Tail gas treatment equipment for chemical material laboratory
By introducing filtration, combustion and buffer technology into the exhaust gas treatment equipment of chemical laboratory, the problems of impurity interference and short reaction time are solved, efficient purification of exhaust gas is achieved, the harm to staff and the environment is reduced, and the treatment is improved efficiency.
Patent Information
- Application Number
- CN202420612976.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-28
- Publication Date
- 2024-12-06
- Estimated Expiration
- 2034-03-28
AI Technical Summary
During the purification process, the exhaust gas treatment devices of existing chemical laboratories are not fully removed due to impurities interference and short reaction time, which harms the staff and the environment.
A exhaust gas treatment device including a filter device, a combustion device and a buffer is designed to remove impurities through filtration, burn harmful gases, and control gas input through a buffer to ensure that the exhaust gas and the treatment liquid are fully reacted.
Effectively remove impurities and harmful gases in the exhaust gas, improve the purification rate, reduce the harm to staff and the environment, and reduce labor maintenance costs.
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Figure CN222111259U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of chemical laboratory equipment, in particular to tail gas treatment equipment for chemical material laboratories. Background Art
[0002] Chemical experiments are an indispensable process in the study of chemical materials. Chemical laboratory staff will produce a large amount of toxic and harmful gases when doing experiments. If these toxic and harmful gases are directly discharged into the outdoor atmosphere, it will cause serious air pollution. Although the laboratory is relatively safe, the concentration of pollutants emitted by some experiments during chemical experiments is much higher than that of general outdoor and indoor air. As a chemical researcher, most of the time in life is spent in the laboratory, so they are more susceptible to the adverse effects of pollutants.
[0003] Existing waste gas emission treatment devices for chemical laboratories include pump water mist absorption devices, pumpless water curtain absorption devices and dry adsorption absorption devices. The principle is to form a spray through the reaction liquid to absorb pollutants in the waste gas, or to adsorb harmful substances into the medium body when passing through the adsorption medium, so that the purified gas is separated from the harmful substances. However, because the waste gas contains impurities such as dust, it will affect the spraying effect during the spraying process of the reaction liquid, resulting in insufficient waste gas purification treatment. When the amount of waste gas is too large, the contact reaction time between the reaction liquid and the waste gas will be short, so that the waste gas still contains harmful substances, which will cause harm to the staff and the surrounding environment. Therefore, in order to solve the above problems, the utility model proposes an exhaust gas treatment equipment for chemical material laboratories. Utility Model Content
[0004] In view of the deficiencies in the prior art, the utility model provides an exhaust gas treatment device for a chemical material laboratory. Impurities in the exhaust gas are first removed through a filtering device to prevent the impurities from interfering with the purification treatment of the exhaust gas. The combustion device oxidizes harmful gases in the exhaust gas. The heated exhaust gas can catalyze subsequent chemical treatments to increase the purification rate of the device. A buffer can use a spring to input a quantitative amount of gas into the treatment device, so that the exhaust gas can fully react with the treatment liquid in the subsequent treatment device.
[0005] The utility model provides the following technical solutions: an exhaust gas treatment device for a chemical material laboratory, comprising a base, a supporting plate fixedly installed on the left upper end of the base, a filter fixedly installed on the upper part of the supporting plate, a filter plate movably sleeved in the inner cavity of the filter, the number of the filter plates is two and evenly distributed, a cover plate fixedly installed on the upper end of the filter plate, the cover plate is arranged on the upper surface of the filter, an armrest is fixedly connected to the upper part of the cover plate, and a valve 1 is fixedly installed on the right part of the filter.
[0006] Preferably, a combustion chamber is fixedly installed on the right part of valve one, and the combustion chamber is fixedly installed on the upper part of the base. Combustion devices are fixedly installed on the upper and lower parts of the inner cavity of the combustion chamber respectively, and there are two combustion devices. A flame nozzle is fixedly installed on the side of the combustion device away from the inner wall of the combustion chamber cavity. There are four flame nozzles and they are evenly distributed on the combustion device, and valve two is fixedly installed on the right part of the combustion chamber.
[0007] Preferably, the right part of valve 2 is connected to fan 1 through a pipeline, a support frame is fixedly installed on the upper part of the base, the support frame is located on the right side of fan 1 and there are two of them, a buffer is fixedly installed on the upper part of the support frame, the left part of the buffer is connected to fan 1 through a pipeline, an upper air port is opened on the upper part of the buffer, a spring is fixedly installed on the right part of the buffer inner cavity, a piston is fixedly installed on the left end of the spring, and the piston is movably sleeved in the buffer inner cavity.
