OLED display device and manufacturing method thereof

By forming a first etching area of ​​an alternating concave structure in the display area of ​​the OLED display device bypassing the opening holes and cutting along the edge of the first etching area during laser cutting, the problem of edge damage during bending is solved, and the improvement of the improvement of the opening holes is improved. Tensile properties and reliability.

CN113206137BActive Publication Date: 2024-12-13BOE TECHNOLOGY GROUP CO LTD
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Patent Information

Application Number
CN202110476532.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2021-04-29
Publication Date
2024-12-13
Estimated Expiration
2041-04-29

AI Technical Summary

Technical Problem

OLED display devices are prone to wrinkles or cracks when bent, which affects the display effect. They cannot bypass the opening during laser cutting, resulting in failure of the opening edge and structural damage.

Method used

By forming a first etching area in the display area, the opening is circulated by the boundary line between the display area, and alternately arranged depressions and protruding parts are adopted to ensure the integrity of the opening and the opening is carried out, and the opening is along the laser cutting process. Cut the edges of the first etching zone to avoid direct cutting of the opening.

Benefits of technology

It improves the tensile performance and reliability of the OLED display device, avoids cracking of the opening edges, and ensures the integrity of the display effect.

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Abstract

An embodiment of the present invention provides an OLED display device and a preparation method thereof, wherein the OLED display device includes a flat area and a bending area surrounding the flat area; the bending area is bent toward the backlight side of the flat area, and the bending area includes at least one stretching area; the stretching area includes a display area and a first etching area, the first etching area is located at an edge of the display area away from the flat area, and the first etching area is connected to at least part of the edge of the display area away from the flat area; the display area includes at least one opening, and a boundary line between the first etching area and the display area bypasses the opening; the display area includes a first display film layer, and the first etching area is an area where the first display film layer is etched and removed; the stretching performance and reliability of the OLED display device are improved.
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Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to an OLED display device and a preparation method thereof. Background Art

[0002] Organic Light Emitting Diode (OLED) is an active light-emitting display device with the advantages of self-luminescence, wide viewing angle, high contrast, low power consumption, wide color gamut, light weight, and special-shaped. With the continuous development of display technology, OLED technology is increasingly used in flexible displays and transparent displays. Transparent display is an important branch of display technology. It refers to the display of images in a transparent state. Viewers can not only see the image in the display device, but also the scene behind the display device, which can realize virtual reality / augmented reality (VR / AR) and 3D display functions.

[0003] In mobile phones and other terminal devices, in order to increase the screen-to-body ratio, four-curved OLED display devices are often used. The four corners of the OLED display device are bent, and holes are opened in the OLED display device to form a stretchable (compressible) structure, so that when the OLED display device is attached to the 3D cover, it is stretched (compressed) to achieve an integrated display effect. However, when the OLED display device is bent, wrinkles or cracks may occur at the edge of the OLED display device, affecting the display effect of the bent area. Summary of the invention

[0004] The embodiment of the present invention provides an OLED display device and a preparation method thereof, which improves the stretchability and reliability of the OLED display device.

[0005] In the first aspect, an embodiment of the present invention provides an OLED display device, comprising a flat area and a bending area surrounding the flat area; the bending area is bent toward the backlight side of the flat area, and the bending area comprises at least one stretching area; the stretching area comprises a display area and a first etching area, the first etching area is located at an edge of the display area away from the flat area, and the first etching area is connected to at least part of the edge of the display area away from the flat area; the display area comprises at least one opening, and a boundary line between the first etching area and the display area bypasses the opening; the display area comprises a first display film layer, and the first etching area is an area where the first display film layer is etched and removed.

[0006] In an exemplary embodiment, a boundary line between the first etching area and the display area includes a plurality of concave portions and a plurality of convex portions that are alternately arranged.

[0007] In an exemplary embodiment, the display area includes at least two openings, the recessed portion bypasses the openings, and the protruding portion is located between adjacent openings.

[0008] In an exemplary embodiment, the at least two openings include at least two first slits, the at least two first slits extend along a first direction, the at least two first slits are arranged at intervals along a second direction, the first direction is different from the second direction, the recessed portion bypasses the ends of the at least two first slits, and the protruding portion is located between the at least two adjacent first slits.

[0009] In an exemplary embodiment, the display area includes at least three openings, the at least three openings include at least two first slit holes and at least one second slit hole, the at least two first slit holes extend along a first direction, the at least two first slit holes are arranged at intervals along a second direction, the at least one second slit hole extends along the second direction, the first direction is different from the second direction, the at least one second slit hole is located between the at least two adjacent first slit holes, and is combined with the at least two first slit holes to form at least one groove, the recessed portion bypasses the ends of the at least two first slit holes, and the protruding portion is located in the at least one groove.

