Transmission mechanism protection structure of vacuum reaction cavity

Abstract

The invention provides a transmission mechanism protection structure of a vacuum reaction cavity, and relates to the technical field of semiconductor equipment. The device comprises an outer cavity and an inner cavity which are designed to be nested, and further comprises a heating device and a rotating mechanism, the outer cavity is arranged outside the inner cavity in a sleeving mode, and a gas filling gap is formed between the outer cavity and the inner cavity; the heating device is arranged on the outer side of the outer cavity so as to transfer heat into the inner cavity through heat conduction and heat radiation of the outer cavity. The problems of particle pollution, space occupation, uneven temperature, limited applicability and the like can be remarkably solved, and the operation reliability and maintenance convenience of equipment are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and in particular to a transmission mechanism protection structure of a vacuum reaction chamber. Background Art

[0002] In existing thermal ALD processes, isolation methods such as seals or shaft seals are typically used to protect the rotating mechanism, labyrinthine piping is used to delay the impact on the rotating mechanism, or magnetically coupled rotary drives are used, either singly or in combination, to isolate the reaction gas. Due to limitations in material properties, process conditions, and cost, using isolation methods to protect the transmission structure in thermal ALD processes can generate particles during rotation that can impact the process. Using labyrinthine piping for isolation can also create space and particles generated by the ALD reaction within the labyrinthine piping that can impact the process. Magnetic coupled rotary drives are limited by their inherent parameters and cannot be widely used. Summary of the Invention

[0003] The present invention discloses a transmission mechanism protection structure of a vacuum reaction chamber, aiming to solve the above-mentioned problems.

[0004] The present invention adopts the following scheme: A transmission mechanism protection structure for a vacuum reaction chamber, comprising an outer chamber and an inner chamber, and further comprising: a heating device and a rotating mechanism, wherein the outer chamber is sleeved outside the inner chamber, and a gas-filled gap is formed between the outer chamber and the inner chamber; the heating device is arranged outside the outer chamber to transfer heat to the inner chamber through heat conduction and heat radiation from the outer chamber; The rotating mechanism includes a magnetic fluid sealed on the outer cavity, a rotating disk rotatably connected to the inner cavity, and a transmission shaft connecting the magnetic fluid and the rotating disk, wherein the magnetic fluid is suitable for driving the rotating disk to rotate through the transmission shaft; The outer cavity is provided with an air inlet channel connected to the gas-filled gap, and the gas-filled gap is connected to the assembly gap between the rotating disk and the inner cavity. By continuously inputting filling gas into the gas-filled gap so that the air pressure in the gas-filled gap is higher than the pressure in the inner cavity, the precursor is prevented from entering the assembly gap.

[0005] Furthermore, a precursor source inlet channel is provided on one side of the air inlet channel, the precursor source inlet channel extends into the inner cavity, and the precursor source inlet channel is located above the rotating disk so that the precursor reacts in the inner cavity.

[0006] Furthermore, the rotating mechanism is provided with a tail exhaust port on the other side of the air inlet channel for extracting the filling gas from the precursor.

[0007] Furthermore, the tail exhaust port includes a first exhaust port and a second exhaust port, the first exhaust port is connected to the inner cavity, the second exhaust port is connected to the gas filling gap, and is suitable for adjusting and controlling the extraction speed of the precursor and filling gas by adjusting the cross-sectional area of ​​the first exhaust port and the second exhaust port.

[0008] Furthermore, it also includes a first pressure detection device and a second pressure detection device, the first pressure detection device is arranged in the air inlet channel or the gas filling gap to detect the pressure of the filling gas, and the second pressure detection device is arranged in the inner cavity or at the source channel to detect the pressure of the precursor.

[0009] Furthermore, the magnetic fluid is externally connected to a water-cooling protection device, and the filling gas is suitable for flowing into the assembly gap to heat the rotating disk and the transmission shaft.

[0010] Furthermore, the diameter of the rotating disk body is 2 to 3.5 times the diameter of the rotating disk mounting hole in the inner cavity, so that the filling gas entering the inner cavity is kept below the rotating disk, thereby reducing the interference of the filling gas on the precursor.

[0011] Furthermore, the flow rate of the filling gas is adjustable in the range of 1 to 10 torr.

