Symmetric magnetron sputtering process and application of diamond-like carbon coating thereof

Abstract

The invention discloses a symmetric magnetron sputtering process and application of a diamond-like carbon coating thereof. Due to the electron gathering effect in the discharging process of symmetricmagnetron sputtering cathodes opposite in direction, the ionization rate of sputtered carbon particles is increased, the high-energy carbon particles overflow from a gap between the symmetric cathodesand is subjected to doping of metal atoms of a magnetron sputtering metal target so that the diamond-like carbon coating can be formed, and due to the symmetric magnetron sputtering process, the target material utilizing rate can be increased, and the ionization rate of sputtered particles is also greatly increased; and the diamond-like carbon coating is composed of a metal base layer, a gradientcomposite layer and a metal-doped diamond-like carbon coating, and in the deposition process of the diamond-like carbon coating, the diamond-like carbon coating in certain gradient and with stable doping proportion can be obtained by adjusting the power of the magnetron sputtering metal target. Due to the process, high energy ionized carbon ions can be obtained, and the compact and fine diamond-like carbon coating can be formed easily.

Description

technical field

[0001] The invention belongs to the field of vacuum coating coating preparation, and relates to a symmetrical slit magnetron sputtering process and the application of the diamond-like coating. Background technique

[0002] Friction and wear of solid materials generally exist in various fields of production and life, and friction and wear exist in all relative moving parts. Statistics at home and abroad show that the energy consumed by friction accounts for 1 / 3 of the world's primary energy, about 80% of mechanical parts eventually fail due to continuous wear and tear, and about 50% of mechanical equipment vicious accidents Occurs due to lubrication failure and excessive wear. The physical, chemical and mechanical properties of the material surface have an important impact on the tribological properties of the material. After the surface of the solid material is pretreated, it is then subjected to surface coating, surface modification or composite treatment ...

Examples

Embodiment 1

[0050] see image 3 , shown: the unbalanced magnetron coating machine 11 for preparing the diamond-like coating of the present invention, the unbalanced magnetron coating machine 11 is a conventional mature equipment in the field, can be purchased directly from the market, and is equipped with four groups of unbalanced magnetrons A sputtering metal target 111, a turret 112, and a symmetrical magnetron sputtering cathode 10 are installed in the center of the chamber. The diamond-like coating metal base layer and the gradient composite layer are prepared using the magnetron sputtering cathode. When the gradient composite is prepared , turn off the reaction gas, feed argon gas, turn on the symmetrical magnetron sputtering cathode 10 and the magnetron sputtering metal target 111, by adjusting the target power of the magnetron sputtering metal target 111, utilize the symmetrical magnetron sputtering cathode 10 discharge process The high-energy ionized sputtering effect of electron ...

Embodiment 2

[0062] see Figure 5 As shown: the unbalanced magnetron coating machine 12 for preparing the doped diamond-like coating of the present invention is equipped with two groups of unbalanced magnetron sputtering metal targets 121 and a turntable 122, and the chamber corresponds to two groups of unbalanced magnetrons. A symmetrical slit magnetron sputtering cathode 10 is installed on one side of the central axis of the sputtering metal target 121, and an anode water cooling column or an anode gas distribution pipe 13 is installed at the corresponding cavity of the symmetrical slit magnetron sputtering cathode 10. By using the water-cooled anode to accelerate the overflow of carbon particles, or through the action of air flow to facilitate the overflow of carbon particles, the diamond-like coating metal base layer and the gradient composite layer are prepared by magnetron sputtering cathode, and the reaction is closed when the gradient composite is prepared. The gas is fed with argo...

technical field

[0001] The invention belongs to the field of vacuum coating coating preparation, and relates to a symmetrical slit magnetron sputtering process and the application of the diamond-like coating. Background technique

[0002] Friction and wear of solid materials generally exist in various fields of production and life, and friction and wear exist in all relative moving parts. Statistics at home and abroad show that the energy consumed by friction accounts for 1 / 3 of the world's primary energy, about 80% of mechanical parts eventually fail due to continuous wear and tear, and about 50% of mechanical equipment vicious accidents Occurs due to lubrication failure and excessive wear. The physical, chemical and mechanical properties of the material surface have an important impact on the tribological properties of the material. After the surface of the solid material is pretreated, it is then subjected to surface coating, surface modification or composite treatment ...

Examples

Embodiment 1

[0050] see image 3 , shown: the unbalanced magnetron coating machine 11 for preparing the diamond-like coating of the present invention, the unbalanced magnetron coating machine 11 is a conventional mature equipment in the field, can be purchased directly from the market, and is equipped with four groups of unbalanced magnetrons A sputtering metal target 111, a turret 112, and a symmetrical magnetron sputtering cathode 10 are installed in the center of the chamber. The diamond-like coating metal base layer and the gradient composite layer are prepared using the magnetron sputtering cathode. When the gradient composite is prepared , turn off the reaction gas, feed argon gas, turn on the symmetrical magnetron sputtering cathode 10 and the magnetron sputtering metal target 111, by adjusting the target power of the magnetron sputtering metal target 111, utilize the symmetrical magnetron sputtering cathode 10 discharge process The high-energy ionized sputtering effect of electron ...

Embodiment 2

[0062] see Figure 5 As shown: the unbalanced magnetron coating machine 12 for preparing the doped diamond-like coating of the present invention is equipped with two groups of unbalanced magnetron sputtering metal targets 121 and a turntable 122, and the chamber corresponds to two groups of unbalanced magnetrons. A symmetrical slit magnetron sputtering cathode 10 is installed on one side of the central axis of the sputtering metal target 121, and an anode water cooling column or an anode gas distribution pipe 13 is installed at the corresponding cavity of the symmetrical slit magnetron sputtering cathode 10. By using the water-cooled anode to accelerate the overflow of carbon particles, or through the action of air flow to facilitate the overflow of carbon particles, the diamond-like coating metal base layer and the gradient composite layer are prepared by magnetron sputtering cathode, and the reaction is closed when the gradient composite is prepared. The gas is fed with argo...

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