Exposure head assembly of exposure machine

Abstract

The invention discloses an exposure head assembly of an exposure machine, which is characterized in that a photoetching frame is slidably mounted on an exposure mounting platform, an exposure head is vertically adjustably mounted on the photoetching frame, an adjusting bottom plate is fixedly mounted on the photoetching frame, an X sliding seat is slidably mounted on the adjusting bottom plate along the X direction, and the X sliding seat is driven to slide by an X driving device; a Y sliding seat is installed on the X sliding seat in the Y direction in an extending and sliding mode, a connecting frame is installed on the Y sliding seat, the Y sliding seat is driven by a Y driving device to slide, a Z sliding seat is installed on the connecting frame in the Z direction in an extending and sliding mode, the Z sliding seat is driven by a Z driving device to slide, an alignment camera and a lighting structure which slide along with the Z sliding seat are installed on the Z sliding seat, and a vertical adjusting device is arranged on the Y sliding seat. The photoetching frame is driven by a linear power device to slide; according to the assembly, the exposure head can be adjusted to vertically align to a wafer, the position of the alignment camera can be changed, the shooting range is expanded, the alignment camera can vertically shoot accurately, and the exposure accuracy is improved.

Description

Technical Field

[0001] The invention relates to the technical field of exposure heads of exposure machines, and in particular to an exposure head assembly of an exposure machine. Background Art

[0002] In the field of exposure machines, before alignment movement, it is necessary not only to capture the marks on the mask plate, but also to capture the wafer marks blocked by the mask plate through the mask plate. Whether a clear and accurate image can be captured has a great impact on whether the subsequent alignment can be completed and whether the expected alignment accuracy can be achieved, ensuring the accuracy of lithography. In actual production, different process treatments often lead to inconsistent imaging effects of the wafer in the image system, resulting in automatic alignment failing to find the marks on the wafer or misjudgment. Traditional equipment only uses a single light source to capture images during alignment, which has great limitations. When encountering the situation where the wafer surface is coated with glass powder or there are acid spots on the surface, it will seriously affect the automatic alignment. At the same time, when the exposure head is exposing, it is also necessary to align the wafer on the wafer turntable, and the exposure head can generally only move in a straight line and cannot be adjusted horizontally to accurately expose the wafer vertically.

[0003] Patent No. 202210460940.3 discloses a lighting system suitable for a near-contact automatic exposure machine. The system fixes a CCD camera through an L-shaped connecting plate, and then a coaxial lighting lamp and a ring lighting lamp are installed below to assist the camera in taking pictures. The ring lighting lamp can be adjusted in height, but because the CCD camera is fixedly installed and cannot be moved, the shooting range cannot be adjusted, and the flexibility is poor. In addition, the CCD camera cannot be adjusted horizontally on the L-shaped connecting plate, and it cannot be ensured that the camera is always perpendicular to the wafer for each inspection. Summary of the invention

[0004] The technical problem to be solved by the present invention is: an exposure head assembly of an exposure machine, which can adjust the exposure head to vertically align with the wafer, and at the same time can change the position of the alignment camera to expand the shooting range, so that the alignment camera can shoot vertically accurately and improve the accuracy of exposure.

[0005] To solve the above technical problems, the technical solution of the present invention is: an exposure head assembly of an exposure machine, comprising an exposure mounting platform, a photolithography frame is slidably mounted on the exposure mounting platform, an exposure head is vertically adjusted and mounted on the photolithography frame through an exposure adjustment device, an adjustment base plate is fixedly mounted on the photolithography frame, an X slide is slidably mounted on the adjustment base plate along the X direction, the X slide is driven to slide by an X drive device, a Y slide is slidably mounted on the X slide along the Y direction, a connecting frame is mounted on the Y slide, the Y slide is driven to slide by the Y drive device, a Z slide is slidably mounted along the Z direction on the connecting frame, the Z slide is driven to slide by the Z drive device, an alignment camera and an illumination structure that follow the Z slide are mounted on the Z slide, and a vertical adjustment device that adjusts the alignment camera and the illumination structure to face vertically downward is provided on the Y slide; the photolithography frame is driven to slide by a linear power device.

[0006] As a preferred solution, the exposure head is connected to an exposure support frame, and the exposure adjustment device includes an exposure adjustment seat, which is evenly arranged at three corners of the exposure support frame. The exposure adjustment seat is installed on the photolithography frame for lifting and lowering adjustment, and the exposure adjustment seat is fixedly connected to the exposure support frame.

