Mobile workpiece carrier for holding the workpieces to be processed

Abstract

A workpiece carrier to be installed in a vacuum chamber of a vacuum processing system, comprising: X Turntable X; one or more with diameter d Ym <d X Turntable Y m , which can be mounted on a turntable X; one or more Zn ≤d Ym Workpiece support Z n , which can be mounted on the one or more turntables Y m Top; Two actuators A1 and A2.

Description

Technical Field

[0001] In the context of the present invention, the term "platform" is used to describe a workpiece carrier. The term "merging platform" is used to describe a workpiece carrier, which is here implemented in the form of a turntable system.

[0002] The present invention relates to a merging platform for processing workpieces in an evacuable processing chamber, in particular a coating chamber for physical vapor deposition (PVD), such as for example a coating chamber used for, for example, cathode arc or magnetron sputtering processes. The merging platform of the present invention allows, for example, different pretreatment, coating and reprocessing steps to be performed on a batch of workpieces in one vacuum chamber by moving the workpieces from one processing step to another. This provides a high degree of flexibility with respect to the batch size to be processed, the pretreatment and reprocessing and coating steps and also allows the processing of workpieces of various shapes and sizes. The platform of the present invention is particularly suitable for coating machines of newly developed types, such as coating machines that allow, within the same system, the processing and coating of different numbers of workpieces distributed in smaller or larger batches of workpieces. Background Art

[0003] Know from the prior art that before and / or after vacuum coating, adopt pre-treatment or post-treatment step for various vacuum treatment processes, for example heating step and / or cleaning step.These steps are necessary, for example, in order to ensure that the deposited coating is well adhered to the substrate.The pre-treatment step that ensures good adhesion is especially important for the wear-resistant hard coating on tools such as drill bits, milling cutters, forming tools and parts that bear mechanical loads, for example gears, injection molds, camshafts, and for the fast movement and heavy-duty parts that bear high mechanical abrasion loads at work.Therefore, the outstanding adhesion of coating to substrate surface is a prerequisite for economy and durability.The main purpose of these pre-treatment processes is to prepare the workpiece to obtain the good adhesion of subsequent coating to substrate.The proven pre-treatment method of enhancing the adhesion of coating to substrate comprises electron bombardment heating as known from DE3330144, sputter etching of rare gas ions as described in DE2833876, and etching workpiece by reactive chemical etching.

[0004] To achieve the most uniform and consistent coating thickness and quality distribution, it is crucial to control the movement of the workpiece past the treatment and etching sources. The parts to be pre-treated, coated, and / or post-treated are typically secured to separate workpiece supports, symmetrically arranged around the system axis, or rotatably mounted on a turntable-like workpiece support. Known industrial systems typically utilize a workpiece support or turntable-like workpiece support that is rotatably coupled to a vacuum chamber, typically the bottom portion of the chamber.

[0005] In Swiss patent applications 2278 / 97 and 1736 / 98, which were not previously published on September 25, 1997 and August 25, 1998, respectively, a planetary system workpiece holder is described. A first system is provided, which can be connected to a device-side drive mechanism and can rotate around an axis related to the device. The first rotating system is hereinafter referred to as the central system. With respect to the central system, a second rotating system is provided on the latter, whose axis of rotation is offset parallel to the axis of rotation of the central system, hereinafter referred to as the planetary system, whose movement is generated by a detachable connection on the reference system formed by the installation of the chamber. In the planetary system, a third rotating system is provided, hereinafter referred to as the satellite system, which is rotatably supported in a manner such that the axis of rotation is parallel to the planetary system and the central system.

[0006] This type of workpiece support with triple rotational motion is particularly useful for relatively small workpieces, guiding them past a stationary processing source, such as a coating source, on the machine, and ensuring uniform treatment of the workpiece from all sides. In this workpiece support configuration, the satellite system is intermittently set in rotational motion. This results in partially unstable, overlapping movements of the workpiece, which in turn has adverse consequences for the uniformity of the workpiece treatment. Intermittent rotation is particularly disadvantageous for coating systems produced from several thin layers, resulting in reduced coating quality.

