Optical element with a removable reflective cover comprising a two-dimensional material

Abstract

In general, the present invention relates to an optical element having a covering including a two-dimensional material. In particular, the present invention relates to an optical element, a method for preparing an optical element, an apparatus, the use of a coated two-dimensional material, the use of an optical element, and the use of an apparatus. In particular, the present invention relates to an optical element comprising: a. a covering having a first surface and a second surface, b. a support, and c. a member; wherein: the covering is oriented with the first surface facing the support; a portion of the first surface is attached to the support; the spatial configuration of the second surface relative to the support defines a covering profile; the member is adapted and configured to move the second surface from a first covering profile to another covering profile; the covering comprises a two-dimensional portion, the two-dimensional portion being one or more two-dimensional materials; the covering has a transmittance divided by a reflectance value of no more than 0.5 for light incident on the second surface, the reflectance and transmittance being measured at a wavelength λ; and λ is in the range of 10nm to 20μm.

Description

Technical Field

[0001] The present invention generally relates to optical elements having a covering comprising a two-dimensional material. In particular, the present invention relates to optical elements, methods for preparing optical elements, devices, uses of coated two-dimensional materials, uses of optical elements and uses of devices. Background Art

[0002] Tunable optical devices can be used for a variety of light scattering, light reflection and light interference applications. Particular utility is provided by devices that are tunable on a cell-by-cell basis, particularly micro devices (where the elements are small), such as display devices having multiple pixels. One class of devices allows for the manipulation of images. In such devices, control of the scattering, reflection and / or interference behavior can be used to turn pixels on or off and / or change their color. Another application is in light sails, where the dynamics are dependent on the shape the sail presents to the light flux.

[0003] A recent attempt to improve optical devices has been made in international patent application WO / 2018 / 228671A1, where a single layer was employed in an interference device.

[0004] There remains a need for improved tunable optical devices, in particular, devices having miniaturized controllable pixels. Summary of the invention

[0005] A general object of the present invention is to at least partially overcome one or more disadvantages inherent in the prior art, in particular, disadvantages associated with tunable optical devices.

[0006] One object is to provide an optical element with tunable light scattering behavior, preferably tunable on a per-unit basis.

[0007] One object is to provide an optical element that is moveable between a specular reflector and a diffuse reflector, preferably adjustable on a per-unit basis.

[0008] One object is to provide optical elements with tunable optical interference behavior, preferably tunable on a cell-by-cell basis.

[0009] One object is to provide optical components that are tunable with increased operating frequencies.

[0010] One object is to provide an optical element, preferably an adjustable optical element, having a reduced mass.

[0011] One object is to provide an optical element with increased mechanical strength.

[0012] One object is to provide an optical component with reduced power consumption.

[0013] One object is to provide optical elements with increased durability.

[0014] One object is to provide optical elements with increased thermal stability.

[0015] One object is to provide an optical element with increased heat conduction.

[0016] One object is to provide optical elements with increased dynamic range.

[0017] One object is to provide optical components with improved wavelength control and increased continuous tunability.

[0018] One object is to provide optical elements with improved angular control and increased continuous tunability.

[0019] One object is to provide an optical element with increased homogeneity of effect.

[0020] One object is to provide optical elements with increased reflectivity.

[0021] One object is to provide an optical element with reduced manufacturing complexity.

[0022] One object is to provide optical elements with increased dynamic range.

[0023] One object is to provide optical components with increased data transmission bandwidth.

[0024] One object is to provide an optical element, preferably a light sail, that experiences increased thrust from incident light.

[0025] Specific description:

[0026] Contributions to at least partially addressing one or more of the deficiencies of the prior art are made by the following embodiments, where the embodiment number x is denoted by [x]. The dependent embodiments represent preferred configurations of the independent embodiments.

[0027] [1] An optical element comprising:

[0028] a. A covering having a first surface and a second surface,

[0029] b. Support members, and

[0030] c. Components; among which:

[0031] The cover is oriented with the first surface facing the support;

[0032] A portion of the first surface is attached to the support, the portion preferably not exceeding 60 area percent of the first surface, more preferably not exceeding 20 area percent of the first surface, most preferably not exceeding 5 area percent of the first surface;

[0033] The spatial configuration of the second surface relative to the support defines a cover profile;

[0034] The member is adapted and configured to move the second surface from a first covering contour profile to another covering contour profile;

[0035] The covering includes a two-dimensional portion, the two-dimensional portion being one or more two-dimensional materials;

[0036] the covering has a value of transmittance divided by reflectance for light incident on the second surface of no more than 0.5, preferably no more than 0.25, more preferably no more than 0.1, most preferably no more than 0.01, the reflectance and the transmittance being measured at wavelength λ; and

[0037] λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0038] In one aspect of this embodiment, the first cover profile is a rest position. Preferably the rest position has a member in an inactive state. In one aspect, the member is adapted and configured to apply a maximum potential difference Vmax and the member applies a potential difference of no more than Vmax / 5, preferably no more than Vmax / 10, more preferably no more than Vmax / 20 in the rest position. Preferably the member does not apply a potential difference in the rest position.

[0039] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0040] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0041] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0042] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0043] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0044] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0045] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0046] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0047] In one aspect of this embodiment, the cover and support member interface with one or more open cavities. Preferably the one or more open cavities each have an opening, the opening and the cover being on opposite sides of the cavity.

[0048] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0049] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0050] [2] An optical element according to embodiment [1], wherein movement from the first cover contour to the second cover contour changes the orientation of the second surface relative to the support at at least one location on the second surface.

[0051] In one embodiment, movement from the first covering outline profile to the second covering outline profile changes the height of points on the covering, which is defined with reference to the plane of the support. In one aspect of this embodiment, the plane of the support is defined by the attachment points between the covering and the support. In another aspect, the plane of the support is a face of the support. In another aspect, the plane of the support is a partial face of the support. In one aspect of this embodiment, the movement changes the height of multiple points on the covering, preferably at least 10% of the area percent of the covering, more preferably at least 50% of the area percent of the covering, and more preferably at least 80% of the area percent of the covering.

[0052] [3] An optical element as in any of the above embodiments, wherein the cover includes an amorphous portion, the amorphous portion being one or more amorphous materials. In one aspect of this embodiment, the amorphous portion includes one or more metals, preferably one or more metals. In one aspect of this embodiment, the amorphous portion includes one or more additives, preferably one or more additives. In one aspect of this embodiment, the amorphous portion is not a two-dimensional material. In one aspect of this embodiment, the amorphous portion does not include a two-dimensional material.

[0053] [4] The optical element of embodiment [3], wherein the average density of the amorphous portion in the cover is 24 kg / m 2 or lower, preferably 2.4×10 -1 kg / m 2 or lower, more preferably 2.4×10 -2 kg / m 2 or lower, more preferably 2.4×10 -3 kg / m 2 or lower, most preferably 1.2×10 -3 kg / m 2 or lower.

[0054] [5] The optical element of embodiment [3] or [4], wherein the average density of the amorphous portion in the cover is 1.7×10 -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m 2In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0055] [6] An optical element as in any one of embodiments [3] to [5], wherein the amorphous portion is present as a layer containing an amorphous substance, and the two-dimensional portion is preferably present outside the layer containing an amorphous substance. In one aspect of this embodiment, the covering includes a layer containing a two-dimensional material, and the layer containing a two-dimensional material is closer to the support than the layer containing an amorphous substance. In one aspect of this embodiment, the covering includes a layer containing a two-dimensional material, and the layer containing a two-dimensional material is farther from the support than the layer containing an amorphous substance.

[0056] [7] The optical element of embodiment [6], wherein the layer containing the amorphous substance has a 2 or lower, preferably 2.4×10 -1 kg / m 2 or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or lower, most preferably 1.2×10 -3 kg / m 2 or lower average density.

[0057] [8] The optical element of embodiment [6] or [7], wherein the layer containing the amorphous substance has a -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m 2 In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5kg / m 2 or more.

[0058] [9] An optical element as in any one of embodiments [6] to [8], wherein the layer containing the amorphous substance has a thickness of 1 mm or less, preferably 10 μm or less, more preferably 1000 nm or less, more preferably 100 nm or less, more preferably 50 nm or less.

[0059]

[10] The optical element of any one of embodiments [6] to [9], wherein the layer containing the amorphous substance has a thickness of 25 μm or more, preferably 69 μm or more, more preferably 100 μm or more. In one aspect of this embodiment, the thickness is 1 nm or more, preferably 3 nm or more. In another aspect of this embodiment, the thickness is 5 nm or more, preferably 10 nm or more, more preferably 30 nm or more.

[0060]

[11] An optical element as in any one of embodiments [6] to

[10] , wherein the layer containing the amorphous substance has a thickness of less than 10 6 Ω·cm, preferably less than 10 -1 Ω·cm, more preferably less than 10 -3 Ω·cm, most preferably less than 10 -5 Resistivity of Ω·cm. Resistivity can be as low as 10 -8 Ω·cm, especially when using non-superconducting conductors. The resistivity can be lower than 10 -8 Ω·cm, especially when using superconducting materials.

[0061]

[12] An optical element as in any one of embodiments [6] to

[11] , wherein the layer containing amorphous substance is on a surface of a covering. In one aspect of this embodiment, the layer containing amorphous substance is on a first surface of a covering. In another aspect of this embodiment, the layer containing amorphous substance is on a second surface of a covering. In another aspect of this embodiment, the layer containing amorphous substance is present on both the first surface and the second surface of a covering. In another aspect of this embodiment, the layer containing amorphous substance is present on neither the first surface nor the second surface of a covering.

[0062]

[13] An optical element as in any one of embodiments [6] to

[12] , wherein the layer containing an amorphous substance has a value of transmittance divided by reflectance of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, most preferably not more than 0.01, the reflectance and transmittance being measured at a wavelength λ;

[0063] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0064] In one aspect of this embodiment, λ is 532 nm. According to this aspect the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0065] In one aspect of this embodiment, λ is 476 nm. According to this aspect, preferably a blue Kr laser is used for optical measurement.

[0066] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0067] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0068] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0069] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0070] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0071] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0072] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0073] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0074]

[14] An optical element as in any one of embodiments [6] to

[13] , wherein the layer containing an amorphous substance has a value of absorbance divided by reflectance of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, most preferably not more than 0.01, the reflectance and absorbance being measured at a wavelength λ;

[0075] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0076] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0077] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0078] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0079] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0080] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0081] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0082] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0083] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0084] In one aspect of this embodiment, the absorbance and reflectance values ​​are for light incident on the second surface. In one aspect of this embodiment, the absorbance and reflectance values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0085] In one aspect of this embodiment, the absorbance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0086] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0087] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0088] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0089] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0090]

[15] An optical element as in any of the above embodiments, wherein the cover comprises a metal portion, the metal portion being one or more metals. In one aspect of this embodiment, the metal portion comprises one or more amorphous materials, preferably one or more amorphous materials. In one aspect of this embodiment, the metal portion comprises one or more additives, preferably one or more additives. In one aspect of this embodiment, the metal portion is not a two-dimensional material. In one aspect of this embodiment, the metal portion does not contain a two-dimensional material.

[0091]

[16] The optical element of embodiment

[15] , wherein the average density of the metal part in the cover is 24 kg / m 2 or less, preferably 2.4×10 -1 kg / m 2 or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or less, most preferably 1.2×10 -3 kg / m 2 or less.

[0092]

[17] The optical element of embodiment

[15] or

[16] , wherein the average density of the metal portion in the cover is 1.7×10 -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m 2 In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0093]

[18] An optical element as in any one of embodiments

[15] to

[17] , wherein the metal portion is present as a metal-containing layer, and the two-dimensional portion is preferably present outside the metal-containing layer. In one aspect of this embodiment, the covering includes a layer containing a two-dimensional material, and the layer containing the two-dimensional material is closer to the support than the metal-containing layer. In one aspect of this embodiment, the covering includes a layer containing a two-dimensional material, and the layer containing the two-dimensional material is farther from the support than the metal-containing layer.

[0094]

[19] The optical element of embodiment

[18] , wherein the metal-containing layer has a 2 or less, preferably 2.4×10 -1 kg / m 2 or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or less, most preferably 1.2×10 -3 kg / m 2 or less average density.

[0095]

[20] The optical element of embodiment

[18] or

[19] , wherein the metal-containing layer has a -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m 2In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0096]

[21] An optical element as in any one of embodiments

[18] to

[20] , wherein the metal-containing layer has a thickness of 1 mm or less, preferably 10 μm or less, more preferably 1000 nm or less, more preferably 100 nm or less, more preferably 50 nm or less.

[0097]

[22] The optical element of any one of embodiments

[18] to

[21] , wherein the metal-containing layer has a thickness of 25 μm or more, preferably 69 μm or more, more preferably 100 μm or more. In one aspect of this embodiment, the thickness is 1 nm or more, preferably 3 nm or more. In another aspect of this embodiment, the thickness is 5 nm or more, preferably 10 nm or more, more preferably 30 nm or more.

[0098]

[23] An optical element as in any one of embodiments

[18] to

[22] , wherein the metal-containing layer has a thickness of less than 10 6 Ω·cm, preferably less than 10 -1 Ω·cm, more preferably less than 10 -3 Ω·cm, most preferably less than 10 -5 Resistivity of Ω·cm. Resistivity can be as low as 10 -8 Ω·cm, especially when using non-superconducting conductors. The resistivity can be lower than 10 -8 Ω·cm, especially when using superconducting materials.

[0099]

[24] An optical element as in any one of embodiments

[18] to

[23] , wherein the metal-containing layer is on a surface of the covering. In one aspect of this embodiment, the metal-containing layer is on a first surface of the covering. In another aspect of this embodiment, the metal-containing layer is on a second surface of the covering. In another aspect of this embodiment, the metal-containing layer is present on both the first surface and the second surface of the covering. In another aspect of this embodiment, the metal-containing layer is present on neither the first surface nor the second surface of the covering.

