Ultraviolet curing device with nitrogen protection, curing system and curing method

Abstract

The invention relates to an ultraviolet curing device with nitrogen protection, a curing system and a curing method.The ultraviolet curing device mainly comprises a first cavity, a main gas dispersion assembly and a second cavity, the first cavity is located on one side of the main gas dispersion assembly, and the second cavity is located on the other side of the main gas dispersion assembly; a nitrogen inlet is formed in one side of the first cavity, a nitrogen outlet is formed in one side of the second cavity, the main gas dispersion assembly is used for dispersing nitrogen in the first cavity and conveying the nitrogen to the second cavity, an ultraviolet irradiation assembly is further arranged in the second cavity, and the ultraviolet irradiation assembly faces the nitrogen outlet. According to the ultraviolet curing device, the concentration of nitrogen flowing out of the nitrogen outlet is high, and the nitrogen purging atmosphere is stable, so that the curing effect of a product is stable.

Description

Technical Field

[0001] The invention relates to the field of light curing equipment, in particular to an ultraviolet curing device with nitrogen protection, a curing system and a curing method. Background Art

[0002] Photocuring technology is a technology that uses ultraviolet (UV) energy to trigger photoinitiators and then initiate polymerization reactions. This technology is widely used in material bonding, coatings, 3D printing and other fields. The application field of high-purity gases involves technologies that provide high-quality gases, such as nitrogen, which are often used as protective gases in industrial production to prevent the influence of impurities such as moisture and oxygen. The field of material curing technology involves curing methods and technologies for various materials, including thermal curing, photocuring, etc.

[0003] Prior art photocuring solution 1: Nitrogen protection is used in a closed chamber to prevent moisture and oxygen in the air from affecting the photocuring reaction, and the material is coated or film-formed in a nitrogen atmosphere and directly cured. This method can achieve rapid curing and prevent the diffusion and flow of materials, but it usually requires high equipment costs and special equipment to maintain the nitrogen concentration.

[0004] Photocuring solution 2 of the prior art: After the material is coated or film-formed in the air, nitrogen is blown at the edge of the UV lamp to reduce the local oxygen concentration and achieve curing, but the nitrogen gas flow is unstable and a stable nitrogen atmosphere cannot be guaranteed.

[0005] Prior art photocuring solution 3: After coating or film formation of the material in the air, the material is transferred to a closed chamber for UV curing. This method has a long waiting time and high equipment cost.

[0006] The existing technologies in this field have the following problems: The traditional nitrogen protection solution requires a sealed chamber, which not only increases the equipment cost but also increases the complexity of operation. The nitrogen purge solution cannot guarantee a stable protective atmosphere and cannot provide a stable curing effect. Summary of the invention

[0007] Based on this, an ultraviolet curing device is provided. The ultraviolet curing device is conducive to making the nitrogen concentration flowing out of the nitrogen outlet higher and the nitrogen purge atmosphere stable, so that the curing effect of the product is stable, and the device is also conducive to improving the curing efficiency.

[0008] To achieve the above object, the present invention adopts the following technical solutions: An ultraviolet curing device, The invention comprises a first cavity, a main gas dispersion component and a second cavity, wherein the first cavity is located on one side of the main gas dispersion component, and the second cavity is located on the other side of the main gas dispersion component. A nitrogen inlet is provided on one side of the first cavity, and a nitrogen outlet is provided on one side of the second cavity. The main gas dispersion component is used to disperse the nitrogen in the first cavity and transport it to the second cavity. An ultraviolet irradiation component is also provided in the second cavity, and the ultraviolet irradiation component faces the nitrogen outlet.

[0009] In one embodiment, the size of the nitrogen outlet is configured so that the nitrogen flowing out of the nitrogen outlet forms a nitrogen protection zone, and the nitrogen protection zone completely covers the surface to be irradiated of the product to be irradiated.

[0010] In one of the embodiments, a primary gas dispersion component or a primary gas flow equalization component facing the nitrogen inlet is further disposed in the first cavity.

[0011] In one embodiment, the primary gas dispersion component is a baffle, and the baffle faces the nitrogen inlet.