[0007] As a preferred solution, a threaded shaft is connected below the exposure adjustment seat, an adjustment dial is threadedly mounted on the threaded shaft, the adjustment dial is rotatably mounted on the photolithography frame, and an adjustment slot is provided on the adjustment dial for rotating in cooperation with the adjustment tool.

[0008] As a preferred solution, the Z slide includes a Z slide rail and a Z slider, the Z slide rail is fixedly mounted on a connecting frame, an upper Z slider and a lower Z slider are respectively mounted on the Z slide rail, an upper connecting plate connected to an alignment camera is mounted on the upper Z slider, and a lower connecting plate connected to an illumination structure is mounted on the lower Z slider, the Z drive device includes a Z drive handle respectively mounted on the upper Z slider and the lower Z slider, and the upper Z slider and the lower Z slider slide back and forth on the Z slide rail via a transmission mechanism driven by the Z drive handle.

[0009] As a preferred solution, an auxiliary sliding seat that slides mutually is provided between the upper connecting plate and the lower connecting plate.

[0010] As a preferred solution, the vertical adjustment device includes an X-direction manual angle table and a Y-direction manual angle table which are stacked and installed on a Y slide.

[0011] As a preferred solution, the Y slide seat includes a Y slide rail and a Y slider, a plurality of Y sliders are slidably mounted on the Y slide rail, corresponding X manual angle table and Y manual angle table are mounted on the Y slider, the connecting frame is fixedly mounted on the X manual angle table or the Y manual angle table, and the Y drive device is the same as the Z drive device.

[0012] As a preferred solution, the X slide seat includes an X lead screw rotatably mounted on the adjustment base plate and extending along the X direction, an X slider is slidably mounted on the X lead screw, the X lead screw and the X slider form a lead screw nut structure, the X drive device is an X drive handle that manually drives the X lead screw to rotate, an X support plate is fixedly mounted on the X slider, and the Y slide rail is fixedly mounted on the X support plate.

[0013] As a preferred solution, the adjusting base plate is also provided with an X guide column for assisting the sliding of the X slider.

[0014] As a preferred solution, the Y slider, the upper Z slider and the lower Z slider are all provided with proximity switches.

[0015] After adopting the above technical scheme, the effect of the present invention is as follows: since the exposure head assembly of the exposure machine includes an exposure mounting platform, a photolithography frame is slidably mounted on the exposure mounting platform, an exposure head is vertically adjusted and mounted on the photolithography frame through an exposure adjustment device, an adjustment base plate is fixedly mounted on the photolithography frame, an X slide is slidably mounted on the adjustment base plate along the X direction, the X slide is driven to slide by an X driving device, a Y slide is slidably mounted on the X slide along the Y direction, a connecting frame is mounted on the Y slide, the Y slide is driven to slide by the Y driving device, a Z slide is slidably mounted along the Z direction on the connecting frame, the Z slide is driven to slide by the Z driving device, an alignment camera and an illumination structure that follow the Z slide to slide are mounted on the Z slide, and a vertical adjustment camera and an illumination structure that adjust the alignment camera and the illumination structure are vertically downward on the Y slide The photolithography frame is driven to slide by a linear power device; first, the position of the X slide in the X direction is adjusted by the X drive device, and then the position of the Y slide in the Y direction is driven and adjusted by the Y drive device, and then the position of the Z slide in the Z direction is adjusted by the Z drive device, so that the alignment camera and the lighting structure can be moved to the accurate shooting position, and then the shooting angle of the alignment camera and the lighting structure is adjusted by the vertical adjustment device to ensure that the wafer is shot vertically and the accurate exposure position is effectively obtained, and then the linear power device drives the photolithography frame to slide above the wafer turntable, and the exposure adjustment device can help the exposure head to complete the vertical orientation to ensure that the exposure head is consistent with the wafer mark; the component can adjust the exposure head to align vertically with the wafer, and at the same time can change the position of the alignment camera, expand the shooting range, make the alignment camera shoot accurately vertically, and improve the accuracy of exposure.

[0016] Since the exposure head is connected to an exposure support frame, the exposure adjustment device includes an exposure adjustment seat, which is evenly arranged at three corners of the exposure support frame. The exposure adjustment seat is installed on the photolithography frame for lifting and adjusting, and the exposure adjustment seat is fixedly connected to the exposure support frame. By lifting and adjusting the exposure adjustment seat, the exposure support frame can be adjusted horizontally, thereby changing the vertical orientation of the exposure head, thereby improving the flexibility of the exposure head and ensuring accurate exposure.