[0010] In an exemplary embodiment, the minimum distance between the boundary line and the edge of the opening is equal to the minimum distance between adjacent edges of the opening.

[0011] In an exemplary embodiment, corners of the recessed portion and / or the protruding portion are rounded.

[0012] In an exemplary embodiment, the radius of the rounded corner is 3 to 10 times the width of the opening.

[0013] In an exemplary embodiment, the opening is a rounded rectangular shape.

[0014] In an exemplary embodiment, in a direction perpendicular to the OLED display device, the first etching region includes a functional structure film layer, and the functional structure film layer wraps an edge of the first display film layer.

[0015] In an exemplary embodiment, the functional structural film layer includes a first functional film layer and a second functional film layer that are disposed opposite to each other, and a connecting layer disposed between the first functional film layer and the second functional film layer, wherein the connecting layer wraps an edge of the first display film layer.

[0016] In an exemplary embodiment, in a direction perpendicular to the OLED display device, the first display film layer includes a substrate, the substrate includes a first flexible substrate layer, a first buffer layer, a second flexible substrate layer and a second buffer layer which are stacked, the first flexible substrate layer and the second flexible substrate layer are made of an organic material, the first buffer layer and the second buffer layer are made of an inorganic material, and the edges of the first flexible substrate layer and the second flexible substrate layer close to the first etching area are recessed in a direction away from the first etching area.

[0017] In an exemplary embodiment, the etching area is connected to the entire edge of the display area on a side away from the planar area.

[0018] In an exemplary embodiment, the bending area further includes at least one frame area connected to the stretching area, and a second etching area is provided at least partially at the edge of the frame area away from the flat area. In a direction perpendicular to the OLED display device, the frame area includes a second display film layer, and the second etching area is an area where the second display film layer is etched and removed.

[0019] In a second aspect, an embodiment of the present invention further provides a method for preparing an OLED display device, comprising:

[0020] A flat area and a bending area surrounding the flat area are formed; the bending area is bent toward the backlight side of the flat area, and the bending area includes at least one stretching area; the stretching area includes a display area and a first etching area, the first etching area is located at an edge of the display area away from the flat area, and the first etching area is connected to at least part of the edge of the display area away from the flat area; the display area includes at least one opening, and a boundary line between the first etching area and the display area bypasses the opening; the display area includes a first display film layer, and the first etching area is an area where the first display film layer is etched and removed.

[0021] In an exemplary embodiment, the first etched region and the opening are formed by a same etching process.

[0022] In an exemplary embodiment, a boundary line between the first etching area and the display area is formed into a plurality of concave portions and a plurality of convex portions which are alternately arranged.

[0023] In an exemplary embodiment, at least two openings are formed in the display area, the recessed portion bypasses the openings, and the protruding portion is located between adjacent openings.

[0024] The present invention provides an OLED display device and a preparation method thereof. By forming a first etching area, a boundary line between the first etching area and a display area bypasses an opening to ensure the integrity of the opening, thereby improving the tensile performance and reliability of the OLED display device.

[0025] Of course, it is not necessary to achieve all of the advantages described above at the same time when implementing any product or method of the present invention. Other features and advantages of the present invention will be described in the subsequent description embodiments, and partly become apparent from the description embodiments, or be understood by practicing the present invention. The purposes and other advantages of the embodiments of the present invention can be achieved and obtained by the structures specifically pointed out in the description, claims and drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The accompanying drawings are used to provide a further understanding of the technical solution of the present invention and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the technical solution of the present invention and do not constitute a limitation on the technical solution of the present invention. The shapes and sizes of the components in the accompanying drawings do not reflect the actual proportions and are only intended to illustrate the contents of the present invention.

[0027] Figure 1 is a structural schematic diagram of an OLED display device;

[0028] Figure 2 This is an enlarged view of an OLED display device before cutting;

[0029] Figure 3 The structure of the OLED display device according to the embodiment of the present invention is shown in FIG. Figure 1 ;

[0030] Figure 4 The OLED display device of the embodiment of the present invention is magnified Figure 1 ;

[0031] Figure 5 is a cross-sectional view of a stretching area in an OLED display device according to an embodiment of the present invention;

[0032] Figure 6 is a cross-sectional view of a frame area in an OLED display device according to an embodiment of the present invention;

[0033] Figure 7 The structure of the OLED display device according to the embodiment of the present invention is shown in FIG. Figure 2 ;

[0034] Figure 8 The OLED display device of the embodiment of the present invention is magnified Figure 2 ;

[0035] Fig. 9 The middle part is a schematic diagram showing the structure of a motherboard in an embodiment of the present invention. DETAILED DESCRIPTION

[0036] The specific embodiments of the present invention are further described in detail below in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention. It should be noted that, in the absence of conflict, the embodiments in this application and the features in the embodiments can be combined arbitrarily with each other.