[0012] In one embodiment, the ultraviolet irradiation component is a point light source, a line light source or a surface light source, and the main gas dispersion component is a gas filter element.

[0013] In one of the embodiments, the nitrogen outlet is located below the ultraviolet irradiation component, and the nitrogen outlet is connected to the inclined guide surface.

[0014] In one embodiment, the first cavity is located in a first shell, the nitrogen inlet is arranged in the first shell, the first shell is connected to a main gas dispersion assembly, the second cavity is located in a second shell, the second shell is connected to the main gas dispersion assembly, and the nitrogen outlet is arranged in the second shell.

[0015] In one embodiment, it includes a box body, the main gas dispersion assembly is arranged in the box body, the main gas dispersion assembly divides the inner cavity of the box body into the first cavity and the second cavity, the nitrogen inlet is arranged at one end of the box body, and the nitrogen outlet is arranged at the other end of the box body.

[0016] A UV curing system with nitrogen protection comprises the UV curing device, and also comprises a first moving platform and a second moving platform, wherein the first moving platform is configured to move below a nitrogen outlet so that the nitrogen flowing out of the nitrogen outlet forms a nitrogen protection area at the first moving platform, and the second moving platform is configured to carry a product to be irradiated and to move to contact with the first moving platform, and when the second moving platform contacts with the first moving platform, the second moving platform moves together with the first moving platform so that the first moving platform is away from the nitrogen outlet and the product to be irradiated on the second moving platform moves below the nitrogen outlet.

[0017] A product curing method adopts the ultraviolet curing system with nitrogen protection, wherein the first moving platform is located below the nitrogen outlet, the product to be irradiated is placed on the second moving platform, the second moving platform moves toward the first moving platform and contacts the first moving platform, then the second moving platform and the first moving platform move together, so that the product to be irradiated on the second moving platform moves below the nitrogen outlet and is located inside the nitrogen protection area, and the product is irradiated by the ultraviolet irradiation component in the box.

[0018] The beneficial effects of this application are: 1. The traditional nitrogen protection solution requires a sealed chamber, which not only increases the equipment cost but also increases the complexity of operation. The solution of the present application provides a clean high-purity nitrogen atmosphere to perform curing under the condition of isolating moisture and oxygen, thus avoiding the need for a sealed chamber and reducing equipment cost and operation complexity.

[0019] 2. The existing technology requires a long waiting time, which not only reduces production efficiency but also increases energy consumption. The solution of this application directly puts the product after the glue layer is formed into a nitrogen protection atmosphere for curing, which shortens the waiting time, improves production efficiency, and also saves energy.

[0020] 3. In the prior art, the existence of a closed chamber may cause certain restrictions on the cured material, such as the size and shape of the closed chamber, as well as the size of the outlet and inlet, which may affect the curing effect of large-sized or complex-shaped materials. The solution of the present application directly puts the product after the glue layer is formed into a nitrogen protection atmosphere for curing, thereby avoiding the influence of the closed chamber on the cured material, thereby ensuring the curing effect. Moreover, the solution of the present application is applicable to products of various sizes and shapes.

[0021] 4. A portion of the nitrogen in the present application will cool the ultraviolet irradiation components in the box, that is, the nitrogen can cool the ultraviolet irradiation components and form a protective atmosphere.

[0022] 5. The present application has only one nitrogen outlet, and the structure is very simple, and there is no need to set up special nitrogen nozzles and other structures. The nitrogen protection area formed by the present application is a continuous area, and the product is completely covered. There is no need to adjust the direction of each nitrogen nozzle as in the prior art, and there is no need to coordinate the injection direction and flow rate of multiple nitrogen nozzles, etc. The prior art solutions are very complicated. The internal structure of the box of the present application is very simple, and a nitrogen protection area can be formed under the box through a simple structure.

[0023] 6. The solution of the present application is a modular design solution, which is easy to use in combination, that is, multiple boxes can be used in combination to significantly improve the curing efficiency.

[0024] 7. The solution of the present application is a modular design solution, which can be installed on a multi-axis robot arm and can be moved between different workstations. It is flexible and convenient to use.

