Auxiliary graph correction method and device, medium and product

Abstract

The invention provides an auxiliary graph correction method and device, a medium and a product, and the method comprises the steps: determining at least one target edge in an initial layout according to the graph attribute of each graph in the initial layout; a recognition area is constructed with the first edge as the benchmark, and the first edge is any one of the at least one target edge; under the condition that the main graph exists in the recognition area, adding an initial auxiliary graph between the main graph and the first edge; judging whether the initial auxiliary pattern conforms to a preset mask manufacturing rule or not; and if not, correcting the initial auxiliary pattern according to a preset mask manufacturing rule to obtain a target auxiliary pattern. The embodiment of the invention can improve the correction effect of the auxiliary graph.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to an auxiliary graphic correction method, device, medium and product. Background Art

[0002] Driven by Moore's Law, the semiconductor industry is moving towards smaller and smaller feature sizes, and the lithography process is facing unprecedented challenges, especially the dual pressures of pattern resolution and process stability are becoming increasingly prominent. In order to meet these challenges, sub-resolution assist feature (SRAF) technology came into being, becoming a key means to improve lithography resolution and enhance process windows. However, in practical applications, the existing technology lacks sufficient adaptability and flexibility in the correction link of auxiliary graphics, and it is difficult to achieve ideal correction effects in complex and changeable lithography environments, which affects the final resolution and process stability of the pattern, resulting in poor auxiliary graphics correction effects in the existing technology. Summary of the invention

[0003] The present application provides an auxiliary graphic correction method, device, medium and product, which can improve the correction effect of the auxiliary graphic.

[0004] In a first aspect, an embodiment of the present application provides an auxiliary graphics correction method, the method comprising:

[0005] Determining at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout;

[0006] Taking the first edge as a reference, constructing a recognition area, wherein the first edge is any one of the at least one target edge;

[0007] When a main graphic exists in the identification area, adding an initial auxiliary graphic between the main graphic and the first side;

[0008] Determining whether the initial auxiliary pattern complies with a preset mask manufacturing rule;

[0009] If not, the initial auxiliary pattern is modified according to the preset mask manufacturing rule to obtain a target auxiliary pattern.

[0010] In a second aspect, the present application provides an auxiliary graphics correction device, the device comprising:

[0011] A determination module, configured to determine at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout;

[0012] A construction module, configured to construct a recognition area based on a first edge, wherein the first edge is any one of the at least one target edge;

[0013] An adding module, configured to add an initial auxiliary graphic between the main graphic and the first side when a main graphic exists in the recognition area;

[0014] A judging module, used for judging whether the initial auxiliary pattern complies with a preset mask manufacturing rule;

[0015] The correction module is used for correcting the initial auxiliary pattern according to the preset mask manufacturing rule to obtain the target auxiliary pattern if no.

[0016] In a third aspect, an embodiment of the present application provides an electronic device, the electronic device comprising: a processor and a memory storing computer program instructions;

[0017] When the processor executes the computer program instructions, the auxiliary graphics correction method in any one of the embodiments of the first aspect is implemented.

[0018] In a fourth aspect, an embodiment of the present application provides a computer storage medium having computer program instructions stored thereon, and when the computer program instructions are executed by a processor, an auxiliary graphics correction method as in any one of the embodiments in the first aspect is implemented.

[0019] In a fifth aspect, an embodiment of the present application provides a computer program product. When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device executes the auxiliary graphics correction method in any one of the embodiments in the first aspect above.

[0020] In an auxiliary graphic correction method, device, medium and product provided in an embodiment of the present application, first, according to the graphic attributes of each graphic in the initial layout, the target edge for placing the auxiliary graphic is identified and selected to ensure that the layout of the auxiliary graphic can accurately match the lithography requirements. Subsequently, by constructing the identification area, the main graphic area to be enhanced is accurately located. When the main graphic is identified in the identification area, the initial auxiliary graphic is added between the main graphic and the first edge. This step fully considers the physical effects in the lithography process and improves the rationality of the auxiliary graphic design. It is particularly critical that the present application introduces a rule compliance check and adaptive correction mechanism for the initial auxiliary graphic. Once it is found that the initial graphic does not meet the strict requirements of mask manufacturing, it is finely adjusted according to the preset rules to ensure that the target auxiliary graphic finally generated not only meets the process specifications, but also can give full play to its expected role in improving resolution and enhancing process stability in the lithography process. This significant improvement in flexibility and adaptability enables the corrected auxiliary graphic to achieve a more ideal correction effect in a complex lithography environment, thereby greatly improving the lithography resolution and the stability of the process window, thereby improving the correction effect of the auxiliary graphic. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solution of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0022] Figure 1 It is a flowchart of an auxiliary graphics correction method provided by an embodiment of the present application;

[0023] Figure 2 This is one of the principle schematic diagrams of the auxiliary graphics correction method provided by an embodiment of the present application;

[0024] Figure 3 This is the second principle schematic diagram of the auxiliary graphics correction method provided by an embodiment of the present application;

[0025] Figure 4 This is the third principle schematic diagram of the auxiliary graphics correction method provided by an embodiment of the present application;

[0026] Figure 5 This is the fourth principle schematic diagram of the auxiliary graphics correction method provided by an embodiment of the present application;

[0027] Figure 6 is a structural schematic diagram of an auxiliary image correction device provided in an embodiment of the present application;

[0028] Figure 7 It is a schematic diagram of the structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0029] In order to more clearly understand the above-mentioned objectives, features and advantages of the present disclosure, the scheme of the present disclosure will be further described below. It should be noted that the embodiments of the present disclosure and the features in the embodiments can be combined with each other without conflict.

[0030] In the following description, many specific details are set forth to facilitate a full understanding of the present disclosure, but the present disclosure may also be implemented in other ways different from those described herein; it is obvious that the embodiments in the specification are only part of the embodiments of the present disclosure, rather than all of the embodiments.

