High-strength chemically-strengthened photosensitive microcrystalline glass as well as preparation method and application thereof
By optimizing the composition and preparation method of high-strength chemically strengthened photosensitive microcrystalline glass, the problems of insufficient contrast and poor strength performance of photosensitive glass patterns were solved, and the processing of high-precision micro-nano structures and improvement of impact resistance were achieved.
Patent Information
- Application Number
- CN202510730632.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-03
- Publication Date
- 2025-09-23
AI Technical Summary
Existing photosensitive glass has deficiencies in pattern display contrast and strength performance, making it difficult to meet the needs of high-precision micro-nano structures, and is prone to cracks and deformation during processing.
By optimizing the composition and preparation method of high-strength chemically strengthened photosensitive microcrystalline glass, including mixing SiO2, Al2O3, Li2O, ZrO2 and other raw materials in specific proportions, combined with two-stage crystallization and two-step chemical strengthening treatment, the ion exchange layer depth and impact resistance of the glass are improved.
It significantly improves the pattern display contrast, enhances the impact resistance of the glass, reduces cracks and deformation during processing, meets the needs of high-intensity application scenarios, and maintains photochromic and processability.
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Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of glass materials, and in particular to a high-strength chemically strengthened photosensitive glass-ceramics and a preparation method and application thereof. Background Art
[0002] Due to its unique photochromic and machinability properties, photosensitive glass-ceramics have broad application prospects in many fields, such as optical devices and electronic packaging. However, existing photosensitive glass has certain limitations in terms of pattern display contrast and machinability, making it difficult to meet the needs of some application scenarios with high material strength requirements. For example, some photosensitive glasses are not sensitive enough to light of specific wavelengths, resulting in poor pattern exposure and development effects; the contrast is limited, making it difficult to meet the needs of preparing high-precision micro-nano structures; and during the processing, cracks, deformation and other problems are prone to occur, affecting product quality and production efficiency. Therefore, the development of a high-strength chemically strengthened photosensitive glass-ceramic and its preparation method and application are of great practical significance. Summary of the Invention
[0003] The object of the present invention is to provide a high-strength chemically strengthened photosensitive micro-ceramic glass to solve the problems of insufficient contrast and poor strength performance of photosensitive glass patterns in the prior art.
[0004] The present invention also provides a method for preparing high-strength chemically strengthened photosensitive microcrystalline glass to solve the problems of insufficient contrast and poor strength performance of photosensitive glass patterns in the prior art.
[0005] The present invention also provides an application of high-strength chemically strengthened photosensitive microcrystalline glass to solve the problems in the prior art of low pattern display contrast and insufficient impact resistance of photosensitive glass used in electronic products.
[0006] In order to solve the above problems, the present invention proposes a high-strength chemically strengthened photosensitive glass-ceramics, the technical solution adopted is: A high-strength chemically strengthened photosensitive microcrystalline glass, whose raw materials include, by mass percentage, 65%-80% SiO2, 3%-12% Al2O3, 5%-15% Li2O, 0%-5% Na2O, 0%-3% K2O, 0%-3% MgO, 0%-1% CaO, 0%-1% SrO, 0%-3% ZnO, 0%-2% P2O5, 1%-7% ZrO2, 0%-1% TiO2, 0%-0.5% CeO2, 0.05%-0.5% Ag2O, and 0.1%-0.6% Sb2O3, wherein Li2O+Na2O+K2O accounts for 8%-16%, and MgO+CaO+SrO+ZnO accounts for 0%-5%.
