mask

Abstract

A mask includes a first mask including a first long side extending in a first direction and a first short side extending in a second direction crossing the first direction, and the first mask includes a first edge portion, a first center portion, and a first weld portion arranged sequentially in the first direction. The mask further includes a second mask including a second long side extending in the first direction and a second short side extending in the second direction, and the second mask includes a second weld portion, a second center portion, and a second edge portion arranged sequentially in the first direction. The first weld portion is in contact with the second weld portion.

Description

[0001] Cross-reference to related applications

[0002] This patent application claims priority and benefit to Korean Patent Application No. 10-2020-0089131, filed on July 17, 2020, with the Korean Intellectual Property Office, the contents of which are incorporated herein by reference in their entirety. Technical Field

[0003] The embodiments of this disclosure relate to a mask and a method of manufacturing the mask. More specifically, the embodiments of this disclosure relate to a mask comprising a plurality of masks welded to each other and a method of manufacturing the mask. Background Technology

[0004] A display panel comprises multiple pixels. Each pixel includes driving elements such as transistors and display elements such as organic light-emitting diodes. Display elements are formed by stacking electrodes and light-emitting patterns on a substrate.

[0005] The luminescent pattern is patterned using a mask with open areas formed therethrough. The luminescent pattern is formed corresponding to the open areas of the mask. In recent years, research has been conducted on large-size masks to improve the manufacturing efficiency of display components. Summary of the Invention

[0006] Embodiments of this disclosure provide a mask that can improve the efficiency of a method for manufacturing a display device.

[0007] Embodiments of this disclosure provide a method for manufacturing a mask that can improve the efficiency of a method for manufacturing a display device.

[0008] An embodiment of the inventive concept provides a mask comprising a first mask including a first long side extending in a first direction and a first short side extending in a second direction intersecting the first direction, wherein the first mask includes a first edge portion, a first center portion, and a first weld portion sequentially arranged in the first direction. The mask further includes a second mask including a second long side extending in the first direction and a second short side extending in the second direction, wherein the second mask includes a second weld portion, a second center portion, and a second edge portion sequentially arranged in the first direction. The first weld portion contacts the second weld portion.

[0009] The first welded portion extends from the first central portion, and one end of the first welded portion is the first short side. The second welded portion extends from the second central portion, and one end of the second welded portion is the second short side.

[0010] The first short side of the first mask is in contact with the second short side of the second mask.

[0011] The first long side is aligned with the second long side in the first direction.

[0012] The first mask further includes a first perforation formed through the first solder portion, the second mask further includes a second perforation formed through the second solder portion, and the first perforation and the second perforation overlap each other.

[0013] A plurality of the first perforations and a plurality of the second perforations are provided.

[0014] The first mask further includes a first alignment mark disposed on an upper surface of the first solder portion, the second mask further includes a second alignment mark disposed on an upper surface of the second solder portion, and the first alignment mark is in contact with the second alignment mark.

[0015] The first solder portion includes a first half-etching portion, and the second solder portion includes a second half-etching portion.

[0016] Each of the first solder portion and the second solder portion includes one of an inclined surface and a step.

[0017] The first solder portion includes a first concave-convex portion having an oscillating shape in a plane, the second solder portion includes a second concave-convex portion having an oscillating shape in a plane, and the first concave-convex portion is engaged with the second concave-convex portion.

[0018] The first mask further includes a first perforation formed through the first concave-convex portion, the second mask further includes a second perforation formed through the second concave-convex portion, wherein the first perforation and the second perforation overlap.

[0019] The mask further includes a metal thin film overlapping the first concave-convex portion and the second concave-convex portion and disposed on an upper surface of each of the first mask and the second mask.

[0020] The first center portion includes a first open area in which an opening is formed and a first non-open area adjacent to the first open area, and the second center portion includes a second open area in which another opening is formed and a second non-open area adjacent to the second open area.

[0021] Each of the first mask and the second mask has a thickness equal to or less than about 50 micrometers.

[0022] Embodiments of the inventive concept provide a method of manufacturing a mask. The method of manufacturing the mask includes preparing a first mask including a first long side extending in a first direction and a first short side extending in a second direction crossing the first direction, wherein the first mask includes a first edge portion, a first center portion, and a first welding portion sequentially arranged in the first direction. The method of manufacturing the mask further includes preparing a second mask including a second long side extending in the first direction and a second short side extending in the second direction, wherein the second mask includes a second welding portion, a second center portion, and a second edge portion sequentially arranged in the first direction. The method of manufacturing the mask further includes welding the first welding portion to the second welding portion.

[0023] The method further includes aligning the first mask and the second mask to each other. The first mask further includes a first perforation formed through the first welding portion, and the second mask further includes a second perforation formed through the second welding portion, wherein aligning the first mask and the second mask to each other after preparing the first mask and the second mask allows the first perforation to overlap the second perforation.