[0008] Preferably, a spray chamber is fixedly installed on the upper part of the base, and the spray chamber is located to the right of the support frame. A valve three is fixedly installed on the left part of the spray chamber, and the valve three is connected to the upper air inlet through a pipe. A water tank is fixedly installed on the upper part of the spray chamber, and a sprayer is fixedly installed on the upper part of the inner cavity of the spray chamber, and the sprayer is located directly below the water tank. A spray head is fixedly connected to the lower part of the sprayer, and the number of the spray heads is five and they are evenly and equidistantly distributed. A filter is fixedly installed on the lower part of the inner cavity of the spray chamber, and a valve four is fixedly installed on the right part of the spray chamber.
[0009] Preferably, the right part of the valve four is connected to the fan two through a pipeline, a purification chamber is fixedly installed on the upper part of the base, the purification chamber is located to the right of the fan two, the purification chamber and the fan two are connected through a pipeline, an air outlet pipe is fixedly sleeved on the left part of the inner cavity of the purification chamber, an air outlet is fixedly installed on the bottom end of the air outlet pipe, the air outlet is located in the inner cavity of the purification chamber, and an exhaust port is fixedly installed on the upper part of the purification chamber through a pipeline.
[0010] Compared with the prior art, the utility model has the following beneficial effects:
[0011] 1. Through the filtering device, impurities are removed from the exhaust gas before chemical treatment to prevent impurities from interfering with the subsequent purification of the exhaust gas. The filter plate is set to be quick-disassembled, which is convenient for the staff to replace and maintain the filter plate, so that the labor cost is reduced. The harmful gas in the exhaust gas is oxidized through the combustion device to reduce the harm of the exhaust gas to the device and surrounding workers. At the same time, the heated exhaust gas can play a catalytic role in the subsequent chemical treatment, speeding up the chemical purification process, so that the purification rate of the device is improved.
[0012] 2. By setting a buffer, when the air pressure in the buffer is high, it will provide thrust to the piston, causing the piston to move and compress the spring, opening the upper air port and inputting gas into the air guide pipe. After the air pressure in the buffer drops, the piston will reset under the action of the elastic potential energy of the spring to close the upper air port and disconnect the connection between the device and the pipeline. In this way, a certain amount of gas can be input into the subsequent processing device, so that the gas generated by the chemical reaction can be fully processed by the processing liquid in the subsequent processing device, avoiding the short contact reaction time between the reaction liquid and the exhaust gas when the exhaust gas volume is too large, thereby improving the efficiency of the device in processing exhaust gas. BRIEF DESCRIPTION OF THE DRAWINGS
[0013] Figure 1 This is a schematic diagram of the exterior structure of the utility model;
[0014] Figure 2 It is a schematic diagram of the left section structure of the utility model;
[0015] Figure 3 It is a schematic diagram of the cross-sectional structure of the middle part of the utility model;
[0016] Figure 4 It is a schematic diagram of the right section structure of the utility model.
[0017] In the figure: 1. base; 2. supporting plate; 3. filter; 4. filter plate; 51. cover plate; 52. handrail; 6. valve one; 7. combustion chamber; 8. combustion device; 9. flame nozzle; 10. valve two; 11. fan one; 12. support frame; 131. buffer; 132. upper air inlet; 14. spring; 15. piston; 16. spray chamber; 17. valve three; 18. water tank; 19. sprinkler; 20. nozzle; 21. filter screen; 22. valve four; 23. fan two; 24. purification chamber; 251. exhaust pipe; 252. outlet; 26. exhaust port. DETAILED DESCRIPTION
[0018] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0019] See also Figure 1-Figure 4, an exhaust gas treatment equipment for a chemical material laboratory, comprising a base 1, a supporting plate 2 is fixedly installed on the left end of the upper part of the base 1, a filter 3 is fixedly installed on the upper part of the supporting plate 2, a filter plate 4 is movably sleeved in the inner cavity of the filter 3, the number of the filter plates 4 is two and evenly distributed, a cover plate 51 is fixedly installed on the upper end of the filter plate 4, the cover plate 51 is arranged on the upper surface of the filter 3, and a handrail 52 is fixedly connected to the upper part of the cover plate 51, a valve 6 is fixedly installed on the right part of the filter 3, a combustion chamber 7 is fixedly installed on the right part of the valve 6, the combustion chamber 7 is fixedly installed on the upper part of the base 1, and combustion devices 8 are fixedly installed on the upper and lower parts of the inner cavity of the combustion chamber 7, respectively, and the number of the combustion devices 8 is