[0100]

[25] An optical element as in any one of embodiments

[18] to

[24] , wherein the metal-containing layer has a transmittance divided by a reflectance value of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, and most preferably not more than 0.01, the reflectance and transmittance being measured at a wavelength λ;

[0101] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0102] In one aspect of this embodiment, λ is 532 nm. According to this aspect the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0103] In one aspect of this embodiment, λ is 476 nm. According to this aspect, preferably a blue Kr laser is used for optical measurement.

[0104] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0105] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0106] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0107] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0108] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0109] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0110] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0111] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0112]

[26] An optical element as in any one of embodiments

[18] to

[25] , wherein the metal-containing layer has an absorbance divided by reflectance value of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, most preferably not more than 0.01, the reflectance and absorbance being measured at wavelength λ;

[0113] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0114] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0115] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0116] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0117] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0118] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0119] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0120] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0121] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0122] In one aspect of this embodiment, the reflectivity and absorbance are for light incident on the second surface. In one aspect of this embodiment, the absorbance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0123] In one aspect of this embodiment, the absorbance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0124] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0125] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0126] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0127] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0128]

[27] An optical element as in any of the above embodiments, wherein the cover includes an additive portion, which is one or more elements selected from the group consisting of Ag, Al, Au, B, Ba, Be, Bi, C, Ca, Cr, Cs, Co, Cu, Fe, Ga, Ge, H, Hf, Hg, In, Ir, K, Mg, Mn, Mo, Na, Nb, Ni, Li, Ti, Os, P, Pb, Pd, Pt, Re, Rh, Ru, S, Sb, Sc, Se, Si, Sn, Sr, Ta, Te, V, W, Zr and Zn; or one or more combinations of two or more of the above elements, preferably alloys; or a combination of one or more of the above elements and one or more chalcogenides (O, S, Se, Te), N or C. Preferred C in this context is amorphous C. Preferred Si in this context is amorphous Si. A preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). The preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4). The preferred combination of Ga and N in this context is amorphous gallium nitride (GaN). The preferred combination of In, Sn, Zn and O is amorphous indium tin oxide (ITO), amorphous indium zinc oxide (IZO), amorphous zinc oxide (ZnO) and amorphous indium tin zinc oxide (ITZO).

[0129] In one aspect of this embodiment, the additive portion is one or more elements selected from the group consisting of Ag, Al, Au, B, Ba, C, Ca, Cr, Cs, Co, Cu, Fe, Ga, Ge, Hf, In, K, Mg, Mn, Mo, Na, Nb, Ni, Li, Ti, P, Pb, Pd, Pt, S, Sb, Se, Si, Sn, Sr, Ta, Te, V, W, Zr, and Zn; or one or more combinations of two or more of the above elements, preferably alloys; or a combination of one or more of the above elements with one or more chalcogenides (O, S, Se, Te), N, or C. The preferred C in this context is amorphous C. The preferred Si in this context is amorphous Si. The preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). The preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4). The preferred combination of Ga and N in this context is amorphous gallium nitride (GaN). Preferred combinations of In, Sn, Zn and O are amorphous indium tin oxide (ITO), amorphous indium zinc oxide (IZO), amorphous zinc oxide (ZnO) and amorphous indium tin zinc oxide (ITZO).

[0130] In one aspect of this embodiment, the additive portion is one or more elements selected from the group consisting of Ag, Al, B, C, Cr, Fe, K, Mg, Mo, Na, Ni, Ti, P, Pb, S, Ta, V, W, and Zn; or one or more combinations of two or more of the above elements, preferably alloys; or a combination of one or more of the above elements and one or more chalcogens (O, S, Se, Te), N, or C. Preferred C in this context is amorphous C.

[0131] In one aspect of this embodiment, the additive portion is one or more elements selected from the group consisting of Ag, Al, B, C, Cr, Fe, K, Mg, Mo, Na, Ni, Ti, P, Pb, S, Si, Ta, V, W, and Zn; or one or more combinations of two or more of the above elements, preferably alloys; or a combination of one or more of the above elements with one or more chalcogens (O, S, Se, Te), N, or C. The preferred C in this context is amorphous C. The preferred Si in this context is amorphous Si. The preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). The preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4).

[0132] In one aspect of this embodiment, the additive part is one or more composite materials, preferably a composite material is a polymer matrix including one or more nanomaterials. Preferred nanomaterials are selected from the group consisting of nanoparticles, quantum dots, carbon nanotubes and silver nanowires.

[0133] In another aspect, preferred nanomaterials are selected from the group consisting of nanoparticles, quantum dots, carbon nanotubes, silver nanowires, organic LEDs, and electronic inks.

[0134] In one aspect of this embodiment, the additive portion is a combination of elements and derived compounds selected from the above list and composite materials from the above list.

[0135] In one aspect of this embodiment, the additive portion comprises one or more metals, preferably one or more metals. In one aspect of this embodiment, the additive portion comprises one or more amorphous materials, preferably one or more amorphous materials. In one aspect of this embodiment, the additive portion is not a two-dimensional material. In one aspect of this embodiment, the additive portion does not contain a two-dimensional material.

[0136]

[28] The optical element of embodiment

[27] , wherein the average density of the additive portion in the cover is 24 kg / m 2 or less, preferably 2.4×10 -1 kg / m 2or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or less, most preferably 1.2×10 -3 kg / m 2 or less.

[0137]

[29] The optical element of embodiment

[27] or

[28] , wherein the average density of the additive portion in the cover is 1.7×10 -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m 2 In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0138]

[30] An optical element as in any one of embodiments

[27] to

[29] , wherein the additive portion is present as a layer containing the additive, and the two-dimensional portion is preferably present outside the layer containing the additive. In one aspect of this embodiment, the covering includes a layer containing the two-dimensional portion, and the layer containing the two-dimensional portion is closer to the support than the layer containing the additive. In one aspect of this embodiment, the covering includes a layer containing the two-dimensional portion, and the layer containing the two-dimensional portion is farther from the support than the layer containing the additive.

[0139]

[31] The optical element of embodiment

[30] , wherein the additive-containing layer has a 2 or less, preferably 2.4×10 -1 kg / m 2 or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or less, most preferably 1.2×10 -3 kg / m 2 or less average density.

[0140]

[32] The optical element of embodiment

[30] or

[31] , wherein the additive-containing layer has a -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m2 or more. In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0141]

[33] An optical element as in any one of embodiments

[30] to

[32] , wherein the additive-containing layer has a thickness of 1 mm or less, preferably 10 μm or less, more preferably 1000 nm or less, more preferably 100 nm or less, more preferably 50 nm or less.

[0142]

[34] The optical element of any one of embodiments

[30] to

[33] , wherein the additive-containing layer has a thickness of 25 μm or more, preferably 69 μm or more, more preferably 100 μm or more. In one aspect of this embodiment, the thickness is 1 nm or more, preferably 3 nm or more. In another aspect of this embodiment, the thickness is 5 nm or more, preferably 10 nm or more, more preferably 30 nm or more.

[0143]

[35] An optical element as in any one of embodiments

[30] to

[34] , wherein the additive-containing layer has a thickness of less than 10 6 Ω·cm, preferably less than 10 -1 Ω·cm, more preferably less than 10 -3 Ω·cm, most preferably less than 10 -5 Resistivity of Ω·cm. Resistivity can be as low as 10 -8 Ω·cm, especially when using non-superconducting conductors. The resistivity can be lower than 10 -8 Ω·cm, especially when using superconducting materials.

[0144]

[36] An optical element as in any one of embodiments

[30] to

[35] , wherein the additive-containing layer is on a surface of the covering. In one aspect of this embodiment, the additive-containing layer is on a first surface of the covering. In another aspect of this embodiment, the additive-containing layer is on a second surface of the covering. In another aspect of this embodiment, the additive-containing layer is present on both the first surface and the second surface of the covering. In another aspect of this embodiment, the additive-containing layer is present on neither the first surface nor the second surface of the covering.

[0145]

[37] An optical element as in any one of embodiments

[30] to

[36] , wherein the additive-containing layer has a transmittance divided by a reflectance value of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, and most preferably not more than 0.01, the reflectance and transmittance being measured at a wavelength λ;

[0146] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0147] In one aspect of this embodiment, λ is 532 nm. According to this aspect the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0148] In one aspect of this embodiment, λ is 476 nm. According to this aspect, preferably a blue Kr laser is used for optical measurement.

[0149] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0150] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0151] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0152] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0153] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0154] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0155] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0156] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0157]

[38] An optical element as in any one of embodiments

[30] to

[37] , wherein the additive-containing layer has an absorbance divided by reflectance value of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, most preferably not more than 0.01, the reflectance and absorbance being measured at wavelength λ;

[0158] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0159] In one aspect of this embodiment, λ is 532 nm. According to this aspect the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0160] In one aspect of this embodiment, λ is 476 nm. According to this aspect, preferably a blue Kr laser is used for optical measurement.

[0161] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0162] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0163] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0164] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0165] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0166] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0167] In one aspect of this embodiment, the reflectivity and absorbance are for light incident on the second surface. In one aspect of this embodiment, the absorbance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0168] In one aspect of this embodiment, the absorbance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0169] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0170] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0171] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0172] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0173]

[39] An optical element as in any of the above embodiments, wherein the two-dimensional portion is one or more of the following:

[0174] d. One or more selected from the following: C, BN, P, MoS2, MoSe2, MoTe2, WS2, WSe2, WTe2, NbS2, NbSe2, NbTe2, TaS2, TaSe2, TaTe2, TiSe2, VSe2, CrS2, CrSe2, B, Ge, Si, Si2BN, Sn, Pb, P, Sb, Bi. Preferred C in this context is one or more selected from the following: graphene (one or more graphite layers) and graphyne; preferred graphene. Preferred BN in this context is h-BN. Preferred P in this context is black phosphorus or phosphorene. Preferred B in this context is borene. Preferred Ge in this context is germanene. Preferred Si in this context is silicene. Preferred Sn in this context is stanene. Preferred Pb in this context is plumbene. Preferred Sb in this context is antimonene. Preferred Bi in this context is bismuthene;

[0175] e. one or more transition metal chalcogenides, each of which is a transition metal chalcogenide other than that listed in a;

[0176] f. one or more oxides, each of which is an oxide of a substance listed in a or b;

[0177] g. one or more atomic intercalation variants, each of which is an atomic intercalation variant of the substance listed in a or b;

[0178] h. One or more physical, chemical, mechanical and / or electromagnetic functionalized derivatives, each of which is a chemical functionalized derivative of a substance listed in a or b. Preferably, the physical functionalization is perforation or atom arresting treatment. Preferably, the mechanical functionalization is stretching or pressing. Preferably, the electromagnetic functionalization is applying voltage.

[0179] In one aspect of this embodiment, the two-dimensional portion is a combination selected from the following: a, b, c, d, e, a+b, a+c, a+d, a+e, b+c, b+d, b+e, c+d, c+e, d+e, a+b+c, a+b+d, a+b+e, a+c+d, a+c+e, a+d+e, b+c+d, b+c+e, b+d+e, c+d+e, b+c+d+e, a+c+d+e, a+b+d+e, a+b+c+e, a+b+c+d and a+b+c+d+e.

[0180] [39a] An optical element as in any of the above embodiments, wherein the two-dimensional portion is one or more of the following:

[0181] a. One or more selected from the following: C, BN, P, MoS2, MoSe2, MoTe2, WS2, WSe2, WTe2, GaS, GaSe, GaTe, NbS2, NbSe2, NbTe2, TaS2, TaSe2, TaTe2, TiSe2, VSe2, CrS2, CrSe2, B, Ge, Si, Si2BN, Sn, Pb, PtS2, PtSe2, PtTe2, Sb, Bi. Preferred C in this context is one or more selected from the following: graphene (one or more graphite layers) and graphyne (single layer of amorphous carbon); preferred graphene. Preferred BN in this context is h-BN. Preferred P in this context is black phosphorus or phosphorene. Preferred B in this context is borene. Preferred Ge in this context is germanene. Preferred Si in this context is silicene. Preferred Sn in this context is stanene. Preferred Pb in this context is plumbene. The preferred Sb in this context is antimonene. The preferred Bi in this context is bismuthene;

[0182] b. one or more transition metal chalcogenides, each of which is a transition metal chalcogenide other than that listed in a;

[0183] c. one or more oxides, each of which is an oxide of a substance listed in a or b;

[0184] d. one or more atomic intercalation variants, each of which is an atomic intercalation variant of the substance listed in a or b;

[0185] e. One or more physical, chemical, mechanical and / or electromagnetic functionalized derivatives, each of which is a chemical functionalized derivative of a substance listed in a or b. Preferably, the physical functionalization is perforation or atom arresting treatment. Preferably, the mechanical functionalization is stretching or pressing. Preferably, the electromagnetic functionalization is applying voltage.

[0186] In one aspect of this embodiment, the two-dimensional portion is a combination selected from the following: a, b, c, d, e, a+b, a+c, a+d, a+e, b+c, b+d, b+e, c+d, c+e, d+e, a+b+c, a+b+d, a+b+e, a+c+d, a+c+e, a+d+e, b+c+d, b+c+e, b+d+e, c+d+e, b+c+d+e, a+c+d+e, a+b+d+e, a+b+c+e, a+b+c+d and a+b+c+d+e.

[0187] In one embodiment, the two-dimensional material is present in a nanosheet solution or a composite material. A preferred composite material is a polymer matrix comprising one or more two-dimensional materials preferably selected according to the above embodiments. A preferred nanosheet solution comprises one or more two-dimensional materials preferably selected according to the above embodiments.

[0188]

[40] An optical element as in any of the above embodiments, wherein the two-dimensional portion comprises graphene or boron nitride or both. Preferably the boron nitride is hexagonal boron nitride. Preferably the graphene is chemically vapor deposited. Preferably the boron nitride is chemically vapor deposited. In one aspect of this embodiment, the two-dimensional portion comprises graphene, preferably graphene. In one aspect of this embodiment, the two-dimensional portion comprises boron nitride, preferably boron nitride.

[0189]

[41] An optical element as in any of the above embodiments, wherein the two-dimensional portion is two or more two-dimensional materials. In one aspect of this embodiment, the two or more two-dimensional materials are each selected from the list of embodiment

[39] .