[0024] The method further includes aligning the first mask and the second mask to each other. The first mask further includes a first alignment mark disposed on an upper surface of the first welding portion, and the second mask further includes a second alignment mark disposed on an upper surface of the second welding portion, wherein aligning the first mask and the second mask to each other after preparing the first mask and the second mask allows the first alignment mark to contact the second alignment mark.

[0025] The first welding portion of the first mask includes a first pattern formed at one end, and the second welding portion of the second mask includes a second pattern formed at one end. The method further includes aligning the first pattern to the second pattern after preparing the first mask and the second mask.

[0026] The first pattern and the second pattern are formed by a half-etching process.

[0027] Each of the first pattern and the second pattern includes one of an inclined surface and a step.

[0028] Each of the first pattern and the second pattern has an oscillating shape.

[0029] The first welding portion further includes a first perforation formed adjacent to the first pattern, the second welding portion further includes a second perforation formed adjacent to the second pattern, and aligning the first mask and the second mask further includes aligning the first mask and the second mask to allow the first perforation to overlap the second perforation.

[0030] The method further includes disposing a metal thin film on the first welding portion and the second welding portion after aligning the first mask and the second mask to each other. Welding the first welding portion and the second welding portion includes welding the first welding portion, the second welding portion, and the metal thin film to each other.

[0031] Embodiments of the inventive concept provide a mask. The mask includes a first mask of a rectangle, the first mask including an edge portion, a center portion, and a welding portion arranged sequentially in a length direction of the first mask. The welding portion extends from the center portion, one end of the welding portion being a short side of the mask, and the short side of the mask being in contact with a short side of a second mask of a rectangle.

[0032] The first mask of a rectangle further includes a long side substantially perpendicular to the short side of the first mask, the second mask of a rectangle includes a long side substantially perpendicular to the short side of the second mask, and the long side of the first mask is aligned with the long side of the second mask.

[0033] According to the above, a mask can have a large area.

[0034] According to the method of manufacturing a mask, a mask having a large area can be provided. BRIEF DESCRIPTION OF DRAWINGS

[0035] Figure 1 is a plan view of a mask assembly according to embodiments of the disclosure.

[0036] Figure 2 is a perspective view of a mask according to embodiments of the disclosure.

[0037] Figure 3 is a flowchart of a method of manufacturing a mask according to embodiments of the disclosure.

[0038] Figures 4 to 12 is a perspective view of a mask in a preparation stage according to embodiments of the disclosure.

[0039] Figure 13 is a perspective view of a process of a method of manufacturing a mask according to embodiments of the disclosure.

[0040] Figure 14is a perspective view of a process of a method of manufacturing a mask according to an embodiment of the disclosure.

[0041] Figure 15 A process of manufacturing a display apparatus using a mask according to an embodiment of the disclosure is illustrated. DETAILED DESCRIPTION

[0042] In the disclosure, it will be understood that when a component or layer is referred to as being "on", "connected to", or "coupled to" another component or layer, it can be directly on the other component or layer, directly connected or coupled to the other component or layer, or intervening components or layers can be present.

[0043] Throughout the specification, like reference numbers can refer to like elements throughout the specification. In the drawings, the thickness, ratio, and size of components can be exaggerated for effective description of the technical content.

[0044] Hereinafter, embodiments of the disclosure will be described with reference to the accompanying drawings.

[0045] Figure 1 is a plan view of a mask assembly MA according to an embodiment of the disclosure. Figure 2 is a perspective view of a mask MK according to an embodiment of the disclosure.

[0046] The mask assembly MA can be used in a process of manufacturing a display apparatus. In detail, the mask assembly MA can be used in a process of depositing an organic light emitting element layer on a deposition substrate of a display apparatus.

[0047] According to an embodiment, the mask assembly MA includes a plurality of masks MK and a mask frame MF. The mask frame MF according to an embodiment has a rectangular shape having a side extending in a first direction DR1 and a side extending in a second direction DR2. The second direction DR2 crosses the first direction DR1. However, the shape of the mask frame MF is not limited thereto and can have other shapes in other embodiments.

[0048] Hereinafter, a direction substantially perpendicular to a plane defined by the first direction DR1 and the second direction DR2 is referred to as a "third direction DR3". In the disclosure, "in the plane" refers to a state observed in the third direction DR3.

[0049] According to an embodiment, the mask frame MF has a rectangular ring shape when viewed in the plane. In detail, the mask frame MF has a frame opening MF-OP formed therethrough. The frame opening MF-OP overlaps at least a portion of each of the masks MK.

[0050] According to embodiments, the mask frame FM comprises a metal. For example, the mask frame FM can comprise Invar having a relatively low coefficient of thermal expansion. The mask frame MF can comprise, for example, nickel (Ni), nickel-cobalt alloy, nickel-iron alloy, or the like. Since the mask frame MF comprises a metal, the mask frame MF will be sufficiently rigid.