[0025] 8. The present application uses two mobile platforms. The first mobile platform is located below the nitrogen outlet and can form a nitrogen protection area in advance. After the second mobile platform moves with the first mobile platform and is located below the nitrogen outlet, the nitrogen protection area will not be destroyed, and the product to be irradiated can directly enter the nitrogen protection area. At this time, since the oxygen content in the nitrogen protection area is very low, the product can be directly cured, which can effectively improve production efficiency. Moreover, for some adhesive layers with very good fluidity, if a long-distance conveyor line is used to convey the product, since the horizontality of the conveyor line is difficult to ensure consistency everywhere, the adhesive layer on the product will flow during the conveying process, which will affect the product quality. The present application uses two mobile platforms. Since the mobile platforms are relatively short and can ensure consistent horizontality, the adhesive layer on the product is not easy to flow during the conveying process of the product, which effectively ensures the excellent quality of the cured product. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 The ultraviolet curing device according to an embodiment of the present application includes a first shell, a main gas dispersion assembly and a second shell.

[0027] Figure 2 This is a schematic diagram of a first movable platform and a second movable platform being arranged below the ultraviolet curing device of an embodiment of the present application.

[0028] Figure 3 This is a schematic diagram of an ultraviolet curing device according to an embodiment of the present application, including a box body, in which a main gas dispersion component is arranged.

[0029] Figure 4 This is a schematic diagram of an ultraviolet curing device according to an embodiment of the present application, including a box body, in which a baffle is arranged.

[0030] Figure 5 Schematic diagram of various detection positions of the nitrogen concentration test experiment of the embodiment of the present application.

[0031] Figure 6 This is a structural diagram of a nitrogen concentration test experiment according to an embodiment of the present application.

[0032] in: 110, housing; 111, nitrogen inlet; 112, nitrogen outlet; 120, main gas dispersion assembly; 130, ultraviolet irradiation assembly; 140, product; 150, carrier; 160, baffle, 170, primary gas dispersion assembly; 181, first cavity; 182, second cavity; 191, first mobile platform; 192, second mobile platform, 201, first shell; 202, second shell, 210, guide surface. DETAILED DESCRIPTION

[0033] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0034] like Figure 1 and Figure 2 As shown, the arrows in the figure represent nitrogen gas flow. An embodiment of the present application provides an ultraviolet curing device, which includes a first cavity 181, a main gas dispersion component 120 and a second cavity 182. The first cavity 181 is located on one side of the main gas dispersion component 120, and the second cavity 182 is located on the other side of the main gas dispersion component 120. A nitrogen inlet 111 is provided on one side of the first cavity 181, and a nitrogen outlet 112 is provided on one side of the second cavity 182. The main gas dispersion component is used to disperse the nitrogen in the first cavity 181 and transport it to the second cavity 182. An ultraviolet irradiation component 130 is also provided in the second cavity 182, and the ultraviolet irradiation component 130 faces the nitrogen outlet.

[0035] Specifically, nitrogen enters the first cavity 181 from the nitrogen inlet 111, and after being dispersed in the first cavity 181, the nitrogen enters the main gas dispersion component 120 below. The nitrogen gas flow can be further dispersed by the main gas dispersion component 120 to form a uniform nitrogen gas flow flowing downward. Then, the nitrogen enters the second cavity 182, and finally flows out from the nitrogen outlet 112 to the area below, and the area below the nitrogen outlet 112 forms a nitrogen protection area. It can be understood that by continuously introducing nitrogen gas flow into the first cavity 181, a high-concentration nitrogen protection area flowing downward can be formed below. When the product 140 to be cured moves to the bottom of the nitrogen outlet 112 and is located in the nitrogen protection area, the product 140 is located in a high-concentration nitrogen protection atmosphere, and the oxygen content in the nitrogen protection atmosphere is extremely low. The product 140 is irradiated by the ultraviolet irradiation component 130, and the adhesive layer on the product 140 is cured.

