Drying device for wafer cleaning

Abstract

The drying device comprises a base, a drying chamber is arranged at the upper end of the base, a rotating shaft is rotationally installed on the upper surface of the base, the top of the rotating shaft is rotationally connected with the top in the drying chamber, a fixing sleeve is fixedly arranged on the periphery of the rotating shaft in a sleeved mode, and a connecting rod is fixedly installed on the outer surface of the fixing sleeve. A containing frame is fixedly installed at the end, away from the fixing sleeve, of the connecting rod, a cavity is formed in the base, a motor is fixedly installed in the cavity, the lower end of the rotating shaft penetrates through the upper surface of the base, extends into the cavity and is fixedly connected with the output end of the motor, and air drying openings are formed in the opposite side walls of the two sides of the drying chamber correspondingly. A sealing door is rotationally mounted on the outer surface of one side, without the air drying opening, of the drying chamber; the motor drives the rotating shaft to rotate so as to drive the connecting rod and the placing frame to rotate, so that the rotating shaft stirs hot air in the drying box, the surface of the wafer is dried uniformly, flowing of the hot air on the surface of the wafer is accelerated through rotation, and the drying speed of the wafer is accelerated.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer drying, in particular to a drying device for wafer cleaning. Background Art

[0002] During the wafer production process, it needs to be repeatedly washed with water to ensure the cleanliness of the wafer surface. After each washing, the moisture on the wafer surface needs to be removed to ensure the dryness of the wafer surface. Wafer drying is roughly divided into spin drying and drying. Drying equipment is widely used and can dry the wafer in a static state, avoiding damage to the wafer surface due to mechanical action.

[0003] However, during the drying process, the wafer's position remains unchanged, and the drying is unevenly distributed in the drying chamber, resulting in slow drying speed and uneven surface drying. In addition, the wafer needs to be placed on a support plate, so the lower surface of the wafer is in contact with the support plate, and the upper and lower surfaces of the wafer cannot be dried at the same time. The wafer needs to be turned over to dry it thoroughly. Utility Model Content

[0004] The utility model aims to provide a drying device for wafer cleaning, which effectively solves the problems of slow drying speed and uneven surface drying, and can dry the upper and lower surfaces of the wafer at the same time, has a simple structure and strong practicality.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a drying device for wafer cleaning, comprising a base, support columns are fixedly installed at the four corners of the bottom of the base, a drying chamber is arranged at the upper end of the base, a rotating shaft is rotatably installed on the upper surface of the base, the top of the rotating shaft is rotatably connected to the top of the drying chamber, a fixing sleeve is provided on the outer peripheral fixed sleeve of the rotating shaft, a connecting rod is fixedly installed on the outer surface of the fixing sleeve, the connecting rod is horizontally arranged, a placing rack is fixedly installed on the end of the connecting rod away from the fixing sleeve, a cavity is provided inside the base, a motor is fixedly installed in the cavity, the lower end of the rotating shaft extends through the upper surface of the base into the cavity and is fixedly connected to the output end of the motor, air-drying openings are opened on the opposite side walls of the drying chamber, and a sealing door is rotatably installed on the outer surface of one side of the drying chamber where the air-drying opening is not opened.

[0006] First, place the wafer to be dried on the placement rack, then close the sealed door and allow hot air to enter the drying chamber from the air drying port, then start the motor to drive the shaft to rotate, the shaft drives the fixed sleeve and the connecting rod to rotate, thereby driving the placement rack and the wafer to rotate. The rotation of the connecting rod can also stir the hot air in the drying box, thereby speeding up the drying of the wafer and drying the wafer surface evenly. The structure is simple and practical.

[0007] Preferably, a bearing is fixedly mounted on the top inner wall of the drying chamber, and the upper end of the rotating shaft is rotatably connected to the bearing.

[0008] Preferably, the placement rack comprises a placement ring and a support frame, the end of the connecting rod away from the fixing sleeve is fixedly connected to the outer surface of the placement ring, the placement ring is horizontally arranged, and the support frame is fixedly installed at the bottom of the inner wall of the placement ring, and the support frame is hollowed out. The bottom of the support frame is hollowed out so that the hot air in the drying chamber can dry the lower surface of the wafer.

[0009] Preferably, the fixing sleeves are provided with a plurality of fixed sleeves at equal intervals and fixedly mounted on the outer circumference of the rotating shaft, at least two connecting rods are fixedly mounted on the outer surface of each fixing sleeve, and a placement rack is fixedly mounted on one end of each connecting rod away from the fixing sleeve. By providing a plurality of placement racks, a plurality of wafers can be placed in the drying chamber at the same time, and the plurality of wafers can be dried at the same time, thereby improving work efficiency.

[0010] Preferably, the connecting rods on each two adjacent fixing sleeves are staggered. The staggered setting of the connecting rods can enable two wafers adjacent to each other in the vertical direction to be staggered, thereby increasing the space on the upper surface of the wafer, improving air flow, and facilitating the placement of the wafers.