[0051] According to embodiments, the mask MK is fixed to the mask frame MF. For example, the mask MK is arranged in the second direction DR2 and fixed to the mask frame MF.

[0052] Referring to Figure 2 , the mask MK according to embodiments extends in the first direction DR1. The mask MK comprises at least a first mask MP1 and a second mask MP2 arranged in the first direction DR1. According to embodiments, the first mask MP1 is in contact with the second mask MP2.

[0053] According to embodiments, the first mask MP1 comprises a first long side LS1 extending in the first direction DR1 and a first short side SS1 extending in the second direction DR2. The first mask MP1 comprises a first edge portion EG1, a first center portion CN1, and a first weld portion WL1 arranged in sequence in the first direction DR1. The first center portion CN1 extends from the first edge portion EG1 to meet the first weld portion WL1, and the first weld portion WL1 extends from the first center portion CN1.

[0054] According to embodiments, the first edge portion EG1, the first center portion CN1, and the first weld portion WL1 are arranged along the first long side LS1. One end of the first weld portion WL1 is the first short side SS1.

[0055] According to embodiments, the first center portion CN1 comprises a first open area OA1 (an opening OP is formed through the first open area OA1) and a first non-open area NOA1 adjacent to the first open area OA1. The first non-open area NOA1 surrounds the first open area OA1.

[0056] Figure 1 and Figure 2 Four first open areas OA1 in the first mask MP1 are shown, however, embodiments are not limited thereto. The number of first open areas OA1 in the first mask MP1 can be equal to or less than three, or greater than four.

[0057] In addition, according to embodiments, as Figure 2 shown, the openings OP are arranged in a matrix form in the first open area OA1, however, embodiments are not limited thereto. For example, no openings OP can be formed in some regions of the first open area OA1.

[0058] According to embodiments, each opening OP has a shape asFigure 2 The rectangular shape is shown, however, the embodiments are not limited thereto. The opening OP can have various shapes, such as a circular shape or a polygonal shape.

[0059] According to the embodiments, the opening OP extends through the first mask MP1. Alternatively, the opening OP can also be a recessed portion of the first mask MP1.

[0060] According to the embodiments, the second mask MP2 includes a second long side LS2 extending in the first direction DR1 and a second short side SS2 extending in the second direction DR2.

[0061] According to the embodiments, the second mask MP2 includes a second welding portion WL2, a second center portion CN2, and a second edge portion EG2 arranged in sequence in the first direction DR1. The second center portion CN2 extends from the second edge portion EG2 to meet the second welding portion WL2, and the second welding portion WL2 extends from the second center portion CN2.

[0062] According to the embodiments, the second welding portion WL2, the second center portion CN2, and the second edge portion EG2 are arranged along the second long side LS2. One end of the second welding portion WL2 is the second short side SS2.

[0063] According to the embodiments, the second center portion CN2 includes a second open area OA2 (the opening OP is formed through the second open area OA2) and a second non-open area NOA2 adjacent to the second open area OA2. The second non-open area NOA2 surrounds the second open area OA2.

[0064] Figure 1 And Figure 2 Four second open areas OA2 in the second mask MP2 are shown, however, the embodiments are not limited thereto. The number of the second open areas OA2 in the second mask MP2 can be equal to or less than three, or greater than four.

[0065] The description of the opening OP in the first open area OA1 also applies to the opening OP in the second open area OA2.

[0066] According to the embodiments, the first welding portion WL1 is in contact with the second welding portion WL2. For example, the first short side SS1 of the first welding portion WL1 is in contact with the second short side SS2 of the second welding portion WL2.

[0067] According to the embodiments, the first welding portion WL1 is connected to the second welding portion WL2 by welding. That is, the mask MK is obtained by welding the first welding portion WL1 to the second welding portion WL2.

[0068] The mask MK according to the embodiment includes the first mask MP1 and the second mask MP2 connected to the first mask MP1, and thus, one mask MK includes a plurality of open areas including the first open area OA1 and the second open area OA2. For example, the number of the first open areas OA1 in the mask MK can be at least twice the number of the first open areas OA1 in the first mask MP1 plus the number of the second open areas OA2.

[0069] According to the embodiment, each of the first open area OA1 and the second open area OA2 has a size substantially corresponding to the size of one display apparatus. The mask MK is fixed to the mask frame MF, and then, since the mask MK includes a plurality of open areas including the first open area OA1 and the second open area OA2, the mask MK is used to perform a deposition process on a plurality of display apparatuses at the same time.

[0070] According to the embodiment, the first edge portion EG1 and the second edge portion EG2 are held by a jig to fix the mask MK to the mask frame MF.

