Composition, method for producing composition, cured film, transfer film, and method for producing touch panel

Abstract

The present invention provides a composition capable of obtaining a transfer film having improved bendability when having a layer containing metal oxide particles. The composition contains an amine compound, metal oxide particles, and an adhesive polymer having an acid group, as a substituent of a nitrogen atom of the amine compound, has a substituent containing a linking group having a linking chain length of 3 or more, and the weight average molecular weight of the amine compound is 100 or more.

Description

TECHNICAL FIELD

[0001] The present application relates to a composition, a method for producing the composition, a cured film, a transfer film, and a method for producing a touch panel. BACKGROUND

[0002] In display devices of electronic devices (for example, mobile phones, car navigation, personal computers, ticket vending machines, and bank terminals), a touch panel is often used as an input device.

[0003] It is known that in such a touch panel, a protective film for protecting an electrode including a metal wiring is provided.

[0004] For example, Patent Document 1 describes a transfer material having a temporary support and a transparent curable resin layer laminated on the temporary support, the transparent curable resin layer having a refractive index of 1.55 or more at a wavelength of 550 nm.

[0005] PRIOR ART DOCUMENTS

[0006] PATENT DOCUMENTS

[0007] Patent Document 1: Japanese Patent Application Publication No. 2014-056311 SUMMARY

[0008] PROBLEMS TO BE SOLVED BY THE INVENTION

[0009] As a result of the present inventors' study on the transfer film described in Patent Document 1, it was found that, when the transfer film is bent, a crack sometimes occurs on the surface of the transparent curable resin layer. It was found that, in particular, when the transparent curable resin layer of the film described in Patent Document 1 contains metal oxide particles, a crack is likely to occur when the film is bent.

[0010] The present application relates to a composition, a method for producing the composition, a cured film, a transfer film, and a method for producing a touch panel.

[0011] MEANS FOR SOLVING THE PROBLEMS

[0012] As a result of the present inventors' intensive study to solve the above problems, it was found that a composition in which a substituent having a linking group having a linking chain length within a specific range is provided in a composition containing metal oxide particles and an adhesive polymer having an acid group and an amine compound having a weight average molecular weight within a specific range is used, thereby a transfer film having improved bendability when having a layer containing metal oxide particles is obtained, and the present application was completed.

[0013] Further, Patent Literature 1 does not describe that the transparent curable resin layer containing metal oxide particles contains an amine compound.

[0014] The structure of the present application and the preferred mode of the present application that can solve the above problems are as follows.

[0015] [1] A composition comprising:

[0016] an amine compound, metal oxide particles, and an adhesive polymer having an acid group,

[0017] As a substituent of a nitrogen atom of the amine compound, a substituent having a linking group with a linking chain length of 3 or more,

[0018] The weight average molecular weight of the amine compound is 100 or more.

[0019] [2] The composition according to [1], wherein,

[0020] The amine compound is a compound represented by the following general formula N.

[0021] [Chemical Formula 1]

[0022]

[0023] [3] The composition according to [1] or [2], wherein,

[0024] The content of the metal oxide particles is 40 to 95 mass% with respect to the total solid content in the composition.

[0025] [4] The composition according to any one of [1] to [3], wherein,

[0026] The metal oxide particles contain at least one selected from the group consisting of zirconium oxide particles and titanium oxide particles.

[0027] [5] The composition according to any one of [1] to [4], further comprising a compound having a 6-membered heterocyclic structure,

[0028] The compound having a 6-membered heterocyclic structure has a monocyclic or polycyclic aromatic heterocyclic structure.

[0029] [6] The composition according to [5], wherein,

[0030] The compound having a 6-membered heterocyclic structure has a 6-membered heterocyclic structure having two nitrogen atoms within the ring structure.

[0031] [7] The composition according to [5] or [6], wherein,

[0032] The compound having a 6-membered heterocyclic structure is adenine or pyrimidine.

[0033] [8] The composition according to any one of [1] to [7], further having an ethylenically unsaturated compound.

[0034] [9] The composition according to [8], further containing a photopolymerization initiator.

[0035]

[10] The composition according to any one of [1] to [9], used for forming a protective film on a touch panel.

[0036]

[11] The composition according to any one of [1] to

[10] , used for forming a refractive index adjusting layer on a touch panel.

[0037]

[12] A method for producing a composition, comprising a step of preparing a composition using metal oxide particles, an adhesive polymer having an acid group, and an amine compound,

[0038] As the substituent of the nitrogen atom of the amine compound, a substituent having a linking group with a linking chain length of 3 or more,

[0039] The weight average molecular weight of the amine compound is 100 or more.

[0040]

[13] A cured film of the composition according to any one of [1] to

[11] .

[0041]

[14] A transfer film having a temporary support and a refractive index adjusting layer containing the composition according to any one of [1] to

[11] .

[0042]

[15] The transfer film according to

[14] , wherein,

[0043] The refractive index of the refractive index adjusting layer is 1.55 to 1.80.

[0044]

[16] The transfer film according to

[14] or

[15] , having a photosensitive resin layer between the temporary support and the refractive index adjusting layer.

[0045]

[17] The transfer film according to

[16] , wherein,

[0046] The photosensitive resin layer contains an adhesive polymer, an ethylenically unsaturated compound, and a photopolymerization initiator.

[0047]

[18] A method for producing a touch panel, comprising:

[0048] a step of preparing a substrate for a touch panel having a structure in which at least one of an electrode for a touch panel and a wiring for a touch panel is disposed on a substrate;

[0049] a step of forming a refractive index adjusting layer composed of the composition described in any one of [1] to

[11] or a dried composition on a surface of the substrate for a touch panel on which at least one of an electrode for a touch panel and a wiring for a touch panel is provided;

[0050] a step of performing pattern exposure on the refractive index adjusting layer formed on the substrate for a touch panel; and

[0051] a step of obtaining a cured film that protects at least a part of at least one of the electrode for a touch panel and the wiring for a touch panel by developing the pattern-exposed refractive index adjusting layer.

[0052] Effects of the Invention

[0053] According to the present application, it is possible to provide a composition that can obtain a transfer film in which a layer containing metal oxide particles has improved flexibility, a method for producing the composition, a cured film, a transfer film, and a method for producing a touch panel. BRIEF DESCRIPTION OF DRAWINGS

[0054] Figure 1 is a schematic cross-sectional view showing an example of a transfer film of the present application.

[0055] Figure 2 is a schematic cross-sectional view showing a first specific example of a touch panel produced using a transfer film of the present application.

[0056] Figure 3 is a schematic cross-sectional view showing a second specific example of a touch panel produced using a transfer film of the present application. DETAILED DESCRIPTION

[0057] Hereinafter, the contents of the present application will be described in detail. The description of the constituent elements described below is completed in accordance with a representative embodiment of the present application, but the present application is not limited to this embodiment.

[0058] In the present application, "to" indicating a numerical range is used in the meaning of including the numerical values written before and after it as lower limit values and upper limit values.

[0059] In the numerical ranges described in stages in the present specification, the upper limit value or the lower limit value described in one numerical range can be replaced with the upper limit value or the lower limit value of another numerically described range. Also, in the numerical ranges described in the present specification, the upper limit value or the lower limit value of the numerical range can be replaced with the value shown in the examples.

[0060] Further, in the present application, the meaning of "mass%" is the same as that of "weight%", and the meaning of "mass parts" is the same as that of "weight parts".

[0061] Further, in the present application, the meaning of "mass%" is the same as that of "weight%", and the meaning of "mass parts" is the same as that of "weight parts".

[0062] Further, in the present application, the combination of two or more preferred modes is a more preferred mode.

[0063] In the present application, in the case where a plurality of substances corresponding to each component are present in the composition, unless otherwise specified, the amount of each component in the composition indicates the total amount of the above plurality of substances present in the composition.

[0064] In the present application, the term "step" includes not only a single step, but also a case where the step cannot be clearly distinguished from other steps, as long as the desired purpose of the step can be achieved.

[0065] In the present application, "(meth)acrylic acid" is a concept including both acrylic acid and methacrylic acid, "(meth)acrylate" is a concept including both acrylate and methacrylate, and "(meth)acryloyl" is a concept including both acryloyl and methacryloyl.

[0066] Further, regarding the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present application, unless otherwise specified, the molecular weight is obtained by using a gel permeation chromatography (GPC) analysis device using a column of TSKgel GMHxL, TSKgel G4000HxL, TSKgel G2000HxL (all are products of TOSOH CORPORATION), detecting with solvent THF (tetrahydrofuran), a differential refractometer, and converting using polystyrene as a standard substance.

[0067] In the present application, unless otherwise specified, the molecular weight of a compound having a molecular weight distribution is the weight average molecular weight.

[0068] In the present application, unless otherwise specified, the ratio of the structural units of a polymer is a molar ratio.

[0069] In the present application, unless otherwise specified, the refractive index is a value at a wavelength of 550 nm measured at 25°C by an ellipsometer.

[0070] Hereinafter, the present application will be described in detail.

[0071] [Composition]

[0072] The composition of the present application contains an amine compound, metal oxide particles, and an adhesive polymer having an acid group, as a substituent of a nitrogen atom of the amine compound, has a substituent containing a linking group having a linking chain length of 3 or more, and the weight average molecular weight of the amine compound is 100 or more.

[0073] A transfer film having improved flexibility when having a layer containing metal oxide particles can be obtained by the composition of the present application.

[0074] The details of the reason are not clear, but the present inventors and others speculate as follows.

[0075] By using metal oxide particles, it is possible to impart a high refractive index to the layer containing the metal oxide particles, but the layer containing the metal oxide particles is easily broken. In the composition containing the metal oxide particles, an amine compound having a substituent containing a linking group having a relatively long linking chain length (for example, a chain-like group), and a relatively large weight average molecular weight reacts with the acid group of the adhesive polymer and is partially or entirely introduced into the adhesive polymer. As a result, it is believed that the glass transition temperature (Tg) of the adhesive polymer is reduced, and the Tg of the film containing the composition is reduced to make it soft, thereby improving the flexibility (becoming less likely to break).

[0076] In addition, compared to a method of reducing the Tg of the adhesive polymer to make it soft by other methods, the degree of freedom of the formulation of the composition of the present application is high, and further improvement in rust resistance is also possible by the preferred mode of the composition of the present application.

[0077] The composition of the present application can be used to form any film on a touch panel, and is particularly preferably used to form a protective film and / or a refractive index adjusting layer on a touch panel.

[0078] When the composition of the present application is used to form a protective film and a refractive index adjusting layer on a touch panel, a single layer of a cured product of the composition of the present application can be used as a protective film on a touch panel. When used to form a protective film and a refractive index adjusting layer on a touch panel, the composition of the present application preferably contains an adhesive polymer, an ethylenically unsaturated compound, and a photopolymerization initiator.

[0079] When the composition of the present application is used to form a refractive index adjusting layer on a touch panel, a layer containing the composition of the present application or a layer of a cured product of the composition of the present application can be used as a refractive index adjusting layer, and a cured product of a photosensitive resin layer prepared separately can be used as a protective film on a touch panel. When used to form a refractive index adjusting layer on a touch panel, the composition of the present application can not contain a photopolymerization initiator, and can not contain an ethylenically unsaturated compound.

[0080] Hereinafter, preferred compositions of the composition of the present application are described. The description is made in two cases, one in which a single layer of the cured product of the composition of the present application is used as a protective film on a touch panel, and the other in which the cured product of the composition of the present application is used as a refractive index adjusting layer (i.e., a case in which the cured product of a separately prepared photosensitive resin layer is used as a protective film on a touch panel).

[0081] [AMINE COMPOUND]

[0082] The amine compound used in the composition of the present application has a substituent containing a linking group having a linking chain length of 3 or more as a substituent of a nitrogen atom of the amine compound, and the weight average molecular weight of the amine compound is 100 or more.

[0083] In the composition of the present application, all of the amount of the amine compound can react with the acid group of the adhesive polymer having an acid group without leaving the amine compound. The mode in which the amine compound exists as a derivative such as a compound (including a salt) in which the adhesive polymer having an acid group is bonded to the amine compound or an amine compound ion is also included in the composition of the present application. In addition, in the composition of the present application, when a compound (for example, ammonia) that reacts with the acid group of the adhesive polymer having an acid group is included in addition to the amine compound, the adhesive polymer having an acid group can form both an ammonium salt and an amine compound salt.

[0084] In the present application, as the substituent of the nitrogen atom of the amine compound, a substituent containing a linking group having a linking chain length of 3 or more is present. In the substituent of the nitrogen atom of the amine compound, at least one substituent is a substituent containing a linking group having a linking chain length of 3 or more. Here, the linking chain length indicates the number of atoms of the linking chain.

[0085] As the substituent containing a linking group having a linking chain length of 3 or more, a substituent containing a linking group having a linking chain length of 3 or more and containing a hetero atom is preferred. As the hetero atom, an oxygen atom, a sulfur atom, a silicon atom, and the like can be given, and an oxygen atom or a sulfur atom is preferred, and an oxygen atom is more preferred. When the linking group having a linking chain length of 3 or more has a hetero atom, the hetero atom can be present at the terminal of the linking group, or the hetero atom can be present in the chain of the linking group. When the substituent containing a linking group having a linking chain length of 3 or more has a hetero atom at the terminal of the linking group, a -OH group or a -SH group is preferred, and a -OH group is more preferred from the viewpoint of improving the solubility to water-based solvents. When the substituent containing a linking group having a linking chain length of 3 or more has a hetero atom in the chain of the linking group, a -O- bond or a -S- bond is preferred, and a -O- bond is more preferred from the viewpoint of improving the flexibility and the pattern formability.

[0086] The substituent group including a linking group having a linking chain length of 3 or more can be branched to have further substituent groups. There is no particular limitation on the further substituent groups, and examples thereof include halogen atoms, alkyl groups, and hydroxyl groups, with preference given to alkyl groups and hydroxyl groups.

[0087] The linking chain length of the linking group having a linking chain length of 3 or more is preferably from 3 to 12, more preferably from 3 to 10, even more preferably from 3 to 8, and even more preferably from 3 to 6, and further preferably from 4 to 6.

[0088] In addition, when the amine compound includes two or more nitrogen atoms, if a specific nitrogen atom in the amine compound is taken as a starting point, the linking chain length of the total length of the substituent groups including a linking group having a linking chain length of 3 or more is not used, and only the linking chain length of the linking group between the nitrogen atoms up to the other nitrogen atom (counting up to the atom not exceeding the other nitrogen atom) is used. For example, in the case of N,N,N',N'-tetra(2-hydroxypropyl)ethylenediamine, it is considered to have four 2-hydroxypropyl groups having a linking chain length of 3 and one linking group having a linking chain length of 2 between the nitrogen atoms. In the case of N,N,N',N'-tetramethyl-1,6-hexanediamine, it is considered to have four methyl groups having a linking chain length of 1 and one linking group having a linking chain length of 6 between the nitrogen atoms (not counting only four methyl groups having a linking chain length of 1 from the nitrogen atom taken as the starting point and one substituent group having a linking chain length of 4 including the other nitrogen atom).

[0089] On the other hand, in the case of N,N,N',N'-tetramethylethylenediamine, it is considered to have four methyl groups having a linking chain length of 1 and one linking group having a linking chain length of 2 between the nitrogen atoms, which is outside the range of the amine compound defined in the present application (not counting two methyl groups having a linking chain length of 1 from the nitrogen atom taken as the starting point and one substituent group having a linking chain length of 4 including the other nitrogen atom).

[0090] The number of substituent groups of the nitrogen atom of the amine compound is not particularly limited, and can be any one of one, two, or three. That is, the amine compound can be any one of a primary amine, a secondary amine, or a tertiary amine. In terms of the viewpoint of the breaking property, the amine compound is preferably a secondary amine or a tertiary amine, and more preferably a tertiary amine.

[0091] When the amine compound is a secondary amine or a tertiary amine, the substituent groups of the nitrogen atom can be the same or different. When the amine compound has two or more substituent groups of the nitrogen atom including a linking group having a linking chain length of 3 or more, the substituent groups are preferably the same.

[0092] As the substituent of the nitrogen atom of the amine compound, a substituent other than the substituent including a linking group having a linking chain length of 3 or more can be present. As the other substituent, an alkyl group and an alkoxy group having a linking chain length of 2 or less can be mentioned, and these can have a further substituent. As the further substituent, there is no particular limitation, and a halogen atom, an alkyl group, and a hydroxyl group can be mentioned. As the other substituent, an unsubstituted alkyl group having a linking chain length of 2 or less is preferred.

[0093] From the viewpoint of the cleavage property, the substituents of the nitrogen atom of the amine compound preferably do not bond to each other to form a ring (i.e., a chain structure is preferred). Also, from the viewpoint of the cleavage property, the substituents of the nitrogen atom of the amine compound are preferably substituents having no ring structure.

[0094] In the present application, the amine compound is preferably a compound represented by the following general formula N.

[0095] [Chemical Formula 2]

[0096]

[0097] In the general formula N, L 1 represents a linking group having a linking chain length of 3 or more and including an oxygen atom, R 1 represents a hydrogen atom or a halogen atom. L 2 and L 3 each independently represent an alkylene group or a linking group having a linking chain length of 3 or more and including an oxygen atom, R 2 and R 3 each independently represent a hydrogen atom or a halogen atom.

[0098] In the general formula N, L 1 is preferably in the same range as the preferable range of the linking group having a linking chain length of 3 or more.

[0099] In the general formula N, L 2 and L 3 represent a linking group having a linking chain length of 3 or more and including an oxygen atom, it is preferred that they be the same as the linking group having a linking chain length of 3 or more and including an oxygen atom represented by L 1 and L 2 and L 3 represent an alkylene group, it is preferred that they be an alkylene group having 1 or 2 carbon atoms.

[0100] In the general formula N, R 1 to R 3 are preferably hydrogen atoms.

[0101] As specific examples of the amine compound, 3-(diethylamino)-l,2-propanediol, N-methyldiethanolamine, 2-[2-(dimethylamino)ethoxy]ethanol, N,N,N',N'-tetra(2-hydroxypropyl)ethylenediamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, tri(2-ethylhexyl)amine, N,N-dimethyl-n-propylamine, N,N-dimethylisopropylamine, N,N-dimethyldodecylamine, N,N,N',N'-tetramethyl-l,3-propanediamine, N,N-dimethyl-N',N'-dimethyl-l,3-propanediamine, N,N-dibutylethanolamine, bis(2-dimethylaminoethyl)ether, N,N,N',N'-tetramethyl-l,6-hexanediamine can be given. Among these, 3-(diethylamino)-l,2-propanediol, N-methyldiethanolamine, 2-[2-(dimethylamino)ethoxy]ethanol, N,N,N',N'-tetra(2-hydroxypropyl)ethylenediamine are preferred, and from the viewpoint of improving the cracking resistance, 3-(diethylamino)-l,2-propanediol, N-methyldiethanolamine, 2-[2-(dimethylamino)ethoxy]ethanol are more preferred.

[0102] In the present application, the weight average molecular weight of the amine compound is 100 or more. The upper limit of the weight average molecular weight of the amine compound is not particularly limited, and for example, it can be set to 500 or less. From the viewpoint of the cracking resistance, the weight average molecular weight of the amine compound is preferably 100 to 350, more preferably 110 to 250, and particularly preferably 120 to 200, and even more particularly preferably 130 to 150.

[0103] The amine compound can be used alone or two or more kinds can be used at the same time.

[0104] From the viewpoint of the cracking resistance, the content of the amine compound is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and further preferably 1.0% by mass or more, with respect to the total solid content in the composition of the present application. Also, the content of the amine compound is preferably 10% by mass or less, more preferably 5% by mass or less, with respect to the total solid content of the photosensitive resin composition of the present application.

[0105] From the viewpoint of the cracking resistance, the content of the amine compound is preferably 5% by mass or more, more preferably 10% by mass or more, with respect to the total solid content of the binder polymer having an acid group. From the viewpoint of the rust resistance, the content of the amine compound is preferably 35% by mass or less, more preferably 25% by mass or less, with respect to the total solid content of the binder polymer having an acid group.

[0106] In addition, the total solid content in the composition of the present application indicates the amount excluding the amount of volatile components such as a solvent, and the solid content of the present application need not be a solid, and can be a liquid, or a mixture of a solid and a liquid.

[0107] 〔Metal Oxide Particles〕

[0108] The kind of the metal oxide particles is not particularly limited, and publicly known metal oxide particles can be used.

[0109] The metal in the metal oxide particles also includes semimetals such as B, Si, Ge, As, Sb, Te, and the like.

[0110] As the metal oxide particles, specifically, at least one kind selected from the group consisting of tin oxide particles, zirconium oxide particles (Zr02particles), Nb205particles, titanium oxide particles (Ti02particles), and silicon dioxide particles (Si02particles) is preferable.

[0111] Among them, from the viewpoint of easily adjusting the refractive index of the refractive index adjusting layer to 1.6 or more, it is more preferable that the metal oxide particles contain at least one kind selected from the group consisting of zirconium oxide particles and titanium oxide particles.

[0112] As a preferable combination of the metal oxide particles, zirconium oxide particles and tin oxide particles, zirconium oxide particles and silicon oxide particles, titanium oxide particles and tin oxide particles can be given.

[0113] The metal oxide particles can be an oxide of an alloy, and as specific examples, an oxide particle of an alloy of zirconium and tin, an oxide particle of an alloy of zirconium and silicon, an oxide particle of an alloy of titanium and tin can be given.

[0114] For example, from the viewpoint of the transparency of the cured film, the average primary particle diameter of the metal oxide particles is preferably 1 nm to 200 nm, and more preferably 3 nm to 80 nm.

[0115] The particle diameters of 200 arbitrary metal oxide particles are measured using an electron microscope, and the measurement results are arithmetically averaged, whereby the average primary particle diameter of the metal oxide particles is calculated. In addition, in the case where the shape of the metal oxide particles is not spherical, the longest side is taken as the particle diameter.

[0116] The composition of the present application can contain only one kind of metal oxide particles, or two or more kinds.

