Touch display device, touch display panel, touch module and manufacturing method thereof

Abstract

The present invention provides a touch display device, a touch display panel, a touch module and a manufacturing method thereof, comprising a substrate and a first shadow elimination layer, a touch electrode layer, a second shadow elimination layer and a bridge layer sequentially located on one side of the substrate; the touch electrode layer comprises a plurality of first touch electrodes; the bridge layer comprises a plurality of bridges, and the bridges connect two adjacent first touch electrodes through vias penetrating the second shadow elimination layer. Since there is a first shadow elimination layer between the touch electrode layer and the substrate, and there is a second shadow elimination layer between the touch electrode layer and the bridge layer, that is, there are shadow elimination layers on both the upper and lower sides of the touch electrode layer, the color difference between the touch electrode and other areas (such as slits) is better reduced, and the shadow elimination of the touch electrode pattern is better achieved, that is, the touch electrode pattern is made less likely to be perceived by the human eye.

Description

Technical Field

[0001] The present invention relates to the field of display technology, and more specifically, to a touch display device, a touch display panel, a touch module and a manufacturing method thereof. Background Art

[0002] With the continuous advancement of science and technology, more and more display devices with touch functions are widely used in people's daily life and work, bringing great convenience to people's daily life and work, and becoming an indispensable tool for people's work and life today.

[0003] Among them, the main component of the display device to realize the touch function is the touch module, which includes multiple touch electrodes. When a finger touches the touch module, the capacitance change between the touch electrodes or between the touch electrode and the ground is determined, and the touch position of the finger is calculated by the IC according to the change in capacitance.

[0004] However, since the touch layer adopts a patterned design, there are slits between adjacent touch electrodes, and the optical path difference of the light reflected from the touch electrode and the slits to the human eye is different. Since the touch electrode adopts a patterned design, there will be differences in the film layer structure in the vertical stacking direction of the film layer, which will lead to differences in reflected light and form color difference. Due to the color difference between the touch electrode and the slits, the pattern of the touch electrode is easily perceived by the human eye, affecting the clarity of the display device. Summary of the invention

[0005] In view of this, the present invention provides a touch display device, a touch display panel, a touch module and a manufacturing method thereof, so as to reduce the color difference between the touch electrode and the slit in the touch module.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] A touch module comprises a substrate, and a first shadow elimination layer, a touch electrode layer, a second shadow elimination layer and a bridge layer which are sequentially located on one side of the substrate;

[0008] The touch electrode layer includes a plurality of first touch electrodes;

[0009] The bridge layer includes a plurality of bridges, and the bridges connect two adjacent first touch electrodes through via holes penetrating the second shadow elimination layer.

[0010] A touch display panel comprises a display module and the touch module as described above, wherein the touch module is located on the light emitting side of the display module;

[0011] The refractive index of the touch electrode layer in the touch module is greater than the refractive index of the image elimination layer.

[0012] A touch display device comprises the touch display panel as described above.

[0013] A method for manufacturing a touch module, comprising:

[0014] providing a substrate;

[0015] forming a first image elimination layer and a touch electrode layer on the substrate in sequence;

[0016] Using a first mask to etch the touch electrode layer to form a plurality of first touch electrodes;

[0017] forming a second image elimination layer on a side of the touch electrode layer away from the substrate;

[0018] Using a second mask to etch the second shadow elimination layer to form a through hole penetrating the second shadow elimination layer;

[0019] A conductive material is filled in the through hole to form a via hole, and a bridge layer is formed on the surface of the second shadow elimination layer. The bridge layer is etched using a third mask plate to form a plurality of bridges, and the bridge connects two adjacent first touch electrodes through the via hole.

[0020] Compared with the prior art, the technical solution provided by the present invention has the following advantages:

[0021] The touch display device, touch display panel, touch module and manufacturing method thereof provided by the present invention have a first shadow elimination layer between the touch electrode layer and the substrate, and a second shadow elimination layer between the touch electrode layer and the bridging layer, that is, the touch electrode layer has shadow elimination layers on both the upper and lower sides. Therefore, the color difference between the touch electrode and other areas (such as slits) outside the touch electrode can be better reduced. For example, ITO (indium tin oxide) can be used as the touch electrode layer, and the touch electrode layer needs to be provided with slits to form the touch electrode. The technical solution of the present application can reduce the color difference between the area with ITO and the area without ITO slits in the touch electrode layer, and better realize the shadow elimination of the touch electrode pattern, that is, make the touch electrode pattern less likely to be perceived by the human eye.

[0022] Furthermore, since there is a second shadow elimination layer between the bridge layer and the touch electrode layer, not only can the bridge and the touch electrode be insulated by the second shadow elimination layer, but also the capacitance of the touch module itself can be reduced by thickening the second shadow elimination layer, thereby increasing the touch sensitivity of the touch module. Furthermore, compared with the prior art solution of only using an insulating layer or a shadow elimination layer as insulation between the bridge layer and the touch electrode layer, the present application can further set an insulating layer between the bridge layer and the touch electrode layer, thereby reducing the capacitance between the touch electrode layer and the bridge layer, thereby making the touch detection more sensitive. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without paying creative work.

[0024] Figure 1 A schematic diagram of the planar structure of a touch module provided by an embodiment of the present invention;

[0025] Figure 2 for Figure 1 The cross-sectional structure diagram of the touch module shown along the cutting line AA';

[0026] Figure 3 A schematic diagram of the planar structure of a touch module provided by another embodiment of the present invention;

[0027] Figure 4 A schematic diagram of the planar structure of a touch module provided by another embodiment of the present invention;

[0028] Figure 5 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0029] Figure 6 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0030] Figure 7 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0031] Figure 8 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0032] Fig. 9 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0033] Fig.10 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0034] Fig.11 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0035] Fig.12 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0036] Fig.13 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0037] Fig.14 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0038] Fig.15 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0039] Fig.16 A schematic cross-sectional structure diagram of a touch module provided by another embodiment of the present invention;

[0040] Fig.17 A schematic diagram of a micro-protrusion structure provided in an embodiment of the present application;

[0041] Fig.18 A schematic diagram of a micro-protrusion structure provided in another embodiment of the present application;

[0042] Fig.19 A schematic diagram of a micro-protrusion structure provided in another embodiment of the present application;

[0043] Fig. 20 A schematic diagram of a micro-protrusion structure provided in another embodiment of the present application;

[0044] Fig.21 A schematic diagram of a micro-protrusion structure provided in another embodiment of the present application;

[0045] Fig. 22 Schematic diagram of the planar structure of making multiple touch modules for a large piece of glass;

[0046] Fig.23 A schematic cross-sectional structure diagram of a touch display panel provided by an embodiment of the present invention;

[0047] Fig.24 A schematic diagram of the structure of a display device provided by an embodiment of the present invention;

[0048] Fig.25 The present invention is a flowchart of a method for manufacturing a touch module according to an embodiment of the present invention. DETAILED DESCRIPTION

[0049] The above is the core idea of ​​the present invention. In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the technical solutions in the embodiments of the present invention will be clearly and completely described below in combination with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0050] An embodiment of the present invention provides a touch module, such as Figure 1 and Figure 2 As shown, Figure 1 A schematic diagram of the planar structure of a touch module provided by an embodiment of the present invention, Figure 2 for Figure 1 The touch module shown is a schematic diagram of a cross-sectional structure along the cutting line AA'. The touch module includes a substrate 10 and a first shadow elimination layer 20, a touch electrode layer 30, a second shadow elimination layer 40 and a bridging layer 50 which are sequentially located on one side of the substrate. Of course, the side of the bridging layer 50 facing away from the substrate 10 may also have a protective layer or a cover plate, which will not be repeated here.

[0051] It should be noted that Figure 1 It is a top view of the touch module. In order to show the substrate 10, the first shadow elimination layer 20 and the second shadow elimination layer 40 in the top view, the boundaries among the three are indicated in a stepped shape. In an actual product, the boundaries among the three may overlap.