[0190]

[42] An optical element as in any of the above embodiments, wherein the average density of the two-dimensional portion of the cover is 24 kg / m 2 or less, preferably 2.4×10 -1 kg / m 2 or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or less, most preferably 1.2×10 -3 kg / m 2 or less average density.

[0191]

[43] An optical element as in any of the above embodiments, wherein the average density of the two-dimensional portion in the cover is 1.7×10 -9 kg / m 2 or more, preferably 3.4×10 -8 kg / m 2 or more, more preferably 1.8×10 -7 kg / m 2 In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m 2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0192]

[44] An optical element as in any of the above embodiments, wherein the two-dimensional portion comprises one or more two-dimensional material sheets.

[0193]

[45] An optical element as in any of the above embodiments, wherein the two-dimensional portion exists as a two-dimensional layer.

[0194]

[46] The optical element of embodiment

[45] , wherein the average density of the two-dimensional layer is 24 kg / m 2 or less, preferably 2.4×10 -1 kg / m 2 or less, more preferably 2.4×10 -2 kg / m 2 or less, more preferably 2.4×10 -3 kg / m 2 or less, most preferably 1.2×10 -3 kg / m 2 or less.

[0195]

[47] The optical element of embodiment

[45] or

[46] , wherein the average density of the two-dimensional layer is 1.7×10 - 9 kg / m 2 or more, preferably 3.4×10 -8 kg / m2 or more, more preferably 1.8×10 -7 kg / m 2 In one aspect of this embodiment, the average density is 5×10 -7 kg / m 2 or more, preferably 1.5×10 -6 kg / m 2 or more, more preferably 5.4×10 -6 kg / m2 or more, more preferably 5.7×10 -5 kg / m 2 or more.

[0196]

[48] ​​An optical element as in any one of embodiments

[45] to

[47] , wherein the two-dimensional layer has a thickness of less than 10 6 Ω·cm, preferably less than 10 -1 Ω·cm, more preferably less than 10 -3 Ω·cm, most preferably less than 10 -5 Resistivity of Ω·cm. Resistivity can be as low as 10 -8 Ω·cm, especially when using non-superconducting conductors. The resistivity can be less than 10 -8 Ω·cm, especially when using superconducting materials.

[0197]

[49] An optical element as described in any one of embodiments

[45] to

[48] , wherein the two-dimensional layer is one or more two-dimensional material sheets.

[0198]

[50] The optical element of any one of embodiments

[45] to

[49] , wherein the two-dimensional layer has a thickness of 1 mm or less, preferably 10 μm or less, more preferably 1000 nm or less, more preferably 100 nm or less, more preferably 50 nm or less. In one aspect of this embodiment, more preferably 10 nm or less, more preferably 5 nm or less, most preferably 1 nm or less.

[0199]

[51] The optical element of any one of embodiments

[45] to

[50] , wherein the two-dimensional layer has a thickness of 25 pm or more, preferably 69 pm or more, more preferably 100 pm or more. In one aspect of this embodiment, the thickness is 1 nm or more, preferably 3 nm or more, more preferably 5 nm or more, still more preferably 10 nm or more. In another aspect of this embodiment, the thickness is 15 nm or more, preferably 20 nm or more, more preferably 30 nm or more.

[0200]

[52] An optical element as in any one of embodiments

[45] to

[51] , wherein the layer containing two dimensions is on the surface of the covering. In one aspect of this embodiment, the layer containing two dimensions is on the first surface of the covering. In another aspect of this embodiment, the layer containing two dimensions is on the second surface of the covering. In another aspect of this embodiment, the layer containing two dimensions is present on both the first surface and the second surface of the covering. In another aspect of this embodiment, the layer containing two dimensions is not present on the first surface of the covering nor on the second surface of the covering.

[0201]

[53] An optical element as in any of the above embodiments, wherein the cover has a value of absorbance divided by reflectance of no more than 0.5, preferably no more than 0.25, more preferably no more than 0.1, and most preferably no more than 0.01 for light incident on the second surface, the reflectance and transmittance being measured at a wavelength λ;

[0202] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0203] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0204] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0205] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0206] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0207] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0208] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0209] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0210] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0211] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0212] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0213] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0214] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0215] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0216] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0217] In one aspect of this embodiment, the absorbance and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0218] In one aspect of this embodiment, the absorbance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0219] [53a] An optical element as in any of the above embodiments, wherein the cover has a value of transmittance divided by reflectance of no more than 0.5, preferably no more than 0.25, more preferably no more than 0.1, and most preferably no more than 0.01 for light incident on the second surface, the reflectance and transmittance being measured at a wavelength λ;

[0220] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0221] In one aspect of this embodiment, λ is 532 nm. According to this aspect the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0222] In one aspect of this embodiment, λ is 476 nm. According to this aspect, preferably a blue Kr laser is used for optical measurement.

[0223] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0224] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0225] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0226] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0227] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0228] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0229] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0230] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0231] [53b] An optical element as in any of the above embodiments, wherein the cover has a value of absorbance divided by reflectance of no more than 0.5, preferably no more than 0.25, more preferably no more than 0.1, and most preferably no more than 0.01 for light incident on the second surface, the reflectance and absorbance being measured at a wavelength λ;

[0232] Wherein λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0233] In one aspect of this embodiment, λ is 532 nm. According to this aspect the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0234] In one aspect of this embodiment, λ is 476 nm. According to this aspect, preferably a blue Kr laser is used for optical measurement.

[0235] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0236] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0237] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0238] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0239] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0240] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0241] In one aspect of this embodiment, the reflectivity and absorbance are for light incident on the second surface. In one aspect of this embodiment, the absorbance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0242] In one aspect of this embodiment, the absorbance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0243]

[54] An optical element as in any of the above embodiments, wherein the covering has a thickness of 1 mm or less, preferably 10 μm or less, more preferably 1000 nm or less, more preferably 100 nm or less, more preferably 50 nm or less.

[0244]

[55] An optical element as in any of the above embodiments, wherein the cover has a thickness of 25 μm or more, preferably 69 μm or more, more preferably 100 μm or more. In one aspect of this embodiment, the thickness is 1 nm or more, preferably 3 nm or more, more preferably 5 nm or more, still more preferably 10 nm or more. In another aspect of this embodiment, the thickness is 15 nm or more, preferably 20 nm or more, more preferably 30 nm or more.

[0245]

[56] An optical element as in any of the above embodiments, wherein the covering has a layered form.

[0246]

[57] An optical element as in any of the above embodiments, wherein the component generates an electrostatic force.

[0247]

[58] An optical element as in any of the above embodiments, wherein the member is adapted and configured to generate a potential difference between the cover and the terminal. In one aspect of this embodiment, the terminal is positioned closer to the first surface than to the second surface. In another aspect of this embodiment, the terminal is positioned closer to the second surface than to the first surface. In another aspect of this embodiment, the first terminal is positioned closer to the first surface than to the second surface and the second terminal is positioned closer to the second surface than to the first surface. In one aspect of this embodiment, the terminal is present in the substrate. In one aspect of this embodiment, the terminal is present in the sleeve.

[0248]

[59] An optical element as in any of the above embodiments, wherein the member is adapted and configured to change the pressure in the region of the first substrate. In one aspect of this embodiment, the pressure is gas pressure. In another aspect of this embodiment, the pressure is liquid pressure.

[0249]

[60] An optical element as in any of the above embodiments, wherein in the first cover outline, the first point in the cover is at a first spatial position relative to the support, and in the second cover outline, the first point is at a second spatial position relative to the support, wherein the distance between the first spatial position and the second spatial position is in the range of 0.1 nm to 2000 nm, preferably 1 nm to 1000 nm. In one aspect of this embodiment, it is preferably in the range of 5 nm to 800 nm. In another aspect of this embodiment, it is more preferably in the range of 5 nm to 400 nm. In another aspect of this embodiment, it is more preferably in the range of 1 nm to 100 nm.

[0250]

[61] An optical element as in any of the above embodiments, wherein movement from the first cover profile to the second cover profile changes the height of a point on the cover by an amount in the range of 0.1 nm to 2000 nm, preferably 1 nm to 1000 nm, the height being defined with reference to the plane of the support. In one aspect of this embodiment, the height changes by an amount in the range of 5 nm to 800 nm. In another aspect of this embodiment, the height changes by an amount in the range of 5 nm to 400 nm. In another aspect of this embodiment, the height changes by an amount in the range of 1 nm to 100 nm. In one aspect of this embodiment, the plane of the support is defined by the attachment points between the cover and the support. In another aspect, the plane of the support is a face of the support. In another aspect, the plane of the support is a partial face of the support. In one aspect of this embodiment, the height at multiple points on the covering changes by an amount within the above range, preferably at least 10% of the area of ​​the covering, more preferably at least 50% of the area of ​​the covering, and more preferably at least 80% of the area of ​​the covering.

[0251] In one aspect of this embodiment, the height at multiple points on the covering changes by an amount within the above range, preferably from at least 10% of the area percent of the second surface of the covering from the first covering contour profile, more preferably from at least 50% of the area percent of the second surface of the covering from the first covering contour profile, and more preferably from at least 80% of the area percent of the second surface of the covering from the first covering contour profile.

[0252]

[62] An optical element as in any of the above embodiments, further comprising a substrate having a substrate surface, wherein a portion of the substrate surface is attached to a support member, and the portion preferably does not exceed 60% of the area percentage of the substrate surface, more preferably does not exceed 20% of the area percentage of the substrate surface, and most preferably does not exceed 5% of the area percentage of the substrate surface.

[0253]

[63] An optical element as in embodiment

[62] , wherein the substrate surface, the support member and the first surface are adjacent to one or more cavities, each cavity having a cavity depth equal to the distance of the cavity between the substrate surface and the first surface.

[0254]

[64] An optical element as in embodiment

[63] , wherein the one or more cavities are one or more selected from the following: holes, channels and holes.

[0255]

[65] An optical element as in embodiment

[63] or

[64] , wherein one or more of the cavity depths in the first cover profile is in the range of 0 nm to 5000 nm, preferably in the range of 0 nm to 2000 nm. In one aspect of this embodiment, it is preferably in the range of 0 nm to 1600 nm. In another aspect of this embodiment, it is more preferably in the range of 0 nm to 800 nm. In another aspect of this embodiment, it is more preferably in the range of 0 nm to 200 nm.

[0256]

[66] An optical element as in any of embodiments

[63] to

[65] , wherein the cavity has a first cavity depth in the first cover profile and a second cavity depth in the second cover profile, wherein the difference between the first depth and the second depth is in the range of 0.1 nm to 2000 nm, preferably 1 nm to 1000 nm. In one aspect of this embodiment, it is preferably in the range of 5 nm to 800 nm. In another aspect of this embodiment, it is more preferably in the range of 5 nm to 400 nm. In another aspect of this embodiment, it is more preferably in the range of 1 nm to 100 nm.

[0257]

[67] An optical element as in any one of embodiments

[62] to

[66] , wherein the substrate has one or more of the following:

[0258] a. a transmittance of at least 0.2, preferably at least 0.5, more preferably at least 0.8, most preferably at least 0.9;

[0259] b. a reflectivity lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1; and

[0260] c. an absorbance of at least 0.01, preferably at least 0.1, preferably at least 0.25, most preferably at least 0.5.

[0261] In one aspect of this embodiment, the characteristics satisfied are a combination selected from the group consisting of: a, b, c, a+b, a+c, b+c, and a+b+c.

[0262] In one aspect of this embodiment, the criterion is met for a wavelength λ in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0263] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0264] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0265] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0266] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0267] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0268] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0269] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0270] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0271] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0272] In one aspect of this embodiment, the value of reflectance divided by transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0273] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0274] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0275] In one aspect of this embodiment, the reflectivity, absorbance, and transmittance are for light incident on the substrate surface. In one aspect of this embodiment, the transmittance values, absorbance values, and reflectance values ​​are for light incident on the substrate surface at an angle θ from the normal, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0276]

[68] An optical element as in any one of embodiments

[62] to

[67] , wherein the substrate has one or more of the following:

[0277] a. a transmittance lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1;

[0278] b. a reflectivity lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1; and

[0279] c. an absorbance of at least 0.5, preferably at least 0.8, preferably at least 0.9, most preferably at least 0.95.

[0280] In one aspect of this embodiment, the characteristics satisfied are a combination selected from the group consisting of: a, b, c, a+b, a+c, b+c, and a+b+c.

[0281] In one aspect of this embodiment, the criterion is met for a wavelength λ in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0282] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0283] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0284] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0285] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0286] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0287] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0288] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0289] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0290] In one aspect of this embodiment, the value of transmittance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0291] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0292] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0293] In one aspect of this embodiment, the value of reflectance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0294] In one aspect of this embodiment, the value of reflectance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0295] In one aspect of this embodiment, the value of the reflectance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0296] In one aspect of this embodiment, the value of the reflectance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0297] In one aspect of this embodiment, the reflectivity, absorbance, and transmittance are for light incident on the substrate surface. In one aspect of this embodiment, the transmittance values, absorbance values, and reflectance values ​​are for light incident on the substrate surface at an angle θ from the normal, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0298]

[69] An optical element as in any one of embodiments

[62] to

[67] , wherein the substrate has one or more of the following:

[0299] a. a transmittance lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1;

[0300] b. a reflectivity of at least 0.5, preferably at least 0.8, more preferably at least 0.9, most preferably at least 0.95; and

[0301] c. an absorbance below 0.5, preferably below 0.3, preferably below 0.2, preferably below 0.1.

[0302] In one aspect of this embodiment, the characteristics satisfied are a combination selected from the group consisting of: a, b, c, a+b, a+c, b+c, and a+b+c.

