Laser based on top surface HR layer and planar metal grating and preparation method thereof

By adopting an external cavity laser structure with a top surface HR layer and a planar metal grating, the problems of wide linewidth and high manufacturing cost of existing InP-based DF optoelectronic device lasers are solved, the narrow linewidth performance and low-cost production of the laser are achieved, and the transmission and integration efficiency of optical signals are improved.

CN120657554AActive Publication Date: 2025-09-16JIXIN (HUZHOU) OPTOELECTRONICS TECHNOLOGY CO LTD
7 Cites 0 Cited by

Patent Information

Application Number
CN202510720976.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-30
Publication Date
2025-09-16
Estimated Expiration
2045-05-30

AI Technical Summary

Technical Problem

The existing InP-based DF optoelectronic device laser has a wide linewidth in the 1550nm band, which is difficult to meet the needs of quantum communication, coherent optical communication and terahertz photonics. At the same time, the manufacturing cost is high, the grating etching process is complex, the reflectivity is low, the power consumption is high, and the optical signal transmission and integration efficiency is low.

Method used

An external cavity laser structure based on a top surface HR layer and a planar metal grating is adopted. The grating is precisely processed through electron beam lithography and ICP etching technology, combined with magnetron sputtering to deposit the Cr/Au layer to achieve high reflectivity and flatness, abandon the InP secondary epitaxial process, simplify the process flow, and improve product performance consistency and yield.

Benefits of technology

It significantly reduces the line width of the laser, improves the reflection filtering efficiency and the purity of the Bragg reflection spectrum, reduces production costs, enhances the output power and stability of the laser, and improves the transmission and integration efficiency of optical signals.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

The invention relates to the technical field of optoelectronic devices, in particular to a laser based on a top surface HR layer and a planar metal grating and a preparation method, and the laser comprises a gain chip, an optical waveguide, the planar metal grating and a covering layer, the planar metal grating prepared by adopting an electronic evaporation plating process replaces traditional complex three-dimensional etching, so that the controllable precision and flatness of the grating structure are greatly improved, an InP secondary epitaxy process is abandoned, the whole process flow is simplified, the production cost is reduced, the product performance consistency and the product yield are improved, and the production cost is reduced. The reflection filtering efficiency is remarkably improved, the purity of the Bragg reflection spectrum is guaranteed, the narrow linewidth performance of the laser is achieved, the covering layer covers the plane metal grating, the problem that semiconductor secondary epitaxial lattices are not matched is effectively solved, diffraction light can be restrained, light energy overflow is reduced, and the freedom degree is increased through the design of the outer cavity structure.
Need to check novelty before this filing date? Find Prior Art