[0036] It can be proved through experiments that the nitrogen concentration in the nitrogen protection area of ​​the present application can reach 99.999%. Correspondingly, it can be proved that the oxygen content in the nitrogen protection area is extremely low.

[0037] On the basis of the above, one embodiment is: the first cavity 181 is located in the first shell 201, the nitrogen inlet 111 is arranged at the upper end of the first shell 201, the lower end of the first shell 201 is connected to the main gas dispersion assembly 120, the second cavity 182 is located in the second shell 202, the upper end of the second shell 202 is connected to the main gas dispersion assembly 120, and the nitrogen outlet 112 is arranged in the second shell 202.

[0038] Specifically, the first shell 201, the main gas dispersion assembly 120 and the second shell 202 are connected in sequence from top to bottom to form a whole. The nitrogen inlet 111 can be one or more. The nitrogen inlet 111 is arranged at the top of the first shell 201, and the nitrogen inlet 111 is used to be connected to an external pipeline. The external pipeline can be connected to the nitrogen supply assembly.

[0039] Specifically, the nitrogen supply assembly may include a nitrogen tank, an air pump, a control valve, a pipeline and an interface assembly, etc. The nitrogen supply assembly is used to continuously introduce nitrogen gas into the first cavity 181 , so that a high-concentration nitrogen area flowing downward can be formed below the nitrogen outlet 112 .

[0040] Based on the above, another implementation method is as follows: Figure 3 and Figure 4As shown, the ultraviolet curing device includes a box 110, a nitrogen inlet 111 is provided at one end of the box 110, a nitrogen outlet 112 is provided at the other end of the box 110, a main gas dispersion component 120 is provided in the box 110, the main gas dispersion component 120 separates the inner cavity of the box 110 into a first cavity 181 and a second cavity 182, the main gas dispersion component 120 is used to disperse the nitrogen in the first cavity 181 and form a uniform downward nitrogen flow, the first cavity 181 is connected to the nitrogen inlet 111, the second cavity 182 is connected to the nitrogen outlet 112, and an ultraviolet irradiation component 130 is further provided in the second cavity 182. The ultraviolet irradiation component 130 faces the nitrogen outlet 112.

[0041] Specifically, the nitrogen inlet 111 may be one or more. The nitrogen inlet 111 is disposed at the top of the housing 110, and is used to be connected to an external pipeline. The main gas dispersion assembly 120 is fixed inside the housing 110, and the space inside the housing 110 is separated into a first cavity 181 and a second cavity 182 by the main gas dispersion assembly 120, and the first cavity 181 is located above the second cavity 182. The nitrogen in the first cavity 181 needs to pass through the main gas dispersion assembly 120 before entering the second cavity 182. The ultraviolet irradiation assembly 130 is fixed inside the housing 110.

[0042] It should be noted that the ultraviolet irradiation assembly 130 is used to irradiate ultraviolet rays to the product 140 to solidify the adhesive layer on the product 140. The ultraviolet irradiation assembly 130 is located below the main gas dispersion assembly 120. After the nitrogen gas flow encounters the ultraviolet irradiation assembly 130, it will bypass and continue to flow downward. The nitrogen gas flow can take away the heat of the ultraviolet irradiation assembly 130.

[0043] In this embodiment, one implementation method is that the size of the nitrogen outlet 112 is configured so that the nitrogen flowing out of the nitrogen outlet 112 covers the surface to be irradiated of the product 140 and can also cover the outer area of ​​the product 140, that is, the product is completely covered in the nitrogen protection area. In this way, the entire product 140 is located in the nitrogen protection atmosphere. This is conducive to ensuring a good curing effect.

[0044] It is understandable that there is a nitrogen protection area below the nitrogen outlet 112 of the present application, and as long as the size of the product 140 can be located in the area, the product 140 can be protected by nitrogen during curing. Therefore, the device of the present application can be applicable to products 140 of various sizes.

[0045] In this embodiment, one implementation method is that a primary gas dispersion component 170 or a primary gas flow equalization component facing the nitrogen inlet 111 is further disposed in the first cavity 181 .