[0007] Zaech and Kurz disclose an improvement of the above-mentioned workpiece support in US6620254 / EP1153155B1. Thus, the drive connection between the central system and the satellite system is established in such a way that it is uninterrupted, enabling a continuous rotational movement of the satellite system. The drive connection is preferably implemented in the form of a forced drive connection. The central system is connected to the device-side drive mechanism. At least one planetary system supported on the central system can rotate around the planetary axis and is equipped with a drive clutch associated with the device. At least one satellite system is supported on the planetary system and can rotate around the satellite axis when drive-connected to the central system. A receptacle for at least one workpiece is provided on the satellite system. This drive connection is established between the central system and the satellite system in an uninterrupted manner at least during operation of the device.

[0008] Esser and Zaech disclose in EP 2 048 263 B1 a workpiece carrier with a simplified design that provides the possibility of changing the gear ratio in a simple manner. The main advantages of the disclosed workpiece carrier are the simple actuation mechanism and the ability to simultaneously change the gear ratio. The chassis is rotatable about a main axis and is powered by an electric motor. Actuation is not accomplished using a central actuator. Instead, a torsion-proof gear is fixed to a pivot mount, and another gear is mounted on the periphery of the turntable. Two rack gears mesh with each other. The electric motor provides power to the gears on the periphery of the turntable, which in turn causes the workpiece carrier to rotate. The workpiece holder is connected to the central shaft via the rack gear, which causes the workpiece holder to rotate. This design provides continuous rotation of the workpiece, which is particularly important for depositing thin multilayer coatings. The gear ratio can be adjusted by changing the size or number of teeth on the gears.

[0009] Another option is to use a vacuum handling system with a workpiece support, where the workpiece support is a turntable. Systems of this type typically employ a turntable that can be completely removed from the vacuum chamber to simplify loading and unloading the workpiece support. Removal of such a turntable can be accomplished, for example, using a forklift.

[0010] In another approach, the turntable is mounted on a wheeled chassis. It can then be transported to the vacuum processing system and inserted into the vacuum chamber by pushing the turntable into the chamber. This type of workpiece holder is called a turntable slide. Once the turntable slide is in its final position in the chamber, the chassis is locked and the central actuator is engaged to the turntable shaft. The disadvantage of this design is that the required coupling mechanism is complex, because the actuator cannot interfere with the turntable slide during the slide's insertion, but at the same time the coupling mechanism must be connected to the turntable's central axis to actuate the turntable. The entire mechanical structure must be built in such a way that it can withstand the extreme conditions that occur during operation, for example it must be able to operate under vacuum conditions.

[0011] Gwehenberger discloses a vacuum processing system with a workpiece holder in EP2758562B1, wherein the workpiece holder is implemented in the form of a turntable so that it allows the workpiece to be processed in front of the processing source to be bypassed by rotating the turntable around its axis. The workpiece can be mounted on the turntable in such a way that it allows one, two or more turns. The turntable is powered by a peripheral actuator. The actuator is located at or near the side wall of the vacuum chamber opposite to the opening through which the turntable can be inserted. The actuator is connected to a rack gear installed within the periphery of the turntable, which meshes with another rack gear installed on the outer side of the turntable. Multiple workpiece holders can be mounted on the turntable, and each workpiece holder has a rack gear installed on its outer side to allow the workpiece holder to rotate. The turntable is preferably implemented in the form of a turntable slide to simplify the loading and unloading process. Preferably, a track is installed in the vacuum chamber to simplify the insertion process of the turntable slide.

[0012] The number of workpieces to be processed and / or coated using PVD depends on specific customer requirements. The coating chamber, equipped with a workpiece holder, is designed to accommodate a specific number of workpieces of a specific size and shape. The workpiece batch size and shape dictate the diameter and height of the coating chamber. More specifically, one type of equipment used today primarily employs coating chambers that exhibit a uniform diameter and are scalable in height to provide varying loading capacities. The workpiece holder is therefore designed to meet the requirements of the vacuum chamber, particularly its height and diameter.

[0013] Issues to be resolved

[0014] The diversity of workpiece sizes and shapes as well as the number of workpieces to be processed and coated depends primarily on customer requirements. Small coating booths are used to process and coat small batches of workpieces.

[0015] Large coating rooms are necessary to process and coat large batches of workpieces. Currently, loading different loads into a single large machine is not economically viable because the cost of goods sold (COGS) write-off negatively impacts the total cost of ownership (TCO) when loading a large machine with only small batches. Utilization rates depend on the number of workpieces, which is why COGS must be adjusted for smaller loads.