[0012] Furthermore, the heating device includes a plurality of heat sources close to the outer wall of the outer cavity to heat the outer cavity.

[0013] Furthermore, the gas-filled gap is less than 1 mm.

[0014] Beneficial effects: This solution involves directly placing an outer cavity over the outer surface of the inner cavity, positioning a heating device outside the outer cavity, and providing a gas-filled gap between the outer and inner cavities. This gap accelerates heat transfer to the inner cavity, while also allowing the gas to flow through the gap between the drive shaft, rotating disk, and inner cavity to heat the drive shaft and rotating disk, bringing the temperature of the rotating disk and the inner cavity closer together, thereby improving process stability and uniformity. Furthermore, the gas pressure of the filling gas is greater than the pressure inside the inner cavity, preventing precursors from leaking through the assembly gap and affecting equipment safety. Therefore, the reaction chamber of this solution has a simple structure, is easy to maintain, and is less restricted by temperature and process reaction gases. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a schematic structural diagram of a transmission mechanism protection structure of a vacuum reaction chamber according to an embodiment of the present invention; Figure 2This is another structural schematic diagram of a transmission mechanism protection structure of a vacuum reaction chamber according to an embodiment of the present invention; Figure 3 This is a schematic diagram of the gas flow direction of a transmission mechanism protection structure of a vacuum reaction chamber according to an embodiment of the present invention; Figure markings: 1. First heat source, 2. Second heat source, 3. Third heat source, 4. Fourth heat source, 5. Fifth heat source, 6. Magnetic fluid, 7. Drive shaft, 8. Rotating disk, 9. Outer cavity, 10. Inner cavity, 11. Filling gas, 12. Air inlet channel, 13. Precursor, 14. Gas filling gap, 15. Assembly gap, 16. Source inlet channel, 17 / 18 / 19. First pressure detection device, 20 / 21 / 22. Second pressure detection device, 23. Tail exhaust port. DETAILED DESCRIPTION

[0016] Combine Figures 1 to 3 As shown, this embodiment provides a transmission mechanism protection structure for a vacuum reaction chamber, comprising an outer chamber 9 and an inner chamber 10, and further comprising: a heating device and a rotating mechanism, wherein the outer chamber 9 is sleeved outside the inner chamber 10, and a gas-filled gap 14 is formed between the outer chamber 9 and the inner chamber 10; the heating device is arranged outside the outer chamber 9 to transfer heat to the inner chamber 10 through heat conduction and heat radiation of the outer chamber 9; The rotating mechanism includes a magnetic fluid 6 sealed on the outer cavity 9, a rotating disk 8 rotatably connected to the inner cavity 10, and a transmission shaft 7 connecting the magnetic fluid 6 and the rotating disk 8, wherein the magnetic fluid 6 is suitable for driving the rotating disk 8 to rotate through the transmission shaft 7; The outer cavity 9 is provided with an air inlet channel 12 connected to the gas filling gap 14, and the gas filling gap 14 is connected to the assembly gap 15 between the rotating disk 8 and the inner cavity 10. By continuously inputting filling gas 11 into the gas filling gap 14 so that the air pressure of the gas filling gap 14 is higher than the pressure in the inner cavity 10, the precursor 13 is prevented from entering the assembly gap 15.

[0017] In this embodiment, the magnetic fluid 6 is an existing device, which can achieve a good sealing effect and drive the transmission shaft 7 to rotate. The heating device adopts an existing heating structure, and specifically can adopt a resistance heating belt or an induction coil to achieve temperature control, and is provided with multiple heat sources close to the outside of the outer cavity 9. For example, a first heat source 1, a second heat source 2, a third heat source 3, a fourth heat source 4, and a fifth heat source 5 are provided to be close to the upper and lower front and back left and right sides of the outer cavity 9. By heating the outer cavity 9, the heat is then transferred to the inner cavity 10 through heat conduction and heat radiation of the outer cavity 9. This structural setting can reduce the space required to be reserved inside the outer cavity 9. On the one hand, it is convenient for maintenance of the equipment, and on the other hand, it also saves the volume space required for the cavity, and the heat transfer effect is basically unaffected.