[0052] The touch electrode layer 30 includes a plurality of first touch electrodes 301; the bridge layer 50 includes a plurality of bridges 501, the bridges 501 connect two adjacent first touch electrodes 301 through vias 502 penetrating the second shadow elimination layer 40, and the bridges 501 can connect two adjacent first touch electrodes 301 that are originally not connected in the same first touch electrode 301 in the second direction. It should be noted that in the embodiment of the present invention, the refractive index of the touch electrode layer 30 is greater than the refractive index of the first shadow elimination layer 20 in contact with it, and the refractive index of the touch electrode layer 30 is greater than the refractive index of the second shadow elimination layer 40 in contact with it.

[0053] Since the touch electrode layer 30 has a first shadow-eliminating layer 20 on the side close to the substrate 10 and a second shadow-eliminating layer 40 on the side away from the substrate 10, and the refractive index of the touch electrode layer 30 is greater than that of the first shadow-eliminating layer 20, and the refractive index of the touch electrode layer 30 is greater than that of the second shadow-eliminating layer 40, a reflective interface will be generated between the first shadow-eliminating layer 20 and the touch electrode layer 30 with different refractive indices, and between the touch electrode layer 30 and the second shadow-eliminating layer 40 with different refractive indices, and external incident light will generate reflected light at each reflective interface. The reflected light at different interfaces will interfere when incident into the human eye, so that the reflected light of different vectors will be superimposed and canceled, thereby making the optical path difference of the reflected light in the area where the touch electrode is located and other areas (such as the slits, that is, the gaps between the touch electrodes on the plane where the touch electrode layer 30 is located) tend to be consistent, so that the color difference between the area where the touch electrode is located and other areas (such as the slits) is small, so that the pattern of the touch electrode is not easily perceived by the human eye, thereby improving the clarity of the display device screen.

[0054] Furthermore, since there is a first shadow elimination layer 20 between the touch electrode layer 30 and the substrate 10, and there is a second shadow elimination layer 40 between the touch electrode layer 30 and the bridge layer 50, that is, the touch electrode layer 30 has shadow elimination layers on both the upper and lower sides, therefore, compared with the solution in which only one side of the touch electrode layer 30 has a shadow elimination layer, the solution in the present invention respectively arranges the first shadow elimination layer 20 and the second shadow elimination layer 40 on the two layers of the touch electrode layer 30, and by arranging more reflection interfaces, more reflected light is generated at more interfaces, thereby achieving a greater degree of coherent cancellation of reflected light, and thus can better reduce the color difference of the reflected light of the first touch electrode 301 and the second touch electrode 302 and other areas outside the touch electrodes (such as the slits), and better achieve the elimination of the patterns of the first touch electrode 301 and the second touch electrode 302, that is, make the pattern of the touch electrode layer 30 less likely to be perceived by the human eye. It should be noted that color difference is a dispersion phenomenon caused by the optical path difference of different lights, and the smaller the optical path difference, the smaller the color difference.

[0055] The touch electrode layer 30 includes a plurality of first touch electrodes 301 and a plurality of second touch electrodes 302. The plurality of first touch electrodes 301 are arranged in an array. The plurality of second touch electrodes 302 are arranged in an array. Figure 1 As shown, in the array formed by the first touch control electrodes 301, a plurality of first touch control electrodes 301 in the same row extend in the second direction X. Figure 1 As shown, in the array formed by the second touch electrodes 302, multiple second touch electrodes 302 in the same column extend in the first direction Y. Multiple second touch electrodes 302 in the same column are connected in one layer, and second touch electrodes 302 in different columns are isolated and insulated. The first touch electrodes 301 in the same row are separated by the second touch electrodes 302, and the first touch electrodes 301 in the same row are connected through the bridge 501. The first touch electrodes 301 in different rows are isolated and insulated.

[0056] In addition, since there is a second shadow elimination layer 40 between the bridge layer 50 and the touch electrode layer 30, or in other words, the second shadow elimination layer 40 is located between the bridge layer 50 and the touch electrode layer 30, the bridge 501 and the second touch electrode 302 can be insulated by the second shadow elimination layer 40 to prevent the first touch electrode 301 and the second touch electrode 302 from short-circuiting and affecting the touch function. That is, in the present invention, the second shadow elimination layer 40 replaces the insulating layer to play an insulating role, which can simplify the process and save costs. In addition, according to the capacitance formula It can be seen that the larger the thickness d of the dielectric layer is, the smaller the capacitance C is. The capacitance between the touch electrode layer 30 and the bridging layer 50 can be reduced by increasing the thickness of the dielectric layer between the bridging layer 50 and the touch electrode layer 30, that is, the thickness of the second shadow elimination layer 40. This can make the capacitance of the touch module itself smaller, thereby making the touch sensitivity of the touch module higher.

[0057] In some embodiments of the present invention, Figure 1 As shown, the touch electrode layer 30 also includes a plurality of second touch electrode strips 32, which include a plurality of second touch electrodes 302 integrally connected in the first direction Y; the second touch electrode strips 32 extend along the first direction Y, and the plurality of second touch electrode strips 32 are arranged in sequence along the second direction X.

[0058] Furthermore, a plurality of first touch electrodes 301 are arranged in an array, and adjacent first touch electrodes 301 in the second direction X are sequentially connected through bridges 501 and vias 502; a plurality of first touch electrodes 301 sequentially connected in the second direction X constitute a first touch electrode strip 31, and a plurality of first touch electrode strips 31 are sequentially arranged along the first direction Y, and the first touch electrode strips 31 and the second touch electrode strips 32 are insulated and intersected. The first touch electrodes 301 and the second touch electrodes 302 constitute mutual capacitance, so that the touch position can be determined according to the change in the capacitance value of the mutual capacitance.

[0059] It should be noted that in some embodiments of the present invention, only Figure 1 The first touch electrode strip 31 and the second touch electrode 302 in the shape shown in FIG. 1 are used as an example for description, but are not limited thereto. In other embodiments, for example Figure 3 As shown, Figure 3 This is a schematic diagram of the planar structure of a touch module provided by another embodiment of the present invention. The first touch electrode 301 and the second touch electrode 302 may also be triangular electrodes.

[0060] In addition, in some other embodiments, Figure 4 As shown, Figure 4 The planar structural schematic diagram of the touch module provided in another embodiment of the present invention, the first touch electrode 301 can also be a self-capacitive touch electrode, such as the first touch electrode 301 is a triangular electrode, two adjacent first touch electrodes 301 are connected by a bridge 501 and a via 502 to form a block electrode, and a plurality of block electrodes are arranged in an array to form a self-capacitive touch electrode.

[0061] Of course, the present invention is not limited to this. In other embodiments, Figure 5 As shown, Figure 5 This is a schematic cross-sectional structural diagram of a touch module provided in another embodiment of the present invention. The touch module further includes an insulating layer 60 .

[0062] The insulating layer 60 is located between the second shadow elimination layer 40 and the bridge layer 50, and the bridge 501 connects two adjacent first touch electrodes 301 through a via 503 that penetrates the second shadow elimination layer 40 and the insulating layer 60. Of course, in other embodiments, the insulating layer 60 may also be located between the second shadow elimination layer 40 and the touch electrode layer 30, which will not be described in detail here.

[0063] Since there is a second shadow elimination layer 40 and an insulating layer 60 between the touch electrode layer 30 and the bridging layer 50, the capacitance between the touch electrode layer 30 and the bridging layer 50 can be reduced by adjusting the thickness of the second shadow elimination layer 40 and / or the insulating layer 60, that is, the capacitance of the touch module itself is reduced.

[0064] It should be noted that when the film thickness exceeds a certain limit, such as when the thickness of silicon nitride exceeds 6000 angstroms and the thickness of silicon oxide exceeds 5000 angstroms, only a low-temperature process can be used for film formation. Based on this, when the thickness of the insulating layer 60 exceeds the limit and the thickness of the shadow elimination layer does not exceed the limit, since the bridge layer 50 is located on the side of the second shadow elimination layer 40 away from the substrate 10, that is, the bridge layer 50 is formed after the first shadow elimination layer 20 and the second shadow elimination layer 40 are formed, the high-temperature process for forming the shadow elimination layer will not affect the structures such as the insulating layer 60 that require low-temperature film formation, thereby ensuring the stability of the touch module film structure.