[0017] Furthermore, since a threaded shaft is connected to the bottom of the exposure adjustment seat, an adjustment dial is installed on the threaded shaft in a threaded manner, the adjustment dial is rotatably installed on the photolithography frame, and an adjustment slot that rotates in cooperation with an adjustment tool is provided on the adjustment dial; the exposure adjustment seat is raised and lowered by rotating the adjustment dial through the adjustment tool, the structure is simple, the operation is convenient, the threaded cooperation can form self-locking, and the adjustment is stable and reliable.

[0018] Furthermore, since the Z slide seat includes a Z slide rail and a Z slider, the Z slide rail is fixedly mounted on the connecting frame, an upper Z slider and a lower Z slider are respectively mounted on the Z slide rail, an upper connecting plate connected to the alignment camera is mounted on the upper Z slider, and a lower connecting plate connected to the lighting structure is mounted on the lower Z slider, the Z driving device includes a Z driving handle respectively mounted on the upper Z slider and the lower Z slider, and the upper Z slider and the lower Z slider drive the transmission mechanism to slide back and forth on the Z slide rail through the Z driving handle; driving the upper Z slider and the lower Z slider separately can drive the alignment camera and the lighting structure to adjust respectively to adapt to different shooting and lighting ranges.

[0019] Furthermore, since an auxiliary sliding seat that slides mutually is provided between the upper connecting plate and the lower connecting plate, when the upper Z sliding block and the lower Z sliding block slide respectively, they can restrain each other and do not affect the sliding, thereby improving the sliding accuracy.

[0020] Furthermore, since the vertical adjustment device includes an X-direction manual angle table and a Y-direction manual angle table stacked and mounted on the Y slide, it is convenient to adjust the shooting angle of the alignment camera and the lighting structure installed on the upper connecting plate and the lower connecting plate as a whole, ensuring that the vertical wafer turntable is photographed and the alignment is accurate and reliable.

[0021] Furthermore, since the Y slide seat includes a Y slide rail and a Y slider, a plurality of Y sliders are slidably mounted on the Y slide rail, corresponding X manual angle tables and Y manual angle tables are mounted on the Y sliders, the connecting frame is fixedly mounted on the X manual angle table or the Y manual angle table, and the Y driving device is the same as the Z driving device; corresponding alignment cameras and lighting mechanisms are mounted on the plurality of Y sliders, thereby expanding the shooting range and improving the use effect.

[0022] Furthermore, since the X slide seat includes an X lead screw rotatably mounted on the adjustment base plate and extending along the X direction, an X slider is slidably mounted on the X lead screw, the X lead screw and the X slider form a lead screw nut structure, the X drive device is an X drive handle that manually drives the X lead screw to rotate, an X support plate is fixedly mounted on the X slider, and the Y slide rail is fixedly mounted on the X support plate; adjusting the sliding of the X slider is simple and reliable, thereby improving practicality.

[0023] In addition, since the adjusting bottom plate is also provided with an X guide column for assisting the sliding of the X slider, it is ensured that the X slider can slide stably along the X direction.

[0024] Furthermore, since the Y slider, the upper Z slider and the lower Z slider are all provided with proximity switches, the moving range is limited, so that the sliders can move accurately without affecting each other's use. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The present invention is further described below in conjunction with the accompanying drawings and embodiments.

[0026] Figure 1 is a stereogram of an embodiment of the present invention;

[0027] Figure 2 is a structural schematic diagram of a photolithography frame installation and adjustment device according to an embodiment of the present invention;

[0028] Figure 3 It is a schematic diagram of the structure of the X slide, the Y slide and the Z slide in an embodiment of the present invention;

[0029] Figure 4 It is a schematic diagram of the structure of the X slide and the Y slide in an embodiment of the present invention;

[0030] Figure 5 It is a schematic diagram of the structure of the Z slide seat of an embodiment of the present invention;

[0031] Figure 6 is a side view of the Z slide of an embodiment of the present invention;

[0032] Figure 7 yes Figure 1 A partial enlarged view of point A;

[0033] In the attached drawings: 1. exposure mounting platform; 2. linear motor; 3. linear slide; 4. exposure support frame; 5. exposure adjustment seat; 6. threaded shaft; 7. adjustment turntable; 8. adjustment slot; 9. photolithography frame; 10. adjustment base plate; 11. alignment camera; 12. lighting structure; 13. Z slide rail; 14. connecting frame; 15. upper Z slider; 16. lower Z slider; 17. upper connecting plate; 18. lower connecting plate; 19. Z drive handle; 20. auxiliary guide rail; 21. auxiliary slider; 22. X manual angle table; 23. Y manual angle table; 24. Y slide rail; 25. Y slider; 26. Y drive handle; 27. X lead screw; 28. X slider; 29. ​​X drive handle; 30. X support plate; 31. X guide column; 32. proximity switch. DETAILED DESCRIPTION

[0034] The present invention is further described in detail below through specific examples.