[0037] The manufacturing of OLED display devices is mainly divided into three major processes: array engineering (array), organic film engineering (OLED) and module engineering (module). The array engineering mainly forms a flexible substrate by performing a PI coating process on a glass substrate, and then repeatedly stacks film layers of different patterns and materials on the flexible substrate through processes such as film formation, exposure, and etching to form a driving structure layer, such as an LTPS (low-temperature polycrystalline silicon) semiconductor thin-film transistor driving circuit.

[0038] The organic film forming process mainly uses vacuum evaporation to deposit organic light-emitting materials and cathode materials on the driving structure layer to form a light-emitting structure layer, and then packages it in an oxygen-free environment.

[0039] The module engineering section mainly includes the module process. The module process mainly involves laser peeling and supporting film attachment of the display motherboard, and then cutting according to different product models, and forming a full module product through panel testing, polarizer attachment, chip (IC) binding, flexible printed circuit board (FPC) binding and cover board bonding, and finally module testing, packaging and storage.

[0040] Figure 1 is a structural schematic diagram of an OLED display device; Figure 2 This is an enlarged view of an OLED display device before cutting. Figure 2 for Figure 1 The enlarged image of the OLED display device before cutting at a is used as an example for explanation. Figure 1 and Figure 2As shown, in a direction parallel to the OLED display device, the OLED display device includes a flat area 100 and a bending area 200 surrounding the flat area 100, the bending area 200 is bent toward the backlight side of the flat area 100, and the bending area 200 includes at least one stretching area 300 and a frame area 500 connected to the stretching area 300. Taking the OLED display device as a rectangle as an example, the bending area 200 is a rounded rectangular ring, which is arranged around the flat area 100. The bending area 200 includes four stretching areas 300 and four frame areas 500, the four stretching areas 300 are respectively located at the four corners of the bending area 200, the four frame areas 500 are respectively located at the four sides of the bending area 200, and the stretching area 300 is respectively connected to two adjacent frame areas 500. The stretching area 300 includes at least one opening 1, and the opening 1 can leave a light channel for devices such as an under-screen light probe and an under-screen camera, and can also be used to provide a deformation space during stretching, improve the flexibility of the display screen, and realize a stretchable display screen. In the module process, before the OLED display device is cut, a cutting line 4 is formed at the edge of the stretching zone 300. During cutting, the laser cuts along the cutting line 4. However, due to the laser cutting precision tolerance, the laser cutting heat-affected zone and the production rhythm, the cutting line 4 cannot bypass the opening 1. It is necessary to extend the stretching zone 300 to the outside of the cutting line 4, that is, the opening 1 on the stretching zone 300 is extended to the peripheral area of ​​the OLED display device. The cutting line 4 is directly cut without considering the pattern of the opening 1. Since the heat-affected zone of laser cutting is large, it is easy to form cracks at the fragile edge of the opening 1, causing failure. And this cutting method will cut the opening 1 in half, forming many open-shaped openings 1, causing the opening 1 to be over-stretched, and generating significant stress concentration at the edge of the stretching zone 300, thereby causing structural damage and destroying the reliability of the device.

[0041] An embodiment of the present invention provides a device including a flat area and a bending area surrounding the flat area; the bending area bends toward the backlight side of the flat area, and the bending area includes at least one stretching area; the stretching area includes a display area and a first etching area, the first etching area is located at an edge of the display area away from the flat area, and the first etching area is connected to at least part of the edge of the display area away from the flat area; the display area includes at least one opening, and the boundary line between the first etching area and the display area bypasses the opening; the display area includes a first display film layer, and the first etching area is an area where the first display film layer is etched and removed.

[0042] The OLED display device of the embodiment of the present invention forms the first etching area so that the boundary line between the first etching area and the display area bypasses the opening to ensure the integrity of the opening, thereby improving the tensile performance and reliability of the OLED display device.

