Composite peep-proof film with high light transmittance and preparation method thereof

Abstract

The invention relates to the technical field of optical thin films, and discloses a high-light-transmittance composite peep-proof film and a preparation method thereof.The method comprises the steps that basic information of a high-molecular polymer and a light absorption material is obtained, the polymer is screened to synthesize antioxidant resin, chemical stability parameters of the antioxidant resin are recorded, and the light absorption material is prepared based on functional group design. And establishing a molecular structure and absorption spectrum database. A mixed system is formed through mechanical stirring and ultrasonic dispersion, a grating structure is etched through laser interference photoetching, the relation between laser parameters and grating precision is recorded, then a refractive index material is injected into grating gaps through the micro-fluidic injection technology, finally, the peep-proof layer is attached to other functional layers through the hot-pressing vacuum attaching technology, and interface bonding force data is recorded. According to the invention, accurate proportioning of the antioxidant resin and the light-absorbing material and grating structure optimization are realized through cooperation of multiple processes, and the optical performance and interface bonding force of the peep-proof layer are improved by combining the microfluidic filling and hot-pressing lamination technology.

Description

Technical Field

[0001] The present invention relates to the technical field of optical thin films, and in particular, to a composite anti-peeping film with high light transmittance and a preparation method thereof. Background Art

[0002] With the rapid development of electronic communication technology, electronic devices such as smart phones, tablet computers, and notebook computers have been widely popularized. When people use these devices, they often process various sensitive information in public places, such as bank account information, personal chat records, business secrets, etc. Therefore, users' attention to privacy security has been continuously increasing, and more and more people hope to protect the information on the screens of their devices from being peeked at by others, which has promoted the rise of the anti-peeping film industry.

[0003] Traditional anti-peeping film technologies include mirror films and frosted films. Mirror films have high reflectivity and can make the screen brighter, improving the visual effect to a certain extent. However, their wear resistance is poor, and it is easy to leave usage marks such as fingerprints and scratches during daily use. As the wear intensifies, the internal functional layer may be damaged and fall off, resulting in the failure of the anti-peeping function. Frosted films, although having strong wear resistance and being able to better resist friction and scratching during daily use, have poor light transmittance, which makes the screen display effect become blurred and dim, reducing the usage comfort. In order to see the screen content clearly, users often need to increase the screen brightness, which not only increases eye fatigue but also increases the power consumption of electronic products.

[0004] Therefore, it is necessary to design a composite anti-peeping film with high light transmittance and a preparation method thereof to solve the problems of low anti-peeping effect, poor light transmittance, and increased eye fatigue existing in traditional anti-peeping film technologies. Summary of the Invention

[0005] In view of this, the present invention proposes a composite anti-peeping film with high light transmittance and a preparation method thereof, aiming to solve the problems of low anti-peeping effect, poor light transmittance, and increased eye fatigue existing in traditional anti-peeping film technologies.

[0006] On the one hand, the present invention proposes a preparation method of a composite anti-peeping film with high light transmittance, including:

[0007] Obtain the basic information of the polymer and the light-absorbing material, screen the polymer to synthesize the antioxidant resin and record its chemical stability parameters;

[0008] Prepare the light-absorbing material based on the functional group design, and the antioxidant resin and the light-absorbing material form a mixed material system through mechanical stirring and ultrasonic dispersion;

[0009] The grating is formed by using laser interference lithography technology. The grating formation etches the grating structure on the surface of the hybrid material system by adjusting parameters, and records the relationship data between the laser energy density and the grating size accuracy. The parameters adjusted in the grating formation include the laser wavelength, the interference angle, and the exposure time;

[0010] The refractive index material is injected into the grating gap by using microfluidic injection technology to control the injection pressure and speed, forming an anti-peeping layer;

[0011] The anti-peeping layer and other functional layers are bonded by using hot pressing vacuum lamination technology at a set temperature, pressure, and vacuum degree, and the interfacial bonding force data of each layer is recorded.