[0046] Specifically, in the above embodiment, by providing a primary gas dispersion component 170 or a primary gas flow equalization component in the first cavity 181, it is beneficial to preliminarily disperse the gas in the first cavity 181, so that after the nitrogen is dispersed by the main gas dispersion component 120, a dispersed and uniform airflow can be formed. The above primary gas dispersion component 170 or primary gas flow equalization component can apply an existing gas dispersion component or gas flow equalization component. If there are multiple nitrogen inlets 111, a primary gas dispersion component 170 or a primary gas flow equalization component is provided at each nitrogen inlet 111.

[0047] In this embodiment, in one implementation, the primary gas dispersion component 170 is a baffle 160 , and the baffle 160 faces the nitrogen inlet 111 .

[0048] Specifically, after the nitrogen enters the first cavity 181 from the nitrogen inlet 111 of the box 110, the nitrogen flow will hit the baffle 160. After hitting the baffle 160, the nitrogen flow will disperse to the surroundings, thus achieving the purpose of preliminary dispersion of the nitrogen.

[0049] In this embodiment, one implementation method is that the ultraviolet irradiation component 130 is a point light source, a line light source or a surface light source.

[0050] For example, the ultraviolet irradiation component 130 may be a UV-LED lamp, a UV lamp tube, or an array of multiple UV lamp beads.

[0051] In this embodiment, one implementation is that the main gas dispersion component 120 is a gas filter element. Here, an existing high-precision gas filter element can be used as the main gas dispersion component 120.

[0052] In this embodiment, one implementation is that the nitrogen outlet 112 is located below the ultraviolet irradiation assembly 130, and the nitrogen outlet 112 is connected to the inclined guide surface 210. For example, a downwardly inclined guide surface 210 is provided at the lower end of the second housing 202 or the lower end of the box 110. Such a guide surface 210 is conducive to quickly discharging oxygen from the area below the ultraviolet irradiation assembly 130, so as to improve the overall curing efficiency.

[0053] In this embodiment, one implementation method is that the number of ultraviolet curing devices of the present application is multiple, and the multiple ultraviolet curing devices are arranged in an array. In this way, by moving the multiple ultraviolet curing devices arranged in an array to the top of the multiple products 140 arranged in an array, the multiple products 140 can be cured at the same time to improve the curing efficiency.

[0054] In this embodiment, one of the implementations is that the number of ultraviolet curing devices of the present application is multiple, and a connector is provided between two adjacent ultraviolet curing devices. In this way, multiple ultraviolet curing devices can be arranged in any shape. If there are multiple areas on the product 140 that need to be cured, and the irradiation range of a single ultraviolet curing device cannot meet the requirements of covering all areas on the product, the ultraviolet curing devices can be formed into an integrated structure through a connector, and multiple ultraviolet curing devices correspond to multiple areas on the products that need to be cured one by one. In this way, multiple areas on the product can be cured simultaneously in the above manner to improve the curing efficiency.

[0055] This application has done a nitrogen concentration test experiment, such as Figure 5 As shown, the distance between the nitrogen outlet and the platform below is 5 mm. The detection area on the platform is an area of ​​290 mm long and 130 mm wide. Multiple detection positions are arranged in an array within the area. In the width direction, the distance between two adjacent detection positions is 50 mm, and in the length direction, the distance between two adjacent detection positions is 80 mm. A nitrogen concentration detection instrument is set at each detection position, and the detection results are shown in Figure 6 As shown. Through testing, it is found that the device of the present application can form a high-concentration nitrogen protection area within 17 to 23 seconds. Moreover, through a large number of experiments, it is found that a high-concentration nitrogen protection area can be quickly formed within a range of 10 mm below the nitrogen outlet of the ultraviolet curing device of the present application.

[0056] An embodiment of the present application provides a UV curing system with nitrogen protection, including the UV curing device with nitrogen protection and a product conveying line, wherein the product conveying line is located below the UV curing device of the present application, and the nitrogen outlet 112 of the UV curing device faces the product conveying line.

