Tempered glass, preparation method therefor and use thereof

Abstract

Tempered glass, a preparation method therefor and the use thereof. The difference between the average density of an exposed region and the average density of a non-exposed region of the tempered glass is controlled within a certain range, so as to achieve a balance between the density of the exposed region and the density of the non-exposed region, thereby reducing the amount of deformation of the tempered glass during thermal treatment while increasing the light transmittance difference between the exposed region and the non-exposed region, and thus reducing the degree of warpage of the tempered glass.

Description

Strengthened glass and method of manufacture and use thereof

[0001] Cross-reference to Related Applications

[0002] The present disclosure claims priority to the Chinese patent application No. 202410740153.3, filed on June 7, 2024, and entitled “Strengthened glass and method of manufacture and use thereof”, the content of which is incorporated herein by reference in its entirety. TECHNICAL FIELD

[0003] The present disclosure relates to the technical field of glass, in particular, to a strengthened glass and a method of manufacture and use thereof. BACKGROUND

[0004] Strengthened glass is a glass material that undergoes structural changes under the irradiation of light at a specific wavelength and exhibits special properties. When irradiated with ultraviolet light, the strengthened glass undergoes structural changes inside, and then generates crystal nuclei. After further heat treatment at a certain temperature, the irradiated area generates glass with specific component microcrystals. The component microcrystals in the irradiated area have the characteristics of weakening the intensity of transmitted light and shielding the light source.

[0005] After the strengthened glass is subjected to ultraviolet exposure and heat treatment, an opaque area that blocks light can be formed in the exposed area. The light transmittance of this area is low, and compared with the matrix glass of the unexposed part, it has the performance of blocking light. Therefore, when the strengthened glass is applied to the cover plate of a mobile phone, by designing the structure of the strengthened glass, the light emitted by adjacent LEDs can be prevented from interfering with each other, thereby avoiding the formation of the phenomenon of light leakage.

[0006] Currently, the research on strengthened glass mainly focuses on reducing the light transmittance of the ultraviolet exposure area of the material. However, during the heat treatment of the base glass, there is a problem that large-size base glass is prone to irregular deformation, which increases the warpage and reduces the yield.

[0007] It should be noted that this part of the present disclosure only provides background technology related to the present disclosure, and does not necessarily constitute prior art or common knowledge. SUMMARY

[0008] The purpose of the present disclosure is to provide a strengthened glass that can achieve the balance of the density of the exposed area and the non-exposed area, and thereby realize the expansion of the light transmittance difference between the exposed area and the non-exposed area while reducing the warpage of the glass.

[0009] In order to achieve the above-mentioned purpose, the present disclosure provides the following technical solutions:

[0010] In a first aspect, a strengthened glass is provided, the strengthened glass being obtained by processing a substrate glass; the substrate glass comprising a first region and a second region, the first region being subjected to a masking treatment, and the first region and the second region being subjected to a processing treatment to obtain a non-exposed region and an exposed region, respectively, wherein the second region is a region that is not subjected to the masking treatment; wherein the first region of the substrate glass corresponds to the first region of the strengthened glass, and the second region of the substrate glass corresponds to the second region of the strengthened glass.

[0011] The processing treatment comprises a radiation treatment, a thermal treatment, and a strengthening treatment.

[0012] The strengthened glass comprises the exposed region and the non-exposed region, the average density p1 of the exposed region is greater than the average density p2 of the non-exposed region, and the difference Ap between the average density p1 of the exposed region and the average density p2 of the non-exposed region is ≤ 0.01 g / cm 3 , preferably the difference Ap is ≤ 0.005 g / cm 3 .

[0013] As an optional embodiment, the processing treatment further comprises one or more of cutting, CNC machining, grinding and polishing, cleaning, 3D thermal bending, and edge polishing before the chemical strengthening.

[0014] As an optional embodiment, the average density p1 of the exposed region satisfies 2.0000 g / cm 3 ≤ p1 ≤ 3.0000 g / cm 3 , preferably 2.3000 g / cm 3 ≤ p1 ≤ 2.7000 g / cm 3 , more preferably 2.3000 g / cm 3 ≤ p1 ≤ 2.5000 g / cm 3 ; and / or,

[0015] The average density p2 of the non-exposed region satisfies 2.0000 g / cm 3 ≤ p2 ≤ 3.0000 g / cm 3 , preferably 2.3000 g / cm 3 ≤ p2 ≤ 2.7000 g / cm 3 , more preferably 2.4000 g / cm 3 ≤ p2 ≤ 2.5000 g / cm 3 .

[0016] As an optional embodiment, the average density p1 of the exposed region is 2.4714 g / cm 3 , 2.4846 g / cm 32.4896 g / cm 3 2.4872 g / cm 3 2.4918 g / cm 3 2.4964 g / cm 3 2.4753 g / cm 3 2.4832 g / cm 3 ; and / or,

[0017] The average density p2 of the non-exposed area is 2.4709 g / cm 3 2.4796 g / cm 3 2.4826 g / cm 3 2.4806 g / cm 3 2.4893 g / cm 3 2.4932 g / cm 3 2.4704 g / cm 3 2.4736 g / cm 3 .

[0018] As an optional embodiment, the difference Ap between the average density pi of the exposed area and the average density p2 of the non-exposed area is 0.0005 g / cm 3 0.005 g / cm 3 0.007 g / cm 3 0.0066 g / cm 3 0.0025 g / cm 3 0.0032 g / cm 3 0.0049 g / cm 3 0.0096 g / cm 3 .

[0019] As an optional embodiment, the average crystal content X C1 in the exposed area is greater than the average crystal content X C2 in the non-exposed area; and / or,

[0020] The average crystal content X C1 in the exposed area satisfies 3.00%≤ X C1 ≤ 25.00%, preferably 4.00%≤ X C1 ≤ 20.00%, more preferably 4.00%≤ X C1 ≤ 15.00% in terms of mass percentage; and / or,

[0021] The average crystal content X C2 in the non-exposed area satisfies 0.50%≤ X C2≤ 20.00%, preferably 1.00% < X C2 ≤ 18.00%, more preferably 1.40% < X C2 ≤ 13.00%.

[0022] As an optional embodiment, the surface CS of the strengthened glass is above 300 MPa, preferably above 350 MPa.

[0023] As an optional embodiment, the CS_50 of the strengthened glass is between 50 MPa and 100 MPa, preferably between 55 MPa and 95 MPa.

[0024] As an optional embodiment, the average crystalline content X in the exposed area, in mass percentage, is between 4.00% and 20.00%, preferably between 1.00% and 15.00%, more preferably between 1.00% and 10.00%, even more preferably between 1.00% and 8.00%, and most preferably between 1.00% and 6.00%. C1 4.27%, 7.12%, 8.31%, 7.53%, 10.23%, 14.42%, 5.42% or 6.32%; and / or,

[0025] As an optional embodiment, the average crystalline content X in the non-exposed area, in mass percentage, is between 0.00% and 20.00%, preferably between 0.00% and 15.00%, more preferably between 0.00% and 10.00%, even more preferably between 0.00% and 8.00%, and most preferably between 0.00% and 6.00%. C2 1.49%, 5.14%, 6.35%, 5.65%, 8.54%, 12.53%, 3.56% or 4.45%.

[0026] As an optional embodiment, the composition of the strengthened glass, in mass percentage of oxides, comprises: SiO2: 65.00% - 75.00%, Al2O3: 5.00% - 10.00%, Li2O: 7.00% - 13.00%, Na2O: 2.00% - 4.00%, K2O: 2.00% - 4.00%, ZrO2: 5.00% - 7.00%, X: 0.05% - 0.80%, CeO2: 0.05% - 0.13%, and Sb2O3: 0% - 0.50%;

[0027] wherein X is Ag, Cu, Au, Bi and / or their respective oxides.

[0028] As an optional embodiment, the composition of the strengthened glass, in mass percentage of oxides, comprises:

[0029] the mass percentage of SiO2 is between 66.00% and 74.50%, preferably the mass percentage of SiO2 is between 66.50% and 74.00%; and / or,

[0030] the mass percentage of Al2O3 is between 5.10% and 9.70%, preferably the mass percentage of Al2O3 is between 5.20% and 9.40%; and / or,

[0031] the mass percent of Li2O is 7.10% to 12.80%, preferably the mass percent of Li2O is 7.10% to 12.80%; and / or,

[0032] the mass percent of Na2O is 2.10% to 3.80%, preferably the mass percent of Na2O is 2.10% to 3.60%; and / or,

[0033] the mass percent of K2O is 2.10% to 3.95%, preferably the mass percent of K2O is 2.10% to 3.90%; and / or,

[0034] the mass percent of ZrO2 is 5.10% to 6.90%, preferably the mass percent of ZrO2 is 5.10% to 6.80%; and / or,

[0035] the mass percent of Ag2O is 0.05% to 0.80%, preferably the mass percent of Ag2O is 0.22% to 0.48%; and / or,

[0036] the mass percent of CeO2 is 0.05% to 0.12%, preferably the mass percent of CeO2 is 0.06% to 0.12%; and / or,

[0037] the mass percent of Sb2O3 is 0.06% to 0.48%, preferably the mass percent of Sb2O3 is 0.07% to 0.46%.