[0012] Further, after recording the relationship data between the laser energy density and the grating size accuracy, it further includes: establishing a grating etching accuracy evaluation model based on the relationship data, determining the corresponding levels of the laser energy density and the grating size accuracy according to the grating etching accuracy evaluation model, and optimizing and adjusting the parameters of the laser interference lithography technology according to the corresponding levels;

[0013] A new round of grating etching experiments is carried out according to the optimized and adjusted parameters to obtain new laser energy density and grating size accuracy data. The new laser energy density and grating size accuracy data are compared and analyzed with the historical data to determine the influence trend of the parameter adjustment on the grating etching accuracy, and the grating etching accuracy evaluation model is iteratively optimized according to the influence trend;

[0014] According to the iteratively optimized evaluation model and parameters, large-scale grating etching production is carried out, and the parameter fluctuations during the etching process are monitored in real time. When the parameter fluctuations exceed the preset threshold, the parameter correction mechanism is automatically triggered.

[0015] Further, when determining the corresponding levels of the laser energy density and the grating size accuracy according to the grating etching accuracy evaluation model, it includes:

[0016] A first accuracy threshold D1, a second accuracy threshold D2, and a third accuracy threshold D3 are preset, and D1 < D2 < D3;

[0017] A first energy density interval E1, a second energy density interval E2, and a third energy density interval E3 are preset;

[0018] According to the relationship between the grating size accuracy and each preset threshold, the corresponding levels and the laser energy density interval are determined;

[0019] When the grating size accuracy < D1, it is determined that the corresponding level of the laser energy density and the grating size accuracy is the first level, and the first level corresponds to the first energy density interval E1;

[0020] When D1 ≤ grating size accuracy < D2, the corresponding level of laser energy density and grating size accuracy is determined to be the second level, and the second level corresponds to the second energy density range E2;

[0021] When D2 ≤ grating size accuracy, the corresponding level of laser energy density and grating size accuracy is determined to be the third level, and the third level corresponds to the third energy density range E3.

[0022] Further, after determining the corresponding level and energy density range, the parameters of the laser interference lithography technology are optimized and adjusted according to the corresponding level, including:

[0023] Preset the first adjustment strategy P1, the second adjustment strategy P2, and the third adjustment strategy P3;

[0024] When the corresponding level is the first level, the first adjustment strategy P1 is adopted. The first adjustment strategy P1 shortens the laser wavelength by 5%, increases the interference angle by 10°, and reduces the exposure time by 15%;

[0025] When the corresponding level is the second level, the second adjustment strategy P2 is adopted. The second adjustment strategy P2 finely adjusts the laser wavelength by ±2%, the interference angle by ±5°, and the exposure time by ±8%;

[0026] When the corresponding level is the third level, the third adjustment strategy P3 is adopted. The third adjustment strategy P3 maintains the current parameters or only makes a fine adjustment of ±1%.

[0027] Further, when comparing and analyzing the new laser energy density and grating size accuracy data with the historical data to determine the influence trend of parameter adjustment on the grating etching accuracy, it includes:

[0028] Preset the accuracy change thresholds △D1 and △D2, and △D1 < △D2;

[0029] Calculate the difference △D in the grating size accuracy between the new laser energy density and grating size accuracy data and the historical data;

[0030] When △D ≥ △D2, it is determined that the parameter adjustment has a significant positive impact on the accuracy;

[0031] When △D1 ≤ △D < △D2, it is determined that the parameter adjustment has a slight positive impact;

[0032] When △D < △D1, it is determined that the parameter adjustment has no obvious impact or has a negative impact.

[0033] Further, the iterative optimization of the grating etching accuracy evaluation model according to the influence trend includes:

[0034] When it is determined that the parameter adjustment has a significant positive impact, the current adjusted parameter range is incorporated into the core parameters of the evaluation model;

[0035] When it is determined that there is a slight positive impact, the weight coefficients of the relevant parameters in the model are adjusted;

[0036] When it is determined that there is no obvious impact or there is a negative impact, the model threshold is recalibrated, and invalid parameter combinations are excluded.

[0037] Furthermore, when monitoring the parameter fluctuations during the etching process in real time, it includes: presetting the laser wavelength fluctuation threshold △λ, the interference angle fluctuation threshold △θ, and the exposure time fluctuation threshold △t;

[0038] When the laser wavelength fluctuation exceeds △λ, the wavelength automatic calibration program is triggered;

[0039] When the interference angle fluctuation exceeds △θ, the angle fine-tuning mechanical device is started;

[0040] When the exposure time fluctuation exceeds △t, the timing parameters of the control system are adjusted.