[0065] It should also be noted that, in order to obtain better touch performance, in some embodiments of the present invention, the thickness of the touch electrode layer 30, the insulating layer 60 and / or the thickness of the second shadow elimination layer 40 will be increased. However, the increase in the thickness of the touch electrode layer 30 will affect the optical path difference between the area where the touch electrodes (the first touch electrodes 301 and the second touch electrodes 302) are located and other areas outside the touch electrodes (such as the slits), thereby affecting the shadow elimination effect, resulting in a poor shadow elimination effect, that is, causing the first touch electrodes 301 and the second touch electrodes 302 to have a large color difference with other areas (such as the slits). Based on this, in order to obtain better touch performance while ensuring that the shadow elimination effect is not affected, in some embodiments of the present invention, the material of the insulating layer 60 is silicon oxide or OC (Over Coating, transparent resin material) material with better insulation performance. Of course, if there are other materials with better insulation performance, they can also be used as the insulating layer 60, which will not be repeated here.

[0066] On this basis, in order to better ensure the shadow elimination effect, in some embodiments of the present invention, the material of the insulating layer 60 is silicon oxide, and the thickness of the silicon oxide ranges from 3000 angstroms to 4000 angstroms. Of course, the present invention is not limited to this. In other embodiments, the material of the insulating layer 60 can also be OC material, and the thickness of the OC material ranges from 12500 angstroms to 20000 angstroms. Among them, the manufacturing process of silicon oxide can be a CVD (Chemical Vapor Deposition) process, and the manufacturing process of OC material can be a coating process. It should be noted that the difference in the thickness range of silicon oxide and OC material is determined by the manufacturing process.

[0067] On this basis, in order to obtain better touch performance, in some embodiments of the present invention, the material of the touch electrode layer 30 is ITO (Indium tin oxide). Generally, the touch electrode layer 30 is ITO. Based on the production process conditions, the thickness of ITO is set to range from 500 angstroms to 1350 angstroms. Optionally, the thickness of the touch electrode layer 30 can be set to range from 500 angstroms to 1250 angstroms. That is, when the thickness of the touch electrode layer 30 ranges from 500 angstroms to 1350 angstroms, not only can the shadow elimination effect be guaranteed, but also better touch performance can be obtained.

[0068] Of course, the present invention is not limited to this. In other embodiments, the material of the touch electrode layer 30 is ITO, and the thickness of the touch electrode layer 30 ranges from 900 angstroms to 1200 angstroms. The material of the bridge layer 50 is also ITO, and the thickness of the bridge layer 50 ranges from 1100 angstroms to 1350 angstroms. Based on this, not only can better touch performance be obtained, but also the color difference between the area where the touch electrode is located and the area where the bridge is located, as well as the color difference between the area where the touch electrode is located and the area where the slit between the touch electrodes is located can be further reduced, thereby further optimizing the shadow elimination effect.

[0069] In a specific embodiment, the color difference between the area where the touch electrode is located and the area where the bridge is located can be reduced to 0.38, and the color difference between the area where the touch electrode is located and the area where the slit between the touch electrodes is located can be reduced to 0.143. It should be noted that if the color difference is less than 0.5, it can make it difficult for the human eye to distinguish the color difference under normal use distance and lighting conditions, that is, meet the shadow elimination requirement.

[0070] Optionally, in some embodiments of the present invention, the material of the insulating layer 60 is silicon oxide with a thickness of 3500 angstroms, and the material of the touch electrode layer 30 is ITO with a thickness of 1250 angstroms. In other embodiments, the material of the insulating layer 60 is OC material with a thickness of 15000 angstroms, and the material of the touch electrode layer 30 is ITO with a thickness of 750 angstroms. In other embodiments, the material of the insulating layer 60 is OC material with a thickness of 19500 angstroms, and the material of the touch electrode layer 30 is ITO with a thickness of 1250 angstroms.

[0071] Based on any of the above embodiments, in some embodiments of the present invention, Figure 6 As shown, Figure 6 This is a schematic diagram of the cross-sectional structure of a touch module provided in another embodiment of the present invention, wherein the first shadow elimination layer 20 includes at least one first sub-shadow elimination layer 201 and at least one second sub-shadow elimination layer 202. For example, the first shadow elimination layer 20 may include one first sub-shadow elimination layer 201 and one second sub-shadow elimination layer 202, or may include one first sub-shadow elimination layer 201 and two second sub-shadow elimination layers 202, or two first sub-shadow elimination layers 201 and two second sub-shadow elimination layers 202, which will not be described in detail herein.

[0072] The refractive index of the first sub-image elimination layer 201 is less than the refractive index of the second sub-image elimination layer 202. The first sub-image elimination layer 201 and the second sub-image elimination layer 202 are alternately arranged in a direction perpendicular to the substrate 10, and the touch electrode layer 30 is disposed adjacent to the first sub-image elimination layer 201, that is, in a first sub-image elimination layer 201 and a second sub-image elimination layer 202 that are closest to the touch electrode layer 30, the first sub-image elimination layer 201 is located between the touch electrode layer 30 and the second sub-image elimination layer 202.

[0073] It should be noted that the refractive index of the touch electrode layer 30 is greater than the refractive index of the first sub-image eliminating layer 201 .

[0074] Since the refractive index of the touch electrode layer 30 is greater than that of the first sub-shadow elimination layer 201, and the refractive index of the first sub-shadow elimination layer 201 is less than that of the second sub-shadow elimination layer 202, a reflective interface will be generated between the touch electrode layer 30 and the first sub-shadow elimination layer 201, and a reflective interface will be generated between the first sub-shadow elimination layer 201 and the second sub-shadow elimination layer 202. The reflected light at different interfaces will interfere when incident on the human eye, so that the reflected light of different vectors is superimposed and canceled, thereby reducing the color difference between the area where the touch electrode is located and other areas (such as the slits).

[0075] It should also be noted that the greater the difference in refractive index between the touch electrode layer 30 and the first sub-shadow elimination layer 201, and the greater the difference in refractive index between the first sub-shadow elimination layer 201 and the second sub-shadow elimination layer 202, the greater the amount of reflected light at the interface, the better the coherent decomposition effect of the reflected light at each interface, and the better the shadow elimination effect.

[0076] In order to ensure the shadow elimination effect of the shadow elimination layer, in some embodiments of the present invention, the material of the first sub-shadow elimination layer 201 is silicon oxide, and the material of the second sub-shadow elimination layer 202 is silicon nitride. Of course, the present invention is not limited to this. In other embodiments, the first sub-shadow elimination layer 201 and the second sub-shadow elimination layer 202 can also be made of other materials, such as silicon oxynitride.

[0077] Furthermore, in order to ensure the shadow elimination effect of the shadow elimination layer, in some embodiments of the present invention, the thickness of the first sub-shadow elimination layer 201 ranges from 250 angstroms to 300 angstroms; the thickness of the second sub-shadow elimination layer 202 ranges from 250 angstroms to 300 angstroms.

[0078] For example, in some embodiments of the present invention, the material of the insulating layer 60 is silicon oxide with a thickness of 3500 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 1250 angstroms, the material of the first sub-shadow elimination layer 201 is silicon oxide with a thickness of 250 angstroms, and the material of the second sub-shadow elimination layer 202 is silicon nitride with a thickness of 250 angstroms.

[0079] In other embodiments, the material of the insulating layer 60 is OC material with a thickness of 15,000 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 750 angstroms, the material of the first sub-shadow elimination layer 201 is silicon oxide with a thickness of 257 angstroms, and the material of the second sub-shadow elimination layer 202 is silicon nitride with a thickness of 272 angstroms.