[0016] The demand for various chamber designs for providing equipment with different loading capacities results in a huge loss of time and effort in investing in various chamber designs. In addition to the high cost of redesigning chambers for each machine in the equipment system, coating research and development must be adjusted for each machine due to different heights, target quantities, and other reasons. Transferring a specific coating from one machine to another machine with different sizes is challenging and time-consuming. In addition, the realization of various equipment products is time-consuming because various products cannot all be realized at the same time. This in turn leads to increased costs. This leads to increased research and development costs. Summary of the Invention

[0017] The present invention aims to provide a platform for processing workpieces within a vacuum system, which allows the vacuum chamber of the vacuum system to be loaded with different workpiece batches, thereby overcoming the problems currently associated with prior art vacuum systems. In particular, the present invention aims to provide a solution that overcomes the problems of prior art PVD coating machines. The primary objective is to reduce COGS to achieve a lower depreciation rate for the vacuum system's total cost of ownership (TCO), while providing a high degree of flexibility to accommodate different workpiece processing methods.

[0018] Solution to the Problem According to the Invention - Description of the Invention

[0019] These objectives are achieved by the present invention, which includes a merging platform installed within an evacuable chamber of a vacuum system, capable of being used for various processing operations on different batches of workpieces while operating in an economically viable manner. The merging platform comprises at least two turntables having different diameters, wherein at least one turntable exhibiting a smaller diameter is rotatably mounted on a turntable exhibiting a larger diameter. Instead of installing only one turntable exhibiting a smaller diameter, multiple such turntables may be mounted to a single turntable exhibiting a larger diameter.

[0020] The design of the inventive merging platform offers a wide range of applications, allowing for, for example, a high degree of flexibility in workpiece length and loading capacity, as well as the opportunity to apply various pretreatments, coatings, and post-treatments to the workpieces all within the same chamber. Among other advantages, this offers time savings for pretreatment and cooling. Thus, compared to prior art systems, the platform allows for a positive impact on TCO, resulting in a reduction in production expenses. Furthermore, it offers greater flexibility regarding the number of substrates to be coated within the machine's chamber, among numerous other advantages compared to prior art solutions.

[0021] In a first aspect of the present invention, a workpiece carrier for holding a processable workpiece to be mounted in a vacuum chamber of a vacuum processing system is disclosed, comprising a workpiece carrier having a diameter (d X ) of a turntable (X), one or more rotatable devices having a diameter (dYm <d X ) of the turntable (Y m ), can be installed on one or more turntables (Y m ) on one or more having a diameter (d Zn ≤d Ym ) of the workpiece support (Z n ), a first actuator (A1) and a second actuator (A2), wherein the actuators (A1), (A2) and the turntable (X), (Y m ) is mounted by means of a transmission mechanism which allows at least two operating modes of the system, wherein in mode 1 the actuator (A1) is powered and the actuator (A2) is not powered, so that the turntable (X) rotates about its central axis (R x ) rotates, in mode 2 the actuator (A1) is not powered and the actuator (A2) is powered, so that the turntable (Y m ) around its central axis of rotation (R Ym ) rotates, while the turntable (X) remains stationary. It should be understood that the workpiece carrier device of the present invention is not limited to use under vacuum conditions, and can also be used in coating systems under atmospheric pressure or high pressure.

[0022] In another example of the first aspect, the turntable (X) of the workpiece carrier device according to the present invention is substantially circular, so the surface area of the turntable (X) is determined by A X =π×(d X / 2) 2 Definition. The essentially circular design of the turntable (X) ensures in particular the exact positioning of the processing devices arranged on the outer side of the turntable (X). One or more turntables (Y m ) and / or one or more workpiece supports (Z n ) On the other hand, it can also be preferably triangular or square in the case of flexible manufacturing process, such as rectangular, square, trapezoidal, or even pentagonal, hexagonal, partially or completely oval, etc. n ) and Z n The preferred option is A z ≤A y x .

[0023] In another example of the first aspect, the central turntable (X) and the at least one turntable (Y) of the workpiece carrier device according to the present invention are m ) are connected through the third transmission mechanism, so that when the workpiece carrying device works according to mode 1, the at least one turntable (Y m ​) is in rotational motion. Such a design allows, in particular, even more flexible processing of individual workpieces.