two, and a flamethrower 9 is fixedly installed on the side of the combustion device 8 away from the inner wall of the combustion chamber 7 cavity, and the number of the flamethrowers 9 is four and when the combustion is The exhaust gas to be treated is connected to the filter 3 through a pipeline, filtered through the filter plate 4, and the valve 6 is opened to allow the exhaust gas to enter the inner cavity of the combustion chamber 7. The valve 6 is closed, and the combustion device 8 is opened to allow the flame to be ejected from the flame port 9. By filtering, impurities are prevented from interfering with the subsequent purification of the exhaust gas. The filter plate 4 is set to be quickly disassembled, which is convenient for the staff to replace and maintain the filter plate, so that the labor cost is reduced. The harmful gas in the exhaust gas is oxidized by the combustion device 8, reducing the harm of the exhaust gas to the device and the surrounding staff. At the same time, the heated exhaust gas can play a catalytic role in the subsequent chemical treatment, speeding up the processing speed of chemical purification, so that the purification rate of the device is improved;
[0020] The right part of the valve 2 10 is connected with the fan 11 through a pipeline, and a support frame 12 is fixedly installed on the upper part of the base 1. The support frame 12 is located on the right side of the fan 11 and there are two of them. A buffer 131 is fixedly installed on the upper part of the support frame 12. The left part of the buffer 131 is connected with the fan 11 through a pipeline. An upper air port 132 is opened on the upper part of the buffer 131. A spring 14 is fixedly installed on the right part of the inner cavity of the buffer 131. A piston 15 is fixedly installed on the left end of the spring 14. The piston 15 is movably sleeved in the inner cavity of the buffer 131. When the exhaust gas is fully burned and heated, the valve 2 10 and the fan 11 are opened to allow the exhaust gas to enter the buffer. In the inner cavity of the buffer 131, as the exhaust gas in the inner cavity of the buffer 131 increases, the air pressure increases, pushing the piston 15 to move to the right, and the spring 14 contracts to generate elastic potential energy. When the piston 15 moves to the right part of the inner cavity of the buffer 131, the upper air port 132 opens to discharge the gas. As the air pressure decreases, the piston 15 returns to its original position under the elastic potential energy of the spring 14. In this way, a certain amount of gas can be input into the subsequent processing device, so that the gas generated by the chemical reaction can be fully processed by the processing liquid in the subsequent processing device, avoiding the short contact reaction time between the reaction liquid and the exhaust gas when the exhaust gas volume is too large, thereby improving the efficiency of the device in processing exhaust gas;
[0021] A spray chamber 16 is fixedly installed on the upper part of the base 1, and the spray chamber 16 is located directly to the right of the support frame 12. A valve three 17 is fixedly installed on the left part of the spray chamber 16, and the valve three 17 is connected to the upper air port 132 through a pipeline. A water tank 18 is fixedly installed on the upper part of the spray chamber 16, and a sprayer 19 is fixedly installed on the upper part of the inner cavity of the spray chamber 16. The sprayer 19 is located directly below the water tank 18. A nozzle 20 is fixedly connected to the lower part of the sprayer 19. The number of the nozzles 20 is five and they are evenly and equidistantly distributed. A filter 21 is fixedly installed on the lower part of the inner cavity of the spray chamber 16, and a valve four 22 is fixedly installed on the right part of the spray chamber 16. The right part of the valve four 22 is connected to the fan two 23 through a pipeline. A purification chamber 24 is fixedly installed on the upper part of the base 1, and the purification chamber 24 is located directly to the right of the fan two 23. The purification chamber 24 is connected to The fans 23 are connected by pipelines, an air outlet pipe 251 is fixedly sleeved on the left part of the inner cavity of the purification chamber 24, an air outlet 252 is fixedly installed on the bottom end of the air outlet pipe 251, and the air outlet 252 is located in the inner cavity of the purification chamber 24. An exhaust port 26 is fixedly installed on the upper part of the purification chamber 24 through a pipeline. The valve 3 17 is opened to allow the exhaust gas to enter the inner cavity of the spray chamber 16, the valve 3 17 is closed, the sprayer 19 is opened to allow the treatment liquid to be sprayed out from the nozzle 20, and the treatment liquid after reacting with the exhaust gas is stored at the bottom of the inner cavity of the spray chamber 16 after passing through the filter 21. The valve 4 22 and the fan 23 are opened, so that the exhaust gas after spraying treatment enters the purification chamber 24 through the air outlet pipe 251 and the air outlet 252, reacts with the treatment liquid in the purification chamber 24, and the purified gas is discharged through the exhaust port 26.