[0080] In other embodiments, the material of the insulating layer 60 is OC material with a thickness of 19950 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 1250 angstroms, the material of the first sub-shadow elimination layer 201 is silicon oxide with a thickness of 276 angstroms, and the material of the second sub-shadow elimination layer 202 is silicon nitride with a thickness of 250 angstroms.

[0081] Based on any of the above embodiments, in some embodiments of the present invention, Figure 7 As shown, Figure 7 This is a schematic cross-sectional structure diagram of a touch module provided in another embodiment of the present invention, in which the second image elimination layer 40 includes at least one third sub-image elimination layer 401 and at least one fourth sub-image elimination layer 402 .

[0082] The refractive index of the third sub-image elimination layer 401 is less than the refractive index of the fourth sub-image elimination layer 402. Similarly, the refractive index of the touch electrode layer 30 is greater than the refractive index of the third sub-image elimination layer 401. The third sub-image elimination layer 401 and the fourth sub-image elimination layer 402 are alternately arranged in a direction perpendicular to the substrate 10, and the touch electrode layer 30 is adjacent to the third sub-image elimination layer 401, that is, in a third sub-image elimination layer 401 and a fourth sub-image elimination layer 402 that are closest to the touch electrode layer 30, the third sub-image elimination layer 401 is located between the touch electrode layer 30 and the fourth sub-image elimination layer 402.

[0083] Likewise, it should be noted that the refractive index of the touch electrode layer 30 is greater than that of the third sub-image elimination layer 401 , and the refractive index of the touch electrode layer 30 is greater than, less than or equal to that of the fourth sub-image elimination layer 402 .

[0084] Since the refractive index of the touch electrode layer 30 is greater than that of the third sub-shadow elimination layer 401, and the refractive index of the third sub-shadow elimination layer 401 is less than that of the fourth sub-shadow elimination layer 402, a reflective interface will be generated between the touch electrode layer 30 and the third sub-shadow elimination layer 401, and a reflective interface will be generated between the third sub-shadow elimination layer 401 and the fourth sub-shadow elimination layer 402. The reflected light at different interfaces will interfere when incident on the human eye, so that the reflected light of different vectors is superimposed and canceled, thereby reducing the color difference between the area where the touch electrode is located and other areas (such as the slits).

[0085] Similarly, it should be noted that the greater the refractive index difference between the touch electrode layer 30 and the third sub-shadow elimination layer 401, and the greater the refractive index difference between the third sub-shadow elimination layer 401 and the fourth sub-shadow elimination layer 402, the greater the amount of reflected light at the interface, the better the coherent decomposition effect of the reflected light at each interface, and the better the shadow elimination effect.

[0086] In order to ensure the shadow elimination effect of the shadow elimination layer, in some embodiments of the present invention, the material of the third sub-shadow elimination layer 401 is silicon oxide, and the material of the fourth sub-shadow elimination layer 402 is silicon nitride. Of course, the present invention is not limited to this. In other embodiments, the third sub-shadow elimination layer 401 and the fourth sub-shadow elimination layer 402 can also be other materials, such as silicon oxynitride.

[0087] Furthermore, in order to ensure the shadow elimination effect of the shadow elimination layer, in some embodiments of the present invention, the thickness of the third sub-shadow elimination layer 401 ranges from 250 angstroms to 300 angstroms; the thickness of the fourth sub-shadow elimination layer 402 ranges from 250 angstroms to 430 angstroms.

[0088] For example, in some embodiments of the present invention, the material of the insulating layer 60 is silicon oxide with a thickness of 3500 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 1250 angstroms, the material of the first sub-image elimination layer 201 is silicon oxide with a thickness of 250 angstroms, the material of the second sub-image elimination layer 202 is silicon nitride with a thickness of 250 angstroms, the material of the third sub-image elimination layer 401 is silicon oxide with a thickness of 250 angstroms, and the material of the fourth sub-image elimination layer 402 is silicon nitride with a thickness of 250 angstroms.

[0089] In other embodiments, the material of the insulating layer 60 is OC material with a thickness of 15,000 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 750 angstroms, the material of the first sub-image elimination layer 201 is silicon oxide with a thickness of 257 angstroms, the material of the second sub-image elimination layer 202 is silicon nitride with a thickness of 272 angstroms, the material of the third sub-image elimination layer 401 is silicon oxide with a thickness of 250 angstroms, and the material of the fourth sub-image elimination layer 402 is silicon nitride with a thickness of 405 angstroms.

[0090] In other embodiments, the material of the insulating layer 60 is OC material with a thickness of 19500 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 1250 angstroms, the material of the first sub-image elimination layer 201 is silicon oxide with a thickness of 276 angstroms, the material of the second sub-image elimination layer 202 is silicon nitride with a thickness of 250 angstroms, the material of the third sub-image elimination layer 401 is silicon oxide with a thickness of 260 angstroms, and the material of the fourth sub-image elimination layer 402 is silicon nitride with a thickness of 397 angstroms.

[0091] Based on any of the above embodiments, in some embodiments of the present invention, Figure 8 As shown, Figure 8The cross-sectional structure schematic diagram of a touch module provided for another embodiment of the present invention, the touch module also includes at least one third shadow elimination layer 70, and the at least one third shadow elimination layer 70 is located between the second shadow elimination layer 40 and the bridging layer 50, and the thickness of the third shadow elimination layer 70 is greater than the thickness of the second shadow elimination layer 40, so as to further ensure the shadow elimination effect through the thicker third shadow elimination layer 70.

[0092] In some embodiments of the present invention, Fig. 9 As shown, Fig. 9 This is a schematic cross-sectional structure diagram of a touch module provided in another embodiment of the present invention, wherein the third image elimination layer 70 includes at least one fifth image elimination sub-layer 701 and at least one sixth image elimination sub-layer 702 .

[0093] The refractive index of the fifth sub-image elimination layer 701 is less than that of the sixth sub-image elimination layer 702. Similarly, the refractive index of the touch electrode layer 30 is greater than that of the fifth sub-image elimination layer 701. The fifth sub-image elimination layer 701 and the sixth sub-image elimination layer 702 are alternately arranged in a direction perpendicular to the substrate 10, and the touch electrode layer 30 and the fifth sub-image elimination layer 701 are adjacently arranged in a layer of the fifth sub-image elimination layer 701 and a layer of the sixth sub-image elimination layer 702 closest to the touch electrode layer 30, and the fifth sub-image elimination layer 701 is located between the touch electrode layer 30 and the sixth sub-image elimination layer 702, or in other words, the sixth sub-image elimination layer 702 is located between the fifth sub-image elimination layer 701 and the bridging layer 50.

[0094] It should be noted that the refractive index of the fourth sub-image eliminating layer 401 is greater than the refractive index of the fifth sub-image eliminating layer 701 , and the refractive index of the fourth sub-image eliminating layer 401 is greater than, less than or equal to the refractive index of the sixth sub-image eliminating layer 702 .

[0095] Since the refractive index of the fourth sub-image elimination layer 401 is greater than that of the fifth sub-image elimination layer 701, and the refractive index of the fifth sub-image elimination layer 701 is less than that of the sixth sub-image elimination layer 702, a reflective interface will be generated between the fourth sub-image elimination layer 401 and the fifth sub-image elimination layer 701, and a reflective interface will be generated between the fifth sub-image elimination layer 701 and the sixth sub-image elimination layer 702. The reflected light at different interfaces will interfere when it enters the human eye, so that the reflected light of different vectors will superimpose and cancel each other, thereby reducing the color difference between the area where the touch electrode is located and other areas (such as the slits).

[0096] It should also be noted that the greater the difference in refractive index between the fourth sub-image elimination layer 401 and the fifth sub-image elimination layer 701, and the greater the difference in refractive index between the fifth sub-image elimination layer 701 and the sixth sub-image elimination layer 702, the greater the amount of reflected light at the interface and the wider the spectrum range, the better the coherent decomposition effect of the reflected light at each interface, and the better the image elimination effect.