[0303] In one aspect of this embodiment, the criterion is met for a wavelength λ in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0304] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0305] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0306] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0307] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0308] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0309] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0310] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0311] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0312] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0313] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0314] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0315] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0316] In one aspect of this embodiment, the reflectivity, absorbance, and transmittance are for light incident on the substrate surface. In one aspect of this embodiment, the transmittance values, absorbance values, and reflectance values ​​are for light incident on the substrate surface at an angle θ from the normal, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0317]

[70] An optical element as in any one of embodiments

[62] to

[69] , wherein the substrate has a thickness of less than 10 6 Ω·cm, preferably less than 10 -1 Ω·cm, more preferably less than 10 -3 Ω·cm, most preferably less than 10 -5 The resistivity can be as low as 10 -8 Ω·cm, especially when non-superconducting conductors are used. The resistivity can be lower than 10 -8 Ω·cm, especially when using superconducting materials.

[0318]

[71] An optical element as in any one of embodiments

[62] to

[70] , wherein the substrate has a surface layer on the substrate surface comprising one or more two-dimensional materials. In one aspect of this embodiment, the one or more two-dimensional materials are each selected from the list of embodiment

[39] .

[0319]

[72] An optical element as in any one of embodiments

[62] to

[71] , wherein the substrate has a thickness of less than 100 mm, preferably less than 1 mm, more preferably less than 500 μm. In one aspect of this embodiment, preferably less than 100 μm, most preferably less than 1 μm.

[0320]

[73] An optical element as in any of the above embodiments, wherein the support has more than 10 6 Ω·cm, preferably a resistivity exceeding 1010 Ω·cm, more preferably exceeding 1014 Ω·cm, most preferably exceeding 1018 Ω·cm.

[0321]

[74] An optical element as in any one of embodiments [1] to

[72] , wherein the support has a thickness of less than 10 6 Ω·cm, preferably less than 10 -1 Ω·cm, more preferably less than 10 -3 Ω·cm, most preferably less than 10 -5 Resistivity of Ω·cm.

[0322]

[75] An optical element as in any of the above embodiments, wherein the support member has a dielectric strength exceeding 0.05 MV / m, more preferably exceeding 1 MV / m, more preferably exceeding 10 MV / m, more preferably exceeding 20 MV / m, and most preferably exceeding 40 MV / m.

[0323]

[76] An optical element as in any of the above embodiments, wherein the support member has one or more of the following:

[0324] a. a transmittance of at least 0.2, preferably at least 0.5, more preferably at least 0.8, most preferably at least 0.9;

[0325] b. a reflectivity lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1; and

[0326] c. an absorbance of at least 0.01, preferably at least 0.1, preferably at least 0.25, most preferably at least 0.5.

[0327] In one aspect of this embodiment, the characteristics satisfied are a combination selected from the group consisting of: a, b, c, a+b, a+c, b+c, and a+b+c.

[0328] In one aspect of this embodiment, the criterion is met for a wavelength λ in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0329] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0330] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0331] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0332] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0333] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0334] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0335] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0336] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0337] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0338] In one aspect of this embodiment, the value of reflectance divided by transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0339] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0340] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0341] In one aspect of this embodiment, the reflectivity, absorbance, and transmittance are for light incident on the surface of the support. In one aspect of this embodiment, the transmittance value, absorbance value, and reflectance value are for light incident on the surface of the support at an angle θ from the normal, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0342] In one aspect of this embodiment, these absorbance, transmittance, and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0343] [76a] An optical element as in any of the above embodiments, wherein the support member has one or more of the following:

[0344] a. a transmittance lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1;

[0345] b. a reflectivity lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1; and

[0346] c. an absorbance of at least 0.5, preferably at least 0.8, preferably at least 0.9, most preferably at least 0.95.

[0347] In one aspect of this embodiment, the characteristics satisfied are a combination selected from the group consisting of: a, b, c, a+b, a+c, b+c, and a+b+c.

[0348] In one aspect of this embodiment, the criterion is met for a wavelength λ in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0349] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0350] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0351] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0352] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0353] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0354] In one aspect of this embodiment, the value of transmittance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0355] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0356] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0357] In one aspect of this embodiment, the value of reflectance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0358] In one aspect of this embodiment, the value of reflectance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0359] In one aspect of this embodiment, the value of the reflectance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0360] In one aspect of this embodiment, the value of the reflectance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0361] In one aspect of this embodiment, these absorbance, transmittance, and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0362] [76b] An optical element as in any of the above embodiments, wherein the support member has one or more of the following:

[0363] a. a transmittance lower than 0.5, preferably lower than 0.3, preferably lower than 0.2, preferably lower than 0.1;

[0364] b. a reflectivity of at least 0.5, preferably at least 0.8, more preferably at least 0.9, most preferably at least 0.95; and

[0365] c. an absorbance below 0.5, preferably below 0.3, preferably below 0.2, preferably below 0.1.

[0366] In one aspect of this embodiment, the characteristics satisfied are a combination selected from the group consisting of: a, b, c, a+b, a+c, b+c, and a+b+c.

[0367] In one aspect of this embodiment, the criterion is met for a wavelength λ in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 nm to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0368] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0369] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0370] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0371] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0372] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0373] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0374] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0375] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0376] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0377] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0378] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0379] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0380] In one aspect of this embodiment, these absorbance, transmittance, and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0381]

[77] A method for preparing an optical element, comprising the following steps, which can be performed in any order:

[0382] a. Provide support;

[0383] b. attaching a covering to the support, wherein the covering comprises a two-dimensional material;

[0384] c. providing a means for changing the position of the covering relative to the support member;

[0385] wherein the covering has a value of transmittance divided by reflectance of not more than 0.5, preferably not more than 0.25, more preferably not more than 0.1, most preferably not more than 0.01, the reflectance and transmittance being measured at a wavelength λ; and

[0386] Wherein, λ is in the range of 10nm to 20μm, preferably 10nm to 2μm. In one aspect, most preferably 380 to 740nm. In another aspect, more preferably 10nm to 200nm, most preferably 13nm to 193nm. In another aspect, more preferably 700nm to 2000nm, most preferably 850nm to 1550nm.

[0387] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0388] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0389] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0390] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0391] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0392] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0393] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0394] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0395] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0396] In one aspect of this embodiment, the value of reflectance divided by transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0397] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0398] In one aspect of this embodiment, the value of the reflectivity divided by the transmittance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0399] In one aspect of this embodiment, the value of transmittance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0400] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0401] In one aspect of this embodiment, the value of the transmittance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0402] In one aspect of this embodiment, the value of reflectance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0403] In one aspect of this embodiment, the value of reflectance divided by absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0404] In one aspect of this embodiment, the value of the reflectance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0405] In one aspect of this embodiment, the value of the reflectance divided by the absorbance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0406] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0407] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0408] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0409] In one aspect of this embodiment, the value of absorbance divided by reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0410] In one aspect of this embodiment, the transmittance values ​​and reflectance values ​​are for light incident at an angle θ from the normal to the contact plane, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°. The contact plane is defined by the contact points between the first surface and the support. In one aspect, the contact plane is the root mean square fit to the contact points.

[0411] In one aspect of this embodiment, the covering includes an amorphous portion, a metallic portion, or an additive portion, or a combination thereof, as described elsewhere.

[0412] In one embodiment, the two-dimensional material is one or more selected from the list of embodiments

[39] .

[0413] In one aspect of this embodiment, step b) comprises the following:

[0414] B1) forming a two-dimensional material on the support;

[0415] B2) Applying one or more further materials to the two-dimensional material to obtain a covering.

[0416] In one aspect of this embodiment, step b) comprises the following:

[0417] B1) providing two-dimensional materials;

[0418] B2) attaching the two-dimensional material to the support;

[0419] B3) Applying one or more other materials to the two-dimensional material to obtain a covering.

[0420] In one aspect of this embodiment, step b) comprises the following:

[0421] B1) providing two-dimensional materials;

[0422] B2) applying one or more other materials to the two-dimensional material to obtain a covering;

[0423] B3) Attaching the cover to the support.

[0424] In one aspect of this embodiment, the attaching in step b. comprises applying the support member to the covering, preferably forming the support member on the covering.

[0425]

[78] A method as in embodiment

[77] , comprising the step of removing a portion of the support member.

[0426]

[79] An optical element, which can be obtained by the method of embodiment

[78] .

[0427]

[80] A device comprising an optical element as described in any one of embodiments [1] to

[76] or

[79] .

[0428]

[81] The device of embodiment

[80] , wherein the device is one or more selected from the following: an adjustable optical mirror, an adjustable optical reflection and / or transmission diffuser, an adjustable optical reflection and / or transmission diffraction grating, an adjustable optical reflection and / or transmission filter, an adjustable optical reflection and / or transmission modulator, an adjustable optical reflection and / or transmission collector, an adjustable optical reflection and / or transmission lens, an adjustable mirror, an adjustable light sail, an adjustable holographic imager, an adjustable attenuator, an adjustable beam splitter, an adjustable beam shifter, an adjustable optical refractor, an adjustable optical switch, an adjustable zone plate, an adjustable wave plate, Adjustable shutters, adjustable apertures, adjustable phase modulators, adjustable microdisplays, adjustable image sensors, adjustable camera sensors, adjustable spectrometers, adjustable light concentrators, adjustable light components for LiFi wireless communications, adjustable light components for LIDAR systems, adjustable light components for gas filtration, adjustable light components for liquid filtration, adjustable light components for reverse osmosis, adjustable light components for metrology, adjustable light components for medical technology, adjustable light components for windmills, adjustable quantum sensors, adjustable radiometers, adjustable solar panels, adjustable sunshades and adjustable windows.

[0429] [81a] A device as in embodiment

[80] , wherein the device is one or more selected from the following: an adjustable optical mirror, an adjustable optical reflection and / or transmission diffuser, an adjustable optical reflection and / or transmission diffraction grating, an adjustable optical reflection and / or transmission filter, an adjustable optical reflection and / or transmission modulator, an adjustable optical reflection and / or transmission collector, an adjustable optical reflection and / or transmission lens, an adjustable mirror, an adjustable light sail, an adjustable holographic imager, an adjustable attenuator, an adjustable beam splitter, an adjustable beam shifter, an adjustable optical refractor, an adjustable optical switch, an adjustable zone plate, an adjustable wave plate, an adjustable shutter , adjustable aperture, adjustable phase modulator, adjustable microdisplay, adjustable image sensor, adjustable camera sensor, adjustable spectrometer, adjustable light concentrator, adjustable light component for LiFi wireless communication, adjustable light component for LIDAR systems, adjustable light component for gas filtration, adjustable light component for liquid filtration, adjustable light component for reverse osmosis, adjustable light component for metrology, adjustable light component for medical technology, adjustable light component for windmills, adjustable microphone, adjustable loudspeaker, adjustable quantum sensor, adjustable radiometer, adjustable solar panel, adjustable sunshade and adjustable window.

[0430]

[82] Use of a coated two-dimensional material in an adjustable optical device.

[0431]

[83] A use of a coated two-dimensional material in a tunable optical device for increasing the operating frequency.

[0432]

[84] A use of a coated two-dimensional material for reducing the mass of a tunable optical device.

[0433]

[85] A use of a coated two-dimensional material to increase the mechanical strength of a tunable optical device.

[0434]

[86] A use of a coated two-dimensional material to increase the durability of an adjustable optical device.

[0435]

[87] A use of a coated two-dimensional material for reducing power consumption of an adjustable optical device.

[0436]

[88] A use of a coated two-dimensional material for increasing the reflectivity of a tunable optical device.

[0437]

[89] A use of a coated two-dimensional material to increase the thrust of a photoresponsive device, preferably a light sail.

[0438]

[90] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] , for increasing the operating frequency of an adjustable optical device.

[0439]

[91] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] , for reducing the mass of an adjustable optical device.

[0440]

[92] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] , for improving the mechanical strength of an adjustable optical device.

[0441]

[93] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] , for improving the durability of an adjustable optical device.

[0442]

[94] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] , for reducing the power consumption of an adjustable optical device.

[0443]

[95] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] , for improving the reflectivity of an adjustable optical element.

[0444]

[96] A use of an optical element as in any one of embodiments [1] to

[76] or

[79] for increasing the thrust of a photoresponsive device, preferably a light sail.

[0445] Other uses of the optical element or device according to the invention are one or more of the following:

[0446] Increase heat conduction

[0447] Increase dynamic range

[0448] Wavelength control and large continuous tunability

[0449] Angle control and large continuous tunability

[0450] Increase data transmission bandwidth

[0451] Reduce manufacturing complexity

[0452] Increase the uniformity of the effect

[0453] Increase thermal stability.

[0454] Further uses of the coated two-dimensional material according to the invention are one or more of the following:

[0455] Increase heat conduction

[0456] Increase dynamic range

[0457] Wavelength control and large continuous tunability

[0458] Angle control and large continuous tunability

[0459] Increase data transmission bandwidth

[0460] Reduce manufacturing complexity

[0461] Increase the uniformity of the effect

[0462] Increase thermal stability.

[0463] Average density

[0464] Average density is provided for layered objects in this article. Average density is expressed as mass per unit area. Average density is calculated by taking the sum of the mass over the entire area and dividing by the area.

[0465] The average density of an object is the mass of the object divided by its area.

[0466] The average density of an object's components is the total mass of the object's components divided by the area of ​​the object.

[0467] wavelength

[0468] The wavelengths presented herein are vacuum wavelengths, ie, the wavelength that the radiation would have if it traveled in a vacuum.

[0469] Optical Components

[0470] Preferred optical elements according to the present invention are adapted and configured to have adjustable scattering properties, reflective properties, interference properties or combinations thereof. Preferred optical elements present a surface, wherein the scattering, reflective or interference behavior of the surface is adjustable. Preferred optical elements have a cover, a support and a member, wherein the member is adapted and adjusted to move the cover.

[0471] Covering

[0472] The optical element comprises a covering. The covering is adjustable, in particular to allow the scattering, reflection and / or interference properties of the optical element to be adjustable.

[0473] Preferred coverings are thin layers. Preferred coverings have a two-dimensional laminar extension and a thickness in two dimensions perpendicular to the laminar extension. Preferred coverings have a laminar area that is at least 25 times the square of the thickness, preferably at least 1000 times, more preferably at least 10000 times. The thin layer may have a substantially planar form. The thin layer may have a non-planar form.

[0474] The covering has a first surface and a second surface. Preferably, the first surface and the second surface are two sides of the thin layer.