[0018] The sleeve structure of the outer cavity 9 and the inner cavity 10 forms an annular gas channel. The heat generated by the heating device is conducted to the gas filling gap 14 through the outer cavity 9, and then transferred to the inner cavity 10. When the filling gas 11 is continuously input into the gas filling gap 14, a gas pressure layer higher than the process chamber is formed. This pressure difference effectively blocks the precursor 13 from penetrating into the rotating shaft area. The gas pressure gradient is used to form a non-contact isolation layer, which fundamentally eliminates the source of friction particles. Compared with the complex flow channel of the maze structure, this solution achieves effective sealing through a single annular gap, which significantly simplifies the equipment structure. Compared with the speed limit of the magnetic coupling drive, this solution adopts a direct transmission method, which expands the operating parameter range of the equipment.

[0019] A precursor 13 source channel 16 is provided on one side of the air inlet channel 12 , and the precursor 13 source channel 16 extends into the inner cavity 10 , and the precursor 13 source channel 16 is located above the rotating disk 8 so that the precursor 13 reacts in the inner cavity 10 .

[0020] The precursor 13 source channel 16 refers to a gas channel for transporting the special precursor 13 into the inner cavity 10, and its air inlet can be set in the area above the rotating disk 8, for example, an independent pipe is used to extend to the inside of the inner cavity 10; through this design, the precursor 13 can fully react in the inner cavity 10, avoiding the filling gas 11 from interfering with the process. Among them, the same or similar position air intake means that the air inlets of the special precursor 13 and the filling gas 11 are set in the same area or adjacent areas. The same flow direction convection means that the flow direction of the precursor 13 and the filling gas 11 is consistent, for example, both flow along the axial direction of the rotating disk 8; through this design, a stable airflow barrier can be formed near the transmission mechanism to prevent the precursor 13 from diffusing back to the non-process area.

[0021] After the precursor 13 enters the inner cavity 10 through the source inlet channel 16, it reacts in the process chamber above the rotating disk 8, and the filling gas 11 enters the gas filling gap 14 from an adjacent position and is confined to the area below the rotating disk 8. Since the two gas inlet positions are close and the flow directions are consistent, the filling gas 11 forms a continuous airflow below the rotating disk 8, blocking the precursor 13 from diffusing toward the transmission mechanism. During this process, most of the filling gas 11 flows only in the non-reactive area and will not interfere with the deposition or reaction process of the precursor 13. At the same time, the tail exhaust system discharges the two gases synchronously to avoid residue. It should be noted that the trace amount of filling gas 11 here has no effect on the process. For example, the flow rate of the filling gas 11 entering the 60L inner cavity 10 is generally below 50sccm, which will not affect the process.

[0022] The rotating mechanism is provided with a tail exhaust port 23 on the other side of the air inlet channel 12 for extracting the filling gas 11 from the precursor 13. The tail exhaust port 23 refers to an exhaust structure provided at a specific position of the cavity, which can be implemented by a pipe interface with a regulating valve. Its function is to actively discharge the filling gas 11 and the residual precursor 13 after the reaction to avoid gas accumulation in the cavity causing pollution or pressure imbalance. The rotating mechanism on the other side of the air inlet channel 12 means that the tail exhaust port 23 and the air inlet channel 12 are symmetrically or diagonally distributed on the cavity, thereby forming a stable flow path in which the filling gas 11 enters from the front end and is discharged from the rear end. This setting can make the flow direction of the precursor 13 and the filling gas 11 the same. By setting the tail exhaust port 23, after the filling gas 11 enters the gas filling gap 14 from the air inlet channel 12 near the source channel 16 of the precursor 13, it flows toward the tail exhaust port 23 driven by the air pressure difference, and at the same time carries the precursor 13 mixed gas after the reaction in the inner cavity 10 and discharges it together. The suction effect of the tail exhaust port 23 can maintain the dynamic pressure balance between the gas filling gap 14 and the inner cavity 10, and prevent the precursor 13 from back-diffusion to the assembly gap 15 between the drive shaft 7 and the rotating disk 8, thereby avoiding the precursor 13 from depositing or reacting inside the rotating mechanism. Through the active extraction mechanism of the tail exhaust port 23, combined with the relative distribution layout of the air inlet channel 12 and the exhaust port, a directional airflow barrier is formed, which effectively blocks the migration of the precursor 13 to the non-process area. Directed removal of the filling gas 11 and the precursor 13 is achieved, preventing the precursor 13 from depositing or reacting in the contact area between the transmission shaft 7 and the rotating disk 8, reducing particle contamination caused by gas residue, and maintaining the dynamic balance of pressure inside and outside the cavity, thereby improving the long-term operation stability of the rotating mechanism in a high-temperature vacuum environment.

