Ion source gas supply structure and ion source device

Abstract

The present application relates to an ion source gas supply structure and an ion source device, including: an airflow loop arranged around an anode component, and an outlet arranged on the anode component and connected to the airflow loop; wherein the outlet is distributed along the middle of the anode component; the airflow loop is connected to an external process gas, and the process gas is transported to each of the outlets, and is led out from the middle of the anode component through the outlet. This technical solution transports the process gas to each of the outlets and leads it out from the middle of the anode component, so that the process gas can be more fully reacted in the ionization chamber, thereby improving the ionization efficiency of the ion source, avoiding process gas deposition, and reducing corrosion to the protective device on the upper part of the magnet.

Description

Technical Field

[0001] The present application relates to the technical field of ion sources, and in particular to an ion source gas supply structure and an ion source device. Background Art

[0002] Ion source is an applied science and technology with wide applications, many types, many sciences involved, strong process technology, and rapid development. As a very common type of ion source, Hall ion source is mostly used in the field of thin film deposition as a deposition auxiliary component to improve the physical properties of thin films. The Hall ion source is a process gas that is plasmatized by the anode in the cooperation of a strong axial magnetic field. The plasmatized gas is accelerated by the anode to separate the gas ions and form an ion beam.

[0003] In conventional ion sources, reference Figure 1 , Figure 1 It is a schematic diagram of the gas supply structure of a traditional ion source. The process gas is generally distributed into the ionization chamber inside the ion source through the gas inlet pipe 210 from the bottom of the anode component 10 of the ion source through the gas distribution plate 201. The gas distribution plate 201 hinders the fluidity of the gas, resulting in a low reaction efficiency of the process gas. In addition, the process gas is corrosive. Corrosive gas exists at the bottom of the anode component 10 for a long time, which can easily cause corrosive damage to the components on the upper part of the magnet 20. Summary of the invention

[0004] The purpose of the present application is to solve one of the above-mentioned technical defects, especially the defects of low process gas reaction efficiency and process gas corrosion of components, and to provide an ion source gas supply structure and an ion source device.

[0005] The present application provides an ion source gas supply structure, comprising:

[0006] An air flow loop is arranged around the anode component, and an air outlet is arranged on the anode component and communicated with the air flow loop; wherein the air outlet is distributed along the middle part of the anode component;

[0007] The gas flow loop is connected to an external process gas, and the process gas is transported to each of the gas outlets, and is then led out from the middle of the anode component through the gas outlets.

[0008] In one embodiment, the gas outlets are evenly distributed along the inside of the anode component, and each gas outlet is connected to the gas flow loop through a gas path; wherein the process gas enters the gas flow loop and is led out into the ionization chamber through each gas outlet.

[0009] In one embodiment, the gas path between the gas outlet and the gas flow circuit is non-vertical in design, the gas outlet has an inclined angle, and the process gas forms a cyclone in the ionization chamber after passing through the gas outlet.

[0010] In one embodiment, a step recessed inwardly is provided in the middle of the anode component along the plane of the gas outlet, wherein the process gas flows outward from the step through the gas outlet.

[0011] In one embodiment, the anode component is divided into an upper component and a lower component along the air outlet plane, and the airflow loop is a milling groove opened on the upper component and / or the lower component.

[0012] In one embodiment, the ion source gas supply structure further includes: a gas isolation component; wherein one end of the gas isolation component is connected to the gas inlet, and the other end is connected to the gas flow circuit.

[0013] In one embodiment, the gas isolation component is installed on the outer side of the anode component, one end of the gas isolation component is provided with an air inlet through a pipeline, and the other end of the gas isolation component is connected to the air flow circuit through a pipeline.

[0014] In one embodiment, a spiral pipeline is provided in the gas isolation component; the process gas enters the spiral pipeline of the isolator through the gas inlet and is transported to the gas flow circuit in a spiral flow manner.

[0015] In one embodiment, the gas isolation component includes a sealed cylindrical outer shell and an internal insert component; wherein the internal insert component is cylindrical in design and has spiral grooves etched on the outside; the internal insert component is inserted into the cylindrical outer shell, and the outer side of the internal insert component is sealed and fitted with the inner wall of the cylindrical outer shell.

[0016] The present application also provides an ion source device, comprising: the ion source gas supply structure as described above.