[0117] From the viewpoint of the concealability of the hidden object such as the electrode pattern being improved and the visual recognition of the hidden object being effectively improved, the content of the metal oxide particles is preferably 40 mass% to 95 mass%, more preferably 40 mass% to 90 mass%, and further preferably 40 mass% to 85 mass% with respect to the total solid content in the composition of the present application.

[0118] As the metal oxide particles, when zirconium oxide particles or titanium oxide particles are used, the content of the zirconium oxide particles or the titanium oxide particles is preferably 40% by mass or more and 95% by mass or less, more preferably 40% by mass or more and 90% by mass or less, and further preferably 40% by mass or more and 85% by mass or less, with respect to the total mass of the refractive index adjusting layer.

[0119] As commercially available products of the metal oxide particles, the following can be given:

[0120] Calcined zirconium oxide particles (manufactured by CIK NanoTek Corporation, product name: ZRPGM15WT%-F04), calcined zirconium oxide particles (manufactured by CIK NanoTek Corporation, product name: ZRPGM15WT%-F74), calcined zirconium oxide particles (manufactured by CIK NanoTek Corporation, product name: ZRPGM15WT%-F75), calcined zirconium oxide particles (manufactured by CIK NanoTek Corporation, product name: ZRPGM15WT%-F76),

[0121] Zirconium oxide particles (NanoUse OZ-S30M, manufactured by Nissan Chemical Corporation), zirconium oxide particles (NanoUse OZ-S30K, manufactured by Nissan Chemical Corporation).

[0122] 〔Adhesive polymer having acid group〕

[0123] <Kind of adhesive polymer having acid group>

[0124] The adhesive polymer having an acid group (hereinafter, also simply referred to as an adhesive polymer) is preferably an alkali-soluble resin.

[0125] For example, from the viewpoint of development, the adhesive polymer is preferably an adhesive polymer having an acid value of 30 to 200 mgKOH / g, and more preferably an alkali-soluble resin having an acid value of 30 to 200 mgKOH / g.

[0126] In addition, in the present application, "alkali-solubility" means that the solubility of sodium carbonate in a 1% by mass aqueous solution at 22°C is 0.1% by mass or more.

[0127] Further, the acid value of the adhesive polymer is a value measured according to the method described in JIS K0070: 1992.

[0128] Further, for example, from the viewpoint of thermal crosslinking by heating with a crosslinking component and easy formation of a strong film, the adhesive polymer is further preferably a resin having a carboxyl group with an acid value of 30 to 160 mgKOH / g (so-called carboxyl group-containing resin), and particularly preferably an acrylic resin having a carboxyl group with an acid value of 30 to 160 mgKOH / g (so-called carboxyl group-containing acrylic resin).

[0129] In the present application, the acrylic resin refers to a resin having a structural unit derived from a (meth)acrylic compound, and the content of the structural unit is preferably 30% by mass or more, more preferably 50% by mass or more, relative to the total mass of the resin.

[0130] From the viewpoint of the moisture permeability and flexibility of the obtained cured film and the adhesiveness of the obtained uncured film, the adhesive polymer is preferably an acrylic resin or a styrene-acrylic acid copolymer.

[0131] In the present application, the styrene-acrylic acid copolymer refers to a resin having a structural unit derived from a styrene compound and a structural unit derived from a (meth)acrylic compound, and the total content of the structural unit derived from the styrene compound and the structural unit derived from the (meth)acrylic compound is preferably 30% by mass or more, more preferably 50% by mass or more, relative to the total mass of the copolymer.

[0132] Further, the content of the structural unit derived from the styrene compound is preferably 1% by mass or more, more preferably 5% by mass or more, and particularly preferably 5% by mass or more and 80% by mass or less, relative to the total mass of the copolymer.

[0133] Further, the content of the structural unit derived from the (meth)acrylic compound is preferably 5% by mass or more, more preferably 10% by mass or more, and particularly preferably 20% by mass or more and 95% by mass or less, relative to the total mass of the copolymer.

[0134] Further, as the (meth)acrylic compound, a (meth)acrylate compound, (meth)acrylic acid, a (meth)acrylamide compound, (meth)acrylonitrile, or the like can be mentioned. Among them, at least one compound selected from a (meth)acrylate compound and (meth)acrylic acid is preferable.

[0135] - Structural Unit Having an Aromatic Ring -

[0136] From the viewpoint of the moisture permeability and strength of the obtained cured film, the adhesive polymer preferably contains a structural unit having an aromatic ring.

[0137] As the monomer forming the structural unit having an aromatic ring, styrene, t-butoxy styrene, methyl styrene, α-methyl styrene, benzyl (meth)acrylate, or the like can be mentioned.

[0138] Among them, styrene compounds are preferred, and styrene is particularly preferred.

[0139] Further, from the viewpoint of the moisture permeability and strength of the obtained cured film, the adhesive polymer more preferably has a structural unit (styrene-derived structural unit) represented by the following formula (S).

[0140] [Chemical Formula 3]

[0141]

[0142] When the adhesive polymer contains a structural unit having an aromatic ring, from the viewpoint of the moisture permeability and strength of the obtained cured film, the content of the structural unit having an aromatic ring is preferably 5 to 90% by mass, more preferably 10 to 70% by mass, and particularly preferably 20 to 50% by mass, relative to the total mass of the adhesive polymer.

[0143] Further, from the viewpoint of the moisture permeability and strength of the obtained cured film, the content of the structural unit having an aromatic ring in the adhesive polymer is preferably 5 to 70% by mole, more preferably 10 to 60% by mole, and particularly preferably 20 to 50% by mole, relative to the total amount of the adhesive polymer.

[0144] Further, from the viewpoint of the moisture permeability and strength of the obtained cured film, the content of the structural unit represented by the above formula (S) in the adhesive polymer is preferably 5 to 70% by mole, more preferably 10 to 60% by mole, and particularly preferably 20 to 50% by mole, relative to the total amount of the adhesive polymer.

[0145] In addition, in the present application, when the content of the "structural unit" is specified in terms of a molar ratio, it is assumed that the meaning of the above "structural unit" is the same as that of the "monomer unit". Further, in the present application, the above "monomer unit" can be modified after polymerization by a high molecular reaction or the like. The same applies hereinafter.

[0146] - Structural Unit Having an Aliphatic Hydrocarbon Ring -

[0147] From the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, the adhesive polymer preferably contains a structural unit having an aliphatic hydrocarbon ring.

[0148] As the aliphatic hydrocarbon ring in the structural unit having an aliphatic hydrocarbon ring, mention can be made of a tricyclodecane ring, a cyclohexane ring, a cyclopentane ring, a norbornane ring, an isophorone ring, and the like.

[0149] Among these, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, a ring condensed from 2 or more aliphatic hydrocarbon rings is preferable, and a tetrahydrodicyclopentadiene ring (tricyclo[5.2.1.0 2,6 ]decane ring) is particularly preferable.

[0150] As the monomer forming the structural unit having an aliphatic hydrocarbon ring, (meth)acryldicyclopentyl ester, (meth)acrylcyclohexyl ester, (meth)acrylisobornyl ester, and the like can be given.

[0151] Further, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, the adhesive polymer more preferably has a structural unit represented by the following formula (Cy), and particularly preferably has a structural unit represented by the above formula (S) and a structural unit represented by the following formula (Cy).

[0152] [Chemical Formula 4]

[0153]

[0154] In formula (Cy), R M represents a hydrogen atom or a methyl group, R Cy represents a monovalent group having an aliphatic hydrocarbon ring structure.

[0155] R M in formula (Cy) is preferably a methyl group.

[0156] From the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, R Cy in formula (Cy) is preferably a monovalent group having an aliphatic hydrocarbon ring structure having 5 to 20 carbon atoms, more preferably a monovalent group having an aliphatic hydrocarbon ring structure having 6 to 16 carbon atoms, and particularly preferably a monovalent group having an aliphatic hydrocarbon ring structure having 8 to 14 carbon atoms.

[0157] Further, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, the aliphatic hydrocarbon ring structure of R Cy in formula (Cy) is preferably a cyclopentane ring structure, a cyclohexane ring structure, a tetrahydrodicyclopentadiene ring structure, a norbornane ring structure, or an isophorone ring structure, more preferably a cyclohexane ring structure or a tetrahydrodicyclopentadiene ring structure, and particularly preferably a tetrahydrodicyclopentadiene ring structure.

[0158] In addition, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, the aliphatic hydrocarbon ring structure of R Cy in formula (Cy) is preferably a ring structure condensed from 2 or more aliphatic hydrocarbon rings, and more preferably a ring condensed from 2 or more aliphatic hydrocarbon rings and 4 or less aliphatic hydrocarbon rings.

[0159] Further, and from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, the group in which the oxygen atom of -C(=0)0- in formula (Cy) is directly bonded to the aliphatic hydrocarbon ring structure, i.e., an aliphatic hydrocarbon ring group, is preferably a cyclohexyl group or a dicyclopentyl group, and a dicyclopentyl group is particularly preferred. Cy Further, and from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film, the group in which the oxygen atom of -C(=0)0- in formula (Cy) is directly bonded to the aliphatic hydrocarbon ring structure, i.e., an aliphatic hydrocarbon ring group, is preferably a cyclohexyl group or a dicyclopentyl group, and a dicyclopentyl group is particularly preferred.

[0160] The adhesive polymer can have only one structural unit having an aliphatic hydrocarbon ring, or can have two or more.

[0161] When the adhesive polymer contains a structural unit having an aliphatic hydrocarbon ring, the content of the structural unit having an aliphatic hydrocarbon ring, relative to the total mass of the adhesive polymer, is preferably 5 to 90 mass%, more preferably 10 to 80 mass%, and particularly preferably 20 to 70 mass%, from the viewpoint of the moisture permeability and strength of the obtained cured film.

[0162] Further, and from the viewpoint of the moisture permeability and strength of the obtained cured film, the content of the structural unit having an aliphatic hydrocarbon ring in the adhesive polymer, relative to the total amount of the adhesive polymer, is preferably 5 to 70 mol%, more preferably 10 to 60 mol%, and particularly preferably 20 to 50 mol%.

[0163] Further, and from the viewpoint of the moisture permeability and strength of the obtained cured film, the content of the structural unit represented by the above formula (Cy) in the adhesive polymer, relative to the total amount of the adhesive polymer, is preferably 5 to 70 mol%, more preferably 10 to 60 mol%, and particularly preferably 20 to 50 mol%.

[0164] When the adhesive polymer contains a structural unit having an aromatic ring and a structural unit having an aliphatic hydrocarbon ring, the total content of the structural unit having an aromatic ring and the structural unit having an aliphatic hydrocarbon ring, relative to the total mass of the adhesive polymer, is preferably 10 to 90 mass%, more preferably 20 to 80 mass%, and particularly preferably 40 to 75 mass%, from the viewpoint of the moisture permeability, flexibility, and strength of the obtained cured film.

[0165] Further, and from the viewpoint of the moisture permeability, flexibility, and strength of the obtained cured film, the total content of the structural unit having an aromatic ring and the structural unit having an aliphatic hydrocarbon ring in the adhesive polymer, relative to the total amount of the adhesive polymer, is preferably 10 to 80 mol%, more preferably 20 to 70 mol%, and particularly preferably 40 to 60 mol%.

[0166] Further, from the viewpoint of the moisture permeability, flexibility, and strength of the obtained cured film, the total content of the structural unit represented by the above formula (S) and the structural unit represented by the above formula (Cy) in the adhesive polymer, with respect to the total amount of the adhesive polymer, is preferably 10 mol% to 80 mol%, more preferably 20 mol% to 70 mol%, and particularly preferably 40 mol% to 60 mol%.

[0167] Further, from the viewpoint of the moisture permeability, flexibility, and strength of the obtained cured film, the molar amount nS of the structural unit represented by the above formula (S) and the molar amount nCy of the structural unit represented by the above formula (Cy) in the adhesive polymer preferably satisfy the relationship shown in the following formula (SCy), more preferably satisfy the following formula (SCy-1), and particularly preferably satisfy the following formula (SCy-2).

[0168] 0.2 ≤ nS / (nS + nCy) ≤ 0.8 Formula (SCy)

[0169] 0.30 ≤ nS / (nS + nCy) ≤ 0.75 Formula (SCy-1)

[0170] 0.40 ≤ nS / (nS + nCy) ≤ 0.70 Formula (SCy-2)

[0171] -Structural Unit Having an Acid Group-

[0172] From the viewpoint of the strength and developability of the obtained cured film, the adhesive polymer having an acid group contains a structural unit having an acid group.

[0173] As the acid group, a carboxyl group, a sulfo group, a phosphonic acid group, a phosphoric acid group, and the like can be given, and a carboxyl group is preferred.

[0174] As the structural unit having the acid group, a (meth)acrylic acid-derived structural unit shown in the following formula can be preferably given, and a methacrylic acid-derived structural unit can be more preferably given.

[0175] [Chemical Formula 5]

[0176]

[0177] The adhesive polymer can have one kind of structural unit having an acid group alone, or two or more kinds thereof.

[0178] When the adhesive polymer contains a structural unit having an acid group, from the viewpoint of the strength and developability of the obtained cured film, the content of the structural unit having an acid group, with respect to the total mass of the adhesive polymer, is preferably 5 mass% to 50 mass%, more preferably 5 mass% to 40 mass%, and particularly preferably 10 mass% to 30 mass%.

[0179] Also, from the viewpoint of the strength and developability of the obtained cured film, the content of the structural unit having an acid group in the adhesive polymer, relative to the total amount of the adhesive polymer, is preferably 5 to 70 mol%, more preferably 10 to 50 mol%, and particularly preferably 15 to 30 mol%.

[0180] Also, from the viewpoint of the strength and developability of the obtained cured film, the content of the structural unit derived from a (meth)acrylic acid in the adhesive polymer, relative to the total amount of the adhesive polymer, is preferably 5 to 70 mol%, more preferably 10 to 50 mol%, and particularly preferably 10 to 30 mol%.

[0181] -Structural unit having a reactive group-

[0182] From the viewpoint of the strength of the obtained cured film and the cohesiveness of the obtained uncured film, the adhesive polymer preferably has a reactive group, and more preferably contains a structural unit having a reactive group.

[0183] As the reactive group, a radical-polymerizable group is preferable, and a group containing an ethylenic unsaturated bond is more preferable. Also, when the adhesive polymer has a group containing an ethylenic unsaturated bond, the adhesive polymer preferably has a structural unit having a group containing an ethylenic unsaturated bond in a side chain.

[0184] In the present application, "main chain" means the longest bonding chain in a molecule of a high molecular compound constituting a resin, and "side chain" means an atom group branching from the main chain.

[0185] As the group containing an ethylenic unsaturated bond, an allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group are preferable, an allyl group and a (meth)acryloyloxy group are more preferable, and an allyl group is particularly preferable.

[0186] As an example of the structural unit having a reactive group, the following structural units can be given, but are not limited thereto.

[0187] [Chemical Formula 6]

[0188]

[0189] The adhesive polymer can have one kind of structural unit having a reactive group alone, or two or more kinds thereof.

[0190] When the adhesive polymer contains a structural unit having a reactive group, the content of the structural unit having a reactive group with respect to the total mass of the adhesive polymer is preferably 5 to 95 mass%, more preferably 10 to 90 mass%, and particularly preferably 70 to 90 mass%, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film.

[0191] When the adhesive polymer contains a structural unit having a reactive group, the content of the structural unit having a reactive group with respect to the total amount of the adhesive polymer is preferably 5 to 95 mole%, more preferably 10 to 90 mole%, and particularly preferably 70 to 85 mole%, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film.

[0192] As a method of introducing a reactive group into the adhesive polymer, a method of reacting an epoxy compound, a blocked isocyanate compound, an isocyanate compound, a vinyl sulfone compound, an aldehyde compound, a methylol compound, a carboxylic anhydride, or the like with a hydroxyl group, a carboxyl group, a primary amine group, a secondary amine group, an acetoacetyl group, a sulfo group, or the like can be given.

[0193] As a preferable example of the method of introducing a reactive group into the adhesive polymer, a method of synthesizing a polymer having a carboxyl group by a polymerization reaction, and then introducing a (meth)acryloyloxy group into the polymer by a high molecular reaction in which an epoxypropyl (meth)acrylate is reacted with a part of the carboxyl group of the obtained polymer can be given. By this method, an adhesive polymer having a (meth)acryloyloxy group in a side chain can be obtained.

[0194] The above polymerization reaction is preferably performed at a temperature of 70 to 100°C, and more preferably at a temperature of 80 to 90°C. As a polymerization initiator for the above polymerization reaction, an azo-based initiator is preferable, and for example, V-601 (trade name) or V-65 (trade name) manufactured by FUJIFILM Wako Pure Chemical Corporation is more preferable. The above high molecular reaction is preferably performed at a temperature of 80 to 110°C. In the above high molecular reaction, a catalyst such as an ammonium salt is preferably used.

[0195] Specific examples of the adhesive polymer having an acid group

[0196] As a specific example of the adhesive polymer having an acid group, for example, ZB-015M (manufactured by FUJIFILM Wako Pure Chemical Corporation), ARUFON UC3920 (manufactured by TOAGOSEI CO., LTD.), or the like can be given.

[0197] As the binder polymer having an acid group, the following polymers shown below can be preferably exemplified. In addition, the content ratio (a to d) and the weight average molecular weight Mw of each structural unit shown below can be appropriately changed according to the purpose.

[0198] [Chemical Formula 7]

[0199]

[0200] [Chemical Formula 8]

[0201]

[0202] Weight Average Molecular Weight of Binder Polymer Having Acid Group

[0203] The weight average molecular weight (Mw) of the binder polymer having an acid group is preferably 5,000 or more, more preferably 10,000 or more, further preferably 10,000 to 50,000, and particularly preferably 20,000 to 30,000, from the viewpoint of the strength of the obtained cured film and the adhesiveness of the obtained uncured film.

[0204] Content of Binder Polymer Having Acid Group

[0205] The composition of the present application can contain only one binder polymer having an acid group, or two or more binder polymers having an acid group.

[0206] When the single layer of the refractive index adjusting layer composed of the cured product of the composition of the present application is used as a protective film on a touch panel, for example, the content of the binder polymer having an acid group is preferably 5 to 50 mass%, more preferably 20 to 40 mass%, and further preferably 25 to 35 mass%, with respect to the total solid content of the composition of the present application, from the viewpoint of the strength of the cured film and the operability on the transfer film.

[0207] When the cured product of the composition of the present application is used as the refractive index adjusting layer and the cured product of the photosensitive resin layer is used as a protective film on a touch panel, the content of the binder polymer having an acid group is preferably 5 to 50 mass%, more preferably 10 to 40 mass%, and further preferably 12 to 35 mass%, with respect to the total solid content in the composition of the present application.

[0208] [Residual Monomer]

[0209] From the viewpoint of improving the pattern formability, the content of the residual monomer of each structural unit of the binder polymer is preferably 5,000 mass ppm or less, more preferably 2,000 mass ppm or less, and further preferably 500 mass ppm or less, relative to the total mass of the binder polymer. The lower limit is not particularly limited, and is preferably 1 mass ppm or more, and more preferably 10 mass ppm or more.

[0210] From the viewpoint of the pattern formability and reliability, the residual monomer of each structural unit of the binder polymer is preferably 3,000 mass ppm or less, more preferably 600 mass ppm or less, and further preferably 100 mass ppm or less, relative to the total mass of the photosensitive composition layer. The lower limit is not particularly limited, and is preferably 0.1 mass ppm or more, and more preferably 1 mass ppm or more.

[0211] The amount of the residual monomer of the monomer when the binder polymer is synthesized in a high molecular reaction is also preferably within the above range. For example, when the binder polymer is synthesized by allowing glycidyl acrylate to undergo a side chain reaction with a carboxylic acid, it is preferable to allow the content of the glycidyl acrylate to be within the above range.

[0212] The amount of the residual monomer can be measured by a publicly known method such as liquid chromatography or gas chromatography.

[0213] [Compound having a 6-membered heterocyclic structure]

[0214] From the viewpoint of improving the bendability and rust resistance, the composition of the present application preferably further contains a compound having a 6-membered heterocyclic structure.

[0215] In the present application, the compound having a 6-membered heterocyclic structure preferably has a monocyclic or polycyclic aromatic heterocyclic structure.

[0216] As the above heterocyclic structure possessed by the compound having a 6-membered heterocyclic structure, from the viewpoint of the development residue inhibitory property and rust resistance, it is preferable that at least one of a nitrogen atom and a sulfur atom be present within the ring structure (in the present application, also referred to as "having as a ring member"). More preferably, a nitrogen atom is present within the ring structure, and further preferably, one or two nitrogen atoms are present within the ring structure, and particularly preferably, two nitrogen atoms are present within the ring structure.

[0217] Further, from the viewpoint of the development residue inhibitory property and rust resistance, the compound having a 6-membered heterocyclic structure preferably has a 6-membered heterocyclic structure having a nitrogen atom within the ring structure as the above heterocyclic structure. In the present application, the compound having a 6-membered heterocyclic structure more preferably has a 6-membered heterocyclic structure having two nitrogen atoms within the ring structure.

[0218] Further, the above-mentioned heterocyclic ring structure possessed by the compound having a 6-membered heterocyclic ring structure can be an aliphatic heterocyclic ring structure or an aromatic heterocyclic ring structure, and can be a monocyclic heterocyclic ring structure or a polycyclic structure condensed from at least one heterocyclic ring, but from the viewpoints of volatility and rust-preventive property, an aromatic heterocyclic ring structure is preferred, and a monocyclic or 2-ring structure aromatic heterocyclic ring structure is more preferred.

[0219] Further, the compound having a 6-membered heterocyclic ring structure can have only one of the above-mentioned heterocyclic ring structures, or can have two or more of them, and from the viewpoints of development residue inhibitory property, volatility and rust-preventive property, it is preferred to have only one.