[0024] In another example of the first aspect, the first actuator (A1) of the workpiece carrier device according to the present invention is coupled to the central turntable (X) via a first transmission mechanism, and the second actuator (A2) is coupled to the at least one peripheral turntable (Y) via a second transmission mechanism. m ). Such a design allows, in particular, precisely controllable machining of individual workpieces.

[0025] In another example of the first aspect, the first actuator (A1) and / or the second actuator (A2) of the workpiece carrier according to the invention are designed as electromechanical actuators, wherein a rotation about the axis (R x ) and / or (R Ym The use of mechanical or electromechanical actuators can minimize the design effort required to allow targeted control over the positioning of the workpiece within the workpiece carrier relative to, for example, a magnetic control system.

[0026] In another example of the first aspect, the workpiece carrier according to the invention can be used at pressures below 1 mbar, preferably below 0.1 mbar, and in particular below 0.001 mbar. Such a design particularly allows for use in vacuum applications such as for PVD coating processes.

[0027] In order to ensure a precise and easily controlled coating of the substrate arranged in the workpiece carrier, the invention provides in another embodiment of the first aspect that the turntable (X) and / or one or more turntables (Y) m ) and / or one or more workpiece supports (Z n ) is essentially planar. Within the scope of the present invention, planar is understood to mean in particular a surface which has a difference from the average outer surface of less than 5%, preferably less than 2%, particularly preferably less than 1% of the total thickness of the corresponding turntable.

[0028] Within the scope of a space-saving and compact arrangement, the invention also provides in a further example of the first aspect that one or more turntables (Y m ) is completely arranged in the area of the first turntable (X) and / or one or more workpiece supports (Z n ) is completely arranged on one or more turntables (Y m ) in the area, wherein the turntable (Y m ) is preferably installed around the turntable (X) so that the turntable (Y m) and (X) overlap when viewed from above. It will be appreciated that arrangement within the region of the corresponding turntable preferably also means arrangement within an enlarged region, for example, at a distance from the surface of the corresponding turntable in a direction relative to the corresponding rotation axis (a direction not perpendicular to the corresponding rotation axis).

[0029] Within the scope of a space-saving and compact arrangement, in a further embodiment of the first aspect, the invention further provides that the first (A1) and / or second actuator (A2) is arranged below the turntable (X), opposite the workpiece arrangement area. Within the scope of such an arrangement, the actuator can, for example, be arranged on the bottom of a vacuum chamber into which the workpiece carrier according to the invention can be inserted.

[0030] In order to ensure a precise and easily controlled coating of the substrate arranged in the workpiece carrier, the invention provides, in a further example of the first aspect, in particular that the axis of rotation (R x ) and (R Ym ) are aligned parallel to each other.

[0031] In order to ensure accurate and controllable coating of the substrate arranged in the workpiece carrier, in another example of the first aspect, the invention provides in particular that the turntable (X), (Y m ) and (Z n ) are aligned parallel to each other and preferably perpendicular to the axis of rotation (R x ) and (R Ym ) are aligned.

[0032] In another example of the first aspect, which allows for particularly flexible positioning of the workpiece, the turntable (X) and the one or more turntables (Y m ) can rotate around its axis (R X ,R Ym ) is rotated clockwise or counterclockwise, where the rotation angle Can be set to any value.

[0033] With regard to a compact and space-saving arrangement which at the same time provides sufficient space for the arrangement of the workpieces to be processed, in another example of the first aspect, one or more turntables (Y m ) shows the diameter d Ym , preferably 10%d X ≤d Ym ≤50%d X , most preferably d Ym =50%d X and / or workpiece support (Z n ) is 10% of the diameter of Ym ≤d Zn ≤50%d Ym .

[0034] In another embodiment of the first aspect, the turntable (X) is constructed in the form of a turntable slide, wherein the turntable (X) is mounted on a wheeled chassis. Such a design allows, in particular, easy transport of the workpiece carrier and easy introduction into the vacuum processing system, whereby the turntable can be inserted into the vacuum chamber.

[0035] In another example of the first aspect which allows for reliable spatial separation of the workpieces, the wall is arranged on a turntable (Y m ) next to or multiple turntables (Y m ) between which the walls are mounted vertically on a turntable (Y m ) next to or multiple turntables (Y m ), preferably at approximately right angles above the turntable X, wherein the wall exhibits a height and width sufficient in particular to completely accommodate a turntable (Y m ) is separated from adjacent segments.