[0071] According to the embodiment, the first center portion CN1 and the second center portion CN2 are spaced apart from each other by the first welding portion WL1 and the second welding portion WL2. The first center portion CN1 and the second center portion CN2 are spaced apart from each other with the first welding portion WL1 and the second welding portion WL2 interposed therebetween. The first welding portion WL1 and the second welding portion WL2 can prevent a defect (such as a crease) generated in one of the first center portion CN1 and the second center portion CN2 from spreading to the other one of the first center portion CN1 and the second center portion CN2. Accordingly, in a process of manufacturing a display apparatus, a defect rate of the display apparatus can be reduced.

[0072] According to the embodiment, the mask MK includes a rectangular first mask MP1 including an edge portion EG1, a center portion CN1, and a welding portion WL1 arranged in sequence in a length direction DR1 of the first mask. The welding portion WL1 extends from the center portion CN1, one end of the welding portion WL1 is a short side SS1 of the mask MP1, and the short side SS1 of the first mask MP1 is in contact with a short side SS2 of a rectangular second mask MP2. The rectangular first mask MP1 further includes a long side LS1 substantially perpendicular to the short side SS1 of the first mask MP1, and the rectangular second mask MP2 includes a long side LS2 substantially perpendicular to the short side SS2 of the second mask MP2. The long side LS1 of the first mask MP1 is aligned with the long side LS2 of the second mask MP2.

[0073] Figure 3 is a flowchart of a manufacturing method S100 of a mask according to the embodiment.

[0074] The mask MK according to the embodiment can be manufactured by a mask manufacturing method S100 according to the embodiment. The mask manufacturing method S100 includes a preparation phase S10 of preparing the first mask MP1 and the second mask MP2, and a welding phase S20 of welding the first welding portion WL1 to the second welding portion WL2. The mask manufacturing method S100 according to the embodiment further includes an alignment phase S10-1 and a compensation phase S10-2 between the preparation phase S10 and the welding phase S20.

[0075] According to the embodiment, the alignment phase S10-1 aligns the first mask MP1 and the second mask MP2 between the preparation phase S10 and the welding phase S20.

[0076] Figures 4 to 12 A mask MK in a preparation phase according to an embodiment of the disclosure is illustrated.

[0077] Referring to Figure 4 , the first mask MP1 and the second mask MP2 are prepared in the preparation phase S10 according to the embodiment. Details of the first mask MP1 and the second mask MP2 described with reference to Figure 1 and Figure 2 are applicable to the first mask MP1 and the second mask MP2. For example, the first mask MP1 includes the first edge portion EG1, the first center portion CN1, and the first welding portion WL1 arranged in sequence in the first direction DR1. The second mask MP2 includes the second welding portion WL2, the second center portion CN2, and the second edge portion EG2 arranged in sequence in the first direction DR1.

[0078] According to the embodiment, in the preparation phase S10, the first mask MP1 and the second mask MP2 are arranged such that the first welding portion WL1 and the second welding portion WL2 face each other.

[0079] According to the embodiment, each of the first mask MP1 and the second mask MP2 is formed separately. In detail, each of the first mask MP1 and the second mask MP2 is formed separately through a photolithography process. For example, a mask sheet on which a photoresist is formed on upper and lower surfaces thereof is disposed on a roller. The roller is rotated to move a predetermined portion of the mask sheet, which needs to be exposed, to an exposure module. The exposure module includes a first exposure machine and a second exposure machine spaced apart from and facing the first exposure machine. An exposure process is performed on the predetermined portion of the mask sheet disposed between the first exposure machine and the second exposure machine. Then, an open region is formed through a development process. When a plurality of exposure machines is provided, a plurality of open regions can be formed through one mask. However, there is a limit to the number of exposure machines that can be disposed and used in the process, and thus there is a limit to the number of open regions that can be formed through one mask.

[0080] Referring to Figure 4 The first mask MP1 according to an embodiment includes a first through-hole H1 formed in the first welding portion WL1. In detail, the first through-hole H1 is formed adjacent to the first short side SS1 of the first welding portion WL1. The first through-hole H1 penetrates the first welding portion WL1.

[0081] The second mask MP2 according to an embodiment includes a second through-hole H2 formed in the second welding portion WL2. In detail, the second through-hole H2 is formed adjacent to the second short side SS2 of the second welding portion WL2. The second through-hole H2 penetrates the second welding portion WL2.

[0082] According to an embodiment, the first mask MP1 and the second mask MP2 are aligned with each other in the alignment phase S10-1 so that the first through-hole H1 overlaps the second through-hole H2. For example, the first center portion CN1 and the second center portion CN2 are arranged in the same direction (such as the first direction DR1), and the first welding portion WL1 is disposed on the second welding portion WL2. Alternatively, the first center portion CN1 and the second center portion CN2 are arranged in the same direction (such as the first direction DR1), and the second welding portion WL2 is disposed on the first welding portion WL1.

[0083] According to an embodiment, the mask MK is formed by welding the first welding portion WL1 and the second welding portion WL2 aligned in the alignment phase S10-1 in the welding phase S20.

[0084] However, the shapes of the first mask MP1 and the second mask MP2 are not limited thereto. In addition, various alignment methods can be used according to the shapes of the first mask MP1 and the second mask MP2.

