An integrated rotating target material that is easy to connect to equipment

Abstract

The present invention belongs to the field of semiconductor technology, and relates to an integrated rotating target material that is easy to connect to a device, wherein the integrated rotating target material that is easy to connect to the device comprises a sputtering target material body, a device connection end and a head connection end respectively arranged at both ends of the sputtering target material body; the device connection end is threadedly connected with a flange, and a connection surface between the flange and the device is provided with a groove for placing an O-ring. The present invention improves the connection mode between the flange and the sputtering target material body from welding to threaded connection, which not only improves the connection efficiency between the flange and the sputtering target material body, but also improves the utilization rate of the flange; and by providing a groove for placing an O-ring in the flange, the integrated rotating target material has good sealing performance when in use, thereby ensuring the cooling effect.

Description

Technical Field

[0001] The invention belongs to the field of semiconductor technology and relates to a rotating target material, in particular to an integrated rotating target material that is convenient for connection with equipment. Background Art

[0002] Magnetron sputtering is a widely used coating deposition process in the coating industry. The principle of sputtering is to bombard the target surface with argon ions through an electron gun under vacuum conditions. The target surface material is sputtered out in the form of molecules, atoms, ions or electrons, and splashed onto the substrate to form a film. With the continuous development of surface coating technology, the demand for sputtering targets, a functional material with high added value, is also increasing year by year. Therefore, it is necessary to continuously improve the utilization efficiency and convenience of sputtering targets.

[0003] Compared with the planar target, the rotary target has the advantages of high target utilization, fast sputtering speed and effective reduction of arcing and surface slag. The structure of the rotary target includes an integrated rotary target and a rotary target with a back tube.

[0004] CN 109267019 A discloses a silicon rotating target material and a preparation method thereof, the preparation method comprising: providing a base tube; using a first plasma spraying process to spray a silicon layer on the base tube to form a silicon target material layer surrounding the collective tube. By using a plasma spraying process to form a silicon target material layer surrounding the collective tube, a silicon rotating target material having a size that meets process requirements, a high structural density, and no cracks is obtained, and the size of the silicon rotating target material is integrated.

[0005] CN 208121188 U discloses a rotating silicon-aluminum target assembly with improved utilization, comprising a tube body, an end head and a target material, wherein the target material is wrapped around the outer periphery of the tube body along the axial direction of the tube body, and two ends of the tube body extend out of two ends of the target material respectively, the inner diameter of the end head is fixedly sleeved on the end of the tube body, and the end of the tube body is sleeved with an elastic annular bushing, the annular bushing is integrally arranged with the tube body, and the annular bushing and the end head are connected by threads, and the outer diameter of the annular bushing is greater than the inner diameter of the end head.

[0006] The above-mentioned rotating target needs to be provided with a separate liner tube, and the structure is complicated, and the problem of substandard structure is easy to occur during installation and use. For example, the rotating target liner tube is generally made of aluminum, aluminum alloy, copper or copper alloy, so that the structural strength of the liner tube is not high, and the tube wall at the end of the rotating target is thinner. The sealing groove is provided on the end, which further reduces the thickness of the tube wall at the end, making it easy for the rotating target to be installed during installation and use, so that the rotating target needs to be reprocessed or replaced with a new rotating target, which causes great waste.

[0007] CN 109807453 A discloses a high-purity copper rotary target, which comprises a high-purity copper target material tube, a copper alloy end head, and a copper alloy tail cover. The copper alloy end head and the copper alloy tail cover are respectively installed at two ends of the high-purity copper target material tube, one end of the copper alloy end head and the copper alloy outer cover are respectively provided with welding surfaces, and two ends of the high-purity copper target are respectively provided with welding surfaces, and the welding surfaces of the copper alloy end head and the copper alloy outer cover are respectively installed against the welding surfaces of the high-purity copper target.

[0008] The connecting gap on the outer wall of the tube formed by the welding surface of the copper alloy end and the welding surface of the high-purity copper target tube being butted together is the end welding port, the connecting gap on the outer wall of the tube formed by the welding surface of the copper alloy tail cover and the welding surface of the high-purity copper target tube being butted together is the tail cover welding port, the end welding port or the tail cover welding port fixed to the rotating fixing part is the welding end, and the end welding port or the tail cover welding port not fixed to the rotating fixing part is the end to be welded.