[0035] like Figures 1 to 7 As shown, an exposure head assembly of an exposure machine comprises an exposure mounting platform 1, on which a photolithography frame 9 is slidably mounted, on which an exposure head is vertically adjusted by an exposure adjustment device, on which an adjustment base plate 10 is fixedly mounted, on which an X slide is slidably mounted along the X direction, the X slide is driven to slide by an X driving device, on which a Y slide is slidably mounted along the Y direction, on which a connecting frame 14 is mounted, the Y slide is driven to slide by the Y driving device, on which a Z slide is slidably mounted along the Z direction, the Z slide is driven to slide by the Z driving device, on which a registration camera 11 and an illumination structure 12 which slide along with the Z slide are mounted, and on which a vertical adjustment device for adjusting the registration camera 11 and the illumination structure 12 to be vertically downward is arranged; the photolithography frame 9 is driven to slide by a linear power device.

[0036] In this embodiment, the linear power device drives the photolithography frame 9 to slide and move the exposure head, so that the position of the exposure and alignment camera 11 can be switched, ensuring that the alignment camera 11 is first accurately positioned, so that the exposure is accurate. The linear power device includes a linear motor 2. The photolithography frame 9 is slidably mounted on the exposure mounting platform 1 through a linear slide 3. The linear motor 2 is fixedly mounted on the exposure mounting platform 1. The linear motor 2 drives the photolithography frame 9 to complete a linear movement in the X direction along the linear slide 3, and linear slides 3 are provided on both sides of the photolithography frame 9 to ensure the stability of sliding.

[0037] like Figure 2 and Figure 7As shown, the exposure head is connected to an exposure support frame 4, and the exposure adjustment device includes an exposure adjustment seat 5. The exposure adjustment seat 5 is evenly arranged at three corners of the exposure support frame 4, and the exposure adjustment seat 5 is installed on the photolithography frame 9 for lifting and lowering adjustment. The exposure adjustment seat 5 is fixedly connected to the exposure support frame 4; the exposure support frame 4 surrounds the exposure head, and then the exposure support frame 4 is supported by the exposure adjustment seat 5 so as to rise and fall with the exposure adjustment seat 5, thereby changing the vertical orientation of the exposure head, improving the flexibility of the exposure head, and ensuring accurate exposure.

[0038] Furthermore, a threaded shaft 6 is connected to the bottom of the exposure adjustment seat 5, and an adjusting dial 7 is installed on the threaded shaft 6 in a matching thread. The adjusting dial 7 is rotatably installed on the photolithography frame 9, and an adjusting slot 8 is provided on the adjusting dial 7 for rotating in cooperation with the adjusting tool. The exposure adjustment seat 5 is raised and lowered by rotating the adjusting dial 7 through the adjusting tool. The structure is simple, the operation is convenient, and the threaded cooperation can form self-locking, and the adjustment is stable and reliable. Three exposure adjustment seats 5 are provided around the exposure support frame 4 to ensure that the level of the exposure support frame 4 can be adjusted, thereby ensuring that the exposure head is perpendicular to the wafer turntable.

[0039] like Figure 5 and Figure 6 As shown, the Z slide seat includes a Z slide rail 13 and a Z slider, the Z slide rail 13 is fixedly mounted on a connecting frame 14, an upper Z slider 15 and a lower Z slider 16 are respectively mounted on the Z slide rail 13, an upper connecting plate 17 connected to the alignment camera 11 is mounted on the upper Z slider 15, and a lower connecting plate 18 connected to the lighting structure 12 is mounted on the lower Z slider 16, and the Z driving device includes a Z driving handle 19 respectively mounted on the upper Z slider 15 and the lower Z slider 16, and the upper Z slider 15 and the lower Z slider 16 are driven by the Z driving handle 19 to drive the transmission mechanism to reciprocate on the Z slide rail 13; the transmission mechanism is a helical gear transmission mechanism, so that turning the Z driving handle 19 can make the corresponding upper Z slider 15 and the lower Z slider 16 slide separately, and different spacings can be formed between the alignment camera 11 and the lighting structure 12, thereby improving the use effect and adapting to different shooting and lighting ranges.