[0043] Figure 3 The structure of the OLED display device according to the embodiment of the present invention is shown in FIG. Figure 1 ; Figure 4 The OLED display device of the embodiment of the present invention is magnified Figure 1 ; Figure 5 FIG. 1 is a cross-sectional view of a stretching region in an OLED display device according to an embodiment of the present invention. Figure 4 for Figure 3 An enlarged view of the OLED display device b in FIG. Figure 5 for Figure 3 The cross-sectional view of the OLED display device along the BB direction is used as an example for explanation. Figure 3 , Figure 4 and Figure 5 As shown, in a direction parallel to the OLED display device, the OLED display device of the embodiment of the present invention includes a flat area 100 and a bending area 200 surrounding the flat area 100, and the bending area 200 is bent toward the backlight side of the flat area 100. Among them, the side of the flat area 100 that transmits light is the display side, and the backlight side of the flat area 100 refers to the side away from the display side of the flat area 100. The bending area 200 includes at least one stretching area 300. Taking the OLED display device as a rounded rectangle as an example, the bending area 200 is a rounded rectangular ring, which is arranged around the flat area 100. The bending area 200 includes four stretching areas 300, and the four stretching areas 300 are respectively located at the four corners of the bending area 200. The stretching area 300 includes a display area 400 connected to the flat area 100 and a first etching area 600 connected to at least part of the edge of the display area 400 away from the flat area 100. The first etching area 600 is located at the edge of the stretching area 300. The display area 400 includes at least one opening 1, which can leave a light channel for devices such as an under-screen optical probe and an under-screen camera, and can also be used to provide a deformation space when stretched, thereby improving the flexibility of the display screen and realizing a stretchable display screen. The boundary line 5 between the first etched area 600 and the display area 400 bypasses the opening 1, so that the boundary line 5 between the first etched area 600 and the display area 400 is spaced from the edge of the opening 1.

[0044] In a direction perpendicular to the OLED display device, the display area 400 includes a first display film layer 40, the first display film layer 40 includes a substrate and various structural film layers stacked on the substrate, and the first display film layer 40 is used to emit light. The first etching area 600 is an area where the first display film layer 40 is etched and removed. In the module process, when cutting the OLED display device, the laser cuts along the edge of the first etching area 600 away from the display area 400. The first etching area 600 separates the laser from the opening 1 to prevent the laser from cutting the opening 1, thereby ensuring the integrity of the opening 1 and improving the tensile performance and reliability of the OLED display device.

[0045] In an exemplary embodiment, the planar structure of the first display film layer 40 includes a plurality of island regions distributed in an array and separated from each other, an opening 1 located between adjacent island regions, and a bridge region connecting adjacent island regions to each other, the island region is used for image display, the opening 1 is used to provide a deformation space when stretched and form a hole for light to pass through, and the bridge region is used for wiring and transmitting tension. Each island region may include one or more pixel units, and each pixel unit includes 3 (such as red, green, and blue) or 4 (such as red, green, blue, and white) light-emitting units that emit light of different colors.

[0046] In an exemplary embodiment, the opening 1 is a microgroove or microhole that penetrates the OLED display device, and the opening 1 is a rounded rectangle, so that the opening 1 has good tensile properties and avoids the opening 1 from breaking when stretched; the width-to-length ratio of the opening 1 is 1:10 to 1:30, such as: the width of the opening 1 is 15um and the length is 300um.

[0047] In an exemplary embodiment, a plurality of openings 1 are arranged at intervals and can be combined to form a variety of shapes, such as an I-shape, a T-shape, and the like.

[0048] In an exemplary embodiment, if Figure 4 As shown, the boundary line 5 between the first etching area 600 and the display area 400 includes a plurality of recessed portions 2 and a plurality of protruding portions 3 arranged alternately. The plurality of recessed portions 2 and the plurality of protruding portions 3 are combined to form a wave shape, and the plurality of recessed portions 2 and the plurality of protruding portions 3 extend along the direction of the edge of the opening 1, so that the distance from the boundary line 5 between the first etching area 600 and the display area 400 to the edge of the opening 1 is uniform, so that the edge of the opening 1 is subjected to uniform force, and the opening 1 is prevented from being broken when stretched.

[0049] In an exemplary embodiment, if Figure 4 As shown, the display area 400 includes at least two openings 1, the recessed portion 2 bypasses the end of the opening 1, and the protruding portion 3 is located between adjacent openings 1, so that the distance between the boundary line 5 and the edge of the opening 1 is the same or similar, so that the edge of the opening 1 is evenly stressed to avoid rupture of the opening 1 when stretched.

[0050] In an exemplary embodiment, if Figure 4As shown, the display area 400 includes at least two openings 1, and the at least two openings 1 include at least two first slit holes 6. The first slit holes 6 are strip-shaped slit holes. At least two first slit holes 6 extend along the first direction. At least two first slit holes 6 are arranged at intervals along the second direction to form a first slit hole row. A plurality of first slit hole rows can be provided along the first direction, and the first slit holes 6 in adjacent first slit hole rows are staggered. The recessed portion 2 bypasses the end of the first slit hole 6 in at least one first slit hole row, and the protruding portion 3 is located between adjacent first slit holes 6 in at least one first slit hole row. The first direction is different from the second direction. For example, the OLED display device of the embodiment of the present invention is a rounded rectangular parallelepiped, the first direction is the long side direction of the OLED display device, the second direction is the short side direction of the OLED display device, and the first direction is perpendicular to the second direction.