[0007] The beneficial effects of the present invention are as follows: in the present invention, SiO2 is the main skeleton former of the glass structure, and its composition is designed to be 65% to 80% to obtain glass with strong chemical stability and crystallization ability; the content of Al2O3 is 3% to 12%, which makes the glass have a certain viscosity and a compact structure, improves the ion exchange rate of the glass, and increases the maximum surface compressive stress and the compression depth of the stress layer; the content of Li2O is 5% to 15%, which can promote the crystallization process of the glass and reduce the crystallization temperature; Na2O and K2O, as alkali metal oxides other than Li2O in the precursor glass, can affect the crystallization dynamics of the glass during the crystallization process and change the growth rate and morphology of the crystal; the content of P2O5 is 2% to 6%, which improves the hardness and wear resistance of the glass surface; the content of ZrO2 is 1% to 7%, which improves the high-temperature stability of the glass and inhibits the glass from being oxidized at high temperatures. The content of TiO2 is 0%~1%, which can improve the optical properties of glass. CeO2 acts as a clarifier with a content of 0%~0.5%, which can remove bubbles in the glass and improve the transparency and quality of the glass. At the same time, it can also act as a nucleating agent to promote the crystallization process of the glass and affect the growth and development of the crystal. Ag2O is a key component in photosensitive micro-ceramic glass with a content of 0.05%~0.5%, which can promote the crystallization process. Sb2O3 acts as a reducing agent with a content of 0.1%~0.6%, which also acts as a clarifier. Li2O+Na2O+K2O is 8%~16%, which can adjust the crystal phase of the glass and realize the ion exchange process. MgO+CaO+SrO+ZnO is 0%~5%, which is used to form new compounds with silicates in the glass, thereby lowering the melting point of the glass and improving the chemical stability of the glass. The high-strength chemically strengthened photosensitive microcrystalline glass of the present invention significantly improves the pattern display contrast by optimizing the glass composition. After chemical strengthening, a chemically strengthened photosensitive glass with a high ion exchange layer depth, a long salt bath service life, and good impact resistance can be obtained. The processing performance of the glass is greatly improved. It is not easy to crack or deform during cutting, grinding and other processing processes. It can better meet the needs of high-strength application scenarios while maintaining the photochromic and processability of the photosensitive microcrystalline glass. The surface compressive stress CS of the high-strength chemically strengthened photosensitive microcrystalline glass obtained in this application is 720~890 Mpa, the stress layer depth DOL is 130~158μm, the height of the simulated whole machine drop is 1500~1900 mm, the non-UV zone transmittance is 88.5-91.9%, the UV zone transmittance is 0.5-11.5%, and the difference between the non-UV zone transmittance and the UV zone transmittance is 80.4-88%.
[0008] In order to further improve the pattern display contrast and thereby obtain a chemically strengthened photosensitive glass with a higher ion exchange layer depth, a longer salt bath service life and better impact resistance, preferably, in the raw materials, (Li2O+Na2O+K2O+MgO+CaO+SrO+ZnO) / Al2O3 is 1~2.6.
[0009] In order to make the surface compressive stress CS of high-strength chemically strengthened photosensitive microcrystalline glass 800~890 MPa, the stress layer depth DOL 140~158 μm, the height of the simulated whole machine drop 1600~1900 mm, the non-UV zone transmittance 90.1-91.9%, the UV zone transmittance 0.5-7.9%, the difference between the non-UV zone transmittance and the UV zone transmittance 83.3-87.8%, preferably, by mass percentage, its raw materials include: 68.7%~78.8% SiO2, 4.8%~10% Al2O3, 5.7%~13.42% Li2O, 1%~4% Na2O, 0%~0.5% K2O, 0%~2.2% MgO, 0%~0.72% SrO, 0.1 %~3%ZnO, 0%~1.66%P2O5, 2.2%~6%ZrO2, 0%~0.4%CeO2, 0.15%~0.5%Ag2O, 0.48%~0.52%Sb2O3, among which Li2O+Na2O+K2O is 9.7%~14.42%, MgO+CaO+SrO+ZnO is 1.5%~5%, and (Li2O+Na2O+K2O+MgO+CaO+SrO+ZnO) / Al2O3 is 1.75~2.52.