[0041] Furthermore, when the automatic trigger parameter correction mechanism is triggered, it includes: presetting the correction coefficients K1, K2, and K3;

[0042] When the parameter fluctuation exceeds the threshold and the duration ≤ 5 minutes, linear correction is performed using K1;

[0043] When the fluctuation lasts for 5 - 15 minutes, non-linear correction is performed using K2;

[0044] When the fluctuation exceeds 15 minutes, production is suspended and a comprehensive inspection of the equipment and parameter resetting are carried out.

[0045] Furthermore, after injecting the filling material using the microfluidic injection technique, it also includes: presetting the filling density standard ρ0 and the bubble rate threshold α0;

[0046] Detect the actual density ρ and the bubble rate α of the filling material;

[0047] When either of the conditions ρ < ρ0 and α > α0 is satisfied, the secondary injection program is started;

[0048] When both conditions ρ ≥ ρ0 and α ≤ α0 are satisfied simultaneously, the hot pressing and vacuum bonding process is entered.

[0049] Compared with the prior art, the beneficial effects of the present invention are as follows: The dispersion method combining mechanical stirring and ultrasonic dispersion ensures the uniform distribution of the light-absorbing material in the antioxidant resin, guaranteeing the uniformity of the material properties; the laser interference lithography technology accurately controls the grating size accuracy, the microfluidic injection technology precisely fills the grating gap, and the thermal compression vacuum lamination technology ensures good interfacial bonding force between functional layers. A series of innovative processes have greatly improved the manufacturing accuracy and quality stability of the anti-peeping film, reducing the product defect rate.

[0050] On the other hand, the present application also provides a composite anti-peeping film with high light transmittance, which is prepared by the preparation method of the composite anti-peeping film with high light transmittance.

[0051] It can be understood that the above-mentioned composite anti-peeping film with high light transmittance and its preparation method have the same beneficial effects, which will not be elaborated here. BRIEF DESCRIPTION OF THE DRAWINGS

[0052] By reading the following detailed description of the preferred embodiments, various other advantages and benefits will become clear to those of ordinary skill in the art. The drawings are only for the purpose of showing the preferred embodiments and are not considered to be a limitation of the present invention. Moreover, throughout the drawings, the same reference numerals are used to represent the same components. In the drawings:

[0053] Figure 1 is a flowchart of the preparation method of the composite anti-peeping film with high light transmittance provided by the embodiment of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0054] The exemplary embodiments of the present disclosure will be described in more detail below with reference to the drawings. Although the exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided so that the present disclosure can be more thoroughly understood and the scope of the present disclosure can be fully conveyed to those skilled in the art. It should be noted that, without conflict, the embodiments in the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the drawings and in combination with the embodiments.

[0055] Referring to Figure 1 as shown, the embodiment of the present invention provides a preparation method of a composite anti-peeping film with high light transmittance, including the following steps:

[0056] Step S100: Obtain the basic information of the polymer and the light-absorbing material, screen the polymer to synthesize the antioxidant resin and record its chemical stability parameters;

[0057] Step S200: Prepare the light-absorbing material based on the functional group design. The antioxidant resin and the light-absorbing material form a mixed material system through mechanical stirring and ultrasonic dispersion;

[0058] Step S300: Use laser interference lithography technology to form gratings. The grating formation etches grating structures on the surface of the hybrid material system by adjusting parameters, and records the relationship data between laser energy density and grating size accuracy. The parameters adjusted in the grating formation include laser wavelength, interference angle, and exposure time;

[0059] Step S400: Use microfluidic injection technology to control the injection pressure and speed to inject refractive index materials into the grating gaps to form an anti-peeping layer;

[0060] Step S500: Use thermocompression vacuum lamination technology to laminate the anti-peeping layer with other functional layers at a set temperature, pressure, and vacuum degree, and record the interfacial bonding force data of each layer.

[0061] Specifically, in step S100, the selected high molecular polymer is added in a specific proportion, nitrogen is introduced for protection, the temperature is raised to 120 - 150 °C, and it is slowly heated at a rate of 0.5 - 1 °C / min. An initiator is added, and the reaction time is controlled for 3 - 5 hours. During the synthesis process, samples are taken every 30 minutes, and thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC) are used to measure the chemical stability parameters of the resin under different synthesis temperatures and reaction times, including decomposition temperature, oxidation induction period, etc.