[0031] It should be noted that, in this article, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the term "comprising" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprising a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0032] Driven by Moore's Law, the semiconductor industry is moving towards smaller and smaller feature sizes. When the integrated circuit process technology node enters below 65nm, the critical dimensions of isolated and sparse patterns change with the focal length, which will lead to insufficient depth of focus of the photolithography process in actual production. The increasingly narrow process window becomes one of the key factors restricting product stability and yield improvement. Commonly used process window enhancement technologies in the industry include multiple exposure technology, lighting optimization technology, and sub-resolution auxiliary graphics technology.

[0033] Sub-Resolution Assist Feature (SRAF) technology can be used to improve the lithography resolution of patterns by changing the amplitude distribution of the transmitted light field during the lithography process to compensate for the diffraction effect of light waves and the nonlinearity of the process. It can effectively reduce the impact of focal length changes on the key dimensions of the pattern and further enhance the depth of focus of the lithography process. There are many factors that affect the performance of sub-resolution assist features, such as the size of the sub-resolution assist feature itself, the distance and position between the sub-resolution assist feature and the main pattern, and the distance between sub-resolution assist features. There are many influencing factors in the actual production application of sub-resolution assist features, such as the shape, size, quantity, range, placement of the added sub-resolution assist features, and the influence of surrounding graphics. These factors are closely related to the final improvement of image resolution.

[0034] The prior art mainly relies on parameters such as graphic size and distance to select the placement edge and position for the placement of auxiliary graphics. Although this method simplifies the operation process, it is limited in that it ignores the overall layout and relative position relationship between graphics, resulting in the placement of auxiliary graphics that cannot accurately match the complex lithography process requirements. Furthermore, when making corrections according to mask manufacturing rules, the prior art only focuses on whether the correction results meet the established rule parameters, but ignores the maintenance of the auxiliary graphic shape during the correction process. In particular, for auxiliary graphics with special shape requirements, the original shape relationship is often lost after correction, affecting its expected effect in improving lithography resolution and process stability. Therefore, this limitation of the prior art not only limits the potential of auxiliary graphics in improving lithography performance, but also makes it difficult to meet the urgent needs of the semiconductor industry for high-precision and high-stability lithography processes in the process of developing to smaller feature sizes.

[0035] In order to solve the problems existing in the prior art, the embodiments of the present application provide an auxiliary graphics correction method, device, equipment, medium and product.

[0036] The present application embodiment provides an auxiliary graphics correction method, device, medium and product. The following first introduces the auxiliary graphics correction method provided by the present application embodiment. Figure 1 As shown, the method specifically comprises the following steps:

[0037] S100, determining at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout.

[0038] Optionally, in the embodiment of the present application, the initial layout contains the layout information of all the graphics that will be lithographically printed on the silicon wafer. These graphics are arranged according to specific design rules to form the functional circuits and interconnection structures of the final chip. The initial layout is a direct input to the lithography process, and its quality directly affects the performance and yield of the chip.

[0039] In the initial layout, there are multiple different graphics that represent different components in the chip, such as transistors, capacitors, metal wires, etc. These graphics have their own shapes, sizes and positions, and together they constitute the complete layout of the chip. The accuracy and coordination of the graphics are crucial to ensure the realization of chip functions.

[0040] Optionally, auxiliary graphics are specially designed graphic structures that are added to the initial layout to improve the light field distribution and pattern resolution during the lithography process. Auxiliary graphics do not directly participate in the functional realization of the chip, but the existence of auxiliary graphics can significantly improve the accuracy and stability of the lithography process. By precisely controlling the position, shape and size of the auxiliary graphics, the diffraction effect and proximity effect in the lithography process can be effectively compensated, thereby ensuring that the shape and size of the final graphics meet the design requirements.

[0041] Optionally, the target edge refers to a pattern edge selected as a reference for placing auxiliary patterns in the initial layout. The selection of these target edges is based on a comprehensive consideration of multiple factors, including but not limited to the geometric size, shape characteristics, positional relationship of the patterns and their potential impact on lithography resolution.

[0042] Optionally, in a feasible implementation of the present application, detailed graphic attributes of each graphic in the initial layout are first comprehensively analyzed, including but not limited to the geometric dimensions (such as length, width), shape features (such as rectangle, circle, polygon, etc.) of the graphics, and the relative positional relationship between them. Based on this detailed information, a series of logical judgments and geometric calculations can be used to identify those graphic edges that have a potential key role in improving the lithography resolution.

[0043] During the recognition process, those edges of graphics that are located at key positions of graphics and have a significant impact on surrounding graphics or the overall layout can be given priority as candidate target edges. For example, for densely arranged graphics areas, those edges of graphics that are prone to resolution degradation due to diffraction effects during the photolithography process can be selected; while in open areas, those edges of graphics that can guide light field distribution and enhance photolithography uniformity are more likely to be selected. In addition, factors such as the size ratio and shape symmetry of the graphics can also be considered to ensure that the selected target edge can most effectively play its role as a reference for auxiliary graphics placement.

[0044] Once the candidate target edges are determined, they can be further screened and evaluated to ensure that the final selected target edges not only meet the physical limitations of the lithography process, but also maximize the lithography resolution. Specifically, it can involve checking the coordination between the candidate target edges and other graphic edges. Ultimately, accurately determining at least one (or more) target edges in the initial layout lays a solid foundation for the precise placement and effective correction of auxiliary graphics in subsequent steps.

[0045] S200 , constructing a recognition area based on a first edge, where the first edge is any one of the at least one target edge.

[0046] Optionally, in an embodiment of the present application, the identification area is a specific area constructed based on a preset area range and with the first side (any one of the at least one target side) as a reference. The identification area is a two-dimensional geometric shape with a clear boundary, such as a rectangle, circle, sector or polygon, etc., and its size and shape can be determined by the parameters of the preset area range and the specific attributes of the first side (such as length, direction, position, etc.). The main function of the identification area is to provide a clear spatial range so as to evaluate and determine the specific placement position of the auxiliary graphics within the range, thereby maximizing the improvement of the lithography resolution.

[0047] The preset area range refers to a set of parameters of one or more area sizes, shapes and positions that are preset according to the requirements of the lithography process, mask manufacturing rules and the layout characteristics of the initial layout. These parameters define the boundary conditions when constructing the recognition area around the target edge (i.e., the first edge), ensuring that the recognition area can cover the key areas where the resolution may be reduced due to physical effects in the lithography process (such as diffraction and proximity effect), but will not be too large to introduce unnecessary complexity or violate the mask manufacturing rules.