[0097] In order to ensure the shadow elimination effect of the shadow elimination layer, in some embodiments of the present invention, the material of the fifth sub-shadow elimination layer 701 is silicon oxide, and the material of the sixth sub-shadow elimination layer 702 is silicon nitride. Similarly, the present invention is not limited to this, and in other embodiments, the fifth sub-shadow elimination layer 701 and the sixth sub-shadow elimination layer 702 can also be other materials, such as silicon oxynitride.

[0098] Furthermore, in order to ensure the shadow elimination effect of the shadow elimination layer, in some embodiments of the present invention, the thickness of the fifth sub-shadow elimination layer 701 ranges from 450 angstroms to 550 angstroms; the thickness of the sixth sub-shadow elimination layer 702 ranges from 250 angstroms to 270 angstroms.

[0099] For example, in some embodiments of the present invention, the material of the insulating layer 60 is OC material with a thickness of 15000 angstroms, the material of the touch electrode layer 30 is ITO with a thickness of 750 angstroms, the material of the first sub-shadow elimination layer 201 is silicon oxide with a thickness of 257 angstroms, the material of the second sub-shadow elimination layer 202 is silicon nitride with a thickness of 272 angstroms, the material of the third sub-shadow elimination layer 401 is silicon oxide with a thickness of 250 angstroms, the material of the fourth sub-shadow elimination layer 402 is silicon nitride with a thickness of 405 angstroms, the material of the fifth sub-shadow elimination layer 701 is silicon oxide with a thickness of 520 angstroms, and the material of the sixth sub-shadow elimination layer 702 is silicon nitride with a thickness of 250 angstroms. At this time, the reflectivity of the touch module is about 0.188%, and the color difference is about 0.39, which meets the optical requirements, that is, meets the shadow elimination requirements. Among them, the optical requirements refer to a reflectivity of less than 0.4% and a color difference of less than 2.

[0100] In other embodiments, the material of the insulating layer 60 is OC material, and the thickness of the OC material is 19500 angstroms, the material of the touch electrode layer 30 is ITO, with a thickness of 1250 angstroms, the material of the first sub-image elimination layer 201 is silicon oxide, with a thickness of 276 angstroms, the material of the second sub-image elimination layer 202 is silicon nitride, with a thickness of 250 angstroms, the material of the third sub-image elimination layer 401 is silicon oxide, with a thickness of 260 angstroms, the material of the fourth sub-image elimination layer 402 is silicon nitride, with a thickness of 397 angstroms, the material of the fifth sub-image elimination layer 701 is silicon oxide, with a thickness of 477 angstroms, and the material of the sixth sub-image elimination layer 702 is silicon nitride, with a thickness of 250 angstroms. At this time, the reflectivity of the touch module is approximately 0.171%, and the color difference is approximately 0.261, which meets the optical requirements.

[0101] Based on any of the above embodiments, in some embodiments of the present invention, Fig.10 As shown, Fig.10The cross-sectional structural schematic diagram of the touch module provided for another embodiment of the present invention also includes a fourth shadow elimination layer 80 located on the side of the bridge layer 50 away from the substrate 10, so that the fourth shadow elimination layer 80 can further eliminate the color difference between the bridge 501 and other areas in the direction parallel to the substrate 10, so that the bridge 501 is optically shadow-free, making the pattern of the bridge 501 not easily perceived by the human eye.

[0102] Of course, in some embodiments of the present invention, the fourth shadow elimination layer 80 may include only at least one layer of silicon oxide, or only at least one layer of silicon nitride, or at least one layer of silicon oxide and at least one layer of silicon nitride, etc., which will not be repeated here.

[0103] In some embodiments of the present invention, Fig.11 As shown, Fig.11 The cross-sectional structure diagram of the touch module provided by another embodiment of the present invention, the second shadow elimination layer 40 and the insulating layer 60 both include a step area T, and the step area T exposes the connection terminal 303 in the touch electrode layer 30 to connect the connection terminal 303 to the external circuit.

[0104] It should be noted that the external circuit may be a driver chip, etc. Since the pins of the driver chip need to be connected to the connection terminals 303 through a binding process, a step region T needs to be formed to expose the connection terminals 303 in the touch electrode layer 30 .

[0105] Since both the second shadow elimination layer 40 and the insulating layer 60 need to be etched to form the via 503 and also need to be etched to form the step area T, in some embodiments of the present invention, the second shadow elimination layer 40 and the insulating layer 60 share the same mask plate, which can not only simplify the process flow and shorten the process time, but also reduce one mask plate, thereby reducing the production cost.

[0106] Of course, in some other embodiments of the present invention, when the touch module includes the third shadow elimination layer 70, Fig.12 As shown, Fig.12 This is a schematic diagram of a cross-sectional structure of a touch module provided by another embodiment of the present invention, wherein the second shadow elimination layer 40, the third shadow elimination layer 70 and the insulating layer 60 all include a step region T, and the step region T exposes the connection terminal 303 in the touch electrode layer 30 so that the connection terminal 303 is connected to an external circuit. In addition, the second shadow elimination layer 40, the third shadow elimination layer 70 and the insulating layer 60 share the same mask plate.

[0107] In some embodiments of the present invention, Fig.13 As shown, Fig.13The cross-sectional structure diagram of the touch module provided by another embodiment of the present invention further includes a first optical adjustment layer 90, and the first optical adjustment layer 90 is located between the substrate 10 and the first shadow elimination layer 20. Optionally, the material of the first optical adjustment layer 90 is silicon oxide or silicon nitride, etc.; the thickness of the first optical adjustment layer 90 ranges from 200 angstroms to 1000 angstroms.

[0108] In some embodiments of the present invention, Fig.14 As shown, Fig.14 The cross-sectional structure diagram of the touch module provided by another embodiment of the present invention, the touch module also includes: a second optical adjustment layer 100 located on the surface of the bridge layer 50 away from the second shadow elimination layer 40; wherein the surface of the second optical adjustment layer 100 away from the bridge layer 50 includes a plurality of first micro-protrusion structures 101. In this way, the bridge layer 50 can be covered and protected by the second optical adjustment layer 100 to prevent the bridge layer 50 from being scratched and damaged. In addition, since the surface of the second optical adjustment layer 100 has a plurality of first micro-protrusion structures 101, the reflected light can be diffusely reflected, and the transmitted light can be scattered and refracted, so that the light distribution in different areas is more uniform, and the difference between the touch electrode and other areas outside the touch electrode can be reduced, the visibility of the touch electrode can be reduced, and the shadow elimination of the touch electrode pattern can be better achieved, so that the touch electrode pattern is less likely to be perceived by the human eye.

[0109] In some embodiments of the present invention, Fig.15 As shown, Fig.15 The cross-sectional structure diagram of the touch module provided by another embodiment of the present invention, the touch module also includes: a third optical adjustment layer 200 located between the touch electrode layer 30 and the second shadow elimination layer 40; wherein the surface of the third optical adjustment layer 200 on the side away from the touch electrode layer 30 includes a plurality of second micro-protrusion structures 201. In this way, since the surface of the third optical adjustment layer 200 has a plurality of second micro-protrusion structures 201, the reflected light can be diffusely reflected, and the transmitted light can be scattered and refracted, so that the light distribution in different areas is more uniform, and the difference between the touch electrode and other areas outside the touch electrode can be reduced, the visibility of the touch electrode can be reduced, and the shadow elimination of the touch electrode pattern can be better achieved, so that the touch electrode pattern is less likely to be perceived by the human eye. In addition, the third optical adjustment layer 200 and the second shadow elimination layer 40 can increase the thickness of the dielectric layer between the touch electrode layer 30 and the bridge layer 50, reduce the capacitance between the two, avoid the influence of the capacitance on the touch, and improve the accuracy of touch detection.