[0009] However, the high-purity copper rotary target needs to maintain a high degree of concentricity between the target and the end cap during welding. If displacement occurs during welding, re-welding is required, resulting in a waste of time. Moreover, the end cap and the end cap are connected to the rotary target by welding, which reduces the utilization rate of the end cap and the end cap.

[0010] Therefore, in order to overcome the shortcomings of the prior art, an integrated rotating target material that is easy to connect to the equipment is provided, which is of great significance for improving the utilization efficiency and installation efficiency of the end head and the connection end with the equipment, and is conducive to improving the application convenience of the rotating target material in the field of magnetron sputtering. Summary of the invention

[0011] The object of the present invention is to provide an integrated rotating target material that is easy to connect to an equipment. The integrated rotating target material that is easy to connect to the equipment improves the connection method between the flange and the sputtering target body from welding to threaded connection, which not only improves the connection efficiency between the flange and the sputtering target body, but also improves the utilization rate of the flange; and the sealing effect of the flange and the equipment connection end is improved by arranging a groove for placing an O-ring on the connecting surface of the flange and the equipment connection end, thereby enabling the integrated rotating target material that is easy to connect to the equipment to operate stably.

[0012] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0013] The present invention provides an integrated rotating target material that is easy to connect with a device. The integrated rotating target material that is easy to connect with the device comprises a sputtering target material body, a device connecting end and an end connecting end respectively arranged at both ends of the sputtering target material body; the device connecting end is threadedly connected with a flange, and the connecting surface between the flange and the device connecting end is provided with a groove for placing an O-ring.

[0014] When an integrated rotating target is used for magnetron sputtering, one end of the integrated rotating target is connected to an end head to block one end of the integrated rotating target; the other end of the integrated rotating target is connected to a magnetron sputtering device so that the cooling medium provided by the magnetron sputtering device enters the cavity of the integrated rotating target to play a cooling role. In order to facilitate the connection between the integrated rotating target and the magnetron sputtering device, the prior art achieves a closed connection between the integrated rotating target and the magnetron sputtering device by welding a flange at the device connection end of the integrated rotating target. The present invention, however, improves the convenience of connecting the flange to the integrated rotating target by generating threads at the device connection end of the integrated rotating target when preparing the integrated rotating target, and connects the device connection end to the flange through threads; at the same time, it also overcomes the defect of poor concentricity caused by welding connection.

[0015] The threaded connection between the device connection end and the flange of the present invention includes two technical solutions: an external thread is arranged at the device connection end to be threadedly connected with the internal thread of the flange; or an internal thread is arranged at the device connection end to be threadedly connected with the external thread of the flange.

[0016] Preferably, a groove for placing an O-ring is provided on the connection surface between the flange and the equipment used for magnetron sputtering.

[0017] Preferably, the pitch of the threaded connection is 0.5-1 mm, for example, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm or 1 mm, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0018] Preferably, the diameter of the sputtering target body is 155-180 mm, for example, it can be 155 mm, 160 mm, 165 mm, 170 mm, 175 mm or 180 mm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0019] Preferably, the length of the sputtering target body is 1000-3000 mm, for example, 1000 mm, 1500 mm, 2000 mm, 2500 mm or 3000 mm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0020] Preferably, it is characterized in that the diameter of the device connection end is 135-165mm, for example, it can be 135mm, 140mm, 145mm, 150mm, 155mm, 160mm or 165mm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0021] Preferably, the length of the device connection end is 130-190 mm, for example, it can be 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm or 190 mm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0022] Preferably, the material of the sputtering target body includes any one of Al, aluminum alloy, Cu, copper alloy, Ti or titanium alloy.

[0023] Preferably, the material of the device connection end includes any one of Al, aluminum alloy, Cu, copper alloy, Ti or titanium alloy.

[0024] Preferably, the material of the terminal connection end includes any one of Al, aluminum alloy, Cu, copper alloy, Ti or titanium alloy.

[0025] Preferably, in order to ensure the concentricity of the one-piece rotating target material that is easy to connect to the equipment, the one-piece rotating target material that is easy to connect to the equipment is prepared by an one-piece casting method. Therefore, as a further preferred technical solution, the sputtering target body, the equipment connection end and the end connection end are made of the same material.