[0048] Optionally, in a feasible implementation of the present application, a two-dimensional recognition area can be constructed based on preset area range parameters, with the first side (i.e., any one of the at least one target side) as the starting point or reference line. The size, shape, and direction of this recognition area are determined based on the preset parameters and the specific attributes of the first side (such as length, direction, position, etc.), and are intended to cover key areas where the resolution may be reduced due to diffraction effects and proximity effects in the lithography process.

[0049] When constructing the identification area, the physical limitations of the lithography process and the requirements of the mask manufacturing rules can be considered. For example, the size of the identification area needs to meet the minimum feature size limit to ensure that the auxiliary pattern can be accurately identified and copied during the lithography process; at the same time, the position and shape of the identification area also need to be compatible with the mask manufacturing rules to avoid violations in the subsequent mask manufacturing process.

[0050] It should be noted that the first edge is defined as any one of at least one target edge. Since there may be multiple target edges suitable for placing auxiliary graphics in the initial layout, S200 can be performed for each target edge, that is, the identification area can be constructed based on each target edge. In this way, the layout characteristics of the initial layout can be more comprehensively considered to ensure that auxiliary graphics are placed at multiple key positions, thereby further improving the uniformity and stability of the lithography resolution.

[0051] S300: When a main graphic exists in the recognition area, add an initial auxiliary graphic between the main graphic and the first side.

[0052] Optionally, in the embodiment of the present application, the main graphics refer to key graphics in the initial layout that have an important impact on the lithography resolution. In integrated circuit design, due to physical phenomena such as diffraction effect and proximity effect in the lithography process, the edges of these main graphics may become blurred or deformed, thereby affecting the lithography resolution. Therefore, in the auxiliary graphics correction process, the main graphics are the objects that need special attention, and the addition of auxiliary graphics is to improve the performance of these main graphics in the lithography process.

[0053] Optionally, in a feasible implementation of the present application, an initial auxiliary graphic may be added based on a preset placement position along the line direction between the main graphic and the first side. The line direction between the main graphic and the first side may refer to the direction of a straight line starting from a specific point (such as a center point, an edge point, etc., depending on the design requirements) of the main graphic (the main graphic present in the identification area) and pointing to a point (such as a midpoint, an edge point, etc.) on the first side (or its extension line). This direction is the reference direction for determining how the initial auxiliary graphic is placed relative to the main graphic and the reference side.

[0054] Optionally, the preset placement position can be along the line direction between the main graphic and the first side, starting from a specific point (such as a center point, an edge point, etc.) of the main graphic, moving a preset distance along the line direction, and then adding the initial auxiliary graphic at this position. This preset distance can be determined based on process requirements, design goals, and characteristics of the graphics in the initial layout to ensure that the initial auxiliary graphic can be correctly placed at the desired position and have an expected impact on the graphics in the initial layout.

[0055] Optionally, in a feasible implementation method of the present application, when it is determined that the main graphic is included in the identification area, the direction of the connection between the main graphic and the first side will be determined. Specifically, a reference point on the main graphic (such as a center point or an edge point) and a corresponding point on the first side (such as an intersection point, a midpoint or a preset offset point) can be selected, and the direction of the straight line between the two points can be determined.

[0056] Then, according to the preset placement position, start from the reference point of the main pattern along the direction of this line and move at a preset distance to find the ideal placement point of the auxiliary pattern. At this position, add the initial auxiliary pattern with a preset pattern size. The preset pattern size can be pre-set according to the requirements of the lithography process, the mask manufacturing rules, and the layout characteristics of the initial layout, in order to ensure that the auxiliary pattern can be accurately identified and copied during the lithography process.

[0057] It should be noted that in the process of adding the initial auxiliary graphics, a series of checks and verifications can be performed to ensure that the placement, size and direction of the auxiliary graphics meet the preset conditions and can coexist harmoniously with other graphics in the initial layout. Through this series of steps, the initial auxiliary graphics can be successfully added to the initial layout, providing strong support for the subsequent lithography process, thereby improving the lithography resolution and enhancing the quality and performance of chip manufacturing.

[0058] S400, determining whether the initial auxiliary pattern complies with a preset mask manufacturing rule;

[0059] S500: If not, the initial auxiliary pattern is modified according to the preset mask manufacturing rule to obtain a target auxiliary pattern.

[0060] Optionally, in an embodiment of the present application, mask manufacturing rules refer to specific requirements and restrictions on the graphic design on the mask during the semiconductor manufacturing process, especially in the photolithography process stage. These rules are determined by the physical properties of the semiconductor manufacturing process, material properties, equipment accuracy, and other factors in the manufacturing process. Mask manufacturing rules cover many aspects, including but not limited to the minimum size of the graphics, the minimum spacing, the angle and shape restrictions of the graphics, the symmetry and balance requirements of the graphics, etc. These rules exist to ensure that the graphics on the mask can be accurately copied and transferred to the silicon wafer during the manufacturing process, while avoiding defects and errors in the manufacturing process.

[0061] The target auxiliary pattern is an auxiliary pattern that meets the rules after correction in S500 when the initial auxiliary pattern does not meet the preset mask manufacturing rules. The target auxiliary pattern matches the initial auxiliary pattern in terms of shape, that is, their basic shapes and outlines are consistent, but they may differ in specific size, position, angle or other attributes to meet the requirements of the mask manufacturing rules.

[0062] Optionally, in a feasible implementation of the present application, the added initial auxiliary graphics are first checked for compliance, that is, whether they comply with the preset mask manufacturing rules. When it is detected that the initial auxiliary graphics do not meet the preset mask manufacturing rules, a correction process is initiated. This correction process first analyzes the specific differences between the initial auxiliary graphics and the preset mask manufacturing rules, including but not limited to the size, shape, position of the graphics, and the relative relationship with other graphics of the initial auxiliary graphics.