[0110] In some embodiments of the present invention, Fig.16 As shown, Fig.16The cross-sectional structure diagram of a touch module provided by another embodiment of the present invention, the touch module further comprises: a second optical adjustment layer 100 located on the surface of the bridge layer 50 away from the second shadow elimination layer 40, wherein the surface of the second optical adjustment layer 100 away from the bridge layer 50 comprises a plurality of first micro-convex structures 101; a third optical adjustment layer 200 located between the touch electrode layer 30 and the second shadow elimination layer 40, wherein the surface of the third optical adjustment layer 200 away from the touch electrode layer 30 comprises a plurality of second micro-convex structures 201. This method simultaneously sets the second optical adjustment layer 100 and the third optical adjustment layer 200, and has both Fig.14 and Fig.15 The advantages of the illustrated method include not only being able to protect the bridge layer 50 and better achieve the elimination of the touch electrode pattern, but also being able to reduce the capacitance between the touch electrode layer 30 and the bridge layer 50 and improve the accuracy of touch detection.

[0111] In the embodiment of the present application, the second optical adjustment layer 100 and the third optical adjustment layer 200 may be OC layers. The micro-convex structures on the surfaces of the second optical adjustment layer 100 and the third optical adjustment layer 200 can make the reflected light form diffuse reflection, and make the transmitted light refracted in a scattered manner, so that the light distribution in different regions is more uniform. The shape of the micro-convex structures on the surfaces of the second optical adjustment layer 100 and the third optical adjustment layer 200 can be designed based on the requirements. The width of the first micro-convex structure 101 and the second micro-convex structure 201 is smaller than the size of the touch electrode. The size of the general touch electrode is 8μm, and the width of the first micro-convex structure 101 and the second micro-convex structure 201 is less than 8μm.

[0112] When the second optical adjustment layer 100 is provided, Fig.14 and Fig.16 In the manner shown, the surface of the first micro-protrusion structure 101 is a smooth curved surface, and the cross-section of the first micro-protrusion structure 101 is a partial ellipse or a partial circle.

[0113] When the third optical adjustment layer 200 is provided, Fig.15 and Fig.16 In the manner shown, the surface of the second micro-protrusion structure 201 is a smooth curved surface, and the cross-section of the second micro-protrusion structure 201 is a partial ellipse or a partial circle.

[0114] like Fig.17 As shown, Fig.17Schematic diagram of a micro-protrusion structure provided by an embodiment of the present application. When a second optical adjustment layer 100 is provided, the first micro-protrusion structure 101 includes a plurality of first sub-protrusion structures 1011. In the same first micro-protrusion structure 101, at least two first sub-protrusion structures 1011 have different heights. The height of the first sub-protrusion structure 1011 is the height of the top of the first sub-protrusion structure 1011 relative to the bottom surface of the second optical adjustment layer 100. When a third optical adjustment layer 200 is provided, as shown in FIG. Fig.17 As shown, the second micro-protrusion structure 201 includes a plurality of second sub-protrusion structures 2011 , and in the same second micro-protrusion structure 201 , at least two second sub-protrusion structures 2011 have different heights.

[0115] like Fig.18 As shown, Fig.18 This is a schematic diagram of a micro-protrusion structure provided by another embodiment of the present application, wherein the touch electrode layer 30 has a slit K; when a second optical adjustment layer 100 is provided, in a direction X perpendicular to the substrate, the second optical adjustment layer 100 has a first portion 100A overlapping with the touch electrode and a second portion 100B overlapping with the slit K. The distribution density of the first micro-protrusion structure 101 in the first portion 100A is greater than the distribution density of the first micro-protrusion structure 101 in the second portion 100B (the number of the first micro-protrusion structure 101 per unit area). In this manner, the first micro-protrusion structures 101 have the same structure and have the same radius of curvature.

[0116] exist Fig.18 In the illustrated embodiment, the distribution density of the first micro-protrusion structure 101 in the first part 100A where the touch electrode is provided is greater than the distribution density of the first micro-protrusion structure 101 in the second part 100B, which can make the light scattering effect in the area with the touch electrode greater, make the light distribution in the area more uniform, reduce the light brightness in the area corresponding to the slit K, and thus achieve a better shadow elimination effect. Among them, the slit K area without the touch electrode has a weak reflection effect and a low light intensity.

[0117] like Fig.19 As shown, Fig.19 A schematic diagram of a micro-protrusion structure provided in another embodiment of the present application, which is similar to Fig.18 The difference between the illustrated method and the embodiment is that the radius of curvature of the first micro-protrusion structure 101 in the first portion 100A is set to be greater than the radius of curvature of the first micro-protrusion structure 101 in the second portion 100B, that is, the surface roughness of the first region 100A is greater than the surface roughness of the second portion 100B. In this method, the distribution density of the first micro-protrusion structure 101 in the first portion 100A is equal to the distribution density of the first micro-protrusion structure 101 in the second portion 100B.

[0118] exist Fig.19In the shown manner, the radius of curvature of the first micro-protrusion structure 101 in the first part 100A is set to be greater than the radius of curvature of the first micro-protrusion structure 101 in the second part 100B, so that the light in the area with the touch electrode is deflected more greatly relative to the direction X when reflected by the first micro-protrusion structure 101, thereby making the light scattering effect in the area with the touch electrode greater, making the light distribution in the area more uniform, reducing the light brightness in the area corresponding to the slit K, thereby better achieving the shadow elimination effect.

[0119] like Fig. 20 As shown, Fig. 20 This is a schematic diagram of a micro-protrusion structure provided by another embodiment of the present application, in which the touch electrode layer 30 has a slit K. When a third optical adjustment layer 200 is provided, in a direction X perpendicular to the substrate, the third optical adjustment layer 200 has a third portion 200A overlapping with the touch electrode and a fourth portion 200B overlapping with the slit K. The distribution density of the second micro-protrusion structure 201 in the third portion 200A is greater than the distribution density of the second micro-protrusion structure 201 in the fourth portion 200B; in this manner, the second micro-protrusion structures 201 have the same structure and have the same radius of curvature.

[0120] exist Fig. 20 In the shown manner, setting the distribution density of the second micro-protrusion structure 201 in the third part 200A greater than the distribution density of the second micro-protrusion structure 201 in the fourth part 200B can make the light scattering effect in the area with the touch electrode greater, make the light distribution in the area more uniform, reduce the light brightness in the area corresponding to the slit K, thereby better achieving the shadow elimination effect.

[0121] like Fig.21 As shown, Fig.21 A schematic diagram of a micro-protrusion structure provided in another embodiment of the present application, which is similar to Fig. 20 The difference between the illustrated method and the embodiment is that the radius of curvature of the second micro-protrusion structure 201 in the third part 200A is set to be greater than the radius of curvature of the second micro-protrusion structure 201 in the fourth part 200B, that is, the surface roughness of the third part 200A is greater than the surface roughness of the fourth part 200B. In this method, the distribution density of the second micro-protrusion structure 201 in the third part 200A is equal to the distribution density of the second micro-protrusion structure 201 in the fourth part 200B.

[0122] exist Fig.21In the shown manner, the radius of curvature of the second micro-protrusion structure 201 in the third part 200A is set to be greater than the radius of curvature of the second micro-protrusion structure 201 in the fourth part 200B, so that the light in the area with the touch electrode is deflected more greatly relative to the direction X when reflected by the second micro-protrusion structure 201, thereby making the light scattering effect in the area with the touch electrode greater, making the light distribution in the area more uniform, reducing the light brightness in the area corresponding to the slit K, thereby better achieving the shadow elimination effect.

[0123] like Fig. 22 As shown, Fig. 22 A schematic diagram of the planar structure of making multiple touch modules 1 for a large glass sheet. When forming the first shadow elimination layer 20 and other CVD film layers on the large glass sheet, i.e., the substrate 10, through the CVD process, a pin is needed to be pressed against the large glass sheet at point B. The pin supports the large glass sheet to descend while the heating stage is raised, so that the large glass sheet is preheated and gradually heated. Finally, the two are brought into contact with each other so that the large glass sheet is further heated to the set temperature, and then the relevant CVD gas is introduced to form a film.