[0051] In an exemplary embodiment, if Figure 4 As shown, the display area 400 includes at least three openings 1, and the at least three openings 1 include at least two first slit holes 6 and at least one second slit hole 7. The first slit hole 6 and the second slit hole 7 are both strip-shaped slit holes. At least two first slit holes 6 extend along the first direction, and at least two first slit holes 6 are arranged at intervals along the second direction to form a first slit hole row. The first slit hole row can be provided with multiple slit holes along the first direction, and the first slit holes 6 in adjacent first slit hole rows are staggered. At least one second slit hole 7 extends along the second direction, and at least one second slit hole 7 is located between adjacent first slit holes 6 in the first slit hole row, and is combined with adjacent first slit holes 6 in the first slit hole row to form at least one groove. The recessed portion 2 bypasses the end of the first slit hole 6 in at least one first slit hole row, and the protruding portion 3 is located in at least one groove. Among them, the first direction is different from the second direction. For example, the OLED display device of the embodiment of the present invention is a rounded rectangular parallelepiped, the first direction is the long side direction of the OLED display device, the second direction is the short side direction of the OLED display device, and the first direction is perpendicular to the second direction.

[0052] In an exemplary embodiment, the shapes of the protrusion 3 and the depression 2 are not limited, as long as the distance from the boundary line 5 between the first etching area 600 and the display area 400 to the edge of the opening 1 is the same or similar. For example, the protrusion 3 and the depression 2 are arc-shaped or polygonal.

[0053] In an exemplary embodiment, the minimum distance between the boundary line 5 between the first etching area 600 and the display area 400 and the edge of the opening 1 is equal to the minimum distance between the edges of adjacent openings 1, so that the edges of the openings 1 are evenly stressed and the openings 1 are prevented from breaking when stretched.

[0054] In an exemplary embodiment, the corners of the protrusion 3 and / or the recessed portion 2 are rounded. The opening 1 is a rounded rectangle. The radius of the corners of the protrusion 3 and / or the recessed portion 2 is 3 to 10 times the width of the opening. The rounded corners can make the corners of the protrusion 3 and / or the recessed portion 2 bear force evenly, avoiding stress concentration at the corners, which may cause the adjacent opening 1 to rupture.

[0055] like Figure 5 As shown, in the direction perpendicular to the OLED display device, the island area of ​​the first display film layer 40 includes a substrate and a driving structure layer and a light-emitting structure layer stacked on the substrate. The driving structure layer mainly includes a pixel driving circuit composed of multiple thin film transistors (TFT), and the light-emitting structure layer mainly includes an anode, an organic light-emitting layer and a cathode. The bridge area of ​​the first display film layer 40 mainly includes connecting wires and a structural layer covering the connecting wires. The connecting wires are used to achieve signal connectivity between adjacent island areas, and the structural layer is used to transmit tension. The openings of the first display film layer 40 include multiple microgrooves or micropores, and the structural film layer and the substrate in each microgroove or micropore are removed to provide deformation space during stretching, and multiple holes enable light to pass directly through, thereby realizing a transparent display structure with a certain degree of stretchability in the embodiment of the present invention.

[0056] In an exemplary embodiment, the substrate in the first display film layer 40 may be a flexible substrate, and the substrate may adopt a single-layer structure or a double-layer structure. Take the substrate adopting a double-layer structure as an example. The substrate includes a first flexible substrate layer 101, a first buffer layer 102, a second flexible substrate layer 103 and a second buffer layer 104, which are stacked in sequence. The preparation process of the substrate 10 includes: coating a flexible material on a glass carrier, curing to form a film, forming a first flexible substrate layer 101, depositing a buffer film on the first flexible substrate layer 101, forming a first buffer layer 102 pattern, coating a flexible material on the first buffer layer 102, curing to form a film, forming a second flexible substrate layer 103, and depositing a buffer film on the second flexible substrate layer 103 to form a second buffer layer 104. The first buffer layer 102 is used to absorb the energy during subsequent laser stripping. The second buffer layer 104 is used for sealing. The first buffer layer 102 and the second buffer layer 104 are both etched and removed at the opening 1. The flexible materials of the first flexible substrate layer 101 and the second flexible substrate layer 103 may be organic materials, such as polyimide PI, polyethylene terephthalate PET, or surface-treated polymer soft films, etc. The materials of the first buffer layer 102 and the second buffer layer 104 may be inorganic materials.