[0220] The above-mentioned heterocyclic ring structure possessed by the compound having a 6-membered heterocyclic ring structure is specifically, for example, a pyridine ring structure, a pyrimidine ring structure, a 1,3,5-triazine ring structure, a quinoline ring structure, an isoquinoline ring structure, a phthalazine ring structure, a naphthylidine ring structure, a quinoxaline ring structure, a quinazoline ring structure, a cinnoline ring structure, a purine ring structure, a phenanthridine ring structure, an acridine ring structure, or the like.

[0221] Among them, from the viewpoints of development residue inhibitory property, volatility and rust-preventive property, a pyridine ring structure, a pyrimidine ring structure, a 1,3,5-triazine ring structure or a purine ring structure is preferred, and a pyridine ring structure or a purine ring structure is more preferred.

[0222] The compound having a 6-membered heterocyclic ring structure preferably has a heterocyclic ring structure having at least one of an oxygen atom, a nitrogen atom and a sulfur atom in the ring structure, and at least one functional group selected from -SH, -OH, -COOH, -NH2and -CONH2.

[0223] In the compound having a 6-membered heterocyclic ring structure, from the viewpoints of development residue inhibitory property and rust-preventive property, the above-mentioned functional group is preferably a group directly bonded to a heterocycle in the above-mentioned heterocyclic ring structure.

[0224] The above-mentioned functional group possessed by the compound having a 6-membered heterocyclic ring structure is preferably at least one group selected from -SH, -OH, -COOH, -NH2and -CONH2from the viewpoints of development residue inhibitory property, adsorptivity to wiring and rust-preventive property, more preferably at least one group selected from -OH and -COOH, and particularly preferably -COOH.

[0225] From the viewpoints of development residue inhibitory property and rust-preventive property, the compound having a 6-membered heterocyclic structure is preferably a compound having a total of 1 to 3 of the aforementioned functional groups selected from -SH, -OH, -COOH, -NH2, and -CONH2, more preferably a compound having a total of 1 or 2 of the aforementioned functional groups selected from -SH, -OH, -COOH, -NH2, and -CONH2, and particularly preferably a compound having 1 of the aforementioned functional groups selected from -SH, -OH, -COOH, -NH2, and -CONH2.

[0226] Also, from the viewpoints of development residue inhibitory property, adsorption to wiring, volatility, and rust-preventive property, the compound having a 6-membered heterocyclic structure is preferably a compound having at least one of the aforementioned functional groups selected from -OH and -COOH, more preferably a compound having 1 or 2 of the aforementioned functional groups selected from -OH and -COOH, and particularly preferably a compound having 1 -COOH as the aforementioned functional group.

[0227] From the viewpoints of volatility and rust-preventive property, the compound having a 6-membered heterocyclic structure preferably has a molecular weight of 500 or less, more preferably 80 or more and 300 or less, further preferably 100 or more and 200 or less, and particularly preferably 100 or more and 150 or less.

[0228] The compound having a 6-membered heterocyclic structure is a compound having a pyridine ring structure, a pyrimidine ring structure, or a 1,3,5-triazine ring structure, and from the viewpoints of development residue inhibitory property and rust-preventive property, it is preferably a compound represented by any one of the following formulae (A-1) to (A-3), and more preferably a compound represented by the following formula (A-2) corresponding to a compound having a pyrimidine ring structure.

[0229] [Chemical Formula 9]

[0230]

[0231] In formulae (A-1) to (A-3), R a Each independently represents -SH, -OH, -COOH, or -NH2, n1 represents an integer of 0 to 5, n2 represents an integer of 0 to 4, and n3 represents an integer of 0 to 3.

[0232] In formulae (A-1) to (A-3), from the viewpoints of development residue inhibitory property, adsorption to wiring, and rust-preventive property, R a is preferably -SH, -OH, or -COOH, more preferably -OH or -COOH, and particularly preferably -COOH.

[0233] From the viewpoints of development residue inhibitory property, adsorption to wiring, volatility, and rust-preventive property, n1 in the formula (A-1) is preferably an integer of 1 to 3, more preferably 1 or 2, and particularly preferably 1.

[0234] From the viewpoints of development residue inhibitory property, adsorption to wiring, volatility, and rust-preventive property, n2 in the formula (A-2) is preferably an integer of 0 to 3, and more preferably 0.

[0235] From the viewpoints of development residue inhibitory property and rust-preventive property, n3 in the formula (A-3) is preferably 1 or 3, and more preferably 1.

[0236] When the compound having a 6-membered heterocyclic structure is a compound having a purine ring structure, from the viewpoint of rust-preventive property, adenine is preferred.

[0237] The compound having a 6-membered heterocyclic structure is not particularly limited, and specifically, for example, pyridine-2-carboxylic acid (2-picolinic acid), pyridine-3-carboxylic acid (nicotinic acid), pyridine-4-carboxylic acid (isonicotinic acid), 2-hydroxypyridine, 3-hydroxypyridine, 4-hydroxypyridine, 2-mercaptopyridine, 3-mercaptopyridine, 4-mercaptopyridine, 2-aminopyridine, 3-aminopyridine, 4-aminopyridine, pyridine-3,5-dicarboxylic acid, 2,3-dihydroxypyridine, pyridine-2-hydroxy-3-carboxylic acid, pyrimidine, 2-aminopyrimidine, 4-hydroxypyrimidine, 2-pyrimidine mercaptan, pyrimidine-4-carboxylic acid, 4,6-dihydroxypyrimidine, 4-amino-6-hydroxypyrimidine, 4,5-diaminopyrimidine, 2,4-diamino-l,3,5-triazine, 2,6-dihydroxyisonicotinic acid, 2-amino-4,6-dihydroxypyrimidine, 2,4-diamino-6-hydroxypyrimidine, 4,6-diamino-2-mercaptopyrimidine, cyanuric acid (trihydroxytriazine), nicotinamide, 6-methyl-nicotinamide, isonicotinamide, 2-amino-isonicotinamide, 6-amino-isonicotinamide, adenine, and the like can be mentioned.

[0238] Among them, as the compound having a 6-membered heterocyclic structure, from the viewpoints of development residue inhibitory property and rust-preventive property, at least one compound selected from the group consisting of pyridine-2-carboxylic acid, pyridine-3-carboxylic acid, 2-hydroxypyridine, 2-mercaptopyridine, 2-aminopyridine, 2,3-dihydroxypyridine, pyridine-2-hydroxy-3-carboxylic acid, pyrimidine, 2-aminopyrimidine, 4-hydroxypyrimidine, pyrimidine-4-carboxylic acid, 4,6-dihydroxypyrimidine, 2,6-dihydroxyisonicotinic acid, cyanuric acid and adenine is preferable, at least one compound selected from the group consisting of pyridine-2-carboxylic acid, pyridine-3-carboxylic acid, 2-hydroxypyridine, 2,3-dihydroxypyridine, pyridine-2-hydroxy-3-carboxylic acid, 4-hydroxypyrimidine, pyrimidine-4-carboxylic acid and 4,6-dihydroxypyrimidine, adenine is more preferable, and at least one compound selected from the group consisting of pyridine-2-carboxylic acid, pyridine-3-carboxylic acid, 2-hydroxypyridine, 2,3-dihydroxypyridine and pyridine-2-hydroxy-3-carboxylic acid, pyrimidine, adenine is especially preferable, and pyrimidine or adenine is further especially preferable in the present application.

[0239] Further, as the compound having a 6-membered heterocyclic structure, from the viewpoint of general-purpose property, pyridine-3-carboxylic acid is preferable, and from the viewpoint of balance between volatility and adsorptivity to a wiring, at least one compound selected from the group consisting of pyridine-2-carboxylic acid, 2-hydroxypyridine, 2,3-dihydroxypyridine, pyridine-2-hydroxy-3-carboxylic acid, 4-hydroxypyrimidine, pyrimidine-4-carboxylic acid and 4,6-dihydroxypyrimidine is preferable.

[0240] The compound having a 6-membered heterocyclic structure can be used alone or two or more kinds thereof can be used simultaneously.

[0241] From the viewpoints of development residue inhibitory property and rust-preventive property, the content of the compound having a 6-membered heterocyclic structure is preferably 0.01 to 20 mass% relative to the total solid content in the photosensitive resin composition, more preferably 0.05 to 10 mass%, further preferably 0.1 to 2.0 mass%, and especially preferably 0.2 to 1.8 mass%.

[0242] The composition of the present application can contain other components in addition to the above-mentioned components.

[0243] As the other components which can be contained in the composition of the present application, the same components as the respective components to be contained in the photosensitive resin layer described later can be mentioned.

[0244] 〔Metal Oxidation Inhibitor〕

[0245] Further, from the viewpoint of oxidation inhibitory property of a metal which contacts with the refractive index adjusting layer, the composition of the present application can contain at least one metal oxidation inhibitor.

[0246] As the metal oxidation inhibitor, for example, a compound having an aromatic ring containing a nitrogen atom in the molecule other than a compound having a 6-membered heterocyclic structure can be preferably mentioned.

[0247] As examples of the metal oxidation inhibitor, imidazole, triazole, benzimidazole, tetrazole, mercaptothiadiazole, benzotriazole and the like can be mentioned.

[0248] [ethylenically unsaturated compound]

[0249] As to the composition of the present application, when a cured product thereof is used as a single layer of a refractive index adjusting layer for a protective film on a touch panel, it is preferable to further have an ethylenically unsaturated compound.

[0250] As the ethylenically unsaturated compound, a radical polymerizable compound having a group containing an ethylenically unsaturated bond is preferable.

[0251] The radical polymerizable compound having a group containing an ethylenically unsaturated bond is a component that contributes to the photosensitivity (i.e., photocurability) of the refractive index adjusting layer and the strength of a cured film formed by curing the refractive index adjusting layer.

[0252] Further, the ethylenically unsaturated compound is a compound having one or more groups containing an ethylenically unsaturated bond.

[0253] The composition of the present application preferably contains an ethylenically unsaturated compound having two or more functions as the ethylenically unsaturated compound.

[0254] Here, the ethylenically unsaturated compound having two or more functions means a compound having two or more groups containing an ethylenically unsaturated bond in one molecule.

[0255] As the group containing an ethylenically unsaturated bond, a (meth)acryloyl group is more preferable.

[0256] As the ethylenically unsaturated compound, a (meth)acrylate compound is preferable.

[0257] From the viewpoint of the curability after curing, the composition of the present application particularly preferably contains an ethylenically unsaturated compound having two functions (preferably a (meth)acrylate compound having two functions) and an ethylenically unsaturated compound having three or more functions (preferably a (meth)acrylate compound having three or more functions).

[0258] As the ethylenically unsaturated compound having two functions, there is no particular limitation, and it can be appropriately selected from publicly known compounds.

[0259] As the ethylenically unsaturated compound having two functions, tricyclodecane dimethanol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate and the like can be mentioned.

[0260] As the 2-functional olefinically unsaturated compound, more specifically, tricyclodecane dimethanol diacrylate (trade name: NK Ester A-DCP, manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD.), tricyclodecane dimethanol dimethacrylate (trade name: NK Ester DCP, manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD.), 1,9-nonanediol diacrylate (trade name: NK Ester A-NOD-N, manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD.), 1,6-hexanediol diacrylate (trade name: NK Ester A-HD-N, manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD.), and the like can be given.

[0261] As the 3 or more functional olefinically unsaturated compound, there is no particular limitation, and it can be appropriately selected from publicly known compounds.

[0262] As the 3 or more functional olefinically unsaturated compound, for example, dipentaerythritol (tri / tetra / penta / hexa) (meth)acrylate, pentaerythritol (tri / tetra) (meth)acrylate, trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, isocyanuric acid (meth)acrylate, (meth)acrylate compounds having a glycerol tri(meth)acrylate skeleton, and the like can be given.

[0263] Among them, "(tri / tetra / penta / hexa) (meth)acrylate" is a concept including tri(meth)acrylate, tetra(meth)acrylate, penta(meth)acrylate, and hexa(meth)acrylate, and "(tri / tetra) (meth)acrylate" is a concept including tri(meth)acrylate and tetra(meth)acrylate.

[0264] As the 3 or more functional olefinically unsaturated compound, dipentaerythritol hexaacrylate (DPHA, manufactured by Toshin Yushi Co., Ltd.) and the like can be given.

[0265] As the ethylenically unsaturated compound, a caprolactone-modified compound of a (meth)acrylate compound (KAYARAD (registered trademark) DPCA-20 manufactured by Nippon Kayaku Co., Ltd., A-9300-1CL manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD., etc.), an alkylene oxide-modified compound of a (meth)acrylate compound (KAYARAD RP-1040 manufactured by Nippon Kayaku Co., Ltd., ATM-35E, A-9300 manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD., EBECRYL (registered trademark) 135 manufactured by DAICEL-ALLNEX LTD., etc.), an ethoxylated glycerol triacrylate (A-GLY-9E manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD., etc.), etc. can also be given.

[0266] As the ethylenically unsaturated compound, a urethane (meth)acrylate compound (preferably a urethane (meth)acrylate compound of 3 or more functions) can also be given.

[0267] As the urethane (meth)acrylate compound of 3 or more functions, for example, 8UX-015A manufactured by Taisei Fine Chemical Co., LTD., NK Ester UA-32P manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD., NK Ester UA-1100H manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD., AH-600 manufactured by KYOEISHA CHEMICAL Co., LTD., UA-306H, UA-306T, UA-306I, UA-510H, UX-5000 (all of which are manufactured by Nippon Kayaku Co., Ltd.), etc. can be given.

[0268] Further, from the viewpoint of improving developability, the ethylenically unsaturated compound preferably contains an ethylenically unsaturated compound having an acid group.

[0269] As the acid group, for example, a phosphoric acid group, a sulfonic acid group, and a carboxyl group can be given, with the carboxyl group being preferred.

[0270] Examples of olefinic unsaturated compounds with acid groups include, for instance, 3- to 4-functional olefinic unsaturated compounds with acid groups (compounds with carboxyl groups introduced into the pentaerythritol tri- and tetraacrylate (PETA) backbone (acid value = 80-120 mg KOH / g)) and 5- to 6-functional olefinic unsaturated compounds with acid groups (compounds with carboxyl groups introduced into the dipentaerythritol penta- and hexaacrylate (DPHA) backbone (acid value = 25-70 mg KOH / g)). These 3- or more functional olefinic unsaturated compounds with acid groups can be used simultaneously with 2-functional olefinic unsaturated compounds with acid groups as needed.

[0271] The preferred olefinic unsaturated compound is selected from at least one of a difunctional olefinic unsaturated compound containing a carboxyl group and its carboxylic anhydride. This results in improved developability and strength of the cured film.

[0272] There are no particular restrictions on difunctional or higher-functional olefinic unsaturated compounds containing carboxyl groups; appropriate selection can be made from known compounds.

[0273] As a difunctional or more olefinic unsaturated compound containing a carboxyl group, ARONIX (registered trademark) TO-2349 (manufactured by TOAGOSEI CO.,LTD.), ARONIX M-520 (manufactured by TOAGOSEI CO.,LTD.) or ARONIX M-510 (manufactured by TOAGOSEI CO.,LTD.) can be preferably used.

[0274] The olefinic unsaturated compounds having acid groups are preferably polymerizable compounds having acid groups as described in paragraphs 0025 to 0030 of Japanese Patent Application Publication No. 2004-239942. The contents of this publication are incorporated herein by reference.

[0275] <Compound M>

[0276] In this invention, the olefinic unsaturated compound is preferably a compound M represented by the following formula (M) (also simply referred to as "compound M").

[0277] Q 2 -R 1 -Q 1 Formula (M)

[0278] In equation (M), Q 1 and Q 2 Each independently represents (meth)acryloyloxy, R 1 This represents a divalent linker with a chain-like structure.

[0279] Regarding Q in equation (M) 1 and Q 2 From the perspective of ease of synthesis, Q1 and Q 2 are preferably the same group.

[0280] and, from the viewpoint of reactivity, Q 1 and Q 2 is preferably acryloyloxy.

[0281] from the viewpoint of flexibility of the obtained cured film, R 1 is preferably an alkylene group, an alkyleneoxyalkylene group (-L 1 -O-L 1 -) or a polyalkyleneoxyalkylene group (-L 1 -O) p -L 1 -), more preferably a hydrocarbon group having 2 to 20 carbon atoms or a polyalkyleneoxyalkylene group, further preferably an alkylene group having 4 to 20 carbon atoms, and particularly preferably a linear alkylene group having 6 to 18 carbon atoms. The above hydrocarbon group can have a chain structure in at least a part thereof, and is not particularly limited as a part other than the above chain structure, and can be, for example, a branched alkylene group, a cyclic alkylene group, a linear alkylene group, an arylene group, an ether bond or a combination thereof. From the viewpoint of flexibility of the obtained cured film, an alkylene group or a group in which two or more alkylene groups and one or more arylene groups are combined is preferred, more preferably an alkylene group, and particularly preferably a linear alkylene group.

[0282] In addition, the above L 1 each independently represents an alkylene group, and is preferably an ethylene group, a propylene group or a butylene group, and more preferably an ethylene group or a 1,2-propylene group. p represents an integer of 2 or more, and is preferably an integer of 2 to 10.

[0283] and, from the viewpoint of moisture permeability and flexibility of the obtained cured film, the shortest linking chain between Q 1 and Q 2 preferably has 3 to 50 atoms, more preferably 4 to 40 atoms, further preferably 6 to 20 atoms, and particularly preferably 8 to 12 atoms.

[0284] In the present application, the "number of atoms of the shortest linking chain between Q 1 and Q 2 is the number of the shortest atoms linking an atom in R 1 linked to Q 1 to an atom in R 2 linked to Q 1 .

[0285] As specific examples of the compound M, 1,3-butanediol di(meth)acrylate, tetramethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,7-heptanediol di(meth)acrylate, 1,8-octanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, 1,4-cyclohexanediol di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, di(meth)acrylate of hydrogenated bisphenol A, di(meth)acrylate of hydrogenated bisphenol F, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, poly(ethylene glycol / propylene glycol) di(meth)acrylate, polybutylene glycol di(meth)acrylate can be given. The above ester monomers can also be used as a mixture.

[0286] Among the above compounds, from the viewpoint of the flexibility of the obtained cured film, at least one compound selected from the group consisting of 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate and neopentyl glycol di(meth)acrylate is preferred, at least one compound selected from the group consisting of 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate and 1,10-decanediol di(meth)acrylate is more preferred, and at least one compound selected from the group consisting of 1,9-nonanediol di(meth)acrylate and 1,10-decanediol di(meth)acrylate is particularly preferred.

[0287] The compound M can be used singly or two or more kinds can be used simultaneously.

[0288] The weight average molecular weight (Mw) of the ethylenically unsaturated compound is preferably 200 to 3,000, more preferably 250 to 2,600, further preferably 280 to 2,200, and particularly preferably 300 to 2,200.

[0289] Further, in the ethylenically unsaturated compound used in the composition of the present application, the proportion of the content of the ethylenically unsaturated compound having a weight average molecular weight of 300 or less, relative to all the ethylenically unsaturated compounds contained in the composition of the present application, is preferably 30% by mass or less, more preferably 25% by mass or less, and further preferably 20% by mass or less.

[0290] The ethylenically unsaturated compound can be used singly or two or more kinds can be used simultaneously.

[0291] When the single layer of the refractive index adjusting layer composed of the cured product of the composition of the present application is used as a protective film on a touch panel, the content of the ethylenically unsaturated compound in the composition of the present application is preferably 1 to 60 mass%, more preferably 5 to 50 mass%, further preferably 10 to 40 mass%, and particularly preferably 10 to 20 mass% relative to the total mass of the composition of the present application, from the viewpoint of ensuring the transferability (adhesion to a substrate) and the curability in a single layer.

[0292] When the cured product of the composition of the present application is used as a refractive index adjusting layer and the cured product of the photosensitive resin layer is used as a protective film on a touch panel, the ethylenically unsaturated compound of the refractive index adjusting layer can be reduced because the photosensitive resin layer is responsible for the transferability and the curability. At this time, the content of the ethylenically unsaturated compound is preferably 0.1 to 60 mass%, more preferably 0.5 to 10 mass%, and particularly preferably 1.0 to 5 mass% relative to the total mass of the composition of the present application.

[0293] Further, when the composition of the present application contains a 2-functional ethylenically unsaturated compound and a 3-functional or higher ethylenically unsaturated compound, the content of the 2-functional ethylenically unsaturated compound is preferably 10 to 90 mass%, more preferably 20 to 85 mass%, and further preferably 30 to 80 mass% relative to all the ethylenically unsaturated compounds contained in the composition of the present application.

[0294] Further, at this time, the content of the 3-functional or higher ethylenically unsaturated compound is preferably 10 to 90 mass%, more preferably 15 to 80 mass%, and further preferably 20 to 70 mass% relative to all the ethylenically unsaturated compounds contained in the composition of the present application.

[0295] Further, at this time, the content of the 2-functional or higher ethylenically unsaturated compound is preferably 40 mass% or more and less than 100 mass%, more preferably 40 to 90 mass%, further preferably 50 to 80 mass%, and particularly preferably 50 to 70 mass% relative to the total content of the 2-functional ethylenically unsaturated compound and the 3-functional or higher ethylenically unsaturated compound.

[0296] Further, when the composition of the present application contains a 2-functional or higher ethylenically unsaturated compound, the composition of the present application can further contain a monofunctional ethylenically unsaturated compound.

[0297] Further, when the composition of the present application contains a 2-functional or higher ethylenically unsaturated compound, the 2-functional or higher ethylenically unsaturated compound is preferably a main component among the ethylenically unsaturated compounds contained in the composition of the present application.

[0298] Specifically, when the composition of the present application contains the olefinically unsaturated compound having 2 or more functionalities, the content of the olefinically unsaturated compound having 2 or more functionalities is preferably 60% by mass or more to 100% by mass or less, more preferably 80% by mass or more to 100% by mass or less, and particularly preferably 90% by mass or more to 100% by mass or less, relative to the total content of the olefinically unsaturated compounds contained in the composition of the present application.