[0022] Working principle: the tail gas to be treated is connected to the filter 3 through the pipeline, filtered through the filter plate 4, and the valve 16 is opened to allow the tail gas to enter the inner cavity of the combustion chamber 7. The valve 16 is closed, and the combustion device 8 is opened to spray flames from the flame nozzle 9. When the tail gas is fully burned and heated, the valve 2 10 and the fan 11 are opened to allow the tail gas to enter the inner cavity of the buffer 131. As the tail gas in the inner cavity of the buffer 131 increases, the air pressure increases, pushing the piston 15 to move to the right, and the spring 14 contracts to generate elastic potential energy. When the piston 15 moves to the right part of the inner cavity of the buffer 131, the upper air port 132 is opened. Open to discharge gas, as the air pressure decreases, the piston 15 returns to its original position under the action of the elastic potential energy of the spring 14, the valve three 17 is opened to allow the exhaust gas to enter the inner cavity of the spray chamber 16, the valve three 17 is closed, the sprayer 19 is opened to allow the treatment liquid to be sprayed out from the nozzle 20, and the treatment liquid after reacting with the exhaust gas is stored at the bottom of the inner cavity of the spray chamber 16 after passing through the filter screen 21, the valve four 22 and the fan two 23 are opened, so that the exhaust gas after spraying treatment enters the purification chamber 24 through the outlet pipe 251 and the outlet 252, reacts with the treatment liquid in the purification chamber 24, and the purified gas is discharged through the exhaust port 26.
Claims
1. An exhaust gas treatment device for a chemical material laboratory, comprising a base (1), characterized in that: A support plate (2) is fixedly mounted on the left upper end of the base (1), a filter (3) is fixedly mounted on the upper part of the support plate (2), a filter plate (4) is movably sleeved in the inner cavity of the filter (3), the number of the filter plates (4) is two and they are evenly distributed, a cover plate (51) is fixedly mounted on the upper end of the filter plate (4), the cover plate (51) is arranged on the upper surface of the filter (3), the upper part of the cover plate (51) is fixedly connected with a handrail (52), a valve (6) is fixedly mounted on the right part of the filter (3), a combustion chamber (7) is fixedly mounted on the right part of the valve (6), the combustion chamber (7) is fixedly mounted on the upper part of the base (1), a combustion device (8) is fixedly mounted on the upper and lower parts of the inner cavity of the combustion chamber (7), the number of the combustion devices (8) is two, and the combustion device (8) is fixed on the side away from the inner wall of the cavity of the combustion chamber (7). A flame-spraying port (9) is installed, the number of the flame-spraying ports (9) is four and they are evenly distributed on the combustion device (8), a valve 2 (10) is fixedly installed on the right part of the combustion chamber (7), the right part of the valve 2 (10) is connected to a fan 1 (11) through a pipeline, a support frame (12) is fixedly installed on the upper part of the base (1), the support frame (12) is located on the right side of the fan 1 (11) and the number is two, a buffer (131) is fixedly installed on the upper part of the support frame (12), the left part of the buffer (131) is connected to the fan 1 (11) through a pipeline, an upper air port (132) is opened on the upper part of the buffer (131), a spring (14) is fixedly installed on the right part of the inner cavity of the buffer (131), a piston (15) is fixedly installed on the left end of the spring (14), and the piston (15) is movably sleeved in the inner cavity of the buffer (131).
2. The tail gas treatment equipment for chemical material laboratory according to claim 1, characterized in that: A spray chamber (16) is fixedly mounted on the upper part of the base (1), and the spray chamber (16) is located directly to the right of the support frame (12). A valve three (17) is fixedly mounted on the left part of the spray chamber (16), and the valve three (17) is connected to the upper air port (132) through a pipeline. A water tank (18) is fixedly mounted on the upper part of the spray chamber (16), and a sprayer (19) is fixedly mounted on the upper part of the inner cavity of the spray chamber (16), and the sprayer (19) is located directly below the water tank (18). A spray head (20) is fixedly connected to the lower part of the sprayer (19), and the number of the spray heads (20) is five and they are evenly and equidistantly distributed. A filter screen (21) is fixedly mounted on the lower part of the inner cavity of the spray chamber (16), and a valve four (22) is fixedly mounted on the right part of the spray chamber (16).
3. The tail gas treatment equipment for chemical material laboratory according to claim 2, characterized in that: The right part of the valve four (22) is connected to the fan two (23) through a pipeline, and a purification chamber (24) is fixedly installed on the upper part of the base (1). The purification chamber (24) is located to the right of the fan two (23). The purification chamber (24) and the fan two (23) are connected through a pipeline. An air outlet pipe (251) is fixedly sleeved on the left part of the inner cavity of the purification chamber (24), and an air outlet (252) is fixedly installed at the bottom end of the air outlet pipe (251). The air outlet (252) is located in the inner cavity of the purification chamber (24). An exhaust port (26) is fixedly installed on the upper part of the purification chamber (24) through a pipeline.
Citation Information
Cited By
Tail gas treatment equipment for chemical laboratory
CN223914953U