[0040] Furthermore, an auxiliary slide that slides against each other is provided between the upper connecting plate 17 and the lower connecting plate 18; the auxiliary slide includes an auxiliary guide rail 20 and an auxiliary slider 21, the auxiliary guide rail 20 is fixedly mounted on the upper connecting plate 17, and the auxiliary slider 21 is fixedly mounted on the lower connecting plate 18. Since the alignment camera 11 and the lighting structure 12 can each move independently, when the upper Z slider 15 and the lower Z slider 16 slide separately, they can constrain each other without affecting the sliding, thereby improving the sliding accuracy and being more stable.

[0041] like Figure 3 and Figure 4As shown, the vertical adjustment device includes an X-direction swinging X-manual angle table 22 and a Y-direction swinging Y-manual angle table 23 which are stacked and installed on the Y slide; since the alignment camera 11 and the lighting structure 12 are connected to the X-manual angle table 22 through the connecting frame 14, the swing of the alignment camera 11 and the lighting structure 12 can be controlled as a whole to ensure the shooting of the vertical wafer turntable and accurate and reliable alignment; the manual angle table is an existing structure on the market and is therefore not described in detail herein.

[0042] In this embodiment, the Y slide seat includes a Y slide rail 24 and a Y slider 25, and a plurality of Y sliders 25 are slidably mounted on the Y slide rail 24, and the corresponding X manual angle table 22 and Y manual angle table 23 are mounted on the Y sliders 25, and the connecting frame 14 is fixedly mounted on the X manual angle table 22 or the Y manual angle table 23, and the Y driving device is the same as the Z driving device; two Y sliders 25 are arranged on the Y slide rail 24, so that there are two pairs of alignment cameras 11 and lighting structures 12, which expands the shooting range and improves the use effect, and the Y slider 25 is also provided with a Y driving handle 26, which is also effectively slid by the helical gear transmission mechanism.

[0043] Further, the X slide seat includes an X lead screw 27 rotatably mounted on the adjustment base plate 10 and extending along the X direction, an X slider 28 is slidably mounted on the X lead screw 27, and the X lead screw 27 and the X slider 28 form a lead screw nut structure, the X drive device is an X drive handle 29 that manually drives the X lead screw 27 to rotate, an X support plate 30 is fixedly mounted on the X slider 28, and the Y slide rail 24 is fixedly mounted on the X support plate 30; the drive handle is rotated to rotate the X lead screw 27 so that the X slider 28 slides, the structure is simple, and the use cost is low; the support range can be expanded by the X support plate 30, and the stability of the support is improved.

[0044] In this embodiment, the adjusting base plate 10 is further provided with an X guide column 31 for assisting the sliding of the X slider 28; during the sliding process of the X slider 28, the X guide column 31 can help the X slider 28 to move stably, so that the X support plate 30 is supported stably.

[0045] The Y slider 25, the upper Z slider 15 and the lower Z slider 16 are all provided with a proximity switch 32; since there are two Y sliders 25, in order to prevent contact during use, the limit switch can effectively limit the movement range of the Y slider 25, and ensure that the alignment cameras 11 can cooperate in shooting. At the same time, the upper Z slider 15 and the lower Z slider 16 avoid the movement range of the alignment camera 11 and the lighting structure 12 when they move respectively, and avoid contact during use; the proximity switch 32 is an existing structure on the market, so it is not described in detail in this article.

[0046] The working principle of this embodiment is as follows: first, the linear motor 2 drives the photolithography frame 9 to move linearly, so that the alignment camera 11 is above the frame, and the X driving handle 29 is rotated to make the X slider 28 move along the X lead screw 27, and the X support plate 30 can move the Y slide rail 24 along the X direction to adjust the X-direction position of the alignment camera 11 and the lighting structure 12, then the Y driving handle 26 is rotated to make the Y slider 25 slide along the Y direction to adjust the Y-direction position of the alignment camera 11 and the lighting structure 12, then the Z driving handle 19 is rotated to make the upper slider and the lower Z slider 16 slide along the Z direction to adjust the distance between the alignment camera 11 and the lighting structure 12 and the wafer turntable, and at the same time, the X manual angle stage 22 and the Y manual angle stage 23 control the shooting illumination angle of the alignment camera 11 and the lighting structure 12 to complete the shooting alignment, then the photolithography frame 9 moves linearly to make the exposure head return to the top of the wafer turntable, and the adjusting turntable 7 is rotated by the adjusting tool, so that the threaded shaft 6 drives the exposure adjustment seat 5 to rise, and the level of the exposure support frame 4 is adjusted, so that the exposure head exposes the wafer turntable vertically.