[0063] Next, the initial auxiliary graphics can be checked and compared one by one according to the preset mask manufacturing rules. If it is found that one or some attributes of the initial auxiliary graphics exceed the range allowed by the preset mask manufacturing rules, these attributes can be adjusted accordingly. This adjustment can be a fine-tuning of the graphic size to ensure that it meets the specified dimensional tolerance; it can also be a repositioning of the graphic position to avoid conflict or overlap with other graphics.

[0064] During the adjustment process, if the size or spacing does not meet the rules, the size of the initial auxiliary pattern can be scaled proportionally, or the position of the initial auxiliary pattern can be adjusted to increase the spacing with the adjacent pattern until the preset mask manufacturing rules are met to obtain the target auxiliary pattern. This adjustment needs to ensure that the basic shape of the auxiliary pattern remains unchanged while changing the size or position, that is, the consistency of its outline and main features is maintained. As a result, the target auxiliary pattern matches the initial auxiliary pattern in shape, but has undergone necessary optimization and improvement in specific properties. In this way, in the subsequent lithography process, the target auxiliary pattern can play its role more accurately, improve the lithography resolution and improve the quality and performance of chip manufacturing.

[0065] In an auxiliary graphic correction method, device, equipment, medium and product provided in an embodiment of the present application, firstly, according to the graphic attributes of each graphic in the initial layout, the target edge for placing the auxiliary graphic is intelligently identified and selected to ensure that the layout of the auxiliary graphic can accurately match the lithography requirements. Subsequently, by constructing the recognition area, the main graphic area to be enhanced is accurately located. When the main graphic is identified in the recognition area, the initial auxiliary graphic is added between the main graphic and the first edge. This step fully considers the physical effects in the lithography process and improves the rationality of the auxiliary graphic design. It is particularly critical that in the correction stage, the present application not only ensures that the auxiliary graphic meets the basic rules of mask manufacturing, but also emphasizes the precise maintenance of the auxiliary graphic shape, so that the graphic shape of the corrected target auxiliary graphic matches the graphic shape of the initial auxiliary graphic before correction, avoiding the performance loss caused by simply satisfying the mask manufacturing rules and ignoring the relationship between the auxiliary graphic shapes in the traditional correction method. The target auxiliary graphic after correction can more effectively compensate for the diffraction effect of light waves in the lithography process, reduce the impact of focal length changes on the key dimensions of the graphic, thereby greatly improving the lithography resolution and the stability of the process window, thereby improving the correction effect of the auxiliary graphic.

[0066] In one embodiment, the step of constructing the identification area based on the first side includes:

[0067] The identification area is constructed based on the target endpoint of the first side; wherein the target endpoint is any endpoint of the first side.

[0068] Optionally, in a feasible implementation of the present application, a target endpoint of the first side is first selected as a starting point or reference point for constructing the identification area. The target endpoint here can be any endpoint of the first side, and the endpoint selected may depend on the layout characteristics of the layout, the position of the main figure, and the improvement effect that the auxiliary figure needs to achieve. For example, if the main figure is close to one end of the first side, it may be more reasonable to select the endpoint close to the main figure as the target endpoint.

[0069] With the target endpoint and the preset area range, we start to build the recognition area. Specifically, we can expand a certain range of space area outward based on the preset boundary conditions (such as area size, shape, direction, etc.) with the target endpoint as the reference. This area is the recognition area, which covers the potential locations where auxiliary graphics may need to be added, while also taking into account the safe distance from adjacent graphics.

[0070] In a specific example, if Figure 2 As shown, in the specific implementation, according to the preset area range, the first side (i.e. Figure 2 The recognition area can be constructed based on the target endpoint of the specific side of the first edge. The recognition area can be divided comprehensively by setting a circular area with the target endpoint as the center and a preset radius range (i.e. [S0, S1]) as the radius, and combining the fan-shaped area with a specific angle range with the first edge (such as a certain angle perpendicular to the first edge or along the direction of the first edge (i.e. [α0, α1])). In this way, the direct connection with the first edge is taken into account, and the position range where the auxiliary graphics may be added is accurately defined by limiting the angle and radius.

[0071] In these optional embodiments, the identification area is constructed based on the target endpoint of the first side, so that the adding position of the auxiliary pattern can be accurately located, ensuring that the auxiliary pattern can specifically improve the lithography resolution problem near the target endpoint.

[0072] In one embodiment, when there is a main graphic in the identification area, adding an initial auxiliary graphic between the main graphic and the first side includes:

[0073] When at least part of the main graphic exists in the recognition area, obtaining a first target point in a graphic edge of a first graphic that is closest to the target endpoint, the first graphic being a portion of the at least part of the main graphic that is located in the recognition area;

[0074] The initial auxiliary graphic is added on a line connecting the target endpoint and the first target point.

[0075] Optionally, in a feasible implementation of the present application, as Figure 3As shown, when the recognition area contains at least part of the main graphic, it is necessary to accurately identify the graphic edge of this part of the main graphic. It should be noted that the graphic edge here may be a complete graphic edge or a partial graphic edge of a complete graphic edge, depending on the relative position of the main graphic and the recognition area. The main graphic boundary in the recognition area can be accurately outlined and the relevant graphic edge information can be extracted through image recognition algorithms or layout analysis tools.

[0076] Next, the first target point in these graphic edges that is closest to the target endpoint of the first edge can be determined. Specifically, first traverse all the points on the graphic edges, calculate their distances to the target endpoint, and find the point with the shortest distance as the first target point. It should be noted that the first target point may be an endpoint of the graphic edge or any point on the graphic edge, depending on the distance from the target endpoint.

[0077] After the first target point is determined, the initial auxiliary graphics can be added according to the preset placement distance and graphic size. Figure 4 As shown, first calculate the direction of the line from the target endpoint to the first target point, and locate a point at a preset placement distance along this direction as the center point of the auxiliary graphic. Then, based on the center point, add the initial auxiliary graphic according to the preset graphic size (such as length, width, shape, etc.).

[0078] In these optional embodiments, the placement based on the relative relationship between the main pattern and the first side can accurately locate the adding position of the initial auxiliary pattern, achieve targeted improvement of the auxiliary pattern on the lithography resolution, and improve the accuracy and efficiency of the lithography process.