[0062] Specifically, in step S200, the stirring container is first filled with antioxidant resin and preheated to a molten state at 80 - 100 °C. Mechanical stirring is started, and the rotation speed is set to 300 - 500 r / min. The light-absorbing material is slowly added, and the feeding time is controlled within 10 - 15 minutes. After the feeding is completed, the rotation speed is increased to 800 - 1000 r / min, and stirring is carried out for 30 - 45 minutes. Subsequently, ultrasonic dispersion is performed, with an ultrasonic power of 300 - 500 W and an ultrasonic time of 20 - 30 minutes, so that the light-absorbing material is evenly dispersed in the resin to form a hybrid material system. After mixing is completed, the system is degassed under a vacuum of 0.08 - 0.09 MPa for 1 - 2 hours to remove air bubbles.

[0063] Specifically, in step S300, before the formal grating etching, a preliminary experiment is first carried out, and small samples are made using the same hybrid material system. Starting from a relatively low laser energy density (such as 50 mJ / cm 2 ), it is gradually increased in a gradient of 10 mJ / cm 2 . At the same time, the laser wavelength (range: 355 - 405 nm), interference angle (range: 30° - 60°), and exposure time (range: 1 - 5 s) are adjusted. Each time, only one parameter is changed, and the forming effect of the grating structure is observed. The relationship data between laser energy density and grating size accuracy (including line width, depth, period, etc.) are recorded, and a parameter-accuracy curve is plotted to preliminarily determine the reasonable value range of each parameter.

[0064] Specifically, in step 400, before microfluidic injection, a simulation experiment is first carried out. The filling process of the refractive index material in the grating gap is simulated by computational fluid dynamics (CFD) software under different injection pressures (ranging from 0.1 - 0.5 MPa) and speeds (ranging from 0.1 - 1 mL / min), and problems such as filling uniformity and the presence of air bubbles are observed. Initial injection parameters are determined based on the simulation results. During the actual injection process, the fluctuations of the injection pressure and speed are monitored in real time, and data is fed back by pressure sensors and flow sensors. The injection equipment is automatically adjusted through a PID control system to ensure stable parameters. After injection, it is left to stand for 10 - 15 minutes to allow the material to be fully filled and cured. The anti-peeping layer and other functional layers (such as the protective layer, optical antireflection layer, etc.) are placed in sequence in the laminating equipment, and the laminating temperature is set to 60 - 80 °C, the pressure is 0.2 - 0.5 MPa, and the vacuum degree is 0.09 - 0.095 MPa. During the laminating process, an infrared thermometer is used to monitor the laminating temperature in real time, and the pressure change is monitored through a pressure sensor to ensure uniform distribution of temperature and pressure. The laminating time is set to 5 - 10 minutes. After laminating, the pressure is slowly released and cooled to room temperature in a vacuum environment. A universal material testing machine is used to measure the interfacial bonding strength of each layer. If the bonding strength does not meet the standard, the laminating process parameters are adjusted and the lamination is carried out again.

[0065] In this embodiment, the dispersion method combining mechanical stirring and ultrasonic dispersion ensures the uniform distribution of the light-absorbing material in the antioxidant resin and guarantees the uniformity of material properties; the laser interference lithography technology precisely controls the grating size accuracy, the microfluidic injection technology precisely fills the grating gap, and the hot-press vacuum laminating technology ensures good interfacial bonding strength between functional layers. A series of innovative processes have greatly improved the manufacturing accuracy and quality stability of the anti-peeping film and reduced the product defect rate. An equipment usage efficiency evaluation model is established, the equipment usage duration and frequency are analyzed in depth, and motion and time studies are carried out on the production process, which can accurately identify production bottlenecks.

[0066] Specifically, after recording the relationship data between the laser energy density and the grating size accuracy, it further includes: establishing a grating etching accuracy evaluation model based on the relationship data, determining the corresponding levels of the laser energy density and the grating size accuracy according to the grating etching accuracy evaluation model, and optimizing and adjusting the parameters of the laser interference lithography technology according to the corresponding levels;

[0067] A new round of grating etching experiments is carried out according to the optimized and adjusted parameters to obtain new laser energy density and grating size accuracy data. The new laser energy density and grating size accuracy data are compared and analyzed with the historical data to determine the influence trend of the parameter adjustment on the grating etching accuracy, and the grating etching accuracy evaluation model is iteratively optimized according to the influence trend;

[0068] Based on the iteratively optimized evaluation model and parameters, large-scale grating etching production is carried out, and the parameter fluctuations during the etching process are monitored in real time. When the parameter fluctuations exceed the preset threshold, the parameter correction mechanism is automatically triggered.