[0299] Further, the composition of the present application preferably contains an olefinically unsaturated compound having an acid group (preferably a 2 or more functional olefinically unsaturated compound containing a carboxyl group or a carboxylic anhydride thereof). The content of the olefinically unsaturated compound having an acid group is preferably 1% by mass or more to 50% by mass or less, more preferably 1% by mass or more to 20% by mass or less, and further preferably 1% by mass or more to 10% by mass or less, relative to the composition of the present application.

[0300] The olefinically unsaturated compound can be used singly or two or more kinds can be used simultaneously.

[0301] 〔Photopolymerization initiator〕

[0302] The composition of the present application can contain a photopolymerization initiator.

[0303] Especially, when the single layer of the refractive index adjusting layer composed of the cured product of the composition of the present application is used as a protective film on a touch panel, the composition of the present application preferably contains a photopolymerization initiator.

[0304] The photopolymerization initiator is not particularly limited, and a publicly known photopolymerization initiator can be used.

[0305] As the photopolymerization initiator, a photopolymerization initiator having an oxime ester structure (hereinafter, also referred to as "oxime-based photopolymerization initiator"), a photopolymerization initiator having an α-aminoalkylphenone structure (hereinafter, also referred to as "α-aminoalkylphenone-based photopolymerization initiator"), a photopolymerization initiator having an α-hydroxyalkylphenone structure (hereinafter, also referred to as "α-hydroxyalkylphenone-based photopolymerization initiator"), a photopolymerization initiator having an acylphosphine oxide structure (hereinafter, also referred to as "acylphosphine oxide-based photopolymerization initiator"), a photopolymerization initiator having an N-phenylglycine structure (hereinafter, also referred to as "N-phenylglycine-based photopolymerization initiator"), and the like can be exemplified.

[0306] The photopolymerization initiator preferably contains at least one kind selected from the group consisting of the oxime-based photopolymerization initiator, the α-aminoalkylphenone-based photopolymerization initiator, the α-hydroxyalkylphenone-based photopolymerization initiator, and the N-phenylglycine-based photopolymerization initiator, and more preferably contains at least one kind selected from the group consisting of the oxime-based photopolymerization initiator, the α-aminoalkylphenone-based photopolymerization initiator, and the N-phenylglycine-based photopolymerization initiator.

[0307] Further, as the photopolymerization initiator, for example, the polymerization initiators described in paragraphs 0031 to 0042 of Japanese Patent Application Publication No. 2011-95716 and paragraphs 0064 to 0081 of Japanese Patent Application Publication No. 2015-014783 can be used.

[0308] As commercially available products of the photopolymerization initiator, 1-[4-(phenylthio)phenyl]-1,2-octanedione-2-(O-benzoyl oxime) (trade name: IRGACURE (registered trademark) OXE-01, manufactured by BASF Corporation), 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone-1-(O-acetyloxime) (trade name: IRGACURE (registered trademark) OXE-02, manufactured by BASF Corporation), IRGACURE (registered trademark) OXE03 (manufactured by BASF Corporation), IRGACURE (registered trademark) OXE04 (manufactured by BASF Corporation), 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone (trade name: IRGACURE (registered trademark) 379EG, manufactured by BASF Corporation), 2-methyl-1-(4-methylthiophenyl)-2-morpholinyl-1-propanone (trade name: IRGACURE (registered trademark) 907, manufactured by BASF Corporation), 2-hydroxy-1-{4-[4-(2-hydroxy-2-methylpropionyl)benzyl]phenyl}-2-methylpropan-1-one (trade name: IRGACURE (registered trademark) 127, manufactured by BASF Corporation), 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butanone-1 (trade name: IRGACURE (registered trademark) 369, manufactured by BASF Corporation), 2-hydroxy-2-methyl-1-phenylpropan-1-one (trade name: IRGACURE (registered trademark) 1173, manufactured by BASF Corporation), 1-hydroxycyclohexyl phenyl ketone (trade name: IRGACURE (registered trademark) 184, manufactured by BASF Corporation), 2,2-dimethoxy-1,2-diphenylethan-1-one (trade name: IRGACURE (registered trademark) 651, manufactured by BASF Corporation), an oxime ester type (trade name: Lunar (registered trademark) 6, manufactured by DKSH Japan K.K.), 1-[4-(phenylthio)phenyl]-3-cyclopentylpropane-1,2-dione-2-(O-benzoyl oxime) (trade name: TR-PBG-305, manufactured by Changzhou Tronly New Electronic Materials CO., LTD.), 1,2-propanedione, 3-cyclohexyl-1-[9-ethyl-6-(2-furanylcarbonyl)-9H-carbazol-3-yl]-, 2-(O-acetyloxime) (trade name: TR-PBG-326, manufactured by Changzhou Tronly New Electronic Materials CO., LTD.),(1) 3-cyclohexyl-1-(6-(2-(benzoyloxyimino)hexanoyl)-9-ethyl-9H-carbazol-3-yl)-propane-1,2-dione-2-(O-benzoyl oxime) (trade name: TR-PBG-391, manufactured by Changzhou Tronly New Electronic Materials CO., LTD.), (2) 1-(diphenyl-4-yl)-2-methyl-2-morpholinopropan-1-one (trade name: API-307, manufactured by Shenzhen UV-ChemTech LTD.), and the like.

[0309] The content of the photopolymerization initiator is not particularly limited, and is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and further preferably 1.0% by mass or more, relative to the total solid content of the composition of the present application.

[0310] Also, the content of the photopolymerization initiator is preferably 10% by mass or less, and more preferably 5% by mass or less, relative to the total solid content of the composition of the present application.

[0311] The photopolymerization initiator can be used alone or two or more kinds can be used simultaneously.

[0312] (Surfactant)

[0313] The composition of the present application can contain a surfactant.

[0314] The surfactant is not particularly limited, and a publicly known surfactant can be used.

[0315] As the surfactant, the surfactants described in paragraph 0017 of Japanese Patent No. 4502784 and paragraphs 0060 to 0071 of Japanese Patent Application Publication No. 2009-237362 can be mentioned.

[0316] As the surfactant, a fluorine-based surfactant or a silicon-based surfactant is preferred.

[0317] As a commercially available product of the fluorine-based surfactant, for example, the following can be mentioned:

[0318] MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-551-A, F-552, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-41, R-41-LM, R-01, R-40, R-40-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all of which are manufactured by DIC Corporation),

[0319] Fluorad FC430, FC431, FC171 (all of which are manufactured by Sumitomo 3M Limited),

[0320] Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all of which are manufactured by AGC Inc.),

[0321] PolyFox PF636, PF656, PF6320, PF6520, PF7002 (all of which are manufactured by OMNOVA Solutions Inc.),

[0322] Futergent 710FM, 610FM, 601AD, 601ADH2, 602A, 215M, 245F, 251, 212M, 250, 209F, 222F, 208G, 710LA, 710FS, 730LM, 650AC, 681 (all of which are manufactured by NEOS COMPANY LIMITED), and the like.

[0323] Further, as the fluorine-based surfactant, an acrylic compound having a molecular structure (having a functional group containing a fluorine atom) and a part of the functional group containing a fluorine atom is cleaved upon heating, whereby the fluorine atom is volatilized, can be preferably used. As such a fluorine-based surfactant, MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), NIKKEI BUSINESS DAILY (February 23, 2016)) can be mentioned, for example, MEGAFACE DS-21.

[0324] Also, as the fluorine-based surfactant, a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound is preferably used.

[0325] The fluorine-based surfactant can also use a block polymer. The fluorine-based surfactant can also preferably use a fluorine atom-containing high molecular compound containing a repeating unit derived from a (meth)acrylate compound having a fluorine atom and a repeating unit derived from a (meth)acrylate compound having 2 or more (preferably 5 or more) alkylene oxide groups (preferably ethylene oxide, propylene oxide).

[0326] The fluorine-based surfactant can also use a fluorine atom-containing polymer having a group containing an ethylenic unsaturated bond in a side chain. MEGAFACE RS-101, RS-102, RS-718K, RS-72-K (all manufactured by DIC Corporation), and the like can be given.

[0327] As the silicone-based surfactant, a linear polymer composed of a siloxane bond and a modified siloxane polymer into which an organic group is introduced in a side chain or a terminal can be given.

[0328] As a commercial product of the silicone-based surfactant, the following can be given:

[0329] DOWSIL 8032 ADDITIVE, Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (all manufactured by Dow Toray Co., Ltd.), and

[0330] X-22-4952, X-22-4272, X-22-6266, KF-351A, K354L, KF-355A, KF-945, KF-640, KF-642, KF-643, X-22-6191, X-22-4515, KF-6004, KP-341, KF-6001, KF-6002 (all manufactured by Shin-Etsu Chemical Co., LTD.),

[0331] F-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials Inc.),

[0332] BYK307, BYK323, BYK330 (above, manufactured by BYK-Chemie GmbH), and the like.

[0333] As the nonionic surfactant, the following can be given:

[0334] glycerin, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates of these (e.g., glycerin propoxylate, glycerin ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, nonylphenol polyoxyethylene ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, and the like.

[0335] As the commercially available product of the nonionic surfactant, the following can be given: PLURONIC L10, L31, L61, L62, 10R5, 17R2, 25R2 (above, manufactured by BASF Corporation),

[0336] TETRONIC 304, 701, 704, 901, 904, 150R1 (above, manufactured by BASF Corporation),

[0337] SOLSPERSE 20000 (above, manufactured by Lubrizol Japan LTD.), NCW-101, NCW-1001, NCW-1002 (above, manufactured by FUJIFILM Wako Pure Chemical Corporation),

[0338] PIONIN D-6112, D-6112-W, D-6315 (above, manufactured by TAKEMOTO OIL & FAT Co., LTD.),

[0339] OLFIN E1010, Surfynol 104, 400, 440 (above, manufactured by Nissan Chemical Industries, LTD.), and the like.

[0340] The composition of the present application can contain only one surfactant, or can contain two or more.

[0341] When the surfactant is contained, the content of the surfactant is preferably 0.01 to 3.0% by mass, more preferably 0.05 to 1.0% by mass, and further preferably 0.10 to 0.80% by mass, relative to the total solid content of the composition of the present application.

[0342] [Solvent]

[0343] The composition of the present application preferably contains a solvent.

[0344] If the composition of the present application contains a solvent, the formation of a refractive index adjusting layer based on coating becomes easier.

[0345] As the solvent, a generally used solvent can be used without particular limitation.

[0346] As the solvent, a water-based solvent or an organic solvent is preferable.

[0347] The kind of the solvent can be appropriately selected depending on the kind of the base layer at the time of forming the transfer film with the composition of the present application.

[0348] For example, in the case where the base layer of the refractive index adjusting layer at the time of forming the transfer film with the composition of the present application is a temporary support, either of a water-based solvent or an organic solvent can be selected. Or in the case where the base layer of the refractive index adjusting layer is an intermediate layer described later, a solvent which does not dissolve the intermediate layer can be appropriately selected.

[0349] On the other hand, in the case where the transfer film of the present application has a photosensitive resin layer between the refractive index adjusting layer and the temporary support, for example, in the case where the photosensitive resin layer is formed using a photosensitive resin composition containing an organic solvent, the composition of the present application preferably selects a water-based solvent.

[0350] As the water-based solvent, a solvent described as a water-based solvent in paragraphs 0161 and 0162 of Japanese Patent Application Publication No. 2018-024226 can be used, the content of which is incorporated into the present application. For example, as the water-based solvent, water or a mixed solvent of a lower alcohol having 1 to 3 carbon atoms and water is preferable. It is preferable to contain water and an alcohol having 1 to 3 carbon atoms, and more preferable to contain water or a mixed solvent in which the mass ratio of an alcohol having 1 to 3 carbon atoms / water is 20 / 80 to 80 / 20. As the mixed solvent, a mixed solvent of water and methanol, a mixed solvent of water and ethanol is preferable, and from the viewpoint of drying and coatability, a mixed solvent of water and methanol is preferable. In particular, in the case where a mixed solvent of water and methanol (MeOH) is used when forming the refractive index adjusting layer, the mass ratio (mass % ratio) of MeOH / water is preferably 20 / 80 to 80 / 20, more preferably 30 / 70 to 75 / 25, and further preferably 40 / 60 to 70 / 30. By controlling within the above range, the photosensitive resin layer and the refractive index adjusting layer do not layer-mix each other at the interface and coating and rapid drying can be achieved.

[0351] As the organic solvent, methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (alternative name: 1-methoxy-2-propyl acetate), diethylene glycol ethyl methyl ether, cyclohexanone, methyl isobutyl ketone, ethyl lactate, methyl lactate, caprolactam, n-propanol, 2-propanol, and the like can be exemplified.

[0352] As the solvent, a mixed solvent of methyl ethyl ketone and propylene glycol monomethyl ether acetate or a mixed solvent of diethylene glycol ethyl methyl ether and propylene glycol monomethyl ether acetate is preferred.

[0353] As the solvent, the solvents described in paragraphs 0054 and 0055 of U.S. Patent Application Publication No. 2005 / 282073 can be used, the content of which is incorporated into the present application.

[0354] Further, as the solvent, an organic solvent (high-boiling solvent) having a boiling point of 180°C to 250°C can also be used as necessary.

[0355] When the composition of the present application contains a solvent, it can contain only one kind of solvent or two or more kinds of solvents.

[0356] When the composition of the present application contains a solvent, the amount of the solid component of the composition of the present application relative to the total mass of the composition of the present application is preferably 0.5 mass% to 80 mass%, more preferably 1.0 mass% to 40 mass%, and particularly preferably 1.5 mass% to 30 mass%.

[0357] When the composition of the present application contains a solvent, the viscosity of the composition of the present application at 25°C is preferably 1 mPa-s to 50 mPa-s, more preferably 2 mPa-s to 40 mPa-s, and further preferably 3 mPa-s to 30 mPa-s, for example, from the viewpoint of coatability.

[0358] The viscosity is measured using a viscometer. As the viscometer, for example, a viscometer (trade name: VISCOMETER TV-22) manufactured by Toki Sangyo Co., Ltd. can be preferably used. However, the viscometer is not limited thereto.

[0359] When the composition of the present application contains a solvent, the surface tension of the composition of the present application at 25°C is preferably 5 mN / m to 100 mN / m, more preferably 10 mN / m to 80 mN / m, and further preferably 15 mN / m to 40 mN / m, for example, from the viewpoint of coatability.

[0360] The surface tension is measured using a surface tension meter. As the surface tension meter, for example, a surface tension meter (trade name: Automatic Surface Tensiometer CBVP-Z) manufactured by Kyowa Interface Science Co., Ltd. can be preferably used. However, the surface tension meter is not limited thereto.

[0361] [Other Components]

[0362] As to the other components of the composition of the present application, reference can be made to the components of the curable second resin layer described in paragraphs 0019 to 0040 and paragraphs 0144 to 0150 of Japanese Patent Application Publication No. 2014-108541, the components of the transparent layer described in paragraphs 0024 to 0035 and paragraphs 0110 to 0112 of Japanese Patent Application Publication No. 2014-10814, the components of the composition having an ammonium salt described in paragraphs 0034 to 0056 of International Publication No. 2016 / 009980, and the like.

[0363] 〔Impurities〕

[0364] In the composition of the present application, the content of impurities in the composition of the present application and the photosensitive resin layer described later is preferably small from the viewpoint of improving reliability and pattern formability.

[0365] As specific examples of the impurities, mention can be made of sodium, potassium, magnesium, calcium, iron, manganese, copper, aluminum, titanium, chromium, cobalt, nickel, zinc, tin, and ions of these, and halide ions (chloride ions, bromide ions, iodide ions, and the like). Among these, sodium ions, potassium ions, and chloride ions are easily mixed as impurities, and thus it is particularly preferable to set the content to the following.

[0366] The content of the impurities in each layer is preferably 1,000 ppm or less, more preferably 200 ppm or less, particularly preferably 40 ppm or less, more particularly preferably 10 ppm or less, and further more particularly preferably 5 ppm or less, on a mass basis. The lower limit is not particularly limited, but from the viewpoint of the limit of actual reducibility and the limit of measurement, it can be set to 10 ppb or more, and it can also be set to 100 ppb or more, on a mass basis.

[0367] As a method of reducing the impurities to the above range, mention can be made of selecting a raw material for each layer so as not to contain impurities, preventing the mixing of impurities at the time of forming the layer, washing and removing, and the like. By this method, the amount of impurities can be made to be within the above range.

[0368] As to the impurities, for example, quantification can be performed by a publicly known method such as ICP (Inductively Coupled Plasma) emission spectrometry, atomic absorption spectrometry, ion chromatography, and the like.

[0369] Also, the content of benzene, formaldehyde, trichloroethylene, 1,3-butadiene, carbon tetrachloride, chloroform, N,N-dimethylformamide, N,N-dimethylacetamide, hexane, and the like in each layer is preferably small. As the content of these compounds in each layer, it is preferably 1,000 ppm or less, more preferably 200 ppm or less, particularly preferably 40 ppm or less, more particularly preferably 10 ppm or less, and further more particularly preferably 5 ppm or less, on a mass basis. The lower limit is not particularly limited, but from the viewpoint of the limit of practical reduction and the limit of measurement, it can be set to 10 ppb or more, and can be set to 100 ppb or more.

[0370] The content of impurities of the compound can be suppressed by the same method as the impurities of the metal described above. Also, it can be quantified by a publicly known measurement method.

[0371] [Method for producing composition]

[0372] The method for producing the composition of the present application includes a step of producing a composition using metal oxide particles, an adhesive polymer having an acid group, and an amine compound, as a substituent of a nitrogen atom of the amine compound, a substituent including a linking group having a linking chain length of 3 or more, and the weight average molecular weight of the amine compound is 100 or more.

[0373] The step of producing a composition using metal oxide particles, an adhesive polymer having an acid group, and an amine compound is not particularly limited, and the composition can be produced by a publicly known method.

[0374] The other preferable modes of the method for producing the composition of the present application are the same as those of the composition of the present application.

[0375] [Cured film]

[0376] The cured film of the present application is a cured film of the composition of the present application.

[0377] The preferable modes of the cured film of the present application are substantially the same as those of the composition of the present application, except for the case where the composition contains an ethylenically unsaturated compound and the ethylenically unsaturated compound is cured, and the case where the composition contains a polymerization initiator and the polymerization initiator is decomposed.

[0378] [Transfer film]

[0379] The transfer film of the present application has a temporary support and a refractive index adjusting layer containing the composition of the present application.

[0380] Hereinafter, each layer of the transfer film of the present application will be described in detail.

[0381] [Temporary support]

[0382] The transfer film of the present application has a temporary support.

[0383] The temporary support is preferably a film, more preferably a resin film. As the temporary support, a film having flexibility and not undergoing significant deformation, shrinkage or stretching under pressure or pressure and heat can be used.

[0384] As such a film, for example, a polyethylene terephthalate film (e.g., biaxially stretched polyethylene terephthalate film), a triacetyl cellulose film, a polystyrene film, a polyimide film and a polycarbonate film can be mentioned.

[0385] Among these, a biaxially stretched polyethylene terephthalate film is particularly preferable as the temporary support.

[0386] Further, the film used as the temporary support preferably has no deformation such as wrinkles, no scratches and the like.

[0387] From the viewpoint of being able to perform pattern exposure via the temporary support, it is preferable that the transparency of the temporary support be high, and the transmittance at 365 nm be preferably 60% or more, more preferably 70% or more.

[0388] From the viewpoints of the pattern formability at the time of pattern exposure via the temporary support and the transparency of the temporary support, it is preferable that the haze of the temporary support be small. Specifically, the haze value of the temporary support is preferably 2% or less, more preferably 0.5% or less, and particularly preferably 0.1% or less.

[0389] From the viewpoints of the pattern formability at the time of pattern exposure via the temporary support and the transparency of the temporary support, it is preferable that the number of fine particles, foreign matter or defects contained in the temporary support be small. The number of fine particles, foreign matter or defects having a diameter of 1 μm or more is preferably 50 or less per 10 mm 2 More preferably, 10 or less per 10 mm 2 Further preferably, 3 or less per 10 mm 2 Especially preferably, 0 or less per 10 mm 2 .

[0390] The arithmetic average roughness Ra of the surface of the temporary support of the transfer film of the present application on the side of the refractive index adjustment layer is 50 nm or less, preferably 1 to 20 nm, and more preferably 1 to 12 nm.

[0391] Here, the arithmetic average roughness Ra is an arithmetic average roughness according to JIS B0601:2001 measured using an optical surface texture measuring device.

[0392] In the present application, from the viewpoint of adjusting the arithmetic mean roughness Ra of the surface of the refractive index adjusting layer side of the temporary support within the above range, the temporary support can contain particles, or can have a particle-containing layer constituting the surface of the refractive index adjusting layer side as a layer structure included in the temporary support.

[0393] From the viewpoint of further improving the operability, the temporary support preferably has particles having a diameter of 0.5 μm or more and 5 μm or less present at 1 / mm2or more on the surface on the side opposite to the side on which the refractive index adjusting layer is formed. 2 The above layer is more preferably present at 1 to 50 / mm2. 2 .

[0394] As the particles contained in the temporary support (particularly the particle-containing layer), organic particles or inorganic particles can be used.

[0395] As the organic particles, specifically, for example, polyimide-based resins, olefin or modified olefin-based resins, crosslinked polystyrene-based resins, silicone resins, and the like can be used.

[0396] As the inorganic particles, specifically, for example, silicon oxide, calcium carbonate, agglomerated alumina, aluminum silicate, mica, clay, talc, barium sulfate, and the like can be used.

[0397] Further, by adjusting the number of particles or the particle diameter contained in the temporary support, the arithmetic mean roughness Ra of the surface of the refractive index adjusting layer side of the temporary support can be adjusted within the above range.

[0398] The thickness of the temporary support is not particularly limited, and is preferably 5 μm to 200 μm, more preferably 10 μm to 150 μm, and further preferably 10 to 50 μm, from the viewpoint of easy operability and versatility.

[0399] As a preferred mode of the temporary support, for example, the description in paragraphs 0017 to 0018 of Japanese Patent Application Publication No. 2014-85643, paragraphs 0019 to 0026 of Japanese Patent Application Publication No. 2016-27363, paragraphs 0041 to 0057 of International Publication No. 2012 / 081680, and paragraphs 0029 to 0040 of International Publication No. 2018 / 179370 is recited, and the contents of these publications are incorporated into the present specification.