[0079] In one embodiment, when there is a main graphic in the identification area, adding an initial auxiliary graphic between the main graphic and the first side further includes:

[0080] In the case where there are at least two main graphics in the recognition area, obtaining a second graphic of the at least two main graphics that is closest to the target endpoint;

[0081] Acquire a second target point which is closest to the target endpoint in the portion of the second graphic located in the recognition area;

[0082] The initial auxiliary graphic is added on a line connecting the target endpoint and the second target point.

[0083] Optionally, in a feasible implementation of the present application, when the recognition area does not contain a single main graphic, but there are at least two main graphics, it is necessary to first identify which of these main graphics is closest to the first side. This step is crucial because it determines the reference position for the subsequent addition of the initial auxiliary graphic to ensure that the auxiliary graphic can most effectively act on the area that needs to be optimized. By traversing all the main graphics in the recognition area and calculating their respective shortest distances to the first side, the second graphic with the closest distance can be determined.

[0084] Next, find the part of the second figure that is within the recognition area. Then, find the point on the edge of the figure that is within the recognition area that is closest to the target endpoint, that is, the second target point. This step is also completed by calculating the distance from each point on the edge of the figure to the target endpoint, and select the point with the shortest distance as the second target point.

[0085] Once the second target point is determined, the initial auxiliary graphics can be added to the initial layout along the direction of the line connecting the target endpoint and the second target point, according to the preset graphic size and placement distance. The preset graphic size is set according to the requirements of the photolithography process and the specifications of the layout design, aiming to ensure that the auxiliary graphics can produce the expected effects during the photolithography process, such as improving resolution and reducing halo. The preset placement distance is determined based on the interaction mechanism between the main graphics and the auxiliary graphics, which is to ensure that the auxiliary graphics can effectively act on the main graphics while avoiding the introduction of unnecessary interference or errors.

[0086] In specific implementation, the above steps can be automatically completed by using relevant functions in the graphics processing software or algorithm library, such as distance calculation, graphics intersection detection, point positioning, etc. At the same time, in order to improve efficiency and accuracy, some optimization algorithms, such as heuristic search, iterative approximation, etc., can also be introduced to quickly find the optimal second graphics and second target points.

[0087] In these optional embodiments, when the identification area includes at least two main graphics, the embodiment ensures that the initial auxiliary graphics can be accurately added to the closest main graphics by determining the second graphics closest to the first side and its portion located in the identification area, and finding the second target point closest to the target endpoint. This method improves the pertinence and effectiveness of the addition of auxiliary graphics, further optimizes the photolithography process, and improves manufacturing quality and efficiency.

[0088] In one embodiment, the identification area is a fan-shaped ring area, wherein the center of the fan-shaped ring area is the target endpoint. By setting the identification area as a fan-shaped ring area, the best candidate area for placing the auxiliary pattern can be accurately defined based on the position and direction of the main pattern, which helps the auxiliary pattern to more effectively improve the lithography resolution, optimize the layout, and improve production efficiency.

[0089] In one embodiment, determining at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout includes:

[0090] When the graphic attribute of any one of the graphics in the initial layout meets the preset screening rule, the graphic edge that matches the preset screening rule among the graphic edges of the graphics that meet the preset screening rule is determined as the target edge, and the graphic attribute includes at least one of the graphic length, the graphic width, and the distance between the graphic and the adjacent graphics. The preset screening rule is determined according to the design parameters of the initial layout.

[0091] Optionally, in a feasible implementation of the present application, first, each graphic in the initial layout is traversed, and these graphics include various design elements, such as lines, polygons, circles, etc., which together constitute the basic structure of the entire layout. For each graphic, its graphic properties are checked, including but not limited to the length, width, and distance between adjacent graphics. These properties are important bases for judging whether the graphic meets specific design requirements or optimization conditions.

[0092] Next, the graphic properties of each graphic are evaluated according to the preset filtering rules. These preset filtering rules are determined based on the design parameters of the initial layout, and they involve multiple aspects such as the size range, shape requirements, and layout density of the graphics. For example, the preset filtering rules require filtering out graphic edges whose length exceeds a certain threshold, or graphics that are too close to adjacent graphics. These rules are designed to quickly locate graphic edges that require special attention or processing.

[0093] After the filtering rules are determined, each edge of each graph can be compared one by one. If the attributes of a certain edge match the preset filtering rules, then this edge will be determined as the target edge. This process requires multiple iterations and comparisons to ensure that all qualified edges can be accurately identified.

[0094] Exemplarily, the preset screening rule requires screening out graphic edges whose length exceeds or is less than a specific threshold. For example, in the photolithography process, lines that are too long may cause uneven exposure, so special attention and processing are required. Similarly, the preset screening rule can also be based on the width of the graphic edges. For example, lines that are too narrow may be easily broken during the manufacturing process, while lines that are too wide may increase manufacturing costs or occupy unnecessary space.

[0095] For another example, a preset filtering rule can check the distance between a graphic edge and its neighboring graphics. For example, to avoid short circuits or signal interference, you may need to filter out graphic edges with too small spacing and adjust them. In some cases, you may also focus on the density of graphics in a specific area.

[0096] In a specific example, the preset screening rule is to screen out all graphic edges with a spacing of less than 5nm from adjacent graphics for reinforcement. In this scenario, the preset screening rule is "spacing screening", and the specific condition is "spacing less than 5nm". Then, each graphic edge in the layout will be traversed to check its spacing with adjacent graphics, and the graphic edges with a spacing of less than 5nm will be marked as target edges.

[0097] It should be noted that since the initial layout may contain a large number of graphics with different shapes, this process may be complicated and time-consuming. In order to improve the efficiency of screening, some optimization algorithms or data structures can be used to speed up the screening and comparison process. For example, a hash table can be used to store the attribute information of the graphics for fast retrieval and matching; or parallel processing technology can be used to process the attribute checks of multiple graphics at the same time.