[0038] As an alternative embodiment, the composition of the strengthened glass comprises, in mass percent of oxide:

[0039] the mass percent of SiO2 is 66.93%, 68.16%, 70.07%, 72.61%, 70.01%, 73.52%, 69.94%, or 72.40%; and / or,

[0040] the mass percent of Al2O3 is 7.19%, 9.19%, 7.86%, 5.23%, 7.87%, 7.35%, 8.36%, or 5.87%; and / or,

[0041] the mass percent of Li2O is 12.32%, 11.56%, 8.95%, 10.25%, 8.93%, 7.33%, 9.77%, or 9.80%; and / or,

[0042] the mass percent of Na2O is 3.47%, 2.14%, 3.11%, 2.66%, 3.08%, 2.41%, 2.32%, or 2.84%; and / or,

[0043] a mass percentage of K2O of 3.83%, 3.02%, 3.72%, 2.42%, 3.74%, 2.15%, 3.34%, or 2.34%; and / or,

[0044] a mass percentage of ZrO2of 5.62%, 5.12%, 5.74%, 6.25%, 5.71%, 6.78%, 5.54%, or 5.77%; and / or,

[0045] a mass percentage of Ag2O of 0.25%, 0.41%, 0.37%, 0.35%, 0.39%, 0.33%, 0.28%, or 0.43%; and / or,

[0046] a mass percentage of CeO2of 0.12%, 0.08%, 0.09%, 0.11%, 0.06%, 0.10%, or 0.12%; and / or,

[0047] a mass percentage of Sb2O3of 0.27%, 0.32%, 0.09%, 0.12%, 0.16%, 0.07%, 0.35%, or 0.43%.

[0048] As an optional embodiment, the exposed region has a low transmittance in the infrared wavelength range, and the non-exposed region has a high transmittance in the infrared wavelength range; and / or,

[0049] At a thickness of 0.70 mm, the exposed region has a transmittance T1 of less than 20% for 550 nm wavelength light, preferably a transmittance T1 of less than 10%, further preferably a transmittance T1 of less than 5%, more preferably T1 is 0, and the non-exposed region has a transmittance T2 of more than 90%; and / or,

[0050] At a thickness of 0.70 mm, the exposed region has a transmittance T3 of 0% to 10% for 850 nm wavelength light, preferably a transmittance T3 of less than 5%, and the non-exposed region has a transmittance T4 of more than 90%; and / or,

[0051] At a thickness of 0.70 mm, the exposed region has a transmittance T5 of 0% to 5% for 1000 nm wavelength light, and the non-exposed region has a transmittance T6 of more than 90%.

[0052] As an optional embodiment, the exposed region has a crystal phase including one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystal, Cu nanocrystal, Au nanocrystal, Bi nanocrystal; and / or,

[0053] The main crystal phase of the non-exposed region comprises one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystal, Cu nanocrystal, Au nanocrystal, Bi nanocrystal.

[0054] In a second aspect, there is provided a method for preparing the strengthened glass as described above, the method comprising:

[0055] obtaining a substrate glass; masking a first region of the substrate glass and not masking a second region of the substrate glass, and then processing the first region and the second region to obtain a non-exposed region and an exposed region, respectively, the processing comprising radiation treatment, heat treatment and strengthening treatment; wherein the first region of the substrate glass corresponds to the first region of the strengthened glass, and the second region of the substrate glass corresponds to the second region of the strengthened glass;

[0056] The strengthened glass comprises the exposed region and the non-exposed region, the average density p1 of the exposed region is greater than the average density p2 of the non-exposed region, and the difference Δρ between the average density p1 of the exposed region and the average density p2 of the non-exposed region is ≤0.01 g / cm 3 , preferably ≤0.005 g / cm 3 .

[0057] As an optional embodiment, the average density p1 of the exposed region satisfies 2.0000 g / cm 3 ≤p1≤3.0000 g / cm 3 , preferably 2.3000 g / cm 3 ≤p1≤2.7000 g / cm 3 , more preferably 2.3000 g / cm 3 ≤p1≤2.5000 g / cm 3 ; and / or,

[0058] The average density p2 of the non-exposed region satisfies 2.0000 g / cm 3 ≤p2≤3.0000 g / cm 3 , preferably 2.3000 g / cm 3 ≤p2≤2.7000 g / cm 3 , more preferably 2.4000 g / cm 3 ≤p2≤2.5000 g / cm 3 .

[0059] As an optional embodiment, the average crystal content X C1 in the exposed region is greater than the average crystal content X C2 in the non-exposed region; and / or,

[0060] the average crystal content X in the exposed region in mass percentage C1 satisfies 3.00%≤X C1 ≤25.00%, preferably, 4.00%≤X C1 ≤20.00%, more preferably, 4.00%≤X C1 ≤15.00%; and / or,

[0061] the average crystal content X in the non-exposed region in mass percentage C2 satisfies 0.50%≤X C2 ≤20.00%, preferably, 1.00%≤X C2 ≤18.00%, more preferably, 1.40%≤X C2 ≤13.00%.

[0062] As an optional embodiment, the composition of the substrate glass comprises, in mass percentage of oxide: SiO2: 65.00%~75.00%, Al2O3: 5.00%~10.00%, Li2O: 7.00%~13.00%, Na2O: 2.00%~4.00%, K2O: 2.00%~4.00%, ZrO2: 5.00%~7.00%, X: 0.05%~0.80%, CeO2: 0.05%~0.13%, and Sb2O3: 0%~0.50%;

[0063] wherein X is Ag, Cu, Au, Bi and / or the oxide thereof respectively.

[0064] As an optional embodiment, the radiation treatment includes ultraviolet irradiation treatment.

[0065] As an optional embodiment, the wavelength of the ultraviolet irradiation treatment is 300nm~320nm; and / or,

[0066] the intensity of the ultraviolet irradiation treatment is 240mw / cm 2 ~260mw / cm 2 .

[0067] As an optional embodiment, the masking treatment includes masking using masking ink and / or mask plate.

[0068] As an optional embodiment, the heat treatment includes nucleation treatment and crystallization treatment.

[0069] As an optional embodiment, the heating rate of the nucleation treatment is 1℃ / min~10℃ / min; and / or,

[0070] the nucleation treatment has a temperature of 450°C to 600°C; and / or,

[0071] the nucleation treatment has a time of 180 min to 300 min; and / or,

[0072] the crystallization treatment has a temperature of 550°C to 800°C; and / or,

[0073] the crystallization treatment has a temperature of 550°C to 800°C; and / or,

[0074] the crystallization treatment has a time of 30 min to 180 min.

[0075] In a third aspect, there is provided a cover glass made of the strengthened glass according to any one of the embodiments of the first aspect.

[0076] In a fourth aspect, there is provided an electronic device comprising the strengthened glass according to any one of the embodiments of the first aspect.

[0077] As an optional embodiment, the electronic device comprises a housing assembled outside the electronic device, and the housing comprises the strengthened glass according to any one of the embodiments of the first aspect.

[0078] As an optional embodiment, the electronic device further comprises a camera assembly located inside the housing, and the housing comprises a camera protective cover plate covering the camera assembly, and the camera protective cover plate comprises the strengthened glass according to any one of the embodiments of the first aspect.

[0079] In some embodiments, the housing can be partially made of the strengthened glass or entirely made of the strengthened glass.

[0080] In a fifth aspect, there is provided a use of the strengthened glass according to any one of the embodiments of the first aspect or the method of manufacturing the strengthened glass according to any one of the embodiments of the second aspect in a component for a mobile phone, a smart watch, a wearable device, a camera module, or a vehicle.

[0081] Compared with the prior art, one or more of the above technical solutions provided by the present disclosure have the following advantages:

[0082] The present disclosure controls the difference Δρ between the average density ρ1 of the exposed area and the average density ρ2 of the non-exposed area of the strengthened glass to be less than or equal to 0.01 g / cm 3The exposure area and the non-exposure area density are balanced, and the difference in light transmittance between the exposure area and the non-exposure area is increased, and the deformation of the strengthened glass during the heat treatment process is reduced, and the warping degree of the strengthened glass is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0083] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the following will briefly introduce the drawings needed to be used in the embodiments. It should be understood that the following drawings only show some embodiments of the present disclosure, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0084] FIG. 1 is a structural schematic diagram of a mask provided by an embodiment of the present disclosure.

[0085] FIG. 2 is a structural schematic diagram of a single hole in a mask provided by an embodiment of the present disclosure.

[0086] FIG. 3 is a structural schematic diagram of a strengthened glass provided by an embodiment of the present disclosure.

[0087] FIG. 4 is a structural schematic diagram of the back side of an electronic device mentioned by an embodiment of the present disclosure.

[0088] FIG. 5 is a structural schematic diagram of an electronic device mentioned by an embodiment of the present disclosure.

[0089] FIG. 6 is a structural schematic diagram of an electronic device mentioned by an embodiment of the present disclosure.

[0090] FIG. 7 is a comparison diagram of XRD diffraction curves of the exposure area and the non-exposure area of a strengthened glass provided by Embodiment 1 of the present disclosure.

[0091] FIG. 8 is a comparison diagram of transmittance curves of the exposure area and the non-exposure area of a strengthened glass provided by Embodiment 7 of the present disclosure.

[0092] Reference signs: 1-outer shell; 12-back cover; 13-camera protection cover plate; 2-camera assembly; 3-middle frame; 4-display module; 5-mask; 51-light transmission area; 52-shading area; 6-strengthened glass; 61-exposure area; 62-non-exposure area. DETAILED DESCRIPTION

[0093] The embodiments of the present disclosure will be described in detail below with reference to the embodiments, but those skilled in the art will understand that the following embodiments are only used to illustrate the present disclosure and should not be regarded as limiting the scope of the present disclosure. The specific conditions are not specified in the embodiments, and the conventional conditions or the conditions recommended by the manufacturer are used. The reagents or instruments used are not specified by the manufacturer, and are conventional products that can be purchased on the market.

[0094] The endpoints of the ranges and any values disclosed herein are not limited to the precise values recited as the exact dimensions are not critical to the properties. The endpoints of the ranges and any values are provided as approximations only, and are understood to include values approximately around the recited values. For numeric ranges, the endpoints of the ranges, the endpoints of the ranges and individual point values, and individual point values can be combined with each other to generate one or more new numeric ranges, which should be considered as specifically disclosed herein. The terms "optionally" and "optional" mean that the subsequently described event or circumstance can or can not occur, or that the subsequently described event or circumstance can or can not be present. The term "and / or" as used herein is inclusive, e.g., "A and / or B" means A alone, B alone, or A and B.