[0085] Referring to Figure 5 According to an embodiment, each of the first mask MP1 and the second mask MP2 includes a half-etch portion. In detail, the first mask MP1 includes a first half-etch portion HF1 obtained by half-etching one end of the first welding portion WL1.

[0086] According to an embodiment, the second mask MP2 includes a second half-etch portion HF2 obtained by half-etching one end of the second welding portion WL2.

[0087] In an embodiment, the first half-etched portion HF1 is obtained by half-etching a lower portion of the first weld portion WL1. The second half-etched portion HF2 is obtained by half-etching an upper portion of the second weld portion WL2. The first half-etched portion HF1 and the second half-etched portion HF2 are obtained before the alignment phase S10-1. However, the embodiment is not limited thereto. According to another embodiment, the first half-etched portion HF1 is obtained by half-etching an upper portion of the first weld portion WL1, and the second half-etched portion HF2 is obtained by half-etching a lower portion of the second weld portion WL2.

[0088] According to the embodiment, in the alignment phase S10-1, the first mask MP1 and the second mask MP2 are aligned with each other so that the first half-etched portion HF1 overlaps the second half-etched portion HF2. In detail, the sum of the thickness of the first half-etched portion HF1 and the thickness of the second half-etched portion HF2 aligned with the first half-etched portion HF1 is substantially equal to the thickness of the first mask MP1. For example, the thickness of the first mask MP1 is equal to or less than about 50 µm, and can be equal to or less than about 40 µm. The thickness of the second mask MP2 is substantially equal to the thickness of the first mask MP1. In the present disclosure, the expression “substantially equal” means not only the case where the thicknesses of the components are equal to each other, but also the case where the thicknesses of the components are substantially equal to each other, taking into account manufacturing errors that can normally occur in a process.

[0089] Referring to Figure 6 According to the embodiment, one end of each of the first mask MP1 and the second mask MP2 can have an oscillating shape, such as a square wave, in a plane. In detail, the first mask MP1 includes the first weld portion WL1, and one end of the first weld portion WL1 has a first relief portion ZG1 having a square wave shape.

[0090] According to the embodiment, the second mask MP2 includes the second weld portion WL2, and one end of the second weld portion WL2 has a second relief portion ZG2 having an oscillating shape. The shape of the second relief portion ZG2 is complementary to the shape of the first relief portion ZG1, so that a convex portion of the first relief portion ZG1 fits into a concave portion of the second relief portion ZG2, and vice versa. Although Figure 6 The first relief portion ZG1 and the second relief portion ZG2 are illustrated as having a square wave shape, but the embodiment is not limited thereto, and the first relief portion ZG1 and the second relief portion ZG2 can have other shapes, such as a triangular wave shape or a sine shape.

[0091] According to the embodiment, in the alignment phase S10-1, the first mask MP1 is aligned with the second mask MP2 so that the first relief portion ZG1 engages the second relief portion ZG2. As Figure 6As shown, a plurality of first and second concave-convex portions ZG1 and ZG2 are provided. In the alignment phase S10-1, the convex portion of the first concave-convex portion ZG1 is inserted into the concave portion of the second concave-convex portion ZG2. Similarly, the convex portion of the second concave-convex portion ZG2 is inserted into the concave portion of the first concave-convex portion ZG1.

[0092] According to an embodiment, when the first mask MP1 is aligned with the second mask MP2, the first concave-convex portion ZG1 of the first mask MP1 and the second concave-convex portion ZG2 of the second mask MP2 are disposed on the same plane.

[0093] Referring to Figure 7 , according to an embodiment, the first mask MP1 includes first perforations H1 formed in the first concave-convex portion ZG1. A plurality of first perforations H1 are provided. In detail, the first perforations H1 are formed in both edges of the first concave-convex portion ZG1.

[0094] According to an embodiment, the second mask MP2 includes second perforations H2 formed in the second concave-convex portion ZG2. A plurality of second perforations H2 are provided. In detail, the second perforations H2 are formed in both edges of the second concave-convex portion ZG2.

[0095] According to an embodiment, in the alignment phase S10-1, the first mask MP1 is aligned with the second mask MP2 such that the first concave-convex portion ZG1 is engaged with the second concave-convex portion ZG2. In the alignment phase S10-1, the edge of the first concave-convex portion ZG1 is disposed on the edge of the second concave-convex portion ZG2. According to another embodiment, the edge of the first concave-convex portion ZG1 is disposed under the edge of the second concave-convex portion ZG2. That is, the first mask MP1 is aligned with the second mask MP2 such that the first perforations H1 and the second perforations H2 overlap each other.

[0096] In an embodiment, the first mask MP1 and the second mask MP2 respectively include the first and second concave-convex portions ZG1 and ZG2, and respectively include the first and second perforations H1 and H2, and thereby the alignment error can be reduced.