[0017] The above-mentioned ion source gas supply structure and ion source device are arranged in an air flow loop around the anode component, and an outlet is arranged in the middle position of the anode component; the external process gas is connected through the air flow loop, and the process gas is transported to each of the outlets and is discharged from the middle position of the anode component; so that the process gas can be more fully reacted in the ionization chamber, the ionization efficiency of the ion source is improved, and the deposition of process gas is avoided, and the corrosion of the protective device on the upper part of the magnet is reduced.

[0018] Furthermore, the gas path between the gas outlet and the gas flow circuit is designed to be non-vertical, and the gas outlet and the cut surface are designed to have an inclined angle, so that the process gas forms a cyclone in the ionization chamber after passing through the gas outlet, which can keep the process gas flowing on the surface of the anode component for a long time and fully react, further improving the use efficiency. In addition, an inwardly concave step is provided along the plane of the gas outlet in the middle of the anode component, and the process gas flows out from the step through the gas outlet, thereby ensuring smooth output of the process gas, and through the step, when the reaction gas using oxygen on the surface of the anode component is placed, it is possible to avoid the formation of an insulating layer on the entire surface of the anode component, ensuring that the step part also has a conductive effect.

[0019] Furthermore, the ion source gas supply structure is also designed with a gas isolation component, which has a spiral pipeline. The process gas enters the spiral pipeline of the isolator through the air inlet and is transported to the air flow circuit in a spiral flow manner. Since the gas path of the process gas is transmitted in a spiral manner, the distance of the transmission path is increased, effectively preventing gas ignition and arcing.

[0020] Additional aspects and advantages of the present application will be partially given in the following description, which will become apparent from the following description, or will be understood through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the following description of the embodiments in conjunction with the accompanying drawings, in which:

[0022] Figure 1 is a schematic diagram of the ion source structure;

[0023] Figure 2 Shown is a cross-sectional view of the ion source gas supply structure;

[0024] Figure 3 A three-dimensional cross-sectional view of a gas supply structure for an ion source;

[0025] Figure 4 is a top view of the air outlet structure;

[0026] Figure 5 This is a schematic diagram of the installation position of the gas isolation component;

[0027] Figure 6 A cross-sectional view of an ion source with gas isolation components installed;

[0028] Figure 7 A three-dimensional cross-sectional view of an ion source with gas isolation components installed;

[0029] Figure 8 It is a schematic diagram of the structure of the gas isolation component. DETAILED DESCRIPTION

[0030] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be interpreted as limiting the present application.

[0031] Those skilled in the art will appreciate that, unless otherwise stated, the singular forms "a", "an", "said" and "the" used herein may also include plural forms. It should be further understood that the term "comprising" used in the specification of the present application refers to the presence of the features, integers, steps, operations, but does not exclude the presence or addition of one or more other features, integers, steps, operations.

[0032] The present application provides an ion source gas supply structure, referring to Figure 2 and 3 , Figure 2 The figure shows a cross-sectional view of the ion source gas supply structure. Figure 3 is a three-dimensional cross-sectional view of an ion source gas supply structure, which mainly includes an air flow loop 110 ( Figure 2 The hatched part) and the gas outlet 101 are arranged on the anode component 10 and connected to the air flow circuit 110; wherein, the gas outlet 101 is distributed along the middle part of the anode component 10. In actual application, the air flow circuit 110 is connected to the external process gas, and then the process gas is transported to each gas outlet 101, and is discharged from the middle position of the anode component 10 through the gas outlet 101.

[0033] Combination Figure 1-3 Analysis, such as Figure 1 In the gas supply structure of the traditional ion source, the air inlet pipe 210 passes through the magnet 20 at the bottom and enters the ionization chamber. A gas distribution plate 201 (which distributes gas and protects the magnet 20 at the bottom) is set on the gas outlet 101 to guide the introduced process gas to the surroundings and then flow to the anode component 10 for reaction. The process gas is transmitted over a long distance, and the ionization efficiency is low. Moreover, when the process gas enters from the bottom, long-term gas deposition will be formed at the bottom, and the process gas will corrode the gas distribution plate 201. Figure 2 and 3The gas supply structure provided in the present application shown in the figure improves the structure of the process gas intake from the bottom of the anode component 10. The air flow loop 110 is arranged around the anode component 10, and the gas outlet 101 is arranged in the middle position of the anode component 10. The process gas is designed to enter the ionization chamber from the middle of the anode. Since the electric field and magnetic field distribution in the middle of the anode are the most effective positions, the process gas can be quickly ionized, thereby improving the ionization efficiency. At the same time, the gas content around the gas distribution plate 201 is reduced, and the gas distribution plate 201 can be directly replaced by a device for protecting the magnet 20, thereby reducing the corrosion of the protective device of the magnet 20.