[0095] Terminology and test methods:

[0096] In the present disclosure, the main surface refers to the surface with the largest surface area, such as the upper surface or the lower surface of a horizontally placed strengthened glass sheet.

[0097] In the present disclosure, the infrared wavelength range refers to 750 nm to 1000 nm.

[0098] In the present disclosure, when light of a certain wavelength is irradiated to the main surface of a strengthened glass, the light is reflected, absorbed, and transmitted, and the ratio of the intensity of the transmitted portion to the intensity of the incident light is the transmittance.

[0099] In the present disclosure, the crystallized glass raw material refers to a glass raw material that is heat-treated for a certain period of time to achieve a certain crystallinity, but has not yet reached the target crystallinity, and can continue to crystallize to reach the target crystallinity upon further heating.

[0100] In the present disclosure, the surface CS refers to the surface compressive stress or the surface compression stress. After chemical strengthening of the base glass, alkali metal ions with a small radius are replaced by alkali metal ions with a large radius, and due to the crowding effect of the alkali metal ions with a large radius, a compressive stress is generated on the surface of the glass, which is called surface compressive stress.

[0101] In the present disclosure, CS_50 refers to the compressive stress value at a depth of 50 μm from the surface of the glass.

[0102] In the present disclosure, the thickness of the glass is measured by a micrometer.

[0103] In the present disclosure, the density of the strengthened glass is measured by an electronic density balance SD-200L of Japan ALFAMIRAGE. The density of different positions of the same glass sheet is measured and the average density is taken.

[0104] In the present disclosure, the size of the glass sheet is measured by a two-dimensional measuring machine (instrument model Miyu MY-YXCL-4030).

[0105] In the present disclosure, the warpage of the glass is obtained by a laser thickness gauge test.

[0106] The surface CS is tested using FSM-6000 of Japan Sakura. The test conditions are: light source wavelength of 596 nm, SOC = 28.6 (nm / cm) / MPa, refractive index = 1.52.

[0107] The CS_50 is tested using a stress meter SLP-2000 of Japan Luceo (Japan Sakura). The test conditions are: light source wavelength of 518 nm, SOC = 28.6 (nm / cm) / MPa, refractive index = 1.52, exposure time: 5000 usec.

[0108] In the present disclosure, the crystalline phase and the crystalline content of the glass are confirmed by an XRD test as follows:

[0109] (1) XRD test: The strengthened glass of the present disclosure is crushed and ground into a sample with a particle size of less than 75 pm, and the ground sample is tested by an X-ray diffractometer to obtain an XRD diffraction peak curve and XRD diffraction data. The X-ray diffractometer used in the present disclosure is Shimadzu XRD-6100, the target material is copper, 2 theta = 10°-50°, the scanning speed is 6° / min, the working voltage is 40 kV, and the working current is 30 mA.

[0110] (2) Determination of crystalline phase: the XRD diffraction data are analyzed by Jade software (JADE Standard 8.6) to determine the crystalline phase in the sample.

[0111] (3) Determination of crystalline content (also known as crystallinity): the test results of XRD (RAW format) are imported into the X-ray diffraction data Rietveld refinement software Jade for fitting and calculation, so as to determine the crystallinity of the sample. Specifically, the ratio of the peak area of the fitted crystalline phase to the total peak area of the fitted sample is recorded as the crystalline content of the sample. The average crystalline content is obtained by testing the crystalline content of different positions of the same glass in the present disclosure.

[0112] In the present disclosure, the transmittance of the exposed area and the non-exposed area of the strengthened glass of the present disclosure is tested by an ultraviolet-visible spectrophotometer. Specifically, the transmittance of different wavelengths of light of the exposed area and the non-exposed area of 5 strengthened glasses in the same batch is tested by an ultraviolet-visible spectrophotometer. The average value of the transmittance of different wavelengths of light of the exposed area and the non-exposed area of the 5 strengthened glasses is recorded as the transmittance result of the exposed area and the non-exposed area of the strengthened glass at the wavelength of light. The ultraviolet-visible spectrophotometer used in the present disclosure is Shimadzu UV-2000 ultraviolet-visible spectrophotometer.

[0113] The present disclosure controls the difference between the average density of the exposed region and the average density of the non-exposed region of the strengthened glass to be within a certain range, thereby balancing the densities of the exposed region and the non-exposed region, and reducing the deformation of the strengthened glass during heat treatment while increasing the difference in light transmittance between the exposed region and the non-exposed region, and reducing the warpage of the strengthened glass.

[0114] In some embodiments of the present disclosure, a strengthened glass is provided, which is obtained by processing a base glass; the base glass comprises a first region and a second region, the first region is subjected to a masking treatment, and the first region and the second region are subjected to processing treatment to obtain a non-exposed region and an exposed region, respectively, wherein the second region is a region that is not subjected to the masking treatment, wherein the first region of the base glass corresponds to the first region of the strengthened glass, and the second region of the base glass corresponds to the second region of the strengthened glass; the processing treatment comprises radiation treatment, heat treatment and strengthening treatment;

[0115] The strengthened glass comprises the exposed region and the non-exposed region, the average density ρ1 of the exposed region is greater than the average density ρ2 of the non-exposed region, and the difference Δρ between the average density ρ1 of the exposed region and the average density ρ2 of the non-exposed region is ≤0.01 g / cm 3 , preferably the difference Δρ is ≤0.005 g / cm 3 .

[0116] In some embodiments of the present disclosure, the difference Δρ between the average density ρ1 of the exposed region and the average density ρ2 of the non-exposed region is 0.0001 g / cm 3 , 0.0005 g / cm 3 , 0.0010 g / cm 3 , 0.0050 g / cm 3 , 0.0070 g / cm 3 , 0.0066 g / cm 3 , 0.0025 g / cm 3 , 0.0032 g / cm 3 , 0.0049 g / cm 3 , 0.0070 g / cm 3 , 0.0080 g / cm 3 , 0.0096 g / cm 3 or 0.01 g / cm 3 , or a value within a range defined by any two of the above specific values as endpoints, as long as the strengthened glass with the required performance of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass with the required performance of the present disclosure can be obtained.

[0117] In some embodiments of the present disclosure, the average density p1 of the exposed region satisfies 2.0000 g / cm 3 ≤ p1≤ 3.0000 g / cm 3 , preferably, 2.3000 g / cm 3 ≤ p1≤ 2.7000 g / cm 3 , more preferably, 2.3000 g / cm 3 ≤ p1≤ 2.5000 g / cm 3 .

[0118] In some embodiments, the average density p1 of the exposed region is 2.1000 g / cm 3 , 2.2000 g / cm 3 , 2.3000 g / cm 3 , 2.4000 g / cm 3 , 2.5000 g / cm 3 , 2.6000 g / cm 3 , 2.7000 g / cm 3 , 2.8000 g / cm 3 , 2.9000 g / cm 3 , 3.0000 g / cm 3 , 2.4714 g / cm 3 , 2.4846 g / cm 3 , 2.4896 g / cm 3 , 2.4872 g / cm 3 , 2.4918 g / cm 3 , 2.4964 g / cm 3 , 2.4753 g / cm 3 , or 2.4832 g / cm 3 , or a value within a range defined by any two of the above specific values as endpoints, as long as a strengthened glass with the desired properties of the present disclosure is obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as a strengthened glass with the desired properties of the present disclosure is obtained.

[0119] In some embodiments of the present disclosure, the average density p2 of the non-exposed region satisfies 2.0000 g / cm 3 ≤ p2≤ 3.0000 g / cm 3 , preferably, 2.3000 g / cm 3 ≤ p2≤ 2.7000 g / cm 3 , more preferably, 2.4000 g / cm 3 ≤ p2≤ 2.5000 g / cm3 .

[0120] In some embodiments, the average density p2 of the non-exposed region is 2.1000 g / cm 3 , 2.2000 g / cm 3 , 2.3000 g / cm 3 , 2.4000 g / cm 3 , 2.5000 g / cm 3 , 2.6000 g / cm 3 , 2.7000 g / cm 3 , 2.8000 g / cm 3 , 2.9000 g / cm 3 , 3.0000 g / cm 3 , 2.4709 g / cm 3 , 2.4796 g / cm 3 , 2.4826 g / cm 3 , 2.4806 g / cm 3 , 2.4893 g / cm 3 , 2.4932 g / cm 3 , 2.4704 g / cm 3 , 2.4736 g / cm 3 , 2.4900 g / cm 3 , or 2.4950 g / cm 3 , or a value within a range defined by any two of the above specific values as endpoints, as long as a strengthened glass with the desired properties of the present disclosure is obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any of the other ranges, as long as a strengthened glass with the desired properties of the present disclosure is obtained.

[0121] In some embodiments of the present disclosure, the average crystal content X C1 in the exposed region of the strengthened glass is greater than the average crystal content X C2 in the non-exposed region.

[0122] In some embodiments of the present disclosure, the average crystal content X C1 in the exposed region satisfies 3.00% < X C1 ≤ 25.00%, preferably, 4.00% < X C1 ≤ 20.00%, more preferably, 4.00% < X C1 ≤ 15.00% in terms of mass percentage.

[0123] In some embodiments, the average crystal content X C1The percentages are 3.00%, 4.00%, 5.00%, 6.00%, 7.00%, 8.00%, 9.00%, 10.00%, 11.00%, 12.00%, 13.00%, 14.00%, 15.00%, 16.00%, 17.00%, 18.00%, 19.00%, 20.00%, 21.00%, 22.00%, 23.00%, 24.00%, 25.00%, 4.27%, 7.12%, 8.31%, 7.53%, 10.23%, 14.42%, 5.42%, or 6.32%, or any value within the range of any two of the above specific values ​​as endpoints, as long as the reinforced glass with the desired performance of this disclosure is obtained. It should be understood that, in specific implementations, any of the above ranges can be combined with any other ranges, as long as the reinforced glass with the performance required by this disclosure can be obtained.