[0047] The above-described embodiments are merely descriptions of preferred implementations of the present invention and are not intended to limit the scope of the present invention. Various modifications and alterations to the technical solutions of the present invention without departing from the spirit of the present invention should fall within the scope of protection defined by the claims of the present invention.

Claims

1. An exposure head assembly of an exposure machine, comprising an exposure mounting platform, on which a photolithography frame is slidably mounted, characterized in that: An exposure head is mounted on the photolithography frame for vertical adjustment through an exposure adjustment device, an adjustment base plate is fixedly mounted on the photolithography frame, an X slide is mounted on the adjustment base plate for sliding along the X direction, the X slide is driven to slide by an X drive device, a Y slide is mounted on the X slide for sliding along the Y direction, a connecting frame is mounted on the Y slide, the Y slide is driven to slide by the Y drive device, a Z slide is mounted on the connecting frame for sliding along the Z direction, the Z slide is driven to slide by the Z drive device, an alignment camera and an illumination structure that follow the Z slide are mounted on the Z slide, and a vertical adjustment device for adjusting the alignment camera and the illumination structure to face vertically downward is provided on the Y slide; the photolithography frame is driven to slide by a linear power device.

2. An exposure head assembly for an exposure machine as claimed in claim 1, characterized in that: The exposure head is connected to an exposure support frame, and the exposure adjustment device includes an exposure adjustment seat, which is evenly arranged at three corners of the exposure support frame. The exposure adjustment seat is installed on the photolithography frame for lifting adjustment, and the exposure adjustment seat is fixedly connected to the exposure support frame.

3. An exposure head assembly for an exposure machine as claimed in claim 2, characterized in that: A threaded shaft is connected below the exposure adjustment seat, an adjustment dial is threadedly mounted on the threaded shaft, the adjustment dial is rotatably mounted on the photolithography frame, and an adjustment slot is provided on the adjustment dial for rotating in cooperation with an adjustment tool.

4. An exposure head assembly of an exposure machine as claimed in claim 3, characterized in that: The Z slide seat includes a Z slide rail and a Z slider, the Z slide rail is fixedly mounted on a connecting frame, an upper Z slider and a lower Z slider are respectively mounted on the Z slide rail, an upper connecting plate connected to an alignment camera is mounted on the upper Z slider, and a lower connecting plate connected to an illumination structure is mounted on the lower Z slider, the Z driving device includes a Z driving handle respectively mounted on the upper Z slider and the lower Z slider, and the upper Z slider and the lower Z slider drive a transmission mechanism to slide back and forth on the Z slide rail through the Z driving handle.

5. An exposure head assembly of an exposure machine as claimed in claim 4, characterized in that: An auxiliary sliding seat which slides mutually is also arranged between the upper connecting plate and the lower connecting plate.

6. An exposure head assembly of an exposure machine as claimed in claim 5, characterized in that: The vertical adjustment device comprises an X-direction manual angle table and a Y-direction manual angle table which are stacked and installed on a Y slide.

7. An exposure head assembly of an exposure machine as claimed in claim 6, characterized in that: The Y slide seat includes a Y slide rail and a Y slider, a plurality of Y sliders are slidably mounted on the Y slide rail, corresponding X manual angle table and Y manual angle table are mounted on the Y slider, the connecting frame is fixedly mounted on the X manual angle table or the Y manual angle table, and the Y driving device is the same as the Z driving device.

8. An exposure head assembly of an exposure machine as claimed in claim 7, characterized in that: The X slide seat includes an X lead screw rotatably mounted on the adjustment base plate and extending along the X direction, an X slider is slidably mounted on the X lead screw, the X lead screw and the X slider form a lead screw nut structure, the X drive device is an X drive handle that manually drives the X lead screw to rotate, an X support plate is fixedly mounted on the X slider, and the Y slide rail is fixedly mounted on the X support plate.

9. An exposure head assembly of an exposure machine as claimed in claim 8, characterized in that: The adjusting bottom plate is also provided with an X guide column for assisting the sliding of the X sliding block.

10. An exposure head assembly of an exposure machine as claimed in claim 9, characterized in that: The Y slider, the upper Z slider and the lower Z slider are all provided with proximity switches.

Images