[0023] In this embodiment, the tail exhaust port 23 includes a first exhaust port and a second exhaust port. The first exhaust port is connected to the inner cavity 10, and the second exhaust port is connected to the gas-filled gap 14. The exhaust port is suitable for adjusting and controlling the extraction speed of the precursor 13 and the filling gas 11 by adjusting the cross-sectional area of ​​the first exhaust port and the second exhaust port. The first exhaust port refers to an exhaust structure directly connected to the inner cavity 10. Specifically, a pipe can be used to connect the interior of the inner cavity 10 to discharge the reacted precursor 13 and by-products. The second exhaust port refers to an exhaust structure connected to the gas-filled gap 14. Specifically, an independent pipe can be used to connect the gap area to discharge the protective filling gas 11. Cross-sectional area adjustment refers to the size control of the flow cross-section of the exhaust port. Specifically, it can be achieved by an adjustable valve or a variable aperture device. By adjusting the ratio of the two, the exhaust speed of the precursor 13 and the filling gas 11 can be controlled respectively. During the process, the filling gas 11 continuously enters the gas-filled gap 14 to form a high-pressure area, and the pressure difference prevents the precursor 13 from penetrating into the assembly gap 15. The first exhaust port actively extracts the precursor 13 in the inner cavity 10, and the second exhaust port simultaneously extracts the filling gas 11 in the gap. By adjusting the cross-sectional areas of the two exhaust ports, the extraction speed ratio of the precursor 13 and the filling gas 11 can be controlled separately. For example, increasing the cross-sectional area of ​​the first exhaust port accelerates the discharge of the precursor 13, while maintaining the cross-sectional area of ​​the second exhaust port to stabilize the pressure of the filling gas 11. In this way, a dynamically balanced airflow barrier is formed around the rotating disk 8, which not only prevents the precursor 13 from overflowing and contaminating the transmission mechanism, but also prevents the filling gas 11 from excessively entering the process chamber and interfering with the reaction. In addition, by dynamically adjusting the extraction speed ratio, it is possible to adapt to changes in gas flow in different process stages, thereby improving the reliability of system operation and process consistency.

[0024] In a preferred embodiment, a first pressure detection device 17 / 18 / 19 and a second pressure detection device 20 / 21 / 22 are also included. The first pressure detection device can be arranged at the air inlet channel 12 to detect the pressure of the filling gas 11, and the second pressure detection device can be arranged in the inner cavity 10 or at the source channel 16 to detect the pressure of the precursor 13.

[0025] The first pressure detection device 17 / 18 / 19 refers to a device for obtaining the pressure data of the filling gas 11 in real time, which can be implemented by a piezoelectric sensor or a capacitive pressure transmitter. By integrating the sensor in the air inlet channel 12 or setting it in the gas filling gap 14, the dynamic pressure signal of the gas flow is directly collected. The function of this device is to provide a feedback basis for the pressure regulation of the filling gas 11, ensuring that the air pressure of the gas filling gap 14 is stably higher than the pressure in the inner cavity 10. The second pressure detection device 20 / 21 / 22 refers to a device for monitoring the pressure state of the precursor 13 in the inner cavity 10 or the exhaust path, which can be implemented by a diaphragm pressure sensor or an optical fiber pressure sensor, capturing the pressure changes in the flow environment of the precursor 13 in real time. The function of this device is to establish pressure balance monitoring between the inner cavity 10 and the filling gas 11 area to prevent the precursor 13 from diffusing to the assembly gap 15 due to pressure anomalies.