[0124] In some embodiments of this disclosure, the average crystal content X in the unexposed region is expressed as a mass percentage. C2 Satisfying 0.50% ≤ X C2 ≤20.00%, preferably, 1.00%≤X C2 ≤18.00%, more preferably, 1.40%≤X C2 ≤13.00%.

[0125] In some implementations, the average crystal content X in the non-exposed region C2 The percentages are 0.50%, 1.00%, 2.00%, 3.00%, 4.00%, 5.00%, 6.00%, 7.00%, 8.00%, 9.00%, 10.00%, 11.00%, 12.00%, 13.00%, 14.00%, 15.00%, 16.00%, 17.00%, 18.00%, 19.00%, 20.00%, 1.49%, 5.14%, 6.35%, 5.65%, 8.54%, 12.53%, 3.56%, or 4.45%.

[0126] It should be understood that the tempered glass in this disclosure is made from a substrate glass through processing including radiation treatment, heat treatment (including nucleation treatment and crystallization treatment) and strengthening treatment. The composition of the substrate glass is the same as or substantially the same as that of the tempered glass in terms of the mass percentage of oxides.

[0127] In some embodiments of the present disclosure, the composition of the strengthened glass comprises, in mass percent of oxides: SiO2: 65.00% to 75.00%, Al2O3: 5.00% to 10.00%, Li2O: 7.00% to 13.00%, Na2O: 2.00% to 4.00%, K2O: 2.00% to 4.00%, ZrO2: 5.00% to 7.00%, X: 0.05% to 0.80%, CeO2: 0.05% to 0.13%, and Sb2O3: 0% to 0.50%;

[0128] wherein X is Ag (silver), Cu (copper), Au (gold), Bi (bismuth), and / or an oxide thereof, respectively. It is to be noted that X is Ag, Cu, Au, Bi, and / or an oxide thereof means that X is at least one of Ag, Cu, Au, Bi, AgO, CuO, AuO, and BiO.

[0129] In the present disclosure, SiO2 is a glass-forming oxide, which forms an irregular continuous network with a structural unit of silicon-oxygen tetrahedron, and is the skeleton of the glass. An increase in the content of SiO2 can increase the T g temperature, enhance the thermal stability, and is conducive to inhibiting phase separation during the heat treatment of the glass, but too much can result in a high viscosity and a high melting temperature of the glass. A decrease in the content of SiO2 is conducive to reducing the melting temperature of the glass and inhibiting the volatilization of components during the melting process of the glass, but too little can result in easy phase separation during the heat treatment of the glass, and the T g temperature will decrease and the thermal stability will deteriorate. In some embodiments of the present disclosure, the content of SiO2 in the composition of the strengthened glass or the base glass used to prepare the strengthened glass is 65.00% to 75.00%, preferably 66.00% to 74.50%, and more preferably 66.50% to 74.00%, in mass percent of oxides.

[0130] In some embodiments of the present disclosure, the content of Si02in the composition of the strengthened glass or the base glass used to prepare the strengthened glass can be 65.00%, 66.00%, 67.00%, 68.00%, 69.00%, 70.00%, 71.00%, 72.00%, 73.00%, 74.00%, 75.00%, 66.93%, 68.16%, 70.07%, 72.61%, 70.01%, 73.52%, 69.94%, or 72.40%, or a value within a range defined by any two of the above specific values as endpoints, as long as the strengthened glass or the base glass having the desired properties of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass or the base glass having the desired properties of the present disclosure can be obtained.

[0131] In the present disclosure, AI2O3is a glass network intermediate, entering the glass network structure as [AIO4] tetrahedron. Increasing AI2O3can increase the T g temperature, enhance thermal stability, and is beneficial to suppress phase separation during heat treatment of the glass, but too much AI2O3can increase the melting temperature of the glass. In some embodiments of the present disclosure, the content of AI2O3in the composition of the strengthened glass or the base glass used to prepare the strengthened glass can be 5.00% to 10.00%, preferably 5.10% to 9.70%, and more preferably 5.20% to 9.40%, by mass percent of oxides.

[0132] In some embodiments of the present disclosure, the content of AI2O3in the composition of the strengthened glass or the base glass used to prepare the strengthened glass can be 5.00%, 5.50%, 6.00%, 6.50%, 7.00%, 7.50%, 8.00%, 8.50%, 9.00%, 9.50%, 10.00%, 7.19%, 9.19%, 7.86%, 5.23%, 7.87%, 7.35%, 8.36%, or 5.87%, or a value within a range defined by any two of the above specific values as endpoints, as long as the strengthened glass or the base glass having the desired properties of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass or the base glass having the desired properties of the present disclosure can be obtained.

[0133] In this disclosure, alkali metal oxide Li₂O is the main component for crystal formation in the strengthened glass material, and it can also lower the glass melting temperature. In some embodiments of this disclosure, the mass percentage of Li₂O in the strengthened glass or the substrate glass used to prepare the strengthened glass is 7.00% to 13.00%, preferably 7.10% to 12.80%, and more preferably 7.10% to 12.80%, based on the mass percentage of the oxide.

[0134] In some embodiments of this disclosure, the Li₂O content in the composition of the tempered glass or the substrate glass used to prepare the tempered glass, based on the mass percentage of oxides, can be 7.00%, 7.50%, 8.00%, 8.50%, 9.00%, 9.50%, 10.00%, 10.50%, 11.00%, 11.50%, 12.00%, 12.50%, 13.00%, 12.32%, 11.56%, 8.95%, 10.25%, 8.93%, 7.33%, 9.77%, or 9.80%, or can be a value within a range defined by any two of the above specific values ​​as endpoints, as long as the tempered glass or substrate glass with the desired performance of this disclosure is obtained. It should be understood that, in specific embodiments, any of the above ranges can be combined with any other ranges, as long as the tempered glass or substrate glass with the desired performance of this disclosure is obtained.

[0135] In this disclosure, Na₂O and K₂O are the outer components of the glass network, acting as fluxes to lower the melting temperature of the glass. + K + In the case of existence, Na + K + It will preferentially enter the aluminum-silicon-oxygen network to compensate for the electricity price, which to some extent maintains the lithium content in the lithium-rich region, making the Si / Li ratio in the lithium-rich region closer to the chemical ratio of Li2SiO3. This results in the precipitated crystalline phase of lithium metasilicate in the strengthened glass containing Na2O and K2O. However, excessive Na2O and K2O can lead to phase separation and turbidity during glass heat treatment, increasing the light absorption coefficient, and T... g The temperature also decreases, and the thermal stability deteriorates. In some embodiments of this disclosure, the mass percentage of Na₂O in the composition of the tempered glass or the substrate glass used to prepare the tempered glass, based on the mass percentage of oxides, is 2.00% to 4.00%, preferably 2.10% to 3.80%, and more preferably 2.10% to 3.60%. In some embodiments of this disclosure, the mass percentage of K₂O in the composition of the tempered glass or the substrate glass used to prepare the tempered glass, based on the mass percentage of oxides, is 2.00% to 4.00%, preferably 2.10% to 3.95%, and more preferably 2.10% to 3.90%.

[0136] In some embodiments of the disclosure, the content of Na20 in the composition of the strengthened glass or the substrate glass used to prepare the strengthened glass, in mass percent of oxides, can be 2.00%, 2.10%, 2.20%, 2.30%, 2.40%, 2.50%, 2.60%, 2.70%, 2.80%, 2.90%, 3.00%, 3.10%, 3.20%, 3.30%, 3.40%, 3.50%, 3.60%, 3.70%, 3.80%, 3.90%, 4.00%, 3.47%, 2.14%, 3.11%, 2.66%, 3.08%, 2.41%, 2.32%, or 2.84%, or a value within a range between any two of the above specific values as endpoints, as long as the strengthened glass or the substrate glass having the desired properties of the disclosure is obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass or the substrate glass having the desired properties of the disclosure is obtained.

[0137] In some embodiments of the disclosure, the content of K20 in the composition of the strengthened glass or the substrate glass used to prepare the strengthened glass, in mass percent of oxides, can be 2.00%, 2.10%, 2.20%, 2.30%, 2.40%, 2.50%, 2.60%, 2.70%, 2.80%, 2.90%, 3.00%, 3.10%, 3.20%, 3.30%, 3.40%, 3.50%, 3.60%, 3.70%, 3.80%, 3.90%, 4.00%, 3.83%, 3.02%, 3.72%, 2.42%, 3.74%, 2.15%, 3.34%, or 2.34%, or a value within a range between any two of the above specific values as endpoints, as long as the strengthened glass or the substrate glass having the desired properties of the disclosure is obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass or the substrate glass having the desired properties of the disclosure is obtained.

[0138] In the disclosure, Zr02may increase the crystal content of the glass and refine the grain size. Too little Zr02content cannot play the role of a nucleating agent, while too high content is likely to deposit during high-temperature melting, affecting the crystallization performance of the strengthened glass material. In some embodiments of the disclosure, the mass percent of Zr02in the composition of the strengthened glass or the substrate glass used to prepare the strengthened glass, in mass percent of oxides, is 5.00% to 7.00%, preferably 2.10% to 3.95%, and more preferably 2.10% to 3.90%.

[0139] In some embodiments of the disclosure, the content of Zr02in the composition of the strengthened glass or the substrate glass used to make the strengthened glass, in mass percent of oxide, can be 5.00%, 5.10%, 5.20%, 5.30%, 5.40%, 5.50%, 5.60%, 5.70%, 5.80%, 5.90%, 6.00%, 6.10%, 6.20%, 6.30%, 6.40%, 6.50%, 6.60%, 6.70%, 6.80%, 6.90%, 7.00%, 5.62%, 5.12%, 5.74%, 6.25%, 5.71%, 6.78%, 5.54%, or 5.77%, or a value within a range having any two of these specific numeric values as endpoints, as long as a strengthened glass or substrate glass having the desired properties of the disclosure is obtained. It is understood that in specific embodiments, any of the above ranges can be combined with any of the other ranges, as long as a strengthened glass or substrate glass having the desired properties of the disclosure is obtained.