[0010] In order to make the surface compressive stress CS of high-strength chemically strengthened photosensitive micro-ceramics 810-890 MPa, the stress layer depth DOL 143-158 μm, the height of the simulated whole device drop 1600-1900 mm, the non-UV zone transmittance 90.1-91.2%, the UV zone transmittance 2.3-7.9%, and the difference between the non-UV zone transmittance and the UV zone transmittance 83.3-87.8%, preferably, by mass percentage, its raw materials include: 68.7%-78.8% SiO2, 4.8%-10% Al2O3, 5.7%-13.42% Li2O, 1%-4% Na2O, 0%-0.25% K2O, 1.8%-2.2% MgO, 0%-0.72% SrO, 0. 1%~3% ZnO, 0%~1.66% P2O5, 2.2%~5% ZrO2, 0%~0.4% CeO2, 0.15%~0.5% Ag2O, 0.48%~0.52% Sb2O3, among which Li2O+Na2O+K2O is 9.7%~14.42%, MgO+CaO+SrO+ZnO is 1.85%~5%, and (Li2O+Na2O+K2O+MgO+CaO+SrO+ZnO) / Al2O3 is 1.75~2.52.
[0011] The present invention also proposes a method for preparing high-strength chemically strengthened photosensitive glass-ceramics, the technical solution adopted is: A method for preparing high-strength chemically strengthened photosensitive glass-ceramics comprises the following steps: First, according to any one of claims 1 to 4, the raw materials are sequentially mixed, melted, formed and annealed to obtain a precursor glass; Secondly, the precursor glass is sequentially subjected to mask UV exposure treatment to obtain an exposed precursor glass; Then, the exposed precursor glass is subjected to a two-stage crystallization process to obtain photosensitive glass; Finally, the photosensitive glass is placed in an alkali metal molten salt for a two-step chemical strengthening treatment to obtain high-strength chemically strengthened photosensitive microcrystalline glass.
[0012] The beneficial effects of the present invention are as follows: the new photosensitive glass of the present invention significantly improves the pattern display contrast by optimizing the glass composition and preparation process; the unique ion exchange treatment process can obtain chemically strengthened photosensitive glass with a high ion exchange layer depth, a long salt bath service life, and good impact resistance, which greatly improves the processing performance of the glass. It is not easy to crack and deform during cutting, grinding and other processing processes, and can better meet the needs of high-intensity application scenarios. At the same time, it maintains the photochromic and processability characteristics of the photosensitive microcrystalline glass. The surface compressive stress CS of the high-strength chemically strengthened photosensitive microcrystalline glass obtained in this application is 720~890 Mpa, the stress layer depth DOL is 130~158μm, the height of the simulated whole machine drop is 1500~1900 mm, the non-UV transmittance is 88.5-91.9%, the UV transmittance is 0.5-11.5%, and the difference between the non-UV transmittance and the UV transmittance is 80.4-88%.
[0013] In order to fully crystallize the precursor glass, preferably, the two-stage crystallization treatment includes a first stage crystallization treatment and a second stage crystallization treatment, wherein the temperature of the first stage crystallization treatment is 490~540°C and the time is 3~5h; the temperature of the second stage crystallization treatment is 690~780°C and the time is 0.5~3h.
[0014] Preferably, the alkali metal molten salt is sodium nitrate molten salt or potassium nitrate molten salt or a mixed molten salt of sodium nitrate and potassium nitrate, and the mixed molten salt of sodium nitrate and potassium nitrate comprises 0-100 wt% of potassium nitrate and 0-100 wt% of sodium nitrate.
[0015] In order to make the photosensitive glass-ceramics photochromic, preferably, the light source of the mask UV exposure treatment is ultraviolet light with a wavelength of 254-260 nm, and the irradiation time is 10-15 minutes.
[0016] The present invention also proposes the use of the high-strength chemically strengthened photosensitive microcrystalline glass described above and the high-strength chemically strengthened photosensitive microcrystalline glass prepared by the preparation method of the high-strength chemically strengthened photosensitive microcrystalline glass described above in the back cover and casing of mobile devices.