[0400] As the temporary support, for example, Lumirror (registered trademark) 16FB40 manufactured by TORAY INDUSTRIES, INC. and Lumirror (registered trademark) 16QS62 (16KS40) manufactured by TORAY INDUSTRIES, INC. can be used.

[0401] Further, as a particularly preferable form of the temporary support, mention can be made of a biaxially-stretched polyethylene terephthalate film having a thickness of 16 μm, a biaxially-stretched polyethylene terephthalate film having a thickness of 12 μm, and a biaxially-stretched polyethylene terephthalate film having a thickness of 10 μm.

[0402] 〔Refractive index adjusting layer〕

[0403] The transfer film of the present application has a refractive index adjusting layer containing the composition of the present application.

[0404] The refractive index of the refractive index adjusting layer is preferably 1.50 or greater, more preferably 1.55 or greater, further preferably 1.60 or greater, and particularly preferably 1.70 or greater.

[0405] The upper limit of the refractive index of the refractive index adjusting layer is not particularly limited, and is preferably 2.10 or less, more preferably 1.85 or less, further preferably 1.78 or less, and particularly preferably 1.74 or less.

[0406] The refractive index adjusting layer can have photocurability (i.e., photosensitivity), can have thermocurability, or can have both photocurability and thermocurability, but from the viewpoint of forming a cured film having excellent strength, it is preferable to have photocurability.

[0407] The refractive index adjusting layer preferably has alkali solubility (e.g., solubility in a weakly alkaline aqueous solution).

[0408] The thickness of the refractive index adjusting layer is not particularly limited.

[0409] When a single-layered refractive index adjusting layer composed of a cured product of the composition of the present application is used as a protective film on a touch panel, from the viewpoint of allowing it to exert sufficient surface protection ability, the thickness of the refractive index adjusting layer is preferably 0.5 to 20 μm, more preferably 0.8 to 10 μm, and particularly preferably 1 to 5 μm.

[0410] When a cured product of the composition of the present application is used as a refractive index adjusting layer (i.e., when a cured product of a separately prepared photosensitive resin layer is used as a protective film on a touch panel), the thickness of the refractive index adjusting layer is preferably 50 nm or greater and 500 nm or less, more preferably 55 nm or greater and 110 nm or less, and further preferably 60 nm or greater and 100 nm or less.

[0411] The thickness of the refractive index adjusting layer is calculated as an average value of any 5 places measured by cross-sectional observation based on a scanning electron microscope (SEM).

[0412] In the present application, the method for controlling the refractive index of the refractive index adjusting layer is not particularly limited other than using metal oxide particles and a binder polymer, and for example, a method using a binder polymer and metal oxide particles of an arbitrary refractive index, a method using a binder polymer and metal oxide particles of a prescribed high refractive index, a method using a composite of metal oxide particles and a binder polymer, a method further using metal particles and metal salts in these methods, and the like can be given.

[0413] The method for forming the refractive index adjusting layer is not particularly limited.

[0414] As an example of the method for forming the refractive index adjusting layer, a method in which a composition for forming a refractive index adjusting layer (water-based resin composition) containing a water-based solvent is applied to a photosensitive resin layer described later formed on a temporary support, and dried as necessary, thereby forming a refractive index adjusting layer, can be given.

[0415] As the method for applying, a publicly known method can be used.

[0416] As the method for applying, a printing method, a spray coating method, a roll coating method, a bar coating method, a curtain coating method, a spin coating method, a die coating method (i.e., a slit coating method), and the like can be given.

[0417] Among these, as the method for applying, a die coating method is preferred.

[0418] As the method for drying, a publicly known method such as natural drying, heating drying, reduced pressure drying, and the like can be used, and these methods can be used alone or in combination.

[0419] In the present application, "drying" means removing at least a part of the solvent contained in the composition.

[0420] [Color of the refractive index adjusting layer]

[0421] The refractive index adjusting layer and the cured film thereof are preferably achromatic. Specifically, the total reflection (incident angle 8°, light source: D-65 (2° field of view)) in the CIE1976 (L * , a * , b * ) color space, the L * value is preferably 10 to 90, the a * value is preferably -1.0 to 1.0, and the b * value is preferably -1.0 to 1.0.

[0422] [Photosensitive resin layer]

[0423] The transfer film of the present application preferably has a photosensitive resin layer between the refractive index adjusting layer and the temporary support. The refractive index of the photosensitive resin layer is preferably lower than that of the refractive index adjusting layer.

[0424] The photosensitive resin layer of the transfer film of the present application preferably contains a binder polymer, an ethylenically unsaturated compound, and a photopolymerization initiator, and more preferably is formed using a photosensitive resin composition containing a binder polymer, a polymerizable monomer, and a photopolymerization initiator.

[0425] <Binder polymer>

[0426] The same binder polymer as the binder polymer having an acid group contained in the composition of the present application can be used as the binder polymer contained in the photosensitive resin layer, and the kind is preferably the same. For example, from the viewpoint of the strength of the cured film and the handleability on the transfer film, the content of the binder polymer in the photosensitive resin layer is preferably 10 to 90 mass%, more preferably 20 to 80 mass%, and further preferably 30 to 70 mass%, relative to the total mass of the photosensitive resin layer (or the total solid content of the photosensitive resin composition).

[0427] <Ethylenically unsaturated compound>

[0428] The same compound as the radical polymerizable compound having a group containing an ethylenically unsaturated bond contained in the composition of the present application can be used as the ethylenically unsaturated compound contained in the photosensitive resin layer, and the kind is preferably the same.

[0429] However, from the viewpoint of the moisture permeability and flexibility of the cured product of the photosensitive resin layer and the adhesion of the obtained uncured film, it is preferable that the ethylenically unsaturated compound contained in the photosensitive resin layer or the photosensitive resin composition for forming the photosensitive resin layer contain a 2-functional ethylenically unsaturated compound having an aliphatic hydrocarbon ring structure, more preferably a 2-functional ethylenically unsaturated compound having a ring structure condensed from 2 or more aliphatic hydrocarbon rings, and particularly preferably a tricyclodecane dimethanol di(meth)acrylate.

[0430] From the viewpoint of the moisture permeability and flexibility of the cured product of the photosensitive resin layer and the adhesion of the obtained uncured film, the above aliphatic hydrocarbon ring structure is preferably a cyclopentane ring structure, a cyclohexane ring structure, a tricyclodecane ring structure, a norbornane ring structure, or an isophorone ring structure, more preferably a cyclohexane ring structure or a tricyclodecane ring structure, and particularly preferably a tricyclodecane ring structure.

[0431] The photosensitive resin composition can contain one kind of 2-functional ethylenically unsaturated compound having an aliphatic hydrocarbon ring structure alone, or two or more kinds thereof.

[0432] The content of the 2-functional olefinically unsaturated compound having an alicyclic hydrocarbon ring structure is preferably 1 to 50 mass%, more preferably 5 to 40 mass%, further preferably 10 to 30 mass%, and particularly preferably 15 to 25 mass%, relative to the total solid content of the photosensitive resin composition, from the viewpoint of the moisture permeability and the flexibility of the obtained cured film, and the adhesion of the cured product of the photosensitive resin layer.

[0433] The content of the olefinically unsaturated compound in the photosensitive resin layer is preferably 1 to 70 mass%, more preferably 5 to 70 mass%, further preferably 10 to 70 mass%, particularly preferably 20 to 60 mass%, and most preferably 20 to 50 mass%, relative to the total mass of the photosensitive resin layer.

[0434] The photosensitive resin layer or the photosensitive resin composition for forming the photosensitive resin layer can use one kind of the olefinically unsaturated compound alone, or two or more kinds of the olefinically unsaturated compounds simultaneously, and preferably two or more kinds of the olefinically unsaturated compounds simultaneously.

[0435] In the photosensitive resin layer or the photosensitive resin composition, as the olefinically unsaturated compound, from the viewpoint of the substrate adhesion, the development residue inhibition, and the rust prevention, it is preferable to use simultaneously the compound represented by the above formula (M) (compound M), the olefinically unsaturated compound having an acid group, and the olefinically unsaturated compound having 3 or more functions, and more preferable to use simultaneously the compound M in which the linking group is a linear alkylene group, the compound M having an alicyclic hydrocarbon ring structure, tricyclodecane dimethanol diacrylate, the multifunctional olefinically unsaturated compound having a carboxylic acid group, and dipentaerythritol (tri / tetra / penta / hexa) (meth)acrylate, and particularly preferable to use simultaneously 1,9-nonanediol diacrylate, tricyclodecane dimethanol diacrylate, the succinic acid-modified product of dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate.

[0436] The content of the compound M is preferably 10 to 90 mass%, more preferably 20 to 80 mass%, further preferably 40 to 75 mass%, and particularly preferably 60 to 70 mass%, relative to the total mass of the olefinically unsaturated compound in the photosensitive resin composition, from the viewpoint of the moisture permeability and the flexibility of the cured product of the photosensitive resin layer.

[0437] Also, the content of the compound M is preferably 1 to 45 mass%, more preferably 15 to 40 mass%, further preferably 20 to 35 mass%, and particularly preferably 25 to 33 mass%, relative to the total solid content of the photosensitive resin composition, from the viewpoint of the moisture permeability and the flexibility of the cured product of the photosensitive resin layer.

[0438] Further, in the photosensitive resin layer or the photosensitive resin composition, as the above-mentioned ethylenically unsaturated compound, from the viewpoint of the strength of the obtained cured film, the substrate adhesion, the development residue inhibitory property, and the rust-preventive property, it is preferable to use simultaneously the compound M, the ethylenically unsaturated compound having an acid group, the ethylenically unsaturated compound of 3 or more functions, and the later-described heat-crosslinkable compound, and it is more preferable to use simultaneously the compound M in which the linking group is a linear alkylene group, the compound M having an aliphatic hydrocarbon ring structure, the ethylenically unsaturated compound having an acid group, the ethylenically unsaturated compound of 3 or more functions, and the later-described blocked isocyanate compound.

[0439] Further, in the photosensitive resin layer or the photosensitive resin composition, from the viewpoint of the moisture permeability and the flexibility of the cured product of the photosensitive resin layer, and the adhesion of the obtained uncured film, it is preferable to use simultaneously the 2-functional ethylenically unsaturated compound having an aliphatic hydrocarbon ring structure and the adhesive polymer containing a structural unit having an aliphatic hydrocarbon ring.

[0440] <Photopolymerization Initiator>

[0441] The photosensitive resin layer possessed by the transfer film of the present application or the photosensitive resin composition forming the photosensitive resin layer can contain a photopolymerization initiator.

[0442] As the photopolymerization initiator contained in the photosensitive resin layer, the same photopolymerization initiator as contained in the composition of the present application can be used, and it is preferable that the kind is also the same.

[0443] The photosensitive resin layer or the photosensitive resin composition can contain only one kind of photopolymerization initiator, or can contain two or more kinds, and it is preferable to use two or more kinds simultaneously.

[0444] In the photosensitive resin layer or the photosensitive resin composition, as the photopolymerization initiator, from the viewpoint of the substrate adhesion, the development residue inhibitory property, and the rust-preventive property, it is preferable to use simultaneously an oxime-based photopolymerization initiator and an α-aminoalkylphenone-based photopolymerization initiator, and it is more preferable to use simultaneously 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone-1-(O-acetyloxime) and 2-methyl-1-(4-methylthiophenyl)-2-morpholinyl-1-propanone.

[0445] The content of the photopolymerization initiator is not particularly limited, and it is preferable to be 0.1% by mass or more, more preferably 0.5% by mass or more, and further preferably 1.0% by mass or more, relative to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition.

[0446] Further, the content of the photopolymerization initiator is preferably 10% by mass or less, and more preferably 5% by mass or less, relative to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition.

[0447] <Thermally crosslinkable compound>

[0448] Considering the reason why the die cutting processability of the cured film formed by curing the photosensitive resin layer after the transfer is made better, the photosensitive resin layer possessed by the transfer film of the present application or the photosensitive resin composition forming the photosensitive resin layer preferably contains a compound (hereinafter, also simply referred to as "thermally crosslinkable compound") produced by heating a group capable of reacting with an acid group or a hydroxyl group.

[0449] As the thermally crosslinkable compound, for example, an epoxy compound, an oxetane compound, a methylol compound, a blocked isocyanate compound, and the like can be given. Among them, from the viewpoint of the strength of the obtained cured film and the adhesion of the obtained uncured film, a blocked isocyanate compound shown below is preferred.

[0450] The blocked isocyanate compound refers to a "compound having a structure in which an isocyanate group of an isocyanate is protected (so-called masked) with a blocking agent".

[0451] The dissociation temperature of the blocked isocyanate compound is not particularly limited, and is preferably 100°C to 160°C, and more preferably 130°C to 150°C.

[0452] Among them, the dissociation temperature of the blocked isocyanate indicates "the temperature of the endothermic peak accompanying the deprotection reaction of the blocked isocyanate when measured by DSC (Differential Scanning Calorimetry) analysis using a differential scanning calorimeter".

[0453] As the differential scanning calorimeter, for example, a differential scanning calorimeter (Model: DSC6200) manufactured by Seiko Instruments Inc. can be preferably used. However, the differential scanning calorimeter is not limited thereto.

[0454] As the blocking agent having a dissociation temperature of 100°C to 160°C, an active methylene compound [malonic acid diester (dimethyl malonate, diethyl malonate, di-n-butyl malonate, di-2-ethylhexyl malonate, and the like), and the like], an oxime compound (a compound having a structure represented by -C(=N-OH)- within the molecule, such as formaldoxime, acetaldoxime, acetoxime, methyl ethyl ketoxime, cyclohexanone oxime, and the like), and the like can be given.

[0455] Among them, as the blocking agent having a dissociation temperature of 100°C to 160°C, for example, at least one selected from oxime compounds is preferred from the viewpoint of storage stability.

[0456] For example, from the viewpoint of improving the brittleness of the film, improving the adhesion to the transferred body, and the like, the blocked isocyanate compound preferably has an isocyanurate structure.

[0457] For example, hexamethylene diisocyanate is isocyanurated to be protected, whereby a blocked isocyanate compound having an isocyanurate structure is obtained.

[0458] Among the blocked isocyanate compounds having an isocyanurate structure, from the viewpoint of more easily controlling the dissociation temperature within a preferable range and easily reducing development residue than compounds not having an oxime structure, it is preferable to use, as the blocked isocyanate compound, a compound having an oxime structure.

[0459] For example, from the viewpoint of the strength of a cured film formed by curing a photosensitive resin layer, the blocked isocyanate compound preferably has a polymerizable group, and more preferably has a radical polymerizable group.

[0460] There is no particular limitation on the polymerizable group, and a publicly known polymerizable group can be used.

[0461] As the polymerizable group, a group containing an ethylenic unsaturated bond such as a (meth)acryloyloxy group, a (meth)acrylic acid amide group, a styryl group, a group having an epoxy group such as a glycidyl group, and the like can be mentioned.

[0462] Among these, from the viewpoint of the surface shape of a cured film formed by curing a photosensitive resin layer, the development speed, and the reactivity, a group containing an ethylenic unsaturated bond is preferable, a (meth)acryloyloxy group is more preferable, and an acryloyloxy group is particularly preferable as the polymerizable group.

[0463] As the blocked isocyanate compound, a commercially available product can be used.

[0464] As examples of the commercially available product of the blocked isocyanate compound, Karenz (registered trademark) AOI-BM, Karenz (registered trademark) MOI-BM, Karenz (registered trademark) MOI-BP, and the like (all of which are manufactured by SHOWA DENKO K.K.), a block type DURANATE series (for example, DURANATE (registered trademark) TPA-B80E, manufactured by Asahi Kasei Corporation), and the like can be mentioned.

[0465] The photosensitive resin layer or the photosensitive resin composition can contain only one heat-crosslinkable compound, or two or more heat-crosslinkable compounds.

[0466] When the heat-crosslinkable compound is contained, the content of the heat-crosslinkable compound is preferably 1% by mass to 50% by mass, and more preferably 5% by mass to 30% by mass, with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition.

[0467] <Thiol compound>

[0468] The reason why the punchability of the cured film formed from the photosensitive resin layer after the solidification transfer becomes better is considered as follows. The photosensitive resin layer or the photosensitive resin composition for forming the photosensitive resin layer possessed by the transfer film preferably contains a compound capable of undergoing Michael addition reaction, and more specifically, a thiol compound represented by the following formula is more preferable.

[0469] As the thiol compound, a monofunctional thiol compound or a polyfunctional thiol compound can be preferably used. Among them, from the viewpoint of the hardness after curing, a thiol compound containing 2 or more functional groups (polyfunctional thiol compound) is preferable, and a polyfunctional thiol compound is more preferable.

[0470] Among them, the polyfunctional thiol compound means a compound having 2 or more mercapto groups (thiol groups) in the molecule.

[0471] As the polyfunctional thiol compound, a low molecular compound having a molecular weight of 100 or more is preferable, and more specifically, a compound having a molecular weight of 100 to 1,500, and further preferably 150 to 1,000 is more preferable.

[0472] As the number of functional groups of the polyfunctional thiol compound, from the viewpoint of the hardness after curing, 2 to 10 functional groups are preferable, 2 to 8 functional groups are more preferable, and 2 to 6 functional groups are further preferable.

[0473] Further, as the polyfunctional thiol compound, from the viewpoint of the viscosity, and the flexibility and the hardness after curing, an aliphatic polyfunctional thiol compound is preferable.

[0474] In addition, as the thiol compound, from the viewpoint of the storage stability of the photosensitive transfer material, a secondary thiol compound is more preferable.

[0475] As the polyfunctional thiol compound, specifically, trimethylolpropane tris(3-mercaptobutyrate), 1,4-bis(3-mercaptobutyryloxy)butane, pentaerythritol tetra(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutyryloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, trimethylolethane tris(3-mercaptobutyrate), tris[(3-mercaptobutyryloxy)ethyl]isocyanurate, trimethylolpropane tris(3-mercapto propionate), pentaerythritol tetra(3-mercapto propionate), tetraethylene glycol bis(3-mercapto propionate), dipentaerythritol hexa(3-mercapto propionate), ethylene glycol bis thio propionate, 1,2-benzenedithiol, 1,3-benzenedithiol, 1,2-ethanedithiol, 1,3-propanedithiol, 1,6-hexamethylenedithiol, 2,2'-(ethylenedithio)diethanethiol, meso-2,3-dimercaptosuccinic acid, p-xylene dithiol, m-xylene dithiol, bis(mercaptoethyl)ether, and the like can be exemplified.

[0476] Among these, trimethylolpropane tris(3-mercaptobutyrate), 1,4-bis(3-mercaptobutyryloxy)butane, pentaerythritol tetra(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutyryloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, trimethylolethane tris(3-mercaptobutyrate), tris[(3-mercaptobutyryloxy)ethyl]isocyanurate, trimethylolpropane tris(3-mercaptopropanoate), pentaerythritol tetra(3-mercaptopropanoate), tetraethylene glycol bis(3-mercaptopropanoate), and dipentaerythritol hexa(3-mercaptopropanoate) can be preferably exemplified.

[0477] As the monofunctional thiol compound, either one of an aliphatic thiol compound and an aromatic thiol compound can be used.

[0478] As the monofunctional aliphatic thiol compound, specifically, 1-octanethiol, 1-dodecanethiol, β-mercaptopropionic acid, methyl-3-mercaptopropionate, 2-ethylhexyl-3-mercaptopropionate, n-octyl-3-mercaptopropionate, methoxybutyl-3-mercaptopropionate, stearyl-3-mercaptopropionate, and the like can be exemplified.

[0479] As the monofunctional aromatic thiol compound, benzene thiol, toluene thiol, xylene thiol, and the like can be exemplified.

[0480] From the viewpoint of viscosity, and flexibility and hardness after curing, the above thiol compound is preferably a thiol compound having an ester bond, and more preferably contains a compound represented by the following Formula 1.

[0481] [Chemical Formula 10]

[0482]

[0483] In Formula 1, n represents an integer of 1 to 6, A represents an n-valent organic group having 1 to 15 carbon atoms or a group represented by the following Formula 2, and R 1 Each independently represents a divalent organic group having 1 to 15 carbon atoms.

[0484] [Chemical Formula 11]

[0485]

[0486] In Formula 2, R 2 ~R 4 Each independently represents a divalent organic group having 1 to 15 carbon atoms, and the wavy line portion represents a bonding position of an oxygen atom adjacent to A in the above Formula 1. Among these, when A represents a group represented by Formula 2, n represents 3.

[0487] From the viewpoint of hardness after curing, n in Formula 1 is preferably an integer of 2 to 6.

[0488] From the viewpoints of viscosity, and flexibility and hardness after curing, A in Formula 1 is preferably an aliphatic group having a valence of n of 1 to 15 carbon atoms or a group represented by the above Formula 2, more preferably an aliphatic group having a valence of n of 4 to 15 carbon atoms or a group represented by the above Formula 2, further preferably an aliphatic group having a valence of n of 4 to 10 carbon atoms or a group represented by the above Formula 2, and particularly preferably a group represented by the above Formula 2.

[0489] Also, from the viewpoints of viscosity, and flexibility, hardness and moisture permeability after curing, A in Formula 1 is preferably a group consisting of hydrogen atoms and carbon atoms or a group consisting of hydrogen atoms, carbon atoms and oxygen atoms having a valence of n, more preferably a group consisting of hydrogen atoms and carbon atoms having a valence of n, and particularly preferably an aliphatic hydrocarbon group having a valence of n.

[0490] From the viewpoints of viscosity, and flexibility and hardness after curing, R 1 are each independently preferably an alkylene group having 1 to 15 carbon atoms, more preferably an alkylene group having 2 to 4 carbon atoms, further preferably an alkylene group having 3 carbon atoms, and particularly preferably 1,2-propylene. The above alkylene group can be linear or branched.