[0098] In these optional embodiments, by accurately matching the key attributes of the graphics with the preset screening rules, the target edges that need special attention or processing in the initial layout are effectively screened out. This method improves the efficiency and accuracy of layout analysis and optimization, and helps to quickly locate and solve potential design problems, such as excessive layout density, non-compliant graphics size, etc., thereby improving the design quality and reliability of the entire layout.

[0099] In one embodiment, if not, the initial auxiliary pattern is modified according to the preset mask manufacturing rule to obtain the target auxiliary pattern, including:

[0100] When the graphic size of the initial auxiliary graphic does not conform to the preset mask manufacturing rule, or the distance between the initial auxiliary graphic and any graphic in the initial layout after the initial auxiliary graphic is added does not conform to the preset mask manufacturing rule, the initial auxiliary graphic is proportionally adjusted according to the preset mask manufacturing rule, that is, proportionally increased or reduced, to obtain the target auxiliary graphic, and the shape of the target auxiliary graphic is the same as the shape of the initial auxiliary graphic.

[0101] Optionally, in a feasible implementation of the present application, in the semiconductor manufacturing process, ensuring that the auxiliary graphics comply with the preset mask manufacturing rules is a critical step, which directly affects the quality and performance of the final product. When the graphic size of the initial auxiliary graphics or the distance between the graphics and other graphics do not comply with the preset mask manufacturing rules, a series of target proportional adjustments are required to correct these non-conforming items, so as to obtain a target auxiliary graphics that complies with the rules.

[0102] Specifically, first, the initial auxiliary pattern needs to be comprehensively checked to identify whether its pattern size or the distance between it and other patterns exceeds the range allowed by the preset mask manufacturing rules. Specifically, the initial auxiliary pattern that does not meet the preset mask manufacturing rules can be automatically scanned and marked by setting rule inspection parameters.

[0103] Specific adjustment strategies need to be developed for the identified non-conformities. If the size of the initial auxiliary pattern is too large or too small, it can be adjusted by scaling it proportionally to ensure that it can meet the preset mask manufacturing rules and maintain its relative position relationship with the surrounding patterns at the new size. If the distance between the initial auxiliary pattern and the surrounding patterns is too close or too far, its position needs to be adjusted by translation to meet the preset spacing rules.

[0104] For example, the adjustment of the graphic size is to enlarge or reduce its overall size according to a certain ratio while keeping the shape of the initial auxiliary graphic unchanged. In this process, the adjustment ratio needs to be accurately calculated to ensure that the adjusted graphic size not only meets the manufacturing rules, but also ensures that the shape of the initial auxiliary graphic matches the shape of the target auxiliary graphic as much as possible. For position adjustment, the initial auxiliary graphic can be translated a certain distance along a specific direction to achieve the required spacing requirements.

[0105] In another example, if Figure 5 As shown, there is an initial auxiliary pattern, which is a square with a side length a of 10 microns. According to the preset mask manufacturing rules, the minimum spacing between the initial auxiliary pattern and the adjacent pattern should be 8 microns, but the actual spacing between the initial auxiliary pattern and the adjacent pattern is only 6 microns, so it needs to be adjusted.

[0106] In order to increase the spacing, you can choose to scale the initial auxiliary graphics in proportion. Specifically, you can scale along the center of the initial auxiliary graphics. Assuming that you choose to reduce the size of the initial auxiliary graphics to 0.9 times (i.e. 90%) of the original, that is, scale the side length a to the side length b, since the initial auxiliary graphics are reduced as a whole, the spacing between it and the adjacent graphics will increase accordingly. Of course, in actual operation, it is necessary to accurately calculate the scaling ratio according to the specific layout and manufacturing rules to ensure that the spacing meets the requirements and does not affect other design elements.

[0107] It should be noted that although proportional scaling is a simple and effective adjustment method, it may not be the optimal solution in some cases. For example, if reducing the initial auxiliary graphic will cause it to be too close to the graphic in another direction, or the reduced size cannot meet other design requirements, then other adjustment strategies need to be considered, such as translating the position of the initial auxiliary graphic or adding additional auxiliary graphics.

[0108] After the adjustment is completed, the target auxiliary pattern needs to be verified to ensure that it fully complies with the preset mask manufacturing rules. The rule check is used to confirm whether the parameters such as the pattern size and spacing of the target auxiliary pattern meet the standards. If problems are still found during the verification process, it is necessary to return to the previous step for further optimization and adjustment until the target auxiliary pattern fully meets the requirements.

[0109] Finally, the corrected target auxiliary pattern is applied to the initial layout and the layout design file is updated. This step is the key to ensure that the subsequent manufacturing process can proceed smoothly, because the corrected auxiliary pattern will directly affect the production of the mask and the manufacturing quality of the semiconductor device.

[0110] In these optional embodiments, by proportionally adjusting the graphic size or spacing, the relative proportions of the graphics are maintained and the initial auxiliary graphics are effectively corrected to target auxiliary graphics that comply with preset mask manufacturing rules, thereby ensuring the smooth progress of the semiconductor manufacturing process and the reliability of product quality.

[0111] Optionally, in an embodiment of the present application, the present application first selects the target edge where the auxiliary graphic needs to be placed according to the length, width and distance of the graphic in the initial layout, identifies the area based on the endpoint position of the target edge, and places the auxiliary graphic based on the positional relationship between the specific edge and the graphic in the identified area, and sets the length and width of the auxiliary graphic to be placed at the selected position. The placed auxiliary graphic is corrected according to the requirements of the mask manufacturing rules, and a sub-resolution auxiliary graphic layout in the GDS / OASIS format placed based on the relationship between the layout graphics can be obtained.

[0112] The present application utilizes the graphic size and the positional relationship between the graphics in the initial layout to place sub-resolution auxiliary graphics, quickly and efficiently selects the graphic environment that meets the placement conditions, avoids the cumbersome selection process, improves the placement efficiency, and enhances the ease of use of the placement function; when correcting auxiliary graphics of specific size ratios, the present application can maintain the original ratio for correction while satisfying the mask manufacturing rules, thereby meeting various requirements for the auxiliary graphic correction results.

[0113] Figure 6 A schematic structural diagram of an auxiliary image correction device provided in another embodiment of the present application is shown. For ease of explanation, only the parts related to the embodiment of the present application are shown.