[0017] Beneficial effects: The high-strength chemically strengthened photosensitive microcrystalline glass of the present application is used in the back cover and outer shell of mobile devices, which can meet customers' requirements for the pattern display contrast and mechanical properties of the cover glass of electronic products. Its application in electronic products has high pattern display contrast and high impact resistance. DETAILED DESCRIPTION
[0018] The existing photosensitive glass displays have insufficient contrast and poor strength. The present invention proposes a high-strength chemically strengthened photosensitive glass-ceramic. The raw materials, calculated by mass percentage, include: 65%-80% SiO2, 3%-12% Al2O3, 5%-15% Li2O, 0%-5% Na2O, 0%-3% K2O, 0%-3% MgO, 0%-1% CaO, 0%-1% SrO, 0%-3% ZnO, 0%-2% P2O5, 1%-7% ZrO2, 0%-1% TiO2, 0%-0.5% CeO2, 0.05%-0.5% Ag2O, and 0.1%-0.6% Sb2O3. The content of Li2O, Na2O, and K2O is 8%-16%, and the content of MgO, CaO, SrO, and ZnO is 0%-5%.
[0019] The technical concept of this invention is as follows: SiO2, the raw material used in the high-strength chemically strengthened photosensitive glass-ceramics disclosed herein, is the primary framework for the glass structure, enhancing its chemical stability, thermal stability, and mechanical strength. During crystallization, it provides a silicon-oxygen tetrahedral network for crystal growth, helping to control the growth direction and morphology of the crystals. Therefore, in this invention, the SiO2 content is 65% to 80%, resulting in glass with both high chemical stability and crystallization ability.
[0020] Al2O3 can partially replace silicon in silicon-oxygen tetrahedrons, enter the glass network structure, and play a role in stabilizing the network. It can improve the chemical stability, thermal stability, and mechanical strength of the glass, especially significantly improving the flexural strength and hardness of the glass. During the crystallization process, it can promote the formation of certain crystal phases and affect the type and size distribution of the crystals. Therefore, in the present invention, the content of Al2O3 is 3% to 12%, which gives the glass a certain viscosity and a compact structure, improves the ion exchange rate of the glass, and increases the maximum surface compressive stress and stress layer compression depth obtained.
[0021] Li₂O can significantly lower the melting temperature of glass, improve glass melting efficiency, and reduce energy consumption. It is also an effective nucleating agent, accelerating the crystallization process, lowering the crystallization temperature, increasing the number of nuclei, and refining the crystal size, thereby improving the performance of glass-ceramics. During the chemical strengthening process, the Li⁺ ion has a small radius and easily exchanges with other ions on the glass surface, forming a compressive stress layer and improving the strength and toughness of the glass. Therefore, the Li⁺ content in the glass of the present invention is 5% to 15%.
[0022] Na⁺ and K⁺, as alkali metal oxides in the precursor glass in addition to Li⁺, can influence the crystallization kinetics of the glass during crystallization, altering the crystal growth rate and morphology. During chemical strengthening, Na⁺ ions can also participate in ion exchange, forming a compressive stress layer, but their exchange capacity is weaker than that of Li⁺. K⁺ ions have a larger radius than Na⁺ and, upon exchange into the glass surface, form a thicker compressive stress layer, improving the glass's impact resistance. However, the exchange rate is relatively slow. Excessive Na⁺ and K⁺ content can increase the glass's thermal expansion coefficient and reduce its chemical stability, potentially leading to cracking and other problems during use. Therefore, the alkali metal oxide R⁺ (Li⁺+Na⁺+K⁺) content is designed to be between 8% and 16% to adjust the crystalline phase of the glass and facilitate the ion exchange process.