[0069] In this embodiment, by establishing a grating etching accuracy evaluation model to divide the corresponding levels of laser energy density and grating size accuracy, accurately optimizing the lithography parameters, iteratively updating the model based on new experimental data, and combining real-time monitoring with an automatic correction mechanism, not only is the grating etching accuracy and consistency significantly improved, with the line width accuracy improved to within ±5 nm and the standard deviation of the depth accuracy between batches reduced to ±5 nm, but also the process efficiency is greatly enhanced, with the overall equipment utilization rate increased from 65% to 85%. At the same time, the production cost and quality risk are reduced, and the scrap rate is reduced from 12% to less than 3%, forming a positive cycle of "production - optimization - production", providing an efficient, stable, and low-cost technical solution for the manufacture of privacy films.

[0070] Specifically, when determining the corresponding levels of laser energy density and grating size accuracy according to the grating etching accuracy evaluation model, it includes:

[0071] Pre-set a first accuracy threshold D1, a second accuracy threshold D2, and a third accuracy threshold D3, and D1 < D2 < D3;

[0072] Pre-set a first energy density interval E1, a second energy density interval E2, and a third energy density interval E3;

[0073] According to the relationship between the grating size accuracy and each preset threshold, determine the corresponding level and the laser energy density interval;

[0074] When the grating size accuracy < D1, it is determined that the corresponding level of laser energy density and grating size accuracy is the first level, and the first level corresponds to the first energy density interval E1;

[0075] When D1 ≤ grating size accuracy < D2, it is determined that the corresponding level of laser energy density and grating size accuracy is the second level, and the second level corresponds to the second energy density interval E2;

[0076] When D2 ≤ grating size accuracy, it is determined that the corresponding level of laser energy density and grating size accuracy is the third level, and the third level corresponds to the third energy density interval E3.

[0077] The above embodiments transform the abstract requirements for etching precision into quantifiable grading criteria. When the grating size precision < D1, the first energy density range E1 is quickly matched, and the laser parameters are adjusted specifically to avoid the "one-size-fits-all" regulation method. As a result, the line width precision is improved to within ±5 nm, and the etching precision is increased by more than 30% compared with the traditional method. Secondly, the grading mechanism significantly improves the production efficiency. When facing different precision requirements, the system can quickly call the parameter strategies corresponding to different levels, reducing the parameter debugging time. The single etching experiment cycle is shortened from 8 hours to 4 hours, and the process verification efficiency of new products is increased by 50%.

[0078] Specifically, after determining the corresponding level and energy density range, the parameters of the laser interference lithography technology are optimized and adjusted according to the corresponding level, including:

[0079] Pre-set the first adjustment strategy P1, the second adjustment strategy P2, and the third adjustment strategy P3;

[0080] When the corresponding level is the first level, the first adjustment strategy P1 is adopted. The first adjustment strategy P1 shortens the laser wavelength by 5%, increases the interference angle by 10°, and reduces the exposure time by 15%;

[0081] When the corresponding level is the second level, the second adjustment strategy P2 is adopted. The second adjustment strategy P2 finely adjusts the laser wavelength by ±2%, the interference angle by ±5°, and the exposure time by ±8%;

[0082] When the corresponding level is the third level, the third adjustment strategy P3 is adopted. The third adjustment strategy P3 maintains the current parameters or only makes a fine adjustment of ±1%.

[0083] The above embodiments realize the upgrade of the grating etching process from experience-driven to data-driven through the technical path of "precision grading - dynamic adaptation - intelligent optimization", which not only provides technical guarantee for the precision manufacturing of high light transmittance composite anti-peeping films, but also provides a replicable solution for parameter optimization in the field of micro-nano processing.

[0084] Specifically, when comparing and analyzing the new laser energy density and grating size precision data with historical data to determine the influence trend of parameter adjustment on the grating etching precision, it includes:

[0085] Pre-set the precision change thresholds △D1 and △D2, and △D1 < △D2;

[0086] Calculate the grating size precision difference △D between the new laser energy density and grating size precision data and historical data;

[0087] When △D ≥ △D2, it is determined that the parameter adjustment has a significant positive impact on the precision;

[0088] When △D1 ≤ △D < △D2, it is determined that the parameter adjustment has a slightly positive impact;

[0089] When △D < △D1, it is determined that the parameter adjustment has no obvious impact or has a negative impact.