[0124] Since the heating stage is empty in the pin needle area, when the large glass is in contact with the stage and finally heated to the set temperature, the pin needle area heats up slower than the non-pin needle area, which results in a temperature difference between the pin needle area and the non-pin needle area. In the subsequent film formation stage, the film quality of the generated CVD film is different due to the different substrate temperatures, which is finally manifested as a difference in reflected light in the two areas, forming a pin point dark area. Based on this, in some embodiments of the present invention, a first optical adjustment layer 90 is formed between the substrate 10 and the first shadow elimination layer 20, so as to effectively reduce the difference in reflected light spectrum between the two areas through the first optical adjustment layer 90, thereby reducing the difference in reflected light between the two areas, so that the difference in reflected light of the entire touch module tends to be consistent.

[0125] The embodiment of the present invention further provides a touch display panel, comprising a display module and a touch module as provided in any of the above embodiments, such as Fig.23 As shown, Fig.23 This is a schematic cross-sectional structure diagram of a touch display panel provided by an embodiment of the present invention, in which the touch module 1 is located on the light emitting side of the display module 2 .

[0126] The display module 2 in the embodiment of the present invention may be a liquid crystal display panel, an LED display panel, or an OLED display panel, etc. Fig.23 The display module 2 is only described as an OLED display panel, but is not limited thereto. The display module 2 includes a driving transistor T and an OLED light emitting unit 12, etc.

[0127] It should be noted that, in the embodiment of the present invention, the refractive index of the touch electrode layer 30 in the touch module 1 is greater than the refractive index of the image elimination layer, that is, the refractive index of the touch electrode layer 30 is greater than the refractive index of the first image elimination layer 20, the second image elimination layer 40 and the third image elimination layer 70, so as to reduce the reflectivity of the touch module 1 through the image elimination layer and eliminate the image of the touch electrode pattern in the touch module 1.

[0128] An embodiment of the present invention further provides a touch display device, which includes the touch display panel provided by any of the above embodiments. Fig.24 As shown, Fig.24 This is a schematic diagram of the structure of a display device provided in one embodiment of the present invention. The display device Z includes but is not limited to a full-screen mobile phone, a tablet computer, a digital camera, etc.

[0129] The embodiment of the present invention also provides a method for manufacturing a touch module. Fig.25 As shown, Fig.25 A flowchart of a method for manufacturing a touch module provided by an embodiment of the present invention, the manufacturing method comprising:

[0130] S101: providing a substrate;

[0131] In some embodiments of the present invention, reference Figure 2 First, a substrate 10 is provided. Optionally, the substrate 10 is a transparent glass substrate. Of course, the present invention is not limited thereto.

[0132] S102: forming a first image elimination layer and a touch electrode layer on the substrate in sequence;

[0133] Specifically, the first shadow elimination layer 20 is first formed on the substrate 10 . Optionally, the first shadow elimination layer 20 can be formed by a CVD process. Of course, other processes can also be used, which will not be described in detail. Then, a touch electrode layer 30 is formed on the surface of the first shadow elimination layer 20 .

[0134] S103: using a first mask to etch the touch electrode layer to form a plurality of first touch electrodes;

[0135] The touch electrode layer 30 is covered with a first mask plate, the first mask plate exposing the slits between the touch electrodes, and then the touch electrode layer 30 is etched with an etching solution to form the first touch electrode 301 and the second touch electrode 302 .

[0136] S104: forming a second image elimination layer on a side of the touch electrode layer away from the substrate;

[0137] After the touch electrode layer 30 is etched, a second image elimination layer 40 is formed on a side of the touch electrode layer 30 away from the substrate 10. Similarly, the second image elimination layer 40 may be formed by a CVD process.

[0138] S105: using a second mask to etch the second shadow elimination layer to form a through hole penetrating the second shadow elimination layer;

[0139] A second mask plate is covered on the second image elimination layer 40 , and the second mask plate exposes the area where the through hole is located. Then, the second image elimination layer 40 is etched with an etching solution or the like to form a through hole penetrating the second image elimination layer 40 .

[0140] S106: Fill the through hole with a conductive material to form a via hole, and form a bridge layer on the surface of the second shadow elimination layer, and use a third mask plate to etch the bridge layer to form a plurality of bridges, and the bridges connect two adjacent first touch electrodes through the via hole. The conductive material can be filled in the through hole by depositing ITO material in the through hole.

[0141] After the through hole is formed, a bridging layer 50 is formed on the surface of the second shadow elimination layer 40, and the bridging layer 50 is etched using a third mask plate to form a plurality of bridges 501, that is, the bridging layer 50 includes a plurality of bridges 501, and the conductive material forming the bridging layer 50 is simultaneously filled in the through hole to form a via 502, so that the bridge 501 connects two adjacent first touch electrodes 301 through the via 502.

[0142] Of course, the present invention is not limited to this. In other embodiments, reference Figure 5 , after etching the touch electrode layer using a first mask to form a plurality of first touch electrodes, the method comprises:

[0143] The second shadow elimination layer 40 and the insulating layer 60 are sequentially formed on the side of the touch electrode layer 30 away from the substrate 10 ; that is, after the second shadow elimination layer 40 is formed, the insulating layer 60 may be deposited to reduce the capacitance.

[0144] Using a second mask to etch the second shadow elimination layer 40 and the insulating layer 60 to form a through hole penetrating the second shadow elimination layer 40 and the insulating layer 60;

[0145] A conductive material is filled in the through hole to form a via hole 503 , and a bridge layer 50 is formed on the surface of the insulating layer 60 . The bridge layer 50 is etched using a third mask to form a plurality of bridges 501 . The bridge 501 connects two adjacent first touch electrodes 301 through the via hole 503 .

[0146] On this basis, in some embodiments of the present invention, reference Fig.11 , the second shadow elimination layer 40 and the insulating layer 60 both include a step region T, then etching the insulating layer 40 and the second shadow elimination layer 60 further includes:

[0147] The second shadow eliminating layer 40 and the insulating layer 60 are etched to form a step region T. The step region T exposes the connecting terminal 303 in the touch electrode layer 30 so that the connecting terminal 303 is connected to an external circuit.

[0148] Since both the second shadow elimination layer 40 and the insulating layer 60 need to be etched to form the via 503 and also need to be etched to form the step area T, in some embodiments of the present invention, the second shadow elimination layer 40 and the insulating layer 60 share the same mask plate, which can not only simplify the process flow and shorten the process time, but also reduce one mask plate, thereby reducing the production cost.

[0149] In this specification, each embodiment is described in a progressive, parallel, or progressive and parallel manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the embodiments can be referred to each other. As for the touch display panel, touch display device, and manufacturing method disclosed in the embodiments, since they correspond to the touch module disclosed in the embodiments, the description is relatively simple, and the relevant parts can be referred to the corresponding part of the touch module.

[0150] The above description of the disclosed embodiments enables one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A touch module, characterized in that: It includes a substrate and a first shadow elimination layer, a touch electrode layer, a second shadow elimination layer and a bridge layer which are sequentially located on one side of the substrate; The touch electrode layer includes a plurality of first touch electrodes; the touch electrode layer has slits; The bridge layer includes a plurality of bridges, and the bridges connect two adjacent first touch electrodes through via holes penetrating the second shadow elimination layer; It also includes: a second optical adjustment layer located on a surface of the bridge layer facing away from the second shadow elimination layer, wherein the surface of the second optical adjustment layer facing away from the bridge layer includes a plurality of first micro-protrusion structures; and / or a third optical adjustment layer located between the touch electrode layer and the second shadow elimination layer, wherein the surface of the third optical adjustment layer facing away from the touch electrode layer includes a plurality of second micro-protrusion structures; When the second optical adjustment layer is provided, in a direction perpendicular to the substrate, the second optical adjustment layer has a first portion overlapping with the touch electrode and a second portion overlapping with the slit; the distribution density of the first micro-protrusion structure in the first portion is greater than the distribution density of the first micro-protrusion structure in the second portion; or the curvature radius of the first micro-protrusion structure in the first portion is greater than the curvature radius of the first micro-protrusion structure in the second portion; When the third optical adjustment layer is provided, in a direction perpendicular to the substrate, the third optical adjustment layer has a third portion overlapping with the touch electrode and a fourth portion overlapping with the slit; a distribution density of the second micro-protrusion structures in the third portion is greater than a distribution density of the second micro-protrusion structures in the fourth portion; or a curvature radius of the second micro-protrusion structures in the third portion is greater than a curvature radius of the second micro-protrusion structures in the fourth portion.