[0023] The content of alkaline earth metal oxide R'O (MgO+CaO+SrO+ZnO) is designed to be 0%~5% to form new compounds with silicates in the glass, thereby lowering the melting point of the glass and improving the chemical stability of the glass.
[0024] P2O5 participates in the formation of the glass network, improving the chemical and thermal stability of the glass. During the crystallization process, it acts as a nucleating agent, promoting crystallization, lowering the crystallization temperature, increasing the number of nuclei, and refining the crystal size. During chemical strengthening, it improves the hardness and wear resistance of the glass surface. Therefore, the P2O5 content in the glass of the present invention is 2% to 6%.
[0025] ZrO2 and TiO2, as effective nucleating agents, can significantly promote the crystallization process of glass, increase the crystallization rate and the number of crystal nuclei, and make the microcrystalline glass have a finer and more uniform crystal structure, thereby improving its mechanical properties and thermal stability. During the chemical strengthening process, it can increase the hardness and wear resistance of the glass surface and enhance the glass's resistance to chemical erosion. In addition, ZrO2 can also improve the high-temperature stability of glass and inhibit crystallization and deformation of glass at high temperatures. An appropriate amount of TiO2 can improve the optical properties of glass, such as refractive index and transmittance, but too high a content will make the glass yellow, affecting its transparency and aesthetics. Therefore, the ZrO2 content in the glass of the present invention is designed to be 1% to 7%; the TiO2 content is designed to be 0% to 1%.
[0026] CeO2 acts as a clarifier, removing bubbles from glass and improving its transparency and quality. It also acts as a nucleating agent, promoting the crystallization process and influencing the growth and development of crystals. However, excessive CeO2 content may alter the color of the glass and affect its crystallization behavior and performance. Therefore, the CeO2 content in the glass of the present invention is 0% to 0.5%.
[0027] Ag2O is a key component in photosensitive glass-ceramics. After UV exposure, it absorbs light of specific wavelengths, generating photogenerated carriers that trigger photochemical reactions in the glass and promote crystallization. During the crystallization process, the Ag atoms produced by the decomposition of Ag2O serve as nuclei, guiding crystal growth. However, excessive Ag2O content can lead to excessive light absorption, affecting the glass's transparency and photosensitivity, while also increasing costs. Therefore, the Ag2O content in the glass of the present invention is 0.05% to 0.5%.
[0028] Sb2O3 acts as a reducing agent and also as a clarifying agent. 3+ During the glass melting process, Ce 4+ Oxidation-reduction reaction occurs to maintain Ce 3+ Then, under the UV exposure of the photosensitive glass, Ce 3+ Ag can be + The Sb2O3 content in the glass of the present invention is therefore 0.1% to 0.6%.
[0029] This application controls the mass percentage range of the above-mentioned raw materials to ensure that the resulting photosensitive glass is chemically strengthened to obtain a chemically strengthened photosensitive glass with a high ion exchange layer depth, a long salt bath service life, and good impact resistance. After further processing, it can meet customer requirements for pattern display contrast and mechanical properties of electronic product cover glass. The high-strength chemically strengthened photosensitive microcrystalline glass obtained in this application has a surface compressive stress CS of 720-890 MPa, a stress layer depth DOL of 130-158 μm, a simulated drop height of 1500-1900 mm, a non-UV transmittance of 88.5-91.9%, a UV transmittance of 0.5-11.5%, and a difference of 80.4-88% between the non-UV transmittance and the UV transmittance.
[0030] Specifically, the preparation method of high-strength chemically strengthened photosensitive glass-ceramics comprises the following steps: First, the raw materials are mixed uniformly according to a certain proportion, and then melted, formed and annealed in sequence to obtain a precursor glass; Next, the precursor glass is masked to cover a portion of the area, and then subjected to UV exposure treatment to obtain an exposed precursor glass; wherein the UV exposure light source is ultraviolet light with a wavelength of 254-260nm, and the exposure time is 10-15 minutes; Then, the exposed precursor glass is subjected to a two-stage crystallization treatment to obtain photosensitive glass, which includes a non-UV area and a UV area; wherein the two-stage crystallization treatment includes a first stage crystallization treatment and a second stage crystallization treatment, the temperature of the first stage crystallization treatment is 490~540℃, and the time is 3~5h; the temperature of the second stage crystallization treatment is 690~780℃, and the time is 0.5~3h.