[0097] Referring to Figure 8 , according to an embodiment, one end of each of the first and second masks MP1 and MP2 includes an inclined surface. In detail, the first mask MP1 includes a first inclined surface IN1 in one end of the first welding portion WL1.

[0098] According to an embodiment, the second mask MP2 includes a second inclined surface IN2 in one end of the second welding portion WL2. The first and second inclined surfaces IN1 and IN2 are substantially parallel to each other to enable the end of the first welding portion WL1 to overlap the end of the second welding portion WL2.

[0099] According to an embodiment, in the aligning phase S10-1, the entire surface of the first inclined surface IN1 is brought into contact with the entire surface of the second inclined surface IN2. When the second mask MP2 is aligned with the first mask MP1, the first inclined surface IN1 of the first mask MP1 overlaps the second inclined surface IN2 of the second mask MP2. In detail, after the first mask MP1 and the second mask MP2 are aligned, the first inclined surface IN1 is disposed under the second inclined surface IN2.

[0100] Referring to Figure 9 , according to an embodiment, one end of each of the first mask MP1 and the second mask MP2 has a stepped shape. In detail, the first mask MP1 includes a first stepped portion ST1 in which one end of the first weld portion WL1 has a step. The step in the first stepped portion ST1 is formed on an upper surface of the first mask MP1. The second mask MP2 includes a second stepped portion ST2 in which one end of the second weld portion WL2 has a step. The step in the second stepped portion ST2 is formed on a lower surface of the second mask MP2. The step in the second stepped portion ST2 of the second mask MP2 is fitted over the step of the first stepped portion ST1 of the first mask MP1.

[0101] The first stepped portion ST1 and the second stepped portion ST2 are modified embodiments of the first half-etched portion HF1 and the second half-etched portion HF2 described with reference to Figure 5 As shown in Figure 9 , the half-etching process can be applied in various ways, and thus, a plurality of steps can be formed in the first weld portion WL1 and the second weld portion WL2.

[0102] According to an embodiment, in the aligning phase S10-1, the first stepped portion ST1 is engaged with the second stepped portion ST2. In detail, the first stepped portion ST1 is disposed under the second stepped portion ST2.

[0103] Referring to Figure 10 , according to an embodiment, one end of each of the first mask MP1 and the second mask MP2 includes a curved surface. In detail, the first mask MP1 includes a first weld portion WL1, one end of which has a first wave-shaped portion WV1 having a wave shape. The wave shape in the first wave-shaped portion WV1 is formed on an upper surface of the first mask MP1. The second mask MP2 includes a second weld portion WL2, one end of which has a second wave-shaped portion WV2 having a wave shape. The wave shape in the second wave-shaped portion WV2 is formed on a lower surface of the second mask MP2. The wave shape in the second wave-shaped portion WV2 of the second mask MP2 is fitted over the wave shape of the first wave-shaped portion WV1 of the first mask MP1.

[0104] According to an embodiment, in the alignment stage S10-1, the first waveform portion WV1 is joined with the second waveform portion WV2. Specifically, the first waveform portion WV1 is positioned below the second waveform portion WV2.

[0105] Reference Figure 11 According to an embodiment, each of the first mask MP1 and the second mask MP2 includes a curved surface at one end. Specifically, the first mask MP1 includes a first welding portion WL1, one end of which has a third waveform portion WV3. The waveform in the third waveform portion WV3 is formed on the upper surface of the first mask MP1. The second mask MP2 includes a second welding portion WL2, one end of which has a fourth waveform portion WV4. The waveform in the fourth waveform portion WV4 is formed on the lower surface of the second mask MP2. The waveform in the fourth waveform portion WV4 of the second mask MP2 is fitted over the waveform of the third waveform portion WV3 of the first mask MP1.

[0106] The third waveform section WV3 and the fourth waveform section WV4 are references. Figure 10 Modified embodiments of the first waveform portion WV1 and the second waveform portion WV2 described. For example... Figure 11 As shown, the curved surfaces at one end of the first welded portion WL1 and the second welded portion WL2 can have various shapes.

[0107] According to the embodiment, in the alignment stage S10-1, the third waveform portion WV3 is joined with the fourth waveform portion WV4. Specifically, the third waveform portion WV3 is positioned below the fourth waveform portion WV4.

[0108] Reference Figure 12 According to an embodiment, each of the first mask MP1 and the second mask MP2 includes an alignment mark. Specifically, the first mask MP1 includes a first alignment mark AM1 disposed on the upper surface of the first weld portion WL1. The first alignment mark AM1 contacts the first short side SS1.

[0109] According to an embodiment, the second mask MP2 includes a second alignment mark AM2 disposed on the upper surface of the second weld portion WL2. The second alignment mark AM2 contacts the second short side SS2.