[0036] In a second aspect of the present invention, a surface treatment system for treating workpieces is disclosed, comprising the aforementioned workpiece carrier for carrying the workpieces during the treatment process, a chamber, in particular in the form of a vacuum chamber, for introducing the workpiece carrier, and at least one treatment device for treating the workpieces arranged in the workpiece carrier. The surface treatment system according to the invention thus has the same advantages as those already described with respect to the workpiece carrier according to the invention.

[0037] In another example of the second aspect, within the scope of the structural simplicity and reliable fixation of the workpiece carrier, the workpiece carrier of the surface treatment system is arranged at the wall or bottom of the chamber, preferably connected to the chamber via actuators (A1) and (A2), and the actuators are detachably fixed to the wall or bottom of the chamber. The detachable fixation can be achieved, for example, by a magnetic seat, a threaded connection, a plug connection, etc.

[0038] In order to ensure uniform and high-quality workpiece processing, in another example of the second aspect, a workpiece carrier of the surface treatment system is arranged in the center of the chamber of the treatment system, wherein one or more processing devices for processing the workpieces are arranged around the workpiece carrier. The processing device or devices are preferably fixed to the chamber wall and are advantageously arranged symmetrically around the workpiece carrier, which is centrally arranged in the surface treatment system according to the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0039]

[0040] DETAILED DESCRIPTION

[0041] The present invention discloses a merging platform that provides a high degree of flexibility with respect to loading capacity and also processing methods, thereby resulting in a reduced TCO. The merging platform is equipped with a X = 100% of the turntable (X), which is powered by the actuator (A1) and can be turned clockwise or counterclockwise to either side. Can be set to any value. Displays the diameter d Ym <d X One or more turntables (Y m ) is installed on the turntable (X). The turntable (Y) installed on the turntable (X) m ) will be referred to as m. One or more turntables (Y m ) can rotate around its m axis (R Ym ) is rotated clockwise or counterclockwise. m ) is rotated by using a forced connection to m ) is connected to an independent actuator (A2) to generate. Each turntable (Y m ) can be equipped with a number n of workpiece supports Z n The workpiece support is rotatably mounted on the turntable (Y m ) and can rotate around its axis (R Zp ) is rotated, where 1≤p≤n. The workpiece support (Z n ) shows the diameter d Zn ≤d Ym The workpiece support is forced to rotate using a forced connection.

[0042] Embodiments of the present invention will be described by way of example, which are intended to be illustrative only and therefore non-limiting.

[0043] The figures mentioned in this document are not strictly to scale and are therefore non-limiting. For example, the size or number of the turntables could also be chosen to be different.

[0044] According to one embodiment of the present invention Figure 1 In the aspect shown, m turntables (Y m ) are dispersedly mounted on a turntable (X). Figure 1 In the example shown, m is selected as m=8, but it can also be selected as a different number. The turntable (X) can be rotated by a rotation angle Turntable (Y m ) can be rotated by its m rotation angle (ψ m ).

[0045] According to a preferred embodiment of the present invention, the turntable (Y m ) is installed around the turntable (X), so that the turntable (Y m) and (X) edges overlap when viewed from above. Figure 6-9 This preferred embodiment is shown.

[0046] According to the present invention Figure 2 One embodiment is shown, showing a diameter d Ym , preferably 10%d X ≤d Ym ≤50%d X , most preferably d Ym =50%d X m=1 turntable (Y m ) is rotatably mounted on a turntable (X). In this embodiment, the vertical cross section of the combined platform arrangement is Figure 3 The turntable (X) is powered by a central actuator (A1) which is driven by a substantially vertical actuator to the axis of rotation (R X ) is connected to the turntable (X). The turntable (X) can be rotated clockwise and counterclockwise, and the rotation angle Can be set to any value. m ) is non-centrally mounted on the turntable (X) and powered by another independent actuator (A2). m ) can rotate around its axis (R Ym )Rotation angle (ψ m ). The actuator (A2) provides power to the gear system that forms the forced connection. m ) through the axis of rotation (R Ym ) is rotatably mounted to the turntable (X) about a substantially vertical axis of action, so that it can exhibit a second rotational movement. Actuator (A2) allows the turntable (Y m ) rotates clockwise and counterclockwise, and the rotation angle (ψ m ) can be set to any value. The combination of two independent actuators provides different working modes. m ) is equipped with n = 4 workpiece supports (Z n ). Workpiece support (Z n ) is chosen to be 10% d Ym ≤d Zn ≤50%d Ym In this embodiment, for all n workpiece supports (Z n ), diameter d Zp are the same, where 1≤p≤n. n workpiece supports (Z n ) is obtained by stopping the turntable (X), i.e. the actuator (A1) is stopped. Each workpiece support can be moved about an axis of rotation (R Zn ) rotates clockwise or counterclockwise, and the angle of rotation is marked as (ω p ).