[0491] From the viewpoints of viscosity, and flexibility and hardness after curing, R 2 to R 4 are each independently preferably an aliphatic group having 2 to 15 carbon atoms, more preferably an alkylene group having 2 to 15 carbon atoms or a polyalkyleneoxyalkyl group having 3 to 15 carbon atoms, further preferably an alkylene group having 2 to 15 carbon atoms, and particularly preferably an ethylene group.

[0492] Also, as the polyfunctional mercaptan compound, a compound having two or more groups represented by the following Formula S-1 is preferred.

[0493] [Chemical Formula 12]

[0494]

[0495] In Formula S-1, R 1S represents a hydrogen atom or an alkyl group, A 1S represents -CO- or -CH2-, and the wavy line portion represents a bonding position to other structures.

[0496] As the polyfunctional mercaptan compound, a compound having two or more and six or fewer groups represented by Formula S-1 is preferred.

[0497] As R 1SThe alkyl group is a straight-chain, branched, or cyclic alkyl group, and the range of carbon atoms is preferably 1 to 16, more preferably 1 to 10. Specific examples of alkyl groups are methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, 2-ethylhexyl, etc., with methyl, ethyl, propyl, or isopropyl being preferred.

[0498] As R 1S The preferred atoms are hydrogen atoms, methyl, ethyl, propyl or isopropyl, with methyl or ethyl being the most preferred.

[0499] Furthermore, as a polyfunctional thiol compound, a compound represented by the following formula S-2 that has a plurality of groups represented by the above formula S-1 is particularly preferred.

[0500] [Chemical Formula 13]

[0501]

[0502] In equation S-2, R 1S Each can be represented independently by a hydrogen atom or an alkyl group, A 1S Each can be represented independently as -CO- or -CH2-, L 1S Let nS be the linking basis, where nS represents an integer from 2 to 8. From a compositional point of view, all R... 1S Preferably, they are the same group, and all A 1S Preferably, they are the same group.

[0503] R in equation S-2 1S The meaning of R is the same as that in the above formula S-1. 1S The preferred ranges are also the same. nS is preferably an integer from 2 to 6.

[0504] L, as the linking basis of nS valence in equation S-2 1S For example, -(CH2) can be cited. mS -(mS represents an integer from 2 to 6.) -(CH2) mS {(CH2)mSO} mT (CH2) mS -(mS and mT independently represent integers from 2 to 6.) These are divalent linkers, trimethylolpropane residues, and contain three -(CH2) groups. pS -(pS represents an integer from 2 to 6) isocyanuric acid ring and other trivalent linkages, pentavalent linkages such as pentaerythritol residues, pentavalent or hexavalent linkages such as dipentaerythritol residues.

[0505] Specifically, the following compounds are preferred examples of thiols, but are not limited thereto.

[0506] [Chemical Formula 14]

[0507]

[0508] [Chemical Formula 15]

[0509]

[0510] <Heterocyclic Compounds>

[0511] The photosensitive resin layer of the transfer film of the present invention, or the photosensitive resin composition forming the photosensitive resin layer, preferably contains a heterocyclic compound.

[0512] Heterocyclic compounds help improve adhesion to substrates (especially copper substrates) and corrosion inhibition of metals (especially copper).

[0513] Heterocyclic compounds can have either monocyclic or polycyclic heterocycles.

[0514] Examples of heteroatoms found in heterocyclic compounds include nitrogen atoms, oxygen atoms, and sulfur atoms. Heterocyclic compounds preferably have at least one atom selected from nitrogen atoms, oxygen atoms, and sulfur atoms, and more preferably have a nitrogen atom.

[0515] Examples of heterocyclic compounds include, for example, triazole compounds, benzotriazole compounds, tetraazole compounds, thiadiazole compounds, triazine compounds, razotanine compounds, thiazole compounds, benzothiazole compounds, benzimidazole compounds, benzoxazole compounds, or pyrimidine compounds. Preferably, the heterocyclic compound is selected from at least one compound chosen from the group consisting of triazole compounds, benzotriazole compounds, tetraazole compounds, thiadiazole compounds, triazine compounds, razotanine compounds, thiazole compounds, benzimidazole compounds, and benzoxazole compounds; more preferably, it is selected from at least one compound chosen from the group consisting of triazole compounds, benzotriazole compounds, tetraazole compounds, thiadiazole compounds, thiazole compounds, benzothiazole compounds, benzimidazole compounds, and benzoxazole compounds.

[0516] Preferred examples of heterocyclic compounds are shown below. The following compounds can be exemplified as triazole and benzotriazole compounds.

[0517] [Chemical Formula 16]

[0518]

[0519] The following compounds can be cited as examples of tetrazolium compounds.

[0520] [Chemical Formula 17]

[0521]

[0522] The following compounds can be cited as examples of thiadiazole compounds.

[0523] [Chemical Formula 18]

[0524]

[0525] As a triazine compound, the following compounds can be exemplified.

[0526] [Chemical Formula 19]

[0527]

[0528] As a rhodanine compound, the following compounds can be exemplified.

[0529] [Chemical Formula 20]

[0530]

[0531] As a thiazole compound, the following compounds can be exemplified.

[0532] [Chemical Formula 21]

[0533]

[0534] As a benzothiazole compound, the following compounds can be exemplified.

[0535] [Chemical Formula 22]

[0536]

[0537] As a benzimidazole compound, the following compounds can be exemplified.

[0538] [Chemical Formula 23]

[0539]

[0540] As a benzoxazole compound, the following compounds can be exemplified.

[0541] [Chemical Formula 24]

[0542]

[0543] The photosensitive resin layer or the photosensitive resin composition can contain only one heterocyclic compound, or two or more.

[0544] When the heterocyclic compound is contained, the content of the heterocyclic compound is preferably 0.01 to 20 mass%, more preferably 0.1 to 10 mass%, further preferably 0.3 to 8 mass%, and particularly preferably 0.5 to 5 mass%, with respect to the total solid content of the photosensitive resin layer or the photosensitive resin composition. By setting the content of the heterocyclic compound within the above range, adhesion to a substrate (particularly, a copper substrate) and corrosion inhibition of a metal (particularly, copper) can be improved.

[0545] <Surfactant>

[0546] The photosensitive resin layer possessed by the transfer film of the present application or the photosensitive resin composition for forming the photosensitive resin layer can contain a surfactant.

[0547] As the surfactant contained in the photosensitive resin layer, the same surfactant as that contained in the refractive index adjusting layer can be used, and the preferable range is also the same.

[0548] <Hydrogen-donating Compound>

[0549] The photosensitive resin layer possessed by the transfer film of the present application or the photosensitive resin composition for forming the photosensitive resin layer preferably contains a hydrogen-donating compound.

[0550] The hydrogen-donating compound has an effect of further improving the sensitivity of a photopolymerization initiator to activated light, inhibiting polymerization inhibition of a polymerizable compound caused by oxygen, and the like.

[0551] As the hydrogen-donating compound, amine compounds such as those described in M. R. Sander et al., "Journal of Polymer Society", Vol. 10, p. 3173 (1972), Japanese Patent Application Publication No. 44-20189, Japanese Patent Application Laid-Open No. 51-82102, Japanese Patent Application Laid-Open No. 52-134692, Japanese Patent Application Laid-Open No. 59-138205, Japanese Patent Application Laid-Open No. 60-84305, Japanese Patent Application Laid-Open No. 62-18537, Japanese Patent Application Laid-Open No. 64-33104, Research Disclosure No. 33825, and the like can be given.

[0552] As specific examples of the hydrogen-donating compound, triethanolamine, ethyl-p-dimethylaminobenzoate, p-formyldimethyl aniline, p-methylthiodimethyl aniline, and the like can be given.

[0553] Further, as the hydrogen-donating compound, an amino acid compound (N-phenylglycine, etc.), an organic metal compound (tributyltin acetate, etc.) described in Japanese Patent Publication No. 48-42965, a hydrogen donor described in Japanese Patent Publication No. 55-34414, a sulfur compound (trithiane, etc.) described in Japanese Patent Laid-Open No. 6-308727, etc. can be mentioned.

[0554] The photosensitive resin layer or the photosensitive resin composition can contain only one kind of hydrogen-donating compound, or can contain two or more kinds thereof.

[0555] When the hydrogen-donating compound is contained, for example, from the viewpoint of improving the curing speed by the balance between the polymerization growth speed and the chain transfer, the content of the hydrogen-donating compound is preferably 0.01 to 10 mass% with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition, more preferably 0.03 to 5 mass%, and further preferably 0.05 to 3 mass%.

[0556] <Solvent>

[0557] The photosensitive resin composition which forms the photosensitive resin layer possessed by the transfer film of the present application preferably contains a solvent.

[0558] If the photosensitive resin composition contains a solvent, the formation of the photosensitive resin layer based on the coating has a tendency to become easier.

[0559] As the solvent contained in the photosensitive resin layer, the same solvent as contained in the composition of the present application can be used, and the preferable range is also the same. When the photosensitive resin composition contains a solvent, the solid content amount of the photosensitive resin composition is preferably 5 to 80 mass% with respect to the total mass of the photosensitive resin composition, more preferably 5 to 40 mass%, and particularly preferably 5 to 30 mass%.

[0560] <Other Component>

[0561] The photosensitive resin layer possessed by the transfer film of the present application or the photosensitive resin composition which forms the photosensitive resin layer can contain a component other than the components described above (so-called other component).

[0562] As the other component, a particle (for example, a metal oxide particle), a colorant, etc. can be mentioned.

[0563] Further, as the other component, for example, a thermal polymerization inhibitor described in paragraph 0018 of Japanese Patent No. 4502784, other additives described in paragraphs 0058 to 0071 of Japanese Patent Laid-Open No. 2000-310706, etc. can be mentioned.

[0564] -Particle-

[0565] The photosensitive resin layer or the photosensitive resin composition can contain particles (e.g., metal oxide particles; the same hereinafter) for the purpose of adjusting the refractive index, light transmittance, and the like.

[0566] The metal in the metal oxide particles also includes B, Si, Ge, As, Sb, Te, and the like, which are semimetals.

[0567] For example, from the viewpoint of the transparency of the cured film, the average primary particle diameter of the particles is preferably from 1 nm to 200 nm, and more preferably from 3 nm to 80 nm.

[0568] The particle diameters of 200 arbitrary particles are measured using an electron microscope, and the average primary particle diameter of the particles is calculated by performing an arithmetic mean of the measurement results. In addition, in the case where the shape of the particles is not spherical, the longest side is taken as the particle diameter.

[0569] The photosensitive resin layer or the photosensitive resin composition can contain only one kind of particles that differ in metal species, size, and the like, or can contain two or more kinds of particles.

[0570] The photosensitive resin layer or the photosensitive resin composition preferably does not contain particles, or the content of the particles is more than 0 mass% and 35 mass% or less with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition, more preferably does not contain particles, or the content of the particles is more than 0 mass% and 10 mass% or less with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition, further preferably does not contain particles, or the content of the particles is more than 0 mass% and 5 mass% or less with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition, further preferably does not contain particles, or the content of the particles is more than 0 mass% and 1 mass% or less with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition, and particularly preferably does not contain particles.

[0571] When a transfer film having a photosensitive resin layer that does not contain particles is used, the mixing of bubbles in the transfer film at the time of transfer can be further prevented.

[0572] - Colorant -

[0573] The photosensitive resin layer or the photosensitive resin composition can contain a trace amount of a colorant (pigment, dye, and the like), and for example, from the viewpoint of transparency, it is preferable that the colorant be substantially not contained.

[0574] When a colorant is contained, the content of the colorant is preferably less than 1 mass% and more preferably less than 0.1 mass% with respect to the total solid content amount of the photosensitive resin layer or the photosensitive resin composition.

[0575] Thickness of the photosensitive resin layer

[0576] The thickness of the photosensitive resin layer is not particularly limited, and is preferably 20 μm or less, more preferably 15 μm or less, and further preferably 12 μm or less.

[0577] If the thickness of the photosensitive resin layer is 20 μm or less, it is advantageous in terms of thinning the entire transfer film, improving the transmittance of the photosensitive resin layer or the obtained cured film, and suppressing yellowing of the photosensitive resin layer or the obtained cured film.

[0578] For example, from the viewpoint of manufacturing adaptability, the thickness of the photosensitive resin layer is preferably 1 μm or more, more preferably 2 μm or more, and particularly preferably 3 μm or more.

[0579] The thickness of the photosensitive resin layer is calculated as the average of any 5 points measured by cross-sectional observation based on a scanning electron microscope (SEM).

[0580] <Refractive Index of Photosensitive Resin Layer>

[0581] The refractive index of the photosensitive resin layer is not particularly limited, and is preferably 1.47 to 1.56, more preferably 1.50 to 1.53, further preferably 1.50 to 1.52, and particularly preferably 1.51 to 1.52.

[0582] <Method for Forming Photosensitive Resin Layer>

[0583] The method for forming the photosensitive resin layer is not particularly limited, and a publicly known method can be used.

[0584] As an example of the method for forming the photosensitive resin layer, a method in which a photosensitive resin composition in a solvent-containing form is applied to a temporary support, and dried as necessary, thereby forming a photosensitive resin layer, can be mentioned.

[0585] The method of application and drying in the method for forming the photosensitive resin layer is the same as the method of application and drying in the method for forming the refractive index adjusting layer.

[0586] [Color of Photosensitive Resin Layer]

[0587] The photosensitive resin layer is preferably achromatic. Specifically, the total reflection (incident angle 8°, light source: D-65 (2° field of view)) in the CIE1976 (L * , a * , b * ) color space is preferably 10 to 90 in the L * value, -1.0 to 1.0 in the a * value, and -1.0 to 1.0 in the b * value.

[0588] [Protective Film]

[0589] The transfer film of the present application preferably has a protective film.

[0590] As the protective film, polyethylene terephthalate film, polypropylene film, polyethylene film, polystyrene film, polycarbonate film, and the like can be given.

[0591] As the protective film, for example, the film described in paragraphs 0083 to 0087 and paragraph 0093 of Japanese Patent Application Publication No. 2006-259138 can be used.

[0592] As the protective film, for example, Alphan (registered trademark) FG-201, Alphan (registered trademark) E-201F manufactured by Oji F-Tex Co., LTD., Cerapeel (registered trademark) 25WZ manufactured by TORAY ADVANCED FILM CO., LTD., and Lumirror (registered trademark) 16QS62 manufactured by TORAY INDUSTRIES, INC. can be given.

[0593] Further, as the protective film, the number of fish eyes having a diameter of 80 μm or more contained in the protective film is preferably 5 / m 2 Hereinafter. In addition, the "fish eye" is a substance such as a foreign matter, an unsolved matter, and an oxidized deteriorated matter of a material, which enters into a film when the material is heat-fused and the film is manufactured by a method such as kneading, extrusion, biaxial stretching, and a casting method.

[0594] The number of particles having a diameter of 3 μm or more contained in the protective film is preferably 30 / mm 2 More preferably, it is 10 / mm 2 Further preferably, it is 5 / mm 2 Hereinafter. Thereby, it is possible to suppress a defect generated by transferring a concave-convex caused by the particles contained in the protective film to the photosensitive resin layer.

[0595] From the viewpoint of imparting coiling property, the arithmetic average roughness Ra of the surface of the protective film on the side opposite to the surface in contact with the refractive index adjusting layer is preferably 0.01 μm or more, more preferably 0.02 μm or more, and further preferably 0.03 μm or more. On the other hand, it is preferably less than 0.50 μm, more preferably 0.40 μm or less, and further preferably 0.30 μm or less.

[0596] From the viewpoint of suppressing a defect at the time of transfer, the arithmetic average roughness Ra of the surface of the protective film in contact with the refractive index adjusting layer is preferably 0.01 μm or more, more preferably 0.02 μm or more, and further preferably 0.03 μm or more. On the other hand, it is preferably less than 0.50 μm, more preferably 0.40 μm or less, and further preferably 0.30 μm or less.

[0597] In the present application, from the viewpoint of adjusting the arithmetic mean roughness Ra of the surface on the side of the refractive index adjusting layer of the protective film within the above range, particles can be contained in the protective film, or a particle-containing layer constituting the surface on the side of the refractive index adjusting layer can be provided as a layer structure contained in the temporary support.

[0598] As the particles contained in the protective film (particularly the particle-containing layer), the same particles as exemplified as the particles contained in the temporary support can be mentioned.

[0599] 〔Thermoplastic resin layer〕

[0600] The transfer film of the present application can further have a thermoplastic resin layer between the temporary support and the refractive index adjusting layer, or between the temporary support and the photosensitive resin layer.

[0601] If the transfer film further has a thermoplastic resin layer, when the transfer film is transferred onto a substrate to form a laminate, it is less likely to cause bubbles due to the lamination. When the laminate is used in an image display device, it is less likely to cause uneven images, and excellent display properties can be obtained.

[0602] The thermoplastic resin layer preferably has alkali solubility.

[0603] The thermoplastic resin layer functions as a cushioning material that absorbs the unevenness of the surface of the substrate at the time of transfer.

[0604] The unevenness of the surface of the substrate also includes an image, an electrode, a wiring, and the like that have been formed.

[0605] The thermoplastic resin layer preferably has a property of being able to deform according to the unevenness.

[0606] The thermoplastic resin layer preferably contains an organic high molecular substance described in Japanese Patent Application Laid-Open No. 5-72724, and more preferably contains an organic high molecular substance having a softening point of about 80°C or lower based on the Vicat method (specifically, the polymer softening point determination method based on ASTM D 1235 of ASTM International).

[0607] For example, the thickness of the thermoplastic resin layer is preferably 3 μm to 30 μm, more preferably 4 μm to 25 μm, and further preferably 5 μm to 20 μm.

[0608] If the thickness of the thermoplastic resin layer is 3 μm or more, the followability to the unevenness of the surface of the substrate is further improved, and thus the unevenness of the surface of the substrate can be more effectively absorbed.

[0609] If the thickness of the thermoplastic resin layer is 30 μm or less, the manufacturing suitability is further improved, so that, for example, the load of drying (so-called drying for removing solvent) at the time of forming the thermoplastic resin layer by coating on the temporary support is further reduced, and the development time of the thermoplastic resin layer after transfer is further shortened.

[0610] The thickness of the thermoplastic resin layer is calculated as an average value of any 5 places measured by cross-sectional observation based on a scanning electron microscope (SEM).

[0611] The thermoplastic resin layer can be formed by coating a thermoplastic resin layer-forming composition containing a solvent and a thermoplastic organic high polymer on a temporary support, and drying it as necessary.

[0612] The method of coating and drying in the method of forming the thermoplastic resin layer has the same specific examples as those of coating and drying in the method of forming the photosensitive resin layer, respectively.

[0613] The solvent is not particularly limited as long as it is a solvent that dissolves the high molecular component for forming the thermoplastic resin layer.

[0614] As the solvent, an organic solvent (for example, methyl ethyl ketone, cyclohexanone, propylene glycol monomethyl ether acetate, n-propanol, and 2-propanol) can be mentioned.

[0615] The viscosity of the thermoplastic resin layer measured at 100°C is preferably 1,000 Pa-s to 10,000 Pa-s. Also, it is preferable that the viscosity of the thermoplastic resin layer measured at 100°C be lower than the viscosity of the photosensitive resin layer measured at 100°C.

[0616] [Intermediate Layer]

[0617] The transfer film of the present application can further have an intermediate layer between the temporary support and the refractive index adjusting layer, or between the temporary support and the photosensitive resin layer.

[0618] When the transfer film of the present application has a thermoplastic resin layer, the intermediate layer is preferably disposed between the thermoplastic resin layer and the photosensitive resin layer.

[0619] As the component contained in the intermediate layer, for example, at least one polymer selected from the group consisting of polyvinyl alcohol, polyvinyl pyrrolidone, and cellulose can be mentioned.

[0620] Also, as the intermediate layer, a layer described as "separation layer" in Japanese Patent Application Laid-Open No. 5-72724 can be used.

[0621] When a transfer film in which a thermoplastic resin layer, an intermediate layer, a photosensitive resin layer, and a refractive index adjusting layer are sequentially provided on a temporary support is manufactured, the intermediate layer can be formed, for example, by coating an intermediate layer-forming composition containing a solvent that does not dissolve the thermoplastic resin layer and the above-mentioned polymer as a component of the intermediate layer, and drying it as necessary. In detail, first, a thermoplastic resin layer-forming composition is coated on the temporary support and dried as necessary, thereby forming a thermoplastic resin layer. Next, an intermediate layer-forming composition is coated on the formed thermoplastic resin layer and dried as necessary, thereby forming an intermediate layer. Next, a photosensitive resin composition (so-called photosensitive resin layer-forming composition) containing an organic solvent is coated on the formed intermediate layer and dried, thereby forming a photosensitive resin layer. In addition, the organic solvent contained in the photosensitive resin layer-forming composition is preferably an organic solvent that does not dissolve the intermediate layer. Next, the composition of the present application containing an aqueous solvent (so-called refractive index adjusting layer-forming composition) is coated on the formed photosensitive resin layer and dried, thereby forming a refractive index adjusting layer. In addition, the aqueous solvent contained in the composition of the present application is preferably an aqueous solvent that does not dissolve the photosensitive resin layer.

[0622] On the other hand, when a transfer film in which a thermoplastic resin layer, an intermediate layer, and a single-layered refractive index adjusting layer are sequentially provided on a temporary support is manufactured, first, a thermoplastic resin layer-forming composition is coated on the temporary support and dried as necessary, thereby forming a thermoplastic resin layer. Next, an intermediate layer-forming composition is coated on the formed thermoplastic resin layer and dried as necessary, thereby forming an intermediate layer. Next, the composition of the present application containing an organic solvent (so-called refractive index adjusting layer-forming composition) is coated on the formed intermediate layer and dried, thereby forming a refractive index adjusting layer. In addition, the organic solvent contained in the composition of the present application is preferably an organic solvent that does not dissolve the intermediate layer.

[0623] The methods of coating and drying in the method of forming the intermediate layer are the same as the methods of coating and drying in the method of forming the refractive index adjusting layer, respectively.