[0057] In a direction perpendicular to the OLED display device, the first etching area 600 is an area where the first display film layer 40 is etched and removed, including etching and removing the structural film layer and the substrate of the first display film layer 40. The structural film layer of the first display film layer 40 includes the film layer of the island area and the film layer of the bridge area. The first etching area 600 and the opening 1 can be prepared by the same etching process. For example, when forming the structural film layer and the substrate of the first display film layer 40, the structural film layer and the substrate are etched and removed in the opening 1 and the first etching area 600 by a photolithography process.

[0058] In an exemplary embodiment, due to the difference in the selectivity of the inorganic material and the organic material for etching in the substrate of the first display film layer 40, after the first etching area 600 is formed by photolithography, the edges of the first flexible substrate layer 101 and the second flexible substrate layer 103 in the substrate of the first display film layer 40 close to the first etching area 600 are recessed in a direction away from the first etching area 600. The OLED display device of the embodiment of the present invention forms the first etching area 600 first to bypass the opening 1, and then performs laser cutting along the edge of the first etching area 600, thereby avoiding the laser from directly cutting the first display film layer 40 and eliminating the damage to the opening 1 caused by the laser cutting. In addition, the first etching area 600 adopts a photolithography process, so that the edge of the first display film layer 40 close to the first etching area 600 is smoother.

[0059] In an exemplary embodiment, if Figure 5 As shown, in a direction perpendicular to the OLED display device, the first etching area 600 includes a functional structure film layer, and the functional structure film layer wraps the edge of the first display film layer to protect the first display film layer.

[0060] In an exemplary embodiment, if Figure 5 As shown, the functional structure film layer includes a first functional film layer 20 and a second functional film layer 30 arranged opposite to each other, and a connecting layer 50 arranged between the first functional film layer 20 and the second functional film layer 30, and the connecting layer 50 wraps the edge of the first display film layer 40 to protect the first display film layer. Among them, the first functional film layer 20 may include a film layer structure such as a polarizer, the second functional film layer 30 may include a film layer structure such as a heat dissipation film and a support film, and the connecting layer 50 may be a glue layer.

[0061] In an exemplary embodiment, the first etched area may be connected to a portion of the edge of the display area away from the flat area, so as to ensure the integrity of the opening at the portion of the edge of the display area; or, the first etched area may be connected to the entire edge of the display area away from the flat area, so as to ensure the integrity of the opening at the entire edge of the display area; or, the first etched area may be connected to the entire edge of the display area away from the flat area and extend to the border area connected to the display area, so as to ensure the integrity of the opening at the edge of the entire display area; or, the first etched area may be connected to the entire edge of the display area away from the flat area, and a second etched area is provided on the edge of the border area away from the flat area, the second etched area is connected to the entire edge of the border area away from the flat area, and the first etched area is connected to the second etched area end to end to form an annular area surrounding the bending area.

[0062] Figure 6 FIG. 1 is a cross-sectional view of a frame region of an OLED display device according to an embodiment of the present invention. Figure 6 for Figure 3 The cross-sectional view of the OLED display device along the AA direction is taken as an example for explanation. Figure 3 and Figure 6 As shown, the bending area 200 also includes at least one frame area 500 connected to the stretching area 300. Taking the OLED display device as a rounded rectangle as an example, the bending area 200 is a rounded rectangular ring, which is arranged around the flat area 100. The bending area 200 includes four stretching areas 300 and four frame areas 500. The four stretching areas 300 are respectively located at the four corners of the bending area 200, and the four frame areas 500 are respectively located at the four sides of the bending area 200. The stretching area 300 is connected to two adjacent frame areas 500. In the direction perpendicular to the OLED display device, the frame area 500 includes a second display film layer 60. The main structure of the second display film layer 60 is basically the same as the first display film layer 40. The difference is that an isolation structure 601 is provided on the substrate of the second display film layer 60. The isolation structure 601 is located at the edge of the second display film layer 60 for isolating the packaging material.

[0063] Figure 7 The structure of the OLED display device according to the embodiment of the present invention is shown in FIG. Figure 2 ; Figure 8 The OLED display device of the embodiment of the present invention is magnified Figure 2 .by Figure 8 for Figure 7 Take the enlarged view at c in FIG. as an example. In an exemplary embodiment, Figure 7 and Figure 8As shown, at least a portion of the edge of the frame area 500 away from the flat area 100 is provided with a second etching area 700. In a direction perpendicular to the OLED display device, the second etching area 700 is an area where the second display film layer 60 is etched away, and the second etching area 700 can improve the stretchability and reliability of the edge of the frame area 500.