[0026] Preferably, the terminal connection end is connected to a terminal.

[0027] Preferably, the connection method between the end connection end and the end includes any one of welding, flange connection or threaded connection, or a combination of at least two of them.

[0028] The welding, flange connection and threaded connection methods described in the present invention are conventional welding, threaded connection and flange connection methods in the art, as long as the end caps and the end cap connection ends can be sealed.

[0029] Compared with the prior art, the present invention has the following beneficial effects:

[0030] The present invention improves the connection mode between the flange and the sputtering target body from welding to threaded connection, which not only improves the connection efficiency between the flange and the sputtering target body, but also improves the utilization rate of the flange; and by arranging a groove for placing an O-ring on the flange, the one-piece rotating target has good sealing performance when in use, thereby ensuring the cooling effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 A schematic diagram of the structure of an integrated rotating target material provided in Example 1 that is convenient for connection with a device;

[0032] Figure 2 A schematic diagram of the structure of a flange connected to an integrated rotating target material provided in Example 1 for easy connection with a device;

[0033] Figure 3 A schematic diagram of the structure of a flange connected to an integrated rotating target material provided in Example 2 for easy connection with the device;

[0034] Figure 4 A schematic diagram of the structure of an integrated rotating target material provided in Example 5 that is convenient for connection with a device;

[0035] Figure 5 A schematic diagram of the structure of an integrated rotating target material provided in Example 6 that is convenient for connection with a device;

[0036] Figure 6 This is a schematic diagram of the structure of a flange connected to an integrated rotating target material provided in Example 6 for easy connection to the equipment.

[0037] Among them: 1, sputtering target body; 2, end connection end; 3, equipment connection end; 4, flange; 5, groove for placing O-ring. DETAILED DESCRIPTION

[0038] The technical solution of the present invention is further described below by specific implementation methods. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0039] As a preferred technical solution for the one-piece rotating target material that is easy to connect with the equipment described in the present invention, the one-piece rotating target material that is easy to connect with the equipment includes a sputtering target material body 1, and an equipment connection end 3 and an end connection end 2 respectively arranged at both ends of the sputtering target material body 1; the equipment connection end 3 is threadedly connected with a flange 4, and the connecting surface between the flange 4 and the equipment connection end 3 is provided with a groove 5 for placing an O-ring. Preferably, the connecting surface between the flange 4 and the equipment used for magnetron sputtering is also provided with a groove 5 for placing an O-ring.

[0040] The pitch of the threaded connection is 0.5-1mm; the diameter of the sputtering target body 1 is 155-180mm; the length of the sputtering target body 1 is 1000-3000mm; the diameter of the equipment connection end 3 is 135-165mm; the length of the equipment connection end 3 is 130-190mm.

[0041] The materials of the sputtering target body 1, the equipment connection end 3 and the end connection end 2 are independently any one of Al, aluminum alloy, Cu, copper alloy, Ti or titanium alloy; further preferably, the materials of the sputtering target body 1, the equipment connection end 3 and the end connection end 2 are the same.

[0042] The terminal connection end 2 is connected to a terminal, and the connection method includes any one of welding, flange connection or threaded connection, or a combination of at least two of them.

[0043] Example 1

[0044] This embodiment provides an integrated rotating target material that is easy to connect to a device. The structural schematic diagram of the integrated rotating target material that is easy to connect to a device is as follows: Figure 1 As shown, it includes a sputtering target body 1, a device connection end 3 and a head connection end 2 respectively arranged at both ends of the sputtering target body 1; the device connection end 3 is threadedly connected with a flange 4, wherein the device connection end 3 is provided with an outer thread, the flange 4 is provided with an inner thread matching the outer thread, and the connection surface between the flange 4 and the device connection end 3 is provided with a groove 5 for placing an O-ring. The structural schematic diagram of the flange 4 is shown in Figure 2 shown.

[0045] The pitch of the threaded connection is 0.8 mm; the diameter of the sputtering target body 1 is 170 mm; the length of the sputtering target body 1 is 2000 mm; the diameter of the equipment connection end 3 is 150 mm; and the length of the equipment connection end 3 is 155 mm.

[0046] The materials of the sputtering target body 1, the equipment connection end 3 and the terminal connection end 2 are independently Al.