[0624] 〔Examples of transfer film〕

[0625] Figure 1 is a schematic cross-sectional view showing an example of the transfer film of the present application.

[0626] As shown in Figure 1 , the transfer film 10 has a layered structure of a protective film 16 / refractive index adjusting layer 20A / photosensitive resin layer 18A / temporary support 12 (i.e., a layered structure in which the temporary support 12, the photosensitive resin layer 18A, the refractive index adjusting layer 20A, and the protective film 16 are sequentially arranged).

[0627] However, the transfer film of the present application is not limited to the transfer film 10, for example, the photosensitive resin layer 18A can be omitted. Also, at least one of the aforementioned thermoplastic resin layer and the intermediate layer can be present between the temporary support 12 and the photosensitive resin layer 18A.

[0628] The refractive index adjustment layer 20A is a layer disposed on the side opposite to the side on which the temporary support 12 is present, when viewed from the photosensitive resin layer 18A. The refractive index adjustment layer 20A is preferably a layer having a refractive index of 1.50 or more at a wavelength of 550 nm.

[0629] The transfer film 10 is a negative type material (so-called negative film).

[0630] 〔Method for manufacturing transfer film〕

[0631] The method for manufacturing the transfer film 10 is not particularly limited.

[0632] When the single layer of the refractive index adjustment layer composed of the cured product of the composition of the present application is used as a protective film on a touch panel, for example, the method for manufacturing the transfer film 10 preferably includes, in order, a step of forming the refractive index adjustment layer 20A on the temporary support 12 and a step of forming the protective film 16 on the refractive index adjustment layer 20A.

[0633] When the cured product of the composition of the present application is used as the refractive index adjustment layer (i.e., when the cured product of the photosensitive resin layer prepared separately is used as a protective film on a touch panel), the method for manufacturing the transfer film 10 preferably includes, in order, a step of forming the photosensitive resin layer 18A on the temporary support 12, a step of forming the refractive index adjustment layer 20A on the photosensitive resin layer 18A, and a step of forming the protective film 16 on the refractive index adjustment layer 20A.

[0634] The method for manufacturing the transfer film 10 can include the step of volatilizing ammonia described in paragraph 0056 of International Publication No. 2016 / 009980 between the step of forming the refractive index adjustment layer 20A and the step of forming the protective film 16.

[0635] 〔Use〕

[0636] The use of the transfer film of the present application is not particularly limited, and since the flexibility is excellent, it can be preferably used as a transfer film for a touch panel, can be more preferably used as a transfer film for forming a protective film on a touch panel, and can be particularly preferably used as a transfer film for forming an electrode protective film on a touch panel.

[0637] <Layered body>

[0638] By using the transfer film of the present application, the refractive index adjusting layer possessed by the transfer film of the present application is transferred on a substrate having an electrode, whereby a laminate in which a cured film cured by the refractive index adjusting layer is laminated can be produced.

[0639] For example, when the transfer film of the present application has a protective film, the method for producing the laminate preferably has:

[0640] a first peeling step of peeling the protective film from the transfer film of the present application,

[0641] a transfer step of transferring the transfer film from which the protective film is peeled from the refractive index adjusting layer side on a substrate having an electrode,

[0642] a curing step of curing at least a part of the transferred refractive index adjusting layer to form a cured film, and a second peeling step of peeling the temporary support after the curing step, to obtain a laminate in which the cured film is laminated on the substrate having an electrode.

[0643] In addition, the specific method in the first peeling step, the transfer step, and the second peeling step of the method for producing the laminate can be the same as the method described in the first peeling step, the transfer step, and the second peeling step of the method for producing the touch panel of the present application described later.

[0644] The substrate having an electrode is preferably a substrate including an electrode of an electrostatic capacity type input device.

[0645] Also, the electrode of the electrostatic capacity type input device can be a transparent electrode pattern, or can be a detour wiring.

[0646] <Touch Panel>

[0647] The laminate can be used as a component of an electrostatic capacity type input device.

[0648] As the electrostatic capacity type input device, a touch panel can be preferably exemplified. The laminate is preferably used as a touch panel component.

[0649] As the electrode for a touch panel, for example, a transparent electrode pattern disposed at least in an image display region of a touch panel can be exemplified. The electrode for a touch panel can extend from the image display region to a frame portion of the touch panel.

[0650] As the wiring for a touch panel, for example, a detour wiring (so-called lead-out wiring) disposed in a frame portion of a touch panel can be exemplified.

[0651] As the substrate for a touch panel and the manner of the touch panel, a manner in which a transparent electrode pattern and a detour wiring are electrically connected by laminating a part of the detour wiring on a part of the transparent electrode pattern extending to a frame portion of the touch panel is preferable.

[0652] As the material of the transparent electrode pattern, a metal oxide film such as ITO (indium tin oxide), IZO (indium zinc oxide), or a metal mesh, a metal fine wire such as silver nanowire is preferable.

[0653] As the metal fine wire, a fine wire of silver, copper, or the like can be given. Among them, a silver conductive material such as a silver mesh, silver nanowire is preferable.

[0654] As the material of the meandering wiring, a metal is preferable.

[0655] As the metal of the material of the meandering wiring, gold, silver, copper, molybdenum, aluminum, titanium, chromium, zinc, and manganese, and an alloy composed of two or more of these metal elements can be given. As the material of the meandering wiring, copper, molybdenum, aluminum, or titanium is preferable, and copper is particularly preferable.

[0656] <1st Specific Example of Touch Panel>

[0657] Figure 2 is a schematic cross-sectional view showing the 1st specific example of the touch panel having a cured film (cured product of the refractive index adjusting layer) formed by the transfer and curing with the transfer film of the present application. More specifically, Figure 2 is a schematic cross-sectional view of the image display region of the touch panel 30.

[0658] As shown in Figure 2 , the touch panel 30 has a structure in which the substrate 32, the second refractive index adjusting layer 36, the transparent electrode pattern 34 which is the electrode for touch panel, the cured film 20 which is the first refractive index adjusting layer (cured product of the refractive index adjusting layer), and the electrode protective film 18 for touch panel are disposed in this order.

[0659] In the touch panel 30, the electrode protective film 18 for touch panel and the cured film 20 cover the entire transparent electrode pattern 34.

[0660] The second refractive index adjusting layer 36 and the cured film 20 are preferably connected to cover the 1st region 40 in which the transparent electrode pattern 34 is present and the 2nd region 42 in which the transparent electrode pattern 34 is not present, directly or via other layers. According to this manner, the transparent electrode pattern 34 becomes more difficult to visually recognize.

[0661] The second refractive index adjusting layer 36 and the cured film 20 are preferably directly covered, as compared with both of the 1st region 40 and the 2nd region 42 being covered via other layers.

[0662] As the "other layer", an electrode pattern other than the insulating layer, the transparent electrode pattern 34, or the like can be given.

[0663] The cured film 20 is laminated across both of the 1st region 40 and the 2nd region 42. The cured film 20 is adjacent to the second refractive index adjusting layer 36, and also adjacent to the transparent electrode pattern 34.

[0664] The shape of the end of the transparent electrode pattern 34 at the location in contact with the second refractive index adjustment layer 36 is as follows: Figure 2 When the cone shape is shown, it is preferable to laminate the cured film 20 along the cone shape (i.e., with the same inclination as the cone angle).

[0665] As the transparent electrode pattern 34, an ITO transparent electrode pattern is preferred.

[0666] For example, a transparent electrode pattern 34 can be formed by the following method.

[0667] On a substrate 32 where a second refractive index adjustment layer 36 is formed, an electrode thin film (e.g., an ITO film) is formed by sputtering. Next, an etching protection layer is formed on the formed electrode thin film by coating with an etching photosensitive resist or by transferring an etching photosensitive film. Then, the formed etching protection layer is patterned into a desired pattern shape by exposure and development. Next, the portions of the electrode thin film not covered by the patterned etching protection layer are removed by etching, resulting in a patterned electrode thin film of the desired shape (i.e., a transparent electrode pattern 34). Finally, the etching protection layer patterned using a stripping solution is removed.

[0668] <Second specific example of a touch panel>

[0669] Figure 3 It refers to a cured film (a cured product with a refractive index adjustment layer) formed by transferring and curing the transfer film of the present invention. Figure 3 A schematic cross-sectional view of a second example of a touch panel containing a cured photosensitive resin layer (not shown in the figure).

[0670] like Figure 3 As shown, the touch panel 90 has an image display area 74 and an image non-display area 75 (i.e., the frame).

[0671] Furthermore, the touch panel 90 has electrodes for the touch panel on both sides of the substrate 32. Specifically, the touch panel 90 has a first transparent electrode pattern 70 on one side of the substrate 32 and a second transparent electrode pattern 72 on the other side.

[0672] In the touch panel 90, the first transparent electrode pattern 70 and the second transparent electrode pattern 72 are respectively connected to a circuitous wiring 56. The circuitous wiring 56 is, for example, a copper wire.

[0673] In the touch panel 90, a cured film (cured refractive index adjustment layer, i.e., the first refractive index adjustment layer) and a touch panel electrode protective film 18 (not shown) are formed on one side of the substrate 32 to cover the first transparent electrode pattern 70 and the circuit wiring 56. On the other side of the substrate 32, a cured film (cured refractive index adjustment layer) and a touch panel electrode protective film 18 (not shown) are formed to cover the second transparent electrode pattern 72 and the circuit wiring 56.

[0674] The second refractive index adjustment layer in the first embodiment can be formed on one side and the other side of the substrate 32.

[0675] [Manufacturing method of touch panel]

[0676] The method for manufacturing a touch panel according to the present invention includes: a step of preparing a substrate for a touch panel, the substrate having a structure on which at least one of a touch panel electrode and a touch panel wiring is disposed; a step of forming a refractive index adjustment layer composed of or dried from the composition of the present invention on the surface of the touch panel substrate on the side where at least one of the touch panel electrode and the touch panel wiring is disposed; a step of patterning the refractive index adjustment layer formed on the touch panel substrate; and a step of obtaining a cured film protecting at least a portion of at least one of the touch panel electrode and the touch panel wiring by developing the patterned refractive index adjustment layer.

[0677] [First stripping process]

[0678] When the transfer film of the present invention has a protective film, the manufacturing method of the touch panel preferably includes a first peeling step of peeling the protective film off the transfer film of the present invention.

[0679] The first peeling step is the process of peeling the protective film off the transfer film of the present invention as described above. The peeling method is not particularly limited, and known methods can be appropriately used.

[0680] [Transfer Printing Process]

[0681] The transfer process is a process of forming a refractive index adjustment layer (transfer) composed of or dried from the composition of the present invention on the surface of a substrate for a touch panel on one side where at least one of an electrode for a touch panel and a wiring for a touch panel is disposed.

[0682] When the transfer film has a photosensitive resin layer between the refractive index adjustment layer and the temporary support, it is preferable to form (transfer) the refractive index adjustment layer and the photosensitive resin layer simultaneously through this transfer process.

[0683] As a transfer method, the following method can be cited: the transfer film of the present invention is laminated onto the surface of a touch panel substrate on one side where at least one of a touch panel electrode and a touch panel wiring is disposed, and the refractive index adjustment layer on the transfer film is transferred onto the surface, thereby forming the refractive index adjustment layer on the surface.

[0684] Lamination (the so-called transfer of refractive index adjustment layers) can be performed using known laminators such as vacuum laminators and automatic cutting laminators.

[0685] As a lamination condition, it can be applied to general conditions.

[0686] The lamination temperature is preferably 80℃~150℃, more preferably 90℃~150℃, and even more preferably 100℃~150℃.

[0687] When using a laminator equipped with rubber rollers, the lamination temperature refers to the temperature of the rubber rollers.

[0688] There are no particular restrictions on the substrate temperature during lamination.

[0689] The substrate temperature during lamination is preferably 10°C to 150°C, more preferably 20°C to 150°C, and even more preferably 30°C to 150°C.

[0690] When a resin substrate is used as a substrate, the substrate temperature during lamination is preferably 10°C to 80°C, more preferably 20°C to 60°C, and even more preferably 30°C to 50°C.

[0691] Furthermore, the linear pressure used in lamination is preferably 0.5 N / cm to 20 N / cm, more preferably 1 N / cm to 10 N / cm, and even more preferably 1 N / cm to 5 N / cm.

[0692] Furthermore, the conveying speed (lamination speed) during lamination is preferably 0.5 m / min to 5 m / min, and more preferably 1.5 m / min to 3 m / min.

[0693] Through a transfer process, the refractive index adjustment layer of the transfer film is transferred to the surface of a touch panel substrate on the side where electrodes are disposed, thereby forming a laminate with a temporary support / refractive index adjustment layer / electrodes / substrate. Alternatively, when the transfer film has a thermoplastic resin layer between the refractive index adjustment layer and the temporary support, a laminate with a temporary support / thermoplastic resin layer / refractive index adjustment layer / electrodes / substrate is formed. Alternatively, when the transfer film has a photosensitive resin layer between the refractive index adjustment layer and the temporary support, a laminate with a temporary support / photosensitive resin layer / refractive index adjustment layer / electrodes / substrate is formed.

[0694] In these layered structures, the "electrodes, etc. / substrate" part is the substrate for touch panels.

[0695] [Exposure process]

[0696] The exposure process is a process of exposing the pattern of the refractive index adjustment layer formed on the substrate of the touch panel.

[0697] When the transfer film has a photosensitive resin layer between the refractive index adjustment layer and the temporary support, it is preferable to simultaneously expose the pattern of the refractive index adjustment layer and the photosensitive resin layer through this exposure process.

[0698] "Pattern exposure" refers to an exposure method that presents a pattern, that is, an exposure method that includes both exposed and unexposed areas.

[0699] In the refractive index adjustment layer on the substrate of the touch panel, the exposed part in the pattern exposure is cured and eventually becomes a cured film.

[0700] On the other hand, in the refractive index adjustment layer on the substrate for the touch panel, the non-exposed areas of the pattern exposure are not cured, but are removed by dissolving in the developer during the subsequent development process. The non-exposed areas can form openings in the cured film after the development process.

[0701] Pattern exposure can be achieved through exposure via a mask or through digital exposure using lasers or similar methods.

[0702] As a light source for pattern exposure, any light within the wavelength range that can illuminate the curable refractive index adjustment layer (e.g., 365nm or 405nm) can be appropriately selected.

[0703] As light sources, examples include various lasers, light-emitting diodes (LEDs), ultra-high pressure mercury lamps, high pressure mercury lamps, and metal halide lamps.

[0704] The optimal exposure level is 5 mJ / cm. 2 ~200mJ / cm 2 More preferably 10 mJ / cm 2 ~200mJ / cm 2 .

[0705] [Second stripping process]

[0706] The manufacturing method of the touch panel preferably includes a second peeling process, which peels off the temporary support after the exposure process and obtains a laminate with a cured film stacked on a substrate having electrodes.

[0707] The second stripping process is the process of stripping the temporary support after the exposure process. There are no particular limitations on the stripping method, and known methods can be appropriately used.

[0708] [Developing process]

[0709] The developing process is preferably performed after the second stripping process.

[0710] The developing process is a process of obtaining a cured film (protective film for touch panel) that protects at least a portion of at least one of the electrodes for touch panel and the wiring for touch panel by developing a refractive index adjustment layer exposed by a pattern.

[0711] When the transfer film has a photosensitive resin layer between the refractive index adjustment layer and the temporary support, it is preferable to simultaneously develop the patterned refractive index adjustment layer and the patterned photosensitive resin layer through this development process.

[0712] There are no particular restrictions on the developer used in the development process, and any known developer, such as the one described in Japanese Patent Application Publication No. 5-72724, may be used.

[0713] An alkaline aqueous solution is preferred as the developer.

[0714] Examples of alkaline compounds that can be contained in alkaline aqueous solutions include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and choline (2-hydroxyethyltrimethylammonium hydroxide).

[0715] The pH of the alkaline aqueous solution at 25°C is preferably 8 to 13, more preferably 9 to 12, and especially preferably 10 to 12.

[0716] The content of the alkaline compound in the alkaline aqueous solution is preferably 0.1% to 5% by mass, more preferably 0.1% to 3% by mass, relative to the total mass of the alkaline aqueous solution.

[0717] The developer may contain an organic solvent that is miscible with water.

[0718] Examples of organic solvents include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, and N-methylpyrrolidone.

[0719] The concentration of the organic solvent is preferably 0.1% to 30% by mass.

[0720] Developers may contain known surfactants.

[0721] The concentration of the surfactant is preferably 0.01% to 10% by mass.

[0722] The preferred temperature of the developer is 20℃~40℃.

[0723] Examples of development methods include, for example, spin-on immersion development, spray development, spray and spin development, and immersion development.

[0724] During spray development, the refractive index adjustment layer after pattern exposure is sprayed with developing solution in a spray pattern, thereby removing the non-exposed parts of the refractive index adjustment layer.

[0725] When using a transfer film having at least one of a refractive index adjustment layer (and any photosensitive resin layer) and a thermoplastic resin layer and an intermediate layer, after these layers are transferred onto the substrate and before the development of the refractive index adjustment layer (and photosensitive resin layer), an alkaline liquid with low solubility for the refractive index adjustment layer (and photosensitive resin layer) can be sprayed in a spray manner to remove at least one of the thermoplastic resin layer and the intermediate layer (or both if both are present).

[0726] Furthermore, after development, it is preferable to remove developing residue by spraying cleaning agents or by wiping with a brush.

[0727] The preferred temperature of the developer is 20℃~40℃.

[0728] The developing process may include the stage of performing the above-described developing process and the stage of heat treatment (hereinafter also referred to as "post-baking") on the cured film obtained by the above-described developing process.

[0729] When the substrate is a resin substrate, the post-baking temperature is preferably 100℃~160℃, more preferably 130℃~160℃.

[0730] The resistance value of the transparent electrode pattern can also be adjusted through this post-baking process.

[0731] When the refractive index adjustment layer or photosensitive resin layer includes a carboxyl (meth)acrylic resin, at least a portion of the carboxyl (meth)acrylic resin can be converted to a carboxylic anhydride through post-baking. Such a conversion results in excellent developability and the strength of the cured film.

[0732] The developing process may include the stage of performing the above-described developing process and the stage of exposing the cured film obtained by the above-described developing process to light (hereinafter also referred to as "post-exposure").

[0733] When the developing process includes both a post-exposure stage and a post-baking stage, it is preferable to perform post-baking after post-exposure.

[0734] Regarding pattern exposure and development, for example, one can refer to paragraphs 0035 to 0051 of Japanese Patent Application Publication No. 2006-23696.

[0735] The manufacturing method of the touch panel of the present invention may include processes other than those already described (so-called other processes).

[0736] Other steps include well-known steps that are sometimes included in the usual photolithography process (e.g., cleaning steps).

[0737] Example

[0738] The present invention will be further described in detail below with examples. The materials, amounts, proportions, processing contents, and processing steps shown in the following examples can be appropriately modified without departing from the spirit of the invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Furthermore, unless otherwise specified, "parts" and "%" are mass measurements.

[0739] Additionally, in the following embodiments, the weight-average molecular weight of the resin was calculated using polystyrene based on gel permeation chromatography (GPC). Furthermore, the theoretical acid value was used.

[0740] [Example 1]

[0741] [Preparation of the composition]

[0742] The following formulation 201, namely the coating liquid for the refractive index adjustment layer, is the composition of Example 1.

[0743] In Example 1, the composition was prepared using a mixed solvent of metal oxide particles, an acid-based adhesive polymer, an aqueous ammonia solution, an amine compound, methanol, and distilled water. The acid-based adhesive polymer was neutralized with the aqueous ammonia solution and the amine compound, thereby preparing an aqueous resin composition containing an ammonium salt of the acid-based adhesive polymer and an amine compound salt, i.e., a coating liquid for a refractive index adjustment layer.

[0744] - Coating liquid for refractive index adjustment layer: Formulation 201 (water-based resin composition) -

[0745] • Metal oxide particles (ZrO2 particles, NanoUse OZ-S30M, 30.5% solids, 69.5% methanol, refractive index 2.2, average particle size: approx. 12 nm, manufactured by Nissan Chemical Corporation): 80.00 parts (solids content).

[0746] • Adhesive polymer with acid groups (acrylic resin, ZB-015M, manufactured by FUJIFILM Wako PureChemical Corporation, copolymer of methacrylic acid / allyl methacrylate, weight average molecular weight 25,000, composition ratio (molar ratio) = 20 / 80, solid content 5.00%, ammonia solution): 12.85 parts (solid content).

[0747] • Adhesive polymer with acid groups (acrylic resin, ARUFON UC3920, manufactured by TOAGOSEI CO.,LTD.): 0.47 parts

[0748] • Unsaturated olefinic compounds (polyfunctional unsaturated olefinic compounds with carboxylic acid groups, ARONIX TO-2349, manufactured by TOAGOSEI CO.,LTD.): 2.00 parts

[0749] • Compounds with a 6-membered heterocyclic structure (adenine, manufactured by Tokyo Chemical Industry Co.,LTD.): 2.00 parts

[0750] Surfactant (fluorinated surfactant, MEGAFACE F-444, manufactured by DIC Corporation): 0.68 parts

[0751] • Amine compound (N-1,N-methyldiethanolamine, manufactured by Tokyo Chemical Industry Co.,LTD.): 2.00 parts

[0752] • Solvent: Add a 7:3 (mass ratio) mixture of methanol and distilled water to make the solid content of the coating solution for the refractive index adjustment layer 1.66% by mass.

[0753] [Preparation of transfer film]

[0754] <Formation of the photosensitive resin layer>

[0755] On a 16 μm thick polyethylene terephthalate film (temporary support, 16QS62, manufactured by TORAY INDUSTRIES, INC.), the photosensitive resin layer of formulation 101 below is applied with a coating liquid adjusted to a thickness of 5.5 μm after drying using a slit nozzle. The solvent is removed by drying using a hot air convection dryer with a temperature gradient of 75°C to 120°C, thereby forming the photosensitive resin layer.