[0140] In the disclosure, X is Ag, Cu, Au, Bi, and / or an oxide thereof, respectively. In some embodiments of the disclosure, the content of X in the composition of the strengthened glass or the substrate glass used to make the strengthened glass, in mass percent of oxide, can be 0.05%, 0.1%, 0.20%, 0.22%, 0.24%, 0.26%, 0.28%, 0.30%, 0.32%, 0.34%, 0.36%, 0.38%, 0.40%, 0.42%, 0.44%, 0.46%, 0.48%, 0.50%, 0.60%, 0.70%, or 0.80%, or a value within a range having any two of these specific numeric values as endpoints, as long as a strengthened glass or substrate glass having the desired properties of the disclosure is obtained. It is understood that in specific embodiments, any of the above ranges can be combined with any of the other ranges, as long as a strengthened glass or substrate glass having the desired properties of the disclosure is obtained.

[0141] In some embodiments of the disclosure, the mass percentage of Ag20 is 0.05% to 0.80%, preferably 0.21% to 0.49%, and more preferably 0.22% to 0.48%. In some embodiments of the disclosure, the content of Ag20 in the composition of the strengthened glass or the base glass used to prepare the strengthened glass, in terms of mass percentage of oxide, can be 0.05%, 0.1%, 0.20%, 0.22%, 0.24%, 0.26%, 0.28%, 0.30%, 0.32%, 0.34%, 0.36%, 0.38%, 0.40%, 0.42%, 0.44%, 0.46%, 0.48%, 0.50%, 0.25%, 0.41%, 0.37%, 0.35%, 0.39%, 0.33%, 0.43%, 0.50%, 0.60%, 0.70%, or 0.80%, or a value within a range between any two of the above specific values as endpoints, as long as a strengthened glass or a base glass having the desired properties of the disclosure is obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as a strengthened glass or a base glass having the desired properties of the disclosure is obtained.

[0142] In the disclosure, Ce02is a photosensitizer, and Ag + provides electrons, and when the content of Ce02is less than 0.05%, it cannot provide sufficient electrons, resulting in too low a content of crystals and increasing the light transmittance of the exposed area of the glass, and when the content of Ce02is higher than 0.13%, the transmittance of the glass in the ultraviolet exposure band decreases, the penetration depth of the ultraviolet light decreases, and the density of the exposed area increases substantially. In some embodiments of the disclosure, the mass percentage of Ce02in the composition of the strengthened glass or the base glass used to prepare the strengthened glass, in terms of mass percentage of oxide, is 0.05% to 0.13%, preferably 0.05% to 0.12%, and more preferably 0.06% to 0.12%.

[0143] In some embodiments of the disclosure, the content of Ce02in the composition of the strengthened glass or the base glass used to prepare the strengthened glass, in terms of mass percentage of oxide, can be 0.05%, 0.06%, 0.07%, 0.08%, 0.09%, 0.10%, 0.11%, 0.12%, or 0.13%, or a value within a range between any two of the above specific values as endpoints, as long as a strengthened glass or a base glass having the desired properties of the disclosure is obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as a strengthened glass or a base glass having the desired properties of the disclosure is obtained.

[0144] In the present disclosure, Sb2O3 is a weak reducing agent, and at the same time, it also functions as a fining agent. Sb 3+ In the glass melting process, Sb2O3 will have a redox reaction with Ce 4+ and maintain the effective content of Ce 3+ In some embodiments of the present disclosure, the content of Sb2O3 in the composition of the strengthened glass or the base glass used to prepare the strengthened glass is 0.05% to 0.50% by mass, preferably 0.06% to 0.48% by mass, and more preferably 0.07% to 0.46% by mass.

[0145] In some embodiments of the present disclosure, the content of Sb2O3 in the composition of the strengthened glass or the base glass used to prepare the strengthened glass is 0.05%, 0.10%, 0.15%, 0.20%, 0.25%, 0.30%, 0.35%, 0.40%, 0.45%, 0.50%, 0.27%, 0.32%, 0.09%, 0.12%, 0.16%, 0.07%, or 0.43% by mass, or is a value within a range defined by any two of the above specific values as endpoints, as long as a strengthened glass or a base glass having the desired properties of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as a strengthened glass or a base glass having the desired properties of the present disclosure can be obtained.

[0146] In some embodiments of the present disclosure, the exposed region has a low transmittance in the infrared wavelength range, and the non-exposed region has a high transmittance in the infrared wavelength range. The strengthened glass satisfying the transmittance can ensure that the non-exposed region has good light transmittance and good transparency, while the exposed region has low light transmittance and good shielding effect, and is suitable for use in cover glasses that need to shield light sources. The "infrared wavelength range" here refers to light with a wavelength of 750 nm to 1000 nm.

[0147] In some embodiments of the present disclosure, the transmittance T1 of the exposed region is less than 20% for light with a wavelength of 550 nm at a thickness of 0.70 mm, preferably the transmittance T1 is less than 10%, preferably the transmittance T1 is less than 5%, preferably the transmittance T1 is 0%, and the transmittance T2 of the non-exposed region is more than 90%.

[0148] In some embodiments, the non-exposed region has a transmittance T2 of 90.00%, 90.10%, 90.20%, 90.30%, 90.40%, 90.50%, 91.00%, 92.00%, 91.05%, 90.98%, 90.73%, 90.83%, 90.65%, 90.51%, 91.02%, or 91.02% for 550 nm wavelength light at a thickness of 0.70 mm, or a value within a range having any two of these values as endpoints, as long as the strengthened glass has the desired properties of the present disclosure. It will be appreciated that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass has the desired properties of the present disclosure.

[0149] In some embodiments of the present disclosure, the exposed region has a transmittance T3 of 0% to 10% for 850 nm wavelength light at a thickness of 0.70 mm, preferably a transmittance T3 of less than 5%, and the non-exposed region has a transmittance T4 of more than 90%.

[0150] In some embodiments, the non-exposed region has a transmittance T4 of 90.00%, 90.10%, 90.20%, 90.30%, 90.40%, 90.50%, 91.00%, 92.00%, 92.23%, 91.54%, 91.35%, 91.46%, 91.21%, 91.15%, 92.09%, or 91.76% for 850 nm wavelength light at a thickness of 0.70 mm, or a value within a range having any two of these values as endpoints, as long as the strengthened glass has the desired properties of the present disclosure. It will be appreciated that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass has the desired properties of the present disclosure.

[0151] In some embodiments, the exposed region has a crystalline phase comprising one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystals, Cu nanocrystals, Au nanocrystals, Bi nanocrystals.

[0152] In some embodiments, the non-exposed region has a crystalline phase comprising one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystals, Cu nanocrystals, Au nanocrystals, Bi nanocrystals.

[0153] In some embodiments, the strengthened glass is a primary strengthened glass, a secondary strengthened glass, or a glass-ceramic (including a primary strengthened glass-ceramic, a secondary strengthened glass-ceramic, or a multiple strengthened glass-ceramic).

[0154] In some embodiments, the substrate glass can also be a bulk glass, a nucleated glass (e.g., a glass that has been nucleated but not crystallized), or a microcrystalline glass (e.g., a primary crystallized microcrystalline glass, a secondary crystallized microcrystalline glass, or a multiple crystallized microcrystalline glass).

[0155] It is understood that the crystallinity of the primary crystallized microcrystalline glass, the secondary crystallized microcrystalline glass, the multiple crystallized microcrystalline glass, the primary crystallized microcrystalline glass, the secondary crystallized microcrystalline glass, or the multiple crystallized microcrystalline glass can be in the range of 10% to 100%.

[0156] In some embodiments of the present disclosure, the exposed region and the non-exposed region can both be microcrystalline glasses, or the exposed region can be a microcrystalline glass and the non-exposed region can not be a microcrystalline glass.

[0157] In some embodiments of the present disclosure, the crystalline phase of the exposed region includes one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystal, Cu nanocrystal, Au nanocrystal, Bi nanocrystal; and the crystalline phase of the non-exposed region includes one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystal, Cu nanocrystal, Au nanocrystal, Bi nanocrystal.

[0158] In the present disclosure, the warpage refers to the warpage caused by the shrinkage or expansion of different regions during the heat treatment of the substrate glass. In some embodiments of the present disclosure, the warpage is not greater than 100 μm, preferably not greater than 90 μm, and more preferably not greater than 80 μm.

[0159] In some embodiments, the warpage of the strengthened glass can be 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm, 50 μm, 55 μm, 60 μm, 65 μm, 70 μm, 75 μm, 80 μm, 85 μm, 90 μm, 95 μm, or 100 μm, or can be a value within a range defined by any two of the above values as endpoints, as long as the strengthened glass having the desired properties of the present disclosure is obtained. It is understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as the strengthened glass having the desired properties of the present disclosure is obtained.

[0160] In some embodiments of the present disclosure, the strengthened glass is planar or curved.

[0161] In some embodiments of the present disclosure, the thickness of the strengthened glass of the present disclosure is not particularly limited, and can be, for example, 0.4-2.0 mm; preferably 0.4-1.0 mm. In some embodiments of the present disclosure, the thickness of the strengthened glass of the present disclosure can be 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1.0 mm, 1.1 mm, 1.2 mm, 1.3 mm, 1.4 mm, 1.5 mm, or 2.0 mm, or can be a value within a range defined by any two of the above-mentioned specific values as endpoints, as long as a strengthened glass having the desired properties of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above-mentioned ranges can be combined with any other range, as long as a strengthened glass having the desired properties of the present disclosure can be obtained.

[0162] In the present disclosure, chemical strengthening can be carried out by a method known in the art; for example, the chemical strengthening includes single-step chemical strengthening or multi-step chemical strengthening. In some embodiments of the present disclosure, the single-step chemical strengthening uses a salt bath containing NaNO3; preferably the content of NaNO3 is 30-100 wt%; preferably the single-step chemical strengthening uses a mixed salt bath containing NaNO3 and KNO3, preferably the content of KNO3 in the mixed salt bath is 80-100 wt%, and the content of NaNO3 is 0-20 wt%.