[0114] Reference Figure 6 , the auxiliary graphics correction device may include:

[0115] A determination module 601 is used to determine at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout;

[0116] A construction module 602 is used to construct a recognition area based on a first edge, where the first edge is any one of the at least one target edge;

[0117] An adding module 603 is used to add an initial auxiliary graphic between the main graphic and the first side when there is a main graphic in the recognition area;

[0118] A judging module 604 is used to judge whether the initial auxiliary pattern meets the preset mask manufacturing rules;

[0119] The correction module 605 is used to correct the initial auxiliary pattern according to the preset mask manufacturing rule to obtain the target auxiliary pattern if no.

[0120] In one embodiment, the construction module 602 may include:

[0121] The construction submodule is used to construct the identification area based on the target endpoint of the first side; wherein the target endpoint is any endpoint of the first side.

[0122] In one embodiment, the adding module 603 may include:

[0123] A first acquisition submodule, configured to acquire, when at least part of the main graphic exists in the recognition area, a first target point in a graphic edge of a first graphic that is closest to the target endpoint, the first graphic being a portion of the at least part of the main graphic that is located in the recognition area;

[0124] A first adding submodule is used to add the initial auxiliary graphic on the line connecting the target endpoint and the first target point.

[0125] In one embodiment, the adding module 603 may further include:

[0126] A second acquisition submodule, configured to acquire, when there are at least two main graphics in the recognition area, a second graphic that is closest to the target endpoint among the at least two main graphics;

[0127] A third acquisition submodule, used for acquiring a second target point which is closest to the target endpoint in the portion of the second graphic located in the recognition area;

[0128] The second adding submodule is used to add the initial auxiliary graphic on the line connecting the target endpoint and the second target point.

[0129] In one embodiment, the identification area is a fan-shaped area, wherein the center of the fan-shaped area is the target endpoint.

[0130] In one embodiment, the determination module 601 may include:

[0131] A determination submodule is used to determine, when a graphic attribute of any one of the graphics in the initial layout meets a preset screening rule, a graphic edge among the graphic edges of the graphics that meet the preset screening rule and that matches the preset screening rule as the target edge, wherein the graphic attribute includes at least one of the graphic length, the graphic width, and the distance between the graphic and an adjacent graphic, and the preset screening rule is determined according to the design parameters of the initial layout.

[0132] In one embodiment, the correction module 605 may include:

[0133] A correction submodule is used to adjust the initial auxiliary graphic in proportion to the target according to the preset mask manufacturing rules to obtain the target auxiliary graphic, wherein the shape of the target auxiliary graphic is the same as that of the initial auxiliary graphic, when the graphic size of the initial auxiliary graphic does not conform to the preset mask manufacturing rules, or the distance between the initial auxiliary graphic and any graphic in the initial layout after the initial auxiliary graphic is added does not conform to the preset mask manufacturing rules.

[0134] It should be noted that the information interaction, execution process, etc. between the above-mentioned devices / units are based on the same concept as the method embodiment of the present application, and are devices corresponding to the above-mentioned methods. All implementation methods in the above-mentioned method embodiment are applicable to the embodiments of the device. Its specific functions and technical effects brought about can be found in the method embodiment part, and will not be repeated here.

[0135] The technicians in the relevant field can clearly understand that for the convenience and simplicity of description, only the division of the above-mentioned functional units and modules is used as an example for illustration. In practical applications, the above-mentioned function allocation can be completed by different functional units and modules as needed, that is, the internal structure of the device can be divided into different functional units or modules to complete all or part of the functions described above. The functional units and modules in the embodiment can be integrated in a processing unit, or each unit can exist physically separately, or two or more units can be integrated in one unit. The above-mentioned integrated unit can be implemented in the form of hardware or in the form of software functional units. In addition, the specific names of the functional units and modules are only for the convenience of distinguishing each other, and are not used to limit the scope of protection of this application. The specific working process of the units and modules in the above-mentioned system can refer to the corresponding process in the aforementioned method embodiment, which will not be repeated here.

[0136] Figure 7 A schematic diagram of the hardware structure of an electronic device provided in an embodiment of the present application is shown.

[0137] The device may include a processor 701 and a memory 702 storing program instructions.

[0138] When the processor 701 executes the program, the steps in any of the above method embodiments are implemented.

[0139] Exemplarily, the program may be divided into one or more modules / units, one or more modules / units are stored in the memory 702 and executed by the processor 701 to complete the present application. One or more modules / units may be a series of program instruction segments capable of completing a specific function, and the instruction segments are used to describe the execution process of the program in the device.

[0140] Specifically, the processor 701 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0141] The memory 702 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 702 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive or a combination of two or more of these. In appropriate cases, the memory 702 may include a removable or non-removable (or fixed) medium. In appropriate cases, the memory 702 may be inside or outside the integrated gateway disaster recovery device. In a specific embodiment, the memory 702 is a non-volatile solid-state memory.

[0142] The memory may include read-only memory (ROM), random access memory (RAM), magnetic disk storage media devices, optical storage media devices, flash memory devices, electrical, optical or other physical / tangible memory storage devices. Thus, typically, the memory includes one or more tangible (non-transitory) readable storage media (e.g., memory devices) encoded with software including computer executable instructions, and when the software is executed (e.g., by one or more processors), it is operable to perform the operations described with reference to the method according to an aspect of the present disclosure.

[0143] The processor 701 implements any one of the methods in the above embodiments by reading and executing program instructions stored in the memory 702 .

[0144] In one example, the electronic device may further include a communication interface 703 and a bus 710. The processor 701, the memory 702, and the communication interface 703 are connected via the bus 710 and communicate with each other.

[0145] The communication interface 703 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0146] Bus 710 includes hardware, software or both, and the parts of online data flow billing equipment are coupled to each other. For example, but not limitation, bus may include accelerated graphics port (AGP) or other graphics bus, enhanced industrial standard architecture (EISA) bus, front-end bus (FSB), hypertransport (HT) interconnection, industrial standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations. In appropriate cases, bus 710 may include one or more buses. Although the present application embodiment describes and shows a specific bus, the present application considers any suitable bus or interconnection.