[0057] Specifically, the product conveying line in the above system is used to convey the product 140. The product 140 is placed on the carrier 150, and the carrier 150 is placed on the product conveying line. The product 140 can be conveyed to the bottom of the nitrogen outlet 112 of the above ultraviolet curing device through the conveying line.

[0058] It should be noted that nitrogen is first charged into the UV curing device a certain time before the product 140 enters the lower part of the nitrogen outlet, thereby forming a nitrogen protection area below the nitrogen outlet, and then the product 140 enters the nitrogen protection area driven by the product conveyor line, and then the product 140 is cured.

[0059] Based on the above, in one embodiment, the ultraviolet curing device is installed on a moving mechanism, and the moving mechanism is used to adjust the relative position of the ultraviolet curing device to the product conveying line or to move the ultraviolet curing device between different product conveying lines.

[0060] Specifically, the ultraviolet curing device of the present application can be installed on a moving mechanism, such as a three-dimensional moving mechanism or a mechanical arm. The height of the ultraviolet curing device, the left and right distance relative to the product conveying line, etc. can be adjusted by the moving mechanism. Moreover, the ultraviolet curing device of the present application can be moved between multiple product conveying lines. For example, after the products 140 on the first product conveying line are cured, the ultraviolet curing device can be moved to the second product conveying line by the moving mechanism, and then the products 140 on the second product conveying line are cured.

[0061] Furthermore, if the product 140 is not convenient to move, the ultraviolet curing device of the present application can be moved by a moving mechanism so that the ultraviolet curing device is located above different products 140, thereby curing multiple products 140.

[0062] The embodiment of the present application provides a UV curing system with nitrogen protection, such as Figure 2 As shown, it includes the ultraviolet curing device as described above, and also includes a first movable platform 191 and a second movable platform 192. The heights of the first movable platform 191 and the second movable platform 192 are substantially the same, and the distance between the platform and the nitrogen outlet is within 10 mm. The first movable platform 191 is configured to move to below the nitrogen outlet 112 so that the nitrogen flowing out of the nitrogen outlet forms a nitrogen protection area at the first movable platform 191. The second movable platform 192 is configured to carry the product to be irradiated and to move to contact with the first movable platform 191. When the second movable platform 192 contacts with the first movable platform 191, the second movable platform 192 moves together with the first movable platform 191, so that the first movable platform 191 is away from the nitrogen outlet and the product to be irradiated on the second movable platform 192 moves to below the nitrogen outlet 112.

[0063] The embodiment of the present application provides a product curing method, using the ultraviolet curing system with nitrogen protection, first, the first mobile platform 191 is located below the nitrogen outlet 112 of the ultraviolet curing device, nitrogen is filled into the ultraviolet curing device, so that a nitrogen protection area is formed between the nitrogen outlet and the first mobile platform 191, the product to be irradiated is placed on the second mobile platform 192, the second mobile platform 192 moves toward the first mobile platform 191 and contacts the first mobile platform 191, then, the second mobile platform 192 and the first mobile platform 191 move together, so that the product to be irradiated on the second mobile platform 192 moves to below the nitrogen outlet 112 and is located inside the nitrogen protection area, and the product is irradiated by the ultraviolet irradiation component 130 in the box. After the irradiation is completed, the first mobile platform 191 moves together with the second mobile platform 192, and the first mobile platform 191 is again located below the nitrogen outlet 112 of the ultraviolet curing device, so that the above-mentioned nitrogen protection area will not be damaged.

[0064] In the above method, the product 140 after the glue layer is formed is directly placed in a nitrogen protection atmosphere for curing, which shortens the waiting time, improves production efficiency, and also saves energy.

[0065] It can be seen from the above description that the solution of this application has the following advantages: 1. The solution of the present application provides a clean high-purity nitrogen atmosphere, so that the product 140 can be cured under the condition of isolating moisture and oxygen. After the glue layer is formed, the product 140 directly enters the nitrogen protective atmosphere for curing. This solution can not only ensure the curing effect, but also shorten the waiting time, improve production efficiency, and reduce energy consumption. Compared with the existing technology, this technical solution is simpler in operation and the equipment cost is relatively low.