[0163] In some embodiments of the present disclosure, the temperature of the single-step chemical strengthening is 380-480°C, and preferably the ion exchange time of the single-step chemical strengthening is 5-10 h.

[0164] In some embodiments of the present disclosure, the multi-step chemical strengthening includes 2-step chemical strengthening, wherein the first-step chemical strengthening uses a salt bath containing NaNO3, and preferably the content of NaNO3 is 30-100 wt%; the second-step chemical strengthening uses a salt bath containing KNO3, and preferably the content of KNO3 is 60-100 wt%.

[0165] In some embodiments of the present disclosure, the temperature of the first-step chemical strengthening is 380-480°C, and preferably the time of the first-step chemical strengthening is 3-10 h; and preferably the temperature of the second-step chemical strengthening is 380-480°C, and preferably the time of the second-step chemical strengthening is 5-30 min.

[0166] In some embodiments of the present disclosure, the CS_50 of the strengthened glass described in the present disclosure is 50 MPa to 100 MPa, preferably, the CS_50 is 55 MPa to 95 MPa. In some embodiments of the present disclosure, the CS_50 of the colored chemically strengthened glass described in the present disclosure is 50 MPa, 55 MPa, 60 MPa, 65 MPa, 70 MPa, 75 MPa, 80 MPa, 82 MPa, 84 MPa, 86 MPa, 88 MPa, 90 MPa, 92 MPa, 94 MPa, 96 MPa, 98 MPa or 100 MPa, or can be a value within a range defined by any two of the above specific values as endpoints, as long as a strengthened glass with the desired properties of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as a strengthened glass with the desired properties of the present disclosure can be obtained.

[0167] In some embodiments of the present disclosure, the surface CS of the strengthened glass described in the present disclosure is 300 MPa or more, preferably 350 MPa or more, and further preferably the surface CS is 300 MPa to 600 MPa. In some embodiments of the present disclosure, the surface CS of the chemically strengthened glass described in the present disclosure is 350 MPa, 380 MPa, 400 MPa, 450 MPa, 500 MPa or 600 MPa, or can be a value within a range defined by any two of the above specific values as endpoints, as long as a strengthened glass with the desired properties of the present disclosure can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range, as long as a strengthened glass with the desired properties of the present disclosure can be obtained.

[0168] The method for preparing the strengthened glass in the present disclosure includes: obtaining a base glass; masking the first region of the base glass and not masking the second region of the base glass, and then processing the first region and the second region to obtain a non-exposed region and an exposed region, respectively, the processing includes radiation treatment, heat treatment and strengthening treatment; wherein the first region of the base glass corresponds to the first region of the strengthened glass, and the second region of the base glass corresponds to the second region of the strengthened glass.

[0169] In the present disclosure, the base glass can be prepared by using the forming method in the prior art, and the present disclosure has no any limitation thereon, for example, the forming method of the base glass can include but is not limited to float method, overflow method, calendering or casting process. For example, the components are mixed according to the formula, melted and formed, and then cooled and annealed to obtain the base glass.

[0170] For example, the raw materials (industrial conventional raw materials) are proportioned according to the formula, a clarifying agent is added, and then the mixture is mixed for a period of time to obtain a raw material mixture with uniform mixing. The raw material mixture is placed in a platinum crucible, heated to 1250-1680°C, preferably the melting temperature is 1480-1680°C, and preferably kept at this temperature for 3-12 hours, then poured into a forming mold to cool and form, preferably cooled to 750-1000°C, then placed in an annealing furnace for annealing treatment, preferably the annealing temperature is 400-650°C, and the annealing time is preferably 10-48 hours; then the furnace is cooled to room temperature, and the base glass is obtained. Those skilled in the art can select the type and amount of clarifying agent according to the needs, without the need for creative labor. Further, the clarifying agent can include, but is not limited to, one or more of sodium chloride, tin oxide, antimony oxide, or arsenic oxide, and the amount of clarifying agent added can be 0wt%-1wt% of the total amount of raw materials.

[0171] In some embodiments of the present disclosure, the radiation treatment is ultraviolet irradiation treatment, wherein the wavelength of the ultraviolet irradiation treatment is 300-320 nm, and the intensity of the ultraviolet irradiation treatment is 240-260 mw / cm 2 2 In some embodiments of the present disclosure, before the radiation treatment, the base glass is subjected to a masking treatment to form the non-exposed area after the radiation treatment and the heat treatment. The masking treatment includes masking the base glass using a masking ink and / or a mask plate. The structure of the mask plate 5 is shown in FIG. 1, which has one of 36 composite circular holes, 48 composite circular holes, or 90 composite circular holes, wherein the composite circular hole has a light transmission area 51 with an inner diameter and a light shielding area 52 other than the inner diameter, and the structure of the composite circular hole is shown in FIG. 2. The structure of the strengthened glass 6 formed thereby is shown in FIG. 3, wherein the exposed area 61 is formed at the position corresponding to the light transmission area 51, and the non-exposed area 62 is formed at the position corresponding to the light shielding area 52.

[0172] In some embodiments of the present disclosure, the heat treatment process of the base glass can include nucleation treatment and / or crystallization treatment, preferably both nucleation treatment and crystallization treatment. In some embodiments, the crystallization treatment includes one-step crystallization treatment or multi-step crystallization treatment. In some embodiments, in order to prepare a curved strengthened glass, two-step crystallization treatment can be used. When two-step crystallization treatment is used, the second step of the crystallization treatment is to place the crystallized glass material obtained by the first step of the crystallization treatment into a hot bending mold, heat to the crystallization temperature, and perform 3D hot bending forming treatment.

[0173] ​In some embodiments of the present disclosure, in order to obtain desired physical and chemical properties of the strengthened glass, the substrate glass can be subjected to one-step heat treatment or two-step or more heat treatment when the substrate glass is subjected to heat treatment. If one-step heat treatment is performed, it means that the nucleation treatment (i.e., nucleation process) is not performed separately, and the one-step heating is directly performed, and the nucleation and target crystal growth are performed at the temperature reached in the one-step heating process, which can be understood as directly performing the crystallization process. If two-step heat treatment is performed, it means that the two-step heating process is performed, and the nucleation process is performed first, and then the target crystal growth process is performed.

[0174] In order to obtain the desired crystal phase of the strengthened glass and obtain the desired physical and chemical properties, further, the temperature of the nucleation process can be 450-600°C, the time of the nucleation process can be 180-300 min, and preferably 210-270 min; the temperature of the crystallization process can be 550-800°C, and the time of the crystallization process can be 30-180 min, and preferably 60-120 min. When the heat treatment is performed, the heating rate is preferably controlled to be 1-10°C / min, and more preferably the heating rate is 10°C / min. The temperature of the nucleation process refers to the temperature at which the crystal nucleus can be formed. The temperature of the crystallization process refers to the temperature at which the target crystal is suitable for controlled growth.

[0175] Before and / or after the heat treatment, the skilled person in the art can also perform other conventional steps to obtain the strengthened glass sample that meets the required specifications or requirements, for example, the sample can be subjected to shaping treatment, cutting treatment (such as cutting using a multi-wire cutting machine), CNC processing (computer numerical control), thinning treatment or polishing treatment, etc. The size of the substrate glass or the strengthened glass sample in the present disclosure is not limited, for example, it can be 50mm x 50mm x 1.0mm, 300mm x 120mm x 0.7mm, etc.

[0176] The strengthened glass provided by the present disclosure has excellent performance, and can be used in electronic devices, including but not limited to mobile phones, tablets, handheld game consoles, portable digital devices (such as digital cameras), smart homes, smart wear (such as smart bracelets, smart watches, smart glasses), and can also be used in vehicles, aircraft or vessels, and can also be used in any required strengthened glass glassware. For example, it can be used for the back cover glass of a mobile phone, the back cover glass of a smart watch, etc.; for example, it can be used for the windshield of a vehicle, aircraft or vessel, such as the front windshield or side windshield. For example, it can be used for countertops, other surfaces, appliance doors, floor tiles, wall panels or storage containers, etc. Other surfaces can include but are not limited to exterior wall surfaces, stair tread surfaces, column facings or counter surfaces, etc., and storage containers can include but are not limited to cups, plates, medicine bottles or beverage bottles, etc.

[0177] Exemplarily, the strengthened glass with excellent performance provided by the present disclosure can be used to manufacture glass devices. The glass devices referred to herein can be regular or irregular, and can be manufactured according to requirements by those skilled in the art.

[0178] Exemplarily, the strengthened glass with excellent performance provided by the present disclosure can be used to manufacture cover glasses, which can be back cover glasses or camera protection cover glasses of electronic devices such as mobile phones. Exemplarily, the strengthened glass with excellent performance provided by the present disclosure can be used in electronic devices. Referring to FIGS. 4, 5 and 6, in some embodiments of the present disclosure, an electronic device is provided, which can be a mobile phone (as shown in FIG. 5), a tablet computer, a smart wearable device (as shown in FIG. 6, the strengthened glass can be used as a back cover of a smart watch), or the like, and the electronic device comprises a housing 1 assembled on the outer side of the electronic device, the housing 1 comprises a display screen cover plate assembled on the front side and a back cover 12 assembled on the back side, the display screen cover plate covers the display module 4, wherein the back cover 12 adopts the aforementioned strengthened glass. In the present disclosure, the back cover 12 can be entirely made of the aforementioned strengthened glass, or can be partially made of the aforementioned strengthened glass. In the present disclosure, the display screen can be a touch display screen, and the display screen cover plate can be a protection cover plate arranged on the touch display screen. In the present disclosure, the back cover 12 can cover only the back side of the electronic device (and the side away from the display screen), or can cover the back side and the side frame of the electronic device, and optionally, the back cover 12 can cover all the side frames of the electronic device, or can cover part of the side frames.