[0147] In addition, in combination with the method in the above embodiment, the embodiment of the present application can provide a storage medium for implementation. The storage medium stores program instructions; when the program instructions are executed by a processor, any one of the methods in the above embodiment is implemented.

[0148] An embodiment of the present application further provides a chip, which includes a processor and a communication interface, wherein the communication interface and the processor are coupled, and the processor is used to run programs or instructions to implement the various processes of the above-mentioned method embodiment, and can achieve the same technical effect. To avoid repetition, it will not be repeated here.

[0149] It should be understood that the chip mentioned in the embodiments of the present application can also be called a system-level chip, a system chip, a chip system or a system-on-chip chip, etc.

[0150] An embodiment of the present application provides a computer program product, which is stored in a storage medium. The program product is executed by at least one processor to implement the various processes of the above-mentioned method embodiment and can achieve the same technical effect. To avoid repetition, it will not be repeated here.

[0151] It should be clear that the present application is not limited to the specific configuration and processing described above and shown in the figures. For the sake of simplicity, a detailed description of the known method is omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present application is not limited to the specific steps described and shown, and those skilled in the art can make various changes, modifications and additions, or change the order between the steps after understanding the spirit of the present application.

[0152] The functional modules shown in the above block diagram can be implemented as hardware, software, firmware or their combination. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), suitable firmware, a plug-in, a function card, etc. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. Programs or code segments can be stored in machine-readable media, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable media" can include any medium that can store or transmit information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. Code segments can be downloaded via computer grids such as the Internet, intranets, etc.

[0153] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or systems based on a series of steps or devices. However, this application is not limited to the order of the above steps, that is, the steps can be performed in the order mentioned in the embodiment, or in a different order from the embodiment, or several steps can be performed simultaneously.

[0154] Aspects of the present disclosure are described above with reference to the flowchart and / or block diagram of the method, device (system) and program product according to the embodiment of the present disclosure. It should be understood that each box in the flowchart and / or block diagram and the combination of each box in the flowchart and / or block diagram can be implemented by computer program instructions. These program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer or other programmable data processing device to produce a machine so that these instructions executed by the processor of the computer or other programmable data processing device enable the implementation of the function / action specified in one or more boxes of the flowchart and / or block diagram. Such a processor can be, but is not limited to, a general-purpose processor, a special-purpose processor, a special application processor or a field programmable logic circuit. It can also be understood that each box in the block diagram and / or flowchart and the combination of boxes in the block diagram and / or flowchart can also be implemented by dedicated hardware that performs a specified function or action, or can be implemented by a combination of dedicated hardware and computer instructions.

[0155] The above are only specific implementation methods of the present application. Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the protection scope of the present application is not limited to this. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in this application, and these modifications or replacements should be included in the protection scope of this application.

Claims

1. An auxiliary graphics correction method, characterized in that: The method comprises: Determining at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout; Taking the first edge as a reference, constructing a recognition area, wherein the first edge is any one of the at least one target edge; When a main graphic exists in the identification area, adding an initial auxiliary graphic between the main graphic and the first side; Determining whether the initial auxiliary pattern complies with a preset mask manufacturing rule; If not, the initial auxiliary pattern is modified according to the preset mask manufacturing rule to obtain a target auxiliary pattern.

2. The method according to claim 1, characterized in that The step of constructing the identification area based on the first side includes: The identification area is constructed based on the target endpoint of the first side; wherein the target endpoint is any endpoint of the first side.

3. The method according to claim 2, characterized in that When a main graphic exists in the identification area, adding an initial auxiliary graphic between the main graphic and the first side includes: When at least part of the main graphic exists in the recognition area, obtaining a first target point in a graphic edge of a first graphic that is closest to the target endpoint, the first graphic being a portion of the at least part of the main graphic that is located in the recognition area; The initial auxiliary graphic is added on a line connecting the target endpoint and the first target point.

4. The method according to claim 2, characterized in that: When a main graphic exists in the identification area, adding an initial auxiliary graphic between the main graphic and the first side also includes: In the case where there are at least two main graphics in the recognition area, obtaining a second graphic of the at least two main graphics that is closest to the target endpoint; Acquire a second target point which is closest to the target endpoint in the portion of the second graphic located in the recognition area; The initial auxiliary graphic is added on a line connecting the target endpoint and the second target point.

5. The method according to claim 2, characterized in that: The identification area is a fan-shaped area, wherein the center of the fan-shaped area is the target endpoint.

6. The method according to claim 1, characterized in that The step of determining at least one target edge in the initial layout according to the graphic attributes of each graphic in the initial layout comprises: When the graphic attribute of any one of the graphics in the initial layout meets the preset screening rule, the graphic edge that matches the preset screening rule among the graphic edges of the graphics that meet the preset screening rule is determined as the target edge, and the graphic attribute includes at least one of the graphic length, the graphic width, and the distance between the graphic and the adjacent graphics. The preset screening rule is determined according to the design parameters of the initial layout.

7. The method according to claim 1, characterized in that If not, the initial auxiliary pattern is modified according to the preset mask manufacturing rule to obtain a target auxiliary pattern, including: When the graphic size of the initial auxiliary graphic does not conform to the preset mask manufacturing rule, or the distance between the initial auxiliary graphic and any graphic in the initial layout after the initial auxiliary graphic is added does not conform to the preset mask manufacturing rule, the initial auxiliary graphic is proportionally adjusted according to the preset mask manufacturing rule to obtain the target auxiliary graphic, and the shape of the target auxiliary graphic is the same as that of the initial auxiliary graphic.

8. An electronic device, characterized in that: The device comprises: a processor and a memory storing computer program instructions; When the processor executes the computer program instructions, the auxiliary graphics correction method as described in any one of claims 1-7 is implemented.

9. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer program instructions, and when the computer program instructions are executed by a processor, the auxiliary graphics correction method according to any one of claims 1 to 7 is implemented.

10. A computer program product, characterized in that When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device executes the auxiliary graphics correction method as described in any one of claims 1-7.

Images