[0047] Installed on the turntable (Y m The number n of workpiece supports on the turntable (Y) can be changed with the change of m. m ) is preferably equipped with a number n of workpiece supports (Z n ), where 1≤n≤10.

[0048] The platform of the present invention can work in two different modes. Figure 4 , and is referred to herein as "Turntable Mode". In this operating mode, actuator (A1) is powered and is therefore rotated clockwise or counterclockwise. Actuator (A2) is fixed and not powered. The turntable plate of the turntable (X) then rotates about its axis of rotation (R x ) is rotated clockwise or counterclockwise. This creates a rotation of the gear spindle and thus the turntable (Y m ) of the turntable, more precisely, the spindle (Z p ) around (R Zp ) forced rotation.

[0049] The second mode is Figure 5 is shown in and is referred to herein as "spindle mode". In this operating mode, the actuator (A1) is not powered and therefore remains in place. This means that the turntable platform of the turntable (X) is also fixed and no movement about the axis of rotation (R X )Rotation. Rotation angle is set to a fixed value and remains constant during this operating mode. The actuator (A2) is powered and causes the turntable (Y m ) of the turntable plate around the rotation axis (R Ym ) clockwise or counterclockwise rotation, which means the rotation angle (ψ m ) changes with time. Gear, gear stator, gear spindle and spindle with substrate (Z p ) Therefore, around the axis of rotation R Zp and the rotation angle (ω p ) is rotated.

[0050] However, the variant using only one turntable (Y1) is not restrictive, and m turntables (Y1) may be connected in the same manner as described for the variant having only one turntable (Y1). m ) is mounted on turntable X, and m≠1. Turntable Y is mounted on turntable X m The number of is preferably selected to be between 1≤m≤3.

[0051] Installed on the turntable (Y m ) can be changed with the change of m. According to one embodiment of the present invention, the turntable (Y m) is equipped with n number of workpiece supports (Z n ), where 1≤n≤10.

[0052] According to a preferred embodiment, all turntables (Y m ) show the same diameter d Ym , which means d Yi =d Yj , where 1≤i, j≤m. However, according to another aspect of the present invention, the turntable diameter (Y m ) can also be different from each other, that is, d Yi ≠d Yj , where 1≤i, j≤m.

[0053] Considering m=1 turntable (Y m ) is mounted on a turntable (X) and n = 4 workpiece holders (Z n ) is installed on (Y m ) embodiment, the platform can be used, for example, to perform different treatments (pre-treatment and post-treatment) and apply different coatings to the substrate. Figure 6 In one embodiment shown, the turntable (Y m ) can be placed in module T k front in order to first pre-treat the substrate (e.g. heating, etching), then it can be moved at an angle If you can Figure 7 As can be seen in the figure, the turntable (X) rotates around the axis of rotation (R X ) is rotated clockwise by approximately And reach another module T k+1 , for example in order to apply a first coating. It can then be moved further in the counterclockwise direction, for example by about like Figure 8 As shown, in the processing source T k-1 Front processing of the substrate, e.g. deposition of a second coating. This is possible due to the turntable (Y m ) can be mounted on the turntable (X) so that it can rotate autonomously. m ) can be placed in front of a module until one of the processing steps is completed. m ) can be approximately (ψ m ) is rotated at a constant angular velocity to obtain a uniform treatment or coating of all substrates. After the processing step, the turntable (Y m ) can be achieved by rotating the turntable (X) by about a certain angle is moved to another module and further processing step.