[0179] In some embodiments of the present disclosure, as shown in FIG. 4, the electronic device further comprises a camera assembly 2 located inside the housing 1, the housing 1 can comprise a camera protection cover plate 13, the camera protection cover plate 13 covers the camera assembly 2 for protecting the camera assembly 2, and the camera protection cover plate 13 adopts the aforementioned strengthened glass. In the present disclosure, the camera protection cover plate 13 can be partially made of the aforementioned strengthened glass, or can be entirely made of the aforementioned strengthened glass. In the present disclosure, the setting position of the camera protection cover plate 13 is determined according to the setting position of the camera assembly 2, and can be located on the front side of the electronic device, or can be located on the back side of the electronic device. In some embodiments of the present disclosure, the camera protection cover plate 13 can be in a separate structure from the back cover 12. In another embodiment of the present disclosure, the camera protection cover plate 13 can be in an integrated structure with the back cover 12.

[0180] In some embodiments of the present disclosure, as shown in FIG. 5, the electronic device can further comprise a middle frame 3 located between the display module 4 and the housing 1, and the middle frame 3 can comprise the aforementioned strengthened glass.

[0181] In the embodiments of the present disclosure, the back cover plate and the camera protection cover plate in the electronic device can be either one of the two made of the aforementioned strengthened glass, or both made of the aforementioned strengthened glass.

[0182] The technical solutions of the present disclosure are further described in detail below in combination with the embodiments. The embodiments of the present disclosure described in detail below are exemplary and are only used to explain the present disclosure, and cannot be understood as a limitation of the present disclosure.

[0183] Embodiment 1

[0184] A strengthened glass is prepared by the following process:

[0185] (1) Preparation of the base glass:

[0186] The raw materials (industrial conventional raw materials) are prepared according to the proportions of each component in Table 1, the total mass of the prepared raw materials is 5000g, 10g of clarifying agent sodium chloride (NaCl) is added to the prepared raw materials, and then the V-shaped mixer is used for mixing for 30 minutes to obtain a raw material mixture with uniform mixing.

[0187] The raw material mixture is transferred to a melting furnace, melted at a temperature of 1500°C, and stirred with a platinum-gold stirring rod, the melting time is 12h, and then drawn into a glass brick of the required specification. The glass brick is quickly placed in an annealing furnace at 450°C for 5h, and then naturally cooled to room temperature to obtain the base glass brick.

[0188] The obtained base glass brick is sequentially subjected to cutting, CNC processing (the CNC instrument equipment used in the present disclosure is of RCG500S type), and polishing cold processing, and then a base glass sample meeting the required specification and requirements can be prepared. In Embodiments 1-8 of the present disclosure, the base glass sample brick is subjected to the aforementioned cold processing to prepare a glass base with a size of 300mm×120mm×0.7mm.

[0189] (2) Preparation of the strengthened glass: The above glass base is sequentially ultrasonically cleaned in deionized water, anhydrous ethanol, propanol, and deionized water for 10min, and then dried in a drying oven; the glass base and the mask plate are fixed together and horizontally placed in the predetermined line of the ultraviolet parallel light spot, wherein the mask plate is on the top and the glass base is on the bottom, the wavelength of the ultraviolet irradiation is 310nm, and the irradiation intensity is 250mw / cm 2, the exposure time was 10 min; the exposed glass substrate was separated from the mask plate; and then the exposed glass substrate was heat treated according to the heat treatment process in Table 1 to obtain a crystallized glass. The mask plate used had 90 composite round holes, and the composite round holes had a light-transmitting region and a light-blocking region, as shown in FIG. 2. The heat treatment included a nucleation treatment and a crystallization treatment, and the heating rate of the nucleation treatment and the crystallization treatment was 10 ℃ / min. The crystallized glass sample obtained above was treated according to a two-step chemical strengthening process to obtain a strengthened glass, and the two-step chemical strengthening process conditions are shown in Table 1.

[0190] The warpage of the substrate glass during the heat treatment process was tested and is shown in Table 1.

[0191] The strengthened glass sample obtained in Example 1 was tested as follows:

[0192] The crystalline phase content, density, and transmittance (under light at wavelengths of 550 nm, 850 nm, and 1000 nm) of the exposed region and the non-exposed region of the strengthened glass sample were tested, respectively, and the results are shown in Table 1.

[0193] Examples 2-8

[0194] Each of Examples 2-8 was performed according to Example 1, except that the raw material composition, different process parameters, and the corresponding test results of each example are shown in the table.

[0195] The XRD patterns of the exposed region and the non-exposed region of the strengthened glass of Example 1 are shown in FIG. 7, and it can be seen from the figure that the crystalline phase structure of the strengthened glass contains lithium metasilicate.

[0196] The transmittance curves of the exposed region and the non-exposed region of the strengthened glass of Example 7 are shown in FIG. 8, and it can be seen from the figure that the exposed region of the strengthened glass has low transmittance in the infrared wavelength range, and the non-exposed region of the strengthened glass has high transmittance in the infrared wavelength range.

[0197] Table 1

[0198] From the above Table 1, it can be seen that, according to the embodiments of the present disclosure, the difference Δρ between the average density ρ1 of the exposed region and the average density ρ2 of the non-exposed region of the strengthened glass is less than or equal to 0.01 g / cm 3 , so that the strengthened glass has a lower warpage, which is less than 80 μm.

[0199] The above description is merely a specific embodiment of this disclosure and is not intended to limit this disclosure. Various modifications and variations can be made to this disclosure by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this disclosure should be included within the scope of protection of this disclosure. Industrial applicability

[0200] This disclosure controls the difference Δρ between the average density ρ1 of the exposed area and the average density ρ2 of the unexposed area of ​​the tempered glass to be less than or equal to 0.01 g / cm³. 3 Within this range, the density of the exposed and unexposed areas is balanced, thereby increasing the difference in light transmittance between the exposed and unexposed areas while reducing the deformation of the tempered glass during the heat treatment process, thus reducing the warpage of the tempered glass.

Claims

1. A strengthened glass characterized by, The strengthened glass is obtained by processing a base glass; the base glass comprises a first region and a second region, the first region is subjected to a masking treatment, and the first region and the second region are subjected to processing treatment to obtain a non-exposed region and an exposed region respectively, wherein the second region is a region without masking treatment, wherein the first region of the base glass corresponds to the first region of the strengthened glass, and the second region of the base glass corresponds to the second region of the strengthened glass. The processing treatment comprises radiation treatment, heat treatment and strengthening treatment. The strengthened glass comprises the exposed regions and the non-exposed regions, the average density pi of the exposed regions is greater than the average density p2 of the non-exposed regions, and the difference Ap between the average density pi of the exposed regions and the average density p2 of the non-exposed regions is < 0.01 g / cm 3 , preferably the difference Ap is < 0.005 g / cm 3 .

2. The strengthened glass of claim 1, wherein, The processing treatment further comprises one or more of cutting, CNC processing, grinding and polishing, cleaning, 3D heat bending and polishing before the chemical strengthening.

3. The strengthened glass of any of claims 1-2, wherein, The masking treatment comprises masking using shielding ink and / or mask plate.

4. The strengthened glass of any one of claims 1 to 3, wherein, The radiation treatment comprises ultraviolet irradiation treatment.

5. The strengthened glass of claim 4, wherein, The wavelength of the ultraviolet irradiation treatment is 300 nm to 320 nm; and / or, the intensity of the ultraviolet irradiation treatment is 240 mw / cm 2 ~ 260 mw / cm 2 .

6. The strengthened glass of any one of claims 1 to 5, wherein, The heat treatment comprises nucleation treatment and crystallization treatment.

7. The strengthened glass of claim 6, wherein, The nucleation treatment has a temperature increasing rate of 1-10 ℃ / min; and / or, The nucleation treatment has a temperature of 450-600 ℃; and / or, The nucleation treatment has a time of 180-300 min; and / or, The crystallization treatment has a temperature increasing rate of 1-10 ℃ / min; and / or, The crystallization treatment has a temperature of 550-800 ℃; and / or, The crystallization treatment has a time of 30-180 min.

8. The strengthened glass of any of Claims 1 to 7, wherein, The difference Δρ between the average density ρ1 of the exposed area and the average density ρ2 of the non-exposed area is 0.0005 g / cm 3 , 0.005 g / cm 3 , 0.007 g / cm 3 , 0.0066 g / cm 3 , 0.0025 g / cm 3 , 0.0032 g / cm 3 , 0.0049 g / cm 3 or 0.0096 g / cm 3 .

9. The strengthened glass of any one of Claims 1 to 8, wherein, The average density p1 of the exposed area satisfies 2.0000 g / cm 3 ≤ p1 ≤ 3.0000 g / cm 3 , preferably, 2.3000 g / cm 3 ≤ p1 ≤ 2.7000 g / cm 3 , more preferably, 2.3000 g / cm 3 ≤ p1 ≤ 2.5000 g / cm 3 ; and / or, The average density p2 of the non-exposed areas satisfies 2.0000 g / cm 3 ≤ p2 ≤ 3.0000 g / cm 3 , preferably, 2.3000 g / cm 3 ≤ p2 ≤ 2.7000 g / cm 3 , more preferably, 2.4000 g / cm 3 ≤ p2 ≤ 2.5000 g / cm 3 .

10. The strengthened glass of any one of Claims 1 to 9, wherein, The average density p1 of the exposed area is 2.4714 g / cm 3 , 2.4846 g / cm 3 , 2.4896 g / cm 3 , 2.4872 g / cm 3 , 2.4918 g / cm 3 , 2.4964 g / cm 3 , 2.4753 g / cm 3 or 2.4832 g / cm 3 ; and / or The average density p2 of the non-exposed area is 2.4709 g / cm 3 , 2.4796 g / cm 3 , 2.4826 g / cm 3 , 2.4806 g / cm 3 , 2.4893 g / cm 3 , 2.4932 g / cm 3 , 2.4704 g / cm 3 or 2.4736 g / cm 3 .