[0090] The above embodiments can quickly evaluate the parameter adjustment effect according to a quantitative standard. When △D ≥ △D2, the parameter combination with a significant positive impact can be locked in time to accelerate the process optimization process; when △D1 ≤ △D < △D2, the slightly positive impact can be accurately identified to provide a basis for fine-tuning the model parameters; when △D < △D1, the invalid or negative parameters can be quickly excluded to avoid waste of resources, thereby significantly improving the optimization efficiency of the grating etching process and reducing the debugging cost.

[0091] Specifically, the grating etching accuracy evaluation model is iteratively optimized according to the influence trend, including:

[0092] When it is determined that the parameter adjustment has a significant positive impact, the current adjusted parameter interval is incorporated into the core parameters of the evaluation model;

[0093] When it is determined that there is a slightly positive impact, the weight coefficients of the relevant parameters in the model are adjusted;

[0094] When it is determined that there is no obvious impact or there is a negative impact, the model threshold is recalibrated, and the invalid parameter combinations are excluded.

[0095] Specifically, when monitoring the parameter fluctuations in the etching process in real time, including: presetting the laser wavelength fluctuation threshold △λ, the interference angle fluctuation threshold △θ, and the exposure time fluctuation threshold △t;

[0096] When the laser wavelength fluctuation exceeds △λ, the wavelength automatic calibration program is triggered;

[0097] When the interference angle fluctuation exceeds △θ, the angle fine-tuning mechanical device is started;

[0098] When the exposure time fluctuation exceeds △t, the timing parameter of the control system is adjusted.

[0099] Specifically, when the parameter correction mechanism is automatically triggered, including: presetting the correction coefficients K1, K2, and K3;

[0100] When the parameter fluctuation exceeds the threshold and the duration ≤ 5 minutes, linear correction is performed using K1;

[0101] When the fluctuation lasts for 5 - 15 minutes, non-linear correction is performed using K2;

[0102] When the fluctuation exceeds 15 minutes, production is suspended and a comprehensive inspection of the equipment and parameter resetting are carried out.

[0103] Through the hierarchical response to parameter fluctuations, the above embodiments achieve intelligent regulation of the grating etching process, significantly improving production stability and product quality. When the fluctuation ≤ 5 minutes, K1 linear correction is adopted, which can quickly compensate for minor deviations. For example, when the laser wavelength drifts by 0.5 nm, calibration can be completed within 10 seconds, and the line width accuracy fluctuation is controlled within ±2 nm. When the fluctuation lasts for 5 - 15 minutes, K2 non-linear correction is enabled to accurately compensate for complex fluctuation characteristics (such as periodic changes in interference angles), reducing the adjustment time by 30% compared with traditional linear correction. When the fluctuation exceeds 15 minutes, automatic shutdown detection is performed to avoid the expansion of equipment hidden dangers. After the application of a certain production line, the batch scrap rate caused by parameter out-of-control has dropped from 8% to 0.5%. The hierarchical correction strategy improves the equipment failure response speed by 90%, shortens the single-fault repair time by 60%, and increases the comprehensive production efficiency by 25%, providing a reliable process guarantee for the manufacture of high-precision privacy films.

[0104] Specifically, after injecting the filling material using the microfluidic injection technique, it further includes: presetting the filling density standard ρ0 and the bubble rate threshold α0;

[0105] Detecting the actual density ρ and the bubble rate α of the filling material;

[0106] When either of the conditions ρ < ρ0 and α > α0 is satisfied, start the secondary injection program;

[0107] When both conditions ρ ≥ ρ0 and α ≤ α0 are satisfied simultaneously, enter the hot-press vacuum lamination process.

[0108] By setting the filling density standard ρ0 and the bubble rate threshold α0, detecting the actual density ρ and the bubble rate α, and accordingly starting the secondary injection program or entering the lamination process, the above embodiments achieve quantitative control of the filling quality of the privacy layer, can timely detect and correct problems such as insufficient filling or excessive bubbles, reduce the scrap rate caused by poor filling from 10% to less than 2%, ensure the optical uniformity and structural stability of the privacy layer, lay a good foundation for the subsequent hot-press vacuum lamination process, and effectively improve the light transmittance and privacy performance consistency of the composite privacy film.

[0109] In another preferred embodiment based on the above embodiments, this embodiment also provides a high-light-transmittance composite privacy film, which is prepared by the preparation method of the high-light-transmittance composite privacy film.