[0011] Preferably, the bottom of the cavity extends downward to the outside of the base, and a fixing plate is provided below the base at a position corresponding to the cavity, and the fixing plate is fixed to the lower surface of the base by bolts.

[0012] Preferably, the bottom of the motor is fixedly connected to the upper surface of the fixing plate. The fixing plate is provided to facilitate the fixing of the motor in the cavity of the base.

[0013] Preferably, the outside of the air-drying port is fixedly connected with an air-drying duct, and one end of the air-drying duct away from the air-drying port is externally connected to an air-drying device. Hot air generated by the air-drying device enters the drying chamber through the air-drying duct and the air-drying port.

[0014] Preferably, an observation window and a handle are fixedly mounted on the sealed door. The observation window is convenient for the staff to observe the working conditions in the drying room, and the handle is convenient for the staff to open the sealed door.

[0015] Compared with the prior art, the utility model adopts the above technical solution and has the following technical effects:

[0016] The utility model is provided with a motor, a rotating shaft, a connecting rod and a placing rack. The motor drives the rotating shaft to rotate, thereby driving the connecting rod and the placing rack to rotate, so that the rotating shaft stirs the hot air in the drying box, and the placing rack drives the wafer to rotate, so that the wafer can be dried with the same effect at various positions, the surface of the wafer is dried evenly, and the flow of hot air on the surface of the wafer is accelerated by rotation, thereby accelerating the drying speed of the wafer; by arranging a hollow supporting rack, the upper and lower surfaces of the wafer can both contact with the hot air, and the upper and lower surfaces of the wafer can be dried at the same time, the structure is simple and practical. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a front cross-sectional schematic diagram of the utility model;

[0018] Figure 2 It is a front view schematic diagram of the utility model;

[0019] Figure 3 It is a structural schematic diagram of the rotating shaft and the placement rack of the utility model.

[0020] Explanation of the accompanying drawings: 1. base; 2. support column; 3. drying chamber; 4. rotating shaft; 5. fixing sleeve; 6. connecting rod; 7. placement rack; 8. cavity; 9. motor; 10. air-drying port; 11. sealing door; 12. bearing; 13. placement ring; 14. support frame; 15. fixing plate; 16. air-drying duct; 17. observation window; 18. handle. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0022] It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings of this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the conditions under which this application can be implemented. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed in this application without affecting the effects and purposes that can be achieved by this application.

[0023] See also Figure 1-3The utility model provides a technical solution: it includes a base 1, support columns 2 are fixedly installed at the four corners of the bottom of the base 1, a drying chamber 3 is arranged at the upper end of the base 1, a rotating shaft 4 is rotatably installed on the upper surface of the base 1, the top of the rotating shaft 4 is rotatably connected to the top in the drying chamber 3, a fixed sleeve 5 is provided on the outer periphery of the rotating shaft 4, a connecting rod 6 is fixedly installed on the outer surface of the fixing sleeve 5, the connecting rod 6 is horizontally arranged, and a placing rack 7 is fixedly installed on one end of the connecting rod 6 away from the fixing sleeve 5, a cavity 8 is arranged inside the base 1, a motor 9 is fixedly installed in the cavity 8, the lower end of the rotating shaft 4 passes through the upper surface of the base 1 and extends into the cavity 8 and is fixedly connected to the output end of the motor 9, air-drying ports 10 are opened on the opposite side walls of the drying chamber 3, and a sealing door 11 is rotatably installed on the outer surface of one side of the drying chamber 3 where the air-drying port 10 is not opened.

[0024] A bearing 12 is fixedly mounted on the top inner wall of the drying chamber 3 , and the upper end of the rotating shaft 4 is rotatably connected to the bearing 12 .

[0025] The placement frame 7 includes a placement ring 13 and a support frame 14. The end of the connecting rod 6 away from the fixing sleeve 5 is fixedly connected to the outer surface of the placement ring 13. The placement ring 13 is horizontally arranged. The support frame 14 is fixedly installed on the bottom of the inner wall of the placement ring 13. The support frame 14 is hollowed out.

[0026] A plurality of fixing sleeves 5 are provided and fixedly installed at equal intervals on the outer circumference of the rotating shaft 4 . At least two connecting rods 6 are fixedly installed on the outer surface of each fixing sleeve 5 . A placement frame 7 is fixedly installed on one end of each connecting rod 6 away from the fixing sleeve 5 .

[0027] The connecting rods 6 on every two adjacent fixing sleeves 5 are staggered.

[0028] The bottom of the cavity 8 extends downward to the outside of the base 1 . A fixing plate 15 is provided below the base 1 at a position corresponding to the cavity 8 . The fixing plate 15 is fixed to the lower surface of the base 1 by bolts.

[0029] The bottom of the motor 9 is fixedly connected to the upper surface of the fixing plate 15 .

[0030] An air-drying duct 16 is fixedly connected to the outside of the air-drying port 10 , and one end of the air-drying duct 16 away from the air-drying port 10 is connected to an external air-drying device.

[0031] An observation window 17 and a handle 18 are fixedly mounted on the sealing door 11 .