2. The touch module according to claim 1, characterized in that: It also includes an insulating layer; the insulating layer is located between the second shadow elimination layer and the bridge layer; the bridge connects two adjacent first touch electrodes through a via hole that penetrates the second shadow elimination layer and the insulating layer.

3. The touch module according to claim 1 or 2, characterized in that: The first image-eliminating layer includes at least one first sub-image-eliminating layer and at least one second sub-image-eliminating layer; The refractive index of the first sub-image elimination layer is smaller than the refractive index of the second sub-image elimination layer; the first sub-image elimination layer and the second sub-image elimination layer are alternately arranged in a direction perpendicular to the substrate, and the first sub-image elimination layer is located between the touch electrode layer and the second sub-image elimination layer.

4. The touch module according to claim 3, characterized in that: The material of the first sub-image elimination layer includes silicon oxide; the material of the second sub-image elimination layer includes silicon nitride; The thickness of the first sub-image elimination layer ranges from 250 angstroms to 300 angstroms; the thickness of the second sub-image elimination layer ranges from 250 angstroms to 300 angstroms.

5. The touch module according to claim 1 or 2, characterized in that: The second image-eliminating layer includes at least one third sub-image-eliminating layer and at least one fourth sub-image-eliminating layer; The refractive index of the third sub-image elimination layer is smaller than the refractive index of the fourth sub-image elimination layer; the third sub-image elimination layer and the fourth sub-image elimination layer are alternately arranged in a direction perpendicular to the substrate, and the third sub-image elimination layer is located between the touch electrode layer and the fourth sub-image elimination layer.

6. The touch module according to claim 5, characterized in that: The material of the third sub-image elimination layer includes silicon oxide; the material of the fourth sub-image elimination layer includes silicon nitride; The thickness of the third sub-image elimination layer ranges from 250 angstroms to 300 angstroms; the thickness of the fourth sub-image elimination layer ranges from 250 angstroms to 430 angstroms.

7. The touch module according to claim 1 or 2, characterized in that: The touch module further includes at least one third image elimination layer, which is located between the second image elimination layer and the bridging layer, and the thickness of the third image elimination layer is greater than that of the second image elimination layer.

8. The touch module according to claim 7, characterized in that: The third image-eliminating layer includes at least one fifth sub-image-eliminating layer and at least one sixth sub-image-eliminating layer; The refractive index of the fifth sub-image elimination layer is smaller than the refractive index of the sixth sub-image elimination layer; the fifth sub-image elimination layer and the sixth sub-image elimination layer are alternately arranged in a direction perpendicular to the substrate, and the fifth sub-image elimination layer is located between the touch electrode layer and the sixth sub-image elimination layer.

9. The touch module according to claim 8, characterized in that: The material of the fifth sub-image elimination layer includes silicon oxide; the material of the sixth sub-image elimination layer includes silicon nitride; The thickness of the fifth sub-image elimination layer ranges from 450 angstroms to 550 angstroms; the thickness of the sixth sub-image elimination layer ranges from 250 angstroms to 270 angstroms.

10. The touch module according to claim 1 or 2, characterized in that: The invention also comprises a fourth shadow eliminating layer which is located on the side of the bridging layer away from the substrate.

11. The touch module according to claim 2, characterized in that: The second shadow elimination layer and the insulating layer both include a step area, and the step area exposes the connection terminal in the touch electrode layer so that the connection terminal is connected to an external circuit; The second shadow elimination layer and the insulating layer share the same mask plate.

12. The touch module according to claim 2, characterized in that: The insulating layer is made of silicon oxide or OC material.

13. The touch module according to claim 12, characterized in that: The thickness of the silicon oxide ranges from 3000 angstroms to 4000 angstroms; the thickness of the OC material ranges from 12500 angstroms to 20000 angstroms.

14. The touch module according to claim 1, characterized in that: The thickness of the touch electrode layer ranges from 500 angstroms to 1350 angstroms.

15. The touch module according to claim 1, characterized in that: The thickness of the touch electrode layer ranges from 900 angstroms to 1200 angstroms, and the thickness of the bridge layer ranges from 1100 angstroms to 1350 angstroms.

16. The touch module according to claim 1, characterized in that: The touch electrode layer further includes a plurality of second touch electrode strips; the second touch electrode strips extend along the first direction, and the plurality of second touch electrode strips are sequentially arranged along the second direction; the second touch electrode strips include a plurality of second touch electrodes integrally connected in the first direction; The multiple first touch electrodes are arranged in an array, and the adjacent first touch electrodes in the second direction are connected in sequence through the bridge and the via; the multiple first touch electrodes connected in sequence in the second direction constitute first touch electrode strips, and the multiple first touch electrode strips are arranged in sequence along the first direction, and the first touch electrode strips are insulated and intersected with the second touch electrode strips.

17. The touch module according to claim 1, characterized in that: The invention also includes a first optical adjustment layer, wherein the first optical adjustment layer is located between the substrate and the first shadow elimination layer.

18. The touch module according to claim 17, characterized in that: The material of the first optical adjustment layer is silicon oxide or silicon nitride; The thickness of the first optical adjustment layer ranges from 200 angstroms to 1000 angstroms.

19. The touch module according to claim 1, characterized in that: When the second optical adjustment layer is provided, the surface of the first micro-protrusion structure is a smooth curved surface, or the first micro-protrusion structure includes a plurality of first sub-protrusion structures, and in the same first micro-protrusion structure, at least two of the first sub-protrusion structures have different heights; When the third optical adjustment layer is provided, the surface of the second micro-protrusion structure is a smooth curved surface, or the second micro-protrusion structure includes a plurality of second sub-protrusion structures, and in the same second micro-protrusion structure, at least two second sub-protrusion structures have different heights.

20. A touch display panel, characterized in that: Comprising a display module and a touch module according to any one of claims 1 to 19, wherein the touch module is located on the light emitting side of the display module; The refractive index of the touch electrode layer in the touch module is greater than the refractive index of the image elimination layer.

21. A touch display device, characterized in that: Includes the touch display panel as claimed in claim 20.

22. A method for manufacturing a touch module according to any one of claims 1 to 19, characterized in that: include: providing a substrate; forming a first image elimination layer and a touch electrode layer on the substrate in sequence; Using a first mask to etch the touch electrode layer to form a plurality of first touch electrodes; forming a second image elimination layer on a side of the touch electrode layer away from the substrate; Using a second mask to etch the second shadow elimination layer to form a through hole penetrating the second shadow elimination layer; A conductive material is filled in the through hole to form a via hole, and a bridge layer is formed on the surface of the second shadow elimination layer. The bridge layer is etched using a third mask plate to form a plurality of bridges, and the bridge connects two adjacent first touch electrodes through the via hole.

23. The method according to claim 22, characterized in that After the touch electrode layer is etched by using a first mask to form a plurality of first touch electrodes, the method includes: forming a second shadow elimination layer and an insulating layer in sequence on a side of the touch electrode layer away from the substrate; Using a second mask to etch the second shadow elimination layer and the insulating layer to form a through hole penetrating the second shadow elimination layer and the insulating layer; A conductive material is filled in the through hole to form a via hole, and a bridge layer is formed on the surface of the second shadow elimination layer. The bridge layer is etched using a third mask plate to form a plurality of bridges, and the bridge connects two adjacent first touch electrodes through the via hole.

24. The method according to claim 23, characterized in that The second shadow elimination layer and the insulating layer both include a step region, and etching the insulating layer and the second shadow elimination layer further includes: The second shadow eliminating layer and the insulating layer are etched to form a step area, wherein the step area exposes the connecting terminal in the touch electrode layer so that the connecting terminal is connected to an external circuit.

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