[0047] The terminal connection end 2 is welded with a terminal.

[0048] Example 2

[0049] The present embodiment provides an integrated rotating target material that is easy to connect to the equipment, including a sputtering target material body 1, and an equipment connection end 3 and an end connection end 2 respectively arranged at both ends of the sputtering target material body 1; the equipment connection end 3 is threadedly connected with a flange 4, wherein the equipment connection end 3 is provided with an outer thread, and the flange 4 is provided with an inner thread matching the outer thread, and the connection surface between the flange 4 and the equipment connection end 3 is provided with a groove 5 for placing an O-ring, and the connection surface between the flange 4 and the equipment used for magnetron sputtering is provided with a groove 5 for placing an O-ring, and the structural schematic diagram of the flange 4 is shown as follows Figure 3 shown.

[0050] The pitch of the threaded connection is 0.8 mm; the diameter of the sputtering target body 1 is 170 mm; the length of the sputtering target body 1 is 2000 mm; the diameter of the equipment connection end 3 is 150 mm; and the length of the equipment connection end 3 is 155 mm.

[0051] The materials of the sputtering target body 1, the equipment connection end 3 and the terminal connection end 2 are independently Al.

[0052] The terminal connection end 2 is welded with a terminal.

[0053] Example 3

[0054] The present embodiment provides an integrated rotating target material that is easy to connect to a device, and the integrated rotating target material that is easy to connect to the device includes a sputtering target material body 1, and a device connection end 3 and an end connection end 2 respectively arranged at both ends of the sputtering target material body 1; the device connection end 3 is threadedly connected with a flange 4, wherein the device connection end 3 is provided with an external thread, and the flange 4 is provided with an internal thread matching the external thread, and the connecting surface between the flange 4 and the device connection end 3 is provided with a groove 5 for placing an O-ring.

[0055] The pitch of the threaded connection is 0.5 mm; the diameter of the sputtering target body 1 is 155 mm; the length of the sputtering target body 1 is 1000 mm; the diameter of the equipment connection end 3 is 135 mm; and the length of the equipment connection end 3 is 130 mm.

[0056] The materials of the sputtering target body 1 , the equipment connection end 3 and the terminal connection end 2 are independently Cu.

[0057] The terminal connection end 2 is welded with a terminal.

[0058] Example 4

[0059] The present embodiment provides an integrated rotating target material that is easy to connect to a device, and the integrated rotating target material that is easy to connect to the device includes a sputtering target material body 1, and a device connection end 3 and an end connection end 2 respectively arranged at both ends of the sputtering target material body 1; the device connection end 3 is threadedly connected with a flange 4, wherein the device connection end 3 is provided with an external thread, and the flange 4 is provided with an internal thread matching the external thread, and the connecting surface between the flange 4 and the device connection end 3 is provided with a groove 5 for placing an O-ring.

[0060] The pitch of the threaded connection is 1 mm; the diameter of the sputtering target body 1 is 180 mm; the length of the sputtering target body 1 is 3000 mm; the diameter of the equipment connection end 3 is 165 mm; and the length of the equipment connection end 3 is 190 mm.

[0061] The materials of the sputtering target body 1, the equipment connection end 3 and the end connection end 2 are independently Ti.

[0062] The terminal connection end 2 is welded with a terminal.

[0063] Example 5

[0064] This embodiment provides an integrated rotating target material that is easy to connect to a device. The structural schematic diagram of the integrated rotating target material that is easy to connect to a device is as follows: Figure 4As shown, it includes a sputtering target body 1, an equipment connection end 3 and an end connection end 2 respectively arranged at both ends of the sputtering target body 1; the equipment connection end 3 is threadedly connected with a flange 4, wherein the equipment connection end 3 is provided with an external thread, the flange 4 is provided with an internal thread matching the external thread, and the connecting surface between the flange 4 and the equipment connection end 3 is provided with a groove 5 for placing an O-ring.

[0065] The pitch of the threaded connection is 0.8 mm; the diameter of the sputtering target body 1 is 155 mm; the length of the sputtering target body 1 is 2000 mm; the diameter of the equipment connection end 3 is 155 mm; the length of the equipment connection end 3 is 160 mm.

[0066] The materials of the sputtering target body 1 , the equipment connection end 3 and the terminal connection end 2 are independently CuAl alloys.