[0475] The covering is attached to the support via the first surface. Preferably, the attachment of the covering to the support is at a point or line on the first surface or a combination of both. In one embodiment, the attachment of the covering to the support comprises a point having a 1 mm 2 In one embodiment, the attachment of the covering to the support comprises a line having a thickness of 1 mm or less. This line may be straight or deviated.

[0476] Preferably, the covering is flexible. Preferably, the covering is flexible enough to allow a point on its surface to be movable between two positions that are at least 10 nm, preferably at least 50 nm, more preferably at least 100 nm apart.

[0477] The spatial position of the covering defines the profile of the covering relative to the support. The support acts as a reference frame for the spatial position of the points in the covering. The covering profile is defined by the spatial position of each point in the covering relative to the support. The covering profile determines the shape of the covering. The covering profile is described in terms of the second surface, but can be equivalently described in terms of the first surface. The second surface can remain parallel to the first surface.

[0478] In one embodiment, the cover is movable so that part of the cover moves without changing its orientation, preferably at least 10 area percent, more preferably at least 20 area percent, more preferably at least 50 area percent of the cover. Preferably, this movement corresponds to an up and down movement of the flat part of the cover.

[0479] The covering may include one or more layers, preferably two or more layers. In one embodiment, the covering includes a layer containing two dimensions, and the layer containing two dimensions includes one or more two-dimensional materials, preferably one or more two-dimensional materials. In one embodiment, the covering includes another layer that is not a layer containing two dimensions. In one embodiment, preferably the other layer is farther away from the support than the layer containing two dimensions. Preferably, the other layer is a deposited layer, preferably a layer of material deposited on the layer containing two dimensions. In another embodiment, preferably the other layer is closer to the support than the layer containing two dimensions. In another embodiment, the other layer is surrounded by the layer containing two dimensions, and one layer containing two dimensions is closer to the support than the other layer surrounded. In another aspect of this embodiment, two other layers surround the layer containing two dimensions, and one other layer is closer to the support than the layer containing two dimensions.

[0480] In one embodiment, the covering comprises less two-dimensional material than other materials, preferably less than 10 weight percent of the covering is two-dimensional material, preferably less than 1 weight percent, more preferably less than 0.1 weight percent.

[0481] Covering outline shape

[0482] The cover contour is defined by the spatial position of all points in the second surface relative to the support. The cover contour describes the surface shape. The portion of the cover attached to the support does not move relative to the support. This portion is in the same position relative to the support in each cover contour.

[0483] In one embodiment, the support member presents a partial surface. The partial surface is a surface with a partial missing portion. The missing portion can be a point, a line, a surface or a combination thereof. The preferred point has a 1mm 2 or less surface area. Preferably the wire has a thickness of 1 mm or less. In one aspect of this embodiment, the local surface is a local planar surface. In one aspect of this embodiment, the local surface is a local non-planar surface. In one aspect of this embodiment, the covering is attached to the entire local surface of the support.

[0484] In one aspect of the invention, the optical element includes a substrate, a depth is defined between a cover and the substrate, and the cover has a contour that is a configuration of the depth.

[0485] The covering is moved between the covering contours by moving one or more points in the covering relative to the support. The movement between the covering contours may include changing one or more depths. The movement between the covering contours may include bending one or more span portions.

[0486] The cover outline shape describes the orientation of the cover. The normal at a point on the cover can be at different angles in different cover outline shapes.

[0487] The height of a point in the covering is defined relative to the plane of the support. In one embodiment, the support is layered, having a first surface in contact with the covering and an opposing second surface. In one aspect of this embodiment, the height is measured relative to the first surface of the support and in a direction perpendicular thereto. In another aspect of this embodiment, the height is measured relative to the second surface of the support and in a direction perpendicular thereto. In one aspect of this embodiment, the support is a thin layer with missing portions.

[0488] In one embodiment, movement between cover outline contours changes the height of one or more points in the cover.

[0489] Support

[0490] A support is something to which the covering is attached, in particular, something attached over part of the first surface. A preferred support is rigid. A preferred support is non-flexible. A preferred support constitutes a reference relative to which the spatial position of the covering is defined.

[0491] Preferably the support presents a partial surface to which the covering is attached.

[0492] The support may be prepared by providing support material, preferably in the form of a thin layer, and removing a portion of the support material. Removing a portion of the support material preferably results in a support having a localized surface.

[0493] The support may be provided by incomplete deposition of a thin layer of the support. The support may be applied as a localized thin layer to a two-dimensional layer or covering.

[0494] In one embodiment, the support comprises one or more tubular columns. In another embodiment, the support comprises one or more walls.

[0495] The support member can be made of many materials, and a person skilled in the art can select the material that he deems suitable. Preferably, the material is one or more selected from the following:

[0496] one or more amorphous materials;

[0497] one or more crystalline materials;

[0498] one or more polymers;

[0499] one or more composite materials;

[0500] One or more glasses; and

[0501] One or more semiconductors.

[0502] A group of preferred amorphous materials is one or more elements selected from the following: Ag, Al, Au, B, Ba, Be, Bi, C, Ca, Cr, Cs, Co, Cu, Fe, Ga, Ge, H, Hf, Hg, In, Ir, K, Mg, Mn, Mo, Na, Nb, Ni, Li, Ti, Os, P, Pb, Pd, Pt, Re, Rh, Ru, S, Sb, Sc, Se, Si, Sn, Sr, Ta, Te, V, W, Zr and Zn. Other preferred amorphous materials are one or more combinations of two or more of the above elements, preferably alloys, or compounds of these elements with chalcogens (O, S, Se, Te), N or C. Preferred C is amorphous C. Preferred Si is amorphous Si. The preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). The preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4). The preferred combination of Ga and N in this context is amorphous gallium nitride (GaN). The preferred combination of In, Sn, Zn and O is amorphous indium tin oxide (ITO), amorphous indium zinc oxide (IZO), amorphous zinc oxide (ZnO) and amorphous indium tin zinc oxide (ITZO).

[0503] A more preferred group of preferred amorphous materials is one or more elements selected from the following: Ag, Al, Au, B, Ba, C, Ca, Cr, Cs, Co, Cu, Fe, Ga, Ge, Hf, In, K, Mg, Mn, Mo, Na, Nb, Ni, Li, Ti, P, Pb, Pd, Pt, S, Sb, Se, Si, Sn, Sr, Ta, Te, V, W, Zr and Zn. Other preferred amorphous materials are one or more combinations of two or more of the above elements, preferably alloys, or compounds of these elements with chalcogens (O, S, Se, Te), N or C. Preferred C is amorphous C. Preferred Si is amorphous Si. The preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). The preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4). The preferred combination of Ga and N in this context is amorphous gallium nitride (GaN). Preferred combinations of In, Sn, Zn and O are amorphous indium tin oxide (ITO), amorphous indium zinc oxide (IZO), amorphous zinc oxide (ZnO) and amorphous indium tin zinc oxide (ITZO).

[0504] Preferred crystalline materials are one or more selected from the group consisting of diamond, c-BN, h-BN, and crystalline oxides.

[0505] Preferred crystalline oxides in this context are selected from one or more of the following: SiO2, SiC, Si3N4, GaN, AlN, Al2O3, BaO and TiO2.

[0506] Preferred crystalline oxides and nitrides in this context are one or more selected from the group consisting of SiO2, SiC, Si3N4, GaN, AlN, Al2O3, BaO and TiO2.

[0507] Preferred polymers are one or more selected from the group consisting of polyethylene, polystyrene, polycarbonate, polyvinyl alcohol, polymethyl methacrylate, polyimide, polyethylene terephthalate, polyethylene naphthalate, polytetrafluoroethylene, poly(3,4-ethylenedioxythiophene) (PEDOT), polystyrene sulfonate (PSS) and PEDOT:PSS (poly(3,4-ethylenedioxythiophene) styrene sulfonate).

[0508] The preferred polymer may be a photoresist polymer. One preferred polymer is a negative photoresist polymer. Another preferred polymer is a positive photoresist polymer.

[0509] Preferred composite materials are polymer matrices comprising one or more selected from the group consisting of nanoparticles, quantum dots, carbon nanotubes, silver nanowires and nanosheets. Preferred nanosheets are selected from the list proposed for two-dimensional materials.

[0510] Preferred glasses are one or more selected from the group consisting of ultra-thin flexible glass and spin-on glass.

[0511] Preferred semiconductors are single element semiconductors or compound semiconductors. Preferred single element semiconductors are selected from one or more of the following: Si, Ge and Sn. Preferred compounds in this context are selected from one or more of the following: GaAs, GaN, GaP, CdS, PbS, BP, MoS2, MoSe2, MoTe2, WS2, WSe2, WTe2, NbS2, NbSe2, NbTe2, TaS2, TaSe2, TaTe2, TiSe2, VSe2, CrS2 and CrSe2. Doped forms of the above semiconductors are also preferred.

[0512] Preferably, the support is a local thin layer. Preferably, the local thin layer provides one or more voids over which no cover is attached to the support. The voids define spans of the cover which are movable. In the presence of a substrate, the voids create cavities.

[0513] In one embodiment, the support has one or more perforations. Preferably, the perforations create separate cavities. Preferably, the perforations create span sections that are enclosed areas.

[0514] In one embodiment, the support has one or more channels. Preferably, the channels create a straight cavity. Preferably, the channels create a span portion of the extended strip.

[0515] In one embodiment, the support is a screen or a grid or a system of channels. In one aspect of this embodiment, the support creates a network of connected cavities. In one aspect of this embodiment, the support creates a network of connections of span sections.

[0516] In one embodiment, the support comprises one or more pores. Preferably, the pores may be empty (vacuum) or filled. Preferably, the filling material is one or more selected from liquids (preferably water, solutions and liquid crystals) and gases (preferably air, N2, Ne and SF6).

[0517] In one embodiment, the support preferably has a low packing ratio. The packing ratio is the mass of the support divided by the theoretical mass of a support of the same material without pores. The packing ratio is preferably 70% or less, more preferably 40% or less, most preferably 35% or less. In one aspect of this embodiment, the packing ratio is 25% or less, preferably 5% or less. One aspect of this embodiment is a light sail.

[0518] In one embodiment, the support has a thickness of 500 μm or less, preferably 10 μm or less, preferably 2 μm or less. In one aspect, the thickness is 1600 nm or less. In another aspect, the thickness is 800 nm or less. In one aspect, the thickness is 200 nm or less.

[0519] In one embodiment, the support is formed directly on the substrate surface. In another embodiment, the support is applied and formed on a cover.

[0520] In one embodiment, the support is formed on the substrate by thermal oxidation. In another embodiment, the support is deposited on a cover and then patterned. In another embodiment, the support is deposited on a cover, then patterned, and then transferred to the substrate.

[0521] substrate

[0522] In one aspect of the invention, the optical element comprises a substrate. Preferably the substrate is attached to a support. Preferably the substrate holds the support in a fixed position relative to the substrate. Preferably the substrate defines a plane relative to which the height is measured. In the presence of the substrate, the height determines the interference behavior.

[0523] The substrate can be made of many materials, and a person skilled in the art can select the material that he deems suitable. Preferred materials are one or more selected from the following:

[0524] one or more amorphous materials;

[0525] one or more crystalline materials;

[0526] one or more polymers;

[0527] one or more composite materials;

[0528] One or more glasses; and

[0529] One or more semiconductors.

[0530] One group of preferred amorphous materials is one or more elements selected from the group consisting of Ag, Al, Au, B, Ba, Be, Bi, C, Ca, Cr, Cs, Co, Cu, Fe, Ga, Ge, H, Hf, Hg, In, Ir, K, Mg, Mn, Mo, Na, Nb, Ni, Li, Ti, Os, P, Pb, Pd, Pt, Re, Rh, Ru, S, Sb, Sc, Se, Si, Sn, Sr, Ta, Te, V, W, Zr and Zn. Other preferred amorphous materials are one or more combinations of two or more of the above elements, preferably alloys, or compounds of one or more of the above elements with chalcogens (O, S, Se, Te), N or C. Preferred C is amorphous C. Preferred Si is amorphous Si. A preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). A preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4). The preferred combination of Ga and N in this context is amorphous gallium nitride (GaN). The preferred combination of In, Sn, Zn and O is amorphous indium tin oxide (ITO), amorphous indium zinc oxide (IZO), amorphous zinc oxide (ZnO) and amorphous indium tin zinc oxide (ITZO).

[0531] A more preferred group of preferred amorphous materials is one or more selected from the following: Ag, Al, Au, B, Ba, C, Ca, Cr, Cs, Co, Cu, Fe, Ga, Ge, Hf, In, K, Mg, Mn, Mo, Na, Nb, Ni, Li, Ti, P, Pb, Pd, Pt, S, Sb, Se, Si, Sn, Sr, Ta, Te, V, W, Zr and Zn. Other preferred amorphous materials are one or more combinations of two or more of the above elements, preferably alloys, or compounds of one or more of the above elements with chalcogens (O, S, Se, Te), N or C. Preferred C is amorphous C. Preferred Si is amorphous Si. The preferred combination of Si and O in this context is amorphous silicon dioxide (SiO2). The preferred combination of Si and N in this context is amorphous silicon nitride (Si3N4). The preferred combination of Ga and N in this context is amorphous gallium nitride (GaN). Preferred combinations of In, Sn, Zn and O are amorphous indium tin oxide (ITO), amorphous indium zinc oxide (IZO), amorphous zinc oxide (ZnO) and amorphous indium tin zinc oxide (ITZO).

[0532] Preferred crystalline materials are one or more selected from the group consisting of diamond, c-BN, h-BN, and crystalline oxides.

[0533] Preferred crystalline oxides in this context are selected from one or more of the following: SiO2, SiC, Si3N4, GaN, AlN, Al2O3, BaO and TiO2.

[0534] Preferred crystalline materials are one or more selected from the group consisting of diamond, c-BN, h-BN, crystalline oxides and nitrides.

[0535] Preferred crystalline oxides or nitrides in this context are one or more selected from the group consisting of SiO2, SiC, Si3N4, GaN, AlN, Al2O3, BaO and TiO2.