[0031] Finally, the photosensitive glass is placed in an alkali metal molten salt for a two-step chemical strengthening treatment to obtain a high-strength chemically strengthened photosensitive microcrystalline glass; wherein the alkali metal molten salt is a sodium nitrate molten salt or a potassium nitrate molten salt or a mixed molten salt of sodium nitrate and potassium nitrate, and the mixed molten salt of sodium nitrate and potassium nitrate includes 0 to 100 wt% of potassium nitrate and 0 to 100 wt% of sodium nitrate; the two-step chemical strengthening treatment includes a first step chemical strengthening treatment and a second step chemical strengthening treatment, the temperature of the first step chemical strengthening treatment is 370 to 480°C, and the time is 2 to 5 hours; the temperature of the second step chemical strengthening treatment is 380 to 450°C, and the time is 1 to 3 hours.
[0032] It should be noted that the main melting method of this application can be a full electric melting furnace or a flame combined with an electric melting furnace, and high-temperature annealing treatment is performed after forming. The specific forming method can be a float method, a slot down-draw method, an overflow down-draw method, or a casting method. The embodiments provided in this invention are only examples and are not limited to this method.
[0033] The implementation process of the present invention is described in detail below in conjunction with specific embodiments. However, it will be understood by those skilled in the art that the following embodiments are merely illustrative of the present invention and should not be construed as limiting the scope of the present invention. It should also be noted that, for ease of description, only the parts relevant to the invention are shown in the embodiments. It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present application will be described in detail below with reference to the embodiments. It should be noted that the endpoints of the ranges and any values disclosed herein are not limited to the precise ranges or values, and these ranges or values should be understood to include values close to these ranges or values. For numerical ranges, the endpoints of each range, the endpoints of each range and individual point values, and the individual point values can be combined with each other to obtain one or more new numerical ranges, and these numerical ranges should be considered to be specifically disclosed herein.
[0034] In the following examples and comparative examples, the raw materials used are all common commercial products that can be directly purchased or can be prepared according to conventional techniques in the art.
[0035] 1. Example of the method for preparing high-strength chemically strengthened photosensitive glass-ceramics of the present invention Examples 1-14 Examples 1-14 all provide high-strength chemically strengthened photosensitive glass-ceramics, wherein the preparation method of the high-strength chemically strengthened photosensitive glass-ceramics comprises the following steps: First, the raw materials in Table 1 and Table 2 were mixed uniformly in proportion, and then melted, formed, and annealed in sequence to obtain a precursor glass; wherein the annealing temperature was 500° C. and the time was 2 h; Next, the precursor glass is masked to cover a portion of the area, and then subjected to UV exposure treatment to obtain an exposed precursor glass; wherein the UV exposure light source is ultraviolet light with a wavelength of 254nm, and the exposure time is 10 minutes; Then, the exposed precursor glass is subjected to a two-stage crystallization process to obtain a photosensitive glass, which includes a non-UV region and a UV region; Finally, the photosensitive glass is placed in an alkali metal molten salt for a two-step chemical strengthening treatment to obtain high-strength chemically strengthened photosensitive microcrystalline glass.
[0036] Among them, the two-stage crystallization process and the two-step chemical strengthening process in the preparation process of high-strength chemically strengthened photosensitive microcrystalline glass are shown in Tables 3 and 4.