[0067] The terminal connection end 2 is flange-connected with a terminal.

[0068] Example 6

[0069] This embodiment provides an integrated rotating target material that is easy to connect to a device. The structural schematic diagram of the integrated rotating target material that is easy to connect to a device is as follows: Figure 5 As shown, it includes a sputtering target body 1, an equipment connection end 3 and an end connection end 2 respectively arranged at both ends of the sputtering target body 1; the equipment connection end 3 is threadedly connected with a flange 4, wherein the equipment connection end 3 is provided with an internal thread, and the flange 4 is provided with an external thread matching the internal thread. The connection surface between the flange 4 and the equipment connection end 3 is provided with a groove 5 for placing an O-ring, and the connection surface between the flange 4 and the equipment used for magnetron sputtering is also provided with a groove 5 for placing an O-ring. The structural schematic diagram of the flange 4 is shown in Figure 6 shown.

[0070] The pitch of the threaded connection is 0.8 mm; the diameter of the sputtering target body 1 is 170 mm; the length of the sputtering target body 1 is 1500 mm; the diameter of the equipment connection end 3 is 155 mm; and the length of the equipment connection end 3 is 140 mm.

[0071] The materials of the sputtering target body 1 , the equipment connection end 3 and the end connection end 2 are independently TiAl alloys.

[0072] The terminal connection end 2 is threadedly connected with a terminal.

[0073] The one-piece rotating target material provided in Examples 1-6, which is easy to connect with the end head, was tested for tightness. The equipment used for the test was a helium mass spectrometer leak detector, model SFJ-231. The test method was as follows: (1) using a proprietary fixture, the flange 4 connected to the equipment connection end 3 of the one-piece rotating target material, which is easy to connect with the end head, was connected to the helium mass spectrometer leak detector exhaust hose to perform exhaust; (2) when the vacuum degree of the helium mass spectrometer leak detector showed that the vacuum degree was 1×10 -10 Pa·m 3 ·s -1 Then, helium gas is sprayed at the end of the integrated rotating target and the equipment connection end 3; (3) the displayed value of the helium mass spectrometer leak detector is recorded.

[0074] During the test, the O-rings were coated with ULVAC Z-300 vacuum sealing grease and placed in 5 corresponding grooves for placing O-rings. The test results are shown in Table 1.

[0075] Table 1

[0076]

[0077]

[0078] In summary, the present invention improves the connection mode between the flange 4 and the sputtering target body 1 from welding to threaded connection, which not only improves the connection efficiency between the flange 4 and the sputtering target body 1, but also improves the utilization rate of the flange 4; and by providing a groove 5 for placing an O-ring on the flange 4, the one-piece rotating target has good sealing performance when used, thereby ensuring the cooling effect.

[0079] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. An integrated rotating target material that is easy to connect to equipment, characterized in that: The one-piece rotating target material that is easy to connect to the equipment includes a sputtering target material body, and an equipment connection end and a terminal connection end respectively arranged at two ends of the sputtering target material body; The material of the sputtering target body includes any one of Al, aluminum alloy, Cu, copper alloy, Ti or titanium alloy, and the material of the sputtering target body, the equipment connection end and the terminal connection end is the same; The one-piece rotating target material which is convenient for connection with the equipment is prepared by an one-piece casting method; The device connection end is threadedly connected with a flange, and the connection surface between the flange and the device connection end is provided with a groove for placing an O-ring, and the device connection end is connected to the magnetron sputtering device through the flange; The diameter of the connecting end of the device is 135-165 mm; The length of the device connection end is 130-190 mm.

2. The integrated rotating target material that is easy to connect to the equipment according to claim 1, characterized in that: The pitch of the threaded connection is 0.5-1 mm.

3. The integrated rotating target material that is easy to connect to the equipment according to claim 1, characterized in that: The diameter of the sputtering target body is 155-180 mm.

4. The integrated rotating target material that is easy to connect to equipment according to claim 3, characterized in that: The length of the sputtering target body is 1000-3000 mm.

5. The integrated rotating target material that is easy to connect to equipment according to claim 1, characterized in that: The terminal connection end is connected with a terminal; The connection method between the end connection end and the end head includes any one of welding, flange connection or threaded connection or a combination of at least two of them.

Images