[0536] Preferred polymers are one or more selected from the group consisting of polyethylene, polystyrene, polycarbonate, polyvinyl alcohol, polymethyl methacrylate, polyimide, polyethylene terephthalate, polyethylene naphthalate, polytetrafluoroethylene, poly(3,4-ethylenedioxythiophene) (PEDOT), polystyrene sulfonate (PSS) and PEDOT:PSS (poly(3,4-ethylenedioxythiophene) styrene sulfonate).

[0537] Preferred composite materials are polymer matrices comprising one or more selected from the group consisting of nanoparticles, quantum dots, carbon nanotubes, silver nanowires and nanosheets. Preferred nanosheets are selected from the list proposed for two-dimensional materials.

[0538] Preferred glasses are one or more selected from the group consisting of ultra-thin flexible glass and spin-on glass.

[0539] Preferred semiconductors are single element semiconductors or compound semiconductors. Preferred single element semiconductors are selected from one or more of the following: Si, Ge and Sn. Preferred compounds in this context are selected from one or more of the following: GaAs, GaN, GaP, CdS, PbS, BP, MoS2, MoSe2, MoTe2, WS2, WSe2, WTe2, NbS2, NbSe2, NbTe2, TaS2, TaSe2, TaTe2, TiSe2, VSe2, CrS2 and CrSe2. Doped forms of the above semiconductors are also preferred.

[0540] In one embodiment, the substrate and the support may be a single integrated part. In one embodiment, the substrate and the support may be the same material.

[0541] Cavity and span sections

[0542] Only a portion of the covering is attached to the support. The other portion of the covering is not attached to the support. The portion of the covering not attached to the support allows the covering to be bent, preferably in a direction perpendicular to the plane defined by the support. The portion of the covering not attached to the support constitutes the span portion. The span portion can be bent. The position and shape of the span portion can be changed.

[0543] In case the optical element has a substrate, the cavity is defined by the cover, in particular the span portion.

[0544] Two-dimensional part

[0545] The cover comprises a two-dimensional portion having one or more two-dimensional materials. Preferably, the two-dimensional materials provide strength to the cover. Preferably, the two-dimensional materials are adapted and configured to support one or more deposited materials, preferably supporting a mass at least 10 times their own mass.

[0546] Two-dimensional materials are known to those skilled in the art and they may select suitable two-dimensional materials to implement the present invention.

[0547] Preferred two-dimensional materials are monolayer materials. Preferred two-dimensional materials are crystals. Preferred two-dimensional materials are monolayers of atoms, preferably monolayers of covalently bonded atoms. Preferred two-dimensional materials are monolayers of atoms.

[0548] Another preferred two-dimensional material is an amorphous monolayer, preferably a monolayer of amorphous carbon or amorphous boron nitride.

[0549] In one embodiment, the two-dimensional material is a 2D list selected from the following: C, BN, P, MoS2, MoSe2, MoTe2, WS2, WSe2, WTe2, GaS, GaSe, GaTe, NbS2, NbSe2, NbTe2, TaS2, TaSe2, TaTe2, TiSe2, VSe2, CrS2, CrSe2, B, Ge, Si, Si2BN, Sn, Pb, PtS2, PtSe2, PtTe2, Sb, Bi. Preferred C in this context is one or more selected from the following: graphene (one or more graphite layers) and graphyne; preferably graphene. Preferred BN in this context is h-BN. Preferred P in this context is black phosphorus or phosphorene. Preferred B in this context is borophene. Preferred Ge in this context is germanene. Preferred Si in this context is silicene. Preferred Sn in this context is stanene. Preferred Pb in this context is plumbene. Preferred Sb in this context is antimonene. Preferred Bi in this context is bismuthene.

[0550] In one embodiment, the two-dimensional material is a transition metal chalcogenide listed in the non-2D list.

[0551] In one embodiment, the two-dimensional material is an oxide of a member of the 2D list.

[0552] In one embodiment, the two-dimensional material is an atomically intercalated variant of a member of the 2D list.

[0553] In one embodiment, the two-dimensional material is a physically, chemically, mechanically and / or electromagnetically functionalized derivative of a member of the 2D list. Preferably, the physical functionalization is perforation or atom arresting treatment. Preferably, the mechanical functionalization is stretching or pressing. Preferably, the electromagnetic functionalization is applying voltage.

[0554] In one embodiment, the two-dimensional material is graphene or a derivative thereof.

[0555] In one embodiment, the two-dimensional material is boron nitride or a derivative thereof.

[0556] One preferred type of two-dimensional material is a continuous sheet.The continuous sheet preferably has an area of ​​at least 10%, more preferably at least 50%, more preferably at least 80% of the area of ​​the covering, most preferably the entire area of ​​the covering.

[0557] In one embodiment, the continuous sheet is prepared by deposition onto a surface.

[0558] Another preferred type of two-dimensional material is a composite sheet. The composite sheet preferably comprises 2 or more, preferably 20 or more, more preferably 100 or more sub-sheets of two-dimensional material. The sub-sheets are preferably attached together, preferably by van der Waals forces. Preferably the preparation of the composite sheet comprises cutting the two-dimensional material. Preferably the preparation of the composite sheet comprises curing. Preferably the composite sheet comprises a polymer.

[0559] Preferred composite sheets are obtained by ball milling, mechanical cutting, solvent exfoliation, sonication, or a combination of any of them.

[0560] In one embodiment, the composite sheet is applied to the surface as a mixture of 2 or more sheets of a two-dimensional material and one or more polymers.

[0561] In one embodiment, the two-dimensional portion is formed directly on the surface of the support. In another embodiment, the two-dimensional portion is formed before being attached to the support.

[0562] In one embodiment, the two-dimensional portion is formed on a support by chemical vapor deposition. In another embodiment, the two-dimensional portion is formed on a precursor by chemical vapor deposition and then transferred to a support. In another embodiment, multiple portions of the two-dimensional material are provided in a fluid. The fluid may also include a polymer. In one aspect of this embodiment, the fluid is applied to a support and cured to form a composite two-dimensional material. In one aspect of this embodiment, the fluid is applied to a precursor and cured to form a composite two-dimensional material.

[0563] Covering ingredients

[0564] Preferably, the covering includes a covering component in addition to the two-dimensional portion.Preferred covering components increase the reflectivity of the covering, preferably sufficiently to fall within the scope of the first embodiment.

[0565] In one embodiment, the covering comprises an amorphous material.

[0566] In another embodiment, the covering comprises metal.

[0567] In another embodiment, the covering comprises one or more additives as listed in the Examples.

[0568] The categories of amorphous materials, metals, and additives are not mutually exclusive.

[0569] In one embodiment, the amorphous material is a metal.

[0570] In one embodiment, the additive material is a metal.

[0571] In one embodiment, metal is the additive material.

[0572] In one embodiment, the layer containing an amorphous substance is a metal-containing layer.

[0573] In one embodiment, the layer containing the amorphous substance is a layer containing an additive.

[0574] In one embodiment, the additive-containing layer is a metal-containing layer.

[0575] The one or more other components of the covering are preferably present in an amount sufficient for a transmittance divided by reflectance value of less than 0.5.

[0576] The covering may be in two or more layers. Adjacent layers preferably have different chemical compositions. The covering may include one or more two-dimensional containing layers. The covering may include one or more layers of non-two-dimensional containing layers, preferably selected from one or more of the following: a metal-containing layer, a layer containing an amorphous substance, and a layer containing an additive.

[0577] In one embodiment, the layer on the first surface of the covering is a two-dimensional layer. In another embodiment, the layer on the first surface of the covering is a layer other than a two-dimensional layer.

[0578] In one embodiment, the layer on the second surface of the covering is a two-dimensional layer. In another embodiment, the layer on the second surface of the covering is a layer other than a two-dimensional layer.

[0579] Photoresponsive devices

[0580] Another contribution to overcoming one or more of the disadvantages of the prior art is made by a photoresponsive device, preferably a light sail. A contribution is made by an optical element comprising:

[0581] i. a covering having a first surface and a second surface, and

[0582] j. Support members;

[0583] in:

[0584] The cover is oriented with the first surface facing the support;

[0585] A portion of the first surface is attached to the support, the portion preferably not exceeding 70% by area of ​​the first surface, more preferably not exceeding 40% by area of ​​the first surface, most preferably not exceeding 35% by area of ​​the first surface;

[0586] The spatial configuration of the second surface relative to the support defines a cover profile;

[0587] The optical element is adapted and configured to move the second surface from a first cover profile to another cover profile responsive to incident radiation;

[0588] The covering includes a two-dimensional portion, the two-dimensional portion being one or more two-dimensional materials;

[0589] The covering has a value of transmittance divided by reflectance for light incident on the second surface of no more than 0.5, preferably no more than 0.25, more preferably no more than 0.1, and most preferably no more than 0.01, the reflectance and transmittance being measured at a wavelength λ; and

[0590] λ is in the range of 10 nm to 20 μm, preferably 10 nm to 2 μm. In one aspect, most preferably 380 to 740 nm. In another aspect, more preferably 10 nm to 200 nm, most preferably 13 nm to 193 nm. In another aspect, more preferably 700 nm to 2000 nm, most preferably 850 nm to 1550 nm.

[0591] In one aspect of this embodiment, λ is 532 nm. According to this aspect, the optical measurement is preferably performed using a frequency-doubled Nd YAG laser.

[0592] In one aspect of this embodiment, λ is 476 nm. According to this aspect, the optical measurement is preferably performed using a blue Kr laser.

[0593] In one aspect of this embodiment, λ is 594 nm. According to this aspect, preferably a yellow He-Ne laser is used for optical measurement.

[0594] In one aspect of this embodiment, λ is 647 nm. According to this aspect, the optical measurement is preferably performed using a red Kr laser.

[0595] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 10 nm to 2 μm, preferably for all wavelengths in the range of 10 nm to 20 μm.

[0596] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, most preferably 0.01 for all wavelengths λ in the range of 380 nm to 740 nm.

[0597] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 13nm to 193nm, preferably for all wavelengths in the range of 10nm to 200nm.

[0598] In one aspect of this embodiment, the value of the transmittance divided by the reflectance is 0.5 or less, preferably 0.25 or less, more preferably 0.1 or less, and most preferably 0.01 for all wavelengths λ in the range of 850nm to 1550nm, preferably for all wavelengths in the range of 700nm to 2000nm.

[0599] In one aspect of this embodiment, the cover and support member interface with one or more open cavities. Preferably the one or more open cavities each have an opening, the opening and the cover being on opposite sides of the cavity.

[0600] In one aspect of this embodiment, the reflectivity and transmittance are for light incident on the second surface. In one aspect of this embodiment, the transmittance values ​​and reflectivity values ​​are for light incident at an angle θ from the normal to the second surface, θ being in the range of 0 to 85°. In one aspect, θ is 0°. In another aspect, θ is 15°. In another aspect, θ is 30°. In another aspect, θ is 45°. In another aspect, θ is 60°. In another aspect, θ is 75°.

[0601] Method for preparing an optical element In one embodiment, the method for preparing an optical element comprises the following steps:

[0602] a. Provide support;

[0603] b. attaching a covering to a support, wherein the covering comprises a two-dimensional material;

[0604] c. providing a means for changing the position of the covering relative to the support;

[0605] The method may comprise the step of providing a substrate. The substrate is preferably provided before providing the support. The support may be applied to the substrate.

[0606] The method may comprise the step of removing a portion of the support. Preferred ways of removing a portion of the support are laser drilling, physical bombing and chemical etching.

[0607] The covering may be formed in situ or attached to the support.

[0608] Component array

[0609] The present invention may be employed in a device comprising a plurality of movable cover portions, preferably the cover portions being independently movable. In one aspect of this embodiment, the device may comprise a plurality of cavities. In another aspect of this embodiment, the cover may comprise a plurality of span portions. In one aspect of this embodiment, the device may comprise up to 1.4×10 12 independently movable parts, or up to 2.5×10 12 or up to 5.5×10 10 or up to 1.6×10 10 , or up to 9×10 8 or up to 4×10 8 or up to 2.3×10 8 indivual.

[0610] The present invention may be employed in a pixel-based display device.

[0611] casing

[0612] The optical elements and devices of the present invention may include a sleeve. The preferred sleeve provides mechanical protection. In one embodiment, the sleeve provides a seal, preferably a gas seal. The sleeve can be used as a terminal of the component.

[0613] Test Method

[0614] Reflectance, Transmittance and Absorbance

[0615] Reflectance, transmittance and absorbance are measured by directing a laser on the surface. Depending on the wavelength tested, the laser is selected from the following list:

[0616] For λ=532nm: frequency-doubled Nd YAG laser.

[0617] For λ=476nm: blue Kr laser.

[0618] For λ=594nm: yellow He-Ne laser.

[0619] For λ=647nm: red Kr laser. BRIEF DESCRIPTION OF THE DRAWINGS

[0620] The invention will now be further illustrated using the accompanying drawings. These drawings are intended to illustrate and not limit the scope of the invention.

[0621] Figure 1 showing a cross-sectional view of an optical element;

[0622] Figure 2 showing a cross-sectional view of an optical element;

[0623] Figure 3The stack is shown before the support material is removed;

[0624] Figure 4 Displays a device with a channel;

[0625] Figure 5 showing a device having a hole;

[0626] Figure 6 Shows the support columns on the base plate;

[0627] Figure 7 showing a cross-sectional view of an optical element;

[0628] Figure 8 A flow chart showing a process for making an optical device;

[0629] Fig. 9 Shows the interaction of light with a flat covering;

[0630] Fig.10 Shows the interaction of light with a convex covering;

[0631] Fig.11 Shows the interaction of light with a concave covering;

[0632] Fig.12 Shows interference interaction with a flat overlay;

[0633] Fig.13 Shows interference interaction with convex coverings;

[0634] Fig.14 Shows interference interaction with concave coverings;

[0635] Fig.15 Describe the position in terms of vector, altitude, and depth;

[0636] Fig.16a and 16b Displays the configuration of the cross supports;

[0637] Fig.17a and 17b Display wearable display device;

[0638] Fig.18 Schematic showing an optical setup with tunable pixels. DETAILED DESCRIPTION

[0639] Figure 1A cross-sectional view of an optical element is shown. The optical element has a cover 101 with a first surface 102 and another surface 103. The cover 101 is attached to a support 104, in this case 3 columns. The attachment covers only a portion of the first surface 102 and is attached at a point 105 on the support. The portion of the cover 101 between the contact points 105 on the support 104 is free to bend and is called the span portion. The cover profile is flat.