[0026] This embodiment allows precise control of the pressure gradient between the fill gas 11 and the precursor 13, effectively preventing the precursor 13 from intruding into the rotating mechanism. The distributed layout of the pressure detection devices not only covers key nodes along the gas flow path but also allows for flexible adjustment of monitoring locations to meet different process requirements. This significantly reduces the risk of corrosion or contamination of the transmission mechanism while maintaining stable operation of the vacuum reaction chamber.

[0027] In this embodiment, the magnetic fluid 6 is externally connected to a water-cooling protection device, and the filling gas 11 is suitable for flowing into the assembly gap 15 to heat the rotating disk 8 and the transmission shaft 7. The water-cooling protection device refers to a circulating cooling system arranged on the outside of the magnetic fluid 6, which can be specifically implemented by an annular cooling pipeline that wraps the outer shell of the magnetic fluid 6. The water-cooling protection device continuously discharges the heat generated by the magnetic fluid 6 during operation through the circulation of coolant to prevent the magnetic fluid 6 from being mechanically damaged due to high temperature. In this process, the problem of affecting the transmission shaft 7 and the rotating disk 8 will be affected, and the process temperature will be affected. However, in the present application, since the filling gas 11 is arranged under the action of heat conduction and heat radiation of the outer cavity 9, the temperature of the filling gas 11 is close to that of the outer cavity 9. When it flows to the assembly gap 15, the transmission shaft 7 and the rotating disk 8 can be heated to supplement the problem of temperature drop caused by the water-cooling protection device on the transmission shaft 7 and the rotating disk 8, which helps to improve the uniformity of the reaction.

[0028] In a preferred embodiment, the diameter of the rotating disk 8 is 2 to 3.5 times the diameter of the mounting hole of the rotating disk 8 in the inner cavity 10, so that the filling gas 11 entering the inner cavity 10 is kept below the rotating disk 8, thereby reducing the interference of the filling gas 11 on the precursor 13. This ratio range enables the rotating disk 8 to form a covering and blocking effect on the entrance of the mounting hole, blocking the filling gas 11 from directly entering the process area. Among them, the filling gas 11 is kept below the rotating disk 8 means that the gas forms a retention layer in the gap between the rotating disk 8 and the inner cavity 10, and the retention layer forms a physical isolation barrier to prevent the filling gas 11 from diffusing upward to the reaction area of ​​the precursor 13. In the internal space of the inner cavity 10, the diameter of the rotating disk 8 is much larger than the aperture of the mounting hole, so that an annular blocking area is formed around the mounting hole. After the filling gas 11 enters the inner cavity 10 through the gas filling gap 14, it is blocked by the rotating disk 8 and cannot rise vertically to the process area where the precursor 13 is located, and can only diffuse toward the periphery along the lower surface of the rotating disk 8. When the gas reaches the edge of the rotating disk 8, its trajectory has deviated from the main reaction space of the process area. At this point, the tail exhaust port 23 can directly discharge the gas. In this way, the filling gas 11 is always confined to the non-process area below the rotating disk 8, avoiding contact interference with the depositing precursor 13. This solution directly utilizes the rotating assembly's inherent structure to form a gas isolation barrier by matching the dimensions of the rotating disk 8 and the mounting hole, eliminating the need for additional sealing devices. This simplifies the equipment structure and eliminates the risk of particle contamination caused by seal wear.

[0029] In this embodiment, the flow rate of the filling gas 11 is adjustable in the range of 1 to 10 torr. By controlling the input flow rate of the filling gas 11, the pressure in the gas-filled gap 14 is dynamically maintained at a state higher than the internal pressure of the inner cavity 10. When the gas is continuously input into the air inlet channel 12, the flow regulation system automatically adjusts the valve opening according to the real-time pressure changes in the inner cavity 10. For example, when the pressure in the inner cavity 10 fluctuates, the gas flow rate is quickly compensated to ensure that the filling gas 11 always overflows from the assembly gap 15 at a stable pressure. The dynamic air curtain formed by this pressure difference can effectively block the precursor 13 from diffusing toward the rotating mechanism, while preventing excessive gas from flowing into the process area and affecting the coating reaction.