[0064] In an exemplary embodiment, the second etched area 700 is connected to the entire edge of the border area 500 away from the flat area 100, the first etched area 600 is connected to the entire edge of the display area 400 away from the flat area 100, and the second etched area 700 is connected end to end with the first etched area 600 to form an annular area surrounding the bending area 200.

[0065] Fig. 9 FIG. 1 is a schematic diagram showing the structure of a motherboard in the middle of an embodiment of the present invention. Fig. 9 As shown, the middle display motherboard in the embodiment of the present invention includes at least one OLED display device 800 to be cut and a peripheral area surrounding the OLED display device 800 to be cut, and the OLED display device 800 to be cut includes at least one stretchable area 1100. Taking the OLED display device 800 to be cut as a rounded rectangle as an example, the stretchable area 1100 is a rounded rectangular ring. The OLED display device 800 to be cut includes four stretchable areas 1100, and the four stretchable areas 1100 are respectively located at the four corners of the OLED display device 800 to be cut. The stretchable area 1100 includes a displayable area 1200 and a third etching area 1300, the third etching area 1300 is located at the edge of the displayable area 1200 close to the peripheral area, the third etching area 1300 is connected to at least part of the edge of the displayable area 1200 close to the peripheral area, the displayable area 1200 includes at least one opening 1, and the boundary line between the third etching area 1300 and the displayable area 1200 bypasses the opening 1; the peripheral area includes a fourth etching area 900 connected to the third etching area 1300, and the boundary line between the fourth etching area 900 and the third etching area 1300 forms a cutting line 4. Among them, the displayable area 1200 includes a first substrate and a first structural film layer stacked on the first substrate, and the third etching area 1300 is a region where the first substrate and the first structural film layer are etched and removed. The peripheral region includes a second substrate and a second structural film layer stacked on the second substrate. The fourth etching area 900 is a region where the second substrate and the second structural film layer are etched away.

[0066] In an exemplary embodiment, the cutting line 4 is a laser cutting line, and the minimum distance from the boundary line between the third etching area 1300 and the display area 1200 to the cutting line 4 is greater than the sum of the laser cutting precision tolerance and the laser cutting heat affected zone; and / or, the minimum distance from the edge of the fourth etching area 900 away from the third etching area 1300 to the cutting line 4 is greater than the sum of the laser cutting precision tolerance and the laser cutting heat affected zone, thereby avoiding the laser affecting the opening 1 on the OLED display device 800 to be cut during cutting.

[0067] In the cutting process of the intermediate display motherboard in the embodiment of the present invention, a substrate and a structural film layer stacked on the substrate are first formed; in the process of forming the substrate and the structural film layer, the substrate and the structural film layer are etched and removed at the opening, the third etching area and the fourth etching area of ​​the OLED display device to be cut through a photolithography process, and the boundary line between the third etching area and the displayable area bypasses the opening to ensure the integrity of the opening; then, the boundary line between the fourth etching area and the third etching area forms a cutting line, so that the cutting line bypasses the opening of the OLED display device to be cut, and sufficient cutting space is reserved for laser cutting, so as to avoid damage to the opening of the OLED display device to be cut by laser cutting, thereby improving the tensile performance and reliability of the OLED display device.

[0068] A method for preparing an OLED display device, comprising:

[0069] A flat area and a bending area surrounding the flat area are formed; the bending area is bent toward the backlight side of the flat area, and the bending area includes at least one stretching area; the stretching area includes a display area and a first etching area, the first etching area is located at an edge of the display area away from the flat area, and the first etching area is connected to at least part of the edge of the display area away from the flat area; the display area includes at least one opening, and a boundary line between the first etching area and the display area bypasses the opening; the display area includes a first display film layer, and the first etching area is an area where the first display film layer is etched and removed.

[0070] In an exemplary embodiment, the first etched region and the opening are formed by a same etching process.

[0071] In an exemplary embodiment, a boundary line between the first etching area and the display area is formed into a plurality of concave portions and a plurality of convex portions which are alternately arranged.

[0072] In an exemplary embodiment, at least two openings are formed in the display area, the recessed portion bypasses the openings, and the protruding portion is located between adjacent openings.

[0073] In the description of the embodiments of the present invention, it should be understood that the terms "middle", "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inside" and "outside" etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0074] In the description of the embodiments of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0075] Although the embodiments disclosed in the present invention are as above, the contents described are only embodiments adopted to facilitate understanding of the present invention and are not intended to limit the present invention. Any technician in the field to which the present invention belongs can make any modifications and changes in the form and details of implementation without departing from the spirit and scope disclosed in the present invention, but the patent protection scope of the present invention shall still be subject to the scope defined in the attached claims.