[0640] Figure 2 Display and Figure 1 A cross-sectional view of the same optical element in FIG. 1 has been employed to bend the cover 101 at the span portion away from the support 104. The cover profile has a peak away from the support 104.

[0641] Figure 3 The stack is shown before the support material is removed. The stack has a substrate 106 on which a support material 301 has been applied. On the support material 301 a cover 101 has been applied.

[0642] Figure 4 Displays devices with channels. Figure 3 The stack has been processed to remove some of the support material 301 to leave three channels 401 in the support 104. The cover 101 spans each of the channels 401 to form a span portion. The pressure of the liquid or gas in the channels 401 can be changed to move the flexible span portion of the cover up and down.

[0643] Figure 5 A device is shown with a hole. Figure 3 The stack of has been processed to remove some of the support material 301 to leave four holes 402 in the support 104. The cover 101 spans each of the holes 402 to form a span portion of the cover 101. The span portion of the cover 101 is flexible, and the span portion can be moved up and down by a member to make the cavity formed by the holes 402 deeper or shallower.

[0644] Figure 6 A support column 104 is shown on a substrate 106. A cover 101 can be attached to the top 105 of the column 104 to obtain an optical element. The cover 101, support 104 and substrate 106 are then interfaced with a network of cavity channels or wells.

[0645] Figure 7A cross-sectional view of an optical element is shown. A support 104 is attached to the upper surface of a substrate 106. A cover 101 is attached to the top of the support 104. The substrate 106, the support 104 and the cover 101 interface with a cavity having a depth 205. The cover 101 consists of a lower layer 202 of graphene and a reflective upper layer 203 of amorphous Au. The cover acts as a terminal B, the substrate acts as a terminal C, and another terminal A is present above the cover, in the top wall of the sleeve 204. The cover can be moved up and down by changing the potential difference between the cover B and the substrate C or between the cover B and the upper terminal A. In the presented position, the cover is pulled upward by the potential difference between the cover B and the upper terminal A, thereby increasing the depth 205. The shape of the cover 101 relative to the support 104 constitutes the cover profile.

[0646] Figure 8 Flowchart showing a process for making an optical device. In a first step 501, a support 104 is provided. In a second step 502, a graphene sheet 202 is attached to the support 104. In a third step 503, a reflective layer 203 of amorphous Au is deposited on the graphene sheet. In a further (optional) step, a portion of the support is removed to create a span portion and / or cavity of the cover. In a fifth step, means for moving the cover are provided. These method steps and their order can be freely selected. Figure 8 Those shown in , preferably vary according to the described embodiment.

[0647] Fig. 9 Showing the interaction of light with a flat cover. Parallel rays 601 and 602 are both deflected by the same angle and remain parallel after interacting with cover 101. This constitutes specular reflection.

[0648] Fig.10 Shows the interaction of light with a convex cover. Due to the rounded convex cover profile, the first ray 601 is deflected by almost 180°, while the second ray 602 is only deflected by a small angle. Rays 601 and 602 are no longer parallel after reflection on the cover. This constitutes diffuse reflection.

[0649] Fig.11 Shows the interaction of light with a concave cover. Due to the circular concave cover profile, the first ray 601 is deflected by less than 90°, while the second ray 602 is deflected by almost 180°. Rays 601 and 602 are no longer parallel after reflection on the cover. This constitutes diffuse reflection.

[0650] Fig.12The interference interaction with a flat cover is shown. The support 104, cover 101 and substrate 106 define a cavity having a depth 205. The substrate 106 is transmissive and absorptive to some extent, while the cover 101 is reflective, so that the incident ray 601 experiences interference that depends on the depth 205.

[0651] Fig.13 Showing the interference interaction with a convex covering. Fig.12 The cover 101 of the optical element has been deformed into a convex shape (cover profile). This is caused by the member pulling the cover 101 upwards. This increases the depth 205 and the interference behavior of the incident light 601 is changed.

[0652] Fig.14 Showing the interference interaction with the concave covering. Fig.12 The cover 101 of the optical element has been deformed into a concave shape (cover profile). This is caused by the member pulling the cover 101 downwards. This reduces the depth 205 and the interference behavior of the incident light 601 is changed.

[0653] Fig.15 An optical element is shown with a cover 101 in the form of a cover profile. The position of a point 701 on the cover can be described in terms of a position vector with a reference point 702 on the support as the origin. The position of point 701 can be described as a height 706. Height 706 is measured between a plane 704 of the support as a reference and a parallel plane 703 passing through point 701. Here, the plane 704 of the support passes through the attachment point of cover 101 to support 104. The position of point 701 can be described as a depth 705. Depth 705 is measured at the substrate surface 104 as a reference. 6 Measured between a parallel plane 703 passing through point 701 .

[0654] Fig.16a 1 is a perspective view showing the configuration of the cross-shaped supports 104. These cross-shaped supports are configured in a square array on the substrate 106. A square array of square holes 402 is defined as recesses between the supports 104. The holes 402 are connected to their adjacent neighbor holes to form a series of channels. To achieve an optical element according to the present invention, a cover attached to the top surface of the cross-shaped supports 104 is provided. The span of the cover above the holes 402 partially surrounds the holes 402 to form the cavity of the present invention. The cross shape of the supports 104 allows a large active area in the device and therefore a high fill factor.

[0655] Fig.16b A plan view of a configuration of cross-shaped supports showing the long-range extension of the square array of supports, holes, and channels.

[0656] Fig.17aA wearable device 900 including an optical element 100 according to the present invention is shown. A projector 903 located in a device frame 902 of the wearable device 900 projects an image onto the optical element 100. The image is directed toward an observer 906 by the optical element 100.

[0657] Fig.17b A schematic diagram of a wearable device 900 is shown. The device 900 has a projector 903 mounted on a device frame 902. The projector 903 projects an image toward an optical element including a layer 905 and a cover 101 attached to a support 104. The guidance of the image toward an observer 906 is determined by a cavity formed between the cover 101 and the layer 905. The cavity can be adjusted by moving the cover 101. The device 900 also has a lens 904. The device allows the observer 906 to simultaneously observe the image presented by the projector 903 and the real image 901 passing through the lens 904, the layer 905 and the cover 101.

[0658] Fig.18 Schematic diagram of a display pixel array. Each pixel is composed of an adjustable cavity according to the present invention. Some of these cavities are in a static position 802, which causes static scattering / reflection / interference of light. Some of these cavities are in a first activation position 803, which causes a first scattering / reflection / interference of light. Some of these cavities are in a second activation position 801, which causes a second scattering / reflection / interference of light. Some of these cavities are in a third activation position 804, which causes a third scattering / reflection / interference of light. The transition between the static position and the activated position is achieved by a component according to the present invention. In one variation, the static position and the activated position each correspond to a different potential difference generated by the component.

[0659] Description of reference numerals:

[0660] 100: Optical components

[0661] 101: Covering

[0662] 102: First surface

[0663] 103: Second Surface

[0664] 104: Support

[0665] 105: Attach

[0666] 106: Substrate

[0667] 202: Two-dimensional materials

[0668] 203: Deposited layers

[0669] 204: Casing

[0670] 205: Depth

[0671] 301: Support material

[0672] 401: Channel

[0673] 402: Hole

[0674] 501: The first step is to provide a support member

[0675] 502: The second step is to attach graphene

[0676] 503: The third step is to deposit Au

[0677] 504: The fourth (optional) step is to remove a portion of the support member

[0678] 505: The fifth step is to provide components

[0679] 601: First Ray

[0680] 602: Second Ray

[0681] A: Cover terminal

[0682] B: Upper terminal

[0683] C: lower terminal

[0684] 701: Points on the Cover

[0685] 702: Reference point on the support

[0686] 703: Height of point

[0687] 704: Support plane

[0688] 705: Depth of cavity

[0689] 706: Height of point

[0690] 801: Second activation position

[0691] 802: static position

[0692] 803: First activation position

[0693] 804: Third activation position

[0694] 900: Wearable devices

[0695] 901: Real Image

[0696] 902: Device Framework

[0697] 903: Projector

[0698] 904: Lens

[0699] 905: Layer

[0700] 906: Observer

[0701] Example

[0702] The present invention is now further described with the aid of examples. These examples are only illustrative and do not limit the scope of the present invention.

[0703] Example 1: Electrically controllable diffuser for semiconductor manufacturing processes

[0704] The device is prepared as follows: a p-doped silicon wafer with a thermally grown silicon dioxide film is provided to serve as both a substrate (silicon) and a support (silicon dioxide film). The silicon wafer has a thickness of 500 μm and the silicon dioxide film has a thickness of 600 nm. Square holes of 600 nm depth and 10,000 nm lateral size spaced 1,000 nm apart are etched in the silicon dioxide film using HF, and rinsed and dried with water. The AB bilayer stack of graphene is bonded to the remaining surface of the patterned silicon dioxide film via the procedure proposed in Nguyen, VL et al., (2016), Wafer-Scale Single-Crystalline AB-Stacked Bilayer Graphene. Adv. Mater., 28: 8177-8183. 5×10 -5 kg / m 2 A Ag layer is applied to the graphene layer.

[0705] The cover over the hole is moved up and down by applying a voltage difference of 30V between the graphene and the silicon substrate, thereby establishing a capacitance across the silicon dioxide membrane and across the air dielectric filling the hole. In this way, most covers can be reversibly and repeatably moved hole by hole between a specular reflective surface (mirror) in a flat position and a diffuse reflective surface (diffuser) in an electro-deformed position. The movement of the cover is of the order of 300nm. The degree of movement of the cover can be continuously controlled by means of voltage.

[0706] A UV light source (λ=400nm) is directed at the surface of the cover at an incident angle of 45°. A UV detector is placed to measure the reflected light along the path of normal specular reflection (45°, matching the incident angle). When the voltage difference is 0V, the photodetector detects a significant UV light signal; when the voltage difference is 30V, the photodetector detects a very reduced UV light signal. The process is reversible and the device can be moved between specular reflection mode and diffuser mode at a frequency of 1kHz, measured by the same photodetector connected to an oscilloscope. The device consumes a certain amount of power (energy efficiency) at this operating frequency.

[0707] Next, a substrate covered with a UV-sensitive resist is placed facing the path of light specularly reflected from the device. In a configuration where the cover surface remains flat, it will specularly reflect light and expose the resist; conversely, in a configuration where the cover surface is electrically deformed, it will diffuse the light and not develop the resist.

[0708] Qualitatively similar results are obtained for angles of incidence other than 45°.

[0709] Finally, the optical power of the light source was greatly increased and the cover was exposed for a long time without photodegradation because the graphene was protected by the transmission / reflection ratio of the metal. In addition, nanoindentation tests were performed using the AFM tip by applying 100 nN to the cover and the cover did not break. The device can move between the specular and diffuse reflection positions a certain number of times before failure because the cover is optomechanically robust (durable).

[0710] Example 2

[0711] Example 1 was repeated, but the density of deposited Ag was varied. For lower densities, the cover ceased to be reflective enough to act as a mirror, and even in a flat position, the photomechanical persistence decreased. For higher densities, the cover operating frequency decreased at the same voltage difference. The power consumption to produce movement at 1 kHz increased.

[0712] result

[0713]

[0714] Example 3: Pressure-controllable spatial modulator for telecommunications in Industry 4.0

[0715] The device was prepared as follows: a 0.5 mm thick ITO-coated glass wafer (Eagle XG ultra-thin glass, purchased from Corning) was provided to serve as a substrate and a spin-on glass (ACCUGLASS purchased from Honeywell) was applied as a 600 nm layer to serve as a support. A channel 600 nm deep and 10000 nm wide was etched in the HF spin-on glass, rinsed with water and dried. The AB bilayer stack of graphene was prepared via the procedure proposed in Nguyen, VL et al., (2016), Wafer-Scale Single-Crystalline AB-Stacked Bilayer Graphene. Adv. Mater., 28: 8177-8183. 5×10 -5 kg / m 2 The Mo-coated graphene is then bonded to the rest of the patterned chip via the procedure proposed in Nguyen, VL et al., (2016), Wafer-Scale Single-Crystalline AB-Stacked Bilayer Graphene. Adv. Mater., 28: 81778183. One end of each channel is kept closed to ensure that only a single inlet hole exists, where a gas pump is placed.

[0716] The covers over the channels are moved up and down by changing the air pressure in the respective channels. In this way, most covers can be moved continuously channel by channel between a first cover profile at rest, where it shows a first interference scattering of light incident on the glass substrate, and a second profile at a pneumatically deformed position, where it shows a second interference scattering of light incident on the glass substrate. The first cover profile has increased light reflection, while the second cover profile has increased light absorption, thus acting as a modulator or tunable filter. This wavelength modulation can occur in a spectrally continuous manner, where the different profiles that exist between the first profile and the second profile each show that they meet the modulation criteria for different wavelengths, thus effectively making it a multi-wavelength modulator or multi-wavelength tunable filter.

[0717] The infrared laser source (λ = 1550 nm) is directed toward the glass substrate at an incident angle of 45°. An infrared light detector is placed facing the path of light reflected from the device mirror. When the pressure difference is 0 Pa, the light detector detects a large amount of infrared light; when the pressure difference is 10 5 At 100 Pa, the photodetector detects a significantly reduced amount of infrared light. This process is reversible and can be modulated at a frequency of 1 kHz, measured by the same photodetector connected to an oscilloscope. The device consumes a certain amount of power (efficiency) at this operating frequency.