[0037] Table 1 Ratio of each group of raw materials for high strength chemically strengthened photosensitive glass-ceramics in Examples 1-7
[0038] Table 2 Ratios of raw materials for high strength chemically strengthened photosensitive glass-ceramics in Examples 8-14
[0039] Table 3 Crystallization and chemical strengthening treatment process of high-strength chemically strengthened photosensitive glass-ceramics of Examples 1-7
[0040] Table 4 Crystallization and chemical strengthening process of high-strength chemically strengthened photosensitive glass-ceramics of Examples 8-14
[0041] 2. Experimental Examples Experimental Example 1 The high-strength chemically strengthened photosensitive glass-ceramics obtained in the above Examples 1-14 were subjected to relevant performance tests.
[0042] Specifically, CS and DOL tests: CS and DOL were tested using FSM6000X and SLP2000 respectively, with the photoelastic coefficient / refractive index being 30.8 / 1.51.
[0043] Transmittance test: The sample of high-strength chemically strengthened photosensitive micro-ceramic was processed into a thickness of 0.7mm and parallel polished on the opposite surfaces. The transmittance of the high-strength chemically strengthened photosensitive micro-ceramic in the non-UV and UV regions was tested in accordance with the national standard "GB / T 7962.12-2010".
[0044] Device drop test: 180-grit German-made silicon carbide sandpaper was used. The drop test started at 200 mm and was raised 100 mm at a time until the glass broke. This height was recorded as the glass breakage height. Ten glass samples were drop tested in each example, and the average of the breakage heights during the drop test was used as the average device drop breakage height.
[0045] The specific test results are shown in Table 5 and Table 6: Table 5 Performance test results of high-strength chemically strengthened photosensitive glass-ceramics obtained in Examples 1-7
[0046] Table 6 Performance test results of high-strength chemically strengthened photosensitive glass-ceramics obtained in Examples 8-14
[0047] It can be seen from Tables 5 and 6 that the surface compressive stress CS of the high-strength chemically strengthened photosensitive microcrystalline glass of Examples 1-14 of the present application is 720~890 Mpa, the stress layer depth DOL is 130~158μm, the height of the simulated drop of the whole machine is 1500~1900mm, the transmittance in the non-UV zone is 88.5-91.9%, the transmittance in the UV zone is 0.5-11.5%, and the difference between the transmittance in the non-UV zone and the transmittance in the UV zone is 80.4-88%.
[0048] This shows that the high-strength chemically strengthened photosensitive microcrystalline glass prepared by the preparation method of the high-strength chemically strengthened photosensitive microcrystalline glass provided in this application has a high ion exchange layer depth, a long salt bath service life and good impact resistance. After reprocessing, it can meet customers' requirements for pattern display contrast and mechanical properties of electronic product cover glass. Its application in electronic products has high pattern display contrast and high impact resistance.
[0049] The foregoing description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that various modifications and variations are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention are intended to be within the scope of protection of the present invention.
Claims
1. A high-strength chemically strengthened photosensitive glass-ceramics, characterized in that: Calculated by mass percentage, the raw materials include: 65%~80%SiO2, 3%~12%Al2O3, 5%~15%Li2O, 0%~5%Na2O, 0%~3%K2O, 0%~3%MgO, 0%~1%CaO, 0%~1%SrO, 0%~3%ZnO, 0%~2%P2O5, 1%~7%ZrO2, 0%~1%TiO2, 0%~0.5%CeO2, 0.05%~0.5%Ag2O, and 0.1%~0.6%Sb2O3, among which Li2O+Na2O+K2O is 8%~16%, and MgO+CaO+SrO+ZnO is 0%~5%.
2. The high-strength chemically strengthened photosensitive glass-ceramics according to claim 1, characterized in that: Among the raw materials, (Li2O+Na2O+K2O+MgO+CaO+SrO+ZnO) / Al2O3 is 1~2.
6.