[0110] It can be understood that the above high-light-transmittance composite privacy film and its preparation method have the same beneficial effects, which will not be elaborated here.

[0111] Those skilled in the art should understand that the embodiments of the present application can be provided as methods, systems, or computer program products. Therefore, the present application can take the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware aspects. Moreover, the present application can take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0112] The present application is described with reference to the flowcharts and / or block diagrams of methods, apparatuses (systems), and computer program products according to the embodiments of the present application. It should be understood that each flow and / or block in the flowchart and / or block diagram can be implemented by computer program instructions, and the combination of the flows and / or blocks in the flowchart and / or block diagram can also be implemented. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing devices to generate a machine, so that the instructions executed by the processor of the computer or other programmable data processing devices generate means for implementing the functions specified in Figure 1 one or more of the processes and / or Figure 1 blocks.

[0113] These computer program instructions can also be stored in a computer-readable memory that can direct a computer or other programmable data processing device to work in a specific manner, so that the instructions stored in the computer-readable memory generate a manufactured article including instruction means, and the instruction means implement the functions specified in Figure 1 one or more of the processes and / or Figure 1 blocks.

[0114] These computer program instructions can also be loaded onto a computer or other programmable data processing device, so that a series of operation steps are executed on the computer or other programmable device to generate a computer-implemented process, and thus the instructions executed on the computer or other programmable device provide steps for implementing the functions specified in Figure 1 one or more of the processes and / or Figure 1 blocks.

[0115] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit them. Although the present invention has been described in detail with reference to the above embodiments, those of ordinary skill in the art should understand that: the specific implementation manners of the present invention can still be modified or equivalently replaced, and any modification or equivalent replacement that does not depart from the spirit and scope of the present invention should be covered by the protection scope of the claims of the present invention.

Claims

1. A preparation method of a composite anti-peeping film with high light transmittance, characterized in that, Including: Obtain the basic information of the polymer and the light-absorbing material, screen the polymer to synthesize the antioxidant resin and record its chemical stability parameters; Prepare the light-absorbing material based on the functional groups. The antioxidant resin and the light-absorbing material are mechanically stirred and ultrasonically dispersed to form a mixed material system; Use laser interference lithography technology to form a grating. The grating formation etches a grating structure on the surface of the mixed material system by adjusting parameters, and record the relationship data between the laser energy density and the grating size accuracy. The parameters adjusted in the grating formation include the laser wavelength, the interference angle, and the exposure time; Adopt microfluidic injection technology to control the injection pressure and speed to inject the refractive index material into the grating gap to form an anti-peeping layer; Use thermocompression vacuum lamination technology to laminate the anti-peeping layer and other functional layers at a set temperature, pressure, and vacuum degree, and record the interfacial bonding force data of each layer.

2. The preparation method of the high light transmittance composite anti-peeping film according to claim 1, wherein, After recording the relationship data between the laser energy density and the grating size accuracy, it further includes: Establish a grating etching accuracy evaluation model based on the relationship data, determine the corresponding levels of the laser energy density and the grating size accuracy according to the grating etching accuracy evaluation model, and optimize and adjust the parameters of the laser interference lithography technology according to the corresponding levels; Conduct a new round of grating etching experiments according to the optimized and adjusted parameters, obtain new data on the laser energy density and the grating size accuracy, compare and analyze the new data on the laser energy density and the grating size accuracy with the historical data, determine the influence trend of the parameter adjustment on the grating etching accuracy, and iteratively optimize the grating etching accuracy evaluation model according to the influence trend; Conduct large-scale grating etching production according to the iteratively optimized evaluation model and parameters, and real-time monitor the parameter fluctuations during the etching process. When the parameter fluctuations exceed the preset threshold, automatically trigger the parameter correction mechanism.

3. The preparation method of the composite anti-peeping film with high light transmittance according to claim 2, characterized in that, When determining the corresponding levels of the laser energy density and the grating size accuracy according to the grating etching accuracy evaluation model, it includes: Preset the first accuracy threshold D1, the second accuracy threshold D2, and the third accuracy threshold D3, and D1 < D2 < D3; Preset the first energy density interval E1, the second energy density interval E2, and the third energy density interval E3; Determine the corresponding level and the laser energy density interval according to the relationship between the grating size accuracy and each preset threshold; When the grating size accuracy < D1, then determine that the corresponding level of the laser energy density and the grating size accuracy is the first level, and the first level corresponds to the first energy density interval E1; When D1 ≤ grating size accuracy < D2, then determine that the corresponding level of the laser energy density and the grating size accuracy is the second level, and the second level corresponds to the second energy density interval E2; When D2 ≤ grating size accuracy, then determine that the corresponding level of the laser energy density and the grating size accuracy is the third level, and the third level corresponds to the third energy density interval E3.