[0030] Furthermore, the gas-filled gap 14 is less than 1 mm. Its size is designed to be less than 1 mm to form a compact sealed space, maintaining a higher pressure of the filling gas 11 in the gas-filled gap 14, thereby effectively preventing the precursor 13 from penetrating into the assembly gap 15. A stable high-pressure area is formed in the gap by continuously inputting the filling gas 11. Due to the small size of the gap and the limited gas flow path, the filling gas 11 can be evenly distributed in the gap with higher efficiency and form a pressure barrier, preventing the precursor 13 from entering the interior of the rotating mechanism through the assembly gap 15. At the same time, the smaller gap reduces the amount of filling gas 11 used, avoids excessive gas interfering with the reaction environment in the process chamber, ensures that the reaction process of the precursor 13 in the inner cavity 10 is not affected by gas diffusion, and is conducive to the radiation and conduction of heat from the outer cavity 9 to the inner cavity 10.

[0031] This embodiment achieves reliable protection of the transmission mechanism with reduced space occupancy and lower gas consumption, while maintaining a stable reaction environment within the process chamber. This reduces the risk of particle contamination caused by the precursor 13 penetrating the assembly gap 15, thereby improving the stability of the coating process and product yield. The entire reaction chamber has a simple structure, is easy to maintain, and is less restricted by temperature and process reaction gases.

[0032] It should be understood that the above are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention.

[0033] The above description of the drawings used in the implementation manner only shows certain embodiments of the present invention and should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without making any creative efforts.

Claims

1. A transmission mechanism protection structure for a vacuum reaction chamber, comprising an outer chamber and an inner chamber, characterized in that: Also includes: A heating device and a rotating mechanism, wherein the outer cavity is sleeved outside the inner cavity, and a gas-filled gap is formed between the outer cavity and the inner cavity; the heating device is arranged outside the outer cavity to transfer heat to the inner cavity through heat conduction and heat radiation of the outer cavity; The rotating mechanism includes a magnetic fluid sealed on the outer cavity, a rotating disk rotatably connected to the inner cavity, and a transmission shaft connecting the magnetic fluid and the rotating disk, wherein the magnetic fluid is suitable for driving the rotating disk to rotate through the transmission shaft; An air inlet channel connected to the gas-filled gap is provided on one side of the rotating mechanism, and the gas-filled gap is connected to the assembly gap between the rotating disk and the inner cavity. By continuously inputting filling gas into the gas-filled gap so that the air pressure in the gas-filled gap is higher than the pressure in the inner cavity, the precursor is prevented from entering the assembly gap.

2. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 1, characterized in that: A precursor source inlet channel is provided on one side of the air inlet channel, and the precursor source inlet channel extends into the inner cavity. The precursor source inlet channel is located above the rotating disk so that the precursor reacts in the inner cavity.

3. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 2, characterized in that: The rotating mechanism is provided with a tail exhaust port on the other side of the air inlet channel for extracting the filling gas from the precursor.

4. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 3, characterized in that: The tail exhaust port includes a first exhaust port and a second exhaust port, the first exhaust port is connected to the inner cavity, the second exhaust port is connected to the gas filling gap, and is suitable for adjusting and controlling the extraction speed of the precursor and filling gas by adjusting the cross-sectional area of ​​the first exhaust port and the second exhaust port.

5. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 4, characterized in that: It also includes a first pressure detection device and a second pressure detection device. The first pressure detection device is arranged in the air inlet channel or the gas filling gap to detect the pressure of the filling gas, and the second pressure detection device is arranged in the inner cavity or at the source channel to detect the pressure of the precursor.

6. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 1, characterized in that: The magnetic fluid is externally connected to a water-cooling protection device, and the filling gas is suitable for flowing into the assembly gap to heat the rotating disk and the transmission shaft.

7. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 1, characterized in that: The diameter of the rotating disk body is 2 to 3.5 times the diameter of the rotating disk mounting hole in the inner cavity, so that the filling gas entering the inner cavity is kept below the rotating disk, thereby reducing the interference of the filling gas on the precursor.

8. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 1, characterized in that: The flow rate of the filling gas is adjustable in the range of 1 to 10 torr.

9. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 1, characterized in that: The heating device includes a plurality of heat sources closely attached to the outer wall of the outer cavity to heat the outer cavity.

10. The transmission mechanism protection structure of the vacuum reaction chamber according to claim 1, characterized in that: The gas-filled gap is less than 1 mm.

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