[0054] According to one aspect of the present invention, the independent actuators are discretely mounted. They can, for example, be mounted within a vacuum chamber wall, such as in or adjacent to an opening through which a workpiece is inserted into the chamber. Each actuator is then coupled to a rack gear mounted on the periphery of the turntable, which meshes with another rack gear mounted on the merging platform.

[0055] According to one aspect of the present invention, the turntable is constructed in the form of a turntable slide. Thus, the turntable is mounted on a wheeled chassis. Thus, it can be transported to a vacuum processing system and inserted into a vacuum chamber by pushing the turntable into the chamber.

[0056] According to another aspect of the invention, the platform of the invention is used to coat a planar substrate with a coating having a varying thickness in one dimension. This can be achieved, for example, using only m=1 turntables (Y m ) is completed. Therefore, the turntable (Y1) stops in front of the coating source, which The turntable (Y1) is turned in front of a coating source, such as an arc target or a sputtering target. This means that (ψ1) is controlled over time. This method can be used to apply convex coatings. Furthermore, this method can be used to create dye distributions, for example for decorative applications.

[0057] According to one aspect of the present invention, the merging platform of the present invention is inserted into a vacuum chamber showing a large height to coat a widened rod-shaped workpiece that cannot be processed in a vacuum chamber having a small height.

[0058] According to one embodiment of the present invention Figure 9 In the embodiment shown, m=3 turntables Y m are dispersedly mounted on a turntable X. Three walls are vertically mounted between m turntables Yi, where 1≤i≤m, and are mounted above the turntable X at approximately right angles. These walls exhibit a height and width sufficient to completely mount a turntable Y i The merging platform is installed on a processing source T with a number k. k The vacuum chamber is selected to allow different treatments of the substrates, which are mounted on different turntables Y i The number of treatment sources can be chosen, for example, to be k=3. This allows the insertion of three different substrate batches, which can be treated in different ways and sequences, since they are isolated with respect to the treatments applied to adjacent segments and thus substrate batches. According to one aspect of the invention, by varying the treatment times, the etching operation for the substrate batch applied to turntable Y1 is different from the etching operation for the substrate batches applied to turntables Y2 and Y3, even though the substrates use the same treatment source T. k Be processed.

[0059] According to Figure 10 In one embodiment shown, a machine having a coating chamber showing a coating height h = 400 mm is equipped with a merging platform according to the invention. The merging platform comprises a turntable (X) on which m other turntables (Y) are mounted. m ), for example, m = 8. If the platform works in the "turntable mode", then n workpiece supports (Z p ), where 1≤p≤n, is mounted on the turntable (Y m ), that is, n≤m, preferably n=m, in this example n=8. Zm ) and (R Zp ) overlap. Thus, the workpiece support is mounted on the turntable (Y i ) axis, if the rotary table works in "spindle mode". Figure 10 In the embodiment shown, d Ym =d Zn The turntable (X) shows the diameter d X =1000mm. Workpiece support (Z n ) are located at the outer edge of the turntable (X). With this arrangement, the loading capacity of the machine in this embodiment is 100%. If working in the "turntable mode", the vacuum chamber is equipped with four processing sources. The same machine with a height h = 400 mm can be equipped with the merging platform of the present invention, while the turntable (X) is a turntable with a diameter d X = 1000mm. Unlike the case with 100% loading capacity, m = 1 turntable (Y m ) are mounted on the turntable (X). n = 4 workpiece supports Z n Mounted on this turntable (Y1). This provides a 50% loading capacity. The number of treatment sources is therefore changed to two treatment sources for a 50% loading capacity. Comparing the two cases, the container remains the same and the turntable (X) also remains unchanged. Turntable (Y m ) number m, workpiece support (Z n ) number n and target T k The number k is changed according to the loading capacity. m ) maintains the required distance between the target and the substrate and rotates around the axis of rotation (R Ym ) rotates at a constant angular velocity. The gear ratio is adjusted according to the coating to be applied. The turntable (X) can be rotated by a certain angle To make the turntable (Y i ) from one position (one processing step) to the next position (the second processing step), where 0≤i≤m, and another turntable (Y j ) moves to the position originally occupied by the turntable (Y i ) is the position occupied by , where 0≤j≤m, j≠i.