[0032] Working principle or structural principle: first, place the wafer to be dried on the placement rack 7 in the drying chamber 3, then close the sealing door 11, start the external air-drying equipment, and the air-drying equipment will transport the hot air into the drying chamber 3 through the air-drying duct 16 and the air-drying port 10 to dry the wafer, start the motor 9, the motor 9 drives the rotating shaft 4 to rotate, the rotating shaft 4 drives the connecting rod 6 and the placement rack 7 to rotate, the placement rack 7 drives the wafer to rotate, and the hot air in the drying chamber 3 is stirred by the rotation of the connecting rod 6 to accelerate the flow of hot air on the surface of the wafer, so that the surface of the wafer is dried quickly, and the wafer can be dried with the same effect at each position, so that the surface of the wafer is dried evenly, the support frame 14 in the placement rack 7 is hollowed out, so that the upper and lower surfaces of the wafer can be exposed to the hot air, so that the upper and lower surfaces of the wafer can be dried at the same time. The device has a simple structure and strong practicality.

[0033] So far, the embodiments of the utility model have been described in detail in conjunction with the accompanying drawings. It should be noted that the implementation methods not shown or described in the drawings or the body of the specification are all forms known to ordinary technicians in the relevant technical field and are not described in detail. In addition, the above definitions of each component are not limited to the various specific structures, shapes or methods mentioned in the embodiments, and ordinary technicians in the field can simply change or replace them.

[0034] Those skilled in the art will appreciate that the features described in the various embodiments and / or claims of the present invention may be combined and / or combined in various ways, even if such combinations and / or combinations are not explicitly described in the present invention. In particular, the features described in the various embodiments and / or claims of the present invention may be combined and / or combined in various ways without departing from the spirit and teachings of the present invention. All of these combinations and / or combinations fall within the scope of the present invention.

[0035] The specific embodiments described above further illustrate the purpose, technical solutions and beneficial effects of the present invention. It should be understood that the above description is only a specific embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A drying device for wafer cleaning, comprising a base (1), characterized in that: Support columns (2) are fixedly installed at the four corners of the bottom of the base (1); a drying chamber (3) is arranged at the upper end of the base (1); a rotating shaft (4) is rotatably installed on the upper surface of the base (1); the top of the rotating shaft (4) is rotatably connected to the top of the drying chamber (3); a fixing sleeve (5) is provided on the outer peripheral fixed sleeve of the rotating shaft (4); a connecting rod (6) is fixedly installed on the outer surface of the fixing sleeve (5); the connecting rod (6) is arranged horizontally and is away from the fixing sleeve (5). ) is fixedly mounted on one end of the base (1), a cavity (8) is arranged inside the base (1), a motor (9) is fixedly mounted inside the cavity (8), the lower end of the rotating shaft (4) passes through the upper surface of the base (1) and extends into the cavity (8) and is fixedly connected to the output end of the motor (9), air-drying openings (10) are provided on the opposite side walls of the drying chamber (3), and a sealing door (11) is rotatably mounted on the outer surface of one side of the drying chamber (3) that does not have the air-drying opening (10).

2. The wafer cleaning drying device according to claim 1, characterized in that: A bearing (12) is fixedly mounted on the top inner wall of the drying chamber (3), and the upper end of the rotating shaft (4) is rotatably connected to the bearing (12).

3. The wafer cleaning drying device according to claim 1, characterized in that: The placement frame (7) comprises a placement ring (13) and a support frame (14); one end of the connecting rod (6) away from the fixing sleeve (5) is fixedly connected to the outer surface of the placement ring (13); the placement ring (13) is arranged horizontally; the support frame (14) is fixedly mounted on the bottom of the inner wall of the placement ring (13); and the support frame (14) is arranged in a hollow shape.

4. The wafer cleaning drying device according to claim 3, characterized in that: The fixing sleeves (5) are provided with a plurality of fixed sleeves (5) which are evenly spaced and fixedly mounted on the outer circumference of the rotating shaft (4); at least two connecting rods (6) are fixedly mounted on the outer surface of each fixing sleeve (5); and a placement frame (7) is fixedly mounted on one end of each connecting rod (6) away from the fixing sleeve (5).

5. The wafer cleaning drying device according to claim 4, characterized in that: The connecting rods (6) on each two adjacent fixing sleeves (5) are staggered.

6. The wafer cleaning drying device according to claim 1, characterized in that: The bottom of the cavity (8) extends downward to the outside of the base (1); a fixing plate (15) is provided below the base (1) at a position corresponding to the cavity (8); the fixing plate (15) is fixed to the lower surface of the base (1) by bolts.

7. The wafer cleaning drying device according to claim 6, characterized in that: The bottom of the motor (9) is fixedly connected to the upper surface of the fixing plate (15).

8. The drying device for wafer cleaning according to claim 1, characterized in that: The outside of the air-drying port (10) is fixedly connected to an air-drying duct (16), and one end of the air-drying duct (16) away from the air-drying port (10) is externally connected to an air-drying device.

9. The wafer cleaning drying device according to claim 1, characterized in that: An observation window (17) and a handle (18) are fixedly mounted on the sealed door (11).

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