[0034] In one embodiment, reference Figure 4 , Figure 4 1 is a top view of the gas outlet structure; the gas outlets 101 are evenly distributed along the inside of the anode component 10, and as shown in the figure, there are 8 gas outlets 101, each of which is connected to the airflow loop 110 through a gas path; in actual operation, the process gas enters the airflow loop 110, and then is led out into the ionization chamber through each gas outlet 101. Furthermore, the gas path between the gas outlet 101 and the airflow loop 110 can be designed as a non-vertical design, and the direction of the gas outlet 101 has an inclined angle, so that the process gas forms a cyclone in the ionization chamber after passing through the gas outlet 101.

[0035] like Figure 4 Through the design of a certain angle of the gas path, the process gas does not enter the ionization chamber vertically at 90°, but is designed to be inclined at an angle with the cut surface through the gas outlet 101. In this way, a cyclone effect can be generated when the process gas enters the ionization chamber. The direction of the gas flow is shown by the dotted arrow in the figure, so that the process gas forms a spiral "tornado" cyclone around the anode component 10, which can keep the process gas flowing on the surface of the anode component 10 for a long time, increase the residence time of the gas in the middle of the anode component 10, and obtain a better ionization effect.

[0036] In one embodiment, reference Figure 3 The ion source gas supply structure of the present application may further include an inwardly recessed step 120 arranged along the plane of the gas outlet 101 in the middle of the anode component 10 , and the process gas flows out from the step 120 through the gas outlet 101 .

[0037] like Figure 3 In the embodiment, an inwardly recessed step 120 is provided on the plane of the gas outlet 101 in the middle of the anode component 10, and the process gas flows out from the step 120 through the gas outlet 101, thereby ensuring smooth output of the process gas. In addition, when the reaction gas using oxygen is placed on the surface of the anode component 10, the step 120 can avoid the formation of an insulating layer on the entire surface of the anode component 10, thereby ensuring that the step 120 also has a conductive effect.

[0038] For example, when the ion source is used for film coating, an insulating layer is easily generated on the surface of the anode component 10 due to deposition during the coating process, thereby hindering the electric field from functioning; however, after passing through the designed step 120, the process gas can be output along the step 120, which has better transmission characteristics, and due to the existence of the step 120, at least the conductivity of the step 120 is guaranteed not to be affected, so that the ion source device can have a better conductive effect.

[0039] In one embodiment, Figure 3 As shown, the anode component 10 can be designed to be divided into an upper component 10a and a lower component 10b along the plane of the gas outlet 101, and the airflow loop 110 is a milling groove opened on the upper component 10a and the lower component 10b. As shown in the figure, the anode component 10 can be divided into two parts, the upper component 10a and the lower component 10b, and the airflow loop 110 is milled out in the lower component 10b, or in the upper component 10a and the lower component 10b by a milling tool, and then the upper component 10a is fixed to the lower component 10b with screws. The technical solution of this embodiment is constructed by dividing into two parts, and can be directly engraved and processed by a milling cutter, which is convenient for design and production, and also convenient for installation and disassembly.

[0040] In one embodiment, reference Figures 4 to 8 As shown, the ion source gas supply structure provided in the present application may also include a gas isolation component, Figure 5 This is a schematic diagram of the installation position of the gas isolation component. Figure 6 A cross-sectional view of the ion source with the gas isolation components installed. Figure 7 A three-dimensional cross-sectional view of the ion source with gas isolation components installed. Figure 8 It is a schematic diagram of the structure of the gas isolation component.

[0041] One end of the gas isolation component 30 is connected to the air inlet, and the other end is connected to the air flow loop 110. Since the inlet and outlet positions of the process gas are generally connected to a large voltage. The voltage difference will cause the gas to arc and short-circuit. The main function of the gas isolation component 30 is to isolate the gas entering the ventilation pipe to avoid the gas arcing and short-circuiting phenomenon. The gas isolation component 30 can be installed on the outside of the anode component 10. One end of the gas isolation component 30 is provided with an air inlet through a pipeline, and the other end is connected to the air flow loop 110 through a pipeline. For the gas isolation component 30, a spiral pipeline can be provided inside it; thus, the process gas can enter the spiral pipeline of the isolator through the air inlet and be transported to the air flow loop 110 in a spiral flow manner.