[0718] Next, a tungsten lamp emitting incoherent light at a continuous range of infrared wavelengths (λ is 800nm ​​to 1600nm) illuminates the device at a 45° angle of incidence. A calibrated infrared spectrometer collects the light that is interferometrically scattered from the device. When the pressure difference is 0Pa, the spectrometer detects a flat spectrum except for the light attenuated at 850nm; when the pressure difference is 103Pa, the spectrometer detects a flat spectrum except for the light attenuated at 1310nm; when the pressure difference is 105Pa, the spectrometer detects a flat spectrum except for the light attenuated at 1550nm. The process is reversible and can be modulated at a frequency of 1kHz, measured for a fixed wavelength by the same spectrometer connected to an oscilloscope. The device allows different profiles, including those with large deformations (dynamic range), which meet the modulation criteria for a wide range of wavelengths (data transmission bandwidth).

[0719] Finally, the optical power of the light source was greatly increased and the cover was exposed for a long time without photodegradation because the graphene was protected by the transmission / reflection ratio of the metal. In addition, nanoindentation tests were performed using the AFM tip by applying 100 nN to the cover and the cover did not break. The device can be moved a certain number of times between positions of different contours before failure because the cover is photomechanically robust (durable).

[0720] Example 4

[0721] Example 3 is repeated, but the density of the deposited Mo is varied. For lower densities, the cover stops being reflective enough to act as a mirror, even in a flat position, thus preventing interferometric scattering from occurring, and it stops being optomechanically robust to move as many times as before and maintain the same pressure difference as before. For higher densities, the cover operating frequency and dynamic range are reduced when the same pressure difference is used, and an increase in the pressure difference to have the same effect would result in high power consumption and optomechanical failure. The device allows for different profiles, including those with large deformations (dynamic range) that meet modulation criteria for a wide range of wavelengths (data transmission bandwidth).

[0722] result

[0723]

[0724]

[0725] Example 5: Passive micromirror components for space light sails

[0726] The device is prepared as follows. A metal foil is provided to act as a support. Circular holes with a diameter of 10000 nm spaced 15000 nm from each other are perforated through the metal foil using a pulsed laser as proposed in Hanbach, N. (2016) (JLMN-Journal of Laser Micro / Nanoengineering Vol. 11, No. 2, 2016 http: / / www.jlps.gr.jp / jlmn / upload / c7127713a4e9ddcf0019534a2fd68e71.pdf). This produces a metal foil with a filling ratio of 31% as a support. The AB bilayer stack of graphene is bonded to the remaining surface of the patterned metal film via the procedure proposed in Nguyen, VL et al., (2016), Wafer-Scale Single-Crystalline AB-Stacked Bilayer Graphene. Adv. Mater., 28: 8177-8183. 30×10 -5 kg / m2 layer of Ag was applied to the graphene layer.

[0727] When strong light is applied in a non-responsive environment by means of radiation pressure, the cover over the hole moves. At a certain angle of incidence of the strong light, the cover over the hole has a first cover profile profile; when the angle of incidence is changed, the cover over the hole adapts to the new environment and self-configures itself to a second cover profile profile. This second cover profile profile distributes the radiation pressure unevenly across the unsupported cover, thus causing rotation of the device until the cover returns to the first cover profile. In this way, most covers can be self-adjusting mirrors.

[0728] The device containing the device and a video recording microscope is dropped from the upper base of a cylindrical container having an altitude of 100 m and containing an air pressure of 1 Pa. During free fall, the device is released facing the bottom base of the tube and it remains floating in microgravity until the device reaches the bottom base of the tube. A strong visible laser source (λ=532 nm) toward the upper base continuously irradiates the device at an incident angle of 90° (perpendicular to the device) and the laser beam is continuously reflected from the device. The beam continuously generates radiation pressure in the direction of the upper base, which causes a first displacement of the device in the same direction. During the radiation pressure, the cover acquires a first contour profile that evenly distributes the radiation pressure across the unsupported cover, as captured by the video recording microscope.

[0729] The same test was then performed with the released device at a 45° angle to the laser beam. At this point, the radiation pressure caused a second displacement of the device in the same direction. During the radiation pressure, the cover acquired a second contour profile that distributed the radiation pressure unevenly across the unsupported cover. This caused the device to rotate toward restoring a 90° angle to the laser beam, as captured by the video recording microscope.

[0730] Finally, the optical power of the light source was greatly increased and the cover was exposed for a long time without photodegradation because the graphene was protected by the transmission / reflection ratio of the metal. In addition, nanoindentation tests were performed using the AFM tip by applying 100 nN to the cover and the cover did not break. The device can be moved a certain number of times between positions of different contours before failure because the cover is photomechanically robust (durable).

[0731] The device requires a certain amount of power (energy efficiency). The device uses radiation pressure displacement, because the fill ratio of the support is low (large thrust or propulsion force), and the cover provides optomechanical robustness against support failure. The device uses different profile shapes as a function of the incident angle, thus causing different rotations (angle-dependent rotation).

[0732] Example 6

[0733] Example 5 was repeated, but the density of deposited Ag was varied. For lower densities, the cover stopped being reflective enough to act as a mirror, even in a flat position, thus preventing angle-dependent rotation from occurring, and it stopped being optomechanically robust to move as many times as before and maintain the same radiated power as before. For much higher densities, the cover angle-dependent rotation and propulsion force were reduced, and an increase in radiated power had the same effect of causing high power consumption and optomechanical failure when the same radiated power was used.

[0734] result

[0735]

[0736] Example 7: Electrically controllable display components for consumer electronics

[0737] The device is prepared as follows: a p-doped silicon wafer with a thermally grown silicon dioxide film is provided to serve as both a substrate (silicon) and a support (silicon dioxide film). The silicon wafer has a thickness of 500 μm and the silicon dioxide film has a thickness of 600 nm. Square holes with a depth of 600 nm and a lateral dimension of 10,000 nm and a channel with a depth of 600 nm and a width of 3,000 nm aligned with the center of the square hole are etched in the silicon dioxide film using HF, and rinsed and dried with water. Thus, the combination of the square hole and the channel forms a single span portion. The AB bilayer stack of graphene is bonded to the remaining surface of the patterned silicon dioxide film via the procedure proposed in Nguyen, VL et al., (2016), Wafer-Scale Single-Crystalline AB-Stacked Bilayer Graphene. Adv. Mater., 28: 8177-8183. 5×10 -5 kg / m2 layer of Ag was applied to the graphene layer.

[0738] The cover over the square hole of the span portion is moved up and down by applying a voltage difference of 30V between the graphene and the silicon substrate, thereby establishing a capacitance across the silicon dioxide film and across the air dielectric filling the span portion. In this way, most covers can be reversibly and repeatedly moved hole by hole between a first cover profile at rest, which shows a first interference scattering of light incident on the cover surface, and a second profile at an aerodynamic deformation position, which shows a second interference scattering of light incident on the cover surface. The movement of the cover is about 300nm. The degree of movement of the cover can be continuously controlled by means of voltage. The first cover profile has an increased light reflection, while the second cover profile has an increased light absorption, thus acting as a modulator or tunable filter. This wavelength modulation can occur in a spectrally continuous manner, where the different profiles existing between the first profile and the second profile each show that they meet the modulation criteria for different wavelengths, thus effectively making it a multi-wavelength modulator or multi-wavelength tunable filter.

[0739] The combination of square holes and channels to create a single span section increases the area of ​​the removable cover, reduces manufacturing complexity and increases durability.

[0740] A green laser source (λ=532nm) is directed at the cover surface at an incident angle of 45°. A visible light detector is placed facing the path of the light reflected from the device mirror. When the voltage difference is 0V, the photodetector detects a significant visible light signal; when the voltage difference is 30V, the photodetector detects a greatly reduced visible light signal. The process is reversible and can be modulated at a frequency of 1kHz, measured by the same photodetector connected to an oscilloscope. The device consumes a certain amount of power (energy efficiency) at this operating frequency.

[0741] Next, a tungsten lamp emitting incoherent light at a continuous range of visible wavelengths (λ from 380nm to 740nm) illuminates the device at a 45° angle of incidence. A calibrated visible spectrometer collects the light interferometrically scattered from the device. When the voltage difference is 0V, the spectrometer detects a flat spectrum except for the light attenuated at 500nm; when the voltage difference is 15V, the spectrometer detects a flat spectrum except for the light attenuated at 550nm; when the voltage difference is 30V, the spectrometer detects a flat spectrum except for the light attenuated at 600nm. The process is reversible and can be modulated at a frequency of 1kHz, measured for a fixed wavelength by the same spectrometer connected to an oscilloscope. The device allows different profiles, including those with large deformation (dynamic range), which meet the modulation criteria for a wide range of wavelengths (data transmission bandwidth).

[0742] Qualitatively similar results are obtained for angles of incidence other than 45°.

[0743] Finally, the optical power of the source was greatly increased and the cover was exposed for a long time without photodegradation because the graphene was protected by the transmission / reflection ratio of the metal. In addition, nanoindentation tests were performed using the AFM tip by applying 100 nN to the cover and the cover did not break. The device can be moved a certain number of times between positions of different contours before failure because the cover is optomechanically robust (durable).

[0744] Example 8

[0745] Example 7 was repeated, but without etching the channels. The lack of a single span section separated the square holes from each other. This reduced device yield and reduced the area of ​​the removable overlay (fill factor) after the graphene bonding process, resulting in a non-functional device. Furthermore, it reduced overlay performance and an increase in overlay performance to have the same effect requires increased manufacturing complexity.

[0746] result

[0747]

Claims

1. An optical element, comprising: a. A covering having a first surface and a second surface, b. Support members, and c. Components; wherein: the cover is oriented so that the first surface faces the support member; a portion of the first surface being attached to the support; The spatial configuration of the second surface relative to the support defines a cover profile; The member is adapted and configured to move the second surface from a first covering contour profile to another covering contour profile; The cover comprises a two-dimensional portion, the two-dimensional portion being one or more two-dimensional materials, wherein the two-dimensional portion has a thickness of 10 nm or less and comprises graphene and / or boron nitride; the covering has a transmittance divided by a reflectance value of no more than 0.5 for light incident on the second surface, the reflectance and the transmittance being measured at a wavelength λ; and λ is in the range of 10 nm to 20 μm.

2. The optical element according to claim 1, wherein The value of the transmittance divided by the reflectance is 0.25 or less.

3. The optical element according to claim 1, wherein The value of the transmittance divided by the reflectance is 0.1 or less.

4. The optical element according to claim 1, wherein The value of the transmittance divided by the reflectance is 0.

01.

5. The optical element according to any one of claims 1 to 4, wherein: Movement from the first covering contour profile to the other covering contour profile changes the orientation of the second surface relative to the support at least one location on the second surface.

6. The optical element according to any one of claims 1 to 4, wherein: The covering includes an amorphous portion, the amorphous portion being one or more amorphous materials.

7. The optical element according to any one of claims 1 to 4, wherein: The cover includes a metal portion, which is one or more metals.

8. The optical element according to any one of claims 1 to 4, wherein: The cover includes an additive portion, which is one or more elements selected from the group consisting of Ag, Al, B, C, Cr, Fe, K, Mg, Mo, Na, Ni, Ti, P, Pb, S, Si, Ta, V, W and Zn; or one or more combinations of two or more of the above elements, or one or more combinations of one or more of the above elements and one or more chalcogen elements (O, S, Se, Te), N or C.

9. The optical element according to any one of claims 1 to 4, wherein: The two-dimensional portion is one or more of the following: a. One or more selected from the following: C, BN, P, MoS2, MoSe2, MoTe2, WS2, WSe2, WTe2, GaS, GaSe, GaTe, NbS2, NbSe2, NbTe2, TaS2, TaSe2, TaTe2, TiSe2, VSe2, CrS2, CrSe2, B, Ge, Si, Si2BN, Sn, Pb, PtS2, PtSe2, PtTe2, Sb, Bi; b. one or more transition metal chalcogenides, each of which is a transition metal chalcogenide other than that listed in a; c. one or more oxides, each of which is an oxide of a substance listed in a or b; d. one or more atomic intercalation variants, each of which is an atomic intercalation variant of the substance listed in a or b; e. One or more chemically functionalized derivatives, each of which is a chemically functionalized derivative of a substance listed in a or b.

10. The optical element according to any one of claims 1 to 4, wherein: The covering has a thickness of 1 mm or less.

11. The optical element according to any one of claims 1 to 4, wherein: The member generates an electrostatic force.

12. The optical element according to any one of claims 1 to 4, wherein: The member is adapted and configured to change the pressure in the area at the first surface.

13. The optical element according to any one of claims 1 to 4, further comprising a substrate having a substrate surface, wherein A portion of the substrate surface is attached to the support.

14. The optical element according to claim 13, wherein: The substrate surface, the support, and the first surface are bounded by one or more cavities, each cavity having a cavity depth, the cavity depth being the distance in the cavity between the substrate surface and the first surface.

15. A method for preparing an optical element, comprising the following steps, which can be performed in any order: a. Provide support; b. Attaching a covering to the support, wherein: The cover comprises a two-dimensional material, wherein the two-dimensional material has a thickness of 10 nm or less and comprises graphene and / or boron nitride; c. providing a means for changing the position of the covering relative to the support member; wherein the covering has a transmittance divided by a reflectance value of no more than 0.5, the reflectance and the transmittance being measured at a wavelength λ; and Here, λ is in the range of 10 nm to 20 μm.

16. An optical element obtainable by the method according to claim 15.

17. A device comprising an optical element according to any one of claims 1 to 14 and 16.

18. Use of a coated two-dimensional material in an adjustable optical device, wherein: The two-dimensional material has a thickness of 10 nm or less and includes graphene and / or boron nitride.

19. Use of an optical element according to any one of claims 1 to 14 or 16 for providing one or more of the following in an optical device: a. Increased operating frequency; b. Reduced mass; c. Improved mechanical strength; d. Improved durability; e. Reduced power consumption; f. Improved reflectivity; g. Increased thrust; h. Increased heat conduction; i. Increased thermal stability; j. Increased dynamic range; k. Wavelength control and large continuous tunability; l. Angle control and large continuous tunability; m. Increased data transmission bandwidth; n. Reduced manufacturing complexity; and o. Increased uniformity of effect.

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