11. The strengthened glass of any one of claims 1 to 10, wherein, the average crystalline content X in the exposed regions C1 greater than the average crystalline content X in the non-exposed regions C2 ; and / or, the average crystal content X in the exposed area in percent by mass C1 satisfies 3.00%≤X C1 ≤25.00%, preferably, 4.00%≤X C1 ≤20.00%, more preferably, 4.00%≤X C1 ≤15.00%; and / or, an average crystal content X in the non-exposed areas in mass percent C2 satisfying 0.50% < X C2 ≤ 20.00%, preferably 1.00% < X C2 ≤ 18.00%, more preferably 1.40% < X C2 ≤ 13.00%.

12. The strengthened glass of any one of Claims 1 to 11, wherein, an average crystal content X in the exposed region in mass percentage C1 4.27%, 7.12%, 8.31%, 7.53%, 10.23%, 14.42%, 5.42%, or 6.32%; and / or, an average crystal content X in the non-exposed regions in mass percentage C2 1.49%, 5.14%, 6.35%, 5.65%, 8.54%, 12.53%, 3.56%, or 4.45%.

13. The strengthened glass of any one of claims 1 to 12, wherein, The strengthened glass comprises, in terms of mass percentage of oxides: SiO2: 65.00-75.00%, Al2O3: 5.00-10.00%, Li2O: 7.00-13.00%, Na2O: 2.00-4.00%, K2O: 2.00-4.00%, ZrO2: 5.00-7.00%, X: 0.05-0.80%, CeO2: 0.05-0.13%, and Sb2O3: 0-0.50%. X is Ag, Cu, Au, Bi and / or the oxide thereof respectively.

14. The strengthened glass of any one of Claims 1 to 13, wherein, The strengthened glass comprises, in terms of mass percentage of oxides: The mass percentage of SiO2 is 66.00-74.50%, preferably 66.50-74.00%; and / or, The mass percentage of Al2O3 is 5.10-9.70%, preferably 5.20-9.40%; and / or, The mass percentage of Li2O is 7.10-12.80%, preferably 7.20-12.60%; and / or, The mass percentage of Na2O is 2.10-3.80%, preferably 2.10-3.60%; and / or, The mass percentage of K2O is 2.10-3.95%, preferably 2.10-3.90%; and / or, Zr02 in a mass percentage of 5.10% to 6.90%, preferably in a mass percentage of 5.10% to 6.80%; and / or, Ag20 in a mass percentage of 0.05% to 0.80%, preferably in a mass percentage of 0.22% to 0.48%; and / or, Ce02 in a mass percentage of 0.05% to 0.12%, preferably in a mass percentage of 0.06% to 0.12%; and / or, Sb203 in a mass percentage of 0.06% to 0.48%, preferably in a mass percentage of 0.07% to 0.46%.

15. The strengthened glass of any one of Claims 1 to 14, wherein, The composition of the strengthened glass comprises, in mass percentage of oxides: Si02 in a mass percentage of 66.93%, 68.16%, 70.07%, 72.61%, 70.01%, 73.52%, 69.94% or 72.40%; and / or, Al203 in a mass percentage of 7.19%, 9.19%, 7.86%, 5.23%, 7.87%, 7.35%, 8.36% or 5.87%; and / or, Li20 in a mass percentage of 12.32%, 11.56%, 8.95%, 10.25%, 8.93%, 7.33%, 9.77% or 9.80%; and / or, Na20 in a mass percentage of 3.47%, 2.14%, 3.11%, 2.66%, 3.08%, 2.41%, 2.32% or 2.84%; and / or, K20 in a mass percentage of 3.83%, 3.02%, 3.72%, 2.42%, 3.74%, 2.15%, 3.34% or 2.34%; and / or, Zr02 in a mass percentage of 5.62%, 5.12%, 5.74%, 6.25%, 5.71%, 6.78%, 5.54% or 5.77%; and / or, Ag20 in a mass percentage of 0.25%, 0.41%, 0.37%, 0.35%, 0.39%, 0.33%, 0.28% or 0.43%; and / or, Ce02 in a mass percentage of 0.12%, 0.08%, 0.09%, 0.11%, 0.06%, 0.10% or 0.12%; and / or, Sb203 in a mass percentage of 0.27%, 0.32%, 0.09%, 0.12%, 0.16%, 0.07%, 0.35% or 0.43%.

16. The strengthened glass of any one of Claims 1 to 15, wherein, The surface CS of the strengthened glass is above 300 MPa, preferably above 350 MPa.

17. The strengthened glass of any one of Claims 1 to 16, wherein, The CS_50 of the strengthened glass is between 50 MPa and 100 MPa, preferably between 55 MPa and 95 MPa.

18. The strengthened glass of any one of Claims 1 to 17, wherein, The exposed regions have a low transmittance in the infrared wavelength range, and the non-exposed regions have a high transmittance in the infrared wavelength range; and / or, at a thickness of 0.70 mm, the exposed region has a transmittance T1 of less than 20% for light of a wavelength of 550 nm, preferably a transmittance T1 of less than 10%, preferably a transmittance T1 of less than 5%, preferably a transmittance T1 of 0; the non-exposed region has a transmittance T2 of more than 90%; and / or, at a thickness of 0.70 mm, the exposed region has a transmittance T3 of 0% to 10% for light of a wavelength of 850 nm, preferably a transmittance T3 of less than 5%, the non-exposed region has a transmittance T4 of more than 90%; and / or, at a thickness of 0.70 mm, the exposed region has a transmittance T5 of 0% to 5% for light of a wavelength of 1000 nm, the non-exposed region has a transmittance T6 of more than 90%.

19. The strengthened glass of any one of Claims 1 to 18, wherein, the crystal phase of the exposed region comprises one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystal, Cu nanocrystal, Au nanocrystal, Bi nanocrystal; and / or, the crystal phase of the non-exposed region comprises one or more of lithium metasilicate, lithium disilicate, petalite, quartz, spodumene, eucryptite, zinc oxide, Ag nanocrystal, Cu nanocrystal, Au nanocrystal, Bi nanocrystal.

20. A method of producing the strengthened glass according to any one of claims 1 to 19, characterized by, The method comprises: obtaining a substrate glass; performing a masking process on a first region of the substrate glass and not performing the masking process on a second region of the substrate glass, and then performing a processing treatment on the first region and the second region to obtain a non-exposed region and an exposed region respectively, the processing treatment comprising a radiation treatment, a heat treatment and a strengthening treatment; wherein the first region of the substrate glass corresponds to the first region of the strengthened glass, and the second region of the substrate glass corresponds to the second region of the strengthened glass; The average density pi of the exposed area is greater than the average density p2 of the non-exposed area, the difference Ap between the average density pi of the exposed area and the average density p2 of the non-exposed area being < 0.01 g / cm 3 , preferably the difference Ap being < 0.005 g / cm 3 .

21. The method of making strengthened glass according to claim 20, wherein, The average density p1 of the exposed area satisfies 2.0000 g / cm 3 ≤ p1≤ 3.0000 g / cm 3 , preferably, 2.3000 g / cm 3 ≤ p1≤ 2.7000 g / cm 3 , more preferably, 2.3000 g / cm 3 ≤ p1≤ 2.5000 g / cm 3 ; and / or, The average density p2 of the non-exposed areas satisfies 2.0000 g / cm 3 ≤ p2 ≤ 3.0000 g / cm 3 , preferably 2.3000 g / cm 3 ≤ p2 ≤ 2.7000 g / cm 3 , more preferably 2.4000 g / cm 3 ≤ p2 ≤ 2.5000 g / cm 3 .

22. The method of making strengthened glass according to any one of claims 20-21, wherein, the average crystalline content X in the exposed regions C1 greater than the average crystalline content X in the non-exposed regions C2 ; and / or, the average crystal content X in the exposed area in percent by mass C1 satisfies 3.00%≤X C1 ≤25.00%, preferably, 4.00%≤X C1 ≤20.00%, more preferably, 4.00%≤X C1 ≤15.00%; and / or, an average crystal content X in the non-exposed areas in mass percent C2 satisfying 0.50% < X C2 ≤ 20.00%, preferably 1.00% < X C2 ≤ 18.00%, more preferably 1.40% < X C2 ≤ 13.00%.

23. The method of making strengthened glass according to any one of claims 20 to 22, wherein, in terms of mass percentage of oxides, the composition of the substrate glass comprises: SiO2: 65.00% to 75.00%, Al2O3: 5.00% to 10.00%, Li2O: 7.00% to 13.00%, Na2O: 2.00% to 4.00%, K2O: 2.00% to 4.00%, ZrO2: 5.00% to 7.00%, X: 0.05% to 0.80%, CeO2: 0.05% to 0.13%, and Sb2O3: 0% to 0.50%; wherein X is Ag, Cu, Au, Bi and / or the oxide thereof respectively.

24. A cover glass, characterized by The cover glass is made of the strengthened glass according to any one of claims 1-19 or prepared by the preparation method according to any one of claims 20-23.

25. An electronic device, comprising: The electronic device comprises the strengthened glass according to any one of claims 1-19 or prepared by the preparation method according to any one of claims 20-23.

26. The electronic device of claim 25, wherein, The electronic device comprises the strengthened glass according to any one of claims 1-19 or prepared by the preparation method according to any one of claims 20-23.

27. The electronic device of claim 26, wherein, The electronic device further comprises a camera assembly, the housing comprises a camera cover plate covering the camera assembly, the camera cover plate comprises the strengthened glass of any one of claims 1-19 or the strengthened glass made by the method of any one of claims 20-23.

28. Use of the strengthened glass of any one of claims 1-19 or the strengthened glass made by the method of any one of claims 20-23 for a component in a mobile phone, a smart watch, a wearable device, a camera module, or a vehicle.

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