[0060] Reference numerals:

[0061]

[0062]

Claims

1. A workpiece carrier for holding a workpiece to be processed to be installed in a vacuum chamber of a vacuum processing system, comprising: - a diameter d X Turntable X, - one or more diameters d Ym Turntable Y m , which can be mounted on the turntable X, the diameter d Ym <the diameter d X , - one or more diameters d Zn Workpiece support Z n , which can be mounted on the one or more turntables Y m On the diameter d Zn ≤ the diameter d Ym , - a first actuator (A1) and a second actuator (A2), The feature is that the first actuator (A1), the second actuator (A2) and the turntable X and turntable Y m The forced connection between the two is established by means of a transmission mechanism in the following manner, which allows at least two operating modes of the vacuum processing system, wherein: - In Mode 1, the first actuator (A1) is powered and the second actuator (A2) is not powered, causing the turntable X to rotate about its central axis R x Turn, and - In Mode 2, the first actuator (A1) is not powered and the second actuator (A2) is powered, so that the turntable Y m Rotation axis R around its center Ym rotates, while the turntable X remains stationary, and The wall is arranged on a turntable Y m Next to or multiple turntables Y m Between, wherein the wall is vertically mounted on a turntable Y m Next to or multiple turntables Y m between and mounted above the turntable X, wherein the wall shows a height and width sufficient to completely accommodate a turntable Y m The segment is separated from the adjacent segment.

2. The workpiece carrying device according to claim 1, wherein: The turntable X is circular, so the surface area of the turntable X is A X =π×(d X / 2) 2 limited.

3. The workpiece carrying device according to claim 1 or 2, characterized in that: The turntable X and at least one turntable Y m The third transmission mechanism is connected so that when the workpiece carrying device works according to mode 1, the at least one turntable Y is connected to the workpiece carrying device through the third transmission mechanism. m In rotational motion.

4. The workpiece carrying device according to claim 1, wherein: The first actuator (A1) is connected to the turntable X through a first transmission mechanism, and the second actuator (A2) is connected to the at least one turntable Y through a second transmission mechanism. m .

5. The workpiece carrying device according to claim 1, wherein: The first actuator (A1) and / or the second actuator (A2) are designed as electromechanical actuators, wherein the first actuator (A1) and / or the second actuator (A2) are rotated about the rotation axis R by applying a control voltage to the first actuator (A1) and / or the second actuator (A2). x and / or around the axis of rotation R Ym Produces rotational motion.

6. The workpiece carrying device according to claim 1, wherein: The device can be used at pressures below 1 mbar.

7. The workpiece carrying device according to claim 1, wherein: The turntable X and / or the one or more turntables Y m and / or the one or more workpiece supports Z n It is flat.

8. The workpiece carrying device according to claim 1, wherein: The one or more turntables Y m Arranged completely in the area of the turntable X and / or the one or more workpiece supports Z n Completely arranged on the one or more turntables Y m In the area where the turntable Y m Mounted on the periphery of the turntable X so that when viewed from above, the turntable Y m Overlapping with the edge of the turntable X.

9. The workpiece carrying device according to claim 1, wherein: The first actuator (A1) and / or the second actuator (A2) are arranged below the turntable X, opposite to the workpiece arrangement area.

10. The workpiece carrying device according to claim 1, wherein: Rotation axis R x and the rotation axis R Ym Aligned parallel to each other.

11. The workpiece carrying device according to claim 1, wherein: The turntable X, the turntable Y m and the workpiece support Z n Aligned parallel to each other.

12. The workpiece carrying device according to claim 1, wherein: The turntable X and the one or more turntables Y m Able to rotate around its axis R x and the rotation axis R Ym Rotate clockwise or counterclockwise, where the rotation angle (φ1, φ m ) can be set to any value.

13. The workpiece carrying device according to claim 1, wherein: The one or more turntables Y m Shows diameter d Ym , and / or the workpiece support Z n The diameter is 10%d Ym ≤d Zn ≤50%d Ym .

14. The workpiece carrying device according to claim 1, wherein: The turntable X is formed in the form of a turntable slide, wherein the turntable X is mounted on a wheeled chassis.

15. A surface treatment system for treating a workpiece, comprising: - a workpiece carrier according to claim 1 for carrying workpieces during processing, - a chamber for introducing a workpiece carrier device according to claim 1, - at least one processing device for processing a workpiece that can be arranged in said workpiece carrier.

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