3. The high-strength chemically strengthened photosensitive glass-ceramics according to claim 2, characterized in that: Calculated by mass percentage, its raw materials include: 68.7%~78.8%SiO2, 4.8%~10%Al2O3, 5.7%~13.42%Li2O, 1%~4%Na2O, 0%~0.5%K2O, 0%~2.2%MgO, 0%~0.72%SrO, 0.1%~3%ZnO, 0%~1.66%P2O5, 2.2%~6%ZrO2, 0% ~0.4%CeO2, 0.15%~0.5%Ag2O, 0.48%~0.52%Sb2O3, among which Li2O+Na2O+K2O is 9.7%~14.42%, MgO+CaO+SrO+ZnO is 1.5%~5%, and (Li2O+Na2O+K2O+MgO+CaO+SrO+ZnO) / Al2O3 is 1.75~2.
52.
4. The high-strength chemically strengthened photosensitive glass-ceramics according to claim 2, characterized in that: In terms of mass percentage, the raw materials include: 68.7%~78.8%SiO2, 4.8%~10%Al2O3, 5.7%~13.42%Li2O, 1%~4%Na2O, 0%~0.25%K2O, 1.8%~2.2%MgO, 0%~0.72%SrO, 0.1%~3%ZnO, 0%~1.66%P2O5, 2.2%~5%ZrO2, 0 %~0.4%CeO2, 0.15%~0.5%Ag2O, 0.48%~0.52%Sb2O3, among which Li2O+Na2O+K2O is 9.7%~14.42%, MgO+CaO+SrO+ZnO is 1.85%~5%, and (Li2O+Na2O+K2O+MgO+CaO+SrO+ZnO) / Al2O3 is 1.75~2.
52.
5. A method for preparing high-strength chemically strengthened photosensitive glass-ceramics, characterized in that: The following steps are involved: First, according to any one of claims 1 to 4, the raw materials are sequentially mixed, melted, formed and annealed to obtain a precursor glass; Secondly, the precursor glass is sequentially subjected to mask UV exposure treatment to obtain an exposed precursor glass; Then, the exposed precursor glass is subjected to a two-stage crystallization process to obtain photosensitive glass; Finally, the photosensitive glass is placed in an alkali metal molten salt for a two-step chemical strengthening treatment to obtain high-strength chemically strengthened photosensitive microcrystalline glass.
6. The high-strength chemically strengthened photosensitive glass-ceramics according to claim 5, characterized in that: The two-stage crystallization treatment includes a first stage crystallization treatment and a second stage crystallization treatment, wherein the temperature of the first stage crystallization treatment is 490-540° C. and the time is 3-5 hours; the temperature of the second stage crystallization treatment is 690-780° C. and the time is 0.5-3 hours.
7. The method for preparing high-strength chemically strengthened photosensitive glass-ceramics according to claim 5, characterized in that: The two-step chemical strengthening treatment includes a first step chemical strengthening treatment and a second step chemical strengthening treatment. The temperature of the first step chemical strengthening treatment is 370-480° C. and the time is 2-5 hours; the temperature of the second step chemical strengthening treatment is 380-450° C. and the time is 1-3 hours.
8. The method for preparing high-strength chemically strengthened photosensitive glass-ceramics according to claim 5, wherein: The alkali metal molten salt is sodium nitrate molten salt or potassium nitrate molten salt or a mixed molten salt of sodium nitrate and potassium nitrate, and the mixed molten salt of sodium nitrate and potassium nitrate includes 0-100 wt% of potassium nitrate and 0-100 wt% of sodium nitrate.
9. The method for preparing high-strength chemically strengthened photosensitive glass-ceramics according to claim 5, wherein: The light source for the mask UV exposure treatment is ultraviolet light with a wavelength of 254-260nm, and the irradiation time is 10-15 minutes.
10. Use of the high-strength chemically strengthened photosensitive glass-ceramics according to any one of claims 1 to 4 and the high-strength chemically strengthened photosensitive glass-ceramics prepared according to the preparation method of the high-strength chemically strengthened photosensitive glass-ceramics according to any one of claims 5 to 9 in the back cover and casing of mobile devices.
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