[0110] According to an embodiment, each of the first alignment mark AM1 and the second alignment mark AM2 is respectively disposed on the upper surface of the first weld portion WL1 and the second weld portion WL2. The upper surfaces of the first weld portion WL1 and the second weld portion WL2 face the third direction DR3. The rear surfaces of the first weld portion WL1 and the second weld portion WL2 may face a direction opposite to the third direction DR3.

[0111] The first alignment mark AM1 and the second alignment mark AM2 can be components added to the upper surfaces of the first welding portion WL1 and the second welding portion WL2, or recesses formed in the upper surfaces that are recessed in a direction opposite to the third direction DR3.

[0112] According to an embodiment, in the alignment phase S10-1, the first short side SS1 is aligned with the second short side SS2 such that the first alignment mark AM1 contacts the second alignment mark AM2.

[0113] formed at one end of the first welding portion WL1 and referring to Figures 4 to 12 The first perforation H1, the first half-etching portion HF1, the first concave-convex portion ZG1, the first inclined surface IN1, the first step portion ST1, the first wave portion WV1, the third wave portion WV3, and the first alignment mark AM1 described above can be referred to as a first pattern. The second perforation H2, the second half-etching portion HF2, the second concave-convex portion ZG2, the second inclined surface IN2, the second step portion ST2, the second wave portion WV2, the fourth wave portion WV4, and the second alignment mark AM2 described above can be referred to as a second pattern. However, the first pattern and the second pattern can have various other shapes, without being limited to those shapes shown in Figures 4 to 12 Figures 4 to 12

[0114] Figure 13 is a perspective view of a process of a mask manufacturing method S100 according to an embodiment of the disclosure. Figure 13 An example of the alignment phase S10-1 is shown, and the alignment of the first mask MP1 and the second mask MP2 shown in Figure 12

[0115] According to an embodiment, when the first mask MP1 and the second mask MP2 are aligned with each other, the first short side SS1 contacts the second short side SS2, and the first alignment mark AM1 contacts the second alignment mark AM2. In addition, the first long side LS1 is aligned with the second long side LS2 in the first direction DR1.

[0116] According to an embodiment, the first welding portion WL1 and the second welding portion WL2 of the first mask MP1 and the second mask MP2 that are aligned with each other can be welded, respectively, to form a mask MK.

[0117] Figure 14 A process of a mask manufacturing method S100 according to an embodiment of the disclosure is shown. Figure 14 An example of the alignment phase S10-1 is shown, and the alignment of the first mask MP1 and the second mask MP2 that are aligned with each other is shown in detail. Figure 6 ​​​​

[0118] According to embodiments, the first relief portion ZG1 of the first mask MP1 is joined with the second relief portion ZG2 of the second mask MP2.

[0119] According to embodiments, the first relief portion ZG1 and the second relief portion ZG2 are arranged on the same plane when aligned with each other. The first mask MP1 and the second mask MP2 are arranged on the same plane.

[0120] The mask manufacturing method S100 according to embodiments further comprises a compensation phase S10-2 after the alignment phase S10-1, in which the metal thin film MP is arranged on the first mask MP1 and the second mask MP2. In detail, the mask manufacturing method S100 according to embodiments comprises the preparation phase S10, the alignment phase S10-1, the compensation phase S10-2 and the welding phase S20.

[0121] According to embodiments, in the compensation phase S10-2, the metal thin film MP is arranged on the first welding portion WL1 and the second welding portion WL2. For example, the metal thin film MP can comprise Invar.

[0122] In the welding phase S20, according to embodiments, the first welding portion WL1 of the first mask MP1 and the second welding portion WL2 of the second mask MP2 are welded to each other.

[0123] When the mask manufacturing method S100 according to embodiments comprises the compensation phase S10-2, in the welding phase S20, the first welding portion WL1, the second welding portion WL2 and the metal thin film MP are welded.

[0124] Since the mask manufacturing method S100 according to embodiments comprises the compensation phase S10-2, although a gap can be generated between the first relief portion ZG1 and the second relief portion ZG2 in the alignment phase S10-1, this gap is closed in the welding phase S20 when the first welding portion WL1, the second welding portion WL2 and the metal thin film MP are welded to each other.

[0125] Even if the first relief portion ZG1 and the second relief portion ZG2 can not be perfectly joined with each other due to process errors in the alignment phase S10-1, the joining errors between the first relief portion ZG1 and the second relief portion ZG2 are compensated in the compensation phase S10-2. The mask manufacturing method S100 according to embodiments comprises the compensation phase S10-2 and, by virtue of this, can reduce defects of the mask MK caused by welding.

[0126] Figure 14 It is shown that in Figure 6The embodiment of the compensation phase S10-2 is performed on the first mask MP1 and the second mask MP2 as illustrated in FIGS. 10-1, 10-2, 10-3, and 10-4, however, the embodiment is not limited thereto. The compensation phase S10-2 can be additionally performed on the first mask MP1 and the second mask MP2 as illustrated in FIGS. 10-1, 10-2, 10-3, and 10-4 after the alignment phase S10-1, as needed. Figure 4 Figure 5 Figures 7 to 11 The compensation phase S10-2 is additionally performed on the first mask MP1 and the second mask MP2 as illustrated in FIGS. 10-1, 10-2, 10-3, and 10-4.