[0756] - Coating solution for photosensitive resin layers: Formulation 101 (organic solvent-based resin composition) -

[0757] ·Alkenes

[0758] A-NOD-N (M-1,1,9-nonanediol diacrylate, manufactured by SHIN-NAKAMURA CHEMICAL CO.,LTD.): 2.73 parts

[0759] A-DCP (M-2, tricyclodecanedimethylethanol diacrylate, manufactured by SHIN-NAKAMURA CHEMICAL CO.,LTD.): 17.90 parts

[0760] ARONIX TO-2349 (M-3, a polyfunctional olefinic unsaturated compound with a carboxylic acid group, manufactured by TOAGOSEI CO.,LTD.): 2.98 parts

[0761] DPHA (M-4, dipentaerythritol hexaacrylate, manufactured by Toshin Yushi Co., Ltd.): 7.99 parts

[0762] Adhesive polymers

[0763] P-1 (The resin shown below, derived from styrene structural units (St) / dicyclopentyl methacrylate structural units (DCPMA) / methacrylic acid structural units (MAA) / structural units derived from methacrylic acid through the addition of glycidyl methacrylate (GMA-MAA) = 41.0 / 15.2 / 23.9 / 19.9 (mol%), Mw = 17,000): 52.67 parts (solid content).

[0764] Photopolymerization initiator

[0765] 1-[9-Ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]acetophenone-1-(O-acetyloxime) (D-1, Irgacure OXE-02, manufactured by BASF): 0.36 parts

[0766] 2-Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone (D-2Irgacure 907, manufactured by BASF): 0.73 parts

[0767] Thermally crosslinked compounds

[0768] DURANATE WT32-B75P (E-3, a capped isocyanate compound, manufactured by Asahi Kasei Corporation): 12.50 parts

[0769] Compound A-1

[0770] Isonicotinamide: 0.52 parts

[0771] Compound A-2

[0772] Benzimidazole: 0.13 parts

[0773] Other additives

[0774] Hydrogen-donating compound (AD-1, N-phenylglycine, manufactured by JUNSEI CHEMICAL CO.,LTD.): 0.10 parts

[0775] A copolymer of styrene and maleic anhydride in a 4:1 molar ratio (AD-2, SMA EF-40, anhydride value 1.94 mmol / g, weight-average molecular weight 10,500, manufactured by Cray Valley): 1.20 parts

[0776] Surfactant (AD-3, fluorinated surfactant, MEGAFACE F-551A, manufactured by DIC Corporation): 0.19 parts

[0777] • Organic solvent: Add a 1:1 (mass ratio) mixture of 1-methoxy-2-propyl acetate and methyl ethyl ketone to make the solid component concentration of the coating solution for forming the photosensitive resin layer 25 by mass.

[0778] [Chemical Formula 25]

[0779]

[0780] <Formation of the Refractive Index Adjustment Layer>

[0781] Next, using a slit nozzle, the composition of Example 1 (formulation 201, i.e., the coating liquid for the refractive index adjustment layer) was adjusted and coated onto the photosensitive resin layer to a thickness of 70 nm after drying. The coating was then dried using a hot air convection dryer with a temperature gradient of 40°C to 95°C to remove the solvent, thereby forming a refractive index adjustment layer that is in direct contact with the photosensitive resin layer. The refractive index of the refractive index adjustment layer is 1.68 at 25°C and a wavelength of 550 nm.

[0782] <Formation of Protective Film>

[0783] The transfer film of Example 1 was produced by pressing a 16 μm thick polyethylene terephthalate film (protective film, 16QS62, manufactured by TORAY INDUSTRIES, INC.) onto the refractive index adjustment layer of the temporary support obtained above.

[0784] [Examples 2-6, 8-18 and Comparative Examples 1-3]

[0785] The formulation of the composition used as the refractive index adjustment layer was changed as shown in Table 1 below. Except for this, the transfer film was prepared in the same manner as in Example 1. Furthermore, the solvent is omitted from Table 1, but the solvent and solids concentrations of the compositions in each example and comparative example are the same as those of the composition in Example 1.

[0786] [Example 7]

[0787] The composition of Example 7, as described in Table 1 below, was prepared. In the composition of Example 7, 0.58 parts of OXE-01 (trade name: IRGACURE (registered trademark) OXE-01, manufactured by BASF) were added as a photopolymerization initiator. Furthermore, the solvent is omitted in Table 1, but the solvent and solids concentrations of the composition of Example 7 are the same as those of the organic solvent and solids concentrations of Formulation 101, i.e., the coating liquid for the photosensitive resin layer.

[0788] On a 16 μm thick polyethylene terephthalate film (temporary support, 16QS62, manufactured by TORAY INDUSTRIES, INC.), the composition of Example 7 (coating liquid for refractive index adjustment layer) was adjusted and coated to a thickness of 4.0 μm after drying using a slit nozzle. The solvent was removed by drying using a hot air convection dryer with a temperature gradient of 75°C to 120°C, thereby forming a single-layer refractive index adjustment layer.

[0789] The transfer film of Example 7 was produced by pressing a 30 μm thick polypropylene film (protective film, Alphan E-201F, manufactured by Oji F-Tex Co.,LTD.) onto a laminate with a single refractive index adjustment layer in direct contact on a temporary support.

[0790] [Example 16]

[0791] - Coating solution for photosensitive resin layer: Formulation 102 (organic solvent-based resin composition) -

[0792] ·Alkenes

[0793] A-NOD-N (M-1,1,9-nonanediol diacrylate, manufactured by SHIN-NAKAMURA CHEMICAL CO.,LTD.): 2.79 parts

[0794] A-DCP (M-2, tricyclodecanedimethylethanol diacrylate, manufactured by SHIN-NAKAMURA CHEMICAL CO.,LTD.): 9.13 parts

[0795] ARONIX TO-2349 (M-3, a polyfunctional olefinic unsaturated compound with a carboxylic acid group, manufactured by TOAGOSEI CO.,LTD.): 3.04 parts

[0796] DPHA (M-4, dipentaerythritol hexaacrylate, manufactured by Toshin Yushi Co., Ltd.): 1.73 parts

[0797] Adhesive polymers

[0798] P-2 (The resin shown below is derived from styrene structural units (St) / methacrylic acid structural units (MAA) / glycidyl methacrylate structural units formed by the addition of methacrylic acid structural units to glycidyl methacrylate (GMA-MAA) / methyl methacrylate structural units (MMA)

[0799] =55.1 / 26.5 / 16.9 / 1.5 (mol%), Mw=17,000): 49.04 parts (solid content)

[0800] P-2

[0801]

[0802] Photopolymerization initiator

[0803] 1-[9-Ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]acetophenone-1-(O-acetyl oxime) (D-1, Irgacure OXE-02, manufactured by BASF): 0.37 parts

[0804] 2-Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone (D-2Irgacure 907, manufactured by BASF): 0.74 parts

[0805] Thermally crosslinked compounds

[0806] DURANATE WT32-B75P (terminated isocyanate compound, manufactured by Asahi Kasei Corporation): 12.50 parts

[0807] Compounds with the following structure: 3.00 parts

[0808]

[0809] Compound A-1

[0810] Isonicotinamide: 0.52 parts

[0811] Compound A-2

[0812] Benzimidazole: 0.13 parts

[0813] Other additives

[0814] Hydrogen-donating compound (AD-1, N-phenylglycine, manufactured by JUNSEI CHEMICAL CO.,LTD.): 0.10 parts

[0815] A copolymer of styrene and maleic anhydride in a 4:1 molar ratio (AD-2, SMA EF-40, anhydride value 1.94 mmol / g, weight-average molecular weight 10,500, manufactured by Cray Valley): 1.20 parts

[0816] Surfactant (AD-3, fluorinated surfactant, MEGAFACE F-551A, manufactured by DIC Corporation): 0.19 parts

[0817] • Organic solvent: Add a 1:1 (mass ratio) mixture of 1-methoxy-2-propyl acetate and methyl ethyl ketone to make the solid component concentration of the coating solution for forming the photosensitive resin layer 25 by mass.

[0818] [Preparation of transfer film]

[0819] <Formation of the photosensitive resin layer>

[0820] On a 16 μm thick polyethylene terephthalate film (temporary support, 16QS62, manufactured by TORAY INDUSTRIES, INC.), the photosensitive resin layer of the following formulation 102 is applied with a coating liquid adjusted to a thickness of 5.5 μm after drying using a slit nozzle. The film is then dried using a hot air convection dryer with a temperature gradient of 75°C to 120°C to remove the solvent, thereby forming the photosensitive resin layer.

[0821] <Formation of the Refractive Index Adjustment Layer>

[0822] Next, using a slit nozzle, the composition of Example 1 (formulation 201, i.e., the coating liquid for the refractive index adjustment layer) was adjusted and coated onto the photosensitive resin layer to a thickness of 70 nm after drying. The coating was then dried using a hot air convection dryer with a temperature gradient of 40°C to 95°C to remove the solvent, thereby forming a refractive index adjustment layer that is in direct contact with the photosensitive resin layer. The refractive index of the refractive index adjustment layer is 1.68 at 25°C and a wavelength of 550 nm.

[0823] <Formation of Protective Film>

[0824] The transfer film of Example 16 was produced by pressing a 16 μm thick polyethylene terephthalate film (protective film, 16QS62, manufactured by TORAY INDUSTRIES, INC.) onto the refractive index adjustment layer of the temporary support obtained above.

[0825] [Example 17]

[0826] The thickness of the dried photosensitive resin layer was adjusted to 4.5 μm, and otherwise a transfer film was prepared in the same manner as in Example 16.

[0827] [Example 18]

[0828] The thickness of the dried photosensitive resin layer was adjusted to 8.8 μm. Otherwise, a transfer film was prepared in the same manner as in Example 16.

[0829] The structures of the amine compounds used in each embodiment are as follows. Additionally, Table 1 below lists the linker chain length (maximum value) of the linker group included in the substituents of the nitrogen atom of each amine compound and the weight-average molecular weight of each amine compound.

[0830] [Chemical Formula 26]

[0831] N-1: N-Methyldiethanolamine

[0832]

[0833] N-2: 3-(diethylamino)-1,2-propanediol

[0834]

[0835] N-3: 2-[2-(dimethylamino)ethoxy]ethanol

[0836]

[0837] N-4: N,N,N',N'-Tetra(2-hydroxypropyl)ethylenediamine

[0838]

[0839] The structures of the amine compounds used in each comparative example are as follows.

[0840] [Chemical Formula 27]

[0841] N-5: Isopropanolamine

[0842]

[0843] N-6: Diisopropylamine

[0844]

[0845] The metal oxide particles used in Example 11 and the olefinic unsaturated compounds used in Example 12 are as follows.

[0846] • Metal oxide particles (titanium dioxide particles, TS-020, containing tin oxide and silicon dioxide, 25.8% non-volatile components, manufactured by TAYCA CORPORATION)

[0847] • Alkene unsaturated compound (2-hydroxyethyl methacrylate, Light Ester Ho-250(N), manufactured by KyoEisha Chemical Co., Ltd.)

[0848] [evaluate]

[0849] The obtained transfer film was evaluated as follows. The results are recorded in Table 1 below.

[0850] [Evaluation of curvature]

[0851] The obtained transfer film was exposed using a proximity exposure machine (manufactured by Hitachi High-TechFine Systems Corporation) equipped with an ultra-high pressure mercury lamp, through a protective film, at 120 mJ / cm². 2 The exposure (i-ray) was performed from above the protective film, covering the entire surface.

[0852] Afterward, peel off the protective film, wrap it 180° around a 1mm diameter rod in contact with the temporary support, and let it stand for 5 minutes.

[0853] The surface of the refractive index adjustment layer was then observed using an optical microscope to confirm whether there were any cracks.

[0854] Among the following evaluation criteria, bending performance A is the best, and D is the worst. Preferably, it is A or B, and more preferably A.

[0855] A: No rupture occurred at all.

[0856] B: A slight rupture has occurred.

[0857] C: The entire surface has cracked.

[0858] D: The entire surface has cracked, and some parts of the resin layer have been peeled off.

[0859] [Evaluation of rust prevention]

[0860] After peeling off the protective film from the obtained photosensitive transfer material, a refractive index adjusting layer is laminated onto the copper plate. The lamination conditions are set as follows: lamination roller temperature 100℃, linear pressure 3N / cm, and conveyor speed 4m / min.

[0861] Subsequently, using a proximity exposure machine equipped with an ultra-high pressure mercury lamp (manufactured by Hitachi High-Tech Fine Systems Corporation), the distance between the exposure mask (1mm wide line and spatial pattern: 5 lines) and the temporary support was set to 125μm. Through the temporary support, an exposure was applied at 120mJ / cm². 2 The obtained pre-exposure laminate was patterned using i-ray exposure. After removing the temporary support, the patterned laminate was immersed in a 1% sodium carbonate aqueous solution at 33°C, left to stand for 45 seconds, and then developed. Residue was removed by spraying ultrapure water onto the developed copper substrate through an ultra-high pressure cleaning nozzle. Next, air was blown to remove moisture from the copper substrate, followed by a post-baking treatment at 140°C for 30 minutes, serving as an evaluation sample for rust resistance.

[0862] Afterwards, the rust-prevention evaluation samples were left to stand for 24 hours at 85°C and 85% relative humidity.

[0863] Visual inspection confirmed the discoloration of the copper in the spatial portion of the pattern.

[0864] Among the following evaluation criteria, A has the best rust resistance, and D has the worst. Preferably, it is any one of A, B, and C, more preferably A or B, and especially preferably A.

[0865] A: The color of the copper is the same as before the treatment; there has been no discoloration.

[0866] B: It turned slightly red.

[0867] C: Turns red.

[0868] D: Turns blue.

[0869] [Table 1-1]

[0870]

[0871] [Table 1-2]

[0872]

[0873] As can be seen from the results shown in Table 1 above, if the composition of the present invention is used, a transfer film with improved flexibility can be obtained when having a layer containing metal oxide particles.

[0874] As can be seen from Comparative Example 1, when the weight-average molecular weight of the amine compound is lower than the lower limit specified in this invention, its flexibility is poor.

[0875] As can be seen from Comparative Example 2, when the linking chain length of the linking group contained in the substituent of the nitrogen atom of the amine compound is lower than the lower limit specified in this invention, the flexibility is poor.

[0876] Comparative Example 3 shows that the flexibility is poor when no amine compound is present.

[0877] Furthermore, as can be seen from Examples 1 to 18, which are preferred embodiments of the compositions of the present invention, a transfer film with further improved rust resistance can be provided.

[0878] [Examples 101-106, 108-118]

[0879] [Manufacturing of display devices]

[0880] A substrate was prepared in which a second refractive index adjustment layer and an ITO transparent electrode pattern and copper circuitry were formed on a cycloolefin transparent film.

[0881] Using transfer films from Examples 1-6 and 8-18 (with the protective film removed), the second refractive index adjustment layer, the ITO transparent electrode pattern, and the copper circuitry were laminated onto the areas covered by the transfer film. Lamination was performed using a vacuum laminator manufactured by MCK Corporation under the following conditions: cycloolefin transparent film temperature 40°C, rubber roller temperature 100°C, linear pressure 3 N / cm, and conveyor speed 2 m / min.

[0882] Subsequently, using a proximity exposure machine equipped with an ultra-high pressure mercury lamp (manufactured by Hitachi High-Tech Fine Systems Corporation), the exposure mask (a quartz exposure mask with a pattern for forming an outer coating) was brought into close contact with a temporary support, and then exposed to the temporary support at a pressure of 100 mJ / cm². 2 The exposure (i-ray) was used to expose the pattern.

[0883] After the temporary support was peeled off, the patterned laminate was immersed in a 1% sodium carbonate aqueous solution at 33°C, left to stand for 45 seconds, and then developed.

[0884] Subsequently, ultrapure water was sprayed from an ultra-high pressure cleaning nozzle onto the developed transparent film substrate to remove residue. Next, air was blown to remove moisture from the transparent film substrate, followed by a post-baking treatment at 145°C for 30 minutes, forming a transparent laminate on the transparent film substrate, which consists of a second refractive index adjustment layer, an ITO transparent electrode pattern, copper circuitry, a cured film (cured refractive index adjustment layer), and a cured photosensitive resin layer.

[0885] [Manufacturing of display devices]

[0886] Using the transparent laminate produced, a capacitive touch panel component (input device) was manufactured by a known method.

[0887] By bonding the manufactured touch panel component with a liquid crystal display element manufactured by the method described in paragraphs 0097 to 0119 of Japanese Patent Application Publication No. 2009-047936, a touch panel of a liquid crystal display device having a touch panel component as an input device and a liquid crystal display device as a display device is manufactured.

[0888] [Example 107]

[0889] The transfer film of Example 7 was used instead of the transfer film of Example 1. Otherwise, a transparent laminate was formed in the same manner as in Example 101, in which a second refractive index adjustment layer, an ITO transparent electrode pattern, copper circuit wiring, and a curing film (cured product of a single refractive index adjustment layer) were sequentially stacked on a transparent film substrate.

[0890] [Touch Panel Evaluation]

[0891] It was confirmed that the touch panels of each embodiment have excellent display characteristics and work normally.

[0892] Symbol Explanation

[0893] 10-Transfer film, 12-Temporary support, 16-Protective film, 18-Electrode protective film for touch panel, 18A-Photosensitive resin layer, 20-First refractive index adjustment layer, 20A-Refractive index adjustment layer, 30-Touch panel, 32-Substrate, 34-Transparent electrode pattern, 36-Second refractive index adjustment layer, 40-First area with transparent electrode pattern, 42-Second area without transparent electrode pattern, 56-Circuitous wiring, 70-First transparent electrode pattern, 72-Second transparent electrode pattern, 74-Image display area, 75-Image non-display area, 90-Touch panel.

Claims

1. A composition comprising: Amine compounds, metal oxide particles, and adhesive polymers with acid groups. As a substituent for the nitrogen atom of the amine compound, the substituent comprises a linking group having a linking chain length of 3 to 6, wherein the linking chain length represents the number of atoms in the linking chain. The metal oxide particles comprise at least one selected from zirconium oxide particles and titanium oxide particles. The amine compound is a compound represented by the following general formula N. The weight-average molecular weight of the amine compound is 100–350. The composition further comprises a compound having a 6-membered heterocyclic structure, wherein the compound having a 6-membered heterocyclic structure is a monocyclic or polycyclic aromatic heterocyclic structure. In the general formula N, L 1 R represents a linker group with a linker chain length of 3-6 and containing an oxygen atom. 1 Represents a hydrogen atom or a halogen atom. L 2 and L 3 Each independently represents an alkylene group or a linking group with a chain length of 3 or more and containing an oxygen atom, R 2 and R 3 Each can be used to represent a hydrogen atom or a halogen atom independently.

2. The composition according to claim 1, wherein, The content of the metal oxide particles is 40% to 95% by mass relative to the total solids content in the composition.

3. The composition according to claim 1, wherein, The compound having a 6-membered heterocyclic structure has a 6-membered heterocyclic structure with 2 nitrogen atoms in the ring structure.

4. The composition according to claim 3, wherein, The compound having a 6-membered heterocyclic structure is adenine or pyrimidine.

5. The composition according to claim 1 or 2, further comprising an olefinically unsaturated compound.

6. The composition according to claim 5, further comprising a photopolymerization initiator.

7. The composition according to claim 1, wherein, The weight-average molecular weight of the amine compound is 100-150.

8. The composition according to claim 1 or 7, used to form a protective film on a touch panel.

9. The composition according to claim 1 or 7, used to form a refractive index adjustment layer on a touch panel.

10. A method for manufacturing a composition, comprising the steps of preparing the composition using an amine compound, metal oxide particles, an adhesive polymer having an acid group, and a compound having a 6-membered heterocyclic structure. As a substituent for the nitrogen atom of the amine compound, the substituent comprises a linking group having a linking chain length of 3 to 6, wherein the linking chain length represents the number of atoms in the linking chain. The metal oxide particles comprise at least one selected from zirconium oxide particles and titanium oxide particles. The amine compound is a compound represented by the following general formula N. The weight-average molecular weight of the amine compound is 100–350. The compounds having a 6-membered heterocyclic structure have monocyclic or polycyclic aromatic heterocyclic structures. In the general formula N, L 1 R represents a linker group with a linker chain length of 3-6 and containing an oxygen atom. 1 Represents a hydrogen atom or a halogen atom. L 2 and L 3 Each independently represents an alkylene group or a linking group with a chain length of 3 or more and containing an oxygen atom, R 2 and R 3 Each can be used to represent a hydrogen atom or a halogen atom independently.

11. A method for manufacturing a composition, wherein the composition is the composition according to any one of claims 1 to 9. The method for manufacturing the composition includes the steps of preparing the composition using the amine compound, the metal oxide particles, the adhesive polymer having acid groups, and the compound having a 6-membered heterocyclic structure.

12. A cured film of the composition according to any one of claims 1 to 9.

13. A transfer film having a temporary support and a refractive index adjusting layer comprising the composition of any one of claims 1 to 9.

14. The transfer film according to claim 13, wherein, The refractive index of the refractive index adjustment layer is 1.55 to 1.

80.

15. The transfer film according to claim 13 or 14, wherein a photosensitive resin layer is present between the temporary support and the refractive index adjustment layer.

16. The transfer film according to claim 15, wherein, The photosensitive resin layer contains an adhesive polymer, an olefinic unsaturated compound, and a photopolymerization initiator.

17. A method for manufacturing a touch panel, comprising: A process for preparing a substrate for a touch panel, wherein the substrate for a touch panel has a structure in which at least one of an electrode for a touch panel and a wiring for a touch panel is disposed on the substrate; A process of forming a refractive index adjustment layer, which is composed of or dried from the composition of any one of claims 1 to 9, on the surface of the substrate for the touch panel on the side where at least one of the electrodes for the touch panel and the wiring for the touch panel is disposed. The process of patterning the refractive index adjustment layer formed on the substrate for the touch panel; and The process of obtaining a cured film that protects at least a portion of at least one of the electrodes for the touch panel and the wiring for the touch panel by developing the patterned refractive index adjustment layer.

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