Claims

1. An OLED display device, characterized in that: comprising a flat area and a bending area surrounding the flat area; The bending area is bent toward the backlight side of the flat area, and the bending area includes at least one stretching area; The stretching area includes a display area and a first etching area, the first etching area is located at an edge of the display area away from the flat area, and the first etching area is connected to at least a portion of an edge of the display area away from the flat area; The display area includes at least one opening, and a boundary line between the first etching area and the display area bypasses the opening; The display area includes a first display film layer, and the first etching area is an area where the first display film layer is etched and removed; The boundary line between the first etching area and the display area includes a plurality of concave portions and a plurality of convex portions which are alternately arranged.

2. The OLED display device according to claim 1, characterized in that: The display area includes at least two openings, the recessed portion bypasses the openings, and the protruding portion is located between adjacent openings.

3. The OLED display device according to claim 2, characterized in that: The at least two openings include at least two first slits, the at least two first slits extend along a first direction, the at least two first slits are arranged at intervals along a second direction, the first direction is different from the second direction, the recessed portion bypasses the ends of the at least two first slits, and the protruding portion is located between the at least two adjacent first slits.

4. The OLED display device according to claim 2, characterized in that: The display area includes at least three openings, and the at least three openings include at least two first slit holes and at least one second slit hole. The at least two first slit holes extend along a first direction, and the at least two first slit holes are arranged at intervals along a second direction. The at least one second slit hole extends along the second direction, and the first direction is different from the second direction. The at least one second slit hole is located between the at least two adjacent first slit holes and is combined with the at least two first slit holes to form at least one groove. The recessed portion bypasses the ends of the at least two first slit holes, and the protruding portion is located in the at least one groove.

5. The OLED display device according to claim 2, characterized in that: The minimum distance between the boundary line and the opening edge is equal to the minimum distance between adjacent opening edges.

6. The OLED display device according to claim 2, characterized in that: Corners of the recessed portion and / or the protruding portion are rounded.

7. The OLED display device according to claim 6, characterized in that: The radius of the fillet is 3 to 10 times the width of the opening.

8. The OLED display device according to claim 1, characterized in that: The opening is a rounded rectangle.

9. The OLED display device according to claim 1, characterized in that: The first etching area includes a functional structure film layer, and the functional structure film layer wraps the edge of the first display film layer.

10. The OLED display device according to claim 9, characterized in that: The functional structure film layer comprises a first functional film layer and a second functional film layer which are arranged opposite to each other, and a connection layer which is arranged between the first functional film layer and the second functional film layer, and the connection layer wraps the edge of the first display film layer.

11. The OLED display device according to claim 1, characterized in that: The first display film layer includes a substrate, which includes a first flexible substrate layer, a first buffer layer, a second flexible substrate layer and a second buffer layer which are stacked, the first flexible substrate layer and the second flexible substrate layer are made of organic material, the first buffer layer and the second buffer layer are made of inorganic material, and the edges of the first flexible substrate layer and the second flexible substrate layer close to the first etching area are recessed in a direction away from the first etching area.

12. The OLED display device according to claim 1, characterized in that: The etching area is connected to the entire edge of the display area on a side away from the flat area.

13. The OLED display device according to claim 1, characterized in that: The bending area also includes at least one border area connected to the stretching area, and a second etching area is provided on at least part of the edge of the border area away from the flat area. The border area includes a second display film layer, and the second etching area is an area where the second display film layer is etched and removed.

14. A method for preparing an OLED display device, characterized in that: include: forming a flat area and a bending area surrounding the flat area; The bending zone is bent toward the backlight side of the flat zone, and the bending zone includes at least one stretching zone; the stretching zone includes a display zone and a first etching zone, the first etching zone is located at an edge of the display zone away from the flat zone, and the first etching zone is connected to at least part of the edge of the display zone away from the flat zone; the display zone includes at least one opening, and a boundary line between the first etching zone and the display zone bypasses the opening; the display zone includes a first display film layer, and the first etching zone is an area where the first display film layer is etched and removed; a boundary line between the first etching zone and the display zone includes a plurality of recessed portions and a plurality of protruding portions that are alternately arranged.

15. The method for preparing an OLED display device according to claim 14, characterized in that: The first etching area and the opening are prepared by the same etching process.

16. The method for preparing an OLED display device according to claim 14, characterized in that: The boundary line between the first etching area and the display area is formed into a plurality of concave portions and a plurality of convex portions which are alternately arranged.

17. The method for preparing an OLED display device according to claim 16, characterized in that: The display area is formed with at least two openings, the recessed portion bypasses the openings, and the protruding portion is located between adjacent openings.

Citation Information

Patent Citations

  • Display substrate and manufacturing method thereof, display panel and display device

    CN112366209A