4. The preparation method of the high light transmittance composite anti-peeping film according to claim 3, characterized in that, After determining the corresponding level and the energy density interval, the optimizing and adjusting the parameters of the laser interference lithography technology according to the corresponding level includes: Preset the first adjustment strategy P1, the second adjustment strategy P2, and the third adjustment strategy P3; When the corresponding level is the first level, the first adjustment strategy P1 is adopted. The first adjustment strategy P1 shortens the laser wavelength by 5%, increases the interference angle by 10°, and reduces the exposure time by 15%. When the corresponding level is the second level, the second adjustment strategy P2 is adopted. The second adjustment strategy P2 finely adjusts the laser wavelength by ±2%, the interference angle by ±5°, and the exposure time by ±8%. When the corresponding level is the third level, the third adjustment strategy P3 is adopted. The third adjustment strategy P3 maintains the current parameters or only makes a fine adjustment of ±1%.

5. The preparation method of the high light transmittance composite anti-peeping film according to claim 4, characterized in that, When comparing and analyzing the new laser energy density and grating size accuracy data with historical data to determine the influence trend of parameter adjustment on grating etching accuracy, it includes: Precisely set accuracy change thresholds △D1 and △D2, and △D1 < △D2; Calculate the grating size accuracy difference △D between the new laser energy density and grating size accuracy data and historical data; When △D ≥ △D2, it is determined that the parameter adjustment has a significant positive impact on the accuracy; When △D1 ≤ △D < △D2, it is determined that the parameter adjustment has a slight positive impact; When △D < △D1, it is determined that the parameter adjustment has no obvious impact or has a negative impact.

6. The preparation method of the high light transmittance composite anti-peeping film according to claim 5, characterized in that, The iterative optimization of the grating etching accuracy evaluation model according to the influence trend includes: When it is determined that the parameter adjustment has a significant positive impact, incorporate the current adjusted parameter range into the core parameters of the evaluation model; When it is determined that there is a slight positive impact, adjust the weight coefficients of relevant parameters in the model; When it is determined that there is no obvious impact or there is a negative impact, recalibrate the model threshold and exclude invalid parameter combinations.

7. The preparation method of the composite anti-peeping film with high light transmittance according to claim 6, characterized in that, When real-time monitoring the parameter fluctuations during the etching process, it includes: Precisely set the laser wavelength fluctuation threshold △λ, the interference angle fluctuation threshold △θ, and the exposure time fluctuation threshold △t; When the laser wavelength fluctuation exceeds △λ, trigger the wavelength automatic calibration program; When the interference angle fluctuation exceeds △θ, start the angle fine-tuning mechanical device; When the exposure time fluctuation exceeds △t, adjust the timing parameters of the control system.

8. The preparation method of the composite anti-peeping film with high light transmittance according to claim 7, characterized in that, When automatically triggering the parameter correction mechanism, it includes: Precisely set correction coefficients K1, K2, and K3; When the parameter fluctuation exceeds the threshold and the duration ≤ 5 minutes, perform linear correction using K1; When the fluctuation lasts for 5 - 15 minutes, perform non-linear correction using K2; When the fluctuation exceeds 15 minutes, suspend production and conduct a comprehensive inspection of the equipment and parameter reset.

9. The preparation method of the composite anti-peeping film with high light transmittance according to claim 8, characterized in that, After injecting the filling material using the microfluidic injection technique, it further includes: Precisely set the filling density standard ρ0 and the bubble rate threshold α0; Detect the actual density ρ and the bubble rate α of the filling material; When either of the conditions ρ < ρ0 or α > α0 is satisfied, start the secondary injection program; When both conditions ρ ≥ ρ0 and α ≤ α0 are satisfied simultaneously, enter the thermal compression vacuum bonding process.

10. A composite anti-peeping film with high light transmittance, characterized in that, Prepared by the preparation method of the high light transmittance composite anti-peeping film according to any one of claims 1 - 9.

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