[0042] The gas isolation component 30 may include a sealed cylindrical shell 310 and an internal insert component 320, such as Figure 8 ,in Figure 8 (a) is the appearance structure diagram of the cylindrical shell. Figure 8 (b) is a structural diagram of the internal insert component 320, wherein the internal insert component 320 can be designed as a cylinder with spiral grooves etched on the outside; the internal insert component 320 is inserted into the cylindrical shell 310, and the outer side of the internal insert component 320 is sealed and fitted with the inner wall of the cylindrical shell 310. Thus, a closed spiral pipeline is formed in the gas isolation component 30, and the process gas enters the spiral pipeline of the isolator through the air inlet and is transported to the gas flow circuit 110 in a spiral flow manner. Since the gas path of the process gas is transmitted in a spiral manner, the distance of the transmission path is increased, effectively preventing the gas ignition and arcing phenomenon.

[0043] The present application also provides an ion source device, which includes the ion source gas supply structure described in any of the above embodiments; the ion source device of the present application guides the process gas from the middle of the anode component 10, so that the process gas can be more fully reacted in the ionization chamber, improves the ionization efficiency of the ion source, and avoids the deposition of process gas, reducing the corrosion of the bottom magnet 20 component. By setting an inwardly concave step 120 along the plane of the gas outlet 101 in the middle of the anode component 10, the process gas flows out from the step 120 through the gas outlet 101, thereby ensuring smooth output of the process gas, and through the step 120, when the reaction gas using oxygen on the surface of the anode component 10 can be placed, it is avoided that an insulating layer is generated on the entire surface of the anode component 10, ensuring that the step 120 also has a conductive effect; it is transported to the gas flow circuit 110 in a spiral flow manner through the gas isolation component 30, which increases the distance of the transmission path and effectively prevents gas ignition and arcing.

[0044] It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as generally understood by those skilled in the art to which this application belongs. It should also be understood that terms such as those defined in common dictionaries should be understood to have meanings consistent with the meanings in the context of the prior art, and will not be interpreted with idealized or overly formal meanings unless specifically defined as here.

[0045] The above description is only a partial implementation method of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. An ion source gas supply structure, characterized in that: include: An air flow loop is arranged around the anode component, and an air outlet is arranged on the anode component and communicated with the air flow loop; wherein the air outlet is distributed along the middle part of the anode component; The gas flow loop is connected to an external process gas, and the process gas is transported to each of the gas outlets, and is led out from the middle of the anode component through the gas outlets; When the ion source is used for film coating, a step recessed inwardly is provided in the middle of the anode component along the plane of the gas outlet, and the process gas flows out from the step through the gas outlet; The process gas enters the ionization chamber from the middle of the anode component through the gas flow loop.

2. The ion source gas supply structure according to claim 1, characterized in that: The gas outlets are evenly distributed along the inside of the anode component, and each gas outlet is connected to the gas flow loop through a gas path; wherein the process gas enters the gas flow loop and is led out into the ionization chamber through each gas outlet.

3. The ion source gas supply structure according to claim 2, characterized in that: The gas path between the gas outlet and the gas flow loop is non-vertical in design, the gas outlet has an inclined angle, and the process gas forms a cyclone in the ionization chamber after passing through the gas outlet.

4. The ion source gas supply structure according to claim 1, characterized in that: The anode component is divided into an upper component and a lower component along the air outlet plane, and the air flow loop is a milling groove opened on the upper component and / or the lower component.

5. The ion source gas supply structure according to claim 1, characterized in that: Also includes: A gas isolation component; wherein one end of the gas isolation component is connected to the air inlet, and the other end is connected to the air flow circuit.

6. The ion source gas supply structure according to claim 5, characterized in that: The gas isolation component is installed on the outer side of the anode component. One end of the gas isolation component is provided with an air inlet through a pipeline, and the other end is connected to the air flow circuit through a pipeline.

7. The ion source gas supply structure according to claim 5, characterized in that: A spiral pipeline is arranged in the gas isolation component; the process gas enters the spiral pipeline of the isolator through the gas inlet and is transported to the gas flow circuit in a spiral flow manner.

8. The ion source gas supply structure according to claim 7, characterized in that: The gas isolation component includes a sealed cylindrical shell and an internal insertion component; wherein the internal insertion component is cylindrical in design and has spiral grooves etched on the outside; the internal insertion component is inserted into the cylindrical shell, and the outer side of the internal insertion component is sealed and fitted with the inner wall of the cylindrical shell.

9. An ion source device, characterized in that: include: The ion source gas supply structure according to any one of claims 1 to 8.

Images