[0127] Figure 15 A display device manufacturing process using a mask MK according to an embodiment of the disclosure is illustrated. Hereinafter, a process of depositing an organic light emitting element on a substrate SUB of a display device using the mask MK described above will be described.

[0128] Referring to Figure 15 , according to an embodiment, a deposition apparatus ED includes a chamber CHB, a deposition source S, a stage ST, a driving plate PP, and a mask assembly MA.

[0129] According to an embodiment, the deposition source S, the stage ST, the driving plate PP, and the mask assembly MA are disposed in the chamber CHB. The chamber CHB provides a defined space. The chamber CHB includes at least one gate GT. The chamber CHB can be opened and closed through the gate GT. The mask assembly MA and the substrate SUB can be loaded into or unloaded from the chamber CHB through the gate GT in the chamber CHB. The substrate SUB is a base substrate on which a deposition material is deposited in a display device.

[0130] According to an embodiment, the deposition source S is disposed on a lower side of the chamber CHB. The deposition source S includes a deposition material. The deposition material can be sublimed or evaporated, and includes at least one of an inorganic material, a metallic material, and an organic material. The deposition source S according to the present embodiment will be described with reference to an organic material used for manufacturing an organic light emitting device.

[0131] According to an embodiment, the stage ST is disposed above the deposition source S. The mask assembly MA is disposed on the stage ST. The mask assembly MA faces the deposition source S. The stage ST overlaps the mask frame MF in a plane and supports the mask assembly MA. The stage ST is located outside of a path through which the deposition material is deposited from the deposition source S onto the substrate SUB.

[0132] According to an embodiment, the substrate SUB is disposed on the mask assembly MA. The driving plate PP is disposed on the substrate SUB. The driving plate PP aligns the substrate SUB with the mask assembly MA.

[0133] According to an embodiment, the deposition material is deposited onto the substrate SUB through the openings OP (refer to Figure 2 ) of the mask MK. Accordingly, the organic light emitting element can be deposited onto the substrate SUB using the mask assembly MA.

[0134] ​​According to the mask manufacturing method of the embodiment, the mask MK through which a plurality of open areas including the first open area OA1 and the second open area OA2 are formed is obtained by welding the first mask MP1 and the second mask MP2 (refer to Figure 2 ). The plurality of organic light emitting elements are deposited on the substrate SUB using the mask MK according to the embodiment, and the efficiency of the manufacturing process of the display apparatus can be improved.

[0135] Although the embodiments of the disclosure have been described, it is understood that the embodiments of the disclosure should not be limited to these embodiments, but various changes and modifications can be made by those of ordinary skill in the art within the spirit and scope of the embodiments of the disclosure as claimed in the appended claims.

[0136] Therefore, the disclosed subject matter should not be limited to any single embodiment described herein, but rather the scope of embodiments of the inventive concept should be according to the appended claims.

Claims

1.A mask comprising: a first mask including a first long side extending in a first direction and a first short side extending in a second direction crossing the first direction, wherein the first mask includes a first edge portion, a first center portion, and a first weld portion sequentially arranged in the first direction; and a second mask including a second long side extending in the first direction and a second short side extending in the second direction, wherein the second mask includes a second weld portion, a second center portion, and a second edge portion sequentially arranged in the first direction, wherein the first weld portion is in contact with the second weld portion; wherein the first mask further includes a first perforation formed through the first weld portion, the second mask further includes a second perforation formed through the second weld portion, wherein the first perforation and the second perforation overlap each other. 2.The mask of claim 1, wherein the first weld portion extends from the first center portion, one end of the first weld portion is the first short side, the second weld portion extends from the second center portion, and one end of the second weld portion is the second short side. 3.The mask of claim 1, wherein the first short side of the first mask is in contact with the second short side of the second mask. 4.The mask of claim 1, wherein the first long side is aligned with the second long side in the first direction. 5.The mask of claim 1, wherein each of the first perforation and the second perforation is provided as a plurality. 6.The mask of claim 1, wherein the first mask further includes a first alignment mark disposed on an upper surface of the first weld portion, the second mask further includes a second alignment mark disposed on an upper surface of the second weld portion, wherein the first alignment mark is in contact with the second alignment mark. 7.The mask of claim 1, wherein the first weld portion includes a first half-etch portion, and the second weld portion includes a second half-etch portion. 8.The mask of claim 1, wherein each of the first weld portion and the second weld portion includes one of an inclined surface and a step. 9.The mask of claim 1, wherein the first weld portion includes a first relief portion having an oscillating shape in a plane, the second weld portion includes a second relief portion having an oscillating shape in a plane, and the first relief portion is engaged with the second relief portion.

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