[0066] 2. During the curing process, the solution of the present application does not need to maintain a high nitrogen concentration in the closed chamber as in the prior art, which not only reduces the complexity of the equipment, but also avoids some restrictions that the closed chamber may cause to the cured material, such as the impact on size and shape. Therefore, the solution of the present application is more flexible in application and suitable for a wider range of scenarios.

[0067] 3. This technical solution can more effectively isolate the influence of moisture and oxygen on the photocuring reaction by providing a high-purity nitrogen atmosphere, thereby improving the curing effect. Compared with the prior art, the solution of this application can achieve better curing effect in a shorter time, which is of great significance for improving production quality and efficiency.

[0068] The above-mentioned embodiments only express several implementation methods of the present invention, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A UV curing device, characterized in that: The invention comprises a first cavity, a main gas dispersion component and a second cavity, wherein the first cavity is located on one side of the main gas dispersion component, and the second cavity is located on the other side of the main gas dispersion component. A nitrogen inlet is provided on one side of the first cavity, and a nitrogen outlet is provided on one side of the second cavity. The main gas dispersion component is used to disperse the nitrogen in the first cavity and transport it to the second cavity. An ultraviolet irradiation component is also provided in the second cavity, and the ultraviolet irradiation component faces the nitrogen outlet.

2. The ultraviolet curing device according to claim 1, characterized in that: The size of the nitrogen outlet is configured so that the nitrogen flowing out of the nitrogen outlet forms a nitrogen protection zone, and the nitrogen protection zone completely covers the to-be-irradiated surface of the to-be-irradiated product.

3. The ultraviolet curing device according to claim 1, characterized in that: The first cavity is also provided with a primary gas dispersion component or a primary gas flow equalization component facing the nitrogen inlet.

4. The ultraviolet curing device according to claim 3, characterized in that: The primary gas dispersion component is a baffle, and the baffle faces the nitrogen inlet.

5. The ultraviolet curing device according to claim 1, characterized in that: The ultraviolet irradiation component is a point light source, a line light source or a surface light source, and the main gas dispersion component is a gas filter element.

6. The ultraviolet curing device according to claim 1, characterized in that: The nitrogen outlet is located below the ultraviolet irradiation component, and the nitrogen outlet is connected to the inclined guide surface.

7. The ultraviolet curing device according to claim 1, characterized in that: The first cavity is located in a first shell, the nitrogen inlet is arranged in the first shell, the first shell is connected to a main gas dispersion assembly, the second cavity is located in a second shell, the second shell is connected to a main gas dispersion assembly, and the nitrogen outlet is arranged in the second shell.

8. The ultraviolet curing device according to claim 1, characterized in that: It comprises a box body, the main gas dispersion assembly is arranged in the box body, the main gas dispersion assembly divides the inner cavity of the box body into the first cavity and the second cavity, the nitrogen inlet is arranged at one end of the box body, and the nitrogen outlet is arranged at the other end of the box body.

9. A UV curing system with nitrogen protection, characterized in that: The ultraviolet curing device comprises the ultraviolet curing device according to any one of claims 1 to 8, and further comprises a first movable platform and a second movable platform, wherein the first movable platform is configured to move to below the nitrogen outlet so that the nitrogen flowing out of the nitrogen outlet forms a nitrogen protection area at the first movable platform, and the second movable platform is configured to carry the product to be irradiated and to move to contact with the first movable platform, and when the second movable platform contacts with the first movable platform, the second movable platform moves together with the first movable platform, so that the first movable platform is away from the nitrogen outlet and the product to be irradiated on the second movable platform moves to below the nitrogen outlet.

10. A product curing method, characterized in that: Using the ultraviolet curing system with nitrogen protection as described in claim 9, the first movable platform is located below the nitrogen outlet, the product to be irradiated is placed on the second movable platform, the second movable platform moves toward the first movable platform and contacts the first movable platform, then the second movable platform and the first movable platform move together, so that the product to be irradiated on the second movable platform moves below the nitrogen outlet and is located inside the nitrogen protection area, and the product is irradiated by the ultraviolet irradiation component in the box.

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