is provided below the furnace body (10), wherein the furnace bottom plate (20) is provided with a waste discharge port (21) for discharging dust or waste gas inside the furnace body (10), and a dust cleaning device (30) is provided on one side of the waste discharge port (21). When cleaning dust, the dust cleaning device (30) partially extends into the waste discharge port (21) to automatically clean dust accumulated on the inner wall, and after cleaning is completed, the dust cleaning device (30) is separated from the waste discharge port (21) so that the waste discharge port (21) can discharge dust or waste gas.

2. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 1, characterized in that: The dust cleaning device (30) comprises an actuator (31) for cleaning dust accumulated on the inner wall and a power mechanism (32) for controlling the rotation and lifting of the actuator (31); the power mechanism (32) comprises a rotating mechanism (33) for controlling the rotation of the actuator (31) and a lifting mechanism (34) for controlling the lifting of the actuator (31).

3. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 2, characterized in that: The waste outlet (21) is connected to a waste outlet pipe (22) for discharging dust or waste gas out of the furnace body. The waste outlet pipe (22) is provided with an opening (23) for allowing the actuator (31) to extend into or out of the waste outlet (21), and a sealing device (40) for sealing the actuator (31) and the opening (23). The sealing device (40) is provided with a receiving space (41) for accommodating the actuator (31) after dust cleaning is completed.

4. The automatic dust cleaning device for facilitating cleaning of the bottom of a single crystal silicon furnace according to claim 3, characterized in that: The opening (23) comprises a transverse cutout (231) for facilitating the rotation of the actuator (31) and a longitudinal cutout (232) for facilitating the lifting and lowering of the actuator (31).

5. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 2, characterized in that: The rotating mechanism (33) comprises a rotatable turntable (331) and a driving device (332) for driving the turntable (331) to rotate; a coaxially rotating rotating assembly (333) is provided on the turntable (331); a coaxially rotating rotating rod (334) is connected to the rotating assembly (333); and a supporting rod (335) for providing support for the actuator (31) is provided between the rotating rod (334) and the actuator (31).

6. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 2, characterized in that: The lifting mechanism (34) comprises a movable rod (341) that can be lifted and lowered, and a sheet metal part (342) for fixing the lifting mechanism (34) on a rotating assembly (333); a limit block (343) that is lifted and lowered into position is provided at the top of the movable rod (341); a through hole (344) for allowing the movable rod (341) to move up and down is provided at the top of the sheet metal part (342); and a control device (345) for controlling the lifting and lowering of the movable rod (341) is provided on the sheet metal part (342).

7. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 6, characterized in that: The rotating assembly (333) comprises a rotating shaft (3331) for driving the actuator (31) to rotate, and a mounting plate (3332) for mounting the lifting mechanism (34).

8. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 2, characterized in that: A protection bracket (52) for protecting the power mechanism (32) is provided on the outside of the dust cleaning device (30).

9. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 1, characterized in that: The furnace body (10) comprises a main furnace chamber (11) and an auxiliary furnace chamber (12); a furnace cover (111) is provided on the top of the main furnace chamber (11); an isolation valve seat (112) for isolating the main furnace chamber (11) from the auxiliary furnace chamber (12) is installed on the furnace cover (111); a monitoring window (113) for monitoring the growth process of single crystal silicon and changes in the state in the furnace chamber is provided on the main furnace chamber (11); and installation positions for installing other components are also reserved on the furnace cover (111).

10. The automatic dust cleaning device for cleaning the bottom of a single crystal silicon furnace according to claim 5, characterized in that: The driving device (332) is arranged below the rotating disk (331), and the driving device (332) is driven by a motor or a rotating cylinder; One end of the support rod (335) is connected to the actuator (31), and the other end is vertically connected to the rotating rod (334).

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